Adjusting device for a profilometer probe and profilometer

Abstract

This invention provides an adjustment device for a profilometer probe and a profilometer. The adjustment device for the profilometer probe includes: a bracket, a base, and two crossed roller assemblies. Along a first direction, first guide grooves are respectively formed on opposite surfaces of the two guide ends of the bracket, and first deformation grooves are respectively formed on both sides of the first guide grooves along a second direction. Along the first direction, second guide grooves are respectively formed on opposite sides of the base, and second deformation grooves are respectively formed on both sides of the second guide grooves along the second direction. Adjacent sets of first and second guide grooves respectively enclose and form crossed roller guides. The second direction has a vertical component. The probe is fixed to the bottom surface of the base away from the bracket. The crossed roller assemblies are disposed within the crossed roller guides and are rolledly connected to the inner walls of the first and second guide grooves, respectively. This invention can improve the adjustment accuracy of the probe adjustment device.

Description

Technical Field

[0001] This invention relates to the field of semiconductor equipment technology, and more specifically to an adjustment device for a profilometer probe and a profilometer. Background Technology

[0002] A profilometer is a precision measuring device whose core function is to acquire the two-dimensional profile and three-dimensional morphology of a workpiece surface. It is used to quantitatively characterize geometric parameters such as surface roughness, step height, linewidth, curvature, and morphological deviations. It is one of the core inspection devices in fields such as precision optical measurement, ultra-precision machining inspection, and semiconductor device inspection. In high-end scenarios such as semiconductor device inspection, non-contact, high-precision optical profilometers are primarily used to avoid scratching fragile surfaces such as wafers, photoresist, and micro / nano structures.

[0003] In high-precision optical profilometers (such as laser interferometric profilometers and white light interferometric profilometers), the interferometer probe is its core measuring device, responsible for outputting nanometer-level height measurement signals. The interferometer probe requires regular maintenance and high-precision horizontal positioning to maintain measurement accuracy and stability. Therefore, the probe adjustment mechanism is a critical component of the interferometer probe structure, directly determining the profilometer's measurement accuracy. However, existing probe adjustment mechanisms lack sufficient precision.

[0004] It should be noted that the information disclosed in the background section above is only used to enhance the understanding of the background of the present invention, and therefore may include information that does not constitute prior art known to those skilled in the art. Summary of the Invention

[0005] In view of this, the present invention provides an adjustment device for a profilometer probe and a profilometer, so as to at least solve the technical problem of insufficient accuracy of the probe adjustment device in the prior art.

[0006] In one aspect, the present invention provides an adjustment device for a profilometer probe, comprising: The bracket has first guide grooves formed on the opposite surfaces of its two guide ends along a first direction, and first deformation grooves formed on both sides of the first guide grooves along a second direction. The base has second guide rail grooves on two opposite sides along the first direction, and second deformation grooves are formed on both sides of the second guide rail grooves along the second direction. Two adjacent sets of first guide rail grooves and second guide rail grooves are respectively enclosed to form cross roller guide rails. The second direction has a vertical component. The probe is fixed to the bottom surface of the base away from the support. Two cross roller assemblies are disposed within the cross roller guide rails and are respectively roll-connected to the inner walls of the first guide rail groove and the second guide rail groove.

[0007] On the other hand, the present invention also provides a profilometer, including the aforementioned adjustment device for the profilometer probe.

[0008] Compared with the prior art, the profilometer probe adjustment device and profilometer provided by the present invention achieve at least the following beneficial effects: The present invention provides an adjustment device for a profilometer probe and a profilometer. The adjustment device for the profilometer probe includes: a bracket, a base, and two crossed roller assemblies. Along a first direction, first guide grooves are respectively formed on opposite surfaces of the two guide ends of the bracket, and first deformation grooves are respectively formed on both sides of the first guide grooves along a second direction. Along the first direction, second guide grooves are respectively formed on opposite sides of the base, and second deformation grooves are respectively formed on both sides of the second guide grooves along the second direction. Two adjacent sets of first and second guide grooves respectively enclose and form crossed roller guides. The second direction has a vertical component. The probe is fixed to the bottom surface of the base away from the bracket. The crossed roller assemblies are disposed within the crossed roller guides and are rolledly connected to the inner walls of the first and second guide grooves respectively. This invention achieves a high degree of integration and compactness of the cross roller guide rail through the integrated design of the first guide rail groove and the bracket, and the second guide rail groove and the base, perfectly adapting to the narrow installation scenario of the profilometer probe. The first and second deformation grooves, symmetrically arranged along the second direction on both sides of the first and second guide rail grooves, endow the cross roller guide rail with controllable vertical flexible deformation capability. This allows the probe to automatically form a movement gap between the contact surfaces of the bracket and the base using the probe's gravity, eliminating the interference of surface contact sliding friction on positioning accuracy from the structural root. This solves common problems in existing rigid adjustment mechanisms, such as low-speed crawling and positioning hysteresis deviation caused by friction. Combined with the rolling guide form of the cross roller assembly, it ensures both the smooth movement and high-precision guidance of the probe along the first direction, while retaining the basic load-bearing rigidity of the cross roller guide rail. It achieves high-precision, low-friction horizontal adjustment within a compact volume, providing a reliable guiding structure foundation for stable probe positioning and subsequent locking efficiency. Attached Figure Description

[0009] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a schematic diagram of the structure of an adjustment device for a profilometer probe provided in an embodiment of the present invention.

[0011] Figure 2 for Figure 1 A schematic diagram of the adjustment device for the probe of the profilometer at another angle.

[0012] Figure 3 This is a schematic diagram of a support structure provided in an embodiment of the present invention.

[0013] Figure 4 This is a schematic diagram of the structure of a base provided in an embodiment of the present invention.

[0014] Figure 5 This is a schematic diagram of the connection structure of a bracket, a base, and a cross roller assembly provided in an embodiment of the present invention.

[0015] Figure 6 This is a schematic diagram of the structure of a cross roller assembly provided in an embodiment of the present invention.

[0016] Figure 7 An exploded view of an adjustment device for a profilometer probe provided in an embodiment of the present invention.

[0017] Figure 8 This is a schematic diagram of a tilt adjustment component provided in an embodiment of the present invention.

[0018] Figure 9 for Figure 7 A cross-sectional schematic diagram of the tilt adjustment component.

[0019] Figure label: 100. Bracket; 110. Guide end; 111. First guide rail groove; 112. First deformation groove; 113. First stress relief groove; 114. Horizontal end face; 115. Vertical end face; 116. Guide hole; 117. Electro-permanent magnet chuck; 200, base; 210, second guide rail groove; 220, second deformation groove; 230, second stress relief groove; 240, guide boss; 250, first through hole; 260, U-shaped hole; 270, connecting part; 300. Crossed roller assembly; 310. Cylindrical roller; 320. Cage; 400. Magnetic shaft motor; 410. Motor body; 420. Output end; 500, tilt adjustment assembly; 510, threaded hole; 520, adjusting screw; 530, arc-shaped groove; 540, hemispherical support; 550, annular groove; 560, notch; P, probe; X, first direction; Y, second direction. Detailed Implementation

[0020] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that the invention will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore repeated descriptions of them will be omitted.

[0021] In the description of this invention, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. In the description of this invention, the terms "upper," "lower," etc., indicate orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings. These are merely for ease of description and do not indicate or imply that the referred device or element must have a specific orientation, or be constructed and operated in a specific orientation; therefore, they should not be construed as limiting the invention. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified. "A and / or B" includes the following three combinations: only A, only B, and a combination of A and B. In this invention, the term "exemplary" is used to mean "used as an example, illustration, or description." Any embodiment described as "exemplary" in this invention is not necessarily to be construed as being more preferred or advantageous than other embodiments.

