Maintenance system and maintenance methods

Abstract

According to this disclosure, a maintenance system and method suitable for vertical maintenance can be provided. One embodiment of the maintenance system includes a track, a work robot, and a self-propelled trolley. The track is fixed to the outer side of a substrate processing apparatus having processing units and extends vertically. The work robot can be loaded and unloaded relative to the track and can move up and down along the track. The self-propelled trolley transports the work robot. The work robot has an arm capable of entering the interior of the processing unit.

Description

Technical Field

[0001] This disclosure relates to maintenance systems and maintenance methods. Background Technology

[0002] Patent Document 1 discloses a substrate processing apparatus having multiple stacked processing blocks. Each processing block has multiple processing modules arranged in a stacked manner.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 2022-83851 Summary of the Invention

[0006] The problem the invention aims to solve

[0007] As a device for automating the maintenance of a substrate processing apparatus, for example, a maintenance apparatus is considered that includes a robot, a lifting axis for lifting the robot, and a moving mechanism for moving the robot and the lifting axis to the substrate processing apparatus.

[0008] However, in such a maintenance device, when maintenance is performed at a relatively high position in the vertical direction, the center of gravity of the maintenance device becomes higher, which makes the robot prone to swaying and may reduce the robot's working accuracy.

[0009] The aforementioned problems are not limited to substrate processing apparatuses that have multiple processing blocks (processing modules) stacked on top of each other; they can also occur in general substrate processing apparatuses. For example, in substrate processing apparatuses with processing modules that have relatively large dimensions in the vertical direction, the aforementioned problems may occur even if the processing modules are a single-level structure. In addition, the aforementioned problems may also occur when processing modules are stacked on top of components other than processing modules, such as exhaust systems or power supply systems.

[0010] This disclosure provides a maintenance system and method suitable for vertical maintenance.

[0011] Solution for solving the problem

[0012] One aspect of the maintenance system disclosed herein includes a track, a work robot, and a self-propelled trolley. The track is fixed to the outer side of a substrate processing device having processing units and extends vertically. The work robot can be loaded and unloaded relative to the track and can move up and down along the track. The self-propelled trolley transports the work robot. The work robot has an arm capable of entering the interior of the processing unit.

[0013] The effects of the invention

[0014] According to this disclosure, a maintenance system and maintenance method suitable for vertical maintenance can be provided. Attached Figure Description

[0015] Figure 1 This is a top view showing an example of the structure of the substrate processing apparatus and maintenance system according to the first embodiment.

[0016] Figure 2 This is a perspective view showing an example of the structure of the maintenance system according to the first embodiment.

[0017] Figure 3 This is a side view showing a maintenance situation performed by the maintenance system of the first embodiment.

[0018] Figure 4 This is a top view showing an example of the structure of the substrate processing apparatus and maintenance system according to the second embodiment.

[0019] Figure 5 This is a side view showing a maintenance situation performed by the maintenance system of the second embodiment.

[0020] Figure 6 This is a side view showing a maintenance situation performed by the maintenance system of the third embodiment.

[0021] Figure 7 This is a top view used to illustrate the operation of the maintenance system according to the fourth embodiment.

[0022] Figure 8 This is a side view used to illustrate the operation of the maintenance system according to the fourth embodiment.

[0023] Figure 9 This is a top view used to illustrate the operation of the maintenance system according to the fifth embodiment.

[0024] Figure 10 This is a side view used to illustrate the operation of the maintenance system according to the fifth embodiment.

[0025] Explanation of reference numerals in the attached figures

[0026] 1. Substrate processing apparatus; 2. Liquid processing unit (an example of a processing unit); 3. Measuring unit (an example of a processing unit); 4. Drying unit (an example of a processing unit); 5. Supply unit; 6. Track; 7. Work robot; 8. Trolley; 9. Power supply line; 16. Frame; 61. Base part (an example of a second base part); 72. Base part (an example of a first base part); 63. Fixing part; 64. Protrusion part; 71. Arm; 75. Holding mechanism; 81, 611. Mounting surface; 82. Pressing part; 83. Claw part; 84. Plate; 85. Recess; 100A, 100B, 100C, 100D, 100E. Maintenance system; 300. Lifting mechanism; 400. Top conveying mechanism (an example of a conveying device); 410. Track; 420. Crane; 421. Arm; 614. Fixing pin; 615. Power receiving ring; 616. First terminal; 711. Holding part; 721. Pin hole; 722. Second terminal; 724. Protrusion; W. Wafer. Detailed Implementation

[0027] Hereinafter, the forms (hereinafter referred to as "implementations") of the maintenance system and maintenance method for implementing the present disclosure will be described in detail with reference to the accompanying drawings. However, the present disclosure is not limited to these embodiments. Furthermore, the various embodiments can be appropriately combined without contradicting the processing content. In the following embodiments, the same reference numerals are used to label the same parts, and repeated descriptions are omitted.

[0028] Furthermore, in the embodiments shown below, there are instances where representations such as "orthogonal" or "parallel" are used, but these representations do not need to be strictly "orthogonal" or "parallel". That is, the above-described representations allow for deviations in, for example, manufacturing precision, setting precision, etc.

[0029] <First Implementation Method>

[0030] (Structure of the substrate processing device)

[0031] First, refer to Figure 1 The structure of the substrate processing apparatus 1 according to the first embodiment will be described. Figure 1 This is a top view showing an example of the structure of the substrate processing apparatus 1 and the maintenance system 100A according to the first embodiment.

[0032] like Figure 1 As shown, the substrate processing apparatus 1 includes an infeed / outfeed station 11 and a processing station 12. The infeed / outfeed station 11 and the processing station 12 are arranged adjacent to each other.

[0033] The delivery station 11 includes a carrier placement section 111 and a conveying section 112. The carrier placement section 111 holds multiple carriers C that hold multiple semiconductor wafers W (hereinafter referred to as "wafers W") in a horizontal position.

[0034] The conveying section 112 is arranged adjacent to the carrier placement section 111. The conveying device 113 and the transfer section 114 are arranged inside the conveying section 112.

[0035] The transport device 113 is equipped with a wafer holding mechanism for holding the wafer W. In addition, the transport device 113 is capable of moving in the horizontal and vertical directions and rotating about the vertical axis, and uses the wafer holding mechanism to transport the wafer W between the carrier C and the junction 114.

[0036] The junction 114 temporarily holds the wafer W.

[0037] The processing station 12 is arranged adjacent to the conveying unit 112. The processing station 12 includes a conveying block 13, a first processing block 14, and a second processing block 15.

