A high-stability polishing device and polishing process for combat boots, training shoes, and leather shoes.

Abstract

This invention discloses a high-stability polishing device and polishing process for combat boots, training shoes, and leather shoes in the field of footwear polishing technology. It includes a polishing wheel fixedly mounted on a rotating shaft, and structures such as a retraction / expansion assembly, a retraction / expansion adjustment assembly, and a flip adjustment assembly connected to the polishing wheel. Multiple retraction / expansion assemblies are evenly distributed around the circumference of the polishing wheel and slide radially along the polishing wheel. Each retraction / expansion assembly is detachably equipped with a set of double-sided polishing components. The retraction / expansion adjustment assembly is mounted on the polishing wheel and drives multiple retraction / expansion assemblies to slide synchronously radially. The flip adjustment assembly includes a push-pull component mounted on the polishing wheel and a rotation control component connecting the push-pull component and the retraction / expansion assembly. This invention solves the problems of existing polishing devices where the polishing wheel is often only usable on one side, cannot be flexibly adjusted according to actual usage needs, and has low material utilization.

Description

Technical Field

[0001] This invention relates to the field of footwear polishing technology, and in particular to a highly stable polishing device and polishing process for combat boots, training shoes, and leather shoes. Background Technology

[0002] Polishing is a key process in the production and maintenance of combat boots, training shoes, and everyday leather shoes, as it enhances the gloss of the shoe surface, applies shoe polish, and ensures the finished product's appearance.

[0003] Existing polishing devices typically employ integral cloth polishing wheels. However, these wheels often only have one side usable for polishing. When polishing shoes of different colors (such as black combat boots and brown leather shoes), residual shoe polish can easily cause cross-contamination, resulting in a cloudy finish or even rendering the shoes unusable. Furthermore, single-sided polishing wheels can only provide grinding force for a single hardness or roughness, making it impossible to simultaneously address different needs such as rough polishing and fine polishing at the same workstation. Additionally, the wear on the outer circumference of the polishing wheel is usually uneven; once a part is damaged or contaminated, the entire wheel often needs to be replaced, leading to high maintenance costs and low material utilization, which is detrimental to practical applications. Therefore, those skilled in the art have provided a highly stable polishing device and polishing process for combat boots, training shoes, and leather shoes to solve the problems mentioned in the background art. Summary of the Invention

[0004] The purpose of this invention is to address the problem that existing polishing devices often only have polishing wheels that can be used on one side, which cannot be flexibly adjusted according to actual usage needs and have low material utilization. Therefore, this invention proposes a highly stable polishing device and polishing process for combat boots, training shoes, and leather shoes.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a high-stability polishing device for combat boots, training shoes, and leather shoes, comprising: Polishing wheel, fixedly mounted on the rotating shaft; The expansion and contraction assembly is provided in multiples and is evenly distributed around the circumference of the polishing wheel. The expansion and contraction assembly is slidably arranged along the radial direction of the polishing wheel. Each expansion and contraction assembly can be detachably mounted with a set of double-sided polishing components. An expansion and contraction adjustment assembly is mounted on the polishing wheel and is used to drive multiple expansion and contraction assemblies to slide synchronously along the radial direction; The flip-adjustment assembly includes a push-pull component mounted on the polishing wheel and a rotation control component connecting the push-pull component and the expansion / retraction assembly. A radial sliding fit pair is provided between the rotation control component and the push-pull component, so that the rotation control component has the freedom to slide radially synchronously with the expansion / retraction assembly. The push-pull component can drive the rotation control component to move by sliding along the axial direction of the polishing wheel, thereby driving the double-sided polishing assembly to flip and switch.

[0006] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The expansion and contraction assembly includes two sets of guide rods slidably installed inside the polishing wheel. One end of each set of guide rods inside the polishing wheel is fixedly installed with a sleeve that connects to the expansion and contraction adjustment assembly. The other end of each set of guide rods extending outside the polishing wheel is rotatably installed with a frame rod that connects to the double-sided polishing assembly.

