Depiction device and adjustment method

Abstract

The present application provides a drawing device for drawing a pattern on a substrate by irradiation of light and an adjustment method for the drawing device, the adjustment method having: a step of drawing a preceding adjustment mark (921) on a subsidiary substrate; a step of acquiring an image of the preceding adjustment mark (921); a step of acquiring an offset amount of a position of the preceding adjustment mark (921); a step of confirming whether the offset amount is within an allowable range; a step of generating adjustment information in a case where the offset amount is not within the allowable range; a step of drawing a subsequent adjustment mark (922) on the subsidiary substrate while using the adjustment information; a step of acquiring an image of the subsequent adjustment mark (922); a step of acquiring an offset amount of a position of the subsequent adjustment mark (922); and a step of confirming whether the offset amount is within an allowable range. An entire outer edge of the subsequent adjustment mark (922) is located outside the preceding adjustment mark (921), and at least a part of the preceding adjustment mark (921) overlaps the subsequent adjustment mark (922).

Description

[0001] [Reference to relevant applications]

[0002] This application claims the benefit of priority to Japanese Patent Application JP2025-29020, filed on February 26, 2025, and incorporates the entire disclosure of that application into this application. Technical Field

[0003] This invention relates to a technique for drawing patterns on a substrate by irradiating it with light. Background Technology

[0004] Unlike contact exposure devices, direct imaging devices, which directly draw patterns on substrates, can improve accuracy by converting projected images into digital information for drawing. The accuracy of the drawing position in a direct imaging device is a crucial performance indicator; maintaining consistent quality regardless of individual device variations or environmental factors is essential.

[0005] After the drawing device is shipped from the manufacturing plant and installed at the customer's site, the accuracy of the drawing position may decrease due to various reasons. To solve this problem, a maintenance contract is signed with the customer for regular maintenance. During regular maintenance, a thin film is pasted onto the chrome-plated, marked clamp glass, and the drawing is performed on the film. The drawing position is then adjusted by observing the results. However, the clamp glass is expensive, and its disposal is complex, resulting in high maintenance costs.

[0006] Japanese Patent Application Publication No. 2012-208237 (Document 1) discloses a technique for simply checking the capability of a drawing apparatus (exposure machine) and, if necessary, making corrections (adjustments). In the drawing apparatus of Document 1, firstly, first inspection marks are drawn on the photosensitive layer of a substrate. The first inspection marks are circular and arranged at equal intervals. Next, the drawing position of the first inspection marks is detected by a camera to correct the drawing data. Then, based on the corrected drawing data, second inspection marks are drawn in a manner that surrounds each of the first inspection marks. The position of the second inspection marks is then detected by a camera, and the substrate is delivered. If it is determined that insufficient drawing accuracy has been obtained from the second inspection marks, mechanical adjustments are made, or a re-inspection is performed from the beginning.

[0007] However, as shown in Reference 1, when the adjusted marks are drawn around the initial marks, the outer marks become larger, making it difficult to efficiently utilize the surface of the substrate used for drawing position adjustments (hereinafter also referred to as the "auxiliary substrate"), and thus preventing an increase in the number of marks. In particular, to facilitate the detection of the outer marks and ensure that the outer and inner marks do not overlap, the outer marks need to be sufficiently large. Summary of the Invention

[0008] One objective of this invention is to efficiently utilize the surface of an auxiliary substrate used for adjusting the position. Another objective is to reduce the cost required for adjustment.

[0009] The drawing apparatus of Embodiment 1 of the present invention draws a pattern on a substrate, comprising: a holding portion for holding the substrate; a drawing portion for emitting modulated light for drawing toward a main surface of the substrate held by the holding portion; a moving mechanism for moving the holding portion relative to the drawing portion in a moving direction parallel to the main surface of the substrate held by the holding portion; an imaging portion for photographing a mark on the substrate; and a control portion for drawing a pattern on the main surface of the substrate by controlling the emission of light from the drawing portion while moving the holding portion along the moving direction; the control portion comprising: an offset acquisition portion for acquiring an offset based on an image of an adjustment mark drawn on an auxiliary substrate by the imaging portion. The adjustment unit determines the offset of the position of the adjustment mark; an adjustment information generation unit generates adjustment information based on the offset to adjust the drawing position of the drawing unit; and an adjustment control unit draws a preliminary adjustment mark on an auxiliary substrate and obtains the offset by the offset acquisition unit. If the offset is not within the allowable range, the adjustment information generation unit generates adjustment information, and while using the adjustment information, draws a subsequent adjustment mark on the auxiliary substrate and obtains the offset again by the offset acquisition unit to confirm whether the offset is within the allowable range. The outer edge of the subsequent adjustment mark is entirely located outside the preliminary adjustment mark, and at least a portion of the preliminary adjustment mark overlaps with the subsequent adjustment mark.

[0010] According to the present invention, the surface of the auxiliary substrate used for positioning adjustments can be utilized efficiently.

[0011] In embodiment 2 of the present invention, according to the drawing apparatus of embodiment 1, if the offset obtained again is not within the allowable range, the adjustment control unit uses the subsequent adjustment mark as a new prior adjustment mark, the adjustment information generation unit generates adjustment information again, and while using the adjustment information, draws a new subsequent adjustment mark on the auxiliary substrate and obtains the offset again by the offset acquisition unit, confirming whether the offset is within the allowable range, the entire outer edge of the new subsequent adjustment mark is located outside the new prior adjustment mark, and at least a portion of the new prior adjustment mark overlaps with the new subsequent adjustment mark.

