A polishing apparatus and polishing method for preparing material samples.

Abstract

This invention relates to the field of material sample polishing technology, and discloses a polishing device and method for material sample preparation. The polishing device includes a worktable and an annular guide rail, and further includes: a sample delivery system disposed on the annular guide rail, comprising a moving pressing component and a rotating clamping component; the moving pressing component drives the sample to move along a predetermined trajectory and provides the pressure required for sample polishing; the rotating clamping component clamps and drives the sample to rotate, adjusts the angle between the sample and the worktable, and supplies a specified polishing fluid during sample polishing; and a polishing system disposed on the worktable, comprising a polishing component and a cooling component; the polishing component polishes the sample by rotating. This invention enables continuous polishing of multiple samples, improves sample polishing efficiency and effect, and reduces waste of polishing fluid and cooling water.

Description

Technical Field

[0001] This invention relates to the field of material sample polishing technology, specifically to a polishing device and method for preparing material samples. Background Technology

[0002] Grinding and polishing of material samples is an indispensable key process in materials science research, quality inspection and metallographic analysis. The metallographic sample preparation process usually includes steps such as sampling, grinding, polishing and etching. Among them, the quality of grinding and polishing directly determines the accuracy and reliability of subsequent microstructure observation.

[0003] Material sample polishing mainly includes manual polishing and automatic polishing. Manual polishing: Although the equipment investment is small and the operation is simple, the labor intensity is high, the efficiency is low, and the experience requirements of the staff are high. Automatic polishing: It can automate the sample polishing, cleaning and drying processes, which can improve the sample preparation efficiency, improve the reproducibility of the preparation and reduce the workload of the staff.

[0004] Current automated sample polishing equipment mainly uses mechanical grippers to pick up samples for polishing. It requires multiple processes such as polishing, cleaning, drying, and testing to be completed before the next sample can be polished. This is inefficient, and the supply position of polishing fluid is relatively fixed, resulting in serious waste of polishing fluid. In addition, the addition position of cooling water is relatively fixed, making it difficult to achieve a good cooling effect, and there are problems of insufficient or excessive cooling, while also resulting in serious waste of cooling water. Summary of the Invention

[0005] This invention provides a polishing device for material sample preparation. The sample feeding system enables simultaneous polishing of multiple samples, and the rotating clamping assembly automatically adjusts the addition position of the polishing solution according to the sample diameter, ensuring polishing effectiveness while reducing waste. Furthermore, the cooling assembly automatically adjusts the addition position based on the sample's movement on the polishing disc, ensuring effective cooling while minimizing cooling water waste. This solves the problems of low sample polishing efficiency, significant waste of polishing solution and cooling water, and poor polishing results mentioned in the background art.

[0006] This invention provides the following technical solution: A polishing apparatus for preparing material samples includes a worktable and an annular guide rail, and further includes: a sample delivery system disposed on the annular guide rail, the sample delivery system including a moving pressing component and a rotating clamping component, wherein the moving pressing component is used to drive the sample to move along a predetermined trajectory and to provide the pressure required for polishing the sample, the rotating clamping component is used to clamp and drive the sample to rotate, and to adjust the angle between the sample and the worktable, and to supply a specified polishing fluid during sample polishing; a polishing system disposed on the worktable, the polishing system including a polishing component and a cooling component, wherein the polishing component polishes the sample by rotation and collects the waste liquid generated during the polishing process, the cooling component is used to add cooling water to the polishing area of ​​the sample during the polishing process, and adjusts the amount of cooling water added according to the polishing speed.

[0007] As a preferred embodiment of the present invention, the trajectory of the sample delivery system is sequentially the sample storage area, the polishing area, the cleaning and drying area, the detection area, and the sample placement area. The sample delivery system has multiple components distributed on the annular guide rail, and each sample delivery system moves independently between itself and the annular guide rail.

[0008] As a preferred embodiment of the present invention, the movable pressing assembly includes a drive base, the output end of the drive base is connected to a plurality of guide wheels, the guide wheels are symmetrically distributed on both sides of the annular guide rail and the guide wheels abut against the annular guide rail, and a pressing rod is installed at the bottom of the drive base.

[0009] As a preferred embodiment of the present invention, the rotary clamping assembly includes a self-rotating motor, which is mounted on the bottom of the movable pressing assembly. A mounting base is installed at the output end of the self-rotating motor, and a limiting groove is formed at the bottom of the mounting base. Two bidirectional synchronous rods are installed inside the limiting groove, namely an electric drive rod and a dual-chamber hydraulic rod. A movable plate is installed at the end of the bidirectional synchronous rod, and the movable plates are symmetrically distributed on both sides of the axis of the self-rotating motor. A servo motor is installed on one of the movable plates, and clamping rings are provided at the output end of the servo motor and on the other movable plate.

