A glass etching method

Abstract

The embodiment of the present application relates to the technical field of electronic product manufacturing, in particular to a glass etching method, the present application is through to the non-fogging area of the glass original plate pasting protective film, and the zinc plating layer is formed to the fogging area of the glass original plate by carrying out zinc plating treatment, again the protective film of the non-fogging area is torn film processing, the laser window processing and glass fogging treatment are carried out to the zinc plating layer of the glass original plate, and then the liquid-throwing etching treatment is carried out to the glass original plate, to form the fogging pattern in the fogging area of the glass original plate, the glass original plate is processed, and the target glass is generated, through the above scheme, the microtopography of the fogging area is accurately controlled, the uniformity is ensured, not only the uniformity and controllability of the glass surface fogging effect can be realized, but also the product appearance consistency and touch feeling are improved.

Description

Technical Field

[0001] This invention relates to the field of electronic product manufacturing technology, specifically to a glass etching method. Background Technology

[0002] Currently, in the processing technology of creating a matte effect on glass surfaces, the common technique is to use abrasive media such as silica, and employ dry spraying or wet spraying to subject the glass surface to high-speed impact, creating numerous pitted scratches on the glass surface. Subsequently, chemical etching is performed on the microscopic scratch areas, thereby forming an uneven structure on the glass surface to achieve a matte effect.

[0003] However, this type of sandblasting process has significant technical limitations in practical applications. On one hand, the abrasive particles used in sandblasting are difficult to maintain perfect uniformity in terms of particle size, shape, and hardness. Inherent differences exist between different particles, resulting in larger and deeper impact craters formed by larger particles when impacting the glass surface at high speed, while smaller particles form smaller and shallower craters. This microstructural difference caused by the inhomogeneity of the abrasive particles ultimately leads to an uneven matte finish on the glass surface, directly affecting the product's appearance consistency and tactile feel. Specifically, the gloss difference between different areas of the entire glass sheet can reach over 0.6 GU, and the surface roughness Sa can reach 0.1 μm. This regional difference is particularly prominent in applications where high uniformity of appearance is crucial, such as high-end electronic device cover plates and automotive display panels. On the other hand, because the abrasive particles are mostly irregular spherical or near-spherical, the microscopic morphology of the indentations formed after impacting the glass is basically limited to circular or near-circular shapes, making it difficult to achieve a uniform microscopic morphology for other regular shapes such as polygons, linear structures, or specific textures. The aforementioned defects result in significant deficiencies in the controllability, consistency, and uniformity of microstructure of existing sandblasting combined with etching atomization processes, making it difficult to meet the increasingly demanding requirements for surface treatment precision in high-quality glass products. Summary of the Invention

[0004] In view of the above problems, embodiments of the present invention provide a glass etching method to solve the problem that the existing atomization process of sandblasting combined with etching has obvious deficiencies in terms of controllability, consistency and appearance uniformity of microstructure.

[0005] According to one aspect of the present invention, a glass etching method is provided, the method comprising: S1, a glass substrate is provided, and a first gloss measurement is performed on the glass substrate to obtain first gloss data, and the glass substrate is subjected to sensitization treatment and activation treatment; S2, apply a protective film to the non-fogging area of ​​the glass substrate, and perform zinc plating on the fogging area of ​​the glass substrate to form a zinc plating layer, and then peel off the protective film on the non-fogging area. S3, according to the first gloss data, the zinc plating layer of the glass substrate is subjected to laser windowing and glass atomization treatment, and then the glass substrate is subjected to liquid polishing etching treatment according to the first gloss data, so as to form atomization pattern in the atomization area of ​​the glass substrate. S4, remove the zinc plating layer from the glass substrate, measure the gloss of the glass substrate to obtain the measurement result, and adjust the gloss according to the measurement result; S5, perform post-processing on the glass substrate to generate the target glass.

[0006] In some embodiments, the sensitization process in step S1 includes: The glass plate is immersed in a sensitization solution at room temperature for 1 min to 3 min, wherein the sensitization solution comprises 10 g / L - 20 g / L SnCl2·2H2O and 20 mL / L - 40 mL / L HCl; The glass substrate is quickly cleaned using deionized water.

[0007] In some embodiments, the activation process in step S1 includes: The original glass plate is immersed in an activation solution at room temperature for 0.5 min to 1 min, wherein the activation solution comprises 0.1 g / L–0.5 g / L of PdCl2 and 5 mL / L–10 mL / L of HCl; The glass substrate is quickly washed with deionized water and then dried at a temperature of 50℃-70℃ for 1-3 minutes.

[0008] In some embodiments, step S1 further includes the following steps before sensitizing and activating the glass substrate: Immerse the glass plate in a 4%-6% NaOH solution at a temperature of 50℃-70℃ for 5-10 minutes, and then wash the glass plate with deionized water. Immerse the glass plate in a 4%-6% HCl solution at room temperature for 3-5 minutes, and then rinse the glass plate with deionized water. Immerse the glass plate in anhydrous ethanol or anhydrous acetone solution at room temperature for 12-14 minutes, then dry the glass plate at 80-100℃ for 12-14 minutes.

[0009] In some embodiments, in step S2, the atomized area of ​​the glass substrate is galvanized to form a zinc plating layer, specifically including: The glass substrate is placed in a zinc plating solution and electroplated under set conditions. The zinc plating solution includes 20 g / L zinc oxide, 100 g / L sodium hydroxide, 30 g / L potassium sodium tartrate, and 3 g / L-5 g / L dimethylaminoborane. The set electroplating conditions are any one or more of the following: pH value of 12.5-13.5, electroplating temperature of 40℃-50℃, and electroplating time of 10 min-30 min. The glass substrate is quickly cleaned using deionized water.

[0010] In some embodiments, in step S3, the zinc plating layer of the original glass plate is subjected to laser windowing and glass frosting treatment based on the first gloss data, specifically including: Based on the first gloss data, query the preset laser parameter mapping table to obtain the target laser data; Based on the preset atomized image, a laser device is used to laser-open the galvanized layer of the glass substrate with the target laser data, and a concave dot is made on the surface of the glass substrate. The laser parameter mapping table is as follows: Target laser data = Basic laser data + (First gloss data - First basic gloss data) * First parameter, where the basic laser data, first basic gloss data, and first parameter are preset values.

