Method, device and equipment for checking graphics

Abstract

The present disclosure provides a pattern inspection method, device and electronic equipment. The pattern inspection method is used for inspecting at least one group of contact hole patterns in a layout. The group of contact hole patterns includes a plurality of contact hole patterns arranged side by side along a first direction, and the plurality of contact hole patterns have different sizes. The method includes: establishing an auxiliary layer on the layout, the auxiliary layer including a plurality of auxiliary patterns arranged side by side along the first direction, the plurality of auxiliary patterns corresponding to and overlapping with the centers of the plurality of contact hole patterns, and the plurality of auxiliary patterns being the same; obtaining a first interval distance between each adjacent two auxiliary patterns in the plurality of auxiliary patterns; and verifying the plurality of first interval distances.

Description

Technical Field

[0001] This disclosure relates to the field of integrated circuit technology, and in particular to methods, apparatus and equipment for inspecting patterns. Background Technology

[0002] Design Rule Check (DRC) is a crucial step in chip design. It verifies whether a design conforms to specific standards and specifications through predefined rules, thereby ensuring testability and overall quality. Currently, ultra-high-density memory devices with three-dimensional (3D) stacked architectures are developing rapidly. Bit lines or word lines in 3D stacked memory devices can be designed as stepped structures; however, the apertures of the contact plugs on different steps in a stepped structure are not all the same, making DRC challenging. Summary of the Invention

[0003] According to a first aspect of this disclosure, a method for inspecting a pattern is provided for inspecting at least one set of contact hole patterns in a layout, said set of contact hole patterns comprising a plurality of contact hole patterns arranged side-by-side along a first direction, the plurality of contact hole patterns having different sizes; the method includes:

[0004] An auxiliary layer is established on the layout. The auxiliary layer includes a plurality of auxiliary graphics arranged side by side along the first direction. The centers of the plurality of auxiliary graphics overlap with those of the plurality of contact hole graphics, and the plurality of auxiliary graphics are identical.

[0005] Obtain the first interval distance between every two adjacent auxiliary graphics in the plurality of auxiliary graphics;

[0006] Verify multiple first interval distances.

[0007] In some embodiments, verifying the plurality of first interval distances includes:

[0008] Each of the first interval distances is compared with the first preset interval distance;

[0009] If the first interval distance is less than the first preset interval distance, then a first error message is generated;

[0010] If the first interval distance is greater than the first preset interval distance, a second error message is generated.

[0011] In some embodiments, the width dimension of the auxiliary pattern along the first direction is less than or equal to the width dimension of the contact hole pattern with the smallest width among the plurality of contact hole patterns.

[0012] In some embodiments, the size of the plurality of contact hole patterns gradually increases or decreases.

[0013] In some embodiments, the layout further includes a marker graphic disposed side-by-side with the contact hole graphic along a second direction, the marker graphic having a reference edge extending along the first direction; the second direction intersects the first direction;

[0014] The method further includes:

[0015] Obtain the second interval distance between the edge of each auxiliary graphic extending along the first direction and the reference edge;

[0016] Verify multiple second interval distances.

[0017] In some embodiments, verifying the plurality of second interval distances includes:

[0018] Each of the second interval distances is compared with the second preset interval distance;

[0019] If the second interval distance is less than the second preset interval distance, a third error message is generated.

[0020] In some embodiments, the method further includes:

[0021] The dimensions of at least the largest and smallest contact hole patterns among the plurality of contact hole patterns are obtained, and the dimensions of the largest and smallest contact hole patterns are verified.

[0022] In some embodiments, verifying the dimensions of the largest and smallest contact hole patterns includes:

[0023] The dimensions of the largest and smallest contact hole patterns are compared with a first preset size, and the dimensions of the largest and smallest contact hole patterns are compared with a second preset size.

[0024] If the size of either contact hole pattern is smaller than the first preset size, a fourth error message is generated;

[0025] If the size of either contact hole pattern is larger than the second preset size, a fifth error message is generated; if the first preset size is smaller than the second preset size.

[0026] In some embodiments, the auxiliary graphic is a square.

[0027] In some embodiments, each contact hole pattern includes a first end and a second end along a vertical direction; the vertical direction is perpendicular to the first direction and the second direction.

[0028] The method further includes:

[0029] Obtain all contact hole patterns in the layout where the first end is located in the first metal layer and the second end is located in the second metal layer structure; wherein, the second metal layer structure includes multiple second metal layers arranged in a stepped manner;

[0030] Verify the number of all the contact hole patterns.

[0031] In some embodiments, the layout includes a memory cell pattern for forming memory cells;

[0032] Each second metal layer in the second metal layer structure includes a bit line coupled to the memory cell; or each second metal layer in the second metal layer structure includes a word line coupled to the memory cell.

[0033] According to a second aspect of this disclosure, a graphic inspection apparatus is provided, the apparatus comprising:

[0034] A setting module is used to establish an auxiliary layer on the layout, the layout including at least one set of contact hole patterns, the set of contact hole patterns including multiple contact hole patterns arranged side by side along a first direction, the multiple contact hole patterns having different sizes; the auxiliary layer including multiple auxiliary patterns arranged side by side along the first direction, the multiple auxiliary patterns correspondingly overlapping the centers of the multiple contact hole patterns, and the multiple auxiliary patterns having the same size;

[0035] The acquisition module is used to acquire the first interval distance between every two adjacent auxiliary graphics in the plurality of auxiliary graphics;

[0036] A verification module is used to verify each of the first interval distances.

[0037] According to a third aspect of this disclosure, an electronic device is provided, the electronic device comprising:

[0038] Memory, used to store executable commands;

[0039] A processor, when executing executable instructions stored in the memory, implements a method for inspecting graphics as described in any of the first aspects of this disclosure.

