Method, apparatus and equipment for diaphragm buffer motion planning optimization in stacking machines

Abstract

This invention discloses a method, apparatus, and equipment for optimizing diaphragm buffer motion planning in a wafer stacking machine. The wafer stacking machine includes a diaphragm traversing mechanism, a diaphragm buffer mechanism, and a stacking table. The method includes: generating an initial traversing motion plan based on pre-set motion parameters of the diaphragm traversing mechanism; determining the buffer motion plan of the diaphragm buffer mechanism based on the initial traversing motion plan and by calling a preset electronic cam algorithm; determining whether the buffer motion plan meets the qualified criteria for buffer motion planning; if not, determining a traversing motion optimization range based on the buffer motion plan, and optimizing the buffer motion plan based on the traversing motion optimization range until the buffer motion plan meets the qualified criteria for buffer motion planning. This invention effectively solves the problems of tape breakage and correction failure during high-speed wafer stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

Description

Technical Field

[0001] This invention relates to the field of vehicle technology, and in particular to a method, apparatus, and equipment for optimizing the motion planning of a diaphragm buffer in a stacking machine. Background Technology

[0002] In related technologies, in stacking equipment, in order to cope with the length change of the diaphragm caused by the lateral movement of the rollers in the Z-stack process, a diaphragm buffer mechanism is usually used to dynamically adjust the diaphragm length. For example, the rollers that were originally located above the stacking table are moved to one side, so that the number of diaphragm stretching changes is reduced from four times to two times, thereby reducing the commutation frequency of the buffer motor acceleration.

[0003] However, while this technology reduces the number of reversals, it does not reduce the peak speed and acceleration of the buffer motor in a single motion. In some operating conditions, it even causes an increase in acceleration, which exacerbates instantaneous tension fluctuations and fails to effectively solve the problems of belt breakage and correction failure during high-speed lamination. Secondly, this structural modification involves a redesign of the entire machine layout, which will affect the surrounding mechanisms, resulting in high modification costs and poor compatibility. At the same time, this technical solution lacks the ability to actively optimize the motion characteristics of the buffer, and therefore cannot fundamentally suppress the tension instability problem caused by sudden acceleration changes under high-speed operating conditions. Summary of the Invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art.

[0005] Therefore, one objective of this invention is to propose a method for optimizing the motion planning of a diaphragm buffer in a stacking machine. This method improves the tracking accuracy of the diaphragm buffer mechanism for lateral movement, reduces diaphragm tension fluctuations caused by inaccurate film supply during stacking, thereby making the buffer motion planning more accurate and reliable. At the same time, it effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0006] Therefore, a second objective of the present invention is to provide a diaphragm buffer motion planning optimization device for a stacking machine.

[0007] Therefore, a third objective of this invention is to provide a stacking machine.

[0008] Therefore, a fourth objective of the present invention is to provide an electronic device.

[0009] To achieve the above objectives, a first aspect of the present invention discloses a method for optimizing the motion planning of a diaphragm buffer in a wafer stacking machine. The wafer stacking machine includes a diaphragm traversing mechanism, a diaphragm buffer mechanism, and a stacking table. The method comprises: generating an initial traversing motion plan based on pre-set motion parameters of the diaphragm traversing mechanism; determining a buffer motion plan for the diaphragm buffer mechanism based on the initial traversing motion plan and by invoking a preset electronic cam algorithm; determining whether the buffer motion plan meets the qualified criteria for buffer motion planning; if not, determining a traversing motion optimization interval based on the buffer motion plan, and optimizing the buffer motion plan based on the traversing motion optimization interval until the buffer motion plan meets the qualified criteria for buffer motion planning.

[0010] According to the embodiment of the present invention, the diaphragm buffer motion planning optimization method for a stacking machine generates an initial transverse motion plan based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This method effectively eliminates model simplification errors in traditional calculation methods by fully modeling the actual diaphragm conveyor path, significantly improving the tracking accuracy of the diaphragm buffer mechanism for transverse movement and reducing diaphragm tension fluctuations caused by inaccurate membrane supply during stacking. This makes the buffer motion planning more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria. This improves the alignment and overall quality of the electrode cores, effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0011] In addition, the diaphragm buffer motion planning optimization method for a stacking machine according to the above embodiments of the present invention may also have the following additional technical features: In some embodiments, when determining a lateral movement optimization interval based on the buffer movement plan, and optimizing the buffer movement plan based on the lateral movement optimization interval until the buffer movement plan meets the qualification criteria, the process includes: determining the intervals in the buffer movement plan that do not meet the qualification criteria as buffer movement non-compliance intervals; determining the corresponding lateral movement optimization intervals based on the mapping relationship between the buffer movement non-compliance intervals and the lateral movement plan; adjusting the current lateral movement plan according to the lateral movement optimization intervals to generate an updated lateral movement plan; and regenerating the buffer movement plan based on the updated lateral movement plan until the buffer movement plan meets the qualification criteria. This ensures accurate feeding and stable tension of the diaphragm during the stacking process, ultimately improving the alignment and overall quality of the electrode cores.

[0012] In some embodiments, when the buffer motion plan meets the qualified judgment condition of the buffer motion plan, the method includes: inputting the final lateral movement plan corresponding to meeting the qualified judgment condition as the actual motion plan into the diaphragm lateral movement mechanism, so that the diaphragm lateral movement mechanism drives the diaphragm buffer mechanism to operate according to the buffer motion plan, wherein the final lateral movement plan includes the initial lateral movement plan or the updated lateral movement plan. This ensures that the diaphragm buffer mechanism can accurately and timely release or retrieve the diaphragm during the lamination process, achieving precise matching of the membrane supply, effectively avoiding problems such as tension fluctuations, tape breakage, or alignment deviations caused by asynchronous movement, thereby ensuring the stability of the electrode core lamination process and the consistency of product quality.

[0013] In some embodiments, determining whether the cache motion plan meets the cache motion plan qualification criteria includes: acquiring one or more cache motion parameters of the diaphragm cache mechanism determined based on the cache motion plan; comparing each cache motion parameter with its corresponding preset threshold; and determining that the cache motion plan meets the cache motion plan qualification criteria when all cache motion parameters do not exceed their corresponding preset thresholds. This ensures stable diaphragm feeding, stable tension, and accurate alignment during the lamination process, guaranteeing the quality of the core products.

[0014] In some embodiments, when determining the buffer motion plan of the diaphragm buffer mechanism based on the initial lateral movement plan and by invoking a preset electronic cam algorithm, the process includes: obtaining the current lateral position and current status flag of the diaphragm lateral movement mechanism corresponding to the current control cycle from the initial lateral movement plan; when determining the diaphragm lateral movement state as a lateral movement state based on the current status flag, dividing the path length change of the diaphragm lateral movement mechanism during the current lateral movement process into a first diaphragm length change segment and a second diaphragm length change segment, wherein the first diaphragm length change segment is the conveyor path formed by the diaphragm around one or more rollers above the diaphragm lateral movement mechanism, and the second diaphragm length change segment is the path between the diaphragm lateral movement mechanism and the stacking table. The conveyor belt path of the separator membrane is determined; the lengths of the first and second separator membranes at the current lateral position are determined respectively; the lengths of the first and second separator membranes are added together to obtain the total variable separator membrane length for the current control cycle; based on the difference between the total variable separator membrane length for the current control cycle and the historical total variable separator membrane length for the previous control cycle, the separator membrane length change between two adjacent control cycles is determined; the separator membrane length change is used as the separator membrane length that the separator buffer mechanism needs to absorb or release in the current control cycle to determine the target displacement of the separator buffer mechanism in the current control cycle; the buffer motion plan is generated based on the target displacement. This ensures that the separator buffer mechanism can respond to path changes caused by lateral movement in real time and accurately, achieving dynamic balance in separator membrane feeding, effectively avoiding tension fluctuations, belt breakage, or roll slippage, and ensuring the stability of the lamination process and the consistency of core quality.

[0015] In some embodiments, determining the length of the first diaphragm at the current lateral position by the first diaphragm length change segment includes: dividing the first diaphragm length change segment into multiple first path intervals based on the current lateral position; within each first path interval, calling its corresponding first length calculation model to determine the length of the effective path within that path interval, wherein different first path intervals correspond to different first length calculation models; and superimposing the lengths of the effective path segments within each first path interval to obtain the first diaphragm length. This ensures that even in complex and variable mechanical structures, the change in diaphragm length can be tracked and calculated with high precision, thereby providing accurate operational basis for the buffer mechanism and ensuring the stability of diaphragm supply and the smoothness of the stacking process.

[0016] In some embodiments, determining the length of the second diaphragm at the current lateral position of the second diaphragm length variation segment includes: obtaining the current lateral direction during the lateral movement; when the current lateral direction is a first lateral direction, segmenting the second diaphragm length variation segment into multiple second path intervals according to the current lateral position; within each second path interval, calling its corresponding second length calculation model to determine the length of the effective path within that path interval, wherein different second path intervals correspond to different second length calculation models; superimposing the lengths of the effective path segments within each second path interval to obtain the second diaphragm length; or, when the current lateral direction is a second lateral direction, obtaining the actual width of the stacking stage; when the actual width is greater than a preset width threshold, determining the length of the second diaphragm. The changing segment is segmented into multiple third path intervals. Within each third path interval, its corresponding third length calculation model is invoked to determine the length of the effective path within that interval. Different third path intervals correspond to different third length calculation models. The lengths of the effective path segments within each third path interval are summed to obtain the second diaphragm length. When the actual width is less than or equal to the preset width threshold, the changing segment of the second diaphragm length is segmented into multiple fourth path intervals. Within each fourth path interval, its corresponding fourth length calculation model is invoked to determine the length of the effective path within that interval. Different fourth path intervals correspond to different fourth length calculation models. The lengths of the effective path segments within each fourth path interval are summed to obtain the second diaphragm length. This achieves high-precision, adaptive modeling of the changing segment of the second diaphragm length under different operating conditions, significantly improving the accuracy of the cache mechanism's motion planning and the overall stability of the system.

[0017] To achieve the above objectives, a second aspect of the present invention discloses a diaphragm buffer motion planning optimization device for a stacking machine. The stacking machine includes a diaphragm traversing mechanism, a diaphragm buffer mechanism, and a stacking table. The device comprises: a generation module for generating an initial traversing motion plan based on preset motion parameters of the diaphragm traversing mechanism; a determination module for determining a buffer motion plan of the diaphragm buffer mechanism based on the initial traversing motion plan and by invoking a preset electronic cam algorithm; a judgment module for determining whether the buffer motion plan meets the qualified criteria for buffer motion planning; and an optimization module for determining a traversing motion optimization interval based on the buffer motion plan when the buffer motion plan does not meet the qualified criteria for buffer motion planning, and optimizing the buffer motion plan based on the traversing motion optimization interval until the buffer motion plan meets the qualified criteria for buffer motion planning.

