Base station base, clean base station, cleaning system, and self-cleaning method for base station base.

Abstract

This application provides a base station base, a cleaning base station, a cleaning system, and a self-cleaning method for the base station base, relating to the field of cleaning equipment technology. The base station base includes a support platform with a placement groove. The placement groove is configured to hold a cleaning module from a cleaning device. When the cleaning module is placed in the placement groove, at least a portion of the groove wall is configured to fit against the cleaning component in the cleaning module, and the cleaning component can rotate and move relative to the placement groove. The placement groove has a rinsing port and a suction port, which are arranged opposite each other along the length of the placement groove. The rinsing port is configured to be connected to a water source. The base station base provided in this embodiment can scrape away dirt by rotating the cleaning component relative to the placement groove, and then rinse the surface of the placement groove with liquid input through the rinsing port, followed by drainage through the suction port. This achieves self-cleaning of the placement groove by the base station base, thereby reducing dirt residue on the base station and improving the user experience.

Description

Technical Field

[0001] This application relates to the field of cleaning equipment technology, and in particular to a base station base, a cleaning base station, a cleaning system, and a self-cleaning method for the base station base. Background Technology

[0002] The cleaning equipment is a device that can automatically clean the surface to be cleaned. The cleaning equipment can clean the surface to be cleaned through cleaning modules.

[0003] After completing its cleaning task, the cleaning equipment can enter the base station for resupply or standby. In related technologies, the base station is equipped with a placement slot for the cleaning module, where the cleaning components of the cleaning module can be placed.

[0004] However, the dirt carried by the cleaning kit can easily accumulate and remain in the placement slot, requiring regular cleaning and affecting the user experience. Summary of the Invention

[0005] This application provides a base station base, a cleaning base station, a cleaning system, and a self-cleaning method for the base station base, which reduces dirt residue on the placement slot, improves the self-cleaning ability of the placement slot and the base station, and thus enhances the user experience.

[0006] In a first aspect, embodiments of this application provide a base station base, including a support platform, the support platform having a placement slot, the placement slot being configured to place a cleaning module in a cleaning device, when the cleaning module is placed in the placement slot, at least a portion of the slot wall is configured to fit against a cleaning component in the cleaning module, and the cleaning component can be rotated and raised / lowered relative to the placement slot.

[0007] The placement tank has a rinsing port and a sludge suction port, which are arranged opposite each other along the length of the placement tank, and the rinsing port is configured to be connected to a water source.

[0008] The base station base provided in this application embodiment has a placement slot, which allows the base station base to receive the cleaning module. With the cleaning component in contact with at least part of the slot wall, when the cleaning module is located in the placement slot, the cleaning component can rotate in the placement slot, thereby forming continuous contact with the slot wall, making it easier for mud, dirt and other adhesives attached to the slot wall to be removed under friction and compression.

[0009] Furthermore, because the cleaning component can be raised and lowered relative to the placement tank, it can be positioned at a certain height above the tank. This allows the liquid entering through the rinsing port to spread along the length of the tank wall. The suction port and rinsing port are positioned opposite each other along the length of the tank, ensuring the orderly flow of wastewater within the tank. This allows the wastewater to be continuously carried away from the tank during rinsing and promptly discharged through the suction port, helping to prevent dirt from accumulating and depositing inside. This improves the self-cleaning ability of the cleaning system for the placement tank, reduces the frequency of subsequent disassembly and cleaning of the tank, and enhances the user experience.

[0010] In some embodiments, the support platform has a support surface and a non-support surface that are arranged opposite to each other in the thickness direction, and the support surface is provided with a placement groove;

[0011] The base station base also includes a water source connector, which is located on a non-load-bearing surface. One end of the water source connector is connected to a flushing port, and the other end of the water source connector is configured to be connected to a water source.

[0012] In this embodiment, by placing the water source connector on a non-load-bearing surface and connecting it with the rinsing port, a stable water supply can be ensured while avoiding interference from external pipelines to the entry, exit, and lifting of the cleaning module.

[0013] In some embodiments, the placement groove has opposing first groove sidewalls and second groove sidewalls on one side of the groove length direction;

[0014] At least some of the flushing ports are located on the side wall of the first tank, and along the length of the placement tank, the sludge extraction port is located on the side of the bottom wall of the placement tank adjacent to the side wall of the second tank.

[0015] In this embodiment, by placing at least some of the rinsing ports on the side wall of the first tank and placing the sludge suction port on the side wall of the second tank, the cleaning liquid enters from one side of the side wall of the first tank and spreads along the length of the tank wall, gradually converging towards the vicinity of the side wall of the second tank. Subsequently, it is drawn away or drained through the sludge suction port located on the bottom wall of the tank near the side wall of the second tank, thereby reducing the accumulation of liquid and backflow retention in the tank.

[0016] In some embodiments, the placement slot is an arc-shaped slot that matches the structure of the cleaning module;

[0017] There are multiple flushing ports, which are spaced apart on one side of the first tank sidewall adjacent to the bottom wall of the tank.

[0018] In this embodiment, the arc-shaped groove design allows the cleaning component to maintain a relatively stable contact with the local groove wall as it moves within the groove, making it easier for dirt to detach under the guidance of the arc surface and the action of the liquid flow. The multiple rinsing nozzles allow cleaning liquid to be sprayed from different positions on the side wall of the first groove, enabling the cleaning liquid to diffuse along the curved inner wall of the arc-shaped groove. This improves the rinsing coverage of the cleaning liquid, allowing for more thorough removal of dirt and mud from the surface of the groove wall, thus providing a better cleaning effect for the groove.

[0019] Meanwhile, multiple rinsing ports are located near the bottom wall of the tank, which makes it easier for the cleaning fluid to diffuse to the lower part of the tank and the lower edge of the cleaning parts. It also helps to prevent the cleaning fluid sprayed from the rinsing ports from splashing upwards, so that the dirty water after rinsing can be collected along the bottom of the tank and discharged in time by the sewage suction port.

[0020] In some embodiments, the wall of the placement tank has a boss configured to support at least a portion of the drive assembly in the cleaning module, and the boss is positioned on the side of the suction port facing the opening of the placement tank.

[0021] This embodiment provides support points or surfaces for the drive components by setting up bosses, providing support, positioning and posture constraints for the bottom of at least part of the drive components in the cleaning module. The cleaning module is less likely to tilt or sink locally during suction and rinsing, which helps to ensure the posture stability of the cleaning module during cleaning and sewage discharge.

[0022] Meanwhile, a partial cavity can be formed between the lower end face of the boss and the bottom wall of the placement tank. Wastewater can enter this partial cavity through the sludge suction port and then be discharged from the placement tank through this cavity. In this way, the partial cavity can buffer the wastewater discharge, helping to prevent direct backflow or splashing of wastewater near the sludge suction port, reducing the probability of wastewater leakage in the tank opening direction, and facilitating rapid wastewater discharge.

[0023] In some embodiments, the boss and a portion of the wall of the placement groove together define a receiving cavity for receiving at least a portion of the drive assembly, and the receiving cavity communicates with the sludge extraction port through a portion of the placement groove.

[0024] In this embodiment, since the receiving cavity is connected to the sewage extraction port through a partial placement groove, when liquid overflows or drips into the receiving cavity, the liquid can flow along the placement groove to the sewage extraction port and be extracted, making it less likely for water to accumulate in the area where the boss is located during cleaning. This reduces the probability of sewage lingering inside the base and helps improve the cleanliness of the placement groove.

[0025] In some embodiments, the base station base also includes a drain pipe, one end of which is connected to a sludge inlet, and the other end of which is configured to be connected to a sludge storage tank in the clean base station, so that the sludge can enter the sludge storage tank along the drain pipe under negative pressure suction or gravity.

[0026] In some embodiments, the carrying platform also has a sludge-collecting tank with a drain outlet, and the sludge-collecting tank is configured to connect with a wastewater storage tank in the cleaning equipment to collect wastewater from the wastewater storage tank.

[0027] The base station base also includes a connecting component. One end of the connecting component is connected to the sewage outlet, and the other end of the connecting component is connected to the sewage pipe, so that the sewage discharged from the sewage receiving tank and the sewage discharged from the placement tank can converge and then flow together into the sewage storage tank in the clean base station, or be discharged together into the sewer pipe.

[0028] Secondly, embodiments of this application provide a clean base station, comprising:

[0029] The aforementioned base station base;

[0030] The liquid storage tank contains liquid that can clean the placement slot on the base station base.

[0031] The flushing port in the base station base is configured to communicate with a liquid storage tank, and / or the sludge suction port in the base station base is configured to communicate with a sludge storage tank.

[0032] The cleaning base station provided in this application embodiment, through the setting of a liquid storage tank and a sludge storage tank, enables the cleaning base station itself to store the liquid used for cleaning and the discharged sewage, thereby making the cleaning base station suitable for application scenarios where automatic water intake and drainage are not convenient.

[0033] Meanwhile, since the cleaning base station provided in this application includes the base station base in any of the above embodiments, the liquid can rinse the placement tank and carry the dirt in the placement tank away to the sewage extraction port, thereby enabling the placement tank to self-clean and improving the self-cleaning capability of the cleaning base station, reducing the frequency of manual disassembly and cleaning of the cleaning base station by users.

[0034] In some embodiments, the cleaning base station further includes a first driving device, and the sludge suction port is connected to the sludge storage tank through the first driving device; the first driving device is configured to extract liquid from the placement tank and drive the liquid to flow to the sludge storage tank.

[0035] In some embodiments, the cleaning base station further includes a second driving device, through which the rinsing port is connected to a liquid storage tank; the second driving device is configured to drive the liquid in the liquid storage tank to flow to the rinsing port.

[0036] Thirdly, embodiments of this application provide a cleaning system, including:

[0037] The cleaning equipment includes a main unit and a cleaning module. The cleaning module is located at the bottom of the main unit and includes cleaning components.

[0038] The aforementioned base station base or the aforementioned cleaning base station, the placement slot in the base station base or the cleaning base station is used to place the cleaning module; the cleaning component can be rotated and raised / lowered relative to the placement slot.

[0039] When the cleaning module is placed in the placement slot, at least a portion of the slot wall is in contact with the cleaning component, and during the rotation of the cleaning component relative to the host, the cleaning component is configured to interfere with at least a portion of the slot wall.

[0040] The cleaning system provided in this embodiment can achieve self-cleaning of the placement slot through the base station base, and improve the self-cleaning capability of the cleaning base station, thereby enhancing the user experience.

