A bearing rectification platform and processing system
Patent Information
- Application Number
- CN202611096419.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-07-23
- Publication Date
- 2026-08-21
AI Technical Summary
[0005]本申请实施例提供一种承载纠偏台及加工系统,以解决相关技术中无法保证大尺寸基板表面功能层的成型质量的技术问题
本申请实施例提供了一种承载纠偏台,基板加工或者检测时,将基板置于承载板上,通过承载纠偏台对基板支撑,并随着承载纠偏台的运动,而带动基板运动。基板置于承载板上后,通过带动安装板相对于底座转动,从而带动承载板和基板同步转动,以此调整基板的长度方向和宽度方向,实现对基板的纠偏,以满足后续对基板的加工或检测需求。
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Figure CN122607819A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of inkjet printing technology, and in particular to a support correction table and processing system. Background Technology
[0002] Inkjet printing is finding increasingly widespread applications in several emerging fields, such as new displays, RFID, thin-film solar cells, wearable flexible devices, PCBs, and smart skins. Inkjet printing technology offers advantages such as high material utilization, no need for photomasks, low equipment cost, and ease of large-size manufacturing. It enables low-cost, large-area printing of new display devices such as OLEDs and QLEDs, making it one of the most promising processes for fabricating new display devices.
[0003] In related technologies, when printing functional layers on the surface of a substrate or when performing defect detection on the functional layers on the surface of a substrate, the substrate needs to be placed on a support platform, which supports the substrate. The substrate can be translated or rotated by moving the support platform to meet the positional movement requirements of the substrate during printing or defect detection.
[0004] However, when processing large-size substrates, various parts of the substrate are prone to deformation due to lack of support, resulting in poor substrate surface flatness. Poor substrate surface flatness makes it difficult to guarantee printing accuracy and affects the accuracy of subsequent defect detection of the substrate's surface functional layers, ultimately compromising the molding quality of large-size surface functional layers. Summary of the Invention
[0005] This application provides a support and correction stage and processing system to solve the technical problem in the related art that the molding quality of the functional layer on the surface of a large-size substrate cannot be guaranteed.
[0006] Firstly, a support platform for the correction stage is provided, comprising: Base; Mounting plate, which is rotatably connected to the base; A support plate, located above the mounting plate, is used to support a substrate; A support assembly is provided, wherein the mounting plate supports the carrier plate via the support assembly. The support assembly includes multiple pushers evenly distributed below the carrier plate. The fixed ends of the pushers are mounted on the mounting plate, and the movable ends of the pushers are connected to the bottom surface of the carrier plate. The operating ends of the pushers are located at the top of the movable ends of the pushers. The carrier plate has multiple through adjustment holes on its surface, and the movable ends of the multiple pushers are respectively installed at the multiple adjustment holes of the carrier plate. The operating end of the pusher is adapted to pass through the adjustment hole and act on the pusher to adjust the height of the movable end of the pusher, thereby changing the height of the support plate at that position.
[0007] In some embodiments, the pusher includes: A push-top flange, which is fixed to the bottom surface of the bearing plate; The mounting sleeve is connected to the mounting plate; An adjusting screw is provided, which passes through the push flange and the mounting sleeve, and is threadedly connected to both the push flange and the mounting sleeve; the top of the adjusting screw is aligned with the adjusting hole. The adjusting screw is rotated through the adjusting hole to cause the mounting sleeve to move up and down, thereby adjusting the local height of the support plate.
[0008] In some embodiments, the pusher further includes an elastic element disposed between the mounting sleeve and the pusher flange, the elastic force of which causes both ends of the elastic element to abut against the pusher flange and the mounting sleeve, respectively.
[0009] In some embodiments, the pusher further includes a fixing sleeve, which is fixed to the mounting plate. The mounting sleeve passes through the fixing sleeve and is threadedly connected to the fixing sleeve. The height of the top of the mounting sleeve can be adjusted by twisting the mounting sleeve relative to the fixing sleeve.
[0010] In some embodiments, the support plate is composed of multiple single plates spliced together.