[0007] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The double-sided polishing assembly includes a connecting frame that is snapped on between two sets of support rods. The connecting frame is equipped with a double-sided polishing brush, and a fixing bolt for positioning and locking the connecting frame is threaded onto one set of support rods.

[0008] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: Both ends of the sleeve are connected to clamping components. When the guide rod slides radially toward the center, the clamping components retract in response to clamp the end of the double-sided polishing brush that is close to the axis of the polishing wheel.

[0009] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The clamping component includes symmetrically hinged folding rods at both ends of the sleeve. A pressure rod for abutting against the double-sided polishing brush is rotatably installed between two sets of folding rods arranged opposite each other. A limit post is fixedly installed on the polishing wheel, and a guide groove for accommodating the limit post is opened in the folding rod.

[0010] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The expansion and contraction adjustment assembly includes an adjustment disc that is rotatably connected to the polishing wheel. The adjustment disc has an arc-shaped connecting groove for the sleeve to slide through, and two sets of positioning rods are fixedly installed on the adjustment disc. The positioning rods are threaded with a first positioning knob that can be inserted into the polishing wheel.

[0011] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The rotation control component includes a movable frame slidably connected to a guide rod. The movable frame is connected to a movable block via a hinged connecting rod. A round rod that slides into the sleeve is fixedly installed on one side of the movable block. A rocker arm is fixedly connected to one of the frame rods. A limiting groove for the rocker arm to slide is provided inside the movable frame.

[0012] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The push-pull component includes a movable disk that is slidably mounted on the polishing wheel along the axial direction, and the movable disk is threaded with a plurality of second positioning knobs that can be inserted into the polishing wheel.

[0013] Further description of the high-stability polishing device for the aforementioned combat boots, training shoes, and leather shoes: The radial sliding fit includes a guide rail disposed inside the movable disk, and the movable block is slidably mounted in the guide rail along the radial direction of the movable disk.

[0014] A high-stability polishing process for combat boots, training shoes, and leather shoes is implemented using the aforementioned high-stability polishing device for combat boots, training shoes, and leather shoes. The high-stability polishing process for combat boots, training shoes, and leather shoes includes the following steps: S1. Install the first polishing surface of the double-sided polishing assembly to the outer working position, drive the polishing wheel to rotate through the rotating shaft, and use the first polishing surface to perform preliminary polishing or decontamination treatment on the shoe surface. S2. When it is necessary to switch the polishing surface, start the expansion and contraction adjustment component to drive multiple expansion and contraction components to slide outward radially along the polishing wheel until the distance between two adjacent sets of double-sided polishing components increases to the flip-over clearance position; S3. Axial sliding push-pull component, which, in conjunction with the rotation control component, drives multiple sets of double-sided polishing components to rotate synchronously, so that the second polishing surface, which was originally on the inner side, is rotated to the outer side, thereby realizing the interchange of the positions of polishing surfaces of different colors of shoe polish or different materials. S4. Restart the expansion and contraction adjustment components to drive multiple expansion and contraction components to retract radially inward, so that multiple sets of double-sided polishing components come close to each other to a tight fit, in order to restore the highly stable rotary polishing station. S5. Use the second polishing surface after switching to continue polishing the shoe surface accordingly. Through the physical isolation and rapid switching of the two sets of polishing surfaces, step polishing of materials with different hardness or anti-cross-contamination polishing of shoe polish of different colors can be achieved.

[0015] In summary, due to the adoption of the above-mentioned high-stability polishing device and polishing process for combat boots, training shoes, and leather shoes, the beneficial effects of this invention are: By setting up circumferentially distributed and easily disassembled modular double-sided polishing components, along with integrated expansion and retraction adjustment and flipping adjustment mechanisms, the polishing unit achieves flexible adjustment in radial position and working surface position. This allows for the simultaneous configuration of a hard cleaning layer and a soft fine polishing layer on the same set of components without changing the abrasive. A quick flipping mechanism enables continuous operation from coarse polishing to fine polishing, significantly improving processing efficiency. Simultaneously, the two polishing surfaces utilize physically isolated independent working areas, allowing for separate application of different colored shoe polishes, completely eliminating cross-contamination and ensuring the color purity of high-end leather polishing. For extreme working conditions of high speed and high frictional resistance, the device uses the centripetal inward displacement of the expansion and retraction mechanism to bring multiple components closer together and form a tight whole. This not only effectively shortens the force arm and suppresses cantilever vibration under high-speed rotation, but also optimizes the dynamic balance characteristics of the entire machine through centripetal reinforcement. This ensures that the structure remains stable and does not shift when polishing heavy combat boots under high pressure, fundamentally guaranteeing the precision stability and ease of operation in complex shoe upper processing. Attached Figure Description

