Pattern printing methods, apparatus and printing equipment

Abstract

This application relates to a pattern printing method, apparatus, and printing device. The method includes: acquiring the relative positional relationship between a design pattern on a reference contour in a contour canvas and the reference contour, and determining the configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship, so as to print the design pattern on the surface of the substrate corresponding to at least two substrate contours of the same specification according to the configuration information of the design patterns of at least two substrate contours of the same specification; the contour canvas includes at least two substrate contours of the same specification, the reference contour is the substrate contour among the at least two substrate contours of the same specification that has been configured with a design pattern; the remaining contours are the substrate contours among the at least two substrate contours of the same specification that have not been configured with a design pattern; in the above method, there is no need for an operator to configure the design pattern for each of multiple substrate contours individually, thus reducing redundant operations by the operator, saving operation time, and correspondingly improving printing efficiency.

Description

Technical Field

[0001] This application relates to the field of pattern printing technology, and in particular to a pattern printing method, apparatus and printing equipment. Background Technology

[0002] Ultraviolet (UV) curing printing is a printing technology that uses a UV light source to cure sprayed materials (such as ink) to form a pattern of the sprayed material on the surface of a substrate.

[0003] In related technologies, when printing patterns on multiple identical substrates, the operator needs to add design patterns to each substrate individually on the layout interface of the corresponding substrate, and adjust the scaling size and layout posture of the design patterns one by one to fit each substrate. Then, the printer prints the patterns on the corresponding substrates according to the adjusted layout interface.

[0004] However, the operation process of the operator in the relevant technology is cumbersome, redundant, and time-consuming, thus reducing printing efficiency. Summary of the Invention

[0005] Therefore, it is necessary to provide a pattern printing method, apparatus, and printing equipment to address the aforementioned technical problems.

[0006] In a first aspect, this application provides a pattern printing method, the method comprising:

[0007] Obtain the relative positional relationship between the design pattern on the reference outline in the outline canvas and the reference outline; the outline canvas includes at least two base material outlines of the same specifications, and the reference outline is the base material outline with the design pattern configured among the at least two base material outlines of the same specifications.

[0008] The configuration information required to configure the design pattern for each remaining contour is determined based on the relative positional relationship; the remaining contour is the base material contour that has not been configured with a design pattern among at least two base material contours of the same specification.

[0009] Based on the configuration information of the design pattern of at least two substrate outlines of the same specification, the design pattern is printed on the surface of the substrate corresponding to the substrate outline of at least two substrates of the same specification to form the design pattern.

[0010] In one embodiment, obtaining the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour includes:

[0011] Obtain the coordinates of the centroid of the reference outline in the outline canvas and the coordinates of the center point of the design pattern of the reference outline;

[0012] Based on the coordinates of the centroid of the reference profile and the coordinates of the center point of the design pattern of the reference profile, a vector is generated pointing from the centroid of the reference profile to the center point of the design pattern, which serves as the relative positional relationship.

[0013] In one embodiment, the configuration information required to configure the design pattern for each remaining contour is determined based on the relative positional relationship, including:

[0014] Obtain the coordinates of the centroid of each remaining contour in the contour canvas, as well as the principal axis angle between each remaining contour and the reference contour;

[0015] Based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and their relative positional relationship, the configuration information of the design pattern of each remaining contour is determined.

[0016] In one embodiment, the configuration information of the design pattern of each remaining contour is determined based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and their relative positional relationship, including:

[0017] For each remaining contour, the center point coordinates of the design pattern of the remaining contour are determined based on the centroid coordinates of the reference contour, the centroid coordinates of the remaining contour, the angle between the principal axes of the remaining contour and the reference contour, and their relative positional relationship.

[0018] The principal axis angle of the design pattern of the remaining contour is determined based on the principal axis angle between the remaining contour and the reference contour, and the principal axis angle of the design pattern of the reference contour.

[0019] The configuration information of the remaining outline design pattern is determined based on the center point coordinates and principal axis angle of the remaining outline design pattern.

[0020] In one embodiment, the configuration information further includes a scaling ratio; determining the configuration information of the remaining contour design pattern based on the center point coordinates and principal axis angle of the remaining contour design pattern includes:

[0021] Obtain the scaling ratio of the design pattern based on the reference outline;

[0022] Based on the center point coordinates and principal axis angle of the remaining contour design pattern, as well as the scaling ratio of the reference contour design pattern, determine the configuration information of the remaining contour design pattern.

[0023] In one embodiment, the configuration information of the design pattern of the remaining contour is determined based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, and the scaling ratio of the design pattern of the reference contour, including:

[0024] A parameter matrix is ​​generated based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour, and is used as the configuration information of the design pattern of the remaining contour.

[0025] In one embodiment, the configuration information of the design pattern includes the center point coordinates, principal axis angle, and scaling ratio of the design pattern; based on the configuration information of the design patterns of at least two substrate outlines of the same specifications, the design pattern is printed on the surface of the substrates corresponding to the at least two substrate outlines of the same specifications to form the design pattern, including:

[0026] For each of at least two substrate profiles of the same specifications, determine the printing start point coordinates of the design pattern based on the center point coordinates of the design pattern of the substrate profile.

[0027] Starting from the coordinates of the printing start point, the design pattern is printed on the substrate corresponding to the outline of the substrate according to the main axis angle and scaling ratio of the design pattern.

[0028] In one embodiment, the method further includes:

[0029] Obtain a substrate image of the substrate placed on the printing platform; the substrate image includes at least two substrates of the same specifications;

[0030] Identify substrates of the same specifications in the substrate image and generate a mask image of the substrate image as a contour canvas.