[0018] According to an embodiment of the present invention, a diaphragm buffer motion planning optimization device for a stacking machine generates an initial transverse motion plan based on pre-set motion parameters of the diaphragm transverse movement mechanism. Then, a determination module calls a preset electronic cam algorithm to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate membrane supply during stacking, thus making the buffer motion plan more accurate and reliable. Next, a judgment module determines whether the buffer motion plan meets the qualified criteria. Based on the judgment result, it determines whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The optimization module optimizes the buffer motion plan based on this range until it meets the qualified criteria, thereby improving the alignment and overall quality of the electrode cores. Simultaneously, it effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0019] To achieve the above objectives, a third aspect of the present invention discloses a wafer stacking machine, comprising: a stacking stage; a diaphragm traversing mechanism for realizing relative movement between the diaphragm and the stacking stage; a diaphragm buffering mechanism for controlling the path length of the diaphragm located above the stacking stage during the diaphragm traversing process, and maintaining stable diaphragm tension in response to changes in the path length of the diaphragm; and a controller for executing the diaphragm buffering motion planning optimization method for a wafer stacking machine as described in any embodiment of the first aspect of the present invention.

[0020] According to the stacking machine of the present invention, an initial transverse motion plan is generated based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate membrane supply during stacking, thus making the buffer motion plan more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria, thereby improving the alignment and overall quality of the electrode cores. Simultaneously, it effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0021] To achieve the above objectives, a fourth aspect of the present invention discloses an electronic device, such as the diaphragm buffer motion planning optimization device for a wafer stacker as described in the second aspect of the present invention; or, a processor, a memory, and a diaphragm buffer motion planning optimization program for a wafer stacker stored in the memory and executable on the processor, wherein the diaphragm buffer motion planning optimization program for a wafer stacker, when executed by the processor, implements the diaphragm buffer motion planning optimization method for a wafer stacker as described in any embodiment of the first aspect of the present invention.

[0022] According to the electronic device of the present invention, an initial transverse motion plan is generated based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate film supply during lamination, thus making the buffer motion plan more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria, thereby improving the alignment and overall quality of the electrode cores. Simultaneously, it effectively solves the problems of tape breakage and correction failure during high-speed lamination, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0023] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0024] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which: Figure 1 This is a flowchart of a diaphragm buffer motion planning optimization method for a wafer stacker according to an embodiment of the present invention; Figure 2 This is a schematic diagram of the initial lateral movement planning according to another embodiment of the present invention; Figure 3 This is a schematic diagram of a cache motion planning curve according to an embodiment of the present invention; Figure 4 This is a schematic diagram of the updated lateral motion planning according to an embodiment of the present invention; Figure 5This is a schematic diagram of the regenerated cache motion plan according to an embodiment of the present invention; Figure 6 This is a schematic diagram of the diaphragm lateral movement mechanism moving from positive to negative according to an embodiment of the present invention; Figure 7 This is a schematic diagram of the diaphragm lateral movement mechanism moving from negative to positive according to an embodiment of the present invention; Figure 8 This is a schematic diagram of the calculation starting point of the segmented interval 1 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 9 This is a schematic diagram illustrating the calculation endpoint of the segmented interval 1 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 10 This is a schematic diagram of the diaphragm length calculation for the segmented interval 1 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 11 This is a schematic diagram of the calculation starting point of the segmented interval 2 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 12 This is a schematic diagram illustrating the calculation endpoint of the segmented interval 2 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 13 This is a schematic diagram of the diaphragm length calculation for the segmented interval 2 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 14 This is a schematic diagram of the calculation starting point of the segmented interval 3 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 15 This is a schematic diagram illustrating the calculation endpoint of the segmented interval 3 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 16 This is a schematic diagram of the diaphragm length calculation for the segmented interval 3 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 17 This is a schematic diagram of the calculation starting point of the segmented interval 4 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 18 This is a schematic diagram illustrating the calculation endpoint of segmented interval 4 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 19 This is a schematic diagram of the diaphragm length calculation for the segmented interval 4 of the first diaphragm length variation segment according to an embodiment of the present invention; Figure 20 This is a schematic diagram of the diaphragm wrap angle at its minimum when the diaphragm lateral movement mechanism moves from negative to positive according to an embodiment of the present invention; Figure 21 This is a schematic diagram of the diaphragm wrap angle at its minimum when the diaphragm lateral movement mechanism moves from positive to negative according to an embodiment of the present invention; Figure 22 This is a schematic diagram showing an obtuse angle as an embodiment of the present invention; Figure 23 This is a schematic diagram of an embodiment of the present invention with an acute angle as the starting angle; Figure 24 This is a schematic diagram of the initial state of a wide-pole core in segmented interval 1 according to an embodiment of the present invention; Figure 25 This is a schematic diagram of a wide-pole core moving from positive to negative at the junction of segmented intervals 1 and 2 according to an embodiment of the present invention; Figure 26 This is a schematic diagram of the final state of the wide-pole core moving from positive to negative in segmented interval 2 according to an embodiment of the present invention; Figure 27 This is a schematic diagram illustrating the calculation of the diaphragm wrap angle according to an embodiment of the present invention; Figure 28 This is a schematic diagram of the starting position of the transverse movement of the wide electrode core from negative to positive in segmented interval 1 according to an embodiment of the present invention; Figure 29 This is a schematic diagram of a wide-pole core moving from negative to positive at the junction of segmented intervals 1 and 2 according to an embodiment of the present invention; Figure 30 This is a schematic diagram of the wide-pole core moving from negative to positive at the junction of segmented intervals 2 and 3 according to an embodiment of the present invention; Figure 31 This is a schematic diagram of the final position of the wide-pole core moving from negative to positive in segmented interval 3 according to an embodiment of the present invention; Figure 32 This is a schematic diagram of the initial state of a narrow electrode core moving from positive to negative in segmented interval 1 according to an embodiment of the present invention; Figure 33 This is a schematic diagram of a narrow electrode core moving from positive to negative at the junction of segmented intervals 1 and 2 according to an embodiment of the present invention; Figure 34 This is a schematic diagram of a narrow electrode core moving from positive to negative at the junction of segmented intervals 2 and 3 according to an embodiment of the present invention; Figure 35 This is a schematic diagram of the final position of the narrow electrode core moving from positive to negative in segmented interval 3 according to an embodiment of the present invention; Figure 36 This is a schematic diagram of the initial state of the narrow electrode core moving from negative to positive in segmented interval 1 according to an embodiment of the present invention; Figure 37 This is a schematic diagram of a narrow electrode core moving from negative to positive at the junction of segmented intervals 1 and 2 according to an embodiment of the present invention; Figure 38This is a schematic diagram of the narrow electrode core moving from negative to positive at the junction of segmented intervals 2 and 3 according to an embodiment of the present invention; Figure 39 A schematic diagram of the final position of the narrow electrode core moving from negative to positive in segmented interval 3 according to an embodiment of the present invention; Figure 40 This is a structural block diagram of a diaphragm buffer motion planning optimization device for a wafer stacker according to an embodiment of the present invention. Detailed Implementation

[0025] The embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present invention are described in detail below.

[0026] In related technologies, by establishing a functional relationship between the change in diaphragm length and the displacement of the transverse mechanism, electronic cam control is used to achieve synchronous linkage between diaphragm buffering and transverse movement, thereby reducing tension fluctuations and improving stacking accuracy and efficiency.

[0027] Specifically, the diaphragm path is decomposed into multiple geometric segments for length calculation, including, for example, the arc length between the first tangent point of the diaphragm and the diaphragm fixing clamping roller and the center point of the diaphragm fixing clamping roller, the length between the first tangent point of the diaphragm and the diaphragm fixing clamping roller and the second tangent point of the diaphragm and the diaphragm transverse upper clamping roller, the arc length between the second tangent point of the diaphragm and the diaphragm transverse upper clamping roller and the center point of the diaphragm transverse upper clamping roller, the fixed height between the upper clamping roller and the lower clamping roller, and the arc segment and straight segment between the lower clamping roller and the stacking table.

[0028] However, the calculation model in this scheme assumes that the upper and lower clamping rollers are spatially closely fitted or arranged at a very close distance, without considering the inevitable gap between the rollers in actual equipment to avoid interference, facilitate maintenance, and accommodate diaphragms of different thicknesses. In a real mechanical structure, when there is a gap between the upper and lower rollers, the diaphragm's path between them is not a single circular arc transition as described above, but rather consists of two circular arc segments and one straight line segment. Furthermore, as the position of the rollers relative to the stacking table changes during the lateral movement, the lengths of these three segments are dynamically adjusted. That is, the wrap angle changes with the position of the rollers, and the inclination angle and length of the straight line segment at the mid-span also change accordingly.

[0029] Because this technology does not incorporate this gap structure into the calculation model, its estimation of the total length change of the diaphragm deviates significantly from the actual physical state. Especially under conditions where the roller stroke is long or the gap is large, the error accumulates significantly, directly affecting the accuracy of the buffer motion curve generated by the electronic cam. This results in excessive or insufficient unwinding of the buffer mechanism, which in turn leads to problems such as increased diaphragm tension fluctuations, edge alignment deviations, and even belt breakage, reducing the stacking accuracy and stability.

[0030] On the other hand, in the diaphragm unwinding mechanism, because the material roll is far from the stacking table, the diaphragm is difficult to supply in a timely manner during high-speed stacking, resulting in poor responsiveness. To address this, a diaphragm buffer mechanism is set up to store the diaphragm during non-stacking stages and release it during stacking stages to meet dynamic film supply requirements.

[0031] The motion accuracy of the diaphragm buffer mechanism directly affects the film supply length, which in turn determines the alignment and uniformity of the electrode core diaphragm. During high-speed wafer stacking, the accuracy and real-time performance of the buffer movement must be ensured to maintain stable film supply. Currently, electronic cam control is commonly used, with the lateral position as the master axis and the buffer position as the slave axis, establishing a point-to-point mapping relationship between the master and slave axes to achieve high-precision following. Its control effect depends on the accuracy of the electronic cam table, which is generated by an algorithm.

[0032] However, existing equipment mostly uses general-purpose function blocks of PLCs (Programmable Logic Controllers) to calculate the cam table. To adapt to different structures, the algorithm is often simplified, failing to accurately reproduce the actual film path and resulting in modeling errors. These errors can cause problems such as tension fluctuations, tape breakage, or misalignment under high-speed conditions.

[0033] To address this, the present invention proposes an electronic cam calculation method based on complete geometric modeling, which accurately restores the length changes of each segment in the diaphragm path, eliminates the calculation deviation caused by the simplified model, improves the buffer following accuracy, reduces tension fluctuations, and improves the quality of the electrode core.

