Microhemisphere resonator lip edge batch polishing device and method

Abstract

The application discloses a kind of micro hemispherical resonator lip along batch polishing device and method, device includes: polishing equipment and mounting mechanism, the chassis of polishing equipment is horizontally rotated and is installed on rack, polishing disc is installed on chassis, main polishing disc is pitch disc by rosin and paraffin modification, micro hemispherical is inverted in the fixture bottom of mounting mechanism, fixture penetrates installation disc and is detachably connected with installation disc, multiple counterweights are corresponding with multiple fixtures, and counterweight is placed on the top of corresponding fixture, installation disc is placed on main polishing disc, and it is arranged with main polishing disc different shaft, driving mechanism is transmission connected with installation disc, for driving installation disc relative circumferential rotation Polishing disc rotation, to make the lip along of multiple micro hemispheres on installation disc and polishing disc mutual grinding.The micro hemispherical lip along flatness of the present application can be polished in batch once, and basically all micro hemispherical fine grinding scratch is removed.

Description

Technical Field

[0001] This invention relates to the field of inertial navigation technology, specifically to a batch polishing device and method for the lip of a micro-hemispherical resonator. Background Technology

[0002] A micro-hemispherical resonator is a high-precision quartz resonator. Its manufacturing process typically includes the following main steps: First, fused quartz sheets are thermoformed using a graphite mold to form a specific micro-hemispherical shell structure. After forming, excess lip material remains on the periphery of the resonator shell, which needs to be removed by machining to achieve the required height. This removal process generally combines rough grinding and fine grinding. After grinding, chipping, grinding marks, and a subsurface damage layer (microcracks, stress layers, with depths ranging from several micrometers to tens of micrometers) are inevitable on the lip. These defects can lead to reduced adhesion of subsequent coatings, film discontinuities, increased interface scattering, increased energy loss, as well as a decrease in Q value, frequency drift, and increased noise.

[0003] Therefore, the lip edge must be polished to remove chipping and scratches, improve flatness, surface accuracy and surface roughness, and minimize the subsurface damage layer, thereby ensuring stable electrical performance and low noise characteristics after coating.

[0004] Existing technologies generally employ conventional polishing equipment and bitumen discs to polish quartz products. Practice shows that when using conventional polishing machines to polish the lips of ground micro-hemispherical products in batches, the micro-hemisphericals are inevitably subjected to external forces during polishing due to clamping and other factors. These forces easily cause chipping or grinding tilting of the micro-hemispherical lips, thus affecting the quality factor Q value. Chinese invention patent application 202510368916.0 discloses a batch polishing device and method for micro-hemisphericals, which uses gravity polishing on a grooved bitumen disc to grind and polish the lips of micro-hemisphericals, solving the technical problems of chipping or grinding tilting caused by conventional polishing methods. However, further practice shows that this method cannot remove all the grinding marks on the micro-hemisphericals at once when the lip marks are deep after fine grinding. Furthermore, prolonged polishing time can easily lead to the micro-hemispherical lips colliding with the edge of the bitumen disc, resulting in chipping or poor parallelism of the lip. Therefore, this method is unlikely to improve the pass rate of batch micro-hemispherical lip polishing. Summary of the Invention

[0005] To address the problems in the background art, this invention proposes a batch polishing device and method for the lip of a micro-hemispherical resonator, which can achieve the flatness of the micro-hemispherical lip to meet design requirements through a single batch polishing process, and essentially removes all fine grinding scratches on the micro-hemispherical lip.

[0006] The present invention adopts the following technical solution: A batch polishing device for the lip edge of a micro-hemispherical resonator includes: a frame, a mounting structure, multiple counterweights, a drive mechanism, a chassis, and a polishing disc. The chassis is horizontally rotatably mounted on the frame, and the polishing disc is mounted on the chassis. The polishing disc includes a main polishing disc. The mounting mechanism includes a mounting disc and multiple fixtures. The micro-hemispherical resonator is inverted and placed at the bottom of the fixture. The fixture passes through the mounting disc and is detachably connected to the mounting disc. The multiple counterweights correspond one-to-one with the multiple fixtures, and the counterweights are placed on top of their respective fixtures. The mounting disc is placed on the main polishing disc and is arranged coaxially with the main polishing disc. The drive mechanism is mounted on the frame and is connected to the mounting plate without gravity. It is used to drive the mounting plate to rotate relative to the circumferentially rotating polishing plate, so that the lips of multiple micro-hemispherical surfaces on the mounting plate and the polishing plate rub against each other. The main polishing disc is made using the following method: Melt the asphalt, add rosin while stirring, and after the rosin and asphalt are evenly mixed, add paraffin wax and stir evenly to obtain a mixed liquid. Pour the mixed liquid into a shaping jig, cool it and take it out to obtain a polished blank. Make polishing grooves on the surface of the polished blank, and polish the surface of the polished blank with polishing grooves until its flatness is less than 5um.

