Fluid supply distribution measurement device and method of use thereof
Patent Information
- Application Number
- CN202611145948.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-07-30
- Publication Date
- 2026-10-27
- Estimated Expiration
- 2046-07-30
AI Technical Summary
例如PVD镀膜供气装置,供气装置由一点进气,通过气体流路分流,在阵列的出气端喷嘴前面,形成了面供气,经过特殊流路设计,可以保证出气时流体分布均匀,但离开阵列的喷嘴端后,在某个面(与喷嘴端等距的平面)的气体分布是否还均匀,靠现有技术无从知晓,现在的测量手段无法直接测量得到这个分布,这就需要一个能够测试流体排出后分布的测量手段,给出分布的定量值
[0020]进一步地,所述的使用方法包括,将所述流体供给分布测量装置拼接成条状测量机构,控制所述条状测量机构一边移动,一边测量,移动方向与所述条状测量机构垂直;
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Figure CN122631341B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a fluid supply distribution measurement device and its usage method, which belongs to the intelligent manufacturing equipment industry in the national strategic emerging industries and is related to the broader semiconductor field. Background Technology
[0002] In the core electronics industry, integrated circuit manufacturing often requires equipment such as PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), and ALD (Atomic Layer Deposition). These devices require the introduction of reactive gases during operation, and the uniformity of gas diffusion affects the quality and performance of semiconductor products. Therefore, these devices require a uniform fluid supply. In existing technologies, when supplying gas to these devices, the fluid typically enters from a single point, then spreads into a line or surface. The final requirement is that the discharged fluid is uniformly distributed along a certain line or surface to achieve a satisfactory film thickness distribution. For example, in a PVD coating gas supply device, gas enters from a single point, is diverted through a gas flow path, and forms a surface gas supply in front of the nozzle at the outlet end of the array. Through a special flow path design, uniform fluid distribution at the outlet can be ensured. However, whether the gas distribution remains uniform on a certain surface (a plane equidistant from the nozzle end) after leaving the nozzle end of the array is unknown with current technology. Current measurement methods cannot directly measure this distribution. Therefore, a measurement method is needed to test the distribution after fluid discharge and provide a quantitative value of the distribution. Summary of the Invention
[0003] To overcome the shortcomings of the prior art, the present invention provides a fluid supply distribution measuring device and its usage method, which can measure the quantitative value of gas distribution after the fluid is ejected from the nozzle end for a certain distance.
[0004] The technical solution adopted by this invention to solve its technical problem is: A fluid supply distribution measuring device includes a support grid, the support grid including a skeleton on the same plane and through holes located between the skeleton, and multiple sets of sensors are arrayed on the upstream side of the skeleton, the array density of the sensors being greater than the array density of the nozzles used for supplying fluid, each set of sensors integrating at least one of a pressure sensor, a temperature sensor, a gas flow sensor, a liquid flow sensor, and a capacitance sensor.
[0005] The fluid supply distribution measuring device provided in this application faces the fluid with an array of sensors on one side. The sensors, with a higher array density than the nozzle array density, can measure the surface distribution or even spatial distribution of physical quantities (pressure, temperature, flow rate, etc.) on a certain cross section of the fluid in real time (when the fluid supply distribution measuring device is movable). The fluid passes through the through hole to avoid backflow affecting the measurement.
[0006] Furthermore, a plurality of guide tubes are provided on one side upstream of the skeleton, each guide tube corresponding to a group of sensors. At the outlet of each guide tube, the position of each group of sensors relative to the guide tube is consistent, and the inlets of each guide tube are on the same plane and have the same diameter.