[0034] The following is for reference. Figures 1-39 A method for optimizing diaphragm buffer motion planning for a wafer stacker according to an embodiment of the present invention is described.

[0035] Figure 1 This is a flowchart of a diaphragm buffer motion planning optimization method for a wafer stacker according to an embodiment of the present invention. Figure 1 As shown, the method includes at least steps S1-S4.

[0036] Step S1: Generate an initial lateral movement plan based on the preset motion parameters of the diaphragm lateral movement mechanism.

[0037] In this embodiment, based on pre-set motion parameters of the diaphragm lateral movement mechanism, such as a stroke of 320 mm, a movement time of 250 ms, a maximum speed of 2300 mm / s, and a maximum acceleration of 25000 mm / s², a result can be generated as follows: Figure 2 The initial lateral motion plan shown includes the position curve, velocity curve, and acceleration curve.

[0038] The lateral motion planning demonstrates a high degree of continuity and smoothness in speed changes, ensuring that the speed curve has no abrupt changes at the beginning and end, effectively avoiding mechanical shock. Simultaneously, the acceleration adjustment employs a stepped strategy, precisely controlling the acceleration process through multiple step segments and strictly adhering to the maximum acceleration limit. This enables high-speed movement within a specified stroke and time, while also ensuring the stability and positioning accuracy of the equipment, maintaining excellent performance even at high speeds.

[0039] Step S2: Based on the initial lateral motion plan, and by calling the preset electronic cam algorithm, determine the buffer motion plan of the diaphragm buffer mechanism.

[0040] Among them, the preset electronic cam algorithm is a tool for generating the buffer motion plan of the diaphragm buffer mechanism. It includes the relative positional relationship between the diaphragm transverse mechanism, the stacking stage and other mechanisms, and can output the buffer motion plan of the diaphragm buffer mechanism based on the transverse motion plan of the diaphragm transverse mechanism.

[0041] In this embodiment, based on the initial lateral movement plan, the buffer movement plan of the diaphragm buffer mechanism can be accurately determined by invoking a preset electronic cam algorithm, such as... Figure 3 As shown, the buffer motion planning includes position curves, velocity curves, and acceleration curves.

[0042] Specifically, the preset electronic cam algorithm dynamically calculates and adjusts the speed and position of the buffer mechanism based on the motion trajectory of the diaphragm lateral movement mechanism, i.e., the initial lateral movement plan, to achieve high-precision synchronous operation between the two. This algorithm, through complete modeling of the actual conveyor path of the diaphragm, effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for lateral movement, and reduces diaphragm tension fluctuations caused by inaccurate film supply during lamination. This makes the buffer movement plan more accurate and reliable, thereby improving the alignment and overall quality of the electrode cores, while also enhancing the operating efficiency and stability of the equipment.

[0043] Step S3: Determine whether the cache motion plan meets the qualified criteria for cache motion plan.

[0044] In this embodiment, determining whether the buffer motion plan meets the qualification criteria primarily involves assessing whether it can ensure precise synchronous operation between the diaphragm buffer mechanism and the diaphragm traversing mechanism, thereby reducing diaphragm tension fluctuations during the lamination process. Specifically, firstly, it is necessary to check whether the position curve, velocity curve, and acceleration curve are smooth and continuous, avoiding any abrupt changes or unreasonable jumps to ensure the stability of mechanical movement. Secondly, it is necessary to verify whether the speed and position adjustments of the buffer mechanism can dynamically respond to the movement changes of the diaphragm traversing mechanism, ensuring coordination between the two under different operating conditions. Furthermore, it is also necessary to examine whether the diaphragm tension remains within a stable and appropriate range throughout the entire lamination cycle, and to collect equipment operating efficiency and stability data during actual operation testing to confirm whether these buffer parameters meet the qualification criteria for the buffer motion plan. If the qualification criteria are met, the buffer motion plan can be determined to be qualified, effectively improving the overall performance of the equipment and product quality.

[0045] Step S4: If not, determine the lateral movement optimization interval based on the cache motion plan, and optimize the cache motion plan based on the lateral movement optimization interval until the cache motion plan meets the cache motion plan qualification judgment condition.

[0046] In this embodiment, if the cache motion plan does not meet the cache motion plan qualification criteria, it needs to be optimized. Specifically, firstly, abnormal areas in the current cache motion plan, i.e., the intervals that do not meet the cache motion plan qualification criteria, such as exceeding speed or acceleration limits, drastic changes, excessive following errors, and excessive tension fluctuations, are analyzed. Combining the motion mapping relationship between the cache and the lateral movement, the lateral movement stage that causes these problems is determined in reverse, i.e., the lateral movement optimization interval. Within this lateral movement optimization interval, the lateral movement plan is locally adjusted, for example, by appropriately reducing the peak acceleration, extending the acceleration and deceleration time, or fine-tuning the motion sequence, to reduce the dynamic impact on the diaphragm cache mechanism. Based on the adjusted lateral movement plan, a new cache motion plan is generated by re-invoking the preset electronic cam algorithm, and the cache motion plan qualification criteria are judged again. This process is iterated until the position, speed, and acceleration characteristics of the cache all meet the preset accuracy, stability, and synchronization requirements, and the diaphragm tension fluctuations are controlled within the allowable range. Ultimately, this ensures that the cache motion plan meets the cache motion plan qualification criteria, thereby guaranteeing the stability of the stacking process and the quality of the core product.

[0047] Therefore, in the embodiments of the present invention, an initial transverse motion plan is generated based on the pre-set motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate membrane supply during lamination, thus making the buffer motion plan more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan, and the buffer motion plan is optimized based on this range until it meets the qualified criteria. This improves the alignment and overall quality of the electrode cores, effectively solves the problems of tape breakage and correction failure during high-speed lamination, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0048] In one embodiment of the present invention, the process of determining a lateral movement optimization interval based on the cache movement plan, and optimizing the cache movement plan based on the lateral movement optimization interval until the cache movement plan meets the cache movement plan qualification criteria includes: determining the intervals in the cache movement plan that do not meet the cache movement plan qualification criteria as cache movement non-compliance intervals; determining the corresponding lateral movement optimization intervals based on the mapping relationship between cache movement non-compliance intervals and lateral movement plans; adjusting the current lateral movement plan according to the lateral movement optimization intervals to generate an updated lateral movement plan; and regenerating the cache movement plan based on the updated lateral movement plan until the cache movement plan meets the cache movement plan qualification criteria.

[0049] In this embodiment, by analyzing the position, velocity, and acceleration curves in the buffer motion planning, abnormal time periods are identified, such as intervals with excessive acceleration, sudden velocity changes, lag in following, or tension fluctuations exceeding allowable thresholds. These abnormal intervals are designated as buffer motion non-compliance intervals. Since the motion of the diaphragm buffer mechanism is generated in real-time by an electronic cam algorithm based on the motion trajectory of the diaphragm lateral movement mechanism, a definite time-position correspondence exists between the two. Therefore, based on this mapping relationship, the lateral movement stage that caused the buffer abnormality can be traced back to determine the lateral movement optimization interval corresponding to the buffer motion non-compliance interval. For example, the time periods of the buffer motion non-compliance interval are 343.4ms-353.5ms and 845.5ms-852.9ms, respectively, corresponding to lateral position coordinates of 88.5-110.6mm and 845.5-852.9mm. Subsequently, the position coordinates, acceleration, and velocity parameters corresponding to the lateral movement optimization interval are input into the lateral movement planning algorithm to re-plan the lateral movement and generate an updated lateral movement plan.

[0050] Next, based on the updated transverse motion plan, the preset electronic cam algorithm is invoked again to generate a new buffer motion plan, and its qualification is checked again. This process is repeated until the buffer motion plan meets the preset accuracy, stability, synchronization, and tension control requirements throughout the entire cycle, that is, it fully passes the qualification judgment conditions of the buffer motion plan, thereby ensuring accurate feeding and stable tension of the diaphragm during the stacking process, and ultimately improving the alignment and overall quality of the electrode core.

[0051] For example, during the iteration, it was identified that the buffer acceleration exceeded its corresponding preset threshold during a specific period, corresponding to the lateral coordinate ranges of 88.5-110.6 mm and 845.5-852.9 mm. This region was thus determined as the lateral motion optimization range. To reduce the peak buffer acceleration within this optimization range, the lateral motion planning for this stage was adjusted. By appropriately reducing the target speed of the diaphragm lateral movement mechanism in this section and increasing its rate of acceleration change, the diaphragm lateral movement mechanism completed the acceleration process earlier and entered the uniform speed operation stage sooner. Thus, under the premise that the target stroke and total motion time remain unchanged, the lateral speed in this section is lower than the initial planned value, and the acceleration has approached zero, thereby reducing the dynamic disturbance to the diaphragm buffer mechanism.

[0052] The updated lateral motion planning curve is as follows: Figure 4 As shown, the overall travel remains 320mm, and the total time remains 950ms. The regenerated buffer motion planning curve is as follows: Figure 5As shown, after optimization, the maximum peak value of the buffer acceleration has been reduced to below the preset threshold, such as 55000mm / s², which meets the safety threshold set by the system, effectively reducing the risk of diaphragm tension fluctuation and improving motion stability and stacking quality.

[0053] In one embodiment of the present invention, when the cache motion plan meets the cache motion plan qualification judgment condition, the method includes: inputting the final transverse motion plan corresponding to the cache motion plan qualification judgment condition as the actual motion plan into the diaphragm transverse mechanism, so that the diaphragm transverse mechanism drives the diaphragm cache mechanism to run according to the cache motion plan, wherein the final transverse motion plan includes the initial transverse motion plan or the updated transverse motion plan.

[0054] In this embodiment, when the cache motion plan meets the preset cache motion plan qualification criteria after iterative optimization, the system will use the current corresponding transverse motion plan as the final control instruction that can be used for actual operation.

[0055] Specifically, when the cached motion plan generated based on the initial lateral motion plan meets the cached motion plan qualification criteria, the initial lateral motion plan will be used as the final lateral motion plan. If the cached motion plan generated based on the initial lateral motion plan does not meet the cached motion plan qualification criteria, a lateral motion optimization interval will be determined, and an updated lateral motion plan will be generated based on the lateral motion optimization interval. Then, the cached motion will be regenerated based on the updated lateral motion plan. If the regenerated cached motion meets the cached motion plan qualification criteria, the updated lateral motion plan will be used as the final lateral motion plan. The updated lateral motion plan may be an updated version after one or more optimizations and adjustments.

