Glass via edge bump compensation method and apparatus

Abstract

This application provides a method and apparatus for compensating for edge protrusions in a glass via (TGV). The method includes: acquiring edge morphology data of the TGV; determining the transition compensation surface of the edge protrusion; determining the target exposure parameters of the transition compensation surface; transmitting the target exposure parameters to a digital lithography (DPL) device; and performing three-dimensional exposure on the edge protrusion coated with photoresist to form a continuous transition slope structure. By acquiring edge morphology data through a morphology data acquisition device to determine the transition compensation surface of the compensated edge protrusion and the target exposure parameters, and subsequently performing three-dimensional exposure on the edge of the TGV using a DPL device to form a more gently sloping continuous transition slope structure, the mechanical stability of the TGV edge region is improved, which is beneficial for improving the quality of subsequent seed layer and metal layer deposition.

Description

Technical Field

[0001] This application belongs to the field of semiconductor packaging and manufacturing, and specifically relates to a method and apparatus for compensating for edge protrusions in glass through-holes. Background Technology

[0002] Currently, glass vias are one of the key structures in advanced packaging, glass interposers, and high-density interconnects. They are often formed by laser drilling on a glass substrate.

[0003] However, after laser drilling, edge morphology defects such as material accumulation, molten material redeposition, or laser-induced edge protrusions often appear at the edge of the through hole. Although the laser process can be optimized to reduce the formation of edge protrusions, it is difficult to completely avoid their formation. These defects will affect subsequent seed layer deposition and metallization processes, and stress concentration areas are easily formed near the edge protrusions, increasing the risk of microcrack initiation and propagation. Summary of the Invention

[0004] This application provides a method and apparatus for compensating for edge protrusions in glass vias. By determining the transition compensation surface for compensating the edge protrusions based on edge morphology data, and further determining the target exposure parameters for forming the transition compensation surface, a continuous transition slope structure with a gentler gradient is formed by three-dimensional exposure at the edge of the glass via using digital lithography equipment according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial to improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition.

[0005] In a first aspect, embodiments of this application provide a method for compensating for edge protrusions in glass vias, applied to a host device of a via compensation system, the via compensation system including the host device and a digital lithography device communicatively connected to the host device; the method includes: Acquire edge topography data of glass through-holes; Based on the edge morphology data, a transition compensation surface for the edge protrusion of the glass via is determined. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. Determine the target exposure parameters for the transition compensation surface; The target exposure parameters are transmitted to the digital lithography equipment, which is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

[0006] In one possible example, determining the transition compensation surface for the edge protrusion of the glass via based on the edge topography data includes: Based on the edge topography data, a topography model of the glass through-hole is established; Obtain the preset compensation rules for the morphology model; Based on the preset compensation rules and the morphology model, the transition compensation surface for the edge protrusion is determined.

[0007] In one possible example, establishing the morphology model of the glass via based on the edge morphology data includes: Extract edge contour information based on edge topography data; The edge contour information is fitted to obtain shape fitting data; Based on the morphology fitting data, determine the morphology characterization parameters; Based on the morphology characterization parameters, a morphology model of the glass through-hole is established.

[0008] In one possible example, determining the target exposure parameters of the transition compensation surface includes: Obtain a preset calibration relationship, which includes the calibration relationship between exposure dose, remaining adhesive thickness, and development depth; The target exposure parameters are determined based on the preset calibration relationship and the transition compensation surface. The target exposure parameters include at least one of the following: pixel-level exposure dose, exposure time, gray value distribution, number of exposures in each zone, focal plane compensation parameters, and development conditions.

[0009] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the method further includes: The laser drilling parameters for obtaining glass through holes include at least one of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focusing position, scanning path, and number of processing steps; Based on the laser drilling parameters, edge morphology data, and target exposure parameters, a reference exposure parameter set is determined. The reference exposure parameter set includes the correspondence between the laser drilling parameters and the edge morphology data, and the correspondence between the edge morphology data and the target exposure parameters.

[0010] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the method further includes: The control film deposition equipment is used to deposit a seed layer on the glass via to form a target seed layer; The film deposition equipment is controlled to deposit a metal layer on the glass via to form the target metal layer.

[0011] In one possible example, the edge topography data includes at least one of the following: edge protrusion height, width, radial position, edge profile, surface slope, local dip angle, and curvature; The transition compensation surface includes at least one of the following: continuous slope structure, segmented slope structure, multi-step approximation slope structure, and spline surface structure.

[0012] Secondly, embodiments of this application provide a glass via edge protrusion compensation device, applied to a host device of a via compensation system. The via compensation system includes the host device and a digital lithography device communicatively connected to the host device. The glass via edge protrusion compensation device includes an acquisition unit, a determination unit, and a transmission unit. The acquisition unit is used to acquire edge morphology data of the glass through hole; The determining unit is used to determine the transition compensation surface of the edge protrusion of the glass through hole according to the edge morphology data. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass through hole. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. The determining unit is also used to determine the target exposure parameters of the transition compensation surface; The transmission unit is used to transmit the target exposure parameters to the digital lithography equipment, and the digital lithography equipment is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

[0013] A third aspect of this application provides an electronic device including: a processor and a memory; and one or more programs stored in the memory and configured to be executed by the processor, the programs including instructions for some or all of the steps as described in the first aspect.