[0040] This disclosure provides a method for checking the design rules of holes in a layout, used to detect at least one set of contact hole patterns in the layout. This set of contact hole patterns includes multiple contact hole patterns arranged side-by-side along a first direction. According to the design rules, the multiple contact hole patterns should be arranged with equal center-to-center distances along the first direction. Therefore, multiple auxiliary patterns overlapping the centers of the multiple contact hole patterns are also arranged with equal center-to-center distances along the first direction. Since the dimensions of the multiple auxiliary patterns are identical, the first interval distance between any two adjacent auxiliary patterns should also be equal. Thus, the DRC detection software can obtain the first interval distance between adjacent auxiliary patterns and simultaneously verify whether multiple first interval distances meet the requirements using simple rules, thereby verifying whether the center distance between any two adjacent contact hole patterns meets the design requirements. This disclosure does not focus solely on detecting the spacing between adjacent contact hole patterns, but rather takes a different approach. Considering that detecting the center distance between adjacent contact hole patterns is more practical, by setting auxiliary patterns and simultaneously verifying whether the first interval distance between any two adjacent auxiliary patterns meets the design requirements, it can simultaneously determine whether the center distance between any two adjacent contact hole patterns meets the requirements, improving inspection efficiency and ensuring reliable inspection results. Attached Figure Description

[0041] Figure 1 This is a schematic diagram of a DRAM stacking structure provided in an embodiment of the present disclosure.

[0042] Figure 2 for Figure 1 The diagram shows a cross-sectional view of the DRAM stack structure along the XZ plane.

[0043] Figure 3 for Figure 1 A schematic diagram of a set of contact holes in the DRAM stack structure shown.

[0044] Figure 4 This is a schematic diagram of a bit line and a contact hole provided in an embodiment of the present disclosure.

[0045] Figure 5 This is a schematic diagram of another set of contact holes provided in an embodiment of this disclosure.

[0046] Figure 6 This is a flowchart illustrating a method for checking the design rules of holes in a layout, as provided in an embodiment of this disclosure.

[0047] Figure 7 This is a schematic diagram of an auxiliary layer provided in an embodiment of the present disclosure.

[0048] Figure 8 This is a schematic diagram of an auxiliary layer including marker graphics provided in an embodiment of the present disclosure.

[0049] Figure 9 This is a schematic diagram of a layout hole design rule checking device provided in an embodiment of the present disclosure. Detailed Implementation

[0050] Exemplary embodiments of the present disclosure will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be implemented in various forms and should not be limited to the specific embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art.

[0051] Where possible, the same reference numerals will be used throughout the accompanying drawings to refer to the same or similar parts. It is obvious that the aspects described are only some, and not all, of the aspects of this disclosure. Features in the various aspects may be interchanged and / or combined.

[0052] In the description of this disclosure, it should be understood that the terms “length,” “width,” “depth,” “upper,” “lower,” “outer,” etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this disclosure and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure.

[0053] DRAM (Dynamic Random Access Memory) is currently transitioning to a high-density 3D stacked structure. Figure 1 This is a schematic diagram of a DRAM stacking structure provided in an embodiment of the present disclosure. Figure 2 for Figure 1 The cross-sectional view of the DRAM stack structure shown along the XZ plane illustrates the bit lines and contact holes. Figure 2 The figure is shown as follows Figure 1 As shown, the stacked structure 10 includes a memory array region 11 and a bit line region 12 arranged side by side. The memory array region 11 includes memory cells stacked vertically. For example, the vertical direction is the Z-direction. The bit line region 12 includes multiple layers of bit lines 20 stacked vertically, with each layer of bit lines having a stepped structure, and a portion of each layer exposed beyond the layer above it. Each exposed portion of the bit line 20 has a contact hole 30, also called a contact plug. The contact hole 30 extends vertically to an interconnect layer or pad layer above the stacked structure. Typically, the contact holes of all bit lines extend upwards to the same metal layer of the interconnect layer or pad layer. Therefore, as... Figure 1 and Figure 2As shown, the contact holes 30 connected to different position lines 20 have different depths. Among them, the contact hole connected to the uppermost step of the stepped structure has the smallest depth, while the contact hole connected to the lowermost step has the largest depth.

[0054] In the prior art, the radial dimensions of contact holes of different bit lines are usually designed to be equal. Figure 3 for Figure 1 A schematic diagram of a set of contact holes in a DRAM stack structure is shown. Figure 3 As shown, the contact holes 30 of the multi-layer bit line are all square and of equal size. Furthermore, the multiple contact holes 30 are evenly spaced and pitched along a specified direction (X or Y direction). Therefore, a simple DRC rule can be used to check whether the spacing between the contact holes meets the design rules. For example, by simply setting a preset spacing value, it is possible to determine whether the spacing between any two adjacent contact holes meets the requirements.

[0055] In this embodiment of the disclosure, in order to increase the process window and improve the reliability of the contact between the contact hole and the bit line, the radial dimension of the contact hole with a large depth is set to be larger, while the radial dimension of the contact hole with a small depth is relatively smaller. Figure 4 This is a schematic diagram of a bit line and a contact hole provided in an embodiment of this disclosure. Figure 5 This is a schematic diagram of another set of contact holes provided in an embodiment of this disclosure. (See diagram below.) Figure 4 As shown, the closer the bit line 20 is to the substrate 40, the larger the width of its contact hole 30. Figure 5 As shown, the multiple contact holes 30 corresponding to different bit lines 20 are all square, but their sizes are different. For example, as... Figure 5 In the diagram, from left to right, the width of the multiple contact holes 30 gradually decreases, and the center-to-center distance (pitch) of the multiple contact holes 30 is set equally. That is, the center-to-center distance between any two adjacent contact holes 30 is consistent, but because the size of the contact holes decreases continuously from left to right, the spacing (space) between any two contact holes 30 is different.

[0056] Typical DRC software can only check the distance between lines in a pattern. In this embodiment, it can only check the space between adjacent contact holes, not the pitch. Because the spacing between every two contact holes 30 is different, it's impossible to check whether the contact holes 30 meet the requirements using simple DRC rules. Manual inspection would be time-consuming and prone to oversights, leading to fabrication failures.

[0057] In view of this, embodiments of this disclosure propose a method for inspecting graphics. Figure 6This is a flowchart illustrating a method for inspecting patterns according to an embodiment of the present disclosure. The method is used to inspect at least one set of contact hole patterns in a layout. The set of contact hole patterns includes multiple contact hole patterns arranged side-by-side along a first direction, and the multiple contact hole patterns have different sizes, such as... Figure 6 As shown, the inspection method includes:

[0058] S100: An auxiliary layer is established on the layout. The auxiliary layer includes multiple auxiliary graphics arranged side by side along the first direction. The centers of the multiple auxiliary graphics overlap with the centers of multiple contact hole graphics, and the dimensions of the multiple auxiliary graphics are the same.

