Photovoltaic module and method for producing an electrically conductive composite film

Abstract

This application provides a method for preparing a photovoltaic module and a conductive composite thin film, relating to the field of photovoltaic technology. The photovoltaic module provided by this application includes: a backsheet; solar cells stacked on the backsheet; photovoltaic glass stacked on the solar cells; a conductive composite thin film including an anti-reflection layer, a conductive layer, and a protective layer, wherein the anti-reflection layer is disposed on the surface of the photovoltaic glass, the conductive layer is disposed on the surface of the anti-reflection layer, and the protective layer is disposed on the surface of the conductive layer; electrodes disposed on the photovoltaic glass and electrically connected to the conductive layer, used to input alternating current to the conductive layer; and a controller electrically connected to the electrodes and the solar cells, the controller being used at least to adjust the voltage and frequency of the alternating current input to the conductive layer to form an alternating electric field for dust removal. This application provides a method for preparing a photovoltaic module and a conductive composite thin film, which has good dust removal effect, long service life, and convenient dust removal.

Description

Technical Field

[0001] This application relates to the field of photovoltaic technology, and in particular to a method for preparing a photovoltaic module and a conductive composite thin film. Background Technology

[0002] When solar photovoltaic modules are used outdoors for extended periods, their surfaces easily accumulate pollutants such as dust and particulate matter. This dust accumulation not only blocks sunlight, reducing the light intensity received by the cells, but also causes electrostatic adsorption due to the high surface resistance of the photovoltaic glass. Combined with capillary adhesion in humid environments, this further exacerbates dust buildup, ultimately leading to a significant decrease in the power generation efficiency of the photovoltaic modules.

[0003] Currently, the industry mainly employs three technical approaches to prevent dust accumulation and clean photovoltaic modules: structural optimization, passive protective coatings, and active cleaning equipment. Among these, structural optimization solutions such as frameless and flush-frame designs can only improve dust accumulation in localized dead corners, offering limited improvement. Passive coatings, such as superhydrophilic, photocatalytic, and antistatic coatings, can only reduce initial dust adhesion to a certain extent, but cannot remove stubborn dust that has already adhered firmly. Their effectiveness is extremely poor in arid regions, and traditional organic coatings have poor UV aging resistance, with a lifespan of only 2 to 3 years, far short of the designed service life of 25 to 30 years for photovoltaic modules. Active cleaning technologies typically involve directly cleaning the surface of the photovoltaic modules using cleaning robots and high-pressure water washing, which is time-consuming and labor-intensive.

[0004] In summary, providing a photovoltaic module that balances dust removal efficiency, service life, and ease of cleaning is a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0005] This application provides a method for preparing photovoltaic modules and conductive composite films, which has good dust removal effect, long service life and convenient dust removal.

[0006] To achieve the above objectives, this application provides the following technical solution:

[0007] This application provides a photovoltaic module, including:

[0008] Back panel;

[0009] The battery cells are stacked on the backplate;

[0010] Photovoltaic glass is stacked on top of solar cells;

[0011] A conductive composite film includes an antireflective layer, a conductive layer, and a protective layer. The antireflective layer is disposed on the surface of a photovoltaic glass, the conductive layer is disposed on the surface of the antireflective layer, and the protective layer is disposed on the surface of the conductive layer.

[0012] Electrodes are disposed on photovoltaic glass and electrically connected to the conductive layer, and are used to input alternating current into the conductive layer;

[0013] The controller, electrically connected to the electrodes and the battery cells, is used at least to regulate the voltage and frequency of the alternating current input to the conductive layer to form an alternating electric field for dust removal.

[0014] As an optional implementation, the antireflection layer includes a first antireflection layer and a second antireflection layer. The first antireflection layer is disposed on the surface of the photovoltaic glass, and the second antireflection layer is disposed on the surface of the first antireflection layer. The first antireflection layer is made of titanium dioxide, and the second antireflection layer is made of silicon dioxide.

[0015] As an optional implementation, the thickness of the first antireflection layer is 30nm-50nm, and the thickness of the second antireflection layer is 70nm-90nm.

