Method of controlling a semiconductor process apparatus and semiconductor process apparatus

Abstract

The application provides a control method of a semiconductor process equipment and the semiconductor process equipment. The method comprises the following steps: obtaining a follow flag value of a process parameter of a current process step; obtaining an execution value of a process parameter of a previous process step based on the condition that the follow flag value of the process parameter of the current process step meets the condition of following the previous process step; taking the execution value of the process parameter of the previous process step as the execution value of the process parameter in the current process step; and running the current process step according to the execution value of the process parameter in the current process step. Therefore, the operation complexity of modifying the parameter value of the process parameter can be effectively reduced, the operation efficiency of the semiconductor process equipment is improved, the risk of introducing an incorrect parameter value when a person manually modifies the parameter value is avoided, and the process effect of the semiconductor process equipment is ensured.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a control method for semiconductor process equipment and semiconductor process equipment. Background Technology

[0002] For semiconductor process equipment such as oxidation equipment, the parameter value of the same process parameter usually needs to remain consistent in multiple consecutive process steps during the execution of the process. However, if the parameter value of the process parameter is manually modified in a certain process step, the parameter value of the process parameter needs to be modified in the execution of subsequent process steps to ensure the consistency of the parameter value of the process parameter in the execution of each process step.

[0003] In this process, modifying process parameters at any given step requires pausing the process, modifying the parameters, and then resuming the process. This is extremely complex and cannot guarantee the operational efficiency of the semiconductor equipment. Furthermore, manually modifying process parameters in subsequent steps carries the risk of inputting incorrect values, further compromising the effectiveness of the semiconductor process. Summary of the Invention

[0004] To address the aforementioned technical problems, this application provides a control method for semiconductor process equipment and semiconductor process equipment, thereby solving the problem that modifying process parameters during the execution of the process is complex and affects the operating efficiency and process effect of semiconductor process equipment in the prior art.

[0005] To achieve the above technical objectives, the embodiments of this application provide the following technical solutions: In a first aspect, embodiments of this specification provide a method for controlling semiconductor process equipment, the method comprising: Obtain the follow flag value of the process parameters for the current process step; Based on the fact that the follow flag value of the process parameter of the current process step meets the condition of following the previous process step, the execution value of the process parameter of the previous process step is obtained, and the execution value of the process parameter of the previous process step is used as the execution value of the process parameter in the current process step. The current process step is executed based on the execution values ​​of the process parameters in the current process step.

[0006] In one implementation, the current process step is the first process step of the called process formula, and the previous process step is the last process step before the main process formula calls the called process formula. Alternatively, the current process step and the previous process step are two adjacent process steps in the main process formula. Alternatively, the current process step and the previous process step can be two adjacent process steps in the called process recipe.

[0007] In one implementation, it further includes: If the follow flag value of the process parameter in the current process step does not meet the condition of following the previous process step, the set value of the process parameter in the current process step is obtained, and the set value is determined as the execution value of the process parameter in the current process step.

[0008] In one implementation, it further includes: During the execution of the current process step, the modified value of the process parameter is used as the execution value of the process parameter in the current process step according to the editing operation of the process parameter.

[0009] In one implementation, it further includes: The user interface displays the process formula; The process formula includes a main process formula and a called process formula; the called process formula includes at least a fixed process formula; the safety level of the process parameters of the fixed process formula is higher than the safety level of the process parameters of other called process formulas and the main process formula, and the fixed process formula is not editable.

[0010] In one implementation, it further includes: After the current process step is completed, the data in the first data storage area is updated to the execution value of the process parameters of the current process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: The first target data is obtained from the first data storage area, and the first target data is stored in the second data storage area as the execution value of the process parameter in the current process step, so as to run the current process step according to the data in the second data storage area; the first target data includes the parameter values ​​of each process parameter in the current process step that meet the condition of following the previous process step.

[0011] In one implementation, each process step corresponds to an execution data storage area, which is used to store the execution values ​​of the process parameters of the corresponding process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: The first target data is obtained from the execution data storage area corresponding to the previous process step, and the first target data is stored as the execution value of the process parameter in the current process step in the execution data storage area corresponding to the current process step, so as to run the current process step according to the data in the execution data storage area corresponding to the current process step; the first target data includes the parameter values ​​of each process parameter in the current process step that meet the conditions of following the previous process step.

[0012] In one implementation, it further includes: Store the set values ​​of the process parameters for each process step to the original data storage area; Obtaining the set values ​​of the process parameters for the current process step, and determining the set values ​​as the execution values ​​of the process parameters in the current process step, includes: Obtain the second target data from the original data storage area, and use the second target data as the execution value of the process parameters in the current process step; the second target data includes the parameter values ​​of each process parameter in the current process step that do not meet the conditions of following the previous process step.

[0013] In one implementation, based on the editing operation of the process parameters, the modified value of the process parameters is used as the executed value of the process parameters in the current process step, including: Based on the editing operation of the process parameters, the modified values ​​of the process parameters are stored in the third data storage area; The third target data in the execution value of the process parameters in the current process step is updated with the data in the third data storage area, so as to run the current process step according to the update result of the execution value of the process parameters in the current process step; the third target data includes the execution value of the process parameters in the current process step that have been edited.

[0014] In one embodiment, the follow flag of the process parameters of the current process step includes at least one follow flag corresponding to a parameter category. The follow flag value corresponding to the parameter category is used to characterize whether each process parameter under the parameter category meets the condition of following the previous process step.

