A soft brick polishing process and soft brick

CN122746903APending Publication Date: 2026-09-15JINGDEZHEN TEDI CERAMICS CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202611120102.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-07-27
Publication Date
2026-09-15

AI Technical Summary

Technical Problem

[0007]综上,现有柔抛抛光工艺存在光泽度调控精度低、批次稳定性差、良品率低等诸多技术短板,无法满足规模化、标准化生产高品质、高一致性柔抛砖的行业需求

Benefits of technology

本发明的抛光工艺,通过降速抛光,延长砖面与磨块的接触时间,再结合抛光磨块排列调整,前段选择200-400目,相比于常规的150目起步,采用细粒度弹性模块,进行基础研磨,使表面初步平整,中段模块600-1200目,过渡研磨,衔接粗磨和细磨,后段采用200目-1200目纤维模块进行精抛,提高表面光滑度,消除划痕。而且每段由多个模组组成,逐级递进,进行研磨,避免局部抛磨过度或抛磨不足组合合理,速度适中,得到的成品光泽度稳定。进一步地,还可以结合打蜡抛片处理,进一步提升柔抛砖光泽度。

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure FT_1
    Figure FT_1
  • Figure FT_2
    Figure FT_2
  • Figure SMS_1
    Figure SMS_1
Patent Text Reader

Abstract

The present application provides a kind of soft polishing brick polishing process and soft polishing brick, belongs to building ceramic technical field.The soft polishing brick polishing process of the present application is reduced by polishing speed, with the speed of 25-30 pieces per minute, glaze brick to be polished is sequentially passed through front polishing, middle polishing and rear polishing, completes surface polishing, then combines polishing abrasive block arrangement adjustment, front section selects 200-400 mesh, compared with the conventional 150 mesh start, uses fine grain elastic module, carries out basic grinding, makes surface preliminary flat, middle section module 600-1200 mesh, transition grinding, connects rough grinding and fine grinding, rear section uses 200 mesh-1200 mesh fiber module and carries out fine polishing, improves surface smoothness, eliminates scratch.Moreover, each section has multiple modules, can be gradually advanced, carries out grinding, avoids local polishing and grinding excessive or polishing and grinding insufficient.The polishing scheme of the present application, combination is reasonable, speed is moderate, the finished product gloss obtained is uniform and stable, and the high-quality product rate is high.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This invention belongs to the field of building ceramics technology, specifically relating to a soft-polishing brick polishing process and soft-polished bricks. Background Technology

[0002] With the upgrading and development of the home decoration industry, consumers' requirements for the visual effect, tactile experience, and spatial adaptability of ceramic tile surfaces are constantly increasing. Soft-polished tiles, which combine aesthetics and practicality, are gradually replacing traditional glossy and matte tiles, becoming the mainstream surface material for mid-to-high-end home and commercial decoration. Soft-polished tiles, with their soft luster between glossy and matte and their delicate and comfortable surface texture, can create a warm and sophisticated spatial atmosphere. They effectively avoid the shortcomings of traditional glossy tiles, such as high reflectivity, easy light pollution, and the visibility of footprints and water stains under strong light. At the same time, they compensate for the dull texture and insufficient transparency of pure matte tiles.

[0003] Currently, the core optical standard for high-quality soft-polished tiles in the industry is a surface gloss level controlled between 25 and 35 degrees. This parameter is a key indicator distinguishing soft-polished tiles from regular ceramic tiles. Regular glossy polished tiles generally have a surface gloss level exceeding 70 degrees, with high-gloss products even approaching 90 degrees. Under direct light, they exhibit strong reflections, causing visual glare, a monotonous spatial texture, and easily leading to visual fatigue. Ordinary matte tiles, on the other hand, have a lower gloss level. While they lack strong light reflection, their surface transparency is poor, and their texture is rough. Soft-polished tiles utilize a specialized soft-polishing process to refine the tile glaze, achieving a medium-to-low soft diffuse reflection effect. Simultaneously, the physical structure of the glaze is optimized, resulting in superior surface wear resistance and stain resistance compared to traditional ceramic tiles. Balancing decorative aesthetics and functional performance, they have broad market application prospects.