[0011] In some embodiments, the support and correction platform further includes a rotating assembly, and the mounting plate is rotatably connected to the base via the rotating assembly; the rotating assembly includes: A rotating base, wherein the fixed end of the rotating base is mounted on the base, and the rotating end of the rotating base is connected to the mounting plate; Multiple arc-shaped guide rail groups are evenly arranged around the rotation axis of the mounting plate. The track portion of the arc-shaped guide rail group is installed on the base, and the sliding portion of the arc-shaped guide rail group is connected to the mounting plate. A correction drive component is connected to the mounting plate to drive the mounting plate to rotate; The rotating base supports the bottom center of the mounting plate, and the multiple arc-shaped guide rails support multiple edges of the bottom of the mounting plate.
[0012] In some embodiments, the rotating assembly further includes multiple multi-axis support platforms disposed between the mounting plate and the base, and the multiple multi-axis support platforms respectively support multiple corners of the mounting plate; the multi-axis support platforms include: The fixing seat is fixed to the base; A first sliding plate is slidably arranged on the fixed base; A second sliding plate is slidably arranged on the first sliding plate; A rotating plate, which is rotatably connected to the second sliding plate and connected to the mounting plate, to support the edges and corners of the mounting plate; The sliding directions of the first sliding plate and the second sliding plate are arranged at an angle. As the mounting plate rotates, the first sliding plate and the second sliding plate slide adaptively, and the rotating plate rotates adaptively.
[0013] In some embodiments, the correction drive includes a linear module for driving a first sliding plate to slide, thereby synchronously driving the mounting plate to rotate.
[0014] In some embodiments, the support and correction stage further includes a pin assembly, the pin assembly comprising: Ejector pin holder, which moves vertically between the mounting plate and the support plate; Multiple ejector pins are mounted on the ejector pin frame, and the support plate has multiple through holes for the ejector pins to pass through. A lifting drive is provided, which is connected to the ejector pin frame to drive the ejector pin frame and all the ejector pins to move up and down, thereby causing the ejector pins to extend above the support plate.
[0015] The beneficial effects of the technical solution provided in this application include: This application provides a support and alignment stage. During substrate processing or inspection, the substrate is placed on a support plate, and the support and alignment stage supports the substrate. As the support and alignment stage moves, the substrate moves. After the substrate is placed on the support plate, the mounting plate rotates relative to the base, thereby causing the support plate and the substrate to rotate synchronously. This adjusts the length and width directions of the substrate, achieving alignment of the substrate to meet the subsequent processing or inspection requirements.
[0016] Before placing the substrate onto the support plate, the flatness of the support plate must be checked to avoid unevenness and ensure uniform support for the substrate. Multiple pushers are used to support different positions on the support plate, and the height of these pushers is adjusted to ensure consistent height across the support plate. This guarantees uniform support for the substrate and prevents deformation. Ensuring consistent height across the substrate not only prevents deformation but also ensures consistent distances between the substrate and processing or inspection components above it, guaranteeing consistent processing and reliable inspection, and ensuring the molding quality of the functional layers on the surface of large-size substrates.
[0017] Furthermore, when dealing with large-sized substrates, the dimensions of the support plate also vary significantly, making it more prone to unevenness. By arranging multiple pushers and incorporating adjustment holes on the support plate, the height of all pushers can be easily adjusted from above, thus leveling the support plate. Therefore, adjusting the support plate does not require operation from below, making it easier to adjust the height of various parts of the support plate and ensuring the flatness of large-sized support plates.
[0018] Secondly, a processing system is provided, including the bearing and correction table as described above.
[0019] Another embodiment of this application provides a processing system. Since the processing system includes the above-mentioned bearing and correction table, the beneficial effects of the processing system are the same as those of the above-mentioned bearing and correction table, and will not be repeated here. Attached Figure Description
[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0021] Figure 1 A schematic diagram of the bearing correction stage provided in an embodiment of this application; Figure 2 This is a partial schematic diagram of the bearing correction stage provided in an embodiment of this application; Figure 3 A schematic diagram of the pusher, mounting plate, and bearing plate provided in the embodiments of this application; Figure 4 A schematic diagram of the pusher provided in an embodiment of this application; Figure 5 A schematic diagram of the mounting plate and base provided in the embodiments of this application; Figure 6 A schematic diagram of the base and rotating assembly provided in an embodiment of this application; Figure 7 A schematic diagram of a multi-axis support platform provided in an embodiment of this application; Figure 8 A schematic diagram of the correction drive provided in an embodiment of this application; Figure 9 A schematic diagram of the ejector pin assembly provided in an embodiment of this application; Figure 10 This is a schematic diagram of the ejector pin provided in an embodiment of this application.