[0015] In one implementation, it further includes: During the process formula editing process, if the follow flag value of the process parameter of the edited process step is set to meet the condition of following the previous process step, then the setting value of the process parameter of the edited process step will be updated to the setting value of the process parameter corresponding to the previous process step, and the parameter values ​​of each process parameter in the edited process step that meet the condition of following the previous process step cannot be edited.

[0016] Secondly, embodiments of this specification provide a semiconductor process apparatus, including a memory, a processor, and a computer program stored in the memory and executed by the processor, wherein the processor executes the computer program to implement the control method as described in any of the preceding claims.

[0017] As can be seen from the above technical solutions, the embodiments of this application provide a control method and semiconductor process equipment for semiconductor process equipment. This method obtains the follow flag value of the process parameters in the current process step, and based on the fact that the follow flag value of the process parameters in the current process step satisfies the condition of following the previous process step, obtains the execution value of the process parameters in the previous process step. The execution value of the process parameters in the previous process step is then used as the execution value of the process parameters in the current process step. The current process step is then executed according to the execution value of the process parameters in the current process step. Therefore, during the execution of the current process, when the parameter value of a process parameter is modified in a certain process step, the process can be automatically executed in subsequent process steps based on the modified parameter value, without the need for manual modification of the parameter value in subsequent process steps. This effectively reduces the operational complexity of modifying the parameter value of the process parameters and improves the operating efficiency of the semiconductor process equipment. At the same time, it avoids the risk of introducing incorrect parameter values ​​when personnel manually modify the parameter values, thereby ensuring the process effect of the semiconductor process equipment. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0019] Figure 1 This is a flowchart illustrating a method for controlling semiconductor process equipment according to one embodiment of this application.

[0020] Figure 2 This is a flowchart illustrating another method for controlling a semiconductor process apparatus, provided as one embodiment of this application. Detailed Implementation

[0021] Unless otherwise defined, the technical or scientific terms used in the embodiments of this specification shall have the ordinary meaning understood by one of ordinary skill in the art to which this specification pertains. The terms "first," "second," and similar terms used in the embodiments of this specification do not indicate any order, quantity, or importance, but are merely used to avoid confusion of constituent elements.

[0022] Unless the context otherwise requires, throughout this specification, "a plurality of" means "at least two," and "including" is interpreted as open-ended or encompassing, that is, "including, but not limited to." In the description of this specification, terms such as "one embodiment," "some embodiments," "exemplary embodiment," "example," "specific example," or "some examples" are intended to indicate that a particular feature, structure, material, or characteristic associated with that embodiment or example is included in at least one embodiment or example of this specification. The illustrative representations of the above terms do not necessarily refer to the same embodiment or example.

[0023] The technical solutions in the embodiments of this specification will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this specification, and not all embodiments. Based on the embodiments in this specification, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this specification.

[0024] As described in the background section, for semiconductor process equipment such as oxidation equipment, the parameter values ​​of the same process parameter usually need to remain consistent in multiple consecutive process steps during the execution of the process. For example, the temperature-related parameter values ​​need to remain the same in process steps 3 to 8.

[0025] However, if the parameter value of a process parameter is manually modified during the execution of a certain process step, then the parameter value of that process parameter needs to be modified in the execution of subsequent process steps to ensure the consistency of the parameter value of that process parameter throughout the execution of each process step.

[0026] In this process, modifying process parameters at any given step requires manually pausing the process, manually changing the parameters, and then manually resuming the process. This is extremely complex and cannot guarantee the operational efficiency of the semiconductor equipment. Furthermore, manually modifying process parameters in subsequent steps carries the risk of inputting incorrect values, further compromising the effectiveness of the semiconductor process.

[0027] To address the problem that traditional methods involve complex modifications to process parameters during process execution, which negatively impact the operating efficiency and process performance of semiconductor equipment, this application's technical solution obtains the follow flag value of the process parameters in the current process step. Based on the fact that the follow flag value of the current process step's process parameters satisfies the condition of following the previous process step, the execution value of the process parameters in the previous process step is obtained. This execution value of the process parameters in the previous process step is then used as the execution value of the process parameters in the current process step. The current process step is then executed based on this execution value. Therefore, during the execution of the current process, when a process parameter value is modified in a certain process step, subsequent process steps can automatically execute the process based on the modified parameter value, eliminating the need for manual modification of the parameter value in subsequent process steps. This effectively reduces the operational complexity of modifying process parameter values ​​and improves the operating efficiency of semiconductor equipment. Simultaneously, it avoids the risk of introducing incorrect parameter values ​​when manually modifying parameter values, thus ensuring the process performance of the semiconductor equipment.

[0028] Based on the above inventive concept, the control method and semiconductor process equipment provided in the embodiments of this specification will be described exemplarily below.

[0029] First, this specification provides a method for controlling semiconductor process equipment, which can be executed by a controller in the semiconductor process equipment, such as a PLC (Programmable Logic Controller). Figure 1 As shown, the method includes: S101. Obtain the follow flag value of the process parameters for the current process step.

[0030] Specifically, the current process step can be the process step being performed at the current moment during the execution of the current process of the semiconductor process equipment. The current process can be the process being performed by the semiconductor process equipment at the current moment. For example, the semiconductor process equipment can be a vertical furnace oxidation equipment, and the current process of the vertical furnace oxidation equipment can be an ignition process, a cleaning process, or a maintenance process, etc.