[0016] As an optional implementation, the conductive layer is formed by a composite of zinc oxide and aluminum oxide, with the aluminum oxide accounting for 1%-3% by mass.

[0017] As an optional implementation, the thickness of the conductive layer is 40-60 nm.

[0018] As an optional implementation, the protective layer is formed by a composite of silicon dioxide and titanium dioxide, with the mass ratio of silicon dioxide in the protective layer being 60%-65%.

[0019] As an optional implementation, the thickness of the protective layer is 20-30 nm.

[0020] Secondly, this application also provides a method for preparing a conductive composite thin film, used to prepare the conductive composite thin film in the photovoltaic module of the first aspect, comprising the following steps:

[0021] The photovoltaic glass surface in the photovoltaic module is cleaned and subjected to plasma surface treatment, and then heated in a vacuum environment;

[0022] Titanium dioxide is deposited onto the surface of photovoltaic glass using a magnetron sputtering process to form the first antireflection layer;

[0023] Silicon dioxide is deposited onto the surface of the first antireflection layer using a magnetron sputtering process to form the second antireflection layer;

[0024] A composite of zinc oxide and aluminum oxide is deposited onto the surface of the second antireflection layer using a magnetron sputtering process to form a conductive layer.

[0025] A protective layer is formed by coating a composite of silica and titanium dioxide onto the surface of a conductive layer using a sol-gel method.

[0026] As an optional implementation, the surface of the photovoltaic glass in the photovoltaic module is cleaned and subjected to plasma surface treatment, and then heated in a vacuum environment, specifically including:

[0027] The surface of the photovoltaic glass was cleaned sequentially with a sodium hydroxide solution of 4%-6% by mass, a hydrogen fluoride solution of 1%-3% by mass, and deionized water.

[0028] The surface of the cleaned photovoltaic glass is treated with argon plasma.

[0029] Photovoltaic glass is heated to 210℃-230℃ in a vacuum environment.

[0030] As an optional implementation method, a composite of silica and titanium dioxide is coated onto the surface of a conductive layer to form a protective layer by means of a sol-gel method. Specifically, this includes: preparing a silica and titanium dioxide composite sol using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent and hydrochloric acid as catalyst, and coating the prepared silica and titanium dioxide composite sol onto the surface of the conductive layer by a roller coating method to form a protective layer.

[0031] This application creates a controllable alternating electric field dust removal structure by setting a conductive composite film consisting of an anti-reflection layer, a conductive layer, and a protective layer on the surface of the photovoltaic glass of a photovoltaic module, and combining it with an electrode and controller structure. The anti-reflection layer optimizes the light transmission performance of the photovoltaic glass, ensuring the light absorption efficiency of the cells and preventing the coating structure from affecting the module's power generation performance. The conductive layer generates an alternating electric field under the action of the electrode power supply, thereby peeling off the adhering dust on the surface of the photovoltaic module through the synergistic effect of electric field force and dielectric force, achieving efficient and automated dust removal with a highly convenient process. The protective layer protects the internal conductive layer, thereby improving the overall structural stability and service life. The controller can precisely adjust the voltage and frequency of the alternating current to adapt to the dust removal needs of different dust accumulation conditions, thus ensuring a good dust removal effect. Attached Figure Description

[0032] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0033] Figure 1 A schematic diagram of the photovoltaic module provided in the embodiments of this application;

[0034] Figure 2 for Figure 1 Enlarged view of point A in the middle;

[0035] Figure 3 This is a schematic flowchart illustrating the preparation method of the conductive composite thin film provided in the embodiments of this application.

[0036] Explanation of reference numerals in the attached figures:

[0037] 100. Photovoltaic module; 110. Backsheet; 120. Solar cell; 130. Photovoltaic glass; 140. Conductive composite film; 141. First antireflective layer; 142. Second antireflective layer; 143. Conductive layer; 144. Protective layer; 150. Electrode; 160. Controller. Detailed Implementation

[0038] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0039] In this application, the terms “upper,” “lower,” “left,” “right,” “front,” “back,” “top,” “bottom,” “inner,” “outer,” “vertical,” “horizontal,” “lateral,” and “longitudinal” indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated devices, elements, or components to having a specific orientation, or to be constructed and operated in a specific orientation.