[0059] S200: Obtain the first interval distance between every two adjacent auxiliary graphics in a plurality of auxiliary graphics;

[0060] S300: Verify the distance of each first interval.

[0061] Figure 7 This is a schematic diagram of an auxiliary layer provided in an embodiment of this disclosure. The following is in conjunction with... Figure 7 This disclosure details the method for checking the design rules of holes in the layout provided.

[0062] For example, the layout includes an array of contact hole patterns, which comprises multiple rows and multiple columns of contact hole patterns. For instance, Figure 1 The layout corresponding to the stacked structure shown may include multiple contact hole pattern arrays. Each contact hole pattern array includes multiple columns of contact hole patterns arranged side by side along the X direction and multiple rows of contact hole patterns arranged side by side along the Y direction. Each column of contact hole patterns includes multiple contact hole patterns spaced apart along the Y direction, and each row of contact hole patterns includes multiple contact hole inner patterns spaced apart along the X direction. Figure 1 Two contact hole pattern arrays are shown, and a 3-row, 3-column pattern of contact holes is shown in each contact hole pattern array. It should be understood that the number of contact hole patterns in each row and column of the contact hole pattern array is not limited to this, and each row and column may include more contact hole patterns, such as dozens, hundreds or thousands, and this disclosure does not limit this.

[0063] In this embodiment of the present disclosure, a set of contact hole patterns includes multiple contact hole patterns arranged side by side along a first direction. This first direction can be either the row direction or the column direction of the contact hole pattern array. That is, a set of contact hole patterns can be a row of contact hole patterns or a column of contact hole patterns; this disclosure does not impose any limitation on this. Steps S100 to S300 of this disclosure only show the steps for inspecting a column or a row of contact hole patterns. When inspecting multiple rows or columns of contact hole patterns, the above steps can be repeated sequentially for each row or column to complete the inspection of the entire contact hole pattern array.

[0064] The multiple contact hole patterns have different dimensions. For example, the width of the multiple contact hole patterns gradually increases or decreases along the first direction. In this embodiment, such as... Figure 7 As shown, along the first direction from left to right, the width of the multiple contact hole patterns 100 gradually decreases. For example, different contact hole patterns correspond to different contact hole depths; the smaller the width, the shallower the depth of the contact hole, and the larger the width, the deeper the contact hole.

[0065] According to design rules, the center-to-center distance (pitch) of any two adjacent contact hole patterns should be equal. Here, the center-to-center distance of adjacent contact hole patterns refers to the distance between the geometric centers (O) of the two contact hole patterns. Contact hole patterns are typically regular geometric shapes, such as squares, rectangles, circles, and ellipses. The geometric center of a square or rectangle is the intersection of its diagonals, while the geometric center of a circle or ellipse is its center. The equal center-to-center distance between any two adjacent contact hole patterns (100) ensures that when interconnect layers or pad layers are subsequently placed on the contact holes, the conductive lines corresponding to multiple contact holes arranged side-by-side along the first direction are parallel and equidistant, resulting in more regular routing of the interconnect layers or pad layers.

[0066] like Figure 7 As shown, an auxiliary layer is created on the layout. For example, the auxiliary layer is not part of the layout but is generated by the DRC software. In some embodiments, the auxiliary layer can be generated by writing a DRC script file, which the DRC software runs. The auxiliary layer includes a plurality of auxiliary graphics 200 arranged side-by-side along a first direction, the plurality of auxiliary graphics 200 correspondingly overlapping with the center point O of a plurality of contact hole graphics 100, where the center refers to the geometric center. Furthermore, the plurality of auxiliary graphics 200 are of the same size, meaning they are identical graphics.

[0067] like Figure 7As shown, according to the design rules, multiple contact hole patterns 100 should be set with equal center-to-center distances (pitch) along the first direction. Therefore, multiple auxiliary patterns 200 should also be set with equal center-to-center distances along the first direction. Since the dimensions of the multiple auxiliary patterns 200 are identical, the first interval distance S1 (space) between any two adjacent auxiliary patterns should also be equal. Thus, the DRC software can obtain the first interval distance S1 between adjacent auxiliary patterns 200 and simultaneously verify whether multiple first interval distances meet the requirements using simple rules. This allows verification of whether the center distance between any two adjacent contact hole patterns meets the design requirements. This disclosure does not focus solely on detecting the spacing between adjacent contact hole patterns but takes a different approach. Considering that detecting the center distance between adjacent contact hole patterns is more practical, by setting auxiliary patterns and simultaneously verifying whether the first interval distance between each adjacent auxiliary pattern meets the design requirements, the center distance between each adjacent contact hole pattern can be determined simultaneously, improving inspection efficiency and ensuring reliable inspection results.

[0068] For example, the auxiliary pattern 200 and the contact hole pattern 100 are similar in shape. For instance, if the contact hole pattern is a square, then the auxiliary pattern is also a square. If the contact hole pattern is a circle, then the auxiliary pattern is also a circle. This eliminates the influence of the shape of the pattern on the measurement results, making the measurement results more accurate. In this embodiment, the contact hole pattern 100 is a square, and the auxiliary pattern 200 is also a square.

[0069] For example, the size of the auxiliary pattern 200 is designed to be as small as possible to reduce the impact of measurement errors on the measurement results. In this embodiment, the width of the auxiliary pattern 200 along the first direction is less than or equal to the width of the contact hole pattern 100 with the smallest width among the plurality of contact hole patterns. For example Figure 7 In the diagram, the contact hole pattern 100 with the smallest width is the rightmost contact hole pattern, while the width of the auxiliary pattern 200 is smaller than the width of each contact hole pattern 100, and smaller than the width of the rightmost contact hole pattern. In another embodiment, the width of the auxiliary pattern 200 may also be equal to the width of the contact hole pattern with the smallest width.

[0070] In some embodiments, auxiliary graphics can be generated in the following manner:

[0071] Extract the center of the contact hole pattern; use the center of the contact hole pattern as the center of the auxiliary pattern to generate an auxiliary pattern of a specific size.