[0031] Secondly, this application also provides a pattern printing apparatus, the apparatus comprising:

[0032] The relationship acquisition module is used to acquire the relative positional relationship between the design pattern on the reference outline in the outline canvas and the reference outline; the outline canvas includes at least two base material outlines of the same specifications, and the reference outline is the base material outline with the design pattern configured among the at least two base material outlines of the same specifications.

[0033] The configuration determination module is used to determine the configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship; the remaining contours are the base material contours that have not been configured with a design pattern among at least two base material contours of the same specification.

[0034] The pattern printing module is used to print a design pattern on the surface of at least two substrates corresponding to the same substrate outlines, based on the configuration information of the design pattern of at least two substrate outlines of the same specifications.

[0035] Thirdly, this application also provides a printing apparatus, including a printing platform, a camera device, a printing component, and a control host. The printing platform is used to carry a substrate on which a pattern to be printed is to be carried; the camera device is used to acquire a substrate image of the substrate on the printing platform; the control host communicates with the camera device and the printing component respectively, and is used to acquire a substrate image from the camera device and construct an outline canvas, and control the printing component to print a pattern on the surface of the substrate according to any of the above pattern printing methods.

[0036] The aforementioned pattern printing method, apparatus, and printing equipment obtain the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour, and determine the configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship. This allows for the printing of design patterns on the surfaces of substrates corresponding to at least two substrate contours of the same specifications, based on the configuration information of the design patterns of at least two substrate contours of the same specifications. The contour canvas includes at least two substrate contours of the same specifications, the reference contour is the substrate contour with the design pattern already configured among the at least two substrate contours of the same specifications, and the remaining contours are the substrate contours without the design pattern configured among the at least two substrate contours of the same specifications. In this method, by obtaining the relative positional relationship between the design pattern and the reference contour to determine the configuration information required to configure the design pattern for the remaining contours, the operator only needs to configure the design pattern for one contour substrate. The printing equipment can automatically determine the configuration information of the remaining contours using this contour substrate as a reference, and print the design pattern for the corresponding substrates. This eliminates the need for the operator to configure the design pattern for each of multiple substrate contours individually, thus reducing redundant operations, saving operation time, and correspondingly improving printing efficiency. Attached Figure Description

[0037] Figure 1 This is a schematic diagram of the printing device in one embodiment;

[0038] Figure 2 This is a flowchart illustrating a pattern printing method in one embodiment;

[0039] Figure 3 This is a schematic diagram of the outline canvas in one embodiment;

[0040] Figure 4 This is a flowchart illustrating the process of obtaining relative positional relationships in one embodiment;

[0041] Figure 5 This is a schematic diagram showing the distribution of the substrate outline in the outline canvas in one embodiment;

[0042] Figure 6 This is a schematic diagram illustrating the configuration information of the design pattern for determining the remaining contour in one embodiment;

[0043] Figure 7This is a schematic diagram illustrating the distribution of the substrate outline in the outline canvas in another embodiment;

[0044] Figure 8 This is a schematic diagram illustrating the configuration information for determining the design pattern of the remaining contour in another embodiment;

[0045] Figure 9 This is a schematic diagram illustrating the configuration information for determining the design pattern of the remaining contour in another embodiment;

[0046] Figure 10 This is a schematic diagram illustrating the process of printing a design pattern on a substrate in one embodiment;

[0047] Figure 11 This is a schematic diagram of the process of obtaining the outline canvas in one embodiment;

[0048] Figure 12 This is a schematic diagram of a substrate image in one embodiment;

[0049] Figure 13 This is a flowchart illustrating a pattern printing method in another embodiment;

[0050] Figure 14 This is a structural block diagram of a pattern printing apparatus in one embodiment. Detailed Implementation

[0051] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0052] The pattern printing method provided in this application embodiment can be applied to, for example... Figure 1 The printing device shown includes a printing platform 101, a camera device 102, a printing assembly 103, and a control host 104.

[0053] The printing platform 101 is used to carry the substrate of the pattern to be printed; the camera device 102 is used to capture the substrate image of the substrate on the printing platform 101; the control host 104 communicates with the camera device 102 and the printing component 103 respectively, and is used to acquire the substrate image from the camera device 102 and construct the outline canvas, and control the printing component 103 to print the pattern on the surface of the substrate.

[0054] Those skilled in the art will understand that Figure 1 The structure shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the computer device to which the present application is applied. Specific computer devices may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.

[0055] In one embodiment, such as Figure 2 As shown, a pattern printing method is provided, which can be applied to... Figure 1 Taking a printing device as an example, specifically the control host in the printing device, the process includes the following steps:

[0056] S210. Obtain the relative positional relationship between the design pattern on the reference outline in the outline canvas and the reference outline; the outline canvas includes at least two substrate outlines of the same specifications, and the reference outline is the substrate outline of the at least two substrate outlines of the same specifications that has been configured with a design pattern.

[0057] The outline canvas is constructed based on the substrate image captured by the camera device, and includes substrate outlines with the same distribution and orientation as the substrates in the substrate image. The design pattern is the pattern to be printed on the substrate surface. Substrate outlines of the same specifications refer to substrate outlines with the same shape and size.

[0058] The outline canvas can be displayed on the printing device's screen, allowing the operator to configure design patterns for the substrate outlines in the outline canvas. The operator can select any substrate outline in the outline canvas, move the design pattern to that substrate outline, and adjust the orientation of the design pattern according to the printing requirements to configure the design pattern for that substrate outline.