[0038] The transfer block 13 includes a transfer area 131 and a transfer device 132. The transfer area 131 is, for example, a cuboid-shaped area extending along the arrangement direction (X-axis direction) of the feed-in / feed-out station 11 and the processing station 12. The transfer device 132 is arranged in the transfer area 131.

[0039] The transport device 132 includes a wafer holding mechanism 132a for holding the wafer W. In addition, the transport device 132 is capable of moving in the horizontal and vertical directions and rotating about the vertical axis, and uses the wafer holding mechanism 132a to transport the wafer W between the junction 114, the first processing block 14 and the second processing block 15.

[0040] The first processing block 14 and the second processing block 15 are arranged adjacent to the conveying area 131 on both sides of the conveying area 131. As an example, the first processing block 14 is arranged on one side (positive Y-axis side) of the conveying area 131 in a direction orthogonal to the arrangement direction (X-axis direction) of the inlet / outlet station 11 and the processing station 12. The second processing block 15 is arranged on the other side (negative Y-axis side) of the conveying area 131 in a direction orthogonal to the arrangement direction (X-axis direction) of the inlet / outlet station 11 and the processing station 12.

[0041] The first processing block 14 and the second processing block 15 can also be configured as multiple layers along the vertical direction (see reference). Figure 3 For example, in the substrate processing apparatus 1 of the first embodiment, the first processing block 14 and the second processing block 15 are each configured as three layers. Furthermore, the number of layers in these plurality of processing blocks is not particularly limited.

[0042] The transfer of wafer W between the first processing block 14 and the second processing block 15 and the junction 114 can also be performed by a transfer device 132 disposed in the transfer block 13.

[0043] The first processing block 14 may also have a first region 141 and a second region 142 along the X-axis direction. In addition, the second processing block 15 may also have a third region 151 and a fourth region 152 along the X-axis direction.

[0044] Alternatively, multiple (two in this case) liquid treatment units 2 (an example of a treatment unit) can be configured in the first region 141 and the second region 142 respectively. Figure 1 As shown, multiple liquid processing units 2 are arranged, for example, along the X-axis direction.

[0045] Alternatively, a measuring unit 3 (an example of a processing unit), a drying unit 4 (an example of a processing unit), and a supply unit 5 can be configured in the third region 151 and the fourth region 152, respectively. The measuring unit 3 can also be configured on top of the drying unit 4 (see reference). Figure 3 The measuring unit 3, drying unit 4, and supply unit 5 can also be arranged along the X-axis.

[0046] Liquid processing unit 2 performs cleaning treatment on the patterned surface, i.e., the upper surface, of wafer W. In addition, liquid processing unit 2 performs liquid film formation treatment by supplying IPA (isopropanol) liquid to the upper surface of the cleaned wafer W to form a liquid film.

[0047] The measuring unit 3 can also measure the weight of the wafer W before and after the liquid film formation process, for example. Then, the control unit 201, which will be described later, can calculate the amount of liquid film formed on the upper surface of the wafer W by the liquid film formation process based on the weight of the wafer W before and after the liquid film formation process measured by the measuring unit 3.

[0048] Drying unit 4 performs a drying process on the wafer W after the liquid film formation process. Specifically, drying unit 4 dries the wafer W by contacting it with a supercritical processing fluid. This drying process suppresses the collapse of the pattern formed on the upper surface of the wafer W and dries the wafer W.

[0049] The supply unit 5 supplies a processing fluid to the drying unit 4. This processing fluid may be, for example, CO2. The supply unit 5 may also include a supply device assembly comprising a flow meter, a flow regulator, a back pressure valve, a heater, etc., and a housing for housing the supply device assembly.

[0050] Furthermore, the processing units included in the substrate processing apparatus 1 are not limited to the liquid processing unit 2, the measurement unit 3, and the drying unit 4. The substrate processing apparatus 1 may also include other processing units for processing the wafer W. In addition, in the following description, the liquid processing unit 2, the measurement unit 3, and the drying unit 4 will sometimes not be specifically distinguished, and will be described simply as "processing units".

[0051] The substrate processing apparatus 1 includes a control device 200. The control device 200 is, for example, a computer, and includes a control unit 201 and a storage unit 202.

[0052] The control unit 201 includes a microcomputer with a CPU (Central Processing Unit), ROM (Read-Only Memory), RAM (Random Access Memory), input / output ports, and various circuits. The CPU of this microcomputer reads and executes programs stored in the ROM to control the conveying devices 113 and 132, the liquid treatment unit 2, the drying unit 4, the supply unit 5, and the robot 7 described later.

[0053] Furthermore, the program can also be stored on a computer-readable storage medium and loaded from that storage medium into the storage unit 202 of the control device 200. Examples of computer-readable storage media include hard disks (HD), floppy disks (FD), optical disks (CD), magneto-optical disks (MO), and memory cards.

[0054] The storage unit 202 is implemented, for example, by semiconductor memory elements such as RAM and flash memory, or storage devices such as hard disks and optical disks.

[0055] (The structure of the maintenance system)

[0056] Next, refer to Figure 1 The structure of the maintenance system 100A according to the first embodiment will be described. For example... Figure 1 As shown, the maintenance system 100A performs maintenance on the substrate processing device 1. The maintenance system 100A includes a track 6, a work robot 7, and a trolley 8.

[0057] Track 6 has a shape that extends vertically (see reference). Figure 3 ).like Figure 1 As shown, in the first embodiment, the track 6 is fixed to the outer side of the substrate processing apparatus 1. The number of tracks 6 fixed to the substrate processing apparatus 1 may be, for example, four.

[0058] like Figure 1 As shown, in the first embodiment, four tracks 6 are respectively positioned adjacent to the first region 141, the second region 142, the third region 151, and the fourth region 152. Furthermore, the number and position of the tracks 6 fixed to the outer side of the substrate processing apparatus 1 are not particularly limited.

[0059] The work robot 7 can be loaded and unloaded relative to the track 6. Furthermore, the work robot 7, mounted on the track 6, can move up and down along the track 6. Additionally, the work robot 7 has an arm 71 capable of entering the interior of the processing unit. The work robot 7 moves up and down along the track 6 to the height of the processing unit containing the object to be maintained, and uses the arm 71 to perform maintenance on the processing unit. For a detailed description of the structure of the work robot 7, please refer to... Figure 2 To be described later.

[0060] The trolley 8 is a self-propelled trolley. In the first embodiment, the trolley 8 transports the working robot 7 to the track 6. Alternatively, the trolley 8 transports the working robot 7 unloaded from the track 6 to a designated waiting area.