[0031] When starting the execution of the current process step, the follow flag values ​​of the process parameters in the current process step can be obtained from the corresponding process recipe. The process recipe corresponding to the current process can be sent from the lower-level machine of the semiconductor process equipment to the controller. For any process executed by the semiconductor process equipment, the corresponding process recipe can include various types of process recipes, such as standard process recipes, sub-process recipes, termination process recipes, idle process recipes, maintenance process recipes, etc. For example, the process recipes used by the vertical furnace oxidation equipment can be as shown in Table 1.

[0032] Table 1 For any type of process formulation, the process formulation may include multiple process steps and set values ​​for each process parameter in each process step. Furthermore, for any process step in the process formulation, each process parameter in that process step can be assigned a follow flag. For example, a follow flag can be assigned to each process parameter, or a follow flag can be assigned to each parameter category. The follow flag value is used to indicate whether the process parameter or each process parameter under that parameter category meets the condition of following the previous process step. For example, a follow flag value of 1 indicates that the process parameter or each process parameter under that parameter category meets the condition of following the previous process step, while a follow flag value of 0 indicates that the process parameter or each process parameter under that parameter category does not meet the condition of following the previous process step.

[0033] Optionally, the follow flag of the process parameters in the current process step includes at least one follow flag corresponding to a parameter category. The follow flag value corresponding to the parameter category is used to characterize whether each process parameter under that parameter category meets the condition of following the previous process step. This reduces the number of follow flags to be set, improves the efficiency of process formula editing, and avoids inputting incorrect follow flag values ​​during the editing of follow flag values ​​of process parameters under the same parameter category, thereby improving the accuracy of the process formula.

[0034] For example, taking the ignition process of a vertical furnace oxidation equipment as an example, the parameter categories in this process step can be shown in Table 2.

[0035] Table 2 In addition, for any type of process recipe other than the terminated process recipe, an alarm handling setting module can be set in each process step of the process recipe. During the process recipe editing, the corresponding alarm handling method can be set in the alarm handling setting module. For example, the alarm handling methods can be as shown in Table 3.

[0036] Table 3 S102. Based on the fact that the follow flag value of the process parameter of the current process step meets the condition of following the previous process step, obtain the execution value of the process parameter of the previous process step, and use the execution value of the process parameter of the previous process step as the execution value of the process parameter in the current process step.

[0037] Specifically, the previous process step refers to the process step executed before the current process step. For any process parameter in the previous process step, the executed value of that process parameter in the previous process step is the target parameter value of that process parameter during the execution of the previous process step; that is, the previous process step executes the process according to the executed value of that process parameter. The executed value of that process parameter during the execution of the previous process step can be the set value of that process parameter in the process formula corresponding to the current process in the previous process step, a modified value of that process parameter received during the execution of the previous process step, or the executed value of that process parameter during the process step before that in the previous process step.

[0038] For any process parameter in the current process step, if the corresponding follow flag value indicates that the process parameter meets the condition of following the previous process step, then the execution value of the process parameter in the previous process step is obtained, and the execution value of the process parameter in the previous process step is used as the execution value of the process parameter in the current process step.

[0039] If the execution value of a process parameter changes during the execution of the previous process step—for example, if the parameter value is manually modified during the previous process step—then the latest updated execution value of the process parameter during the previous process step will be used as the execution value of the process parameter in the current process step. For example, the execution value of the process parameter at the end of the previous process step can be used as the execution value of the process parameter in the current process step.

[0040] In addition, for any process parameter in the current process step, if the process parameter does not have a follow flag, or if the follow flag value of the process parameter indicates that the process parameter does not meet the condition of following the previous process step, then the set value of the process parameter in the current process step in the process formula corresponding to the current process can be determined as the execution value of the process parameter in the current process step.

[0041] Understandably, for the first process step of the main process recipe, such as the standby process step, none of the process parameters in this step have a follow flag. Similarly, for each process step in an idle process recipe, none of the process parameters have a follow flag. However, for other process recipes that are called and executed, such as sub-process recipes and termination process recipes, the process parameters in each process step can be configured with a follow flag.

[0042] Optionally, during the editing of the process formula, for any process parameter in the currently edited process step, if the corresponding follow flag value indicates that the process parameter meets the condition of following the previous process step, the setting value of the process parameter in the previous process step can be automatically determined as the setting value of the process parameter in the currently edited process step. This avoids repeatedly editing the parameter value of the process parameter in different process steps, greatly improving the editing efficiency of the process formula. At the same time, it reduces the risk of parameter editing errors by editors, thereby reducing the risk of process execution effect and process execution safety being affected by parameter value editing errors.

[0043] S103. Run the current process step according to the execution value of the process parameter in the current process step.

[0044] Specifically, after determining the execution values ​​of each process parameter in the current process step, the current process step can be run according to these execution values ​​to ensure that the parameter values ​​of each process parameter in the current process step reach their corresponding execution values. For example, the temperature of the chamber can be controlled based on the execution value of the temperature in the current process step, and the pressure of the chamber can be controlled based on the execution value of the pressure in the current process step.

