Perovskite photovoltaic cell and solar module

Abstract

The first aspect of the application provides a perovskite photovoltaic cell and a solar cell module, the perovskite photovoltaic cell comprising a hole transport layer, the hole transport layer containing a hole transport agent; the hole transport layer contains an ultraviolet-resistant additive; or one side of the hole transport layer is provided with an ultraviolet-resistant layer, the ultraviolet-resistant layer containing an ultraviolet-resistant additive; the structure of the ultraviolet-resistant additive is: wherein R1 or R2 is at least one hydroxyl group (-OH); R3 and R4 are hydroxyl groups (-OH) and / or hydrogen groups (-H); n is an integer of 1-10; R5 is at least one of,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,

Description

Technical Field

[0001] This application relates to the field of solar cell technology, and more particularly to perovskite photovoltaic cells and solar cell modules. Background Technology

[0002] In related technologies, the aromatic ring structure of hole transport materials in perovskite photovoltaic cells typically contains heteroatoms such as N, O, and S, which easily generate photogenerated free radicals under illumination, causing degradation of the hole transport materials. This is especially true for hole transport materials loaded on NiOx, where NiOx acts as a photocatalyst, accelerating the photodegradation process and ultimately reducing the stability of perovskite cells. To address the stability issue of the hole transport layer, researchers have made improvements to the molecular structure. However, these molecules suffer from the following problems: optimization is difficult, requiring the synthesis of new molecules for optimization, and this is limited by the synthetic pathway. Summary of the Invention

[0003] The perovskite photovoltaic cell provided in this application embodiment can effectively improve the stability of the hole transport layer.

[0004] This application provides a perovskite photovoltaic cell, comprising a hole transport layer containing a hole transport agent; the hole transport layer containing an anti-ultraviolet additive; or an anti-ultraviolet layer is provided on one side of the hole transport layer, the anti-ultraviolet layer containing an anti-ultraviolet additive; the structure of the anti-ultraviolet additive is as follows:

[0005]

[0006] Wherein, at least one of R1 or R2 is a hydroxyl group (-OH); R3 and R4 are hydroxyl groups (-OH) and / or hydrogen groups (-H); n is an integer from 1 to 10; R5 is... , , , At least one of them.

[0007] In some embodiments of this application, when one of R1 or R2 is a hydroxyl group (-OH), the other is a hydrogen group (-H).

[0008] In some embodiments of this application, n is 2 to 4.

[0009] In some embodiments of this application, the hole transport layer contains an anti-ultraviolet additive, and the hole transport layer also contains a passivating agent.

[0010] In some embodiments of this application, the hole transport layer contains an anti-ultraviolet additive, wherein the weight ratio of the hole transport agent to the anti-ultraviolet additive is 10:1 to 1:1.

[0011] In some embodiments of this application, the weight ratio of the UV-resistant additive to the passivating agent is 1:1 to 1:10.

[0012] In some embodiments of this application, the passivating agent contains at least one of propylamine iodide (PAI), 1,3-diaminopropane dihydroiodide (PDADI), 4-fluorophenylethylamine (F-PEA), and 4-trifluoromethylaniline (CF3-PA).

[0013] In some embodiments of this application, the hole transport agent in the hole transport layer is a molecule containing at least one of N, O, and S atoms in an aromatic ring structure.

[0014] In some embodiments of this application, the hole transport agent in the hole transport layer contains at least one of 4-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl (i.e., Me-4PACz), 2-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl (i.e., Me-2PACz), 2-(N,N-dimethoxymethyl)phenyl-4'-(9H-carbazole-9-yl)biphenyl (i.e., MeO-2PACz), and 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (i.e., PADCB).

[0015] In some embodiments of this application, the thickness of the hole transport layer is less than or equal to 20 nm.

[0016] In some embodiments of this application, the perovskite photovoltaic cell includes a hole transport layer, and an anti-ultraviolet layer is provided on one side of the hole transport layer. The anti-ultraviolet layer contains an anti-ultraviolet additive, and the thickness of the anti-ultraviolet layer is less than or equal to 1 nm.

[0017] In some embodiments of this application, the perovskite photovoltaic cell includes a conductive glass, a hole transport layer, a perovskite active layer, a passivation layer, an electron transport layer, and electrodes stacked sequentially.