[0007] The fluid first enters the guide tube before reaching the sensor, effectively assigning each sensor group an independent sampling channel. All guide tube inlets are on the same plane and have the same diameter, meaning that the initial conditions for fluid collection are consistent across all tubes. The inflow angle and effective collection area at the inlet are identical. This ensures that no tube will collect more fluid due to its forward position or larger diameter, nor will it collect less due to its backward position or smaller diameter. Thus, the data measured by each sensor group has a unified collection benchmark, allowing direct lateral comparison to reflect the true differences in inflow distribution without the need for additional inlet correction. At the outlet of each guide tube, the sensor's position relative to the tube is consistent, ensuring that the angle and distance at which the fluid impacts the sensor after exiting the tube are the same. The fluid state sensed by the sensor depends only on the parameters of the inflow itself and is unaffected by changes in the impact angle due to differences in installation position. The guide tubes are independent of each other, and the fluid collected by adjacent guide tubes does not interfere with each other.
[0008] Furthermore, the outlet of the guide tube is funnel-shaped with a gradually narrowing inner diameter.
[0009] The fluid jet from the guide tube is more concentrated, with a smaller divergence angle. After converging, the fluid accurately hits the center of the sensor's preset sensitive area, thus improving measurement sensitivity. Because it doesn't deviate to the sensor edge or overflow onto adjacent structures, the spatial positioning of the measurement point is also more accurate. The gradually narrowing inner diameter structure allows the guide tube to smoothly transition from a large inlet diameter to a small outlet diameter, ensuring a sufficiently large sampling area at the inlet to guarantee sample representativeness.
[0010] Furthermore, the frame is provided with an auxiliary fluid outlet, which is not within the range aligned with the guide pipe.
[0011] If gaps exist between the guide tubes, some fluid will bypass them instead of entering the guide tubes. If this fluid lacks a clear discharge path, it will accumulate in the space between the guide tube and the frame, forming a local stagnation zone. As the pressure gradually increases, this stagnation zone will backflow into the guide tube from the outlet, interfering with the sensor's normal measurements. The auxiliary fluid outlet precisely receives this bypass fluid, allowing it to flow directly downstream through the frame. The pressure difference between the inside and outside of the guide tube remains stable, and the flow state of the fluid inside the tube is unaffected by external pressure fluctuations. The bypass fluid discharged from the auxiliary fluid outlet also carries the fluid near the outer wall of the guide tube downstream, forming a sweeping airflow on the outer wall of the guide tube. This prevents fluid stagnation in the dead zone between the outer wall of the guide tube and the frame. The fluid in the dead zone is continuously renewed, and its temperature, composition, and other parameters remain consistent with the mainstream. Long-term stagnation will not create a parameter gradient that would affect the temperature measurement of the fluid inside the tube through heat transfer via the tube wall. The frame contains both through holes and auxiliary fluid outlets, which perform different drainage functions. The through holes receive the main fluid from the outlet of the guide pipe, while the auxiliary fluid outlets receive the bypass fluid between the guide pipes. The two channels work together to ensure that the fluid in the entire measuring surface can be smoothly transmitted downstream, further reducing the overall flow resistance of the device and minimizing the reaction effect on the upstream flow field.
[0012] Furthermore, a heat insulation gap or heat insulation layer is provided between the guide tube and the frame.
[0013] The flow guide tube is exposed to the incoming flow, and its temperature changes rapidly with the incoming flow temperature. The sensor integrated into the frame is often affected by its own temperature in terms of measurement accuracy. If the frame temperature fluctuates with the flow guide tube temperature, the sensor's zero point will drift, introducing temperature errors into the measurement results. The thermal insulation structure blocks heat transfer from the flow guide tube to the frame. The frame's temperature change lags behind the incoming flow temperature change, and the fluctuation amplitude is significantly attenuated. The sensor operates on a relatively stable substrate, resulting in minimal zero-point drift and a more stable baseline for the measurement data.
[0014] Furthermore, where the sensor is not present, the cross-section of the skeleton is triangular or teardrop-shaped.
[0015] With the triangular or teardrop-shaped tip pointing upstream, the fluid smoothly splits along the inclined surface when it encounters the support grid, preventing the formation of a stagnant high-pressure zone on the windward side of the grid. After bypassing the grid, the fluid quickly re-converges downstream, resulting in a narrower wake region. Low flow resistance means minimal pressure loss as the fluid passes through the support grid, minimizing the pressure difference before and after the device. The distribution measured by the sensor accurately reflects the nozzle's actual output, rather than being distorted by back pressure from the device. A weak wake also reduces flow turbulence after passing through the support grid, allowing downstream equipment (such as wafers and substrates) to receive a fluid distribution closer to the sensor's measurement location. This results in better correlation between the measurement results and actual process parameters, making the measurement data more instructive.