[0012] In embodiment 3 of the present invention, according to the drawing apparatus of embodiment 2, the adjustment control unit repeatedly acquires the offset and confirms whether the offset is within the allowable range during the period when the offset is not within the allowable range, and displays an error to the operator when the number of repetitions reaches a predetermined number.

[0013] In embodiment 4 of the present invention, the drawing apparatus according to embodiment 1 (or any one of embodiments 1 to 3) is used, wherein the subsequent adjustment mark is a solid pattern that overlaps entirely with the preceding adjustment mark.

[0014] According to any one of embodiments 1 to 4, in embodiment 5 of the present invention, the drawing unit has a plurality of drawing heads.

[0015] The drawing apparatus of embodiment 6 of the present invention draws a pattern on a substrate, comprising: a holding part for holding the substrate; a drawing part for emitting modulated light for drawing toward a main surface of the substrate held by the holding part; a moving mechanism for moving the holding part relative to the drawing part in a moving direction parallel to the main surface of the substrate held by the holding part; an imaging part for imaging a mark on the substrate; and a control part for drawing a pattern on the main surface of the substrate by controlling the emission of light from the drawing part while moving the holding part along the moving direction; the control part comprising: an offset acquisition part for acquiring an offset of the position of the adjustment mark based on an image of an adjustment mark drawn on an auxiliary substrate acquired by the imaging part; an adjustment information generation part for generating adjustment information for adjusting the drawing position of the drawing part based on the offset; and an adjustment control part for drawing a prior adjustment mark on the auxiliary substrate and controlling the offset. The acquisition unit acquires an offset. If the offset is not within the allowable range, the adjustment information generation unit generates adjustment information. While using the adjustment information, a subsequent adjustment mark is drawn on the auxiliary substrate, and the offset acquisition unit acquires the offset again to confirm whether the offset is within the allowable range. If the offset acquired again is not within the allowable range, the adjustment control unit uses the subsequent adjustment mark as a new preliminary adjustment mark, and the adjustment information generation unit generates adjustment information again. While using the adjustment information, a new subsequent adjustment mark is drawn on the auxiliary substrate, and the offset acquisition unit acquires the offset again to confirm whether the offset is within the allowable range. The adjustment control unit repeats the action of acquiring the offset again and confirming whether the offset is within the allowable range while the offset is not within the allowable range. If the repetition reaches a predetermined number of times, an error is displayed to the operator.

[0016] According to the present invention, the cost required for adjustment can be reduced.

[0017] The adjustment method of Embodiment 7 of the present invention is used in a drawing apparatus for drawing a pattern on a substrate by irradiation with light, wherein the adjustment method comprises: a) a step of drawing a preliminary adjustment mark on an auxiliary substrate by a drawing unit; b) a step of acquiring an image of the preliminary adjustment mark by an imaging unit; c) a step of acquiring an offset of the position of the preliminary adjustment mark based on the image; d) a step of confirming whether the offset is within an allowable range; e) a step of generating adjustment information for adjusting the drawing position of the drawing unit if the offset is not within the allowable range; f) a step of drawing a subsequent adjustment mark on the auxiliary substrate by the drawing unit while using the adjustment information; g) a step of acquiring an image of the subsequent adjustment mark by the imaging unit; h) a step of acquiring an offset of the position of the subsequent adjustment mark based on the image; and i) a step of confirming whether the offset is within an allowable range; wherein the outer edge of the subsequent adjustment mark is entirely located outside the preliminary adjustment mark, and at least a portion of the preliminary adjustment mark overlaps with the subsequent adjustment mark.

[0018] The adjustment method of Embodiment 8 of the present invention is used for a drawing apparatus that draws a pattern on a substrate by irradiation with light, wherein the adjustment method includes: a) a step of drawing a preliminary adjustment mark on an auxiliary substrate by a drawing unit; b) a step of acquiring an image of the preliminary adjustment mark by an imaging unit; c) a step of acquiring an offset of the position of the preliminary adjustment mark based on the image; d) a step of confirming whether the offset is within an allowable range; e) a step of generating adjustment information to adjust the drawing position of the drawing unit if the offset is not within the allowable range; f) a step of using the adjustment information while drawing a pattern on the substrate by the drawing unit. The process involves: g) drawing subsequent adjustment marks on the auxiliary substrate; h) acquiring an image of the subsequent adjustment marks using the imaging unit; i) obtaining an offset of the position of the subsequent adjustment marks based on the image; j) confirming whether the offset is within the allowable range; j) performing steps e) to i) on the subsequent adjustment marks as new prior adjustment marks if the offset is not within the allowable range in step i); and k) repeating step j) while the offset is not within the allowable range, and displaying an error to the operator if the number of repetitions reaches a predetermined number.

[0019] The above-mentioned objects, other objects, features, methods, and advantages will become clearer from the accompanying drawings and the following detailed description of the invention. Attached Figure Description

[0020] Figure 1 It is a three-dimensional diagram depicting the device.

[0021] Figure 2 A diagram showing the functional structure of the control unit.

[0022] Figure 3 It is a diagram showing the process of automatically adjusting actions.

[0023] Figure 4 It is a diagram indicating the adjustment of the pattern.

[0024] Figure 5 It is a diagram that shows the relationship between the preceding adjustment markers and the subsequent adjustment markers.

[0025] Figure 6A This is a diagram depicting a situation where the markers have been adjusted beforehand.

[0026] Figure 6B This is a diagram depicting the situation where subsequent adjustment marks are made.

[0027] Figure 6C This diagram depicts the situation where the third adjustment mark has been applied.

[0028] Figure 7 This is a diagram showing other examples of advance adjustment markers and subsequent adjustment markers.