[0022] It should be noted that, unless otherwise specified, the embodiments of the present invention and the features in different embodiments can be combined with each other.

[0023] On one hand, such as Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, an embodiment of the present invention provides an adjustment device for a profilometer probe P, which includes a bracket 100, a base 200, and two cross roller assemblies 300.

[0024] Along the first direction X, first guide rail grooves 111 are respectively formed on the opposite surfaces of the two guide ends 110 of the bracket 100, and first deformation grooves 112 are respectively formed on both sides of the first guide rail grooves 111 along the second direction Y. Specifically, the bracket 100, as the fixed bearing base of the adjustment device, may include side walls and tops for fixing the bracket 100 to other structures. The bracket 100 has two guide ends 110 extending along the first direction X at its bottom, and first guide rail grooves 111 are respectively machined on the opposite surfaces of the two guide ends 110. Unlike the conventional solution of using independent guide rails for assembly and fixation in the prior art, the first guide rail grooves 111 are directly formed on the guide ends 110 of the bracket 100, which is an integrated guide rail structure. This can eliminate the form and position errors and assembly gaps caused by independent guide rail assembly, and at the same time significantly reduce the overall radial volume of the guide structure, adapting to the extremely limited installation space inside the profilometer probe P. On each of the first guide rail grooves 111, a first deformation groove 112 is provided on both sides along the second direction Y. The second direction Y has a vertical component, that is, the first deformation grooves 112 are symmetrically distributed on the upper and lower sides of the first guide rail groove 111. This type of deformation groove is a narrow slit-type slotted structure. By removing the local matrix material around the first guide rail groove 111, the overall rigidity of the guide rail area is broken, so that the local area where the first guide rail groove 111 is located has controllable flexible deformation capability along the second direction Y. It can produce a small amount of elastic deformation under vertical load without affecting the guiding accuracy in the first direction X.

[0025] Along the first direction X, second guide rail grooves 210 are respectively formed on two opposite sides of the base 200, and second deformation grooves 220 are respectively formed on both sides of the second guide rail grooves 210 along the second direction Y. Two adjacent sets of first guide rail grooves 111 and second guide rail grooves 210 respectively enclose and form a cross roller guide rail. The second direction Y has a vertical component. The probe P is fixed to the bottom surface of the base 200 away from the bracket 100. Specifically, the base 200, as the direct bearing and motion execution component of the probe P, has second guide rail grooves 210 respectively processed on two opposite sides extending along the first direction X. The second guide rail grooves 210 are also processed into the body of the base 200 using an integral molding process, and are arranged one-to-one with the first guide rail grooves 111 on the bracket 100. An adjacent set of first guide rail grooves 111 and second guide rail grooves 210 together enclose and form a closed raceway space of the cross roller guide rail. Correspondingly, a second deformation groove 220 is provided on both sides of each second guide rail groove 210 along the second direction Y, which corresponds to and cooperates with the first deformation groove 112, so that the raceway base on both sides of the crossed roller guide rail has a flexible deformation margin along the second direction Y. The probe P is fixed to the bottom surface of the base 200 away from the bracket 100 and is installed in a hanging manner. The weight of the probe P itself will form a continuous vertical load along the second direction Y, which acts on the base 200 and the crossed roller guide rail, causing the second guide rail groove 210 to produce a slight downward displacement along the second direction Y. This causes the remaining contact surfaces between the bracket 100 and the base 200, except for the rolling contact area of ​​the guide rail, to naturally separate and form a stable gap. Structurally, this avoids large-area surface contact and sliding friction between the base 200 and the bracket 100 during the movement of the base 200 along the first direction X.

[0026] The crossed roller assembly 300 is disposed within the crossed roller guide rail and is roll-connected to the inner walls of the first guide rail groove 111 and the second guide rail groove 210, respectively. Specifically, the two sets of crossed roller assemblies 300 are respectively housed within the crossed roller guide rails formed by the two sets of assemblies. The crossed roller assembly 300 simultaneously forms a roll-connection with the inner walls of the first guide rail groove 111 and the second guide rail groove 210, replacing the sliding friction of the traditional sliding guide rail with pure rolling friction. This significantly reduces frictional resistance and minimizes resistance fluctuations throughout the entire process. At the same time, the cross arrangement of the rollers in the crossed roller assembly 300 can withstand horizontal and vertical loads and overturning moments in multiple directions, ensuring the straightness and guiding stability of the base 200 as it moves along the first direction X.

[0027] The structure described in this embodiment, through the integrated design of the first guide rail groove 111 and the bracket 100, and the second guide rail groove 210 and the base 200, achieves a high degree of integration and compactness of the cross roller guide, perfectly adapting to the confined installation scenario of the profilometer probe P; through the first deformation groove 112 and the second deformation groove 220 symmetrically arranged on both sides of the first guide rail groove 111 and the second guide rail groove 210 along the second direction Y, the cross roller guide is endowed with controllable vertical flexible deformation capability, which can automatically form a movement gap between the mating surfaces of the bracket 100 and the base 200 by means of the gravity of the probe P, from a structural perspective... This fundamentally eliminates the interference of surface contact sliding friction on positioning accuracy, solves common problems in existing rigid adjustment mechanisms such as low-speed crawling and positioning hysteresis deviation caused by friction, and improves the adjustment accuracy of the probe P's adjustment device. Combined with the rolling guide form of the cross roller assembly 300, it ensures both the smoothness of the probe P's movement and high-precision guidance along the first direction X, while retaining the basic load-bearing rigidity of the cross roller guide rail. It achieves high-precision, low-friction horizontal adjustment function in a compact volume, providing a reliable guiding structure foundation for the stable positioning of the probe P and subsequent locking efficiency improvement.

[0028] like Figure 5 , Figure 6 and Figure 7As shown, in some embodiments, the crossed roller assembly 300 includes cylindrical rollers 310 and a cage 320. The cylindrical rollers 310 are arranged sequentially at adjacent 90° orthogonal angles and mounted on the cage 320. The cylindrical rollers 310 are in rolling connection with the inner walls of the first guide groove 111 and the second guide groove 210. Specifically, the cylindrical rollers 310 are high-precision cylindrical rolling elements, and their outer cylindrical surfaces are processed by ultra-precision grinding. The diameter, length, and cylindricity tolerances of all rollers are strictly controlled within the micrometer range to ensure high consistency of roller dimensions and avoid uneven load and motion jamming caused by individual size differences. The cylindrical rollers 310 are arranged sequentially at adjacent 90° orthogonal angles and mounted on the cage 320, that is, the central axes of any two adjacent cylindrical rollers 310 are arranged perpendicularly at 90° and staggered. The axis of some rollers extends vertically and mainly bears vertical loads, while the axis of other rollers extends horizontally and mainly bears lateral loads. This arrangement allows a single set of crossed roller assemblies 300 to simultaneously withstand loads in both vertical and horizontal orthogonal directions, as well as overturning moments around the first direction X, achieving multi-directional stable guidance without the need for additional lateral limiting structures. The cage 320 is a strip-shaped load-bearing structure extending along the first direction X, with equally spaced receiving and limiting positions corresponding to the cylindrical rollers 310. Each cylindrical roller 310 is independently limited within its corresponding receiving position, ensuring that all rollers maintain a 90° orthogonal arrangement, preventing tilting, shifting, or collisions during start-up, stop-motion, and position reversal. It also maintains a uniform spacing between rollers, avoiding wear debris and resistance fluctuations caused by direct contact friction, and prevents rollers from falling out of the guide rail raceway, thus improving the motion reliability and long-term operational stability of the assembly. The cylindrical roller 310 is in rolling contact with the inner walls of the first guide groove 111 and the second guide groove 210. That is, the outer cylindrical surface of the cylindrical roller 310 simultaneously forms a line contact with the inner walls of the raceways of the two guide grooves, converting the relative motion between the bracket 100 and the base 200 into the pure rolling motion of the cylindrical roller 310 along the raceway, replacing the traditional surface contact sliding friction with rolling friction. This embodiment, through the aforementioned structure, achieves high-rigidity, multi-directional load-bearing precision guidance within an extremely compact profilometer space. The resistance of pure rolling friction is smaller and fluctuates more smoothly compared to the sliding friction resistance of existing sliding tracks. Combined with the design of deformation grooves to eliminate surface contact friction between the support 100 and the base 200, the total frictional resistance of the base 200 moving along the first direction X can be further reduced, avoiding crawling and stagnation phenomena during low-speed fine-tuning and point reversal, and improving the accuracy and smoothness of the probe P's horizontal positioning. The stabilizing and limiting function of the cage 320 ensures the consistency of the roller posture and arrangement during long-term reciprocating motion, reducing wear debris and lubricant evaporation, and adapting to the cleanliness requirements and long-term accuracy stability needs of semiconductor precision measurement scenarios.

