A carrier plate non-contact etching device and a carrier plate etching method

Abstract

The application relates to the technical field of etching devices, in particular to a non-contact etching device for a carrier plate and an etching method for a carrier plate. The technical scheme comprises a conveying mechanism, multiple groups of spraying pipes and a liquid suction and discharge unit arranged between adjacent spraying pipes. The liquid suction and discharge unit comprises a relatively inclined air flow accumulation assembly, a liquid suction pipe, a vertical air knife and two side dust hoods. The middle etching liquid is accumulated by the air knife and is actively sucked away by the liquid suction pipe, the residual liquid film is scattered by the vertical air knife and is sucked away by the dust hoods. The side sealing structure limits the outflow of the liquid, and the self-adaptive floating lifting mechanism adjusts the position of the liquid suction pipe according to the liquid level in real time. The application can actively discharge the etching liquid in the middle of the carrier plate, prevent the etching liquid from flowing to the edge and realize uniform etching.

Description

Technical Field

[0001] This invention relates to the field of etching apparatus technology, and in particular to a non-contact etching apparatus and method for etching a substrate. Background Technology

[0002] Existing non-contact etching apparatuses typically include a conveyor mechanism that carries and horizontally transports the substrate, and multiple sets of spray pipes arranged at intervals above the conveyor mechanism along the transport direction. The spray pipes spray etching solution onto the substrate surface, and the substrate passes through each spray area sequentially to achieve continuous etching.

[0003] However, during actual etching, the etchant sprayed into the center of the substrate gradually flows and diffuses towards the edges due to factors such as gravity, surface tension, and transport motion. This results in a longer residence time and greater reaction volume of the etchant at the edges compared to the center, leading to a significantly higher etching depth at the edges and severely affecting the etching uniformity across the entire substrate. Existing devices lack effective means to suppress the lateral migration of the liquid in the center. Summary of the Invention

[0004] The purpose of this application is to address the problems existing in the background art by proposing a non-contact etching device and method for substrates that can actively control the discharge of etching solution and avoid excessive etching at the edges.

[0005] On one hand, this application proposes a non-contact etching apparatus for a carrier plate, including a conveying mechanism for carrying and horizontally transporting the carrier plate, multiple sets of spray pipes disposed above the conveying mechanism and spaced apart along the conveying direction, and further including: At least one liquid suction and drainage unit is disposed between two adjacent sets of spray pipes, the liquid suction and drainage unit comprising: The airflow accumulation assembly includes a first air knife and a second air knife. The air outlet directions of the first air knife and the second air knife are opposite and inclined downwards, which accumulates the etching solution on the carrier plate into the middle area between the two air knives, so that the liquid level in the middle area is higher than that in the surrounding area. A suction tube installed between the first and second air knives for sucking up the etching solution accumulated in the intermediate region; An airflow agitation assembly is located behind the liquid suction pipe along the conveying direction. The airflow agitation assembly includes a vertical air knife with the air outlet direction perpendicular to the surface of the carrier plate, and dust suction hoods are located on both sides of the vertical air knife for sucking up small droplets. Optionally, the lower opening of the suction tube is located in the area between the first air knife and the second air knife.

[0006] Optionally, the angle between the air outlet direction of the first air knife and the surface of the carrier plate is 15°-45°, and the horizontal distance between the air outlets of the first air knife and the second air knife is 20-100 mm.

[0007] Optionally, the airflow pressure of the vertical air knife is higher than that of the first and second air knives, and the outlet width of the vertical air knife is 0.5-2 mm.

[0008] Optionally, it also includes a sealing structure located on both sides of the liquid absorption and drainage unit, the sealing structure restricting the etching solution from flowing out from the side of the carrier plate.

[0009] Optionally, the sealing structure includes a base fixedly disposed thereon, at least two slide rods slidably mounted on the base, a mounting box fixedly mounted on the slide rods, and a transmission belt mounted on the mounting box. The transmission belt includes a belt body that contacts the side of the liquid suction and drainage unit and two pulleys.

