Display panel and display panel preparation method

Abstract

The application relates to the technical field of display, in particular to a display panel and a display panel preparation method. The display panel comprises a light-emitting layer, a touch insulation layer and a planarization layer. The light-emitting layer comprises a plurality of light-emitting units. The touch insulation layer is arranged on the light-emitting side of the light-emitting layer and comprises a plurality of first convex parts. The first convex parts cover the light-emitting units. The planarization layer covers the first convex parts. The refractive index of the planarization layer is smaller than that of the first convex parts. The display panel can improve the light-emitting efficiency without increasing the manufacturing process and material cost of the display panel.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display panel and a method for manufacturing the display panel. Background Technology

[0002] Organic light-emitting diodes (OLEDs) possess advantages such as self-illumination, wide viewing angle, high contrast, low power consumption, thinness, and flexibility, making OLED display panels the mainstream product in the display field. The light emission efficiency and light transmittance of OLED display panels are important indicators for evaluating their display performance.

[0003] To improve the luminous efficiency of display panels, OLED display panels typically incorporate microlens structures formed by high-refractive-index and low-refractive-index materials. This requires the introduction of high-refractive-index and low-refractive-index materials and related fabrication processes during the panel manufacturing process, increasing the manufacturing costs of display panels. Summary of the Invention

[0004] This application provides a display panel and a method for manufacturing the display panel, which improves the luminous efficiency of the display panel without increasing the manufacturing process and material costs.

[0005] In a first aspect, embodiments of this application provide a display panel, including: Substrate; A light-emitting layer, disposed on one side of the substrate, includes multiple light-emitting units; A touch layer is disposed on the light-emitting side of the light-emitting layer, and includes a first touch trace and a second touch trace stacked sequentially. A touch insulating layer is disposed between the first touch trace and the second touch trace, and includes a plurality of first protrusions, the first protrusions covering the light-emitting unit; A planarization layer is provided, which covers the first protrusion and has a refractive index lower than that of the first protrusion.

[0006] In one possible implementation, the touch insulating layer further includes a second protrusion, which is disposed around the first protrusion; the first touch trace is disposed on the side of the second protrusion closer to the light-emitting layer, and the second touch trace is disposed on the side of the second protrusion away from the light-emitting layer; Preferably, the orthographic projections of the first touch trace on the substrate and the orthographic projections of the second touch trace on the substrate at least partially overlap.

[0007] In one possible implementation, the display panel further includes a compensation layer disposed between the planarization layer and the touch insulating layer, wherein the refractive index of the compensation layer is greater than that of the planarization layer and less than that of the first protrusion. Preferably, the thickness of the compensation layer is less than 1. m, and greater than 0.3 m; Preferably, the material of the compensation layer is SiO, SiON, or SiNx.

[0008] In one possible implementation, the planarization layer is made of polyimide, and the planarization film thickness is 3-10 mm. m.

[0009] In one possible implementation, the orthographic projection of the first protrusion on the substrate overlaps the orthographic projection of the light-emitting unit on the substrate, and the horizontal distance between the edge of the orthographic projection of the first protrusion on the substrate and the edge of the orthographic projection of the light-emitting unit on the substrate ranges from 0 to 5. m; The first protrusion has a trapezoidal cross-section along the thickness direction of the display panel, and the taper angle of the first protrusion is less than or equal to 80 degrees and greater than 45 degrees. Preferably, the material of the touch insulating layer is SiO, SiON, or SiNx; Preferably, the material of the touch insulating layer is an acrylic-based material doped with high refractive index particles; Preferably, the touch-sensitive insulating layer comprises multiple film layers, each film layer having a thickness greater than or equal to 0.3. m, and less than 0.6 m; the thickness of the touch insulation layer is greater than or equal to 0.6. m, and less than 1.2 m.

[0010] Secondly, embodiments of this application provide a method for manufacturing a display panel, including: A light-emitting layer is prepared on one side of a substrate, the light-emitting layer comprising a plurality of light-emitting units; A touch layer and a touch insulating layer are prepared on the light-emitting side of the light-emitting layer; The touch insulating layer is patterned to form a plurality of first protrusions; the first protrusions cover the light-emitting unit; A planarization layer is formed on the side of the touch insulating layer away from the light-emitting layer, and the refractive index of the planarization layer is less than the refractive index of the first protrusion.