[0045] Therefore, through the embodiments of this application, when the parameter value of a process parameter is modified in a certain process step during the current process execution, the process can be automatically executed in subsequent process steps based on the modified parameter value, without the need to manually modify the parameter value in subsequent process steps. This effectively reduces the operational complexity of modifying the parameter value of the process parameter and improves the operating efficiency of the semiconductor process equipment. At the same time, it avoids the risk of introducing incorrect parameter values ​​when personnel manually modify the parameter values, thereby ensuring the process effect of the semiconductor process equipment.

[0046] In one feasible implementation, the current process step is the first process step of the called process formula, and the previous process step of the current process step is the last process step before the main process formula calls the called process formula. Alternatively, the current process step and the previous process step are two adjacent process steps in the main process formula. Alternatively, the current process step and the previous process step can be two adjacent process steps in the called process recipe.

[0047] Specifically, the process recipe corresponding to the current process may include one or more main process recipes, and one or more called process recipes. The main process recipe can call the called process recipes during its operation. It is understood that the called process recipes cannot run independently and can only be called through the main process recipes. For example, the called process recipes can be sub-process recipes or termination process recipes, etc.

[0048] Understandably, for any process formula other than the one that terminates the process formula, the terminated process formula can be invoked during the process, thereby enabling the current process to be terminated in a timely manner in the event of a serious anomaly, further improving the safety of the process execution.

[0049] The current process step can be the first process step of the called process recipe. In this case, the previous process step can be the last process step before the main process recipe calls the called process recipe. Therefore, when the follow flag value of the process parameter in the current process step meets the condition of following the previous process step, the execution value of the process parameter in the last process step before the main process recipe calls the called process recipe can be used as the execution value of the process parameter in the current process step.

[0050] Therefore, for multiple main process recipes with different execution values ​​of process parameters, the same called process recipe can be invoked. Moreover, when the called process recipe is invoked by different main process recipes, it can adaptively run according to the execution value of the process parameter in the main process recipe that is currently invoking it, thus making the called process recipe highly versatile.

[0051] Optionally, the invoked process recipe corresponding to the current process may include at least a target sub-process recipe. This target sub-process recipe may include multiple process steps, and these multiple process steps may include the same process parameters. Furthermore, the follow flag value of the same process parameter in these multiple process steps all indicates that the condition of following the previous process step is met. Therefore, by setting multiple process steps with at least some process parameters whose parameter values ​​remain unchanged in the same sub-process recipe, and configuring each process parameter with unchanged parameter values ​​to have the function of following the previous process step in each process step of this sub-process recipe, it is possible to avoid repeatedly editing the parameter values ​​of this process parameter in different main process recipes, thereby improving the editing efficiency of each main process recipe and avoiding the risk of introducing incorrect parameter values ​​when personnel edit the main process recipes, thus ensuring the process effect of the semiconductor process equipment.

[0052] Taking the ignition process of a vertical furnace oxidation equipment as an example, the vertical furnace oxidation equipment usually needs to perform the ignition process at different temperatures. At this time, the process steps in the process formula corresponding to the ignition process at different temperatures, where the parameter values ​​of other process parameters besides the temperature parameter are the same, can be set in the target sub-process formula. During the operation of the main process formula corresponding to the ignition process at different temperatures, the target sub-process formula can be called. Thus, for the main process formula corresponding to the ignition process at any temperature, when the main process formula calls the target sub-process formula, the target sub-process formula can adaptively run according to the execution value of the temperature parameter in the main process formula.

[0053] Furthermore, the current process step and the previous process step can be two adjacent process steps in the main process formulation currently being executed. For example, the current process step can be any process step from the second to the last process step in the main process formulation currently being executed. It is understood that for the first process step in the main process formulation, none of the process parameters in that process step have follow flag bits.

[0054] The current process step and the previous process step can also be two adjacent process steps in the called process recipe currently being executed. In this case, the current process step can be any process step from the second to the last process step in the called process recipe currently being executed.

[0055] It should be noted that the main process recipes in the embodiments of this application include, but are not limited to, the Process Recipe, Purge Recipe or Maintenance Recipe mentioned above.

[0056] In one feasible implementation, it also includes: If the follow flag value of the process parameter in the current process step does not meet the condition of following the previous process step, the set value of the process parameter in the current process step is obtained, and the set value is determined as the execution value of the process parameter in the current process step.

[0057] Specifically, at the initial running time of the current process step, the follow flag values ​​of each process parameter in the current process step can be obtained. For any process parameter in the current process step, if the follow flag value corresponding to the process parameter indicates that the parameter value does not meet the condition of following the previous process step, or if no corresponding follow flag is configured for the process parameter, the set value of the process parameter in the current process step can be directly obtained from the process recipe corresponding to the current process, and the set value of the process parameter in the current process step can be used as the execution value of the process parameter in the current process step. Thus, for process parameters that do not meet the condition of following the previous process step, the current process step can be run according to the set value of the process parameter in the process recipe.

[0058] In one feasible implementation, it also includes: During the execution of the current process step, the modified value of the process parameter is used as the execution value of the process parameter in the current process step according to the editing operation of the process parameter.

[0059] Specifically, during the execution of the current process step, relevant personnel can manually modify the parameter values ​​of the process based on the current process execution status. The modified values ​​of the process parameters can be sent to the controller via the lower-level computer. It is understood that this modification of parameter values ​​only involves the modification of parameter values ​​during the current process step and will not cause changes to the set values ​​of the process parameters in the process formula.