[0010] Optionally, the mounting box is equipped with a power component for driving the transmission belt. The power component includes a motor base fixedly mounted on the mounting box, a servo motor fixedly mounted on the motor base, a drive gear fixedly mounted on the servo motor, and a driven gear fixedly mounted on one of the pulleys and coaxially arranged. The driven gear meshes with the drive gear. A first push rod motor is fixedly installed on one side of the base, and the output shaft of the first push rod motor is fixedly connected to the mounting box.

[0011] Optionally, it also includes an adaptive floating lifting mechanism applied to the suction tube for adjusting the height of the lower opening of the suction tube in real time according to the height of the etching solution level; The adaptive floating lifting mechanism includes a detection component for detecting the height between the suction tube and the etching solution, and an adjustment component for driving the suction tube to rise and fall according to the detection data.

[0012] Optionally, the detection assembly includes multiple substrates fixedly mounted on the suction tube, multiple balls rotatably mounted inside the substrates, a detection rod slidably mounted inside the substrates via the balls, a connector fixedly mounted on the detection rod, and a floating plate adhered to the connector. A magnet is fixedly mounted on the detection rod, a Hall sensor is fixedly mounted inside the substrate, a limiting ring is provided inside the substrate, and a support ring is provided on the detection rod. The adjustment assembly includes a second push rod motor fixedly mounted above the spray pipe, and the output shaft of the second push rod motor is fixedly connected to the suction pipe via a connecting seat.

[0013] On the other hand, this application proposes a substrate etching method, applied to the above-described substrate non-contact etching apparatus, comprising the following steps: Step 1: Start the conveying mechanism to move the carrier plate horizontally, and at the same time turn on the spray pipe to spray the etching liquid onto the surface of the carrier plate. When the carrier plate moves to the bottom of the liquid suction and drainage unit, the first air knife and the second air knife spray gas in a relatively inclined direction, which will cause the etching liquid in the middle of the carrier plate to accumulate in the middle area between the two air knives. At the same time, the transmission belt of the sealing structure adheres to the side of the carrier plate and moves synchronously to prevent the liquid from flowing out from the side. Step 2: The floating plate in the detection component floats on the surface of the liquid in the accumulation area. The Hall sensor detects the liquid level height signal and transmits it to the adjustment component. The second push rod motor drives the suction pipe to rise and fall, keeping the lower opening of the suction pipe below the liquid surface, and starts the negative pressure suction to draw up the accumulated etching solution. Step 3: Behind the suction tube along the conveying direction, the vertical air knife sprays high-pressure airflow vertically onto the surface of the carrier plate, breaking the thin layer of etching solution remaining after suction into small droplets. At the same time, the dust suction hoods on both sides of the vertical air knife generate negative pressure, drawing away the small droplets with the airflow, thus drying the surface of the carrier plate. Step 4: The carrier plate continues to move, passing through the subsequent spray pipes and liquid suction and drainage units in sequence, repeating steps 1 to 3 until the entire etching process is completed and a uniform etching depth is obtained.

[0014] In summary, this application includes at least one of the following beneficial technical effects: This application uses a liquid suction and drainage unit set between adjacent spray pipes to actively accumulate the etching liquid in the middle of the carrier plate towards the middle area using a relatively inclined air knife. The liquid suction pipe driven by the adaptive floating lifting mechanism is used to remove the accumulated liquid, thus avoiding the liquid in the middle from passively flowing to the edge. At the same time, the vertical air knife breaks the residual liquid film into small droplets and is sucked away by the dust hood, achieving complete drainage. The side sealing structure physically prevents the liquid from overflowing to both sides of the carrier plate, and the transmission belt can move synchronously with the carrier plate, which not only ensures the sealing effect but also avoids friction damage. The adaptive floating lifting mechanism can track changes in liquid level in real time, keeping the suction pipe at the optimal suction depth and effectively overcoming interference from gas source fluctuations and changes in liquid properties. This device enables active and controllable discharge of etching solution in the middle of the carrier plate, completely eliminating the problem of excessive edge etching caused by lateral liquid migration, significantly improving the etching uniformity of the entire plate surface, and also has the ability to quickly adapt to carrier plates of different widths, and operates stably and reliably. Attached Figure Description