[0029] Explanation of reference numerals in the attached figures: 1. Drawing device 3. Filming Department 4. Description Section 8. Control Department 9 substrate 21. Maintenance Section 22. Mobile mechanism 41. Depicting the head 82 Offset Acquisition Section 84. Adjust the information generation department 85 Adjustment Control Department 91 Upper surface (main surface) 92 Auxiliary substrate Adjustment marks 921-925 Steps S12 to S18 Detailed Implementation

[0030] Figure 1 This is a perspective view illustrating a drawing apparatus 1 according to one embodiment of the present invention. The drawing apparatus 1 is a device for drawing patterns on a substrate 9. Specifically, the drawing apparatus 1 is a direct drawing device that illuminates a photosensitive material forming the upper surface of the substrate 9 with spatially modulated, generally beam-shaped light, and draws a pattern by scanning the illuminated area on the substrate 9. Figure 1In the diagram, arrows represent three mutually orthogonal directions as the X, Y, and Z directions. Figure 1 In the example shown, the X and Y directions are horizontal directions that are perpendicular to each other, and the Z direction is vertical (i.e., up and down). The same applies to other figures.

[0031] The substrate 9 is, for example, a generally rectangular flat printed wiring substrate. On the main surface (hereinafter also referred to as "upper surface 91") of the (+Z) side of the substrate 9, a resist film formed of photosensitive material is disposed on a copper layer. In the drawing apparatus 1, a circuit pattern is drawn (i.e. formed) on this resist film of the substrate 9. Furthermore, the substrate 9 can also be a substrate other than a printed wiring substrate, and the type and shape of the substrate 9 can be varied. The pattern drawn on the substrate 9 can also be a pattern other than a circuit pattern.

[0032] The drawing device 1 includes a holding part 21, a moving mechanism 22, an imaging part 3, a drawing part 4, a base 51, and a control part 8. The holding part 21, the moving mechanism 22, the imaging part 3, the drawing part 4, and the base 51 are housed inside a housing (not shown). The control part 8 is disposed outside the housing and controls the moving mechanism 22, the imaging part 3, and the drawing part 4, etc.

[0033] The holding portion 21 is a generally rectangular flat plate positioned lower than the imaging portion 3 and the drawing portion 4 (i.e., the (-Z) side). The holding portion 21 holds the substrate 9 in a horizontal position from below. In this embodiment, the holding portion 21 includes a vacuum chuck 211 that adsorbs and holds the lower surface of the substrate 9. The holding portion 21 may also have a structure other than a vacuum chuck, for example, a mechanical chuck. The upper surface 91 of the substrate 9, placed on the holding portion 21, is perpendicular to the Z-direction and parallel to the X and Y directions.

[0034] The moving mechanism 22 moves the holding part 21 relative to the shooting part 3 and the drawing part 4 in the horizontal direction (i.e., the direction of movement parallel to the upper surface 91 of the substrate 9). The moving mechanism 22 is mounted on the upper surface of the base 51 and is supported from below by the base 51. The base 51 is, for example, a generally rectangular parallelepiped shape in which the length in the Y direction is longer than the length in the X direction.

[0035] The moving mechanism 22 has a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 supports the holding part 21 from below and causes the holding part 21 to move linearly along the guide rail in the X direction. The first moving mechanism 23 supports the second moving mechanism 24 from below and causes the holding part 21 and the second moving mechanism 24 to move linearly along the guide rail in the Y direction together.

[0036] The drive source for the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor or a drive source with a motor mounted on a ball screw. The structure of the first moving mechanism 23 and the second moving mechanism 24 can be modified in various ways.

[0037] In the drawing apparatus 1, a rotation mechanism may also be provided to rotate the holding part 21 about a rotation axis extending in the Z direction. Additionally, a lifting mechanism to move the holding part 21 in the Z direction may also be provided on the drawing apparatus 1. For example, a servo motor can be used as the rotation mechanism. For example, a linear servo motor can be used as the lifting mechanism. The structures of the rotation mechanism and the lifting mechanism can be modified in various ways.

[0038] The imaging unit 3 has a plurality of (in) arranged along the X direction. Figure 1 The example shown shows two imaging heads 31. Each imaging head 31 is a camera with an imaging element such as a CCD or CMOS sensor. Each imaging head 31 is supported above the holding part 21 and the moving mechanism 22 by a support part 40 that spans the holding part 21 and the moving mechanism 22. The support part 40 is, for example, a single component positioned in the Y direction. Figure 1 In the example shown, when viewed parallel to the Y direction, the support 40 is a portal-shaped component (so-called a portal frame) that is fixed to the upper surface of the base 51.

[0039] exist Figure 1 In the example shown, two camera heads 31 are mounted on the (+Y) side of the support 40. Of the two camera heads 31, for example, one camera head 31 is fixed to the support 40, while the other camera head 31 can move along the X direction on the support 40. This allows for changing the distance in the X direction between the two camera heads 31. The number of camera heads 31 in the camera unit 3 can be one or more.

[0040] The drawing section 4 has a plurality of drawing heads 41 arranged along the X direction. The plurality of (in) Figure 1 The six drawing heads 41 shown in the example have substantially the same structure. Each drawing head 41 includes: a light source; a DMD (Digital Micro Mirror Device) that modulates (i.e., spatially modulates) the light from the light source and projects it downwards; and an optical system such as a lens that converges the light modulated by the DMD onto the substrate. Each drawing head 41 is supported above the holding part 21 and the moving mechanism 22 by the aforementioned support part 40. Figure 1 In the example shown, six drawing heads 41 are mounted on the (-Y) side of the support 40. In other words, the six drawing heads 41 are arranged in the Y direction across the support 40 on the side opposite to the two shooting heads 31 mentioned above.