[0060] When the controller receives a modified value for a process parameter, it can update the execution value of that process parameter in the current process step to the corresponding modified value, and continue to run the current process step according to the updated execution value of the process parameter, thereby ensuring the flexibility of process execution.

[0061] In one feasible implementation, it also includes: The user interface displays the process formula; The process formula includes a main process formula and a called process formula; the called process formula includes at least a fixed process formula; the safety level of the process parameters of the fixed process formula is higher than the safety level of the process parameters of other called process formulas and the main process formula, and the fixed process formula is not editable.

[0062] Specifically, the interface for operating the process recipes of semiconductor process equipment can also be displayed, allowing relevant personnel to view or edit the process recipes through this interface. The process recipes for semiconductor process equipment may include one or more master process recipes, and one or more invoked process recipes. Each invoked process recipe may include at least a fixed process recipe, and at least some process parameters in the fixed process recipe may have a higher safety level than the process parameters in other invoked process recipes and the master process recipe.

[0063] In this context, the safety level of any process parameter characterizes the required accuracy of its executed value. The safety level can be determined based on the impact of the executed value on the safety of the current process. For example, the safety level of a process parameter can be positively correlated with the impact of its executed value on the safety of the current process; a higher impact and a lower accuracy requirement result in a higher safety level.

[0064] Taking vertical furnace oxidation equipment as an example, it is a key piece of equipment in semiconductor manufacturing used to form an oxide layer on the surface of silicon wafers. Vertical furnace oxidation equipment is typically placed vertically and contains heating elements. The silicon wafer is placed in a quartz boat and fed into the furnace via a lifting mechanism to form a silicon dioxide thin film at high temperatures. The wet oxidation process is widely used in semiconductor device manufacturing due to its advantages such as high growth rate, uniform oxide layer quality, excellent interface characteristics, low oxidation temperature, and high process flexibility. The wet oxidation process involves the reaction of solid silicon (Si) and water vapor (H2O) to obtain solid silicon dioxide (SiO2) and hydrogen (H2). Water vapor is typically prepared through an ignition process; for example, fuel gas (e.g., hydrogen) and oxygen-enhancing gas (e.g., oxygen) are mixed in a set ratio and ignited to produce pure, high-temperature water vapor, which participates in the wet oxidation process.

[0065] If the ratio of hydrogen to oxygen exceeds the safe range during ignition, an explosion can easily occur, affecting the process efficiency and the safety of the vertical furnace oxidation equipment, and in severe cases, even endangering personnel safety. Therefore, the process parameters in the fixed process formula can include the ratio of hydrogen to oxygen.

[0066] To ensure the accuracy of fixed process formulas, the editing permissions of fixed process formulas can be higher than those of other called process formulas and the main process formula. Specifically, for any process formula, the editing permissions of that process formula can be the permissions that the formula editor has when editing that process formula.

[0067] For example, the editing permissions for other called process formulas besides the fixed process formula, as well as the main process formula, can be administrator-level, while the editing permissions for the fixed process formula can be higher than administrator-level. Therefore, during the editing of the fixed process formula, the risk of process execution failure or safety accidents due to incorrect editing of process parameter settings can be effectively reduced, thus mitigating the risk of process execution failure or safety accidents at the source. Understandably, personnel without editing permissions for the fixed process formula can only view it and cannot edit it.

[0068] In addition, the import permissions of a fixed process recipe can be higher than those of other called process recipes and the master process recipe. For any process recipe, the import permissions of that process recipe can be the permissions that the recipe importer has when importing the process recipe into the semiconductor process equipment.

[0069] For example, the import permissions for other process formulas besides the fixed process formula, as well as the main process formula, can be administrator-level, while the import permissions for the fixed process formula can be higher than administrator-level. Therefore, during the import of fixed process formulas, the risk of process execution failure or safety accidents due to import errors can be effectively reduced, thus mitigating the risk of such failures at the source.

[0070] In addition, the fixed process formula is not editable, meaning that relevant personnel cannot modify the setting values ​​of process parameters in each process step of the fixed process formula through the operation interface of the process formula. This can fix the setting values ​​of each process parameter in the fixed process formula, thereby effectively avoiding the process execution failure or safety accident caused by the accidental modification of the setting values ​​of process parameters.

[0071] It is understandable that, for other process formulas or main process formulas that are called in addition to the fixed process formulas, relevant personnel can modify the set values ​​of process parameters in each process step.

[0072] It should be noted that during the operation of the fixed process formula, on-site personnel cannot modify the execution values ​​of process parameters in the process steps being executed in the fixed process formula. However, for other called process formulas or main process formulas other than the fixed process formula, relevant personnel can modify the execution values ​​of process parameters in each process step through the operation interface of the process formula.

[0073] In one feasible implementation, it also includes: After the current process step is completed, the data in the first data storage area is updated to the execution value of the process parameters of the current process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: The first target data is obtained from the first data storage area, and the first target data is stored in the second data storage area as the execution value of the process parameter in the current process step, so as to run the current process step according to the data in the second data storage area; the first target data includes the parameter values ​​of each process parameter in the current process step that meet the condition of following the previous process step.

[0074] Specifically, the controller of a semiconductor process equipment may be equipped with a first data storage area and a second data storage area. During the operation of the current process step, the first data storage area may be used to store the execution values ​​of the process parameters of the previous process step that is immediately adjacent to the current process step, and the second data storage area may be used to store the execution values ​​of the process parameters of the current process step.