[0018] In some embodiments of this application, the perovskite photovoltaic cell includes, in sequence, conductive glass, hole transport layer, UV-resistant layer, perovskite active layer, passivation layer, electron transport layer, and electrode.

[0019] In some embodiments of this application, a hole blocking layer is provided between the electron transport layer of the perovskite photovoltaic cell and the electrode.

[0020] This application also provides a solar cell module, including the aforementioned perovskite photovoltaic cell.

[0021] The embodiments of this application provide a perovskite photovoltaic cell including a hole transport layer, the hole transport layer containing a hole transport agent; the hole transport layer containing an anti-ultraviolet additive; or an anti-ultraviolet layer is provided on one side of the hole transport layer, the anti-ultraviolet layer containing an anti-ultraviolet additive;

[0022] The structure of the UV-resistant additive is as follows:

[0023]

[0024] Wherein, at least one of R1 or R2 is a hydroxyl group (-OH); R3 and R4 are hydroxyl groups (-OH) and / or hydrogen groups (-H); n is an integer from 1 to 10; R5 is... , , , At least one of the following. This UV-resistant additive is a multifunctional free radical scavenging molecule whose core structure comprises a central benzene ring, flanked by alkoxy chains containing hydroxyl groups (R1 / R2), and terminated by an electron-accepting R5 functional group. The presence of the hydroxyl group (-OH) not only enhances molecular polarity and improves its compatibility with hole transport materials, but more importantly, its OH bond has a low bond dissociation energy, which can efficiently provide hydrogen atoms and interrupt free radical chain reactions. R5 is selected from... , , , At least one of the groups, these groups have strong electron-withdrawing ability, can stabilize free radical intermediates, and achieve a dual capture mechanism in conjunction with hydroxyl groups. n is an integer from 1 to 10, representing the length of the alkoxy chain. Examples of this application show that after continuous irradiation with 15W ultraviolet light for 2.5 hours, the hole transport solution without the added anti-UV additive turned significantly yellow (ΔE>15), while the solution with the added anti-UV additive showed no color change (ΔE<2). The shift of the aromatic proton peak of the hole transport material in the ¹H NMR spectrum was less than 0.05 ppm, proving that its molecular structure did not undergo breakage or oxidation. By introducing this structured anti-UV additive into the hole transport layer, carbon-center free radicals and oxygen free radicals generated by ultraviolet light excitation can be effectively quenched, significantly reducing the photo-oxidation rate of the hole transport material at the NiOx interface, and avoiding the decrease in hole mobility and increase in interface defects caused by material degradation. The molecular structure design of this additive avoids the high synthesis difficulty of traditional molecular modification methods, requiring only a simple condensation reaction for preparation, resulting in low cost and suitability for large-scale production.

[0025] Other features and advantages of this application will be described in detail in the following detailed description section. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0027] To gain a more complete understanding of this application and its beneficial effects, the following description will be provided in conjunction with the accompanying drawings, wherein the same reference numerals in the following description denote the same parts.

[0028] Figure 1 This is a photograph of the mixture in Example 1 of the present invention before it was irradiated with ultraviolet light; Figure 2 This is a photograph of the mixture of Example 1 of the present invention after being irradiated with ultraviolet light; Figure 3 This is a photograph of the mixture in Example 2 of the present invention before it was irradiated with ultraviolet light; Figure 4 This is a photograph of the mixture of Example 2 of the present invention after being irradiated with ultraviolet light;

[0029] Figure 5 This is a photograph of the mixture in Example 3 of the present invention before it was irradiated with ultraviolet light; Figure 6 This is a photograph of the mixture of Example 3 of the present invention after being irradiated with ultraviolet light;

[0030] Figure 7 This is a photograph of the mixture in Example 4 of the present invention before it was irradiated with ultraviolet light; Figure 8 This is a photograph of the mixture of Example 4 of the present invention after being irradiated with ultraviolet light;

[0031] Figure 9 This is a photograph of the mixture of Comparative Example 1 of the present invention before it was irradiated with ultraviolet light. Figure 10 A photograph of the mixture of Comparative Example 1 of the present invention after being irradiated with ultraviolet light; Figure 11 This is a comparison diagram of the changes in the ¹H NMR spectrum before and after ultraviolet light irradiation according to Example 1 of this application;

[0032] Figure 12 This is a comparison diagram of the changes in the ¹H NMR spectrum before and after ultraviolet light irradiation according to Comparative Example 1 of this application. Detailed Implementation

[0033] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the protection scope of this application.