[0015] Figure 1 Schematic diagram of the etching apparatus Figure 1 ; Figure 2 Schematic diagram of the etching apparatus Figure 2 ; Figure 3 for Figure 1 A magnified view of a section at point A in the middle; Figure 4 for Figure 1 A magnified view of a section at point B in the middle; Figure 5 This is a schematic diagram of the detection component. Figure 6 Schematic diagram of the sealing structure Figure 1 ; Figure 7 Schematic diagram of the sealing structure Figure 2 ; Figure 8 for Figure 7 A magnified view of a section at point C.

[0016] Reference numerals: 1. Carrier plate; 2. Conveying mechanism; 3. Spray pipe; 4. Liquid suction and discharge unit; 41. Airflow accumulation assembly; 411. First air knife; 412. Second air knife; 413. Liquid suction pipe; 42. Airflow fragmentation assembly; 421. Vertical air knife; 422. Dust suction hood; 5. Adaptive floating lifting mechanism; 51. Detection assembly; 511. Base; 512. Detection rod; 513. Connector; 514. Floating plate; 515. 516. Magnet; 517. Hall sensor; 518. Ball bearing; 519. Limiting ring; 52. Support ring; 53. Adjustment assembly; 54. Second push rod motor; 55. Connecting seat; 66. Sealing structure; 67. Base; 68. Slide rod; 69. Mounting box; 60. Transmission belt; 61. Power component; 62. Motor base; 63. Servo motor; 64. Drive gear; 65. Driven gear; 66. First push rod motor. Detailed Implementation

[0017] The technical solution of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0018] like Figure 1 and Figure 2 As shown, the present application proposes a non-contact etching apparatus for a carrier plate, including a conveying mechanism 2 for carrying and horizontally conveying the carrier plate 1, and multiple sets of spray pipes 3 arranged above the conveying mechanism 2 and spaced apart along the conveying direction. The spray pipes 3 are used to uniformly spray etching liquid onto the upper surface of the carrier plate 1. The conveying mechanism 2 drives the carrier plate 1 to pass under each spray pipe 3 in sequence to achieve continuous etching. However, in the prior art, the etching liquid in the middle of the carrier plate 1 will naturally flow to the edge, resulting in the edge etching depth being greater than that in the center, which seriously affects the etching uniformity.

[0019] like Figures 1 to 4As shown, the etching apparatus of this embodiment also includes at least one liquid suction and drainage unit 4 disposed between two adjacent sets of spray pipes 3. The liquid suction and drainage unit 4 includes an airflow accumulation assembly 41, including a first air knife 411 and a second air knife 412. The air outlet directions of the first air knife 411 and the second air knife 412 are opposite and inclined downward, accumulating the etching liquid on the carrier plate 1 into the middle area between the two air knives, so that the liquid level in the middle area is higher than that in the surrounding area. The angle between the air outlet directions of the first air knife 411 and the second air knife 412 and the surface of the carrier plate 1 is 15°-45°. The horizontal distance between the air outlets of the first air knife 411 and the second air knife 412 is 20-100 mm. Through the two relatively inclined airflows, an aerodynamic dam is formed in the middle of the carrier plate 1, forcing the etching liquid that would naturally diffuse to the edge to accumulate in the middle area, thereby actively preventing the liquid in the middle from flowing to the edge. This can suppress the main cause of excessive edge etching from the source, so that the subsequent liquid suction operation can be concentrated in the local high liquid level area, greatly improving the liquid drainage efficiency.

[0020] Furthermore, the etching apparatus also includes a suction pipe 413 installed between the first air knife 411 and the second air knife 412 for suctioning the etching solution accumulated in the middle region. The lower opening of the suction pipe 413 is located in the middle region between the first air knife 411 and the second air knife 412. The suction pipe 413 acts directly on the highest accumulation area of ​​the liquid, and actively removes the accumulated etching solution by using negative pressure. Compared with the traditional natural overflow drainage, it can controllably and quantitatively remove the liquid in the middle, avoiding the liquid from passively flowing to the edge and causing excessive etching at the edge. At the same time, since the suction pipe 413 is located between the two air knives, the airflow of the air knives can also prevent the external liquid from flowing back into the area, ensuring the suction effect.