[0061] The trolley 8 in the first embodiment may also have a transfer mechanism for transferring the work robot 7 to the base 61 of the track 6 (described later). By using this transfer mechanism, the trolley 8 can load and unload the work robot 7 relative to the track 6. For a detailed description of the trolley 8, please refer to... Figure 2 To be described later.

[0062] Next, refer to Figure 2 The structure of the maintenance system 100A according to the first embodiment will be described in detail. Figure 2 This is a perspective view showing an example of the structure of the maintenance system 100A according to the first embodiment. As described above, the maintenance system 100A includes a track 6, a work robot 7, and a trolley 8.

[0063] like Figure 2 As shown, the track 6 may also have a base portion 61 (an example of a second base portion) that can be raised and lowered along the track 6. The base portion 72 of the working robot 7, which will be described later, is mounted on the base portion 61. By raising and lowering the base portion 61 along the track 6, the working robot 7 can be raised and lowered in the vertical direction.

[0064] The base portion 61 in the first embodiment may also have a mounting surface 611, a first wall surface 612, and a second wall surface 613. In addition, the base portion 61 in the first embodiment may also have a movable fixing pin 614, a power receiving ring 615, a first terminal 616, and a guide groove 617.

[0065] The mounting surface 611 is the surface on which the base portion 72 of the work robot 7 (described later) is mounted. The first wall surface 612 is a surface orthogonal to the outer wall of the substrate processing apparatus 1, extending from the mounting surface 611 in the Z-axis direction. Figure 2 In the example shown, the first wall surface 612 abuts against the side surface of the base portion 72 in the negative X-axis direction.

[0066] The second wall surface 613 is a surface parallel to the outer wall of the substrate processing apparatus 1, extending from the mounting surface 611 toward the Z-axis direction. Figure 2 In the example shown, the second wall surface 613 abuts against the side surface of the base portion 72 in the positive Y-axis direction, which will be described later.

[0067] The base portion 61 may also have a movable fixing pin 614. The fixing pin 614 may also be located on the mounting surface 611. For example, the fixing pin 614 may be able to move up and down under the control of the control unit 201, and protrude from the mounting surface 611 as needed.

[0068] Alternatively, the base portion 61 may also have a power receiving ring 615. The power receiving ring 615 may also be provided on the side of the base portion 61 in the negative X-axis direction. The power supply line 9, described later, passes through the power receiving ring 615. The power receiving ring 615 is able to receive power from the power supply line 9.

[0069] Alternatively, the base portion 61 may also have a first terminal 616 electrically connected to the power receiving ring 615. The first terminal 616 is connected to the second terminal 722 of the working robot 7, which will be described later. The first terminal 616 may also be located on the first wall surface 612, for example. According to the above structure, power can be supplied to the working robot 7 from the power receiving ring 615 via the first terminal 616.

[0070] Alternatively, the base portion 61 may also have a guide groove 617 on the mounting surface 611. For example... Figure 2 As shown, the top view of the guide groove 617 can be, for example, a triangular shape that tapers towards the negative X-axis direction. The guide groove 617 can also be formed by cutting a triangular shape from the end of the mounting surface 611 on the positive X-axis direction towards the center of the mounting surface 611.

[0071] Furthermore, the number of base sections 61 on the track 6 can be multiple. With this structure, multiple work robots 7 can be mounted on one track 6. Therefore, the operational efficiency of the maintenance system 100A can be improved.

[0072] The power supply line 9 extends along the track 6. The power supply line 9 can also be electrically connected to the substrate processing apparatus 1. The power supply line 9 passes through the power receiving ring 615 in a non-contact manner. According to this structure, power can be supplied from the substrate processing apparatus 1 to the power receiving ring 615 via the power supply line 9.

[0073] Specifically, the receiving ring 615 and the power supply line 9 function as a contactless power supply mechanism. More specifically, the receiving ring 615 can generate an induced electromotive force through the vibrating magnetic field formed around the axis of the power supply line 9. Thus, power can be supplied to the receiving ring 615 from the substrate processing apparatus 1 via the power supply line 9 without contact.

[0074] According to this structure, power can be supplied to the robot 7 even without connecting a power cable or the like. Therefore, the risk of the power cable getting tangled in the lifting robot 7 or the like can be reduced.

[0075] Furthermore, the power supply line 9 may be constructed, for example, from a cable through which alternating current flows. Alternatively, the power supply line 9 may be constructed from a rod-shaped conductor through which alternating current flows.

[0076] The work robot 7 may also have an arm 71, a base 72 (an example of a first base), a maintenance component 73, and a retaining plate 74.

[0077] The arm 71 may also be a multi-joint arm. The arm 71 may also have a gripping part 711 at its top for gripping the maintenance member 73. The arm 71 may be provided on the upper part of the base part 72. The arm 71 is capable of moving the gripping part 711 in multiple directions with the base part 72 as a fulcrum.

[0078] Arm 71 enters the interior of the processing unit to perform maintenance on the processing unit. Specifically, gripping part 711 enters the interior of the processing unit, and maintenance member 73 held by gripping part 711 is used to perform maintenance on the processing unit.

[0079] The maintenance component 73 may be, for example, a cleaning component. In this case, the robot 7 can use the cleaning component to clean the processing unit. Alternatively, the maintenance component 73 may be, for example, a component constituting the processing unit. In this way, the robot 7 can also perform component replacement of the processing unit. In addition, a retaining plate 74 for mounting the maintenance component 73 may be provided on the upper surface of the base portion 72.

[0080] The base portion 72 may have a cuboid shape, for example. As described above, an arm 71 may also be provided on the upper part of the base portion 72. The base portion 72 is placed on the mounting surface 611 of the base portion 61. The base portion 72 may also have a pin hole 721, a second terminal 722, and a protrusion 723. In addition, the shape of the base portion 72 is not particularly limited.

[0081] The pin hole 721 can also be located on the bottom surface of the base portion 72. The fixing pin 614 of the base portion 61 is inserted into the pin hole 721. In this way, the working robot 7 can be connected to the track 6.

[0082] The second terminal 722 may also be located on the side of the base portion 72 in the negative X-axis direction. The second terminal 722 is connected to the first terminal 616 of the base portion 61. Thus, power can be supplied to the working robot 7 from the power receiving ring 615 via the first terminal 616 and the second terminal 722.

[0083] Furthermore, the first terminal 616, the second terminal 722, and the track 6 can also have communication functions. According to this structure, the actions of the work robot 7 can be controlled under the control of the control unit 201.

