Method and system for processing mask pattern data

Abstract

The present application relates to a kind of mask pattern data processing method and system.Utilizing the mask pattern data processing method and system, after obtaining at least two CCD versions detected for the same JDV layout, check whether multiple CCD data in it have duplicates, if there are duplicates, delete and retain one, and the CCD data without duplicates is merged and summarized, wherein the distance of the two CCD data corresponding to the measurement pattern belonging to the duplicate in the set direction is less than the set value and the measurement direction, CD value and measurement pattern type are consistent.In the duplicate checking, the distance of the measurement pattern corresponding to each CCD data, the measurement direction, CD value and measurement pattern type are used for screening, automatic checking, deletion and merging can be realized, and the problem of large task quantity, low efficiency and easy to make mistakes in manual merging and summarizing different CCD versions detected for JDV layout by relying on manpower is solved.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and in particular to a method for processing mask pattern data and a system for processing mask pattern data. Background Technology

[0002] Before a semiconductor mask leaves the factory, the semiconductor manufacturer usually checks the JDV (jobdeck view, i.e., online photomask data inspection) layout sent by the mask manufacturer. After the inspection is passed, the inspection results are fed back to the mask manufacturer.

[0003] When semiconductor manufacturers perform JDV (Junior Diode Dimension) layout inspection, different departments (such as PIE (Process Integration) and LITHO (Lithography) departments) typically select patterns from the JDV layout for inspection and obtain chip critical dimension (CCD) data by measuring these patterns. When the inspection results are sent back to the mask manufacturer, the CCD data measured by each department are checked and compared, duplicates are removed, and the data is merged to form a single CCD data handbook, which is then sent to the mask manufacturer.

[0004] Currently, the process of merging CCD data provided by various departments is mainly done manually, which is a large workload and suffers from low efficiency and a high risk of errors. Summary of the Invention

[0005] To address the problems of large workload, low efficiency, and error-proneness associated with manually merging and summarizing different CCD versions obtained from JDV layout detection, this invention provides a mask image data processing system and a mask image data processing method.

[0006] On one hand, the present invention provides a mask pattern data processing system, the mask pattern data processing system comprising:

[0007] The data acquisition module is used to acquire at least two CCD versions obtained from the detection of the same JDV layout, wherein the at least two CCD versions include multiple CCD data entries; and

[0008] The data merging module is used to check whether there are duplicate items in the multiple CCD data. If there are duplicate items, the duplicate items are deleted and one item is retained. The CCD data without duplicate items are merged and summarized. Among the multiple CCD data, the measurement patterns corresponding to the two CCD data that are duplicate items are less than the set value in the set direction and the measurement direction, CD value and measurement pattern type are consistent.

[0009] Optionally, checking whether there are duplicates in the multiple CCD data includes:

[0010] Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the same coordinate system, determine whether the distance between the measurement patterns corresponding to each CCD data and the measurement patterns corresponding to other CCD data in a set direction is less than a set value. If the distance between the measurement patterns corresponding to two CCD data is less than the set value, further determine whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all are yes, then the two CCD data are duplicates. If not all are yes, then the two CCD data are non-duplicates.

[0011] Optionally, determining whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data points are consistent includes:

[0012] First, determine whether the measurement directions corresponding to the two CCD data are consistent. Only if the result is yes, then determine whether the CD values ​​are consistent. And only if the result is yes, then determine whether the measurement pattern types are consistent. If the measurement pattern types are also consistent, then the two CCD data are duplicates; otherwise, they are non-duplicates.

[0013] Optionally, the data merging module includes at least one of the following units:

[0014] The distance judgment unit is used to determine whether the distance between the measurement pattern corresponding to each of the CCD data and the measurement pattern corresponding to other CCD data in a set direction is less than the set value.

[0015] The measurement direction determination unit is used to determine whether the measurement directions corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent.

[0016] The CD value determination unit is used to determine whether the CD values ​​corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent; and

[0017] The measurement pattern judgment unit is used to determine whether the measurement pattern types corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent.