[0011] In some embodiments, step S3 involves liquid polishing and etching the glass substrate based on the first gloss data, specifically including: Based on the first gloss data, query the preset etching parameter mapping table to obtain the target etching concentration data and the target etching environment data; The etching solution, based on the target etching concentration data, etches the concave points of the glass substrate in the target etching environment data to form a fogging pattern in the fogging area of ​​the glass substrate. The etching parameter mapping table includes an etching concentration mapping table and an etching environment mapping table. The etching concentration mapping table is: Target etching concentration data = Base etching concentration data + (First gloss data - Second base gloss data) * Second parameter. The etching environment mapping table is: Target etching environment data = Base etching environment data + (First gloss data - Third base gloss data) * Third parameter. The base etching concentration data, second base gloss data, second parameter, base etching environment data, third base gloss data, and third parameter are all preset values.

[0012] In some embodiments, removing the zinc plating layer from the original glass plate in step S4 specifically includes: The zinc coating on the original glass plate is removed by immersing it in a 20%-33.3% hydrochloric acid solution at a temperature of 25℃-30℃ for 0.5min-10min.

[0013] In some embodiments, in step S4, a second gloss measurement is performed on the glass substrate to obtain second gloss data, and gloss adjustment is performed based on the second gloss data, specifically including: The gloss of the atomized area of ​​the glass substrate is measured to obtain the measurement result, and it is determined whether the measurement result reaches the set threshold. If so, proceed with the next step; Otherwise, based on the second gloss data, the gloss of the original glass plate is adjusted by re-polishing with an alkaline solution, and the gloss is re-inspected. Specifically, adjusting the gloss of the glass substrate by repolishing with an alkaline solution based on the second gloss data includes: querying a preset repolishing mapping table based on the second gloss data and preset target gloss data to obtain the target repolishing time; and adjusting the gloss of the glass substrate by applying an alkaline solution within the target repolishing time.

[0014] In some embodiments, step S5 involves post-processing the glass substrate to generate the target glass, specifically including: S51, The outline of the glass plate is processed by CNC equipment; S52, the glass substrate is hardened by potassium nitrate; S53, ink is applied to the reverse side of the atomized area of ​​the original glass plate to create the target glass.

[0015] The glass etching method of the present invention has the following advantages: The present invention involves sensitizing and activating the glass substrate; applying a protective film to the non-fogging area of ​​the glass substrate, and galvanizing the fogged area of ​​the glass substrate to form a zinc plating layer; then peeling off the protective film from the non-fogging area; performing laser windowing and glass fogging treatment on the zinc plating layer of the glass substrate; then performing liquid polishing etching on the glass substrate to form a fogging pattern in the fogged area; removing the zinc plating layer of the glass substrate; measuring the gloss of the glass substrate and adjusting the gloss based on the measurement results; and finally performing post-processing on the glass substrate to generate the target glass. Through the above scheme, the present invention precisely controls the microstructure of the fogged area, ensuring uniformity. This not only achieves uniformity and controllability of the fogging effect on the glass surface but also improves the consistency of the product's appearance and tactile feel.

[0016] The above description is merely an overview of the technical solutions of the embodiments of the present invention. In order to better understand the technical means of the embodiments of the present invention and to implement them in accordance with the contents of the specification, and to make the above and other objects, features and advantages of the embodiments of the present invention more apparent and understandable, specific embodiments of the present invention are described below. Attached Figure Description

[0017] The accompanying drawings are for illustrative purposes only and are not intended to limit the invention. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings: Figure 1 A schematic flowchart of the glass etching method of Embodiment 1 provided by the present invention is shown; Figure 2 A detailed schematic diagram of step S5 of Embodiment 1 provided by the present invention is shown; Figure 3 A schematic diagram of the glass structure change in the glass etching method of Embodiment 1 provided by the present invention is shown. Detailed Implementation

[0018] Exemplary embodiments of the invention will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention can be implemented in various forms and should not be limited to the embodiments set forth herein.

[0019] Example 1: Figure 1 A first embodiment of a glass etching method is shown, which addresses the significant shortcomings of existing atomization processes combining sandblasting and etching in terms of controllability, consistency, and uniformity of microstructure. This method specifically includes the following steps: S1. A glass substrate is provided. A first gloss measurement is performed on the glass substrate to obtain first gloss data. The glass substrate is then sensitized and activated. In step S1, the glass substrate can be obtained directly from a supplier or can be a glass substrate that has undergone preliminary cutting, grinding, or other mechanical processing. The first gloss measurement is then performed on the glass substrate to obtain first gloss data. During the sensitization treatment of the glass substrate, various chemical reagents can be used for surface activation. For example, immersion in an acidic solution containing a specific metal salt can form a thin film on the glass surface to improve its adsorption capacity for subsequent activators. The subsequent activation treatment can use a solution containing a noble metal salt, for example, immersion in a solution containing palladium salt, to form catalytic active centers on the glass surface, providing nucleation sites for subsequent coating deposition. The purpose of these treatments is to ensure that the glass surface has coating adhesion.

[0020] S2, a protective film is applied to the non-fogging areas of the glass substrate, and the fogged areas of the glass substrate are galvanized to form a zinc plating layer. The protective film on the non-fogging areas is then peeled off. In step S2, before galvanizing, the non-fogging areas of the glass substrate need to be protected. This can be achieved by applying a corrosion-resistant protective film, which effectively isolates the non-fogging areas and prevents them from being affected during subsequent processing. Subsequently, the fogged areas of the glass substrate are galvanized to form a zinc plating layer. Galvanizing can be performed by electroplating, immersing the glass substrate in an electroplating solution containing zinc ions, and applying an electric current to deposit zinc metal onto the glass surface. After galvanizing, the protective film on the non-fogging areas is peeled off, exposing the zinc plating layer and the ungalvanized glass surface.

[0021] S3, based on the first gloss data, the galvanized layer of the glass substrate undergoes laser windowing and glass atomization treatment. Then, based on the first gloss data, the glass substrate undergoes liquid polishing etching to form atomized patterns in the atomized areas. In step S3, after the galvanized layer is formed, a preset laser parameter mapping table is consulted based on the first gloss data to obtain target laser data; laser windowing is then performed using the target laser data. This treatment utilizes a high-energy laser to locally ablate or vaporize the galvanized layer, thereby forming precise openings on the galvanized layer and exposing the underlying glass surface. The shape and distribution of these openings can be designed according to a preset pattern. Subsequently, the glass substrate undergoes glass atomization treatment, which may include preliminary physical or chemical modification of the exposed glass surface to enhance the effect of subsequent etching. Further, based on the first gloss data, a preset etching parameter mapping table is consulted to obtain target etching concentration data and target etching environment data. The etching solution based on the target etching concentration data is used to etch the recesses of the glass substrate within the target etching environment data. This etching process can use a solution containing etchants such as hydrofluoric acid or sodium hydroxide to selectively corrode the exposed glass surface through a chemical reaction, thereby forming a micro-uneven structure in the atomized area of ​​the original glass plate.