[0040] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0041] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0042] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0043] Currently, the industry mainly employs three technical approaches to prevent dust accumulation and clean photovoltaic modules: structural optimization, passive protective coatings, and active cleaning equipment. Among these, structural optimization solutions such as frameless and flush-frame designs can only improve dust accumulation in localized dead corners, offering limited improvement. Passive coatings, such as superhydrophilic, photocatalytic, and antistatic coatings, can only reduce initial dust adhesion to a certain extent, but cannot remove stubborn dust that has already adhered firmly. Their effectiveness is extremely poor in arid regions, and traditional organic coatings have poor UV aging resistance, with a lifespan of only 2 to 3 years, far short of the designed service life of 25 to 30 years for photovoltaic modules. Active cleaning technologies typically involve directly cleaning the surface of the photovoltaic modules using cleaning robots and high-pressure water washing, which is time-consuming and labor-intensive.

[0044] In view of this, this application provides a photovoltaic module in which a conductive composite film composed of an anti-reflection layer, a conductive layer, and a protective layer is disposed on the surface of the photovoltaic glass. Combined with an electrode and controller structure, this forms a controllable alternating electric field cleaning structure. The anti-reflection layer optimizes the light transmittance of the photovoltaic glass, ensuring the light absorption efficiency of the solar cells and preventing the coating structure from affecting the module's power generation performance. The conductive layer generates an alternating electric field under the action of the electrode power supply, thereby peeling off the adhering dust on the surface of the photovoltaic module through the synergistic effect of electric field force and dielectric force, achieving efficient and automated cleaning, and making the cleaning process extremely convenient. The protective layer protects the internal conductive layer, thereby improving the overall structural stability and service life. The controller can precisely adjust the voltage and frequency of the alternating current to adapt to the cleaning needs of different dust accumulation conditions, thus ensuring a good cleaning effect.

[0045] Figure 1 A schematic diagram of the photovoltaic module provided in the embodiments of this application; Figure 2 for Figure 1 Enlarged view of point A in the middle; Figure 3 This is a schematic flowchart illustrating the preparation method of the conductive composite thin film provided in this application embodiment. (See also...) Figures 1 to 3 This application provides a photovoltaic module 100, comprising:

[0046] Back panel 110;

[0047] The battery cell 120 is stacked on the backplate 110;

[0048] Photovoltaic glass 130 is stacked on the solar cell 120;

[0049] The conductive composite film 140 includes an antireflection layer, a conductive layer 143, and a protective layer 144. The antireflection layer is disposed on the surface of the photovoltaic glass 130, the conductive layer 143 is disposed on the surface of the antireflection layer, and the protective layer 144 is disposed on the surface of the conductive layer 143.

[0050] Electrode 150 is disposed on photovoltaic glass 130 and electrically connected to conductive layer 143 for inputting alternating current into conductive layer 143;

[0051] The controller 160 is electrically connected to the electrode 150 and the battery cell 120. The controller 160 is used to adjust the voltage and frequency of the alternating current input to the conductive layer 143 to form an alternating electric field for dust removal.

[0052] This embodiment of the application forms a controllable alternating electric field dust removal structure by setting a conductive composite film 140, consisting of an anti-reflection layer, a conductive layer 143, and a protective layer 144, on the surface of the photovoltaic glass 130 of the photovoltaic module 100, and cooperating with the electrode 150 and controller 160. The anti-reflection layer optimizes the light transmittance of the photovoltaic glass 130, ensuring the light absorption efficiency of the solar cell 120 and preventing the coating structure from affecting the module's power generation performance. The conductive layer 143 forms an alternating electric field under the power supply of the electrode 150, thereby peeling off the adhering dust on the surface of the photovoltaic module 100 through the synergistic effect of electric field force and dielectric force, achieving efficient and automated dust removal with a highly convenient process. The protective layer 144 protects the internal conductive layer 143, thereby improving the overall structural stability and service life. The controller 160 can precisely adjust the voltage and frequency of the alternating current to adapt to the dust removal needs of different dust accumulation conditions, thus ensuring a good dust removal effect.