[0016] Figure 1 This is a first schematic diagram of the overall structure of the present invention; Figure 2 This is a second schematic diagram of the overall structure of the present invention; Figure 3 This is a schematic diagram of the structure of the expansion and contraction adjustment component of the present invention; Figure 4 This is a schematic diagram of the push-pull component structure of the present invention; Figure 5 This is a first schematic diagram of the structure of the expansion and contraction assembly, the double-sided polishing assembly, the clamping component, and the rotation control component of the present invention. Figure 6 This is a second schematic diagram of the structure of the expansion and contraction assembly, the double-sided polishing assembly, the clamping component, and the rotation control component of the present invention. Figure 7 for Figure 1 Enlarged view of the A-structure in the middle; Figure 8 for Figure 2 Enlarged view of the B structure.

[0017] Legend: 10. Polishing wheel; 11. Shaft; 20. Retraction and expansion assembly; 201. Guide rod; 202. Sleeve; 203. Frame rod; 30. Double-sided polishing assembly; 301. Connecting frame; 302. Double-sided polishing brush; 40. Expansion / contraction adjustment assembly; 401. Adjustment disc; 402. Arc-shaped connecting groove; 403. Positioning rod; 404. First positioning knob; 50. Flip adjustment assembly; 501. Push-pull component; 5011. Moving plate; 5012. Second positioning knob; 5013. Guide slide rail; 502. Rotation control component; 5021. Moving frame; 5022. Connecting rod; 5023. Moving block; 5024. Round rod; 5025. Rocker arm; 5026. Limiting groove; 60. Clamping component; 601. Folding rod; 602. Pressure rod; 603. Limiting post; 604. Guide groove. Detailed Implementation

[0018] The following will describe, with reference to the accompanying drawings of the embodiments of the present invention, a high-stability polishing device and polishing process for combat boots, training shoes, and leather shoes according to the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0019] like Figures 1-8 As shown, the present invention provides a high-stability polishing device for combat boots, training shoes, and leather shoes, including a polishing wheel 10 fixedly mounted on a rotating shaft 11, and structures such as a retraction and expansion assembly 20, a retraction and expansion adjustment assembly 40, and a flip adjustment assembly 50 disposed on the polishing wheel 10. An external motor can be connected to the end of the rotating shaft 11 to control the rotation of the polishing wheel 10. Multiple retraction and expansion assemblies 20 are provided and evenly distributed around the polishing wheel 10. The retraction and expansion assemblies 20 are slidably disposed along the radial direction of the polishing wheel 10, and a set of double-sided polishing assemblies 30 can be detachably mounted on each retraction and expansion assembly 20. The retraction and expansion adjustment assembly 40 is mounted on the polishing wheel 10 and is used to drive multiple retraction and expansion assemblies 20 to slide synchronously along the radial direction.

[0020] Correspondingly, the flip adjustment assembly 50 includes a push-pull member 501 mounted on the polishing wheel 10, and a rotation control member 502 connecting the push-pull member 501 and the expansion assembly 20. A radial sliding fit pair is provided between the rotation control member 502 and the push-pull member 501 so that the rotation control member 502 has the freedom to slide radially synchronously with the expansion assembly 20. The push-pull member 501 can drive the rotation control member 502 to move by sliding along the axial direction of the polishing wheel 10, so as to drive the double-sided polishing assembly 30 to flip and switch.