[0022] S4: Remove the zinc plating layer from the original glass plate and perform a second gloss measurement to obtain second gloss data. Adjust the gloss based on the second gloss data. In step S4, after the atomized pattern is formed, the residual zinc plating layer on the original glass plate needs to be removed. This removal process can be carried out using a chemical stripping method, for example, immersing the original glass plate in an acidic or alkaline solution that can dissolve zinc but does not corrode the glass, so that the zinc plating layer completely peels off. After the zinc plating layer is removed, the gloss of the atomized area of ​​the original glass plate is measured. The gloss measurement can be performed using a gloss meter to obtain the intensity data of the light reflected from the glass surface. Based on the measurement results, the gloss of the original glass plate can be adjusted. For example, if the gloss does not meet the requirements, the surface morphology can be corrected by additional polishing or light etching to achieve the expected gloss standard.

[0023] S5, Post-processing of the glass substrate to generate the target glass. In step S5, after etching and gloss adjustment, a series of post-processing steps are performed on the glass substrate to generate the target glass product. These post-processing steps may include machining the glass substrate such as edge trimming and chamfering to ensure its dimensional accuracy and edge quality. In addition, surface strengthening treatments may be applied to the glass substrate, for example, by using ion exchange to improve the surface hardness and scratch resistance of the glass. Finally, according to product design requirements, the glass substrate may be cleaned, inspected, and packaged to obtain the target glass that meets the standards.

[0024] In steps S1-S5, the glass substrate refers to a glass substrate that has not undergone any surface treatment or has only undergone basic cleaning treatment, and it serves as the carrier for subsequent etching processes.

[0025] Sensitization treatment refers to the pretreatment of the surface of the glass substrate with a chemical solution to form a microstructure with catalytic activity on the surface, thereby enhancing the effect of subsequent activation treatment.

[0026] Activation treatment refers to the process of using a chemical solution to create active centers on the surface of the glass substrate, which can adsorb metal ions, based on sensitization treatment, thus providing a bonding basis for subsequent zinc plating.

[0027] A zinc plating layer is a zinc metal layer deposited in a specific area of ​​the glass substrate by electroplating or other methods. This layer serves as a protective layer or mask layer in subsequent laser windowing and etching processes.

[0028] Laser windowing refers to the use of laser equipment to precisely remove the galvanized layer in a localized area, thereby exposing the surface of the original glass plate and forming a pre-set pattern area.

[0029] Glass frosting treatment refers to the process of creating a microscopic uneven structure on the surface of the original glass plate through a series of physical or chemical means to achieve light scattering and thus produce a uniform frosted effect.

[0030] Liquid etching refers to the process of using a chemical etching solution to corrode the surface of a glass substrate, thereby creating a recessed structure with a specific depth and morphology within the area formed by laser windowing, and ultimately forming a fogged pattern.

[0031] A frosted pattern refers to a region with a specific shape, distribution, and micro-roughness formed on the surface of a glass plate. It can cause diffuse reflection of incident light, thus presenting a uniform frosted visual effect.

[0032] Gloss adjustment refers to measuring the intensity of light reflected from the surface of the glass substrate and correcting the surface treatment parameters of the glass substrate based on the measurement results, so that the gloss of the final product meets the preset standard.

[0033] See Figure 3 10 represents the original glass sheet; 11 represents the protective film; 12 represents the galvanized layer; and 13 represents the atomized pattern. The original glass sheet is processed sequentially through steps S1-S5 to produce the target glass. This invention achieves precise control over the atomized pattern on the glass surface. This method effectively avoids the problem of uneven atomization caused by uneven media in traditional sandblasting processes, thus obtaining a glass surface with high consistency, uniform gloss, and controllable microstructure. Therefore, this method can meet the requirements of applications with high requirements for appearance uniformity, tactile feel, and surface treatment precision.

[0034] Example 2: Based on Example 1, the present invention provides a second embodiment of a glass etching method to further illustrate the glass etching method.

[0035] In some embodiments, in step S1, the sensitization treatment includes: immersing the glass substrate in a sensitization solution at room temperature for 1 min to 3 min, wherein the sensitization solution includes 10 g / L - 20 g / L SnCl2·2 H2O and 20 mL / L - 40 mL / L HCl; and rapidly rinsing the glass substrate with deionized water.

[0036] In this embodiment, the glass is immersed at room temperature for 1–3 minutes in SnCl₂·2H₂O at a concentration of 10 g / L–20 g / L and HCl at a concentration of 20–40 mL / L. This allows the Sn²⁺ to... + It undergoes dehydration condensation with Si-OH on the glass surface to form Si-O-Sn chemical bonds; Chemical formula: Si – OH + Sn² + ----->Si – O - Sn² + + H +Then rinse quickly with deionized water, leaving no residue. The SnCl₂·2H₂O content can be any value among 10 g / L, 15 g / L, and 20 g / L. The HCl content can be any value among 20 mL / L, 30 mL / L, and 40 mL / L. Room temperature refers to 20℃-30℃. Immersion in the sensitization solution at room temperature can be for any time among 1 min, 2 min, and 3 min.

[0037] The above technical solution enables precise control of process parameters for the sensitization treatment of the glass substrate. Specifically, by immersing the glass substrate in a sensitization solution of a specific concentration (containing SnCl2·2H2O and HCl) at room temperature and strictly controlling the immersion time, a uniform, dense, and highly active sensitized layer is formed on the surface of the glass substrate. This precisely controlled sensitization treatment effectively solves the problems of uneven sensitized layer, poor adhesion, or introduction of impurities that may occur in traditional sensitization treatments. Subsequently, rapid rinsing with deionized water further ensures the cleanliness of the glass surface and avoids interference from residues in subsequent activation and zinc plating processes. Therefore, this solution can significantly improve the adhesion between the subsequent zinc plating layer and the glass substrate, enhance the uniformity and stability of the coating, and lay a solid foundation for subsequent laser windowing, glass atomization treatment, and liquid polishing etching, thereby improving the quality of the final atomized pattern and the overall product yield.