[0022] In the diagram: 1. Base; 2. Mounting plate; 3. Bearing plate; 3a. Adjustment hole; 4. Support assembly; 41. Pushing component; 411. Pushing flange; 412. Mounting sleeve; 413. Adjusting screw; 414. Elastic component; 415. Fixing sleeve; 416. Locking nut; 42. Support column; 5. Rotating assembly; 51. Rotating seat; 52. Arc-shaped guide rail assembly; 53. Correction drive component; 54. Multi-axis support platform; 541. Fixing seat; 542. First sliding plate; 543. Second sliding plate; 544. Rotating plate; 6. Ejector pin assembly; 61. Ejector pin frame; 62. Ejector pin component; 621. Ejector rod; 622. Ball bearing; 63. Lifting drive component. Detailed Implementation
[0023] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0024] This application provides a support and correction stage and processing system. Through the cooperation of multiple pushers and adjustment holes on the support plate, it achieves precise adjustment of the height of various parts of a large-size support plate, ensuring uniform support for the substrate and thus guaranteeing the surface height consistency of the large-size substrate and the quality of the film formed on the substrate surface. This application solves the technical problem in related technologies that cannot guarantee the forming quality of the functional layer on the surface of large-size substrates.
[0025] Reference Figure 1 and Figure 2A spin-alignment correction table includes a base 1, a mounting plate 2, a support plate 3, and a support assembly 4. The base 1, mounting plate 2, and support plate 3 are arranged sequentially from bottom to top. The base 1 is slidably mounted on the processing platform of the processing system. By sliding the base 1 on the processing platform, the spin-alignment correction table can switch positions on the processing platform. The support plate 3 is mounted above the mounting plate 2 via the support assembly 4 and supports the substrate. The mounting plate 2 is rotatably connected to the base 1. Rotation of the mounting plate 2 relative to the base 1 causes the support plate 3 and the substrate to rotate, thereby adjusting the length direction of the substrate and achieving spin-alignment correction.
[0026] Reference Figures 1-3 The support component 4 includes multiple pushers 41, which are evenly distributed below the support plate 3. In this embodiment, the multiple pushers 41 are arranged in a rectangular array.
[0027] Reference Figures 1-3 The fixed end of the pusher 41 is mounted on the mounting plate 2, the movable end of the pusher 41 is connected to the bottom surface of the support plate 3, and the operating end of the pusher 41 is located at the top of the movable end of the pusher 41. The support plate 3 has multiple through adjustment holes 3a, and the movable ends of the multiple pushers 41 are respectively installed at the multiple adjustment holes 3a of the support plate 3.
[0028] This configuration allows for adjustment of the height of the movable end of the pusher 41 by acting through the adjustment hole 3a, thereby changing the height of the support plate 3 at that position. When dealing with large substrates, the size of the support plate 3 also varies significantly, making it more prone to unevenness. By arranging multiple pushers 41 and providing adjustment holes 3a on the support plate 3, the height of all pushers 41 can be easily adjusted from above the support plate 3, thus leveling the support plate 3. Therefore, adjusting the support plate 3 does not require operation from below, making it easier to adjust the height of various parts of the support plate 3 and ensuring the flatness of large-size support plates 3.
[0029] It should be noted that the height of the pusher 41 is adjusted, causing the bearing plate 3 to deform, thereby adjusting the height of the bearing plate 3 at corresponding positions. Generally, the height difference at various points on the bearing plate 3 is small, so the range required for adjusting the height of various points on the bearing plate 3 is small, and it can be achieved by utilizing the deformation of the bearing plate 3.
[0030] By using the pusher 41, the surface height difference of the large-sized carrier plate 3 can be kept within 1-5 micrometers. This ensures the height consistency of the substrate surface when carrying the substrate, thus guaranteeing the quality of the film formation process on the substrate surface.
[0031] Reference Figures 2-4In this embodiment, preferably, the support plate 3 is spliced from multiple single plates, which not only reduces the processing cost of the support plate 3, but also avoids the support plate 3 from being too large and easily deformed by arranging the support plate 3 separately, and makes it easier to ensure the flatness of the surface of the support plate 3.
