A method and system for fabricating a differentiated precision polymer optical waveguide

Abstract

The application relates to the technical field of laser printing, and provides a preparation method and system of a differential-precision polymer optical waveguide, which comprises the following steps: constructing a first printing atlas, a second printing atlas and a coordinate difference value set; constructing a first movement set of a three-axis large-stroke displacement table and a second movement set of a three-axis piezoelectric displacement table; constructing a first printing parameter set of a DMD spatial light modulator printing subsystem and a second printing parameter set of a femtosecond laser printing subsystem based on the printing height of a to-be-printed substrate; controlling the DMD spatial light modulator printing subsystem to print the to-be-printed substrate; constructing a printing movement set and a printing point cloud data conversion set based on the second printing atlas, the coordinate difference value set, a rotation matrix and a translation matrix; and controlling the femtosecond laser printing subsystem to print the to-be-printed substrate. The preparation method of the differential-precision polymer optical waveguide can be used for processing the differential-precision polymer optical waveguide while ensuring the printing efficiency and precision.

Description

Technical Field

[0001] This application relates to the field of laser printing technology, and in particular to a method and system for fabricating a polymer optical waveguide with differentiated precision. Background Technology

[0002] Polymer optical waveguides, using organic polymers as their core material, are fundamental optical devices that utilize the principle of total internal reflection to constrain, transmit, and control optical signals. They are key components in integrated photonics, optical communication, and optical sensing. Compared to inorganic waveguides such as quartz, silicon, and lithium niobate, polymer optical waveguides offer advantages such as simple fabrication processes, low cost, customizable material properties, ease of integration, good compatibility, and unique mechanical and physical properties. With the development of organic polymer materials science, integrated photonics, and micro / nano fabrication technologies, polymer optical waveguides have broad application prospects in short-distance optical interconnects, consumer electronics, biosensing, and flexible photonics.

[0003] Among existing polymer optical waveguide fabrication technologies, surface projection lithography and femtosecond laser direct writing each have their advantages and disadvantages. While surface projection lithography offers advantages such as high processing efficiency and low cost, its processing accuracy is limited by the pixel size of the DMD (Digital Modulated Mask), making it difficult to achieve fine printing of high-precision submicron structures. Furthermore, pixel jagged edges are prone to appearing at the processing edges, resulting in lower processing accuracy and surface flatness. Although femtosecond laser direct writing can achieve nanoscale high-precision three-dimensional optical waveguide structure fabrication, this technology mainly uses a point-by-point scanning method, resulting in low processing efficiency and making it unsuitable for printing large-size structures. While the simple combination of DMD surface projection lithography and femtosecond laser direct writing on the market combines the advantages of both technologies to some extent, it suffers from disadvantages such as high processing alignment difficulty and low control coordination, making it difficult to achieve synergistic optimization of processing accuracy, processing size, and processing efficiency, thus limiting the fabrication of polymer optical waveguides with differentiated precision. Summary of the Invention

[0004] This application provides a method and system for fabricating polymer optical waveguides with differentiated precision, in order to solve the problem of printing efficiency and precision compatibility when fabricating polymer optical waveguides with differentiated precision in the integrated processing of digital micromirror device projection and femtosecond laser direct writing.

[0005] The first aspect of this application provides a method for fabricating a polymer optical waveguide with differentiated precision, comprising: segmenting a printed pattern to construct a first printed pattern set, a second printed pattern set, and a coordinate difference set; the first printed pattern set is a pattern set for printing operations performed by a DMD spatial light modulator printing subsystem, and the second printed pattern set is a pattern set for printing operations performed by a femtosecond laser printing subsystem; the first printed pattern set corresponds to the second printed pattern set, and the coordinate difference set is a set of coordinate differences between the plane containing the center of the first printed pattern in the first printed pattern set and the plane containing the center of the second printed pattern in the corresponding second printed pattern set; constructing a first movement set of a triaxial large-stroke displacement stage and a second movement set of a triaxial piezoelectric displacement stage; the first movement set is a dataset of movement of the triaxial large-stroke displacement stage in the X1 and Y1 axis directions, and the second movement set is a dataset of movement compensation of the triaxial piezoelectric displacement stage in the X2 and Y2 axis directions; wherein, the X1 and Y1 axes are the triaxial large-stroke displacement stage... The coordinate axes in the coordinate system are X2 and Y2, which are the coordinate axes in the coordinate system of the triaxial piezoelectric displacement stage. Based on the printing height of the substrate to be printed, a first printing parameter set for the DMD spatial light modulator printing subsystem and a second printing parameter set for the femtosecond laser printing subsystem are constructed. The DMD spatial light modulator printing subsystem is controlled to print the substrate to be printed according to the first printing parameter set, the first printing atlas, the first movement set, and the second movement set. Based on the second printing atlas, the coordinate difference set, the rotation matrix, and the translation matrix, a printing movement set and a printing point cloud data conversion set are constructed. The printing movement set is the dataset of the movement of the triaxial large-stroke displacement stage in the X1 and Y1 axes when the femtosecond laser printing subsystem performs the printing operation. The printing point cloud data conversion set is the dataset of the printing points of the femtosecond laser printing subsystem. The triaxial large-stroke displacement stage and the femtosecond laser printing subsystem are controlled to print the substrate to be printed according to the first movement set, the printing movement set, and the printing point cloud data conversion set.

[0006] In some feasible implementations, the printed graphic is segmented to construct a first printed graphic set, a second printed graphic set, and a coordinate difference set. This includes: segmenting the printed graphic by combining the pixel size of the DMD spatial light modulator, the chip resolution, and the medium magnification of the objective lens to construct the first printed graphic set; and constructing the second printed graphic set and the coordinate difference set based on the first printed graphic set.

[0007] In some feasible implementations, constructing a second print set and a coordinate difference set based on a first print set includes: constructing a subset of femtosecond print patterns corresponding to the first print patterns in the first print set; each first print pattern corresponds to a subset of femtosecond print patterns, and the subset of femtosecond print patterns contains second print patterns; determining a subset of coordinate difference vectors based on the center coordinates of the first print patterns and the center coordinates of each second print pattern in the subset of femtosecond print patterns; the subset of coordinate difference vectors contains multiple center coordinate difference vectors, which are the difference vectors between the center coordinates of the first print pattern and the center coordinates of the second print pattern; constructing a second print set based on the subset of femtosecond print patterns; and constructing a coordinate difference set based on the subset of coordinate difference vectors.

[0008] In some feasible implementations, constructing a first set of motion for a triaxial large-stroke displacement stage and a second set of motion for a triaxial piezoelectric displacement stage includes: printing a first displacement calibration feature map set for the triaxial large-stroke displacement stage; the first displacement calibration feature map set includes a first displacement calibration feature map S00, a second displacement calibration feature map S01, and a third displacement calibration feature map S10; wherein, the short side of the second displacement calibration feature map S01 is adjacent to and fitted with the short side of the first displacement calibration feature map S00, the long side of the second displacement calibration feature map S01 is aligned with the long side of the first displacement calibration feature map S00, and the long side of the third displacement calibration feature map S10 is adjacent to and fitted with the long side of the first displacement calibration feature map S00. The short side of the third displacement calibration feature map S10 is aligned with the short side of the first displacement calibration feature map S00; the first compensation data of the triaxial large-stroke displacement stage is determined based on the first printing distance, and the second compensation data of the triaxial large-stroke displacement stage is determined based on the second printing distance; the first printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the second displacement calibration feature map S01; the second printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the third displacement calibration feature map S10; the second displacement calibration feature map set of the triaxial piezoelectric displacement stage is printed by combining the first compensation data and the second compensation data; the second displacement calibration feature map set includes the first... Four displacement calibration feature maps S00', S01', and S10' are defined; wherein, the short side of the fifth displacement calibration feature map S01' is adjacent to the short side of the fourth displacement calibration feature map S00', the long side of the fifth displacement calibration feature map S01' is aligned with the long side of the fourth displacement calibration feature map S00', the long side of the sixth displacement calibration feature map S10' is adjacent to the long side of the fourth displacement calibration feature map S00', and the short side of the sixth displacement calibration feature map S10' is aligned with the short side of the fourth displacement calibration feature map S00'; the third compensation data of the triaxial piezoelectric displacement stage is determined based on the third printing distance, and the triaxial... The fourth compensation data of the piezoelectric displacement stage; the third printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the fifth displacement calibration feature map S01'; the fourth printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the sixth displacement calibration feature map S10'; obtain the planar orientation rotation angle; the planar orientation rotation angle is the angle between the horizontal axis of the coordinate plane where the projection image of the DMD spatial light modulator is located and the horizontal axis of the coordinate plane where the three-axis large stroke displacement stage is located; determine the first movement set based on the planar orientation rotation angle, the first compensation data and the second compensation data; determine the second movement set based on the third compensation data and the fourth compensation data.

[0009] In some feasible implementations, a printing motion set and a printing point cloud data transformation set are constructed based on the second printing atlas, the coordinate difference set, the rotation matrix, and the translation matrix. These include: constructing a femtosecond printing point cloud dataset based on the second printing atlas; constructing a printing motion set by combining the second printing atlas and the coordinate difference set; constructing a femtosecond printing point cloud data transformation set by combining the rotation matrix, the translation matrix, and the femtosecond printing point cloud dataset; and the femtosecond printing point cloud data transformation set corresponds to the femtosecond printing point cloud dataset.

[0010] In some feasible implementations, a femtosecond printed point cloud dataset is constructed based on the second printed image set, including: converting the second printed image set into a corresponding grayscale image set; the grayscale image set contains multiple grayscale images; performing single-pixel grayscale value conversion on the multiple grayscale images to obtain a grayscale value set; and combining the grayscale value set with the center coordinates of the second printed image to construct the femtosecond printed point cloud dataset.

