Display thin films and their preparation methods, glass assemblies, display modules, windows, and equipment.

Abstract

This application relates to a display thin film and its preparation method, a glass assembly, a display module, a window, and an apparatus. The display thin film includes a transparent substrate and a transparent light guide layer. The transparent substrate has a light-guiding display area. The transparent light guide layer is disposed in the light-guiding display area, and the refractive index of the transparent light guide layer is greater than that of the transparent substrate. The display thin film, its preparation method, the glass assembly, the display module, the window, and the apparatus of this application can solve the technical problems in related technologies such as the inability to completely conceal transparent display patterns, complex processes, and high costs.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display thin film and its preparation method, a glass assembly, a display module, a window, and an apparatus. Background Technology

[0002] In related technologies, transparent displays for car windows or sunroofs are mainly achieved through printing fluorescent ink patterns, laser-engraving patterns into glass, using transparent projection films combined with projection equipment, and combining dimming films with transparent projection films and projection equipment. Printing fluorescent ink patterns cannot achieve complete invisibility, laser-engraving patterns into glass involves complex processing and low product safety, and using projection equipment requires additional display devices, increasing system costs. In summary, existing transparent display structures suffer from problems such as inability to achieve complete invisibility, complex processes, and high manufacturing costs. Summary of the Invention

[0003] This application provides a display film and its preparation method, glass assembly, display module, window, and device to solve the technical problems of transparent display patterns not being completely invisible, complex processes, and high costs in related technologies.

[0004] To achieve the above objectives, according to a first aspect of this application, a display film is provided, comprising:

[0005] A transparent substrate, wherein a light-guiding display area is provided on the transparent substrate;

[0006] A transparent light guide layer is disposed in the light guide display area, and the refractive index of the transparent light guide layer is greater than the refractive index of the transparent substrate.

[0007] Furthermore, the light-guiding display area includes at least one groove, and the transparent light-guiding layer is disposed within the groove.

[0008] Furthermore, the light-guiding display area includes a plurality of the aforementioned grooves, wherein:

[0009] Along the thickness direction of the transparent substrate, the depth of the plurality of grooves is the same, or,

[0010] Along the thickness direction of the transparent substrate, at least two of the plurality of grooves have different depths.

[0011] Furthermore, along the thickness direction of the transparent substrate, the depth of the groove is greater than or equal to the thickness of the transparent light guide layer.

[0012] Furthermore, along the thickness direction of the transparent substrate, the ratio of the depth of the groove to the thickness of the transparent substrate satisfies the following relationship: 1 / 5 ≤ r ≤ 4 / 5.

[0013] Furthermore, the transparent substrate includes a light guide portion and a light emission portion, the light guide portion being located on the side of the light emission portion, and the light guide display area being disposed on the light emission portion.

[0014] Furthermore, the light guide portion is provided with at least a micro / nano light guide structure for converting a point light source into a line light source.

[0015] Furthermore, the refractive index n1 of the transparent substrate satisfies the relationship: 1.5 ≤ n1 ≤ 1.6; and / or,

[0016] The refractive index n2 of the transparent light guide layer satisfies the following relationship: 1.6≤n2≤1.9.

[0017] Furthermore, the transparent light guide layer includes at least one of a liquid crystal layer and an invisible resin layer.

[0018] Furthermore, the thickness d1 of the transparent substrate satisfies the relationship: 0.01mm ≤ d1 ≤ 0.5mm; and / or,

[0019] The haze H of the transparent substrate satisfies the following relationship: H < 5%; and / or,

[0020] The transmittance T of the transparent substrate satisfies the following relationship: T > 80%.

[0021] Furthermore, the transparent substrate includes a flexible, bendable transparent light-guiding film.

[0022] Furthermore, the display film also includes an encapsulation layer, which is attached to the surface of the transparent substrate and covers the light-guiding display area.

[0023] Furthermore, the transparent substrate and / or the encapsulation layer comprises at least one of polyethylene terephthalate layer, polycarbonate layer, polystyrene layer, polyimide layer, colorless polyimide layer, polymethyl methacrylate layer, and polyvinyl chloride layer.

[0024] According to a second aspect of this application, a display module is also provided, the display module including the above-described display film, the display module further including a light source assembly, the light source assembly being disposed on the side of the light guide portion of the display film away from the light emitting portion of the display film, for at least emitting light toward the transparent light guide layer.

[0025] Furthermore, the display module includes multiple display films, which are stacked along the thickness direction of the display films.

[0026] Furthermore, two adjacent display films are bonded together by a first adhesive layer.

[0027] Furthermore, the first adhesive layer includes a solid optically transparent adhesive layer or a liquid optically transparent adhesive layer.

[0028] Furthermore, the light source assembly includes LED lights.

[0029] According to a third aspect of this application, a glass assembly is also provided, the glass assembly including the above-described display film or including the above-described display module;

[0030] The glass assembly also includes a glass substrate, and the display film is attached to the surface of the glass substrate by a second adhesive layer.

[0031] Furthermore, the second adhesive layer includes any one of the following: a polyvinyl butyral layer, a thermoplastic polyurethane layer, an ethylene-vinyl acetate copolymer layer, a solid optically transparent adhesive layer, and a liquid optically transparent adhesive layer.

[0032] Furthermore, the glass assembly includes multiple glass substrates stacked along the thickness direction of the glass substrates, and the display film is disposed between at least two adjacent glass substrates.

[0033] According to a fourth aspect of this application, a window is also provided, the window comprising the aforementioned display film, or the aforementioned display module, or the aforementioned glass assembly.

[0034] According to a fifth aspect of this application, an apparatus is also provided, the apparatus comprising the aforementioned display film, or the aforementioned display module, or the aforementioned glass assembly, or the aforementioned window.

[0035] According to a sixth aspect of this application, a method for preparing a display thin film is also provided, the method comprising:

[0036] A light-guiding display area is fabricated on a transparent substrate;

[0037] A transparent light guide layer is prepared in the light guide display area.

[0038] Furthermore, the light guide display area is processed by at least one of laser engraving technology, photolithography technology, and chemical etching technology.

[0039] Furthermore, the step of processing the light-guiding display area on the transparent substrate using the laser engraving technology includes:

[0040] Control the laser engraving equipment to position it at a predetermined engraving location on the transparent substrate;

[0041] The laser engraving equipment is controlled to engrave on the surface of the transparent substrate according to a predetermined pattern, so as to form the light guide display area on the transparent substrate.

[0042] Furthermore, the step of processing the light-guiding display area on the transparent substrate using the photolithography technique includes:

[0043] A photoresist layer with a predetermined pattern is prepared on the surface of the transparent substrate using a photolithography device;

[0044] The positions on the transparent substrate corresponding to the predetermined pattern are etched to form the light-guiding display area on the transparent substrate.

[0045] Furthermore, the step of preparing a photoresist layer with a predetermined pattern on the surface of the transparent substrate using a photolithography device includes:

[0046] A photoresist layer is obtained by coating the surface of the transparent substrate with a photoresist material.