[0084] Furthermore, the work robot 7 can also perform maintenance actions autonomously. In this case, the work robot 7 may, for example, have a computer built into the base 72 for controlling its movements.

[0085] The protrusion 723 is located on the bottom surface of the base portion 72. The protrusion 723 may also have a triangular shape that is substantially the same as the guide groove 617 of the base portion 61. As will be described in detail later, according to this structure, the base portion 72 can be easily mounted on the base portion 61 of the track 6.

[0086] The trolley 8 transports the work robot 7. The trolley 8 is capable of autonomous movement. The trolley 8 in the first embodiment may also have a mounting surface 81 for carrying the work robot 7. In addition, the trolley 8 in the first embodiment may also have a pressing part 82 and a claw part 83 as a transfer mechanism for transferring the work robot 7 to the base part 61 of the track 6.

[0087] The pressing part 82 is provided, for example, in a manner that abuts against the base part 72 placed on the mounting surface 81 from a horizontal direction. Figure 2 As shown, the pressing part 82 can also be a plate having a plane orthogonal to the X-axis. This plate can also be mounted on the claw part 83, which will be described later. By pressing the working robot 7 with the pressing part 82, the transfer mechanism can transfer the working robot 7 to the base part 61 of the track 6. Furthermore, the specific operation of the transfer mechanism will be described later.

[0088] The claw 83 is provided, for example, to abut against the base 72 placed on the mounting surface 81 from the vertical direction upwards. Specifically, the claw 83 may protrude from the mounting surface 81 in the vertical direction upwards, or it may be in the shape of an inverted L when viewed from the Y-axis direction. The transfer mechanism can unload the work robot 7 from the base 61 of the track 6 by pulling the work robot 7 using the claw 83.

[0089] like Figure 2 As shown, the plate 84 can also be located between the mounting surface 81 and the base portion 72. The plate 84 can also be made of a self-lubricating resin. Examples of self-lubricating resins include Teflon (registered trademark). Specifically, as described later, by providing the plate 84 on the trolley 8, the working robot 7 can be smoothly transferred to the base portion 61 of the track 6.

[0090] (Regarding the operation of the transfer mechanism)

[0091] Next, refer to Figure 2 The operation of the above-mentioned transfer mechanism will be explained in more detail.

[0092] The transfer mechanism uses the pressing part 82 to press the base part 72 in a direction parallel to the outer wall of the substrate processing device 1, thereby moving the work robot 7 from the mounting surface 81 of the trolley 8 to the mounting surface 611 of the base part 61. For example, in Figure 2 In the example shown, the transfer mechanism moves the robot 7 in the negative X-axis direction.

[0093] At this time, the transfer mechanism moves the working robot 7 so that the position of the pin hole 721 of the base part 72 aligns with the position of the fixing pin 614 of the base part 61. Then, after the working robot 7 has moved, the fixing pin 614 rises from the mounting surface 611 and inserts into the pin hole 721. Thus, the working robot 7 engages with the track 6.

[0094] As described above, the base portion 61 may also have a guide groove 617. Additionally, as described above, the base portion 72 may also have a protrusion 723. According to this structure, for example in… Figure 2 In the example shown, even when the base portion 72 is inserted in a state that is offset relative to the base portion 61 in the Y-axis direction, the two can be properly aligned.

[0095] Specifically, by guiding the protrusion 723 using the guide groove 617 while transferring the base portion 72 to the base portion 61, the two can be connected while appropriately adjusting the position of the base portion 72 relative to the base portion 61. Therefore, according to this structure, the accuracy of the feeding position of the work robot 7 fed in by the trolley 8 can be improved.

[0096] The transfer mechanism uses a claw 83 to pull the base 72 along a direction parallel to the outer wall of the substrate processing apparatus 1, thereby moving the work robot 7 from the mounting surface 611 to the mounting surface 81. For example, in Figure 2 In the example shown, the transfer mechanism moves the robot 7 in the positive X-axis direction.

[0097] Thus, by utilizing the trolley 8, which has a pressing part 82 and a claw part 83 as a transfer mechanism, the robot 7 can be loaded and unloaded relative to the base part 61 of the track 6 using the driving force of the trolley 8. Therefore, the mechanism for loading and unloading the robot 7 relative to the track 6 can be simplified.

[0098] Furthermore, as described above, when loading and unloading the robot 7 relative to the base portion 61, by moving the robot 7 along a direction parallel to the outer wall of the substrate processing apparatus 1, the application of pressing or pulling forces to the substrate processing apparatus 1 can be reduced. This reduces the possibility of adverse effects on the substrate processing apparatus 1.

[0099] As described above, the sheet 84 made of self-lubricating resin can also be located between the base portion 72 and the mounting surface 81. With this structure, friction generated between the base portion 61 and the base portion 72 can be reduced when the work robot 7 is transferred to the base portion 61. Therefore, the work robot 7 can be smoothly transferred to the base portion 61.

[0100] (Regarding maintenance procedures)

[0101] Next, refer to Figure 3 The operation of the maintenance system 100A when maintaining the substrate processing apparatus 1 will be explained. Figure 3 This is a side view showing a case where maintenance is performed using the maintenance system 100A of the first embodiment. Furthermore, in Figure 3 The image shows an example of a work robot 7 performing maintenance on a processing unit located in the third area 151 of the second processing block 15.

[0102] During maintenance of the processing unit, firstly, the work robot 7 moves up and down on the track 6 to a designated work position. Specifically, the designated work position may be a position opposite to the processing unit in the third area 151, which is the object of maintenance. Then, the work robot 7, positioned at the work position, moves the gripping part 711 of its arm 71 into the interior of the processing unit and performs maintenance on the processing unit using the maintenance component 73.

[0103] In addition, although Figure 3 Although the illustration is omitted, openings for the arm 71 to enter can be provided on the side of the substrate processing apparatus 1 and the side of the processing unit. These openings can be controlled by the control unit 201, for example.

[0104] Furthermore, maintenance of the processing units located in the first area 141, the second area 142, and the fourth area 152 is performed by a work robot 7, which is installed on tracks 6 located adjacent to the first area 141, the second area 142, and the fourth area 152, respectively. The work robot 7 is also transported to its respective track 6 by a trolley 8.

[0105] According to the maintenance system 100A of the first embodiment, by mounting the work robot 7 on the track 6 fixed to the substrate processing apparatus 1, the work robot 7 can be integrated with the substrate processing apparatus 1. As a result, problems such as shaking of the work robot 7 can be reduced.

[0106] For example, when a maintenance robot has a lifting mechanism, its center of gravity rises when maintenance is performed at a relatively high position in the vertical direction, making it prone to swaying. If the robot sways, its operational accuracy may decrease.