[0032] The support plate 3 has multiple air-float holes on its surface. Through an external air supply device, the support plate 3 can provide air-float support for the substrate.
[0033] Reference Figures 2-4 The pusher component 41 includes a pusher flange 411, a mounting sleeve 412, and an adjusting screw 413. The pusher flange 411 is fixed to the bottom surface of the support plate 3 by bolts. The mounting sleeve 412 is connected to the mounting plate 2. The adjusting screw 413 passes through the pusher flange 411 and the mounting sleeve 412, and is threadedly connected to both the pusher flange 411 and the mounting sleeve 412. The top of the adjusting screw 413 is aligned with the adjusting hole 3a.
[0034] Reference Figures 2-4 Specifically, the adjusting screw 413 includes a first connecting section and a second connecting section. The first connecting section is threadedly connected to the push flange 411, and the second connecting section is threadedly connected to the mounting sleeve 412. The threads of the first and second connecting sections have the same direction of rotation, and the pitch of the thread of the first connecting section is smaller than the pitch of the thread of the second connecting section. Therefore, when the adjusting screw 413 is rotated, the change in distance of the adjusting screw 413 relative to the mounting sleeve 412 is greater than the change in distance of the adjusting screw 413 relative to the push flange 411. Thus, by rotating the adjusting screw 413, the push flange 411 can be driven to move up and down, thereby driving part of the bearing plate 3 to move up and down.
[0035] In another embodiment, the threads of the first connecting section and the second connecting section are in opposite directions, and the lifting and lowering of the push flange 411 can be achieved by rotating the adjusting screw 413.
[0036] Reference Figures 2-4 The top surface of the adjusting screw 413 is provided with an operating groove to allow external tools to drive the adjusting screw 413 to rotate. The operating groove includes an internal hexagonal groove, a cross groove, a slotted groove, etc.
[0037] With this configuration, the local height of the support plate 3 can be adjusted by rotating the adjusting screw 413 through the adjusting hole 3a with an external tool, causing the mounting sleeve 412 to move up and down. Therefore, it is not necessary to adjust the local height of the support plate 3 from below.
[0038] It should be noted that, due to the large size of the bearing plate 3 and the presence of numerous pushers 41, air-floating structures, and other structures beneath it, it is difficult to adjust the flatness of the large bearing plate 3 from below.
[0039] In this embodiment, the bearing correction stage is adapted to the substrate processing of G6 and G8.5 generation production lines. The substrate size is large, so the bearing plate 3 is also large.
[0040] Furthermore, the pusher 41 also includes an elastic element 414, which is arranged between the mounting sleeve 412 and the pusher flange 411. The elastic force of the elastic element 414 causes its two ends to abut against the pusher flange 411 and the mounting sleeve 412, respectively.
[0041] This configuration utilizes the elastic force of the elastic element 414 to push the mounting sleeve 412 and the push flange 411 against each other, thereby increasing the damping of the adjustment screw 413 and preventing the adjustment screw 413 from loosening. This ensures the adjusted position height of the push flange 411 while maintaining the local height of the bearing plate 3. Furthermore, it makes it easier to control the rotation angle of the adjustment screw 413 when rotating, thus improving the movement accuracy of the push flange 411. Therefore, it can improve the height adjustment accuracy of the specific position of the bearing plate 3.
[0042] Reference Figures 2-4 Specifically, the elastic element 414 includes a spring, which is sleeved on the adjusting screw 413.
[0043] The pusher 41 also includes a fixing sleeve 415, which is fixed to the mounting plate 2. The mounting sleeve 412 passes through the fixing sleeve 415 and is threadedly connected to the fixing sleeve 415. The height of the top of the mounting sleeve 412 can be adjusted by screwing the mounting sleeve 412 relative to the fixing sleeve 415.
[0044] Reference Figures 2-4 Specifically, the fixing sleeve 415 is fixed to the mounting plate 2 by bolts. Before the bearing plate 3 is installed, the height of the mounting sleeve 412 relative to the fixing sleeve 415 is adjusted by rotating the mounting sleeve 412. The adjustment makes the top height of the push flange 411 on all the mounting sleeves 412 consistent, so as to facilitate the fixing of the bearing plate 3 to multiple push flanges 411 and ensure that multiple push flanges 411 support the bearing plate 3.