[0021] The two polishing surfaces of the double-sided polishing assembly 30 can be configured with polishing materials of different properties according to actual usage needs. Through differences in physical characteristics, they achieve functional complementarity. In the rough polishing stage, a harder fabric material is used to efficiently remove stubborn stains or perform initial sanding. In the fine polishing stage, the assembly switches to a softer fabric material for delicate polishing of the shoe surface, enhancing surface gloss and improving the processing quality of footwear of different materials such as combat boots and leather shoes. When the double-sided polishing assembly 30 uses a uniform material, it can prevent color isolation and cross-contamination. The two polishing surfaces can serve as independent color working areas, each used to apply different colors of shoe polish or wax (such as black, brown, or clear). When processing combat boots, training shoes, or leather shoes of different colors, a quick flip allows for color switching, completely eliminating color cross-contamination caused by shared abrasives and ensuring the purity of the polishing effect.

[0022] When the polishing device needs to adjust the polishing material or shoe polish color, the operator can control the displacement of multiple sets of expansion and contraction components 20 and double-sided polishing components 30 to the flip adjustment position through the expansion and contraction adjustment component 40. The push-pull component 501 is moved axially, and the push-pull component 501 can drive the rotation control component 502 to move through the axial displacement. The rotation control component 502 then drives the double-sided polishing component 30 to flip around its mounting axis, switching the inner spare polishing surface to the outer working position. After the double-sided polishing component 30 is adjusted, the expansion and contraction adjustment component 40 is used to retract and tighten the multiple sets of double-sided polishing components 30, which can ensure the overall stability of the device during rotary polishing. The device adjustment method is simple and easy to operate, and the operation is convenient and fast, which is beneficial to practical applications.

[0023] In one embodiment, such as Figures 1-2 and Figures 5-8 As shown, specifically, the expansion / contraction assembly 20 includes two sets of guide rods 201 slidably installed inside the polishing wheel 10. One end of each guide rod 201 inside the polishing wheel 10 is fixedly fitted with a sleeve 202 connecting to the expansion / contraction adjustment assembly 40. The other end of each guide rod 201 extending outside the polishing wheel 10 is rotatably fitted with a support rod 203 connecting to the double-sided polishing assembly 30. The expansion / contraction adjustment assembly 40 can be adjusted by controlling the displacement of the two sets of guide rods 201 through the sleeve 202. The two sets of guide rods 201 slide radially within a preset slide rail on the polishing wheel 10. The double-rod structure ensures stability during movement and effectively prevents the swaying or jamming phenomena that are prone to occur in single-rod structures. The end of each guide rod 201 extending outside the wheel supports the support rod 203. The support rod 203 not only serves as a support base for the double-sided polishing assembly 30, but its rotatable installation also provides the necessary rotational freedom for the flipping and switching action of the double-sided polishing assembly 30.

[0024] The double-sided polishing assembly 30 includes a connecting frame 301 that is snapped together between two sets of support rods 203. A double-sided polishing brush 302 is located inside the connecting frame 301. One set of support rods 203 is threaded with a fixing bolt for positioning and locking the connecting frame 301. The connecting frame 301 serves as the carrier of the polishing brush, utilizing its outer snap-fit ​​structure to engage with the two sets of support rods 203. During installation, the connecting frame 301 is pushed into a pre-set slot between the two sets of support rods 203, achieving initial spatial limitation and axial coarse positioning through the snap-fit. After initial positioning, the operator locks it by rotating the fixing bolt on one set of support rods 203, thus achieving final rigid fixation.

[0025] The detachable nature of the double-sided polishing assembly 30 allows operators to disassemble the assembly for thorough physical cleaning or chemical dewaxing. This not only prevents old shoe polish from clumping and affecting the polishing feel but also effectively extends the lifespan of the polishing material. When one side shows localized wear due to prolonged high-intensity operation, it can be flipped to the other side to continue working, effectively doubling the service life of a single assembly and reducing the average maintenance cost of the tool.