[0107] On the other hand, when the work robot 7 and the substrate processing device 1 are integrated, the substrate processing device 1 is relatively heavy, thus the center of gravity of the integrated work robot 7 and substrate processing device 1 is stable. Therefore, according to the maintenance system 100A of the first embodiment, the shaking of the work robot 7 can be reduced, thereby improving the accuracy of the work robot 7 in maintaining the processing unit.

[0108] <Second Implementation Method>

[0109] Next, refer to Figure 4 and Figure 5 The structure of the maintenance system 100B according to the second embodiment will be described. Figure 4 This is a top view showing an example of the structure of the substrate processing apparatus 1 and maintenance system 100B according to the second embodiment. Figure 5 This is a side view showing the maintenance situation of the maintenance system 100B according to the second embodiment.

[0110] As described above, in the first embodiment, an example was given where the track 6 is fixed to the outer side of the substrate processing apparatus 1. On the other hand, as... Figure 4 As shown, in the second embodiment, the track 6 can also be mounted and detached relative to the substrate processing device 1.

[0111] The maintenance system 100B of the second embodiment includes a track 6, a work robot 7 mounted on the track 6, and a trolley 8. In the second embodiment, the trolley 8 transports the track 6 on which the work robot 7 is mounted to the outer side of the substrate processing apparatus 1. Alternatively, in the second embodiment, the track 6 may be fixed relative to the trolley 8.

[0112] like Figure 5 As shown, a fixing part 63 for fixing the track 6 to the substrate processing apparatus 1 may also be provided on the upper part of the track 6 in the second embodiment. The fixing part 63 may be, for example, a movable hook. The fixing part 63 may also be connected to, for example, a frame (not shown) provided on the outer wall of the substrate processing apparatus 1. With this structure, the track 6 transported by the trolley 8 can be easily fixed to the substrate processing apparatus 1.

[0113] like Figure 4 As shown, in the second embodiment, track 6 can also be configured adjacent to the first region 141, the second region 142, the third region 151, or the fourth region 152. For example, in Figure 4 In this configuration, track 6 is positioned adjacent to the third region 151. Furthermore, the mounting position of track 6 relative to the substrate processing apparatus 1 is not particularly limited.

[0114] like Figure 4As shown, the trolley 8 in the second embodiment may also have a recess 85, which, when viewed from a vertical direction, is recessed from the outer side of the trolley 8 and extends through the trolley 8 in the vertical direction. Furthermore, when viewed from a vertical direction, the track 6 and the working robot 7 may also be located inside the recess 85.

[0115] According to this structure, compared to the case where the trolley 8 does not have the recess 85, the work robot 7 can descend further along the track 6. Therefore, even the processing unit located at the lower part of the substrate processing device 1 can be properly maintained by the work robot 7.

[0116] According to the maintenance system 100B of the second embodiment, by fixing the track 6 on which the work robot 7 is mounted to the substrate processing device 1, the work robot 7 can be integrated with the substrate processing device 1. Therefore, similar to the maintenance system 100A of the first embodiment, the shaking of the work robot 7 can be reduced, thereby improving the accuracy of the work robot 7 in maintaining the processing unit.

[0117] <Third Implementation Method>

[0118] Next, refer to Figure 6 The substrate processing apparatus 1 and maintenance system 100C of the third embodiment will be described. Figure 6 This is a side view showing the maintenance situation of the maintenance system 100C according to the third embodiment.

[0119] like Figure 6 As shown, the substrate processing apparatus 1 of the third embodiment may also include a frame 16. For example... Figure 6 As shown, the frame 16 can also be provided on the outer wall surface of the substrate processing apparatus 1 in such a way as to be along the edges of the first processing block 14 and the second processing block 15.

[0120] like Figure 6 As shown, the maintenance system 100C of the third embodiment may also include a lifting mechanism 300 for raising and lowering the work robot 7 in the vertical direction instead of the track 6. In addition, the work robot 7 of the third embodiment may also have a holding mechanism 75 for holding the frame 16 of the substrate processing device 1.

[0121] The lifting mechanism 300 positions the work robot 7 at a predetermined work position by raising and lowering it along the vertical direction. Alternatively, the lifting mechanism 300 may be, for example, a crane attached to the substrate processing device 1.

[0122] The gripping mechanism 75 can also be provided on the base 72 of the robot 7. The gripping mechanism 75 grips the frame 16 when the robot 7 is positioned in the specified working position.

[0123] According to the maintenance system 100C of the third embodiment, the work robot 7 can be fixed to the substrate processing device 1 by using the holding mechanism 75 to hold the frame 16. Therefore, similar to the maintenance systems 100A and 100B described above, the shaking of the work robot 7 can be reduced, thereby improving the accuracy of the work robot 7 in maintaining the processing unit.

[0124] <Fourth Implementation Method>

[0125] Next, refer to Figure 7 and Figure 8 The maintenance system 100D of the fourth embodiment will be described. Figure 7 This is a top view used to illustrate the operation of the maintenance system 100D according to the fourth embodiment. Figure 8 This is a side view used to illustrate the operation of the maintenance system 100D according to the fourth embodiment.

[0126] In the first embodiment described above, an example was given where a trolley 8 was used to transport the work robot 7 to a position on the track 6 fixed to the outer side of the substrate processing apparatus 1. On the other hand, as... Figure 7 As shown, in the fourth embodiment, a top conveying mechanism 400 (an example of a conveying device) that is separately provided from the substrate processing device 1 can also be used instead of the trolley 8 to transport the work robot 7 to the position of the track 6.

[0127] like Figure 7 As shown, the top conveying mechanism 400 may also have, for example, a top track 410 disposed above the substrate processing device 1 and a crane 420 capable of moving along the track 410.

[0128] like Figure 7 As shown, when viewing the top conveying mechanism 400 from a vertical perspective, the track 410 can also be configured in a grid pattern, for example. Figure 7 In the diagram, track 410 is roughly represented by a black line. With the work robot 7 held by the crane 420, the top conveying mechanism 400 can move the work robot 7 horizontally (parallel to the XY plane) by moving the crane 420 along track 410. Furthermore, the configuration of track 410 is not limited to... Figure 7 The example shown.

[0129] like Figure 8 As shown, the crane 420 may also have an arm 421 capable of lifting and lowering along the vertical direction. When the crane 420 is holding the work robot 7 with the arm 421, the arm 421 is lifted and lowered in the vertical direction (Z-axis direction), thereby enabling the work robot 7 to move in the vertical direction.