[0047] The photoresist layer is exposed using a photolithography device and a mask having the predetermined pattern;

[0048] The photoresist layer after exposure is dissolved by a chemical developer to obtain a photoresist layer with the predetermined pattern.

[0049] Furthermore, after etching the positions on the transparent substrate corresponding to the predetermined pattern, the fabrication method further includes:

[0050] Remove the photoresist layer from the surface of the transparent substrate.

[0051] Furthermore, the step of fabricating a transparent light guide layer in the light guide display area includes:

[0052] The light guide material is filled into the light guide display area, and the light guide material is cured to form the transparent light guide layer.

[0053] Furthermore, the light-guiding material is cured by UV light to form the transparent light-guiding layer.

[0054] Furthermore, after fabricating the transparent light guide layer in the light guide display area, the fabrication method further includes:

[0055] An encapsulation layer is disposed on the surface of the transparent substrate, such that the encapsulation layer is at least attached to the surface of the transparent substrate and covers the light guide display area.

[0056] The display film of this application includes a transparent substrate and a transparent light guide layer. The transparent light guide layer is disposed in the light-guiding display area of ​​the transparent substrate, and the refractive index of the transparent light guide layer is greater than that of the transparent substrate. Pattern display can be achieved through the transparent light guide layer. Both the transparent substrate and the transparent light guide layer are transparent materials, allowing the pattern to be completely invisible when not needed, thus improving the display effect and light transmittance of the display film. By setting the transparent light guide layer for pattern display on the transparent substrate, there is no need to use a complex laser engraving process for pattern carving. The display function can be achieved simply by processing the light-guiding display area on the transparent substrate and filling it with the transparent light guide layer, simplifying the process and reducing production difficulty. The display film of this application does not rely on additional projection equipment; it can achieve pattern display only through its own light guide structure and light source, reducing dependence on external equipment and lowering usage costs.

[0057] Other features and advantages of this application will be described in detail in the following detailed description section. Attached Figure Description

[0058] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0059] To gain a more complete understanding of this application and its beneficial effects, the following description will be provided in conjunction with the accompanying drawings, wherein the same reference numerals in the following description denote the same parts.

[0060] Figure 1 This is a schematic diagram of the structure of the display film disclosed in the embodiments of this application;

[0061] Figure 2 This is a partial schematic diagram of the display film disclosed in the embodiments of this application;

[0062] Figure 3 This is a schematic diagram of the structure of the display module disclosed in the embodiments of this application;

[0063] Figure 4 This is a schematic diagram of the display module disclosed in an embodiment of this application from another perspective;

[0064] Figure 5 This is a comparison diagram of the display module disclosed in the embodiments of this application with the LED light source on and off.

[0065] Figure 6 This is a schematic diagram of the first structure of the glass assembly disclosed in the embodiments of this application;

[0066] Figure 7 This is a schematic diagram of a second structure of the glass assembly disclosed in the embodiments of this application;

[0067] Figure 8 This is a schematic diagram of the third structure of the glass assembly disclosed in the embodiments of this application;

[0068] Figure 9 This is a schematic diagram of the fourth structure of the glass assembly disclosed in the embodiments of this application;

[0069] Figure 10 This is a schematic flowchart of the method for preparing the display thin film disclosed in the embodiments of this application;

[0070] Figure 11 This is a schematic diagram of the process of processing a light guide display area on a transparent substrate using laser engraving technology, as disclosed in the embodiments of this application.

[0071] Figure 12 This is a schematic diagram of the process for processing a light-guiding display area on a transparent substrate using photolithography, as disclosed in an embodiment of this application.

[0072] Figure 13 This is a schematic diagram of the process for preparing a photoresist layer with a predetermined pattern on the surface of a transparent substrate using a photolithography device, as disclosed in the embodiments of this application.

[0073] Figure 14 This is a process flow diagram of processing a single-layer pattern using laser engraving technology, as disclosed in the embodiments of this application;

[0074] Figure 15 This is a process flow diagram of processing multi-layer patterns using laser engraving technology disclosed in the embodiments of this application;

[0075] Figure 16 This is a process flow diagram of processing a single-layer pattern using photolithography, as disclosed in the embodiments of this application;

[0076] Figure 17 This is a process flow diagram of processing multi-layer patterns using photolithography technology, as disclosed in the embodiments of this application.

[0077] Explanation of reference numerals in the attached figures:

[0078] 10. Display film; 11. Transparent substrate; 111. Groove; 12. Transparent light guide layer; 13. Encapsulation layer; 14. Light guide section; 15. Light emitting section; 20. Display module; 21. Light source assembly; 22. First adhesive layer; 30. Glass assembly; 31. Glass substrate; 32. Second adhesive layer; 33. Third adhesive layer. Detailed Implementation

[0079] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the protection scope of this application.

[0080] As described in the background section, related technologies mainly achieve transparent displays through methods such as printing ink patterns, laser engraving patterns inside glass, transparent projection films combined with projection equipment, dimming films, and transparent projection films combined with projection equipment. However, printing ink patterns cannot completely conceal the displayed pattern, laser engraving patterns inside glass involves complex processing and has low product safety, and using projection equipment requires additional display devices, increasing costs.

[0081] refer to Figure 1 and Figure 2 As shown, according to a first aspect of this application, a display film 10 is provided, the display film 10 including a transparent substrate 11 and a transparent light guide layer 12. The transparent substrate 11 has a light-guiding display area. The transparent light guide layer 12 is disposed in the light-guiding display area, and the refractive index n2 of the transparent light guide layer 12 is greater than the refractive index n1 of the transparent substrate 11.

[0082] Specifically, when using the display film 10 of this embodiment, a light source for providing a light source is disposed on the side of the display film 10. The light source emits light from the side to the display film 10. Since the refractive index of the transparent light guide layer 12 of the display film 10 is greater than that of the transparent substrate 11, the light entering the transparent light guide layer 12 is more likely to be refracted and reflective at the interface than the light entering the transparent substrate 11. This makes it easier for the originally divergent light to converge after passing through the transparent light guide layer 12. The transparent light guide layer 12 is brighter than the transparent substrate 11, and the pattern of the transparent light guide layer 12 can be displayed on the transparent substrate 11. The light divergence angle at the edge of the transparent light guide layer 12 is smaller, the edge of the pattern is clearer, and the graphic display effect is better.

[0083] In some embodiments, the light-guiding display area includes at least one groove 111, and a transparent light-guiding layer 12 is disposed within the groove 111. Thus, the shape of the groove 111 on the transparent substrate 11 can limit the shape of the transparent light-guiding layer 12, that is, by setting the shape of the groove 111, a transparent light-guiding layer 12 with a predetermined pattern can be formed on the transparent substrate 11.

[0084] In some embodiments, the light guide display area includes a plurality of grooves 111, wherein the plurality of grooves 111 have the same depth along the thickness direction of the transparent substrate 11.

[0085] Thus, since the multiple grooves 111 have the same depth, when displayed through the display film 10 of this embodiment, the multiple grooves 111 with the same depth present a planar pattern display effect, which can improve the display range of the display film 10.