[0018] Optionally, the mask image data processing system further includes:

[0019] The approval and upload module is used to approve and upload the CCD versions that will be merged from different departments to a designated storage location.

[0020] Optionally, the data merging module includes:

[0021] The version confirmation unit is used to determine whether the product identification code and mask identification code of the at least two CCD versions are the same. Only when the product identification code and mask identification code are the same, it checks whether there are duplicate items in the multiple CCD data. Otherwise, it stops checking and outputs the corresponding alarm information.

[0022] On the other hand, the present invention provides a method for processing mask graphic data, the method comprising:

[0023] Obtain at least two CCD versions detected for the same JDV layout, wherein the at least two CCD versions include multiple CCD data entries; and

[0024] Check whether there are duplicates in the multiple CCD data. If there are duplicates, delete the duplicates and keep one. Then merge and summarize the CCD data without duplicates. Among the multiple CCD data, the measurement patterns corresponding to the two CCD data that are duplicates are less than the set value in the set direction and have the same measurement direction, CD value and measurement pattern type.

[0025] Optionally, before checking whether there are duplicates in the multiple CCD data, the mask image data processing method further includes:

[0026] Determine whether the product identification code and mask identification code of the at least two CCD versions are the same. Only if the product identification code and mask identification code are the same, check whether there are duplicate items in the multiple CCD data. Otherwise, stop the check and output the corresponding alarm information.

[0027] Optionally, checking whether there are duplicates in the multiple CCD data includes:

[0028] Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the same coordinate system, determine whether the distance between the measurement patterns corresponding to each CCD data and the measurement patterns corresponding to other CCD data in a set direction is less than a set value. If the distance between the measurement patterns corresponding to two CCD data is less than the set value, further determine whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all are yes, then the two CCD data are duplicates. If not all are yes, then the two CCD data are non-duplicates.

[0029] Optionally, determining whether the distance between the measurement pattern corresponding to each CCD data and the measurement pattern corresponding to other CCD data in a set direction is less than the set value, based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the same coordinate system, includes:

[0030] Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in a single CCD version in the same coordinate system, determine whether the distance between the measurement pattern corresponding to each CCD data in a single CCD version and the measurement patterns corresponding to other CCD data in a set direction is less than the set value.

[0031] Based on the premise that there are no duplicate CCD data in the single CCD version, and according to the coordinates of the measurement patterns corresponding to the two CCD data selected from the two CCD versions in the same coordinate system, it is determined whether the distance between the measurement patterns corresponding to the two CCD data in the set direction is less than the set value.

[0032] Optionally, determining whether the CD values ​​corresponding to the two CCD data points are consistent includes:

[0033] Determine whether the difference between the CD values ​​corresponding to the two CCD data points is less than the measurement error. If yes, the CD values ​​corresponding to the two CCD data points are consistent; otherwise, the CD values ​​corresponding to the two CCD data points are inconsistent.

[0034] Optionally, determining whether the measurement pattern types corresponding to the two CCD data points are consistent includes:

[0035] Determine whether the exposure and development modes of the measurement patterns corresponding to the two CCD data are consistent. If not, the measurement pattern types corresponding to the two CCD data are inconsistent. If yes, further determine whether the graphic shapes of the measurement patterns corresponding to the two CCD data are consistent. When the graphic shapes are also consistent, the measurement pattern types corresponding to the two CCD data are consistent. When the graphic shapes are inconsistent, the measurement pattern types corresponding to the two CCD data are inconsistent.

[0036] The mask pattern data processing system and method provided by this invention, after obtaining at least two CCD versions for the same JDV layout detection, checks whether there are duplicates among the multiple CCD data. If there are duplicates, the duplicates are deleted and one is retained. The CCD data without duplicates are merged and summarized. The measurement patterns corresponding to the two CCD data that are duplicates have a distance of less than a set value in a set direction and the measurement direction, CD value, and measurement pattern type are consistent. When checking for duplicates, the distance, measurement direction, CD value, and measurement pattern type of the measurement patterns corresponding to each CCD data can be used for filtering. This can realize automatic checking, deletion, and merging, solving the problems of large workload, low efficiency, and easy error in manually merging and summarizing different CCD versions obtained for JDV layout detection. Attached Figure Description

[0037] Figure 1This is a schematic diagram of the structure of a mask graphic data processing system according to an embodiment of the present invention.