[0038] In some embodiments, step S1, the activation treatment includes: immersing the glass substrate in an activation solution at room temperature for 0.5 min to 1 min, wherein the activation solution comprises 0.1 g / L–0.5 g / L PdCl2 and 5 mL / L–10 mL / L HCl; rapidly washing the glass substrate with deionized water; and drying the glass substrate at a temperature of 50℃–70℃ for 1 min to 3 min. The PdCl2 content can be any value of 0.1 g / L, 0.3 g / L, or 0.5 g / L. The HCl content can be any value of 5 mL / L, 8 mL / L, or 10 mL / L. The immersion in the activation solution at room temperature can be any time of 0.5 min, 0.8 min, or 1 min.

[0039] In this embodiment, Sn²⁺ is soluble in 0.1–0.5 g / L PdCl₂ and 5–10 mL / L concentrated HCl at room temperature for 30 seconds–1 minute to induce oxidative damage. + Reduction of Pd² + It becomes a seed crystal for Pd metal. Chemical formula: Si – O – Sn² + + Pd² + = Si – O – Sn 4+ +Pd 0Rinse thoroughly with deionized water and then lightly dry at 60°C for 1-3 minutes.

[0040] The above technical solution enables precise control of the activation process of the glass substrate. Specifically, by immersing the glass substrate in an activation solution with optimized concentrations of PdCl2 and HCl, the formation of catalytically active nuclei on the glass surface is ensured to be uniform and efficient, providing an ideal adhesion base for the subsequent zinc plating layer. Precise immersion time of 0.5-1 minute at room temperature avoids under- or over-activation. Furthermore, a rapid deionized water rinsing step after activation effectively removes residual chemicals from the surface, preventing contamination of the subsequent zinc plating process. Further, the glass substrate is dried at 50-70℃ for 1-3 minutes, ensuring the glass surface is completely dry and free of water stains before entering the zinc plating process. This significantly improves the uniformity and adhesion of the zinc plating layer, laying a solid foundation for high-quality atomized patterns in subsequent laser windowing and liquid polishing etching, effectively solving the problems of coating defects and unstable etching effects caused by improper activation treatment.

[0041] In some embodiments, step S1 further includes the following steps before sensitizing and activating the glass substrate: Immerse the glass plate in a 4%-6% NaOH solution at a temperature of 50℃-70℃ for 5-10 minutes, and then rinse the glass plate with deionized water. The NaOH solution can be any concentration of 4%, 5%, or 6%, the temperature can be any value of 50℃, 60℃, or 70℃, and the immersion time can be any time of 5 minutes, 8 minutes, or 10 minutes.

[0042] Immerse the glass plate in a 4%-6% HCl solution at room temperature for 3-5 minutes, then rinse the glass plate with deionized water. The HCl concentration can be any value among 4 mL / L, 5 mL / L, and 6 mL / L.

[0043] Immerse the glass plate in anhydrous ethanol or anhydrous acetone solution at room temperature for 12-14 minutes, then dry the glass plate at 80-100℃ for 12-14 minutes.

[0044] In this embodiment, the sample is first soaked in 5% NaOH at 60°C for 5-10 minutes, then rinsed with deionized water. Next, it is soaked in 5% HCl at room temperature for 3-5 minutes, then rinsed with deionized water. Finally, it is soaked in anhydrous ethanol / acetone at room temperature for 10 minutes, and then dried at 100°C for 10 minutes.

[0045] Through the above technical solution, before sensitizing and activating the glass substrate, a multi-stage cleaning and drying pretreatment effectively removes oil, dust, oxide layers, and other organic or inorganic impurities from the glass substrate surface. Specifically, NaOH solution cleaning removes most organic contaminants and some inorganic impurities, HCl solution cleaning further neutralizes alkaline residues and dissolves metal oxides, while anhydrous ethanol or anhydrous acetone solution cleaning combined with high-temperature drying thoroughly removes moisture and trace organic matter, ensuring a highly clean and dry glass surface. This thorough pretreatment provides an ideal substrate for the uniform adsorption and reaction of subsequent sensitizers and activators on the glass surface, significantly improving the efficiency and uniformity of sensitization and activation treatments. Therefore, it ensures stronger and more uniform adhesion of the subsequent zinc plating layer, laying a solid foundation for subsequent laser windowing, glass atomization, and liquid polishing etching processes. Ultimately, this results in more precise and uniform atomization pattern formation, effectively improving product yield and ensuring the overall quality and appearance consistency of the target glass.

[0046] Example 3: Based on Embodiment 1 or Embodiment 2, the present invention provides a third embodiment of a glass etching method to further illustrate the glass etching method.

[0047] In some embodiments, in step S2, the atomized area of ​​the glass substrate is galvanized to form a zinc layer. Specifically, this includes: immersing the glass substrate in a zinc plating solution and performing electroplating under set electroplating conditions, wherein the zinc plating solution includes 20 g / L zinc oxide, 100 g / L sodium hydroxide, 30 g / L potassium sodium tartrate, and 3 g / L-5 g / L dimethylaminoborane; and rapidly washing the glass substrate with deionized water. The set electroplating conditions are any one or more of the following: a pH value of 12.5–13.5, an electroplating temperature of 40°C–50°C, and an electroplating time of 10 min–30 min.

[0048] In this embodiment, a protective film is first applied to a layer that does not require chemical plating. The film material must be resistant to strong alkalis, with adhesion degradation of less than 20% after 1 hour in a pH 13.5 solution, and edge erosion width less than 1 mm. The film material must be free of adhesive residue. The film application must be smooth and gap-free. After application, pressing is required to prevent loosening during the plating process.

[0049] Secondly, dimethylaminoborane (DMAB) is used as a reducing agent to generate a large amount of excess electrons in the coating, promoting the transfer of Zn from the anolyte zinc plate to the glass workpiece surface. The zinc plating solution consists of 20 g / L zinc oxide, 100 g / L sodium hydroxide, 30 g / L potassium sodium tartrate, and 3 g / L-5 g / L dimethylaminoborane; electroplating is carried out at a pH of 12.5–13.5, a temperature of 40℃–50℃, and a time of 10 min–30 min, with the coating thickness controlled according to the concentration and time.

[0050] Finally, the protective film is removed to expose the reverse side of the coating. This prevents the bottom film from affecting the accuracy of the laser path when the laser is used to create a window on the zinc layer on the upper surface of the glass. It also avoids accidentally damaging the film and generating dust or fumes.