[0059] For example, such as Figure 3 The outline canvas shown includes 8 substrate outlines of the same size. When the operator selects one of the substrate outlines as the reference outline, the unselected substrate outlines are the remaining outlines.

[0060] Optionally, the printing device can respond to the operator's selection operation of the substrate contour, take the selected substrate contour as the reference contour, and obtain the pose of the reference contour in the pre-constructed canvas coordinate system. At the same time, it can respond to the operator's posture adjustment operation of the design pattern, and obtain the adjusted pose of the design pattern in the canvas coordinate system, so as to obtain the relative positional relationship between the design pattern and the reference contour on the reference contour based on the pose of the reference contour and the pose of the design pattern.

[0061] S220. Determine the configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship; the remaining contour is the substrate contour that has not been configured with a design pattern among at least two substrate contours of the same specification.

[0062] The configuration information of the design pattern includes the pose of the design pattern. For example, the configuration information of the design pattern includes the position coordinates and pose of the design pattern in the canvas coordinate system. The canvas coordinate system is a coordinate system constructed with any point in the plane where the outline canvas is located as the origin, such as the upper left vertex of the outline canvas as the origin.

[0063] After the operator completes the operation of configuring the design pattern for the reference outline in the outline canvas, the AutoFill instruction can be triggered to instruct the printing device to configure the design pattern for the remaining outlines on the outline canvas according to the relative positional relationship between the design pattern on the reference outline and the reference outline.

[0064] Optionally, after obtaining the relative positional relationship between the design pattern on the reference contour and the reference contour, for each remaining contour in the contour canvas, the printing device can obtain the pose of the remaining contour in the canvas coordinate system, and determine the pose of the design pattern corresponding to the remaining contour based on the pose of the remaining contour and the relative positional relationship between the design pattern on the reference contour and the reference contour, as the configuration information required to configure the design pattern for the remaining contour, so that all substrate contours of the same specifications in the contour canvas maintain the same relative positional relationship with the corresponding design pattern.

[0065] S230. Based on the configuration information of the design pattern of at least two substrate outlines of the same specification, print the design pattern on the surface of the substrate corresponding to the substrate outline of at least two substrates of the same specification.

[0066] In this process, the substrate outline is matched with the position of the corresponding substrate. For example, the coordinate position of the substrate outline in the canvas coordinate system is transformed to the device coordinate system of the printing device, and the transformed position coordinates are the position of the corresponding substrate.

[0067] Optionally, after obtaining the configuration information required to configure the design pattern for the remaining contours, the printing device can configure and display the design pattern for each remaining contour on the contour canvas according to the required configuration information, so that all substrate contours of the same specification in the contour canvas are configured with design patterns. For each substrate contour of the same specification, the printing device can transform the position coordinates in the configuration information of the design pattern presented in the contour canvas to the device coordinate system, and drive the printing component to print the design pattern in the corresponding posture in the configuration information at the transformed position coordinates, thereby realizing the printing of the design pattern on the surface of the substrate corresponding to the substrate contour.

[0068] It should be noted that the printing device can display an outline canvas on the display end, and show a demonstration image of the effect of configuring the design pattern for each substrate outline based on the configuration information of the design pattern. It can also accept the operator's adjustment operation of the design pattern, such as translation, rotation or scaling.

[0069] In this embodiment, the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour is obtained. Based on this relative positional relationship, the configuration information required to configure the design pattern for each remaining contour is determined. This allows for the printing of design patterns on the surfaces of the corresponding substrates of at least two substrate contours of the same specifications, based on the configuration information of the design patterns of at least two substrate contours of the same specifications. The contour canvas includes at least two substrate contours of the same specifications. The reference contour is the substrate contour of the at least two substrate contours of the same specifications that has already been configured with a design pattern. The remaining contours are the substrate contours of the at least two substrate contours of the same specifications that have not been configured with a design pattern. In this method, by obtaining the relative positional relationship between the design pattern and the reference contour to determine the configuration information required to configure the design pattern for the remaining contours, the operator only needs to configure the design pattern for one contour substrate. The printing device can automatically determine the configuration information of the remaining contours using this contour substrate as a reference, and print the design pattern for the corresponding substrates. This eliminates the need for the operator to configure the design pattern for each of multiple substrate contours individually, thus reducing redundant operations, saving operation time, and improving printing efficiency.

[0070] Relative positional relationships can be represented using vectors. In one embodiment, such as... Figure 4 As shown, S210 above, obtaining the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour, includes:

[0071] S410. Obtain the coordinates of the centroid of the reference contour and the coordinates of the center point of the design pattern of the reference contour in the contour canvas.

[0072] In this context, the coordinates of the centroid of the reference contour and the center point of the design pattern are both positional coordinates under the canvas coordinate system. In practical applications, the substrate material is uniform, and the centroid is correspondingly the geometric center of the substrate.

[0073] Optionally, the printing device can establish a canvas coordinate system in the outline canvas, determine the geometric center point of the reference outline based on its outline shape, use it as the centroid of the reference outline, and obtain the position coordinates of the centroid of the reference outline in the canvas coordinate system to obtain the coordinates of the centroid of the reference outline. Simultaneously, the geometric center point of the design pattern is determined based on its pattern shape, and the position coordinates of the geometric center point of the design pattern in the canvas coordinate system are obtained to obtain the coordinates of the center point of the design pattern.

[0074] For example, when the design pattern has an irregular shape, the printing device can use the Oriented Bounding Box (OBB) algorithm to determine the geometric center point of the design pattern.