[0004] The current mainstream production process for soft-polished tiles mostly adopts a conventional high-speed polishing mode with elastic modules, with a standard processing speed of 45 pieces / minute. This conventional polishing process results in tiles with a high gloss level, failing to consistently fall within the optimal soft-light range of 25 to 35 degrees, making it difficult to meet the production standards for high-quality soft-polished tiles. To adapt to the low-gloss production requirements of soft-polished tiles, the industry generally adopts a method of simply reducing the polishing speed to adjust the process parameters.

[0005] However, simply slowing down the polishing speed will directly aggravate the roughness of the tile glaze surface, destroy the delicate texture of the glaze, and result in a dry and less smooth feel to the finished product, which will greatly reduce the quality of the product. In addition, the low-speed polishing mode cannot achieve precise and stable control of gloss, resulting in large gloss deviations in single batches of products, poor consistency of finished products, and low yield.

[0006] Patent document CN 112028666 provides a 30-degree soft polishing process for slab surfaces, involving coarse polishing, medium polishing, fine polishing, and soft polishing. Coarse polishing uses four sets of 400-grit elastic modules, medium polishing uses eight sets of 1000-grit elastic modules, fine polishing uses five sets of 1500-grit elastic modules, and soft polishing uses five sets of 600-grit fiber modules. However, the single setting of each polishing module results in poor adaptability. During low-speed processing, uneven force is easily applied, leading to over- or under-polishing of certain areas of the glaze surface, resulting in defects such as color differences and uneven texture, severely affecting the appearance quality and stability of the soft-polished tiles. Therefore, this solution also requires coating the soft-polished slab with a 30-degree nano-coating liquid to correct the local roughness defects caused by the aforementioned polishing process and ensure the tile surface is compatible with the 25-35 degree soft light standard.

[0007] In summary, existing soft polishing processes suffer from numerous technical shortcomings, including low precision in gloss control, poor batch stability, and low yield, failing to meet the industry's demand for large-scale, standardized production of high-quality, highly consistent soft-polished tiles. Therefore, this invention proposes an improved soft polishing process to address the deficiencies of existing technologies and achieve the production goals of precise and controllable gloss and stable batch quality in soft-polished tiles. Summary of the Invention

[0008] This invention proposes a soft-polishing brick polishing process and soft-polished bricks to solve one or more technical problems existing in the prior art, and at least provides a beneficial option or creates conditions.

[0009] To solve the above-mentioned technical problems, a first aspect of the present invention provides a soft-polishing brick polishing process, comprising the steps of: The glazed tiles to be polished are sequentially processed through pre-polishing, middle polishing, and post-polishing at a speed of 25-30 pieces / minute to complete the surface polishing and obtain a soft-polished tile with a gloss of 25-35 degrees. The forward polishing includes at least one set of elastic modules, each set of elastic modules includes at least 6 elastic modules, and the abrasive fineness of the elastic modules is 200 mesh to 400 mesh; The intermediate polishing device includes at least 3 sets of elastic modules, each set of elastic modules includes at least 5 elastic modules, and the abrasive fineness of the elastic modules is 400 mesh-1200 mesh; The post-polishing process includes at least four sets of fiber modules, each set of fiber modules including at least six fiber modules, and the abrasive fineness of the fiber modules is 200 mesh to 1200 mesh.

[0010] The polishing scheme of this application extends the contact time between the brick surface and the polishing blocks by slowing down the polishing speed, creating conditions for subsequent fine grinding and fundamentally reducing the risk of scratches. Combined with the adjustment of the polishing block arrangement, the initial stage uses 200-400 grit blocks, compared to the conventional starting point of 150 grit, employing fine-grained elastic modules for basic grinding to achieve initial surface smoothness. The middle stage uses 600-1200 grit blocks for transitional grinding, connecting coarse and fine grinding. The final stage uses 200-1200 grit fiber blocks for fine polishing, improving surface smoothness and eliminating scratches. Furthermore, each stage has multiple modules, allowing for progressive grinding and avoiding localized over- or under-polishing. The polishing scheme of this invention is rationally combined, with a moderate speed, and the resulting finished product has a stable gloss level of 25-35 degrees with minimal deviation.