[0014] A fourth aspect of this application provides a computer-readable storage medium for storing a computer program that causes a computer to perform some or all of the steps described in the first aspect of this application.

[0015] A fifth aspect of this application provides a computer program product, comprising a non-transitory computer-readable storage medium storing a computer program operable to cause a computer to perform some or all of the steps described in the first aspect of this application. This computer program product may be a software installation package.

[0016] As can be seen, in this embodiment, the edge morphology data of the glass via is first obtained. Then, based on the edge morphology data, a transition compensation surface for the edge protrusion of the glass via is determined. This transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. Next, the target exposure parameters of the transition compensation surface are determined. Finally, the target exposure parameters are transmitted to the digital lithography equipment, which is used to form a continuous transition slope structure on the glass via according to the target exposure parameters. By determining the transition compensation surface for compensating the edge protrusion based on the edge morphology data, and further determining the target exposure parameters for forming the transition compensation surface, the digital lithography equipment forms a more gently sloping continuous transition slope structure at the edge of the glass via through three-dimensional exposure according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial to improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is an architectural diagram of a through-hole compensation system provided in an embodiment of this application; Figure 2 This is a schematic flowchart of a glass through-hole edge protrusion compensation method provided in an embodiment of this application; Figure 3 This is a schematic diagram of the structure of a glass substrate provided in an embodiment of this application; Figure 4 This is a schematic diagram of another glass substrate structure provided in an embodiment of this application; Figure 5 This is a schematic diagram of a glass through-hole engraving provided in an embodiment of this application; Figure 6 This is a schematic diagram of yet another glass substrate provided in an embodiment of this application; Figure 7 This is a schematic diagram of a process for determining a transition compensation surface provided in an embodiment of this application; Figure 8 This is a flowchart illustrating a method for determining a morphological model, as provided in an embodiment of this application. Figure 9 This is a schematic diagram of a target exposure parameter provided in an embodiment of this application; Figure 10 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application; Figure 11 This is a block diagram of the functional units of a glass through-hole edge protrusion compensation device provided in an embodiment of this application. Detailed Implementation

[0019] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present application.

[0020] The terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish different objects, not to describe a specific order. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or apparatus that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to these processes, methods, products, or apparatuses.

[0021] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0022] In the embodiments of this application, "and / or" describes the relationship between associated objects, indicating that three relationships can exist. For example, A and / or B can represent the following three situations: A exists alone; A and B exist simultaneously; B exists alone. Among them, A and B can be singular or plural.

[0023] In this embodiment, the symbol " / " can indicate that the preceding and following objects are in an "or" relationship. Alternatively, the symbol " / " can also represent a division sign, i.e., performing a division operation. For example, A / B can mean A divided by B.

[0024] In the embodiments of this application, "at least one item" or its similar expression refers to any combination of these items, including any combination of a single item or a plurality of items. "One or more" means one or more, while "multiple" means two or more. For example, "at least one item" of a, b, or c can represent the following seven cases: a, b, c; a and b; a and c; b and c; a, b, and c. Each of a, b, and c can be an element or a set containing one or more elements.

[0025] In the embodiments of this application, "equal to" can be used with "greater than" and is applicable to technical solutions used when "greater than" is used; it can also be used with "less than" and is applicable to technical solutions used when "less than" is used. When "equal to" is used with "greater than", it is not used with "less than"; when "equal to" is used with "less than", it is not used with "greater than".

[0026] To better understand the solutions of the embodiments of this application, the electronic devices, related concepts and background that may be involved in the embodiments of this application will be introduced below.

[0027] The electronic device in this application embodiment is a device with wireless communication capabilities, and may be referred to as a terminal, user equipment (UE), mobile station (MS), mobile terminal (MT), access terminal device, vehicle-mounted terminal device, industrial control terminal device, UE unit, UE station, mobile station, remote station, remote terminal device, mobile device, UE terminal device, wireless communication device, UE agent, or UE device, etc. The terminal device can be fixed or mobile. It should be noted that the terminal device can support at least one wireless communication technology, such as LTE, New Radio (NR), Wideband Code Division Multiple Access (WCDMA), etc. For example, terminal devices can be mobile phones, tablets, desktop computers, laptops, all-in-one computers, in-vehicle terminals, virtual reality (VR) terminal devices, augmented reality (AR) terminal devices, wireless terminals in industrial control, wireless terminals in self-driving, wireless terminals in remote medical surgery, wireless terminals in smart grids, wireless terminals in transportation safety, wireless terminals in smart cities, wireless terminals in smart homes, cellular phones, cordless phones, session initiation protocol (SIP) phones, wireless local loop (WLL) stations, personal digital assistants (PDAs), handheld devices with wireless communication capabilities, electronic devices or other processing devices connected to a wireless modem, wearable devices, terminal devices in future mobile communication networks, or terminal devices in future evolved public land mobile networks (PLMNs), etc.

[0028] Please see Figure 1 , Figure 1This is an architecture diagram of a through-hole compensation system provided in an embodiment of this application. The through-hole compensation system 1 includes a host device 10, a topography data acquisition device 20, and a digital lithography device 30. The host device 10 is connected to the topography data acquisition device 20 and the digital lithography device 30, respectively.

[0029] Among them, the topography data acquisition device 20 is used to perform three-dimensional topography measurement on the area surrounding the glass through hole and obtain topography data of the edge protrusion.