[0056] The final lateral movement plan is then input into the diaphragm lateral movement mechanism as the actual movement plan. The diaphragm lateral movement mechanism executes precise reciprocating motion according to this actual movement plan. Simultaneously, through an electronic cam control mechanism, the lateral position is transmitted in real-time as a master axis signal to the diaphragm buffer mechanism, driving it to operate synchronously as a slave axis according to the verified buffer movement plan. This ensures that the diaphragm buffer mechanism can accurately and timely release or retrieve the diaphragm during the lamination process, achieving precise matching of the membrane supply and effectively avoiding problems such as tension fluctuations, tape breakage, or alignment deviations caused by asynchronous movement. This ensures the stability of the core lamination process and the consistency of product quality.

[0057] In one embodiment of the present invention, when determining whether the cache motion plan meets the cache motion plan qualification criteria, the method includes: obtaining one or more cache motion parameters of the diaphragm cache mechanism determined based on the cache motion plan; comparing each cache motion parameter with its corresponding preset threshold; and determining that the cache motion plan meets the cache motion plan qualification criteria when all cache motion parameters do not exceed their corresponding preset thresholds.

[0058] In this embodiment, based on the generated buffer motion plan, one or more buffer motion parameters of the diaphragm buffer mechanism are extracted throughout the entire motion cycle. These buffer motion parameters include at least the buffer acceleration, buffer velocity, and rate of change of buffer acceleration (i.e., jerk) of the diaphragm buffer mechanism, to comprehensively reflect its dynamic performance and control accuracy. Subsequently, each buffer motion parameter is compared with its corresponding preset threshold item by item. For example, when the buffer motion parameter only includes buffer acceleration, it is determined whether the buffer acceleration exceeds its corresponding preset threshold, such as 55000 mm / s². If the buffer acceleration does not exceed 55000 mm / s², the buffer motion plan is determined to meet the qualified condition for buffer motion planning; if the buffer acceleration exceeds 55000 mm / s², the buffer motion plan is determined not to meet the qualified condition for buffer motion planning.

[0059] When the cache motion parameters include cache acceleration, cache velocity, and cache acceleration change rate, the cache acceleration, cache velocity, and cache acceleration change rate are compared with their corresponding preset thresholds. If none of these three cache motion parameters exceed their corresponding preset thresholds, the cache motion plan is deemed to meet the cache motion plan qualification criteria. If at least one of them exceeds its corresponding preset threshold, the cache motion plan is deemed not to meet the cache motion plan qualification criteria, and the optimization process needs to be initiated to adjust the transverse motion plan and regenerate the cache motion plan until all parameters are within a controllable range. This ensures stable diaphragm feeding, stable tension, and accurate alignment during the stacking process, thereby guaranteeing the quality of the core products.

[0060] In one embodiment of the present invention, when determining the buffer motion plan of the diaphragm buffer mechanism based on the initial lateral movement plan and by calling a preset electronic cam algorithm, the process includes: obtaining the current lateral position and current status flag of the diaphragm lateral movement mechanism corresponding to the current control cycle from the initial lateral movement plan; when determining the diaphragm lateral movement state as a lateral movement state based on the current status flag, dividing the path length change of the diaphragm lateral movement mechanism during the current lateral movement process into a first diaphragm length change segment and a second diaphragm length change segment, wherein the first diaphragm length change segment is the conveyor path formed by the diaphragm around one or more rollers above the diaphragm lateral movement mechanism, and the second diaphragm length change segment is the diaphragm lateral movement mechanism itself. The conveyor path of the diaphragm between the stacking stage and the diaphragm; the lengths of the first and second diaphragm segments at the current lateral position are determined respectively; the lengths of the first and second diaphragm segments are added together to obtain the total variable diaphragm length of the current control cycle; based on the difference between the total variable diaphragm length of the current control cycle and the historical total variable diaphragm length of the previous control cycle, the diaphragm length change between two adjacent control cycles is determined; the diaphragm length change is used as the diaphragm length that the diaphragm buffer mechanism needs to absorb or release in the current control cycle to determine the target displacement of the diaphragm buffer mechanism in the current control cycle; a buffer motion plan is generated based on the target displacement.

[0061] In an embodiment, such as Figure 6 and Figure 7 As shown, to achieve a Z-shaped relative motion between the diaphragm and the stacking table (electrode core), the diaphragm lateral movement mechanism needs to move laterally relative to the stacking table before placing the wafers. During the lateral movement, there are two dynamically changing length sections in the diaphragm path, namely, diaphragm length change section 1 (or the upper diaphragm length) and diaphragm length change section 2 in the figure, which are respectively designated as the first diaphragm length change section and the second diaphragm length change section. The first diaphragm length change section refers to the conveyor path located above the diaphragm lateral movement mechanism, formed by the diaphragm passing around one or more rollers, and its length dynamically changes with the position of the diaphragm lateral movement mechanism. The second diaphragm length change section refers to the conveyor path between the diaphragm lateral movement mechanism and the stacking table, which directly participates in the electrode core wafer supply, and its length also fluctuates in real time with the change of the diaphragm lateral movement position. The total length of these two sections changes in real time with the lateral movement position, resulting in a continuous change in the diaphragm demand. The role of the diaphragm buffer mechanism is to respond in real time to changes in the length of these two paths. Through precise winding or unwinding operations, it dynamically compensates for increases or decreases in diaphragm length, ensuring that the actual diaphragm length in the belt conveyor system always matches the theoretical required length under the current working conditions. This maintains stable tension, prevents belt breakage or roll slippage, and ensures the continuity and accuracy of the lamination process.

[0062] Therefore, based on the initial lateral movement plan and by invoking a preset electronic cam algorithm, when determining the buffer movement plan of the diaphragm buffer mechanism, the system first obtains the current lateral position of the diaphragm buffer mechanism within the current control cycle and the status flag bit used to identify its movement state from the initial lateral movement plan. When the system determines that the diaphragm buffer mechanism is in a lateral movement state based on the status flag bit, it divides the total length change of the diaphragm path during the current lateral movement into a first diaphragm length change segment and a second diaphragm length change segment. Subsequently, the system calculates the actual length of these two path segments at the current lateral position. For example, by using geometric modeling methods, combined with the fixed coordinates of each roller, the wrap angle relationship, and the tangent point position between the diaphragm and the roller, the first diaphragm length is accurately calculated; simultaneously, the second diaphragm length is calculated based on the stacking table boundary, the current position of the diaphragm buffer mechanism, and the diaphragm direction. The two are added together to obtain the total variable diaphragm length within the current control cycle. Next, by calculating the difference between the historical total variable diaphragm length of the previous control cycle and the diaphragm length of the previous cycle, the diaphragm length between two adjacent cycles is obtained. This diaphragm length is then used as the amount that the diaphragm buffer mechanism needs to absorb (when the length increases) or release (when the length decreases) in the current cycle. This amount is then converted into the target displacement that the diaphragm buffer mechanism needs to perform in the current control cycle. Finally, this target displacement is used as the core input, combined with the response characteristics of the buffer system and the control cycle, to generate a continuous and high-precision buffer motion planning curve. This ensures that the diaphragm buffer mechanism can respond to path changes caused by lateral movement in real time and accurately, achieving dynamic balance in diaphragm feeding, effectively avoiding problems such as tension fluctuations, belt breakage, or roll slippage, and ensuring the stability of the lamination process and the consistency of the electrode core quality.

[0063] In one embodiment of the present invention, determining the length of the first diaphragm at the current lateral position by the first diaphragm length change segment includes: dividing the first diaphragm length change segment into multiple first path intervals according to the current lateral position; calling the corresponding first length calculation model in each first path interval to determine the length of the effective path in the path interval, wherein different first path intervals correspond to different first length calculation models; and superimposing the lengths of the effective path segments in each first path interval to obtain the first diaphragm length.

[0064] In this embodiment, to determine the length of the first diaphragm length variation segment at the current lateral position, the first diaphragm length variation segment is first subdivided into multiple first path intervals based on the current lateral position of the diaphragm lateral movement mechanism. Each first path interval represents a path in which the diaphragm bypasses a specific roller or passes through a specific path section. For each such path interval, the system calls the corresponding first length calculation model to accurately calculate the actual length of the effective path within that interval. It is worth noting that because different path intervals have different geometries, diaphragm wrap angles, and relative positional relationships with other components, each interval has its own applicable first length calculation model. In this way, the system can consider all factors affecting the path length, such as the diaphragm's bending radius and the specific layout of the rollers. Then, the effective path lengths calculated in each first path interval are superimposed to finally obtain the total length of the first diaphragm length variation segment at the current lateral position. This method ensures that even in complex and variable mechanical structures, the changes in diaphragm length can be tracked and calculated with high precision, thereby providing accurate operational basis for the buffer mechanism and ensuring the stability of diaphragm supply and the smoothness of the stacking process.

[0065] Specifically, for calculating the diaphragm length of the first diaphragm length variation segment, the range of the diaphragm to be calculated should first be determined, and the point where the diaphragm contacts the mechanism and remains unchanged during the lateral movement should be used as the starting and ending points for calculating the length of the first diaphragm length variation segment. For example... Figure 8 As shown, during the transverse movement, due to the gap between the fixed rollers above the diaphragm transverse movement mechanism, the straight line segment l1 will slightly oscillate in the gap between the rollers as the position of the diaphragm transverse movement mechanism changes. This causes the wrap angle between the diaphragm and the rollers to change slightly during the transverse movement, affecting the calculation of the diaphragm length.

[0066] Therefore, the starting point for calculating the diaphragm length is chosen as the tangent point between the diaphragm and the roller on the upper pair of rollers during the lateral movement. This point ensures that the diaphragm remains in contact with the roller during lateral movement. Similarly, although there is a gap between the rollers on the diaphragm lateral movement mechanism, the arc segment h4 can always exist during lateral movement, and the relative positional relationship between the rollers of the lateral movement mechanism and the roller below them remains unchanged. Regardless of how the lateral movement mechanism moves, the diaphragm can always remain tangent to the two rollers. Therefore, the endpoint for calculating the diaphragm length of the first diaphragm length variation segment is the position where the arc segment h4 ends.

[0067] During the lateral movement, as the diaphragm's position changes, some of the wrap angles between the rollers and the diaphragm, or some straight segments of the diaphragm, may disappear or reappear during the lateral movement. To ensure more accurate diaphragm length calculation, the algorithm must be compatible with these interactive changes in the diaphragm. Therefore, a segmented approach is used when calculating the diaphragm length, and the formula for calculating the diaphragm length remains unchanged within each segment.

[0068] Unlike the calculation of the second diaphragm length variation segment, the calculation of the diaphragm length in the first diaphragm length variation segment does not include the fixtures that vary with the electrode core size; the stroke of the diaphragm traversing mechanism remains constant, and there are no scenarios requiring separate discussion due to changes in the electrode core model. Furthermore, the start and end points of the diaphragm length calculation do not change during the diaphragm traversal from positive to negative and from negative to positive. Therefore, the diaphragm structure is completely identical in the first diaphragm length variation segment during the diaphragm traversal from positive to negative and from negative to positive; the segmentation points are only used to distinguish scenarios where the diaphragm length structure changes during the calculation.

