Gas dilution device and integrated exhaust management system

Abstract

This invention relates to the field of exhaust gas treatment technology, and more particularly to a gas dilution device and an integrated exhaust gas management system. The gas dilution device, used in an integrated exhaust gas management system, includes a gas source, a gas delivery pipeline, a pressure regulating valve, a first shut-off valve, and a multi-way valve. The two ends of the gas delivery pipeline are connected to the gas source and a plant-end pipeline, respectively. The pressure regulating valve is located on the gas delivery pipeline. The first shut-off valve is located on the gas delivery pipeline and downstream of the pressure regulating valve. The first port of the multi-way valve is connected to the gas delivery pipeline, the second port is connected to the plant-end pipeline, and the third port is connected to the exhaust gas treatment component. According to the gas dilution device of this invention, when a large amount of hydrogen is present in the plant-end pipeline, the first shut-off valve is opened, and the gas adjusted by the pressure regulating valve is delivered to the plant-end pipeline through the gas delivery pipeline, thereby reducing the volume concentration of hydrogen in the plant-end pipeline and improving the safety of the integrated exhaust gas management system.

Description

Technical Field

[0001] This invention relates to the field of exhaust gas treatment technology, and in particular to a gas dilution device and an integrated exhaust management system. Background Technology

[0002] This section provides only background information relevant to this disclosure and is not necessarily prior art.

[0003] Integrated exhaust management systems can be widely used in various epitaxial production fields such as semiconductor epitaxy, photovoltaic epitaxy, and LED epitaxy, and are especially suitable for production scenarios with high capacity, high purity, and high safety requirements.

[0004] In semiconductor manufacturing, the EPI (Epitaxy) process is commonly used. The EPI process is typically implemented using epitaxial equipment. The integrated exhaust management system is connected to the plant's pipelines, which contain a large amount of hydrogen. If the volume concentration of hydrogen reaches a certain range, there is a risk of explosion. Therefore, a gas dilution device is needed to control the volume concentration of hydrogen in the plant's pipelines and improve the safety of the integrated exhaust management system. Summary of the Invention

[0005] The objective of this invention is to at least solve the problem of how to control the volume concentration of hydrogen in the plant-side pipeline, thereby improving the safety of exhaust gas from an integrated exhaust management system. This objective is achieved through the following technical solution: A first aspect of this invention provides a gas dilution device for an integrated exhaust management system, the integrated exhaust management system being connected to a plant-level pipeline, the gas dilution device comprising: Gas source; A gas delivery pipeline, the two ends of which are respectively connected to the gas source and the plant end pipeline; A pressure regulating valve is provided on the gas delivery pipeline; A first shut-off valve is provided on the gas delivery pipeline and located downstream of the pressure regulating valve; A multi-port valve, comprising a first port, a second port, and a third port, wherein the first port is connected to the gas delivery pipeline, the second port is connected to the plant-side pipeline, and the third port is connected to the exhaust gas treatment component of the integrated exhaust management system.

[0006] According to the gas dilution device of the present invention, when there is a large amount of hydrogen in the plant end pipeline, the first shut-off valve is opened, and the gas adjusted by the pressure regulating valve is transported to the plant end pipeline through the gas delivery pipeline, thereby reducing the volume concentration of hydrogen in the plant end pipeline and improving the safety of the integrated exhaust management system.

[0007] In addition, the gas dilution apparatus according to the present invention may also have the following additional technical features: In some embodiments of the present invention, the gas dilution device further includes a mass flow controller, which is disposed on the gas delivery pipeline.

[0008] In some embodiments of the present invention, the gas dilution device further includes a second shut-off valve, which is located downstream of the first shut-off valve.

[0009] In some embodiments of the present invention, the integrated exhaust management system further includes a vacuum pump assembly; the multi-way valve further includes a fourth interface, which is connected to the output pipe of the vacuum pump assembly.

[0010] In some embodiments of the present invention, the inner diameter of any one of the second interface, the third interface, and the fourth interface is smaller than the inner diameter of the first interface.

[0011] In some embodiments of the present invention, at least one of the first shut-off valve and the second shut-off valve is a diaphragm valve.

[0012] A second aspect of this invention provides an integrated exhaust management system, the integrated exhaust management system comprising: As described in the above embodiment, the gas dilution device is connected to the plant end pipeline and is used to input gas into the plant end pipeline.

[0013] In addition, the integrated exhaust management system according to the present invention may also have the following additional technical features: In some embodiments of the present invention, the integrated exhaust management system further includes: A vacuum pump assembly, the vacuum pump assembly including a first vacuum pump and a first three-way valve, the first vacuum pump being connected to one port of the first three-way valve; The exhaust gas treatment assembly includes a scrubbing tower, and the other two ports of the first three-way valve are selectively connected to either the plant-end pipeline or the scrubbing tower. When the first three-way valve is connected to the plant end pipeline, the gas dilution device is configured to input gas into the plant end pipeline.

[0014] In some embodiments of the present invention, the integrated exhaust management system further includes: An exhaust gas treatment assembly, wherein the gas dilution device is configured to activate in the event of a malfunction of the exhaust gas treatment assembly to deliver dilute gas to the plant-end pipeline.