[0130] like Figure 8As shown, the work robot 7 of the fourth embodiment may also have a protrusion 724 held by the arm 421 of the crane 420. The protrusion 724 is provided, for example, in a manner that protrudes from the side of the base portion 72. For example, in Figure 8 In the example shown, the base portion 72 has protrusions 724 on the side surface on the positive Y-axis direction and on the side surface on the negative Y-axis direction.

[0131] Thus, by providing the protrusion 724 to the work robot 7, the work robot 7 can be moved using a conveying device such as the top conveying mechanism 400.

[0132] In the fourth embodiment, the top conveying mechanism 400 transports the work robot 7 to the position of the substrate processing apparatus 1 as follows: First, the crane 420 holds (holds) the work robot 7 in a predetermined standby position (not shown). Then, the crane 420 moves horizontally along the track 410 and is positioned above the track 6 (see reference 1). Figure 7 Next, the crane 420 lowers its arm 421, thereby placing the work robot 7 onto the base 61 of the track 6 (see reference). Figure 8 Next, the fixing pin 614 of the base part 61 is inserted into the pin hole 721 of the base part 72, and the working robot 7 is installed on the track 6.

[0133] According to the maintenance system 100D of the fourth embodiment, by mounting the work robot 7 on the track 6 fixed to the substrate processing device 1, the work robot 7 can be integrated with the substrate processing device 1. Therefore, similar to the maintenance system 100A of the first embodiment, the shaking of the work robot 7 can be reduced, thereby improving the accuracy of the work robot 7 in maintaining the processing unit.

[0134] Furthermore, the track 6 in the fourth embodiment can also be detached from the substrate processing apparatus 1. That is, the track 6 in the fourth embodiment can also have the aforementioned fixing part 63 on its upper part. In this case, the track 6 can also be transported to the position of the substrate processing apparatus 1 by the trolley 8. Thus, the maintenance system 100D of the fourth embodiment can also be a specification in which the track 6 is transported by the trolley 8 and the work robot 7 is transported by the top transport mechanism 400.

[0135] <Fifth Implementation Method>

[0136] Next, refer to Figure 9 and Figure 10 The maintenance system 100E of the fifth embodiment will be described. Figure 9 This is a top view used to illustrate the operation of the maintenance system 100E according to the fifth embodiment. Figure 10 This is a side view used to illustrate the operation of the maintenance system 100E according to the fifth embodiment.

[0137] In the second embodiment described above, an example was given of using a trolley 8 to transport the track 6, on which the work robot 7 is mounted, to the outer side of the substrate processing apparatus 1. On the other hand, as... Figure 9 As shown, in the fifth embodiment, the top conveying mechanism 400 described above can also be used instead of the trolley 8 to transport the track 6 on which the work robot 7 is mounted to the outer side of the substrate processing device 1.

[0138] like Figure 9 As shown, with the top conveying mechanism 400 holding the track 6 in place using the crane 420, the track 6 can be moved horizontally (in a direction parallel to the XY plane) by moving the crane 420 along the track 410. Furthermore, with the crane 420 holding the track 6 using the arm 421, the track 6 can be moved vertically by raising and lowering the arm 421 in the vertical direction (Z-axis direction).

[0139] like Figure 10 As shown, the track 6 in the fifth embodiment may also have the aforementioned fixing part 63 on its upper part. Additionally, the track 6 in the fifth embodiment may also have a protrusion 64 that is held by the arm 421 of the crane 420. The protrusion 64 may, for example, be provided on the upper part of the track 6 in a manner that protrudes from the side of the track 6.

[0140] Thus, by providing a protrusion 64 on the track 6, the work robot 7 can be transported using a conveying device such as a top conveying mechanism 400.

[0141] In the fifth embodiment, the top conveying mechanism 400 moves the track 6 to the outer side of the substrate processing apparatus 1 as follows: First, the crane 420 holds the track 6 in a predetermined standby position (not shown). Then, the crane 420 moves horizontally along the track 410 and is positioned in a predetermined position (see reference 1). Figure 9 The specified location mentioned here can also be, for example, such as... Figure 9 The position shown is adjacent to the third region 151 when viewed from above the substrate processing apparatus 1. Next, the crane 420 lowers its arm 421 to position the track 6 at the same height as the substrate processing apparatus 1. Then, the track 6 is fixed to the substrate processing apparatus 1 by means of the fixing part 63.

[0142] According to the maintenance system 100E of the fifth embodiment, by fixing the track 6 on which the work robot 7 is mounted to the substrate processing device 1, the work robot 7 can be integrated with the substrate processing device 1. Therefore, similar to the maintenance system 100B of the second embodiment, the shaking of the work robot 7 can be reduced, thereby improving the accuracy of the work robot 7 in maintaining the processing unit.

[0143] In addition, Figure 10 In the example shown, track 6 has a length that is the same as the height of substrate processing device 1, but the length of track 6 could also be the same as the height of the first processing block 14 and the second processing block 15. In this way, by using a shorter track 6, the top conveying mechanism 400 can efficiently transport track 6.

[0144] The present disclosure has been described in detail above, but it is not limited to the above-described embodiments. Various changes and improvements can be made without departing from the spirit of the present disclosure.

[0145] Furthermore, in the above embodiments, the substrate processing apparatus 1 has been described as having a structure of multiple processing blocks stacked in multiple layers, or in other words, a structure of multiple processing units stacked in multiple layers. However, the substrate processing apparatus 1 is not necessarily a structure having multiple processing blocks (processing modules) stacked in multiple layers. For example, the substrate processing apparatus 1 may also be a structure with a single-layer structure (in other words, a flat arrangement) having a processing module with a large vertical dimension. In addition, the substrate processing apparatus 1 may also be a structure in which processing modules are stacked on top of components other than processing modules, such as exhaust systems or power systems. That is, the substrate processing apparatus 1 may also be a structure in which exhaust systems or power systems are arranged in lower layers and processing units are arranged in upper layers.

[0146] The embodiments disclosed herein should be considered illustrative rather than restrictive in all respects. In fact, the above-described embodiments can be implemented in various ways. Furthermore, the above-described embodiments can be omitted, substituted, or modified in various ways without departing from the appended claims and their spirit.

[0147] In addition, this technology can also adopt the following structure. (1)

[0149] A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein,

[0150] This maintenance system has the following features:

[0151] The track is fixed to the outer side of the substrate processing device and extends in the vertical direction;

[0152] A work robot capable of loading and unloading relative to the track, and capable of moving up and down along the track; and

[0153] The self-propelled trolley transports the aforementioned work robot.