[0051] Specifically, the composition of the zinc plating solution is carefully designed. Zinc oxide, as the primary zinc source, is at a concentration of 20 g / L, ensuring a sufficient supply of zinc ions to form the desired coating thickness. Sodium hydroxide, at a concentration of 100 g / L, maintains the strongly alkaline environment of the solution, stably complexing zinc ions into zincate form and promoting their uniform deposition on the glass substrate surface. Potassium sodium tartrate, as a complexing agent, is at a concentration of 30 g / L, further stabilizing zinc ions and preventing their hydrolysis and precipitation during electroplating. It also helps refine the coating grains, improving the density and adhesion of the coating. Dimethylaminoborane, at a concentration of 3 g / L - 5 g / L, acts as a reducing agent or special additive, promoting the reduction deposition of zinc and positively impacting the microstructure and properties of the coating, such as improving its brightness and uniformity. The electroplating process is carried out under strictly controlled conditions. Maintaining the pH value within a strongly alkaline range of 12.5–13.5 is crucial for the stability of the zincate system and the effective deposition of zinc, while also effectively suppressing hydrogen evolution and reducing coating defects. Temperature control at 40℃–50℃ ensures a balance between ion diffusion rate and electrochemical reactivity, guaranteeing coating deposition efficiency while avoiding solution instability or a rough coating due to excessively high temperatures. The electroplating time is 10-30 minutes, precisely adjustable according to the required zinc coating thickness to meet the coating protection requirements of subsequent laser windowing and etching processes. After electroplating, the glass substrate is rapidly rinsed with deionized water to thoroughly remove residual zinc plating solution and byproducts from the glass surface, preventing contamination or corrosion of subsequent processes and ensuring coating purity and smooth processing.

[0052] By precisely controlling the composition of the zinc plating solution, including the specific ratio of zinc oxide, sodium hydroxide, potassium sodium tartrate, and dimethylaminoborane, and strictly controlling the pH value, temperature, and time during the electroplating process, a uniform, dense, and strongly adherent zinc plating layer can be formed in the atomized area of ​​the glass substrate. This high-quality zinc plating layer provides a stable foundation for subsequent laser windowing, effectively preventing damage to non-target areas during laser processing and ensuring precise protection of the glass substrate during liquid polishing etching, thereby significantly improving the accuracy of the atomized pattern formation and the overall yield. Furthermore, the rapid deionized water rinsing step after electroplating effectively removes residual chemicals from the surface, avoiding potential contamination of subsequent processes and further guaranteeing the quality of the final target glass.

[0053] In some embodiments, step S3 involves performing laser windowing and glass atomization on the galvanized layer of the glass substrate based on the first gloss data. Specifically, this includes: querying a preset laser parameter mapping table based on the first gloss data to obtain target laser data; performing laser windowing on the galvanized layer of the glass substrate using the target laser data through a laser device based on a preset atomization image, and creating concave dots on the surface of the glass substrate; wherein the laser parameter mapping table is: target laser data = basic laser data + (first gloss data - first basic gloss data) * first parameter, and the basic laser data, first basic gloss data, and first parameter are preset values.

[0054] In this embodiment, the basic laser data, the first basic gloss data, and the first parameter can be set based on historical data or manually assigned to ensure that the laser windowing achieves the preset effect. The target laser data can be obtained by calculating the basic laser data + (first gloss data - first basic gloss data) * the first parameter. By applying differentiated processing to the glass substrate based on different gloss data, this invention can make glass atomization more efficient and accurate, greatly reducing the occurrence of rough, irregular, or even defective atomized surfaces.

[0055] A custom laser pattern is used to laser-etch and atomize the zinc plating layer by controlling the laser energy. Windows are created in the areas to be etched, and the laser energy is controlled to form tiny pits on the glass surface, allowing the etching solution to penetrate and etch the corresponding areas, resulting in a dense and uniform surface with fine micro-dimples. The pattern is designed using a laser pattern programming program based on the micro-dimples to be etched. The atomized pattern can be small dots, small squares, hexagons, pentagons, etc. The spacing of the pattern array is customized, and the pattern and total area volume ratio are set. The total area to be etched / product surface area = volume ratio, which has a significant impact on the final gloss, roughness, etc. The laser energy is controlled to etch and remove the plating, ensuring complete removal of the plating from the processed area. Simultaneously, a certain degree of laser etching is also performed on the glass surface to enrich its 3D morphology.

[0056] Specifically, the preset atomization image refers to digital image data generated or imported using computer-aided design (CAD) software. This image precisely defines the shape, size, position, and possible atomization density or depth of the final atomization pattern. This preset atomization image serves as the processing instruction for the laser equipment, ensuring the accuracy and consistency of subsequent processing. Laser windowing of the galvanized layer of the glass substrate involves using a high-energy laser beam, such as a nanosecond or picosecond laser, to precisely ablate or vaporize specific areas on the galvanized layer, thereby exposing the underlying glass substrate surface. The laser equipment offers extremely high processing precision and flexibility, allowing the formation of openings of arbitrary shapes and sizes on the galvanized layer according to the requirements of the preset atomization image. Simultaneously, by precisely controlling parameters such as laser power, scanning speed, and focal point position, the quality and efficiency of the windowing are ensured. Creating concave dots on the surface of the glass substrate involves the laser equipment further acting on these exposed areas after laser windowing, precisely controlling the laser energy and action time to form tiny concave dots on the surface of the glass substrate. These pits form the basis for the subsequent liquid polishing etching to create the atomized pattern. Their depth, density, and distribution directly affect the optical effect and tactile feel of the final atomized pattern. For example, by adjusting the laser energy density and pulse count, pits of different depths and shapes can be created, thus providing different starting conditions for subsequent etching to achieve the desired atomization effect. These pits can be irregularly distributed micro-pits or microstructures arranged in a specific array.

[0057] The above technical solution, before liquid polishing etching of the glass substrate, utilizes laser equipment to precisely laser-open windows in the galvanized layer based on a preset atomization image, and directly creates recesses on the surface of the glass substrate. This effectively solves the problems of insufficient pattern precision and difficulty in controlling the atomization effect in traditional methods. The high-precision processing capability of the laser equipment ensures a high degree of consistency between the windowed area and the preset atomization image, avoiding pattern distortion caused by inaccurate windowing. Simultaneously, creating recesses directly on the glass substrate using laser provides a uniform and controllable starting point for subsequent liquid polishing etching, allowing the etching solution to act more precisely on the target area, thereby forming a pattern with good uniformity, clear outline, and the desired atomization effect. This method not only improves the fineness and aesthetics of the atomized pattern but also provides a reliable technical guarantee for achieving complex or high-requirement atomization effects, significantly enhancing the quality and added value of glass etching products.