[0021] The etching apparatus also includes an airflow agitation assembly 42 disposed behind the suction pipe 413 along the conveying direction. The airflow agitation assembly 42 includes a vertical air knife 421 with its outlet direction perpendicular to the surface of the carrier plate 1, and dust suction hoods 422 disposed on both sides of the vertical air knife 421 for suctioning small droplets. The airflow pressure of the vertical air knife 421 is higher than that of the first air knife 411 and the second air knife 412, and the outlet width of the vertical air knife 421 is 0.5-2 mm. Although the suction tube 413 removes most of the accumulated etching solution, a very thin liquid film will still remain on the surface of the carrier plate 1. This liquid film may still flow towards the edge. The vertical air knife 421 impacts the residual liquid film vertically with high pressure, breaking it into small droplets. These small droplets are small in mass and easily dispersed with the airflow. They are then drawn away by the negative pressure of the dust suction hoods 422 on both sides. The residual liquid can be completely removed by the two-step method of breaking and suction, ensuring that there is no free-flowing etching solution on the surface of the carrier plate 1 before entering the next spray zone, thereby avoiding cumulative edge over-etching.

[0022] like Figure 2 and Figures 6 to 8As shown, the etching apparatus of this embodiment also includes a sealing structure 6 disposed on both sides of the liquid suction and drainage unit 4. The sealing structure 6 restricts the etching solution from flowing out from the side of the carrier plate 1. Some of the etching solution may still diffuse along the width direction of the carrier plate 1 to the two sides, causing the liquid to remain in the side area for too long, which also causes excessive etching at the edges. The sealing structure 6 physically blocks the liquid from flowing out to the side and confines the liquid within the effective range of the liquid suction and drainage unit 4, which significantly improves the ability to suppress the lateral migration of liquid.

[0023] Furthermore, the sealing structure 6 includes a base 61 fixedly mounted thereon, at least two sliding rods 62 slidably mounted on the base 61, a mounting box 63 fixedly mounted on the sliding rods 62, and a transmission belt 64 mounted on the mounting box 63. The transmission belt 64 includes a belt body that contacts the side of the liquid suction and discharge unit 4 and two pulleys. The belt body of the transmission belt 64 is in contact with the side of the carrier plate 1. On the one hand, it acts as a movable baffle to prevent the liquid from flowing out laterally. On the other hand, the transmission belt 64 is driven to rotate by the power component 65 so that its linear speed is the same as the conveying speed of the conveying mechanism 2, thereby forming a contact with the side of the carrier plate 1 without relative movement. This ensures the sealing effect and avoids the frictional resistance and scratch risk between the fixed baffle and the moving carrier plate 1.

[0024] The mounting box 63 is equipped with a power component 65 that drives the transmission belt 64. The power component 65 includes a motor base 651 fixedly mounted on the mounting box 63, a servo motor 652 fixedly mounted on the motor base 651, a drive gear 653 fixedly mounted on the servo motor 652, and a driven gear 654 fixedly mounted on one of the pulleys and coaxially arranged. The driven gear 654 meshes with the drive gear 653. The servo motor 652 drives the pulley to rotate through the gear pair, thereby driving the transmission belt 64 to run at a precise and controllable linear speed. By controlling the speed of the servo motor 652, the linear speed of the transmission belt 64 can always match the actual conveying speed of the conveying mechanism 2, achieving synchronous follow-up and ensuring the reliability and stability of the sealing.

[0025] Furthermore, a first push rod motor 66 is fixedly installed on one side of the base 61. The output shaft of the first push rod motor 66 is fixedly connected to the mounting box 63. The first push rod motor 66 can push the mounting box 63 to move horizontally along the slide rod 62, thereby adjusting the spacing between the two transmission belts 64. When replacing the carrier plate 1 with a different width, it is only necessary to control the extension and retraction of the first push rod motor 66 to make the sealing structure 6 adaptively fit the side of the new carrier plate 1.