[0045] This configuration allows for adjustments to the height of the mounting sleeve 412 relative to the fixed sleeve 415. On one hand, it allows for adjustments to the installation height of the bearing plate 3 relative to the mounting plate 2 to accommodate different installation heights of the bearing plate 3. On the other hand, by adjusting the height of the mounting sleeve 412 before installing the bearing plate 3, it ensures that all the pushing parts 41 support the bearing plate 3, facilitating subsequent adjustments to the flatness of the bearing plate 3 by fine-tuning the height of the pushing flange 411.
[0046] Reference Figures 2-4The pusher 41 also includes a locking nut 416, which is threaded onto the mounting sleeve 412 and is adapted to press against the end face of the fixing sleeve 415 to lock the mounting sleeve 412 and prevent relative movement between the mounting sleeve 412 and the fixing sleeve 415.
[0047] In addition, the support assembly 4 also includes a plurality of support columns 42, which are arranged along the edge of the mounting plate 2 and are used to support the edge of the bearing plate 3.
[0048] Reference Figures 5-8 Furthermore, the support and correction platform also includes a rotating assembly 5, and the mounting plate 2 is rotatably connected to the base 1 through the rotating assembly 5.
[0049] This arrangement of the rotating component 5 ensures the rotational accuracy of the mounting plate 2.
[0050] Reference Figures 5-7 Specifically, the rotating assembly 5 includes a rotating base 51, a correction drive component 53, and multiple arc-shaped guide rails 52. The fixed end of the rotating base 51 is fixedly mounted to the base 1, and the rotating end of the rotating base 51 is connected to the mounting plate 2. Specifically, the rotating end of the rotating base 51 is fixed to the mounting plate 2, preferably by bolts. The rotating base 51 enables the mounting plate 2 to rotate with high precision relative to the base 1. The rotating base 51 supports the bottom center of the mounting plate 2, and the rotating base 51 is located at the center of gravity of the mounting plate 2 to prevent the mounting plate 2 from tilting. Therefore, ensuring the levelness of the bearing plate 3 on the mounting plate 2 ensures the height consistency of the surface of the bearing plate 3.
[0051] Reference Figures 5-7 Multiple arc-shaped guide rails 52 are evenly arranged around the rotation axis of the mounting plate 2, with the center line of each arc-shaped guide rail 52 coinciding with the rotation axis of the rotating seat 51. The track portion of each arc-shaped guide rail 52 is fixedly mounted to the base 1, and the sliding portion of each arc-shaped guide rail 52 is fixedly connected to the mounting plate 2. Multiple arc-shaped guide rails 52 are arranged near multiple edges of the bottom of the mounting plate 2. Each arc-shaped guide rail 52 supports multiple edges of the bottom of the mounting plate 2. Therefore, the edges of the mounting plate 2 are all supported, preventing deformation of parts of the mounting plate 2 due to suspension, thus ensuring the levelness of the bearing plate 3 and the base plate, as well as the consistency of the upper surface height.
[0052] This configuration, with the rotating seat 51 and multiple arc-shaped guide rails 52 supporting the mounting plate 2, provides large-scale support to the bottom of the mounting plate 2, preventing the mounting plate 2 from being suspended and deformed. As a result, the mounting plate 2 is less likely to collapse in certain areas, thus ensuring the flatness of the support plate 3 and the substrate on the support plate 3, and guaranteeing the film formation quality on the substrate surface.
[0053] Reference Figures 5-7The correction drive 53 is connected to the mounting plate 2 to drive the mounting plate 2 to rotate.
[0054] With this configuration, the mounting plate 2 can be rotated by the correction drive 53, thereby adjusting the length direction of the substrate placement.
[0055] Specifically, the correction drive 53 includes either a linear drive or a rotational drive. Both can achieve the rotation of the mounting plate 2, and no limitation is made here.
[0056] Reference Figures 5-7 Furthermore, the rotating assembly 5 also includes multiple multi-axis support platforms 54, which are located between the mounting plate 2 and the base 1. The multiple multi-axis support platforms 54 support multiple corners of the mounting plate 2 respectively, and the moving end of the multi-axis support platform 54 moves with the movement of the mounting plate 2 to maintain support for the corners of the mounting plate 2.