[0007] Preferably, the mass ratio of asphalt, wax and rosin is 2.5-3.5:0.5-1.5:5-7.

[0008] Preferably, there are multiple polishing grooves, which are arranged at intervals along the circumference of the polishing blank, and each polishing groove extends radially along the polishing blank to penetrate the side wall of the polishing blank.

[0009] Preferably, the polishing disc further includes a secondary polishing disc, which is a polishing disc with a polishing surface made of polyurethane damping material.

[0010] Preferably, the frame is provided with a polishing tank, the chassis is placed in the polishing tank, and the frame is also provided with a liquid filling mechanism for spraying polishing liquid between the mounting plate and the polishing plate during the polishing process.

[0011] Preferably, the polishing liquid is a mixture of oxide powder and water, wherein the mass ratio of oxide powder to water in the mixture is 1:3-5.

[0012] Preferably, the drive mechanism includes a transmission rod and a drive component. The lower end of the transmission rod is connected to the mounting plate without gravity. The drive component is mounted on the frame and is connected to the transmission rod for driving the transmission rod to swing, thereby causing the mounting plate to rotate relative to the circumferentially rotating polishing disc.

[0013] Preferably, the transmission rod is connected to the mounting plate without gravity via a connecting assembly. The connecting assembly includes a bearing sleeve and a ball bearing. The bearing sleeve is fixed to the center of the upper surface of the mounting plate, and the ball bearing is fixed in the bearing sleeve. The upper part of the transmission rod is connected to the drive mechanism for transmission, and its lower end has a ball head. The ball head is suspended in the center hole of the ball bearing and is fitted with it with a small clearance.

[0014] As a general inventive concept, the present invention also provides a method for batch polishing of the lip edge of a micro-hemispherical resonator using the above-described apparatus, comprising the following steps: S1: Place the micro-hemispherical object upside down at the bottom of the fixture. Connect multiple fixtures with the upside-down micro-hemispherical objects through the mounting plate and detachably connect them to the mounting plate. Then place the counterweight on top of the corresponding fixture. S2: Install the main polishing disc onto the base plate, then place the mounting disc on the main polishing disc so that the inverted micro-hemispherical lip abuts against the main polishing disc. S3: Drive the main polishing disk to rotate, and at the same time drive the mounting disk to rotate relative to the circumferentially rotating main polishing disk, so that the lips of multiple micro-hemispherical surfaces on the mounting disk and the main polishing disk rub against each other until the flatness and scratches of the micro-hemispherical lips meet the design requirements.

[0015] Preferably, the method for batch polishing of the lip edge of the micro-hemispherical resonator further includes: S4: Replace the main polishing disc with a secondary polishing disc, the secondary polishing disc being a polishing disc with a polishing surface made of polyurethane damping material; and remove the counterweight block on the top of the fixture, drive the secondary polishing disc to rotate, and at the same time drive the mounting disc to rotate relative to the circumferentially rotating polishing disc, so that the secondary polishing disc polishes the lip edge of the micro-hemispherical, as well as the inner and outer circumferences of the lip edge, until the inner and outer circumferences of the lip edge form rounded corners.

[0016] Compared with the prior art, the advantages of the present invention are as follows: This invention improves the efficiency of lip surface flatness processing by adding rosin and beeswax / paraffin to asphalt in a certain proportion. The addition of rosin increases the hardness and elastic modulus of the asphalt disc, enhances the removal of scratches on the lip surface, reduces excessive softening and flow deformation at high temperatures, and provides a more uniform pressure distribution. The beeswax / paraffin has low adhesion and volatility, which significantly reduces the surface residue of the polishing disc, avoids the introduction of new surface scratches, and improves the roughness of the micro-hemispherical harmonic oscillator after polishing. At the same time, the melting point adjustment of the wax makes the working temperature of the disc surface more stable and reduces the impact of local thermal stress accumulation on the lip. Meanwhile, after the mounting disc is placed on the modified asphalt disc, the drive mechanism that drives the mounting disc to rotate is connected to the mounting disc in a weightless manner. Thus, after the modified asphalt disc and the mounting disc start to rotate, the mounting disc can perform self-weight polishing of batch micro-hemispherical lips, so that the modified asphalt disc and the micro-hemispherical lips can be polished at the same time, thereby greatly improving the flatness polishing efficiency of the micro-hemispherical lips.