[0011] It should be noted that the polishing process of the present invention is applicable to existing common glazed tiles and has no special requirements on the glaze composition of the tiles. Preferably, the chemical composition of the glaze of the tile to be polished, by mass percentage, includes 45-50% silicon dioxide, 10-13% aluminum oxide, 0.1-0.3% ferric oxide, 0.01-0.03% titanium dioxide, 5-10% calcium oxide, 3-6% magnesium oxide, 1-2% potassium oxide, 1-5% sodium oxide, 3-5% zinc oxide, and 10-15% loss on ignition.

[0012] In some embodiments of the present invention, the pre-polishing includes three sets of elastic modules; the abrasive fineness of the first set of elastic modules is 200-250 mesh, the abrasive fineness of the second set of elastic modules is 300-350 mesh, and the abrasive fineness of the third set of elastic modules is 350-400 mesh. Coarse polishing is gradually performed, starting with 200 mesh, which is finer than conventional glazing (150 mesh), to reduce initial scratches, and then progressing group by group to eliminate coarse polishing marks.

[0013] In some embodiments of the present invention, during the pre-polishing process, the first group of elastic modules has 6-12 modules, the second group of elastic modules has 10-12 modules, and the third group of elastic modules has 10-16 modules. Typically, the second and third groups of elastic modules have a higher number of modules than the first group to better remove coarse abrasion scratches.

[0014] In some embodiments of the present invention, the intermediate polishing includes three sets of elastic modules; the abrasive fineness of the first set of elastic modules is 400-600 mesh, the abrasive fineness of the second set of elastic modules is 600-800 mesh, and the abrasive fineness of the third set of elastic modules is 1000-1200 mesh. Starting from 400 mesh and progressing to 1200 mesh, this serves as a transitional grinding step with the initial polishing, connecting coarse and fine grinding, and preparing for the subsequent fine polishing. Divided into three sets, the process can be progressively advanced: the first set uses 400-600 mesh for transitional grinding, the second set uses 600-800 mesh for fine grinding, and the third set uses 1000-1200 mesh for fine grinding, preparing for the final polishing.

[0015] In some embodiments of the present invention, during the intermediate polishing process, the first group of elastic modules has 6-20 modules, the second group of elastic modules has 6-12 modules, and the third group of elastic modules has 5-9 modules. The first group of elastic modules has more modules than the second and third groups to ensure proper connection and guarantee the removal of scratches from the rough grinding.

[0016] In some embodiments of the present invention, the post-polishing includes four sets of fiber modules; the first set of fiber modules has an abrasive fineness of 200-300 mesh, the second set has an abrasive fineness of 300-350 mesh, the third set has an abrasive fineness of 400-600 mesh, and the fourth set has an abrasive fineness of 800-1000 mesh. Post-polishing mainly involves fine polishing through the fiber modules to improve gloss and create a smooth, scratch-free surface. Starting from 200 mesh, the process is divided into four sets, with progressively higher levels of polishing yielding better results. Specifically, the first set (200-300 mesh) is for fine polishing, improving surface smoothness and reducing scratches; the second set (300-350 mesh) is for medium-fine polishing, further enhancing gloss and eliminating minor scratches; the third set (400-600 mesh) is for fine polishing, achieving a gloss close to the target and a smooth surface; and the fourth set (800-1000 mesh) is for final polishing, stabilizing gloss and ensuring a scratch-free surface. Preferably, the fourth group of 800-1000 mesh consists of 800 mesh modules and 1000 mesh modules to avoid scratches.

