An adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates

Abstract

This invention discloses an adjustable target distance vacuum sputtering device for irregularly shaped substrates, belonging to the field of substrate processing technology. The invention utilizes an electric telescopic plate, an L-shaped pusher frame, a fixed turntable, and a telescopic swing rod. A connecting frame and a fixed plate lift a movable plate that slides inside a rectangular frame, adjusting the target distance between the plate-type sputtering source and the fixed workpiece within the rectangular frame. After the target distance is adjusted, a second drive motor is activated, rotating a bevel gear. This rotation causes the fixed turntable at its end to rotate in a circular motion. The telescopic swing rod, connected to the edge of the fixed turntable via bearings, reciprocates with this circular motion, while the other end of the telescopic swing rod rotates inside the fixed frame. This converts the circular motion into angular swinging power for the concave frame, allowing the plate-type sputtering source fixed on the concave frame to synchronously complete the angular swing, covering different parts of the irregularly shaped substrate, such as curved surfaces, inclined surfaces, and stepped surfaces, achieving omnidirectional, blind-spot-free sputtering processing of the irregularly shaped substrate.

Description

Technical Field

[0001] This invention relates to the field of substrate processing technology, specifically to an adjustable target distance vacuum sputtering device for irregularly shaped substrates. Background Technology

[0002] Vacuum sputtering technology, as the core process for functional coating of substrate surfaces, has been widely used in various fields such as electronic devices, optical components, precision machinery, and aerospace parts due to its outstanding advantages such as strong adhesion between the film and the substrate, high controllability of film composition and thickness, and excellent deposition uniformity. It has become a key means to achieve surface modification of substrates and improve their wear resistance, corrosion resistance, and oxidation resistance. With the rapid development of modern industrial manufacturing towards high precision, customization, and diversification, the application scenarios of irregularly shaped substrates with curved surfaces, inclined surfaces, stepped surfaces, and irregular contours are increasing. The market demand for surface coating processing of irregularly shaped substrates has also increased significantly, which puts forward higher requirements for the adaptability, processing accuracy, and automation of vacuum sputtering equipment.

[0003] Existing vacuum sputtering devices for irregularly shaped substrates have a fixed distance between the sputtering source and the substrate, which cannot be precisely adjusted according to the contour size, curvature of the surface, and coating process requirements of the irregularly shaped substrate. When processing irregularly shaped substrates of different specifications and shapes, the fixed target distance can easily lead to excessively high or low sputtering intensity in local areas of the substrate, resulting in uneven film thickness and significantly reducing coating quality. This makes it difficult to meet the personalized processing needs of irregularly shaped substrates. At the same time, the sputtering direction of the sputtering source is relatively singular, which cannot fully cover complex parts such as curved surfaces, inclined surfaces, and stepped surfaces of irregularly shaped substrates. This can easily create processing blind spots. Unsputtered blind spots will result in incomplete coating on the substrate surface, directly affecting the surface function and performance of the substrate.

[0004] Based on this, the present invention designs an adjustable target distance vacuum sputtering device for irregularly shaped substrates to solve the above problems. Summary of the Invention

[0005] The purpose of this invention is to provide an adjustable target distance vacuum sputtering device for irregularly shaped substrates, addressing the problem mentioned in the background art where the distance between the sputtering source and the substrate is fixed, making it impossible to precisely adjust according to the contour dimensions, curvature, and coating process requirements of the irregularly shaped substrate. When processing irregularly shaped substrates of different specifications and shapes, a fixed target distance can easily lead to excessively high or low sputtering intensity in local areas of the substrate, resulting in uneven film thickness and significantly reducing coating quality, making it difficult to meet the personalized processing needs of irregularly shaped substrates. At the same time, the sputtering direction of the sputtering source is relatively singular, making it impossible to fully cover complex parts such as curved surfaces, inclined surfaces, and stepped surfaces of irregularly shaped substrates with sputtering, easily forming processing blind spots. Unsputtered blind spots will result in incomplete coating on the substrate surface, directly affecting the surface function and performance of the substrate.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] An adjustable target-distance vacuum sputtering apparatus for irregularly shaped substrates includes a processing chamber. The processing chamber includes a chamber body. A rectangular frame is fixedly installed at the center of the surface of the chamber body away from the opening, and the rectangular frame is connected to the interior of the chamber body. A rotating mechanism is rotatably installed inside the chamber body via bearings. The rotating mechanism includes a rotating column, and the two ends of the rotating column are rotatably connected to the top and bottom of the chamber body via bearings, respectively. Two disc frames are fixedly installed at the two ends of the rotating column inside the chamber body, and the positions of the two disc frames are corresponding. Three substrate fixing mechanisms are rotatably installed at the edge between the two disc frames via bearings at equal angles. A Geneva mechanism is provided on one side of the top of the processing chamber. A pushing mechanism is provided on the side of the rectangular frame away from the chamber body, and an inclined sputtering plate is slidably installed on the side of the rectangular frame close to the chamber body.

[0008] As a further embodiment of the present invention, a box cover is rotatably installed on one side of the box opening via a pin, and a sealing strip is fixedly installed at the edge of the box opening. The top and bottom of the inner side of the box are respectively provided with annular grooves, and a guide groove is provided at one corner of the annular groove near the box opening. A guide block is fixedly installed on the inner wall of the annular groove at a position corresponding to the guide groove. A vacuum connecting valve pipe is connected to the outer surface of the box on one side of the rectangular frame.