[0053] In the above embodiments, the antireflection layer includes a first antireflection layer 141 and a second antireflection layer 142. The first antireflection layer 141 is disposed on the surface of the photovoltaic glass 130, and the second antireflection layer 142 is disposed on the surface of the first antireflection layer 141. The first antireflection layer 141 is made of titanium dioxide, and the second antireflection layer 142 is made of silicon dioxide.

[0054] The antireflection layer adopts a double-layer structure, consisting of a first antireflection layer 141 made of titanium dioxide and a second antireflection layer 142 made of silicon dioxide. The first antireflection layer 141 is bonded to the outer surface of the photovoltaic glass 130, and the second antireflection layer 142 is applied to the side of the first antireflection layer 141 facing away from the photovoltaic glass 130. Based on the principle of optical thin-film interference antireflection, titanium dioxide has a high refractive index, while silicon dioxide has a low refractive index. The photovoltaic glass 130, the high-refractive-index first antireflection layer 141, and the low-refractive-index second antireflection layer 142 form a gradient-matched optical film structure. When sunlight is incident, the reflected light generated at the interfaces of each layer undergoes destructive interference, which can significantly reduce the visible light and near-infrared light reflection loss on the surface of the photovoltaic glass 130. The transmittance is significantly improved to ensure that the solar cell 120 receives the incident light intensity and stabilizes the basic power generation of the module. At the same time, both titanium dioxide and silicon dioxide are inorganic oxide materials, which have excellent resistance to ultraviolet radiation, acid and alkali rain erosion, and wind and sand abrasion. This can avoid the problem of short-term aging and failure of organic antireflective materials. The titanium dioxide layer can also slightly degrade organic pollutants attached to the film surface by relying on its own photocatalytic properties to help reduce dust adhesion to the substrate. The outer layer of silicon dioxide has a dense and smooth texture, which can reduce the physical embedding of dust. The double-layer inorganic antireflective structure not only achieves high-efficiency antireflection but also synergistically improves the isolation and protection capabilities of the bottom conductive layer 143, delays the erosion and damage of water vapor and ultraviolet rays to the conductive layer 143, and extends the long-term service life of the overall conductive composite film 140.

[0055] In the above embodiments, the thickness of the first antireflection layer 141 is 30nm-50nm, and the thickness of the second antireflection layer 142 is 70nm-90nm. It is understandable that setting the thickness of the first antireflective layer 141, composed of titanium dioxide, to 30nm-50nm and the thickness of the second antireflective layer 142, composed of silicon dioxide, to 70nm-90nm allows the thickness range of the film layers to match the destructive interference optical path difference requirement of the main band of visible light in sunlight. The 30nm-50nm thickness of the high-refractive-index titanium dioxide bottom layer can precisely control the phase of the reflected light at the interface between the glass and the film layer, while the 70nm-90nm thickness of the low-refractive-index silicon dioxide outer layer matches the phase of the reflected light at the interface between the air and the second antireflective layer 142. The combination of the two layer thicknesses maximizes the destructive interference of the reflected light at the multi-layer interface, minimizing the light reflection loss on the surface of the photovoltaic glass 130 and improving the light transmission efficiency across the entire band. If the thickness of the first antireflective layer 141 is less than 30nm, the titanium dioxide film layer cannot form a complete and continuous cover layer, which is prone to local omissions, optical mismatch, and loss of the filling and passivation effect on the glass surface defects. If the thickness exceeds 50nm, it will increase the overall light absorption loss of the film layer and cause stress cracking within the film, reducing the structural stability.