[0017] When using the modified asphalt disc combined with self-weight polishing to polish the finely ground micro-hemispherical, the flatness of the lip edge of the finely ground micro-hemispherical can be improved from 5um to 1um within 30-60 minutes. The flatness is greatly improved, and the surface is basically free of scratches. Only in cases where the original surface has deep scratches, slight scratches may remain. Attached Figure Description

[0018] To facilitate understanding of the invention, it will be described in more detail with reference to the specific embodiments shown in the accompanying drawings. These drawings depict only typical embodiments of the invention and should not be considered as limiting the scope of protection of the invention.

[0019] Figure 1 This is a three-dimensional structural schematic diagram of the batch polishing device for the lip edge of a micro-hemispherical resonator according to an embodiment of the present invention.

[0020] Figure 2 This is a partial three-dimensional structural diagram of the batch polishing device for the lip edge of a micro-hemispherical resonator according to an embodiment of the present invention.

[0021] Figure 3 This is a partial three-dimensional exploded view of the batch polishing device for the lip edge of a micro-hemispherical resonator according to an embodiment of the present invention.

[0022] Figure 4 This is a schematic cross-sectional view of the fixture fixing the micro-hemispherical structure in an embodiment of the present invention. Detailed Implementation

[0023] The embodiments of the present invention are described below with reference to the accompanying drawings to enable those skilled in the art to better understand and implement the present invention. However, the listed embodiments are not intended to limit the present invention. In the absence of conflict, the following embodiments and the technical features in the embodiments can be combined with each other, wherein the same components are indicated by the same reference numerals.

[0024] like Figures 1-4 As shown, this embodiment provides a batch polishing device for the lip edge of a micro-hemispherical resonator, including a frame 11, a mounting structure, multiple counterweights 5, a drive mechanism, a chassis 9, and a polishing disc. The chassis 9 is horizontally mounted on the frame 11 via a rotation drive mechanism 14. The polishing disc is mounted on the chassis 9 and includes a main polishing disc 8. The mounting mechanism includes a mounting disc 3 and multiple fixtures 2. The micro-hemispherical 1 is inverted and placed at the bottom of the fixture 2. The fixture 2 passes through the mounting disc 3 and is detachably connected to the mounting disc 3. The multiple counterweights 5 correspond one-to-one with the multiple fixtures 2, and the counterweights 5 are placed on the top of the corresponding fixtures 2. The mounting disc 3 is placed on the main polishing disc 8 and is arranged coaxially with the main polishing disc 8. The drive mechanism is mounted on the frame 11 and is connected to the mounting plate 3 without gravity. It is used to drive the mounting plate 3 to rotate relative to the circumferentially rotating polishing plate, so that the lips of the multiple micro-hemispherical surfaces on the mounting plate 3 and the polishing plate rub against each other. The main polishing disk 8 is manufactured using the following method: Melt the asphalt and add rosin while stirring until the rosin and asphalt are evenly mixed. Then add paraffin wax and stir evenly to obtain a mixed liquid. Pour the mixed liquid into a shaping jig, cool it, and take it out to obtain a polished blank. Make polishing grooves on the surface of the polished blank. Use a mixture of oxide powder and water as polishing liquid and an ultra-smooth quartz base as a polishing disc to polish the surface of the polished blank with polishing grooves until its flatness is less than 5 μm.

[0025] In this embodiment, the mass ratio of asphalt, wax, and rosin is 2.5-3.5:0.5-1.5:5-7.

[0026] In this embodiment, multiple polishing grooves are provided, and the multiple polishing grooves are arranged at intervals along the circumference of the polishing blank. Each polishing groove extends radially along the polishing blank to penetrate the side wall of the polishing blank.

[0027] In this embodiment, the polishing disc also includes a secondary polishing disc, which is a polishing disc with a polishing surface made of polyurethane damping material.