[0011] In one possible implementation, the touch layer includes a first touch trace and a second touch trace, and the fabrication of the touch layer and the touch insulating layer on the light-emitting side of the light-emitting layer includes: The first touch trace is formed on the light-emitting side of the light-emitting layer, and the touch insulating layer is formed on one side of the first touch trace. The first touch trace surrounds the light-emitting unit. Preferably, the step of patterning the touch insulating layer to form a plurality of first protrusions includes: The touch insulating layer between the first touch trace and the light-emitting unit is etched to form a first protrusion covering the light-emitting unit and a second protrusion surrounding the first protrusion, the second protrusion covering the first touch trace.

[0012] In one possible implementation, the etching of the touch insulating layer between the first touch trace and the light-emitting unit forms a first protrusion covering the light-emitting unit and a second protrusion surrounding the first protrusion. After the second protrusion covers the first touch trace, the method further includes: A second touch trace is formed on the side of the second protrusion away from the light-emitting layer, and the orthographic projections of the first touch trace on the substrate and the second touch trace on the substrate at least partially overlap.

[0013] In one possible implementation, after forming the second touch path on the side of the second protrusion away from the light-emitting layer, the method further includes: A compensation layer is formed on one side of the first protrusion and the second touch trace. The compensation layer is disposed between the planarization layer and the touch insulating layer. The refractive index of the compensation layer is greater than that of the planarization layer and less than that of the first protrusion. Preferably, the thickness of the compensation layer is less than 1. And greater than 0.3 m; Preferably, the material of the compensation layer is SiO, SiON, or SiNx.

[0014] Preferably, the planarization layer is made of polyimide, and the planarization film thickness is 3-10 mm. m.

[0015] In one possible implementation, the orthographic projection of the first protrusion on the substrate overlaps the orthographic projection of the light-emitting unit on the substrate, and the horizontal distance between the edge of the orthographic projection of the first protrusion on the substrate and the edge of the orthographic projection of the light-emitting unit on the substrate ranges from 0 to 5. m; The first protrusion has a trapezoidal cross-section along the thickness direction of the display panel, and the taper angle of the first protrusion is less than or equal to 80 degrees and greater than 45 degrees. Preferably, the material of the touch insulating layer is SiO, SiON, or SiNx; Preferably, the touch-sensitive insulating layer comprises multiple film layers, each film layer having a thickness greater than or equal to 0.3. m, and less than 0.6 m; the thickness of the touch insulation layer is greater than or equal to 0.6. m, and less than 1.2 m.

[0016] The solution adopted in this application embodiment utilizes a touch insulating layer to form multiple first protrusions, a planarization layer to cover the first protrusions, and the refractive index of the first protrusions is higher than that of the planarization layer. By using the first protrusions formed by the touch insulating layer and the planarization layer to form a microlens structure, the luminous efficiency can be improved. Compared with the prior art, which requires covering the light-emitting unit with organic high-refractive-index materials and low-refractive-index materials to form a microlens structure, this application embodiment uses the existing touch insulating layer and planarization layer to form a microlens structure, without increasing the cost of additional process materials, which can save the manufacturing cost of the display panel. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a cross-sectional schematic diagram of a display panel provided in an embodiment of this application; Figure 2 This is a top view of a display panel provided in an embodiment of the present application; Figure 3 A cross-sectional schematic diagram of another display panel provided in an embodiment of this application; Figure 4 A schematic flowchart illustrating a method for manufacturing a display panel according to an embodiment of this application; Figure 5 This is a schematic flowchart of another display panel manufacturing method provided in an embodiment of this application.

[0019] Explanation of reference numerals in the attached figures: The light-emitting layer 100, the light-emitting unit 120, the pixel limiting layer 130, the first inorganic encapsulation layer 140, the organic planarization layer 150, and the second inorganic encapsulation layer 160 are included. Touch insulating layer 200, first protrusion 210, second protrusion 220; Planarization layer 300; Touch layer 400; first touch trace 410, second touch trace 420; Compensation layer 500; Substrate 600. Detailed Implementation

[0020] The features and exemplary embodiments of various aspects of this application will now be described in detail. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain this application and are not configured to limit this application. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples of this application.

[0021] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0022] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.

[0023] In related technologies, in order to improve the luminous efficiency of display panels, organic high-refractive-index materials and low-refractive-index materials need to be covered on the light-emitting units of the display panel to form a microlens structure; additional high-refractive-index material printing processes are required, as well as matching new materials and equipment, which increases additional costs.

[0024] To solve the above technical problems, such as Figure 1As shown, this application embodiment provides a display panel. Figure 1 A schematic diagram of a display panel provided in this application embodiment includes: a substrate 600; a light-emitting layer 100, which includes a plurality of light-emitting units 120; a touch layer 400 disposed on the light-emitting side of the light-emitting layer 100, which includes a first touch trace 410 and a second touch trace 420 stacked sequentially; a touch insulating layer 200 disposed between the first touch trace 410 and the second touch trace 420, which includes a plurality of first protrusions 210 covering the light-emitting units 120; and a planarization layer 300 covering the first protrusions 210, wherein the refractive index of the planarization layer 300 is less than the refractive index of the first protrusions 210.