[0015] In some embodiments of the present invention, the number of the vacuum pump assembly, the exhaust gas treatment assembly, and the gas dilution device are each at least two; When the first three-way valve of each of the vacuum pump assemblies is in communication with the plant end pipeline, each of the gas dilution devices is configured to input gas into the plant end pipeline. Attached Figure Description

[0016] Various other advantages and benefits will become apparent to those skilled in the art upon reading the following detailed description of preferred embodiments. The accompanying drawings are for illustrative purposes only and are not intended to limit the invention. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings: Figure 1 This is a schematic diagram of an integrated exhaust management system. Figure 2 for Figure 1 The diagram shows the integrated exhaust management system in another operating state. Figure 3 for Figure 1 The diagram shows the integrated exhaust management system in another operating state. Figure 4 for Figure 1 The diagram shows the integrated exhaust management system in another working state. Figure 5 A schematic diagram of the integrated exhaust management system of this application is shown. Figure 6 A schematic diagram of the gas dilution device of this application is shown. Figure 7 A schematic three-dimensional structural diagram of the gas dilution device of this application is shown. Figure 8 for Figure 7 The diagram shows the gas dilution device from a second-view perspective. Figure 9 A schematic diagram of an integrated exhaust management system according to this application is shown.

[0017] The attached figures are labeled as follows: 100. Integrated exhaust management system; 10. Gas dilution device; 11. Gas source; 12. Gas delivery pipeline; 13. Pressure regulating valve; 14. First shut-off valve; 15. Mass flow controller; 16. Second shut-off valve; 17. Multi-port valve; 171. First port; 172. Second port; 173. Third port; 174. Fourth port; 20. Vacuum pump assembly; 21. First vacuum pump; 211. Output pipe; 22. First three-way valve; 30. Exhaust gas treatment assembly; 31. Scrubber tower; 32. Second three-way valve; 50. First connecting pipe; 60. Second connecting pipe; 70. Third connecting pipe 200. Plant-side pipeline. Detailed Implementation

[0018] Exemplary embodiments of the present disclosure will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be implemented in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.

[0019] It should be understood that the terminology used herein is for the purpose of describing particular exemplary embodiments only and is not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms “a,” “an,” and “described” as used herein may also include the plural forms. The terms “comprising,” “including,” “containing,” and “having” are inclusive and therefore indicate the presence of the stated features, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, steps, operations, elements, components, and / or combinations thereof. The method steps, processes, and operations described herein are not construed as requiring them to be performed in a particular order described or illustrated unless the order of performance is explicitly indicated. It should also be understood that additional or alternative steps may be used.

[0020] Although terms such as first, second, third, etc., may be used in this document to describe multiple elements, components, regions, layers, and / or segments, these elements, components, regions, layers, and / or segments should not be limited by these terms. These terms may be used only to distinguish one element, component, region, layer, or segment from another. Unless the context clearly indicates otherwise, terms such as "first," "second," and other numerical terms used herein do not imply order or sequence. Therefore, the first element, component, region, layer, or segment discussed below may be referred to as the second element, component, region, layer, or segment without departing from the teachings of the exemplary embodiments.

[0021] For ease of description, spatial relative terms may be used in the text to describe the relationship of one element or feature relative to another element or feature, as shown in the figure. These relative terms include, for example, "inside," "outside," "middle," "outer," "below," "below," "above," "over," etc. Such spatial relative terms are intended to include different orientations of the device in use or operation, other than those depicted in the figure. For example, if the device in the figure is flipped, an element described as "below other elements or features" or "below other elements or features" would subsequently be oriented "above other elements or features" or "above other elements or features." Therefore, the example term "below" can include both upper and lower orientations.

[0022] In semiconductor manufacturing, EPI (Epitaxy) technology is commonly used. EPI technology is typically implemented using epitaxial equipment. The integrated exhaust management system 100 is connected to the plant-end pipeline 200. The plant-end pipeline 200 contains a large amount of hydrogen gas. If the volume concentration of hydrogen gas reaches a certain range, there is a risk of explosion. Therefore, a gas dilution device 10 is needed to control the volume concentration of hydrogen gas in the plant-end pipeline 200 to improve the safety of the integrated exhaust management system 100.

[0023] like Figures 1 to 4 As shown, Figure 1 This is a schematic diagram of the structure of an integrated exhaust management system 100. Figure 2 for Figure 1 The schematic diagram shown depicts the integrated exhaust management system 100 in another operating state. Figure 3 for Figure 1 The diagram shows the integrated exhaust management system 100 in another operating state. Figure 4 for Figure 1 The diagram shows the integrated exhaust management system 100 in another working state. The integrated exhaust management system 100 includes a vacuum pump assembly 20 and an exhaust gas treatment assembly 30. The number of vacuum pump assemblies 20 and exhaust gas treatment assemblies 30 can be two or more. All vacuum pump assemblies 20 and exhaust gas treatment assemblies 30 are integrated into one structure. The core technical advantage of this integrated structure is that, compared with the existing technology where the vacuum pump assembly 20 and exhaust gas treatment assembly 30 are arranged separately, it can significantly save equipment installation space, reduce pipeline connection nodes, and reduce the risk of exhaust gas leakage. At the same time, the integrated design facilitates unified debugging, maintenance, and operation and maintenance management of the equipment, reduces the workload of maintenance personnel, improves equipment operation and maintenance efficiency, and reduces operation and maintenance costs. It is especially suitable for scenarios with high requirements for site space and operation and maintenance precision, such as semiconductor epitaxial production.