[0030] The host device 10 can acquire edge topography data of the glass through hole from the topography data acquisition device 20.

[0031] Among them, the topographic data acquisition device 20 can be a confocal microscope, a white light interferometer, a laser scanning microscope, and a profilometer.

[0032] Among them, the digital lithography equipment 30 is used to perform three-dimensional exposure on the glass through-hole according to the target exposure parameters to form a continuous transition slope structure.

[0033] The through-hole compensation system 1 also includes a laser drilling device, which can perform laser drilling on the glass substrate to form glass through holes.

[0034] The through-hole compensation system 1 also includes a film deposition equipment, which can deposit a seed layer to form a seed layer in the glass through-hole, and deposit a metal layer to form a metal layer in the glass through-hole. The film deposition equipment is not limited; different equipment can be used for different seed layer and metal layer deposition methods.

[0035] In one possible example, the host device 10 first acquires the edge topography data of the glass via. Then, based on the edge topography data, the host device 10 determines a transition compensation surface for the edge protrusion of the glass via. This transition compensation surface forms a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The host device 10 then determines the target exposure parameters for the transition compensation surface. Finally, the host device 10 transmits the target exposure parameters to the digital lithography equipment 30, which forms the continuous transition slope structure on the glass via according to the target exposure parameters. By determining the transition compensation surface for compensating the edge protrusion based on the edge topography data, and further determining the target exposure parameters for forming the transition compensation surface, the digital lithography equipment 30 subsequently forms a gentler continuous transition slope structure at the edge of the glass via through three-dimensional exposure according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial for improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition.

[0036] Please see Figure 2 , Figure 2 This is a flowchart illustrating a method for compensating for edge protrusions in glass vias according to an embodiment of this application. It is applied to the host device of a via compensation system, which includes the host device and a digital lithography device communicatively connected to the host device. The method includes: Step S201: Obtain the edge morphology data of the glass through hole.

[0037] Specifically, a series of glass through-holes can be formed on a glass substrate using laser drilling technology, based on laser drilling parameters including one or more of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focusing position, scanning path, and number of processing steps. After laser drilling, material accumulation, molten material redeposition, or laser-induced edge protrusion structures are formed at the edges of the through-holes.

[0038] Among them, the topography data acquisition device of the through-hole compensation system collects the edge topography data of the glass through-hole, and the host device can acquire the edge topography data from the topography data acquisition device.

[0039] The edge morphology data includes at least one of the following: edge protrusion height, width, radial position, edge profile, surface slope, local tilt angle, and curvature.

[0040] Among them, the glass through holes can be circular through holes, elliptical through holes, polygonal through holes, arrayed through holes, and other irregularly shaped glass through hole structures.

[0041] Please refer to 3. Figure 3 This is a schematic diagram of a glass substrate provided in an embodiment of this application, showing the glass substrate, a glass through-hole, and an edge protrusion at the edge of the glass through-hole, as well as the height h, width w, and angle between the inclined surface of the edge protrusion and the horizontal reference plane. and the glass substrate surface that is far from the glass through-hole.

[0042] Step S202: Based on the edge morphology data, determine the transition compensation surface of the edge protrusion of the glass through hole. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass through hole. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion.

[0043] The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. The larger the characteristic tilt angle, the steeper the edge protrusion is relative to the horizontal plane of the glass substrate.

[0044] When measuring the characteristic tilt angle, the three-dimensional morphology of the through-hole edge can be obtained first using equipment such as a confocal microscope. Then, using the flat glass substrate surface away from the through-hole as a reference plane, the cross-sectional profile is extracted radially, and the angle between the edge protrusion slope and the reference plane is calculated. Alternatively, the angle can be taken from the fitted straight line of a certain cross-section of the edge protrusion, or the average / maximum value of the angles of the fitted straight lines of multiple cross-sections as the characteristic tilt angle.

[0045] Among them, the morphological features of edge protrusions in edge topography data can be analyzed to perform precise compensation for edge protrusions.

[0046] The shape of the edge protrusion is not limited, and the transition compensation surface includes at least one of the following: continuous slope structure, segmented slope structure, multi-step approximation slope structure and spline surface structure; the transition compensation surface geometrically mitigates the abrupt slope change caused by the edge protrusion at the edge of the through hole.

[0047] The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. Preferably, the characteristic tilt angle of the transition compensation surface is 1 / 3 or less of the characteristic tilt angle of the edge protrusion. More preferably, the characteristic tilt angle of the transition compensation surface is 1 / 5 of the characteristic tilt angle of the edge protrusion.

[0048] Please refer to 4. Figure 4 This is a schematic diagram of another glass substrate structure provided in an embodiment of this application. Figure 4 The cross-sectional profiles of the glass substrate, glass via, edge protrusion, transition compensation surface, original tilt angle (characteristic tilt angle of the edge protrusion), and compensation tilt angle (characteristic tilt angle of the transition compensation surface) are shown, wherein the characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion.

[0049] Step S203: Determine the target exposure parameters of the transition compensation surface.

[0050] Among them, the target exposure parameters are the three-dimensional exposure parameters that convert the target compensation surface into a digital lithography device.

[0051] The target exposure parameters can be represented as a grayscale image or an exposure dose distribution map, and there is no limitation here.