[0029] like Figure 5 , Figure 6 and Figure 7 As shown, in some embodiments, the first guide groove 111 and the second guide groove 210 are 90° V-shaped raceways, and the cross roller guide rail formed by the first guide groove 111 and the second guide groove 210 is a square raceway. Specifically, both the first guide groove 111 and the second guide groove 210 are set as 90° V-shaped raceways, which are formed by the intersection of two planar raceway surfaces at a 90° angle. The two raceway surfaces correspond to the two types of cylindrical rollers 310 orthogonally arranged in the cross roller assembly 300, and the axes of the two types of cylindrical rollers 310 are perpendicular to each other and form a 45° angle with the vertical direction. The 90° V-shaped raceway design of the first guide rail groove 111 and the second guide rail groove 210 perfectly matches the 90° orthogonal arrangement of the adjacent cylindrical rollers 310. This ensures that the outer cylindrical surface of each cylindrical roller 310 forms a uniform and complete line contact with the corresponding raceway surface, avoiding contact line offset, off-center load, or local point contact problems caused by raceway angle mismatch. This effectively reduces the risk of contact stress concentration and extends the service life of the raceway and rollers. The cross roller guide formed by the two sets of relatively arranged 90° V-shaped raceways (i.e., the first guide rail groove 111 and the second guide rail groove 210) is a square raceway, meaning that the internal cross-sectional profile of the raceway is a standard square, with the four raceway surfaces corresponding to the four sides of the square. The orthogonally arranged cylindrical rollers 310 reciprocate along the first direction X within the closed square raceway. The raceway's limitation and load-bearing capacity for the rollers are highly consistent in the two orthogonal directions, allowing for simultaneous constraint of the horizontal and vertical degrees of freedom without the need for additional lateral limiting structures. Furthermore, since the first guide rail groove 111 and the second guide rail groove 210 are both integrally machined on the bracket 100 and the base 200, the 90° V-shaped raceway can rely on a unified machining benchmark to ensure the angular accuracy of the included angle, avoiding the angle deviation, centering error and assembly gap caused by the assembly of independent guide rails. This embodiment can achieve symmetrical and balanced multi-directional load-bearing capacity in the extremely small installation space of the profilometer. The uniform line contact state effectively improves the overall rigidity and anti-overturning ability of the guide structure, which helps to improve the inherent mode and vibration resistance of the probe P adjustment mechanism. The symmetrical square raceway structure also ensures that the contact state between the roller and the raceway remains stable during the vertical flexible deformation of the guide rail, and will not cause jamming or off-center loading due to slight vertical displacement. This ensures the smoothness and positioning accuracy of the probe P moving along the first direction X. At the same time, the standardized 90° V-shaped raceway and square raceway are easier to ensure angular accuracy through ultra-precision machining processes, reducing the difficulty of machining and assembly, and perfectly adapting to the compact and high-precision design requirements of the profilometer probe P.

[0030] like Figure 3 , Figure 4 and Figure 5As shown, in some embodiments, a first stress relief groove 113 and a second stress relief groove 230 are respectively formed at the V-shaped tips of the first guide rail groove 111 and the second guide rail groove 210. The first stress relief groove 113 and the second stress relief groove 230 at least partially accommodate the cross roller assembly 300. Specifically, a first stress relief groove 113 and a second stress relief groove 230 extending along the first direction X are respectively formed at the V-shaped tips of the first guide rail groove 111 and the second guide rail groove 210. This type of stress relief groove is a long groove structure that runs through the entire length of the raceway extension direction and is precisely positioned at the intersection apex of the two raceway surfaces of the V-shaped raceway, that is, at the four inner corners of the square raceway enclosed by the two sets of guide rail grooves. The cross-sectional dimensions of the first stress relief groove 113 and the second stress relief groove 230 are larger than the theoretical sharp corner area of ​​the V-shaped tip. This causes the two raceway surfaces, which originally converged at a single point, to terminate at the two sides of the groove body. From a manufacturing process perspective, this eliminates the processing blind spot of the V-shaped sharp corner in the ultra-precision grinding process. The ultra-precision grinding of the raceway surface can be completely finished at the edge of the groove body, avoiding problems such as machining residue, uneven surface quality, and grinding stress accumulation at the sharp corner. This helps to ensure the overall shape and position accuracy and surface roughness consistency of the raceway surface. From a structural mechanics perspective, the V-shaped sharp corner is the area with the highest stress concentration coefficient when the raceway is under load. Under alternating loads and long-term reciprocating motion conditions, it is prone to fatigue cracks and raceway precision failure. The stress relief groove can interrupt the stress transmission path at the sharp corner, dispersing the stress originally concentrated at a single point to the base structure around the groove body, significantly reducing the local maximum stress value, and effectively improving the fatigue strength and long-term load-bearing stability of the raceway structure. The first stress relief groove 113 and the second stress relief groove 230 at least partially accommodate the crossed roller assembly 300. Specifically, the end edge region of the cylindrical roller 310 in the crossed roller assembly 300 can extend into the internal space of the first stress relief groove 113 and the second stress relief groove 230. During the rolling process along the first direction X, the end face edge of the cylindrical roller 310 will not rigidly scrape or interfere with the V-shaped tip. Especially when the guide rail area undergoes vertical flexible deformation due to the weight of the probe P, the cylindrical roller 310 will experience a slight positional shift relative to the raceway. The additional clearance space provided by the first stress relief groove 113 and the second stress relief groove 230 effectively avoids the risk of roller end jamming and scratching the raceway working surface. Simultaneously, the internal accommodating space of the first stress relief groove 113 and the second stress relief groove 230 can also accommodate trace amounts of wear debris and residual lubricating medium generated during rolling, preventing contaminants from accumulating on the raceway working surface and interfering with the rolling contact state of the cylindrical roller 310, thus maintaining the stability and consistency of rolling friction resistance.