[0086] In some embodiments, the light guide display area includes a plurality of grooves 111, wherein at least two of the plurality of grooves 111 have different depths along the thickness direction of the transparent substrate 11.

[0087] Thus, the grooves 111 of different depths correspond to the transparent light guide layers 12 of different depths, which can present patterns of different depths. Each pattern, combined with a light source of a different color, can present a stacked display effect of colored patterns, which enhances the display effect of the display film 10 and improves the user experience.

[0088] In some embodiments, along the thickness direction of the transparent substrate 11, the depth of the groove 111 is greater than or equal to the thickness of the transparent light guide layer 12.

[0089] In this way, the transparent light guide layer 12 in the groove 111 will not protrude from the surface of the transparent substrate 11, which improves the flatness of the display film 10 and avoids the protruding part from interfering with the use of the display film 10.

[0090] Reference Figure 2 As shown, in some embodiments, along the thickness direction of the transparent substrate 11, the ratio of the depth d2 of the groove 111 to the thickness d1 of the transparent substrate 11 satisfies the following relationship: 1 / 5 ≤ r ≤ 4 / 5. That is, r = d1 / d2, which yields 0.2d1 ≤ d2 ≤ 0.8d1.

[0091] Thus, by limiting the ratio of the depth d2 of the groove 111 to the thickness d1 of the transparent substrate 11 to satisfy the relationship 1 / 5 ≤ r ≤ 4 / 5, that is, setting the depth of the groove 111 to one-fifth to four-fifths of the thickness of the transparent substrate 11, the depth of the groove 111 is kept within a suitable range, ensuring the display effect of the predetermined pattern on the transparent light guide layer 12 and the support strength of the transparent substrate 11 for the transparent light guide layer 12. Furthermore, while d2 > 0.8d1 can improve the display effect of the display film 10, it will affect the transmittance of the display film 10 and the structural strength of the transparent substrate 11.

[0092] It should be noted that the relationship between the depth d2 of the groove 111 and the thickness d1 of the transparent substrate 11 can be set according to actual needs. For example, the depth d2 of the groove 111 can be 0.2d1, 0.3d1, 0.4d1, 0.5d1, 0.6d1, 0.7d1 or 0.8d1. Specifically, this application does not limit this.

[0093] refer to Figure 4As shown, in some embodiments, the transparent substrate 11 includes a light guide portion 14 and a light emitting portion 15, with the light guide portion 14 located on the side of the light emitting portion 15, and the light-guided display area disposed on the light emitting portion 15. The light guide portion 14 is provided with at least a micro / nano light guide structure for converting a point light source into a line light source.

[0094] Thus, when the point light emitted by the light source passes through the light guide section 14, the micro-nano light guide structure of the light guide section 14 converts the point light into a line light. After entering the light emission section 15 from the light guide section 14, the line light can propagate uniformly within the display film 10. When the line light propagates from the light emission section 15 to the transparent light guide layer 12, the light entering the transparent light guide layer 12 undergoes stronger refraction and interface reflection phenomena compared to the transparent substrate 11, thereby displaying the predetermined pattern information corresponding to the transparent light guide layer 12 on the display film 10. The presence of the light guide section 14 can efficiently couple the point light source to the edge of the display module, achieving high-efficiency light propagation.

[0095] In some embodiments, the refractive index n1 of the transparent substrate 11 satisfies the relationship 1.5 ≤ n1 ≤ 1.6. Thus, by limiting the refractive index n1 of the transparent substrate 11 to the range of 1.5 to 1.6, this range can accommodate a variety of commonly used materials, reducing manufacturing costs and process complexity. The refractive index range of 1.5 to 1.6 ensures uniform and stable propagation of light as it passes through the transparent substrate 11, guaranteeing the display effect of the light-guiding display area. When n1 < 1.5, the light utilization rate is relatively low, easily leading to blurred display patterns. When n1 > 1.6, material selection becomes difficult, display brightness is low, and a good display effect cannot be guaranteed.

[0096] It should be noted that the refractive index n1 of the transparent substrate 11 in this embodiment can be set according to actual needs. For example, the refractive index n1 of the transparent substrate 11 can be 1.5, 1.55 or 1.6. Specifically, this application does not limit it in this regard.

[0097] In some embodiments, the refractive index n2 of the transparent light guide layer 12 satisfies the relationship 1.6 ≤ n2 ≤ 1.9. Thus, by limiting the refractive index n2 of the transparent light guide layer 12 to the range of 1.6 to 1.9, a refractive index difference of 0.1 to 0.4 can be formed between it and the transparent substrate 11. This ensures sufficient interface reflection of light within the transparent light guide layer 12 to enhance brightness, while avoiding excessive reflection that prevents light from passing through, resulting in a clear pattern and good visibility. When n2 < 1.6, the refractive index difference between it and the transparent substrate 11 is too small, leading to a small brightness difference between the light guide display area and the transparent substrate 11. The predetermined pattern in the light guide display area is difficult to distinguish from the transparent substrate 11, resulting in poor display performance. When n2 > 1.9, the choice of material for the transparent light guide layer 12 is limited, often requiring special high-refractive-index materials, which reduces light transmittance and increases cost.

[0098] It should be noted that the refractive index n2 of the transparent light guide layer 12 in this embodiment can be set according to actual needs. For example, the refractive index n2 of the transparent light guide layer 12 can be 1.6, 1.65, 1.75, 1.8, 1.85 or 1.9. Specifically, this application does not limit it in this regard.

[0099] In some embodiments, the transparent light guide layer 12 includes at least one of a liquid crystal layer and an invisible resin layer. That is, the transparent light guide layer 12 in this embodiment can be a liquid crystal layer, an invisible resin layer, or a combination of a liquid crystal layer and an invisible resin layer.

[0100] Understandably, the refractive index of the liquid crystal layer is relatively fixed. As a transparent light guide layer 12, it forms an optical contrast with the transparent substrate 11 to achieve pattern display. The liquid crystal material has good light transmittance, which can improve display clarity. The refractive index of the invisible resin layer is fixed and stable, which can clearly display patterns for a long time, and it has low cost, high light transmittance, and good weather resistance.

[0101] In some embodiments, the thickness d1 of the transparent substrate 11 satisfies the relationship 0.01mm ≤ d1 ≤ 0.5mm. Thus, with the thickness d1 of the transparent substrate 11 within the range of 0.01mm to 0.5mm, the transparent substrate 11 is thinner and lighter, and the propagation path length of light within the transparent substrate 11 is reasonable, ensuring that light is uniformly transmitted from the light guide portion 14 to the light-guiding display area of ​​the light-emitting portion 15, thereby improving the display effect of the display film 10. When d1 < 0.01mm, the mechanical strength of the transparent substrate 11 is poor, making it susceptible to damage from external forces during use, and the thickness difference between the transparent substrate 11 and the transparent light guide layer 12 is small, resulting in a poor display effect. When d1 > 0.5mm, the transparent substrate 11 is too thick, increasing the volume and weight of the display film 10.