[0034] This application provides a perovskite photovoltaic cell, which includes a hole transport layer containing a hole transport agent; the hole transport layer also contains an anti-ultraviolet additive; or an anti-ultraviolet layer is provided on one side of the hole transport layer, and the anti-ultraviolet layer contains an anti-ultraviolet additive; the structure of the anti-ultraviolet additive is as follows:

[0035]

[0036] Wherein, at least one of R1 or R2 is a hydroxyl group (-OH), R3 and R4 are hydroxyl groups (-OH) and / or hydrogen groups (-H); n is an integer from 1 to 10; R5 is... , , , At least one of the following. This UV-resistant additive is a multifunctional free radical scavenging molecule whose core structure comprises a central benzene ring, flanked by alkoxy chains containing hydroxyl groups (R1 / R2), and terminated by an electron-accepting R5 functional group. The presence of the hydroxyl group (-OH) not only enhances molecular polarity and improves its compatibility with hole transport materials, but more importantly, its OH bond has a low bond dissociation energy, which can efficiently provide hydrogen atoms and interrupt free radical chain reactions. R5 is selected from... , , , At least one of the groups, these groups have strong electron-withdrawing ability, can stabilize free radical intermediates, and synergistically achieve a dual capture mechanism with hydroxyl groups. n is an integer from 1 to 10, representing the alkoxy chain length. Examples of this application show that after continuous irradiation with 15W ultraviolet light for 2.5 hours, the hole transport solution without the added anti-UV additive turned significantly yellow (ΔE>15), while the solution with the added anti-UV additive showed no color change (ΔE<2). The shift of the aromatic proton peak of the hole transport material in the ¹H NMR spectrum was less than 0.05 ppm, proving that its molecular structure did not undergo breakage or oxidation. By introducing this structured anti-UV additive into the hole transport layer, carbon-center free radicals and oxygen free radicals generated by ultraviolet light excitation can be effectively quenched, significantly reducing the photo-oxidation rate of the hole transport material at the NiOx interface, and avoiding the decrease in hole mobility and increase in interface defects caused by material degradation. The molecular structure design of this additive avoids the high synthesis difficulty of traditional molecular modification methods, requiring only a simple condensation reaction for preparation, resulting in low cost and suitability for large-scale production.

[0037] In some embodiments of the present invention, when one of R1 or R2 is a hydroxyl group (-OH), the other is a hydrogen group (-H). The inventors of this application have discovered through experiments that this molecular formula has a better anti-ultraviolet effect.

[0038] In some embodiments of the present invention, when n=2~4, the molecular flexibility is optimal, which can effectively embed into the gaps between hole transport material molecules and achieve uniform dispersion.

[0039] In some embodiments of the present invention, R1, R3, and R4 are hydrogen groups, R2 is a hydroxyl group, n is 1, and R5 is... The molecular formula of the UV-resistant additive is

[0040] .

[0041] In some embodiments, the UV-resistant additive has R1 as hydroxyl-OH, R2 as hydrogen-H, R3 and R4 as both hydroxyl-OH, n as 5, and R5 as... This structure exhibits high solubility in polar solvents and excellent compatibility with 4-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl PTAA, forming a uniform, pinhole-free film after spin coating. In other embodiments, R1 is hydrogen-H, R2 is hydroxyl-OH, R3 is hydroxyl-OH, R4 is hydrogen-H, n is 8, and R5 is... This structure has a stronger steric hindrance effect and is suitable for high-concentration doped systems.

[0042] This application also provides a perovskite photovoltaic cell, wherein the hole transport layer contains an anti-UV additive and a passivating agent. The passivating agent is used to repair interface defects between the hole transport layer and the substrate, forming a synergistic stabilization mechanism with the anti-UV additive. The passivating agent is selected from at least one of propylamine iodide, 1,3-diaminopropane dihydroiodate, 4-fluorophenylethylamine, and 4-trifluoromethylaniline. Propylamine iodide can form coordination bonds with uncoordinated Ni²⁺ ions on the NiOx surface, reducing interface trap states; 1,3-diaminopropane dihydroiodate indirectly stabilizes the hole transport layer / perovskite interface by forming ionic interactions with I⁻ in the perovskite precursor solution through -NH₃⁺. 4-fluorophenylethylamine and 4-trifluoromethylaniline, due to their strong electron-withdrawing groups, can adjust the work function of the hole transport layer and improve energy level matching. In some embodiments of the present invention, the passivating agent and the UV-resistant additive are co-dissolved in chlorobenzene to form a homogeneous mixed solution. The passivating agent has the function of passivating defects on the perovskite surface. In the above embodiments, by simultaneously introducing the UV-resistant additive and the passivating agent into the hole transport layer, the dual functions of "photostabilization + interface repair" are achieved. This not only inhibits the photodegradation of the material bulk but also solves the problem of interface charge recombination caused by the NiOx substrate, making the device perform better than the prior art under UV irradiation.