[0028] In this embodiment, the frame 11 is provided with a polishing pool 13, the chassis 9 is placed in the polishing pool 13, and the frame 11 is also provided with a liquid injection mechanism for spraying polishing liquid between the mounting plate 3 and the polishing plate during the polishing process.

[0029] In this embodiment, the polishing liquid is a mixture of oxide powder and water, and the mass ratio of oxide powder to water in the mixture is 1:3-5.

[0030] In this embodiment, the driving mechanism includes a transmission rod 6 and a driving component 12. The lower end of the transmission rod 6 is connected to the mounting plate 3 without gravity. The driving component 12 is mounted on the frame 11 and is connected to the transmission rod 6 for driving the transmission rod 6 to swing, thereby driving the mounting plate 3 to rotate relative to the circumferentially rotating polishing plate.

[0031] Specifically, the transmission rod 6 is connected to the mounting plate 3 without gravity through a connecting assembly. The connecting assembly includes a bearing sleeve 4 and a ball bearing 7. The bearing sleeve 4 is fixed to the center of the upper surface of the mounting plate 3, and the ball bearing 7 is fixed in the bearing sleeve 4. The upper part of the transmission rod 6 is connected to the drive mechanism for transmission, and its lower end has a ball head 61. The ball head 61 is suspended in the center hole of the ball bearing 7 and is fitted with it with a small clearance.

[0032] The method for batch polishing of the lip edge of a micro-hemispherical resonator using the apparatus of this embodiment includes the following steps: S1: Place the micro-hemispherical 1 upside down at the bottom of the fixture 2, and connect multiple fixtures 2 with the micro-hemispherical 1 upside down through the mounting plate 3 and detachably connect them to the mounting plate 3. Then place the counterweight 5 on top of the corresponding fixture 2. S2: Install the main polishing disk 8 onto the base plate 9, and then place the mounting disk 3 on the main polishing disk 8 so that the lip of the inverted micro-hemispherical 1 abuts against the main polishing disk 8. S3: Drive the main polishing disk 8 to rotate, and at the same time drive the transmission rod 6 to swing, so as to drive the mounting disk 3 to rotate relative to the circumferentially rotating main polishing disk 8, so that the lips of the multiple micro-hemisphericals 1 on the mounting disk 3 and the main polishing disk 8 rub against each other until the flatness and scratches of the micro-hemispherical lips meet the design requirements.

[0033] S4: Replace the main polishing disc 8 with a secondary polishing disc, the secondary polishing disc being a polishing disc with a polishing surface made of polyurethane damping material; and remove the counterweight 5 on the top of the fixture 2, drive the secondary polishing disc to rotate, and simultaneously drive the transmission rod 6 to swing, so as to drive the mounting disc 3 to rotate relative to the circumferentially rotating polishing disc, so that the secondary polishing disc polishes the lip edge of the micro-hemispherical, as well as the inner and outer circumferences of the lip edge, until the inner and outer circumferences of the lip edge form rounded corners.

[0034] The specific implementation steps are as follows: 1) The thermoformed micro-hemispherical resonator 1 is bonded to the fixture 2, such as... Figure 4 As shown, referring to the applicant's Chinese utility model patent CN222958333U, it will not be repeated here; 2) Complete the rough grinding of the skirt of the micro-hemispherical oscillator so that the overall height of the micro-hemispherical harmonic oscillator reaches the specified value. For specific methods, please refer to the applicant's Chinese invention patent CN118559515B. 3) Complete the fine grinding of the lip edge of the micro-hemispherical structure to ensure that the height between the center anchor rod and the lip edge of the micro-hemispherical structure is within the tolerance range; 4) Complete the inner and outer chamfer grinding of the micro-hemispherical lip edge, check if there is any chipping on the lip edge. If there is chipping and the chipping is greater than 10um, the micro-hemispherical is returned to the fine grinding process in step 3). If the chipping is less than 10um, it is transferred for batch lip edge polishing. While the above processes are being performed, the preparation process for the main polishing pad 8 can be carried out: The main polishing disc 8 is made by mixing asphalt, beeswax / paraffin wax, and rosin in a certain ratio (3:1:6 in this example). The production process of the polishing disc is as follows: melt the asphalt at 90℃~120℃, add rosin in proportion while stirring, and stir for about 30 minutes until the rosin is completely and evenly mixed with the asphalt. Then add paraffin wax in proportion and stir for about 10 minutes. Pour the mixed liquid onto an aluminum disc containing a shaping jig, ensuring that the liquid level is 5~8mm higher than the aluminum disc. Stop pouring the liquid and wait for it to cool and solidify before removing the shaping jig.