[0017] In some embodiments of the present invention, during the post-polishing process, the first group of fiber modules has 5-16 modules, the second group of fiber modules has 5-10 modules, the third group of fiber modules has 6-8 elastic modules, and the fourth group of fiber modules has 6-20 elastic modules. Preferably, the elastic modules of the fourth group of fiber modules consist of 6-8 800-mesh modules and 6-10 1000-mesh modules to avoid abrasion.

[0018] In some embodiments of the present invention, a wax polishing pad is also included to polish and enhance the gloss of the post-polished ceramic tile. The wax polishing pad contains the abrasive particles from the fiber module. This wax polishing process can further improve the filling of micropores on the tile surface and enhance the uniformity of gloss.

[0019] In some embodiments of the present invention, the number of waxing polishing pads is 4-6, which can improve the gloss by 8-10 degrees.

[0020] In a second aspect, the present invention also provides a soft-polished brick, which is prepared by the above-mentioned polishing process and has a gloss level that can be stabilized at 28-35 degrees.

[0021] Compared with the prior art, the present invention has the following advantages: The polishing process of this invention extends the contact time between the brick surface and the polishing blocks by slowing down the polishing speed. Combined with adjustments to the arrangement of the polishing blocks, the initial stage uses 200-400 grit (compared to the conventional starting point of 150 grit) and employs fine-grained elastic modules for basic grinding to achieve initial surface smoothness. The middle stage uses 600-1200 grit modules for transitional grinding, connecting coarse and fine grinding. The final stage uses 200-1200 grit fiber modules for fine polishing, improving surface smoothness and eliminating scratches. Furthermore, each stage consists of multiple modules, progressively advancing the grinding process to avoid over- or under-polishing in certain areas. The reasonable combination and moderate speed result in a stable gloss level on the finished product. Additionally, it can be combined with waxing and polishing treatment to further enhance the gloss of the soft-polished bricks.

[0022] The polishing process of this invention has a wide range of applications, stable polishing effect, small batch-to-batch variation, gloss can be kept stable at 30±5 degrees, the rate of excellent grades can be >90%, and the customer complaint rate is reduced. Attached Figure Description

[0023] Figure 1 This is a schematic diagram of the polishing effect of the soft-polished brick in Example 6; Figure 2 This is a schematic diagram of the polishing effect of the soft-polished brick in Comparative Example 1. Detailed Implementation

[0024] The present invention will now be described in detail with reference to embodiments to facilitate understanding of the invention by those skilled in the art. It is particularly important to note that the embodiments are merely illustrative of the invention and should not be construed as limiting the scope of protection of the invention. Non-essential improvements and adjustments made to the invention by those skilled in the art based on the above description should still fall within the scope of protection of the invention. Furthermore, all raw materials mentioned below, unless otherwise specified, are commercially available products; all process steps or methods not mentioned in detail are process steps or methods known to those skilled in the art.

[0025] Example 1 Referring to Table 1, this embodiment provides a polishing process for soft-polished tiles with a specification of 800×800mm, including the following steps: (1) Preparation of polished glazed tiles: The glazed tile to be polished consists of a body, a base glaze layer, a pattern layer and a surface glaze layer from bottom to top. The chemical composition of the surface glaze layer, by mass percentage, includes 49.65% silicon dioxide, 11.08% aluminum oxide, 0.2% ferric oxide, 0.02% titanium dioxide, 7.55% calcium oxide, 5.23% magnesium oxide, 1.54% potassium oxide, 3.57% sodium oxide, 4.54% zinc oxide, and 11.97% loss on ignition. After pressing the tile body, it is dried, then the base glaze is applied, the pattern layer is printed by inkjet printing, then the surface glaze is applied, and then it is sintered at 1190-1210℃ to obtain the polished glazed tile.

[0026] (2) Polishing: Set the conveying speed of the polishing machine to 27 pieces / minute, and pass the glazed tiles to be polished through the front polishing, middle polishing and rear polishing in sequence to complete the surface polishing.