[0038] Figure 2 This is a step diagram of a method for processing mask graphic data according to an embodiment of the present invention.

[0039] Figure 3 This is a schematic diagram of the process of CCD data signing, uploading, and merging using a mask graphic data processing method according to an embodiment of the present invention.

[0040] Figure 4 This is a schematic flowchart illustrating the CCD data processing method using a mask graphic data processing method according to an embodiment of the present invention. Detailed Implementation

[0041] The following detailed description, in conjunction with the accompanying drawings and specific embodiments, further illustrates the mask pattern data processing method and system of the present invention. The advantages and features of the present invention will become clearer from the following description. It should be understood that the accompanying drawings are in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of the present invention.

[0042] This invention relates to a mask pattern data processing system and a mask pattern data processing method, wherein "mask pattern data" refers to the relevant data of the pattern used to make a semiconductor mask. In the following embodiments, "mask pattern data" includes CCD measurement data of JDV layout.

[0043] Reference Figure 1 According to an embodiment of the present invention, a mask graphic data processing system 100 includes a data acquisition module 120 and a data merging module 130, and may further include a signature and upload module 110. Detailed description follows.

[0044] The approval and upload module 110 is used to approve and upload CCD (Chip Key Dimension) versions to be merged from different departments to a designated storage location. This allows for subsequent retrieval of different CCD versions from the designated storage location for inspection, removal of duplicates, and merging into a single CCD version. The designated storage location can be a specified computer directory or a specified cloud storage location, etc. As an example, the different departments include the PIE (Process Integration) department and the LITHO (Lithography) department. Using the approval and upload module 110 for approval and upload can save time spent on manual communication and approval procedures.

[0045] The data acquisition module 120 is used to acquire at least two CCD versions obtained for the same JDV layout detection. Each CCD version may include one or more CCD data points. The at least two CCD versions acquired by the data acquisition module 120 may come from different departments, and each department's CCD version includes CCD data obtained by that department for some detection patterns in the JDV layout. Each CCD data point may include the coordinates, measurement direction, and CD value (CD stands for critical dimension) of the corresponding measurement pattern, and may also include information such as the exposure and development mode and pattern type of the measurement pattern.

[0046] The data acquisition module 120 acquires at least two CCD versions. The CCD data in each CCD version may contain duplicates, and the CCD data in different CCD versions may also contain duplicates. Before feeding back the JDV layout inspection results to the mask manufacturer, these CCD versions are processed to remove duplicates and merge them into one version.

[0047] The data merging module 130 is used to check whether multiple CCD data in the at least two CCD versions acquired by the data acquisition module 120 have duplicates. If there are duplicates, the duplicates are deleted and one is retained. The CCD data without duplicates are merged and summarized. Among the multiple CCD data, the measurement patterns corresponding to the two CCD data that are duplicates are less than the set value in the set direction and the measurement direction, CD value and measurement pattern type are consistent.

[0048] Optionally, the data merging module 130 may include a version confirmation unit 131 to confirm whether the at least two CCD versions acquired by the data acquisition module 120 are versions for the same JDV layout before performing duplicate checks, thus avoiding errors during signing and uploading and data acquisition. As an example, the version confirmation unit 121 can determine whether the product ID and mask ID of the at least two CCD versions acquired by the data acquisition module 120 are the same. Only if both the product ID and mask ID are the same will a duplicate check be performed (i.e., checking whether there are duplicates in the CCD data of the at least two CCD versions). Otherwise, the subsequent process will be stopped, and corresponding alarm information will be output to remind the operator to check and handle the issue.

[0049] To check whether there are duplicates in the multiple CCD data sets, as an example, the data merging module 130 can perform the following process:

[0050] First, based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the at least two CCD versions in the same coordinate system, it is determined whether the distance between the measurement patterns corresponding to each CCD data and the measurement patterns corresponding to other CCD data in a set direction is less than a set value. If the distance between the measurement patterns corresponding to two CCD data in the set direction is less than the set value, it is further determined whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all are yes, then the two CCD data are duplicates; if not all are yes, then the two CCD data are non-duplicates.