[0024] It should be added that, here, "plant-end pipeline 200" refers to various public works conveying systems in a factory or manufacturing facility that are managed, maintained, and operated by the plant administration department. These systems support the supply and treatment of media such as water, electricity, gas, chemicals, waste gas, and wastewater required for the production process. In this case, plant-end pipeline 200 is used for waste gas treatment. Plant-end pipeline 200 refers to pipelines installed within the plant building and can be at least two interconnected pipeline structures.

[0025] exist Figures 1 to 4 In the diagram, there are two vacuum pump assemblies 20 and two exhaust gas treatment assemblies 30. The arrows in the diagram indicate the direction of exhaust gas flow. Figure 1 In the middle, the gas discharged from the vacuum pump assembly 20 on the left enters the exhaust gas treatment assembly 30 on the left, and the gas discharged from the vacuum pump assembly 20 on the right enters the exhaust gas treatment assembly 30 on the right, thus achieving exhaust gas treatment. Figure 2 In the middle, the exhaust gas treatment component 30 on the left shuts down. The exhaust gas discharged from the vacuum pump component 20 on the left and the exhaust gas discharged from the vacuum pump component 20 on the right both enter the exhaust gas treatment component 30 on the right, thus achieving exhaust gas treatment. Figure 3 In the middle, the exhaust gas treatment component 30 on the right side stops operating. The exhaust gas discharged from both the vacuum pump component 20 on the left and the vacuum pump component 20 on the right side enters the exhaust gas treatment component 30 on the left, thus achieving exhaust gas treatment. Figure 4 In the middle, the exhaust gas treatment components 30 on the left and right simultaneously stop. At this time, the exhaust gas discharged from the vacuum pump assembly 20 on the left and the exhaust gas discharged from the vacuum pump assembly 20 on the right both enter the plant end pipeline 200. Since the exhaust gas contains a large amount of hydrogen, there will be a large amount of hydrogen in the plant end pipeline 200. Therefore, it is necessary to provide a gas dilution device 10 to control the volume concentration of hydrogen in the plant end pipeline 200 and improve the safety of the integrated exhaust management system 100.

[0026] like Figure 5 As shown, Figure 5 A schematic diagram of the integrated exhaust management system 100 of this application is shown. Figure 5 The integrated exhaust management system 100 also includes a gas dilution device 10, which is connected to the plant end pipeline 200 and is used to input gas into the plant end pipeline 200, thereby reducing the volume concentration of hydrogen in the plant end pipeline 200 and reducing safety hazards.

[0027] It should be noted that the explosive limits of hydrogen in air are typically between 4% and 75.6% by volume concentration. This means that when the volume concentration of hydrogen in air is within this range, the mixing ratio of hydrogen and oxygen is exactly within the flammable range. Once exposed to a source of ignition or high temperatures, a rapid combustion reaction will occur, releasing a large amount of energy and leading to an explosion. Therefore, when hydrogen is exposed to air and comes into contact with oxygen, reducing and diluting its volume concentration to below the 4% lower explosive limit is crucial to ensuring the overall safety of the integrated exhaust management system 100.

[0028] The volume concentration mentioned here refers to the gas volume concentration, which is the content of a certain gas in a unit volume of mixed gas. In this invention, the volume concentration of hydrogen is the content of hydrogen in a unit volume of mixed gas.

[0029] Integrated exhaust management system 100 Figure 4 In the state of hydrogen, the volume concentration of hydrogen is usually high. Therefore, a gas dilution device 10 is required to reduce the volume concentration of hydrogen in the plant end pipeline 200 so that the volume concentration of hydrogen is below 4% or close to 4%, thereby improving the safety of the integrated exhaust management system 100.

[0030] exist Figure 5 The integrated exhaust management system 100 has two vacuum pump assemblies 20 and two exhaust gas treatment assemblies 30. This structure breaks the limitation of single-component operation and realizes the redundancy backup and alternating operation of the integrated exhaust management system 100. It effectively avoids the problem of the integrated exhaust management system 100 shutting down due to the failure of a single component and ensures the continuity of production of extended equipment. At the same time, this structure can flexibly switch the working mode (such as single-component operation or dual-component parallel operation) according to the real-time changes in exhaust gas emission and pollutant concentration, realize the dynamic adjustment of exhaust gas treatment load, ensure the exhaust gas treatment effect, avoid energy waste, and improve the flexibility and economy of the integrated exhaust management system 100 operation.

[0031] Figure 9 The schematic diagram illustrates the structure of an integrated exhaust management system according to this application. Figure 9 In the integrated exhaust management system 100, there are two vacuum pump assemblies 20 and two exhaust gas treatment assemblies 30, which are formed as an integrated single structure.

[0032] The following will combine Figures 6 to 8 The structure of the gas dilution device 10 will be described in detail below, wherein, Figure 6 A schematic diagram of the gas dilution device 10 of this application is shown. Figure 7A schematic three-dimensional structural diagram of the gas dilution device 10 of this application is shown. Figure 8 for Figure 7 The diagram shows the gas dilution device 10 from a second-view perspective.

[0033] like Figure 6 As shown, the gas dilution device 10 includes a gas source 11, a gas delivery pipeline 12, a pressure regulating valve 13, a first shut-off valve 14, and a multi-way valve 17. The two ends of the gas delivery pipeline 12 are connected to the gas source 11 and the plant-end pipeline 200, respectively. The pressure regulating valve 13 is located on the gas delivery pipeline 12; the first shut-off valve 14 is located on the gas delivery pipeline 12 and downstream of the pressure regulating valve 13. The multi-way valve 17 includes a first interface 171, a second interface 172, and a third interface 173. The first interface 171 is connected to the gas delivery pipeline 12, the second interface 172 is connected to the plant-end pipeline 200, and the third interface 173 is connected to the exhaust gas treatment component 30 of the integrated exhaust management system 100.