[0025] In the embodiments of this application, Figure 1 The display panel shown is a flexible OLED display panel, wherein the light-emitting layer 100 includes a pixel limiting layer 130 and light-emitting units 120 disposed between the pixel limiting layer 130. A plurality of light-emitting units 120 are arranged in an array on the substrate 600, and each light-emitting unit 120 constitutes a sub-pixel for emitting light of a specific color, such as red, green or blue light. The light-emitting units 120 are separated from each other by the pixel limiting layer 130.

[0026] The light-emitting layer 100 of the flexible display panel also includes an encapsulation structure. In this embodiment, thin-film encapsulation technology is used, such as... Figure 2 As shown, the encapsulation structure of the light-emitting layer 100 specifically includes a first inorganic encapsulation layer 140, an organic planarization layer 150, and a second inorganic encapsulation layer 160. The organic planarization layer 150 is formed on one side of the first inorganic encapsulation layer 140 by inkjet printing technology, which can play a planarization role.

[0027] The touch insulating layer 200 includes a plurality of first protrusions 210, each of which corresponds to a light-emitting unit 120 below it. The touch insulating layer 200 is formed by a patterning process using a high refractive index material to create the plurality of first protrusions 210. Each first protrusion 210 corresponds vertically to a light-emitting unit 120 below it.

[0028] After the first protrusion 210 is formed, a planarization layer 300 is formed on the touch insulating layer 200. This planarization layer 300 covers the first protrusion 210, smoothing out surface undulations caused by the protruding structure, providing a smooth interface for subsequent film layers. Furthermore, the refractive index of the planarization layer 300 is lower than that of the first protrusion 210 formed on the touch insulating layer 200. Based on the above structure, each first protrusion 210 made of a high-refractive-index material and its contacting low-refractive-index planarization layer 300 together constitute a microlens unit. Its optical principle is as follows: Light emitted from the light-emitting unit 120 enters the high-refractive-index first protrusion 210 at a certain angle. When the light propagates to the interface between the first protrusion 210 and the planarization layer 300, because the light travels from an optically denser medium (high refractive index) to an optically less dense medium (low refractive index), the large-angle light that would normally undergo total internal reflection at a planar interface has its incident angle reduced under the action of this convex structure. This allows more light to break through the critical angle of total internal reflection and exit. In short, this microlens structure converges light and collimates the exit direction, significantly reducing the total internal reflection loss within the panel, thereby greatly improving the light extraction efficiency of the display panel.

[0029] The solution adopted in this application embodiment utilizes a touch insulating layer 200 to form a plurality of first protrusions 210, and a planarization layer 300 covers the first protrusions 210. The refractive index of the first protrusions 210 is higher than that of the planarization layer 300. By means of the first protrusions 210 formed by the touch insulating layer 200 and the planarization layer 300, a microlens structure is formed, which can improve the luminous efficiency. Compared with the prior art, which requires covering the light-emitting unit with organic high refractive index material and low refractive index material to form a microlens structure, this application embodiment uses the existing touch insulating layer and planarization layer 300 to form a microlens structure, without increasing the cost of additional process materials, which can save the manufacturing cost of the display panel.

[0030] In another embodiment of this application, based on the above embodiment, the orthographic projection of the first protrusion 210 on the substrate 600 covers the orthographic projection of the light-emitting unit 120 on the substrate 600. The horizontal distance between the edge of the orthographic projection of the first protrusion 210 on the substrate 600 and the edge of the orthographic projection of the light-emitting unit 120 on the substrate 600 ranges from 0 to 5 μm.

[0031] In this embodiment, to ensure maximum collection of light emitted by the light-emitting unit 120, the horizontal distance between the edge of the protrusion 210 projected onto the substrate 600 and the edge of the light-emitting unit 120 projected onto the substrate 600 is 0-5 mm. m is preferably 0 to 5 micrometers (e.g., 0 micrometers, 2 micrometers, or 5 micrometers). It is understood that when this distance is 0, the first protrusion 210 is aligned with the edge of the light-emitting unit 120 in the vertical direction, forming the most compact optical coupling structure.

[0032] In one possible implementation, the first protrusion 210 has a trapezoidal cross-section along the thickness direction of the display panel, and the taper angle of the first protrusion is less than or equal to 80 degrees.