[0052] Step S204: The target exposure parameters are transmitted to the digital lithography equipment, which is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

[0053] Optionally, photoresist can be coated on the surface of the glass substrate, pre-baked, and then placed in a digital lithography equipment. Alignment is performed using the glass via itself or preset alignment marks. One or more vias can be preset on the glass substrate. Then, the digital lithography equipment performs three-dimensional exposure according to the target exposure parameters, and after post-baking and development, a continuous transition slope structure covering the raised area at the edge of the via is formed.

[0054] Among them, digital lithography equipment can perform digital lithography in various ways, such as grayscale exposure, multiple exposures in different areas, layer-by-layer exposure, and focal plane compensation exposure, etc., without any limitation.

[0055] Before digital lithography is performed in a digital lithography machine, the edge surface can be pre-treated by means of local chemical treatment, plasma treatment, and slight etching to facilitate digital lithography.

[0056] Please see Figure 5 , Figure 5 This is a schematic diagram of glass through-hole overlay provided in an embodiment of this application. Four alignment marks are preset on the glass substrate, and then the digital lithography equipment performs overlay alignment based on the four alignment marks to facilitate three-dimensional exposure of the edge area of ​​the glass through-hole (the digital lithography exposure area in the figure); and the four glass through-holes themselves can be used for overlay alignment to facilitate three-dimensional exposure of the edge area of ​​the glass through-hole (the digital lithography exposure area in the figure).

[0057] Please see Figure 6 , Figure 6 This is a schematic diagram of another glass substrate provided in an embodiment of this application. Figure 6 The diagram shows a glass substrate, a glass via, edge protrusions at the edge of the glass via, a three-dimensional compensation photoresist structure (i.e., a continuous transition slope structure achieved by three-dimensional exposure in a digital lithography device), and a flat substrate surface of the glass substrate away from the glass via.

[0058] As can be seen, in this embodiment, the edge morphology data of the glass via is first obtained. Then, based on the edge morphology data, a transition compensation surface for the edge protrusion of the glass via is determined. This transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. Next, the target exposure parameters of the transition compensation surface are determined. Finally, the target exposure parameters are transmitted to the digital lithography equipment, which is used to form a continuous transition slope structure on the glass via according to the target exposure parameters. By determining the transition compensation surface for compensating the edge protrusion based on the edge morphology data, and further determining the target exposure parameters for forming the transition compensation surface, the digital lithography equipment forms a more gently sloping continuous transition slope structure at the edge of the glass via through three-dimensional exposure according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial to improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition.

[0059] Please see Figure 7 Regarding the determination of the transition compensation surface for the edge protrusion of the glass through-hole based on the edge topography data, the above method may include the following steps: Step S701: Based on the edge topography data, establish the topography model of the glass through hole.

[0060] Among them, the actual morphology model of the glass through hole edge can be established based on the edge morphology data.

[0061] Step S702: Obtain the preset compensation rules for the morphology model.

[0062] Among them, the preset compensation rules can be preset based on different actual edge protrusion types, and the corresponding preset compensation rules can be obtained based on the edge protrusion type.

[0063] Among them, the preset compensation rules ensure that the side of the transition compensation surface closest to the glass through hole is closely fitted with the edge protrusion, and limit one or more of its characteristic tilt angle, height, width, length, profile, surface slope, and curvature. For example, the farther away a point on the transition compensation surface is from the glass through hole, the lower its height tends to be.

[0064] In one possible example, the preset compensation rule includes a general compensation rule for constraining the basic geometric properties of the transition compensation surface. This general compensation rule includes: setting a first fitting area on the side near the glass through-hole; limiting the height difference between the transition compensation surface and the edge protrusion in the topography model within the first fitting area to not exceed a preset height error threshold Δh, where Δh can be any fixed value or combination thereof, such as 2%-10% of the maximum height of the edge protrusion or 0.05 µm-0.2 µm, to ensure that the side of the transition compensation surface near the glass through-hole is tightly fitted with the edge protrusion; limiting the characteristic tilt angle of the transition compensation surface to be less than the characteristic tilt angle of the edge protrusion, preferably 1 / 3 or less, more preferably 1 / 5; and limiting the effective compensation width of the transition compensation surface to not exceed a preset width threshold, which can be set to 0.5-2 times the diameter of the glass through-hole. The surface slope and / or curvature of the transition compensation surface are limited to a preset threshold, such as limiting the surface slope to no more than 10°-15° and the radius of curvature to no less than a preset minimum radius of curvature, in order to reduce the risk of introducing new slope abrupt changes or stress concentration in the compensation area. The preset minimum radius of curvature can be set manually or by system default, and is not limited here.

[0065] In one possible example, the preset compensation rule further stipulates that the height of each point on the transition compensation surface decreases monotonically as its radial distance from the edge of the glass via increases. That is, the derivative of the height function of the transition compensation surface with respect to the radial distance is non-positive. The height attenuation process can be parameterized by at least one of linear, exponential, or Gaussian functions, so that the edge protrusion gradually transitions into a flat area on the glass substrate surface away from the glass via, provided that the surface is tightly fitted to the side near the glass via.

[0066] Step S703: Determine the transition compensation surface for the edge protrusion according to the preset compensation rule and the morphology model.