[0035] 5) The main polishing disc 8 is radially grooved, with a groove width and depth of approximately 0.5~1mm. Conventional asphalt board grooving uses a crisscrossing grid pattern, with a groove depth and width of approximately 2mm. To accommodate the grinding of thin-walled micro-hemispherical surfaces, the original grooving method is unsuitable, as too many grooves or excessively wide grooves can easily cause chipping and damage to the micro-hemispherical surfaces during polishing. The radial grooving method allows the grinding fluid to flow normally into the fine grooves, preventing dry grinding between the micro-hemispherical edges and the main polishing disc 8, which would lead to accumulated grinding temperature and chipping. It also avoids the chipping and damage that can occur with excessive grooving during polishing.

[0036] 6) On an ultra-smooth quartz base (flatness typically ≤λ / 10), a mixture of micron-sized cerium oxide powder and water is used as the polishing fluid (cerium oxide powder to water mass ratio 1:4) to finish the main polishing disc 8. Finishing must be performed on a high-precision rotary polishing machine. The polishing disc undergoes irregular polishing motion through clamping and rotation, while the quartz base rotates circumferentially to improve the flatness of the main polishing disc 8. Polishing time is 2-4 hours. The flatness of the polishing disc is checked with colored powder; uniform color indicates the finishing is complete. Particles and fillers on the asphalt disc are cleaned. Compared to traditional alumina and silica powders, cerium oxide powder can not only be mechanically ground but also chemically react with the silicon-oxygen bonds on the glass surface to form an easily removable softening layer, achieving efficient and scratch-free polishing.

[0037] 7) Measure the flatness of the main polishing disk 8 using a coordinate measuring machine. If the flatness is greater than 5 μm, return to step 6). If it is qualified, install the main polishing disk 8 on the chassis 9 of the pneumatic precision polishing machine and fix it with 4 fastening screws 10. 8) Place the quartz mounting plate 3 on the main polishing plate 8, and then install the micro-hemispherical 1 and its fixing fixture 2 into the quartz mounting plate 3 to enable it to perform batch polishing. The quartz mounting plate 3 is equipped with a bearing sleeve 4, which is connected to the transmission rod 6 on the pneumatic precision polishing machine through the ball bearing 7 mounted on the bearing sleeve 4. At this time, adjust the air pressure applied to the transmission rod 6 to about 0.1~0.5Pa. 9) Add a counterweight 5 to the top of the micro-hemispherical fixture. Depending on the polishing rate, a counterweight made of copper or aluminum or other materials of different densities can be selected for polishing. The weight should be controlled between 20g and 40g, and materials that are prone to rust should be avoided. 10) Using a modified asphalt disc at a rate of 5~10 rev / min, use a polishing fluid (ratio of 1:5) prepared with cerium oxide with a particle size <1um and pure water for auxiliary polishing and heat dissipation. Polish the lips of the multiple micro-hemispherical discs for 30-60 minutes. At this time, the rotation speed of the fixed disc where the micro-hemispherical discs are located is 3~8 rev / min. Check whether there are scratches on the lips of the micro-hemispherical discs. If there are scratches, continue polishing; if there are no scratches or only slight scratches, proceed to step (11). 11) Transfer to another polishing base plate with the polyurethane damping cloth or replace the modified asphalt plate with the polishing plate with the polyurethane damping cloth. On the same principle, place the quartz grinding mounting plate 3 with the micro-hemispherical on the polishing base plate. Polish for 10 to 15 minutes at a rate of 60 to 80 rev / min without adding the counterweight 5. At this time, the rotation speed of the fixed plate where the micro-hemispherical is located is 40 to 60 rev / min.