[0010] As a preferred embodiment of the present invention, it further includes an extension track, which is symmetrically installed on the self-rotating motor. A telescopic rod is installed inside the extension track, and a fixing plate is installed at the end of the telescopic rod. The fixing plate is slidably connected to the extension track. Multiple polishing liquid nozzles are symmetrically installed at the bottom of the fixing plate. The dual-chamber hydraulic rod is connected to the telescopic rod through a fluid slip ring and a pipe at the shaft end of the self-rotating motor. When the dual-chamber hydraulic rod contracts, the enlarged chamber is connected to the telescopic rod, and the other chamber is connected to the external environment.

[0011] As a preferred embodiment of the present invention, it further includes a mixing slip ring, which is installed on the top of the annular guide rail. The polishing fluid nozzle is connected to the polishing fluid container through the mixing slip ring and the pipe. The self-rotating motor, drive seat, electric drive rod and servo motor are connected to external power equipment through the mixing slip ring.

[0012] As a preferred embodiment of the present invention, the polishing assembly includes a polishing disc, a groove is provided on the worktable, a revolution motor is installed inside the worktable, the polishing disc is installed at the output end of the revolution motor, a splash guard is installed on the side wall of the groove, an annular air nozzle is installed on the inner wall of the splash guard, a collection groove is provided at the bottom of the groove, a push plate is installed at the bottom of the polishing disc, the push plate is adapted to the collection groove, a scraper is installed on the push plate, and the scraper is spirally fitted to the inside of the splash guard.

[0013] As a preferred embodiment of the present invention, the cooling assembly includes a main water pipe and a side wall water pipe. The main water pipe is disposed on the workbench, and an elastic hose is installed inside the side wall water pipe. One end of the elastic hose is connected to the main water pipe, and the other end of the elastic hose is connected to a cooling water nozzle.

[0014] As a preferred embodiment of the present invention, it further includes a connecting pipe and a hollow column. The connecting pipe is rotatably connected to the bottom end of the main water pipe. A coil spring is installed between the outer wall of the main water pipe and the outer wall of the connecting pipe. A positioning plate is installed at the bottom of the outer wall of the connecting pipe, and multiple locking blocks are evenly installed on the positioning plate. A locking hole matching the positioning plate is opened inside the worktable. A driven gear is installed at the bottom of the outer wall of the hollow column. A driving gear is installed at the end of the revolution motor away from the polishing disc. When the locking block engages with the locking hole, the driving gear engages with the driven gear. A spiral rod is installed at the top of the hollow column, and the outer side of the spiral rod is adapted to the inner wall of the connecting pipe.

[0015] A polishing method for preparing material samples includes the following steps: Step 1: When polishing the sample, place the sample to be polished in the storage area of ​​the equipment; Step 2: The equipment will then grab the sample and move it to the polishing area, press it down and rotate it to polish the sample, while repeatedly adjusting the relative position of the sample and the polishing area. Step 3: Before polishing, adjust the position of the cooling water spray to match the diameter of the sample. Then, during the polishing process, automatically adjust the position of the cooling water spray according to the movement of the sample to match the polishing area of ​​the sample. Step 4: After polishing is completed, the sample is detached from the polishing area using the equipment and moved to the cleaning area. At the same time, the angle of the sample is adjusted so that it faces the cleaning area. Step 5: After the sample is cleaned and dried, move it to the testing area of ​​the equipment to observe the polishing effect on the sample surface, and finally place the sample in the placement area of ​​the equipment.

[0016] Compared with the prior art, the present invention provides a grinding and polishing device and method for preparing material samples, which has the following beneficial effects: 1. In this grinding and polishing equipment for material sample preparation, the sample feeding system can realize continuous grinding and polishing of multiple samples, thereby improving the grinding and polishing efficiency. At the same time, the rotating clamping component can automatically adjust the addition position of the grinding and polishing liquid according to the diameter of the sample, ensuring the grinding and polishing effect of the sample while reducing the waste of the grinding and polishing liquid.