[0067] Among them, the characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion, thus geometrically mitigating the abrupt slope change of the through hole edge due to the edge protrusion, and realizing compensation for the edge protrusion.

[0068] As can be seen, in this embodiment of the application, the topography model of the glass through hole is first established based on the edge topography data, and the transition compensation surface required for the compensation topography model is determined by the preset compensation rules, which helps to improve the efficiency and accuracy of determining the transition compensation surface.

[0069] Please see Figure 8 In establishing the morphology model of the glass via based on the edge morphology data, the above method may include the following steps: Step S801: Extract edge contour information based on edge topography data.

[0070] The edge morphology data can be acquired by at least one of the following three-dimensional morphology measurement devices: confocal microscope, white light interferometer, laser scanning microscope, or profilometer. The three-dimensional morphology measurement device scans and measures the area around the glass through hole to obtain three-dimensional edge morphology data covering the protrusion at the edge of the through hole and its surrounding area.

[0071] Before extracting edge contour information, the edge morphology data can be preprocessed to remove obvious noise and outliers. The analysis area of ​​the through hole edge is determined according to the position of the glass through hole. The height distribution and contour data of the area surrounding the through hole edge protrusion are extracted from the analysis area to form edge contour information.

[0072] Step S802: Fit the edge contour information to obtain shape fitting data.

[0073] Among them, fitting the edge contour information to obtain morphology fitting data, including the shape parameters and radial deviation of the through hole edge protrusion, can be completed in a mature three-dimensional morphology characterization device.

[0074] Step S803: Determine the morphology characterization parameters based on the morphology fitting data.

[0075] The morphological characterization parameters include, but are not limited to, the position and size of the edge protrusions (e.g., maximum height, effective width, radial position and corresponding circumferential angle range), shape error, Fourier coefficients and roughness statistics.

[0076] Step S804: Based on the morphology characterization parameters, establish the morphology model of the glass through hole.

[0077] In one possible example, a three-dimensional topography model can be constructed based on topography characterization parameters, including the spatial location of the through-hole edge, cross-sectional profile, circumferential fluctuations, and local protrusion features. This three-dimensional topography model characterizes the actual topography of the glass through-hole edge and provides a basis for subsequently determining the transition compensation surface for the edge protrusions according to preset compensation rules. Utilizing mature three-dimensional topography measurement equipment to acquire edge topography data and extracting, fitting, and parameterizing the through-hole edge profile to establish an actual topography model of the through-hole edge improves the accuracy of the topography model.

[0078] As can be seen, in this example, by extracting, fitting, and parametrically representing the contour of the through hole edge, an actual morphological model of the through hole edge is established, which helps to improve the accuracy of the morphological model establishment.

[0079] In one possible example, the above method may include the following steps in determining the target exposure parameters of the transition compensation surface: obtaining a preset calibration relationship, the calibration relationship including a calibration relationship between exposure dose and remaining photoresist thickness and development depth; determining the target exposure parameters according to the preset calibration relationship and the transition compensation surface, the target exposure parameters including at least one of the following: pixel-level exposure dose, exposure time, grayscale distribution, number of zone exposures, focal plane compensation parameters, and development conditions.

[0080] Among them, the calibration relationship between exposure dose, remaining resist thickness and development depth can be established in advance according to the photoresist used, and different calibration relationships can be set for different photoresists.

[0081] Please see Figure 9 , Figure 9 This is a schematic diagram of a target exposure parameter provided in an embodiment of this application. When using a high exposure dose, the transition compensation surface formed on the glass substrate surface has a higher height and a thicker thickness; when using a low exposure dose, the transition compensation surface formed on the glass substrate surface has a lower height and a thinner thickness. The transition compensation surface parameter is mapped / converted to a grayscale image or an exposure dose distribution map, and the exposure dose gradually increases from left to right in the grayscale image or exposure dose distribution map.

[0082] As can be seen in this example, the transition compensation surface can be converted into three-dimensional exposure parameters that can be executed by digital lithography equipment based on the preset calibration relationship, which helps to improve the efficiency and accuracy of exposure parameter determination.

[0083] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the above method may include the following steps: obtaining laser drilling parameters for the glass via, the laser drilling parameters including at least one of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focus position, scanning path, and number of processing operations; determining a reference exposure parameter set based on the laser drilling parameters, edge morphology data, and target exposure parameters, the reference exposure parameter set including the correspondence between the laser drilling parameters and the edge morphology data, and the correspondence between the edge morphology data and the target exposure parameters.

[0084] This process involves selecting various laser drilling parameters to form a via array on a glass substrate. Edge morphology data and target exposure parameters are determined for each group of glass vias. Furthermore, multiple sets of laser drilling parameters, edge morphology data, and target exposure parameters are used to establish a reference exposure parameter set that includes the correspondence between laser drilling parameters and edge morphology data, as well as the correspondence between edge morphology data and target exposure parameters. This results in a database or mapping table of "laser drilling parameters - edge morphology data - target exposure parameters" for easy retrieval and process optimization in the future.

[0085] In addition to obtaining the target exposure parameters through empirical table lookup, other methods for determining the target exposure parameters include interpolation fitting, multinomial regression, machine learning models, or inversion algorithms based on photoresist response curves, etc., which are not limited here.

[0086] As can be seen in this example, a database or mapping table of "laser drilling parameters - edge topography data - target exposure parameters" can be established for subsequent calls, which helps to improve the efficiency of determining exposure parameters.