[0027] The pre-polishing process includes three sets of elastic modules. The first set of elastic modules has an abrasive fineness of 240 mesh and no modules. The second set of elastic modules has an abrasive fineness of 320 mesh and no modules. The third set of elastic modules has an abrasive fineness of 400 mesh and 12 modules.

[0028] The medium-sized polishing device includes three sets of elastic modules. The first set of elastic modules has an abrasive fineness of 600 mesh and contains 20 modules; the second set of elastic modules has an abrasive fineness of 800 mesh and contains 11 modules; and the third set of elastic modules has an abrasive fineness of 1000 mesh and contains 5 modules.

[0029] The post-polishing system includes five fiber modules. The first group of fiber modules has an abrasive fineness of 240 mesh and consists of five modules; the second group of fiber modules has an abrasive fineness of 320 mesh and consists of six modules; the third group of fiber modules has an abrasive fineness of 400 mesh and consists of six modules; the fourth group of fiber modules has an abrasive fineness of 800 mesh and consists of seven modules; and the fifth group of fiber modules has an abrasive fineness of 1000 mesh and consists of eight modules.

[0030] (3) Post-processing: The polished bricks are transported to the post-processing process and pass through 6 waxing polishing discs in sequence for gloss enhancement. The waxing polishing discs contain abrasives with fiber modules of fineness of 800-1200 mesh, and then the soft-polished bricks are obtained.

[0031] Examples 2-6 Referring to Table 1, the difference from Example 1 is that the polishing module and the number of waxing polishing pads are different, but all other aspects are the same.

[0032] Example 7 Referring to Table 1, the difference from Example 6 is that the post-processing waxing polishing disc does not contain abrasive with a fineness of 800-1200 mesh fiber modules; all other aspects are the same.

[0033] Comparative Example 1 Referring to Table 1, the difference from Example 6 is the polishing speed, which is 45 pieces / minute, while the rest are the same.

[0034] Comparative Example 2 Referring to Table 1, the difference from Example 6 is that the module combination in the middle throwing stage is different, but the rest are the same.

[0035] Table 1 shows the statistical table of parameters for each embodiment and comparative example.

[0036] Table 1. Statistics of Examples and Comparative Examples

[0037] Performance testing Using the module combinations and polishing speeds in the above embodiments and comparative examples, soft-polished tiles of the same specifications were produced, with 100 tiles produced for each. The yield rate and gloss data of the high-quality tiles were calculated, and the results are shown in Table 2.

[0038] The standard for high-quality products is that there are no missed polishing, abrasions, or polishing marks, and the gloss level is between 25 and 35 degrees.

[0039] Table 2 Test results for each embodiment and comparative example

[0040] As shown in Table 2, the polishing effect in Example 6 is the best. Compared with the rapid polishing in Comparative Example 1, the yield and gloss are significantly improved. Figure 1 The image shows a backlit reflection and a front view of the superior soft-polished brick obtained in Example 6. Figure 2The image provided shows the light reflection of the sample that was missed during polishing in Comparative Example 1. It reveals numerous instances of missed polishing and scratches, leading to a significant decrease in the yield rate, gloss uniformity, and average gloss. A comparison of the results from Examples 1, 2, and 6 shows that in the pre-polishing stage, a finer initial polishing particle size is not necessarily better. It is necessary to start with a suitable, relatively large particle size to avoid missed polishing. This is likely because some coarse particles exist in the glaze. If the initial polishing particle size is too fine, the removal of large particles will be ineffective, easily leading to missed polishing, which in turn affects gloss and yield. Comparing Comparative Example 2 and Example 6, it is shown that in the intermediate polishing process, the 400-1200 mesh module must be divided into at least three groups: 400-600 mesh, 600-800 mesh, and 1000-1200 mesh. All three are indispensable, serving as a transition between coarse and fine polishing. The intermediate polishing stage needs to be carried out step by step; the lack of corresponding grouping easily leads to missed polishing, thus affecting the yield rate and gloss. Data from Examples 4 and 5 show that the fiber module combination in the post-polishing process also affects polishing defects. The first group of fine polishing modules has a small number of modules, which makes it easy to produce polishing marks. The fourth group of final fine polishing modules has a small number of modules, lacking 1000-grit modules, which makes it easy to produce scratches, reduce the yield of high-quality products, and result in insufficient gloss.