[0031] In some embodiments, the surface roughness Ra of the first guide rail groove 111 and the second guide rail groove 210 satisfies Ra ≤ 0.2 μm. It should be noted that the surface roughness Ra is specifically the arithmetic mean deviation of the profile, which refers to the arithmetic mean of the absolute values ​​of the height deviations of each point on the measured surface profile line relative to the reference centerline within a specified sampling length. A surface roughness Ra ≤ 0.2 μm means that the average microscopic height deviation of the guide rail raceway surface does not exceed 0.2 micrometers, and this index falls under the surface quality control requirements of ultra-precision machining. Specifically, the surface roughness Ra of the first guide rail groove 111 and the second guide rail groove 210 can be any value among 0.2 μm, 0.15 μm, 0.1 μm, 0.05 μm, or 0.1 μm, but is not limited to these values. To achieve this accuracy index, the raceway surfaces of the first guide rail groove 111 and the second guide rail groove 210 need to be processed using a multi-stage iterative ultra-precision machining process to form a continuous, uniform, high-quality working surface. The surface roughness of the first guide groove 111 and the second guide groove 210 matches the high-precision surface of the cylindrical roller 310 in the crossed roller assembly 300. Together, they form a high-precision rolling friction pair, ensuring uniform and stable contact. This embodiment can effectively reduce the friction coefficient of the rolling friction pair, reduce the fluctuation range of frictional resistance, significantly improve the smoothness of motion under low-speed conditions, avoid crawling and stagnation during the fine adjustment of the probe P, and effectively improve the positioning accuracy and repeatability of the probe P along the first direction X. The flat raceway working surface can increase the actual effective contact area between the cylindrical roller 310 and the guide groove, reduce the contact stress per unit area, and improve the contact stiffness of the guide structure, thereby improving the overall natural mode and vibration resistance of the probe P adjustment mechanism and reducing the negative impact of external vibration and its own motion disturbance on the accuracy of interferometric measurement. At the same time, the significant reduction of microscopic peaks and valleys can reduce the wear rate of the raceway and rollers, reduce the amount of wear debris, extend the service life and accuracy maintenance cycle of the guide mechanism, and reduce the impact of wear debris and contaminants on the clean measurement environment of semiconductors.

[0032] In some embodiments, the width of both the first deformation groove 112 and the second deformation groove 220 is in the range of 0.3 to 0.8 mm. Specifically, the width of the first deformation groove 112 and the second deformation groove 220 can be any value among 0.3 mm, 0.4 mm, 0.5 mm, 0.6 mm, 0.7 mm, or 0.8 mm, but is not limited to these values. From the perspective of structural mechanics, the width of the first deformation groove 112 and the second deformation groove 220 directly determines the amount of material removed from the substrate around the first guide rail groove 111 and the second guide rail groove 210 and the stiffness characteristics of the flexible support unit. When the groove width is in the range of 0.3 to 0.8 mm, the thickness of the connecting substrate around the first guide rail groove 111 and the second guide rail groove 210 is within a reasonable design range. This can provide sufficient vertical deformation through the elastic deformation of the material to meet the gap requirements required for the separation of the contact surface between the bracket 100 and the base 200 under the action of the probe P's own weight. At the same time, it will not cause a significant decrease in the horizontal bearing stiffness and anti-overturning stiffness of the guide rail area due to excessive material removal. This can stably maintain the guiding accuracy and structural bearing stability of the cross roller guide rail. Since the first deformation groove 112 and the second deformation groove 220 are symmetrically distributed on both sides of the first guide groove 111 and the second guide groove 210 and adopt a uniform width range, the flexible stiffness of the upper and lower sides of the first guide groove 111 and the second guide groove 210 is symmetrical and consistent, so that the vertical deformation under the self-weight of the probe P is uniform and stable. This avoids problems such as the first guide groove 111 and the second guide groove 210 tilting and the cylindrical roller 310 being unbalanced due to the uneven stiffness of the first deformation groove 112 and the second deformation groove 220 on both sides, and the cross roller assembly 300 maintaining a good contact state with the working surface of the guide groove.

[0033] like Figure 3 , Figure 4 and Figure 7As shown, in some embodiments, the guide end 110 includes a horizontal end face 114 and a vertical end face 115 connected to each other; a first guide groove 111 is disposed on the vertical end face 115; a guide hole 116 is provided on the horizontal end face 114 along the first direction X; a guide boss 240 is provided on the top surface of the base 200 near the bracket 100; the guide boss 240 slides within the guide hole 116 during the sliding process of the base 200 relative to the bracket 100. Specifically, the guide end 110 is configured to include a horizontal end face 114 and a vertical end face 115 connected to each other. The horizontal end face 114 and the vertical end face 115 are integrally formed by the bracket 100 body, and the two are in a vertical spatial position relationship, which ensures the perpendicularity and positional accuracy between the end faces and avoids the fitting gap and positional deviation caused by separate assembly. The vertical end faces 115 of the two guide ends 110 are arranged opposite each other, forming a lateral mounting reference for the movement of the base 200. The first guide rail groove 111 is set on the vertical end face 115, so that the crossed roller guide rail is formed in the lateral vertical plane, undertaking the functions of guidance and lateral load bearing. Each of the horizontal end faces 114 of the two guide ends 110 has a guide hole 116 extending along the first direction X. The guide hole 116 is an elongated hole structure extending along the entire length of the first direction X. Its extension axis is strictly parallel to the extension direction of the first guide rail groove 111. During the processing, it can share the same clamping reference with the first guide rail groove 111 to ensure the coaxiality of their movement directions and avoid movement interference and guide coupling deviation. The inner wall of the guide hole 116 is precision machined to ensure the dimensional accuracy and surface quality of the mating surface. Two guide protrusions 240 are symmetrically arranged on both sides of the top surface of the base 200 near the support 100, corresponding one-to-one with two guide holes 116. The guide protrusion 240 is a strip-shaped protrusion extending along the first direction X. Its cross-sectional dimensions are precisely matched with the cross-sectional dimensions of the guide hole 116, and the two form a small gap precision sliding fit. The guide protrusion 240 is embedded in the corresponding guide hole 116. During the entire process of the base 200 moving relative to the support 100 along the first direction X, the guide protrusion 240 is always accommodated in the guide hole 116 and slides synchronously along the extension direction of the hole. Together with the two sets of lateral cross roller guides, it forms a spatial double guide constraint system.This embodiment can effectively distribute the vertical load and overturning moment borne by the crossed roller guide without increasing the size of the mechanism, reducing the degree of off-center wear between the cylindrical rollers 310 and the raceway, extending the service life and accuracy maintenance cycle of the guide pair, and restraining the vertical movement and attitude deflection of the base 200 during its movement, improving the straightness and attitude stability of the base 200 along the first direction X, and ensuring the accuracy of the probe P positioning; the one-piece machined guide hole 116 and guide boss 240 do not require additional guide components, thus maintaining the adjustment The compact design of the mechanism avoids the negative impact of assembly errors on the guiding accuracy. The symmetrical arrangement on both sides also makes the guiding load distribution more uniform, avoiding the torsional load problem caused by unilateral guidance. When the guide rail area is subjected to vertical flexible deformation due to the weight of the probe P, the guide boss 240 can generate a small vertical displacement synchronously with the base 200 and always maintain the matching constraint with the guide hole 116. It will not lose its guiding and limiting function due to the formation of vertical gaps, and maintains the stability of motion guidance throughout the process, further ensuring the smoothness of the horizontal adjustment of the probe P and the reliability of its positioning.