[0041] In some embodiments, the cleaning equipment further includes a squeegee, a clean water tank, a clean water strip, and a wastewater storage tank, the clean water tank being configured to store liquid;

[0042] The water strip is configured to communicate with the water tank, and the outlet of the water strip faces the cleaning component;

[0043] The smear strip is configured to interfere with the cleaning parts to scrape off dirt from the cleaning parts and direct the dirt into the wastewater storage tank.

[0044] In this embodiment, with the above structure, when the cleaning module of the cleaning equipment performs self-cleaning, the liquid in the clean water tank can enter the clean water strip through the connecting pipe under the action of the pump or gravity, and be released from the outlet of the clean water strip toward the cleaning part. The liquid can form a continuous or intermittent wetting flow on the surface of the cleaning part, which can soften and disperse dirt such as mud stains, dust and adhesive particles attached to the cleaning part.

[0045] Meanwhile, because the scraping strip and the cleaning component are interference-fitted, the scraping strip can squeeze, scrape off, and wipe away wet dirt from the surface of the cleaning component. The scraped dirt is then directed to the wastewater storage tank of the cleaning equipment, achieving separation of wastewater from the cleaning component and preventing wastewater from flowing back to the surface to be cleaned.

[0046] Fourthly, embodiments of this application provide a self-cleaning method for a base station base. The self-cleaning method is applied to a cleaning system, which includes a cleaning device and a cleaning base. The cleaning device includes a host and a cleaning module. The cleaning module is located at the bottom of the host and includes cleaning components.

[0047] The base station base has a placement slot, the cleaning module is placed in the placement slot and contacts at least part of the slot wall; the cleaning component can be rotated and raised relative to the placement slot; the placement slot has a rinsing port and a sludge suction port, which are arranged opposite each other along the length of the placement slot, and the rinsing port is configured to be connected to a water source.

[0048] The self-cleaning method includes the following steps:

[0049] Triggered by a base station base cleaning command, the cleaning equipment first performs a first action and then a second action; wherein, the first action is to drive the cleaning component to rotate in the placement slot for a first preset time; the second action is to drive the cleaning component to lift so that the surface of the cleaning component is detached from the slot wall.

[0050] Perform a cleaning action on the placement tank, the cleaning action including controlling the rinsing port to rinse the placement tank for a second preset time, and draining the sewage in the placement tank through the sewage suction port.

[0051] The self-cleaning method for a base station base provided in this application embodiment, triggered by a base station base cleaning command, first drives the cleaning component to rotate within the placement slot for a first preset time, then drives the cleaning component to lift and detach from the slot wall. Subsequently, the rinsing port is controlled to rinse the placement slot within a second preset time, and wastewater is discharged through the suction port, forming a continuous self-cleaning process. During this process, the relative movement between the cleaning component and the placement slot during contact loosens the dirt within the slot. The lifting action allows the cleaning component to avoid the flow channel of the placement slot, and the rinsing port and suction port form a wastewater discharge path, enabling the liquid to effectively rinse all areas within the placement slot. This achieves cleaning of the placement slot, reduces wastewater residue and the probability of dirt re-attachment, thereby improving the self-cleaning capability and low-maintenance performance of the cleaning system.

[0052] In some embodiments, the cleaning equipment further includes a squeegee, a clean water tank, a clean water component, and a wastewater storage tank, wherein the clean water tank is configured to store liquid;

[0053] In performing the first action, the self-cleaning method also includes the following steps:

[0054] The cleaning equipment performs a self-cleaning action on the cleaning components. The self-cleaning action includes spraying liquid from the clean water tank onto the cleaning components through the clean water component, and scraping off the dirt on the cleaning components by interference fit between the scraper and the cleaning components, and directing the dirt into the wastewater storage tank.

[0055] Through the above steps, this embodiment can simultaneously clean the cleaning component itself while loosening the dirt in the placement tank, effectively reducing secondary pollution caused by dirt carried by the cleaning component, thereby improving the self-cleaning effect of the cleaning component and the placement tank.

[0056] In some embodiments, prior to performing the first action, the self-cleaning method further includes the following steps:

[0057] Before the cleaning module is placed in the placement tank, the liquid injection action of the placement tank is performed first, and then the cleaning equipment performs the third action.

[0058] The liquid injection action includes injecting liquid into the placement tank through the rinsing port for a third preset time, and then the cleaning equipment performs a third action to store liquid in the placement tank; the third action is to drive the cleaning component to descend a preset height so that part of the cleaning component is immersed in the liquid in the placement tank for a fourth preset time.

[0059] Through the above steps, this embodiment enables the placement tank to be pre-wetted and the cleaning parts to be pre-soaked, achieving simultaneous softening of the dirt in the placement tank and the dirt on the surface of the cleaning parts. This reduces the adhesion strength between the dirt and the cleaning parts, as well as the adhesion strength between the dirt and the placement tank, which helps to improve the effectiveness of subsequent mechanical scraping and water rinsing operations. It also reduces the situation of stubborn dirt residue and incomplete local cleaning during the cleaning process, thereby further improving the stability of the self-cleaning operation of the cleaning system and the overall cleaning effect, and optimizing the automated operation and maintenance performance of the equipment and the user experience.

[0060] In some embodiments, the water flow rate at the rinsing port during the cleaning action is greater than the water flow rate at the sludge extraction port during the liquid injection action, so that a certain amount of liquid accumulates in the placement tank.

[0061] In some embodiments, before performing the first action and after performing the third action, the self-cleaning method further includes the following steps:

[0062] The cleaning equipment performs a fourth action; wherein, the fourth action is to first drive the cleaning component to lift, and then perform the self-cleaning action again, and the self-cleaning action is performed for a fifth preset time.

[0063] Through the above steps, the cleaning component can perform self-cleaning before cleaning the placement tank, thereby reducing the probability of residual dirt on the cleaning component participating in the subsequent cleaning operation of the placement tank, and reducing the accumulation of dirt in the placement tank, thus improving the overall efficiency and cleanliness uniformity of the self-cleaning process of the cleaning system.

[0064] In some embodiments, the cleaning system further includes a sludge storage tank, which is installed at the base station;

[0065] After performing the fourth action and before performing the first action, the self-cleaning method also includes the following steps:

[0066] Wastewater is extracted from the storage tank through the sludge extraction port and stored in the sludge storage tank.

[0067] Through the above steps, the wastewater in the placement tank can be promptly extracted and centrally stored after the fourth action, clearing the turbid liquid and free impurities generated during the pretreatment stage in the placement tank. This provides a relatively clean tank environment for the subsequent operation of the cleaning components rotating and disturbing the tank's dirt in the first action, reducing wastewater backflow, retention, and secondary pollution, and improving the stability of the cleaning environment when the cleaning components enter the working state.

[0068] In some embodiments, the cleaning equipment further includes a wastewater storage tank, which is located in the main unit;

[0069] The base station base has a dirt collection trough, and the dirt collection trough has a drain outlet, which is connected to the dirt storage tank on the base station base.

[0070] Before performing the first action, the self-cleaning method also includes the following steps:

[0071] Connect the wastewater storage tank to the sludge receiving tank, and discharge the wastewater in the wastewater storage tank into the wastewater storage tank through the sludge receiving tank and the drain outlet.

[0072] In this embodiment, through the above steps, before the first action is performed, the sewage in the sewage storage tank can enter the sludge receiving tank under the action of gravity, and then flow into the sludge storage tank through the sewage outlet to complete the transfer. This reduces the sewage retention in the sewage storage tank before cleaning the placement tank, which helps to avoid the problems of odor accumulation and bacterial growth caused by long-term closed retention of sewage, and maintains the cleanliness of the sewage storage tank.

[0073] In some embodiments, at least during the execution of the first action, the self-cleaning method further includes the following steps:

[0074] The wastewater storage tank is flushed with liquid from the wastewater storage tank, and the flushed liquid is discharged into the wastewater storage tank through the drain outlet.

[0075] In this embodiment, the wastewater storage tank can collect wastewater generated during the initial cleaning and pretreatment processes. This wastewater has a relatively low impurity content and is suitable for secondary recycling. Simultaneously, by utilizing the water stored inside the main unit's wastewater storage tank to continuously flush the base station's base sludge-collecting tank, the system can fully utilize the operating water, reduce the consumption of clean water, improve the equipment's water resource utilization efficiency, achieve simultaneous pretreatment of the main tank and cleaning of the drainage structure, enhance the cleaning effect of the sludge-collecting tank, and improve the overall efficiency of the equipment's self-cleaning operation. Attached Figure Description

[0076] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0077] Figure 1 This is a schematic diagram of the structure of the cleaning system provided in the embodiments of this application;

[0078] Figure 2This is a schematic diagram of the structure of the cleaning equipment provided in the embodiments of this application;

[0079] Figure 3 This is a schematic diagram of the structure of the cleaning equipment provided in this application embodiment on the base station base;

[0080] Figure 4 A schematic diagram of the structure of the base station base provided in the embodiments of this application. Figure 1 ;

[0081] Figure 5 A schematic diagram of the structure of the base station base provided in the embodiments of this application. Figure 2 ;

[0082] Figure 6 A schematic diagram of the structure of the base station base provided in the embodiments of this application. Figure 3 ;

[0083] Figure 7 This is a flowchart illustrating the self-cleaning method for a base station base provided in an embodiment of this application.

[0084] Figure label:

[0085] 1- Cleaning system;

[0086] 10-Clean base stations;

[0087] 20-Cleaning equipment; 21-Main unit; 22-Cleaning components;

[0088] 100 - Base station base; 110 - Bearing platform; 111 - Bearing surface; 112 - Non-bearing surface; 120 - Placement slot; 121 - Flushing port; 122 - Sewage suction port; 123 - Boss; 124 - Side wall of the first slot; 125 - Side wall of the second slot; 130 - Water source connector; 140 - Sewage pipe; 150 - Sewage receiving slot; 151 - Sewage discharge port; 160 - Connecting component. Detailed Implementation

[0089] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0090] Please see Figure 1The cleaning system 1 provided in this application embodiment may include a cleaning device 20 and a base station. The cleaning device 20 may be a robot vacuum cleaner, a vacuum cleaner, a washer-mop combo, a sweeper-mop combo, a floor scrubber, or other equipment capable of cleaning the surface to be cleaned. The surface to be cleaned may be a floor, which may be a wooden floor, tile, cement surface, etc.

[0091] Please see Figure 2 The cleaning equipment 20 serves as the main body for performing the cleaning operation. The cleaning equipment 20 may include a cleaning module for cleaning the surface to be cleaned. The cleaning module includes a cleaning component 22, the outer peripheral working surface of which can face the surface to be cleaned and continues to face the surface to be cleaned when rotating, so that dirt is separated from the surface to be cleaned and temporarily stored in the wastewater storage tank of the cleaning equipment 20 through the cleaning module, thereby cleaning the surface to be cleaned.