[0034] According to the gas dilution device 10 of the present invention, when there is a large amount of hydrogen in the plant end pipeline 200, the first shut-off valve 14 is opened, and the gas adjusted by the pressure regulating valve 13 is transported to the plant end pipeline 200 through the gas delivery pipeline 12, thereby reducing the volume concentration of hydrogen in the plant end pipeline 200 and improving the safety of the integrated exhaust management system 100.

[0035] Specifically, the pressure regulating valve 13 is a device for automatically regulating the pressure of a fluid (gas or liquid). Its core function is to stably reduce the pressure of the upstream high-pressure medium to the required low-pressure value downstream, and to maintain a constant outlet pressure even when the inlet pressure or flow rate fluctuates. The pressure regulating valve 13 can be a manually adjustable or automatically adjustable pressure regulating structure. The setting of the pressure regulating valve 13 can achieve precise control of the dilution gas delivery pressure, which can not only meet the dilution requirements of different concentrations of tail gas (such as increasing the dilution gas pressure to accelerate the dilution speed when the hydrogen concentration is too high), but also avoid damage to the plant-end pipeline 200 due to excessive pressure or untimely dilution due to excessively low pressure, thus improving the controllability and stability of the dilution process.

[0036] The first shut-off valve 14 is located downstream of the pressure regulating valve 13. After the pressure regulating valve 13 completes pressure regulation, it enables rapid on / off switching of the dilution gas. This facilitates quick cutoff of the dilution gas supply in emergency situations (such as abnormal pressure in the plant-side pipeline 200 or a sudden increase in hydrogen concentration). Combined with other safety devices, it enables emergency response and further enhances the safety and reliability of the integrated exhaust management system 100. Furthermore, the gas dilution device 10 has a simple structure and highly interchangeable components, making it easy to install, debug, and maintain. It can be directly adapted to the upgrade of existing integrated exhaust management systems 100 without requiring large-scale modifications to existing pipelines and equipment, reducing upgrade costs and demonstrating strong practicality and compatibility.

[0037] The gas in gas source 11 can be nitrogen, inert gas such as argon or helium, or gas such as carbon dioxide, which will not be explained further here.

[0038] It should be noted that the multi-way valve 17 here is a four-way valve. In actual applications, the multi-way valve 17 can be changed to a five-way valve or a six-way valve, etc., depending on the flow direction of the dilution gas.

[0039] The multi-way valve 17 enables diversified switching of the dilution gas delivery path, breaking the limitations of a single delivery path and improving the flexibility and adaptability of the integrated exhaust management system 100. Specifically, when the exhaust gas treatment component 30 (such as the scrubbing tower 31) experiences abnormal pressure or reagent failure and cannot operate normally, the multi-way valve 17 can directly deliver the dilution gas to the exhaust gas treatment component 30 to dilute the flammable and explosive gases remaining in the component, preventing excessive gas concentration and potential safety hazards. Simultaneously, the multi-way valve 17 allows for flexible distribution of the dilution gas between the plant-side pipeline 200 and the exhaust gas treatment component 30. When the hydrogen volume concentration in the exhaust gas treatment component 30 is high, dilution gas can be added to the component to help improve the treatment effect and shorten the treatment time. Furthermore, the integrated design of the multi-way valve 17 reduces the complexity of pipeline connections, lowers the risk of leakage, and facilitates centralized control of the dilution gas delivery path, improving the ease of operation of the integrated exhaust management system 100.

[0040] In some embodiments of the present invention, such as Figures 6 to 8 As shown, the gas dilution device 10 also includes a mass flow controller 15, which is located on the gas delivery pipeline 12. Specifically, the mass flow controller 15 is located downstream of the first shut-off valve 14.

[0041] The embodiments of this application achieve precise quantitative control of the dilution gas flow rate by installing a mass flow controller 15 on the gas delivery pipeline 12 and placing the mass flow controller 15 downstream of the first shut-off valve 14. Compared to relying solely on pressure regulation by the pressure regulating valve 13, this method can more accurately match changes in hydrogen concentration in the exhaust gas. Specifically, this invention can adjust the set value of the mass flow controller 15 by real-time monitoring of the hydrogen concentration in the plant-end pipeline 200, achieving on-demand dilution. This ensures the dilution effect while avoiding waste of dilution gas and reducing the consumption cost of the gas source 11. Simultaneously, the closed-loop control function of the mass flow controller 15 can automatically compensate for the impact of temperature and pressure fluctuations on the flow rate, ensuring the stability and consistency of the dilution process and preventing fluctuations in hydrogen concentration due to flow rate fluctuations, further enhancing the safety of the integrated exhaust management system 100. Furthermore, the mass flow controller 15 can achieve real-time acquisition and feedback of flow data, facilitating maintenance personnel to monitor the operating status of the dilution process in real time, promptly detect anomalies, and make adjustments, thereby improving the intelligent operation and maintenance level of the integrated exhaust management system 100.

[0042] In some embodiments of the present invention, such as Figures 6 to 8 As shown, the gas dilution device 10 also includes a second shut-off valve 16, which is located downstream of the first shut-off valve 14. This configuration allows for control of the connection or disconnection of the gas delivery pipeline from two positions.