[0102] It should be noted that the thickness d1 of the transparent substrate 11 in this embodiment can be set according to actual needs. For example, the thickness d1 of the transparent substrate 11 can be 0.01mm, 0.05mm, 0.1mm, 0.15mm, 0.2mm, 0.25mm, 0.3mm, 0.35mm, 0.4mm, 0.45mm, or 0.5mm. Specifically, this application does not limit it in this respect.

[0103] In some embodiments, the haze H of the transparent substrate 11 satisfies the relationship H < 5%. It can be understood that haze H represents the degree of scattering of light when it passes through the transparent substrate 11. The lower the haze H, the better the light transmittance, and the higher the haze H, the worse the light transmittance.

[0104] Thus, by setting the haze of the transparent substrate 11 to less than 5%, this embodiment ensures the light transmittance of the transparent substrate 11, so that when the corresponding predetermined pattern is displayed through the display film 10, the transparent display effect is not affected. For example, when the display film 10 is used in a transparent window, it does not affect the transparency function of the transparent window.

[0105] It should be noted that the haze of the transparent substrate 11 in this embodiment can be set according to actual needs. For example, the haze H of the transparent substrate 11 can be set to 1%, 2%, 3%, 4%, or 5%. Specifically, this application does not limit this.

[0106] In some embodiments, the transmittance T of the transparent substrate 11 satisfies the relationship T > 80%. Thus, setting the transmittance T of the transparent substrate 11 to be greater than 80% improves the transparent display effect of the display film 10, enhances the contrast between the transparent light guide layer 12 and the background transparent substrate 11, and enables the predetermined pattern of the transparent light guide layer 12 to be displayed more clearly on the display film 10.

[0107] It should be noted that the transmittance of the transparent substrate 11 in this embodiment is set according to actual needs. For example, the haze T of the transparent substrate 11 can be set to 80%, 85%, 90%, or 95%. Specifically, this application does not limit this.

[0108] In some embodiments, the transparent substrate 11 includes a flexible and bendable transparent light-guiding film. This gives the display film 10 of this embodiment good flexibility and plasticity, allowing it to adapt to complex installation scenarios such as curved surfaces and irregular shapes, thus broadening its application range. At the same time, it does not affect the light transmittance and pattern display effect of the display film 10, and can improve the impact resistance and durability of the display film 10 during use, meeting the needs of various scenarios.

[0109] In some embodiments, the display film 10 further includes an encapsulation layer 13, which is attached to the surface of the transparent substrate 11 and covers the light guide display area. In this way, the encapsulation layer 13 can isolate external moisture, dust and other impurities from eroding or contaminating the transparent light guide layer 12, and can prevent surface wear of the transparent substrate 11 and the transparent light guide layer 12, ensuring long-term stability of the display effect.

[0110] For example, the transparent substrate 11 includes at least one of polyethylene terephthalate (PET) layer, polycarbonate (PC) layer, polystyrene (PS) layer, polyimide (PI) layer, colorless polyimide (CPI) layer, polymethyl methacrylate (PMMA) layer and polyvinyl chloride (PVC) layer.

[0111] Understandably, polyethylene terephthalate (PET) is a polymer material with good optical transparency. Using it as the transparent substrate 11 in this embodiment provides high light transmittance, reducing light loss, and also offers high mechanical strength and wear resistance, ensuring the durability of the transparent substrate 11. Furthermore, it is low in cost and easy to process. Polycarbonate (PC) is a resilient thermoplastic resin with good light transmittance. When used as the transparent substrate 11 in this embodiment, it provides good impact resistance and a certain degree of high-temperature resistance, allowing it to operate stably in environments with large temperature variations. Polystyrene (PS) is a plastic with good transparency. Using it as the transparent substrate 11 in this embodiment provides good light transmittance, low cost, and easy processing. Polyimide (PI) is a high-performance polymer with excellent heat resistance and chemical stability. Using it as the transparent substrate 11 in this embodiment allows it to maintain good mechanical properties in high-temperature and complex chemical environments, and also possesses a certain degree of flexibility, giving the display film 10 of this embodiment good toughness. Colorless polyimide (CPI) is an improved material based on polyimide. While retaining the high-temperature resistance and chemical corrosion resistance of polyimide, it improves light transmittance, thus enhancing the transparent display effect of the display film 10. Polymethyl methacrylate (PMMA), also known as plexiglass, has extremely high light transmittance, approaching that of ordinary glass. Using it as the transparent substrate 11 in this embodiment provides good weather resistance, making it less susceptible to aging due to environmental factors, and it is easy to process into various shapes. Polyvinyl chloride (PVC) is a low-cost general-purpose plastic with good chemical stability. Using it as the transparent substrate 11 in this embodiment can significantly reduce the production cost of the display film 10.

[0112] For example, the encapsulation layer 13 includes at least one of polyethylene terephthalate layer, polycarbonate layer, polystyrene layer, polyimide layer, colorless polyimide layer, polymethyl methacrylate layer and polyvinyl chloride layer.

[0113] Thus, in this embodiment, the encapsulation layer 13 uses a highly transparent encapsulation material that is the same as or similar to that of the transparent substrate 11, capable of isolating water and oxygen. The encapsulation layer 13 can cooperate with the transparent substrate 11 to form a tight and stable protective barrier, effectively preventing water vapor, oxygen, and other substances from eroding the light-guiding display area, thereby improving the service life of the display film 10. The encapsulation layer 13 also uses a highly transparent material, which can reduce light loss when light passes through the interface between the transparent substrate 11 and the encapsulation layer 13, ensuring smooth light propagation. This not only guarantees the brightness and clarity of the displayed pattern on the display film 10, but also maintains the high light transmittance of the overall structure.

[0114] According to a second aspect of this application, a display module 20 is also provided, with reference to... Figure 3 and Figure 4As shown, the display module 20 includes the aforementioned display film 10 and light source assembly 21. The light source assembly 21 is disposed on the side of the light guide portion 14 of the display film 10 away from the light emitting portion 15 of the display film 10, so as to at least emit light to the transparent light guide layer 12.

[0115] Thus, the light source component 21 serves as the light source of the display film 10 in this embodiment, emitting light. The light emitted by the light source component 21 first enters the light guide section 14 of the display film 10. The micro-nano light guide structure inside the light guide section 14 converts the point light source light into the line light source light, and then the light enters the light emission section 15 evenly. Since the light guide display area is located in the light emission section 15, the light can evenly illuminate the transparent light guide layer 12 of the light guide display area, making the display effect of the display film 10 better.

[0116] In some embodiments, the display module 20 includes a plurality of display films 10, which are stacked along the thickness direction of the display films 10.

[0117] In this way, each display film 10 in the display module 20 can independently carry different display content, and form a composite image with spatial layers through light superposition. The three-dimensional display of the pattern can be achieved without setting up additional 3D equipment, which improves the display effect of the display film 10.

[0118] It should be noted that the number of display films 10 in the display module 20 of this embodiment can be set according to actual needs. For example, the number of display films 10 in the display module 20 can be set to 2, 3, 4 or 5. Specifically, this application does not limit this.

[0119] In some embodiments, two adjacent display films 10 are bonded together by a first adhesive layer 22. Thus, the first adhesive layer 22 bonds the two adjacent display films 10 together.