[0092] After completing its cleaning task or when its power is low, the cleaning equipment 20 can enter the containment cavity inside the base station. In this way, the cleaning equipment 20 can perform functions such as parking, refueling, self-cleaning, and sewage discharge on the base station, ensuring the effectiveness of subsequent cleaning operations.

[0093] In related technologies, the base station base station base is provided with a placement slot for placing the cleaning module. The cleaning component of the cleaning module can be placed in the placement slot, or the cleaning component can be placed in the placement slot after self-cleaning, so that the dirt carried by the cleaning component is easily deposited in the corners, mating surfaces or low-lying areas of the placement slot.

[0094] As a result, after long-term use of the base station and cleaning equipment, stubborn dirt can easily accumulate in the contact area between the cleaning module and the base station base, which can increase odor and breed bacteria. Users need to disassemble and clean it frequently, which increases maintenance costs and affects the user experience.

[0095] In view of this, embodiments of this application provide a base station base 100, a cleaning base station 10, a cleaning system 1, and a self-cleaning method for the base station base 100 to solve the above-mentioned technical problems.

[0096] In a first aspect, embodiments of this application provide a base station base 100, which includes a support platform 110. The support platform 110 is a support component in the base station base 100 for supporting cleaning modules.

[0097] Please see Figure 3 The support platform 110 has a placement groove 120, which is a recessed structure on the support platform 110. The placement groove 120 is configured to hold the cleaning module in the cleaning device 20. The bottom, side walls, or end walls of the placement groove 120 can be adapted to the outer contour of the cleaning module so that the cleaning component 22 of the cleaning module can be stably placed in the placement groove 120. For example, the placement groove 120 can be an arc-shaped groove, an approximately U-shaped groove, a long strip groove, etc.

[0098] When the cleaning module is placed in the placement slot 120, at least a portion of the slot wall of the placement slot 120 is configured to fit against the cleaning component 22 in the cleaning module, so that the slot wall and the cleaning component 22 can form a partial fit or light pressure contact.

[0099] The cleaning component 22 is a cleaning execution component that directly contacts the surface to be cleaned in the cleaning module. The cleaning component 22 can be a roller cloth, a conveyor cloth, or other flexible cleaning component 22 with rotation, circumference, or reciprocating motion characteristics.

[0100] The cleaning component 22 can rotate and move up and down relative to the placement slot 120. That is, the cleaning component 22 can rotate, move, swing, and move up and down relative to the placement slot 120, thereby changing the contact state between the cleaning component 22 and the slot wall. In this way, when the cleaning component 22 is not in contact with the placement slot 120, it can achieve self-cleaning; when the cleaning component 22 is in contact with the placement slot 120, it can form a friction cleaning effect with the slot wall of the placement slot 120, so that the placement slot 120 of the base station base 100 can achieve self-cleaning.

[0101] Please see Figure 4 and Figure 5 The placement tank 120 has a rinsing port 121 and a sludge suction port 122. The rinsing port 121 and the sludge suction port 122 are arranged opposite each other along the length of the placement tank 120, and the rinsing port 121 is configured to be connected to a water source.

[0102] The rinsing port 121 is an inlet for supplying cleaning liquid to the placement tank 120. It allows water or cleaning liquid from a water source to be introduced into the placement tank 120, enabling the liquid to directly act on the surface of the cleaning component 22, the tank wall surface of the placement tank 120, and the areas with attached dirt, thereby forming a combination of rinsing, wetting, and dissolving. The drain port 122 is a drain for discharging the dirty liquid, foam, and suspended impurities formed in the placement tank 120.

[0103] The rinsing port 121 can be located at one end of the placement tank 120 along its length or near that end, and is positioned opposite the sludge suction port 122 along the length of the tank, so that the cleaning fluid can enter and pass through the working area of ​​the cleaning component 22 along a predetermined path.

[0104] Since the sludge extraction port 122 and the rinsing port 121 are arranged opposite each other along the length of the placement tank 120, the liquid enters from one end and is extracted from the other end, forming a relatively clear flow path, which is conducive to the dirt being carried away from the cleaning area along the liquid flow direction.

[0105] The base station base 100 provided in this application embodiment, through the setting of the placement groove 120, allows the base station base 100 to receive the cleaning module through the placement groove 120. Through the setting of the cleaning component 22 being in contact with at least part of the groove wall of the placement groove 120, when the cleaning module is located at the placement groove 120, the cleaning component 22 can rotate at the placement groove 120, thereby forming continuous contact with the groove wall of the placement groove 120, making it easier for mud stains, dirt and other adhesives attached to the groove wall to be removed under the action of friction and compression.

[0106] Furthermore, since the cleaning component 22 can be raised and lowered relative to the placement tank 120, it can be raised to a certain height above the placement tank 120. This allows the liquid entering through the rinsing port 121 to spread along the length of the placement tank 120 on the tank wall surface. The suction port 122 and the rinsing port 121 are positioned opposite each other along the length of the tank, ensuring that the waste liquid in the placement tank 120 flows orderly along the length of the tank. During rinsing, the waste liquid is continuously carried away from the placement tank 120 and promptly discharged through the suction port 122. This helps prevent dirt from accumulating and depositing in the tank, thereby improving the self-cleaning effect of the placement tank 120, reducing the frequency of subsequent disassembly and cleaning of the base station interior, and improving the user experience.

[0107] Please see Figure 5 and Figure 6 In some embodiments, the support platform 110 has a support surface 111 and a non-support surface 112 that are arranged opposite to each other in the thickness direction, and the support surface 111 is provided with a placement groove 120.

[0108] The bearing surface 111 is the side surface of the bearing platform 110 facing the cleaning equipment 20, and the non-bearing surface 112 is the other side surface opposite to the bearing surface 111. The bearing surface 111 and the non-bearing surface 112 are distributed along the thickness direction of the base station base 100, so that the water supply interface and the base station cavity are arranged in an upper and lower layer in terms of structure.

[0109] The base station base 100 also includes a water source connector 130, which is located on the non-load-bearing surface 112. This allows the connecting pipes to avoid the cleaning operation space on the load-bearing surface 111, thereby reducing interference with the parking and movement of the cleaning module and facilitating the layout and maintenance of external pipes.

[0110] One end of the water source connector 130 is connected to the flushing port 121, and the other end of the water source connector 130 is configured to be connected to a water source. External water enters the base station base 100 through the water source connector 130 and is introduced into the flushing port 121 connected to it through one end of the water source connector 130. Then, the flushing fluid enters the placement tank 120 through the flushing port 121 to flush the placement tank 120.

[0111] Specifically, one end of the water source connector 130 can form a continuous conductive relationship with the flushing port 121 through an internal flow channel, a pipe section, or an integrally formed flow channel, while the other end can be connected to the water supply pipe through plugging or screwing to ensure a stable and reliable water supply.

[0112] The water source connector 130 can be a straight connector, an elbow connector, or an integrated connector with a transition cavity. The external water source can be a water pipe, a purified water pipe, or an external cleaning fluid supply pipe.

[0113] Therefore, in this embodiment, by setting the water source connector 130 on the non-bearing surface 112 and connecting it with the flushing port 121, it is possible to ensure a stable water supply while avoiding interference from external pipelines to the entry, exit, and lifting of the cleaning module.

[0114] Please see Figure 4 and Figure 5 In some embodiments, the placement groove 120 has opposing first groove sidewall 124 and second groove sidewall 125 on one side in the groove length direction.

[0115] Along the length of the placement groove 120, the first groove sidewall 124 and the second groove sidewall 125 are located on both sides of the cleaning module, and together with the bottom wall of the groove, they form a space that can accommodate the cleaning module.

[0116] At least some of the rinsing ports 121 are provided on the side wall 124 of the first tank, so that external water sources can deliver cleaning fluid from the side wall 124 of the first tank into the placement tank 120.

[0117] Along the length of the placement tank 120, the sludge suction port 122 is located on the bottom wall of the placement tank 120 adjacent to the side wall 125 of the second tank, so that the sewage collected in the tank can be discharged nearby along the bottom of the tank, thus forming a counter-arrangement with the flushing port 121 along the length of the tank. In this way, when the sludge suction port 122 is located on the bottom wall of the tank, the sludge suction port 122 can be placed in a relatively low position, so that the sewage collected in the tank can be discharged nearby along the bottom of the tank, thereby facilitating sewage discharge.

[0118] Specifically, after the cleaning liquid enters from the side wall 124 of the first tank, it can spread along the length of the placement tank 120 on the surface of the tank wall and gradually converge towards the vicinity of the side wall 125 of the second tank. Then, it is drawn away or drained through the sludge extraction port 122 located on the bottom wall of the tank near the side wall 125 of the second tank, thereby reducing the accumulation of liquid and backflow retention in the tank.

[0119] The first tank sidewall 124 and the second tank sidewall 125 can be straight sidewalls, arc-shaped sidewalls, or sidewalls with guide surfaces to adapt to the requirements of different cleaning module shapes and cleaning trajectories.

[0120] In some embodiments, the placement slot 120 is an arc-shaped slot that matches the structure of the cleaning module.

[0121] It is understandable that the contour of the arc-shaped groove is adapted to the shape of the cleaning module so that after the cleaning module returns to the base station base 100, the cleaning component 22 can achieve relatively stable positioning and fit along the arc surface. In this way, during the rotation or movement of the cleaning component 22 within the placement groove 120, the cleaning component can maintain continuous or intermittent contact with the groove wall, making it easier for attached dirt to be peeled off and collected under the guidance of the curved surface.

[0122] For example, the arc groove can be a semi-circular arc groove, a circular arc segment groove, or a composite curvature arc groove.

[0123] There are multiple flushing ports 121, which are spaced apart on one side of the first tank sidewall 124 adjacent to the bottom wall of the tank.

[0124] Multiple rinsing ports 121 form a distributed water inlet structure, allowing the liquid entering the placement tank 120 to form multi-point replenishment and zoned spraying near the bottom of the tank, thereby increasing the rinsing area of ​​the rinsing ports 121 and reducing the rinsing blind spots caused by single-point liquid supply. Furthermore, since the rinsing ports 121 are located near the bottom wall of the tank, it helps to prevent the cleaning liquid from being sprayed onto the cleaning module in the raised state.

[0125] In this embodiment, the rinsing ports 121 can be arranged at equal intervals along the length of the first tank sidewall 124, or they can be configured at non-equal intervals according to the distribution of dirt in different parts of the cleaning module, so that liquid diffusion can be formed in the area near the bottom wall of the tank.

[0126] The flushing port 121 can be structurally a circular nozzle, a flat nozzle slit, a micro-hole array, or a multi-channel diversion port. The spacing between multiple flushing ports 121 can be determined by combining the length of the arc-shaped groove and the coverage width, so that adjacent jets can overlap and cover each other within the groove, without creating obvious blank areas.