[0057] This configuration, with the multi-axis support platform 54 supporting the corners of the mounting plate 2, prevents deformation at the corners of the mounting plate 2, thus ensuring the flatness of the mounting plate 2, the carrier plate 3, and the substrate.
[0058] It is important to note that in the processing of large-size substrates, the mounting plate 2 is relatively large, and deformation of any part of the mounting plate 2 will affect the flatness of the carrier plate 3, and thus the flatness of the substrate. In actual mass production, even if the flatness of the carrier plate 3 is adjusted to the process requirements during the debugging phase, the carrier correction table needs to work for a long time. If some parts of the mounting plate 2 lack support, deformation can easily accumulate during processing, which will affect the flatness of the carrier plate 3 and ultimately the flatness of the substrate.
[0059] Reference Figures 5-7 Specifically, the multi-axis support platform 54 includes a fixed base 541, a first sliding plate 542, a second sliding plate 543, and a rotating plate 544. The fixed base 541 is fixed to the base 1 by bolts. The first sliding plate 542 is slidably arranged on the fixed base 541, the second sliding plate 543 is slidably arranged on the first sliding plate 542, and the rotating plate 544 is rotatably connected to the second sliding plate 543. The rotating plate 544 is also connected to the mounting plate 2. Specifically, the rotating plate 544 is fixed to the mounting plate 2, preferably by bolts. Thus, the corners of the mounting plate 2 can be supported by the fixed base 541, the first sliding plate 542, the second sliding plate 543, and the rotating plate 544.
[0060] Reference Figures 5-7 The sliding directions of the first sliding plate 542 and the second sliding plate 543 are arranged at an angle. In this embodiment, the sliding directions of the first sliding plate 542 and the second sliding plate 543 are arranged perpendicularly.
[0061] As the mounting plate 2 rotates, the first sliding plate 542 and the second sliding plate 543 slide adaptively, and the rotating plate 544 rotates adaptively. Therefore, during the rotation of the mounting plate 2, the corners of the mounting plate 2 can still be supported, and deformation at the corners of the mounting plate 2 can be avoided.
[0062] It should be noted that when using the rotating mounting plate 2 to drive the carrier plate 3 and the substrate to rotate for substrate correction, the substrate generally has a small skew angle during loading, and the rotation angle of the mounting plate 2 is also small. Therefore, the multi-axis support stage 54 can meet the rotation angle requirements of the mounting plate 2.
[0063] When the mounting plate 2 rotates, the rotating end of the rotating seat 51 rotates synchronously. As the mounting plate 2 rotates, the rotating plate 544 of the multi-axis support platform 54 rotates because it supports the corners of the mounting plate 2. In addition, the second sliding plate 543 and the first sliding plate 542 both slide to support the rotation of the mounting plate 2.
[0064] Correspondingly, by causing the first sliding plate 542 to slide, the second sliding plate 543 will slide due to the change in the position of the first sliding plate 542, and the rotating plate 544 will rotate, so as to realize the rotation of the mounting plate 2.
[0065] This configuration utilizes a rotating base 51, multiple arc-shaped guide rail assemblies 52, and multiple multi-axis support platforms 54 to rotatably connect the mounting plate 2 to the base 1, providing all-around support for the mounting plate 2. This greatly reduces the possibility of deformation of the mounting plate 2 during long-term processing, ensuring that the flatness of the support plate 3 and the substrate is not affected, and guaranteeing the film formation quality on the substrate surface.
[0066] In this embodiment, the correction drive 53 includes a linear module and an additional multi-axis support platform 54. The linear module is driven to the mounting plate 2 via the multi-axis support platform 54. The linear module is driven to the first sliding plate 542, causing the first sliding plate 542 to slide, thereby synchronously driving the mounting plate 2 to rotate. Specifically, the linear module includes a lead screw mechanism or a linear motor.
[0067] This configuration, by driving the first sliding plate 542 to slide and transmitting power to the mounting plate 2, allows the mounting plate 2 to rotate, resulting in higher rotational precision. A larger displacement of the first sliding plate 542 will only cause the mounting plate 2 to rotate by a smaller angle, thus achieving higher positional adjustment accuracy for the mounting plate 2.
[0068] In some embodiments, the correction drive 53 includes a linear module for driving a first sliding plate 542 to slide, thereby synchronously driving the mounting plate 2 to rotate. Specifically, the linear module includes a lead screw mechanism or a linear motor.