[0041] exist Figure 1 In the example shown, the six drawing heads 41 are arranged in a roughly straight line, approximately parallel to the X direction. The six drawing heads 41 are positioned approximately the same in the Y and Z directions. Furthermore, the plurality of drawing heads 41 do not necessarily need to be arranged in a straight line; for example, they can be arranged in an alternating pattern. In addition, the number of drawing heads 41 in the drawing section 4 can be one or more.

[0042] Figure 2 This diagram illustrates the functional structure of the control unit 8. The control unit 8 is implemented using a general computer system, interface, dedicated circuitry, and other structures. The control unit 8 comprises a drawing control unit 81, an offset acquisition unit 82, a correction information generation unit 83, an adjustment information generation unit 84, and an adjustment control unit 85, as its functional structure. These functional structures and their functions are not shown and do not need to be strictly distinguished. The drawing control unit 81 represents the control function when drawing a pattern in the drawing device 1.

[0043] When drawing is performed by the drawing apparatus 1, the moving mechanism 22 moves the substrate 9 under the control of the drawing control unit 81 or the offset acquisition unit 82, and the imaging unit 3 captures images of the marks (so-called alignment marks) provided on the substrate 9 to obtain the accurate position of the marks on the substrate 9. The offset acquisition unit 82 calculates the positional offset and deformation of the substrate 9 as the offset amount based on the position of the marks. The detection accuracy of the offset amount is, for example, about 1 μm and less than 2 μm.

[0044] The correction information generation unit 83 generates correction information to correct the pattern that should be drawn based on the offset. The drawing control unit 81 corrects the drawing data and / or drawing timing by referring to the correction information, controls the emission of light from the drawing unit 4, and moves the holding unit 21 in a predetermined moving direction, thereby drawing a pattern on the main surface, i.e., the upper surface 91, of the substrate 9.

[0045] In the drawing apparatus 1, the pattern drawing on the substrate 9 is performed in a so-called multipath manner. Specifically, while modulated light is irradiated onto the upper surface 91 of the substrate 9 from a plurality of drawing heads 41 of the drawing unit 4, the substrate 9 is moved in the Y direction and passed under the drawing heads 41 by the first moving mechanism 23 of the moving mechanism 22. As a result, the irradiated area of ​​the light from the plurality of drawing heads 41 is scanned on the substrate 9 along the Y direction, and the substrate 9 is drawn. Thus, in this embodiment, the Y direction is the moving direction during drawing.

[0046] Next, the second moving mechanism 24 moves the substrate 9 a predetermined distance in the X direction. Then, the first moving mechanism 23 moves the substrate 9 in the Y direction (the opposite direction to the previous movement) again, and light is irradiated onto the substrate 9 from the drawing head 41 in parallel with this movement, thus drawing the substrate 9. In the drawing apparatus 1, by alternately irradiating the substrate 9 moving in the Y direction with light and moving the substrate 9 in the X direction, a pattern of the entire area on the substrate 9 is drawn.

[0047] Furthermore, in the drawing apparatus 1, the drawing of the substrate 9 can also be performed using a single-path method (also called a single-time method) in which the substrate 9 is drawn by moving the drawing head 41 only once in the Y direction. In this way, the movement in the X direction performed by the moving mechanism 22 is not necessary in the drawing process. The moving mechanism 22 is a mechanism that moves the holding part 21 relative to the drawing part 4 in the Y direction, which is the direction of movement during the drawing process.

[0048] Next, the automatic adjustment function of the drawing apparatus 1 will be explained. The automatic adjustment function is a function that automatically adjusts mechanical or optical offsets generated by the drawing apparatus 1 itself to maintain or improve drawing accuracy. Thus, the automatic adjustment function is different from the function of detecting the deformation of the substrate 9 and correcting the drawing data during the drawing of each substrate 9.

[0049] Figure 3 This diagram illustrates the flow of the automatic adjustment operation performed by the drawing device 1. During automatic adjustment, a test substrate (hereinafter referred to as the "auxiliary substrate") of a predetermined size is adhered to the upper surface using a thin film of photosensitive material. The operation of the drawing device 1 during automatic adjustment is primarily controlled by the adjustment control unit 85 of the control unit 8. During automatic adjustment, a dedicated automatic adjustment screen is displayed on the display unit of the drawing device 1, and automatic adjustment begins by the operator inputting a start instruction via the operation unit.

[0050] First, the auxiliary substrate is loaded into the drawing apparatus 1 and held by the holding unit 21 (step S11). Next, the drawing control unit 81 is instructed by the adjustment control unit 85, thereby controlling the moving mechanism 22 and the drawing unit 4. Using light emitted from the drawing unit 4, an initial adjustment pattern (hereinafter also referred to as "adjustment pattern") is drawn on the auxiliary substrate (step S12). The data of the adjustment pattern is prepared by pre-storing it in the control unit 8 and is automatically registered as drawing data during automatic adjustment. Furthermore, the adjustment information described later is not used in the initial drawing of the adjustment pattern. Alternatively, the drawing is performed based on the adjustment pattern being corrected using the adjustment information currently in use.