[0056] When the thickness of the second antireflection layer 142 is less than 70nm, it cannot fully achieve optical impedance matching on the air side, resulting in a significant decrease in antireflection gain. When the thickness is greater than 90nm, it will increase the amount of ultraviolet light absorbed by the film and exacerbate the risk of wind and sand erosion and detachment. At the same time, the 30nm-50nm titanium dioxide thin layer can stably play a photocatalytic self-cleaning auxiliary role and will not cause light-blocking loss due to excessive thickness. The 70nm-90nm dense silicon dioxide thin layer can form a uniform wear-resistant protective barrier, preventing water vapor and sand from directly contacting the bottom conductive layer 143. The thickness of the two layers works together to achieve optimal anti-reflection optical performance, film mechanical structure stability and long-term weather protection effect.

[0057] In the above embodiments, the conductive layer 143 is formed by a composite of zinc oxide and aluminum oxide, with the aluminum oxide accounting for 1%-3% of the mass. It is understood that pure zinc oxide semiconductor films have low carrier concentration, insufficient conductivity, and are prone to lattice defect diffusion under outdoor ultraviolet and humid conditions, leading to a rapid increase in resistivity. A small amount of aluminum oxide, as a donor dopant, uniformly incorporated into the zinc oxide lattice, can provide a large number of free electrons, significantly improving the film's conductivity. This ensures that a uniform and stable alternating electric field can be quickly formed after an alternating current is applied, guaranteeing that the dielectric force and electric field repulsion act uniformly on the film surface to achieve efficient dust removal across the entire area. The aluminum oxide mass percentage is limited to 1%-3%. When the doping amount is less than 1%, the doping modification effect is weak, the resistivity of the conductive layer 143 is high, and the electric field strength is insufficient under the same input voltage, making it difficult to peel off thick slabs. Dust accumulation and a doping content exceeding 3% can easily cause alumina particles to agglomerate and precipitate, damaging the continuous conductive structure of the zinc oxide film, generating numerous conductive open circuit defects, significantly increasing the film resistance, and simultaneously causing uneven stress cracking and detachment of the film layer. Both zinc oxide and aluminum oxide are inorganic metal oxides, possessing excellent resistance to ultraviolet aging, acid and alkali corrosion, and wear resistance. They can work in conjunction with the outer protective layer 144 to block water vapor and dust erosion, preventing the conductive layer 143 from failing due to long-term outdoor use, thus meeting the long-term service requirements of photovoltaic modules 100. Furthermore, this composite oxide film has excellent light transmittance and will not significantly block sunlight. Combined with the bottom double-layer anti-reflective film, it can jointly ensure the overall light transmittance and power generation output performance of the module.

[0058] In the above embodiments, the thickness of the conductive layer 143 is 40-60 nm. This thickness range can balance the continuity of the film's conductivity, light transmittance, and the effect of generating an alternating electric field. When the thickness is less than 40 nm, it is difficult for the film to form a complete and continuous conductive film layer, and local conductive breaks are likely to occur. After energizing, the distribution of the alternating electric field on the film surface is uneven, and the electric field strength in some areas is insufficient to peel off the adhering dust. At the same time, the total number of charge carriers in the thin layer is small, and the electric field force is weaker under the same input parameters, resulting in a significant decrease in dust removal efficiency. A thickness greater than 60 nm will increase the light absorption loss in the visible light band of the film, weaken the overall light transmittance of the photovoltaic glass 130, and directly reduce the efficiency of the solar cell 120. The photoelectric conversion output power is high, but the internal stress accumulated inside the excessively thick film layer increases. Long-term exposure to outdoor temperature differences and wind and sand erosion can easily lead to peeling, cracking and detachment. The thickness range of 40nm to 60nm can ensure that the doped zinc oxide aluminum film has sufficient charge carrier channels, and after being energized, it can quickly generate a uniform and appropriately strong alternating electric field to complete dry automatic dust removal in conjunction with dielectric force. At the same time, it can control the film's light-shielding loss to maintain excellent light transmission characteristics. Meanwhile, the internal stress level of the film layer is moderate. Combined with the inner double-layer inorganic anti-reflection layer and the outer protective layer 144, the overall mechanical stability and outdoor weather resistance service life of the conductive layer 143 are further improved.