[0016] Furthermore, the support grid is a hollowed-out wafer.
[0017] Sensors can be fabricated directly on the wafer surface without the need for an additional mounting substrate. There is no adhesive layer or assembly gap between the sensor and the substrate, resulting in a short and stable heat conduction path and more consistent thermal response characteristics. The die-cutting wafer technology is mature, allowing for the creation of very fine skeletons and high aperture ratios. The skeleton occupies a small area, while the via ratio is high, resulting in low overall flow resistance and minimal interference with the measured flow field. Multiple sensors can be fabricated simultaneously on the wafer surface, integrating pressure, temperature, flow, and other sensitive structures onto the same wafer using semiconductor technology. The positional accuracy between different sensors is ensured by photolithography, reaching the nanometer level. The spatial registration accuracy of multi-parameter data is extremely high, virtually eliminating errors caused by spatial misalignment during subsequent correlation analysis.
[0018] Furthermore, the frame has a heating element on its downstream side.
[0019] Secondly, this application provides a method of using the fluid supply distribution measuring device as described in the first aspect, wherein the fluid supply distribution measuring device is placed downstream of the nozzle, the side of the support grid with the sensor faces the nozzle, and the plane of the sensor is parallel to the plane of the nozzle.
[0020] Furthermore, the method of use includes assembling the fluid supply distribution measuring device into a strip-shaped measuring mechanism, controlling the strip-shaped measuring mechanism to move while measuring, with the direction of movement perpendicular to the strip-shaped measuring mechanism; Alternatively, the fluid supply distribution measuring device can be assembled into a fan-shaped measuring mechanism, which can be controlled to rotate while measuring, with the rotation center on the angle bisector of the fan-shaped measuring mechanism.
[0021] The beneficial effects of this invention are: This invention uses the side with the array of sensors to receive the fluid, and uses the array of sensors to measure in real time the surface distribution and even spatial distribution of physical quantities on a certain cross section of the fluid after it has been ejected a certain distance from the nozzle end. The density of the sensor array is greater than that of the nozzle array, and the measured distribution is more refined. Although a large number of sensors are arranged, the fluid flowing towards the support grid can pass through the through holes, avoiding backflow that affects the measurement. It can be applied to the design and debugging of equipment such as PVD, CVD, and ALD.
[0022] Other features and advantages of this application will be set forth in the following description and will be apparent in part from the description or may be learned by practicing the application. The objectives and other advantages of this application may be realized and obtained by means of the structures particularly pointed out in the written description and the accompanying drawings. Attached Figure Description
[0023] Figure 1 This is one of the top views of a fluid supply distribution measuring device provided in the embodiments of this application.
[0024] Figure 2 This is one of the schematic diagrams showing the positional relationship between the guide tube and the skeleton.
[0025] Figure 3 This is a second top view of a fluid supply distribution measuring device provided in an embodiment of this application.
[0026] Figure 4 This is the second schematic diagram showing the positional relationship between the guide tube and the skeleton.
[0027] Figure 5 This is a schematic diagram of the skeleton's shape.
[0028] Figure 6 This is a schematic diagram of the skeleton structure.
[0029] Figure 7 This is a schematic diagram of the working state of a fluid supply distribution measuring device provided in an embodiment of this application.
[0030] Figure 8 This is a schematic diagram of the working state of the strip-shaped measuring mechanism.
[0031] Figure 9 This is a schematic diagram of the working state of the sector-shaped measuring mechanism.
[0032] Figure 10 This is a schematic diagram of the working state of a fluid supply distribution measuring device provided in this application embodiment when measuring liquid.