[0051] Figure 4This is a diagram showing an adjustment pattern depicted on the auxiliary substrate 92. In the depiction data, the adjustment pattern includes a plurality of adjustment marks arranged at equal intervals in the X and Y directions. By depicting the adjustment pattern, as... Figure 4 As shown, a plurality of adjustment marks 921 (hereinafter also referred to as "preliminary adjustment marks") are drawn on the auxiliary substrate 92. Each preliminary adjustment mark 921 is a solid circle. For example, the spacing (in the drawing data) between the preliminary adjustment marks 921 in the X and Y directions is 20 mm, and the diameter of the preliminary adjustment mark 921 is 2 mm.

[0052] The adjustment control unit 85 (or offset acquisition unit 82) acquires images of each preliminary adjustment mark 921 by controlling the moving mechanism 22 and the imaging unit 3 (step S13). The depicted adjustment marks are, for example, latent image marks on a photosensitive material that can be photographed. Furthermore, the adjustment control unit 85 determines the accurate position of each preliminary adjustment mark 921 by issuing an instruction to the offset acquisition unit 82, and acquires the offset of the adjustment mark from its original position (step S14). Specifically, the offset acquisition unit 82 determines the position (e.g., the center of gravity position) of the preliminary adjustment mark 921 by pattern matching based on the image acquired by the imaging unit 3 using the preliminary adjustment marks 921, and acquires the offset between this position and the ideal position in the depiction data. In addition, the imaging position of the imaging unit 3 is corrected.

[0053] The adjustment control unit 85 confirms whether the offset is within the allowable range (step S15). Specifically, the offset is calculated for all the advance adjustment marks 921, and its variance is set to σ. It is then confirmed whether 3σ is below the allowable value. The allowable value is usually the accuracy determined by the device specifications. If 3σ is within the allowable value, since no adjustment of the drawing device 1 is required, the automatic adjustment operation ends. Alternatively, the advance adjustment marks 921 can be grouped according to each corresponding drawing head 41, and it can be confirmed whether the offset is within the allowable range in each group.

[0054] If the offset is not within the allowable range, the adjustment information generation unit 84 generates adjustment information based on the offset to adjust the drawing position based on the drawing unit 4, according to the instruction of the adjustment control unit 85 (step S17). Furthermore, the repetition of step S16 will be explained later, but during the initial drawing of the adjustment pattern, the repetition is 1. The adjustment information is information for adjusting the drawing position to compensate for the offset between the drawing position of each preliminary adjustment mark 921 and the ideal position. For example, if the drawing position of the preliminary adjustment mark 921 is offset by (+ΔX) and (+ΔY) in the X and Y directions, the adjustment information is information for offsetting the drawing position of that adjustment mark by (-ΔX) and (-ΔY).

[0055] The offset can be divided into components of the overall offset of the advance adjustment mark 921 and components of the inherent offset of each advance adjustment mark 921. The overall offset of the advance adjustment mark 921 can be used to adjust the drawing timing (adjustment of the drawing position), while the inherent offset of each advance adjustment mark 921 can be used to adjust (i.e., correct) the distortion of the drawn pattern, thereby generating adjustment information. The adjustment information, as information to improve the accuracy of the drawing position, can be obtained using various other methods.

[0056] Next, the adjustment control unit 85 automatically registers the next adjustment pattern into the drawing control unit 81, and the adjustment control unit 85 issues an instruction to the drawing control unit 81, thereby adjusting the drawing position using the adjustment information and drawing the next adjustment pattern on the auxiliary substrate 92 (step S12). The second adjustment pattern includes adjustment marks (hereinafter also referred to as "subsequent adjustment marks") that cover the size of each of the preceding adjustment marks 921 of the initial adjustment pattern. Figure 5 This is a diagram that uses the outlines of these adjustment marks to represent the relationship between the preceding adjustment mark 921 and the subsequent adjustment mark 922. Figure 5 The outlines of subsequent adjustment marks 923, 924, and 925 are also shown. For example, the diameter of the initial adjustment mark 921 is 2 mm, and the diameters of adjustment marks 922, 923, 924, and 925 are 2.5 mm, 3 mm, 3.5 mm, and 4 mm, respectively.

[0057] The preliminary adjustment mark 921 and the subsequent adjustment mark 922 are solid circles, and their centers are aligned in the depiction data. Thus, the outer edge of the subsequent adjustment mark 922 is entirely outside the preliminary adjustment mark 921, and the entirety of the preliminary adjustment mark 921 overlaps with the subsequent adjustment mark 922.

[0058] Figure 6A This diagram depicts a scenario where prior adjustment mark 921 is present. Figure 6B This diagram depicts the situation with subsequent adjustment mark 922. In Figure 6B In the example, the drawing position is adjusted when drawing the subsequent adjustment mark 922, and the centers of the preceding adjustment mark 921 and the subsequent adjustment mark 922 are not aligned. The size of the subsequent adjustment mark 922 is set such that even if the drawing positions of the two deviate from the intended maximum offset, the entire preceding adjustment mark 921 will overlap with the subsequent adjustment mark 922. That is, the entire preceding adjustment mark 921 will necessarily overlap with the subsequent adjustment mark 922.

[0059] When the subsequent adjustment marks 922 are drawn, the adjustment control unit 85 controls the movement mechanism 22 and the imaging unit 3 to acquire images of each subsequent adjustment mark 922 (step S13). Then, the adjustment control unit 85 sends an instruction to the offset acquisition unit 82 to determine the accurate position of each subsequent adjustment mark 922 and acquire the offset of the adjustment mark from its intended position (step S14). That is, the offset is acquired again by the offset acquisition unit 82. The adjustment control unit 85 confirms whether the offset is within the allowable range (step S15).