[0059] In the above embodiments, the protective layer 144 is formed by a composite of silicon dioxide and titanium dioxide, with the mass ratio of silicon dioxide in the protective layer 144 being 60%-65%. It is understood that pure silicon dioxide films are brittle and have poor toughness, making them prone to cracking and damage under long-term temperature cycling and wind and sand impacts. Protective layers 144 prepared solely from titanium dioxide have a high surface roughness, making them prone to dust accumulation and exhibiting poor overall light transmittance. The composite of the two materials complements each other's material properties. A silicon dioxide content of 60%-65% forms a continuous and dense inorganic substrate framework, giving the protective layer 144 excellent hydrophobic isolation effects, effectively preventing rainwater, water vapor, and salt mist from penetrating and corroding the underlying conductive layer 143. Simultaneously, the smooth silicon dioxide... The substrate can reduce the physical adsorption and adhesion of dust. Titanium dioxide, as an auxiliary phase, is uniformly dispersed inside the silica substrate and can play a role in photocatalytic degradation of organic pollutants on the film surface, reducing the solidification and accumulation of sticky dirt. It can also enhance the UV shielding ability of the protective layer 144 and weaken the damage of ultraviolet rays to the lattice of the conductive layer 143. If the mass ratio of silica is less than 60%, the continuous density of the substrate is insufficient, the water vapor barrier performance is greatly reduced, the wear resistance of the protective layer 144 decreases, and excessive doping of titanium dioxide will increase the light absorption loss of the film layer and reduce the overall light transmittance.

[0060] When the silica content exceeds 65%, the titanium dioxide phase content is insufficient, significantly weakening the photocatalytic self-cleaning and UV protection effects, and increasing the brittleness of the film layer, making it prone to microcracks. With a silica content of 60% to 65%, the composite protective layer 144 combines the comprehensive characteristics of being dense and waterproof, UV resistant, having low dust adhesion, and moderate toughness. It can effectively cover and protect the internal conductive layer 143 and the double-layer anti-reflection layer for a long time, delaying the oxidation and aging failure of each functional film layer, and adapting to the outdoor service life of photovoltaic modules 100. At the same time, the inorganic composite material does not produce light transmission loss, and works together with the bottom double-layer anti-reflection film and the zinc oxide aluminum conductive layer 143 to ensure the high light transmission characteristics of the photovoltaic glass 130 without weakening the power generation output performance of the solar cell 120.

[0061] In the above embodiments, the thickness of the protective layer 144 is 20-30 nm. This thickness range can balance UV blocking, water vapor barrier, light transmittance, and film mechanical stability. When the thickness is less than 20 nm, the protective layer 144 cannot form a complete and dense continuous coating film, resulting in microporous defects. Water vapor, salt ions, and ultraviolet rays can penetrate these defects and directly erode the underlying conductive layer 143, causing an increase in the resistivity of the conductive layer 143 and unstable alternating electric field output. Furthermore, the thin layer lacks sufficient wear resistance, and long-term erosion by wind and sand can easily lead to localized wear-through failure. A thickness greater than 30 nm will increase the impact of the composite oxide film layer on… The absorption loss of visible light offsets the anti-reflection effect of the bottom double-layer anti-reflection film, reducing the overall light transmittance of photovoltaic glass 130 and thus affecting the power generation efficiency of solar cell 120. In addition, an excessively thick protective layer 144 will accumulate large internal stress, which is prone to micro-cracks, peeling and flaking under the alternating high and low temperature outdoor conditions. A composite protective layer 144 with a thickness of 20nm to 30nm can completely cover the surface of the conductive layer 143, giving full play to the synergistic effect of the dense water barrier of silicon dioxide and the ultraviolet shielding and photocatalytic dust suppression of titanium dioxide. It can effectively isolate external corrosive media and protect the internal conductive layer 143 structure and conductivity stability.