[0017] 2. In this grinding and polishing equipment for material sample preparation, the grinding and polishing components and cooling components can reduce the splashing of cooling water and grinding and polishing fluid and reduce the risk of clogging of the drain port. At the same time, the cooling water addition position is automatically adjusted according to the change of the sample position on the grinding and polishing plate to ensure the cooling effect of the sample during the grinding and polishing process and avoid the sample being affected by insufficient or excessive cooling. Moreover, the cooling water addition amount can be automatically adjusted according to the rotation speed of the grinding and polishing plate of the sample to reduce the waste of cooling water.

[0018] The parts of this device not covered herein are the same as or can be implemented using existing technologies. This invention enables continuous polishing of multiple samples, improves the polishing efficiency and effect of the samples, and reduces the waste of polishing fluid and cooling water. Attached Figure Description

[0019] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, the elements or parts are not necessarily drawn to actual scale.

[0020] Figure 1 This is a three-dimensional schematic diagram of the present invention; Figure 2 This is a three-dimensional schematic diagram of the workbench in this invention; Figure 3 This is a three-dimensional schematic diagram of the structure on the annular guide rail in this invention; Figure 4 This is a three-dimensional schematic diagram of the sample delivery system in this invention; Figure 5 This is a three-dimensional schematic diagram of the rotating clamping assembly in this invention; Figure 6This is a partial cross-sectional structural diagram of the grinding and polishing assembly and the cooling assembly in this invention; Figure 7 This is a three-dimensional schematic diagram of the cooling component in this invention; Figure 8 This is a partial cross-sectional perspective view of the cooling component in this invention.

[0021] In the diagram: 1. Workbench; 2. Support; 3. Circular guide rail; 4. Moving pressing component; 41. Drive base; 42. Guide wheel; 43. Pressing rod; 5. Rotary clamping assembly; 51. Rotary motor; 52. Mounting base; 53. Limiting groove; 54. Bidirectional synchronous rod; 55. Moving plate; 56. Servo motor; 57. Clamping ring; 58. Extension track; 59. Telescopic rod; 510. Fixing plate; 511. Polishing fluid nozzle; 512. Fluid slip ring; 6. Polishing fluid container; 7. Mixing slip ring; 8. Sample stage; 9. Grinding and polishing assembly; 91. Groove; 92. Revolutionary motor; 93. Grinding and polishing disc; 94. Splash guard; 95. Annular air nozzle; 96. Collection trough; 97. Push plate; 98. Scraper; 99. Drive gear; 10. Cooling assembly; 101. Main water pipe; 102. Side wall water pipe; 103. Flexible hose; 104. Cooling water nozzle; 105. Connecting pipe; 106. Disc spring; 107. Positioning plate; 108. Locking block; 109. Hollow column; 1010. Driven gear; 1011. Helical rod; 11. Cleaning tank; 12. Rinse nozzle; 13. Microscope lens. Detailed Implementation

[0022] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Example 1:

[0023] Reference Figures 1-8 A polishing device for preparing material samples includes a worktable 1 and an annular guide rail 3. The annular guide rail 3 is connected to the worktable 1 via a bracket 2. The worktable 1 is typically equipped with a touch screen display and multiple control switches.

[0024] The circular guide rail 3 is mounted on the worktable 1 via the bracket 2, forming a circular motion path. The touch screen and control switch are human-machine interface for parameter setting and operation control, which physically separates the operation control area from the processing execution area, making it convenient for the operator to monitor and avoiding contamination of the control components by the grinding and polishing environment.

[0025] Reference Figure 1 and Figure 3 The sample delivery system is mounted on the annular guide rail 3. The sample delivery system includes a moving pressing component 4 and a rotating clamping component 5. The moving pressing component 4 is used to drive the sample to move along a predetermined trajectory and to provide the pressure required for sample polishing. The rotating clamping component 5 is used to clamp and drive the sample to rotate, and to adjust the angle between the sample and the worktable 1, and to supply the specified polishing fluid during sample polishing.

[0026] The movable pressing component 4 achieves two functions: first, driving the sample to flow between workstations along the annular guide rail 3; and second, applying axial pressure to the sample at the polishing station. Since the pressure directly determines the polishing efficiency and surface quality, it is usually used in conjunction with a pressure sensor. The rotating clamping component 5 achieves circumferential fixation, rotation drive, posture adjustment, and polishing fluid supply for the sample. It should be noted that the angle adjustment function not only allows the sample to tilt according to process requirements but also meets the needs of subsequent sample cleaning, drying, and testing.