[0069] Based on the different diaphragm compositions constituting the first diaphragm length variation segment, the first diaphragm length variation segment can be divided into four first path intervals, and these four first path intervals are respectively denoted as segment interval 1, segment interval 2, segment interval 3 and segment interval 4.

[0070] When calculating segmented interval 1, such as Figure 8 and Figure 9 As shown, the diaphragm moves laterally from the positive electrode side to the negative electrode side, and the arc segment h3 gradually decreases until it disappears. The segmentation point of this interval is when the arc segment h3 completely disappears, and the straight segment l2 is tangent to the upper moving roller on the left side of the diaphragm's lateral movement.

[0071] The diaphragm length of segment 1 includes the following components:

[0072] refer to Figure 10 To determine the diaphragm length, the coordinates of each point in the diagram are shown below: The center coordinates of the upper roller are s1(xs1,ys1), the center coordinates of the left upper fixed roller are s2(xs2,ys2), the center coordinates of the left upper moving roller are m1(xm1,ym1), and the center coordinates of the right upper moving roller are m2(xm2,ym2).

[0073] Since the upper roller is located directly above the upper fixed roller on the left, therefore The length of the arc segment h1 is: The length of line segment l1 is: ; The length of the arc segment h2 is: , among which angle The value is: The length of line segment l2 is: ; The length of the arc segment h3 is: , among which angle The value is: The length of line segment l3 is: ; The length of the arc segment h4 is: The value of angle δ is: ;

[0074] The formula for calculating the diaphragm length within segment 1 is as follows:

[0075] The dividing point between segment 1 and segment 2 is a straight line segment l2 that is tangent to both the upper left and upper right moving rollers and the upper left fixed roller. At this point, the slope of the straight line segment l3 is equal to the slope of the line connecting the centers of the upper left moving roller and the upper left fixed roller. Therefore, the following relationship exists:

[0076] In the formula, only xm1 is a time-dependent variable, that is: ,

[0077] When calculating segmented interval 2, refer to Figure 11 and Figure 12 The diaphragm continues to move from the positive electrode side to the negative electrode side, and the arc segment h2 gradually decreases until it disappears. The segmentation point of this interval is when the arc segment h2 completely disappears. The straight segment l1 is collinear with the straight segment l2 and is tangent to the upper fixed roller on the left.

[0078] The diaphragm length of segment 2 includes the following components: .

[0079] like Figure 13 As shown, the center coordinates of the upper roller are s1(xs1,ys1), the center coordinates of the left upper fixed roller are s2(xs2,ys2), the center coordinates of the left upper moving roller are m1(xm1,ym1), and the center coordinates of the right upper moving roller are m2(xm2,ym2).

[0080] Since the upper roller is located directly above the upper fixed roller on the left, therefore The length of the arc segment h1 is: The length of line segment l1 is: ; The length of the arc segment h2 is: , among which angle The value is: The length of line segment l2 is: ; The length of the arc segment h4 is: , among which angle The value is: ;

[0081] The formula for calculating the diaphragm length within segment 2 is as follows:

[0082] The dividing point between segment 2 and segment 3 is when the straight line segment l2 is simultaneously tangent to both the upper left fixed roller and the roller above it. At this point, the straight line segment l2 is completely vertical, and xm1 has the following relationship:

[0083] When calculating segmented interval 3, such as Figure 14 and Figure 15 As shown, the diaphragm continues to move from the positive electrode side on the left to the negative electrode side until the common straight line formed by the straight line segment l1 and the straight line segment l2 is tangent to the upper fixed roller on the right. The diaphragm length of segment 3 includes the following components:

[0084] To solve for the diaphragm length, the coordinates of each point in the definition diagram are as follows: Figure 16 As shown.

[0085] The length of the arc segment h1 is: , among which angle The value is: The length of line segment l1 is: ; The length of the arc segment h4 is: , where the angle value The value is: ,

[0086] The formula for calculating the diaphragm length within segment 3 is as follows:

[0087] The segmentation point between segment 3 and segment 4 is the starting point of the straight line segment l2, which is tangent to the upper right moving roller. xm1 has the following relationship:

[0088] When calculating segmented interval 4, such as Figure 17 and Figure 18 As shown, the diaphragm continues to move from the positive electrode side to the negative electrode side, the straight segment l1 and the straight segment l2 separate, the arc segment h2 appears, and the contact angle between the diaphragm and the upper fixed roller on the right side gradually increases until the diaphragm lateral movement mechanism reaches the negative electrode side.

[0089] The diaphragm length of segment 4 includes the following components: .

[0090] like Figure 19 As shown, the center coordinates of the upper roller are s1(xs1,ys1), the center coordinates of the left upper fixed roller are s2(xs2,ys2), and the center coordinates of the left upper moving roller are m1(xm1,ym1).

[0091] The length of the arc segment h1 is: , among which angle The value is: The length of line segment l1 is: ; The length of the arc segment h2 is: , among which angle The value is: The length of line segment l2 is: ; The length of the arc segment h4 is: , among which angle The value is: ,

[0092] The formula for calculating the diaphragm length within segment 4 is as follows:

[0093] In summary, the calculation formula for the first diaphragm length variation segment is as follows:

[0094] Where t1, t2, t3, and t4 are the segmentation points of each segmented interval.

[0095] In one embodiment of the present invention, determining the length of the second diaphragm at the current lateral position of the second diaphragm length variation segment includes: obtaining the current lateral direction during the lateral movement; when the current lateral direction is a first lateral direction, dividing the second diaphragm length variation segment into multiple second path intervals according to the current lateral position; within each second path interval, calling its corresponding second length calculation model to determine the length of the effective path within that path interval, wherein different second path intervals correspond to different second length calculation models; superimposing the lengths of the effective path segments within each second path interval to obtain the second diaphragm length; or, when the current lateral direction is a second lateral direction, obtaining the actual width of the stacking stage; when the actual width is greater than a preset width threshold, adjusting the second diaphragm length variation segment. The membrane is segmented into multiple third path intervals. Within each third path interval, its corresponding third length calculation model is called to determine the length of the effective path within that interval. Different third path intervals correspond to different third length calculation models. The lengths of the effective path segments within each third path interval are summed to obtain the second membrane length. When the actual width is less than or equal to a preset width threshold, the second membrane length variation segment is segmented into multiple fourth path intervals. Within each fourth path interval, its corresponding fourth length calculation model is called to determine the length of the effective path within that interval. Different fourth path intervals correspond to different fourth length calculation models. The lengths of the effective path segments within each fourth path interval are summed to obtain the second membrane length.

[0096] In this embodiment, to accurately determine the length of the second diaphragm in the current lateral movement position, the current lateral movement direction of the diaphragm lateral movement mechanism during its movement is first obtained. This direction is typically defined as the first lateral movement direction, moving from the negative electrode stacking position to the positive electrode stacking position, and the reverse direction (i.e., from positive to negative) is the second lateral movement direction. When the current lateral movement direction is the first lateral movement direction, the system dynamically segments the conveyor path of the second diaphragm length change segment (i.e., between the diaphragm lateral movement mechanism and the stacking table) according to the current lateral movement position, dividing it into multiple second path intervals. Each interval corresponds to the diaphragm's path segment under different geometric states, such as paths crossing different rollers or passing through different clamping points. Within each second path interval, the system calls a second length calculation model that matches the structural characteristics of that interval. This model comprehensively considers the roller radius, diaphragm wrap angle, tangent point position, and spatial coordinate relationship to accurately calculate the effective path length within that interval. Subsequently, the effective path lengths within all second path intervals are accumulated to obtain the second diaphragm length in the current state.

[0097] When the current lateral movement direction is the second lateral movement direction, the system further incorporates the actual width of the stacking stage as a judgment condition. If the detected actual width is greater than the preset width threshold, it indicates that the stacking stage structure is large or there are many electrode stacks. In this case, the path geometry is complex. The system divides the second diaphragm length variation segment into multiple third path intervals and calls the corresponding third length calculation model in each interval to more precisely model the diaphragm's transport morphology on the wide platform. The effective lengths of each segment are calculated and then summed to obtain the second diaphragm length. When the actual width is less than or equal to the preset width threshold, it indicates that the stacking stage is narrow or there are fewer electrode stacks, and the transport path is relatively simplified. The system then divides it into multiple fourth path intervals and calls the fourth length calculation model adapted to this simplified structure to calculate the length. Finally, the second diaphragm length is obtained by superimposing the effective path lengths of each segment. By dynamically selecting the segmentation strategy and calculation model according to the lateral movement direction and the actual working conditions of the stacking stage, high-precision and adaptive modeling of the second diaphragm length variation segment under different operating conditions is achieved, significantly improving the accuracy of the cache mechanism motion planning and the overall system stability.

[0098] Specifically, regarding the calculation range of the second diaphragm length variation segment, such as... Figure 20 and Figure 21 As shown, since the relative position between the right-hand roller and the upper roller above the stacking table remains constant, the common tangent and tangent point of the two rollers remain unchanged. The tangency relationship changes only when the diaphragm disengages from the right-hand roller (hereinafter referred to as the right roller or roller 2). However, during the entire transverse movement, the position where the diaphragm has the least contact with the roller is... Figure 20 and Figure 21 The position shown is such that the diaphragm is tangent to both rollers simultaneously, and the diaphragm remains on the right roller of the opposite roller shaft. Therefore, the diaphragm never detaches from the right roller during the entire lateral movement, and the junction point B remains unchanged. Therefore, the starting point for calculating the second diaphragm length variation segment is the junction point B in the figure.

[0099] Meanwhile, since the diaphragm on the stacking platform is always fixed by the clamping claws, the calculated endpoint of the second diaphragm length variation segment is the edge of the stacking platform. It is important to note that the endpoint position changes with the stroke of the diaphragm traversing mechanism as the stacking state changes. When the diaphragm traversing mechanism moves from positive to negative, the endpoint position is the left edge of the stacking platform. When the diaphragm traversing mechanism moves from negative to positive, the endpoint position is the right edge of the stacking platform.

[0100] During the lateral movement, as the diaphragm's position changes, some of the wrap angle between the diaphragm and the roller, or some straight segments of the diaphragm, will disappear and some will reappear. To ensure more accurate diaphragm length calculation, the algorithm must be compatible with these interactive changes in the diaphragm. Therefore, a segmented approach is used when calculating the diaphragm length, and the formula for calculating the diaphragm length within each segment remains unchanged.