[0120] For example, the first adhesive layer 22 includes a solid optically transparent adhesive (OCA) layer or a liquid optically transparent adhesive (OCR) layer.

[0121] Understandably, using solid optically transparent adhesive (OCA) as the first adhesive layer 22, the solid OCA has high light transmittance, low haze, and no air bubbles after bonding, which can stably maintain the tight connection between the display films 10. Using liquid optically transparent adhesive (OCR) as the first adhesive layer 22, the liquid OCA can fill tiny gaps after curing, adapt to uneven surfaces, and significantly improve the sealing of interlayer bonding. In this embodiment, both solid and liquid OCA can reduce interlayer light reflection loss, ensure efficient light transmission, and enhance the stability of the stacked structure.

[0122] For example, the light source component 21 includes an LED lamp. Thus, the LED lamp projects colored light onto the display film 10 of this embodiment, and a colored pattern is presented in the transparent light guide layer 12 within the display film 10. The pattern is clearly displayed when the LED lamp is on, and completely invisible when the LED lamp is off. The color of the displayed pattern changes with the color of the LED light source. This embodiment uses an LED lamp as the light source component 21. LED lamps have high luminous efficiency and low energy consumption, providing stable and controllable light for the display film 10 of this embodiment. LED lamps are small in size and generate less heat, better adapting to the thin and light design of the display module 20. Simultaneously, LED lamps have a long lifespan and fast response speed, ensuring the continuity of the display effect and the sensitivity of dynamic displays.

[0123] refer to Figure 5 The diagram shows a comparison of the display module 20 in this embodiment with the LED light source (LED lamp) on and off. It can be seen that when the LED light source is on, the pattern on the display film 10 can be displayed clearly and completely, resulting in a good display effect and high clarity. When the LED light source is off, no pattern remains on the display film 10, indicating good light transmittance.

[0124] According to a third aspect of this application, a glass assembly 30 is also provided, with reference to... Figures 6 to 9 As shown, the glass assembly 30 includes the aforementioned display film 10 or the aforementioned display module 20.

[0125] In some embodiments, the glass assembly 30 further includes a glass substrate 31, and the display film 10 is bonded to the surface of the glass substrate 31 via a second adhesive layer 32. In this way, the display film 10 is bonded to the glass substrate 31 via the second adhesive layer 32, which not only provides stable support using the glass substrate 31, improving the overall structural strength and durability, but also allows the high light transmittance of the glass to maintain the display effect.

[0126] It should be noted that the glass substrate 31 in this embodiment can be automotive glass, house window glass, etc. The specific choice depends on the actual application, and this application does not limit it.

[0127] For example, the second adhesive layer 32 includes any one of a polyvinyl butyral (PVB) layer, a thermoplastic polyurethane (TPU) layer, an ethylene-vinyl acetate copolymer (EVA) layer, a solid optically transparent adhesive layer, and a liquid optically transparent adhesive layer.

[0128] Understandably, using polyvinyl butyral (PVB) as the second adhesive layer 32 is advantageous because PVB has good optical transparency and bonding strength, strong impact resistance, and a certain degree of sound insulation, thus improving the safety of the glass substrate 31 after the display film 10 is bonded to it. Using thermoplastic polyurethane (TPU) as the second adhesive layer 32 is also beneficial because TPU has good flexibility, wear resistance, and low-temperature resistance, making it better suited for curved glass or flexible display requirements. Using ethylene-vinyl acetate copolymer (EVA) as the second adhesive layer 32 is also advantageous because EVA has high light transmittance, aging resistance, and is easy to bond, with low cost. In this embodiment, the use of PVB, thermoplastic polyurethane, and ethylene-vinyl acetate copolymer layers as the second adhesive layer 32 can achieve a stable bond between the display film 10 and the glass substrate 31, reducing light reflection, and simultaneously meeting the different requirements for bonding strength, flexibility, and low cost in various scenarios. The second adhesive layer 32 can also use the solid optical transparent adhesive (OCA) or liquid optical transparent adhesive (OCR) described above. Since the technical effects of solid optical transparent adhesive and liquid optical transparent adhesive have been described in detail above, they will not be repeated here.

[0129] In some embodiments, the glass assembly 30 includes a plurality of glass substrates 31, which are stacked along the thickness direction of the glass substrates 31, and a display film 10 is disposed between at least two adjacent glass substrates 31.

[0130] In this way, the display film 10 is combined with the glass assembly 30 structure formed by stacking multiple glass substrates 31. The display film 10 is positioned between at least two adjacent glass substrates 31, ensuring the structural stability of the glass assembly 30 while enabling pattern display. Furthermore, since the display film 10 is positioned between two glass substrates 31, it will not be scratched by friction during use, thus improving its lifespan and display effect.

[0131] In some embodiments, the display film 10 is bonded to the glass substrate 31 via a second adhesive layer 32. When the display film 10 is disposed between two glass substrates 31, the second adhesive layer 32 can be any one of a PVB layer, a TPU layer, and an EVA layer. Since the weight of the glass substrate 31 is very large relative to the display film 10, the PVB layer, TPU layer, and EVA layer all have high adhesive strength, which can enhance the overall structural stability of the glass assembly 30 and is more suitable for use in glass interlayers to prevent the glass substrates 31 from detaching. When the display film 10 is disposed on the outer surface of one glass substrate 31, the second adhesive layer 32 can be an OCA layer or an OCR layer. The OCA layer or OCR layer has high light transmittance and is more suitable for bonding the display film 10 to the outer surface of the glass substrate 31, which can improve the display effect of the glass assembly 30 while ensuring bonding.

[0132] For example, refer to Figure 6 The diagram shown is a first structural schematic of the glass assembly 30 of this embodiment. In this glass assembly 30, the display module 20 with a single-layer display film 10 is used in a double-layer glass structure in the aftermarket. The display module 20 with the single-layer display film 10 is bonded to one of the glass substrates 31 through a second adhesive layer 32, and the two glass substrates 31 of the double-layer glass structure are bonded together through a third adhesive layer 33.

[0133] For example, the third adhesive layer 33 includes any one of a polyvinyl butyral (PVB) layer, a thermoplastic polyurethane (TPU) layer, and an ethylene-vinyl acetate copolymer (EVA) layer. In this embodiment, using a polyvinyl butyral (PVB) layer, a thermoplastic polyurethane (TPU) layer, or an ethylene-vinyl acetate copolymer (EVA) layer as the third adhesive layer 33 to bond the two glass substrates 31 of the double-layer glass structure not only ensures the light transmittance of the double-layer glass structure but also improves the bonding strength.

[0134] For example, refer to Figure 7 The diagram shown is a second structural schematic of the glass assembly 30 in this embodiment. In this glass assembly 30, the display module 20 with a double-layer display film 10 is used in a double-layer glass structure in the aftermarket. The display module 20 with the double-layer display film 10 is bonded to one of the glass substrates 31 through a second adhesive layer 32, and the two glass substrates 31 of the double-layer glass structure are bonded together through a third adhesive layer 33.