[0011] In some feasible implementations, a printing motion set is constructed by combining the second printing atlas and the coordinate difference set, including: combining the center coordinate difference and the planar orientation rotation angle in the coordinate difference set to determine the amount of movement of the three-axis large stroke displacement stage in the X1 and Y1 axis directions; the amount of movement corresponds to the center coordinate difference vector; and a printing motion set is constructed based on multiple amounts of movement.

[0012] In some feasible implementations, a femtosecond printing point cloud data conversion set is constructed by combining rotation matrices, translation matrices, and femtosecond printing point cloud datasets. This includes: controlling a three-axis large-stroke displacement stage to move from the DMD printing focus point position of the DMD spatial light modulator printing subsystem to the femtosecond printing focus point position of the femtosecond laser printing subsystem according to rigid displacement parameters, and printing a rectangular structure of a preset length; the rigid displacement parameters include a first-direction spacing, a second-direction spacing, and a third-direction spacing. The first-direction spacing is the distance between the DMD printing focus point and the femtosecond printing focus point along the X1 axis, and the second-direction spacing is the distance between the DMD printing focus point and the femtosecond printing focus point along the X1 axis. The distance between the focal points and the femtosecond printing focal points along the Y1 axis is determined, and the distance along the third axis is the distance between the focal points of the DMD printing focal points and the femtosecond printing focal points along the Z1 axis. The rotation angle for the point cloud data rotation transformation during printing by the femtosecond laser printing subsystem is determined. The rotation angle is the sum of the planar orientation rotation angle and the rotation compensation angle, and the rotation compensation angle is the angle between the long side of the rectangular structure and the long side of the aligned feature graphic. The rotation matrix is ​​determined based on the rotation angle. The translation matrix is ​​determined by combining the rotation angle and the center coordinates of the second printed graphic. The femtosecond printing point cloud dataset is transformed using the rotation matrix and the translation matrix to obtain the femtosecond printing point cloud data transformation set.

[0013] The method for fabricating polymer optical waveguides with differentiated precision provided in the first aspect of this application achieves high-precision and high-efficiency differentiated fabrication of polymer optical waveguides through the synergistic cooperation of a femtosecond laser printing subsystem and a DMD spatial light modulator printing subsystem. The femtosecond laser printing subsystem, with its ultrashort pulse characteristics, can accurately shape fine structures at the micro-nano scale, meeting the stringent requirements for processing precision in the core region of the optical waveguide. The DMD spatial light modulator printing subsystem, through rapid modulation of a patterned beam, utilizes its large field of view and high throughput to quickly complete the shaping of the waveguide cladding and complex three-dimensional macroscopic structures. The complementary advantages of both significantly improve fabrication efficiency and reduce costs, enabling a balance between printing efficiency and precision when fabricating polymer optical waveguides with differentiated precision.

[0014] The second aspect of this application provides a fabrication system for differentiated precision polymer optical waveguides, comprising: a femtosecond laser printing subsystem including: a femtosecond light source assembly configured to emit a femtosecond laser; a first focusing assembly disposed in the optical path of the femtosecond light source assembly and configured to control the focusing of the femtosecond laser; a first beam splitting assembly disposed opposite to the first focusing assembly and configured to split the femtosecond laser; an illumination assembly disposed opposite to the first beam splitting assembly and configured to provide illumination; and a projection assembly disposed opposite to the first focusing assembly and located between the first focusing assembly and the substrate to be printed, configured to project the femtosecond laser; and a DMD spatial light modulator printing subsystem including: a DMD light source module configured to emit a printing laser; and a DMD spatial light modulator... A modulator, positioned in the optical path of the DMD light source module, is configured to receive and modulate the printing laser to generate a patterned beam; a lens module, positioned in the optical path of the DMD spatial light modulator, is configured to calibrate the optical path of the patterned beam; a second focusing component, positioned opposite the illumination component, is configured to focus the printing laser; a second beam splitter, positioned opposite the second focusing component, is configured to split the patterned beam; a medium-magnification objective, positioned opposite the second focusing component, is configured to project the patterned beam onto the substrate to be printed; a three-axis large-stroke stage is positioned opposite the projection component and the medium-magnification objective, and is configured to move along three axes to drive the substrate to be printed to be perpendicularly aligned with the projection component or the medium-magnification objective.

[0015] In some feasible implementations, the femtosecond source component includes: a femtosecond laser configured to generate a femtosecond laser; a femtosecond power modulator disposed opposite to the femtosecond laser and configured to modulate the power of the femtosecond laser; a beam expanding and shaping module disposed in the optical path of the femtosecond laser and configured to expand and shape the femtosecond laser beam; a high-speed galvanometer disposed in the optical path of the beam expanding and shaping module and configured to control the processing trajectory of the femtosecond laser; and a lens focusing module disposed in the optical path of the high-speed galvanometer and configured to focus the femtosecond laser beam.

[0016] In some feasible implementations, the first focusing component includes a first focusing detection module, a first high-precision CCD observation camera, and a high-precision uniaxial piezoelectric displacement stage; the first beam splitting component includes a first beam splitter and a second beam splitter; the fabrication system for the differentiated precision polymer optical waveguide also includes a first dichroic mirror; wherein, the illumination component, the second beam splitter, the first beam splitter, the first dichroic mirror, the high-precision uniaxial piezoelectric displacement stage, and the projection component are arranged sequentially, and the second beam splitter is arranged opposite to the first focusing detection module, and the first beam splitter is arranged opposite to the first high-precision CCD observation camera.

[0017] In some feasible implementations, the second focusing component includes a second focusing detection module, a second high-precision CCD observation camera, a triaxial piezoelectric displacement stage, and a high-precision laser ranging module; the second beam splitting component includes a third beam splitter and a fourth beam splitter; the fabrication system for the differentiated precision polymer optical waveguide also includes a second dichroic mirror; wherein, the illumination component, the fourth beam splitter, the third beam splitter, the second dichroic mirror, the triaxial piezoelectric displacement stage, and the medium-magnification objective lens are arranged sequentially, and the fourth beam splitter is arranged opposite to the second focusing detection module, the third beam splitter is arranged opposite to the second high-precision CCD observation camera, and the second dichroic mirror is arranged opposite to the lens module.

[0018] The differential precision polymer optical waveguide fabrication system provided in the second aspect of this application is used to perform the differential precision polymer optical waveguide fabrication method. Therefore, its beneficial technical effects can be found in the first aspect, and will not be repeated here. Attached Figure Description

[0019] To more clearly illustrate the technical solution of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the structure of the first differentiated precision polymer optical waveguide fabrication system provided in the embodiments of this application; Figure 2 This is a schematic diagram of the fabrication system for the second type of differentiated precision polymer optical waveguide provided in the embodiments of this application; Figure 3 This is a schematic diagram of the fabrication system for the third type of differentiated precision polymer optical waveguide provided in the embodiments of this application; Figure 4 This is a schematic flowchart of a method for fabricating a polymer optical waveguide with differentiated precision provided in an embodiment of this application; Illustration markings: 1. Femtosecond light source assembly; 101. Femtosecond laser; 102. Femtosecond power modulator; 103. Beam expander and shaping module; 104. High-speed galvanometer; 105. Lens focusing module; 2. First focusing assembly; 201. First focusing detection module; 202. First high-precision CCD observation camera; 203. High-precision uniaxial piezoelectric displacement stage; 3. First beam splitter assembly; 301. First beam splitter; 302. Second beam splitter; 4. Illumination components; 5. Projection components; 6. DMD light source module; 7. DMD spatial light modulator; 8. Lens module; 9. Second focusing assembly; 901. Second focusing detection module; 902. Second high-precision CCD observation camera; 903. Triaxial piezoelectric displacement stage; 904. High-precision laser ranging module; 10. Second beam splitter assembly; 10a. Third beam splitter; 10b. Fourth beam splitter; 11. Medium magnification objective lens; 12. Three-axis large-stroke displacement stage; 13. First dichroic mirror; 14. Second dichroic mirror; 15. System control panel; 16. Printing stage; J. Substrate to be printed. Detailed Implementation

[0021] The technical solutions of the embodiments of this application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. Other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are all within the protection scope of this application.

[0022] In the following description, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0023] Furthermore, in this application, directional terms such as "upper," "lower," "inner," and "outer" are defined relative to the indicated placement of the components in the accompanying drawings. It should be understood that these directional terms are relative concepts, used for relative description and clarification, and can change accordingly depending on the placement of the components in the accompanying drawings.

[0024] To facilitate the explanation of the technical solution of this application, some concepts involved in this application will be explained first below.

[0025] Maskless Projection Stereolithography (MPSL) is a photopolymerization 3D printing technology that uses a digital micromirror device (DMD) as its core to project patterned planar ultraviolet light onto a photosensitive resin and stack them into a three-dimensional solid through a layer-by-layer curing process.

[0026] Femtosecond laser printing is a form of micro-nano printing technology based on the instantaneous interaction between femtosecond ultrashort pulse lasers and materials.

[0027] Polymer optical waveguides are optical waveguide structures made from polymer materials that rely on the principle of total internal reflection to confine and transmit optical signals. Using organic polymers as the core material, polymer optical waveguides are fundamental optical devices that achieve optical signal confinement, transmission, and control through the principle of total internal reflection. They are key basic components in integrated photonics, optical communication, and optical sensing. Compared to inorganic optical waveguides such as quartz, silicon, and lithium niobate, polymer optical waveguides have advantages such as simple fabrication processes, low cost, customizable material properties, ease of integration, good compatibility, and unique mechanical and physical properties. With the development of organic polymer materials science, integrated photonics, and micro / nano fabrication technology, polymer optical waveguides have broad application prospects in short-distance optical interconnects, consumer electronics, biosensing, and flexible photonics.