[0101] Furthermore, because the stacking machine accommodates a wide range of electrode core widths, the segmentation of the diaphragm length calculation differs depending on the width of the stacking table. This is primarily because a vector angle formula is used when calculating the diaphragm wrap angle, with an output angle of 0-180°. When the stacking table is narrow, the angle θ between the line connecting the center of the right-side roller above the stacking table and the edge of the stacking table, and the line connecting the tangent point of the roller and the diaphragm, is greater than 180°, leading to an error in the vector angle formula's output angle. Figure 23 and Figure 24 As shown. Therefore, when explaining the segmentation points, the cases of wide and narrow pole cores need to be discussed separately.

[0102] For the above situation, the relative positions of the three points need to be discussed. When the diaphragm transverse mechanism is in the starting position, when the left edge of the stacking table is above the straight line formed by the center of the roller 2 and the intersection point B, then the angle θ is the dominant angle; when the left edge of the stacking table is below the straight line formed by the center of the roller 2 and the intersection point B, then the angle θ is the minor angle.

[0103] With the center of the upper surface of the stacking table as the origin, let the coordinates of the center P2 of roller 2 be... The coordinates of point O on the left edge of the stacking stage are The coordinates of the boundary point B are The coordinates of the various institutions have the following relationship: The equation of the straight line formed by the intersection point B and the center of the roller 2 circle is:

[0104] When angle θ is the dominant angle (the left edge of the stacked platform is above the straight line), we have:

[0105] When angle θ is a minor angle (the left edge of the stacked platform is below the straight line), we have:

[0106] The coordinates in the formula are expressed as follows:

[0107] Where: r is the radius of the roller; f is the distance between the centers of roller 1 and roller 2; h is the distance between the center of the roller and the upper surface of the stacking table; w is the actual width of the stacking table; and d is the distance from the center of roller 2 to the center of the roller above it.

[0108] Substituting the coordinates of the stacked platform edge into the inequality, we obtain the relationship between the actual width and the preset width threshold, namely:

[0109] In summary, when the actual width w of the stacking stage is less than the preset width threshold w0, the angle θ changes from an abscissa to an adequacy angle during the diaphragm's lateral movement from positive to negative. Therefore, segmentation points need to be added for discussion during calculation. Thus, when the actual width is greater than the preset width threshold, the second diaphragm length change segment is segmented into multiple third path intervals; when the actual width is less than or equal to the preset width threshold, the second diaphragm length change segment is segmented into multiple fourth path intervals.

[0110] When the current lateral movement direction is the second lateral movement direction, that is, the diaphragm moves from positive to negative lateral movement.

[0111] like Figure 24-27 As shown, when the actual width of the stacking stage is greater than the preset width threshold, the second diaphragm length variation segment is divided into two segments. That is, the second diaphragm length of the second diaphragm length variation segment (i.e., the diaphragm length of the wide electrode core moving from positive to negative) consists of the following segments:

[0112] in, This indicates the time point when the diaphragm is at the boundary between segmented interval 1 and segmented interval 2, that is, the second diaphragm length change segment is divided into segmented interval 1 and segmented interval 2.

[0113] With the center of the upper surface of the stacking table as the origin, the coordinates of the center points of rollers 1 and 2 in the x-direction indicate the motion changes of the diaphragm traversing mechanism, which is a function related to time t. Let the coordinates of the center P1 of roller 1 be... The coordinates of the center P2 of the roller 2 are: The coordinates of point O on the left edge of the stacking stage are The coordinates of the boundary point B are The coordinates of the center a of the upper fixed roller are The coordinate d of the center of the upper moving roller on the side closest to the upper fixed roller is The relationship between the coordinates of the coordinate point and t is as follows:

[0114] Where r is the radius of the roller; f is the distance between the centers of roller 1 and roller 2; h is the distance between the center of the roller and the upper surface of the stacking platform; w is the actual width of the stacking platform; d is the distance from the center of roller 2 to the center of the roller above it; wd is the distance from the center of the upper fixed roller to the center of the stacking platform in the horizontal direction; hd is the height of the upper fixed roller from the upper surface of the stacking platform in the vertical direction; wj is the distance from the upper moving roller to the center line of the diaphragm transverse movement mechanism; s(t) is the x-axis coordinate of the center point of the roller of the diaphragm transverse movement mechanism.

[0115] The angle θ formed by taking the center of the roller 2 circle as the vertex and the intersection point and the edge point of the stacked sheets is:

[0116] The angle formed by taking the center of the roller 2 circle as the vertex, the tangent point, and the edge of the stacked sheet is... for:

[0117] The length h1 corresponding to arc segment 1 is: The length of line segment l1 have:

[0118] For the segmentation point of the function, when the diaphragm transverse mechanism is in this position, the straight line l1 is simultaneously tangent to both roller 1 and roller 2 and passes through the midpoint of the line connecting the centers of the two rollers. Therefore, we have:

[0119] For the segmented interval 2 in formula (50), the value of the constant a can be expressed as:

[0120] After entering the latter part of formula (50) (i.e., segmented interval 2), the position points that remain unchanged, besides the intersection points, also include point C (not shown in the figure), which is tangent to the straight line l1 and the roller 1. Its coordinates are... The following relationship exists:

[0121] Based on the above derivation, the length of line l2 is: The length of arc length h2 is:

[0122] in:

[0123] In summary, when the actual width of the stacking stage is greater than the preset width threshold and the diaphragm moves laterally from positive to negative, the length of the second diaphragm during the second diaphragm length change segment (i.e., the length of the diaphragm during the wide electrode core movement from positive to negative) is:

[0124] When the actual width of the stacking stage is greater than the preset width threshold and the diaphragm moves laterally from negative to positive, the second diaphragm length change segment is divided into three third path intervals, denoted as segment interval 1, segment interval 2, and segment interval 3, respectively. The second diaphragm length of the second diaphragm length change segment (i.e., the diaphragm length when the wide electrode core moves from negative to positive) consists of the following segments:

[0125] refer to Figures 28-31 With the center of the upper surface of the stacking table as the origin, the coordinate positions of the center points of rollers 1 and 2 in the x-direction indicate the motion changes of the diaphragm traversing mechanism, which is a function related to time t. Let the coordinates of the center P1 of roller 1 be... The coordinates of the center P2 of the roller 2 are: The coordinates of point O on the left edge of the stacking stage are The coordinates of the boundary point B are The coordinates of the boundary point C are The coordinates of the center a of the upper fixed roller are The coordinate d of the center of the upper moving roller on the side closest to the upper fixed roller is The relationship between the coordinates of the coordinate point and t is shown below.

[0126] Where r is the radius of the roller; f is the distance between the centers of roller 1 and roller 2; h is the distance between the center of the roller and the upper surface of the stacking table; w is the width of the stacking table; and d is the distance from the center of roller 2 to the center of the roller above it.

[0127] The coordinates of point C (not shown in the figure) where line l1 is tangent to roller 1 are... The following relationship exists:

[0128] The equation for the segmented interval 1 in formula (64): The angle formed by taking the center of the roller 1 circle as the vertex, the intersection point C, and the edge point of the stacked sheets. for:

[0129] The angle formed by taking the center of the roller 1 circle as the vertex, the tangent point, and the edge of the stacked sheet is... for:

[0130] The length h2 corresponding to arc segment 2 is:

[0131] The length of line l2 is:

[0132] The value of the constant b can be expressed as:

[0133] Therefore, the length of the diaphragm during reverse motion is:

[0134] The equation for the segmented interval 2 in formula (64): When at the segmentation point, the diaphragm transverse movement mechanism is in this position, and straight line l1 is simultaneously tangent to rollers 1 and 2 and passes through the midpoint of the line connecting the centers of the two rollers. Therefore:

[0135] After passing the intersection point C, the length of the diaphragm is the sum of the lengths of the two circular arcs h1 and the straight line l1.

[0136] Similarly, for the angle formed by taking the center of the roller 2 circle as the vertex and the intersection point and the edge point of the stacked sheets, for:

[0137] The angle formed by taking the center of the roller 2 circle as the vertex, the tangent point, and the edge of the stacked sheet is... for:

[0138] The length corresponding to arc segment 1 have:

[0139] The length of line segment l1 have:

[0140] The length of the diaphragm in this section is:

[0141] The equation for segmented interval 3 in formula (64) is such that the angle formed by the center of roller 2, the intersection point B and the edge of the stack is greater than 180 degrees.

[0142] When at segmentation point t2, the center of roller 2, the junction point B, and the edge of the stack are on the same straight line. At this time, we have

[0143] Simplifying, we get the following positions for the diaphragm lateral movement mechanism:

[0144] Based on the above, the length of the diaphragm at this time is:

[0145] Therefore, when the diaphragm lateral movement mechanism moves in the reverse direction, the diaphragm length is:

[0146] When the actual width of the stacking stage is less than or equal to a preset width threshold and the diaphragm moves laterally from positive to negative, the second diaphragm length change segment is divided into multiple fourth path intervals, i.e., as shown below. Figure 32-35 As shown, the length of the second diaphragm in the second diaphragm length variation section consists of the following parts:

[0147] With the center of the upper surface of the stacking table as the origin, the coordinates of the center points of rollers 1 and 2 in the x-direction indicate the motion changes of the transverse mechanism, which is a function related to time t. Let the coordinates of the center P1 of roller 1 be... The coordinates of the center P2 of the roller 2 are: The coordinates of point O on the left edge of the stacking stage are The coordinates of the boundary point B are The coordinates of the center a of the upper fixed roller are The coordinate d of the center of the upper moving roller on the side closest to the upper fixed roller is The relationship between the coordinates of the coordinate point and t is shown below:

[0148] Where r is the radius of the roller; f is the distance between the centers of roller 1 and roller 2; h is the distance between the center of the roller and the upper surface of the stacking table; w is the width of the stacking table; and d is the distance from the center of roller 2 to the center of the roller above it.

[0149] The angle formed by taking the center of the roller 2 circle as the vertex, the intersection point, and the edge point of the stacked sheets. for:

[0150] The solution obtained at this time The angle is less than 180°.