[0075] S420. Based on the coordinates of the centroid of the reference profile and the coordinates of the center point of the design pattern of the reference profile, generate a vector pointing from the centroid of the reference profile to the center point of the design pattern, as a relative positional relationship.

[0076] Optionally, after obtaining the coordinates of the centroid of the reference contour and the coordinates of the center point of the design pattern of the reference contour, the printing device can generate a vector on the contour canvas pointing from the centroid of the reference contour to the center point of the design pattern, as the relative positional relationship between the design pattern on the reference contour and the reference contour.

[0077] For example, such as Figure 5 As shown, the printing device obtains the coordinates of the centroid point A of the reference contour L1 in the canvas coordinate system XOY, i.e., the centroid point coordinates, and obtains the coordinates of the geometric center point B of the design pattern on the reference contour L1 in the canvas coordinate system XOY, i.e., the center point coordinates, so as to generate a vector from the centroid point A of the reference contour L1 to the center point B of the design pattern based on the centroid point coordinates and the center point coordinates. .

[0078] In this embodiment, the coordinates of the centroid of the reference contour and the coordinates of the center point of the design pattern of the reference contour are obtained in the contour canvas. Based on the coordinates of the centroid of the reference contour and the coordinates of the center point of the design pattern, a vector is generated pointing from the centroid of the reference contour to the center point of the design pattern, which serves as the relative positional relationship. In the above method, the vector pointing from the centroid of the reference contour to the center point of the design pattern can accurately represent the relative positional relationship between the reference contour and the design pattern, thus improving the accuracy of the obtained relative positional relationship.

[0079] In order to obtain the configuration information needed to design patterns for the remaining contours, in one embodiment, such as Figure 6 As shown, the configuration information required for configuring the design pattern for each remaining contour in S220 based on the relative positional relationship includes:

[0080] S610. Obtain the coordinates of the centroid of each remaining contour in the contour canvas, as well as the principal axis angle between each remaining contour and the reference contour.

[0081] The angle between the principal axes of the remaining contour and the reference contour is the angle between the principal axes of the remaining contour and the reference contour, representing the relative rotation angle between the principal axes of the remaining contour and the reference contour.

[0082] Optionally, the printing device can obtain the centroid coordinates of each remaining contour in the contour canvas, and determine the principal axis of the reference contour and the principal axis of each remaining contour, so as to obtain the principal axis angle between each remaining contour and the reference contour.

[0083] S620. Based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and the relative positional relationship, determine the configuration information of the design pattern of each remaining contour.

[0084] Optionally, the relative positional relationship between the design pattern and the reference contour includes a vector from the centroid of the reference contour to the center point of the design pattern. For each substrate contour, the printing device can rotate the vector by the angle of the main axis, and then translate the rotated vector to a position with the centroid coordinates of the remaining contour as the starting point of the vector, and obtain the position coordinates of the vector's endpoint in the canvas coordinate system. The coordinate position and the corresponding main axis angle are used together as the configuration information of the design pattern of the corresponding remaining contour.

[0085] For example, continuing from the above Figure 5 Examples, such as Figure 7 As shown, the printing device obtains the coordinates of the centroid C of the remaining contour L2 in the canvas coordinate system XOY, i.e., the centroid coordinates, and obtains the angle between the principal axis of the reference contour L1 and the principal axis of the remaining contour L2, i.e., the principal axis angle. The vector... Rotate the principal axis angle (angle) by the angle, and then rotate the vector. Translate the vector to the point where the centroid of the remaining contour L2 is the starting point, and obtain the position coordinates of the vector endpoint B2 in the canvas coordinate system XOY. Use the position of this coordinate and the angle between the principal axis and the vector as the configuration information of the design pattern of the remaining contour L2.

[0086] In this embodiment, the centroid coordinates of each remaining contour in the contour canvas and the principal axis angle between each remaining contour and the reference contour are obtained. Based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and the relative positional relationship, the configuration information of the design pattern of each remaining contour is determined. In the above method, the relative positional relationship is used as a reference. The configuration information of the design pattern of each remaining contour is determined by combining the centroid coordinates of the reference contour and each remaining contour, as well as the principal axis angle between each remaining contour and the reference contour. This enables one-click acquisition of the configuration information of all remaining contours, thereby improving the convenience and efficiency of batch pattern printing.

[0087] The configuration information of the design pattern includes the coordinates of the center point and the principal axis angle of the design pattern. Based on this, in one embodiment, such as Figure 8 As shown, in step S620 above, based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and their relative positional relationship, the configuration information of the design pattern for each remaining contour is determined, including:

[0088] S810. For each remaining contour, determine the center point coordinates of the design pattern of the remaining contour based on the centroid coordinates of the reference contour, the centroid coordinates of the remaining contour, the angle between the principal axes of the remaining contour and the reference contour, and their relative positional relationship.

[0089] Optionally, for each remaining contour, the printing device can generate a vector pointing from the centroid of the reference contour to the centroid of the remaining contour based on the centroid coordinates of the reference contour and the centroid coordinates of the remaining contour. The relative positional relationship between the design pattern and the reference contour includes the vector pointing from the centroid of the reference contour to the center point of the design pattern. The printing device can rotate this vector by the angle of the principal axis and determine the center point coordinates of the design pattern of the remaining contour based on the rotated vector and the vector pointing from the centroid of the reference contour to the centroid of the remaining contour.