[0072] For example, DRC software can be run to generate a database of the layout; then, a DRC script file can be used to extract the geometric information of the contact hole pattern from the database, thereby obtaining the position information of the center of the contact hole pattern. In other embodiments, other methods can also be used to extract the center of the contact hole pattern.

[0073] In some embodiments, the auxiliary pattern is a square with a side length of 0.001 μm. The step of using the center of the contact hole pattern as the center of the auxiliary pattern and generating an auxiliary pattern of a specific size specifically includes: generating an auxiliary pattern of a specific size based on the center of the contact hole using a boundary-defining programming language. For example, the boundary-defining programming language could be Extend. An auxiliary square with a side length of 0.001 μm can be found outwards from the center of the contact hole pattern.

[0074] The DRC software can automatically execute step S200 to obtain the first interval distance between every two adjacent auxiliary graphics. The DRC software can identify the edges of each auxiliary graphic and measure the distance between the outer edges of two auxiliary graphics to obtain the first interval distance S1.

[0075] Next, step S300 is executed, while verifying multiple first interval distances. In some embodiments, this can be achieved by comparing each first interval distance with a first preset interval distance, wherein the first preset interval distance is equal to the difference between the preset center distance between adjacent contact hole patterns and the width dimension of the auxiliary pattern along the first direction; if the first interval distance is less than the first preset interval distance, a first error message is generated.

[0076] The difference between the preset center distance between adjacent contact hole patterns and the width of the auxiliary pattern is the first interval distance between adjacent auxiliary patterns required in the design rules, also known as the first preset interval distance.

[0077] by Figure 7 For example, if the position of a contact hole pattern shifts in the first direction, one first interval distance will decrease and the other will increase. In this embodiment, by determining whether each first interval distance is less than a first preset interval distance, this situation can be identified, and information related to the erroneous first interval distance can be indicated in the first error message. For example, the positions of the two contact holes related to the erroneous first interval distance can be indicated, or the two contact holes can be marked.

[0078] In some other embodiments, multiple first interval distances can be verified simultaneously by comparing each first interval distance with a first preset interval distance; if the first interval distance is less than the first preset interval distance, a first error message is generated; if the first interval distance is greater than the first preset interval distance, a second error message is generated.

[0079] This verification method is more stringent. If the first interval distance is less than the first preset interval distance, the DRC software will report an error; if the first interval distance is greater than the first preset interval distance, the DRC software will also report an error. This verifies whether each first interval distance is equal to the first preset interval distance, effectively identifying situations where multiple contact holes shift collectively after a certain contact hole. For example, Figure 7 In the example, the third contact hole from the left is offset to the right, and the fourth contact hole is also offset to the right, but the center distance between them and the third contact hole is equal to the preset center distance. This error can also be identified.

[0080] In practical applications, either method can be selected based on the common error scenarios. If only the case where the distance is less than the first preset interval is checked, the inspection speed is faster. This is understandable, as the number of contact holes may be hundreds or thousands; checking only those smaller saves inspection time. If the case where the distance is checked is greater than or less than the first preset interval, the verification time will be longer, but the inspection will be more comprehensive.

[0081] In some embodiments, the auxiliary graphic is a square, and the DRC software can simultaneously verify whether multiple first interval distances are less than a first preset interval distance in the following manner:

[0082] Check if the first spacing distance (S1) between adjacent auxiliary squares is less than the preset center distance (pitch1) between adjacent contact hole patterns minus half the side length (W) of the two auxiliary squares (pitch1-2*(W / 2)). Determine if the first spacing distance S1 between the auxiliary squares is less than pitch-2*(W / 2). If it is less, report an error. For example, W is the side length of the auxiliary square, such as 0.001μm.

[0083] In some embodiments, the layout further includes a marker pattern arranged side-by-side with a contact hole pattern along a second direction, the marker pattern having a reference edge extending along a first direction; the second direction and the first direction intersect; the inspection method further includes: obtaining a second interval distance between the edge extending along the first direction of each auxiliary pattern and the reference edge; and verifying multiple second interval distances simultaneously.

[0084] Figure 8 This is a schematic diagram of a layout including marker graphics provided for embodiments of this disclosure. Figure 8As shown, according to the design rules, the center O of this group of contact hole patterns should be located on the same straight line L. The layout also includes marker patterns 300, which are arranged side by side and spaced apart from the group of contact hole patterns along the second direction. The marker pattern 300 has a reference edge 310 extending along the first direction, the length of which is greater than the center distance between the first and last contact hole patterns in the group of contact hole patterns 100. According to the design rules, the reference edge 310 should be parallel to the straight line L containing the center of the group of contact hole patterns. Therefore, the reference edge 310 should also be parallel to the straight line containing the center of the group of auxiliary patterns. Consequently, the second interval distance S2 between the reference edge 310 and the edge extending along the first direction of each auxiliary pattern 200 should also be equal.

[0085] In some embodiments, the specific implementation of verifying multiple second interval distances simultaneously is as follows: each second interval distance is compared with a second preset interval distance, wherein the second preset interval distance is equal to the difference between the preset distance from the center of the contact hole pattern to the reference edge and half the length dimension of the auxiliary pattern along the second direction; if the second interval distance is less than the second preset interval distance, a third error message is generated.

[0086] like Figure 8 As shown, the preset distance from the center of the contact hole pattern 100 to the reference edge 310 is specified by the layout designer in the design rules and is known. The length of the auxiliary pattern 200 along the second direction is also specified by the designer and is known. The difference between the preset distance from the center of the contact hole pattern to the reference edge and half the length of the auxiliary pattern along the second direction is the theoretically required second interval distance from the edge of the auxiliary pattern along the first direction to the reference edge, which is also the second preset interval distance.