[0151] The angle formed by taking the center of the roller 2 circle as the vertex, the tangent point, and the edge of the stacked sheet is... for:

[0152] The length corresponding to arc segment 1 have:

[0153] The length of line segment l1 have:

[0154] At the function segmentation point t1, the edge of the stack, the center of roller 2, and the intersection point B are on the same straight line. At this time:

[0155] have:

[0156] For the second function segmentation point t2, when the diaphragm transverse mechanism is in this position, the straight line l1 is tangent to both roller 1 and roller 2 simultaneously and passes through the midpoint of the line connecting the centers of the two rollers. Therefore, we have:

[0157] For the third segment of equation (83), the value of the constant a can be expressed as:

[0158] After entering the latter part of the piecewise equation, the only points that remain unchanged, besides the intersection points, are point C, which is tangent to line l1 and roller 1. Its coordinates... The following relationship exists:

[0159] Based on the above derivation, the length of line l2 is:

[0160] The length of arc length h2 is:

[0161] in:

[0162] In summary, when the actual width of the stacking stage is less than or equal to the preset width threshold and the diaphragm moves laterally from positive to negative, the length of the second diaphragm during the second diaphragm length change segment is:

[0163] When the actual width of the stacking stage is less than or equal to a preset width threshold and the diaphragm moves from positive to negative, by Figures 36-39 As shown, the initial boundary point changes from B to C. At this point, the slope of the straight line formed by boundary point C and the center of roller 1 is negative, and this straight line does not intersect the x-axis on the left side of the transverse mechanism. Therefore, during the entire reverse movement, the angle formed by boundary point C, the center of roller 1, and the edge of the stack is always less than 180°, and there is no need to handle the θ angle additionally due to the stack being too wide or too narrow. Therefore, the formula for calculating the diaphragm length from negative to positive for narrow stacks can be completely applied to wide stacks. Therefore, the derivation is not performed here, and the formula for calculating the diaphragm length from negative to positive for wide stacks is directly applied. The diaphragm length is:

[0164] In summary, the formula for calculating the length of the second diaphragm is as follows: When the actual width w of the stacking table is greater than the preset width threshold When the core is wide, the length of the second diaphragm is given by formula (63) when the diaphragm moves laterally from the positive electrode to the negative electrode; and by formula (82) when the diaphragm moves laterally from the negative electrode to the positive electrode.

[0165] When the actual width w of the stacking table is less than the preset width threshold When the core is narrow, the length of the second diaphragm is given by formula (97) when the diaphragm moves laterally from the positive to the negative electrode; when the diaphragm moves laterally from the negative to the positive electrode, the length of the second diaphragm is given by formula (99).

[0166] Furthermore, the algorithm for calculating the first diaphragm length in the first diaphragm length change segment is also known as the upper diaphragm length calculation algorithm, and the algorithm for calculating the second diaphragm length in the second diaphragm length change segment is also known as the lower diaphragm length calculation algorithm.

[0167] On the other hand, when the diaphragm lateral movement mechanism is on the negative side and not lateral, the system determines it to be in a static stationary state, at which time the diaphragm conveyor path remains basically unchanged. Since there is no relative motion, the length of the second diaphragm length variation segment tends to stabilize, and the system directly calls the preset static length model or the historically stored reference length value, combined with the current positional relationship between the clamping roller and the stacking table, to determine the diaphragm length at this time.

[0168] When the diaphragm traversing mechanism reaches the positive electrode side and stops moving, the system determines that it is in a stationary state on the positive electrode side. At this time, the diaphragm forms a new stable configuration on the conveyor path between the traversing mechanism and the stacking table, and its length is different from that on the negative electrode side. By detecting the current position information, the system calls a specific length calculation model applicable to the positive electrode side, and comprehensively considers parameters such as the roller position, diaphragm tension direction, and stacking table boundary to accurately calculate the length of the second diaphragm in this state.

[0169] According to the embodiment of the present invention, the diaphragm buffer motion planning optimization method for a stacking machine generates an initial transverse motion plan based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This method effectively eliminates model simplification errors in traditional calculation methods by fully modeling the actual diaphragm conveyor path, significantly improving the tracking accuracy of the diaphragm buffer mechanism for transverse movement and reducing diaphragm tension fluctuations caused by inaccurate membrane supply during stacking. This makes the buffer motion planning more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria. This improves the alignment and overall quality of the electrode cores, effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0170] A further embodiment of the present invention discloses a diaphragm buffer motion planning optimization device for a wafer stacker.

[0171] like Figure 40 As shown, the diaphragm buffer motion planning optimization device 2 for the stacking machine includes: a generation module 21, a determination module 22, a judgment module 23, and an optimization module 24.

[0172] The generation module 21 generates an initial transverse motion plan based on the preset motion parameters of the diaphragm transverse mechanism; the determination module 22 determines the buffer motion plan of the diaphragm buffer mechanism based on the initial transverse motion plan and by calling a preset electronic cam algorithm; the judgment module 23 determines whether the buffer motion plan meets the qualified judgment conditions; and the optimization module 24 determines the transverse motion optimization range based on the buffer motion plan when the buffer motion plan does not meet the qualified judgment conditions, and optimizes the buffer motion plan based on the transverse motion optimization range until the buffer motion plan meets the qualified judgment conditions.

[0173] In one embodiment of the present invention, the optimization module 24 determines the lateral movement optimization interval based on the cache movement plan, and optimizes the cache movement plan based on the lateral movement optimization interval until the cache movement plan meets the cache movement plan qualification judgment condition. This includes: determining the interval in the cache movement plan that does not meet the cache movement plan qualification judgment condition as the cache movement non-compliance interval; determining the corresponding lateral movement optimization interval based on the mapping relationship between the cache movement non-compliance interval and the lateral movement plan; adjusting the current lateral movement plan according to the lateral movement optimization interval to generate an updated lateral movement plan; and regenerating the cache movement plan according to the updated lateral movement plan until the cache movement plan meets the cache movement plan qualification judgment condition.

[0174] In one embodiment of the present invention, when the cache motion plan meets the cache motion plan qualification judgment condition, the method includes: inputting the final transverse motion plan corresponding to the cache motion plan qualification judgment condition as the actual motion plan into the diaphragm transverse mechanism, so that the diaphragm transverse mechanism drives the diaphragm cache mechanism to run according to the cache motion plan, wherein the final transverse motion plan includes the initial transverse motion plan or the updated transverse motion plan.

[0175] In one embodiment of the present invention, when determining whether the cache motion plan meets the cache motion plan qualification judgment condition, the judgment module 23 includes: obtaining one or more cache motion parameters of the diaphragm cache mechanism determined based on the cache motion plan; comparing each cache motion parameter with its corresponding preset threshold; and determining that the cache motion plan meets the cache motion plan qualification judgment condition when all cache motion parameters do not exceed their corresponding preset thresholds.

[0176] In one embodiment of the present invention, when determining the buffer motion plan of the diaphragm buffer mechanism based on the initial lateral movement plan and by calling a preset electronic cam algorithm, the determining module 22 includes: obtaining the current lateral movement position and current status flag of the diaphragm buffer mechanism corresponding to the current control cycle from the initial lateral movement plan; when determining the diaphragm lateral movement state as a lateral movement state according to the current status flag, dividing the path length change of the diaphragm buffer mechanism in the current lateral movement process into a first diaphragm length change segment and a second diaphragm length change segment, wherein the first diaphragm length change segment is the conveyor path formed by the diaphragm around one or more rollers above the diaphragm buffer mechanism, and the second diaphragm length change segment is the diaphragm lateral movement path... The conveyor path of the diaphragm between the transfer mechanism and the stacking stage is determined; the lengths of the first and second diaphragm segments at the current lateral position are determined; the lengths of the first and second diaphragm segments are added together to obtain the total variable diaphragm length for the current control cycle; based on the difference between the total variable diaphragm length for the current control cycle and the historical total variable diaphragm length for the previous control cycle, the change in diaphragm length between two adjacent control cycles is determined; the change in diaphragm length is used as the diaphragm length that the diaphragm buffer mechanism needs to absorb or release in the current control cycle to determine the target displacement of the diaphragm buffer mechanism in the current control cycle; and a buffer motion plan is generated based on the target displacement.

[0177] In one embodiment of the present invention, when determining the length of the first diaphragm at the current lateral position, the determining module 22 includes: dividing the length change segment of the first diaphragm into multiple first path intervals according to the current lateral position; calling the corresponding first length calculation model in each first path interval to determine the length of the effective path in the path interval, wherein different first path intervals correspond to different first length calculation models; and superimposing the lengths of the effective path segments in each first path interval to obtain the length of the first diaphragm.

[0178] In one embodiment of the present invention, when determining the length of the second diaphragm length change segment at the current lateral position, the determining module 22 includes: obtaining the current lateral movement direction during the lateral movement process; when the current lateral movement direction is the first lateral movement direction, dividing the second diaphragm length change segment into multiple second path intervals according to the current lateral movement position; within each second path interval, calling its corresponding second length calculation model to determine the length of the effective path within that path interval, wherein different second path intervals correspond to different second length calculation models; superimposing the lengths of the effective path segments within each second path interval to obtain the second diaphragm length; or, when the current lateral movement direction is the second lateral movement direction, obtaining the actual width of the stacking stage; when the actual width is greater than a preset width threshold, determining the length of the second diaphragm. The length variation segment is segmented into multiple third path intervals. Within each third path interval, its corresponding third length calculation model is called to determine the length of the effective path within that interval. Different third path intervals correspond to different third length calculation models. The lengths of the effective path segments within each third path interval are summed to obtain the second diaphragm length. When the actual width is less than or equal to a preset width threshold, the second diaphragm length variation segment is segmented into multiple fourth path intervals. Within each fourth path interval, its corresponding fourth length calculation model is called to determine the length of the effective path within that interval. Different fourth path intervals correspond to different fourth length calculation models. The lengths of the effective path segments within each fourth path interval are summed to obtain the second diaphragm length.

[0179] It should be noted that the specific implementation method of the diaphragm buffer motion planning of the stacking machine is similar to the specific implementation method of the diaphragm buffer motion planning optimization method for the stacking machine described in the first aspect embodiment of the present invention. Therefore, for a detailed exemplary description of the diaphragm buffer motion planning optimization device 2 for the stacking machine, please refer to the aforementioned description of the diaphragm buffer motion planning optimization for the stacking machine. To reduce redundancy, it will not be repeated here.

[0180] According to an embodiment of the present invention, the diaphragm buffer motion planning optimization device 2 for a stacking machine comprises a generation module 21 that generates an initial transverse motion plan based on pre-set motion parameters of the diaphragm transverse movement mechanism. Then, a determination module 22 calls a preset electronic cam algorithm to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate membrane supply during stacking, thus making the buffer motion plan more accurate and reliable. Next, a judgment module 23 determines whether the buffer motion plan meets the qualified criteria for buffer motion planning. Based on the judgment result, it determines whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. An optimization module 24 optimizes the buffer motion plan based on the transverse motion optimization range until the buffer motion plan meets the qualified criteria for buffer motion planning. This improves the alignment and overall quality of the electrode cores, effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0181] A further embodiment of the present invention discloses a stacking machine, comprising: a stacking table; a diaphragm traversing mechanism for realizing relative movement between the diaphragm and the stacking table; a diaphragm buffering mechanism for controlling the path length of the diaphragm located above the stacking table during the diaphragm traversing process, and maintaining stable diaphragm tension in response to changes in the path length of the diaphragm; and a controller for executing the diaphragm buffering motion planning optimization method for a stacking machine as described in any of the above embodiments of the present invention.