[0033] To optimize the light converging effect and facilitate the manufacturing process, the cross-section of the first protrusion along the thickness direction of the display panel is preferably set as a trapezoid (i.e., a regular trapezoid), and the taper angle formed by its sidewall and bottom surface is less than or equal to 80 degrees and greater than 45 degrees. For example, it can be 46 degrees, 50 degrees, 60 degrees, 70 degrees or 80 degrees.

[0034] In one possible implementation, the first protrusion 210 (touch insulating layer 200) can be made of a high-refractive-index inorganic transparent material, specifically SiO, SiON, or SiNx. By adjusting the material composition, its refractive index can be stabilized between 1.7 and 2.0; for example, the refractive index can be 1.72, 1.75, 1.8, 1.9, 1.95, or 1.99. Alternatively, it can be an acrylic-based material doped with high-refractive-index particles, such as titanium dioxide particles.

[0035] In one possible implementation, to enhance insulation reliability, the touch insulation layer 200 may employ a multilayer film stack, wherein each film layer has a thickness greater than or equal to 0.3. m, and less than 0.6 m; for example, the thickness of each film layer can be 0.3 m. m, 0.35 m, 0.4 m, 0.45 m, 0.5 m or 0.55 m; the total thickness of the touch insulation layer is greater than or equal to 0.6. m, and less than 1.2 m, for example, 0.6 m, 0.7 m, 0.8 m, 0.9 m, 1.0 m or 1.15 m.

[0036] In one possible implementation, the planarization layer 300 can be made of a low-refractive-index organic transparent material, preferably polyimide. The refractive index of polyimide is typically between 1.49 and 1.53; for example, it can be 1.5, 1.51, or 1.52. Through molecular structure design, its refractive index can be lower than that of the first protrusion 210 material. To ensure good planarization and maintain a stable optical interface, the thickness of the planarization layer 300 is set to 3 to 10 micrometers, for example, 3 micrometers, 5 micrometers, or 10 micrometers.

[0037] In another embodiment of this application, the touch insulating layer 200 further includes a second protrusion 220, which is disposed around the first protrusion 210. A first touch trace 410 is disposed on the side of the second protrusion 220 near the light-emitting layer 100, and a second touch trace 420 is disposed on the side of the second protrusion away from the light-emitting layer.

[0038] In one possible implementation, the orthographic projection of the first touch trace 410 on the substrate 600 and the orthographic projection of the second touch trace 420 on the substrate 600 at least partially overlap.

[0039] In a preferred implementation, the orthographic projection of the first touch trace 410 on the substrate 600 and the orthographic projection of the second touch trace 420 on the substrate 600 completely overlap.

[0040] Based on the microlens structure described above, this embodiment further integrates touch functionality, and the layout of the touch wiring fully utilizes the patterned structure of the touch insulating layer 200.

[0041] like Figure 2 As shown, Figure 2 This is a top view of a display panel provided in an embodiment of this application; the touch insulating layer 200 forms a first protrusion 210 and a second protrusion 220. The second protrusion 220 is disposed around the first protrusion 210, that is, in the interval area between adjacent light-emitting units 120.

[0042] A first touch trace 410 is provided on the side of the second protrusion 220 closest to the light-emitting layer 100 (i.e., the bottom of the second protrusion 220), and a second touch trace 420 is provided on the side of the second protrusion 220 furthest from the light-emitting layer 100 (i.e., the top of the second protrusion 220). Furthermore, to achieve optimal touch sensitivity and signal stability, the orthographic projections of the first touch trace 410 and the second touch trace 420 on the substrate 600 completely overlap. This vertically aligned trace design makes the electric field distribution between the driving electrode and the sensing electrode more concentrated, effectively reducing parasitic capacitance between touch channels and improving the touch signal-to-noise ratio.

[0043] Based on the above embodiments, in another embodiment of this application, to further optimize optical performance and reduce reflection loss that may be caused by excessive refractive index difference between the first protrusion 210 and the planarization layer 300, this embodiment further provides a compensation layer 500 between the planarization layer 300 and the touch insulating layer 200. For example... Figure 3 As shown, Figure 3 This is a cross-sectional schematic diagram of another display panel provided in an embodiment of this application.

[0044] The refractive index of the compensation layer 500 is greater than that of the planarization layer 300, but less than that of the first protrusion 210. As a refractive index transition layer, the compensation layer 500 reduces light reflection at the interface, further improving light extraction efficiency. In this embodiment, the material of the compensation layer 500 is SiO, SiON, or SiNx, and its thickness is less than 1 mm. m, and greater than 0.3 m; for example, the thickness can be 0.35 m. m, 0.2 m, 0.3 m, 0.4 m, 0.5 m, 0.8 m or 0.9 m, which ensures optical performance without significantly increasing panel thickness.