[0043] In some embodiments, the weight ratio of the hole transport agent to the UV-resistant additive is 10:1 to 1:1. When the ratio is 10:1, the additive concentration is low (approximately 9.1 wt%), suitable for devices requiring high charge transport efficiency, where the free radical capture capability still meets basic stability requirements. When the ratio is 1:1, the additive concentration reaches 50 wt%, suitable for extreme UV environments (such as high-altitude areas), where the film's photostability is optimal. Experimental data show that at a 1:1 ratio, after 120 hours of UV irradiation, the hole mobility retention rate is as high as 92%, while the unadded group only retains 41%. The weight ratio of the hole transport agent to the UV-resistant additive can be any one of 10:1, 10:2, 10:3, 10:4, 2:1, 10:6, 10:7, 10:8, 10:9, or 1:1, or a range between any two. Too low a ratio will result in poor UV resistance, while too high a ratio will hinder hole transport.

[0044] In some embodiments, the weight ratio of the UV-resistant additive to the passivating agent is 1:1 to 1:10. When the ratio is 1:1, the synergistic effect is strongest, with the passivating agent preferentially repairing the interface and the additive preferentially capturing free radicals. When the ratio is 1:10, the passivating dosage is larger, resulting in a more complete interface passivation layer, but the total solid content needs to be controlled to avoid an excessively thick film. The weight ratio of the UV-resistant additive to the passivating agent can be any one of 1:1, 1:2, 1:3, 1:4, 1:5, 1:6, 1:7, 1:8, 1:9, or 1:10, or a range between any two. A ratio that is too low will fail to achieve the passivation effect, while a ratio that is too high will hinder hole transport.

[0045] In some embodiments, the passivating agent contains at least one of propylamine iodide, 1,3-diaminopropane dihydroiodate, 4-fluorophenylethylamine, and 4-trifluoromethylaniline. A preferred combination is propylamine iodide (60 wt%) and 4-trifluoromethylaniline (40 wt%), the former providing iodine ion passivation of NiOx, and the latter reducing the surface energy of the hole transport layer through the -CF3 group, thus inhibiting water and oxygen permeation.

[0046] In some embodiments, the hole transport agent in the hole transport layer is a molecule containing at least one of N, O, and S atoms in its aromatic ring structure. Such molecules provide hole transport channels due to their lone pair electrons, but are easily oxidized. Preferred materials are 4-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl (Me-4PACz), 2-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl (Me-2PACz), 2-(N,N-dimethoxymethyl)phenyl-4'-(9H-carbazole-9-yl)biphenyl (MeO-2PACz), and 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (PADCB). Me-4PACz is widely used due to the good conjugation of the carbazole unit and the high hole mobility (>10⁻³ cm² / V·s). However, its aniline group is prone to generating nitrogen-centered free radicals under ultraviolet light. The UV-resistant additive of this invention can effectively capture such free radicals and extend its lifetime.

[0047] In some embodiments, the hole transport layer has a thickness of less than or equal to 20 nm. This thin-layer design reduces series resistance and improves the fill factor. After UV irradiation, the layer remains intact without peeling or cracking.

[0048] In some embodiments, the perovskite photovoltaic cell includes a hole transport layer, and an anti-ultraviolet (UV) layer is provided on one side of the hole transport layer. The anti-ultraviolet layer contains UV-resistant additives, and the thickness of the anti-ultraviolet layer is less than or equal to 1 nm. The anti-ultraviolet layer may be entirely composed of UV-resistant additives. The anti-ultraviolet layer, acting as a "light filtering layer," is located above the hole transport layer, and its main function is to absorb ultraviolet photons and reduce their intensity as they penetrate to the hole transport layer.