[0041] Compared with Examples 3, 4, 5 and 6, it is shown that adding a waxing and polishing post-processing step can improve gloss and uniformity, especially uniformity. Moreover, compared with the ordinary waxing and polishing in Example 7, the waxing and polishing pad containing fiber polishing module used in the embodiments of the present invention has a better effect on improving gloss.

[0042] For those skilled in the art, several simple deductions or substitutions can be made without departing from the inventive concept, without requiring creative effort. Therefore, any simple improvements made to this invention by those skilled in the art based on the disclosure of this invention should be within the scope of protection of this invention. The above embodiments are preferred embodiments of this invention, and all processes similar to this invention and equivalent changes should fall within the scope of protection of this invention.

Claims

1. A soft-polishing brick polishing process, characterized in that, Including the following steps: Polish the glazed tiles to be polished by passing them through the front polishing, middle polishing and rear polishing processes in sequence at a speed of 25-30 pieces / minute to complete the surface polishing; The forward polishing includes at least one set of elastic modules, each set of elastic modules includes at least 6 elastic modules, and the abrasive fineness of the elastic modules is 200 mesh to 400 mesh; The intermediate polishing device includes at least 3 sets of elastic modules, each set of elastic modules includes at least 5 elastic modules, and the abrasive fineness of the elastic modules is 400 mesh-1200 mesh; The post-polishing process includes at least four sets of fiber modules, each set of fiber modules including at least six fiber modules, and the abrasive fineness of the fiber modules is 200 mesh to 1200 mesh.

2. The polishing process according to claim 1, characterized in that, The forward polishing includes three sets of elastic modules; the abrasive fineness of the first set of elastic modules is 200-250 mesh, the abrasive fineness of the second set of elastic modules is 300-350 mesh, and the abrasive fineness of the third set of elastic modules is 350-400 mesh.

3. The polishing process according to claim 2, characterized in that, In the forward throw, the first group of elastic modules has 6-12 modules, the second group of elastic modules has 10-12 modules, and the third group of elastic modules has 10-16 modules.

4. The polishing process according to claim 1, characterized in that, The intermediate polishing unit includes three sets of elastic modules; the abrasive fineness of the first set of elastic modules is 400-600 mesh, the abrasive fineness of the second set of elastic modules is 600-800 mesh, and the abrasive fineness of the third set of elastic modules is 1000-1200 mesh.

5. The polishing process according to claim 4, characterized in that, In the aforementioned intermediate throw, the first group of elastic modules has 6-20 modules, the second group of elastic modules has 6-12 modules, and the third group of elastic modules has 5-9 modules.

6. The polishing process according to claim 1, characterized in that, The post-polishing process includes four sets of fiber modules; the abrasive fineness of the first set of fiber modules is 200-300 mesh, the abrasive fineness of the second set of fiber modules is 300-350 mesh, the abrasive fineness of the third set of fiber modules is 400-600 mesh, and the abrasive fineness of the fourth set of fiber modules is 800-1000 mesh.

7. The polishing process according to claim 6, characterized in that, In the post-thrown fiber module, the first group of fiber modules has 5-16 modules, the second group of fiber modules has 5-10 modules, the third group of fiber modules has 6-8 elastic modules, and the fourth group of fiber modules has 6-20 elastic modules.

8. The polishing process according to any one of claims 1-7, characterized in that, It also includes using a wax polishing pad to polish and enhance the gloss of the post-polished tiles, wherein the wax polishing pad contains the abrasive from the fiber module.

9. The polishing process according to claim 8, characterized in that, The number of waxing and polishing pads is 4-6.

10. A type of soft-polished brick, characterized in that, It is prepared using the polishing process described in any one of claims 1-9.