[0182] Among them, the diaphragm buffer mechanism is the mechanism that actually controls the length of the diaphragm above the stacking table when the stacking table moves laterally. The diaphragm buffer mechanism includes, but is not limited to, the storage shaft and the buffer shaft. The diaphragm lateral movement mechanism is the motion mechanism that controls the relative motion between the stacking table and the diaphragm. The relative motion can be the movement of the stacking table or the movement of the diaphragm. The diaphragm lateral movement mechanism includes, but is not limited to, the diaphragm swing assembly and the film pulling shaft.

[0183] It should be noted that the specific implementation of the diaphragm buffer motion planning for the stacking machine is similar to the specific implementation of the diaphragm buffer motion planning optimization method or apparatus for the stacking machine in any of the above embodiments of the present invention. Therefore, for a detailed exemplary description of the diaphragm buffer motion planning optimization process for the stacking machine, please refer to the relevant description of the diaphragm buffer motion planning optimization method or apparatus for the stacking machine mentioned above. To reduce redundancy, it will not be repeated here.

[0184] According to the stacking machine of the present invention, an initial transverse motion plan is generated based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate membrane supply during stacking, thus making the buffer motion plan more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria, thereby improving the alignment and overall quality of the electrode cores. Simultaneously, it effectively solves the problems of tape breakage and correction failure during high-speed stacking, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0185] A further embodiment of the present invention also discloses an electronic device.

[0186] In some embodiments, the electronic device includes the diaphragm buffer motion planning optimization device for a wafer stacker described in the above embodiments of the present invention.

[0187] In other embodiments, the electronic device includes a processor, a memory, and a diaphragm cache motion planning optimization program for a wafer stacker stored in the memory and executable on the processor. When executed by the processor, the diaphragm cache motion planning optimization program for a wafer stacker implements the diaphragm cache motion planning optimization method for a wafer stacker as described in any of the above embodiments of the present invention.

[0188] According to the electronic device of the present invention, an initial transverse motion plan is generated based on the preset motion parameters of the diaphragm transverse movement mechanism. Then, a preset electronic cam algorithm is invoked to determine the buffer motion plan based on the initial transverse motion plan. This complete modeling of the actual diaphragm conveyor path effectively eliminates model simplification errors in traditional calculation methods, significantly improves the tracking accuracy of the diaphragm buffer mechanism for transverse movement, and reduces diaphragm tension fluctuations caused by inaccurate film supply during lamination, thus making the buffer motion plan more accurate and reliable. Next, it is determined whether the buffer motion plan meets the qualified criteria. Based on the determination result, it is determined whether optimization is needed. If optimization is needed, a transverse motion optimization range is determined based on the buffer motion plan. The buffer motion plan is then optimized based on this range until it meets the qualified criteria, thereby improving the alignment and overall quality of the electrode cores. Simultaneously, it effectively solves the problems of tape breakage and correction failure during high-speed lamination, reduces costs, improves compatibility, and enhances the operating efficiency and stability of the equipment.

[0189] In the description of this specification, references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example.

[0190] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A method for optimizing diaphragm buffer motion planning in a wafer stacking machine, the wafer stacking machine comprising a diaphragm traversing mechanism, a diaphragm buffer mechanism, and a stacking table, characterized in that, The method includes: An initial lateral movement plan is generated based on the preset motion parameters of the diaphragm lateral movement mechanism. Based on the initial lateral motion plan, and by invoking a preset electronic cam algorithm, the buffer motion plan of the diaphragm buffer mechanism is determined; Determine whether the cache motion plan meets the cache motion plan qualification criteria; If not, then determine the lateral movement optimization interval based on the cache movement plan, and optimize the cache movement plan based on the lateral movement optimization interval until the cache movement plan meets the cache movement plan qualification judgment condition.

2. The diaphragm buffer motion planning optimization method for a wafer stacker according to claim 1, characterized in that, Determining the lateral movement optimization interval based on the cache motion plan, and optimizing the cache motion plan based on the lateral movement optimization interval until the cache motion plan meets the cache motion plan qualification criteria, includes: The intervals in the cache motion plan that do not meet the qualified judgment conditions of the cache motion plan are identified as the cache motion unsatisfied intervals; Based on the mapping relationship between the buffered motion non-satisfaction interval and the lateral motion planning, the corresponding lateral motion optimization interval is determined. The current lateral movement plan is adjusted according to the lateral movement optimization interval to generate an updated lateral movement plan; The cached motion plan is regenerated based on the updated lateral motion plan until the cached motion plan meets the cached motion plan qualification criteria.

3. The diaphragm buffer motion planning optimization method for a stacking machine according to claim 1 or 2, characterized in that, When the cache motion plan meets the cache motion plan qualification criteria, it includes: The final lateral movement plan corresponding to the condition that the cache movement plan is qualified is input into the diaphragm lateral movement mechanism as the actual movement plan, so that the diaphragm lateral movement mechanism drives the diaphragm cache mechanism to run according to the cache movement plan. The final lateral movement plan includes the initial lateral movement plan or the updated lateral movement plan.

4. The diaphragm buffer motion planning optimization method for a wafer stacker according to claim 1, characterized in that, When determining whether the cache motion plan meets the cache motion plan qualification criteria, the following are included: Obtain one or more cache motion parameters of the diaphragm cache mechanism determined based on the cache motion planning; Each cache motion parameter is compared with its corresponding preset threshold. When all the cache motion parameters do not exceed their corresponding preset thresholds, the cache motion plan is determined to meet the cache motion plan qualification criteria.

5. The diaphragm buffer motion planning optimization method for a wafer stacker according to claim 1, characterized in that, When determining the buffer motion plan of the diaphragm buffer mechanism based on the initial lateral motion plan and by invoking a preset electronic cam algorithm, the process includes: Obtain the current lateral position and current status flag of the diaphragm lateral movement mechanism corresponding to the current control cycle from the initial lateral movement plan; When the diaphragm lateral movement state is determined to be a lateral movement state according to the current state flag, the path length change of the diaphragm lateral movement mechanism during the current lateral movement process is divided into a first diaphragm length change segment and a second diaphragm length change segment. The first diaphragm length change segment is the conveyor path formed by the diaphragm around one or more rollers above the diaphragm lateral movement mechanism, and the second diaphragm length change segment is the conveyor path of the diaphragm between the diaphragm lateral movement mechanism and the stacking table. Determine the lengths of the first and second diaphragms at the current lateral position, respectively, for the first diaphragm length variation segment and the second diaphragm length variation segment. The lengths of the first and second diaphragms are added together to obtain the total variable diaphragm length for the current control cycle; Based on the difference between the total variable diaphragm length of the current control cycle and the historical total variable diaphragm length of the previous control cycle, the change in diaphragm length between two adjacent control cycles is determined. The change in diaphragm length is used as the diaphragm length that the diaphragm buffer mechanism needs to absorb or release within the current control cycle, so as to determine the target displacement of the diaphragm buffer mechanism within the current control cycle. The buffer motion plan is generated based on the target displacement.

6. The diaphragm buffer motion planning optimization method for a wafer stacker according to claim 5, characterized in that, Determining the length of the first diaphragm at the current lateral position during the first diaphragm length change segment includes: Based on the current lateral position, the first diaphragm length change segment is divided into multiple first path intervals; Within each first path interval, the corresponding first length calculation model is invoked to determine the length of the effective path within that path interval. Different first path intervals correspond to different first length calculation models. The length of the first diaphragm is obtained by summing the lengths of the effective path segments within each first path interval.

7. The diaphragm buffer motion planning optimization method for a wafer stacker according to claim 5, characterized in that, Determining the length of the second diaphragm during the second diaphragm length change segment at the current lateral position includes: Obtain the current lateral movement direction during the lateral movement process; When the current lateral movement direction is the first lateral movement direction, the second diaphragm length change segment is segmented into multiple second path intervals according to the current lateral movement position; Within each second path interval, the corresponding second length calculation model is called to determine the length of the effective path within that path interval. Different second path intervals correspond to different second length calculation models. The length of the second diaphragm is obtained by summing the lengths of the effective path segments within each second path interval; or... When the current lateral movement direction is the second lateral movement direction, the actual width of the stacking stage is obtained; When the actual width is greater than the preset width threshold, the second diaphragm length change segment is segmented into multiple third path intervals; Within each third path interval, the corresponding third length calculation model is invoked to determine the length of the effective path within that path interval. Different third path intervals correspond to different third length calculation models. The lengths of the effective path segments within each third path interval are summed to obtain the length of the second diaphragm. When the actual width is less than or equal to the preset width threshold, the second diaphragm length change segment is segmented into multiple fourth path intervals; Within each fourth path interval, the corresponding fourth length calculation model is invoked to determine the length of the effective path within that path interval. Different fourth path intervals correspond to different fourth length calculation models. The lengths of the effective path segments within each fourth path interval are summed to obtain the second diaphragm length.

8. A diaphragm buffer motion planning optimization device for a stacking machine, the stacking machine comprising a diaphragm traversing mechanism, a diaphragm buffer mechanism, and a stacking table, characterized in that, The device includes: The generation module is used to generate an initial lateral movement plan based on the preset motion parameters of the diaphragm lateral movement mechanism. The determination module is used to determine the buffer motion plan of the diaphragm buffer mechanism based on the initial lateral motion plan and by calling a preset electronic cam algorithm. The judgment module is used to determine whether the cached motion plan meets the cached motion plan qualification judgment conditions; An optimization module is used to determine a lateral movement optimization interval based on the cache motion plan when the cache motion plan does not meet the cache motion plan qualification criteria, and optimize the cache motion plan based on the lateral movement optimization interval until the cache motion plan meets the cache motion plan qualification criteria.

9. A stacking machine, characterized in that, include: Stacking table; A diaphragm lateral movement mechanism is used to realize the relative movement between the diaphragm and the stacking stage; A diaphragm buffer mechanism is used to control the path length of the diaphragm located above the stacking stage during the diaphragm lateral movement, and to maintain stable diaphragm tension in response to changes in the path length of the diaphragm. A controller for executing the diaphragm buffer motion planning optimization method for a stacker as described in any one of claims 1-7.

10. An electronic device, characterized in that, include: The diaphragm buffer motion planning optimization device for a stacking machine as described in claim 8; or, The processor, the memory, and a diaphragm cache motion planning optimization program for a wafer stacker stored in the memory and executable on the processor, wherein the diaphragm cache motion planning optimization program for a wafer stacker, when executed by the processor, implements the diaphragm cache motion planning optimization method for a wafer stacker as described in any one of claims 1-7.

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