[0069] The mounting plate 2 can be rotated either by directly sliding the first sliding plate 542 on the multi-axis support platform 54 at the corner of the mounting plate 2, or by additionally arranging a multi-axis support platform 54, with the additional multi-axis support platform 54 having the same installation configuration as the other multi-axis support platforms 54 below the mounting plate 2, and by sliding the first sliding plate 542 of the additional multi-axis support platform 54, thereby rotating the mounting plate 2. Both methods are acceptable.
[0070] Reference Figure 2 and Figure 9 The support and correction platform further includes a pin assembly 6, which comprises a pin frame 61, a lifting drive 63, and multiple pin components 62. The pin frame 61 moves up and down between the mounting plate 2 and the support plate 3 via a slide rail. Multiple pin components 62 are mounted on the pin frame 61, and the support plate 3 has multiple through holes for the pin components 62 to pass through. The lifting drive 63 is driven by the pin frame 61 to move the pin frame 61 and all the pin components 62 up and down, allowing the pin components 62 to pass through the through holes and extend above the support plate 3. In this embodiment, the lifting drive 63 includes a lead screw mechanism, a linear motor, a cylinder, or an electric cylinder.
[0071] With this configuration, when the substrate is loaded and unloaded, the ejector pins 62 rise above the support plate 3, and multiple ejector pins 62 support the substrate, thereby leaving space between the substrate and the support plate 3, and leaving space for the external robot arm to facilitate the loading and unloading of the substrate.
[0072] Reference Figure 9 and Figure 10 Specifically, the ejector pin 62 includes an ejector rod 621.
[0073] Reference Figure 9 and Figure 10 Furthermore, the ejector pin 62 also includes a ball 622, which is mounted on the top of the ejector rod 621, and the ejector rod 621 supports the substrate through the ball 622.
[0074] With this configuration, when the substrate is being loaded and unloaded, the substrate comes into contact with the ball bearing 622, resulting in rolling friction between the ball bearing 622 and the substrate, thus making it less likely to damage the substrate.
[0075] The beneficial effects of the technical solution provided in this application include: This application provides a support and alignment stage. During substrate processing or inspection, the substrate is placed on a support plate 3, and the support and alignment stage supports the substrate. As the support and alignment stage moves, the substrate moves. After the substrate is placed on the support plate 3, the mounting plate 2 rotates relative to the base 1, thereby causing the support plate 3 and the substrate to rotate synchronously. This adjusts the length and width directions of the substrate, achieving alignment of the substrate to meet the subsequent processing or inspection requirements.
[0076] Before placing the substrate onto the support plate 3, the flatness of the support plate 3 needs to be checked to avoid unevenness on its surface and ensure uniform support for the substrate. Multiple pushers 41 are used to support different positions on the support plate 3. By adjusting the height of the different pushers 41, the height of different positions on the support plate 3 is adjusted to ensure that the height of the support plate is consistent across all three positions. This ensures uniform support for the substrate and prevents deformation. Therefore, ensuring consistent height across the substrate not only prevents deformation but also ensures consistent distances between the substrate and processing or inspection components above it, guaranteeing consistent processing and reliable inspection, and ensuring the molding quality of the functional layers on the surface of large-size substrates.
[0077] Furthermore, when dealing with large-sized substrates, the dimensions of the support plate 3 also vary significantly, making it more prone to unevenness. By arranging multiple pushers 41 and providing adjustment holes 3a on the support plate 3, the height of all pushers 41 can be easily adjusted from above the support plate 3, thereby leveling the support plate 3. Therefore, during the adjustment of the support plate 3, there is no need to operate from below the support plate 3, making it easier to adjust the height of various parts of the support plate 3 and ensuring the flatness of the large-sized support plate 3.
[0078] Another embodiment of this application provides a processing system including the load-bearing correction table as described above.
[0079] Specifically, the processing system includes an inkjet printing system, a defect detection system, and so on.
[0080] Another embodiment of this application provides a processing system. Since the processing system includes the above-mentioned bearing and correction table, the beneficial effects of the processing system are the same as those of the above-mentioned bearing and correction table, and will not be repeated here.
[0081] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.
[0082] It should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.
[0083] The above description is merely a specific embodiment of this application, enabling those skilled in the art to understand or implement this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.