[0058] In some embodiments, step S3, performing liquid polishing etching on the glass substrate based on the first gloss data, specifically includes: querying a preset etching parameter mapping table based on the first gloss data to obtain target etching concentration data and target etching environment data; etching the concave points of the glass substrate using an etching solution based on the target etching concentration data in the target etching environment data to form a fogging pattern in the fogging area of ​​the glass substrate; wherein, the etching parameter mapping table includes an etching concentration mapping table and an etching environment mapping table, the etching concentration mapping table being: target etching concentration data = basic etching concentration data + (first gloss data - second basic gloss data) * second parameter, and the etching environment mapping table being: target etching environment data = basic etching environment data + (first gloss data - third basic gloss data) * third parameter, wherein the basic etching concentration data, second basic gloss data, second parameter, basic etching environment data, third basic gloss data, and third parameter are all preset values.

[0059] In this embodiment, the basic etching concentration data, second basic gloss data, second parameter, basic etching environment data, third basic gloss data, and third parameter can be set based on historical data or manually assigned to ensure that laser windowing achieves the preset effect. The target etching concentration data can be calculated by adding (first gloss data - second basic gloss data) to the second parameter. The target etching environment data can also be calculated by adding (first gloss data - third basic gloss data) to the third parameter. This invention differentiates the treatment of the glass substrate based on different gloss data, making glass atomization more efficient and accurate, greatly reducing roughness, irregularities, and even defective products on the atomized surface. The laser-etched components are then immersed in an alkaline NaOH solution for chemical polishing. The NaOH aqueous solution concentration is 35%-45%, and 0.5%-5% sodium gluconate can be added for cleaning to improve appearance yield. The etching chemical polishing time can be customized according to gloss and appearance requirements.

[0060] The above technical solution utilizes a specific etching solution, comprising 35%-45% NaOH and 0.5%-5% sodium gluconate, to perform liquid polishing etching on laser-generated recesses. This effectively addresses the shortcomings of traditional etching solutions in controlling etching uniformity and surface quality. The high concentration of NaOH ensures sufficient etching power, enabling rapid and effective corrosion of the glass recesses to form the desired atomized structure. Simultaneously, sodium gluconate, as a key additive, effectively complexes the etching products, preventing their redeposition on the glass surface. This ensures a stable etching process, avoiding problems such as uneven localized corrosion and excessive surface roughness. This synergistic effect results in a more uniform and delicate atomized pattern with excellent gloss, significantly improving the appearance quality and optical performance of the glass product.

[0061] In the example shown in Table 1, when the first gloss data changes, the target laser data is positively correlated with the first gloss data, the target etching concentration data, the target temperature environment, and the target time. Furthermore, by adjusting the target laser, the target etching concentration, and the target etching environment, glass materials with different first gloss data can be transformed into the same gloss data after atomization. The units for the first gloss data and the gloss after atomization and decoating are in gigabytes (GU).

[0062]

[0063] Table 1. Changes in target laser adjustment, target etching concentration adjustment, and target etching environment adjustment. In some embodiments, step S4, removing the zinc plating layer of the glass substrate, specifically includes immersing the glass substrate in a 20%-33.3% hydrochloric acid solution at a temperature of 25°C-30°C for 0.5 min-10 min to remove the zinc plating layer. The hydrochloric acid solution can be any concentration among 20%, 25%, 30%, and 33.3%.

[0064] In this embodiment, the zinc-plated protective layer is stripped. It is immersed in a 20%-33.3% hydrochloric acid (HCl) solution at room temperature (25-30 degrees Celsius) for 30 seconds to 10 minutes, depending on the designed thickness of the coating.

[0065] Specifically, hydrochloric acid solution, as a strong acid, can effectively dissolve the zinc plating layer. A concentration range of 20%-33.3% is chosen to ensure sufficient dissolving power for the zinc plating layer while avoiding excessive corrosion of the glass substrate and existing fogging patterns. Lower concentrations may result in low removal efficiency, while excessively high concentrations may increase the risk of glass corrosion. The immersion temperature is controlled between 25℃ and 30℃, which typically refers to room temperature or slightly above room temperature. Immersion treatment at this temperature ensures a moderate rate of chemical reaction, effectively removing the zinc plating layer while avoiding excessively vigorous reactions due to high temperatures, which could make it difficult to control the etching depth and uniformity, reducing potential damage to the original glass substrate. Immersion time is a key parameter affecting the zinc plating layer removal effect. A time range of 0.5 to 10 minutes is set, allowing for flexible adjustment based on factors such as the thickness of the zinc plating layer, the actual concentration of the hydrochloric acid solution, and the ambient temperature. This ensures complete removal of the zinc plating layer while avoiding unnecessary prolonged immersion that could damage the glass surface or alter the fogging pattern.

[0066] By employing the aforementioned technical solution, using a hydrochloric acid solution within a specific concentration range, and treating the glass substrate with precisely controlled temperature and immersion time, efficient and uniform removal of the zinc plating layer can be achieved. This precisely controlled removal method effectively avoids the problems of incomplete zinc plating removal or excessive corrosion, ensuring the integrity of the formed atomized pattern and preserving the surface quality of the glass substrate. This not only improves the yield rate of glass etching products but also provides a high-quality substrate for subsequent gloss measurement and adjustment, as well as final post-processing steps, thereby guaranteeing the overall performance and aesthetics of the target glass.

[0067] In some embodiments, in step S4, a second gloss measurement is performed on the glass substrate to obtain second gloss data, and gloss adjustment is performed based on the second gloss data. Specifically, this includes: performing a second gloss measurement on the fogged area of ​​the glass substrate to obtain second gloss data, and determining whether the measurement result reaches a set threshold; if so, proceeding to the next step; otherwise, adjusting the gloss of the glass substrate by repolishing with an alkaline solution based on the second gloss data, and performing a gloss re-inspection. Specifically, adjusting the gloss of the glass substrate by repolishing with an alkaline solution based on the second gloss data includes: querying a preset repolishing mapping table based on the second gloss data to obtain the target repolishing time; and adjusting the gloss of the glass substrate with an alkaline solution within the target repolishing time.