[0009] As a further embodiment of the present invention, the substrate fixing mechanism includes a rectangular frame, with T-shaped frames fixedly installed at the top and bottom of the rectangular frame, and the T-shaped frames being rotatably connected to the edge of the disc frame via bearings. A flipping roller is symmetrically installed on the side of the T-shaped frame away from the rectangular frame, passing through the disc frame and rotating symmetrically via a pivot, and the flipping roller is in close contact with the inner wall of the annular groove. Flexible clamping mechanisms are fixedly installed at the top and bottom of the inner side of the rectangular frame, and a three-way conduit is connected to one side of the two flexible clamping mechanisms. Multiple fixing clips are snapped onto the surface of the three-way conduit. An electric telescopic rod is fixedly installed at the top of one side of the rectangular frame, and a piston sleeve is fixedly installed at the bottom of the rectangular frame on the same side as the electric telescopic rod. The telescopic end of the electric telescopic rod extends through the piston sleeve and is fixedly installed inside the piston sleeve with a piston head that slides inside the piston sleeve. The end of the three-way conduit away from the flexible clamping mechanism is connected to the bottom end of the piston sleeve, and the fixing clips on the surface of the three-way conduit are fixedly connected to the surfaces of the rectangular frame and the piston sleeve, respectively.

[0010] As a further embodiment of the present invention, the Geneva mechanism includes a drive motor, which is fixedly connected to the top surface of the housing away from the opening. A drive turntable is fixedly installed at the output end of the drive motor. A linkage turntable is rotatably installed on the top of the housing located at the top of the rotating mechanism via a bearing. A limit plate is fixedly installed at the center of the top of the linkage turntable. A linkage strip is rotatably installed at the edges of the limit plate and the top of the drive turntable via a protrusion. A drive pin is fixedly installed at the edge of the top of the linkage turntable located on the side of the limit plate. An intermittent turntable is fixedly installed through the housing at the top of the rotating column. The surface of the intermittent turntable has six intermittent slots at equal angles, and the intermittent slots are engaged with the drive pins. An arc-shaped groove is provided on the surface of the intermittent turntable between two adjacent intermittent slots, and the arc-shaped groove is closely fitted to the limit plate.

[0011] As a further embodiment of the present invention, the pushing mechanism includes a T-shaped slide bar, which is fixedly connected to the inner wall of the rectangular frame away from the box body. A movable slide block is slidably mounted through the surface of the T-shaped slide bar. A limiting slide bar is symmetrically fixedly mounted inside the rectangular frame near the T-shaped slide bar. A pushing slide block is slidably mounted through the surfaces of the two limiting slide bars, and one side of the pushing slide block is fixedly connected to the movable slide block. An electric telescopic plate is rotatably mounted on the top side of the rectangular frame away from the T-shaped slide bar via a pin, and the telescopic end of the electric telescopic plate is rotatably connected to the movable slide block via a pin.

[0012] As a further embodiment of the present invention, a fixed column is fixedly installed at the center of the inner wall of the rectangular frame, and L-shaped pusher frames are rotatably installed at both ends of the fixed column. The end of the L-shaped pusher frame near the pusher slide is provided with a pusher groove, and the pusher groove is slidably connected to both ends of the pusher slide. The end of the L-shaped pusher frame away from the pusher groove is rotatably installed with a connecting frame via a pin, and the end of the connecting frame away from the L-shaped pusher frame is rotatably installed with a fixing plate via a pin.

[0013] As a further embodiment of the present invention, the inclined sputtering plate includes a movable plate, and fixed plates are respectively fixedly connected to the center of the edge of the movable plate near the pushing mechanism. Limiting slide rods 2 are slidably installed through the four corners of the movable plate, and the two ends of the limiting slide rods 2 are respectively fixedly connected to the four corners of the inner wall of the rectangular frame. A drive motor 2 is fixedly installed at the bottom of one side of the movable plate, and a bevel gear 1 is fixedly connected to the output end of the drive motor 2. A bevel gear 2 is rotatably installed at the center of the movable plate through a bearing, and the bevel gear 2 meshes with the bevel gear 1.

[0014] As a further embodiment of the present invention, a fixed turntable is fixedly installed at the end of the second bevel gear away from the first bevel gear through the moving plate. A limiting frame is fixedly installed on the side of the fixed turntable away from the second bevel gear. A curved frame is slidably installed inside the limiting frame. An electric push rod is fixedly installed at the bottom inside the limiting frame, and the telescopic end of the electric push rod is fixedly connected to the limiting frame. A telescopic swing rod is rotatably installed on the side of the curved frame away from the electric push rod via a bearing. Support plates are symmetrically fixedly installed on the side of the moving plate away from the second drive motor. A concave frame is rotatably installed on the opposite side of the two support plates via a bearing. A fixed frame is fixedly installed at the center position between the two support plates on the side of the concave frame near the moving plate. The end of the telescopic swing rod away from the fixed turntable is rotatably connected to the center position inside the fixed frame via a bearing. A plate sputtering source is fixedly installed on the side of the concave frame away from the fixed frame.