[0043] exist Figure 6 In the mass flow controller 15, the second shut-off valve 16 and the first shut-off valve 14 are respectively located on opposite sides of the mass flow controller 15. That is, the first shut-off valve 14 is located upstream of the mass flow controller 15, and the second shut-off valve 16 is located downstream of the mass flow controller 15.

[0044] In this embodiment of the invention, the second shut-off valve 16 and the first shut-off valve 14 are located on opposite sides of the mass flow controller 15, forming a bidirectional isolation protection for the mass flow controller 15. When maintenance, calibration, or replacement of the mass flow controller 15 is required, the first shut-off valve 14 and the second shut-off valve 16 can be closed simultaneously, completely isolating the mass flow controller 15 from the gas source 11 and the plant-end pipeline 200, preventing gas leakage, ensuring the personal safety of maintenance personnel, and preventing exhaust gas in the plant-end pipeline 200 from flowing back into the gas delivery pipeline 12, contaminating the gas source 11 or damaging the equipment. Furthermore, this dual shut-off valve configuration of the second shut-off valve 16 and the first shut-off valve 14 enables hierarchical control. During normal operation, isolation of a local pipeline can be achieved by closing one of the shut-off valves, facilitating the segmented commissioning and maintenance of the integrated exhaust management system 100, and improving the flexibility and safety of equipment operation and maintenance. Simultaneously, the redundant design of the dual shut-off valves avoids gas leakage problems caused by the failure of a single shut-off valve, further improving the reliability of the gas dilution device 10.

[0045] In some embodiments of the present invention, the multi-way valve 17 further includes a fourth interface 174, which is connected to the output pipe 211 of the vacuum pump assembly 20.

[0046] The fourth interface 174 here connects to the output pipe 211 of the vacuum pump assembly 20, enabling targeted protection of the vacuum pump assembly 20 by the dilution gas. During operation, exhaust gas may remain in the output pipe 211 of the vacuum pump assembly 20. If the exhaust gas contains a large amount of flammable and explosive gases such as hydrogen, long-term accumulation may cause safety hazards and may also cause corrosion and damage to the internal components of the first vacuum pump 21. This invention, through the fourth interface 174 of the multi-way valve 17, can directly deliver dilution gas to the output pipe 211 of the first vacuum pump 21 to dilute the residual exhaust gas, reduce the gas concentration, ensure the safe operation of the vacuum pump assembly 20, reduce the corrosion of the first vacuum pump 21 by the exhaust gas, and extend the service life of the first vacuum pump 21. In addition, this design realizes a single source of dilution gas for multiple uses, eliminating the need for additional dilution pipelines, reducing the cost and pipeline complexity of the integrated exhaust management system 100, and further improving the integration and economy of the integrated exhaust management system 100.

[0047] Continue to refer to Figure 5 As shown, the integrated exhaust management system 100 here also includes a first connecting pipe 50, a second connecting pipe 60 and a third connecting pipe 70. The two ends of the first connecting pipe 50 are respectively connected to the second interface 172 and the plant end pipe 200, and the two ends of the second connecting pipe 60 are respectively connected to the third interface 173 and the exhaust gas treatment component 30 of the integrated exhaust management system 100.

[0048] The first connecting pipe 50, the second connecting pipe 60, and the third connecting pipe 70 are all pipe structures, and their shapes and lengths can be different. For example, the first connecting pipe 50, the second connecting pipe 60, and the third connecting pipe 70 can all be circular or rectangular pipes, or the first connecting pipe 50 can be a circular pipe, the second connecting pipe 60 can be a rectangular pipe, and the third connecting pipe 70 can be an irregularly shaped pipe, etc.

[0049] Optionally, such as Figure 5 As shown, the vacuum pump assembly 20 includes a first vacuum pump 21 and a first three-way valve 22 that are interconnected. The first vacuum pump 21 is connected to one port of the first three-way valve 22. The exhaust gas flowing out of the first vacuum pump 21 can flow to different locations after passing through the first three-way valve 22. Here, the first vacuum pump 21 can assist in the collection and transportation of exhaust gas by generating negative pressure or vacuum.

[0050] like Figure 5 As shown, the exhaust gas treatment component 30 here includes a scrubbing tower 31 and a second three-way valve 32. The three ports of the second three-way valve 32 can be connected to the plant end pipeline 200, the first three-way valve 22 and the scrubbing tower 31 respectively, so as to control the flow direction of the exhaust gas.

[0051] The scrubbing tower 31 here is a device widely used in industrial waste gas purification. Its core function is to remove harmful components from the exhaust gas through gas-liquid contact, so that it meets environmental emission standards.

[0052] In an embodiment of the present invention, the two ends of the second connecting pipe 60 are respectively connected to the third interface 173 and the scrubbing tower 31 of the exhaust gas treatment component 30, so that part of the gas flowing out of the gas dilution device 10 can enter the scrubbing tower 31.

[0053] In some embodiments of the present invention, such as Figure 7 As shown, the inner diameter of any one of the three interfaces 172, 173 and 174 is smaller than the inner diameter of the first interface 171.