[0068] Specifically, measuring the gloss of the atomized area of ​​the glass substrate involves using specialized equipment such as a gloss meter to emit light at a specific angle onto the atomized area and measure the intensity of the reflected light, thereby quantifying the surface gloss level. This measurement is typically performed at multiple points to ensure overall uniformity. The gloss of the atomized area is a crucial indicator for evaluating the appearance and feel of glass products, directly impacting user experience. Subsequently, it is determined whether the measurement result meets a set threshold. This threshold is a pre-defined acceptable gloss range used for automated or semi-automated judgment of the measurement results. This threshold is usually set based on product design requirements, industry standards, or customer needs, ensuring that only products meeting the standards proceed to subsequent processes. If the measurement result is within the set threshold range, it indicates that the gloss of the current glass substrate meets the requirements, and it can smoothly proceed to the subsequent S5 step, i.e., post-processing the glass substrate to generate the target glass. Otherwise, if the measurement result does not meet the set threshold, re-polishing with an alkaline solution is an effective correction method. Alkaline solution re-polishing refers to re-immersing or spraying the original glass plate in an alkaline etching solution for a slight secondary etching or polishing process. This process aims to fine-tune the surface morphology of the atomized areas to increase or decrease their gloss to achieve a preset acceptable range. For example, the etching amount can be precisely controlled by adjusting the concentration, temperature, and processing time of the alkaline solution. After re-polishing, a gloss re-inspection must be performed again to verify the adjustment effect and ensure that the final gloss of the original glass plate meets the requirements, forming a closed-loop quality control process.

[0069] The gloss of the glass substrate is adjusted using alkaline solution re-polishing based on the second gloss data. Specifically, this involves: querying a preset re-polishing mapping table based on the second gloss data and preset target gloss data to obtain the target re-polishing time; and adjusting the gloss of the glass substrate using alkaline solution within the target re-polishing time. As shown in Table 2, this invention, by differentiating the glass substrate according to different gloss data, can make glass atomization more efficient and accurate, greatly reducing roughness, irregularities, and even defective products on the atomized surface. The target re-polishing time is related to the second gloss data and the target gloss data. This invention can transform glass substrates with different second gloss data into those with the target gloss data after adjustment. The units for the second gloss data and the target gloss data are GU.

[0070]

[0071] Table 2. Adjustment and Changes in Target Return Time The above technical solution enables precise measurement and assessment of the gloss level in the atomized areas of the glass substrate after the zinc plating layer is removed. When the gloss level fails to meet the preset standard, a corrective mechanism involving alkaline solution re-polishing is promptly activated to adjust the gloss level of the glass substrate, and the adjustment effect is ensured through re-inspection. This feedback-based quality control process effectively avoids rejects due to unacceptable gloss levels, significantly improving product pass rate and consistency, ensuring that the final target glass meets design requirements, thereby enhancing production efficiency and product competitiveness.

[0072] In some embodiments, step S5 involves post-processing the glass substrate to generate the target glass, specifically including: S51 uses CNC equipment to process the outline of the glass plate; S52, hardening treatment of the glass substrate using potassium nitrate; S53, ink is applied to the reverse side of the atomized area of ​​the original glass plate to create the target glass.

[0073] In steps S51-S53, the glass substrate is contoured using CNC equipment. This refers to the precise cutting, drilling, milling, or edge grinding of the glass substrate using computer numerical control (CNC) controlled processing equipment. This equipment is typically equipped with high-hardness cutting tools (such as diamond tools) or laser cutting heads, enabling high-precision and high-efficiency shaping of the glass material according to preset digital program instructions. During processing, to prevent cracking due to thermal stress, a water-cooling system is often used for cooling, and the smoothness and dimensional accuracy of the processed edges are ensured to meet the shape and assembly requirements of the final product.

[0074] Hardening the glass substrate with potassium nitrate typically refers to a chemical tempering process. This involves immersing the glass substrate in a high-temperature molten potassium nitrate bath. Under high temperature, potassium ions (K+) in the potassium nitrate exchange ions with smaller sodium ions (Na+) on the glass surface. Because potassium ions have a larger radius than sodium ions, when they enter the glass surface and replace sodium ions, they form a compressive stress layer. This compressive stress layer significantly improves the surface hardness, bending strength, impact resistance, and scratch resistance of the glass, thereby enhancing the overall durability and safety of the glass product. Furthermore, potassium nitrate can be replaced with a potassium nitrate + sodium nitrate formula for hardening, creating a denser filling layer on the glass surface and further increasing its strength.

[0075] Decorating the reverse side of the atomized area of ​​the glass substrate with ink refers to applying ink materials with specific colors, patterns, or text to the back of the atomized area of ​​the glass substrate using printing techniques such as screen printing or inkjet printing. The ink can be UV-cured ink, high-temperature sintering ink, etc. Choosing a suitable ink requires considering its adhesion, weather resistance, and compatibility with the glass material. After printing, a curing process (such as UV curing or high-temperature baking) is usually required to ensure that the ink layer adheres firmly to the glass surface and has good abrasion resistance and chemical resistance. Decorating on the reverse side effectively protects the decorative layer from external wear and scratches, while utilizing the special optical effects of the atomized area to create a unique visual presentation for the decorative pattern.

[0076] Through the aforementioned technical solutions, CNC machining of the glass substrate ensures dimensional accuracy and edge quality, meeting the final product assembly requirements and avoiding errors and burrs that may arise from manual cutting or traditional machining. Hardening the glass substrate with potassium nitrate significantly improves its surface hardness and impact resistance, making the etched glass less prone to breakage or scratches during subsequent use, thus enhancing product durability and reliability. Printing decoration on the reverse side of the frosted area of ​​the glass substrate not only adds an aesthetically pleasing visual effect and personalized characteristics but also effectively prevents direct wear and tear on the decorative layer during daily use, maintaining the durability of the pattern. Furthermore, the combination of this decorative method and the frosted area creates unique light and shadow effects and a sense of visual depth. In summary, these post-processing steps transform the etched glass substrate from a semi-finished product into a functional, aesthetically pleasing, and durable target glass, greatly enhancing the product's added value and market competitiveness.

[0077] Numerous specific details are set forth in the specification provided herein. However, it will be understood that embodiments of the invention may be practiced without these specific details. Similarly, for the sake of brevity and to aid in understanding one or more aspects of the invention, in the description of exemplary embodiments of the invention above, various features of the embodiments are sometimes grouped together in a single embodiment, figure, or description thereof. The claims, which follow the detailed description, are hereby expressly incorporated into that detailed description, wherein each claim itself is a separate embodiment of the invention.

[0078] Those skilled in the art will understand that the modules in the device of the embodiment can be adaptively changed and placed in one or more devices different from that embodiment. Modules, units, or components in the embodiment can be combined into a single module, unit, or component, and further, they can be divided into multiple sub-modules, sub-units, or sub-components, except that at least some of such features and / or processes or units are mutually exclusive.