[0045] The display panel provided in this embodiment creatively forms a microlens array structure by combining the first protrusion 210 of the high-refractive-index touch insulating layer 200 with the low-refractive-index planarization layer 300, fundamentally improving light extraction efficiency. Simultaneously, this structure cleverly accommodates vertically aligned touch traces, achieving a high degree of integration between optical and touch performance. Furthermore, it features a compact structure, good process compatibility, and is suitable for high-resolution, high-brightness, and low-power display products.

[0046] Based on the same inventive concept, such as Figure 4 As shown, Figure 4 This is a flowchart illustrating a display panel fabrication method provided in an embodiment of this application. This application also provides a display panel fabrication method comprising: S101. A light-emitting layer is prepared on one side of the substrate, the light-emitting layer comprising multiple light-emitting units; In the embodiments of this application, Figure 2 The display panel shown is a flexible OLED display panel. The light-emitting layer 100 includes a substrate 110, a pixel limiting layer 130, and light-emitting units 120 disposed between the pixel limiting layer 130. A plurality of light-emitting units 120 are arranged in an array on the substrate 110. Each light-emitting unit 120 constitutes a sub-pixel for emitting light of a specific color, such as red, green, or blue light. The light-emitting units 120 are separated from each other by the pixel limiting layer 130.

[0047] The light-emitting layer 100 of the flexible display panel also includes an encapsulation structure. In this embodiment, thin-film encapsulation technology is used, such as... Figure 2As shown, the encapsulation structure of the light-emitting layer 110 specifically includes a first inorganic encapsulation layer 140, an organic planarization layer 150, and a second inorganic encapsulation layer 160. The organic planarization layer 150 is formed on one side of the first inorganic encapsulation layer 140 by inkjet printing technology, which can play a planarization role.

[0048] S102. Prepare a touch layer and a touch insulating layer on the light-emitting side of the light-emitting layer.

[0049] In one possible implementation, the touch insulating layer 200 can be formed by chemical vapor deposition or by coating with an organic adhesive.

[0050] For example, when the touch insulating layer 200 is prepared by chemical vapor deposition, inorganic materials such as SiO, SiON or SiNx can be used to prepare the touch insulating layer 200; when the touch insulating layer 200 is prepared by coating with organic adhesive, acrylic materials doped with high refractive index particles can be used to prepare the touch insulating layer 200, and the doped high refractive index particles can be titanium dioxide particles.

[0051] In one possible implementation, to enhance insulation reliability, the touch insulation layer 200 may employ a multilayer film stack, wherein each film layer has a thickness greater than or equal to 0.3. m, and less than 0.6 m; for example, the thickness of each film layer can be 0.3 m. m, 0.35 m, 0.4 m, 0.45 m, 0.5 m or 0.55 m; the total thickness of the touch insulation layer is greater than or equal to 0.6. m, and less than 1.2 m, for example, 0.6 m, 0.7 m, 0.8 m, 0.9 m, 1.0 m or 1.15 m.

[0052] S103. The touch insulating layer is patterned to form multiple first protrusions; the first protrusions cover the light-emitting unit; In this embodiment, the touch insulating layer 200 can be achieved by dry etching, wet etching or exposure, with dry etching being preferred. For example, reactive ion etching or plasma etching can be used.

[0053] The touch insulating layer 200 includes a plurality of first protrusions 210, each of which corresponds to a light-emitting unit 120 below it. The touch insulating layer 200 is formed by a patterning process using a high refractive index material to create the plurality of first protrusions 210. Each first protrusion 210 corresponds vertically to a light-emitting unit 120 below it.

[0054] In one possible implementation, the orthographic projection of the first protrusion 210 on the substrate 600 covers the orthographic projection of the light-emitting unit 120 on the substrate 600, and the horizontal distance between the edge of the orthographic projection of the first protrusion 210 on the substrate 600 and the edge of the orthographic projection of the light-emitting unit 120 on the substrate 600 is in the range of 0-5. m.

[0055] In this embodiment, to ensure maximum collection of light emitted by the light-emitting unit 120, the horizontal distance between the edge of the first protrusion 210 and the edge of the light-emitting unit 120 is preferably 0 to 5 micrometers, for example, 0 micrometers, 2 micrometers, or 5 micrometers. It is understood that when this distance is 0, the first protrusion 210 is aligned with the edge of the light-emitting unit 120, forming the most compact optical coupling structure.

[0056] In one possible implementation, the first protrusion 210 has a trapezoidal cross-section along the thickness direction of the display panel, with a taper angle less than or equal to 80 degrees.