Claims
1. A support and correction platform, characterized in that, It includes: Base; Mounting plate, which is rotatably connected to the base; A support plate, located above the mounting plate, is used to support a substrate; A support assembly is provided, wherein the mounting plate supports the carrier plate via the support assembly, the support assembly includes multiple pushers, the multiple pushers are evenly distributed below the carrier plate, the fixed ends of the pushers are mounted on the mounting plate, and the movable ends of the pushers are connected to the bottom surface of the carrier plate; The operating end of the pusher is located at the top of the movable end of the pusher, and the surface of the bearing plate is provided with a plurality of through adjustment holes, and the movable ends of the plurality of pushers are respectively installed at the plurality of adjustment holes of the bearing plate; The adjustment hole acts on the operating end of the pusher to adjust the height of the movable end of the pusher, thereby changing the height of the bearing plate.
2. The bearing correction platform according to claim 1, characterized in that, The pusher includes: A push-top flange, which is fixed to the bottom surface of the bearing plate; The mounting sleeve is connected to the mounting plate; An adjusting screw is provided, which passes through the push flange and the mounting sleeve, and is threadedly connected to both the push flange and the mounting sleeve; the top of the adjusting screw is aligned with the adjusting hole. The adjusting screw is rotated through the adjusting hole to cause the mounting sleeve to move up and down, thereby adjusting the local height of the support plate.
3. The bearing correction table according to claim 2, characterized in that, The pusher also includes an elastic element, which is arranged between the mounting sleeve and the pusher flange. The elastic force of the elastic element causes its two ends to abut against the pusher flange and the mounting sleeve, respectively.
4. The bearing correction table according to claim 2, characterized in that, The pusher also includes a fixing sleeve, which is fixed to the mounting plate. The mounting sleeve passes through the fixing sleeve and is threadedly connected to the fixing sleeve. The height of the top of the mounting sleeve can be adjusted by twisting the mounting sleeve relative to the fixing sleeve.
5. The bearing correction table according to any one of claims 1 to 4, characterized in that, The support plate is composed of multiple single plates spliced together.
6. The bearing correction platform according to claim 1, characterized in that, It also includes a rotating assembly, through which the mounting plate is rotatably connected to the base; the rotating assembly includes: A rotating base, wherein the fixed end of the rotating base is mounted on the base, and the rotating end of the rotating base is connected to the mounting plate; Multiple arc-shaped guide rail groups are evenly arranged around the rotation axis of the mounting plate. The track portion of the arc-shaped guide rail group is installed on the base, and the sliding portion of the arc-shaped guide rail group is connected to the mounting plate. A correction drive component is connected to the mounting plate to drive the mounting plate to rotate; The rotating base supports the bottom center of the mounting plate, and the multiple arc-shaped guide rails support multiple edges of the bottom of the mounting plate.
7. The bearing correction table according to claim 6, characterized in that, The rotating assembly also includes multiple multi-axis support platforms, which are disposed between the mounting plate and the base, and the multiple multi-axis support platforms respectively support multiple corners of the mounting plate; The multi-axis support platform includes: The fixing seat is fixed to the base; A first sliding plate is slidably arranged on the fixed base; A second sliding plate is slidably arranged on the first sliding plate; A rotating plate, which is rotatably connected to the second sliding plate and connected to the mounting plate, to support the edges and corners of the mounting plate; The sliding directions of the first sliding plate and the second sliding plate are arranged at an angle. As the mounting plate rotates, the first sliding plate and the second sliding plate slide adaptively, and the rotating plate rotates adaptively.
8. The bearing correction table according to claim 7, characterized in that, The correction drive includes a linear module, which is used to drive a first sliding plate to slide, thereby synchronously driving the mounting plate to rotate.
9. The bearing correction platform according to claim 1, characterized in that, It also includes a ejector pin assembly, the ejector pin assembly comprising: Ejector pin holder, which moves vertically between the mounting plate and the support plate; Multiple ejector pins are mounted on the ejector pin frame, and the support plate has multiple through holes for the ejector pins to pass through. A lifting drive is provided, which is connected to the ejector pin frame to drive the ejector pin frame and all the ejector pins to move up and down, thereby causing the ejector pins to extend above the support plate.
10. A processing system, characterized in that, Includes the load-bearing correction table as described in any one of claims 1 to 9.