High speed exposure system and method for direct write lithography apparatuses

Abstract

The application discloses a kind of high-speed exposure system of direct writing photoetching equipment and a kind of high-speed exposure method of direct writing photoetching equipment, comprising: pattern generator, pattern generator is divided into N display areas, wherein N≥2, when first display area completes data loading and carries out display operation, second display area synchronously carries out data loading, when second display area completes data loading and carries out display operation, first display area synchronously carries out next frame data loading, so that data loading time and display operation time partially overlap;Illumination system, illumination system includes N independent light source, and each independent light source corresponds to the display area of pattern generator;Control unit, control unit generates trigger signal.The high-speed exposure system of direct writing photoetching equipment according to the embodiment of the application has the advantages of fast exposure speed and high image forming quality.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to a high-speed exposure system and a high-speed exposure method for a direct-write lithography apparatus. Background Technology

[0002] In the data link of the high-speed exposure system of the direct-write lithography equipment, the pattern switching process of the pattern generator usually includes two serial steps: loading pattern data and displaying pattern data. The single pattern switching time is the sum of the loading time T0 and the display time T1, i.e., T0+T1, and the corresponding highest pattern switching frequency is only 1 / (T0+T1).

[0003] To improve exposure speed, existing high-speed exposure systems in direct-write lithography equipment often increase the pattern switching step distance. However, this method easily leads to pattern stretching and distortion along the scanning direction. To address this, existing technologies introduce laser strobe functionality, using pulse triggering to synchronize the laser output with the pattern output timing, and shutting off a portion of the laser output time during the pattern display cycle to solve the pattern stretching problem. However, existing technologies are limited by insufficient optical power and low pattern switching frequency, making it difficult to match the ever-increasing exposure capacity requirements, thus restricting the processing efficiency and application scenarios of direct-write lithography equipment. Summary of the Invention

[0004] The present invention aims to at least solve one of the technical problems existing in the prior art. Therefore, one object of the present invention is to provide a high-speed exposure system for a direct-write lithography apparatus, which has the advantages of fast exposure speed and high image forming quality.

[0005] The second objective of this invention is to provide a high-speed exposure method for a direct-write lithography apparatus.

[0006] To achieve the above objectives, a high-speed exposure system for a direct-write lithography apparatus according to an embodiment of the present invention includes: a pattern generator, which is divided into N display areas, where N≥2; when a first display area completes data loading and performs a display operation, a second display area simultaneously loads data; when the second display area completes data loading and performs a display operation, the first display area simultaneously loads the next frame of data, so that the data loading time and the display operation time partially overlap; an illumination system, which includes N independent light sources, each of which corresponds to one display area of ​​the pattern generator; and a control unit, which generates a trigger signal, which controls the display timing of each display area of ​​the pattern generator and the flicker timing of each independent light source, so that each independent light source emits light only when its corresponding display area is in the display state.

[0007] According to an embodiment of the present invention, in the high-speed exposure system of a direct-write lithography apparatus, the pattern generator is divided into N display areas. Each display area adopts a working mode in which loading and display timing overlap. While the first display area completes data loading and performs display operations, the second display area simultaneously loads data. When the second display area enters the display state, the first display area immediately loads the next frame of data simultaneously, effectively overlapping the data loading time and the display operation time. This significantly shortens the single-frame pattern switching cycle, significantly increases the pattern switching frequency, directly improves the overall exposure efficiency of the system, and achieves high-speed exposure. The illumination system is configured with N independent light sources, each corresponding one-to-one with a display area of ​​the pattern generator. This provides independent and controllable laser illumination for each display area, avoiding optical signal crosstalk or illumination interference when multiple areas work simultaneously, and ensuring the independence and accuracy of pattern exposure in each area. The trigger signal generated by the control unit can precisely control the display timing of each display area of ​​the graphics generator and the flicker timing of each independent light source, so that each independent light source emits light only when the corresponding display area is in an effective display state, ensuring that the laser illumination and graphics display are strictly synchronized, effectively guaranteeing the forming accuracy of the graphics along the scanning direction and improving the image forming quality.

[0008] Therefore, the high-speed exposure system according to the embodiments of the present invention has the advantages of fast exposure speed and high image forming quality.

[0009] According to some specific embodiments of the present invention, the single graphics data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1, and the graphics switching cycle of the graphics generator is T1×N.