[0028] To address the issue of printing efficiency and accuracy compatibility when fabricating polymer optical waveguides with varying precision in integrated digital micromirror device (DMD) projection and femtosecond laser direct writing processes, see [reference needed]. Figure 1 As shown in the embodiment of this application, the fabrication system for differentiated precision polymer optical waveguides may include a femtosecond laser printing subsystem, a DMD spatial light modulator printing subsystem, and a triaxial large-stroke displacement stage 12.

[0029] The femtosecond laser printing subsystem is used to fabricate high-precision micro-nano structures on the substrate J using femtosecond laser technology; the DMD spatial light modulator printing subsystem is used to fabricate large-scale structures on the substrate J using surface projection stereolithography; and the triaxial large-stroke displacement stage 12 is used to support the substrate J and switch positioning between the femtosecond laser printing subsystem and the DMD spatial light modulator printing subsystem.

[0030] The femtosecond laser printing subsystem includes: a femtosecond light source assembly 1, a first focusing assembly 2, a first beam splitting assembly 3, an illumination assembly 4, and a projection assembly 5.

[0031] Specifically, the femtosecond light source assembly 1 is used to emit femtosecond laser light; the first focusing assembly 2 is disposed in the optical path of the femtosecond light source assembly 1 and is used to control the focusing of the femtosecond laser light; the first beam splitting assembly 3 is disposed opposite to the first focusing assembly 2 and is used to split the femtosecond laser light to facilitate other functions, such as detection; the illumination assembly 4 is disposed opposite to the first beam splitting assembly 3 and is used to provide illumination; the projection assembly 5 is disposed opposite to the first focusing assembly 2 and is located between the first focusing assembly 2 and the substrate J to be printed, and the projection assembly 5 is used to project the femtosecond laser light.

[0032] The DMD spatial light modulator printing subsystem includes: DMD light source module 6, DMD spatial light modulator 7, lens module 8, second focusing assembly 9, second beam splitting assembly 10, and medium magnification objective lens 11.

[0033] Specifically, the DMD light source module 6 is used to emit printing laser; the DMD light source module 6 can be a 365nm ultraviolet light source module.

[0034] The DMD spatial light modulator 7 is positioned in the optical path of the printing laser to receive and modulate the printing laser to generate a patterned beam. Specifically, the DMD spatial light modulator 7 can be controlled by a host computer to load a printing pattern as a dynamic mask. When ultraviolet light shines on the DMD spatial light modulator 7 at a preset angle, such as 24°, a planar patterned beam is generated, which is then used for processing.

[0035] Lens module 8 is set in the optical path of DMD spatial light modulator 7 and is used to calibrate the optical path of patterned beams; lens module 8 can be an infinity correction sleeve lens module, covering the ultraviolet band, and is adapted to DMD light source module 6.

[0036] The second focusing component 9 is positioned opposite the illumination component 4 and is used to focus the printing laser.

[0037] The second beam splitting component 10 is disposed opposite to the second focusing component 9 and is used to split the patterned beam to facilitate other functions, such as detection.

[0038] The medium-magnification objective lens 11 is positioned opposite to the second focusing component 9 to project a patterned beam onto the substrate J to be printed, thereby achieving magnified focusing imaging.

[0039] The three-axis large-stroke stage 12 is positioned opposite the projection assembly 5 and the medium-magnification objective lens 11. The three-axis large-stroke stage 12 is configured to move along three axes to move the substrate J to be printed below the projection assembly 5 or the medium-magnification objective lens 11 for printing. Specifically, the travel distance of the three-axis large-stroke stage 12 along the X-axis can be ±100mm, the travel distance along the Y-axis can be ±100mm, and the travel distance along the Z-axis can be 0-30mm.

[0040] By coordinating and controlling the femtosecond laser printing subsystem and the DMD spatial light modulator printing subsystem, and combining the advantages of high resolution and high precision of femtosecond laser printing with the characteristics of large-size and high-efficiency printing of DMD spatial light modulator 7-sided projection stereolithography, the integrated fabrication of differentiated precision structures on the same substrate J can be achieved. This ensures that the micro-nano structure processing precision of the core region of the optical waveguide meets the device performance requirements, while also enabling the rapid processing of non-core regions such as large-size substrates and cladding of the optical waveguide. This significantly shortens the overall processing cycle, reduces processing costs, and solves the technical problem that existing single processing methods cannot simultaneously achieve processing precision, processing size, and processing efficiency.

[0041] It is important to emphasize that the size of the illumination component 4 is sufficient to cover the processing areas of both the femtosecond laser printing subsystem and the DMD spatial light modulator printing subsystem, ensuring that the two subsystems can work together. Through this collaborative design, the two subsystems can share the same illumination component 4, further simplifying the optical path structure and reducing the complexity and cost of the system.

[0042] Among some feasible implementation methods, see Figure 2 As shown, the femtosecond light source assembly 1 includes: a femtosecond laser 101, a femtosecond power modulator 102, a beam expander and shaper module 103, a high-speed galvanometer 104, and a lens focusing module 105.

[0043] Specifically, the femtosecond laser 101 is used to generate femtosecond laser light. The femtosecond laser 101 can generate femtosecond laser light with a center wavelength of 780nm for high-precision machining.

[0044] The femtosecond power modulator 102 is positioned opposite to the femtosecond laser 101, and the femtosecond power modulator 102 is used to modulate the power of the femtosecond laser.

[0045] The beam expanding and shaping module 103 is set in the optical path of the femtosecond laser to expand and shape the femtosecond laser beam, match the subsequent optical system, and improve the focusing quality.

[0046] The high-speed galvanometer 104 is set in the optical path of the beam expanding and shaping module 103. The high-speed galvanometer 104 can perform high-speed positioning and scanning of the femtosecond laser beam to control the processing trajectory of the femtosecond laser spot.

[0047] The lens focusing module 105 is set in the optical path of the high-speed galvanometer 104 and is used to focus the femtosecond laser.

[0048] Among some feasible implementation methods, see Figure 3 As shown, the first focusing component 2 includes a first focusing detection module 201, a first high-precision CCD observation camera 202, and a high-precision uniaxial piezoelectric displacement stage 203.

[0049] The first beam splitting component 3 includes a first beam splitter 301 and a second beam splitter 302.

[0050] The fabrication system for the differentiated precision polymer optical waveguide also includes: a first dichroic mirror 13.

[0051] The illumination component 4, the second beam splitter 302, the first beam splitter 301, the first dichroic mirror 13, the high-precision uniaxial piezoelectric displacement stage 203, and the projection component 5 are arranged in sequence. The second beam splitter 302 is arranged opposite to the first focusing detection module 201, and the first beam splitter 301 is arranged opposite to the first high-precision CCD observation camera 202.

[0052] The first focusing detection module 201 includes a focusing marker plate (not shown in the figure) and a corresponding optical path to observe the alignment status of the substrate J to be printed.

[0053] Specifically, the first high-precision CCD observation camera 202 is used for observation during femtosecond laser processing or inspection. The first high-precision CCD observation camera 202 can acquire three types of images: the first image is the image reflected back after the femtosecond laser is projected onto the substrate J to be printed; the second image is the image reflected back after the illumination light is projected onto the substrate J to be printed; and the third image is the image reflected back after the pattern of the focusing marker is projected onto the substrate J to be printed. All three images can be simultaneously displayed in the first high-precision CCD observation camera 202. The high-precision uniaxial piezoelectric displacement stage 203 is used for fine-tuning the projection assembly 5 in the vertical direction during femtosecond laser processing.

[0054] The first dichroic mirror 13 is used to selectively orient the femtosecond laser to a target band and reflect it highly in the femtosecond laser processing optical path, ultimately reflecting the femtosecond laser of the selected band into the first focusing component 2; the first dichroic mirror 13 has high transmission for visible light and observation light, allowing the reflected light formed by the observation light and visible light on the printed substrate to directly pass through the first dichroic mirror 13 and enter the first high-precision CCD observation camera for imaging.

[0055] The first beam splitter 301 is used to split the observation light, focusing light and femtosecond laser beam during femtosecond printing, dividing the three types of light into two paths: one path is used for the first high-precision CCD observation camera 202, and the other path is used for the optical path.

[0056] The second beam splitter 302 is used to split the observation light and the focused detection light during femtosecond printing.

[0057] In this way, through the cooperation of the first focusing component 2 and various beam splitting and optical elements, it is possible to achieve precise alignment of the printing position and real-time observation of the processing status during femtosecond laser processing. The high-precision fine-tuning mechanism and multi-path beam splitting not only ensure the stable transmission of the femtosecond laser processing optical path, but also do not interfere with the signal acquisition of the monitoring imaging optical path. This can provide stable and reliable high-precision alignment and monitoring support for the fabrication of polymer optical waveguides with different precision, and meet the alignment requirements of processing in different precision areas.

[0058] See also Figure 3 As shown, the second focusing component 9 includes a second focusing detection module 901, a second high-precision CCD observation camera 902, a triaxial piezoelectric displacement stage 903, and a high-precision laser ranging module 904.

[0059] The second beam splitting assembly 10 includes a third beam splitter 10a and a fourth beam splitter 10b.

[0060] The fabrication system for the differentiated precision polymer optical waveguide also includes: a second dichroic mirror 14.