[0062] Furthermore, this application embodiment also provides a method for preparing a conductive composite film 140, used to prepare the conductive composite film 140 in the photovoltaic module 100 of the above embodiment, including the following steps:

[0063] S100: The surface of the photovoltaic glass 130 in the photovoltaic module 100 is cleaned and subjected to plasma surface treatment, and the photovoltaic glass 130 is heated in a vacuum environment.

[0064] It is understandable that cleaning the surface of photovoltaic glass 130 can thoroughly remove oil, dust, and particulate impurities from the glass surface, eliminating pinholes and localized peeling defects caused by impurities. Then, plasma surface treatment is performed, which activates the substrate by bombarding the glass surface with high-energy plasma, enhances the activity of chemical bonds on the glass surface, and significantly strengthens the adhesion between the subsequent titanium dioxide film and the glass substrate. This prevents the film from peeling and delaminating after long-term outdoor use. Simultaneously, photovoltaic glass 130 is heated in a vacuum environment. The vacuum environment can prevent moisture and dust from re-attaching in the air, while heating can remove moisture and gaseous impurities adsorbed inside the glass micropores, eliminate residual internal stress in the substrate, and prevent bulging defects caused by the release of gas from the substrate after the deposition of subsequent multilayer films. This provides a clean, highly active, and low-stress substrate environment for the uniform deposition of subsequent multilayer functional films.

[0065] S200. Titanium dioxide is deposited onto the surface of photovoltaic glass 130 by magnetron sputtering to form the first antireflection layer 141.

[0066] It is understandable that magnetron sputtering achieves atomic-level deposition in a vacuum-sealed environment, which can precisely control the deposition rate and stably control the thickness of the first antireflection layer 141 to the required thickness. The film is dense and continuous, with uniform composition and no agglomeration. The bottom optical matching layer of the double-layer antireflection film is built based on high-refractive-index titanium dioxide, which stably achieves phase control of the reflected light at the interface. At the same time, the atomic-level deposition method improves the adhesion between the first antireflection layer 141 and the glass, avoiding problems such as incomplete coating and cracking of thin titanium dioxide layers.

[0067] S300. Silicon dioxide is deposited onto the surface of the first antireflection layer 141 by magnetron sputtering to form the second antireflection layer 142.

[0068] The second antireflection layer 142 is formed by depositing silicon dioxide on the surface of the first antireflection layer 141 using magnetron sputtering. The thickness of the film can be precisely controlled. The low-refractive-index silicon dioxide and the underlying titanium dioxide form a gradient optical film system, which maximizes the cancellation of interference of reflected light at each interface and improves light transmittance. The silicon dioxide layer formed by magnetron sputtering is dense and smooth, which can isolate the diffusion of raw materials in the underlying titanium dioxide conductive layer 143, avoid the mixing of the two film components and damage to optical performance, and the interlayer bonding is tight without delamination gaps.

[0069] S400. A composite of zinc oxide and aluminum oxide is deposited onto the surface of the second antireflection layer 142 by magnetron sputtering to form a conductive layer 143.

[0070] A conductive layer 143 is formed by depositing zinc oxide-doped aluminum oxide composite powder using magnetron sputtering. Magnetron sputtering enables uniform co-deposition of zinc and aluminum oxides, ensuring uniform doping of aluminum oxide within the zinc oxide lattice and preventing alumina particle agglomeration and precipitation defects that could cause circuit breaks. This precisely stabilizes the thickness of the conductive layer 143 within a preset range, ensuring sufficient charge carriers to form a uniform alternating electric field for dry cleaning, while also controlling the light absorption loss of the film layer to avoid affecting light transmission. Furthermore, the sputtered conductive layer 143 has high density and is free of pore defects, which can delay water vapor erosion.

[0071] S500. A composite of silicon dioxide and titanium dioxide is coated onto the surface of conductive layer 143 by a sol-gel method to form protective layer 144.