[0010] According to some specific embodiments of the present invention, the single graphics data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N>T1, and the graphics switching cycle of the graphics generator is T0.

[0011] According to some specific embodiments of the present invention, N in-phase trigger signals are generated by sampling from the trigger signal, and each in-phase trigger signal controls the strobe of an independent light source.

[0012] According to some specific embodiments of the present invention, the control unit is configured to adjust the pulse width of each independent light source according to the scanning step distance to compensate for the pattern stretching along the scanning direction caused by the increase in the step distance.

[0013] According to some specific embodiments of the present invention, the pattern generator includes a spatial light modulator or a phase light modulator.

[0014] A second aspect of the present invention provides a high-speed exposure method for a direct-write lithography apparatus, which uses a pattern generator for scanning exposure and includes the following steps: dividing the pattern generator into N display areas, where N≥2; after data loading is completed in the first display area, performing a display operation on the first display area according to a trigger signal, while simultaneously loading data in the second display area; after data loading is completed in the second display area, performing a display operation on the second display area according to the trigger signal, while simultaneously loading the next frame of data in the first display area, and so on, so that the data loading time and the display operation time partially overlap; illuminating the N display areas respectively through N independent light sources, each independent light source performing strobe control according to a corresponding sampling trigger signal, and emitting light only while the corresponding display area is in the display state.

[0015] According to some specific embodiments of the present invention, the single data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1; the graphics switching cycle of the graphics generator is T1×N.

[0016] According to some specific embodiments of the present invention, the single data loading time of the graphics generator is T0, the single display operation time is T1, and the number of display areas N satisfies T0 / N > T1; the graphics switching cycle of the graphics generator is T0.

[0017] According to some specific embodiments of the present invention, the exposure dose is controlled by adjusting the pulse width and / or pulse frequency of each independent light source, while keeping the average optical power constant.

[0018] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0019] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which: Figure 1 This is a schematic diagram of the high-speed exposure system of a direct-write lithography apparatus according to an embodiment of the present invention; Figure 2 This is a flowchart of high-speed exposure using a direct-write lithography apparatus according to an embodiment of the present invention.

[0020] Figure label: High-speed exposure system 1 of direct-write lithography equipment, pattern generator 100, illumination system 200, control unit 300. First display area 101, second display area 102, first independent light source 201, second independent light source 202. Detailed Implementation

[0021] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0022] In the description of this invention, it should be understood that the terms "center", "upper", "lower", "front", "rear", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0023] In the description of this invention, "first feature" and "second feature" may include one or more of the features.

[0024] In the description of this invention, "a plurality of" means two or more, and "several" means one or more.

[0025] The high-speed exposure system 1 of the direct-write lithography apparatus according to an embodiment of the present invention is described below with reference to the accompanying drawings.

[0026] like Figure 1 As shown, the high-speed exposure system 1 of the direct-write lithography apparatus according to an embodiment of the present invention includes a pattern generator 100, an illumination system 200, and a control unit 300.

[0027] The graphics generator 100 is divided into N display areas, where N≥2. When the first display area 101 completes data loading and performs a display operation, the second display area 102 simultaneously loads data. When the second display area 102 completes data loading and performs a display operation, the first display area 101 simultaneously loads the next frame of data, so that the data loading time and the display operation time partially overlap. The lighting system 200 includes N independent light sources, each corresponding to one display area of ​​the graphics generator 100. The control unit 300 generates trigger signals, which control the display timing of each display area of ​​the graphics generator 100 and the flicker timing of each independent light source, so that each independent light source emits light only while its corresponding display area is in display mode.

[0028] For example, when N is 2, the graphics generator 100 is divided into a first display area 101 and a second display area 102. The lighting system 200 includes a first independent light source 201 and a second independent light source 202. The first independent light source 201 corresponds to the first display area 101, and the second independent light source 202 corresponds to the second display area 102. During operation, the first display area 101 completes data loading and displays the data, while the second display area 102 simultaneously loads data. When the second display area 102 completes loading and displays the data, the first display area 101 simultaneously loads the next frame of data. The loading and display processes of the two areas alternate and run in parallel. The control unit 300 outputs two trigger signals: one triggers the first display area 101 to display and simultaneously triggers the first independent light source 201 to flash light, and the other triggers the second display area 102 to display and simultaneously triggers the second independent light source 202 to flash light. This ensures that the light source emits light only when the corresponding area is displayed, avoiding light interference between areas and achieving high-frequency, precise graphics exposure.