[0015] Compared with the prior art, the beneficial effects of the present invention are: 1. This invention, through the setting of an electric telescopic plate, an L-shaped pusher frame, a fixed turntable, and a telescopic swing rod, enables the electric telescopic plate to be activated. Its telescopic end, using a pin as a fulcrum, pushes a movable slide block to slide linearly along a T-shaped slide bar. This slides synchronously with the pusher slide block fixed to the movable slide block along a limiting slide rod. The two ends of the pusher slide block slide within the pusher groove of the L-shaped pusher frame and apply thrust, causing the L-shaped pusher frame to rotate synchronously around a fixed column. This pushes the connecting frame and the fixed plate to lift the movable plate, allowing it to slide within the rectangular frame. This adjusts the target distance between the plate-type sputtering source and the fixed workpiece within the rectangular frame. After the distance adjustment is completed, start the second drive motor to drive the first bevel gear to rotate, so that the second bevel gear rotates synchronously and drives the fixed turntable at its end to make a circular motion. The edge of the fixed turntable is connected by a bearing to a telescopic swing rod to swing back and forth with the circular motion, and the other end of the telescopic swing rod rotates inside the fixed frame, converting the circular motion into the angle swinging power of the concave frame, so that the plate sputtering source fixed on the concave frame completes the angle swing synchronously with the concave frame, covering different parts of the irregular substrate such as curved surface, inclined surface, and stepped surface, realizing all-round, blind-zone-free sputtering processing of irregular substrates; 2. This invention, by setting up a flexible clamping mechanism, a drive turntable, an intermittent turntable, a guide block, and a flipping roller, clamps and fixes the workpiece between two flexible clamping mechanisms inside a rectangular frame. After closing the box cover, the drive motor fixed on the outer surface of the box is started. Its output end drives the drive turntable to rotate at a uniform speed. The drive turntable transmits power to the linkage turntable through the linkage bar connected by the edge protrusion, causing the linkage turntable and the top limit plate to rotate synchronously. This causes the drive pin to engage in the intermittent slot and drive the intermittent turntable to rotate. The rotating mechanism causes the substrate fixing mechanism to rotate intermittently inside the processing box. When the flipping roller moves with the substrate fixing mechanism to the guide groove position of the annular groove, under the rigid guidance of the guide block, the flipping roller is forced to slide along the trajectory of the guide groove, causing the T-shaped frame to flip around the connecting bearing of the disc frame as the fulcrum. This causes the workpiece, which was originally facing the back side, to turn towards the sputtering direction of the plate sputtering source, thereby performing double-sided processing on the workpiece. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the unfolded structure of the present invention;

[0018] Figure 2 This is a cross-sectional structural diagram of the present invention;

[0019] Figure 3 This is a schematic diagram of the unfolded structure of the box body and box lid of the present invention;

[0020] Figure 4 This is a cross-sectional view of the annular groove and guide block of the present invention;

[0021] Figure 5 This is a schematic diagram of the rotating column and disc frame of the present invention;

[0022] Figure 6 This is a cross-sectional view of the rectangular frame and flexible clamping mechanism of the present invention.

[0023] Figure 7 This is a schematic diagram of the structure of the linked turntable and the intermittent turntable of the present invention;

[0024] Figure 8 This is a cross-sectional view of the rectangular frame and the L-shaped pusher frame of the present invention;

[0025] Figure 9 This is a schematic diagram of the T-shaped slider and L-shaped pusher frame of the present invention;

[0026] Figure 10 This is a cross-sectional view of the movable plate and concave frame of the present invention;

[0027] Figure 11 This is a schematic diagram of the structure of the fixed turntable and telescopic swing rod of the present invention.

[0028] The attached diagram lists the components represented by each number as follows: 1. Processing box; 101. Box body; 102. Box cover; 103. Sealing strip; 104. Circular groove; 105. Guide groove; 106. Guide block; 107. Rectangular frame; 108. Vacuum connecting valve pipe; 2. Rotating mechanism; 201. Rotating column; 202. Disc frame; 3. Substrate fixing mechanism; 301. Rectangular frame; 302. T-shaped frame; 303. Tilting roller; 304. Flexible clamping mechanism; 305. T-shaped conduit; 306. Fixing clamp; 307. Electric telescopic rod; 308. Piston sleeve; 309. Piston head; 4. Geneva mechanism; 401. Drive motor one; 402. Drive turntable; 403. Linkage turntable; 404. Limit plate; 405. Linkage bar; 406. Drive pin; 407. Intermittent 408. Turntable; 409. Intermittent slot; 400. Arc-shaped slide; 5. Pushing mechanism; 501. T-shaped slide bar; 502. Moving slide; 503. Limiting slide bar one; 504. Pushing slide; 505. Electric telescopic plate; 506. L-shaped pushing frame; 507. Fixed column; 508. Pushing slide; 509. Connecting frame; 510. Fixed plate; 6. Inclined sputtering plate; 601. Moving plate; 602. Limiting slide bar two; 603. Drive motor two; 604. Bevel gear one; 605. Bevel gear two; 606. Fixed turntable; 607. Telescopic swing rod; 608. Support plate; 609. Concave frame; 610. Fixed frame; 611. Plate sputtering source; 612. Limiting frame; 613. Electric push rod; 614. Curved frame. Detailed Implementation

[0029] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0030] Please see Figures 1-11 The present invention provides a technical solution:

[0031] An adjustable target-distance vacuum sputtering apparatus for irregularly shaped substrates includes a processing chamber 1. The processing chamber 1 includes a chamber body 101. A rectangular frame 107 is fixedly installed at the center of the surface of the chamber body 101 away from the opening, and the rectangular frame 107 is connected to the interior of the chamber body 101. A rotating mechanism 2 is rotatably installed inside the chamber body 101 via bearings. The rotating mechanism 2 includes a rotating column 201, and the two ends of the rotating column 201 are respectively rotatably connected to the top and bottom of the inner side of the chamber body 101 via bearings. Two disc frames 202 are fixedly installed at the two ends of the rotating column 201 inside the chamber body 101. Correspondingly, three substrate fixing mechanisms 3 are installed at the edge between the two disc frames 202 via bearings at equal angles. A Geneva mechanism 4 is provided on one side of the top of the processing box 1. A pushing mechanism 5 is provided on the side of the rectangular frame 107 away from the box body 101. An inclined sputtering plate 6 is slidably installed on the side of the rectangular frame 107 close to the box body 101. A box cover 102 is rotatably installed on one side of the opening of the box body 101 via a pin. A sealing strip 103 is fixedly installed at the edge of the opening of the box body 101. A vacuum connecting valve pipe 108 is connected to the outer surface of the box body 101 on one side of the rectangular frame 107.