[0127] In summary, this embodiment, through the design of the arc-shaped groove, allows the cleaning component 22 to maintain a relatively stable contact with the local groove wall during its movement within the groove, making it easier for dirt to detach under the guidance of the arc surface and the action of the liquid flow. The multiple rinsing ports 121 allow cleaning liquid to be sprayed from different positions on the side wall 124 of the first groove, enabling the cleaning liquid to diffuse along the curved inner wall of the arc-shaped groove. This improves the rinsing coverage of the cleaning liquid, allowing for more thorough removal of dirt and mud from the surface of the placement groove 120, thereby providing a better cleaning effect for the placement groove 120.

[0128] Meanwhile, multiple rinsing ports 121 are located near the bottom wall of the tank, which makes it easier for the cleaning fluid to diffuse to the lower part of the tank and the lower edge of the cleaning component 22. It also helps to prevent the cleaning fluid sprayed from the rinsing ports 121 from splashing upwards, so that the dirty liquid after rinsing can be collected along the bottom of the tank and discharged in time by the sewage suction port 122.

[0129] Please see Figure 5 In some embodiments, the wall of the placement slot 120 has a boss 123, which is configured to support at least part of the drive components in the cleaning module and blocks the side of the suction port 122 facing the opening of the placement slot.

[0130] The boss 123 is a partial protrusion structure within the placement slot 120. The drive component can be a power component and its transmission-related components used to drive the cleaning component 22 in the cleaning module, such as a motor, reduction mechanism, drive shaft, linkage bracket, or transmission wheel connected to the drive end of the cleaning component 22.

[0131] When the cleaning module returns to the base station base 100 and falls into the placement slot 120, the boss 123 can provide a support point or support surface for the drive components, and provide support, positioning and attitude constraint for the bottom of at least part of the drive components in the cleaning module. The cleaning module is less likely to tilt or sink locally during the suction and rinsing process, which helps to ensure the attitude stability of the cleaning module during the cleaning and sewage discharge process.

[0132] Since the boss 123 is arranged on the side of the sludge extraction port 122 facing the groove of the placement groove 120, the boss 123 can form a partial shield in the communication direction between the sludge extraction port 122 and the groove, preventing large particles of impurities on the cleaning component 22 from falling into the sludge extraction port 122.

[0133] Meanwhile, a partial cavity can be formed between the lower end face of the boss 123 and the bottom wall of the placement tank 120. Wastewater can enter this partial cavity through the suction port 122 and then be discharged from the placement tank 120 through the same cavity. In this way, the partial cavity acts as a buffer for wastewater discharge, helping to prevent direct backflow or splashing of wastewater near the suction port 122, reducing the probability of wastewater leakage in the tank opening direction, and facilitating rapid wastewater discharge.

[0134] For example, the boss 123 can be a strip-shaped boss 123, a block-shaped boss 123, or a stepped boss 123. The boss 123 can be integrally formed with the tank wall, or it can be set on the tank wall by means of snap-fit, screw-fit, welding, or bonding, so as to adapt to the structural height and drive component arrangement of different cleaning modules.

[0135] In some embodiments, the boss 123 and a portion of the wall of the placement groove 120 together define a receiving cavity for accommodating at least a portion of the drive assembly, and the receiving cavity communicates with the drain port 122 through a portion of the placement groove 120.

[0136] The receiving cavity is formed by the boss 123 and part of the groove wall of the placement groove 120. The boss 123 can serve as a support structure protruding upwards or inwards, and part of the groove wall cooperates with the boss 123 to form a local envelope boundary for the drive component. The platform of the boss 123 can be higher than the bottom wall of the placement groove 120, so that the boss 123 protrudes from the bottom wall of the placement groove 120, forming a receiving platform for placing the drive component.

[0137] When the cleaning module is placed in the placement slot 120, the accommodating cavity can support and protect at least part of the drive components, which helps to avoid interference between the drive components and the surrounding slot walls during positioning or cleaning, and reduces rigid collisions between the drive components and the base station base 100.

[0138] Since the receiving cavity is connected to the sewage outlet 122 through the placement groove 120, when liquid overflows or drips into the receiving cavity, the liquid can flow along the placement groove 120 to the sewage outlet 122 and be drawn away, making it less likely for water to accumulate in the area where the boss 123 is located during cleaning, thereby reducing the probability of sewage lingering inside the base and helping to improve the cleanliness of the placement groove 120.

[0139] Please see Figure 6 In some embodiments, the base station base 100 also includes a drain pipe 140, one end of which is connected to a sludge inlet 122, and the other end of which is configured to be connected to a sludge storage tank in the clean base station 10.

[0140] The drain pipe 140 is a pipeline component that transports the sewage extracted from the suction port 122 to the sewage storage tank. One end of the drain pipe 140 can be connected to the liquid outlet of the suction port 122 by means of plug-in or screw connection, and the other end is connected to the sewage storage tank in the cleaning base station 10, so that the sewage enters the sewage storage tank along the drain pipe 140 under negative pressure suction or gravity, thereby preventing the sewage from stagnating or flowing back in the placement tank 120.

[0141] The sewage pipe 140 can be arranged below or to the side of the support platform 110 to minimize the flow path of sewage and reduce turning resistance, while avoiding interference with the cleaning equipment 20 on the upper side of the support platform 110.

[0142] Please see Figure 4 In some embodiments, the carrying platform 110 also has a sludge tank 150 with a drain outlet 151. The sludge tank 150 is configured to connect with the sewage storage tank in the cleaning equipment 20 to receive sewage from the sewage storage tank.

[0143] The wastewater storage tank is the container for storing wastewater in the cleaning equipment 20. The wastewater receiving tank 150 can be set on the bearing surface 111 of the bearing platform 110 and located near the docking position of the wastewater storage tank of the cleaning equipment 20, so that after the cleaning equipment 20 enters the base station, the wastewater storage tank can be docked in the wastewater receiving tank 150.

[0144] Wastewater in the wastewater storage tank enters the wastewater receiving tank 150 under its own weight, suction, or pumping. The drain outlet 151 in the wastewater receiving tank 150 can be connected to the outlet of the wastewater storage tank, allowing the wastewater in the storage tank to be directly discharged through the drain outlet 151. Alternatively, the drain outlet 151 in the wastewater receiving tank 150 and the outlet of the wastewater storage tank can be disconnected; in this case, the wastewater in the storage tank first flows through the outlet into the wastewater receiving tank 150, and then flows through the drain outlet 151 out of the base station base 100.

[0145] The sludge receiving tank 150 can be a groove-type, trough-type, or box-type structure, or it can be integrally formed with the supporting platform 110 as a flow guiding cavity. The shape of the sludge receiving tank 150 can be adapted to the shape of the sewage storage tank so that the sewage storage tank can be stably placed in the sludge receiving tank 150.

[0146] The base station base 100 also includes a connecting member 160, one end of which is connected to the drain outlet 151, and the other end of which is connected to the drain pipe 140.

[0147] The connecting member 160 serves as a transitional connection between the sludge receiving tank 150 and the sewage discharge pipe 140. The connecting member 160 is installed between the sludge receiving tank 150 and the sewage discharge pipe 140, so that the sewage discharged from the sludge receiving tank 150 and the sewage discharged from the placement tank 120 can converge and then flow together into the sludge storage tank in the cleaning base station 10, or be discharged together into the sewer pipe.

[0148] For example, the connecting member 160 can be a branch pipe of the sewage pipe 140. The connecting member 160 and the sewage pipe 140 can be connected by an adapter or a transition pipe, or the connecting member 160 and the sewage pipe 140 can be an integral pipe structure.

[0149] Secondly, this application provides a cleaning base station 10, which includes a liquid storage tank, a sludge storage tank, and a base station base 100 as described in any of the above embodiments.

[0150] The liquid storage tank contains liquid that can clean the placement slot 120 on the base station 10 base 100.

[0151] The flushing port 121 in the base station base 100 is configured to communicate with the liquid storage tank, and the sludge suction port 122 in the base station base 100 is configured to communicate with the sludge storage tank.

[0152] The liquid storage tank can store the liquid used to clean the placement tank 120. The liquid in the storage tank can be clean water or a cleaning solution containing detergent. The liquid promotes the removal of dirt adhering to the inner wall, bottom and surface of the cleaning parts 22 of the placement tank 120 through rinsing, wetting, dilution and dirt-carrying action, and the dirt is then recycled into the waste storage tank through the drainage path.

[0153] The liquid storage tank can be connected to the flushing port 121 via a hose, rigid pipe, quick-connect interface or valve-controlled interface, so that liquid can be delivered to the placement tank 120 when it is necessary to flush the placement tank 120.

[0154] The wastewater storage tank is a container for storing wastewater in the cleaning base station 10, and can recover the liquid carrying dirt after rinsing from the base station base 100. The wastewater storage tank and the wastewater suction port 122 can be connected through a suction pipe, a flow guide channel or a valve control channel, so that when the base station base 100 needs to be drained, the wastewater can be pumped from the wastewater suction port 122 to the wastewater storage tank for temporary storage.

[0155] The cleaning base station 10 provided in this application embodiment, through the setting of a liquid storage tank and a sludge storage tank, enables the cleaning base station 10 to store the liquid used for cleaning and the discharged sewage, thereby making the cleaning base station 10 suitable for application scenarios where automatic water intake and drainage are inconvenient.

[0156] Meanwhile, since the clean base station 10 provided in this application includes the base station base 100 in any of the above embodiments, the liquid can rinse the placement tank 120 and carry the dirt in the placement tank 120 away to the sewage outlet 122, thereby enabling the placement tank 120 to self-clean and improving the self-cleaning capability of the clean base station 10, reducing the frequency of manual disassembly and cleaning of the clean base station 10 by users.

[0157] In some embodiments, the cleaning base station 10 further includes a first driving device, and the sewage suction port 122 is connected to the sewage storage tank through the first driving device.

[0158] The first drive unit is configured to draw liquid from the placement tank 120 and drive the liquid to flow into the sludge storage tank.

[0159] The second drive device can be installed on the pipeline between the sludge extraction port 122 and the sludge storage tank. The first drive device is a fluid drive mechanism that creates negative pressure or conveying pressure between the sludge extraction port 122 and the sludge storage tank, which can promptly extract and transport the liquid, sewage or residual cleaning liquid collected in the placement tank 120 after rinsing to the sludge storage tank.

[0160] For example, the first driving device can be a pump body mechanism such as a micro water pump, centrifugal pump, or vacuum suction pump.