[0087] For example, such as Figure 1 As shown, the contact hole 30 may be located at the edge of the bit line step. In this case, the marker pattern can be located on the side of the contact hole pattern away from the previous bit line step or away from the memory array area. In some embodiments, if a set of contact hole patterns includes a row of contact hole patterns along the X direction, the marker pattern is located on the side of the contact hole pattern away from the memory array area along the Y direction. If a set of contact hole patterns is a column of contact hole patterns along the Y direction, the marker pattern is located on the side of the contact hole pattern away from the previous bit line step along the X direction. In other embodiments, both a first marker pattern and a second marker pattern may be provided, with the reference edge of the first marker pattern parallel to the row direction of the contact hole pattern array and the reference edge of the second marker pattern parallel to the column direction of the contact hole pattern array. In this way, either the first marker pattern or the second marker pattern can be selected for use as needed.

[0088] like Figure 1If the contact hole 30 is biased towards the edge of the bit line step, in this embodiment, the second interval S2 from the edge of the auxiliary pattern 200 extending along the first direction to the reference edge is less than the second preset interval distance. This poses a risk that the contact hole 30 may detach from the bit line step. In this embodiment, by determining whether each second interval distance S2 is less than the second preset interval distance, it is possible to identify whether a contact hole pattern has shifted towards the side of the marked pattern, resulting in the contact hole potentially detaching from the bit line step. Furthermore, information related to the erroneous second interval distance can be indicated in the second error message. For example, the location of the contact hole related to the erroneous second interval distance can be indicated, or the contact hole can be marked.

[0089] In other embodiments, multiple second interval distances can be verified simultaneously in the following manner: each second interval distance is compared with a second preset interval distance; if the second interval distance is less than the second preset interval distance, a third error result is generated; if the second interval distance is greater than the second preset interval distance, a sixth error message is generated.

[0090] This verification method is more stringent. If the second interval distance is less than the second preset interval distance, the DRC software will report an error; if the second interval distance is greater than the second preset interval distance, the DRC software will also report an error. This verifies whether each second interval distance is equal to the second preset interval distance, ensuring that all contact holes in the group are centered in the second direction and that the distance from the reference edge is equal to the second preset interval distance, thus guaranteeing reliable contact with the corresponding bit line.

[0091] In practical applications, either method can be selected based on the common error scenarios. If only the case where the distance is less than the second preset interval is checked, the check speed is faster. If the case where the distance is checked to be less than or greater than the second preset interval, the check time will be longer, but the inspection will be more comprehensive.

[0092] For example, the DRC software can obtain the second interval distance S2 between the edge extending along the first direction and the reference edge of each auxiliary graphic.

[0093] For example, the auxiliary graphic is a square; the DRC software can simultaneously verify whether multiple second interval distances are less than a second preset interval distance in the following way:

[0094] Check whether the second interval distance S2 between the side of the auxiliary square extending along the first direction and the reference side is less than the preset distance (pitch2) from the center of the contact hole pattern to the reference side minus half the side length (W) of the auxiliary square (pitch2-W / 2). If it is less than this, report an error. For example, W is 0.001μm.

[0095] In some embodiments, the detection method further includes: obtaining at least the dimensions of the largest and smallest contact hole patterns among a plurality of contact hole patterns, and verifying the dimensions of the largest and smallest contact hole patterns.

[0096] For example, size refers to area. That is, in this embodiment, the areas of the contact hole pattern with the largest area and the contact hole pattern with the smallest area can be obtained and verified. In another embodiment, size may also refer to the width dimension along the first direction, that is, the width dimension of the contact hole pattern with the largest width along the first direction can be obtained and verified, and the width dimension of the contact hole pattern with the smallest width along the first direction can be obtained and verified.

[0097] This check assumes that the dimensions of multiple contact hole patterns gradually increase or decrease. Therefore, if the dimensions of the largest and smallest contact hole patterns meet the design rules, then all contact hole patterns are considered to meet the design rules. It's understandable that if the size of a single contact hole pattern in a row increases or decreases, it's relatively easy for a designer to intuitively detect, so this problem is unlikely to occur. However, it's not easy to detect if the overall size of a group of contact hole patterns increases or decreases. Therefore, in this embodiment, during DRC verification, the dimensions of the largest and smallest contact hole patterns are checked to ensure that the dimensions of a group of contact hole patterns are within the design rule requirements.

[0098] In some embodiments, verifying the dimensions of the largest and smallest contact hole patterns includes: comparing the dimensions of the largest and smallest contact hole patterns with a first preset dimension, and comparing the dimensions of the largest and smallest contact hole patterns with a second preset dimension; if the dimension of either contact hole pattern is smaller than the first preset dimension, a fourth error message is generated; if the dimension of either contact hole pattern is larger than the second preset dimension, a fifth error message is generated; the first preset dimension is smaller than the second preset dimension.

[0099] For example, the first preset size can be the minimum size of the contact hole pattern required by the design rules, and the second preset size can be the maximum size of the contact hole pattern required by the design rules. If the size of the smallest contact hole pattern is smaller than the first preset size, and / or the size of the largest contact hole pattern is smaller than the first preset size, then the relevant information of the contact hole pattern with a size smaller than the first preset size can be reported in the fourth error message. For example, the location of the contact hole pattern can be reported, or the contact hole can be marked. If the size of the largest contact hole pattern is larger than the second preset size, and / or the size of the smallest contact hole pattern is larger than the second preset size, then the relevant information of the contact hole pattern with a size larger than the second preset size can be reported in the fifth error message.

[0100] In another embodiment, the size of each contact hole pattern can also be obtained, and it can be verified whether the size of each contact hole pattern is smaller than a first preset size or larger than a second preset size. This can identify contact hole patterns that are significantly larger or smaller in size.

[0101] In practical applications, either method can be selected based on the common error scenarios. Verifying only the dimensions of the largest and smallest contact hole patterns results in faster inspection. Verifying the dimensions of every contact hole pattern takes longer but provides a more comprehensive inspection.

[0102] The following description uses area as an example to illustrate a specific implementation. For instance, the area of ​​the largest contact hole pattern and the area of ​​the smallest contact hole pattern can be obtained. If the area of ​​either contact hole pattern is less than a first preset area, a fourth error message is generated; if the area of ​​either contact hole pattern is greater than a second preset area, a fifth error message is generated.