[0032] During operation, the cover 102 is opened to clamp and fix the substrate workpiece inside the corresponding substrate fixing mechanism 3. After the three substrate workpieces are fixed inside the three substrate fixing mechanisms 3 respectively, the cover 102 is closed to make the inside of the box 101 a sealed environment. The vacuum connection valve pipe 108 is connected to an external vacuum pump to evacuate the inside of the box 101. The tilting sputtering plate 6 can integrate multiple sensors to realize real-time monitoring of the distance between it and the substrate. According to the shape of the substrate, the push mechanism 5 is controlled to push the tilting sputtering plate 6, so that the tilting sputtering plate 6 is close to the substrate workpiece and tilts and swings to sputter the surface of the substrate workpiece. At the same time, the Geneva mechanism 4 is activated to drive the rotating mechanism 2 to rotate intermittently inside the processing box 1, so that the three sets of substrate fixing mechanisms 3 drive the corresponding substrate workpieces to be sputtered intermittently towards the tilting sputtering plate 6 inside the processing box 1. After the rotating mechanism 2 drives the substrate fixing mechanism 3 to rotate one revolution, one side of the three substrate fixing mechanisms 3 is flipped so that the unprocessed side of the substrate workpiece faces the tilting sputtering plate 6 for sputtering again.

[0033] As a further embodiment of the present invention, the top and bottom of the inner side of the housing 101 are respectively provided with annular grooves 104, and a guide groove 105 is provided at one corner of the annular groove 104 near the opening of the housing 101. A guide block 106 is fixedly installed on the inner wall of the annular groove 104 at a position corresponding to the guide groove 105. The substrate fixing mechanism 3 includes a rectangular frame 301, and T-shaped frames 302 are fixedly installed on the top and bottom of the rectangular frame 301, and the T-shaped frames 302 are rotatably connected to the edge of the disc frame 202 through bearings. A flipping roller 303 is symmetrically installed on the side of the T-shaped frame 302 away from the rectangular frame 301 through the disc frame 202 via a rotating shaft, and the flipping roller 303 is close to the inner wall of the annular groove 104. A guide block 106 is fixedly installed on the top and bottom of the inner side of the rectangular frame 301. A flexible clamping mechanism 304 is provided. Two flexible clamping mechanisms 304 are connected to a three-way conduit 305 on one side. Multiple fixing clips 306 are snapped onto the surface of the three-way conduit 305. An electric telescopic rod 307 is fixedly installed on the top of one side of a rectangular frame 301. A piston sleeve 308 is fixedly installed on the bottom of the rectangular frame 301 on the same side as the electric telescopic rod 307. The telescopic end of the electric telescopic rod 307 extends through the piston sleeve 308 and is fixedly installed inside the piston sleeve 308. The piston head 309 slides inside the piston sleeve 308. The end of the three-way conduit 305 away from the flexible clamping mechanism 304 is connected to the bottom end of the piston sleeve 308. The fixing clips 306 on the surface of the three-way conduit 305 are fixedly connected to the surfaces of the rectangular frame 301 and the piston sleeve 308, respectively.

[0034] During operation, the cover 102 is opened, and the irregularly shaped workpiece to be processed is placed inside the rectangular frame 301 of the substrate fixing mechanism 3, so that the workpiece is between the upper and lower flexible clamping mechanisms 304. The electric telescopic rod 307 on the top side of the rectangular frame 301 is activated, and its telescopic end extends downward, causing the piston head 309 passing through the piston sleeve 308 to slide downward inside the piston sleeve 308, creating a negative pressure inside the piston sleeve 308. The negative pressure is transmitted to the two flexible clamping mechanisms 304 through the three-way conduit 305 connected to the bottom end of the piston sleeve 308, causing the flexible clamping mechanisms 304 to generate an inward clamping force, quickly and firmly clamping the workpiece. The surface fixing clip 306 limits the guide tube to ensure the stability of air pressure transmission and prevent the guide tube from deviating and falling off. After the workpiece is clamped, the box cover 102 is closed and the sealing strip 103 at the edge of the opening of the box 101 achieves sealing. The vacuum communication valve pipe 108 on the outer surface of the box 101 creates a vacuum environment inside the box 101 to prepare for subsequent vacuum sputtering processing. The T-shaped frame 302 of the substrate fixing mechanism 3 is rotatably connected to the edge of the disc frame 202 of the rotating mechanism 2 through bearings. The flipping roller 303 at the end of the T-shaped frame 302 is always close to the inner wall of the annular groove 104 at the top and bottom of the inner side of the box 101, providing a guiding foundation for subsequent movement and flipping.