[0057] To optimize the light converging effect and facilitate manufacturing, the cross-section of the first protrusion 210 along the thickness direction of the display panel is preferably set as a trapezoid (i.e., a regular trapezoid), and the taper angle formed by its sidewall and bottom surface is less than or equal to 80 degrees and greater than 45 degrees. For example, it can be 46 degrees, 50 degrees, 60 degrees, 70 degrees or 80 degrees.

[0058] In one possible implementation, to enhance insulation reliability, the touch insulation layer 200 may employ a multilayer film stack, wherein each film layer has a thickness greater than or equal to 0.3. m, and less than 0.6 m; for example, the thickness of each film layer can be 0.3 m. m, 0.35 m, 0.4 m, 0.45 m, 0.5 m or 0.55 m; the total thickness of the touch insulation layer is greater than or equal to 0.6. m, and less than 1.2 m, for example, 0.6 m, 0.7 m, 0.8 m, 0.9 m, 1.0 m or 1.15 m.

[0059] S104. A planarization layer is formed on the side of the touch insulating layer away from the light-emitting layer, and the refractive index of the planarization layer is less than the refractive index of the first protrusion.

[0060] In this embodiment, the planarization layer 300 can be formed into a transparent film material by inkjet printing or PI coating process and then cured at high temperature or ultraviolet light.

[0061] In one possible implementation, the planarization layer 300 material can be a low-refractive-index organic transparent material, preferably polyimide. The refractive index of polyimide is typically between 1.49 and 1.53; for example, it can be 1.5, 1.51, or 1.52. Through molecular structure design, its refractive index can be lower than that of the first protrusion 210 material. To ensure good planarization and maintain a stable optical interface, the thickness of the planarization layer 300 is set to 3 to 10 micrometers (e.g., 3 micrometers, 5 micrometers, or 10 micrometers).

[0062] After the first protrusion 210 is formed, a planarization layer 300 is formed on the touch insulating layer 200. This planarization layer 300 covers the first protrusion 210, smoothing out surface undulations caused by the protruding structure, providing a smooth interface for subsequent film layers. Furthermore, the refractive index of the planarization layer 300 is lower than that of the first protrusion 210 formed on the touch insulating layer 200. Based on the above structure, each first protrusion 210 made of a high-refractive-index material and its contacting low-refractive-index planarization layer 300 together constitute a microlens unit. Its optical principle is as follows: Light emitted from the light-emitting unit enters the high-refractive-index first protrusion at a certain angle. When the light propagates to the interface between the first protrusion and the planarization layer 300, because the light travels from an optically denser medium (high refractive index) to an optically less dense medium (low refractive index), the large-angle light rays that would normally undergo total internal reflection at a planar interface have their incident angle reduced under the action of this convex structure. This allows more light rays to break through the critical angle of total internal reflection and exit. In short, this microlens structure converges light rays and collimates the exit direction, significantly reducing the total internal reflection loss within the panel, thereby greatly improving the light extraction efficiency of the display panel.

[0063] The solution adopted in this application embodiment utilizes a touch insulating layer 200 to form a plurality of first protrusions 210, and a planarization layer 300 covers the first protrusions 210. The refractive index of the first protrusions 210 is higher than that of the planarization layer 300. By means of the first protrusions 210 formed by the touch insulating layer 200 and the planarization layer 300, a microlens structure is formed, which can improve the luminous efficiency. Compared with the prior art, which requires covering the light-emitting unit 120 with organic high refractive index material and low refractive index material to form a microlens structure, this application embodiment uses the existing touch insulating layer 200 and planarization layer 300 to form a microlens structure, without increasing the cost of additional process materials, which can save the manufacturing cost of the display panel.

[0064] In another embodiment of this application, such as Figure 5 As shown, Figure 5 This is a schematic flowchart of a display panel fabrication method provided in an embodiment of this application. In step S102, a touch layer and a touch insulating layer are fabricated on the light-emitting side of the light-emitting layer. Specifically, this can be implemented as follows: S1021. A first touch trace is formed on the light-emitting side of the light-emitting layer, and a touch insulating layer is formed on one side of the first touch trace. The first touch trace surrounds the light-emitting unit.

[0065] In this embodiment, the first touch trace can be formed by first depositing a metal layer on one side of the light-emitting layer using a physical vapor deposition (PVD) device, and then etching the deposited metal layer using an etching process. The material of the first touch trace 410 can be molybdenum, and its thickness can be 0.2-0.4 mm. Between m, for example, it can be 0.21 m, 0.25 m, 0.28 m, 0.3 m, 0.35 m or 0.39 m.