[0103] For example, the contact hole pattern is square; the DRC software can verify the contact hole patterns with the largest and smallest areas in the following way:

[0104] Verify whether the areas of the contact hole pattern with the largest area and the contact hole pattern with the smallest area are less than the square of the first preset side length (A*A); the first preset side length A is the minimum side length of the contact hole pattern specified in the design rules;

[0105] Verify whether the areas of the contact hole pattern with the largest area and the contact hole pattern with the smallest area are greater than the square of the second preset side length (B*B); the second preset side length B is the maximum side length of the contact hole pattern specified in the design rules.

[0106] Since the contact hole pattern is square, A*A is the specified minimum area, which is the first preset area mentioned above. Similarly, B*B is the specified maximum area, which is the second preset area mentioned above. If the area of ​​the two selected contact hole patterns is greater than the maximum area B*B, an error is reported; if it is less than the minimum area A*A, an error is also reported.

[0107] In this embodiment, after verifying that the center distance (pitch) of each adjacent contact hole pattern meets the design rules, it is further verified that the size of the contact hole pattern meets the design requirements. Therefore, it can be inferred that the spacing (space) between each pair of adjacent contact hole patterns meets the design rules. This method can verify some dimensional errors in the contact hole pattern design, improve the success rate of chip fabrication, and is efficient and easy to operate.

[0108] In some embodiments, the inspection method further includes: obtaining shape parameters for each contact hole pattern and verifying the shape parameters for each contact hole pattern.

[0109] Shape parameters refer to the parameters used to determine the shape of the contact hole pattern. In this embodiment, the contact hole pattern is rectangular, and the shape parameters include the aspect ratio (ASPECT) of the contact hole pattern. A square is a special type of rectangle, and the aspect ratio of a rectangle refers to the ratio of its longer side to its shorter side.

[0110] For example, verify the shape parameters of each contact hole pattern, including: verifying whether each contact hole pattern is a square; if it is not a square, generate a ninth error message.

[0111] For example, DRC software can verify whether the contact hole pattern is square in the following way:

[0112] Determine if the aspect ratio of the contact hole pattern is 1; if it is not 1, report an error, indicating that the contact hole pattern is not a square. Understandably, if the contact hole pattern is not a square, in the above... Figure 8 In the step of checking whether the center lines of a set of contact hole patterns 100 are aligned based on the marked pattern 300, the DRC software will also report an error. This step checks the area of ​​the contact hole patterns more directly, making the inspection results more comprehensive.

[0113] In some embodiments, each contact hole pattern corresponds to a contact hole including a first end and a second end along a vertical direction; the vertical direction is perpendicular to the first and second directions; the inspection method further includes:

[0114] Obtain all contact hole patterns in the layout where the first end is located in the first metal layer and the second end is located in the second metal layer structure; wherein, the second metal layer structure includes multiple second metal layers arranged in a stepped manner;

[0115] Verify the number of all contact hole patterns.

[0116] Here, the vertical direction refers to the Z-direction. (See also: [link to previous page]) Figure 1 All bitline contact holes extend vertically, with their first ends located on the first metal layer. The first metal layer is located on the side of the contact hole away from the bitline, and includes several conductive lines connected to the contact holes to couple them to the peripheral circuitry. The second metal layer structure includes multiple second metal layers arranged in a stepped manner. In this embodiment, the second metal layer structure refers to the bitline stepped structure, and the second metal layer refers to the bitline. Multiple bitlines are stacked in a stepped manner, and adjacent bitlines are isolated from each other by an isolation layer.

[0117] For example, verifying the number of all contact hole patterns can include comparing whether the total number of all contact holes is equal to a preset number.

[0118] For example, the DRC software can select the bit line contact holes and verify the quantity as follows:

[0119] Obtain the number of all contact hole patterns in the layout whose first end is located on the first metal layer (Metal1) and whose second end is located on different bit lines (Metal2) in the bit line ladder structure;

[0120] Compare the number of all contact hole patterns with the preset number;

[0121] If the total number of all contact hole patterns exceeds the preset number, a seventh error message will be generated;

[0122] If the total number of contact hole patterns is less than the preset number, an eighth error message will be generated.

[0123] For example, the first metal layer (Metal1) is a metal layer in the pad layer or interconnect layer, and the preset number is the number of contact holes on the bit line stepped structure required by the design.

[0124] An error is reported if the actual number of contact holes acquired is less than the preset number; an error is also reported if the actual number of contact holes acquired is greater than the preset number. This allows the system to check whether the actual number of contact holes acquired is equal to the preset number.

[0125] For example, when the actual number of contact holes acquired is not equal to the preset number, all contact holes with the first end located on the first metal layer (Metal1) and the second end located on different bit lines (Metal2) in the bit line ladder structure are displayed in the seventh and eighth error messages.

[0126] In this embodiment, by setting constraints, the number of all bitline contact holes can be obtained to verify whether the number of contact holes is less than or more than the number specified by the design rules. Using a first metal layer and a second metal layer structure (such as a bitline stack structure) can accurately obtain the number of all bitline contact holes, which is efficient and accurate.

[0127] Furthermore, in this embodiment of the disclosure, the operation of acquiring and verifying the first interval distance can be referred to as the first inspection operation. The operation of acquiring and verifying the second interval distance can be referred to as the second inspection operation. The operation of acquiring and verifying the shape parameters of the contact hole pattern can be referred to as the third inspection operation. The operation of acquiring and verifying the size of the contact hole pattern can be referred to as the fourth inspection operation. The operation of acquiring and verifying the number of contact hole patterns can be referred to as the fifth inspection operation.

[0128] In some embodiments, the first through fifth check operations may be independent of each other. In other words, the result of one check operation does not determine whether another check operation is performed. The DRC software can execute the first through fifth check operations during runtime and display the result of each check operation in the output check report.

[0129] For example, the DRC software can perform the first through fifth checks by default. Also for example, the DRC software can, in response to an instruction, select to perform one or more of the first through fifth checks. The instruction can be entered by the operator via a terminal such as a keyboard.

[0130] In other embodiments, at least two of the first to fifth check operations are related. For example, in the first to fifth check operations, the next check operation is executed only after the previous check operation passes, and the check is interrupted if the previous check operation fails.

[0131] In one specific implementation, a first check operation can be performed first, in which an auxiliary layer is created on the layout, and auxiliary graphics are formed in the auxiliary layer. Then, the first interval distance between each two adjacent auxiliary graphics is obtained, and the multiple first interval distances are verified. If the multiple first interval distances meet the design rules and no error is reported, a second check operation is performed.