[0035] As a further embodiment of the present invention, the Geneva mechanism 4 includes a drive motor 401, which is fixedly connected to the top surface of the housing 101 away from the opening. A drive turntable 402 is fixedly mounted on the output end of the drive motor 401. A linkage turntable 403 is rotatably mounted on the top side of the housing 101 located at the top of the rotating mechanism 2 via a bearing. A limit plate 404 is fixedly mounted at the center of the top of the linkage turntable 403, and the limit plate 404 and the top edge of the drive turntable 402 are connected by a protrusion. A linkage bar 405 is installed. A drive pin 406 is fixedly installed on the top edge of the linkage turntable 403 located on one side of the limiting plate 404. An intermittent turntable 407 is fixedly installed on the top of the rotating column 201 through the housing 101. Six intermittent slots 408 are provided at equal angles on the surface of the intermittent turntable 407, and the intermittent slots 408 are engaged with the drive pin 406. An arc-shaped sliding groove 409 is provided on the surface of the intermittent turntable 407 between two adjacent intermittent slots 408, and the arc-shaped sliding groove 409 is closely attached to the limiting plate 404.

[0036] During operation, the drive motor 401 is started, driving the drive turntable 402 to rotate at a constant speed. The drive turntable 402 transmits power to the linkage turntable 403 on the top of the housing 101 through the linkage bar 405 connected by the top edge protrusion. This causes the linkage turntable 403 and the limiting plate 404 at the center of its top to rotate synchronously. When the linkage turntable 403 rotates, the drive pin 406 on its top edge moves in a circular motion as well. When the drive pin 406 rotates to the position corresponding to the intermittent slot 408 on the surface of the intermittent turntable 407, it will engage with the intermittent slot 408 and drive the intermittent turntable 407 to rotate. The intermittent turntable 407 and the top of the rotating column 201 of the rotating mechanism 2... With the end fixed connection, the rotating column 201 rotates synchronously with the intermittent turntable 407, thereby driving the disc frame 202 at both ends of the rotating column 201 to rotate. The three base material fixing mechanisms 3 connected to the disc frame 202 move circumferentially with the disc frame 202. When the drive pin 406 rotates out of the intermittent slot 408, the limiting plate 404 will closely fit the arc-shaped sliding groove 409 on the surface of the intermittent turntable 407, forming a circumferential limit on the intermittent turntable 407, keeping it stationary, until the drive pin 406 is inserted into the next intermittent slot 408. This achieves the fixed angle intermittent rotation of the rotating column 201 and the disc frame 202, reserving a stable working time for the processing and flipping of the workpiece.

[0037] As a further embodiment of the present invention, the pushing mechanism 5 includes a T-shaped slide bar 501, which is fixedly connected to the inner wall of the rectangular frame 107 away from the box 101. A movable slide block 502 is slidably mounted through the surface of the T-shaped slide bar 501. A limiting slide bar 503 is symmetrically fixedly mounted inside the rectangular frame 107 on the side near the T-shaped slide bar 501. A pushing slide block 504 is slidably mounted through the surface of the two limiting slide bars 503, and one side of the pushing slide block 504 is fixedly connected to the movable slide block 502. An electric telescopic plate 505 is rotatably mounted on the top side of the rectangular frame 107 away from the T-shaped slide bar 501 through a pin, and the telescopic end of the electric telescopic plate 505 is rotatably connected to the movable slide block 502 through a pin. A fixed column 507 is fixedly installed at the center of the inner wall of the rectangular frame 107. L-shaped pusher frames 506 are rotatably installed at both ends of the fixed column 507. A pusher groove 508 is provided through the end of the L-shaped pusher frame 506 near the pusher slide 504, and the pusher groove 508 is slidably connected to both ends of the pusher slide 504. A connecting frame 509 is rotatably installed at the end of the L-shaped pusher frame 506 away from the pusher groove 508 through a pin. A fixing plate 510 is rotatably installed at the end of the connecting frame 509 away from the L-shaped pusher frame 506 through a pin.

[0038] During operation, based on the shape, size, and sputtering requirements of the workpiece, the electric telescopic plate 505 at the top of the rectangular frame 107 is activated. Its telescopic end extends and retracts, pushing the movable slide 502 to slide linearly along the T-shaped slide bar 501. This causes the push slide 504 to slide linearly along the two symmetrically arranged limiting slide bars 503 inside the rectangular frame 107, following the sliding of the movable slide 502. As the push slide 504 slides, its two ends slide within the push groove 508 of the L-shaped push frame 506, applying a pushing force to the L-shaped push frame 506, causing the L-shaped push frame 506 to be positioned relative to the fixed column 507. With the axis rotating, the two symmetrical L-shaped pushers 506 swing synchronously toward the housing 101. The end of the L-shaped pusher 506 away from the pusher slide 508 is rotatably connected to the connecting frame 509 through a pin. Its swinging power is transmitted to the fixed plate 510 through the connecting frame 509, pushing the fixed plate 510 to move toward the housing 101. By controlling the extension and retraction stroke of the electric telescopic plate 505, the sliding distance of the pusher slide 504 can be precisely controlled, thereby adjusting the swing angle of the L-shaped pusher 506 and realizing precise control of the moving distance of the fixed plate 510, providing a basis for subsequent target distance adjustment.