[0154] The robot has an arm that can enter the interior of the processing unit. (2)

[0156] According to the maintenance system described in (1) above, wherein,

[0157] The robot has a first base portion with pin holes.

[0158] The track has a second base portion that can move up and down along the track, and has a movable fixing pin that inserts into the pin hole.

[0159] The robot is connected to the track by inserting the fixing pin of the second base into the pin hole of the first base. (3)

[0161] According to the maintenance system described in (2) above, wherein,

[0162] The trolley has a transfer mechanism for transferring the working robot to the second base.

[0163] The transfer mechanism moves the working robot so that the position of the pin hole is aligned with the position of the fixing pin. (4)

[0165] According to the maintenance system described in (3) above, wherein,

[0166] The transfer mechanism has a pressing part that abuts against the first base portion of the working robot in a horizontal direction and a claw part that contacts the first base portion from the vertical direction.

[0167] The transfer mechanism uses the pressing part to move the working robot from the trolley to the second base part, and uses the claw part to move the working robot from the second base part to the trolley. (5)

[0169] According to the maintenance system described in (4) above, wherein,

[0170] The transfer mechanism uses the pressing part or the claw part to move the working robot along a direction parallel to the outer wall of the substrate processing device. (6)

[0172] According to any one of the maintenance systems described in (2) to (5) above, wherein,

[0173] This maintenance system has the following features:

[0174] A receiving ring is disposed on the second base portion;

[0175] A power supply line extends along the track and passes through the power receiving ring in a non-contact manner;

[0176] A first terminal, disposed on the second base portion, is electrically connected to the power receiving ring; and

[0177] The second terminal is disposed on the first base portion and is electrically connected to the first terminal. (7)

[0179] According to any one of the maintenance systems described in (2) to (6) above, wherein,

[0180] The track has multiple second base sections. (8)

[0182] A maintenance method, performed by a maintenance system, the maintenance system comprising:

[0183] The track is fixed to the outer side of the substrate processing device with processing units and extends in the vertical direction;

[0184] A work robot capable of loading and unloading relative to the track, having an arm capable of entering the interior of the processing unit; and

[0185] Self-propelled trolleys, among which,

[0186] The maintenance method includes:

[0187] The process of using the trolley to move the work robot onto the track;

[0188] The process of raising and lowering the robot along the track to a predetermined work position; and

[0189] The procedure of using the arm to maintain the processing unit at the work location. (9)

[0191] A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein,

[0192] This maintenance system has the following features:

[0193] The track, which is detachable relative to the substrate processing device, extends in a vertical direction;

[0194] A work robot, mounted on the track, capable of moving up and down along the track; and

[0195] The self-propelled trolley transports the aforementioned rails.

[0196] The robot has an arm that can enter the interior of the processing unit. (10)

[0198] According to the maintenance system described in (9) above, wherein,

[0199] A fixing part for fixing the track to the substrate processing device is provided on the upper part of the track. (11)

[0201] According to the maintenance system described in (9) or (10) above, wherein,

[0202] The trolley has a recess that, when viewed from a vertical direction, is recessed from the outer side towards the interior and extends through the trolley in the vertical direction.

[0203] The robot has a base, which is the component for mounting the arm and allows it to move up and down along the track.

[0204] When viewed from the vertical direction, the track and the base portion are located inside the recess. (12)

[0206] According to the maintenance system described in (11) above, wherein,

[0207] The track has multiple base sections. (13)

[0209] A maintenance method, performed by a maintenance system, the maintenance system comprising:

[0210] The track, which can be loaded and unloaded relative to the substrate processing device with processing units, extends in the vertical direction;

[0211] A work robot, mounted on the track, has an arm capable of entering the interior of the processing unit; and

[0212] Self-propelled trolleys, among which,

[0213] The maintenance method includes:

[0214] The process of using the trolley to transport the track to the substrate processing device;

[0215] The process of raising and lowering the robot along the track to a predetermined work position; and

[0216] The procedure of using the arm to maintain the processing unit at the work location. (14)

[0218] A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein,

[0219] This maintenance system has the following features:

[0220] A work robot having an arm capable of entering the interior of the processing unit and a gripping mechanism for holding the frame of the substrate processing device; and

[0221] A lifting mechanism that causes the robot to move up and down in a vertical direction. (15)

[0223] A maintenance method, performed by a maintenance system, the maintenance system comprising:

[0224] A work robot having an arm capable of entering the interior of a processing unit within a substrate processing apparatus and a gripping mechanism for holding the frame of the substrate processing apparatus; and

[0225] A lifting mechanism that causes the robot to move up and down vertically, wherein...

[0226] The maintenance method includes:

[0227] The process of using the lifting mechanism to raise and lower the robot to a predetermined working position; and

[0228] The process of maintaining the processing unit using the arm while the frame is held by the holding mechanism at the working position. (16)

[0230] A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein,

[0231] This maintenance system has the following features:

[0232] A track, fixed to the outer side of the substrate processing device, extends vertically; and

[0233] The work robot is capable of loading and unloading relative to the track, and can move up and down along the track, having an arm capable of entering the interior of the processing unit.

[0234] The robot is configured to be transported by a conveying device. (17)

[0236] According to the maintenance system described in (16) above, wherein,

[0237] The robot has a protrusion that is held by the arm of the conveying device. (18)

[0239] A maintenance method, performed by a maintenance system, the maintenance system comprising:

[0240] A track, fixed to the outer side of a substrate processing apparatus having processing units, extends vertically; and

[0241] The work robot, capable of loading and unloading relative to the track and of moving up and down along the track, has an arm capable of entering the interior of the processing unit and is configured to be transported by a conveying device, wherein...

[0242] The maintenance method includes:

[0243] The process of using the conveying device to move the working robot to the track;

[0244] The process of raising and lowering the robot along the track to a predetermined work position; and

[0245] The procedure of using the arm to maintain the processing unit at the work location. (19)

[0247] A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein,

[0248] This maintenance system has the following features:

[0249] Tracks, which are detachable relative to the substrate processing apparatus, extend vertically; and

[0250] The work robot, mounted on the track, is capable of moving up and down along the track and has an arm that can enter the interior of the processing unit.

[0251] The track is configured to be transported by a conveying device. (20)

[0253] According to the maintenance system described above (19), wherein,

[0254] The track has a protrusion that is held by the arm of the conveying device. (twenty one)

[0256] A maintenance method, performed by a maintenance system, the maintenance system comprising:

[0257] A track, capable of being loaded and detached relative to a substrate processing apparatus having processing units, extends vertically and is configured to be conveyed by a conveying device; and

[0258] The work robot, mounted on the track and capable of moving up and down along the track, has an arm that can enter the interior of the processing unit, wherein...