[0132] In the second check operation, the second interval distance between the edge extending along the first direction of each auxiliary graphic and the reference edge is obtained, and multiple second interval distances are then verified. If multiple second interval distances meet the design rules and no error is reported, the third check operation is performed.

[0133] The third check operation obtains the aspect ratio of each contact hole pattern and verifies whether each contact hole pattern is a square. If each contact hole pattern is a square and no error is reported, the fourth check operation is performed.

[0134] The fourth check operation obtains and verifies the areas of the largest and smallest contact hole patterns. If the verification passes and no error is reported, the fifth check operation is performed.

[0135] Perform the fifth check to obtain all contact holes on the bitline stepped structure and verify their quantity. If an error is reported in any of the above checks, the check is terminated. This method allows for early detection and resolution of errors.

[0136] In practical applications, multiple inspection operations can be set to be related or unrelated depending on the actual situation, in order to shorten the inspection time.

[0137] In some embodiments, when the layout includes multiple sets of contact hole patterns, the first, second, and fourth inspection operations can be performed group by group. The third and fifth inspection operations can be performed on all contact hole patterns to save inspection time. The third and fifth inspection operations can be performed before or after the first, second, and fourth inspection operations on each set of contact hole patterns; this disclosure does not limit this.

[0138] In some embodiments, the layout includes arrayed patterns of memory cells used to form memory cells. The arrayed patterns of memory cells are used to form an array of memory cells. For example... Figure 1 As shown, each second metal layer in the second metal layer structure includes a bit line coupled to a memory cell. It should be understood that in a 3D stacked memory structure, bit lines and word lines are typically perpendicular to each other. Therefore, in this embodiment, multiple word lines extending vertically are also included, coupled to the memory cell.

[0139] In other embodiments, each second metal layer in the second metal layer structure may also include word lines coupled to memory cells. The multi-layered word lines are arranged in a stepped configuration to form a word line stepped structure, and contact holes are used to lead the word lines to interconnect layers or pad layers. Contact holes may also be referred to as word line contact holes. For example, bit lines may extend vertically and be coupled to memory cells.

[0140] It should be noted that this disclosure does not limit whether the 3D stacked memory rack adopts a word line ladder structure or a bit line ladder structure. However, regardless of whether a word line ladder structure or a bit line ladder structure is adopted, the hole design rule checking method in the layout provided in the above embodiments of this disclosure is applicable.

[0141] In some embodiments, the memory cell may include a DRAM memory cell or a FeRAM (Ferroelectric RAM) memory cell. The memory cell may also be other types of memory cells, such as NAND memory cells, phase-change memory cells, etc. This disclosure does not limit the type of memory cell.

[0142] This disclosure also provides a device for checking the design rules of holes in a layout. Figure 9 A schematic diagram of a hole design rule checking device provided in an embodiment of this disclosure, as shown below. Figure 9 As shown, the device 400 includes:

[0143] The generation module 410 is used to create an auxiliary layer on the layout. The layout includes at least one group of contact hole patterns. The group of contact hole patterns includes multiple contact hole patterns arranged side by side along a first direction. The multiple contact hole patterns have different sizes. The auxiliary layer includes multiple auxiliary patterns arranged side by side along the first direction. The centers of the multiple auxiliary patterns overlap with the centers of the multiple contact hole patterns. The multiple auxiliary patterns have the same size.

[0144] The acquisition module 420 is used to acquire the first interval distance between every two adjacent auxiliary graphics in a plurality of auxiliary graphics;

[0145] Verification module 430 is used to verify the distance of each first interval.

[0146] In some embodiments, the verification module 430 is configured to: compare each first interval distance with a first preset interval distance; wherein the first preset interval distance is equal to the difference between the preset center distance between adjacent contact hole patterns and the width dimension of the auxiliary pattern along the first direction; if the first interval distance is less than the first preset interval distance, a first error message is generated; if the first interval distance is greater than the first preset interval distance, a second error message is generated.

[0147] In some embodiments, the layout further includes marker graphics arranged side-by-side with the contact hole graphics along a second direction, the marker graphics having a reference edge extending along a first direction; the second direction and the first direction intersect. The acquisition module 420 is further configured to: acquire a second interval distance between the edge extending along the first direction and the reference edge of each auxiliary graphic; the verification module 430 is configured to: verify multiple second interval distances.

[0148] In some embodiments, the acquisition module 420 is further configured to: acquire at least the dimensions of the largest and smallest contact hole patterns among a plurality of contact hole patterns; the verification module 430 is further configured to: verify the dimensions of the largest and smallest contact hole patterns.

[0149] In some embodiments, the acquisition module 420 is further configured to acquire the shape parameters of each contact hole pattern; the verification module 430 is configured to verify the shape parameters of each contact hole pattern.

[0150] In some embodiments, the contact hole pattern is rectangular, and the shape parameters include the aspect ratio of the contact hole pattern. The acquisition module 420 is further configured to acquire the aspect ratio of each contact hole pattern; the verification module 430 is configured to verify the aspect ratio of each contact hole pattern.

[0151] In some embodiments, each contact hole pattern corresponds to a contact hole including a first end and a second end along a vertical direction; the vertical direction is perpendicular to the first and second directions. The acquisition module 420 is further configured to: acquire all contact hole patterns in the layout whose first ends are all located in a first metal layer and whose second ends are located in a second metal layer structure; wherein, the second metal layer structure includes a plurality of second metal layers arranged in a stepped manner; the verification module 430 is configured to: verify the number of all contact hole patterns.

[0152] This application provides an electronic device, including a memory and a processor, wherein the memory is used to store executable instructions; and the processor is used to execute the executable instructions stored in the memory to implement the image recognition method of this application.

[0153] The electronic devices provided in this application can be implemented as various types of user terminals, such as laptops, tablets, desktop computers, set-top boxes, mobile devices (e.g., mobile phones, portable music players, personal digital assistants, dedicated messaging devices, portable gaming devices), and in-vehicle terminals, or as servers. These embodiments are applicable to various scenarios, including but not limited to cloud technology, artificial intelligence, smart transportation, and assisted driving. These embodiments can be implemented by a server, or by a combination of terminal devices and a server.