[0039] As a further embodiment of the present invention, the tilting sputtering plate 6 includes a movable plate 601, and a fixed plate 510 is fixedly connected to the center of the edge of the movable plate 601 near the pushing mechanism 5. Limiting slide rods 602 are slidably installed through the four corners of the movable plate 601, and the two ends of the limiting slide rods 602 are fixedly connected to the four corners of the inner wall of the rectangular frame 107. A drive motor 603 is fixedly installed at the bottom of one side of the movable plate 601, and a bevel gear 604 is fixedly connected to the output end of the drive motor 603. A bevel gear 605 is rotatably installed at the center of the movable plate 601 through a bearing, and the bevel gear 605 meshes with the bevel gear 604. A fixed turntable 606 is fixedly installed at the end of bevel gear 2 605 away from bevel gear 1 604, passing through the moving plate 601. A limit frame 612 is fixedly installed on the side of the fixed turntable 606 away from bevel gear 2 605. A curved frame 614 is slidably installed inside the limit frame 612. An electric push rod 613 is fixedly installed at the bottom inside the limit frame 612, and the telescopic end of the electric push rod 613 is fixedly connected to the limit frame 612. A telescopic swing rod 607 is rotatably installed on the side of the curved frame 614 away from the electric push rod 613 via a bearing. A support plate 608 is symmetrically fixedly installed on the side of the two support plates 601 away from the drive motor 603. A concave frame 609 is rotatably installed on the opposite side of the two support plates 608 via bearings. A fixed frame 610 is fixedly installed on the side of the concave frame 609 near the moving plate 601 at the center position between the two support plates 608. The end of the telescopic swing rod 607 away from the fixed turntable 606 is rotatably connected to the center position inside the fixed frame 610 via bearings. A plate sputtering source 611 is fixedly installed on the side of the concave frame 609 away from the fixed frame 610.

[0040] During operation, when the fixed plate 510 moves towards the housing 101, it drives the movable plate 601, which is fixedly connected to it, to slide linearly along the limiting slide bar 602. The movable plate 601 is pushed into the housing 101 until the plate sputtering source 611 and the workpiece reach the preset target distance. After the target distance is adjusted, the drive motor 603 is started to drive the bevel gear 604 to rotate, which in turn drives the bevel gear 605 to rotate synchronously. This causes the fixed turntable 606 at the end of the bevel gear 605 to perform uniform circular motion, which in turn drives the fixed turntable 606 to drive the curved frame 614 to rotate, causing the telescopic swing rod 607 to swing back and forth. The reciprocating swing of the swing arm 607 converts the circular motion into the angular swinging power of the concave frame 609, causing the concave frame 609 to swing back and forth with the connecting bearing of the support plate 608 as the fulcrum. The plate sputtering source 611, which is fixed on the side of the concave frame 609 away from the fixed frame 610, completes the angular swing synchronously with the concave frame 609. By controlling the rotation direction and speed of the drive motor 603, the swing angle and swing speed of the plate sputtering source 611 can be precisely adjusted, so that the sputtering direction of the plate sputtering source 611 covers different parts of the irregular substrate such as curved surface, inclined surface, and stepped surface, and completes all-round vacuum sputtering processing.

[0041] Working principle of this invention:

[0042] Open the box cover 102 and place the irregularly shaped substrate to be processed into the rectangular frame 301 of the substrate fixing mechanism 3, so that the substrate is between the upper and lower flexible clamping mechanisms 304. Activate the electric telescopic rod 307 on the top side of the rectangular frame 301, and its telescopic end extends downward, causing the piston head 309, which passes through the piston sleeve 308, to slide downward inside the piston sleeve 308, creating a negative pressure inside the piston sleeve 308. This negative pressure is transmitted to the two flexible clamping mechanisms 304 through the three-way conduit 305 connected to the bottom end of the piston sleeve 308. The pressure difference is used to generate an inward clamping force in the flexible clamping mechanism 304 to quickly clamp the substrate. After the workpiece is clamped, the cover 102 of the box 101 is closed. The sealing strip 103 at the edge of the opening of the box 101 achieves a seamless seal between the cover 102 and the box 101 to prevent air leakage during the subsequent vacuuming process. The air inside the box 101 is extracted through the vacuum equipment via the vacuum connecting valve pipe 108 to form a vacuum processing environment. After the vacuuming is completed, the vacuum connecting valve pipe 108 is closed to maintain the vacuum state inside the box 101.

[0043] The drive motor 401, fixed to the top of the surface of the housing 101 away from the opening, is activated, causing the drive turntable 402 to rotate at a constant speed. The drive turntable 402 transmits power to the linkage turntable 403 at the top of the housing 101 via a linkage bar 405 connected to a protrusion on its top edge. This causes the linkage turntable 403 and its central limiting plate 404 to rotate synchronously. As the linkage turntable 403 rotates, its top edge drive pin 406 also rotates, causing the drive pin 406 to engage in the intermittent slot 408 and drive the intermittent turntable 407 to rotate, thereby rotating the two rotating columns 201. The rotating disc frame 202 at the end causes the substrate fixing mechanism 3 connected to the disc frame 202 and the clamped workpiece to move circumferentially with the disc frame 202. When the drive pin 406 rotates out of the intermittent slot 408, the limiting plate 404 will closely fit the arc-shaped sliding groove 409 on the surface of the intermittent turntable 407, forming a circumferential limit on the intermittent turntable 407 and keeping it stationary until the drive pin 406 is inserted into the next intermittent slot 408. This achieves the intermittent rotation of the rotating column 201 and the disc frame 202, so that the workpiece is accurately stopped at the sputtering processing position, and the stationary stage reserves a stable working time for sputtering processing.

[0044] According to the shape, size and sputtering process requirements of the irregular substrate to be processed, the electric telescopic plate 505 at the top of the rectangular frame 107 is activated to telescopically extend and retract, pushing the movable slide 502 to slide linearly along the T-shaped slide bar 501 on the inner wall of the rectangular frame 107. The push slide 504 fixed to the movable slide 502 slides linearly along the first limiting slide bar 503. When the push slide 504 slides, its two ends slide inside the push groove 508 of the L-shaped push frame 506, pushing the L-shaped push frame 506 to rotate around the fixed column 507. One end of the L-shaped push frame 506 pushes the connecting frame 509 to push the fixed plate 510, pushing the fixed plate 510 to move towards the box 101, thereby driving the movable plate 601 to slide along the second limiting slide bar 602 until the plate sputtering source 611 fixed on the inclined sputtering plate 6 and the workpiece reach the preset target distance.