[0061] The illumination assembly 4, the fourth beam splitter 10b, the third beam splitter 10a, the second dichroic mirror 14, the triaxial piezoelectric displacement stage 903, and the medium magnification objective lens 11 are arranged in sequence. The fourth beam splitter 10b is positioned opposite to the second focusing detection module 901, the third beam splitter 10a is positioned opposite to the second high-precision CCD observation camera 902, and the second dichroic mirror 14 is positioned opposite to the lens module 8.

[0062] Specifically, the second focusing detection module 901 includes a focusing marker plate and a corresponding optical path. The second high-precision CCD observation camera 902 is used to acquire three types of images: the first image is the image reflected back after the processing light generated by the DMD light source module 6 illuminates the DMD spatial light modulator 7, is reflected by the loaded dynamic mask image, and is then projected onto the substrate J to be printed; the second image is the image reflected back after the illumination light is projected onto the substrate J to be printed; and the third image is the image reflected back after the pattern of the focusing marker plate is projected onto the substrate J to be printed. All three images can be simultaneously displayed in the second high-precision CCD observation camera 902. The triaxial piezoelectric displacement stage 903 is used for micro-displacement and fine-tuning in three axes. The high-precision laser ranging module 904 is used to measure the distance from its sensing head to the upper surface of the printing substrate J.

[0063] The second dichroic mirror 14 is used to selectively directionally reflect the processing light in the processing optical path to the target wavelength, reflecting the selected wavelength processing light to the second focusing component 9; and to perform high transmission of visible light and observation light, allowing the reflected light formed on the printed substrate by the observation light and visible light to directly pass through the second dichroic mirror 14 and enter the second high-precision CCD observation camera for imaging.

[0064] The third beam splitter 10a is used to separate the observation light, focused light, and ultraviolet light, dividing the three types of light into two paths: one path is used for observation by the second high-precision CCD observation camera 902, and the other path is used for the optical path.

[0065] The fourth beam splitter 10b is used for observing light and focusing detection light.

[0066] See also the following for some feasible implementation methods. Figure 3 As shown, the fabrication system for differentiated precision polymer optical waveguides also includes a printing stage 16 and a system control console 15.

[0067] The printing stage 16 is used to attract the substrate J to be printed onto the printing stage 16 by negative pressure, and is driven by the three-axis large-stroke displacement stage 12. The substrate J to be printed can be a borosilicate glass substrate.

[0068] The system control console 15 controls the hardware devices in the system via a control bus. Specifically, the system control console 15 is connected to the lighting assembly 4, the DMD light source module 6, the DMD spatial light modulator 7, the printing stage 16, the triaxial piezoelectric displacement stage 903, and the high-precision laser ranging module 904 via the control bus. The system control console 15 is also directly connected to the femtosecond light source assembly 1, the first focusing assembly 2, and the triaxial large-stroke displacement stage 12.

[0069] It should be emphasized that when establishing a Cartesian coordinate system with the center of the optical element, each optical element is located in a different Cartesian coordinate system. In order to distinguish the positions of different optical elements, the Cartesian coordinate systems of different optical elements will be distinguished in subsequent embodiments.

[0070] Corresponding to the aforementioned embodiments of the fabrication system for differentiated precision polymer optical waveguides, this application also provides embodiments of the fabrication method for differentiated precision polymer optical waveguides.

[0071] See Figure 4 The method for fabricating differentiated precision polymer optical waveguides provided in this application embodiment may include steps S1 to S6.

[0072] Step S1: Segment the printed graphic to construct a first printed image set, a second printed image set, and a coordinate difference set; the first printed image set is the image set for the DMD spatial light modulator printing subsystem to perform printing operations, and the second printed image set is the image set for the femtosecond laser printing subsystem to perform printing operations; the first printed image set corresponds to the second printed image set, and the coordinate difference set is the set of coordinate differences between the plane containing the center of the first printed graphic in the first printed image set and the plane containing the center of the second printed graphic in the corresponding second printed image set.

[0073] In this step, the purpose of segmenting the printed pattern is to determine the DMD printing area and the femtosecond printing area based on accuracy requirements. Specifically, step S1 may include steps S11 and S12.

[0074] Step S11: Combine the pixel size of the DMD spatial light modulator, chip resolution, and medium magnification of the objective lens to segment the printed pattern and construct the first printed pattern set.

[0075] In this step, the pixel size of the DMD spatial light modulator can be 10.8 μm, the chip resolution of the DMD spatial light modulator can be 1920×1080, and the magnification of the medium-magnification objective lens can be 10. The printed pattern is processed by combining the minimum linewidth, the chip resolution of the DMD spatial light modulator, and the actual size of the printed pattern. The pixel spacing of the processed pattern corresponds to the minimum linewidth. The processed pattern is then divided into rows and columns, with the sub-patterns corresponding to the DMD chip resolution, thus constructing the first printed pattern set P of the DMD. uv During segmentation, any parts of the image that are not fully visible at the edges are filled with black to ensure that the pixel resolution of the segmented sub-images is consistent with the chip resolution of the DMD spatial light modulator.

[0076] Step S12: Construct a second print set and a coordinate difference set based on the first print set.

[0077] Specifically, step S12 may include steps S121 to S124.

[0078] S121: Construct a subset of femtosecond print patterns corresponding to the first print patterns in the first print pattern set; each first print pattern corresponds to a subset of femtosecond print patterns, and the subset of femtosecond print patterns contains second print patterns. The number of second print patterns can be 0, 1, or more.

[0079] In this step, the first printed drawing set P uv After the construction is completed, a corresponding femtosecond printout subset F is constructed based on each frame of the DMD image. w w is a variable. Femtosecond printed image subset F w The number is multiple, and each femtosecond prints a subset of graphics F. w Each of them contains a second printed graphic.

[0080] S122: Determine a subset of coordinate difference vectors based on the center coordinates of the first printed graphic and the center coordinates of each second printed graphic in the femtosecond printed graphic subset; the subset of coordinate difference vectors contains multiple center coordinate difference vectors, and the center coordinate difference vectors are the differences between the center coordinates of the first printed graphic and the center coordinates of the second printed graphic.

[0081] In this step, a subset of coordinate difference vectors is constructed. ={( , ), ( , ),..., ( , )}, where ([ , ) is a vector coordinate, and the direction is from the center of the femtosecond pattern to the center of the DMD pattern.

[0082] S123: Construct the second printing atlas based on the femtosecond printing pattern subset.

[0083] In this step, construct the second printing atlas F[[ uvw w from the femtosecond printing pattern subset F[[ w uvw of all frames. In the second printing atlas F[[ uvw uvw F[[ ijw ijw (i < u, j < v, w varies according to the number of elements in the actual femtosecond printing pattern subset) is the femtosecond printing pattern subset corresponding to one frame of DMD pattern.

[0084] S124: Construct the coordinate difference set based on the coordinate difference vector subset.

[0085] In this step, construct the coordinate difference set ΔA[[ uvw from the coordinate difference vector subset [[ID=4)), coordinate difference set ΔA[[ uvw ) uvw ijw ΔA[[ ijw ijw (i < u, j < v, w varies according to the number of elements in the actual femtosecond printing pattern subset) is the coordinate difference subset of the center points of the femtosecond printing patterns and the center point of the DMD pattern, which is determined by the graphic relationship.

[0086] Step S2: Construct the first movement set of the three-axis large-stroke displacement stage and the second movement set of the three-axis piezoelectric displacement stage; the first movement set is the data set for the three-axis large-stroke displacement stage to move in the X1 and Y1 axis directions, and the second movement set is the data set for the three-axis piezoelectric displacement stage to move and compensate in the X2 and Y2 axis directions; where, the X1 and Y1 axes are the coordinate axes in the coordinate system where the three-axis large-stroke displacement stage is located, and the X2 and Y2 axes are the coordinate axes in the coordinate system where the three-axis piezoelectric displacement stage is located.

[0087] In this step, construct the first movement set M[[ uv uv of the three-axis large-stroke displacement stage and the second movement set M[[ uv uv ’ of the three-axis piezoelectric displacement stage according to the number of rows and columns of the DMD segmentation, where the second movement set M[[ uv uv ’ can be the displacement compensation set of the three-axis piezoelectric displacement stage in the X2 and Y2 axis directions when the three-axis large-stroke displacement stage moves.

[0088] Specifically, step S2 may include steps S21 to S27.

[0089] Step S21: Print the first displacement calibration feature map set of the triaxial large stroke displacement stage; the first displacement calibration feature map set includes the first displacement calibration feature map S00, the second displacement calibration feature map S01 and the third displacement calibration feature map S10; wherein, the short side of the second displacement calibration feature map S01 is adjacent to the short side of the first displacement calibration feature map S00, the long side of the second displacement calibration feature map S01 is aligned with the long side of the first displacement calibration feature map S00, the long side of the third displacement calibration feature map S10 is adjacent to the long side of the first displacement calibration feature map S00, and the short side of the third displacement calibration feature map S10 is aligned with the short side of the first displacement calibration feature map S00.

[0090] In this step, the substrate coated with photoresist is placed on the printing stage. The three-axis large-stroke displacement stage is controlled to move in the X1 and Y1 axes. After automatic focusing, the first displacement calibration feature map S00 is printed first. The three-axis large-stroke displacement stage is controlled to move according to the first printing distance to print the second displacement calibration feature map S01. The three-axis large-stroke displacement stage is controlled to move back to the position when printing S00 according to the first printing distance. Then, the three-axis large-stroke displacement stage is controlled to move according to the second printing distance to print the third displacement calibration feature map S10.