[0034] like Figure 7As shown, in some embodiments, the bracket 100 further includes an electro-permanent magnet chuck 117; the electro-permanent magnet chuck 117 is fixed to the upper surface of the horizontal end face 114; when the electro-permanent magnet chuck 117 is de-energized, the electro-permanent magnet chuck 117 magnetically attracts the guide boss 240. Specifically, the electro-permanent magnet chuck 117 is configured on the bracket 100 as a locking actuator. The electro-permanent magnet chuck 117 adopts a magnetic circuit structure in which a permanent magnet is coupled to an excitation coil, and integrates a permanent magnet unit that provides steady-state attraction force and an excitation coil for switching the magnetic circuit state. Unlike conventional electromagnets that rely on continuous power to maintain magnetic force, the electro-permanent magnet chuck 117 in this embodiment only receives a short pulse current at the moment of switching the magnetic attraction state. During the normal locking phase, continuous power supply is not required, thus eliminating the heat source that generates continuous heat in principle. The electro-permanent magnet chuck 117 is fixed to the upper surface of the horizontal end face 114. Its adsorption working surface corresponds one-to-one with the guide hole 116 opened below the horizontal end face 114. Directly below is the top surface of the guide boss 240 embedded in the guide hole 116. During installation, it is strictly ensured that the adsorption working surface of the electro-permanent magnet chuck 117 is parallel to the top surface of the guide boss 240, so that the adsorption force during locking acts perpendicularly to the guide boss 240 in the second direction Y, without generating a horizontal component force. When the electro-permanent magnet chuck 117 is in the de-energized state, the main magnetic circuit of the internal permanent magnet unit passes through the guide boss 240 below to form a closed magnetic circuit. Relying on the inherent magnetic force of the permanent magnet itself, a stable vertical adsorption force is generated on the guide boss 240, firmly adsorbing and adhering the guide boss 240 to the mating surface of the horizontal end face 114. Then, vertical locking is achieved through the base 200 integrally connected to the guide boss 240. When the position adjustment of probe P needs to be carried out, only an instantaneous reverse pulse current needs to be passed through the excitation coil of the electro-permanent magnet chuck 117. The reverse magnetic field excited by the coil cancels the working magnetic flux of the permanent magnet unit, so that the magnetic force on the working surface of the electro-permanent magnet chuck 117 disappears quickly, releasing the adsorption constraint on the guide boss 240. The base 200 can then generate vertical displacement under the action of the probe P's own weight to form a movement gap, and then the position is adjusted along the first direction X.This embodiment applies only vertical force during the locking process, without introducing horizontal lateral interference displacement. This prevents the locking operation from damaging the horizontal position of the probe P, ensuring the stability of the positioning accuracy. The electro-permanent magnet chuck 117's power-off magnetic retention characteristic completely avoids thermal expansion drift caused by continuous power-on, eliminating the negative impact of additional heat sources on the nanometer-level measurement accuracy of the interferometer. It can also maintain the locking state continuously under sudden power failure conditions, preventing probe P from shifting and being damaged, thus improving the reliability and safety of the mechanism's operation. Vertical adsorption locking allows the mating surfaces of the base 200 and the bracket 100 to form a tight surface contact, significantly improving the overall structural rigidity and inherent modes after locking, enhancing the vibration resistance of the probe P assembly, and meeting the stringent requirements of interferometric measurement for structural stability. At the same time, the adsorption force acts directly on the guide boss 240, with a short and uniform force transmission path, avoiding local stress deformation, and will not damage the shape and position accuracy of the guide structure even after long-term use.

[0035] like Figure 1 , Figure 2 and Figure 7As shown, in some embodiments, the adjustment device further includes a magnetic shaft motor 400; the motor body 410 of the magnetic shaft motor 400 is fixed to the bracket 100, and the output end 420 of the magnetic shaft motor 400 is fixed to the base 200; the magnetic shaft motor 400 drives the base 200 to move relative to the guide end 110 of the bracket 100 along the first direction X based on the movement of the output end 420 relative to the motor body 410. Specifically, a magnetic shaft motor 400 is used as the power actuator for the base 200 to move along the first direction X. The magnetic shaft motor 400 is a direct-drive precision linear drive element, mainly composed of a motor body 410 and an output end 420. The motor body 410 is the stator, which integrates a permanent magnet circuit assembly to provide a stable and uniform background magnetic field. The output end 420 is the mover, which integrates a coil winding. There is no mechanical contact between the two. The linear thrust along the axial direction is generated by the principle of electromagnetic induction, which directly drives the output end 420 to perform linear reciprocating motion relative to the motor body 410. There is no need for any intermediate transmission links such as lead screws, synchronous belts, or gears, thus eliminating transmission gaps, backlash errors, and transmission friction losses from the root of the transmission chain. The motor body 410 is fixedly mounted on the bracket 100, using the fixed bracket 100 as the driving reference to ensure a stable and reliable position reference for power output. The output end 420 of the magnetic shaft motor 400 is fixedly connected to the corresponding connection part 270 of the base 200, and the power is directly transmitted to the base 200. The transmission path is extremely short, the power response speed is fast, and the thrust transmission is lag-free. The thrust output of the magnetic shaft motor 400 has excellent linearity and extremely low thrust fluctuation. There is no frictional nonlinear disturbance of the lead screw drive, nor the end effect and low-speed servo jitter problem of ordinary flat linear motors. It can achieve precise point control and smooth low-speed movement at the micron or even submicron level, perfectly matching the adjustment requirements of the high-precision positioning of the interferometer probe P. Structurally, the magnetic shaft motor 400 adopts a compact integrated design with a small overall radial dimension and light weight. Its volume for the same thrust level is significantly smaller than that of a lead screw drive module and a conventional linear motor. It can be directly embedded into the narrow internal space of the probe P adjustment mechanism without causing excessive expansion of the overall size of the mechanism, thus fitting the compact design constraints of the profilometer probe P. Furthermore, the heat source of the magnetic shaft motor 400 is concentrated in the coil assembly, and it only needs to be powered during the position adjustment phase. After positioning, the power supply can be cut off with the locking structure. The continuous heat generation is far lower than that of conventional linear motors that require continuous power to maintain position, effectively reducing the risk of thermal expansion and deformation caused by the drive heat source.This embodiment enables high-speed, high-precision position adjustment of the base 200 along the first direction X. The direct-drive, backlash-free transmission characteristics, combined with low-friction rolling guides, maximize the accuracy and repeatability of the probe P's horizontal positioning, effectively improving adjustment efficiency. The non-contact transmission characteristic fundamentally avoids the contamination of wear debris and volatile grease generated by transmission friction, meeting the cleanliness requirements of semiconductor precision measurement scenarios. The compact and lightweight structure adapts to the limited installation space inside the probe P, aligning with the overall miniaturization design goal. The low-heat operation effectively reduces thermal drift of the mechanism, preventing thermal deformation from interfering with the nanometer-level measurement accuracy of the interferometer. Furthermore, the power-off shutdown operation mode after positioning and locking further eliminates the influence of the drive heat source.

[0036] like Figure 4 , Figure 7 and Figure 8As shown, in some embodiments, the base 200 also has: a first through hole 250 and two U-shaped holes; along the second direction Y, the first through hole 250 penetrates the top surface and the bottom surface of the base 200; along the first direction X, the U-shaped holes penetrate the side of the base 200 that is fixed to the output end 420; the U-shaped holes and the first through hole 250 are connected; the U-shaped openings of the cross sections of the two U-shaped holes are close to each other and together with the first through hole 250 define a connecting part 270, and the connecting part 270 is fixedly connected to the output end 420 of the magnetic shaft motor 400. Specifically, a first through hole 250 and two U-shaped holes are formed in the corresponding connection area of ​​the base 200. The first through hole 250 extends along the second direction Y and penetrates the top and bottom surfaces of the base 200, forming a vertically penetrating hollow cavity in the middle area of ​​the side where the base 200 connects with the magnetic shaft motor 400. This breaks the continuous rigidity of the base 200 base in this area, providing sufficient space for deformation of the connecting part 270. The two U-shaped holes extend along the first direction X and penetrate the side of the base 200 where the output end 420 of the magnetic shaft motor 400 is fixed, i.e., the mounting side of the base 200 facing the magnetic shaft motor 400. The two U-shaped holes are symmetrically distributed vertically along the second direction Y, and the U-shaped openings of their cross-sections are close to each other and connected to the first through hole 250. Thus, the first through hole 250 and the two U-shaped holes together enclose an independent connecting part 270 in the magnetic shaft motor 400 connection area of ​​the base 200. This connecting part 270 is essentially a flexible connecting beam structure surrounded by through hole grooves and connected to the main body of the base 200 only through a small amount of base material. After the connecting part 270 is fixedly connected to the output end 420 of the magnetic shaft motor 400, the driving force output by the magnetic shaft motor 400 along the first direction X can be smoothly transmitted to the main body of the base 200. At the same time, due to the flexible release effect of the surrounding U-shaped holes, the connecting part 270 can generate a small elastic displacement along the second direction Y relative to the main body of the base 200, without forming a rigid constraint on the vertical deformation of the guide rail area of ​​the base 200.This embodiment, while ensuring efficient and stable transmission of horizontal driving force, releases the vertical deformation freedom of the connecting area, avoiding the rigid constraint of the magnetic shaft motor 400 output end 420 from hindering the vertical flexible deformation of the guide rail area. This ensures the stable formation of the movement gap between the bracket 100 and the base 200, fully leveraging the function of eliminating surface contact friction to improve positioning accuracy. Simultaneously, the flexible connection structure effectively absorbs minor vibrations of the magnetic shaft motor 400, weakening the transmission path of vibration to the probe P body, improving the smoothness of the probe P's movement and positioning process, and also compensating for motor safety. The slight coaxiality error during assembly eliminates motion jamming and positioning deviation caused by internal stress during assembly. The integrated slotted structure eliminates the need for additional connecting components, maintaining the overall compact shape of the adjustment mechanism and adapting to the narrow installation space of the profilometer probe P. In addition, the first through hole 250 and the two U-shaped holes increase the thermal resistance between the magnetic shaft motor 400 and the base 200, reducing the conduction of heat from the magnetic shaft motor 400 to the base 200 and probe P, reducing measurement accuracy drift caused by thermal deformation, and further improving the long-term stability of probe P adjustment and measurement.