[0026] like Figures 2 to 5As shown, the etching apparatus also includes an adaptive floating lifting mechanism 5 applied to the suction tube 413 for real-time adjustment of the height of the lower opening of the suction tube 413 according to the height of the etching solution. The adaptive floating lifting mechanism 5 includes a detection component 51 for detecting the height between the suction tube 413 and the etching solution and an adjustment component 52 for driving the suction tube 413 to rise and fall according to the detection data. During the gas flow accumulation process, the air pressure fluctuation of the air knife, the viscosity change of the etching solution, or the fluctuation of the conveying speed of the carrier plate 1 will all cause the liquid level height in the middle area to change in real time. If the lower opening of the suction tube 413 is fixed, air may be sucked in when the liquid level is too high, resulting in suction failure. When the liquid level is too low, the liquid cannot be touched. The adaptive floating lifting mechanism 5 can dynamically track the liquid level height, so that the lower end of the suction tube 413 is always kept at the optimal suction depth, ensuring stable and reliable liquid discharge.

[0027] Furthermore, the detection assembly 51 includes multiple substrates 511 fixedly mounted on the suction tube 413, multiple balls 517 rotatably mounted inside the substrates 511, a detection rod 512 slidably mounted inside the substrates 511 via the balls 517, a connector 513 fixedly mounted on the detection rod 512, and a floating plate 514 bonded to the connector 513. A magnet 515 is fixedly mounted on the detection rod 512, a Hall sensor 516 is fixedly mounted inside the substrates 511, a limiting ring 518 is provided inside the substrates 511, and a support ring 519 is provided on the detection rod 512. The floating plate 514 is made of a lightweight and corrosion-resistant material, such as polytetrafluoroethylene, and floats directly on the surface of the etching solution. When the liquid level changes, the floating plate 514 drives the detection rod 512 to slide up and down inside the substrates 511 via the balls 517. The relative position of the magnet 515 and the Hall sensor 516 changes, and the Hall sensor 516 outputs a corresponding liquid level signal. The ball bearing 517 significantly reduces sliding resistance and ensures detection sensitivity. The limiting ring 518 cooperates with the support ring 519 to prevent the detection rod 512 from descending excessively and causing the floating plate 514 to collide with the surface of the carrier plate 1, thus avoiding damage to the carrier plate 1 or the floating plate 514.

[0028] The adjustment component 52 includes a second push rod motor 521 fixedly installed above the spray pipe 3. The output shaft of the second push rod motor 521 is fixedly connected to the suction pipe 413 through the connecting seat 522. The second push rod motor 521 receives the liquid level signal from the Hall sensor 516 and drives the suction pipe 413 to rise and fall, so that the lower opening of the suction pipe 413 is always located at the optimal suction position 1-5 mm below the liquid surface, ensuring that the suction pipe 413 always works efficiently.

[0029] Working principle: The conveying mechanism 2 drives the carrier plate 1 to move horizontally, passing through multiple sets of spray pipes 3 and liquid suction and drainage units 4 in sequence. In each set of liquid suction and drainage units 4, the first air knife 411 and the second air knife 412 first accumulate etching liquid in the middle, and the sealing structure 6 prevents liquid from overflowing from the side. The adaptive floating lifting mechanism 5 adjusts the suction pipe 413 to the optimal position according to the real-time liquid level height, actively removes the accumulated liquid, and then the vertical air knife 421 breaks the residual liquid film into small droplets, and the dust suction hoods on both sides 422 completely remove the droplets. After being processed by this unit, excess etching solution in the middle of the surface of the carrier board 1 is actively removed, and no liquid flows to the edge, so that the liquid is evenly distributed when entering the next spray zone, and finally uniform etching is achieved on the entire board surface.