[0087] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the above method may further include the following steps: controlling the film deposition equipment to perform seed layer deposition on the glass via to form a target seed layer; controlling the film deposition equipment to perform metal layer deposition on the glass via to form a target metal layer.

[0088] The seed layer deposition method can be one or more combinations of sputtering, evaporation, chemical plating, atomic layer deposition, etc., and the seed layer deposition material can include titanium, copper, chromium, nickel, palladium or combinations thereof.

[0089] Metal layer deposition can be achieved through one or more methods, such as sputtering, evaporation, electroless plating, atomic layer deposition, and electroplating.

[0090] As can be seen in this example, after compensating for the edge protrusions, seed layer deposition and metal layer deposition can be performed on the glass via to form a seed layer and a metal layer, which helps to improve the quality of the seed layer and the metal layer and reduce the risk of metal wiring cracking.

[0091] Please see Figure 10 , Figure 10 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application, such as... Figure 10 As shown, a host device is used in a through-hole compensation system, the through-hole compensation system including the host device and a digital lithography device communicatively connected to the host device; the electronic device includes a processor, a memory, a communication interface, and one or more programs, wherein the one or more programs are stored in the memory, and the one or more programs are configured to be executed by the processor according to the following instructions: Acquire edge topography data of glass through-holes; Based on the edge morphology data, a transition compensation surface for the edge protrusion of the glass via is determined. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. Determine the target exposure parameters for the transition compensation surface; The target exposure parameters are transmitted to the digital lithography equipment, which is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

[0092] As can be seen, in this embodiment, the electronic device first acquires the edge morphology data of the glass via, then determines the transition compensation surface of the edge protrusion of the glass via based on the edge morphology data. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. Next, the target exposure parameters of the transition compensation surface are determined. Finally, the target exposure parameters are transmitted to the digital lithography equipment, which is used to form a continuous transition slope structure on the glass via according to the target exposure parameters. By determining the transition compensation surface to compensate for the edge protrusion based on the edge morphology data, and further determining the target exposure parameters for forming the transition compensation surface, the digital lithography equipment then forms a more gently sloping continuous transition slope structure at the edge of the glass via through three-dimensional exposure according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial to improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition.

[0093] In one possible example, regarding the determination of the transition compensation surface for the edge protrusion of the glass via based on the edge topography data, the above procedure includes instructions for performing the following steps: Based on the edge topography data, a topography model of the glass through-hole is established; Obtain the preset compensation rules for the morphology model; Based on the preset compensation rules and the morphology model, the transition compensation surface for the edge protrusion is determined.

[0094] In one possible example, regarding the step of establishing a topographic model of the glass via based on the edge topography data, the above procedure includes instructions for performing the following steps: Extract edge contour information based on edge topography data; The edge contour information is fitted to obtain shape fitting data; Based on the morphology fitting data, determine the morphology characterization parameters; Based on the morphology characterization parameters, a morphology model of the glass through-hole is established.

[0095] In one possible example, regarding the determination of the target exposure parameters for the transition compensation surface, the above procedure includes instructions for performing the following steps: Obtain a preset calibration relationship, which includes the calibration relationship between exposure dose, remaining adhesive thickness, and development depth; The target exposure parameters are determined based on the preset calibration relationship and the transition compensation surface. The target exposure parameters include at least one of the following: pixel-level exposure dose, exposure time, gray value distribution, number of exposures in each zone, focal plane compensation parameters, and development conditions.

[0096] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the above procedure further includes instructions for performing the following steps: The laser drilling parameters for obtaining glass through holes include at least one of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focusing position, scanning path, and number of processing steps; Based on the laser drilling parameters, edge morphology data, and target exposure parameters, a reference exposure parameter set is determined. The reference exposure parameter set includes the correspondence between the laser drilling parameters and the edge morphology data, and the correspondence between the edge morphology data and the target exposure parameters.

[0097] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the above procedure further includes instructions for performing the following steps: The control film deposition equipment is used to deposit a seed layer on the glass via to form a target seed layer; The film deposition equipment is controlled to deposit a metal layer on the glass via to form the target metal layer.

[0098] The above primarily describes the solutions of the embodiments of this application from the perspective of the method execution process. It is understood that, in order to achieve the above functions, the electronic device includes corresponding hardware structures and / or software modules for executing each function. Those skilled in the art should readily recognize that, in conjunction with the units and algorithm steps of the various examples described in the embodiments provided herein, this application can be implemented in hardware or a combination of hardware and computer software. Whether a function is executed by hardware or by computer software driving hardware depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of this application.

[0099] This application embodiment can divide the electronic device into functional units according to the above method example. For example, each function can be divided into a separate functional unit, or two or more functions can be integrated into one processing unit. The integrated unit can be implemented in hardware or as a software functional unit. It should be noted that the unit division in this application embodiment is illustrative and only represents one logical functional division. In actual implementation, there may be other division methods.