[0026] Based on the above embodiments, Figures 5-8 As shown, both ends of the sleeve 202 are connected to a clamping member 60. When the guide rod 201 slides radially toward the center, the clamping member 60 retracts in conjunction to clamp the end of the double-sided polishing brush 302 near the axis of the polishing wheel 10, effectively eliminating the cantilever sway of the component when it rotates at high speed, thereby improving the stability of the device. In detail, the clamping member 60 includes symmetrically hinged folding rods 601 at both ends of the sleeve 202. A pressure rod 602 for abutting against the double-sided polishing brush 302 is rotatably installed between the two sets of folding rods 601. A limiting post 603 is fixedly installed on the polishing wheel 10. A guide groove 604 for accommodating the limiting post 603 is opened in the folding rod 601. The trajectory of the guide groove 604 is configured such that when the sleeve 202 slides radially toward the center along the guide rod 201, the guide groove 604, constrained by the limiting post 603, can force the folding rod 601 to rotate around the hinge point, thereby driving the pressure rod 602 to retract inward and clamp the double-sided polishing brush 302.

[0027] The precise clamping of the inner side of the double-sided polishing brush 302 by the pressure rod 602 provides a reasonable space for the multiple circumferentially distributed double-sided polishing brushes 302 to approach each other. This ensures that when the components are retracted to the working position, they can achieve a compact circular arrangement without mechanical collision, thus guaranteeing the smooth operation of the mechanism. The clamping member 60 presses against the polishing brush from the inside, forming a centripetal clamping force. By rigidly fixing the inner ring of the double-sided polishing brush 302, under high-speed rotation polishing conditions, centrifugal force can easily cause the polishing head to oscillate radially. The clamping member 60 provides additional centripetal support torque, enabling the full-circumference double-sided polishing brush 302 to maintain extremely high coaxiality during high-speed rotation. This not only suppresses noise caused by high-frequency vibration but also significantly improves the overall stability during rotation, ensuring the process quality when performing high-intensity polishing on heavy footwear such as combat boots.

[0028] In one embodiment, such as Figures 1-3 As shown, specifically, the expansion and contraction adjustment assembly 40 includes an adjustment disc 401 rotatably connected to the polishing wheel 10. The adjustment disc 401 has an arc-shaped connecting groove 402 through which the sleeve 202 slides. Two sets of positioning rods 403 are fixedly installed on the adjustment disc 401. Each positioning rod 403 is threaded with a first positioning knob 404 that can be inserted into the polishing wheel 10. When the operator moves the positioning rod 403, the adjustment disc 401 rotates. This rotation of the adjustment disc 401, through its internal arc-shaped connecting groove 402, causes all sleeves 202 to move radially in sync, thereby achieving radial displacement adjustment of the expansion and contraction assembly 20. After the position of the expansion and contraction assembly 20 is adjusted, the first positioning knob 404 can be rotated so that its end is inserted into the corresponding locking hole, thus achieving rapid adjustment and positioning of the expansion and contraction assembly 20.

[0029] In one embodiment, such as Figures 5-8 As shown, specifically, the rotation control component 502 includes a movable frame 5021 slidably connected to the guide rod 201. The movable frame 5021 is connected to a movable block 5023 via a hinged connecting rod 5022. A round rod 5024 that slides into the sleeve 202 is fixedly installed on one side of the movable block 5023. A set of frame rods 203 is fixedly connected to a rocker arm 5025. A limiting groove 5026 for sliding of the rocker arm 5025 is provided inside the movable frame 5021. Figure 4 As shown, specifically, the push-pull component 501 includes a movable disk 5011 slidably mounted on the polishing wheel 10 along the axial direction. Multiple sets of second positioning knobs 5012, which can be inserted into the polishing wheel 10, are threaded onto the movable disk 5011. The radial sliding fit includes a guide rail 5013 disposed within the movable disk 5011, and a movable block 5023 is radially slidably mounted within the guide rail 5013 along the movable disk 5011.

[0030] To achieve the flipping adjustment of the double-sided polishing brush 302, the operator can pull the movable disk 5011 to slide axially on the polishing wheel 10. The movable disk 5011 can drive the movable block 5023 to move axially through the guide rail 5013. The round rod 5024 connected to the movable block 5023 can cause the rotation control component 502 to move radially synchronously when the expansion and contraction assembly 20 is adjusted radially. When the movable block 5023 produces axial displacement, it can drive the movable frame 5021 to move radially relative to the guide rod 201 through the connecting rod 5022. The movable frame 5021 can drive the rocker arm 5025 inside it to rotate around the rotation mounting point of the frame rod 203. The frame rod 203 can then drive the double-sided polishing brush 302 connected to it to achieve flipping adjustment.