[0051] As an example, the coordinate system can be a wafer coordinate system or a coordinate system in the layout, and the set value is, for example, 5nm. When determining whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data points are consistent, a suitable order can be adopted as needed. For example, in one embodiment, it is first determined whether the measurement directions corresponding to the two CCD data points are consistent; only if the result is yes, then it is determined whether the CD values ​​are consistent; and only if the result is yes, then it is determined whether the measurement pattern types are consistent. If the measurement pattern types are also consistent, then the two CCD data points are duplicates; otherwise, they are non-duplicates. In another embodiment, when determining whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data points are consistent, it is first determined whether the CD values ​​or measurement pattern types are consistent.

[0052] like Figure 1 As shown, the data merging module 130 may include at least one of a distance judgment unit 132, a measurement direction judgment unit 133, a CD value judgment unit 134, and a measurement pattern judgment unit 135; wherein, the distance judgment unit 132 is used to determine whether the distance between the measurement pattern corresponding to each CCD data and the measurement pattern corresponding to other CCD data in a set direction is less than a set value; the measurement direction judgment unit 133 is used to determine whether the measurement directions corresponding to two CCD data whose measurement patterns are less than the set value in a set direction are consistent; the CD value judgment unit 134 is used to determine whether the CD values ​​corresponding to two CCD data whose measurement patterns are less than the set value in a set direction are consistent; and the measurement pattern judgment unit 135 is used to determine whether the measurement pattern types corresponding to two CCD data whose measurement patterns are less than the set value in a set direction are consistent.

[0053] The mask image data processing system 100 described above may include multiple computers, hardware, devices, etc., interconnected via communication units such as a network, or may include a single computer, hardware, device, etc., having the process for implementing the present invention. The computer may include a central processing unit (CPU), memory, and input / output components, such as a keyboard, mouse, touchscreen, display, etc. The term "module" or "unit" used in the mask image data processing system 100 refers to components of the present invention, such as logically separable software (computer programs), hardware, or equivalent components, and may be combined or split as needed. For example, the aforementioned signature upload module 110, data acquisition module 120, and data merging module 130 may be combined into one module as needed, or any one of these modules may be split into multiple modules, or at least some of the functions of one or more of these modules may be combined with at least some of the functions of other modules and implemented in one module. According to embodiments of the present invention, at least one of the modules is generally implemented in conjunction with hardware using software programs; however, all or part of them may also be implemented using electronic hardware or software programs. Whether implemented in software or hardware, certain parts can be carried out by personnel familiar with the fields of electronics and software; therefore, the details will not be elaborated in this manual.

[0054] According to the mask pattern data processing system 100 of the present invention, at least two CCD versions for the same JDV layout can be obtained. The system uses the coordinates, measurement directions, CD values, and measurement patterns of each CCD data in the same coordinate system to determine whether there are duplicate items in the multiple CCD data. If there are duplicate items, the duplicate items are deleted and one item is retained. The non-duplicate items are merged and summarized into one CCD version. The above-mentioned duplicate item checking, deletion, and non-duplicate item merging and summarizing can be completed automatically, which can solve the problems of large workload, low efficiency, and easy error in manually merging CCD data.

[0055] This invention also relates to a method for processing mask pattern data. The mask pattern data processing method can be executed by the mask pattern data processing system 100 described in the above embodiments, or the method can be stored as computer instructions in a readable storage medium and executed by a processor. The following is in conjunction with... Figures 2 to 4 The method for processing the mask graphic data and the mask graphic data processing system 100 described above will be further explained.

[0056] Reference Figure 2The mask pattern data processing method of this invention includes step S1: obtaining at least two CCD versions for the same JDV layout detection, wherein the at least two CCD versions include multiple CCD data.

[0057] Reference Figure 3 Before obtaining the at least two CCD versions, different departments (such as Department A and Department B) that uploaded the at least two CCD versions can sign off on and upload the CCD versions for merging and summarizing the same JDV layout to a designated storage location. This allows step S1 to retrieve the at least two signed-off and uploaded CCD versions from the designated storage location. This signing-off process can be implemented by computer, saving time spent on manual communication and signing operations.