[0027] Reference Figure 2 The trajectory of the sample delivery system is sequentially the sample storage area, polishing area, cleaning and drying area, detection area and sample placement area. The sample delivery system has multiple components distributed on the annular guide rail 3, and each sample delivery system moves independently from the annular guide rail 3. The sample storage area and the sample placement area are equipped with sample stages 8. The cleaning and drying area includes a cleaning tank 11 and multiple rinsing nozzles 12. The multiple rinsing nozzles 12 are used to deliver clean water, ethanol and clean air respectively. The detection area is equipped with a microscope head 13.

[0028] Multiple sample delivery systems operate independently on the same annular guide rail 3, forming parallel processing capabilities and significantly improving the grinding and polishing efficiency of the equipment. The process flow follows a closed-loop logic of storage, grinding and polishing, cleaning and drying, testing, and placement, meeting the standardized requirements for material sample preparation. Clean water and ethanol in the cleaning and drying area are used to adapt to the cleaning of different samples (some samples may not be suitable for cleaning with clean water). Clean air completes the surface drying, effectively preventing water stains and secondary pollution. The microscope lens 13 enables online quality detection to determine the grinding and polishing effect of the sample surface (whether the various parameters of the sample surface are compatible with the current mesh size of the grinding and polishing disc 93). The rinsing nozzle 12 adopts a pull-out design, and the entire cleaning tank 11 is generally cleaned after cleaning is completed.

[0029] Reference Figure 4The movable pressing component 4 includes a drive base 41. The output end of the drive base 41 is connected to a plurality of guide wheels 42. The guide wheels 42 are symmetrically distributed on both sides of the annular guide rail 3 and abut against the annular guide rail 3. A pressing rod 43 is installed at the bottom of the drive base 41.

[0030] The drive seat 41 drives the guide wheel 42 to run on the annular guide rail 3 through the output end. The guide wheel 42 is symmetrically distributed on both sides of the annular guide rail 3 to form a clamping structure, which ensures the stability of operation and prevents the risk of derailment. The guide wheel 42 and the annular guide rail 3 adopt friction drive or meshing drive. The pressing rod 43 is a pressure transmission element. By extending, it drives the rotating clamping assembly 5 and the sample below to move downward, so that the sample can contact the polishing disc 93 with a specific pressure.

[0031] Reference Figures 4-5 The rotating clamping assembly 5 includes a self-rotating motor 51, which is mounted on the bottom of the movable pressing assembly 4. The output end of the self-rotating motor 51 is equipped with a mounting base 52. A limit groove 53 is formed at the bottom of the mounting base 52. Two bidirectional synchronous rods 54 are installed inside the limit groove 53. The two bidirectional synchronous rods 54 are an electric drive rod and a double-chamber hydraulic rod, respectively. A movable plate 55 is installed at the end of the bidirectional synchronous rod 54. The movable plates 55 are symmetrically distributed on both sides of the axis of the self-rotating motor 51. A servo motor 56 is installed on one of the movable plates 55. A clamping ring 57 is provided on the output end of the servo motor 56 and on the other movable plate 55.

[0032] The self-rotating motor 51 transmits rotational motion to the clamping mechanism below via the mounting base 52. The limiting groove 53 and the bidirectional synchronous rod 54 cause the two moving plates 55 to move symmetrically along a straight line. The two bidirectional synchronous rods 54, which have different principles, have clear functional divisions: the electric drive rod provides precise position control and clamping force adjustment, while the dual-chamber hydraulic rod is used to monitor the distance between the two moving plates 55 so as to adjust the position of the polishing liquid nozzle 511 according to the change in hydraulic pressure. The moving plates 55 are symmetrically distributed on both sides of the axis to ensure the centering accuracy of the clamping and prevent the sample from becoming unstable during rotation. It should be explained that the clamping ring 57 connected to the servo motor 56 adjusts the angle through the servo motor 56 (since the surface to be polished is usually located at the top when the sample is placed, the sample can be rotated 180 degrees so that the surface to be polished is facing down and opposite the polishing disc 93). The clamping ring 57 on the other side is rotatably connected to the moving plate 55 and has greater resistance to prevent self-rotation without the drive of the servo motor 56.

[0033] Reference Figures 4-5It also includes an extension track 58, which is symmetrically installed on the self-rotating motor 51. A telescopic rod 59 is installed inside the extension track 58. A fixing plate 510 is installed at the end of the telescopic rod 59. The fixing plate 510 is slidably connected to the extension track 58. Multiple polishing liquid nozzles 511 are symmetrically installed at the bottom of the fixing plate 510. The dual-chamber hydraulic rod is connected to the telescopic rod 59 through a fluid slip ring 512 at the shaft end of the self-rotating motor 51 and a pipe. When the dual-chamber hydraulic rod contracts, the enlarged chamber is connected to the telescopic rod 59, and the other chamber is connected to the external environment.