[0054] The first interface 171 serves as the main input interface for the dilution gas. Its larger inner diameter ensures the maximum flow rate of the dilution gas, meeting dilution requirements under different operating conditions (such as rapid dilution in emergencies). The second interface 172, third interface 173, and fourth interface 174 serve as branch output interfaces. Their smaller inner diameters allow for precise distribution of the dilution gas flow rate, preventing excessive flow at a single branch interface from causing insufficient flow at other branch interfaces, thus ensuring uniform and stable dilution effects across all delivery paths. Simultaneously, the smaller inner diameter of the branch interfaces reduces pressure loss during gas delivery, minimizing energy consumption, and facilitates the installation of various control valves, sensors, and other components on the branch pipelines, improving pipeline controllability. Furthermore, the dimensional differences between the second interface 172, third interface 173, and fourth interface 174 and the first interface 171 prevent misconnection during pipeline connection, improving the accuracy and efficiency of equipment installation.

[0055] Optionally, the inner diameters of the second interface 172, the third interface 173, and the fourth interface 174 are not exactly the same. The inner diameter of the second interface 172 is larger than that of the third interface 173 and the fourth interface 174. Setting the inner diameter of the second interface 172 (connected to the plant end pipeline 200) to be larger than that of the third interface 173 (connected to the exhaust gas treatment component 30) and the fourth interface 174 (connected to the output pipe 211 of the vacuum pump component 20) is a targeted optimization based on the actual operating conditions of each branch pipeline, and has significant practical value.

[0056] As the main pipeline for centralized transport and emission of exhaust gas, the plant-end pipeline 200 has a large volume and a large exhaust gas flow rate. Multiple vacuum pump assemblies 20 may simultaneously supply exhaust gas to the plant-end pipeline 200, requiring a dilution gas flow rate far exceeding the needs of the exhaust gas treatment assembly 30 and the output pipe 211 of the first vacuum pump 21. The second interface 172 has a larger inner diameter, allowing for the delivery of more dilution gas. This rapidly and uniformly reduces the concentration of flammable and explosive gases such as hydrogen within the plant-end pipeline 200, preventing safety dead zones caused by untimely dilution or uneven concentration. It is particularly suitable for scenarios with long plant-end pipelines 200 and large instantaneous exhaust gas emissions, further enhancing the safety protection capabilities of the integrated exhaust management system 100. This aligns perfectly with the functional positioning of the multi-way valve 17 and the operating requirements of the plant-end pipeline 200.

[0057] The third interface 173 connects to the scrubbing tower 31 of the exhaust gas treatment component 30. The internal space of the scrubbing tower 31 is relatively enclosed and the exhaust gas capacity is limited. Only a small amount of dilution gas is needed to complete the dilution or auxiliary treatment of the residual exhaust gas, without the need for large-flow delivery. The fourth interface 174 connects to the output pipe 211 of the vacuum pump component 20. The amount of residual exhaust gas in the output pipe 211 is small and the pipe volume is small, so a large amount of dilution gas is also not needed. By setting the inner diameter of the third interface 173 and the fourth interface 174 to be smaller than that of the second interface 172, the flow rate of the dilution gas can be precisely controlled, avoiding energy waste caused by excessive delivery of dilution gas, while reducing the consumption cost of the gas source 11, achieving the effect of on-demand distribution and precise dilution, and balancing safety and economy.

[0058] Different inner diameter interfaces can be matched to the resistance characteristics of each branch pipeline. The second interface 172 has a larger inner diameter, which can reduce the flow resistance of the dilution gas flowing into the plant end pipeline 200, ensuring smooth delivery of large flow rates of dilution gas and avoiding pressure buildup due to excessive flow resistance. The third interface 173 and the fourth interface 174 have smaller inner diameters, which can appropriately increase the gas pressure in the pipeline, ensuring that the dilution gas can be accurately and efficiently delivered to the interior of the exhaust gas treatment component 30 and the output pipe 211 of the first vacuum pump 21, achieving targeted protection. This differentiated design can make the pressure distribution of the entire dilution gas delivery pipeline more reasonable, reduce pressure fluctuations, avoid problems such as gas leakage and poor dilution effect caused by pressure imbalance, and improve the operational stability of the integrated exhaust management system 100.

[0059] In some embodiments of the present invention, at least one of the first shut-off valve 14 and the second shut-off valve 16 is a diaphragm valve.

[0060] The diaphragm valve mentioned here is a special type of shut-off valve. Its core feature is that it uses a flexible diaphragm (usually made of rubber, plastic or composite material) to completely isolate the valve body cavity from the valve cover cavity and drive components, thereby achieving fluid flow control.

[0061] At least one of the first shut-off valve 14 and the second shut-off valve 16 is a diaphragm valve, which can be categorized into several cases. The first case is where the first shut-off valve 14 can be a diaphragm valve, and the second shut-off valve 16 is another type of shut-off valve. The second case is where the first shut-off valve 14 can be another type of shut-off valve, and the second shut-off valve 16 is a diaphragm valve. The third case is where both the first shut-off valve 14 and the second shut-off valve 16 can be diaphragm valves. Diaphragm valves offer advantages such as good sealing, corrosion resistance, and leak-free operation. Compared to ordinary gate valves, they effectively prevent dilution gas from contacting the internal transmission components of the valve, preventing corrosion and damage to valve components, and extending the valve's service life. They are particularly suitable for corrosive exhaust gas environments that may exist in the exhaust gas treatment of extended equipment. Furthermore, diaphragm valves offer rapid opening and closing, convenient operation, and quick switching of dilution gas, adapting to emergency response needs. Their simple structure and easy maintenance reduce operating costs. Furthermore, the low flow resistance of diaphragm valves reduces pressure loss during the delivery of diluted gas, ensuring stable gas flow and further improving the reliability of the dilution effect. If both systems use diaphragm valves, dual sealing protection can be achieved, further reducing the risk of leakage and enhancing the safety of the integrated exhaust management system 100.