[0033] Reference numerals: 1. Support grid; 101. Strip measuring mechanism; 102. Fan-shaped measuring mechanism; 103. Circular measuring mechanism; 11. Frame; 111. Auxiliary fluid outlet; 113. Insulation gap; 12. Through hole; 3. Sensor; 31. First sensor; 32. Second sensor; 4. Guide pipe; 5. Heating element; 6. Pipe; 7. Vacuum chamber; 71. Vacuum gauge; 72. Gas flow meter; 73. Gas source; 74. Rotating lifting mechanism; 75. Vacuum pump; 8. Fluid discharge device; 9. Nozzle; 91. Diverting device; 92. Gas inlet. Detailed Implementation
[0034] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.
[0035] The following disclosure provides many different embodiments or examples for implementing different structures of the invention. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the invention. Furthermore, reference numerals and / or letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or arrangements discussed.
[0036] Reference Figure 1 This application provides a fluid supply distribution measuring device, including a support grid 1. The support grid 1 includes a skeleton 11 on the same plane and through holes 12 located between the skeleton 11. Multiple sets of sensors 3 are arrayed on the upstream (in the direction of fluid flow) side of the skeleton 11. The array density of the sensors 3 is greater than the array density of the nozzles 9 used for supplying fluid. Each set of sensors 3 integrates at least one of a pressure sensor, temperature sensor, airflow sensor, liquid flow sensor, and capacitance sensor. That is, the types and quantities of specific sensors are the same among the multiple sets of sensors. For example, if a set of sensors consists of one capacitance sensor and one temperature sensor, then each set of sensors on the entire skeleton consists of one capacitance sensor and one temperature sensor. If a set of sensors consists of an airflow sensor, then each set of sensors on the entire skeleton consists of one airflow sensor.
[0037] This device can measure the surface distribution of physical quantities on the fluid cross section in real time. When the device is movable, for example, by driving the device with a drive mechanism, or when multiple support grids 1 are used in combination, the spatial distribution of physical quantities can also be measured.
[0038] After the fluid flows into the device, the array sensors sense and / or record the pressure and / or temperature at each point in the array, thereby calculating the fluid flow rate and fluid temperature, and finally calculating the fluid flow rate distribution, fluid temperature distribution, etc.
[0039] like Figure 1 In the represented embodiment, the support grid is circular, and multiple equilateral triangles are divided inside by a rod-shaped skeleton 11, with the sensor 3 set at the vertices of the triangles.
[0040] In some embodiments, reference is made to Figures 2 to 4 ( Figure 2 Point a in the middle is a cross-sectional view from the frontal perspective. Figure 2 (Center b is a top view) Multiple guide pipes 4 are provided on one side of the upstream of the skeleton 11. Each guide pipe 4 corresponds to a set of sensors 3. At the outlet of each guide pipe 4, the position of each set of sensors 3 relative to the guide pipe 4 is consistent. The inlets of each guide pipe 4 are on the same plane and have the same diameter.
[0041] like Figure 2In the represented embodiment, the support grid is rectangular, and it is divided into multiple sub-units of rectangular array by a skeleton 11. Each sub-unit is rectangular, and each sub-unit is equipped with a set of sensors 3. Rod-shaped skeletons 11 are built at the four corners of the sub-unit to support the sensors 3. The rod-shaped skeletons 11 form many intersections. Some intersections are equipped with sensors 3, and some intersections are used to support the guide pipe 4. All flow must enter the guide pipe.
[0042] In some embodiments, reference is made to Figure 4 and Figure 6 The outlet of the guide tube 4 is funnel-shaped with a gradually narrowing inner diameter to improve the sensor's sensing accuracy. Preferably, the inlet of the guide tube 4 is also designed with a gradually increasing wall thickness, so that the inner diameter at the inlet also gradually narrows (e.g., Figure 4 The top has a tapered shape, and the end shape is less prone to turbulence.