[0037] In some embodiments, the support 100 or the base 200 is made of Invar steel. Specifically, the support 100 or the base 200 is made of Invar steel, which is a 4J36 iron-nickel alloy commonly used in the field of precision machinery. This alloy has iron as its base and contains about 36% nickel. Its core material characteristic is that it has an extremely low coefficient of linear expansion in the range of room temperature to the operating temperature of ultra-precision equipment. When the temperature fluctuates slightly, the change in the macroscopic size of the material can be controlled at the submicron level. It is a core functional material used in current ultra-precision equipment to suppress thermal deformation and ensure dimensional stability. In this adjustment device, the bracket 100 and the base 200 are both core base components of the bearing and guiding structure. The first guide rail groove 111 and the second guide rail groove 210 are directly and integrally machined on the body of the bracket 100 and the base 200. The straightness of the guide rail raceway, the accuracy of the V-angle, the fit clearance of the cross roller assembly 300, and the relative position accuracy of the guide pair all depend on the dimensional stability of the base material. If the thermal expansion coefficient of the base material is too high, it will cause slight changes in the size and shape of the guide rail groove. At best, it will change the preload state of the cross roller assembly 300, cause fluctuations in frictional resistance and a decrease in smoothness of movement. At worst, it will cause the overall position and attitude of the probe P to shift by nanometers to micrometers, directly offsetting the positioning accuracy of the high-precision adjustment mechanism and destroying the reference stability of the interferometric measurement. When Invar steel is used to manufacture the bracket 100 or the base 200, the material's low expansion characteristics can fundamentally reduce the impact of temperature changes on structural dimensions. This ensures that within the normal operating temperature fluctuation range, the dimensional and positional accuracy of the integrated guide rail groove and the fitting clearance of the crossed roller guide remain highly stable. It will not cause problems such as abnormal preload, motion jamming, or deterioration of guiding accuracy due to temperature changes. At the same time, it can also prevent the probe P from drifting due to thermal expansion and contraction of the base 200, maintaining the long-term consistency of probe P positioning. In addition, Invar steel has the process performance to adapt to ultra-precision machining. High-precision guide rail groove and deformation groove structures can be processed through slow wire cutting, ultra-precision grinding, and other processes, while maintaining sufficient structural strength and elastic modulus to meet the load-bearing stiffness requirements of the guide base and ensure the inherent modal and vibration resistance performance of the structure.

[0038] like Figure 1 and Figure 7 As shown, in some embodiments, the first direction X is horizontal and the second direction Y is vertical. Specifically, the first direction X is defined as horizontal and the second direction Y is defined as vertical, and the two are strictly spatially orthogonal, perfectly matching the actual spatial conditions of the profilometer interferometer probe P being hoisted and installed. The horizontal direction is the feed motion direction for the fine adjustment of the probe P's position and also the extended guiding direction of the crossed roller guide. The vertical direction is the direction of the probe P's own weight and also the displacement direction formed by the flexible deformation of the guide rail area and the movement gap between the bracket 100 and the base 200.

[0039] like Figure 7 , Figure 8 and Figure 9As shown, in some embodiments, the adjustment device further includes a tilt adjustment component 500; the tilt adjustment component 500 includes: three threaded holes 510 and three adjusting screws 520; the threaded holes 510 penetrate the base 200 along the second direction Y; the center line of the three threaded holes 510 forms an equilateral triangle; the adjusting screws 520 are screwed into the threaded holes 510, and the ends of the adjusting screws 520 extend from the bottom surface of the base 200 away from the support 100 and are screwed into the probe P. Specifically, a three-point statically determinate support type threaded adjustment structure is used to achieve a small tilt adjustment of the probe P, wherein the tilt adjustment component 500 is integrated in the connection area between the base 200 and the probe P, without the need for an additional independent adjustment mechanism, and can make full use of the assembly space between the base 200 and the probe P to maintain the compactness of the overall structure. The tilt adjustment assembly 500 includes three threaded holes 510 penetrating the base 200 along the second direction Y. The center line of the three threaded holes 510 forms an equilateral triangle, meaning the three support points are evenly distributed at 120° along the circumference, forming a mechanically statically determinate support system. Unlike the insufficient attitude constraint of two-point support and the over-positioning drawbacks of four-point or higher support, the three-point equilateral arrangement can achieve complete constraint on the tilt attitude of the probe P with the minimum number of support points, and will not cause micro-deformation of the probe P body due to additional internal stress caused by the height deviation of each support point. Each threaded hole 510 is screwed with an adjusting screw 520. The screw of the adjusting screw 520 and the threaded hole 510 form a precision threaded transmission pair. The helix angle of the thread converts the circumferential rotation into a small axial linear displacement. The axial feed can be precisely controlled by controlling the rotation angle of the screw. The end of the adjusting screw 520 extends from the bottom surface of the base 200 away from the bracket 100 and is screwed into the corresponding mounting position of the probe P. This allows the probe P to be suspended and supported below the base 200 by the three adjusting screws 520. In actual adjustment, one of the adjusting screws 520 can be fixed as a reference fulcrum, and the extension length of the other two adjusting screws 520 can be differentially adjusted to drive the probe P to produce a slight tilt rotation, achieving precise fine-tuning of the probe P's pitch and yaw attitude. Since the threaded hole 510 passes through the base 200 along the second direction Y, the operator can directly turn the head of the adjusting screw 520 from one side of the top surface of the base 200 to complete the attitude calibration without disassembling the probe P or other surrounding components, significantly improving the ease of operation. At the same time, this tilt adjustment is independent of the horizontal adjustment of the base 200 along the first direction X. The two belong to different motion adjustment units. After the horizontal adjustment is completed and the base 200 is locked, the tilt fine-tuning will not cause reverse interference to the calibrated horizontal position. Structurally, this decoupling of horizontal displacement adjustment and tilt attitude adjustment is achieved.This embodiment completely avoids the coupling interference problem of multi-degree-of-freedom adjustment, greatly improving the adjustment efficiency and final positioning accuracy of probe P calibration. The arrangement of three statically determinate supports ensures the stability and reliability of probe P's attitude, preventing the introduction of additional internal stress that could cause internal optical element misalignment. The fine-tuning characteristics of the precision threaded drive can meet the sub-micron level adjustment accuracy requirements of the interferometer probe P for attitude angle. At the same time, the overall structure is fully integrated within the connection space between the base 200 and probe P, without the need to increase the size of the mechanism. It adapts to the compact design constraints of the profilometer probe P, and can further optimize the measurement attitude of probe P on the basis of achieving high-precision horizontal positioning, ensuring the overall measurement accuracy and long-term stability of the interferometer.