[0029] According to an embodiment of the present invention, in the high-speed exposure system 1 of the direct-write lithography apparatus, the pattern generator 100 is divided into N display areas. Each display area adopts a working mode in which loading and display timing overlap. While the first display area 101 completes data loading and performs display operations, the second display area 102 simultaneously loads data. When the second display area 102 enters the display state, the first display area 101 then simultaneously loads the next frame of data, so that the data loading time and display operation time effectively overlap, significantly shortening the single-frame pattern switching cycle, significantly improving the pattern switching frequency, directly improving the overall exposure efficiency of the system, and achieving high-speed exposure. The illumination system 200 is configured with N independent light sources, each independent light source corresponding one-to-one with a display area of ​​the pattern generator. It can provide independent and controllable laser illumination for each display area, avoiding optical signal crosstalk or illumination interference problems when multiple areas work simultaneously, and ensuring the independence and accuracy of pattern exposure in each area. The trigger signal generated by the control unit 300 can precisely control the display timing of each display area of ​​the graphics generator 100 and the flicker timing of each independent light source, so that each independent light source emits light only when the corresponding display area is in an effective display state, ensuring that the laser illumination and graphics display are strictly synchronized, effectively guaranteeing the forming accuracy of the graphics along the scanning direction and improving the image forming quality.

[0030] Therefore, the high-speed exposure system 1 according to the embodiments of the present invention has the advantages of fast exposure speed and high image forming quality.

[0031] In some specific embodiments of the present invention, the single graphics data loading time of the graphics generator 100 is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1, and the graphics switching cycle of the graphics generator is T1×N.

[0032] By distributing the graphics data loading task across N display areas, the loading time T0 / N for each area is significantly less than the display time T1. The loading process can be completed in parallel within the display periods of adjacent areas, achieving temporal overlap between data loading and display operations. This avoids the time waste caused by sequential loading and display in the traditional serial mode. The graphics switching cycle is shortened from the traditional T0+T1 to T1×N, significantly reducing the graphics switching time per frame, significantly increasing the graphics switching frequency, directly improving the overall system exposure efficiency, and achieving high-speed exposure.

[0033] In some specific embodiments of the present invention, the single graphics data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N>T1, and the graphics switching cycle of the graphics generator is T0.

[0034] The graphics generator 100 is divided into N display areas. By operating these areas in parallel, the data loading time T0 / N for each display area is made greater than the display operation time T1. Display operations can be completed in parallel within the loading periods of adjacent areas, fully utilizing the loading gaps to execute display actions. This avoids the time redundancy caused by sequential loading and display in the traditional serial mode. The graphics switching cycle is shortened from the traditional T0+T1 to T0, effectively reducing the time consumed by single-frame graphics switching, increasing the graphics switching frequency, significantly improving the overall system exposure efficiency, and achieving high-speed exposure.

[0035] In some specific embodiments of the present invention, such as Figure 1 As shown, N in-phase trigger signals are generated by sampling from the trigger signal, and each in-phase trigger signal controls the strobe of an independent light source.

[0036] By sampling and generating N in-phase trigger signals from the trigger signal, each in-phase trigger signal controls the strobe of an independent light source, enabling precise and independent control of the emission timing of each independent light source. This ensures strict synchronization between the independent light source and the graphic display action of the corresponding display area. In the above embodiment, with the increased exposure frequency, the graphic slicing step distance increases, and different display areas may simultaneously contain graphics to be exposed. Independent control of the illumination in each area is necessary to avoid mutual interference of light signals. By combining this with a regional strobe illumination system, each independent light source is controlled to emit light only when its corresponding display area is in an effective display state. This ensures the independence, consistency, and accuracy of the graphic exposure in each area. While increasing the graphic switching frequency and achieving high-speed exposure, this significantly optimizes the forming quality of the exposed graphics, meeting the high-speed and high-precision processing requirements of the high-speed exposure system in direct-write lithography equipment.

[0037] In some specific embodiments of the present invention, the control unit is configured to adjust the pulse width of each independent light source according to the scanning step distance to compensate for the pattern stretching along the scanning direction caused by the increase in the step distance.