[0034] The extension track 58 and the telescopic rod 59 form a radial adjustment mechanism for the polishing slurry nozzle 511, enabling the nozzle to adjust its spray position according to the sample diameter. The sliding connection between the fixed plate 510 and the extension track 58 ensures smooth adjustment. One chamber of the dual-chamber hydraulic rod expands in volume during contraction. This expanded chamber is connected to the telescopic rod 59 via a fluid slip ring 512 and a pipe. Utilizing the incompressibility of hydraulic oil, the linear motion of the dual-chamber hydraulic rod is synchronously transmitted to the telescopic rod 59, achieving automatic following of the polishing slurry nozzle 511. The other chamber is connected to the outside, ensuring the stability of the extension and retraction of the dual-chamber hydraulic rod. The fluid slip ring 512 is a conventional method in the prior art, mainly used to solve the fluid connection problem between rotating parts and stationary pipelines, ensuring the stability of the fluid supply.

[0035] Reference Figure 1 and Figure 3 It also includes a mixing slip ring 7, which is installed on the top of the annular guide rail 3. The polishing fluid nozzle 511 is connected to the polishing fluid container 6 through the mixing slip ring 7 and the pipe. The self-rotating motor 51, the drive seat 41, the electric drive rod and the servo motor 56 are connected to the external power equipment through the mixing slip ring 7.

[0036] The hybrid slip ring 7 is used to connect the rotating / moving parts with the stationary external system. It can handle two different media simultaneously: the fluid channel is used to transport the polishing fluid from the polishing fluid container 6 to the polishing fluid nozzle 511, and the electrical channel is used to power the various driving components. It should be noted that the hybrid slip ring 7 is a conventional method in the prior art. The product is divided into two completely isolated modules that do not interfere with each other and are leak-proof and short-circuit-proof. It will not be elaborated here. The hybrid slip ring 7 is installed on the top of the annular guide rail 3 to facilitate docking with the sample delivery system running along the annular guide rail 3, reducing the number of interfaces, simplifying the pipeline and wiring layout, and improving the reliability and maintenance convenience of the system.

[0037] Reference Figures 1-2 and Figures 6-8The polishing system is set on the workbench 1. The polishing system includes a polishing component 9 and a cooling component 10. The polishing component 9 polishes the sample by rotating and collects the waste liquid generated during the polishing process. The cooling component 10 is used to add cooling water to the polishing area of ​​the sample during the polishing process and adjusts the amount of cooling water added according to the polishing speed.

[0038] Among them, the rotational motion of the polishing component 9 and the rotation and revolution of the sample in the sample delivery system form a compound motion, which improves the uniformity and efficiency of polishing. The waste liquid collection function keeps the working environment clean and prevents polishing liquid splashing and ground pollution. The cooling component 10 is based on the heat generation mechanism of polishing: the higher the polishing speed, the faster the frictional heat is generated and the greater the amount of cooling water required. Therefore, the cooling water volume is automatically adjusted according to the speed, which can ensure sufficient cooling to prevent thermal damage to the sample, and avoid water waste and dilution of polishing liquid caused by excessive cooling.

[0039] Reference Figure 6 The polishing assembly 9 includes a polishing disc 93, a groove 91 on the worktable 1, a revolution motor 92 installed inside the worktable 1, the polishing disc 93 installed at the output end of the revolution motor 92, a splash guard 94 installed on the side wall of the groove 91, an annular air nozzle 95 installed on the inner wall of the splash guard 94, a collection groove 96 opened at the bottom of the groove 91, a push plate 97 installed at the bottom of the polishing disc 93, the push plate 97 is adapted to the collection groove 96, a scraper 98 is installed on the push plate 97, the scraper 98 is spiral and fits into the inside of the splash guard 94.

[0040] The rotating motor 92 drives the polishing disc 93 to rotate, and the rotation speed directly determines the polishing speed. It should be explained that the polishing disc 93 is usually a composite disc, for example, it includes an aluminum disc, a magnetic disc and a polishing disc from bottom to top. The splash guard 94 encloses the polishing area to prevent the polishing liquid from splashing at high speed. The annular air nozzle 95 can form an air curtain to further block the overflow of droplets and reduce the contact between waste liquid and splash guard 94. The collection tank 96 is located at the bottom of the groove 91 and uses gravity to collect waste liquid (the collection tank 96 is usually in the shape of an inverted trapezoid). The push plate 97 is installed at the bottom of the polishing disc 93 and rotates synchronously with the polishing disc 93. The spiral scraper 98 is attached to the inner wall of the splash guard 94 to form a spiral conveying structure. When the polishing disc 93 rotates, the spiral scraper 98 scrapes off the waste liquid on the inner wall of the splash guard 94 and conveys it downward to the collection tank 96. Then, the push plate 97 makes the waste liquid finally discharged through the drain port to achieve active drainage and prevent waste liquid accumulation and secondary pollution.