[0031] A high-stability polishing process for combat boots, training shoes, and leather shoes is implemented using the aforementioned high-stability polishing device for combat boots, training shoes, and leather shoes. The high-stability polishing process for combat boots, training shoes, and leather shoes includes the following steps: S1. Install the first polishing surface of the double-sided polishing assembly 30 to the outer working position, drive the polishing wheel 10 to rotate through the rotating shaft 11, and use the first polishing surface to perform preliminary polishing or destaining treatment on the shoe surface. S2. When it is necessary to switch the polishing surface, start the expansion and contraction adjustment component 40 to drive multiple expansion and contraction components 20 to slide radially outward along the polishing wheel 10 until the distance between two adjacent sets of double-sided polishing components 30 increases to the flip-over clearance position. S3. Axial sliding push-pull component 501, through its linkage with rotation control component 502, drives multiple sets of double-sided polishing components 30 to rotate synchronously, so that the second polishing surface originally located on the inner side is rotated to the outer side, realizing the interchange of positions of polishing surfaces of different colors of shoe polish or different materials. S4. Restart the expansion and contraction adjustment component 40 to drive multiple expansion and contraction components 20 to retract radially inward, so that multiple sets of double-sided polishing components 30 come close to each other to a tight fit, in order to restore the highly stable rotary polishing station. S5. Use the second polishing surface after switching to continue polishing the shoe surface accordingly. Through the physical isolation and rapid switching of the two sets of polishing surfaces, step polishing of materials with different hardness or anti-cross-contamination polishing of shoe polish of different colors can be achieved.

[0032] In summary, the present invention, through the adjustment and coordination between the expansion and retraction component 20, the double-sided polishing component 30, the expansion and retraction adjustment component 40, the flipping adjustment component 50, and the clamping component 60, enables the polishing device to meet different polishing requirements for combat boots, leather shoes, etc., and ensures that the device always has excellent stability, ease of operation, and pollution-proof process cleanliness.

[0033] The above are merely preferred embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art who makes equivalent substitutions or modifications to the high-stability polishing device and polishing process for combat boots, training shoes, and leather shoes and the inventive concept disclosed in the present invention within the scope of the technology disclosed in the present invention should be covered within the scope of protection of the present invention.

Claims

1. A high-stability polishing device for combat boots, training shoes, and leather shoes, characterized in that, include: Polishing wheel (10) is fixedly mounted on shaft (11); The expansion and contraction assembly (20) is provided in multiple and is evenly distributed around the polishing wheel (10). The expansion and contraction assembly (20) is slidably arranged along the radial direction of the polishing wheel (10). Each expansion and contraction assembly (20) is detachably equipped with a set of double-sided polishing assemblies (30). An expansion and contraction adjustment assembly (40) is mounted on the polishing wheel (10) and is used to drive multiple expansion and contraction assemblies (20) to slide synchronously along the radial direction; The flip adjustment assembly (50) includes a push-pull member (501) mounted on the polishing wheel (10) and a rotation control member (502) connecting the push-pull member (501) and the expansion assembly (20). A radial sliding fit pair is provided between the rotation control member (502) and the push-pull member (501) so that the rotation control member (502) has the freedom to slide radially synchronously with the expansion assembly (20). The push-pull member (501) can drive the rotation control member (502) to move by sliding along the axial direction of the polishing wheel (10), so as to drive the double-sided polishing assembly (30) to flip and switch.

2. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 1, characterized in that: The expansion and contraction assembly (20) includes two sets of guide rods (201) slidably installed inside the polishing wheel (10). One end of the two sets of guide rods (201) inside the polishing wheel (10) is fixedly installed with a sleeve (202) that connects to the expansion and contraction adjustment assembly (40). The other end of the two sets of guide rods (201) extending to the outside of the polishing wheel (10) is rotatably installed with a bracket (203) that connects to the double-sided polishing assembly (30).

3. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 2, characterized in that: The double-sided polishing assembly (30) includes a connecting frame (301) snapped between two sets of support rods (203), and a double-sided polishing brush (302) is provided inside the connecting frame (301). A fixing bolt for positioning and locking the connecting frame (301) is threaded onto one set of the support rods (203).

4. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 3, characterized in that: Both ends of the sleeve (202) are connected to a clamping member (60). When the guide rod (201) slides radially toward the center, the clamping member (60) retracts in conjunction to clamp the end of the double-sided polishing brush (302) near the axis of the polishing wheel (10).

5. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 4, characterized in that: The clamping member (60) includes folding rods (601) symmetrically hinged to both ends of the sleeve (202). A pressure rod (602) for abutting against the double-sided polishing brush (302) is rotatably installed between the two sets of folding rods (601). A limiting post (603) is fixedly installed on the polishing wheel (10). A guide groove (604) for accommodating the limiting post (603) is opened in the folding rod (601).

6. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 2, characterized in that: The expansion and contraction adjustment assembly (40) includes an adjustment disk (401) rotatably connected to the polishing wheel (10). The adjustment disk (401) has an arc-shaped connecting groove (402) through which the sleeve (202) slides. Two sets of positioning rods (403) are fixedly installed on the adjustment disk (401). The positioning rods (403) are threaded with a first positioning knob (404) that can be inserted into the polishing wheel (10).

7. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 2, characterized in that: The rotation control component (502) includes a movable frame (5021) slidably connected to the guide rod (201). The movable frame (5021) is connected to a movable block (5023) via a hinged connecting rod (5022). A round rod (5024) that slides into the sleeve (202) is fixedly installed on one side of the movable block (5023). A rocker arm (5025) is fixedly connected to a set of the frame rods (203). A limiting groove (5026) for the rocker arm (5025) to slide is provided in the movable frame (5021).

8. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 7, characterized in that: The push-pull component (501) includes a movable disk (5011) that is slidably mounted on the polishing wheel (10) along the axial direction. The movable disk (5011) is threaded with a plurality of second positioning knobs (5012) that can be inserted into the polishing wheel (10).

9. The high-stability polishing device for combat boots, training shoes, and leather shoes according to claim 8, characterized in that: The radial sliding fit includes a guide rail (5013) provided inside the movable disk (5011), and the movable block (5023) is radially slidably installed inside the guide rail (5013) along the movable disk (5011).

10. A high-stability polishing process for combat boots, training shoes, and leather shoes, implemented using the high-stability polishing device for combat boots, training shoes, and leather shoes as described in any one of claims 1-9, characterized in that... The high-stability polishing process for combat boots, training shoes, and leather shoes includes the following steps: S1. Install the first polishing surface of the double-sided polishing assembly (30) to the outer working position, drive the polishing wheel (10) to rotate through the rotating shaft (11), and use the first polishing surface to perform preliminary polishing or decontamination treatment on the shoe surface; S2. When it is necessary to switch the polishing surface, start the expansion and contraction adjustment component (40) to drive multiple expansion and contraction components (20) to slide radially outward along the polishing wheel (10) until the distance between two adjacent sets of double-sided polishing components (30) increases to the flip-over avoidance position; S3. Axial sliding push-pull component (501), using its linkage with rotation control component (502), drives multiple sets of double-sided polishing components (30) to rotate synchronously, so that the second polishing surface originally located on the inner side is rotated to the outer side, realizing the interchange of positions of different colored shoe polish or polishing surfaces of different materials. S4. Restart the expansion and contraction adjustment component (40) to drive multiple expansion and contraction components (20) to retract radially inward, so that multiple sets of double-sided polishing components (30) come close to each other to a tight fit, so as to restore the high stability of the rotary polishing station. S5. Use the second polishing surface after switching to continue polishing the shoe surface accordingly. Through the physical isolation and rapid switching of the two sets of polishing surfaces, step polishing of materials with different hardness or anti-cross-contamination polishing of shoe polish of different colors can be achieved.

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