[0038] The control unit 300 can dynamically adjust the pulse width of each independent light source according to the scanning step distance, which can accurately compensate for the image stretching problem along the scanning direction caused by increasing the step distance. By specifically adjusting the light source emission duration, the laser exposure energy is evenly distributed in the scanning direction, effectively correcting image distortion, avoiding defects such as edge blurring and size deviation, and ensuring the clarity of the exposed image outline and dimensional accuracy.

[0039] In some specific embodiments of the present invention, the pattern generator includes a spatial light modulator or a phase light modulator.

[0040] The pattern generator 100 employs a spatial light modulator or a phase light modulator. These structures offer high resolution, high response speed, and programmable pattern generation capabilities, enabling rapid loading and precise rendering of various complex lithography patterns. It supports independent display of multiple regions and high-frequency switching, and is compatible with N-zone parallel operation. Furthermore, it allows for flexible control of light intensity and phase, precisely coordinating with the zoned strobe illumination system to ensure timing synchronization between pattern display and laser illumination. This effectively improves pattern switching efficiency and exposure positioning accuracy, providing a reliable core imaging foundation for high-speed, high-precision exposure in direct-write lithography equipment.

[0041] The following is for reference. Figure 2 A high-speed exposure method for a direct-write lithography apparatus according to a second aspect of the present invention is described, such as... Figure 2 As shown, the method includes at least steps S1 to S4.

[0042] Step S1: Divide the graphics generator into N display areas, where N≥2; Specifically, based on the size of the exposed pattern and the scanning stroke, the effective display surface of the pattern generator is evenly divided into N independent sub-display areas along the scanning direction. Each display area has clear physical partitions and does not overlap with the others. Moreover, each display area can independently complete the loading and display of pattern data, providing a hardware partitioning basis for subsequent parallel partitioning and timing overlap control.

[0043] Step S2: After the data loading in the first display area is completed, the first display area is displayed according to the trigger signal, and the data is loaded in the second display area at the same time. Specifically, the control unit outputs a synchronous trigger signal, which immediately drives the first display area to enter the display state after the graphic data loading is completed. At the same time, the data loading process of the second display area is started in parallel, so that the display operation and data loading are performed synchronously in different areas.

[0044] Step S3: After the data loading in the second display area is completed, the second display area is displayed according to the trigger signal, and the next frame of data is loaded in the first display area. This process is repeated so that the data loading time and the display operation time partially overlap. Specifically, after the data in the second display area is loaded, the control unit switches the display area through a trigger signal, drives the second display area to output the current graphic, and simultaneously triggers the first display area to load the next frame of graphic data. The two areas alternately perform display and loading actions, repeating in a loop, effectively utilizing idle time periods, making the loading and display sequences overlap, and shortening the overall graphic switching cycle.

[0045] Step S4: Illuminate the N display areas with N independent light sources. Each independent light source is controlled to flicker according to the corresponding sampling trigger signal and emits light only when the corresponding display area is in display state.

[0046] Specifically, N in-phase sampled trigger signals are extracted from the total trigger signal and connected to each independent light source, so that the display timing of each light source is precisely synchronized with the display area of ​​the corresponding display area. The light source is controlled to flicker only when the graphic is displayed in the corresponding area, and remains off during other times to avoid light interference between areas and ensure that the exposure of each area is independent and accurate.

[0047] The high-speed exposure method of the direct-write lithography apparatus according to embodiments of the present invention divides the pattern generator into multiple display areas and alternately performs data loading and display operations, so that the loading time and display time overlap, effectively shortening the pattern switching cycle and significantly improving the pattern switching frequency and overall exposure efficiency. Simultaneously, it employs N independent light sources for zoned illumination and precise flashing based on sampling trigger signals, ensuring that each independent light source emits light only when its corresponding area is displayed, avoiding crosstalk between areas, ensuring the independence and consistency of pattern exposure, effectively improving the pattern stretching problem caused by increasing the step distance, and enhancing the contour clarity, dimensional accuracy, and forming quality of the lithographic pattern. This achieves the dual technical effects of high-speed exposure and high-precision forming, significantly enhancing the processing capability and application reliability of the high-speed exposure system of the direct-write lithography apparatus.

[0048] In some specific embodiments of the present invention, the single data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1, and the graphics switching cycle of the graphics generator is T1×N.

[0049] By dividing the graphics generator into N display areas and making the loading time T0 / N less than the display time T1, the data loading of each area is completed in parallel within the display time of adjacent areas. The graphics switching cycle is shortened from the traditional T0+T1 to T1×N, which significantly reduces the graphics switching time per frame and greatly improves the graphics switching frequency and exposure efficiency.