[0045] According to processing requirements, the electric push rod 613 is controlled to extend and retract, pushing the curved frame 614 to slide inside the limiting frame 612, causing the telescopic swing rod 607 to extend and retract, adjusting the swing amplitude of the fixed frame 610. Then, the drive motor 603 at the bottom of one side of the moving plate 601 is started, and its output end drives the bevel gear 604 to rotate, driving the bevel gear 605 to drive the fixed turntable 606 to perform uniform circular motion. This causes the fixed turntable 606 to drive the limiting frame 612 and the curved frame 614 to rotate synchronously with the fixed rotation 606, causing the telescopic swing rod 607 to reciprocate, converting the reciprocating swing of the telescopic swing rod 607 into circular motion. The angle swinging power of the concave frame 609 causes the concave frame 609 to reciprocate around the connecting bearing of the support plate 608. The plate sputtering source 611, which is fixed on the side of the concave frame 609 away from the fixed frame 610, swings synchronously with the concave frame 609. By controlling the rotation direction and speed of the drive motor 603, the swing angle and swing speed of the plate sputtering source 611 can be precisely adjusted so that the sputtering direction fully covers the irregular parts of the irregular substrate, and completes the all-round vacuum sputtering processing of the workpiece facing the sputtering source side. During the processing, the Geneva mechanism 4 remains intermittently stationary to ensure the stability of the workpiece processing position.

[0046] After one side of the workpiece is processed, the drive motor 401 is restarted. The Geneva mechanism 4 drives the rotating column 201 and the disc frame 202 to rotate at a fixed angle. The substrate fixing mechanism 3 moves circumferentially with the disc frame 202. When the substrate fixing mechanism 3 moves, the turning roller 303 at the end of the T-shaped frame 302 slides along the inner wall of the annular groove 104 on the inner side of the box 101. When the turning roller 303 moves to the guide groove 105 near the corner of the opening of the box 101 in the annular groove 104, under the guidance of the guide block 106 fixed on the inner wall of the guide groove 105, the turning roller 303 can no longer slide along the annular groove 104 and is forced to turn and slide along the trajectory of the guide groove 105. The turning and sliding of the turning roller 303 drives the T-shaped frame 302 and the disc frame 202 to move in a circular direction. The connecting bearing of the frame 202 is used as a pivot point for rotation, causing the unprocessed side of the workpiece to turn towards the sputtering direction of the plate sputtering source 611. After the rotation is completed, the rotating roller 303 slides back into the annular groove 104 along the guide groove 105 and continues to move circumferentially with the disc frame 202 until it stops at the sputtering processing position again. The Geneva mechanism 4 returns to a stationary position, providing a stable position for the processing of the other side of the workpiece. After the workpiece is rotated, the target distance between the plate sputtering source 611 and the workpiece is finely adjusted by the pushing mechanism 5 according to the irregular structural parameters of the other side of the workpiece. Then, the drive motor 603 of the tilting sputtering plate 6 is started, causing the plate sputtering source 611 to swing at an angle, performing all-round, blind-zone-free vacuum sputtering processing on the other side of the workpiece, ensuring the consistency and accuracy of the processing of both sides of the workpiece.

Claims

1. An adjustable target-distance vacuum sputtering apparatus for irregularly shaped substrates, comprising a processing chamber (1), characterized in that: The processing box (1) includes a box body (101). A rectangular frame (107) is fixedly installed at the center of the surface of the box body (101) away from the opening, and the rectangular frame (107) is connected to the interior of the box body (101). A rotating mechanism (2) is rotatably installed on the inner side of the box body (101) via bearings. The rotating mechanism (2) includes a rotating column (201), and the two ends of the rotating column (201) are rotatably connected to the top and bottom of the inner side of the box body (101) via bearings, respectively. The rotating column (201) is located in the box body (101). 01) Two disc frames (202) are fixedly installed at both ends of the inner side, and the positions of the two disc frames (202) are corresponding. Three substrate fixing mechanisms (3) are installed at the edge between the two disc frames (202) by rotating at the same angle through bearings. A Geneva mechanism (4) is provided on one side of the top of the processing box (1). A pushing mechanism (5) is provided on the side of the rectangular frame (107) away from the box (101). An inclined sputtering plate (6) is slidably installed on the side of the rectangular frame (107) close to the box (101).

2. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 1, characterized in that: A cover (102) is rotatably mounted on one side of the opening of the box (101) via a pin, and a sealing strip (103) is fixedly installed at the edge of the opening of the box (101). The top and bottom of the inner side of the box (101) are respectively provided with annular grooves (104), and a guide groove (105) is provided at one corner of the annular groove (104) near the opening of the box (101). A guide block (106) is fixedly installed on the inner wall of the annular groove (104) at the position corresponding to the guide groove (105). A vacuum connecting valve pipe (108) is connected to the outer surface of the box (101) at one side of the rectangular frame (107).

3. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 2, characterized in that: The substrate fixing mechanism (3) includes a rectangular frame (301). T-shaped frames (302) are fixedly installed at the top and bottom of the rectangular frame (301), and the T-shaped frames (302) are rotatably connected to the edge of the disc frame (202) through bearings. A flipping roller (303) is symmetrically installed on the side of the T-shaped frame (302) away from the rectangular frame (301) through the disc frame (202) via a rotating axis. The flipping roller (303) is close to the inner wall of the annular groove (104). Flexible clamping mechanisms (304) are fixedly installed at the top and bottom of the inner side of the rectangular frame (301), and a three-way conduit (305) is connected to one side of the two flexible clamping mechanisms (304). Multiple three-way conduits (305) are snapped onto the surface of the three-way conduit (305). A fixed clamp (306) is provided. An electric telescopic rod (307) is fixedly installed on the top of one side of the rectangular frame (301). A piston sleeve (308) is fixedly installed on the bottom of the rectangular frame (301) on the same side as the electric telescopic rod (307). The telescopic end of the electric telescopic rod (307) extends through the piston sleeve (308) and is fixedly installed inside the piston sleeve (308). The piston head (309) slides inside the piston sleeve (308). The end of the three-way conduit (305) away from the flexible clamping mechanism (304) is connected to the bottom end of the piston sleeve (308). The fixed clamp (306) on the surface of the three-way conduit (305) is fixedly connected to the surfaces of the rectangular frame (301) and the piston sleeve (308) respectively.

4. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 1, characterized in that: The Geneva mechanism (4) includes a drive motor (401), which is fixedly connected to the top surface of the housing (101) away from the opening. A drive turntable (402) is fixedly installed at the output end of the drive motor (401). A linkage turntable (403) is rotatably installed on the top side of the housing (101) located at the top of the rotating mechanism (2) via a bearing. A limit plate (404) is fixedly installed at the center of the top of the linkage turntable (403), and a linkage bar is rotatably installed at the edge of the top of the limit plate (404) and the drive turntable (402) via a protrusion. 405), the top of the linkage turntable (403) is fixedly installed with a drive pin (406) at the edge of the limiting plate (404) on one side. The top of the rotating column (201) passes through the box (101) and is fixedly installed with an intermittent turntable (407). The surface of the intermittent turntable (407) is provided with six intermittent slots (408) at equal angles, and the intermittent slots (408) are correspondingly engaged with the drive pin (406). The surface of the intermittent turntable (407) is provided with an arc-shaped sliding groove (409) between two adjacent intermittent slots (408), and the arc-shaped sliding groove (409) is correspondingly close to the limiting plate (404).

5. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 2, characterized in that: The pushing mechanism (5) includes a T-shaped slide bar (501), and the T-shaped slide bar (501) is fixedly connected to the inner wall of the rectangular frame (107) away from the box (101). A movable slide block (502) is slidably installed on the surface of the T-shaped slide bar (501). A limiting slide bar (503) is symmetrically fixedly installed on the side of the rectangular frame (107) near the T-shaped slide bar (501). A pushing slide block (504) is slidably installed on the surface of the two limiting slide bars (503), and one side of the pushing slide block (504) is fixedly connected to the movable slide block (502). An electric telescopic plate (505) is rotatably installed on the top side of the rectangular frame (107) away from the T-shaped slide bar (501) through a pin, and the telescopic end of the electric telescopic plate (505) is rotatably connected to the movable slide block (502) through a pin.

6. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 5, characterized in that: A fixed column (507) is fixedly installed at the center of the inner wall of the rectangular frame (107). An L-shaped pusher frame (506) is rotatably installed at both ends of the fixed column (507). A pusher groove (508) is provided through the end of the L-shaped pusher frame (506) near the pusher slide (504), and the pusher groove (508) is slidably connected to both ends of the pusher slide (504). A connecting frame (509) is rotatably installed at the end of the L-shaped pusher frame (506) away from the pusher groove (508) through a pin. A fixing plate (510) is rotatably installed at the end of the connecting frame (509) away from the L-shaped pusher frame (506) through a pin.

7. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 6, characterized in that: The tilting sputtering plate (6) includes a movable plate (601) and a fixed plate (510) is fixedly connected to the center of the edge of the movable plate (601) near the pushing mechanism (5). Limiting slide rods (602) are slidably installed through the four corners of the movable plate (601), and the two ends of the limiting slide rods (602) are fixedly connected to the four corners of the inner wall of the rectangular frame (107). A drive motor (603) is fixedly installed at the bottom of one side of the movable plate (601), and a bevel gear (604) is fixedly connected to the output end of the drive motor (603). A bevel gear (605) is rotatably installed at the center of the movable plate (601) through a bearing, and the bevel gear (605) meshes with the bevel gear (604).

8. The adjustable target distance vacuum sputtering apparatus for irregularly shaped substrates according to claim 7, characterized in that: The end of the second bevel gear (605) away from the first bevel gear (604) passes through the moving plate (601) and is fixedly mounted with a fixed turntable (606). A limiting frame (612) is fixedly mounted on the side of the fixed turntable (606) away from the second bevel gear (605). A curved frame (614) is slidably mounted inside the limiting frame (612). An electric push rod (613) is fixedly mounted at the bottom inside the limiting frame (612), and the telescopic end of the electric push rod (613) is fixedly connected to the limiting frame (612). A telescopic swing rod (607) is rotatably mounted on the side of the curved frame (614) away from the electric push rod (613) via a bearing. A support plate (608) is symmetrically fixedly installed on the side of the movable plate (601) away from the drive motor (603). A concave frame (609) is rotatably installed on the opposite side of the two support plates (608) via a bearing. A fixed frame (610) is fixedly installed on the side of the concave frame (609) near the movable plate (601) at the center position between the two support plates (608). The end of the telescopic swing rod (607) away from the fixed turntable (606) is rotatably connected to the center position inside the fixed frame (610) via a bearing. A plate sputtering source (611) is fixedly installed on the side of the concave frame (609) away from the fixed frame (610).

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