[0090] For example, continuing from the above Figure 7 In the example, the printing device obtains the vector from the centroid A of the reference contour L1 to the centroid C of the remaining contour L2. and according to + get ,by The position coordinates of the vector endpoint B2 in the canvas coordinate system are used as the center point coordinates of the design pattern of the remaining contour L2.

[0091] S820. Determine the principal axis angle of the design pattern of the remaining contour based on the principal axis angle between the remaining contour and the reference contour, and the principal axis angle of the design pattern of the reference contour.

[0092] The principal axis angle of the design pattern represents the relative rotation angle between the principal axis of the design pattern and the reference line. For example, the reference line is parallel to the X-axis or Y-axis of the canvas coordinate system. The principal axis angle between the remaining contour and the reference contour is equal to the difference between the principal axis angles of the design patterns of the remaining contour and the reference contour.

[0093] Optionally, the printing device can obtain the principal axis angle of the design pattern of the reference contour, and use the fact that the included principal axis angle between the remaining contour and the reference contour is equal to the difference between the principal axis angles of the design pattern of the remaining contour and the design pattern of the reference contour to deduce the principal axis angle of the design pattern of the remaining contour.

[0094] For example, such as Figure 7 As shown, the main axis of the design pattern of the reference contour L1 coincides with the main axis of the reference contour L1, forming a main axis angle α with the X-axis. The main axis of the design pattern of the remaining contour L2 coincides with the main axis of the remaining contour L2, forming a main axis angle β with the X-axis. Given α and angle, β can be derived by using α-β=angle.

[0095] S830. Determine the configuration information of the design pattern of the remaining contour based on the center point coordinates and principal axis angle of the design pattern of the remaining contour.

[0096] Optionally, after obtaining the center point coordinates and main axis angle of the design pattern of the remaining contour, the printing device can use the center point coordinates and main axis angle of the design pattern as the configuration information of the corresponding remaining contour.

[0097] In this embodiment, for each remaining contour, the center point coordinates of the design pattern of the remaining contour are determined based on the centroid coordinates of the reference contour, the centroid coordinates of the remaining contour, the principal axis angle between the remaining contour and the reference contour, and their relative positional relationship. The principal axis angle of the design pattern of the remaining contour is determined based on the principal axis angle between the remaining contour and the reference contour, and the principal axis angle of the design pattern of the reference contour. The configuration information of the design pattern of the remaining contour is determined based on the center point coordinates and principal axis angle of the design pattern. In the above method, the center point coordinates and principal axis angle of the design pattern can accurately reflect the pose of the design pattern in the contour canvas. Determining the configuration information of the design pattern of the remaining contour based on the center point coordinates and principal axis angle of the design pattern can improve the comprehensiveness of the configuration information, so that the pattern can be printed directly based on the configuration information, thereby improving the feasibility and efficiency of pattern printing.

[0098] The configuration information for the design pattern also includes the scaling ratio of the design pattern. In one embodiment, such as... Figure 9 As shown, S830 above, determining the configuration information of the remaining contour design pattern based on the center point coordinates and principal axis angle of the remaining contour design pattern, includes:

[0099] S910. Obtain the scaling ratio of the design pattern of the reference outline.

[0100] The scaling factor of the design pattern on the reference contour is the scaling factor of the size of the design pattern configured on the reference contour relative to the reference size of the design pattern. For example, the reference size of the design pattern can be the default size of the design pattern. This scaling factor includes both X-axis scaling and Y-axis scaling.

[0101] While adjusting the posture of the design pattern on the reference outline according to the pattern printing requirements, the operator can also adjust the size of the design pattern to fit the size of the reference outline.

[0102] Optionally, in response to the operator's size adjustment operation on the design pattern, the printing device can obtain the ratio of the adjusted design pattern's size in the X-axis direction to the reference size of the design pattern in the X-axis direction as the X-axis scaling ratio, and obtain the ratio of the adjusted design pattern's size in the Y-axis direction to the reference size of the design pattern in the Y-axis direction as the Y-axis scaling ratio, and use the X-axis scaling ratio and Y-axis scaling ratio together as the scaling ratio of the design pattern of the reference outline.

[0103] S920. Based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, and the scaling ratio of the design pattern of the reference contour, determine the configuration information of the design pattern of the remaining contour.

[0104] Optionally, the remaining contour has the same shape and size as the reference contour. After obtaining the scaling ratio of the design pattern of the reference contour, the printing device can use the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio, as configuration information for the design pattern of the remaining contour.

[0105] The configuration information can be represented in matrix form. In an optional embodiment, the configuration information of the remaining contour design pattern is determined in step S920 based on the center point coordinates and principal axis angle of the remaining contour design pattern, and the scaling ratio of the reference contour design pattern, including:

[0106] A parameter matrix is ​​generated based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour, and is used as the configuration information of the design pattern of the remaining contour.

[0107] Optionally, the printing device can generate a third- or fourth-order parameter matrix based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour, as the configuration information of the design pattern of the remaining contour.

[0108] For example, consider generating a fourth-order parameter matrix as shown below:

[0109]

[0110] The three parameters on the top-left to bottom-right diagonal of the 3x3 submatrix in the top-left corner of this fourth-order parameter matrix represent the scaling ratio of the design pattern, corresponding to the X-axis scaling ratio, Y-axis scaling ratio, and Z-axis scaling ratio, respectively. Since the design pattern is two-dimensional, the Z-axis scaling ratio is 1. The other parameters in the top-left 3x3 submatrix represent the axial angles of the design pattern. The parameters in the first and second rows of the fourth column represent the coordinates of the center point of the design pattern, corresponding to the X-axis coordinate (i.e., the translation parameter relative to the origin in the X-axis direction) and the Y-axis coordinate (i.e., the translation parameter relative to the origin in the Y-axis direction), respectively.