[0043] In some embodiments, reference is made to Figure 3 and Figure 4 The frame 11 is provided with an auxiliary fluid outlet 111, which is not within the range aligned with the guide pipe 4. That is, there is a gap between adjacent guide pipes. Figure 2 The embodiments represented are different, and it is not mandatory for all fluids to pass through the guide tube. It is allowed that some fluids do not enter the guide tube. These fluids that do not enter the guide tube pass through the support frame, either entirely or partially, from the auxiliary fluid outlet 111.
[0044] like Figure 3 In the represented embodiment, the support grid is rectangular, with circular through holes 12 cut out, and the remaining part forms the skeleton 11. The auxiliary fluid outlet 111 is also formed by cutting out the remaining skeleton. Part of the fluid enters the guide pipe 4, is measured by the sensor 3, and then passes through the support grid 1 via the through holes 12. Part of the fluid does not enter the guide pipe 4, but passes through, for example, between adjacent guide pipes 4. In this case, a portion passes through the support grid 1 via the through holes 12, and another portion passes through the support grid 1 via the auxiliary fluid outlet 111.
[0045] In some embodiments, reference is made to Figure 6 The frame 11 has a heating element 5 on the downstream side to keep the support grid at a constant temperature.
[0046] The support grid 1 is preferably a hollowed-out wafer. The sensor is a device fabricated on the wafer, such as using the MEMS (Microelectromechanical Systems) method. The heating element 5 can be a resistive film deposited on the downstream surface of the wafer, or a TFT (Thin Film Transistor) circuit can be set on the frame.
[0047] The current guide tube and the wafer do not necessarily need to be connected; their position only needs to be aligned with the sensor. Specifically, the current guide tube can be connected as a whole, with the edge of this whole fixed to the edge of the support grid. If the current guide tube needs to be fixed to the wafer, the wafer can be metallized and the current guide tube soldered onto it (similar to fan-out wire bonding in ICs), or the wafer can be slotted and the current guide tube can be embedded in it.
[0048] Preferably, a heat insulation gap 113 or a heat insulation layer is provided between the guide pipe 4 and the frame 11.
[0049] like Figure 6 In the represented embodiment, the guide tube 4 is spaced a certain distance from the support grid 1, forming a heat insulation gap 113. The support grid is made of a wafer, with a resistive film deposited on the downstream side of the wafer as a heating element 5, and multiple sets of sensors 3 arranged in an array on the upstream side of the wafer. Each set of sensors 3 includes a first sensor 31 and a second sensor 32. Specifically, the first sensor 31 can be a pressure sensor, and the second sensor 32 can be a temperature sensor.
[0050] In some embodiments, reference is made to Figure 5 Where there is no sensor 3, the cross-section of the skeleton 11 is triangular or teardrop-shaped.
[0051] like Figure 5 In the represented embodiment, the support grid is circular, and multiple equilateral triangles are divided inside by a rod-shaped skeleton 11. The sensor 3 is set at the vertex of the triangle. Where there is no sensor 3, the radial cross section of the rod-shaped skeleton (the radial direction of the "rod", not the radial direction of the support grid) is triangular or teardrop-shaped. This means that the upstream end of the skeleton is sharp, and the downstream end is flat or rounded, so that the fluid flows out smoothly and turbulence and backflow are avoided as much as possible. The streamlined cross section facilitates the passage of fluid.
[0052] The method of using the above-mentioned fluid supply distribution measuring device is as follows: Figure 7 The gas source enters the flow distribution device 91 through the gas inlet 92. The flow distribution device 91 distributes the airflow to multiple nozzles 9 and then sprays it out. During measurement, the fluid supply distribution measurement device is placed downstream of the nozzle 9. The side of the support grid 1 with the sensor 3 faces the nozzle 9, and the plane where the sensor 3 is located is parallel to the plane where the nozzle 9 is located.
[0053] Specifically, please refer to Figure 8 The diversion device 91 outputs fluid to the fluid discharge device. In this embodiment, the fluid supply distribution measuring devices are assembled into a strip-shaped measuring mechanism 101. The strip-shaped measuring mechanism 101 is controlled to move while measuring, and the direction of movement is ( Figure 8 The middle arrow is perpendicular to the strip measuring mechanism 101.