[0049] In some embodiments, a perovskite photovoltaic cell includes, in sequence, a conductive glass, a hole transport layer, a perovskite active layer, a passivation layer, an electron transport layer, and an electrode. The complete structure is: conductive glass (FTO or ITO) → hole transport layer (containing hole transport agent and UV-resistant additive) → perovskite active layer (e.g., MAPbI3) → passivation layer (e.g., PCBM) → electron transport layer (e.g., C). 60 → Electrode (Ag or Al). This structure is suitable for conventional devices, and the UV-resistant additive acts directly on the hole transport layer to achieve in-situ protection.

[0050] In some embodiments, a perovskite photovoltaic cell includes, in sequence, a conductive glass, a hole transport layer, an anti-UV layer, a perovskite active layer, a passivation layer, an electron transport layer, and an electrode. The complete structure is: conductive glass (FTO or ITO) → hole transport layer (containing a hole transport agent) → anti-UV layer (i.e., the anti-UV additive of this application) → perovskite active layer (e.g., MAPbI3) → passivation layer (e.g., PCBM) → electron transport layer (e.g., C... 60→ Electrode (Ag or Al). This structure features a "dual-layer protection" design: the hole transport layer is responsible for charge transport, and the UV-resistant layer is responsible for light filtering; the two work synergistically. The UV-resistant layer can be entirely composed of UV-resistant additives.

[0051] In some embodiments, a hole-blocking layer is provided between the electron transport layer and the electrode of the aforementioned perovskite photovoltaic cell. For example, the complete structure is: conductive glass (FTO or ITO) → hole transport layer (containing hole transport agent and UV-resistant additive) → perovskite active layer (such as MAPbI3) → passivation layer (such as PCBM) → electron transport layer (such as C 60 The structure consists of: a hole-blocking layer (e.g., Bphen or TPBi) → an electrode (Ag or Al). In this structure, the hole-blocking layer (e.g., Bphen or TPBi) is located between the electron transport layer and the electrode to prevent reverse hole injection and, together with the UV-resistant additive, improves the stability of the device. The UV-resistant additive is still present in the hole transport layer, providing protection for the front interface.

[0052] This application also provides a solar cell module, including the aforementioned perovskite photovoltaic cell.

[0053] The method for preparing the hole transport layer of the perovskite photovoltaic cell of the present invention is not significantly different from that of the hole transport layer in the prior art. In some embodiments of this application...

[0054] 1. Purification of the hole transport material: Add the hole transport material to an ethanol solution, heat to approximately 70°C until completely dissolved, then stop heating and allow the solid to precipitate. Filter using a suction funnel, wash with ethanol, and finally dry in a vacuum drying oven to obtain the purified hole transport material.

[0055] 2. Purification of the UV-resistant additive: The UV-resistant additive is dissolved in dichloromethane solvent, wet-loaded, and purified by silica gel chromatography (300-400 mesh). The eluent is a mixture of petroleum ether and dichloromethane. The purified product is then dried in a vacuum drying oven to obtain the purified UV-resistant additive material.

[0056] 3. Prepare a mixture for preparing a hole transport layer: The mixture contains hole transport layer molecules and UV-resistant additives. Deuterated dimethyl sulfoxide solvent is added and mixed to obtain a mixture. The hole transport layer containing UV-resistant additives can be prepared by spin-coating with this mixture.

[0057] The following specific embodiments will be used for further explanation:

[0058] Example 1

[0059] 1.1 Purification of the hole transport material: 1 g of hole transport material was added to 40 mL of ethanol solution and heated to 70 °C until it was completely dissolved. Heating was then stopped, and the solid was allowed to precipitate. The solid was filtered using a vacuum funnel, washed with ethanol, and finally dried in a vacuum drying oven for 6 hours to obtain the purified hole transport material.

[0060] 1.2 Purification of the UV-resistant additive: Dissolve 1g of the UV-resistant additive in 2mL of dichloromethane solvent, load the sample using a wet method, and purify it using a silica gel column (300-400 mesh). The eluent is a mixture of petroleum ether and dichloromethane. Dry the purified product in a vacuum drying oven for 6 hours to obtain the purified UV-resistant additive material.