[0091] Step S22: Determine the first compensation data of the three-axis large-stroke displacement stage based on the first printing distance, and determine the second compensation data of the three-axis large-stroke displacement stage based on the second printing distance; the first printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the second displacement calibration feature map S01, and the second printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the third displacement calibration feature map S10.

[0092] In this step, the first printing distance corresponds to the actual printing length of the long side of the DMD pattern, and the second printing distance corresponds to the actual printing length of the short side of the DMD pattern. After cleaning the substrate to be printed, the pattern is observed under a high-powered microscope. Based on the measurement results, the first compensation data {Δx} of the bottom triaxial large-stroke displacement stage on the long and short sides (X1 axis and Y1 axis directions) of the printed DMD pattern is calculated. b Δy b} and second compensation data {Δx b ’ Δy b ’}

[0093] Step S23: Combine the first compensation data and the second compensation data to print the second displacement calibration feature map set of the triaxial piezoelectric displacement stage; the second displacement calibration feature map set includes the fourth displacement calibration feature map S00', the fifth displacement calibration feature map S01' and the sixth displacement calibration feature map S10'; wherein, the short side of the fifth displacement calibration feature map S01' is adjacent to the short side of the fourth displacement calibration feature map S00', the long side of the fifth displacement calibration feature map S01' is aligned with the long side of the fourth displacement calibration feature map S00', the long side of the sixth displacement calibration feature map S10' is adjacent to the long side of the fourth displacement calibration feature map S00', and the short side of the sixth displacement calibration feature map S10' is aligned with the short side of the fourth displacement calibration feature map S00'.

[0094] In this step, printing is performed again, and step S21 is repeated. During the repetition of step S21, when controlling the movement of the three-axis large-stroke displacement stage, the first compensation data {Δx} obtained in step S22 is added to the original movement. b Δy b} and second compensation data {Δx b ’ Δy b ’}, and print the fourth displacement calibration feature map S00', the fifth displacement calibration feature map S01', and the sixth displacement calibration feature map S10' in sequence.

[0095] Step S24: Determine the third compensation data of the triaxial piezoelectric displacement stage based on the third printing distance, and determine the fourth compensation data of the triaxial piezoelectric displacement stage based on the fourth printing distance; the third printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the fifth displacement calibration feature map S01', and the fourth printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the sixth displacement calibration feature map S10'.

[0096] In this step, after cleaning the substrate to be printed, the pattern is observed under a high-powered microscope, and the third compensation data {Δx} of the triaxial piezoelectric displacement stage on the long and short sides (X2 axis and Y2 axis directions) of the DMD pattern is calculated. c Δy c} and the fourth compensation data {Δx c ’ Δy c ’}

[0097] Step S25: Obtain the planar orientation rotation angle; the planar orientation rotation angle is the angle between the horizontal axis of the coordinate plane where the projected image of the DMD spatial light modulator is located and the horizontal axis of the coordinate plane where the three-axis large-stroke displacement stage is located.

[0098] In this step, the planar orientation rotation angle α can be obtained by printing the feature pattern.

[0099] For example, first, feature pattern P0 is printed on the substrate coated with photoresist. Next, the triaxial large-stroke displacement stage is controlled to move 50 μm in the positive direction of the X1 axis to print feature pattern P1. Then, the triaxial large-stroke displacement stage is controlled to move 50 μm in the reverse direction of the X1 axis and then 50 μm in the positive direction of the Y1 axis to print feature pattern P2. After printing, the substrate is cleaned and feature patterns P0, P1 and P2 are observed under a high-power microscope. The planar orientation rotation angle α is calculated by measuring the relative positions of the feature points of P0, P1 and P2, where the planar orientation rotation angle α is the deflection angle.

[0100] Step S26: Determine the first movement set based on the planar orientation rotation angle, the first compensation data, and the second compensation data.

[0101] First moving set M uv satisfy: M ij =

[0102] Among them, M ij For the first movement set M uv The elements in, Δx b Δy b Δx b ’ and Δy b ’ Len represents the compensation amount of the three-axis large-stroke displacement stage in the X1 and Y1 axes during moving and splicing. D Width is the actual distance corresponding to the long side when the DMD printing graphic is a pure white image. D This refers to the distance corresponding to the actual printed short side when the DMD printing graphic is a pure white image.

[0103] In one specific implementation, when high printing precision is required or the fabrication system for polymer optical waveguides with differentiated precision has large errors, element M... ij A compensation coefficient, M, can also be introduced. ij It can be satisfied: M ij =

[0104] in, The first compensation coefficient is... This is the second compensation coefficient. This is the third compensation coefficient. This is the fourth compensation coefficient, and its specific value can be adjusted based on the usage parameters of the fabrication system for the differentiated precision polymer optical waveguide.

[0105] Step S27: Determine the second movement set based on the third compensation data and the fourth compensation data.

[0106] Second moving set M uv ’ satisfy: M ij ’ =

[0107] Among them, M ij ’ For the second movement set M uv ’ The elements in, Δx c Δy c Δx c ’ and Δy c ’ This refers to the compensation amount of the triaxial piezoelectric displacement stage in the X2 and Y2 directions when it moves with the triaxial large-stroke displacement stage during the splicing process.

[0108] Step S3: Based on the printing height of the substrate to be printed, construct the first printing parameter set of the DMD spatial light modulator printing subsystem and the second printing parameter set of the femtosecond laser printing subsystem.

[0109] In this step, the first number of printing layers of the DMD spatial light modulator printing subsystem and the second number of printing layers of the femtosecond laser printing subsystem are designed according to the printing height H of the printing substrate. A first set of printing parameters is constructed based on the first number of printing layers, and a second set of printing parameters is constructed based on the second number of printing layers.

[0110] Step S3 may include steps S31 to S35.

[0111] Step S31: Determine the first printing layer thickness d1 of the DMD spatial light modulator printing subsystem based on the energy density of the ultraviolet light source, the pixel size of the DMD spatial light modulator, the optical path scaling factor, and the photoresist curing characteristics. In this embodiment, SU8 photoresist is used for structure printing. The formula for selecting the d1 printing layer thickness is as follows: d1=min{0.8C dr d p ~1.5d p}; C dr =D0×ln(I0×t×10 -3 / E c ), where C dr D0 represents the actual critical curing depth of the photosensitive resin, and I0 represents the penetration depth of the photoresist. The light intensity on the sample surface is expressed in mW / cm². 2 .

[0112] Based on actual measurements, t represents the exposure time in milliseconds (ms), and E... c Critical curing energy for printing photoresist, unit: mW / cm 2 ;d p =P len × |M |, where P len Where is the pixel size of the DMD spatial light modulator, and M is the optical path scaling factor.

[0113] Step S32: Confirm the layer thickness d2 during printing by the femtosecond laser printing subsystem. This is determined by the laser focal axial dimension, printing accuracy requirements, the process window for stable curing of the photoresist, and the aspect ratio of the printed structure. The following conditions must be met: d2≈0.3~0.7×L ax And AR≤10.

[0114] Where L ax The laser focal axis dimension is AR, which is calculated as total printed height / minimum line width.

[0115] Step S33: Determine the first number of printing layers r1=H / d1 based on the printing height H and the first printing layer thickness d1. The DMD spatial light modulator printing subsystem prints layer by layer with a fixed layer thickness. Determine the second number of layers r2=H / d2 for the femtosecond laser printing subsystem based on the printing height H and the second printing layer thickness d2. The femtosecond laser printing subsystem prints layer by layer by scanning and controlling the layer height through a high-precision uniaxial piezoelectric displacement stage. The layer height is also a fixed value.

[0116] Step S34: Construct the first printing parameter set for the DMD light source module during printing of the DMD spatial light modulator printing subsystem. The first printing parameter set includes the current setting set I. r1 and exposure time set T r1 The current set in the DMD light source module corresponds to the optical power, and the depth of exposure is directly proportional to the total exposure. This is based on the formula: Exposure depth ; The effective absorption coefficient of SU8; Total exposure; This is the critical exposure dose.

[0117] SU8 photoresist exhibits inherent characteristics such as strong light absorption, limited penetration depth, and high curing shrinkage when cured under ultraviolet light. Ultraviolet light attenuates rapidly with depth within the SU8 photoresist layer. Under the same exposure, shallow layers are sufficiently cured, while deeper layers are insufficiently cured. To address this issue, a depth-step exposure method combining light intensity and exposure time is employed during actual printing. Currently, printing is performed layer by layer from bottom to top. Specific settings require gradually reducing the current and exposure time of the ultraviolet light source as the printing height increases. The following settings can be referenced: Ir1 ={I0, I0, ..., I0 - Δi, I0 - Δi, ..., I0 - m×Δi, I0 - m×Δi}, T r1 ={T0, T0, ..., T0 - Δt, T0 - Δt, ..., T0 - m×Δt, T0 - m×Δt}。

[0118] Step S35: Construct the voltage set V of the power modulator during the printing of the femtosecond laser printing subsystem r2 and the high-speed galvanometer rotation speed set S r2 。

[0119] The layer thickness printed by the femtosecond laser printing subsystem satisfies: d ≈ C × P 2 × ; where C is a system constant determined by the numerical aperture of the objective lens, the laser pulse width, the laser repetition frequency, and the composition of the photoresist; P is the laser power; v is the laser scanning speed; the voltage of the laser power modulator has a linear relationship with the laser power. To balance the overall printing efficiency of the femtosecond laser printing subsystem, the method of "femtosecond laser control voltage + high-speed galvanometer speed binding for deep processing" of appropriately gradually reducing the voltage and increasing the high-speed galvanometer scanning speed is adopted. Set the voltage set V r2 ={V0, V0 - Δv1, ..., V0 - Δv n}(1 < n ≤ r2 - 1), and the galvanometer rotation speed set S r2 ={S0, S0 + Δs1, ..., S0 + Δs n}(1 < n ≤ r2 - 1).