[0040] like Figure 7 , Figure 8 and Figure 9As shown, in some embodiments, the tilt adjustment assembly 500 further includes: three arc-shaped grooves 530 and three hemispherical supports 540; the arc-shaped grooves 530 are formed on the bottom surface of the base 200 away from the bracket 100; the arc-shaped grooves 530 communicate with the threaded holes 510; the hemispherical supports 540 are located between the arc-shaped grooves 530 and the probe P; the radius of the hemispherical supports 540 is larger than the radius of the arc-shaped grooves 530; the hemispherical supports 540 are partially disposed within the arc-shaped grooves 530; the hemispherical supports 540 have a second through hole through which the adjusting screw 520 passes. Specifically, three arc-shaped grooves 530 are made on the bottom surface of the base 200 away from the bracket 100, which correspond one-to-one with the threaded holes 510 and are coaxially connected. Three hemispherical supports 540 are configured as intermediate support components between the base 200 and the probe P. The arc-shaped grooves 530 are rotating arc surface structures that are recessed inward along the axis of the threaded holes 510. Their rotation center is completely coincident with the axis of the threaded holes 510. The inner wall of the groove is precision machined to ensure the shape and position accuracy and surface finish of the arc contour. This provides a precise fitting reference for the hemispherical supports 540 and also provides space for the embedding and swinging of the supports. The hemispherical support 540 is located between the arc-shaped groove 530 and the probe P. The side of the hemispherical support facing the base 200 is a convex continuous spherical surface, and the side facing the probe P is a flat support end face. The radius of the spherical surface of the hemispherical support 540 is larger than the radius of the arc surface of the arc-shaped groove 530. When the two are in contact, the spherical surface cannot completely fit the inner arc surface of the groove. Only a closed annular line contact area is formed at the opening edge of the arc-shaped groove 530. This line contact fit mode greatly reduces the contact area and frictional resistance of the mating surface while ensuring stable transmission of the support load. At the same time, it allows the hemispherical support 540 to swing slightly in any radial direction around the contact ring line. It can adaptively match the posture changes during the tilt adjustment process of the probe P and always maintain the complete surface fit between the support end face and the mounting surface of the probe P. The spherical side of the hemispherical support 540 is embedded in the arc-shaped groove 530. The inner wall of the arc-shaped groove 530 can provide radial restraint for the hemispherical support 540 in the horizontal direction, preventing lateral displacement of the support during adjustment or operation. At the same time, the internal depth of the arc-shaped groove 530 is greater than the embedding depth of the support, providing sufficient space for swinging and avoiding rigid interference between the top of the support and the bottom of the groove when it swings. A second through hole is opened at the center of the hemispherical support 540 along its own axis. The adjusting screw 520 passes through the threaded hole 510 from the top surface of the base 200, then through the second through hole, through the hemispherical support 540, and is finally screwed and fixed to the corresponding mounting position of the probe P. The diameter of the second through hole is slightly larger than the diameter of the rod of the adjusting screw 520, forming a uniform radial gap between the hole wall and the rod of the adjusting screw 520. When the hemispherical support 540 swings with the tilt of the probe P, this gap can accommodate the relative offset of the rod of the adjusting screw 520, avoiding rigid compression between the rod of the adjusting screw 520 and the hole wall, thus structurally eliminating the lateral additional load borne by the threaded pair during tilt adjustment.This embodiment, through the aforementioned configuration of the arc-shaped groove 530 and the hemispherical support 540, transforms the traditional rigid point support into a flexible support with adaptive swing capability. This completely solves the problem of lateral force on the thread during tilt adjustment, making the adjustment torque more uniform and stable, significantly improving the operational feel and precision controllability of tilt fine-tuning, and ensuring the accuracy and repeatability of probe P posture adjustment. The adaptively fitting support end face of the hemispherical support 540 ensures that the three-point support is always in effective surface contact, avoiding posture instability caused by false support. The evenly distributed support load of the hemispherical support 540 can also reduce local stress concentration, preventing micro-deformation of the probe P mounting surface from interfering with the internal optical reference. The low-friction line contact fit can significantly reduce the wear of the support parts, and can maintain good fit accuracy and posture retention capability even after long-term use.

[0041] like Figure 8 and Figure 9As shown, in some embodiments, the tilt adjustment component 500 further includes: an annular groove 550 and a notch 560; the annular groove 550 is formed around the arc-shaped groove 530; the notch 560 is formed on the bottom surface of the base 200 away from the support 100; the notch 560 connects the annular groove 550 and the arc-shaped groove 530. Specifically, an annular groove 550 is formed on the bottom surface of the base 200 away from the support 100, at the outer periphery of each arc-shaped groove 530. The annular groove 550 is coaxially arranged with the arc-shaped groove 530, forming a continuous annular recessed structure around the arc-shaped groove 530 in the circumferential direction. The groove body is recessed into the base 200 base body to form an independent closed receiving cavity. Its radial width and groove depth have been optimized by both mechanics and receiving capacity, which can provide sufficient activity space for the arc-shaped groove 530 without excessively weakening the structural rigidity of the base body around the groove, ensuring the load-bearing strength and structural mode of the support area of ​​the arc-shaped groove 530. Meanwhile, a notch 560 is provided on the bottom surface of the base 200 away from the support 100. The notch 560 extends radially along the arc-shaped groove 530, with one end connecting to the inner mating space of the arc-shaped groove 530 and the other end connecting to the inner cavity of the annular groove 550. This creates an integrated receiving passage that connects the mating clearance of the arc-shaped groove 530, the channel of the notch 560, and the cavity of the annular groove 550. When the hemispherical support 540 swings slightly within the arc-shaped groove 530 as the probe P tilts, excess grease squeezed out between the mating surfaces, small amounts of wear debris generated by friction, and environmental particles falling into the mating area are pushed through the notch 560 to the outer annular groove 550 for storage, rather than remaining on the contact bearing surface between the hemispherical support 540 and the arc-shaped groove 530. This avoids problems such as scratches on the mating surfaces and abnormal fluctuations in frictional resistance caused by hard particles intervening in the friction pair. From a structural mechanics perspective, the opening edge of the arc-shaped groove 530 is the core load-bearing area that forms an annular line contact with the hemispherical support 540. It is also a high-incidence area of ​​stress concentration under load. The annular groove 550 around the groove can interrupt the stress transmission path of the substrate around the groove, disperse the local stress concentrated at the opening edge to a larger area of ​​the substrate around the annular groove 550, effectively reduce the local maximum stress value, alleviate the accumulation of material fatigue under repeated oscillating loads, and improve the long-term structural stability and service life of the support structure.This embodiment effectively maintains the cleanliness and lubrication of the mating friction surfaces, avoiding adjustment jams, surface scratches, and precision degradation caused by contaminants. It significantly improves the smoothness of tilt fine-tuning and the ability to maintain long-term accuracy. The stress dispersion effect enhances the fatigue resistance and structural reliability of the support area, and the long-term lubrication function reduces adjustment resistance fluctuations during long-term use, ensuring the accuracy and consistency of attitude adjustment. At the same time, the overall structure is fully integrated into the existing space of the base 200, without the need for additional expansion of the installation volume, which meets the design constraints of the compact profilometer probe P. With the tilt adjustment system of three-point statically determinate support, it can continuously maintain high-precision attitude adjustment performance under long-term service conditions, better adapting to the high stability and low maintenance requirements of semiconductor precision measurement scenarios.