[0161] The first drive device can be installed near the sludge storage tank or in the pipeline downstream of the sludge suction port 122 to shorten the effective path from the end of the drain to the sludge storage tank. It can also work in conjunction with the sludge suction port 122 through a check valve, filter element or anti-backflow structure to prevent liquid from flowing back into the sludge storage tank after shutdown.

[0162] In some embodiments, the cleaning base station 10 further includes a second driving device, and the rinsing port 121 is connected to the liquid storage tank through the second driving device.

[0163] The second drive unit is configured to drive the liquid in the storage tank to the flushing port 121.

[0164] The second drive device can be installed on the pipeline between the liquid storage tank and the rinsing port 121. The first drive device is a liquid drive mechanism that provides conveying power between the liquid storage tank and the rinsing port 121, and can stably convey the liquid stored in the liquid storage tank to the rinsing port 121 corresponding to the placement tank 120, so as to deliver rinsing liquid to the rinsing port 121 when the placement tank 120 needs to be cleaned.

[0165] For example, the second drive unit can be a pump body mechanism such as a micro water pump, centrifugal pump, or vacuum suction pump.

[0166] The second drive device can be installed on the side wall of the liquid storage tank, the base station base 100, or the middle of the liquid supply pipeline by screws, clips, brackets, or vibration damping seats. Its inlet is connected to the outlet at the bottom or side of the liquid storage tank, and the outlet is connected to the flushing port 121 through a hose or rigid pipe.

[0167] Thirdly, please refer to Figure 1 The cleaning system 1 provided in this application embodiment may include cleaning equipment 20 and base station base 100 or cleaning base station 10 in any of the above embodiments.

[0168] The cleaning device 20 includes a main unit 21 and a cleaning module. The cleaning module is located at the bottom of the main unit 21 and includes a cleaning component 22.

[0169] The cleaning device 20 is a main unit that can move on the surface to be cleaned and perform cleaning operations. The main unit 21 can internally carry a walking drive unit, drive components, and a cleaning module. By supporting and controlling the cleaning module, the main unit 21 enables the cleaning component 22 to switch between working state and base station return state, meeting different requirements for cleaning and self-cleaning.

[0170] Please see Figure 2 The cleaning module may include a cleaning component 22 and a drive mechanism and support structure that cooperate with the cleaning component 22. The cleaning component 22 is the working part of the cleaning module that directly contacts the surface to be cleaned, and can perform actions such as wiping, brushing, and scraping to complete the treatment of stains, hair and sewage on the ground.

[0171] The placement slot 120 in the base station base 100 or the cleaning base station 10 is used to place the cleaning module; the cleaning component 22 can be rotated and raised / lowered relative to the placement slot 120. The cleaning component 22 can be driven to rotate and rise / lower by a single drive mechanism, or it can be driven to rotate and rise / lower by two drive mechanisms respectively.

[0172] In the example row, the drive mechanism can be a lifting drive mechanism or a rotating drive mechanism. The drive mechanism may include a telescopic motor or a rotating motor, and controls the rotation and lifting of the cleaning component 22 through a gear transmission structure, a gear and rack transmission mechanism or a shaft transmission mechanism.

[0173] When the cleaning module is placed in the placement slot 120, at least a portion of the slot wall of the placement slot 120 is in contact with the cleaning component 22, and during the rotation of the cleaning component 22 relative to the host 21, the cleaning component 22 is configured to interfere with at least a portion of the slot wall of the placement slot 120.

[0174] After the cleaning device 20 returns to the base station base 100 or the cleaning base station 10, the host 21 carries the cleaning module into the placement slot 120. Under the action of the drive mechanism, the cleaning component 22 can descend and be placed in the placement slot 120, so that at least part of the slot wall and the cleaning component 22 form a close contact. The cleaning component 22 can rotate under the action of the drive mechanism, and during the rotation, it continuously interferes with the slot wall, causing the dirt originally attached to the surface of the slot wall 120 to be scraped, squeezed, and removed by the cleaning component 22.

[0175] Subsequently, the liquid in the storage tank can be transported to the rinsing port 121 under the driving action of the second driving device, and the dirt on the surface of the placement tank 120 is rinsed and the dirt is removed. Then, it is discharged to the sludge storage tank through the sludge suction port 122.

[0176] Therefore, the cleaning system 1 provided in this embodiment can achieve self-cleaning of the placement slot 120 through the base station base 100, and improve the self-cleaning capability of the cleaning base station 10, reduce the frequency of manual disassembly and cleaning of the cleaning base station 10 by the user, and improve the user experience.

[0177] In some embodiments, the cleaning device 20 also includes a scraper, a clean water tank, a clean water strip, and a wastewater storage tank, the clean water tank being configured to store liquid.

[0178] The water strip is configured to communicate with the water tank, and the outlet of the water strip faces the cleaning component 22.

[0179] The smear strip is configured to interfere with the cleaning part 22 to scrape off dirt from the cleaning part 22 and direct the dirt into the wastewater storage tank.

[0180] The clean water tank is a liquid storage component for storing cleaning fluid, which can provide clean water and cleaning fluid to the cleaning unit 22. The clean water tank can be installed inside the main unit 21 and connected to the clean water strip through a pump body, valve body, hose or rigid pipeline to realize the liquid delivery and start / stop control.

[0181] The water strip is a liquid supply component connected to the water tank, which can directionally deliver liquid to the surface of the cleaning component 22. The outlet of the water strip faces the cleaning component 22 so that the liquid can directly act on the cleaning surface of the cleaning component 22 to complete the functions of wetting, rinsing or assisting in the removal of dirt.

[0182] The water strip can be a strip-shaped structure with a flow guiding structure. For example, the water strip can be a strip-shaped tube, a flat liquid guiding groove, or a spray strip with channels, or it can be a seepage strip with a built-in capillary structure so that the water strip can guide the liquid in the water tank to the cleaning component 22.

[0183] The water strip can be installed on the main unit 21 housing of the cleaning equipment 20, and can be connected to the main unit 21 housing by snap-fit, screw fixing, welding or integral injection molding.

[0184] The scraping strip, through its interference fit with the cleaning component 22, allows it to directly abut against the outer periphery of the cleaning component 22. As the cleaning component 22 moves relative to the scraping strip, it scrapes away stains, hair, and other debris from the cleaning component 22, helping to prevent debris from tangling and affecting the cleaning effect, thus improving the cleanliness of the cleaning component 22 during the cleaning process and increasing the cleaning efficiency of the cleaning component 22.

[0185] The wastewater storage tank is a container used to temporarily store wastewater after scraping. The main unit 21 can be equipped with a suction pump inside the wastewater storage tank. The main unit 21 has a suction port on the side facing the surface to be cleaned, and the suction port is connected to the wastewater storage tank. Under the action of the suction pump, a negative pressure is formed inside the wastewater storage tank, creating suction at the suction port, thereby allowing the wastewater on the cleaning component 22 to be sucked into the wastewater storage tank. The suction pump can be a miniature centrifugal pump, a diaphragm pump, or a gas-liquid mixing pump.

[0186] When the cleaning module of the cleaning device 20 performs self-cleaning, the liquid in the clean water tank can enter the clean water strip through the connecting pipe under the action of the pump or gravity, and be released from the outlet of the clean water strip toward the cleaning component 22. The liquid can form a continuous or intermittent wetting flow on the surface of the cleaning component 22, which can soften and disperse dirt such as mud stains, dust and adhesive particles attached to the cleaning component 22.

[0187] Because the scraping strip and the cleaning component 22 are interference-fitted, the scraping strip can squeeze, scrape off, and wipe away the wet dirt on the surface of the cleaning component 22. The scraped dirt is guided to the wastewater storage tank of the cleaning equipment 20, realizing the separation of wastewater from the cleaning component 22 and preventing wastewater from flowing back to the surface to be cleaned.

[0188] At the same time, the water strip continuously replenishes the liquid, allowing the scraping action to continue, thereby gradually cleaning the cleaning component 22 and achieving self-cleaning of the cleaning module.

[0189] Of course, during the cleaning process, the water strip and the shaving strip can also be applied to the cleaning component 22 at the same time, which helps to remove dirt from the cleaning component 22 in time and wet the cleaning component 22, thereby improving the cleaning effect of the cleaning component 22 on the cleaning surface.

[0190] The wastewater storage box separates the scraped-off liquid from the solid waste, preventing it from flowing back onto the surface of the cleaning component 22 or spreading secondary within the base station.

[0191] Fourthly, this application embodiment also provides a self-cleaning method for a base station base 100, which is applied to the aforementioned cleaning system 1.

[0192] The specific structure of the cleaning system 1 has been detailed in the previous section and will not be described in detail again here. The cleaning system 1 includes a cleaning device 20 and a cleaning base. The cleaning device 20 includes a main unit 21 and a cleaning module. The cleaning module is located at the bottom of the main unit 21 and includes a cleaning component 22.

[0193] The base station base 100 has a placement slot 120, in which the cleaning module is placed and in contact with at least a portion of the slot wall. The cleaning component 22 is rotatable and height-adjustable relative to the placement slot 120. The placement slot 120 has a rinsing port 121 and a suction port 122, which are arranged opposite each other along the length of the placement slot 120. The rinsing port 121 is configured to be connected to a water source.

[0194] It should be noted that in this embodiment of the application, the main body executing the self-cleaning method of the base station base 100 is the cleaning system 1. The cleaning system 1 controls the base station and cleaning equipment to perform relevant actions through controllers, computers, etc. The method is described in detail below.

[0195] Please see Figure 7 The self-cleaning method for the base station base 100 provided in this application embodiment includes the following steps:

[0196] Step S100: Triggered by the cleaning command from the base station base 100, the cleaning device 20 first performs a first action and then performs a second action; wherein, the first action is to drive the cleaning component 22 to rotate in the placement slot 120 for a first preset time; the second action is to drive the cleaning component 22 to lift so that the surface of the cleaning component 22 is detached from the slot wall of the placement slot 120.

[0197] The cleaning command for the base station base 100 can be input by a button set on the cleaning base or the housing of the host 21, or it can be generated by the voice recognition module after receiving the user's voice, or it can be automatically issued by the control program when the cleaning module reaches the preset conditions.

[0198] Cleaning component 22 is a part of the cleaning module that comes into direct contact with the ground, and can be a roller cloth, a conveyor belt cloth, or other movable cleaning body.

[0199] The first action can be the rotation of the cleaning component 22 relative to the placement tank 120. The first action can cause continuous relative movement between the cleaning component 22 and at least part of the tank wall of the placement tank 120, so as to create a scraping, pulling and loosening effect on the tank wall and bottom of the placement tank 120.