[0061] 1.3 Preparation of a mixture for preparing a hole transport layer: The mixture contains hole transport layer molecules and an anti-UV additive. The composition and weight percentage of the mixture are as follows: the hole transport molecule is MeO-2PACz, and the anti-UV additive is... A solute solid with a weight ratio of hole transport layer molecules to UV-resistant additives of 2:1 was shaken for 10 minutes and dissolved in deuterated dimethyl sulfoxide solvent to obtain a solution concentration of 1.0 wt%, thus obtaining a mixed solution.

[0062] The mixture was filtered using a microporous membrane with a pore size of 0.22 micrometers.

[0063] Example 2

[0064] Experimental Example 2 differs from Experimental Example 1 in that MeO-2PACz is replaced with PADCB, and the weight ratio of the hole transport agent to the UV-resistant additive is 9:1.

[0065] Example 3

[0066] Experimental Example 3 differs from Experimental Example 1 in that MeO-2PACz is replaced with MeO-4PACz, and the weight ratio of the hole transport agent to the UV-resistant additive is 5:1.

[0067] Example 4

[0068] Experimental Example 4 differs from Experimental Example 1 in that MeO-2PACz is replaced with Me-2PACz, and it also contains the passivating agent propylamine hydrogen iodide. The weight ratio of hole transport layer molecules, anti-ultraviolet additives, and passivating agent is 2:1:1.

[0069] Example 5

[0070] Example 5 differs from Example 1 in the molecular formula of the UV-resistant additive. In this context, R1, R3, and R4 are hydrogen groups, R2 is a hydroxyl group, n is 3, and R5 is... .

[0071] Example 6

[0072] Example 6 differs from Example 1 in the molecular formula of the UV-resistant additive. In this context, R3 and R4 are hydrogen groups, R1 and R2 are hydroxyl groups, n is 6, and R5 is... .

[0073] Example 7

[0074] Example 7 differs from Example 1 in the molecular formula of the UV-resistant additive. In this context, R3 and R4 are hydrogen groups, R1 and R2 are hydroxyl groups, n is 8, and R5 is... .

[0075] Comparative Example 1

[0076] The difference between Comparative Example 1 and Experimental Example 1 is that Comparative Example 1 does not contain any UV-protective additives.

[0077] Comparative Example 2

[0078] The difference between Comparative Example 1 and Experimental Example 1 is that n=12.

[0079] Test case

[0080] 2.1 Ultraviolet light irradiation test: After irradiating the mixture with strong ultraviolet light (15 W) for 2.5 hours, observe with the naked eye whether the color of the mixture solution changes.

[0081] 2.2 Nuclear magnetic resonance hydrogen spectrum test: The components of the mixture in Example 1 and the solution in Comparative Example 1 were tested by nuclear magnetic resonance hydrogen spectrum to analyze the specific components.

[0082] After undergoing ultraviolet light irradiation testing in section 2.1, the mixture before ultraviolet light irradiation was... Figure 1 The image shows the mixture after being irradiated with ultraviolet light (15 W) for 2.5 hours. Figure 2 After a period of exposure to ultraviolet light, through Figure 2 and Figure 1 The comparison shows that the color of the mixed solution remains unchanged, indicating that the chemical properties of the hole-transporting molecules remain unchanged, and the mixed solution has good chemical stability. Therefore, if the mixed solution is applied to perovskite photovoltaic cells, the perovskite photovoltaic cells will maintain good chemical stability under sunlight exposure for a period of time. Similarly, Figure 4 and Figure 3 compared to, Figure 6 and Figure 5 compared to, Figure 8 and Figure 7In comparison, the color of the mixed solution remained essentially unchanged, indicating that the chemical properties of the hole-transporting molecules remained essentially unchanged, and the mixed solution exhibited good chemical stability. Similarly, the same conclusions were obtained from the ultraviolet light irradiation tests conducted on Examples 5, 6, and 7. The solution of Comparative Example 1, after being irradiated with ultraviolet light of the same intensity and duration as in the other examples, showed... Figure 10 and Figure 9 In comparison, the solution color of Comparative Example 1 became significantly darker, indicating that a photochemical reaction occurred and the solution deteriorated. Similarly, when the solution of Comparative Example 2 was subjected to the same ultraviolet light irradiation, the solution color was similar to that of Comparative Example 1, but the color of the solution after irradiation became significantly darker, indicating that a photochemical reaction occurred and the solution deteriorated.