[0111] In this embodiment, the configuration information also includes a scaling ratio. By obtaining the scaling ratio of the design pattern of the reference contour, the configuration information of the design pattern of the remaining contour is determined based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour. In the above method, by obtaining the scaling ratio of the design pattern of the reference contour and connecting the center point coordinates and principal axis angle of the design pattern of the remaining contour to generate configuration information, it is applicable when the operator adjusts the size of the design pattern, thereby expanding the applicable scenarios of the pattern printing method and improving its versatility. Specifically, using the generated parameter matrix as the configuration information can reduce the amount of configuration information data, and correspondingly reduce the resource requirements for data processing and storage.

[0112] In one embodiment, where the configuration information of the design pattern includes the center point coordinates, principal axis angle, and scaling ratio of the design pattern, such as... Figure 10 As shown, S230 above, which involves printing a design pattern on the surface of at least two substrates corresponding to the same substrate outlines based on the configuration information of the design pattern of at least two substrate outlines of the same specifications, includes:

[0113] S1010. For each of at least two substrate profiles of the same specification, determine the printing start point coordinates of the design pattern based on the center point coordinates of the design pattern of the substrate profile.

[0114] Optionally, in response to the operator's operation of selecting a reference contour and configuring a design pattern for the reference contour, the printing device can obtain the center point coordinates, principal axis angle, and scaling ratio of the design pattern of the reference contour as the configuration information of the reference contour, and obtain the configuration information of the center point coordinates, principal axis angle, and scaling ratio of each remaining contour obtained above, that is, obtain the configuration information of the design patterns of all substrate contours of the same specifications in the contour canvas.

[0115] For each substrate outline of the same specifications in the outline canvas, the printing device can read the positional relationship between the center point of the preset design pattern and the printing start point, and determine the printing start point coordinates according to the positional relationship and the center point coordinates of the corresponding substrate outline design pattern.

[0116] S1020. Starting from the coordinates of the printing start point, print the design pattern on the substrate corresponding to the substrate outline according to the main axis angle and scaling ratio of the design pattern.

[0117] Among them, the principal axis angle of the design pattern is used to determine the orientation of the design pattern, and the scaling ratio of the design pattern is used to determine the size of the design pattern.

[0118] Optionally, after obtaining the printing start point coordinates, the printing device can drive the printing component to take the printing start point coordinates as the starting point, determine the posture of the design pattern according to the main axis angle of the design pattern, and determine the size of the design pattern according to the scaling ratio of the design pattern, and print the design pattern with the corresponding posture and size on the substrate corresponding to the substrate outline.

[0119] In this embodiment, the configuration information of the design pattern includes the center point coordinates, principal axis angle, and scaling ratio of the design pattern. For each substrate contour of at least two substrate contours of the same specifications, the printing start point coordinates of the design pattern are determined according to the center point coordinates of the design pattern of the substrate contour. Starting from the printing start point coordinates, the design pattern is printed on the substrate corresponding to the substrate contour according to the principal axis angle and scaling ratio of the design pattern. In the above method, the configuration information of the design pattern includes the center point coordinates, principal axis angle, and scaling ratio of the design pattern. The information is rich and comprehensive, which can accurately characterize the posture of the design pattern in the contour canvas and the size relationship with the reference contour, thereby improving the accuracy of the design pattern printed based on the configuration information and improving the overall reliability of the image printing method.

[0120] The above method may also include a process of acquiring a contour canvas; based on this, in one embodiment, such as Figure 11 As shown, the above method also includes:

[0121] S1110. Obtain a substrate image of the substrate placed on the printing platform; the substrate image includes at least two substrates of the same specifications.

[0122] After the operator places the substrate to be printed onto the printing platform, a contour acquisition command can be triggered to instruct the printing equipment to control the camera device to capture the substrate image of the substrate placed on the printing platform, and obtain the contour canvas based on the substrate image.

[0123] Optionally, the printing equipment controls a camera device to capture a substrate image of the substrate placed on the printing platform from a top-down angle, thereby obtaining a substrate image including at least two substrates of the same specifications.

[0124] For example, the printing device can also perform a series of preprocessing on the substrate image, such as cropping, noise reduction, sharpening, highlight removal, or image enhancement, to improve image quality.

[0125] S1120. Identify substrates of the same specifications in the substrate image and generate a mask image of the substrate image as a contour canvas.

[0126] Optionally, the printing device is equipped with an artificial intelligence (AI) model for substrate detection and recognition. The printing device can input the acquired substrate image into the AI ​​model to identify the substrate in the substrate image, extract the shape and size of each substrate, obtain substrates with the same shape and size in the substrate image, i.e., the same specifications, and perform binarization processing on the substrate image to obtain the mask image of the substrate image as the outline canvas.

[0127] Among them, AI models (such as the IS-Net model trained using feature-level and mask-level guidance) can identify the substrate placed on the printing platform and segment it to extract high-precision substrate portions from the substrate image.

[0128] For example, the AI ​​model can be an image segmentation model, such as a Dichotomous Image Segmentation (DIS) model. Taking an RGB image as an example, after segmenting the substrate image, the DIS model can set the pixel values ​​of the regions containing substrates of the same size to (255, 255, 255), corresponding to white, and set the pixel values ​​of the remaining regions to (0, 0, 0), corresponding to black, thereby obtaining a mask image of the substrate image. For example, the obtained substrate image is as follows: Figure 12 As shown, image segmentation can yield the following results: Figure 3 The mask image shown is the outline canvas.