[0200] When the cleaning component 22 is a roller, the first action can be manifested as the roller continuously rotating around its own axis, while the outer circumference of the roller interferes with and contacts the arc-shaped groove wall of the placement groove 120. When the cleaning component 22 is a tracked cleaning belt, the first action can be manifested as the cleaning belt circulating along a circular path, and forming sliding friction with the inner wall of the placement groove 120 during operation.

[0201] The first preset time is the time for the cleaning component 22 to perform the first action, ensuring that the cleaning component 22 can complete a sufficient number of relative motion cycles within the placement groove 120, thereby thoroughly cleaning the groove wall of the placement groove 120.

[0202] The second action can lift the cleaning component 22 through the drive structure, so that the surface of the cleaning component 22 is at least out of contact with the wall of the placement tank 120, so that the rinsing water can cover the area of ​​the cleaning component 22 that was originally covered by the tank wall and the corresponding surface of the tank wall, so that the water flow input from the rinsing port 121 can flow from the rinsing port 121 side to the sewage suction port 122 side, and pass through the gap area between the cleaning component 22 and the tank wall.

[0203] Step S200: Perform the cleaning action of the placement tank 120. The cleaning action of the placement tank 120 includes controlling the rinsing port 121 to rinse the placement tank 120 for a second preset time, and discharging the sewage in the placement tank 120 through the sewage suction port 122.

[0204] After the second action is completed and it is confirmed that the cleaning component 22 has detached from the tank wall, the cleaning system delivers the liquid from the storage tank to the rinsing port 121. If the base station is equipped with an independent external water source interface, the rinsing port 121 can also be directly connected to the external water supply system through a pipeline.

[0205] During the cleaning operation of the placement tank 120, clean water or cleaning fluid enters the placement tank 120 through the rinsing port 121 and propagates along the length of the tank. As it passes through the gap between the cleaning component 22 and the tank wall, the bottom guide surface, and the side wall transition surface, it carries away the dirt, residual cleaning fluid, hair, and particulate matter loosened by the first operation, forming wastewater. The wastewater flows directionally from the rinsing port 121 towards the sewage suction port 122 within the placement tank 120, and is then discharged through the sewage suction port 122 to the base station's sewage storage tank, or directly into the external drainage pipe.

[0206] It is understandable that the second preset time can be adjusted according to the degree of dirtiness of the placement tank 120, the duration of the first action, the water supply flow rate, and the sewage discharge efficiency.

[0207] In this embodiment, after being triggered by a cleaning command from the base station base 100, the cleaning component 22 is first driven to rotate within the placement tank 120 for a first preset time. Then, the cleaning component 22 is driven to lift and detach from the tank wall of the placement tank 120. Subsequently, the rinsing port 121 is controlled to rinse the placement tank 120 within a second preset time and discharge wastewater through the sewage extraction port 122, forming a continuous self-cleaning process. During the above process, the relative movement between the cleaning component 22 and the placement tank 120 during contact can loosen the dirt within the placement tank 120. Subsequently, by lifting, the cleaning component 22 avoids the flow channel of the placement tank 120, and a wastewater discharge path is formed through the rinsing port 121 and the sewage extraction port 122, allowing the liquid to effectively rinse all areas within the placement tank 120, thereby cleaning the placement tank 120, reducing wastewater residue and the probability of dirt re-attachment, and thus improving the self-cleaning capability and low-maintenance performance of the cleaning system 1.

[0208] In some embodiments, the cleaning device 20 further includes a scraper, a clean water tank, a clean water component, and a wastewater storage tank, the clean water tank being configured to store liquid.

[0209] In performing the first action, the self-cleaning method also includes the following steps:

[0210] The cleaning equipment performs a self-cleaning action on the cleaning component. The self-cleaning action includes spraying liquid from the clean water tank onto the cleaning component 22 through the clean water component, and scraping the dirt off the cleaning component 22 by interference fit with the scraper strip, and directing the dirt into the wastewater storage tank.

[0211] The clean water tank can be installed inside the main unit 21 or the base station base 100 to store clean water or cleaning solution, and is connected to the clean water component through a pipeline. The clean water component is a liquid outlet component connected to the clean water tank, with its outlet facing the cleaning component 22. After being sprayed by the liquid, it can cover the surface of the cleaning component 22.

[0212] The scraping strip can be an elastic blade or a flexible scraping edge, which forms an interference fit with the cleaning component 22 to scrape off dirt adhering to the surface when the cleaning component 22 rotates. The dirt scraped off below the scraping strip can be pumped into a wastewater storage tank by a sewage pump.

[0213] During the self-cleaning action of the cleaning component, the cleaning component 22 is in a rotating state. The water component first sprays liquid onto its surface, causing the stains attached to the cleaning component 22 to be wetted and softened.

[0214] Subsequently, due to the interference fit between the scraper and the cleaning component 22, the cleaning component 22 remains in close contact with the scraper during relative motion. Through mechanical scraping, softened stains and loose impurities on the surface of the cleaning component 22 are continuously peeled off and removed, thereby improving the cleanliness of the cleaning component 22 itself, reducing residual dirt on the surface of the cleaning component 22, and reducing the possibility of secondary contamination and secondary dirt accumulation in the placement tank 120.

[0215] The scraper removes solid dirt and mixed stains, which can then be directed to the wastewater storage tank for centralized collection and storage. This helps prevent loose dirt from scattering and remaining in the placement tank 120 after scraping.

[0216] Therefore, through the above steps, this embodiment can simultaneously clean the cleaning component 22 itself while loosening the dirt in the placement tank 120, effectively reducing secondary pollution caused by dirt carried by the cleaning component 22, thereby improving the self-cleaning effect of the cleaning component 22 and the placement tank 120.

[0217] In some embodiments, prior to performing the first action, the self-cleaning method further includes the following steps:

[0218] Before the cleaning module is placed in the placement tank 120, a liquid injection action is performed in the placement tank 120, and then the cleaning device 20 performs a third action. The liquid injection action includes injecting liquid into the placement tank 120 through the rinsing port 121 for a third preset time, and then the cleaning device 20 performs the third action. The third action is to drive the cleaning component 22 to descend a preset height so that part of the cleaning component 22 is immersed in the liquid in the placement tank 120 for a fourth preset time.

[0219] Specifically, before the cleaning module is placed in the placement tank 120, cleaning liquid is continuously injected into the cavity of the placement tank 120 through the rinsing port 121, and the water injection operation is maintained for a third preset time to ensure that the low-lying areas, corners and contact areas of the placement tank 120 can accumulate sufficient cleaning liquid. This allows the dried dirt, deposited impurities, oil deposits and other residues that remain and adhere to the inner wall of the placement tank 120 during the previous equipment operation to fully come into contact with the cleaning liquid, gradually wetting, swelling and softening them, thus weakening the adhesion between stubborn dirt and the tank wall.

[0220] After the third preset time for filling the tank with water is completed, a certain volume of liquid is stored in the placement tank 120. The cleaning device 20 then performs the preset third action, actively driving the cleaning component 22 at the bottom to descend a preset height, so that at least part of the structure of the cleaning component 22 is immersed in the accumulated liquid in the placement tank 120, and maintains the soaking state for a fourth preset time.

[0221] This operation step allows the working part of the cleaning component 22 to be immersed in the cleaning liquid, effectively softening stubborn dirt adhering to the surface and crevices of the cleaning component 22, reducing the adhesion strength between the dirt and the substrate of the cleaning component 22, reducing the probability of high-intensity adhesive stains remaining, and reducing the operating resistance and cleaning load for the subsequent first action of disturbing the cleaning component 22, mechanical scraping and tank rinsing.

[0222] The third preset time is required to ensure the liquid level reaches the set height, and the fourth preset time is used to ensure that the dirt attached to the cleaning component 22 is soaked and softened. The third and fourth preset times can be determined according to the operational requirements, and this embodiment does not impose specific limitations on them.

[0223] Through the above steps, this embodiment allows the placement tank 120 to be pre-wetted and the cleaning component 22 to be pre-soaked, achieving simultaneous softening of dirt in the placement tank 120 and dirt on the surface of the cleaning component 22. This reduces the adhesion strength between dirt and the cleaning component 22, as well as the adhesion strength between dirt and the placement tank 120, which helps improve the effectiveness of subsequent mechanical scraping and water rinsing operations. It also reduces the occurrence of stubborn dirt residue and incomplete local cleaning during the cleaning process, thereby further improving the stability of the self-cleaning operation of the cleaning system 1 and the overall cleaning effect, and optimizing the automated operation and maintenance performance of the equipment and the user experience.

[0224] In some embodiments, the water flow velocity at the rinsing port 121 during the cleaning action is greater than the water flow velocity at the suction port 122 during the liquid injection action.

[0225] During the pre-soaking and pretreatment liquid injection stage, the equipment controls the flushing port 121 to continuously input cleaning liquid at a relatively low water flow rate, while the sludge suction port 122 operates at a lower suction speed or maintains an intermittent suction state, so that the inflow rate in the placement tank 120 is greater than the outflow rate.

[0226] For example, during the injection phase, the flushing port 121 is kept in a state of continuous low-flow water intake, and the sludge suction port 122 adopts an intermittent start-stop suction mode, which is only opened for short periods of time at fixed intervals and closed for the rest of the time, or the outflow rate of the sludge suction port 122 is always less than the inflow rate of the flushing port 121, so that the inflow rate of the placement tank 120 is greater than the outflow rate.

[0227] Based on the difference in liquid flow rate between the rinsing port 121 and the suction port 122, the liquid continuously injected through the rinsing port 121 can gradually accumulate in the placement tank 120, thereby realizing the water storage function of the placement tank 120. This allows the tank to quickly form a liquid storage environment that meets the soaking requirements, enabling the stubborn dirt on the surface of the cleaning component 22 and the tank wall of the placement tank 120 to be fully and evenly soaked and softened, which is suitable for the operation requirements of slow and stable liquid storage and long-term soaking and softening in the pretreatment stage.

[0228] After completing the soaking pretreatment and entering the subsequent cleaning action stage of rinsing in the placement tank 120, the cleaning system 1 controls the liquid flow rate of the rinsing port 121 and the sewage suction port 122, adjusting the rinsing port 121 to a relatively higher water flow rate, and at the same time adapting to increase the suction water flow rate of the sewage suction port 122, so that the overall sewage discharge efficiency matches the liquid inlet condition of high-speed rinsing.

[0229] The high-speed flushing water flow can generate a strong fluid shearing impact force, which can effectively peel off and flush away stubborn dirt, fine impurities and residual sediments that have been softened by soaking on the inner wall, corners and crevices and low-lying areas of the placement tank 120, solving the problem of insufficient flushing force of low-speed water flow and difficulty in completely removing residual dirt.