[0135] For example, refer to Figure 8The diagram shown illustrates a third structural design of the glass assembly 30 in this embodiment. In this glass assembly 30, the display module 20 with a single-layer display film 10 is used in a double-layer glass structure for the OEM market. The display module 20 with the single-layer display film 10 is bonded between the two glass substrates 31 of the double-layer glass structure via a second adhesive layer 32.

[0136] For example, refer to Figure 9 The diagram shown is a fourth structural schematic of the glass assembly 30 in this embodiment. In this glass assembly 30, the display module 20 with a double-layer display film 10 is applied to the double-layer glass structure in the pre-installed market. The display module 20 with the double-layer display film 10 is attached between the two glass substrates 31 of the double-layer glass structure through a second adhesive layer 32.

[0137] According to a fourth aspect of this application, a window is also provided, which, by way of example, includes, but is not limited to, house windows, car windows, train windows, airplane windows, and ship portholes.

[0138] The window includes the aforementioned display film 10, display module 20, or glass assembly 30. Therefore, the window includes all the technical effects of the aforementioned display film 10, display module 20, or glass assembly 30. Since the technical effects of the display film, display module 20, or glass assembly 30 have been described in detail above, they will not be repeated here.

[0139] According to a fifth aspect of this application, an apparatus is also provided, which, by way of example, includes, but is not limited to, automobiles, trains, airplanes, and ships.

[0140] The device includes the display film 10, display module 20, or glass assembly 30 described above. Therefore, the device includes all the technical effects of the display film 10, display module 20, or glass assembly 30 described above. Since the technical effects of the display film 10, display module 20, and glass assembly 30 have been described in detail above, they will not be repeated here.

[0141] According to a sixth aspect of this application, a method for preparing a display thin film is also provided, the method being used to prepare the above-described display thin film 10, referring to... Figure 10 As shown, the preparation method includes:

[0142] Step S100: A light-guiding display area is processed on the transparent substrate 11.

[0143] It should be noted that the light guide display area in this embodiment includes at least one groove 111, and a transparent light guide layer 12 is prepared in the groove 111 in this embodiment.

[0144] In some embodiments, the light guide display area is processed by at least one of laser engraving, photolithography, and chemical etching techniques.

[0145] Among them, reference Figure 11 , Figure 14 and Figure 15 As shown, the steps for processing the light guide display area on the transparent substrate 11 using laser engraving technology include:

[0146] Step S101: Control the laser engraving equipment to position itself at the predetermined engraving location on the transparent substrate 11;

[0147] Step S102: The laser engraving equipment is controlled to engrave on the surface of the transparent substrate 11 according to the predetermined pattern to form a light guide display area on the transparent substrate 11.

[0148] In some embodiments, the laser engraving position is determined on the transparent substrate 11 based on a predetermined pattern, the laser engraving device is controlled to move to the top of the transparent substrate 11, and the laser engraving device is controlled to emit laser light to perform fine laser engraving on the laser engraving position on the surface of the transparent substrate 11 according to the predetermined pattern. Figure 14 For a single-layer predetermined pattern, the depth of each engraved groove 111 is the same, for example, one-third of the thickness of the transparent substrate 11. For a multi-layer predetermined pattern, at least two of the engraved grooves 111 have different depths, which are set according to the actual situation, such as... Figure 15 As shown, when the display film 10 includes two layers of predetermined patterns, the depths of the grooves 111 corresponding to the two different layers of patterns are different. For example, they can be set to half and one-third of the thickness of the transparent substrate 11. After engraving, the predetermined pattern area is cleaned at specific points to promptly remove debris, dust, and other impurities generated by laser engraving, preventing them from adhering to the grooves 111 or the surface of the transparent substrate 11 and affecting the subsequent preparation of the transparent light guide layer 12. At the same time, it prevents display defects caused by impurities and ensures the display effect of the light guide display area.

[0149] For example, the cleaning methods include one or more of air jet cleaning, airflow adsorption, and physical fixed / rotating roller brush cleaning. Air jet cleaning uses high-pressure airflow for directional blowing, quickly removing loose debris from the surface and grooves 111. Airflow adsorption uses negative pressure to promptly remove dust and particles, avoiding secondary pollution, and is suitable for handling light, floating impurities. Physical fixed / rotating roller brush cleaning removes stubborn debris through contact friction, and when combined with directional cleaning, it can precisely handle localized residual impurities. The combination of multiple methods achieves comprehensive cleaning, ensuring no impurities remain in the engraved area.

[0150] Reference Figure 12 , Figure 15 and Figure 16As shown, the steps for processing the light-guiding display area on the transparent substrate 11 using photolithography include:

[0151] Step S111: A photoresist layer with a predetermined pattern is prepared on the surface of the transparent substrate 11 using a photolithography device;

[0152] Step S112: Etch the position on the transparent substrate corresponding to the predetermined pattern to form a light guide display area on the transparent substrate 11.

[0153] It should be noted that the photoresist layer with the predetermined pattern in this embodiment is prepared using photoresist material, which includes positive photoresist material and negative photoresist material. Positive photoresist material undergoes a chemical change after being exposed to light and is easily dissolved. Negative photoresist material cross-links and solidifies after being exposed to light, becoming difficult to dissolve.

[0154] Reference Figure 13 As shown, the step of preparing a photoresist layer with a predetermined pattern on the surface of a transparent substrate 11 using a photolithography apparatus includes:

[0155] Step S121: Coating a photoresist material onto the surface of the transparent substrate 11 to obtain a photoresist layer;

[0156] Step S122: Expose the photoresist layer using a photolithography device and a mask with a predetermined pattern;

[0157] Step S123: Dissolve the exposed photoresist layer with a chemical developer to obtain a photoresist layer with a predetermined pattern.

[0158] In some embodiments, photoresist can be uniformly coated onto the surface of a transparent substrate using spin coating, followed by solvent removal and enhanced adhesion via soft baking. Spin coating utilizes centrifugal force generated by high-speed rotation to evenly spread the photoresist onto the surface of the transparent substrate, and removes excess photoresist, thereby forming a uniformly thick film. This results in a uniformly thick and completely covered photoresist coating on the transparent substrate surface, avoiding any impact on the precision of the photolithography process. Soft baking removes the solvent by moderately heating the photoresist to slowly evaporate the solvent, while simultaneously promoting the bonding of colloidal molecules to the substrate surface. This enhances the density and adhesion of the coating, preventing the formation of bubbles or pinholes in the coating, and strengthening the adhesion between the photoresist and the transparent substrate 11, ensuring the precision and stability of the photolithography process.

[0159] In some embodiments, a photomask is disposed parallel to the top of the photoresist layer and at a predetermined distance from the photoresist layer. Light is irradiated onto the photomask by a photolithography device. The photomask has transparent and opaque areas. When the photoresist material is positive, the shape of the transparent area on the photomask is the shape of a predetermined pattern; when the photoresist material is negative, the shape of the opaque area on the photomask is the shape of a predetermined pattern. Part of the light irradiated from the photolithography device onto the photomask shines through the transparent area onto the photoresist layer, while part is blocked by the non-transparent areas. The light then shines through the transparent area onto the photoresist layer, thus exposing the photoresist layer. If the photoresist material is positive, the exposed areas are dissolved by a chemical developer to obtain a photoresist layer with a predetermined pattern; if the photoresist material is negative, the unexposed areas are dissolved by a chemical developer to obtain a photoresist layer with a predetermined pattern, thereby clearly revealing the exposed predetermined pattern.