[0129] In this embodiment, a substrate image of a substrate placed on a printing platform is obtained to identify substrates of the same specifications in the substrate image, and a mask image of the substrate image is generated as a contour canvas. The substrate image includes at least two substrates of the same specifications. In the above method, a mask image is generated by identifying substrates in the substrate image as a contour canvas. The mask image can accurately and clearly restore the distribution position of the substrate on the printing platform. The mask image of the substrate image is used as a contour canvas to determine the configuration information of the design pattern that serves as a guide for subsequent pattern printing, thereby reducing the occurrence of printing misalignment and improving the positional accuracy of pattern printing.

[0130] To facilitate understanding by those skilled in the art, the pattern printing method provided in this application is described in detail below, such as... Figure 13 As shown, the method may include:

[0131] S1301. Obtain a substrate image of the substrate placed on the printing platform; the substrate image includes at least two substrates of the same specifications;

[0132] S1302. Identify substrates of the same specifications in the substrate image and generate a mask image of the substrate image as a contour canvas.

[0133] S1303. Obtain the centroid coordinates of the reference contour and the center point coordinates of the design pattern of the reference contour in the contour canvas; the contour canvas includes at least two base material contours of the same specifications, and the reference contour is the base material contour with the design pattern configured in the at least two base material contours of the same specifications.

[0134] S1304. Based on the coordinates of the centroid of the reference profile and the coordinates of the center point of the design pattern of the reference profile, generate a vector pointing from the centroid of the reference profile to the center point of the design pattern, which serves as the relative positional relationship between the design pattern on the reference profile and the reference profile.

[0135] S1305. Obtain the centroid coordinates of each remaining contour in the contour canvas, and the principal axis angle between each remaining contour and the reference contour; the remaining contour is the base material contour without a design pattern among at least two base material contours of the same specification.

[0136] S1306. For each remaining contour, determine the center point coordinates of the design pattern of the remaining contour based on the centroid coordinates of the reference contour, the centroid coordinates of the remaining contour, the angle between the principal axes of the remaining contour and the reference contour, and their relative positional relationship.

[0137] S1307. Determine the principal axis angle of the design pattern of the remaining contour based on the principal axis angle between the remaining contour and the reference contour, and the principal axis angle of the design pattern of the reference contour.

[0138] S1308. Obtain the scaling ratio of the design pattern of the reference outline;

[0139] S1309. Generate a parameter matrix based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour, and use it as the configuration information of the design pattern of the remaining contour.

[0140] S1310. For each of at least two substrate contours of the same specification, determine the printing start point coordinates of the design pattern according to the center point coordinates in the configuration information of the design pattern.

[0141] S1311. Starting from the coordinates of the printing start point, print the design pattern on the substrate corresponding to the substrate outline according to the main axis angle and scaling ratio in the configuration information of the design pattern.

[0142] It should be noted that the descriptions in S1301-S1311 above can be found in the relevant descriptions in the above embodiments, and their effects are similar, so they will not be repeated here.

[0143] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the steps or stages of other steps.

[0144] Based on the same inventive concept, this application also provides a pattern printing apparatus for implementing the pattern printing method described above. The solution provided by this apparatus is similar to the implementation described in the above method; therefore, the specific limitations in one or more of the pattern printing apparatus embodiments provided below can be found in the limitations of the pattern printing method described above, and will not be repeated here.

[0145] In one embodiment, such as Figure 14 As shown, a pattern printing apparatus is provided, including: a relationship acquisition module 1401, a configuration determination module 1402, and a pattern printing module 1403; wherein:

[0146] The relationship acquisition module 1401 is used to acquire the relative positional relationship between the design pattern on the reference outline in the outline canvas and the reference outline; the outline canvas includes at least two base material outlines of the same specifications, and the reference outline is the base material outline with the design pattern configured among the at least two base material outlines of the same specifications.

[0147] The configuration determination module 1402 is used to determine the configuration information required to configure the design pattern for each remaining contour according to the relative positional relationship; the remaining contour is the base material contour that has not been configured with a design pattern among at least two base material contours of the same specification.

[0148] The pattern printing module 1403 is used to print a design pattern on the surface of a substrate corresponding to at least two substrate outlines of the same specifications, based on the configuration information of the design pattern of at least two substrate outlines of the same specifications.

[0149] Each module in the aforementioned pattern printing device can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in or independent of the processor in a computer device, or stored in the memory of a computer device as software, so that the processor can call and execute the operations corresponding to each module.

[0150] In one embodiment, this application also provides a printing device, such as... Figure 1 As shown, the printing device includes a printing platform 101, a camera device 102, a printing component 103, and a control host 104.

[0151] The printing platform 101 is used to carry the substrate of the pattern to be printed; the camera device 102 is used to acquire the substrate image of the substrate on the printing platform 101; the control host 104 communicates with the camera device 102 and the printing component 103 respectively, and is used to acquire the substrate image from the camera device 102 and construct the outline canvas, and control the printing component 103 to print the pattern on the surface of the substrate according to any of the above pattern printing methods.

[0152] For example, the printing assembly 103 includes a drive connecting rod, a printing nozzle, and a UV light source. The control host 104 can control the drive connecting rod to move the printing nozzle and the UV light source to print and cure a pattern on the surface of the substrate.