[0079] It should be noted that the above embodiments are illustrative of the invention and not restrictive, and that those skilled in the art can devise alternative embodiments without departing from the scope of the appended claims. In the claims, any reference signs placed between parentheses should not be construed as limiting the claims. The word "comprising" does not exclude the presence of elements or steps not listed in the claims. The word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements. The invention can be implemented by means of hardware comprising several different elements and by means of a suitably programmed computer. In the unit claims enumerating several systems, several of these systems may be embodied by the same item of hardware. The use of the words first, second, and third, etc., does not indicate any order. These words can be interpreted as names. The steps in the above embodiments, unless otherwise specified, should not be construed as limiting the order of execution.

Claims

1. A glass etching method, characterized in that, The method includes: S1, a glass substrate is provided, and a first gloss measurement is performed on the glass substrate to obtain first gloss data, and the glass substrate is subjected to sensitization treatment and activation treatment; S2, apply a protective film to the non-fogging area of ​​the glass substrate, and perform zinc plating on the fogging area of ​​the glass substrate to form a zinc plating layer, and then peel off the protective film on the non-fogging area. S3, according to the first gloss data, the zinc plating layer of the glass substrate is subjected to laser windowing and glass atomization treatment, and then the glass substrate is subjected to liquid polishing etching treatment according to the first gloss data, so as to form atomization pattern in the atomization area of ​​the glass substrate. S4, remove the zinc plating layer of the glass substrate, perform a second gloss measurement on the glass substrate to obtain second gloss data, and adjust the gloss based on the second gloss data; S5, perform post-processing on the glass substrate to generate the target glass.

2. The glass etching method according to claim 1, characterized in that, In step S1, the sensitization process includes: The glass plate is immersed in a sensitization solution at room temperature for 1 min to 3 min, wherein the sensitization solution comprises 10 g / L - 20 g / L SnCl2·2 H2O and 20 mL / L - 40 mL / L HCl; The glass substrate is quickly cleaned using deionized water.

3. The glass etching method according to claim 1, characterized in that, In step S1, the activation process includes: The original glass plate is immersed in an activation solution at room temperature for 0.5 min to 1 min, wherein the activation solution comprises 0.1 g / L–0.5 g / L of PdCl2 and 5 mL / L–10 mL / L of HCl; The glass substrate is quickly washed with deionized water and then dried at a temperature of 50℃-70℃ for 1-3 minutes.

4. The glass etching method according to claim 1, characterized in that, In step S1, before the sensitization and activation treatments are performed on the glass substrate, the following steps are also included: Immerse the glass plate in a 4%-6% NaOH solution at a temperature of 50℃-70℃ for 5-10 minutes, and then wash the glass plate with deionized water. Immerse the glass plate in a 4%-6% HCl solution at room temperature for 3-5 minutes, and then rinse the glass plate with deionized water. Immerse the glass plate in anhydrous ethanol or anhydrous acetone solution at room temperature for 12-14 minutes, then dry the glass plate at 80-100℃ for 12-14 minutes.

5. The glass etching method according to claim 1, characterized in that, In step S2, the atomized area of ​​the glass substrate is galvanized to form a zinc coating, specifically including: The glass substrate is placed in a zinc plating solution and electroplated under set conditions; wherein the zinc plating solution comprises 20 g / L zinc oxide, 100 g / L sodium hydroxide, 30 g / L potassium sodium tartrate and 3 g / L-5 g / L dimethylaminoborane, and the set electroplating conditions are any one or more of the following: pH value of 12.5-13.5, electroplating temperature of 40℃-50℃, and electroplating time of 10 min-30 min; The glass substrate is quickly cleaned using deionized water.

6. The glass etching method according to claim 1, characterized in that, In step S3, the zinc plating layer of the original glass plate is subjected to laser windowing and glass frosting treatment based on the first gloss data, specifically including: Based on the first gloss data, query the preset laser parameter mapping table to obtain the target laser data; Based on the preset atomized image, a laser device is used to laser-open the galvanized layer of the glass substrate with the target laser data, and a concave dot is made on the surface of the glass substrate. The laser parameter mapping table is as follows: Target laser data = Basic laser data + (First gloss data - First basic gloss data) * First parameter, where the basic laser data, first basic gloss data, and first parameter are preset values.

7. The glass etching method according to claim 6, characterized in that, In step S3, the glass substrate is subjected to liquid polishing etching based on the first gloss data, specifically including: Based on the first gloss data, query the preset etching parameter mapping table to obtain the target etching concentration data and the target etching environment data; The etching solution based on the target etching concentration data etches the concave points of the glass substrate in the target etching environment data to form an atomized pattern in the atomized area of ​​the glass substrate. The etching parameter mapping table includes an etching concentration mapping table and an etching environment mapping table. The etching concentration mapping table is: target etching concentration data = basic etching concentration data + (first gloss data - second basic gloss data) * second parameter. The etching environment mapping table is: target etching environment data = basic etching environment data + (first gloss data - third basic gloss data) * third parameter. The basic etching concentration data, second basic gloss data, second parameter, basic etching environment data, third basic gloss data, and third parameter are all preset values.

8. The glass etching method according to claim 1, characterized in that, In step S4, the zinc plating layer of the original glass plate is removed, specifically including: The zinc coating on the original glass plate is removed by immersing it in a 20%-33.3% hydrochloric acid solution at a temperature of 25℃-30℃ for 0.5min-10min.

9. The glass etching method according to claim 8, characterized in that, In step S4, a second gloss measurement is performed on the original glass plate to obtain second gloss data, and gloss adjustment is performed based on the second gloss data, specifically including: A second gloss measurement is performed on the atomized area of ​​the glass substrate to obtain second gloss data, and it is determined whether the second gloss data reaches a set threshold. If so, proceed with the next step; Otherwise, based on the second gloss data, the gloss of the original glass plate is adjusted by re-polishing with an alkaline solution, and the gloss is re-inspected. Specifically, adjusting the gloss of the glass substrate by repolishing with an alkaline solution based on the second gloss data includes: querying a preset repolishing mapping table based on the second gloss data and preset target gloss data to obtain the target repolishing time; and adjusting the gloss of the glass substrate by applying an alkaline solution within the target repolishing time.

10. The glass etching method according to claim 1, characterized in that, In step S5, the original glass plate undergoes post-processing to generate the target glass, specifically including: S51, The outline of the glass plate is processed by CNC equipment; S52, the glass substrate is hardened by potassium nitrate; S53, ink is applied to the reverse side of the atomized area of ​​the original glass plate to create the target glass.

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