[0042] On the other hand, embodiments of the present invention also provide a profilometer, including the aforementioned adjustment device for the profilometer probe P. In this embodiment, the specific configuration of the profilometer can be referred to the aforementioned embodiment of the adjustment device for the profilometer probe P, and will not be repeated here.

[0043] In summary, as can be seen from the above embodiments, compared with the prior art, the profilometer probe P adjustment device and profilometer provided by the present invention achieve at least the following beneficial effects: The present invention provides an adjustment device for a profilometer probe P and a profilometer. The adjustment device for the profilometer probe P includes: a support 100, a base 200, and two cross roller assemblies 300. Along a first direction X, first guide grooves 111 are respectively formed on the opposite surfaces of the two guide ends 110 of the support 100, and first deformation grooves 112 are respectively formed on both sides of the first guide grooves 111 along a second direction Y. Along the first direction X, second guide grooves 210 are respectively formed on two opposite sides of the base 200, and second deformation grooves 220 are respectively formed on both sides of the second guide grooves 210 along the second direction Y. Two adjacent sets of first guide grooves 111 and second guide grooves 210 respectively enclose and form cross roller guides. The second direction Y has a vertical component. The probe P is fixed to the bottom surface of the base 200 away from the support 100. The cross roller assemblies 300 are disposed within the cross roller guides and are rolledly connected to the inner walls of the first guide grooves 111 and the second guide grooves 210 respectively. This invention achieves a high degree of integration and compactness of the cross roller guide rail through the integrated design of the first guide rail groove 111 and the bracket 100, and the second guide rail groove 210 and the base 200, perfectly adapting to the narrow installation scenario of the profilometer probe P. The first deformation groove 112 and the second deformation groove 220, symmetrically arranged along the second direction Y on both sides of the first guide rail groove 111 and the second guide rail groove 210, endow the cross roller guide rail with controllable vertical flexible deformation capability, allowing it to automatically form a movement space between the contact surfaces of the bracket 100 and the base 200 by means of the gravity of the probe P. The gap eliminates the interference of surface contact sliding friction on positioning accuracy from the structural source, and solves the common problems of low-speed crawling and positioning hysteresis deviation caused by friction in existing rigid adjustment mechanisms. With the rolling guide form of the cross roller assembly 300, it not only ensures the smoothness of the movement of the probe P along the first direction X and the high-precision guidance, but also retains the basic load-bearing rigidity of the cross roller guide. It realizes high-precision, low-friction horizontal adjustment function in a compact volume, and provides a reliable guiding structure foundation for the stable positioning of the probe P and the subsequent locking efficiency improvement.

[0044] The above description, in conjunction with specific optional embodiments, provides a further detailed explanation of the present invention. It should not be construed that the specific implementation of the present invention is limited to these descriptions. For those skilled in the art, various simple deductions or substitutions can be made without departing from the concept of the present invention, and all such modifications and substitutions should be considered within the scope of protection of the present invention.

Claims

1. An adjustment device for a profilometer probe, characterized in that, include: The bracket has first guide grooves formed on the opposite surfaces of its two guide ends along a first direction, and first deformation grooves formed on both sides of the first guide grooves along a second direction. The base has second guide rail grooves on two opposite sides along the first direction, and second deformation grooves on both sides of the second guide rail grooves along the second direction; two adjacent sets of the first guide rail grooves and the second guide rail grooves respectively form a cross roller guide rail; the second direction has a vertical component; the probe is fixed to the bottom surface of the base away from the bracket; Two cross roller assemblies are disposed within the cross roller guide rail and are respectively roll-connected to the inner walls of the first guide rail groove and the second guide rail groove.

2. The adjustment device for the profilometer probe according to claim 1, characterized in that, The cross roller assembly includes cylindrical rollers and a cage, wherein the cylindrical rollers are arranged in a 90° orthogonal sequence and mounted on the cage; the cylindrical rollers are in rolling connection with the inner walls of the first guide groove and the second guide groove.

3. The adjustment device for the profilometer probe according to claim 1, characterized in that, The first guide rail groove and the second guide rail groove are 90° V-shaped raceways, and the cross roller guide rail formed by the first guide rail groove and the second guide rail groove is a square raceway.

4. The adjustment device for the profilometer probe according to claim 3, characterized in that, The first guide rail groove and the second guide rail groove are respectively provided with a first stress relief groove and a second stress relief groove at the V-shaped tip, and the first stress relief groove and the second stress relief groove at least partially accommodate the cross roller assembly.

5. The adjustment device for the profilometer probe according to claim 1, characterized in that, The surface roughness Ra of the first guide rail groove and the second guide rail groove satisfies Ra≤0.2μm.

6. The adjustment device for the profilometer probe according to claim 1, characterized in that, The widths of both the first deformation groove and the second deformation groove range from 0.3 to 0.8 mm.

7. The adjustment device for the profilometer probe according to claim 1, characterized in that, The guide end includes a horizontal end face and a vertical end face that are connected to each other; The first guide rail groove is disposed on the vertical end face; The horizontal end face is provided with a guide hole along the first direction; the top surface of the base near the bracket is provided with a guide boss; the guide boss slides in the guide hole during the sliding of the base relative to the bracket.

8. The adjustment device for the profilometer probe according to claim 7, characterized in that, The bracket also includes an electro-permanent magnet chuck; the electro-permanent magnet chuck is fixed to the upper surface of the horizontal end face; when the electro-permanent magnet chuck is de-energized, the electro-permanent magnet chuck magnetically attracts the guide boss.

9. The adjustment device for the profilometer probe according to claim 1, characterized in that, The regulating device further includes: A magnetic shaft motor, wherein the motor body of the magnetic shaft motor is fixed to the bracket, and the output end of the magnetic shaft motor is fixed to the base; the magnetic shaft motor drives the base to move along the first direction relative to the guide end of the bracket based on the movement of the output end relative to the motor body.

10. The adjustment device for the profilometer probe according to claim 9, characterized in that, The base also has the following features: A first through hole, along the second direction, penetrates the top and bottom surfaces of the base; Two U-shaped holes are provided along the first direction, the U-shaped holes passing through the side of the base and the output end fixed together; the U-shaped holes are connected to the first through hole; the U-shaped openings of the cross sections of the two U-shaped holes are close to each other and together with the first through hole define a connecting part, the connecting part being fixedly connected to the output end of the magnetic shaft motor.

11. The adjustment device for the profilometer probe according to claim 1, characterized in that, The support or the base is made of Invar steel.

12. The adjustment device for the profilometer probe according to claim 1, characterized in that, The first direction is horizontal, and the second direction is vertical.

13. The adjustment device for the profilometer probe according to claim 1, characterized in that, The adjustment device further includes a tilt adjustment component; the tilt adjustment component includes: Three threaded holes, the threaded holes penetrating the base along the second direction; the center line of the three threaded holes forms an equilateral triangle; Three adjusting screws are screwed into the threaded holes, and the ends of the adjusting screws extend from the bottom surface of the base away from the bracket and are screwed into the probe.

14. The adjustment device for the profilometer probe according to claim 13, characterized in that, The tilt adjustment component also includes: Three arc-shaped grooves are formed on the bottom surface of the base away from the bracket; the arc-shaped grooves communicate with the threaded holes; Three hemispherical supports are provided, located between the arc-shaped groove and the probe; the radius of each hemispherical support is greater than the radius of the arc-shaped groove; the hemispherical support is partially disposed within the arc-shaped groove; each hemispherical support has a second through hole through which the adjusting screw passes.

15. The adjustment device for the profilometer probe according to claim 14, characterized in that, The tilt adjustment component also includes: An annular groove is formed around the arc-shaped groove; A notch is formed on the bottom surface of the base away from the bracket; the notch connects the annular groove and the arc-shaped recess.

16. A profilometer, characterized in that, The device includes an adjustment mechanism for the profilometer probe according to any one of claims 1 to 15.

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