[0058] Reference Figure 2 and Figure 3 After obtaining at least two CCD versions detected for the same JDV layout, step S2 is executed: Checking whether multiple CCD data entries in the at least two CCD versions have duplicates. If duplicates are found, the duplicates are removed, and only one is retained. The CCD data without duplicates are then merged and summarized. Specifically, among the multiple CCD data entries, the measurement patterns corresponding to the two CCD data entries that are duplicates have a distance less than a set value in a set direction, and their measurement direction, CD value, and measurement pattern type are consistent. By merging and summarizing the remaining non-duplicate CCD data, a merged CCD version can be formed.

[0059] Optionally, after obtaining the at least two CCD versions, it can be confirmed whether the at least two CCD versions are for the same JDV layout to avoid errors during uploading and data acquisition. For example, the product ID and mask ID corresponding to the at least two CCD versions can be checked for consistency. Only when both the product ID and mask ID are the same can it be determined that the at least two CCD versions are for the same JDV layout, and then the above-mentioned duplicate check and merging operation can be performed. Otherwise, subsequent operations are stopped, and corresponding inconsistency information and alarm information can be output to remind the operator to handle the situation.

[0060] like Figure 4As shown, as an example, we can first check whether the product identification codes corresponding to the at least two CCD versions are the same (or duplicated). If so, we can further determine whether the mask identification codes corresponding to the at least two CCD versions are the same. If so, we can perform subsequent duplicate checks. If the product identification codes or mask identification codes corresponding to the at least two CCD versions are different, it means that the different CCD versions being compared do not target the same JDV layout, and we will not perform subsequent duplicate checks.

[0061] After confirming using the above method that at least two CCD versions are for the same JDV layout, the next step is to perform duplicate checking and merging operations, which may include the following process.

[0062] First, obtain the coordinates of the center point of the measurement pattern corresponding to each CCD data in the same coordinate system (such as the wafer coordinate system or the layout coordinate system), and determine whether the distance between the measurement pattern corresponding to each CCD data and the measurement pattern corresponding to other CCD data in the set direction is less than a set value based on the coordinates.

[0063] The coordinate system is, for example, an XY two-dimensional coordinate system. The center point of the measurement pattern corresponding to each CCD data has coordinates corresponding to the same coordinate system. Based on the coordinates of the center points of the measurement patterns corresponding to two CCD data, the distance between the two measurement patterns in a set direction can be calculated. The distance in the set direction can be the distance on the horizontal axis (X-axis), the distance on the vertical axis (Y-axis), or the distance between two points in a two-dimensional plane. When determining whether the distance between the measurement pattern corresponding to each CCD data and the measurement pattern corresponding to other CCD data in the set direction is less than a set value, two CCD data can be selected from multiple CCD data in a certain order for comparison, and any two CCD data can be traversed. For example, one can first determine whether the distance between the measurement pattern corresponding to each CCD data in a single CCD version and the measurement pattern corresponding to other CCD data in a set direction is less than a set value, based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in a single CCD version within the same coordinate system, to determine whether the CCD data in a single CCD version has duplicates; then, based on the premise that the CCD data in a single CCD version has no duplicates, one can determine whether the distance between the measurement patterns corresponding to two CCD data selected from two different CCD versions in a set direction is less than the set value, based on the coordinates of the center points of the measurement patterns corresponding to the two CCD data selected from two different CCD versions within the same coordinate system, to determine whether the CCD data selected from different CCD versions has duplicates.

[0064] The difference in the x-coordinates and / or y-coordinates of the center points of the measurement patterns corresponding to the two selected CCD data points can be compared to determine whether the distance between the two measurement patterns in a set direction is less than a set value. For example, the set value is 5 nm. When determining whether the distance between the measurement patterns corresponding to the two CCD data points in the x-axis direction is less than the set value, the x-coordinates of the measurement patterns corresponding to the two CCD data points can be obtained, the difference Δx between the two x-coordinates can be calculated, and then it can be determined whether the difference Δx is less than 5 nm. If not, it indicates that the measurement patterns corresponding to the two CCD data points are different measurement patterns, and the two CCD data points are non-duplicate items, so they can be merged and summarized without deletion. If yes, it indicates that the two CCD data points may be duplicate items, and further judgment is required.