[0120] Step S4: Control the DMD spatial light modulator printing subsystem to print the substrate to be printed according to the first printing parameter set, the first printing atlas set, the first movement set, and the second movement set.

[0121] Specifically, step S4 may include steps S41 to S44.

[0122] Step S41: Prepare the printing substrate. After substrate cleaning, spin coating, pre-baking, and room temperature cooling, place the processed substrate to be printed at a fixed position on the printing platform. Confirm the starting position of printing, control the three-axis large-stroke displacement stage to move the glue-free area closest to the starting position to the medium magnification objective lens. After automatic focusing, confirm the position value h1 of the Z2 axis direction of the three-axis piezoelectric displacement stage at this time. Then, control the three-axis large-stroke displacement stage to move the starting position of printing to below the medium magnification objective lens. After automatic focusing, confirm the position value h2 of the Z2 axis direction of the three-axis piezoelectric displacement stage at this time. Then, the actual glue thickness of the substrate to be printed is h2 - h1. Confirm whether the actual glue thickness is greater than the height H to be printed. If it is greater, control the Z2 axis of the three-axis piezoelectric displacement stage to move down by a distance of H.

[0123] Step S42: Control the DMD spatial light modulator to load pattern P ij (i≤u-1, j≤v-1).

[0124] Step S43: Set the current of the 365nm ultraviolet light source module to I. w (w≤r1-1), control the DMD light source module switch according to the exposure time T w (w≤r1-1) Perform the switch operation to complete the printing of a single graphic. Control the Z2 axis of the triaxial piezoelectric displacement stage to rise by d1 height. Repeat the current step to complete the printing of the current DMD graphic in layer r1.

[0125] Step S44: Control the three-axis large stroke displacement stage to press M ij (i≤u-1, j≤v-1) Move to the next DMD graphic printing position, accumulate statistics on the movement of the triaxial large-stroke displacement stage, and record the movement amounts SumX and SumY of the X1 and Y1 axes during the splicing process. Then control the X2 and Y2 axes of the triaxial piezoelectric displacement stage to move according to M. ij ’ (i≤u-1,j≤v-1)) Perform micro-displacement position compensation to ensure splicing accuracy, repeat steps S42 and S43 until u×v DMD graphic printing is completed. After printing, control the X1 and Y1 axes of the three-axis large stroke displacement stage to move back to the initial position of DMD printing according to the values ​​of SumX and SumY.

[0126] Step S5: Construct a printing movement set and a printing point cloud data conversion set based on the second printing atlas, coordinate difference set, rotation matrix, and translation matrix; the printing movement set is the dataset of the movement of the three-axis large-stroke displacement stage in the X1 and Y1 axes when the femtosecond laser printing subsystem performs printing operations, and the printing point cloud data conversion set is the dataset of femtosecond laser printing points.

[0127] Specifically, step S5 may include steps S51 to S53.

[0128] Step S51: Construct a femtosecond print point cloud dataset based on the second print atlas.

[0129] Specifically, step S51 may include steps S511 to S513.

[0130] Step S511: Convert the second printed image set into the corresponding grayscale image set; the grayscale image set contains multiple grayscale images.

[0131] In this step, the actual center coordinates (X0, Y0) of the printed graphic are determined based on its actual position. Then, the first directional spacing Δx and the second directional spacing Δy are determined based on the printing accuracy requirements. The femtosecond printed graphic subset F is then printed.uvw Convert to the corresponding grayscale image set F uvw ’ .

[0132] In this step, the first directional spacing Δx and the second directional spacing Δy are determined according to the printing accuracy requirements. Specifically, step S511 includes steps S5111 to S5113.

[0133] Step S5111: Obtain the rigid displacement parameters {Δx, Δy, Δz} of the three-parameter precision alignment between the DMD focus and the femtosecond printing focus. Specifically, place the substrate to be printed at the center of the printing stage, where a mark is provided. Align the center of the substrate with the center of the printing stage. Control the three-axis large-stroke displacement stage to move the substrate to be printed directly below the medium-power objective lens. After autofocusing, print the alignment pattern of the DMD, which has a crosshair in the center. Then move the center of the substrate to be printed directly below the projection component. After autofocusing, print a micro square with a side length of 20μm. After cleaning the substrate, measure the deviation in the XY direction between the center of the micro square and the center of the crosshair of the DMD pattern under a high-power microscope. Combine this with the travel distance of the three-axis large-stroke displacement stage from the DMD end to the femtosecond end to obtain the rigid displacement parameters {Δx, Δy, Δz}. Wherein, Δx is the alignment parameter of the X1 axis of the three-axis large-stroke displacement stage, Δy is the alignment parameter of the Y1 axis of the three-axis large-stroke displacement stage, and Δz is the alignment parameter of the Z1 axis of the three-axis large-stroke displacement stage, corresponding to the focal space offset of the ultraviolet light focusing space point during printing by the DMD spatial light modulator printing subsystem and the 780nm laser focusing space point during printing by the femtosecond laser printing subsystem.

[0134] Step S5112: After the triaxial large-stroke displacement stage is moved below the projection component by controlling the precise alignment rigid displacement parameters {Δx, Δy, Δz}, the high-precision uniaxial piezoelectric displacement stage at the femtosecond end is moved to the middle position d0 in the vertical direction, which is near the femtosecond laser focus.

[0135] Step S5113: Turn on the first focusing detection module, start the first high-precision CCD observation camera to acquire images, obtain the feature pattern of the first focusing component, measure the centroid distance ΔC of the pattern, and according to the relationship: ΔC = k × δ + d, where k and d are linear constants, and δ is the defocusing amount.

[0136] Calculate the defocusing amount δ corresponding to the current ΔC, and control the high-precision uniaxial piezoelectric displacement stage to move a certain distance in the vertical direction to complete automatic focusing. Here, δ is positive when it moves downwards and negative when it moves upwards.

[0137] Step S512: Convert the grayscale values ​​of multiple grayscale images to the grayscale values ​​of individual pixels to obtain a grayscale value set.

[0138] In this step, a single grayscale image F ijk ’ (where i < u, j < v, k < w) is converted into a corresponding grayscale value set Gray according to the grayscale value of each single pixel rc {gray 00 ,.., gray 0，c-1}},.. {gray r-1，0 ,.., gray r-1，c-1}}, where r is the pixel row and c is the pixel column.

[0139] Step S513: Combine the grayscale value set and the central coordinates of the second printing pattern to construct a femtosecond printing point cloud data set.

[0140] In this step, for the grayscale value set Gray rc count row by row. When gray ij > 0 (i < r, j < c), calculate the actual printing coordinates of the current point Xg = (i - r / 2) × Δx + X0, Yg = (j - c / 2) × Δy + Y0, and form the calculated printing coordinates in order into a point cloud data subset D ijk ’ corresponding to the grayscale image F rc {X0 ’ , Y0 ’},.., {X s ’ , Y t ’}}, and convert each femtosecond printing image according to the above method to construct a printing point cloud data set D uvw .

[0141] Step S52: Combine the second printing pattern set and the coordinate difference set to construct a printing movement set.

[0142] This step is used to establish the movement amounts of the three-axis large-stroke displacement stage along the X1 axis and Y1 axis during femtosecond printing. Specifically, step S52 may include step S521 and step S522.

[0143] Step S521: Combine the central coordinate difference vector in the coordinate difference set and the plane azimuth rotation angle to determine the movement amounts of the three-axis large-stroke displacement stage along the X1 axis and Y1 axis; the movement amounts correspond to the central coordinate difference vector.

[0144] In this step, each DMD pattern corresponds to a coordinate difference vector subset = {( , ), ( , ) , ... , ( , )}, where ( , ) coordinates are vector coordinates, the direction is from the center of the femtosecond pattern to the center of the DMD pattern, x corresponds to the long side direction of the DMD pattern, y corresponds to the short side direction of the DMD pattern, which is the actual positional relationship between the femtosecond pattern and the DMD pattern during actual printing. One DMD pattern corresponds to multiple femtosecond patterns. This relationship is converted into the corresponding movement amounts (bx, by) of the three-axis large-travel displacement stage in the X1-axis and Y1-axis directions.

[0145] Taking the elements (Δx k , Δy k ) in the coordinate difference vector subset as an example, the conversion relation formula: bx = | ×cosα + ×sinα|; by = | ×sinα + ×cosα|.

[0146] Step S522: Construct a printing movement set based on multiple movement amounts.

[0147] According to the conversion relation formula and combining with the coordinate difference vector subset ΔA ijw (i < u, j < v), calculate the corresponding movement set B ijw ’ , and construct the printing movement set B of the three-axis large-travel displacement stage in the X1-axis and Y1-axis during femtosecond printing uvw ’ .

[0148] Step S53: Combine the rotation matrix, translation matrix and the femtosecond printing point cloud data set to construct a femtosecond printing point cloud data conversion set; the femtosecond printing point cloud data conversion set corresponds to the femtosecond printing point cloud data set.

[0149] In this step, there is a rotation conversion relationship between the coordinate system of the high-speed galvanometer and the graphic coordinate system of the DMD during femtosecond printing. Therefore, it is necessary to perform rotation and translation conversion on the femtosecond printing point cloud data set to ensure the alignment effect of the femtosecond printing pattern and the DMD pattern in the physical space. Specifically, step S53 includes steps S531 to S535.