[0041] Reference Figure 6The cooling assembly 10 includes a main water pipe 101 and a side wall water pipe 102. The main water pipe 101 is set on the workbench 1. An elastic hose 103 is installed inside the side wall water pipe 102. One end of the elastic hose 103 is connected to the main water pipe 101, and the other end of the elastic hose 103 is connected to a cooling water nozzle 104.

[0042] Among them, the main water pipe 101 is the main supply pipeline for cooling water. The deformable characteristics of the flexible hose 103 allow the cooling water nozzle 104 to adjust its position and angle within a certain range, so that after grinding and polishing, the cooling water nozzle 104 can be pulled out to clean the entire grinding and polishing disc 93.

[0043] Reference Figures 7-8 It also includes a connecting pipe 105 and a hollow column 109. The connecting pipe 105 is rotatably connected to the bottom end of the main water pipe 101. A coil spring 106 is installed between the outer wall of the main water pipe 101 and the outer wall of the connecting pipe 105. A positioning plate 107 is installed at the bottom of the outer wall of the connecting pipe 105. Multiple locking blocks 108 are evenly installed on the positioning plate 107. The inside of the workbench 1 has a locking hole that matches the positioning plate 107. A driven gear 1010 is installed at the bottom of the outer wall of the hollow column 109. A driving gear 99 is installed at the end of the revolution motor 92 away from the polishing disc 93. When the locking block 108 meshes with the locking hole, the driving gear 99 meshes with the driven gear 1010. A spiral rod 1011 is installed at the top of the hollow column 109. The outer side of the spiral rod 1011 is adapted to the inner wall of the connecting pipe 105.

[0044] The connecting pipe 105 and the main water pipe 101 form a rotatable sleeve structure. The coil spring 106 provides a reset force, so that the main water pipe 101 maintains its initial position when it is not subjected to external force. The locking block 108 on the positioning plate 107 cooperates with the locking hole in the worktable 1 to form a clutch mechanism. When the locking block 108 is engaged with the locking hole, the positioning plate 107 and the connecting pipe 105 are locked and cannot rotate. When the sample moves back and forth along the polishing plate 93, the moving plate 55 contacts the side wall water pipe 102 and adjusts the position of the cooling water nozzle 104 so that it automatically follows the sample. Initially, the operator can pull the main water pipe 101 upward according to the diameter of the sample to disengage the locking block 108 from the locking hole in the worktable 1, thereby adjusting the initial position of the cooling water nozzle 104. It should be noted that the size and number of locking blocks 108 are not limited here, as long as they can be adapted to polishing samples of different specifications.

[0045] In addition, when the locking block 108 is locked, the driving gear 99 at the other end of the output shaft of the revolution motor 92 (which adopts a dual-output shaft motor) meshes with the driven gear 1010 at the bottom of the hollow column 109. The rotational power of the revolution motor 92 is transmitted to the hollow column 109 through gear transmission, driving the spiral rod 1011 to rotate in the connecting pipe 105, generating a conveying force. It should be explained that the bottom end of the hollow column 109 can be connected to the cooling water tank through a slip ring and a pipe. The conveying force generated when the spiral rod 1011 rotates can draw cooling water. Moreover, the higher the rotation speed of the polishing disc 93, the more cooling water is conveyed, thereby ensuring the cooling effect of the sample and reducing the waste of cooling water. Example 2:

[0046] Similar to Example 1, a polishing method for preparing material samples is proposed based on Example 1, including the following steps: Step 1: When polishing the sample, place the sample to be polished in the storage area of ​​the equipment; The operator places the sample to be processed on the sample stage 8 in the storage area to provide material input for the subsequent automated process.

[0047] Step 2: The equipment will then grab the sample and move it to the polishing area, press it down and rotate it to polish the sample, while repeatedly adjusting the relative position of the sample and the polishing area. The equipment automatically grabs the sample through the rotating clamping component 5 of the sample feeding system, and the moving pressing component 4 drives it to run along the annular guide rail 3 to the polishing area; after arrival, the pressing rod 43 presses down to provide polishing pressure, and the self-rotating motor 51 drives the sample to rotate; the function of reciprocating adjustment of relative position is achieved by the small reciprocating movement of the moving pressing component 4 along the annular guide rail 3. The compound motion avoids the uneven surface texture caused by fixed trajectory polishing and improves the consistency of polishing quality.