[0100] When dividing each function into modules according to its corresponding function. Figure 11 This is a functional unit block diagram of a glass through-hole edge protrusion compensation device provided in an embodiment of this application, as shown below. Figure 11 As shown, the glass through-hole edge protrusion compensation device includes an acquisition unit 1101, a determination unit 1102, a transmission unit 1103, and a control unit 1104; wherein, The acquisition unit 1101 is used to acquire edge morphology data of the glass through hole; The determining unit 1102 is used to determine the transition compensation surface of the edge protrusion of the glass through hole according to the edge morphology data. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass through hole. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. The determining unit 1102 is also used to determine the target exposure parameters of the transition compensation surface; The transmission unit 1103 is used to transmit the target exposure parameters to the digital lithography equipment, which is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

[0101] As can be seen from the embodiments of this application, the glass via edge protrusion compensation device first acquires the edge morphology data of the glass via, then determines the transition compensation surface of the edge protrusion of the glass via based on the edge morphology data. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. Next, the target exposure parameters of the transition compensation surface are determined. Finally, the target exposure parameters are transmitted to the digital lithography equipment, which is used to form a continuous transition slope structure on the glass via according to the target exposure parameters. By determining the transition compensation surface for compensating the edge protrusion based on the edge morphology data, and further determining the target exposure parameters for forming the transition compensation surface, the digital lithography equipment forms a more gently sloping continuous transition slope structure at the edge of the glass via through three-dimensional exposure according to the target exposure parameters. This improves the geometric connection between the via edge and the glass substrate surface away from the via, which is beneficial to improving the mechanical stability of the glass via and the quality of subsequent seed layer and metal layer deposition.

[0102] In one possible example, regarding the determination of the transition compensation surface for the edge protrusion of the glass via based on the edge topography data, the determining unit 1102 is specifically used for: Based on the edge topography data, a topography model of the glass through-hole is established; Obtain the preset compensation rules for the morphology model; Based on the preset compensation rules and the morphology model, the transition compensation surface for the edge protrusion is determined.

[0103] In one possible example, regarding the establishment of a morphology model of the glass via based on the edge morphology data, the determining unit 1102 is specifically used for: Extract edge contour information based on edge topography data; The edge contour information is fitted to obtain shape fitting data; Based on the morphology fitting data, determine the morphology characterization parameters; Based on the morphology characterization parameters, a morphology model of the glass through-hole is established.

[0104] In one possible example, the determining unit 1102 is specifically used for determining the target exposure parameters of the transition compensation surface, in relation to: Obtain a preset calibration relationship, which includes the calibration relationship between exposure dose, remaining adhesive thickness, and development depth; The target exposure parameters are determined based on the preset calibration relationship and the transition compensation surface. The target exposure parameters include at least one of the following: pixel-level exposure dose, exposure time, gray value distribution, number of exposures in each zone, focal plane compensation parameters, and development conditions.

[0105] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the determining unit 1102 is further specifically used for: The laser drilling parameters for obtaining glass through holes include at least one of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focusing position, scanning path, and number of processing steps; Based on the laser drilling parameters, edge morphology data, and target exposure parameters, a reference exposure parameter set is determined. The reference exposure parameter set includes the correspondence between the laser drilling parameters and the edge morphology data, and the correspondence between the edge morphology data and the target exposure parameters.

[0106] In one possible example, after transmitting the target exposure parameters to the digital lithography equipment, the control unit 1104 is further specifically configured to: The control film deposition equipment is used to deposit a seed layer on the glass via to form a target seed layer; The film deposition equipment is controlled to deposit a metal layer on the glass via to form the target metal layer.

[0107] It should be noted that all relevant content of each step involved in the above method embodiments can be referenced from the functional description of the corresponding functional module, and will not be repeated here.

[0108] The electronic device provided in this embodiment is used to perform the above-described glass through-hole edge protrusion compensation method, and thus can achieve the same effect as the above-described implementation method.

[0109] When using integrated units, the electronic device may include a processing module, a storage module, and a communication module. The processing module can be used to control and manage the actions of the electronic device; for example, it can support the electronic device in executing the steps performed by the aforementioned functional units. The storage module can support the electronic device in executing stored program code and data. The communication module can support communication between the electronic device and other devices.

[0110] The processing module can be a processor or a controller. It can implement or execute various exemplary logic blocks, modules, and circuits described in conjunction with the disclosure of this application. The processor can also be a combination that implements computing functions, such as a combination of one or more microprocessors, a combination of digital signal processing (DSP) and a microprocessor, etc. The storage module can be a memory. The communication module can specifically be a radio frequency circuit, a Bluetooth chip, a Wi-Fi chip, or other devices that interact with other electronic devices.

[0111] This application also provides a computer storage medium storing a computer program for electronic data interchange, which causes a computer to perform some or all of the steps of any of the methods described in the above method embodiments, wherein the computer includes an electronic device.

[0112] This application also provides a computer program product, which includes a non-transitory computer-readable storage medium storing a computer program operable to cause a computer to perform some or all of the steps of any of the methods described in the above method embodiments. The computer program product may be a software installation package, and the computer includes a control platform.

[0113] It should be noted that, for the sake of simplicity, the foregoing method embodiments are all described as a series of actions. However, those skilled in the art should understand that this application is not limited to the described order of actions, as some steps may be performed in other orders or simultaneously according to this application. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions and modules involved are not necessarily essential to this application.

[0114] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0115] In the several embodiments provided in this application, it should be understood that the disclosed apparatus can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for instance, the division of the units described above is only a logical functional division, and in actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the coupling or direct coupling or communication connection shown or discussed may be through some interfaces; the indirect coupling or communication connection between devices or units may be electrical or other forms.