[0150] Step S531: Control the three-axis large-stroke displacement stage to move from the DMD printing focus position of the DMD spatial light modulator printing subsystem to the femtosecond printing focus position of the femtosecond laser printing subsystem according to the rigid displacement parameters, and print a rectangular structure of a preset length; the rigid displacement parameters include the first direction spacing, the second direction spacing and the third direction spacing, the first direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the X1 axis, the second direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the Y1 axis, and the third direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the Z1 axis.

[0151] In some feasible implementations, the autofocus process in step S531 can be achieved through steps S531a to S531d.

[0152] Step S531a: Control the high-precision uniaxial piezoelectric displacement stage and set the height value to the middle position d0. At this time, the Z1 axis of the triaxial large-stroke displacement stage has moved Δz according to the rigid displacement parameter. Theoretically, the distance between the projection component and the substrate to be printed is the focal length of the femtosecond laser printing. However, due to the objective thickness error of the substrate to be printed, there is actually a deviation of about 20μm from the theoretical focal length of the femtosecond laser, which needs to be calibrated. Control the first focusing detection module to output a 3 / 4 annular image, turn on the first high-precision CCD observation camera to observe the image, and control the Z1 axis of the triaxial large-stroke displacement stage to move until the annular image is focused on a point. Record the image at this time as G0.

[0153] Step S531b: Control the high-precision uniaxial piezoelectric displacement stage to select 10-20 position points with an interval of 1μm above and below the intermediate position d0, forming a position point set d. m {d j d j+1 , ..., d0, d1, ..., d k}, acquire images at the corresponding locations, and construct an image set G from the acquired images according to their corresponding locations. m {G j G j+1 ..., G0, G1, ..., G k}

[0154] Step S531c: Calculate the image set G using the gray-level weighting method. m Construct the centroid distance set ΔC for the corresponding centroid. m {ΔC j ΔC j+1 ,...,ΔC0,ΔC1,...,ΔC k The vertical height and defocusing amount of a high-precision uniaxial piezoelectric displacement stage have a fixed difference, based on the position point set d.m Construct a defocus amount set δ m {δ j , δ j+1 ,..., δ0, δ1,..., δ k}.

[0155] Step S531d: The centroid distance and the defocus amount have a linear relationship. According to the centroid distance set ΔC m and the defocus amount set δ m perform fitting calculation to obtain the relational expression: ΔC = k×δ + d.

[0156] Step S532: Determine the rotation angle of the point cloud data rotation transformation during femtosecond laser printing; the rotation angle is the sum of the plane azimuth rotation angle and the rotation compensation angle, and the rotation compensation angle is the angle between the long side of the rectangular structure and the long side of the alignment feature pattern. The alignment feature pattern is the pattern used for alignment. <头

[0157] In this step, place the substrate to be printed coated with photoresist under the medium-power objective lens, and print a feature pattern with a cross in the printing center; control the three-axis large-stroke displacement stage to move to the projection component below according to the rigid displacement parameters {Δx, Δy, Δz}, and after automatic focusing, print a micro-rectangular structure with a long side of 40μm, a short side of 20μm and rotated by the first plane azimuth rotation angle around the center; after cleaning the substrate to be printed, observe the pattern under a high-power microscope, and measure the angle between the long side of the rectangular structure and the long side of the alignment feature pattern as the rotation compensation angle β. The rotation conversion angle during femtosecond printing is the sum of the plane azimuth rotation angle α and the rotation compensation angle β.

[0158] Step S533: Determine the rotation matrix based on the rotation angle.

[0159] The rotation matrix R = .

[0160] Step S534: Determine the translation matrix in combination with the rotation angle and the center coordinates of the second printed pattern.

[0161] The translation matrix T satisfies: T = ; where ( , ) is the actual coordinate corresponding to the center point of the pattern.

[0162] Step S535: Use the rotation matrix and the translation matrix to transform the femtosecond printing point cloud data set to obtain the femtosecond printing point cloud data transformation set.

[0163] For the points (x, y) in the femtosecond printing point cloud data subset D ijk (i < u, j < v, k < w) through the formula: ​ =R× +T; Convert to the points required for actual femtosecond laser printing ( , ) to construct the femtosecond printing point cloud data conversion set D uvw ’ .

[0164] Step S6: Control the three-axis large-stroke displacement stage and the femtosecond laser printing subsystem to print the substrate to be printed according to the first movement set, the printing movement set, and the printing point cloud data conversion set.

[0165] Specifically, step S6 may include steps S61 to S63.

[0166] Step S61: Control the three-axis large-stroke displacement stage to move according to the element M in the first movement set Muv ij (i < u, j < v), move the femtosecond processing area corresponding to the DMD pattern to below the projection component of the femtosecond laser printing subsystem, and then according to the subset B uvw ’ in the printing movement set B ijk ’ (i < u, j < v, k < w), move the substrate to be printed to the position corresponding to the element data set in the femtosecond printing point cloud data conversion subset D ijk ’ (i < u, j < v, k < w), where D ijk ’ is a subset of D uvw ’ .

[0167] Step S62: Control the femtosecond laser power modulator, the high-speed galvanometer, and the high-precision single-axis piezoelectric displacement stage to complete the femtosecond printing of the r2-layer element data set in D r2 and the galvanometer rotation speed set S r2 layer by layer, where the settings of the voltage set V of the femtosecond laser power modulator ijk ’ (i < u, j < v, k < w) and the rotation speed set S of the high-speed galvanometer r2 and the rotation speed set S of the high-speed galvanometer r2 are set according to the previous steps.

[0168] Step S63: Repeat steps S61 and S62 to complete the femtosecond laser printing.

[0169] The method for fabricating differentiated precision polymer optical waveguides provided in this application achieves precise alignment of the differentiated precision printed optical waveguide structure through the movement of a high-precision triaxial displacement stage at the bottom and data rotation and translation. This method can balance printing efficiency and precision when processing differentiated precision polymer optical waveguides. When printing large-size structures with low precision requirements using surface projection micro-stereolithography, a method of "depth-step exposure bound by light intensity and exposure time" is used to solve the problem of uneven adhesive layer curing. When processing small-size structures with high precision requirements using femtosecond laser direct writing, a method of "depth-gradient processing bound by femtosecond laser control voltage and galvanometer speed" is used to optimize the aspect ratio.

[0170] It should be noted that, upon considering the specification and practicing the application disclosed herein, those skilled in the art will readily conceive of other embodiments of this application. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein.

[0171] It should be understood that this application is not limited to the precise structure described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from its scope. The true scope is indicated by this application.

Claims

1. A method for fabricating a polymer optical waveguide with differentiated precision, characterized in that, include: The printed graphic is segmented to construct a first printed image set, a second printed image set, and a coordinate difference set; The first print set is a print set executed by the DMD spatial light modulator printing subsystem, and the second print set is a print set executed by the femtosecond laser printing subsystem. The first print set corresponds to the second print set, and the coordinate difference set is the set of coordinate differences between the plane containing the center of the first print pattern in the first print set and the plane containing the center of the second print pattern in the corresponding second print set. A first set of motion data for a triaxial large-stroke displacement stage and a second set of motion data for a triaxial piezoelectric displacement stage are constructed. The first set of motion data is the dataset of the movement of the triaxial large-stroke displacement stage in the X1 and Y1 axis directions, and the second set of motion data is the dataset of the movement compensation of the triaxial piezoelectric displacement stage in the X2 and Y2 axis directions. The X1 and Y1 axes are the coordinate axes in the coordinate system of the triaxial large-stroke displacement stage, and the X2 and Y2 axes are the coordinate axes in the coordinate system of the triaxial piezoelectric displacement stage. Based on the printing height of the substrate to be printed, a first set of printing parameters for the DMD spatial light modulator printing subsystem and a second set of printing parameters for the femtosecond laser printing subsystem are constructed. The DMD spatial light modulator printing subsystem is controlled to print the substrate to be printed according to the first printing parameter set, the first printing atlas, the first movement set, and the second movement set. Based on the second printing atlas, the coordinate difference set, the rotation matrix, and the translation matrix, a printing movement set and a printing point cloud data conversion set are constructed; the printing movement set is a dataset of the movement of the three-axis large-stroke displacement stage in the X1 and Y1 axes when the femtosecond laser printing subsystem performs printing operations; the printing point cloud data conversion set is a dataset of the printing points of the femtosecond laser printing subsystem. The triaxial large-stroke displacement stage and the femtosecond laser printing subsystem are controlled to print the substrate to be printed according to the first movement set, the printing movement set, and the printing point cloud data conversion set.

2. The method for fabricating differentiated precision polymer optical waveguides according to claim 1, characterized in that, The printed graphic is segmented to construct a first printed atlas, a second printed atlas, and a coordinate difference set, including: The printed pattern is segmented by combining the pixel size, chip resolution, and medium magnification of the DMD spatial light modulator to construct the first printed pattern set; A second printing set and a coordinate difference set are constructed based on the first printing set.

3. The method for fabricating differentiated precision polymer optical waveguides according to claim 2, characterized in that, Based on the first printed atlas, a second printed atlas and a coordinate difference set are constructed, including: Construct a femtosecond print pattern subset corresponding to the first print pattern in the first print pattern set; each first print pattern corresponds to one femtosecond print pattern subset, and the femtosecond print pattern subset includes the second print pattern; A subset of coordinate difference vectors is determined based on the center coordinates of the first printed pattern and the center coordinates of each second printed pattern in the femtosecond printed pattern subset; the subset of coordinate difference vectors contains multiple center coordinate difference vectors, and the center coordinate difference vectors are the difference vectors between the center coordinates of the first printed pattern and the center coordinates of the second printed pattern; A second printing atlas is constructed based on the femtosecond printing pattern subset; Construct a coordinate difference set based on the subset of coordinate difference vectors.