[0230] At the same time, relying on the synchronous high-speed suction of the sludge extraction port 122, the sewage mixed with dirt in the tank can be quickly discharged in an instant, avoiding the impurities washed off from settling and adhering to the surface of the tank again, achieving a dynamic cleaning effect of rinsing and discharging at the same time, and adapting to the operational needs of efficient dirt removal and rapid dirt discharge in the cleaning stage.

[0231] Therefore, in this embodiment, the water storage and soaking operation of the tank is stably completed by the difference in flow rate between the inlet and outlet during the liquid injection stage. The cleaning operation of the placement tank 120 is completed by relying on the flow rate configuration of high-speed flushing and high-speed sewage discharge during the cleaning stage. This makes the liquid flow rate of the flushing port 121 and the sewage suction port 122 match the functional requirements of the self-cleaning stage, and further improves the stability of the self-cleaning process in the cleaning system 1.

[0232] In some embodiments, before performing the first action and after performing the third action, the self-cleaning method further includes the step of the cleaning device 20 performing a fourth action.

[0233] The fourth action involves first lifting the cleaning component 22 and then performing the self-cleaning action again for a fifth preset time. In other words, the cleaning system drives the cleaning component 22 to rotate for the fifth preset time, spraying liquid from the clean water tank onto the cleaning component 22 via the clean water component. The cleaning strip, in an interference fit with the cleaning component 22, scrapes away dirt from the cleaning component 22 and directs the dirt into the wastewater storage tank.

[0234] Specifically, after the cleaning device 20 enters the fourth action, the lifting mechanism first drives the cleaning component 22 to rise, so that the cleaning component 22 is removed from the low-position contact area of ​​the placement slot 120, and the self-cleaning of the cleaning component 22 is completed first.

[0235] During the dynamic rotation of the cleaning component 22, the water supply component and water tank are synchronized to complete the liquid supply operation. The cleaning liquid stored in the water tank is evenly sprayed by the water supply component to cover the entire working surface of the cleaning component 22. The residual dirt that still adheres to the surface of the cleaning component 22 after soaking and softening is further wetted and rinsed, which further reduces the binding force between loose dirt and the cleaning component 22.

[0236] At the same time, relying on the interference fit structure between the squeegee and the cleaning component 22, a continuous squeegee action is formed during the continuous rotation of the cleaning component 22, which can stably peel off stubborn stains, residual dirt and embedded impurities on the surface of the cleaning component 22 after soaking and spraying softening, thereby improving the cleaning thoroughness of the cleaning component 22 itself.

[0237] While the scraper strip completes the scraping operation, the scraped solid dirt and liquid mixture can be directionally collected into the sewage storage tank along a fixed guide path, realizing the closed centralized collection of dirt. This helps to prevent the dirt after stripping from being randomly scattered and lingering inside the placement tank 120, reducing the problem of secondary dirt accumulation in the placement tank 120 from the source of the operation.

[0238] Therefore, through the above steps, the cleaning component 22 can perform self-cleaning before cleaning the placement tank 120, thereby reducing the probability of residual dirt on the cleaning component 22 participating in the subsequent cleaning operation of the placement tank 120, and reducing the accumulation of dirt in the placement tank 120, thereby improving the overall efficiency and cleanliness uniformity of the self-cleaning process of the cleaning system 1.

[0239] In some embodiments, the cleaning system 1 further includes a sludge storage tank, which is installed on the base station base 100.

[0240] After performing the fourth action and before performing the first action, the self-cleaning method also includes the following steps:

[0241] Wastewater is extracted from the placement tank 120 through the sludge extraction port 122 so that it can be stored in the sludge storage tank.

[0242] In actual operation, after the cleaning module completes the fourth action, sewage, mud and small dirt formed during the cleaning process may remain in the placement tank 120. At this time, the base station base 100 sucks the liquid in the placement tank 120 through the sewage suction port 122 and puts the extracted sewage into the sewage storage tank for temporary storage.

[0243] Through the above steps, the wastewater in the placement tank 120 can be promptly extracted and centrally stored after the fourth action, clearing the turbid liquid and free impurities generated during the pretreatment stage in the placement tank 120. This provides a relatively clean tank environment for the subsequent operation of the cleaning component 22 rotating and disturbing the tank dirt in the first action, reducing wastewater backflow, retention, and secondary pollution, and improving the stability of the cleaning environment when the cleaning component 22 enters the working state.

[0244] In some embodiments, the cleaning device 20 further includes a wastewater storage tank, which is located on the main unit 21.

[0245] The base station base 100 has a dirt collection tank 150, and the dirt collection tank 150 has a drain outlet 151, which is connected to the dirt storage box on the base station base 100.

[0246] The wastewater receiving trough 150 is a wastewater receiving trough installed on the base station base 100, used to receive wastewater discharged from the wastewater storage tank and guide it to the drain outlet 151. The wastewater storage tank is a temporary wastewater storage container located inside the host 21 or at the bottom of the host 21, used to temporarily store wastewater during the cleaning process.

[0247] Before performing the first action, the self-cleaning method also includes the following steps: connecting the sewage storage tank to the sludge receiving tank 150, and discharging the sewage in the sewage storage tank into the sewage storage tank through the sludge receiving tank 150 and the sewage outlet 151.

[0248] Before the first action is performed, the sewage in the sewage storage tank can enter the sludge receiving tank 150 under the action of gravity, and then flow into the sludge storage tank through the sewage outlet 151 to complete the transfer. This reduces the sewage retention in the sewage storage tank before cleaning the placement tank 120, which helps to avoid the problems of odor accumulation and bacterial growth caused by long-term closed retention of sewage, and maintains the cleanliness of the sewage storage tank.

[0249] Meanwhile, the wastewater storage tank, as an independent water storage structure mounted on the main unit 21 of the cleaning equipment 20, can also collect the wastewater generated during the scraping and pretreatment process of the cleaning components 22. Since this part of the water contains clean water discharged from the cleaning components, it has a lower impurity content and is relatively clearer than the final flushing wastewater in the placement tank 120, and has the flushing value for secondary recycling.

[0250] Therefore, the dirty water stored in the sewage storage tank can be drained first, which makes it easier to store relatively cleaner dirty water later.

[0251] The sludge tank 150 serves as a transfer and diversion structure between the sewage temporary storage tank and the base station sludge storage tank. It receives various types of sewage containing impurities for a long time. Small dirt and residual sewage are easily trapped on its surface and in the dead corners of the diversion. Over time, these can easily accumulate and form attached dirt.

[0252] Therefore, in some embodiments, at least during the execution of the first action, the self-cleaning method further includes the following steps: rinsing the sludge-collecting tank 150 with sewage from the sewage storage tank, and discharging the rinsed sewage into the sludge storage tank through the drain outlet 151.

[0253] This embodiment limits the timing of the rinsing operation to at least cover the execution process of the first action. While the cleaning device 20 drives the cleaning component 22 to rotate in the placement tank 120 to loosen the dirt in the tank, the water stored in the sewage storage tank of the host 21 is simultaneously used to continuously rinse the dirt-collecting tank 150 of the base station base 100.

[0254] Compared to simply using clean water for rinsing, using the wastewater collected and retained during the pretreatment stage for secondary circulation rinsing can make full use of the operating water body, reduce the consumption of clean water, improve the water resource utilization efficiency of the equipment, realize the simultaneous operation of main tank pretreatment and sewage structure cleaning, effectively shorten the overall self-cleaning time, and improve the overall efficiency of equipment self-cleaning operation.

[0255] During the actual operation, the water output from the sewage storage tank continuously flushes the walls, guide surfaces, and low-lying areas of the sewage receiving tank 150. This flushes and removes suspended impurities, thin scale, and dried water stains that remain or adhere to the inside of the sewage receiving tank 150 after the previous sewage discharge operation, reducing the fixed-point deposition and solidification of dirt within the structure of the sewage receiving tank 150.

[0256] After rinsing, the mixed wastewater can quickly converge to the drain outlet 151 along the pre-set flow guide structure of the wastewater receiving tank 150, and then be transported to the wastewater storage tank through the connection between the drain outlet 151 and the wastewater storage tank for centralized collection. This helps to prevent the wastewater after rinsing from remaining inside the wastewater receiving tank 150 again, ensuring the actual effect of the rinsing operation of the wastewater receiving tank 150.

[0257] The self-cleaning method for the base station base 100 disclosed in the embodiments of this application relies on the cleaning equipment 20 and the base station base 100 to form a self-cleaning process. The specific working process is as follows:

[0258] Before the cleaning module is placed in the placement tank 120, cleaning liquid is continuously injected into the tank through the rinsing port 121 of the placement tank 120 for a third preset time, so that the placement tank 120 is fully filled with liquid.

[0259] After water injection is completed, the cleaning device 20 performs the third action, driving the bottom cleaning component 22 to descend to a preset height, so that part of the structure of the cleaning component 22 is immersed in the liquid in the placement tank 120, and maintains the soaking state for a fourth preset time, thus completing the synchronous soaking and softening treatment of dirt on the inner wall of the placement tank 120 and the surface of the cleaning component 22.

[0260] After the soaking pretreatment is completed, the cleaning equipment 20 performs the fourth action to complete the pre-cleaning operation of the cleaning component 22. The cleaning equipment 20 first drives the cleaning component 22 to lift it, separating it from the contact area between the liquid surface and the tank wall of the placement tank 120, and then drives the cleaning component 22 to rotate continuously for a fifth preset time.

[0261] During the rotation of the cleaning component 22, the water cleaning component sprays the cleaning liquid in the water tank onto the surface of the cleaning component 22. At the same time, the scraping strip mechanically scrapes away the softened dirt on the surface of the cleaning component 22 by means of the interference fit between the scraping strip and the cleaning component 22. The scraped dirt is then guided into the wastewater storage tank of the main unit 21 for temporary storage.

[0262] After the fourth action is completed, the equipment enters the pre-stage tiered sewage discharge phase. The cleaning equipment 20 is aligned with the base station base 100, so that the sewage storage tank of the host 21 is precisely connected with the sewage receiving tank 150 of the base station. The pre-treated sewage and scraping sewage stored in the sewage storage tank can be collected through the sewage receiving tank 150 and then discharged into the sewage storage tank of the base station base 100 through the sewage outlet 151 at the bottom of the sewage receiving tank 150, thus completing the centralized discharge and collection of sewage from the previous operation.

[0263] After the pre-drainage operation is completed, the cleaning equipment 20 starts the first action, driving the cleaning component 22 in the placement tank 120 to rotate continuously for a first preset time. Through the relative movement between the cleaning component 22 and the tank wall of the placement tank 120, the softened dirt inside the tank is disturbed and loosened.