[0060] If the offset obtained again is within the allowable range, the automatic adjustment operation ends. If the offset obtained again is not within the allowable range, it is checked whether the number of repetitions has reached the predetermined upper limit (step S16). In this embodiment, the upper limit is set to 5, and the process proceeds to step S17 after the second offset confirmation is completed. Then, the adjustment information generation unit 84 generates adjustment information again based on the offset (step S17).

[0061] Then, while utilizing the adjustment information, a third adjustment mark is drawn and the offset is obtained (steps S12 to S14). The third adjustment pattern includes adjustment marks that cover the size of each subsequent adjustment mark 922 of the second adjustment pattern. Figure 5 The circle with reference numeral 923 indicates the outline of a further subsequent adjustment mark of subsequent adjustment mark 922. The third action is to treat subsequent adjustment mark 922 as a new preceding adjustment mark (more precisely, to treat the offset obtained from subsequent mark 922 as the offset of the new preceding adjustment mark), and to treat adjustment mark 923 as a new subsequent mark, and to repeat this action. Therefore, in the following description, subsequent adjustment mark 922 is referred to as "preceding adjustment mark 922", and adjustment mark 923 is referred to as "subsequent adjustment mark 923" relative to preceding adjustment mark 922.

[0062] like Figure 5 As shown, the preliminary adjustment mark 922 and the subsequent adjustment mark 923 are solid circles, and their centers are aligned as depicting data. Thus, the outer edge of the subsequent adjustment mark 923 is entirely outside the preliminary adjustment mark 922, and the entirety of the preliminary adjustment mark 922 overlaps with the subsequent adjustment mark 923.

[0063] Figure 6C This diagram illustrates the scenario where subsequent adjustment marks 923 are drawn on the auxiliary substrate 92 while utilizing the regenerated adjustment information. Figure 6CIn the example, the drawing position is adjusted when drawing the subsequent adjustment mark 923, and the centers of the preceding adjustment mark 922 and the subsequent adjustment mark 923 are not aligned. The size of the subsequent adjustment mark 923 is set such that even if the drawing positions of the two deviate from the intended maximum offset, the entire preceding adjustment mark 922 will overlap with the subsequent adjustment mark 923. That is, the entire preceding adjustment mark 922 will necessarily overlap with the subsequent adjustment mark 923.

[0064] By adjusting the control unit 85, images of each subsequent adjustment mark 923 are acquired (step S13). The adjustment control unit 85 sends an instruction to the offset acquisition unit 82 to determine the accurate position of each subsequent adjustment mark 923, and then acquires the offset of the adjustment mark from its original position (step S14). The adjustment control unit 85 confirms whether the offset is within the allowable range (step S15). If the offset is within the allowable range, the automatic adjustment operation ends.

[0065] If the offset is not within the allowed range, check whether the number of repetitions has reached the specified upper limit (step S16), and proceed to step S17, where the adjustment information generation unit 84 generates adjustment information based on the offset (step S17).

[0066] In the above process, when the offset of the initial adjustment mark is not within the allowable range, adjustment information is generated based on the offset. While correcting using the adjustment information, subsequent adjustment marks are drawn, the offset of the subsequent adjustment marks is calculated, and its size is confirmed. The drawing of subsequent adjustment marks and the acquisition and confirmation of offsets are repeated until the offset reaches the allowable range (step S16). If the offset does not reach the allowable range and the repetition reaches a predetermined number of times (5 times in this embodiment), an error is displayed on the display unit of the drawing device 1, indicating that the automatic adjustment of the drawing accuracy has failed (step S18), and the automatic adjustment operation ends.

[0067] exist Figure 5 The outlines of adjustment mark 924 in the fourth adjustment pattern and adjustment mark 925 in the fifth adjustment pattern are also shown. When all adjustment marks are considered subsequent adjustment marks, the outer edge of the subsequent adjustment mark is entirely outside the previously depicted preliminary adjustment mark, which overlaps with the subsequent adjustment mark.

[0068] Assuming that the subsequent adjustment mark is set as a ring surrounding the outer edge of the preceding adjustment mark, the subsequent adjustment mark becomes significantly larger than the preceding adjustment mark. As a result, the ring-shaped adjustment marks after the third time become very large, limiting the number of adjustment marks that can be arranged and making it impossible to efficiently utilize the surface of the auxiliary substrate 92. In addition, if the adjustment mark is larger than the area captured by the imaging unit 3, the offset cannot be calculated.

[0069] In contrast, in the drawing apparatus 1, the outer edge of the subsequent adjustment mark is entirely located outside the previously drawn advance adjustment mark, and the advance adjustment mark overlaps entirely with the subsequent adjustment mark. This reduces the number of subsequent adjustment marks and makes efficient use of the surface of the auxiliary substrate 92. Consequently, it is possible to increase the number of adjustment marks arranged in the adjustment pattern, or to increase the number of times adjustment marks are drawn in overlapping order.

[0070] Furthermore, from the perspective that subsequent adjustment marks do not need to be significantly increased relative to the earlier adjustment marks, such as Figure 7 As shown, the subsequent adjustment mark 922 can also be annular, with only a portion of the preceding adjustment mark 921 overlapping the subsequent adjustment mark. That is, the entire outer edge of the subsequent adjustment mark is located outside the preceding adjustment mark, and at least a portion of the preceding adjustment mark overlaps with the subsequent adjustment mark. Furthermore, from the viewpoint of easily detecting the position of the subsequent adjustment mark through pattern matching, it is preferable to perform a simple matching process where there is no gap between the preceding and subsequent adjustment marks. Moreover, if there is a gap between the preceding and subsequent adjustment marks, and dirt or scratches are present in that gap, it could potentially lead to false detection. From these viewpoints, it is preferable that the subsequent adjustment mark is a fully covered graphic that completely overlaps with the preceding adjustment mark. Of course, it does not need to be a completely covered graphic; it can be a partially covered graphic. The above explanation of the relationship between the "preceding adjustment mark" and the "subsequent adjustment mark" applies to... Figure 3 "Advance adjustment flags" and "subsequent adjustment flags" at any stage in the repetitive processing.