[0065] If, after distance detection, the distance between any two CCD data points from the at least two CCD versions is greater than or equal to a set value in the corresponding measurement pattern in the set direction, then it indicates that there are no duplicate CCD data points in the at least two CCD versions. In this case, the CCD data points can be sorted in a certain order (such as ascending order of the horizontal coordinate in the same coordinate system) and then merged and summarized (i.e.,...). Figure 4 The “merge” shown means merging without deletion into a single version.

[0066] When performing the above distance detection on at least two CCD versions, if the distance between the measurement patterns corresponding to the two CCD data in the set direction is less than the set value, it can be further determined whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all of these are true, then the two CCD data are duplicates and need to be deleted to retain one. If not all of these are true, then the two CCD data are non-duplicates and are used for merging and summarizing.

[0067] like Figure 4 As shown in the example, when the difference Δx between the horizontal coordinates of the measurement patterns corresponding to two CCD data points is less than a set value, it is further determined whether the measurement directions (pattern directions) corresponding to the two CCD data points are consistent. The measurement direction refers to the direction in which the CD value is measured relative to the measurement pattern in the JDV layout. The measurement direction can be represented, for example, by the deflection angle relative to the X-axis or Y-axis in the same coordinate system. When the measurement directions are inconsistent, it indicates that the two CCD data points are non-repeating items and can be merged and summarized. If the measurement directions are consistent, it indicates that the two CCD data points may be repeating items and further judgment is required.

[0068] like Figure 4As shown in the example, when the difference Δx between the horizontal coordinates of the measurement patterns corresponding to two CCD data points is less than a set value and the corresponding measurement directions are consistent, it is further determined whether the CD values ​​corresponding to the two CCD data points are consistent. Due to the existence of measurement error, when determining whether the CD values ​​corresponding to the two CCD data points are consistent, a measurement error is set, for example, 0.001 nm, and it is determined whether the difference between the CD values ​​corresponding to the two CCD data points is less than the measurement error. If not, that is, the difference between the CD values ​​corresponding to the two CCD data points is greater than or equal to the measurement error, then it is determined that the CD values ​​corresponding to the two CCD data points are inconsistent, indicating that the two CCD data points are non-repeating items and can be merged and summarized. If yes, that is, the difference between the CD values ​​corresponding to the two CCD data points is less than the measurement error, then it can be considered that the CD values ​​corresponding to the two CCD data points are consistent, indicating that the two CCD data points may still be repeating items and further judgment is required.

[0069] In this embodiment, when the difference Δx between the horizontal coordinates of the measurement patterns corresponding to two CCD data points is less than a set value, the corresponding measurement directions are consistent, and the corresponding CD values ​​are consistent, it is further determined whether the measurement pattern types corresponding to the two CCD data points are consistent. The consistency of the measurement pattern types can be determined by checking the exposure and development mode (patterntone) and the pattern shape of the measurement pattern. Here, the exposure and development mode of the measurement pattern refers to the exposure and development characteristics when the measurement pattern is formed, such as opaque, translucent, or semi-translucent. When the exposure and development modes are different, the corresponding measurement patterns are also different. The pattern shape refers to the shape characteristics of the measurement pattern, such as lines, pillars, or holes. When the pattern shapes are different, the corresponding measurement patterns are also different.