[0153] In one embodiment, a computer-readable storage medium is provided having a computer program stored thereon, which, when executed by a processor, implements the steps of any of the above-described pattern printing methods.

[0154] In one embodiment, a computer program product is provided, including a computer program that, when executed by a processor, implements the steps of any of the above-described pattern printing methods.

[0155] Those skilled in the art will understand that all or part of the processes in the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium. When executed, the computer program can include the processes of the embodiments described above. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, pattern processors, digital signal processors, programmable logic devices, quantum computing-based data processing logic devices, etc., and are not limited to these.

[0156] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0157] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. A pattern printing method, characterized in that, The method includes: Obtain the relative positional relationship between the design pattern on the reference outline in the outline canvas and the reference outline; the outline canvas includes at least two base material outlines of the same specifications, and the reference outline is the base material outline of the at least two base material outlines of the same specifications that has been configured with a design pattern. The configuration information required to configure the design pattern for each remaining contour is determined based on the relative positional relationship; the remaining contour is the base material contour that has not been configured with a design pattern among the at least two base material contours of the same specification; Based on the configuration information of the design patterns of the at least two identical substrate outlines, the design patterns are printed on the surface of the substrates corresponding to the at least two identical substrate outlines.

2. The method according to claim 1, characterized in that, The step of obtaining the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour includes: Obtain the coordinates of the centroid of the reference contour in the contour canvas and the coordinates of the center point of the design pattern of the reference contour; Based on the coordinates of the centroid of the reference contour and the coordinates of the center point of the design pattern of the reference contour, a vector is generated pointing from the centroid of the reference contour to the center point of the design pattern, which serves as the relative positional relationship.

3. The method according to claim 1 or 2, characterized in that, The configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship includes: Obtain the centroid coordinates of each remaining contour in the contour canvas, and the principal axis angle between each remaining contour and the reference contour; Based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and the relative positional relationship, the configuration information of the design pattern of each remaining contour is determined.

4. The method according to claim 3, characterized in that, The step of determining the configuration information of the design pattern of each remaining contour based on the centroid coordinates of each remaining contour, the principal axis angle between each remaining contour and the reference contour, and the relative positional relationship includes: For each of the remaining contours, the center point coordinates of the design pattern of the remaining contour are determined based on the centroid coordinates of the reference contour, the centroid coordinates of the remaining contour, the principal axis angle between the remaining contour and the reference contour, and the relative positional relationship. The principal axis angle of the design pattern of the remaining contour is determined based on the principal axis angle between the remaining contour and the reference contour, and the principal axis angle of the design pattern of the reference contour. The configuration information of the design pattern of the remaining contour is determined based on the center point coordinates and principal axis angle of the design pattern of the remaining contour.

5. The method according to claim 4, characterized in that, The configuration information also includes a scaling ratio; the configuration information for determining the design pattern of the remaining contour based on the center point coordinates and principal axis angle of the design pattern of the remaining contour includes: Obtain the scaling ratio of the design pattern of the reference contour; Based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, and the scaling ratio of the design pattern of the reference contour, the configuration information of the design pattern of the remaining contour is determined.

6. The method according to claim 5, characterized in that, The step of determining the configuration information of the design pattern of the remaining contour based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, and the scaling ratio of the design pattern of the reference contour, includes: A parameter matrix is ​​generated based on the center point coordinates and principal axis angle of the design pattern of the remaining contour, as well as the scaling ratio of the design pattern of the reference contour, and is used as the configuration information of the design pattern of the remaining contour.

7. The method according to claim 1 or 2, characterized in that, The configuration information of the design pattern includes the center point coordinates, principal axis angle, and scaling ratio of the design pattern; the step of printing the design pattern on the surface of the substrate corresponding to the at least two substrate outlines of the same specification, based on the configuration information of the design pattern of the at least two substrate outlines of the same specification, includes: For each of the at least two substrate contours of the same specification, the printing start point coordinates of the design pattern are determined based on the center point coordinates of the design pattern of the substrate contour. Starting from the coordinates of the printing start point, the design pattern is printed on the substrate corresponding to the substrate outline according to the main axis angle and scaling ratio of the design pattern.

8. The method according to claim 1 or 2, characterized in that, The method further includes: Obtain a substrate image of a substrate placed on a printing platform; the substrate image includes at least two substrates of the same specifications; Identify substrates of the same specifications in the substrate image, and generate a mask image of the substrate image as the contour canvas.

9. A pattern printing apparatus, characterized in that, The device includes: The relationship acquisition module is used to acquire the relative positional relationship between the design pattern on the reference contour in the contour canvas and the reference contour; the contour canvas includes at least two base material contours of the same specifications, and the reference contour is the base material contour with the design pattern configured among the at least two base material contours of the same specifications. A configuration determination module is used to determine the configuration information required to configure the design pattern for each remaining contour based on the relative positional relationship; the remaining contours are the base material contours among the at least two base material contours of the same specification that have not been configured with a design pattern; A pattern printing module is used to print the design pattern on the surface of the substrate corresponding to the at least two substrate outlines of the same specifications, according to the configuration information of the design pattern of the at least two substrate outlines of the same specifications.

10. A printing apparatus, comprising a printing platform, a camera device, a printing assembly, and a control host, characterized in that, The printing platform is used to support the substrate on which the pattern to be printed is located; The camera device is used to acquire a substrate image of the substrate on the printing platform; the control host communicates with the camera device and the printing component respectively, and is used to acquire the substrate image from the camera device and construct an outline canvas, and control the printing component to print a pattern on the surface of the substrate according to any one of claims 1-8.

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