[0075] Therefore, for any process step, when the process step is completed, the execution value of the process parameters in the process step can be stored in the first data storage area. Thus, if the follow flag value of the process parameters in the subsequent process step meets the condition of following the previous process step, the execution value of the corresponding process parameters can be directly obtained from the first data storage area.

[0076] In the specific implementation process, at the initial running time of the current process step, if the follow flag value of the process parameter of the current process step meets the condition of following the previous process step, the first target data can be obtained from the first data storage area. The first target data may include the parameter values ​​of each process parameter in the current process step whose follow flag value meets the condition of following the previous process step. Therefore, this first target data can be stored as the execution value of the corresponding process parameter in the current process step in the second data storage area, and the current process step is run according to the execution values ​​of each process parameter in the second data storage area.

[0077] Therefore, by using the solution of this application embodiment, only a first data storage area and a second data storage area are needed to realize the function of the process parameter value following the previous process step, which greatly reduces the requirement for data storage space.

[0078] In one feasible implementation, each process step corresponds to an execution data storage area, which is used to store the execution values ​​of the process parameters of the corresponding process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: The first target data is obtained from the execution data storage area corresponding to the previous process step, and the first target data is stored as the execution value of the process parameter in the current process step in the execution data storage area corresponding to the current process step, so as to run the current process step according to the data in the execution data storage area corresponding to the current process step; the first target data includes the parameter values ​​of each process parameter in the current process step that meet the conditions of following the previous process step.

[0079] Specifically, the controller of the semiconductor process equipment can be equipped with an execution data storage area corresponding to each process step in the process recipe. That is, the execution data storage area corresponds one-to-one with the process step. For any process step, the execution data storage area corresponding to that process step can be used to store the execution value of the process parameters of that process step.

[0080] In the specific implementation process, at the initial running time of the current process step, if the follow flag value of the process parameter of the current process step meets the condition of following the previous process step, the first target data can be obtained from the execution data storage area corresponding to the previous process step. The first target data may include the parameter values ​​of each process parameter in the current process step whose follow flag value meets the condition of following the previous process step.

[0081] Therefore, the first target data can be stored as the execution value of the corresponding process parameter in the current process step in the execution data storage area of ​​the current process step, and the current process step can be run according to the execution values ​​of each process parameter in the execution data storage area of ​​the current process step. Thus, by setting the execution data storage area corresponding to each process step, the function of the parameter value of the process parameter following the previous process step can be realized.

[0082] In one feasible implementation, it also includes: Store the set values ​​of the process parameters for each process step to the original data storage area; Obtaining the set values ​​of the process parameters for the current process step, and determining the set values ​​as the execution values ​​of the process parameters in the current process step, includes: Obtain the second target data from the original data storage area, and use the second target data as the execution value of the process parameters in the current process step; the second target data includes the parameter values ​​of each process parameter in the current process step that do not meet the conditions of following the previous process step.

[0083] Specifically, the controller of the semiconductor process equipment may include a raw data storage area, which stores the set values ​​of the process parameters for each process step in the current process. Additionally, the controller may also include a second data storage area or an execution data storage area corresponding to each process step, to store the execution values ​​of the process parameters for the current process step.

[0084] Specifically, when receiving the process recipe corresponding to the current process sent by the lower-level machine of the semiconductor process equipment, the set values ​​of the process parameters of each process step in the process recipe can be stored in the original data storage area so that the set values ​​of the process parameters can be obtained from the original data storage area during the operation of each process step.

[0085] In practice, at the initial running moment of the current process step, the follow flag value of the process parameters for the current process step can be obtained from the original data storage area. If the follow flag value of the process parameters for the current process step does not meet the condition of following the previous process step, second target data can be obtained from the original data storage area. The second target data may include the parameter values ​​of each process parameter in the current process step whose follow flag values ​​do not meet the condition of following the previous process step. Therefore, this second target data can be used as the execution value of the corresponding process parameter in the current process step, and the second target data is stored in the second data storage area or the execution data storage area corresponding to the current process step. The current process step is then run based on the execution values ​​of each process parameter in the second data storage area or the execution data storage area corresponding to the current process step, thereby ensuring reliable process operation.

[0086] In one feasible implementation, based on the editing operation of the process parameters, the modified value of the process parameters is used as the executed value of the process parameters in the current process step, including: Based on the editing operation of the process parameters, the modified values ​​of the process parameters are stored in the third data storage area; The third target data in the execution value of the process parameters in the current process step is updated with the data in the third data storage area, so as to run the current process step according to the update result of the execution value of the process parameters in the current process step; the third target data includes the execution value of the process parameters in the current process step that have been edited.

[0087] Specifically, the controller of the semiconductor process equipment may be equipped with a third data storage area, which is used to store the modified values ​​of each process parameter during the current process step. Additionally, the controller may also be equipped with a second data storage area or an execution data storage area corresponding to each process step, to store the execution values ​​of the process parameters for the current process step.

[0088] During the execution of the current process step, if any process parameter in the current process step is edited, the modified value of that process parameter can be stored in the third data storage area. Furthermore, if the modified value of a process parameter exists in the third data storage area, the third target data in the execution value of the process parameter in the current process step can be updated to the data in the third data storage area. For example, the third target data in the second data storage area or the execution data storage area corresponding to the current process step can be updated to the data in the third data storage area, and the current process step is run based on the latest update result of the second data storage area or the execution data storage area corresponding to the current process step. The third target data includes the execution value of the process parameter in the current process step that has been edited, thus enabling quick and effective modification of process parameter values ​​during process execution.