[0066] In a preferred implementation, the above-mentioned S103, patterning the touch insulating layer to form multiple first protrusions, can be specifically implemented as follows: S1031. Etch the touch insulating layer between the first touch trace and the light-emitting unit to form a first protrusion covering the light-emitting unit and a second protrusion surrounding the first protrusion, the second protrusion covering the first touch trace.

[0067] In one possible implementation, in the touch insulating layer between the etched light-emitting units in S1031, a first protrusion covering the light-emitting units and a second protrusion surrounding the first protrusion are formed. After the second protrusion covers the first touch line, the system further includes: S105, a second touch trace is formed on the side of the second protrusion away from the light-emitting layer, and the orthographic projection of the first touch trace on the substrate and the orthographic projection of the second touch trace on the substrate at least partially overlap.

[0068] The second touch trace 420 is formed in the same way as the first touch trace 410, and can be referred to the relevant description in the above embodiments.

[0069] In a preferred implementation, the orthographic projection of the first touch trace 410 on the substrate 600 and the orthographic projection of the second touch trace 420 on the substrate 600 completely overlap.

[0070] Based on the microlens structure described above, this embodiment further integrates touch functionality, and the layout of the touch wiring fully utilizes the patterned structure of the touch insulating layer 200.

[0071] The touch insulating layer 200 forms a first protrusion 210 and a second protrusion 220. The second protrusion 220 is disposed around the first protrusion 210, that is, in the interval area between adjacent light-emitting units 120.

[0072] A first touch trace 410 is provided on the side of the second protrusion 220 closest to the light-emitting layer 100 (i.e., the bottom of the second protrusion 220), and a second touch trace 420 is provided on the side of the second protrusion 220 furthest from the light-emitting layer 100 (i.e., the top of the second protrusion 220). Furthermore, to achieve optimal touch sensitivity and signal stability, the orthographic projections of the first touch trace 410 and the second touch trace 420 on the light-emitting layer 100 completely overlap. This vertically aligned trace design makes the electric field distribution between the driving electrode and the sensing electrode more concentrated, effectively reducing parasitic capacitance between touch channels and improving the touch signal-to-noise ratio.

[0073] Based on the above embodiments, in another embodiment of this application, to further optimize optical performance and reduce reflection loss that may be caused by excessive refractive index difference between the first protrusion 210 and the planarization layer 300, this embodiment further provides a compensation layer 500 between the planarization layer 300 and the touch insulating layer 200. After forming the second touch trace on the side of the second protrusion away from the light-emitting layer, the method further includes: A compensation layer is formed on one side of the first protrusion and the second touch trace. The compensation layer is disposed between the planarization layer and the touch insulating layer. The refractive index of the compensation layer is greater than that of the planarization layer and less than that of the first protrusion. The refractive index of the compensation layer 500 is greater than that of the planarization layer 300 and less than that of the first protrusion 210. As a refractive index transition layer, the compensation layer 500 reduces light reflection at the interface, further improving light extraction efficiency. In this embodiment, the compensation layer is made of SiO, SiON, or SiNx, and its thickness is less than 1 μm and greater than 0.3 μm. m; for example, the thickness can be 0.35 m. m, 0.2 m, 0.3 m, 0.4 m, 0.5 m, 0.8 m or 0.9 m, which ensures optical performance without significantly increasing panel thickness.

[0074] The display panel provided in this embodiment creatively forms a microlens array structure by combining the first protrusion 210 of the high-refractive-index touch insulating layer 200 with the low-refractive-index planarization layer 300, fundamentally improving light extraction efficiency. Simultaneously, this structure cleverly accommodates vertically aligned touch traces, achieving a high degree of integration between optical and touch performance. Furthermore, it features a compact structure, good process compatibility, and is suitable for high-resolution, high-brightness, and low-power display products.

[0075] This application also provides a display device, including any of the display panels described in the above embodiments. The display device can be an electronic device such as a smartphone, tablet computer, or laptop computer.

[0076] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0077] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A display panel, characterized in that, include: Substrate; A light-emitting layer, disposed on one side of the substrate, includes multiple light-emitting units; A touch layer is disposed on the light-emitting side of the light-emitting layer, and includes a first touch trace and a second touch trace stacked sequentially. A touch insulating layer is disposed between the first touch trace and the second touch trace, and includes a plurality of first protrusions, the first protrusions covering the light-emitting unit; A planarization layer is provided, which covers the first protrusion and has a refractive index lower than that of the first protrusion.

2. The display panel according to claim 1, characterized in that, The touch insulating layer further includes a second protrusion, which is disposed around the first protrusion; the first touch trace is disposed on the side of the second protrusion closer to the light-emitting layer, and the second touch trace is disposed on the side of the second protrusion away from the light-emitting layer. Preferably, the orthographic projections of the first touch trace on the substrate and the orthographic projections of the second touch trace on the substrate at least partially overlap.