[0062] Optionally, such as Figure 5 As shown, one port of the first three-way valve 22 is connected to the first vacuum pump 21, and the other two ports of the first three-way valve 22 are selectively connected to either the plant end pipeline 200 or the scrubbing tower 31. When the first three-way valve 22 is connected to the plant end pipeline 200, the gas dilution device 10 is configured to input gas into the plant end pipeline 200.

[0063] The core function of the first three-way valve 22 is to achieve precise and controllable exhaust gas flow direction of the first vacuum pump 21. One of its ports is fixedly connected to the first vacuum pump 21, serving as the only input channel for exhaust gas. The other two ports correspond to the plant-end pipeline 200 and the scrubbing tower 31, respectively. By switching the valve, selective flow of exhaust gas can be achieved, adapting to the exhaust gas treatment needs under different working conditions. Moreover, the switching process is quick and convenient, and can be completed without stopping the machine, ensuring production continuity. Specifically, after the exhaust gas is tested, if the pollutant concentration is low and does not require deep treatment by the scrubbing tower 31 (such as exhaust gas generated during normal low-load operation of the epitaxial equipment), it can be switched to a state connected to the plant-end pipeline 200 through the first three-way valve 22. At this time, the exhaust gas is directly introduced into the plant-end pipeline 200 for discharge. Since the exhaust gas of the epitaxial equipment generally contains flammable and explosive gases such as hydrogen, direct discharge into the plant-end pipeline 200 may cause the hydrogen volume concentration to rise above the safety threshold. Therefore, in this connected state, the gas dilution device 10 is simultaneously triggered to start, inputting dilution gas into the plant-end pipeline 200 to quickly reduce the hydrogen volume concentration in the pipeline and control the hydrogen volume concentration within a safe range. This avoids safety hazards such as explosion and combustion from the source, achieving safe and rapid discharge of exhaust gas, while shortening the exhaust gas treatment path and improving treatment efficiency.

[0064] When the concentration of pollutants in the exhaust gas exceeds the standard (such as exhaust gas generated during high-load operation of extended equipment or process abnormalities), the first three-way valve 22 switches to a state connected to the scrubbing tower 31. After the exhaust gas enters the scrubbing tower 31, it undergoes deep treatment processes such as acid-base neutralization and adsorption to remove harmful pollutants, ensuring that the exhaust gas emissions meet national environmental protection standards before being discharged into subsequent pipelines. This flow control design based on the first three-way valve 22 achieves the core objective of on-demand treatment. It avoids the waste of reagents and ineffective equipment wear caused by low-concentration exhaust gas passing through the scrubbing tower 31, extends the service life of the scrubbing tower 31, and reduces operation and maintenance costs. It also ensures compliant treatment of high-concentration exhaust gas, balancing safety, efficiency, and economy. In addition, the linkage design between the first vacuum pump 21 and the first three-way valve 22 can synchronously adjust the valve opening and the operating parameters of the first vacuum pump 21 according to real-time changes in exhaust gas delivery pressure and flow rate, achieving stable and controllable exhaust gas delivery. This avoids exhaust gas leakage or incomplete treatment caused by pressure fluctuations, further improving the stability and reliability of the integrated exhaust management system 100.

[0065] It should be noted that the vacuum pump assembly 20, exhaust gas treatment assembly 30 and gas dilution device 10 of the integrated exhaust management system 100 can all be one unit. When the exhaust gas treatment assembly 30 stops, the gas dilution device 10 is configured to input gas into the plant end pipeline 200.

[0066] In some embodiments of the present invention, the number of vacuum pump assembly 20, exhaust gas treatment assembly 30 and gas dilution device 10 are at least two, and each gas dilution device 10 is configured to input gas into the plant end pipeline 200 when the first three-way valve 22 of each vacuum pump assembly 20 is in a state of communication with the plant end pipeline 200.

[0067] In this embodiment, at least two vacuum pump components 20, exhaust gas treatment components 30, and gas dilution devices 10 are configured to form a redundant architecture with multiple sets working collaboratively. This adapts to the exhaust gas treatment requirements of the high-capacity integrated exhaust management system 100, significantly improving the exhaust gas treatment capacity and efficiency of the integrated exhaust management system 100. Specifically, when the first three-way valve 22 of each vacuum pump component 20 is switched to the state of being connected to the plant-end pipeline 200, each corresponding gas dilution device 10 is simultaneously configured to input dilution gas into the plant-end pipeline 200. This achieves coordinated matching of multi-source exhaust gas input and multi-source dilution replenishment, fundamentally solving the safety problem of rapid increase in hydrogen volume concentration when the first vacuum pump 21 of multiple sets of vacuum pump components 20 simultaneously delivers exhaust gas to the plant-end pipeline 200.