[0038] This invention relates to a device and method for batch polishing of the lip edge of a micro-hemispherical object using a modified asphalt disc combined with gravity polishing. The main innovations are as follows: (1) Rosin and beeswax / paraffin are added to the asphalt in a certain proportion. The addition of rosin increases the hardness and elastic modulus of the asphalt disc, enhances the removal of scratches on the lip surface, and reduces excessive softening and flow deformation at high temperature, providing a more uniform pressure distribution, thereby improving the processing efficiency of the lip surface flatness. Beeswax / paraffin has low adhesion and volatility, which significantly reduces the surface residue of the polishing disc, avoids the introduction of new surface scratches, improves the roughness of the micro-hemispherical harmonic oscillator after polishing, and at the same time, the melting point adjustment of the wax makes the working temperature of the disc surface more stable, reducing the impact of local thermal accumulation stress on the lip. Meanwhile, after the mounting disc is placed on the modified asphalt disc, the drive mechanism that drives the mounting disc to rotate is connected to the mounting disc in a weightless manner. Thus, after the modified asphalt disc and the mounting disc start to rotate, the mounting disc can perform self-weight polishing of batch micro-hemispherical lips, so that the modified asphalt disc and the micro-hemispherical lips can be polished at the same time, thereby greatly improving the flatness polishing efficiency of the micro-hemispherical lips.

[0039] When polishing the finely ground micro-hemispherical using the modified asphalt disc combined with self-weight polishing, the flatness of the lip edge of the finely ground micro-hemispherical can be improved from 5um to 1um within 30-60 minutes. Compared with patent application 202510368916.0, the flatness is significantly improved (the unit in 202510368916.0 is incorrect; um is actually mm). Furthermore, the surface is basically free of scratches, with only slight scratches remaining if the original surface has deep scratches.

[0040] (2) The micro hemispherical resonator after being polished with modified asphalt discs is batch polished with polyurethane discs. While not damaging the flatness of the lip edge, it can further polish the slight scratches on the lip edge, eliminate the scratches and shallow sub-damage layer, and the polyurethane material will wrap the inner and outer circumferences of the lip edge, thereby polishing the inner and outer circumferences of the lip edge so that the inner and outer circumferences of the lip edge form rounded corners, thereby avoiding the inner and outer circumferences of the lip edge being too sharp and scratching the electrode surface during subsequent assembly, which would affect the performance of the hemispherical resonator gyroscope after assembly.

[0041] (3) Radial grooving of modified asphalt discs, compared with conventional crisscrossing grid grooving, can ensure that grinding fluid flows normally into the small grooves, avoid dry grinding between the edge of the micro-hemispherical and the polishing disc, and prevent the accumulation of grinding temperature and edge chipping; it can also avoid excessive grooving, which can cause the micro-hemispherical to chip and be damaged during the grinding and polishing process.

[0042] (4) During the polishing process, cerium oxide powder is used as the polishing medium. Compared with traditional alumina and silicon oxide powder, it can not only be mechanically ground, but also react chemically with the silicon-oxygen bonds on the glass surface to form an easily removable softening layer, thereby achieving efficient and traceless polishing and enhancing the ability to remove the subsurface damage layer on the lip edge.

[0043] The embodiments described above are merely preferred embodiments of the present invention. The terms "in one embodiment," "in another embodiment," "in yet another embodiment," or "in still another embodiment" used in this specification all refer to one or more of the same or different embodiments according to this disclosure. Ordinary variations and substitutions made by those skilled in the art within the scope of the present invention should be included within the protection scope of the present invention.

Claims

1. A batch polishing device for the lip edge of a micro-hemispherical resonator, characterized in that, include: The machine includes a frame (11), a mounting structure, multiple counterweights (5), a drive mechanism, a chassis (9), and a polishing disc. The chassis (9) is horizontally rotatably mounted on the frame (11). The polishing disc is mounted on the chassis (9) and includes a main polishing disc (8). The mounting mechanism includes a mounting disc (3) and multiple fixtures (2). A micro-hemispherical object (1) is placed upside down at the bottom of the fixture (2). The fixture (2) passes through the mounting disc (3) and is detachably connected to the mounting disc (3). Multiple counterweights (5) correspond one-to-one with multiple fixtures (2), and the counterweights (5) are placed on the top of the corresponding fixtures (2). The mounting disc (3) is placed on the main polishing disc (8) and is arranged coaxially with the main polishing disc (8). The drive mechanism is mounted on the frame (11) and is connected to the mounting plate (3) without gravity. It is used to drive the mounting plate (3) to rotate relative to the circumferentially rotating polishing plate, so that the lips of the multiple micro-hemispherical surfaces on the mounting plate (3) and the polishing plate rub against each other. The main polishing disk (8) is made by the following method: Melt the asphalt, add rosin while stirring, and after the rosin and asphalt are evenly mixed, add paraffin wax and stir evenly to obtain a mixed liquid. Pour the mixed liquid into a shaping jig, cool it and take it out to obtain a polished blank. Make polishing grooves on the surface of the polished blank, and polish the surface of the polished blank with polishing grooves until its flatness is less than 5um.