3. The display panel according to claim 2, characterized in that, The display panel further includes a compensation layer, which is disposed between the planarization layer and the touch insulating layer. The refractive index of the compensation layer is greater than that of the planarization layer and less than that of the first protrusion. Preferably, the thickness of the compensation layer is less than 1. m, and greater than 0.3 m; Preferably, the material of the compensation layer is SiO, SiON, or SiNx.

4. The display panel according to claim 3, characterized in that, The planarization layer is made of polyimide, and the thickness of the planarization film layer is 3-10 mm. m.

5. The display panel according to claim 4, characterized in that, The orthographic projection of the first protrusion on the substrate overlaps the orthographic projection of the light-emitting unit on the substrate, and the horizontal distance between the edge of the orthographic projection of the first protrusion on the substrate and the edge of the orthographic projection of the light-emitting unit on the substrate ranges from 0 to 5. m; The first protrusion has a trapezoidal cross-section along the thickness direction of the display panel, and the taper angle of the first protrusion is less than or equal to 80 degrees and greater than 45 degrees. Preferably, the material of the touch insulating layer is SiO, SiON, or SiNx; Preferably, the material of the touch insulating layer is an acrylic-based material doped with high refractive index particles; Preferably, the touch-sensitive insulating layer comprises multiple film layers, each film layer having a thickness greater than or equal to 0.

3. m, and less than 0.6 m; the thickness of the touch insulation layer is greater than or equal to 0.

6. m, and less than 1.2 m.

6. A method for manufacturing a display panel, characterized in that, include: A light-emitting layer is prepared on one side of a substrate, the light-emitting layer comprising a plurality of light-emitting units; A touch layer and a touch insulating layer are prepared on the light-emitting side of the light-emitting layer; The touch insulating layer is patterned to form a plurality of first protrusions; the first protrusions cover the light-emitting unit; A planarization layer is formed on the side of the touch insulating layer away from the light-emitting layer, and the refractive index of the planarization layer is less than the refractive index of the first protrusion.

7. The method according to claim 6, characterized in that, The touch layer includes a first touch trace and a second touch trace. The fabrication of the touch layer and the touch insulating layer on the light-emitting side of the light-emitting layer includes: The first touch trace is formed on the light-emitting side of the light-emitting layer, and the touch insulating layer is formed on one side of the first touch trace. The first touch trace surrounds the light-emitting unit. Preferably, the step of patterning the touch insulating layer to form a plurality of first protrusions includes: The touch insulating layer between the first touch trace and the light-emitting unit is etched to form a first protrusion covering the light-emitting unit and a second protrusion surrounding the first protrusion, the second protrusion covering the first touch trace.

8. The method according to claim 7, characterized in that, The etching of the touch insulating layer between the first touch trace and the light-emitting unit forms a first protrusion covering the light-emitting unit and a second protrusion surrounding the first protrusion. After the second protrusion covers the first touch trace, the method further includes: A second touch trace is formed on the side of the second protrusion away from the light-emitting layer, and the orthographic projections of the first touch trace on the substrate and the second touch trace on the substrate at least partially overlap.

9. The method according to claim 8, characterized in that, After forming the second touch path on the side of the second protrusion away from the light-emitting layer, the method further includes: A compensation layer is formed on one side of the first protrusion and the second touch trace. The compensation layer is disposed between the planarization layer and the touch insulating layer. The refractive index of the compensation layer is greater than that of the planarization layer and less than that of the first protrusion. Preferably, the thickness of the compensation layer is less than 1. And greater than 0.3 m; Preferably, the material of the compensation layer is SiO, SiON, or SiNx; Preferably, the planarization layer is made of polyimide, and the planarization film thickness is 3-10 mm. m.

10. The method according to claim 9, characterized in that, The orthographic projection of the first protrusion on the substrate overlaps the orthographic projection of the light-emitting unit on the substrate, and the horizontal distance between the edge of the orthographic projection of the first protrusion on the substrate and the edge of the orthographic projection of the light-emitting unit on the substrate ranges from 0 to 5. m; The first protrusion has a trapezoidal cross-section along the thickness direction of the display panel, and the taper angle of the first protrusion is less than or equal to 80 degrees and greater than 45 degrees. Preferably, the material of the touch insulating layer is SiO, SiON, or SiNx; Preferably, the touch-sensitive insulating layer comprises multiple film layers, each film layer having a thickness greater than or equal to 0.

3. m, and less than 0.6 m; the thickness of the touch insulation layer is greater than or equal to 0.

6. m, and less than 1.2 m.

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