[0068] The integrated exhaust management system 100, through the precise dilution protection of the gas dilution device 10, combined with the redundant protection of the first shut-off valve 14, the second shut-off valve 16, and the multi-way valve 17, comprehensively avoids the safety hazards of flammable and explosive gases such as hydrogen, meeting the stringent requirements of high-precision and high-safety industries such as semiconductor epitaxial production. The integrated multi-component configuration and switchable exhaust gas treatment paths realize dynamic adjustment of exhaust gas treatment, taking into account both treatment efficiency and compliance, and can adapt to exhaust gas treatment needs of different concentrations and emission volumes. Optionally, the gas dilution device 10 is configured to start when the exhaust gas treatment assembly 30 malfunctions, in order to deliver dilution gas to the plant end pipeline 200. When the exhaust gas treatment assembly 30 is in operation, the gas dilution device 10 is in a non-operational state.

[0069] It is understandable that the integrated exhaust management system 100 here has three or four vacuum pump components 20, exhaust gas treatment components 30 and gas dilution devices 10, etc., which will not be described in detail here.

[0070] The working process of the integrated exhaust management system 100 is as follows: by Figure 5Taking the integrated exhaust management system 100 shown as having two vacuum pump assemblies 20 and two exhaust gas treatment assemblies 30 as an example, in the event that both exhaust gas treatment assemblies 30 shut down simultaneously, dilution gas such as nitrogen or other inert gas can be stored in the gas source 11 or supplied to the gas delivery pipeline 12 through the plant terminal (which has a plant terminal pipeline 200 and a pipeline for transporting dilution gas). The first shut-off valve 14, the second shut-off valve 16, and the mass flow controller 15 are all in the open state. The dilution gas enters the multi-way valve 17 and flows to different locations through the second interface 172, the third interface 173, and the fourth interface 174, respectively. A large amount of dilution gas enters the plant terminal pipeline 200 through the second interface 172, and a small amount of dilution gas enters the scrubbing tower 31 and the output pipe 211 of the first vacuum pump 21.

[0071] After the integrated exhaust management system 100 continuously inputs dilution gas for a period of time, when the volume concentration of hydrogen in the plant end pipeline 200 is less than 4%, the first shut-off valve 14 or the second shut-off valve 16 can be closed. At this time, the gas delivery pipeline 12 is in the disconnected state.

[0072] Optionally, the flow rates of the diluent gas entering the scrubbing tower 31 and the output pipe 211 of the first vacuum pump 21 can be the same or different. In an embodiment of the present invention, the flow rate of the diluent gas entering the plant end pipe 200 through the second interface 172 is approximately 1600 slm (Standard Liter per Minute), the flow rate of the diluent gas entering the scrubbing tower 31 through the third interface 173 is approximately 100 slm, and the flow rate of the diluent gas entering the output pipe 211 of the first vacuum pump 21 through the fourth interface 174 is approximately 100 slm.

[0073] For the structure of other parts of this invention, please refer to the prior art; therefore, this invention will not repeat the details here.

[0074] The above description is merely a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A gas dilution device for an integrated exhaust management system connected to a plant-side pipe, characterized by, The gas dilution device includes: Gas source; A gas delivery pipeline, the two ends of which are respectively connected to the gas source and the plant end pipeline; A pressure regulating valve is provided on the gas delivery pipeline; A first shut-off valve is provided on the gas delivery pipeline and located downstream of the pressure regulating valve; A multi-port valve, comprising a first port, a second port, and a third port, wherein the first port is connected to the gas delivery pipeline, the second port is connected to the plant-side pipeline, and the third port is connected to the exhaust gas treatment component of the integrated exhaust management system.

2. The gas dilution device of claim 1, wherein, The gas dilution device further includes: A mass flow controller is installed on the gas delivery pipeline.

3. The gas dilution device of claim 1, wherein, The gas dilution device further includes: The second shut-off valve is located downstream of the first shut-off valve.

4. The gas dilution device of claim 1, wherein, The integrated exhaust management system also includes a vacuum pump assembly; The multi-way valve also includes a fourth port, which is connected to the output pipe of the vacuum pump assembly.

5. The gas dilution device of claim 4, wherein, The inner diameter of any one of the second interface, the third interface, and the fourth interface is smaller than the inner diameter of the first interface.

6. The gas dilution device of claim 3, wherein, At least one of the first shut-off valve and the second shut-off valve is a diaphragm valve.

7. An integrated exhaust management system, characterized in that, The integrated exhaust management system includes: The gas dilution device according to any one of claims 1 to 6, wherein the gas dilution device is connected to a plant-end pipeline and is used to input gas into the plant-end pipeline.

8. The integrated exhaust management system of claim 7, wherein, The integrated exhaust management system also includes: A vacuum pump assembly, the vacuum pump assembly including a first vacuum pump and a first three-way valve, the first vacuum pump being connected to one port of the first three-way valve; The exhaust gas treatment assembly includes a scrubbing tower, and the other two ports of the first three-way valve are selectively connected to either the plant-end pipeline or the scrubbing tower. When the first three-way valve is connected to the plant end pipeline, the gas dilution device is configured to input gas into the plant end pipeline.

9. The integrated exhaust management system of claim 7, wherein, The integrated exhaust management system also includes: An exhaust gas treatment assembly, wherein the gas dilution device is configured to activate in the event of a malfunction of the exhaust gas treatment assembly to deliver dilute gas to the plant-end pipeline.

10. The integrated exhaust management system of claim 8, wherein, The number of the vacuum pump assembly, the exhaust gas treatment assembly, and the gas dilution device is at least two; When the first three-way valve of each of the vacuum pump assemblies is in communication with the plant end pipeline, each of the gas dilution devices is configured to input gas into the plant end pipeline.

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