[0259] The maintenance method includes:

[0260] The process of using the conveying device to transport the track to the substrate processing device;

[0261] The process of raising and lowering the robot along the track to a predetermined work position; and

[0262] The procedure of using the arm to maintain the processing unit at the work location.

Claims

1. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein, This maintenance system has the following features: The track is fixed to the outer side of the substrate processing device and extends in the vertical direction; The work robot is capable of loading and unloading relative to the track and can move up and down along the track; as well as The self-propelled trolley transports the aforementioned work robot. The robot has an arm that can enter the interior of the processing unit.

2. The maintenance system according to claim 1, wherein, The robot has a first base portion with pin holes. The track has a second base portion that can move up and down along the track, and has a movable fixing pin that inserts into the pin hole. The robot is connected to the track by inserting the fixing pin of the second base into the pin hole of the first base.

3. The maintenance system according to claim 2, wherein, The trolley has a transfer mechanism for transferring the working robot to the second base. The transfer mechanism moves the working robot so that the position of the pin hole is aligned with the position of the fixing pin.

4. The maintenance system according to claim 3, wherein, The transfer mechanism has a pressing part that abuts against the first base portion of the working robot in a horizontal direction and a claw part that contacts the first base portion from the vertical direction. The transfer mechanism uses the pressing part to move the working robot from the trolley to the second base part, and uses the claw part to move the working robot from the second base part to the trolley.

5. The maintenance system according to claim 4, wherein, The transfer mechanism uses the pressing part or the claw part to move the working robot along a direction parallel to the outer wall of the substrate processing device.

6. The maintenance system according to claim 2, wherein, This maintenance system has the following features: A receiving ring is disposed on the second base portion; A power supply line extends along the track and passes through the power receiving ring in a non-contact manner; A first terminal is disposed on the second base portion and is electrically connected to the power receiving ring; as well as The second terminal is disposed on the first base portion and is electrically connected to the first terminal.

7. The maintenance system according to claim 2, wherein, The track has multiple second base sections.

8. A maintenance method performed by a maintenance system, the maintenance system comprising: The track is fixed to the outer side of the substrate processing device with processing units and extends in the vertical direction; The work robot is capable of loading and unloading relative to the track and has an arm that can enter the interior of the processing unit; as well as Self-propelled trolleys, among which, The maintenance method includes: The process of using the trolley to move the work robot onto the track; The process of raising and lowering the robot along the track to a predetermined work position; as well as The procedure of using the arm to maintain the processing unit at the work location.

9. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein, This maintenance system has the following features: The track, which is detachable relative to the substrate processing device, extends in a vertical direction; The work robot is mounted on the track and is capable of moving up and down along the track; as well as The self-propelled trolley transports the aforementioned rails. The robot has an arm that can enter the interior of the processing unit.

10. The maintenance system according to claim 9, wherein, A fixing part for fixing the track to the substrate processing device is provided on the upper part of the track.

11. The maintenance system according to claim 9, wherein, The trolley has a recess that, when viewed from a vertical direction, is recessed from the outer side towards the interior and extends through the trolley in the vertical direction. The robot has a base, which is the component for mounting the arm and allows it to move up and down along the track. When viewed from the vertical direction, the track and the base portion are located inside the recess.

12. The maintenance system according to claim 11, wherein, The track has multiple base sections.

13. A maintenance method performed by a maintenance system, the maintenance system comprising: The track, which can be loaded and unloaded relative to the substrate processing device with processing units, extends in the vertical direction; A work robot, mounted on the track, has an arm capable of entering the interior of the processing unit; as well as Self-propelled trolleys, among which, The maintenance method includes: The process of using the trolley to transport the track to the substrate processing device; The process of raising and lowering the robot along the track to a predetermined work position; as well as The procedure of using the arm to maintain the processing unit at the work location.

14. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein, This maintenance system has the following features: A work robot having an arm capable of entering the interior of the processing unit and a gripping mechanism for holding the frame of the substrate processing device; and A lifting mechanism that causes the robot to move up and down in a vertical direction.

15. A maintenance method performed by a maintenance system, the maintenance system comprising: The work robot has an arm capable of entering the interior of a processing unit in a substrate processing apparatus and a holding mechanism for holding the frame of the substrate processing apparatus. and A lifting mechanism that causes the robot to move up and down vertically, wherein... The maintenance method includes: The process of using the lifting mechanism to raise and lower the robot to a predetermined working position; and The process of maintaining the processing unit using the arm while the frame is held by the holding mechanism at the working position.

16. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein, This maintenance system has the following features: A track, fixed to the outer side of the substrate processing device, extends vertically; and The work robot is capable of loading and unloading relative to the track, and can move up and down along the track, having an arm capable of entering the interior of the processing unit. The robot is configured to be transported by a conveying device.

17. The maintenance system according to claim 16, wherein, The robot has a protrusion that is held by the arm of the conveying device.

18. A maintenance method performed by a maintenance system, the maintenance system comprising: A track, fixed to the outer side of a substrate processing apparatus having processing units, extends vertically; and The work robot, capable of loading and unloading relative to the track and of moving up and down along the track, has an arm capable of entering the interior of the processing unit and is configured to be transported by a conveying device, wherein... The maintenance method includes: The process of using the conveying device to move the working robot to the track; The process of raising and lowering the robot along the track to a predetermined work position; and The procedure of using the arm to maintain the processing unit at the work location.

19. A maintenance system for performing maintenance on a substrate processing apparatus having a processing unit, wherein, This maintenance system has the following features: Tracks, which are detachable relative to the substrate processing apparatus, extend vertically; and The work robot, mounted on the track, is capable of moving up and down along the track and has an arm that can enter the interior of the processing unit. The track is configured to be transported by a conveying device.

20. The maintenance system according to claim 19, wherein, The track has a protrusion that is held by the arm of the conveying device.

21. A maintenance method performed by a maintenance system, the maintenance system comprising: A track, capable of being loaded and detached relative to a substrate processing apparatus having processing units, extends vertically and is configured to be conveyed by a conveying device; and The work robot, mounted on the track and capable of moving up and down along the track, has an arm that can enter the interior of the processing unit, wherein... The maintenance method includes: The process of using the conveying device to transport the track to the substrate processing device; The process of raising and lowering the robot along the track to a predetermined work position; and The procedure of using the arm to maintain the processing unit at the work location.

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