[0089] The following example illustrates the implementation process of the control method for the semiconductor process equipment of this application, using a controller for a semiconductor process equipment that includes a first data storage area, a second data storage area, a third data storage area, and a raw data storage area. (Reference) Figure 2 The control method for this semiconductor process equipment includes: S201. When receiving the process formula corresponding to the current process sent by the lower-level machine, store the set values ​​of the process parameters of each process step in the process formula into the original data storage area, and take the first process step as the current process step. S202. When the current process step begins to be executed, obtain the follow flag value of the process parameters of the current process step from the original data storage area. S203. Determine whether the following flag value of each process parameter in the current process step is 1. If yes, proceed to step S204; otherwise, proceed to step S205. S204. Obtain the execution value of the process parameter in the previous process step from the first data storage area, and store it in the second data storage area as the execution value of the process parameter in the current process step. Execute step S206. S205. Obtain the set value of the process parameter in the current process step from the original data storage area, and store it in the second data storage area as the execution value of the process parameter in the current process step. Execute step S206. S206. Run the current process step according to the execution values ​​of each process parameter in the second data storage area; S207. Determine whether the third data storage area has received the modified value of the process parameters. If yes, proceed to step S208; otherwise, proceed to step S209. S208. Update the execution value of the process parameter in the second data storage area to the modified value of the process parameter, and execute step S209. S209. Determine whether the current process step has been completed. If yes, proceed to step S210; otherwise, proceed to step S206. S210. Update the data in the first data storage area to the data in the second data storage area; S211. Determine if there is a next process step. If yes, proceed to step S212; otherwise, proceed to step S213. S212. Set the next process step as the current process step and execute step S202. S213, The current process has ended.

[0090] In one feasible implementation, it also includes: During the process formula editing process, if the follow flag value of the process parameter of the edited process step is set to meet the condition of following the previous process step, then the setting value of the process parameter of the edited process step will be updated to the setting value of the process parameter corresponding to the previous process step, and the parameter values ​​of each process parameter in the edited process step that meet the condition of following the previous process step cannot be edited.

[0091] Specifically, process recipes can be edited through the process recipe's operation interface. During the editing process, corresponding operation buttons (e.g., TEMP Follow) can be set for process parameters or parameter categories. Clicking these buttons sets the follow flag value for the corresponding process parameter or parameter category. For example, when the button is clicked, it turns green, and the follow flag value for the corresponding process parameter or parameter category is 1, indicating that the condition of following the previous process step is met. When the button is not clicked, it is gray, and the follow flag value for the corresponding process parameter or parameter category is 0, indicating that the condition of following the previous process step is not met. It is also understandable that corresponding follow flag editing boxes can be set for process parameters or parameter categories to edit the follow flag values ​​for each process parameter or parameter category.

[0092] Specifically, if the follow flag value corresponding to the process parameter of the edited process step is set to meet the condition of following the previous process step, and if the edited process step is any of the second to last process steps in the process formula, the setting value of the process parameter in the edited process step can be automatically updated to the setting value of the process parameter in the previous process step in the process formula. Simultaneously, the parameter value of the process parameter in the edited process step is not editable; for example, the edit box for the parameter value is grayed out. If the edited process step is the first process step of the process formula, and the process formula is the called process formula, the setting value of the process parameter in the edited process step can be automatically updated to the preset value. During the operation of the called process formula, it can run according to the execution value of the process parameter in the last process step before the called process formula is called by the main process formula, thereby effectively improving the editing efficiency and accuracy of the editing results.

[0093] It is understandable that the process parameters of the first process step in the main process formula do not have a follow flag bit, or the follow flag bit value is set to not meet the condition of following the previous process step.

[0094] In addition, if the follow flag value corresponding to the process parameter of the edited process step is set to not meet the condition of following the previous process step, the parameter value of the process parameter can be edited. That is, relevant personnel can edit the setting value of the process parameter according to their needs.

[0095] It should be noted that when the follow flag value corresponding to the parameter category is set to meet the condition of following the previous process step, the settings of each process parameter under that parameter category will be automatically updated, and the parameter values ​​will not be editable; when the follow flag value corresponding to the parameter category is set to not meet the condition of following the previous process step, the parameter values ​​of each process parameter under that parameter category can be edited.

[0096] This specification also provides a semiconductor process apparatus, including a memory, a processor, and a computer program stored in the memory and executed by the processor, wherein the processor executes the computer program to implement the control method of the semiconductor process apparatus as described in any of the preceding embodiments.

[0097] In addition to the methods and apparatus described above, the control methods for semiconductor process equipment provided in the embodiments of this specification can also be computer program products, which include computer program instructions that, when executed by a processor, cause the processor to perform the steps in the control methods for semiconductor process equipment according to various embodiments of this specification as described in the "Exemplary Methods" section above.

[0098] The computer program product described herein can be written in any combination of one or more programming languages ​​to perform the operations of the embodiments described herein. These programming languages ​​include object-oriented programming languages ​​such as Java and C++, as well as conventional procedural programming languages ​​such as C or similar languages. The program code can be executed entirely on the user's semiconductor process equipment, partially on the user's equipment, as a standalone software package, partially on the user's semiconductor process equipment and partially on a remote semiconductor process equipment, or entirely on a remote semiconductor process equipment or server.