[0070] like Figure 4As shown in the example, when the difference Δx between the horizontal coordinates of the measurement patterns corresponding to two CCD data points is less than a set value, the corresponding measurement directions are consistent, and the corresponding CD values ​​are consistent, determining whether the measurement pattern types corresponding to the two CCD data points are consistent includes the following process: First, determine whether the exposure and development modes of the measurement patterns corresponding to the two CCD data points are consistent. If not, it indicates that the two CCD data points are inconsistent and can be merged and summarized. If yes, that is, the exposure and development modes of the measurement patterns corresponding to the two CCD data points are consistent, it indicates that the two CCD data points may still be duplicates; then, in the two CCD data points... When the exposure and development modes of the measurement patterns corresponding to the two CCD data are also consistent, further determine whether the shapes of the measurement patterns corresponding to the two CCD data are consistent. If not, it means that the measurement pattern types corresponding to the two CCD data are different, and the two CCD data are inconsistent and not duplicates, so they can be merged and summarized. If yes, it means that the two CCD data not only have a difference of Δx in the horizontal coordinates of their corresponding measurement patterns that is less than the set value, the corresponding measurement directions are consistent, the corresponding CD values ​​are consistent, and the exposure and development modes of their corresponding measurement patterns are consistent, but the shape of the patterns is also consistent. In this case, the two CCD data can be determined to be duplicates. When duplicates are found, they are removed, and one is retained and merged and summarized with other CCD data.

[0071] When determining whether the exposure and development modes and graphic shapes of the measurement patterns corresponding to the two CCD data are consistent, if the information on the exposure and development modes and / or graphic shapes is empty, an alarm message can be issued to remind the operator to check and handle the issue.

[0072] When the above process is used to check and remove duplicates from multiple CCD data entries in at least two CCD versions, multiple CCD data entries without duplicates are obtained. These multiple CCD data entries without duplicates are then merged and summarized to obtain a merged CCD version without duplicates. This merged CCD version can be stored and downloaded as needed.

[0073] Using the mask pattern data processing method described in the above embodiments, after obtaining at least two CCD versions for the same JDV layout, it checks whether there are duplicates in the multiple CCD data. If there are duplicates, the duplicates are deleted to retain one, and the CCD data without duplicates are merged and summarized. When checking for duplicates, the measurement pattern distance, measurement direction, CD value, and measurement pattern type corresponding to each CCD data can be used for filtering. Automatic checking, deletion, and merging can be achieved, solving the problems of large workload, low efficiency, and easy error in manually merging and summarizing different CCD versions.

[0074] The above description is merely a description of preferred embodiments of the present invention and is not intended to limit the scope of the present invention. Any person skilled in the art can make possible changes and modifications to the technical solutions of the present invention by utilizing the methods and techniques disclosed above without departing from the spirit and scope of the present invention. Therefore, any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solutions of the present invention shall fall within the protection scope of the technical solutions of the present invention.

Claims

1. A system for processing mask graphic data, characterized in that, include: The data acquisition module is used to acquire at least two CCD versions obtained from the detection of the same JDV layout, wherein the at least two CCD versions include multiple CCD data. as well as The data merging module is used to check whether there are duplicate items in the multiple CCD data. If there are duplicate items, the duplicate items are deleted and one item is retained. The CCD data without duplicate items are merged and summarized. Among the multiple CCD data, the measurement patterns corresponding to the two CCD data that are duplicate items are less than the set value in the set direction and the measurement direction, CD value and measurement pattern type are consistent.

2. The mask image data processing system as described in claim 1, characterized in that, Checking whether there are duplicates in the multiple CCD data sets includes: Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the same coordinate system, determine whether the distance between the measurement patterns corresponding to each CCD data and the measurement patterns corresponding to other CCD data in a set direction is less than a set value. If the distance between the measurement patterns corresponding to two CCD data is less than the set value, further determine whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all are yes, then the two CCD data are duplicates. If not all are yes, then the two CCD data are non-duplicates.

3. The mask pattern data processing system as described in claim 2, characterized in that, Determining whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data points are consistent includes: First, determine whether the measurement directions corresponding to the two CCD data are consistent. Only if the result is yes, then determine whether the CD values ​​are consistent. And only if the result is yes, then determine whether the measurement pattern types are consistent. If the measurement pattern types are also consistent, then the two CCD data are duplicates; otherwise, they are non-duplicates.