2. The batch polishing device for the lip edge of a micro-hemispherical resonator according to claim 1, characterized in that, The mass ratio of asphalt, wax, and rosin is 2.5-3.5:0.5-1.5:5-7.

3. The batch polishing device for the lip edge of a micro-hemispherical resonator according to claim 1, characterized in that, The polishing groove is provided with multiple grooves, which are arranged at intervals along the circumference of the polishing blank. Each groove extends radially along the polishing blank to penetrate the side wall of the polishing blank.

4. The batch polishing apparatus for the lip edge of a micro-hemispherical resonator according to any one of claims 1-3, characterized in that, The polishing disc also includes a secondary polishing disc, which is a polishing disc with a polishing surface made of polyurethane damping material.

5. The batch polishing device for the lip edge of a micro-hemispherical resonator according to claim 4, characterized in that, The frame (11) is provided with a polishing pool (13), and the chassis (9) is placed in the polishing pool (13). The frame (11) is also provided with a liquid injection mechanism for spraying polishing liquid between the mounting plate (3) and the polishing plate during the polishing process.

6. The batch polishing device for the lip edge of a micro-hemispherical resonator according to claim 5, characterized in that, The polishing fluid is a mixture of oxide powder and water, wherein the mass ratio of oxide powder to water in the mixture is 1:3-5.

7. The batch polishing device for the lip edge of a micro-hemispherical harmonic oscillator according to any one of claims 1-3, wherein the driving mechanism includes a transmission rod (6) and a driving component (12), the lower end of the transmission rod (6) is connected to the mounting plate (3) without gravity, and the driving component (12) is mounted on the frame (11) and is connected to the transmission rod (6) for driving the transmission rod (6) to swing so as to drive the mounting plate (3) to rotate relative to the circumferentially rotating polishing plate.

8. The batch polishing device for the lip edge of a micro-hemispherical resonator according to claim 7, characterized in that, The transmission rod (6) is connected to the mounting plate (3) without gravity through the connecting assembly. The connecting assembly includes a bearing sleeve (4) and a ball bearing (7). The bearing sleeve (4) is fixed to the center of the upper surface of the mounting plate (3), and the ball bearing (7) is fixed in the bearing sleeve (4). The upper part of the transmission rod (6) is connected to the drive mechanism for transmission, and its lower end has a ball head (61). The ball head (61) is suspended in the center hole of the ball bearing (7) and is fitted with it with a small clearance.

9. A method for batch polishing of the lip edge of a micro-hemispherical harmonic oscillator using the apparatus as described in any one of claims 1-8, characterized in that, Includes the following steps: S1: Place the micro-hemispherical (1) upside down at the bottom of the fixture (2), insert multiple fixtures (2) with the micro-hemispherical (1) upside down through the mounting plate (3) and detachably connect them to the mounting plate (3), and then place the counterweight (5) on top of the corresponding fixture (2). S2: Install the main polishing disk (8) onto the base plate (9), and then place the mounting disk (3) onto the main polishing disk (8) so that the lip of the inverted micro-hemispherical (1) abuts against the main polishing disk (8). S3: Drive the main polishing disk (8) to rotate, and at the same time drive the mounting disk (3) to rotate relative to the circumferentially rotating main polishing disk (8), so that the lips of multiple micro-hemisphericals (1) on the mounting disk (3) and the main polishing disk (8) rub against each other until the flatness and scratches of the micro-hemispherical lips meet the design requirements.

10. The method for batch polishing the lip edge of a micro-hemispherical resonator according to claim 9, characterized in that, Also includes: S4: Replace the main polishing disc (8) with a secondary polishing disc, the secondary polishing disc being a polishing disc with a polishing surface made of polyurethane damping material; and remove the counterweight (5) on the top of the fixture (2), drive the secondary polishing disc to rotate, and at the same time drive the mounting disc (3) to rotate relative to the circumferentially rotating polishing disc, so that the secondary polishing disc polishes the lip edge of the micro-hemispherical, as well as the inner and outer circumferences of the lip edge, until the inner and outer circumferences of the lip edge form rounded corners.

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