[0116] The units described above as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0117] Furthermore, the functional units in the various embodiments of this application can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit.

[0118] If the aforementioned integrated units are implemented as software functional units and sold or used as independent products, they can be stored in a computer-readable storage device (CMD). Based on this understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a memory and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of this application. The aforementioned memory includes various media capable of storing program code, such as USB flash drives, read-only memory (ROM), random access memory (RAM), portable hard drives, magnetic disks, or optical disks.

[0119] Those skilled in the art will understand that all or part of the steps in the various methods of the above embodiments can be implemented by a program instructing related hardware. The program can be stored in a computer-readable storage device, which may include: a flash drive, a read-only memory, a random access memory, a magnetic disk, or an optical disk, etc.

[0120] The embodiments of this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A method for compensating for edge protrusions in glass through-holes, characterized in that, A host device for a through-hole compensation system, the through-hole compensation system comprising the host device and a digital lithography device communicatively connected to the host device; including: Acquire edge topography data of glass through-holes; Based on the edge morphology data, a transition compensation surface for the edge protrusion of the glass via is determined. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass via. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. Obtain a preset calibration relationship, which includes the calibration relationship between exposure dose, remaining adhesive thickness, and development depth; Based on the preset calibration relationship and the transition compensation surface, the target exposure parameters are determined. The target exposure parameters include at least one of the following: pixel-level exposure dose, exposure time, gray value distribution, number of exposures in each zone, focal plane compensation parameters, and development conditions. The target exposure parameters are transmitted to the digital lithography equipment, which is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

2. The method according to claim 1, characterized in that, The step of determining the transition compensation surface for the edge protrusion of the glass through hole based on the edge morphology data includes: Based on the edge topography data, a topography model of the glass through-hole is established; Obtain the preset compensation rules for the morphology model; Based on the preset compensation rules and the morphology model, the transition compensation surface for the edge protrusion is determined.

3. The method according to claim 2, characterized in that, The step of establishing a morphology model of the glass via based on the edge morphology data includes: Extract edge contour information based on edge topography data; The edge contour information is fitted to obtain shape fitting data; Based on the morphology fitting data, determine the morphology characterization parameters; Based on the morphology characterization parameters, a morphology model of the glass through-hole is established.

4. The method according to claim 1, characterized in that, After transmitting the target exposure parameters to the digital lithography apparatus, the method further includes: The laser drilling parameters for obtaining glass through holes include at least one of the following: laser wavelength, pulse energy, repetition frequency, pulse width, scanning speed, focusing position, scanning path, and number of processing steps; Based on the laser drilling parameters, edge morphology data, and target exposure parameters, a reference exposure parameter set is determined. The reference exposure parameter set includes the correspondence between the laser drilling parameters and the edge morphology data, and the correspondence between the edge morphology data and the target exposure parameters.

5. The method according to claim 1, characterized in that, After transmitting the target exposure parameters to the digital lithography apparatus, the method further includes: The control film deposition equipment is used to deposit a seed layer on the glass via to form a target seed layer; The film deposition equipment is controlled to deposit a metal layer on the glass via to form the target metal layer.

6. The method according to any one of claims 1-5, characterized in that, Edge topography data includes at least one of the following: edge protrusion height, width, radial position, edge profile, surface slope, local dip angle, and curvature; The transition compensation surface includes at least one of the following: continuous slope structure, segmented slope structure, multi-step approximation slope structure, and spline surface structure.

7. A device for compensating for edge protrusions in glass through-holes, characterized in that, A host device for a through-hole compensation system, the through-hole compensation system including the host device and a digital lithography device communicatively connected to the host device; the glass through-hole edge protrusion compensation device includes an acquisition unit, a determination unit, and a transmission unit; wherein... The acquisition unit is used to acquire edge morphology data of the glass through hole; The determining unit is used to determine the transition compensation surface of the edge protrusion of the glass through hole according to the edge morphology data. The transition compensation surface is used to form a continuous transition slope structure between the edge protrusion and the glass substrate surface away from the glass through hole. The characteristic tilt angle of the transition compensation surface is smaller than the characteristic tilt angle of the edge protrusion. The characteristic tilt angle is used to characterize the steepness of the edge protrusion slope relative to the horizontal plane of the glass substrate. The determining unit is further configured to determine the target exposure parameters of the transition compensation surface; determining the target exposure parameters of the transition compensation surface includes: obtaining a preset calibration relationship, the calibration relationship including the calibration relationship between exposure dose and remaining adhesive thickness and development depth; determining the target exposure parameters according to the preset calibration relationship and the transition compensation surface, the target exposure parameters including at least one of the following: pixel-level exposure dose, exposure time, grayscale distribution, number of exposures in zones, focal plane compensation parameters and development conditions; The transmission unit is used to transmit the target exposure parameters to the digital lithography equipment, and the digital lithography equipment is used to form the continuous transition slope structure on the glass via according to the target exposure parameters.

8. An electronic device, characterized in that, It includes a processor and a memory, the memory being used to store one or more programs and configured to be executed by the processor, the programs including instructions for performing the steps of the method as described in any one of claims 1-6.

9. A computer-readable storage medium, characterized in that, A computer program for storing electronic data interchange is provided, wherein the computer program causes a computer to perform the method as described in any one of claims 1-6.

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