[0154] This application provides a computer program product or computer program that includes computer instructions stored in a computer-readable storage medium. A processor of a computer device reads the computer instructions from the computer-readable storage medium and executes the computer instructions, causing the computer device to perform the layout hole design rule checking method described above in this application.

[0155] This application provides a computer-readable storage medium storing executable instructions. When the executable instructions are executed by a processor, the processor will execute the hole design rule checking method in the layout provided in this application.

[0156] In some embodiments, the computer-readable storage medium may be a memory such as FRAM, ROM, PROM, EPROM, EEPROM, flash memory, magnetic surface memory, optical disk, or CD-ROM; or it may be a variety of devices including one or any combination of the above-mentioned memories.

[0157] In some embodiments, executable instructions may take the form of a program, software, software module, script, or code, written in any form of programming language (including compiled or interpreted languages, or declarative or procedural languages), and may be deployed in any form, including as a standalone program or as a module, component, subroutine, or other unit suitable for use in a computing environment.

[0158] As an example, executable instructions can be deployed to execute on a single computing device, or on multiple computing devices located in one location, or on multiple computing devices distributed across multiple locations and interconnected via a communication network.

[0159] In summary, by completing all the checks on the contact holes through the above-described steps in the embodiments of this application, the design rules requirements can be met. Furthermore, the method provided by this invention saves a lot of repetitive measurement work and reduces the uncontrollable risks caused by design oversights.

[0160] The methods disclosed in the several method embodiments provided in this disclosure can be arbitrarily combined without conflict to obtain new method embodiments.

[0161] The above description is merely an embodiment of this application and is not intended to limit the scope of protection of this application. Any modifications, equivalent substitutions, and improvements made within the spirit and scope of this application are included within the scope of protection of this application.

Claims

1. A method for inspecting graphics, characterized in that, A method for inspecting at least one set of contact hole patterns in a layout, said set of contact hole patterns comprising a plurality of contact hole patterns arranged side-by-side along a first direction, the plurality of contact hole patterns having different sizes; the method includes: An auxiliary layer is established on the layout. The auxiliary layer includes a plurality of auxiliary graphics arranged side by side along the first direction. The centers of the plurality of auxiliary graphics overlap with those of the plurality of contact hole graphics, and the plurality of auxiliary graphics are identical. Obtain the first interval distance between every two adjacent auxiliary graphics in the plurality of auxiliary graphics; Verify multiple first interval distances.

2. The method for inspecting graphics according to claim 1, characterized in that, The verification of multiple first interval distances includes: Each of the first interval distances is compared with the first preset interval distance; If the first interval distance is less than the first preset interval distance, then a first error message is generated; If the first interval distance is greater than the first preset interval distance, a second error message is generated.

3. The method for inspecting graphics according to claim 1, characterized in that, The width of the auxiliary pattern along the first direction is less than or equal to the width of the contact hole pattern with the smallest width among the plurality of contact hole patterns.

4. The method for inspecting graphics according to claim 1, characterized in that, The width dimension of the plurality of contact hole patterns along the first direction gradually increases or gradually decreases.

5. The method for inspecting graphics according to claim 1, characterized in that, The layout also includes a marker graphic, which is arranged side by side with the contact hole graphic along a second direction, and the marker graphic has a reference edge extending along the first direction; The second direction intersects with the first direction; The method further includes: Obtain the second interval distance between the edge of each auxiliary graphic extending along the first direction and the reference edge; Verify multiple second interval distances.

6. The method for inspecting graphics according to claim 5, characterized in that, The verification of multiple second interval distances includes: Each of the second interval distances is compared with the second preset interval distance; If the second interval distance is less than the second preset interval distance, a third error message is generated.

7. The method for inspecting graphics according to claim 1, characterized in that, The method further includes: The dimensions of at least the largest and smallest contact hole patterns among the plurality of contact hole patterns are obtained, and the dimensions of the largest and smallest contact hole patterns are verified.

8. The method for inspecting graphics according to claim 7, characterized in that, The verification of the dimensions of the largest and smallest contact hole patterns includes: The dimensions of the largest and smallest contact hole patterns are compared with a first preset size, and the dimensions of the largest and smallest contact hole patterns are compared with a second preset size. If the size of either contact hole pattern is smaller than the first preset size, a fourth error message is generated; If the size of either contact hole pattern is larger than the second preset size, a fifth error message is generated; if the first preset size is smaller than the second preset size.

9. The method for inspecting graphics according to claim 1, characterized in that, The auxiliary graphic is a square.

10. The method for inspecting graphics according to claim 1, characterized in that, Each contact hole pattern corresponds to a contact hole including a first end and a second end along the vertical direction; the vertical direction is perpendicular to the plane where the contact hole pattern is located; The method further includes: Obtain all contact hole patterns in the layout where the first end is located in the first metal layer and the second end is located in the second metal layer structure; wherein, the second metal layer structure includes multiple second metal layers arranged in a stepped manner; Verify the number of all the contact hole patterns.

11. The method for inspecting a graphic according to claim 10, characterized in that, The layout includes storage cell graphics for forming storage cells; Each second metal layer in the second metal layer structure includes a bit line coupled to the memory cell; Alternatively, each of the second metal layers in the second metal layer structure includes a word line coupled to the memory cell.

12. A device for inspecting graphics, characterized in that, The device includes: A generation module is used to create an auxiliary layer on a layout, the layout including at least one set of contact hole patterns, the set of contact hole patterns including multiple contact hole patterns arranged side by side along a first direction, the multiple contact hole patterns having different sizes; the auxiliary layer includes multiple auxiliary patterns arranged side by side along the first direction, the centers of the multiple auxiliary patterns corresponding to and overlapping with the centers of the multiple contact hole patterns, and the multiple auxiliary patterns having the same size. The acquisition module is used to acquire the first interval distance between every two adjacent auxiliary graphics in the plurality of auxiliary graphics; A verification module is used to verify each of the first interval distances.

13. An electronic device, characterized in that, The electronic device includes: Memory, used to store executable commands; A processor, when executing executable instructions stored in the memory, implements the method for inspecting graphics as described in any one of claims 1 to 11.

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