[0048] Step 3: Before polishing, adjust the position of the cooling water spray to match the diameter of the sample. Then, during the polishing process, automatically adjust the position of the cooling water spray according to the movement of the sample to match the polishing area of ​​the sample. The pre-adjustment of the cooling water position is achieved through the aforementioned locking block 108: the radial position of the cooling water nozzle 104 is preset according to the sample diameter to ensure that the cooling water covers the grinding and polishing contact area. The automatic adjustment during the grinding and polishing process is achieved by utilizing the self-resetting property of the disc spring 106, so that the cooling water nozzle 104 can dynamically adjust to follow the moving trajectory of the sample, always keeping the cooling water accurately sprayed to the grinding and polishing heat generation area, thus achieving efficient thermal management.

[0049] Step 4: After polishing is completed, the sample is detached from the polishing area using the equipment and moved to the cleaning area. At the same time, the angle of the sample is adjusted so that it faces the cleaning area. After polishing, the pressing rod 43 is lifted to remove the sample from the polishing disc 93. The moving pressing component 4 drives the sample to run along the annular guide rail 3 to the cleaning and drying area. The rotating clamping component 5 adjusts the sample angle so that the sample surface faces the rinsing nozzle 12, ensuring that the cleaning medium can fully contact and rinse the polished surface, removing residual abrasive particles and polishing liquid, as well as the polished surface of the dried sample.

[0050] Step 5: After the sample is cleaned and dried, move it to the testing area of ​​the equipment to observe the polishing effect on the sample surface, and finally place the sample in the placement area of ​​the equipment.

[0051] After cleaning and drying, the sample delivery system continues to run along the circular guide rail 3 to the detection area. The sample surface is optically inspected by the microscope lens 13. The operator can observe the surface roughness, scratches, residual defects and other indicators on the display screen. After passing the inspection, the sample is finally transferred to the sample stage 8 in the placement area to complete the closed loop of the entire preparation process.

[0052] Components not described in detail in this article are existing technologies.

[0053] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A grinding and polishing device for preparing material samples, comprising a worktable (1) and an annular guide rail (3), characterized in that, Also includes: The sample delivery system is mounted on the annular guide rail (3) and includes a moving pressing component (4) and a rotating clamping component (5). The moving pressing component (4) is used to drive the sample to move along a predetermined trajectory and to provide the pressure required for sample polishing. The rotating clamping component (5) is used to clamp and drive the sample to rotate, and to adjust the angle between the sample and the worktable (1). During sample polishing, the specified polishing liquid is supplied. A polishing system is provided on the workbench (1), and the polishing system includes a polishing component (9) and a cooling component (10). The polishing component (9) polishes the sample by rotating and collects the waste liquid generated during the polishing process. The cooling component (10) is used to add cooling water to the polishing area of ​​the sample during the polishing process and adjusts the amount of cooling water added according to the polishing speed.

2. The grinding and polishing equipment for preparing material samples according to claim 1, characterized in that, The trajectory of the sample delivery system is sequentially the sample storage area, polishing area, cleaning and drying area, detection area and sample placement area. The sample delivery system has multiple components distributed on the annular guide rail (3), and each sample delivery system moves independently between itself and the annular guide rail (3).

3. The grinding and polishing equipment for preparing material samples according to claim 1, characterized in that, The movable pressing assembly (4) includes a drive seat (41), the output end of which is connected to a plurality of guide wheels (42). The guide wheels (42) are symmetrically distributed on both sides of the annular guide rail (3), and the guide wheels (42) abut against the annular guide rail (3). A pressing rod (43) is installed at the bottom of the drive seat (41).

4. The grinding and polishing equipment for preparing material samples according to claim 3, characterized in that, The rotating clamping assembly (5) includes a self-rotating motor (51), which is installed at the bottom of the moving pressing assembly (4). The output end of the self-rotating motor (51) is equipped with a mounting base (52). A limiting groove (53) is opened at the bottom of the mounting base (52). Two bidirectional synchronous rods (54) are installed inside the limiting groove (53). The two bidirectional synchronous rods (54) are an electric drive rod and a double-chamber hydraulic rod, respectively. A moving plate (55) is installed at the end of the bidirectional synchronous rod (54). The moving plates (55) are symmetrically distributed on both sides of the axis of the self-rotating motor (51). A servo motor (56) is installed on one of the moving plates (55). A clamping ring (57) is provided on the output end of the servo motor (56) and on the other moving plate (55).