4. The method for fabricating differentiated precision polymer optical waveguides according to claim 3, characterized in that, Constructing the first motion set of a triaxial large-stroke displacement stage and the second motion set of a triaxial piezoelectric displacement stage, including: Print the first displacement calibration feature map set of the triaxial large stroke displacement stage; the first displacement calibration feature map set includes a first displacement calibration feature map S00, a second displacement calibration feature map S01, and a third displacement calibration feature map S10; wherein, the short side of the second displacement calibration feature map S01 is adjacent to and fits against the short side of the first displacement calibration feature map S00, the long side of the second displacement calibration feature map S01 is aligned with the long side of the first displacement calibration feature map S00, the long side of the third displacement calibration feature map S10 is adjacent to and fits against the long side of the first displacement calibration feature map S00, and the short side of the third displacement calibration feature map S10 is aligned with the short side of the first displacement calibration feature map S00; The first compensation data of the three-axis large-stroke displacement stage is determined based on the first printing distance, and the second compensation data of the three-axis large-stroke displacement stage is determined based on the second printing distance; the first printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the second displacement calibration feature map S01; the second printing distance is the distance between the center point of the first displacement calibration feature map S00 and the center point of the third displacement calibration feature map S10. The second displacement calibration feature map set of the triaxial piezoelectric displacement stage is printed by combining the first compensation data and the second compensation data; the second displacement calibration feature map set includes a fourth displacement calibration feature map S00', a fifth displacement calibration feature map S01', and a sixth displacement calibration feature map S10'; wherein, the short side of the fifth displacement calibration feature map S01' is adjacent to the short side of the fourth displacement calibration feature map S00', the long side of the fifth displacement calibration feature map S01' is aligned with the long side of the fourth displacement calibration feature map S00', the long side of the sixth displacement calibration feature map S10' is adjacent to the long side of the fourth displacement calibration feature map S00', and the short side of the sixth displacement calibration feature map S10' is aligned with the short side of the fourth displacement calibration feature map S00'; The third compensation data of the triaxial piezoelectric displacement stage is determined based on the third printing distance, and the fourth compensation data of the triaxial piezoelectric displacement stage is determined based on the fourth printing distance; the third printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the fifth displacement calibration feature map S01'; the fourth printing distance is the distance between the center point of the fourth displacement calibration feature map S00' and the center point of the sixth displacement calibration feature map S10'; Obtain the planar orientation rotation angle; the planar orientation rotation angle is the angle between the horizontal axis of the coordinate plane where the projected image of the DMD spatial light modulator is located and the horizontal axis of the coordinate plane where the three-axis large-stroke displacement stage is located; The first movement set is determined based on the planar orientation rotation angle, the first compensation data, and the second compensation data; The second movement set is determined based on the third compensation data and the fourth compensation data.

5. The method for fabricating differentiated precision polymer optical waveguides according to claim 4, characterized in that, Based on the second printing atlas, the coordinate difference set, the rotation matrix, and the translation matrix, a printing movement set and a printing point cloud data transformation set are constructed, including: Construct a femtosecond print point cloud dataset based on the second print atlas; The print movement set is constructed by combining the second print atlas and the coordinate difference set; A femtosecond printed point cloud data conversion set is constructed by combining the rotation matrix, the translation matrix, and the femtosecond printed point cloud dataset; the femtosecond printed point cloud data conversion set corresponds to the femtosecond printed point cloud dataset.

6. The method for fabricating a differentiated precision polymer optical waveguide according to claim 5, characterized in that, A femtosecond print point cloud dataset is constructed based on the second print atlas, including: The second printed image set is converted into a corresponding grayscale image set; the grayscale image set contains multiple grayscale images. The grayscale images are converted into grayscale values ​​of individual pixels to obtain a grayscale value set. By combining the grayscale value set and the center coordinates of the second printed graphic, a femtosecond printed point cloud dataset is constructed.

7. The method for fabricating a differentiated precision polymer optical waveguide according to claim 6, characterized in that, Constructing the print movement set by combining the second print atlas and the coordinate difference set includes: By combining the center coordinate difference value in the coordinate difference set and the planar orientation rotation angle, the movement of the three-axis large-stroke displacement stage in the X1 and Y1 axis directions is determined; the movement corresponds to the center coordinate difference vector. The print move set is constructed based on multiple of the aforementioned move values.

8. The method for fabricating a differentiated precision polymer optical waveguide according to claim 7, characterized in that, A femtosecond printed point cloud data transformation set is constructed by combining the rotation matrix, translation matrix, and the aforementioned femtosecond printed point cloud dataset, including: The triaxial large-stroke displacement stage is controlled to move from the DMD printing focus position of the DMD spatial light modulator printing subsystem to the femtosecond printing focus position of the femtosecond laser printing subsystem according to rigid displacement parameters, and prints a rectangular structure of a preset length; the rigid displacement parameters include a first direction spacing, a second direction spacing, and a third direction spacing, wherein the first direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the X1 axis, the second direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the Y1 axis, and the third direction spacing is the spacing between the DMD printing focus and the femtosecond printing focus in the Z1 axis; Determine the rotation angle of the point cloud data rotation transformation during printing by the femtosecond laser printing subsystem; the rotation angle is the sum of the planar orientation rotation angle and the rotation compensation angle, and the rotation compensation angle is the angle between the long side of the rectangular structure and the long side of the aligned feature graphic; The rotation matrix is ​​determined based on the rotation angle; The translation matrix is ​​determined by combining the rotation angle and the center coordinates of the second printed graphic; The femtosecond printed point cloud dataset is transformed using the rotation matrix and the translation matrix to obtain the femtosecond printed point cloud data transformation set.

9. A fabrication system for a polymer optical waveguide with differentiated precision, characterized in that, The fabrication system of the differentiated precision polymer optical waveguide, as described in any one of claims 1-8, comprises: a femtosecond laser printing subsystem, a DMD spatial light modulator printing subsystem, and a triaxial large-stroke displacement stage; The femtosecond laser printing subsystem includes: The femtosecond light source component is configured to emit femtosecond lasers; A first focusing component is disposed in the optical path of the femtosecond light source component and is configured to control the focusing of the femtosecond laser; The first beam-splitting component, disposed opposite to the first focusing component, is configured to split the femtosecond laser beam; An illumination component, disposed opposite to the first beam-splitting component, is configured to provide illumination; A projection component is disposed opposite to the first focusing component and located between the first focusing component and the substrate to be printed. The projection component is configured to project the femtosecond laser. The DMD spatial light modulator printing subsystem includes: The DMD light source module is configured to emit a printing laser; A DMD spatial light modulator, disposed in the optical path of the DMD light source module, is configured to receive and modulate the printing laser to generate a patterned beam. A lens module, disposed in the optical path of the DMD spatial light modulator, is configured to perform optical path calibration on the patterned beam. A second focusing component, disposed opposite to the illumination component, is configured to focus the printing laser; The second beam-splitting component, disposed opposite to the second focusing component, is configured to split the patterned beam; A medium-power objective lens, disposed opposite to the second focusing assembly, is configured to project the patterned beam onto the substrate to be printed; The three-axis large-stroke displacement stage is arranged opposite to the projection component and the medium-magnification objective lens. The three-axis large-stroke displacement stage is configured to move along three axes to drive the substrate to be printed to be perpendicularly aligned with the projection component or the medium-magnification objective lens.

10. The fabrication system for differentiated precision polymer optical waveguides according to claim 9, characterized in that, The femtosecond light source assembly includes: A femtosecond laser is configured to generate a femtosecond laser. A femtosecond power modulator, disposed opposite to the femtosecond laser, is configured to modulate the power of the femtosecond laser; A beam expanding and shaping module is disposed in the optical path of the femtosecond laser and is configured to expand and shape the femtosecond laser beam. A high-speed galvanometer is disposed in the optical path of the beam expanding and shaping module and is configured to control the processing trajectory of the femtosecond laser; The lens focusing module is located in the optical path of the high-speed galvanometer and is configured to focus the femtosecond laser.

11. The fabrication system for differentiated precision polymer optical waveguides according to claim 10, characterized in that, The first focusing component includes a first focusing detection module, a first high-precision CCD observation camera, and a high-precision uniaxial piezoelectric displacement stage; The first beam splitting component includes a first beam splitter and a second beam splitter; The fabrication system for the differentiated precision polymer optical waveguide also includes: a first dichroic mirror; The illumination component, the second beam splitter, the first beam splitter, the first dichroic mirror, the high-precision uniaxial piezoelectric displacement stage, and the projection component are arranged in sequence, with the second beam splitter positioned opposite to the first focusing detection module and the first beam splitter positioned opposite to the first high-precision CCD observation camera.

12. The fabrication system for differentiated precision polymer optical waveguides according to claim 11, characterized in that, The second focusing component includes a second focusing detection module, a second high-precision CCD observation camera, a triaxial piezoelectric displacement stage, and a high-precision laser ranging module; The second beam-splitting assembly includes a third beam splitter and a fourth beam splitter; The fabrication system for the differentiated precision polymer optical waveguide also includes: a second dichroic mirror; The illumination component, the fourth beam splitter, the third beam splitter, the second dichroic mirror, the triaxial piezoelectric displacement stage, and the medium-magnification objective lens are arranged sequentially. The fourth beam splitter is positioned opposite to the second focusing detection module, the third beam splitter is positioned opposite to the second high-precision CCD observation camera, and the second dichroic mirror is positioned opposite to the lens module.

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