[0050] In some specific embodiments of the present invention, the single data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N>T1, and the graphics switching cycle of the graphics generator is T0.

[0051] The number of display areas N satisfies T0 / N>T1, and the graphics switching cycle is shortened to T0, which is significantly reduced compared to T0+T1 in the traditional serial working mode. This effectively compresses the graphics switching time and improves the graphics switching frequency and overall exposure efficiency.

[0052] In some specific embodiments of the present invention, the exposure dose is controlled by adjusting the pulse width and / or pulse frequency of each independent light source, while keeping the average light power constant.

[0053] Precise control of exposure dosage is achieved by adjusting the pulse width and / or pulse frequency of each independent light source, while maintaining a constant average optical power. This allows for dynamic compensation of pattern stretching distortion for different scanning step distances, flexible matching of timing requirements for zoned display areas, and ensures uniform exposure energy across all areas, thereby improving the forming accuracy and contour quality of the lithographic pattern. Furthermore, it avoids exposure instability caused by optical power fluctuations, achieving high-speed switching and improved exposure efficiency while ensuring laser output stability, making it suitable for high-frequency intensified exposure conditions.

[0054] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example.

[0055] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A high-speed exposure system for a direct-write lithography apparatus, characterized in that, include: A graphics generator is divided into N display areas, where N≥2. When the first display area completes data loading and performs a display operation, the second display area simultaneously loads data. When the second display area completes data loading and performs a display operation, the first display area simultaneously loads the next frame of data, so that the data loading time and the display operation time partially overlap. A lighting system comprising N independent light sources, each of which corresponds to a display area of ​​the graphics generator; The control unit generates trigger signals, which control the display timing of each display area of ​​the graphics generator and the flicker timing of each independent light source, so that each independent light source emits light only when the corresponding display area is in display mode.

2. The high-speed exposure system of the direct-write lithography apparatus according to claim 1, characterized in that, The graphics generator has a single graphics data loading time of T0 and a single display operation time of T1. The number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1. The graphics switching cycle of the graphics generator is T1×N.

3. The high-speed exposure system of the direct-write lithography apparatus according to claim 1, characterized in that, The graphics generator has a single graphics data loading time of T0, a single display operation time of T1, and the number of display areas N satisfies T0 / N>T1. The graphics switching cycle of the graphics generator is T0.

4. The high-speed exposure system of the direct-write lithography apparatus according to claim 1, characterized in that, N in-phase trigger signals are generated by sampling from the trigger signal, and each in-phase trigger signal controls the strobe of an independent light source.

5. The high-speed exposure system of the direct-write lithography apparatus according to claim 1, characterized in that, The control unit is configured to adjust the pulse width of each independent light source according to the scanning step distance to compensate for the graphic stretching along the scanning direction caused by the increase in the step distance.

6. The high-speed exposure system of the direct-write lithography apparatus according to claim 1, characterized in that, The pattern generator includes a spatial light modulator or a phase light modulator.

7. A high-speed exposure method for a direct-write lithography apparatus, comprising scanning exposure using a pattern generator, characterized in that, Includes the following steps: The graphics generator is divided into N display areas, where N≥2; After data loading is completed in the first display area, the first display area is displayed according to the trigger signal, and data is loaded in the second display area at the same time. After the data loading in the second display area is completed, the second display area is displayed according to the trigger signal, and at the same time, the first display area is loaded with the next frame of data. This process is repeated so that the data loading time and the display operation time partially overlap. The N display areas are illuminated by N independent light sources. Each independent light source is controlled to flicker according to the corresponding sampling trigger signal and emits light only when the corresponding display area is in display mode.

8. The high-speed exposure method of the direct-write lithography apparatus according to claim 7, characterized in that, The single data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N < T1 and T1×N < T0+T1, and the graphics switching cycle of the graphics generator is T1×N.

9. The high-speed exposure method of the direct-write lithography apparatus according to claim 7, characterized in that, The single data loading time of the graphics generator is T0, the single display operation time is T1, the number of display areas N satisfies T0 / N>T1, and the graphics switching cycle of the graphics generator is T0.

10. The high-speed exposure method of the direct-write lithography apparatus according to claim 7, characterized in that, Exposure dose is controlled by adjusting the pulse width and / or pulse frequency of each independent light source, while keeping the average light power constant.

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