5. A grinding and polishing device for preparing material samples according to claim 4, characterized in that, It also includes an extension track (58), which is symmetrically mounted on the self-rotating motor (51). A telescopic rod (59) is installed inside the extension track (58), and a fixing plate (510) is installed at the end of the telescopic rod (59). The fixing plate (510) is slidably connected to the extension track (58), and multiple polishing liquid nozzles (511) are symmetrically mounted at the bottom of the fixing plate (510). The dual-chamber hydraulic rod is connected to the telescopic rod (59) through the fluid slip ring (512) at the shaft end of the self-rotating motor (51) and the pipe. When the dual-chamber hydraulic rod contracts, the enlarged chamber is connected to the telescopic rod (59), and the other chamber is connected to the external environment.

6. The grinding and polishing equipment for preparing material samples according to claim 5, characterized in that, It also includes a mixing slip ring (7), which is installed on the top of the annular guide rail (3). The polishing liquid nozzle (511) is connected to the polishing liquid container (6) through the mixing slip ring (7) and the pipe. The self-rotating motor (51), drive seat (41), electric drive rod and servo motor (56) are connected to the external power equipment through the mixing slip ring (7).

7. The grinding and polishing equipment for preparing material samples according to claim 1, characterized in that, The polishing assembly (9) includes a polishing disc (93), and a groove (91) is provided on the worktable (1). A revolution motor (92) is installed inside the worktable (1), and the polishing disc (93) is installed at the output end of the revolution motor (92). The groove (91) is equipped with a splash guard (94) on its side wall, and an annular air nozzle (95) is installed on the inner wall of the splash guard (94). A collection groove (96) is provided at the bottom of the groove (91). A push plate (97) is installed at the bottom of the polishing disc (93). The push plate (97) is adapted to the collection groove (96). A scraper (98) is installed on the push plate (97). The scraper (98) is spiral and fits into the interior of the splash guard (94).

8. A grinding and polishing device for preparing material samples according to claim 7, characterized in that, The cooling assembly (10) includes a main water pipe (101) and a side wall water pipe (102). The main water pipe (101) is set on the workbench (1). An elastic hose (103) is installed inside the side wall water pipe (102). One end of the elastic hose (103) is connected to the main water pipe (101), and the other end of the elastic hose (103) is connected to a cooling water nozzle (104).

9. A grinding and polishing device for preparing material samples according to claim 8, characterized in that, It also includes a connecting pipe (105) and a hollow column (109). The connecting pipe (105) is rotatably connected to the bottom end of the main water pipe (101). A coil spring (106) is installed between the outer wall of the main water pipe (101) and the outer wall of the connecting pipe (105). The bottom of the outer wall of the connecting pipe (105) is equipped with a positioning plate (107), and multiple locking blocks (108) are evenly installed on the positioning plate (107). The inside of the workbench (1) is provided with a locking hole that matches the positioning plate (107). The bottom of the outer wall of the hollow column (109) is equipped with a driven gear (1010). The end of the revolution motor (92) away from the polishing disc (93) is equipped with a driving gear (99). When the locking block (108) meshes with the locking hole, the driving gear (99) meshes with the driven gear (1010). The top of the hollow column (109) is equipped with a spiral rod (1011), and the outer side of the spiral rod (1011) is adapted to the inner wall of the connecting pipe (105).

10. A polishing method for preparing material samples, employing the polishing equipment for preparing material samples as described in any one of claims 1-9, characterized in that, Includes the following steps: Step 1: When polishing the sample, place the sample to be polished in the storage area of ​​the equipment; Step 2: The equipment will then grab the sample and move it to the polishing area, press it down and rotate it to polish the sample, while repeatedly adjusting the relative position of the sample and the polishing area. Step 3: Before polishing, adjust the position of the cooling water spray to match the diameter of the sample. Then, during the polishing process, automatically adjust the position of the cooling water spray according to the movement of the sample to match the polishing area of ​​the sample. Step 4: After polishing is completed, the sample is detached from the polishing area using the equipment and moved to the cleaning area. At the same time, the angle of the sample is adjusted so that it faces the cleaning area. Step 5: After the sample is cleaned and dried, move it to the testing area of ​​the equipment to observe the polishing effect on the sample surface, and finally place the sample in the placement area of ​​the equipment.

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