[0030] Please see Figures 1 to 8 As shown, this embodiment proposes a substrate etching method, applied to the above-mentioned substrate non-contact etching apparatus, including the following steps: Step 1: Start the conveying mechanism 2 to move the carrier plate 1 horizontally, and at the same time turn on the spray pipe 3 to spray the etching liquid onto the surface of the carrier plate 1; when the carrier plate 1 moves to the bottom of the liquid suction and drainage unit 4, the first air knife 411 and the second air knife 412 spray gas in a relatively inclined direction, and accumulate the etching liquid in the middle of the carrier plate 1 into the middle area between the two air knives. At the same time, the transmission belt 64 of the sealing structure 6 adheres to the side of the carrier plate 1 and moves synchronously to prevent the liquid from flowing out from the side. Step 2: The floating plate 514 in the detection component 51 floats on the surface of the liquid in the accumulation area. The Hall sensor 516 detects the liquid level height signal and transmits it to the adjustment component 52. The second push rod motor 521 drives the suction pipe 413 to rise and fall, so that the lower opening of the suction pipe 413 is kept below the liquid surface, and the negative pressure suction of the accumulated etching solution is started. Step 3: Behind the suction pipe 413 along the conveying direction, the vertical air knife 421 sprays high-pressure airflow vertically onto the surface of the carrier plate 1, breaking the thin layer of etching liquid remaining after suction into small droplets. At the same time, the dust suction hoods 422 on both sides of the vertical air knife 421 generate negative pressure, which draws away the small droplets with the airflow, thereby drying the surface of the carrier plate 1. Step 4: The carrier plate 1 continues to move, passing through the subsequent spray pipe 3 and liquid suction and drainage unit 4 in sequence, repeating steps one to three until the entire etching process is completed and a uniform etching depth is obtained.

[0031] The above specific embodiments are merely several optional embodiments of the present invention. Based on the technical solutions of the present invention and the relevant teachings of the above embodiments, those skilled in the art can make various alternative improvements and combinations to the above specific embodiments.

Claims

1. A non-contact etching apparatus for a carrier plate, comprising a conveying mechanism (2) for carrying and horizontally conveying the carrier plate (1), and multiple sets of spray pipes (3) disposed above the conveying mechanism (2) and spaced apart along the conveying direction, characterized in that, Also includes: At least one liquid suction and drainage unit (4) is disposed between two adjacent sets of spray pipes (3), the liquid suction and drainage unit (4) comprising: The airflow accumulation assembly (41) includes a first air knife (411) and a second air knife (412). The air outlet directions of the first air knife (411) and the second air knife (412) are opposite and inclined downward, so that the etching liquid on the carrier plate (1) is accumulated in the middle area between the two air knives, making the liquid level in the middle area higher than that in the surrounding area. A suction tube (413) is installed between the first air knife (411) and the second air knife (412) to suck up the etching solution accumulated in the middle area. An airflow breaking assembly (42) is disposed behind the liquid suction pipe (413) along the conveying direction. The airflow breaking assembly (42) includes a vertical air knife (421) with the air outlet direction perpendicular to the surface of the carrier plate (1) and dust suction hoods (422) disposed on both sides of the vertical air knife (421) for sucking up small droplets.

2. The non-contact etching apparatus for a carrier plate according to claim 1, characterized in that, The lower opening of the suction tube (413) is located in the area between the first air knife (411) and the second air knife (412).

3. The non-contact etching apparatus for a carrier plate according to claim 2, characterized in that, The angle between the air outlet direction of the first air knife (411) and the surface of the carrier plate (1) is 15°-45°. The horizontal distance between the air outlets of the first air knife (411) and the second air knife (412) is 20-100 mm.

4. The non-contact etching apparatus for a carrier plate according to claim 3, characterized in that, The airflow pressure of the vertical air knife (421) is higher than that of the first air knife (411) and the second air knife (412), and the width of the air outlet of the vertical air knife (421) is 0.5-2 mm.

5. The non-contact etching apparatus for a carrier plate according to claim 4, characterized in that, It also includes a sealing structure (6) located on both sides of the liquid absorption and drainage unit (4), the sealing structure (6) restricting the etching solution from flowing out from the side of the carrier plate (1).