4. The mask pattern data processing system as described in claim 2, characterized in that, The data merging module includes at least one of the following units: The distance judgment unit is used to determine whether the distance between the measurement pattern corresponding to each of the CCD data and the measurement pattern corresponding to other CCD data in a set direction is less than the set value. The measurement direction determination unit is used to determine whether the measurement directions corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent. The CD value determination unit is used to determine whether the CD values ​​corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent; and The measurement pattern judgment unit is used to determine whether the measurement pattern types corresponding to two CCD data points whose distance in a set direction is less than the set value are consistent.

5. The mask pattern data processing system as described in claim 1, characterized in that, Also includes: The approval and upload module is used to approve and upload the CCD versions that will be merged from different departments to a designated storage location.

6. The mask graphic data processing system as described in claim 1, characterized in that, The data merging module includes: The version confirmation unit is used to determine whether the product identification code and mask identification code of the at least two CCD versions are the same. Only when the product identification code and mask identification code are the same, it checks whether there are duplicate items in the multiple CCD data. Otherwise, it stops checking and outputs the corresponding alarm information.

7. A method for processing mask graphic data, characterized in that, include: Obtain at least two CCD versions detected for the same JDV layout, wherein the at least two CCD versions include multiple CCD data; as well as Check whether there are duplicates in the multiple CCD data. If there are duplicates, delete the duplicates and keep one. Then merge and summarize the CCD data without duplicates. Among the multiple CCD data, the measurement patterns corresponding to the two CCD data that are duplicates are less than the set value in the set direction and have the same measurement direction, CD value and measurement pattern type.

8. The mask pattern data processing method as described in claim 7, characterized in that, Before checking whether there are duplicates in the multiple CCD data, the process also includes: Determine whether the product identification code and mask identification code of the at least two CCD versions are the same. Only if the product identification code and mask identification code are the same, check whether there are duplicate items in the multiple CCD data. Otherwise, stop the check and output the corresponding alarm information.

9. The mask pattern data processing method as described in claim 7, characterized in that, Checking whether there are duplicates in the multiple CCD data sets includes: Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in the same coordinate system, determine whether the distance between the measurement patterns corresponding to each CCD data and the measurement patterns corresponding to other CCD data in a set direction is less than a set value. If the distance between the measurement patterns corresponding to two CCD data is less than the set value, further determine whether the measurement directions, CD values, and measurement pattern types corresponding to the two CCD data are consistent. If all are yes, then the two CCD data are duplicates. If not all are yes, then the two CCD data are non-duplicates.

10. The mask graphic data processing method as described in claim 9, characterized in that, Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data point in the same coordinate system, determining whether the distance between the measurement patterns corresponding to each CCD data point and the measurement patterns corresponding to other CCD data points in a set direction is less than the set value includes: Based on the coordinates of the center points of the measurement patterns corresponding to each CCD data in a single CCD version in the same coordinate system, determine whether the distance between the measurement pattern corresponding to each CCD data in a single CCD version and the measurement patterns corresponding to other CCD data in a set direction is less than the set value. Based on the premise that there are no duplicate CCD data in the single CCD version, and according to the coordinates of the center points of the measurement patterns corresponding to the two CCD data selected from the two CCD versions in the same coordinate system, it is determined whether the distance between the measurement patterns corresponding to the two CCD data in the set direction is less than the set value.

11. The mask image data processing method as described in claim 9, characterized in that, Determining whether the CD values ​​corresponding to the two CCD data points are consistent includes: Determine whether the difference between the CD values ​​corresponding to the two CCD data points is less than the measurement error. If yes, the CD values ​​corresponding to the two CCD data points are consistent; otherwise, the CD values ​​corresponding to the two CCD data points are inconsistent.

12. The mask image data processing method as described in claim 9, characterized in that, Determining whether the measurement pattern types corresponding to the two CCD data points are consistent includes: Determine whether the exposure and development modes of the measurement patterns corresponding to the two CCD data are consistent. If not, the measurement pattern types corresponding to the two CCD data are inconsistent. If yes, further determine whether the graphic shapes of the measurement patterns corresponding to the two CCD data are consistent. When the graphic shapes are also consistent, the measurement pattern types corresponding to the two CCD data are consistent. When the graphic shapes are inconsistent, the measurement pattern types corresponding to the two CCD data are inconsistent.

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