[0071] The upper limit of the number of repetitions in step S16 is preferably 3 or more. In practical applications, it is preferably 3 or more and 10 or less, and to prevent unnecessary repetitions when the offset does not converge, it is further preferably 4 or more and 6 or less. The upper limit of the number of repetitions can be 2. That is, only the initial adjustment pattern (first time) can be drawn, and the second adjustment pattern (second time) can be drawn.

[0072] Furthermore, in the drawing device 1, the action of acquiring the offset again by using the subsequent adjustment mark as a new preliminary adjustment mark when the offset is not within the allowable range (steps S17, S12-S14) is repeated during the period when the offset is not within the allowable range (step S15). When the number of repetitions reaches a predetermined number (step S16), an error is displayed to the operator (step S18). Therefore, the operator's operation required in the automatic adjustment operation is only the instruction to start the automatic adjustment. As a result, the cost required for adjustment can be reduced. In addition, precision adjustment can be repeated on an auxiliary substrate 92 until the upper limit number of times.

[0073] Furthermore, the action of repeating the adjustment until the offset reaches the allowable range (preferably fully automatic) can also be applied to adjustment marks that are different from the adjustment marks described above. For example, the repetition of the above adjustment action can also be applied when the subsequent adjustment mark is a shape that does not overlap with the previous adjustment mark. The repetition of the above adjustment action can also be applied when the subsequent adjustment mark is drawn in a different position than the previous adjustment mark.

[0074] As with the drawing device 1, when the drawing unit 4 has a plurality of drawing heads 41, adjustments made by one drawing head 41 may affect adjustments made by other drawing heads 41. That is, adjustments among the plurality of drawing heads 41 may not be independent. In step S16, setting the upper limit to 3 or more is particularly suitable for this situation.

[0075] Alternatively, for example, if multiple adjustments are to be made in a short period of time, such as if multiple adjustments are to be made in a day, the auxiliary substrate 92 that has been used once can be held again in the holding part 21, and the adjustment pattern with the adjustment mark of the next size can be automatically adjusted as the initial adjustment pattern.

[0076] After automatic adjustment is completed, it is preferable to display the offset for each repetition (e.g., the 3σ value of the offset of all adjustment marks) to the operator. More preferably, the offset for each repetition of each drawing head 41 is displayed. This allows the operator to understand the extent to which the adjustment action is effective.

[0077] The structure and operation of the drawing device 1 can be modified in various ways.

[0078] For example, adjustment marks used for adjustment are not limited to circles or rings. They can be squares, rectangles, rhombuses, (sufficiently wide) L-shapes or crosses, or even ring-shaped polygons. Adjustment marks can be any shape as long as they are graphics that can determine position.

[0079] In the above explanation, "offset" is defined as the difference between the position of each adjustment mark and the position of the adjustment mark on the drawing data. The offset is judged to be within the allowable range by comparing the 3σ of the offset with the allowable reference. However, the offset can also be understood as a statistical measure of the offset from the ideal position of a plurality of marks. As an offset, a value representing the drawing accuracy or a value representing the degree of difference between the ideal position and the drawn position can also be used.

[0080] The adjustment of the drawing device 1 is preferably fully automatic, but operator input can also be incorporated into some parts. For example, each repetitive action can be started according to the operator's instructions.

[0081] In the drawing device 1, the adjustment information can be returned to the adjustment information at any stage, that is, it can return to the action that used the past adjustment information. For example, multiple past adjustment information can be selected based on changes in room temperature, seasonal changes, etc.

[0082] The drawing unit 4 can employ various other structures that emit modulated light for drawing toward the main surface of the substrate 9 held in the holding unit 21. For example, the spatial modulator is not limited to a DMD, but can also be a GLV (Grating Light Valve) (a registered trademark of Silicon Light Machines, located in Sunnyvale, California). Furthermore, the drawing unit 4 can also emit a single scanning light (light that scans the emission direction) that is only modulated on / off.

[0083] In the drawing device 1, the holding part 21 can be moved relative to the drawing part 4 in the moving direction (Y direction) by the first moving mechanism 23. For example, the holding part 21 can be fixed, and the drawing part 4 can be moved in the Y direction above the holding part 21 by the moving mechanism. In addition, the drawing part 4 can also be moved in the X direction by the moving mechanism.

[0084] The structures in the above-described embodiments and variations can be appropriately combined as long as they do not contradict each other.

[0085] Although the invention has been described and illustrated in detail, the above description is illustrative rather than limiting. Therefore, various modifications or embodiments are possible without departing from the scope of the invention.

Claims

1. A drawing apparatus for drawing a pattern on a substrate, wherein, have: Holding section, holding substrate; The drawing section emits modulated light for drawing toward the main surface of the substrate held by the holding section; The moving mechanism moves the holding portion relative to the drawing portion in a moving direction parallel to the main surface of the substrate held by the holding portion; The imaging unit photographs the markings on the substrate; as well as The control unit draws a pattern on the main surface of the substrate by controlling the emission of light from the drawing unit while moving the holding unit along the moving direction. The control unit has: The offset acquisition unit acquires the offset of the position of the adjustment mark based on the image acquired by the imaging unit, which is drawn on the adjustment mark on the auxiliary substrate; The adjustment information generation unit generates adjustment information based on the offset to adjust the drawing position of the drawing unit; as well as The adjustment control unit draws preliminary adjustment marks on the auxiliary substrate and obtains the offset by the offset acquisition unit. If the offset is not within the allowable range, the adjustment information generation unit generates adjustment information. While using the adjustment information, the subsequent adjustment marks are drawn on the auxiliary substrate and the offset acquisition unit obtains the offset again to confirm whether the offset is within the allowable range. The outer edge of the subsequent adjustment mark is entirely located outside the preceding adjustment mark, and at least a portion of the preceding adjustment mark overlaps with the subsequent adjustment mark.