[0099] Furthermore, embodiments of this specification also provide a computer-readable storage medium having a computer program stored thereon, the computer program being executed by a processor of the steps in the control methods for semiconductor process equipment according to various embodiments of this specification as described in the "Exemplary Methods" section above.

[0100] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium. When executed, the computer program can include the processes of the embodiments of the above methods. Any references to memory, storage, databases, or other media used in the embodiments provided in this specification can include non-volatile and / or volatile memory. Non-volatile memory may include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. Volatile memory may include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in a variety of forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), dual data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous link DRAM (SLDRAM), RAMbus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM), etc.

[0101] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0102] The embodiments described above are merely illustrative of several implementation methods outlined in this specification. While the descriptions are specific and detailed, they should not be construed as limiting the scope of the solutions provided in this specification. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this specification, and these modifications and improvements all fall within the scope of protection of this specification. Therefore, the scope of protection for this patent should be determined by the appended claims.

Claims

1. A control method of a semiconductor process apparatus, characterized by, The method includes: Obtain the follow flag value of the process parameters for the current process step; Based on the fact that the follow flag value of the process parameter of the current process step meets the condition of following the previous process step, the execution value of the process parameter of the previous process step is obtained, and the execution value of the process parameter of the previous process step is used as the execution value of the process parameter in the current process step. The current process step is executed based on the execution values ​​of the process parameters in the current process step.

2. The method according to claim 1, characterized in that, The current process step is the first process step of the called process formula, and the previous process step is the last process step before the main process formula calls the called process formula. Alternatively, the current process step and the previous process step are two adjacent process steps in the main process formula. Alternatively, the current process step and the previous process step can be two adjacent process steps in the called process recipe.

3. The method according to claim 1, characterized in that, Also includes: If the follow flag value of the process parameter in the current process step does not meet the condition of following the previous process step, the set value of the process parameter in the current process step is obtained, and the set value is determined as the execution value of the process parameter in the current process step.

4. The method according to claim 1, characterized in that, Also includes: During the execution of the current process step, the modified value of the process parameter is used as the execution value of the process parameter in the current process step according to the editing operation of the process parameter.

5. The method according to any one of claims 1 to 4, characterized in that, Also includes: The user interface displays the process formula; The process formula includes a main process formula and a called process formula; the called process formula includes at least a fixed process formula; the safety level of the process parameters of the fixed process formula is higher than the safety level of the process parameters of other called process formulas and the main process formula, and the fixed process formula is not editable.

6. The method according to claim 1, characterized in that, Also includes: After the current process step is completed, the data in the first data storage area is updated to the execution value of the process parameters of the current process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: Obtain the first target data from the first data storage area, and store the first target data as the execution value of the process parameter in the current process step in the second data storage area, so as to run the current process step according to the data in the second data storage area; The first target data includes the parameter values ​​of each process parameter in the current process step that satisfy the condition of following the previous process step.

7. The method according to claim 1, characterized in that, Each process step corresponds to an execution data storage area, which is used to store the execution values ​​of the process parameters for the corresponding process step; Obtaining the execution value of the process parameters from the previous process step, and using the execution value of the process parameters from the previous process step as the execution value of the process parameters in the current process step, includes: Obtain the first target data from the execution data storage area corresponding to the previous process step, and store the first target data as the execution value of the process parameter in the current process step in the execution data storage area corresponding to the current process step, so as to run the current process step according to the data in the execution data storage area corresponding to the current process step; The first target data includes the parameter values ​​of each process parameter in the current process step that satisfy the condition of following the previous process step.

8. The method according to claim 3, characterized in that, Also includes: Store the set values ​​of the process parameters for each process step to the original data storage area; Obtaining the set values ​​of the process parameters for the current process step, and determining the set values ​​as the execution values ​​of the process parameters in the current process step, includes: Obtain the second target data from the original data storage area, and use the second target data as the execution value of the process parameter in the current process step; The second target data includes the parameter values ​​of each process parameter in the current process step that do not meet the conditions for following the previous process step.

9. The method according to claim 4, characterized in that, Based on the editing operation of the process parameters, the modified value of the process parameters is used as the execution value of the process parameters in the current process step, including: Based on the editing operation of the process parameters, the modified values ​​of the process parameters are stored in the third data storage area; The third target data in the execution value of the process parameters in the current process step is updated with the data in the third data storage area, so as to run the current process step according to the update result of the execution value of the process parameters in the current process step; the third target data includes the execution value of the process parameters in the current process step that have been edited.

10. The method according to claim 1, characterized in that, The follow flag of the process parameters in the current process step includes at least one follow flag corresponding to a parameter category. The follow flag value corresponding to the parameter category is used to characterize whether each process parameter under the parameter category meets the condition of following the previous process step.

11. The method according to claim 1, characterized in that, Also includes: During the process formula editing process, if the follow flag value of the process parameter of the edited process step is set to meet the condition of following the previous process step, then the setting value of the process parameter of the edited process step will be updated to the setting value of the process parameter corresponding to the previous process step, and the parameter values ​​of each process parameter in the edited process step that meet the condition of following the previous process step cannot be edited.

12. A semiconductor process apparatus, characterized in that, The system includes a memory, a processor, and a computer program stored in the memory and executed by the processor, characterized in that the processor, when executing the computer program, implements the control method as described in any one of claims 1 to 11.

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