[0054] Or, refer to Figure 9Gas source 73 supplies gas to the flow distribution device 91 in vacuum chamber 7. A gas flow meter 72 is installed along the gas supply path. Vacuum chamber is connected to vacuum gauge 71 and vacuum pump 75. In this embodiment, the fluid supply distribution measuring device is assembled into a fan-shaped measuring mechanism 102. The fan-shaped measuring mechanism 102 is controlled to rotate while measuring, and the rotation center is on the angle bisector of the fan-shaped measuring mechanism 102. Specifically, a rotating lifting mechanism is connected to the center of the fan-shaped measuring mechanism 102. While measuring, it rotates and lifts, which can obtain the spatial distribution of physical quantities.
[0055] In some embodiments, this application can also be used to measure liquid fluids, referring to... Figure 10 The fluid supply distribution measuring device is made into a circular measuring mechanism 103 and fixedly installed in the pipeline 6, so that the liquid is distributed according to the flow rate. Figure 10 The flow direction indicated by the center arrow allows for the measurement of liquid flow rate, temperature, pressure, etc., using a circular measuring mechanism 103. In this specification, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, materials, or characteristics described in connection with the described embodiment or example, which are included in at least one embodiment or example of the invention. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the described specific features, materials, or characteristics may be combined in any suitable manner in one or more embodiments or examples.
[0056] The above description represents the preferred embodiments of the present invention. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of the present invention, and these improvements and modifications are also considered to be within the scope of protection of the present invention.
Claims
1. A fluid supply distribution measuring device, characterized in that, It includes a support grid (1), the support grid (1) includes a skeleton (11) on the same plane and through holes (12) between the skeleton (11), and multiple sets of sensors (3) are arranged in an array on the upstream side of the skeleton (11). The array density of the sensors (3) is greater than the array density of the nozzle (9) used to supply fluid. Each set of sensors (3) integrates at least one of pressure sensor, temperature sensor, airflow sensor, liquid flow sensor and capacitance sensor. Multiple guide tubes (4) are provided on one side of the upstream of the skeleton (11). Each guide tube (4) corresponds to a set of sensors (3). At the outlet of each guide tube (4), the position of each set of sensors (3) relative to the guide tube (4) is consistent. The inlets of each guide tube (4) are on the same plane and have the same diameter. A heat insulation gap (113) is provided between the guide tube (4) and the skeleton (11). An auxiliary fluid outlet (111) is provided on the skeleton (11). The auxiliary fluid outlet (111) is not within the range aligned with the guide tube (4).
2. The fluid supply distribution measuring device according to claim 1, characterized in that, The outlet of the guide tube (4) is funnel-shaped with a gradually narrowing inner diameter.
3. The fluid supply distribution measuring device according to claim 1, characterized in that, Where the sensor (3) is not present, the cross-section of the skeleton (11) is triangular or teardrop-shaped.
4. The fluid supply distribution measuring device according to claim 1, characterized in that, The support grid (1) is a hollowed-out wafer.
5. The fluid supply distribution measuring device according to claim 1, characterized in that, The frame (11) has a heating element (5) on the downstream side.
6. The method of using the fluid supply distribution measuring device as described in any one of claims 1 to 5, characterized in that, The fluid supply distribution measuring device is placed downstream of the nozzle (9), with the side of the support grid (1) containing the sensor (3) facing the nozzle (9), and the plane containing the sensor (3) is parallel to the plane containing the nozzle (9).
7. The method of use according to claim 6, characterized in that, The fluid supply distribution measuring device is assembled into a strip-shaped measuring mechanism (101). The strip-shaped measuring mechanism (101) is controlled to move while measuring, and the moving direction is perpendicular to the strip-shaped measuring mechanism (101). Alternatively, the fluid supply distribution measuring device can be assembled into a fan-shaped measuring mechanism (102), and the fan-shaped measuring mechanism (102) can be controlled to rotate while measuring, with the rotation center on the angle bisector of the fan-shaped measuring mechanism (102).
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