[0083] After 2.2 NMR proton spectrum testing, as shown Figure 11 As shown, δ represents the chemical shift. In Example 1, after 2.5 hours of strong ultraviolet light (15 W) irradiation, the NMR peak of MeO-2PACz remained basically unchanged compared with that before the ultraviolet light irradiation. The anti-ultraviolet additive showed a new peak, indicating that during the irradiation process, the anti-ultraviolet additive prevented the deterioration of MeO-2PACz by acting as a sacrificial agent. Figure 12 As shown, after 2.5 hours of strong ultraviolet light irradiation, the MeO-2PACz solution showed obvious impurity peaks 1, 2, and 3, indicating that MeO-2PACz deteriorated under light irradiation and impurities appeared.

[0084] In the description of this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0085] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0086] The embodiments, implementation methods, and related technical features of this application can be combined and substituted for each other without conflict.

[0087] The above are merely preferred embodiments of this application and are not intended to limit this application in any way. Any simple modifications, equivalent changes, and alterations made to the above embodiments based on the technical essence of this application without departing from the scope of the technical solution of this application shall still fall within the scope of the technical solution of this application.

Claims

1. A perovskite photovoltaic cell, characterized in that, The perovskite photovoltaic cell includes a hole transport layer, and the hole transport layer contains a hole transport agent. The hole transport layer contains an anti-ultraviolet additive; or an anti-ultraviolet layer is provided on one side of the hole transport layer, and the anti-ultraviolet layer contains an anti-ultraviolet additive. The structure of the UV-resistant additive is as follows: Wherein, at least one of R1 or R2 is a hydroxyl group (-OH), R3 and R4 are hydroxyl groups (-OH) and / or hydrogen groups (-H); n is an integer from 1 to 10; R5 is... , , , At least one of them.

2. The perovskite photovoltaic cell according to claim 1, wherein when one of R1 or R2 is a hydroxyl group (-OH), the other is a hydrogen group (-H).

3. The perovskite photovoltaic cell according to claim 1, wherein n is 2 to 4.

4. The perovskite photovoltaic cell according to claim 1, wherein the hole transport layer contains an anti-ultraviolet additive, and the hole transport layer further contains a passivating agent.

5. The perovskite photovoltaic cell according to claim 1, wherein the hole transport layer contains an anti-ultraviolet additive, and the weight ratio of the hole transport agent to the anti-ultraviolet additive is 10:1 to 1:

1.

6. The perovskite photovoltaic cell according to claim 4, wherein the weight ratio of the UV-resistant additive to the passivating agent is 1:1 to 1:

10.

7. The perovskite photovoltaic cell according to claim 4, wherein the passivating agent contains at least one of propylamine hydrogen iodide, 1,3-diaminopropane dihydroiodate, 4-fluorophenylethylamine, and 4-trifluoromethylaniline.

8. The perovskite photovoltaic cell according to claim 1, wherein the hole transport agent in the hole transport layer is a molecule containing at least one of N, O, and S atoms in an aromatic ring structure.

9. The perovskite photovoltaic cell according to claim 1, wherein the hole transport agent in the hole transport layer contains at least one of 4-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl, 2-(N,N-dimethylamino)phenyl-4'-(9H-carbazole-9-yl)biphenyl, and 2-(N,N-dimethoxymethyl)phenyl-4'-(9H-carbazole-9-yl)biphenyl.

10. The perovskite photovoltaic cell according to claim 1, wherein the thickness of the hole transport layer is less than or equal to 20 nm.

11. The perovskite photovoltaic cell according to claim 1, wherein the perovskite photovoltaic cell includes a hole transport layer, an anti-ultraviolet layer is provided on one side of the hole transport layer, the anti-ultraviolet layer contains an anti-ultraviolet additive, and the thickness of the anti-ultraviolet layer is less than or equal to 1 nm.

12. The perovskite photovoltaic cell according to claim 1, wherein the perovskite photovoltaic cell comprises conductive glass, hole transport layer, perovskite active layer, passivation layer, electron transport layer, and electrode stacked sequentially.

13. The perovskite photovoltaic cell according to claim 1, characterized in that, The perovskite photovoltaic cell comprises, in sequence, conductive glass, hole transport layer, UV-resistant layer, perovskite active layer, passivation layer, electron transport layer, and electrode.

14. The perovskite photovoltaic cell according to claim 12 or 13, characterized in that, A hole-blocking layer is provided between the electron transport layer and the electrode.

15. A solar cell module, characterized in that, Includes the perovskite photovoltaic cell according to any one of claims 1-14.

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