2. The drawing apparatus according to claim 1, wherein, If the offset obtained again is not within the allowable range, the adjustment control unit uses the subsequent adjustment mark as a new prior adjustment mark, the adjustment information generation unit generates adjustment information again, and while using the adjustment information, draws a new subsequent adjustment mark on the auxiliary substrate and the offset acquisition unit acquires the offset again to confirm whether the offset is within the allowable range. The outer edge of the new subsequent adjustment mark is entirely located outside the new preceding adjustment mark, and at least a portion of the new preceding adjustment mark overlaps with the new subsequent adjustment mark.

3. The drawing apparatus according to claim 2, wherein, The adjustment control unit repeatedly acquires the offset and confirms whether the offset is within the allowable range during the period when the offset is not within the allowable range. If the number of repetitions reaches a predetermined number, an error is displayed to the operator.

4. The drawing apparatus according to claim 1, wherein, The subsequent adjustment mark is a solid graphic that overlaps entirely with the preceding adjustment mark.

5. The drawing apparatus according to any one of claims 1 to 4, wherein, The drawing unit has a plurality of drawing heads.

6. A drawing apparatus for drawing a pattern on a substrate, wherein, have: Holding section, holding substrate; The drawing section emits modulated light for drawing toward the main surface of the substrate held by the holding section; The moving mechanism moves the holding portion relative to the drawing portion in a moving direction parallel to the main surface of the substrate held by the holding portion; The imaging unit photographs the markings on the substrate; as well as The control unit draws a pattern on the main surface of the substrate by controlling the emission of light from the drawing unit while moving the holding unit along the moving direction. The control unit has: The offset acquisition unit acquires the offset of the position of the adjustment mark based on the image acquired by the imaging unit, which is drawn on the adjustment mark on the auxiliary substrate; The adjustment information generation unit generates adjustment information based on the offset to adjust the drawing position of the drawing unit; as well as The adjustment control unit draws preliminary adjustment marks on the auxiliary substrate and obtains the offset by the offset acquisition unit. If the offset is not within the allowable range, the adjustment information generation unit generates adjustment information. While using the adjustment information, the subsequent adjustment marks are drawn on the auxiliary substrate and the offset acquisition unit obtains the offset again to confirm whether the offset is within the allowable range. If the offset obtained again is not within the allowable range, the adjustment control unit uses the subsequent adjustment mark as a new prior adjustment mark, the adjustment information generation unit generates adjustment information again, and while using the adjustment information, draws a new subsequent adjustment mark on the auxiliary substrate and the offset acquisition unit acquires the offset again to confirm whether the offset is within the allowable range. The adjustment control unit repeatedly acquires the offset and confirms whether the offset is within the allowable range during the period when the offset is not within the allowable range. If the number of repetitions reaches a predetermined number, an error is displayed to the operator.

7. An adjustment method for a drawing apparatus that draws a pattern on a substrate by means of light irradiation, wherein, The adjustment method has the following characteristics: a) In the process, the drawing department draws advance adjustment marks on the auxiliary substrate; b) In the process of acquiring an image of the pre-adjustment marks by the imaging unit; c) Step: Obtain the offset of the position of the preliminary adjustment mark based on the image; d) Step: Confirm whether the offset is within the allowable range; e) In the process of generating adjustment information to adjust the drawing position of the drawing part when the offset is not within the allowable range; f) In the process of using the adjustment information, the drawing unit draws subsequent adjustment marks on the auxiliary substrate; g) In the step of acquiring an image of the subsequent adjustment mark by the imaging unit; h) Step, based on the image, obtain the offset of the position of the subsequent adjustment mark; as well as i) Step: Confirm whether the offset is within the allowable range; The outer edge of the subsequent adjustment mark is entirely located outside the preceding adjustment mark, and at least a portion of the preceding adjustment mark overlaps with the subsequent adjustment mark.

8. An adjustment method for a drawing apparatus that draws a pattern on a substrate by means of light irradiation, wherein, The adjustment method has the following characteristics: a) In the process, the drawing department draws advance adjustment marks on the auxiliary substrate; b) In the process of acquiring an image of the pre-adjustment marks by the imaging unit; c) Step: Obtain the offset of the position of the preliminary adjustment mark based on the image; d) Step: Confirm whether the offset is within the allowable range; e) In the process of generating adjustment information to adjust the drawing position of the drawing part when the offset is not within the allowable range; f) In the process of using the adjustment information, the drawing unit draws subsequent adjustment marks on the auxiliary substrate; g) In the step of acquiring an image of the subsequent adjustment mark by the imaging unit; h) Step, based on the image, obtain the offset of the position of the subsequent adjustment mark; i) Step: Confirm whether the offset is within the allowable range; In step j), if the offset is not within the allowable range in step i), step e) is executed as a new prior adjustment mark to step i); as well as k) During the period when the offset is not within the allowable range, the j) procedure is repeated, and if the number of repetitions reaches a predetermined number, an error is displayed to the operator.

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