[0160] In some embodiments, the transparent substrate 11 exposed at predetermined pattern positions on the photoresist layer is etched using wet etching or dry etching, thereby forming a light-guiding display area with a predetermined pattern on the surface of the transparent substrate 11. Wet etching involves etching the surface of the transparent substrate 11 with a chemical etching solution. Since the surface of the transparent substrate 11 is protected by a photoresist layer except at the predetermined pattern positions, the chemical etching solution only etches the transparent substrate 11 at the positions corresponding to the predetermined pattern, thus forming the predetermined pattern on the surface of the transparent substrate 11. Wet etching is low-cost, simple to operate, suitable for large-area etching, and can form a relatively smooth etched surface. Dry etching utilizes gas plasma to chemically react with or physically bombard the transparent substrate 11, removing the transparent substrate 11 at the positions corresponding to the predetermined pattern, thus forming the predetermined pattern on the surface of the transparent substrate 11. Dry etching, through plasma, enables directional etching, resulting in good anisotropy, clear pattern edges, and high precision, ensuring the accuracy of the light-guiding display area.

[0161] For example, a transparent substrate 11 exposed at a predetermined pattern position on the photoresist layer is etched using a diluted hydrofluoric acid solution, and the depth of the groove 111 is controlled by controlling the etching time to form a predetermined pattern of the light guide display area.

[0162] For example, chlorine-based gas is ionized into plasma in a radio frequency field, which reacts with silicon in the transparent substrate 11 to generate volatile silicon chloride, which is then removed, thereby achieving an etching effect on the transparent substrate 11. The depth of the groove 111 is controlled by controlling the reaction time between the plasma and the transparent substrate 11, forming a predetermined pattern in the light-guiding display area.

[0163] In some embodiments, after etching the positions on the transparent substrate 11 corresponding to the predetermined pattern, the fabrication method further includes:

[0164] Step S113: Remove the photoresist layer on the surface of the transparent substrate 11.

[0165] For example, the photoresist layer on the surface of the transparent substrate 11 is removed by chemical solvents or plasma to obtain the final transparent substrate 11 with a light-guiding display area. The photoresist layer protects the non-etched areas of the transparent substrate 11 during the etching process. Removing the photoresist layer after etching fully exposes the light-guiding display area formed on the surface of the transparent substrate 11, facilitating subsequent fabrication processes. Removing the photoresist layer improves the cleanliness of the transparent substrate 11 surface, ensuring stable optical performance of the light-guiding display area.

[0166] Understandably, a single-layer predetermined pattern can be processed using the photolithography process described above. For multi-layer predetermined patterns, each layer can be processed individually using the photolithography process described above, which will not be described in detail in this application.

[0167] Step S200: A transparent light guide layer 12 is prepared in the light guide display area.

[0168] In some embodiments, the step of fabricating a transparent light guide layer 12 in the light guide display area includes:

[0169] The light guide material is filled into the light guide display area and then cured to form a transparent light guide layer 12.

[0170] For example, the light-guiding material is cured by UV light to form the transparent light-guiding layer 12. UV light can achieve rapid curing, significantly shortening the production cycle, and the curing process is highly controllable, allowing for precise control of the curing degree and ensuring stable performance of the light-guiding layer. UV curing does not produce solvent evaporation, making it environmentally friendly.

[0171] For example, the light guide material includes a liquid crystal, which can be filled into the groove 111 of the light guide display area using a dotting device, and then the filled liquid crystal is cured to obtain the corresponding transparent light guide layer 12. The liquid crystal filled into the groove 111 by the dotting device can be cured by UV light. The transparent light guide layer 12 formed after curing has good optical matching and can efficiently conduct light.

[0172] For example, the light guide material includes an invisible resin liquid. The invisible resin liquid can be filled into the groove 111 of the light guide display area using a dispensing device, and can be cured by UV light to obtain the corresponding transparent light guide layer 12. The invisible resin liquid has good fluidity and can completely fill the fine structure of the groove 111. After curing, it has high light transmittance and can adhere tightly to the transparent substrate 11 to form a seamless, homogeneous, transparent light guide layer 12, ensuring the stability of light transmission in the transparent light guide layer 12.

[0173] In some embodiments, after fabricating the transparent light guide layer 12 in the light guide display area, the fabrication method further includes:

[0174] In step S300, an encapsulation layer 13 is disposed on the surface of the transparent substrate 11 so that the encapsulation layer 13 is at least attached to the surface of the transparent substrate 11 and covers the light guide display area.

[0175] For example, the encapsulation layer 13 uses a material that has the same effect as the transparent substrate 11, such as one of polyethylene terephthalate, polycarbonate, polystyrene, polyimide, colorless polyimide, polymethyl methacrylate, and polyvinyl chloride. It can form a tight and stable protective barrier with the transparent substrate 11, effectively blocking moisture, oxygen, etc. from corroding the light guide display area.

[0176] For example, the encapsulation layer 13 can also use a thin-film adhesive for encapsulation. The thin-film adhesive is encapsulated on the side of the cured transparent substrate 11 with the light-guiding display area to complete the encapsulation operation and form the final display film 10. The thin-film adhesive adheres tightly and has a uniform thickness, which can form a continuous protective layer on the surface of the light-guiding display area, effectively isolating external moisture, dust and other impurities from intrusion and protecting the internal light-guiding structure from environmental corrosion.

[0177] For example, refer to Figures 15 to 17 As shown, in this embodiment, the encapsulation layer 13 is bonded to the transparent substrate 11 and the transparent light guide layer 12 using a composite hot-melt method. This composite hot-melt method enhances interlayer stability through tight molecular-level bonding, reduces gaps and bubbles, strengthens protection against moisture and impurities, ensures efficient light transmission and display performance, and improves the reliability of the display film 10.

[0178] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0179] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0180] The embodiments, implementation methods, and related technical features of this application can be combined and substituted for each other without conflict.

[0181] The above are merely preferred embodiments of this application and are not intended to limit this application in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this application without departing from the scope of the technical solution of this application shall still fall within the scope of the technical solution of this application.

Claims

1. A display film (10), characterized in that, include: A transparent substrate (11) is provided with a light-guiding display area; A transparent light guide layer (12) is disposed in the light guide display area, and the refractive index of the transparent light guide layer (12) is greater than the refractive index of the transparent substrate (11).

2. The display film (10) according to claim 1, characterized in that, The light-guiding display area includes at least one groove (111), and the transparent light-guiding layer (12) is disposed in the groove (111).

3. The display film (10) according to claim 2, characterized in that, The light-guiding display area includes a plurality of the grooves (111), wherein: Along the thickness direction of the transparent substrate (11), the depths of the plurality of grooves (111) are the same, or, Along the thickness direction of the transparent substrate (11), at least two of the plurality of grooves (111) have different depths.