[0264] During the execution of the first action, the sludge receiving tank 150 can be flushed simultaneously. Water from the sewage storage tank is used to flush the tank body, guide surface and corners of the sludge receiving tank 150. The sewage generated during flushing is also discharged into the sewage storage tank through the sewage outlet 151, thus cleaning the sludge receiving tank 150.

[0265] After the first action and the synchronous rinsing process are completed, the cleaning equipment 20 performs the second action, driving the cleaning component 22 to be lifted as a whole, so that the cleaning component 22 is completely separated from the wall of the placement tank 120, opening up the internal space of the placement tank 120.

[0266] Subsequently, the flushing port 121 is controlled to continuously flush the placement tank 120 for a second preset time. At the same time, the sewage and impurities generated in the tank are extracted in real time through the sewage extraction port 122 of the placement tank 120, and the sewage is uniformly transported to the sewage storage tank to complete the flushing and sewage discharge operation of the placement tank 120.

[0267] In summary, the base station base 100 provided in this application embodiment can achieve self-cleaning of the placement slot 120 and the receiving slot, which is beneficial to improving the cleanliness and maintenance capability of the base station base 100 and reducing the frequency of manual maintenance, thereby improving the user experience.

[0268] The embodiments or implementation methods in this application are described in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the embodiments can be referred to each other.

[0269] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0270] In the description of this application, it should be understood that the terms “comprising” and “having” as used herein, and any variations thereof, are intended to cover non-exclusive inclusion, for example, a process, method, display structure, product, or device that includes a series of steps or units is not necessarily limited to those steps or units that are expressly listed, but may include other steps or units that are not expressly listed or that are inherent to such process, method, product, or device.

[0271] The term "and / or" used in this application is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0272] Unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated.

[0273] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A base station base, characterized in that, Includes a support platform (110) having a placement slot (120) configured to hold a cleaning module in a cleaning device (20). When the cleaning module is placed in the placement slot (120), at least a portion of the slot wall is configured to fit against a cleaning component (22) in the cleaning module, and the cleaning component (22) is rotatable and liftable relative to the placement slot (120). The placement trough (120) has a flushing port (121) and a sludge suction port (122). The flushing port (121) and the sludge suction port (122) are arranged opposite each other along the length of the placement trough (120), and the flushing port (121) is configured to be connected to a water source.

2. The base station base according to claim 1, characterized in that, The bearing platform (110) has a bearing surface (111) and a non-bearing surface (112) arranged opposite to each other in the thickness direction, and the bearing surface (111) is provided with the placement groove (120). The base station base (100) also includes a water source connector (130), which is located on the non-load-bearing surface (112). One end of the water source connector (130) is connected to the flushing port (121), and the other end of the water source connector (130) is configured to be connected to the water source.

3. The base station base according to claim 1, characterized in that, The placement groove (120) has a first groove sidewall (124) and a second groove sidewall (125) on one side in the groove length direction. At least part of the flushing port (121) is located on the side wall (124) of the first tank. Along the length of the placement tank (120), the sludge extraction port (122) is located on the side of the bottom wall of the placement tank (120) adjacent to the side wall (125) of the second tank.

4. The base station base according to claim 3, characterized in that, The placement slot (120) is an arc-shaped slot that matches the structure of the cleaning module; The number of flushing ports (121) is multiple, and the multiple flushing ports (121) are spaced apart on the side of the first tank sidewall (124) adjacent to the bottom wall of the tank.

5. The base station base according to claim 3, characterized in that, The placement slot (120) has a boss (123) on its wall. The boss (123) is configured to support at least part of the drive assembly in the cleaning module and the boss (123) blocks the side of the suction port (122) facing the opening of the placement slot (120).

6. The base station base according to claim 5, characterized in that, The boss (123) and a portion of the groove wall of the placement groove (120) together define a receiving cavity, which is used to receive at least a portion of the drive assembly, and the receiving cavity is connected to the sewage outlet (122) through a portion of the placement groove (120).

7. The base station base according to any one of claims 1-6, characterized in that, It also includes a drain pipe (140), one end of which is connected to the sludge inlet (122), and the other end of which is configured to be connected to the sludge storage tank in the cleaning base station (10).

8. The base station base according to claim 7, characterized in that, The carrying platform (110) also has a sludge receiving tank (150), which has a sewage outlet (151). The sludge receiving tank (150) is configured to connect with the sewage storage tank in the cleaning equipment (20) to receive sewage in the sewage storage tank. The base station base (100) also includes a connecting member (160), one end of which is connected to the drain outlet (151), and the other end of which is connected to the drain pipe (140).

9. A clean base station, characterized in that, include: The base station base (100) as described in any one of claims 1-8; A liquid storage tank and a sludge storage tank, wherein the liquid storage tank contains liquid that can clean the placement slot (120) on the base station base (100). The flushing port (121) in the base station base (100) is configured to communicate with the liquid storage tank, and / or the sludge suction port (122) in the base station base (100) is configured to communicate with the sludge storage tank.

10. The clean base station according to claim 9, characterized in that, It also includes a first driving device, and the sludge suction port (122) is connected to the sludge storage tank through the first driving device; The first drive device is configured to extract liquid from the placement tank (120) and drive the liquid to flow to the sludge tank.

11. The clean base station according to claim 9 or 10, characterized in that, It also includes a second drive device, through which the flushing port (121) is connected to the liquid storage tank; The second drive device is configured to drive the liquid in the reservoir to flow toward the flushing port (121).

12. A cleaning system, characterized in that, include: The cleaning device (20) includes a main unit (21) and a cleaning module. The cleaning module is located at the bottom of the main unit (21) and includes a cleaning component (22). The base station base (100) as described in any one of claims 1-8, or the cleaning base station (10) as described in any one of claims 9-11, wherein the placement slot (120) in the base station base (100) or the cleaning base station (10) is used to place the cleaning module; the cleaning component (22) is rotatable and height-adjustable relative to the placement slot (120); When the cleaning module is placed in the placement slot (120), at least a portion of the slot wall of the placement slot (120) is in contact with the cleaning component (22), and during the rotation of the cleaning component (22) relative to the host (21), the cleaning component (22) is configured to interfere with at least a portion of the slot wall of the placement slot (120).

13. The cleaning system according to claim 12, characterized in that, The cleaning equipment (20) also includes a squeegee, a clean water tank, a clean water strip, and a wastewater storage tank, the clean water tank being configured to store liquid; The water strip is configured to communicate with the water tank, and the outlet of the water strip faces the cleaning component (22). The scraper is configured to be interference-fitted with the cleaning element (22) to scrape off dirt from the cleaning element (22) and direct the dirt into the wastewater storage tank.

14. A self-cleaning method for a base station base, characterized in that, The self-cleaning method is applied to a cleaning system (1), which includes a cleaning device (20) and a cleaning base. The cleaning device (20) includes a main unit (21) and a cleaning module. The cleaning module is located at the bottom of the main unit (21) and includes a cleaning component (22). The base station base (100) has a placement slot (120), the cleaning module is placed in the placement slot (120) and contacts at least part of the slot wall of the placement slot (120); the cleaning component (22) can be rotated and raised relative to the placement slot (120); the placement slot (120) has a rinsing port (121) and a sludge suction port (122), the rinsing port (121) and the sludge suction port (122) are arranged opposite to each other along the length of the placement slot (120), and the rinsing port (121) is configured to be connected to a water source; The self-cleaning method includes the following steps: Triggered by the cleaning command of the base station base (100), the cleaning device (20) first performs a first action and then performs a second action; wherein, the first action is to drive the cleaning component (22) to rotate in the placement groove (120) for a first preset time; the second action is to drive the cleaning component (22) to lift so that the surface of the cleaning component (22) is separated from the groove wall of the placement groove (120); Perform a cleaning action on the placement tank (120), the cleaning action includes controlling the flushing port (121) to flush the placement tank (120) for a second preset time, and discharging the sewage in the placement tank (120) through the sewage suction port (122).

15. The self-cleaning method according to claim 14, characterized in that, The cleaning equipment (20) also includes a scraper, a clean water tank, a clean water component, and a wastewater storage tank, the clean water tank being configured to store liquid; In performing the first action, the self-cleaning method further includes the following steps: The cleaning equipment performs a self-cleaning action on the cleaning component (22). The self-cleaning action includes spraying the liquid in the clean water tank onto the cleaning component (22) through the clean water component, and using the scraper strip to press against the cleaning component (22) to scrape off the dirt on the cleaning component (22) and guide the dirt into the wastewater storage tank.

16. The self-cleaning method according to claim 15, characterized in that, Before performing the first action, the self-cleaning method further includes the following steps: Before the cleaning module is placed in the placement tank (120), the liquid injection action of the placement tank (120) is performed first, and then the cleaning device (20) performs the third action; The liquid injection action includes injecting liquid into the placement tank (120) through the flushing port (121) for a third preset time, so that the placement tank (120) is filled with liquid; The third action is to drive the cleaning component (22) to descend a preset height so that a portion of the cleaning component (22) is immersed in the liquid in the placement tank (120) for a fourth preset time.

17. The self-cleaning method according to claim 16, characterized in that, The water flow velocity at the rinsing port (121) during the cleaning action is greater than the water flow velocity at the sludge extraction port (122) during the liquid injection action.

18. The self-cleaning method according to claim 16, characterized in that, Before performing the first action and after performing the third action, the self-cleaning method further includes the following steps: The cleaning device (20) performs a fourth action; wherein the fourth action is to first drive the cleaning component (22) to lift, and then perform the self-cleaning action again, and the self-cleaning action is performed for a fifth preset time.

19. The self-cleaning method according to claim 16 or 18, characterized in that, The cleaning system (1) also includes a sludge storage tank, which is installed at the base station; After performing the fourth action and before performing the first action, the self-cleaning method further includes the following steps: Wastewater is drawn from the placement tank (120) through the sludge extraction port (122) so that the wastewater is stored in the sludge storage tank.

20. The self-cleaning method according to any one of claims 15-18, characterized in that, The cleaning equipment (20) also includes a sewage storage tank, which is located on the main unit (21). The base station base (100) has a dirt collection trough (150), and the dirt collection trough (150) has a drain outlet (151), which is connected to the dirt storage tank on the base station base (100). Before performing the first action, the self-cleaning method further includes the following steps: The sewage storage tank is connected to the sludge receiving tank (150), and the sewage in the sewage storage tank is discharged into the sewage storage tank through the sludge receiving tank (150) and the sewage outlet (151).

21. The self-cleaning method according to claim 20, characterized in that, At least during the execution of the first action, the self-cleaning method further includes the following steps: The wastewater storage tank (150) is flushed with liquid from the wastewater storage tank, and the flushed liquid is discharged into the wastewater storage tank through the drain (151).

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