6. The non-contact etching apparatus for a carrier plate according to claim 5, characterized in that, The sealing structure (6) includes a base (61) fixedly mounted thereon, at least two slide rods (62) slidably mounted on the base (61), a mounting box (63) fixedly mounted on the slide rods (62), and a transmission belt (64) mounted on the mounting box (63). The transmission belt (64) includes a belt body that contacts the side of the liquid suction and discharge unit (4) and two pulleys.

7. The non-contact etching apparatus for a carrier plate according to claim 6, characterized in that, The mounting box (63) is equipped with a power component (65) for driving the transmission belt (64) to move. The power component (65) includes a motor base (651) fixedly mounted on the mounting box (63), a servo motor (652) fixedly mounted on the motor base (651), a drive gear (653) fixedly mounted on the servo motor (652), and a driven gear (654) fixedly mounted on one of the pulleys and coaxially arranged. The driven gear (654) meshes with the drive gear (653). A first push rod motor (66) is fixedly installed on one side of the base (61), and the output shaft of the first push rod motor (66) is fixedly connected to the mounting box (63).

8. The non-contact etching apparatus for a carrier plate according to claim 1, characterized in that, It also includes an adaptive floating lifting mechanism (5) applied to the suction tube (413) for adjusting the height of the lower opening of the suction tube (413) in real time according to the height of the etching solution level. The adaptive floating lifting mechanism (5) includes a detection component (51) for detecting the height between the suction tube (413) and the etching solution, and an adjustment component (52) for driving the suction tube (413) to rise and fall according to the detection data.

9. The non-contact etching apparatus for a carrier plate according to claim 8, characterized in that, The detection assembly (51) includes multiple substrates (511) fixedly mounted on the suction tube (413), multiple balls (517) rotatably mounted inside the substrates (511), a detection rod (512) slidably mounted inside the substrates (511) via the balls (517), a connector (513) fixedly mounted on the detection rod (512), and a floating plate (514) bonded to the connector (513). A magnet (515) is fixedly mounted on the detection rod (512), a Hall sensor (516) is fixedly mounted inside the substrates (511), a limiting ring (518) is provided inside the substrates (511), and a support ring (519) is provided on the detection rod (512). The adjustment assembly (52) includes a second push rod motor (521) fixedly installed above the spray pipe (3), and the output shaft of the second push rod motor (521) is fixedly connected to the suction pipe (413) through a connecting seat (522).

10. A substrate etching method, applied to the substrate non-contact etching apparatus of claim 9, characterized in that, Includes the following steps: Step 1: Start the conveying mechanism (2) to move the carrier plate (1) horizontally, and at the same time turn on the spray pipe (3) to spray the etching liquid onto the surface of the carrier plate (1). When the carrier plate (1) moves to the bottom of the liquid suction and drainage unit (4), the first air knife (411) and the second air knife (412) spray gas in a relatively inclined direction, and accumulate the etching liquid in the middle of the carrier plate (1) into the middle area between the two air knives. At the same time, the transmission belt (64) of the sealing structure (6) adheres to the side of the carrier plate (1) and moves synchronously to prevent the liquid from flowing out from the side. Step 2: The floating plate (514) in the detection component (51) floats on the liquid surface of the accumulation area. The Hall sensor (516) detects the liquid level height signal and transmits it to the adjustment component (52). The second push rod motor (521) drives the suction tube (413) to rise and fall, so that the lower opening of the suction tube (413) is kept below the liquid surface, and the negative pressure suction of the accumulated etching liquid is started. Step 3: Behind the suction tube (413) along the conveying direction, the vertical air knife (421) sprays high-pressure airflow vertically onto the surface of the carrier plate (1) to break the thin layer of etching liquid remaining after suction into small droplets. At the same time, the dust suction hoods (422) on both sides of the vertical air knife (421) generate negative pressure to draw away the small droplets with the airflow, thereby drying the surface of the carrier plate (1). Step 4: The carrier plate (1) continues to move, passing through the subsequent spray pipe (3) and liquid suction and drainage unit (4) in sequence, repeating steps one to three until all etching processes are completed and a uniform etching depth is obtained.

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