4. The display film (10) according to claim 2, characterized in that, Along the thickness direction of the transparent substrate (11), the depth of the groove (111) is greater than or equal to the thickness of the transparent light guide layer (12).

5. The display film (10) according to claim 2, characterized in that, Along the thickness direction of the transparent substrate (11), the ratio of the depth of the groove (111) to the thickness r of the transparent substrate (11) satisfies the following relationship: 1 / 5≤r≤4 / 5.

6. The display film (10) according to claim 1, characterized in that, The transparent substrate (11) includes a light guide (14) and a light emitter (15). The light guide (14) is located on the side of the light emitter (15), and the light guide display area is disposed on the light emitter (15).

7. The display film (10) according to claim 6, characterized in that, The light guide section (14) is provided with at least a micro-nano light guide structure for converting a point light source into a line light source.

8. The display film (10) according to claim 1, characterized in that, The refractive index n1 of the transparent substrate (11) satisfies the following relationship: 1.5 ≤ n1 ≤ 1.6; and / or, The refractive index n2 of the transparent light guide layer (12) satisfies the following relationship: 1.6≤n2≤1.

9.

9. The display film (10) according to claim 1, characterized in that, The transparent light guide layer (12) includes at least one of a liquid crystal layer and an invisible resin layer.

10. The display film (10) according to any one of claims 1 to 9, characterized in that, The thickness d1 of the transparent substrate (11) satisfies the following relationship: 0.01mm ≤ d1 ≤ 0.5mm; and / or, The haze H of the transparent substrate (11) satisfies the following relationship: H < 5%; and / or, The transmittance T of the transparent substrate (11) satisfies the following relationship: T > 80%.

11. The display film (10) according to any one of claims 1 to 9, characterized in that, The transparent substrate (11) includes a flexible and bendable transparent light guide film.

12. The display film (10) according to any one of claims 1 to 9, characterized in that, The display film (10) further includes an encapsulation layer (13), which is attached to the surface of the transparent substrate (11) and covers the light-guiding display area.

13. The display film (10) according to claim 12, characterized in that, The transparent substrate (11) and / or the encapsulation layer (13) include at least one of polyethylene terephthalate layer, polycarbonate layer, polystyrene layer, polyimide layer, colorless polyimide layer, polymethyl methacrylate layer and polyvinyl chloride layer.

14. A display module (20), characterized in that, The display module (20) includes a display film (10) according to any one of claims 1 to 13, and the display module (20) further includes a light source assembly (21), which is disposed on the side of the light guide portion (14) of the display film (10) away from the light emitting portion (15) of the display film (10) for at least emitting light to the transparent light guide layer (12).

15. The display module (20) according to claim 14, characterized in that, The display module (20) includes multiple display films (10), which are stacked along the thickness direction of the display films (10).

16. The display module (20) according to claim 15, characterized in that, The two adjacent display films (10) are bonded together by a first adhesive layer (22).

17. The display module (20) according to claim 16, characterized in that, The first adhesive layer (22) includes a solid optically transparent adhesive layer or a liquid optically transparent adhesive layer.

18. The display module (20) according to claim 17, characterized in that, The light source assembly (21) includes LED lights.

19. A glass assembly (30), characterized in that, The glass assembly (30) includes the display film (10) according to any one of claims 1 to 13 or the display module (20) according to any one of claims 14 to 18; The glass assembly (30) further includes a glass substrate (31), and the display film (10) is attached to the surface of the glass substrate (31) by a second adhesive layer (32).

20. The glass assembly (30) according to claim 19, characterized in that, The second adhesive layer (32) includes any one of the following: polyvinyl butyral layer, thermoplastic polyurethane layer, ethylene-vinyl acetate copolymer layer, solid optically transparent adhesive layer, and liquid optically transparent adhesive layer.

21. The glass assembly (30) according to claim 19, characterized in that, The glass assembly (30) includes a plurality of glass substrates (31), which are stacked along the thickness direction of the glass substrates (31), and the display film (10) is disposed between at least two adjacent glass substrates (31).

22. A window, characterized in that, The window includes a display film (10) as described in any one of claims 1 to 13, or a display module (20) as described in any one of claims 14 to 18, or a glass assembly (30) as described in claim 19 or 21.

23. A device, characterized in that, The device includes a display film (10) according to any one of claims 1 to 13, or a display module (20) according to any one of claims 14 to 18, or a glass assembly (30) according to any one of claims 19 to 21, or a window according to claim 22.

24. A method for preparing a display thin film, characterized in that, The preparation method is used to prepare the display thin film (10) according to any one of claims 1 to 13, and the preparation method includes: A light-guiding display area is fabricated on a transparent substrate (11); A transparent light guide layer (12) is prepared in the light guide display area.

25. The method for preparing a display thin film according to claim 24, characterized in that, The light guide display area is processed by at least one of laser engraving technology, photolithography technology, and chemical etching technology.

26. The method for preparing a display thin film according to claim 25, characterized in that, The step of processing the light guide display area on the transparent substrate (11) using the laser engraving technology includes: The laser engraving equipment is positioned to a predetermined engraving location on the transparent substrate (11); The laser engraving equipment is controlled to engrave on the surface of the transparent substrate (11) according to a predetermined pattern to form the light guide display area on the transparent substrate (11).

27. The method for preparing a display thin film according to claim 25, characterized in that, The step of processing the light-guiding display area on the transparent substrate (11) using the photolithography technique includes: A photoresist layer with a predetermined pattern is prepared on the surface of the transparent substrate (11) using a photolithography device; The position on the transparent substrate (11) corresponding to the predetermined pattern is etched to form the light guide display area on the transparent substrate (11).

28. The method for preparing a display thin film according to claim 27, characterized in that, The step of preparing a photoresist layer with a predetermined pattern on the surface of the transparent substrate (11) using a photolithography apparatus includes: A photoresist layer is obtained by coating a photoresist material onto the surface of the transparent substrate (11); The photoresist layer is exposed using a photolithography device and a photomask with the predetermined pattern. The photoresist layer after exposure is dissolved by a chemical developer to obtain a photoresist layer with the predetermined pattern.

29. The method for preparing a display thin film according to claim 27, characterized in that, After etching the position on the transparent substrate (11) corresponding to the predetermined pattern, the preparation method further includes: Remove the photoresist layer from the surface of the transparent substrate (11).

30. The method for preparing a display thin film according to any one of claims 24 to 29, characterized in that, The step of fabricating the transparent light guide layer (12) in the light guide display area includes: The light guide material is filled into the light guide display area and the light guide material is cured to form the transparent light guide layer (12).

31. The method for preparing the display thin film according to claim 30, characterized in that, The light guide material is cured by UV light to form the transparent light guide layer (12).

32. The method for preparing the display thin film according to claim 30, characterized in that, After fabricating the transparent light guide layer (12) in the light guide display area, the fabrication method further includes: An encapsulation layer (13) is provided on the surface of the transparent substrate (11) so that the encapsulation layer (13) is at least attached to the surface of the transparent substrate (11) and covers the light guide display area.

Images