[0072] A protective layer 144 is prepared by coating a silicon-titanium composite coating on the surface of the conductive layer 143 using the sol-gel method. The sol-gel system can pre-mix the composite precursor liquid with the required mass ratio of silicon dioxide, which is simpler to achieve precise proportion of silicon-titanium components compared with magnetron sputtering. After coating and curing, an ultra-thin, complete and dense film of the required thickness can be formed on the surface of the conductive layer 143. The silicon dioxide forms a water-proof and wear-resistant skeleton, and the uniform dispersion of titanium dioxide achieves ultraviolet shielding and photocatalytic dust suppression.

[0073] In the above embodiments, the surface of the photovoltaic glass 130 in the photovoltaic module 100 is cleaned and subjected to plasma surface treatment, and the photovoltaic glass 130 is heated in a vacuum environment, specifically including:

[0074] The surface of the photovoltaic glass 130 was cleaned sequentially with a sodium hydroxide solution of 4%-6% by mass, a hydrogen fluoride solution of 1%-3% by mass, and deionized water.

[0075] The surface of the cleaned photovoltaic glass 130 is subjected to plasma surface treatment using argon plasma.

[0076] Photovoltaic glass 130 is heated to 210℃-230℃ in a vacuum environment.

[0077] The process involves rinsing the glass surface with a 4%–6% sodium hydroxide solution to saponify and decompose organic oil stains, mold release agent residues, and organic dust adhering to the glass surface, thus removing organic contaminants. Then, a 1%–3% hydrogen fluoride solution is used to lightly etch the glass surface layer to remove the inorganic oxide layer, micro-protrusions, and stubborn mineral spots. At the same time, the micro-etching creates a micro-rough interface to improve the adhesion of the film substrate. Finally, deionized water is used to thoroughly rinse the glass surface to remove residual alkali, hydrofluoric acid, and ionic impurities, preventing residual chemicals from corroding subsequent deposited films and causing pinholes, yellowing, and failure.

[0078] After cleaning, the glass surface is bombarded with argon plasma. The inert argon plasma has no oxidation side reaction. The high-energy ions continuously strip away the trace impurities microscopically adsorbed on the glass surface and break the silicon-oxygen bonds on the glass surface to achieve surface activation. This can significantly improve the chemical bonding force between the subsequent magnetron sputtered titanium dioxide film and the glass substrate, and prevent the film from delaminating and falling off under long-term temperature difference and wind and sand.

[0079] Finally, the treated photovoltaic glass 130 is placed in a vacuum chamber and heated to 210℃~230℃. The vacuum environment isolates the glass from secondary pollution by air moisture and dust. The constant temperature heating of 210℃~230℃ can completely remove water molecules and trace gases adsorbed in the micropores inside the glass, and eliminate residual internal stress from the cold and hot processing of the glass substrate. If the heating temperature is lower than 210℃, water vapor and impurity gases cannot be fully desorbed, and subsequent deposited films are prone to bulging and porosity defects. Temperatures higher than 230℃ will cause thermal deformation of the glass and aggravate the thermal stress of the substrate, resulting in cracking after film deposition. This entire pretreatment process removes organic impurities, inorganic stubborn pollutants, activates the substrate interface, removes adsorbed gases from the substrate, and eliminates internal stress in sequence, providing a clean, highly active, low-defect stable substrate for subsequent magnetron sputtering deposition of multilayer inorganic functional films, thereby improving the overall adhesion and long-term weather resistance of the conductive composite film 140.

[0080] In the above embodiments, a composite of silica and titanium dioxide is coated onto the surface of the conductive layer 143 by a sol-gel method to form a protective layer 144. Specifically, this includes: preparing a silica and titanium dioxide composite sol using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent, and hydrochloric acid as catalyst, and then coating the prepared silica and titanium dioxide composite sol onto the surface of the conductive layer 143 by a roller coating method to form the protective layer 144.

[0081] It is understandable that tetraethyl orthosilicate, as a precursor of silica, and tetrabutyl titanate, as a precursor of titanium dioxide, can achieve molecular-level uniform mixing in anhydrous ethanol homogeneous solvent system. This avoids the problems of agglomeration and uneven component distribution that are prone to occur when powder is doped, ensuring the required mass ratio of silica in the protective layer 144. The acidic hydrochloric acid catalyst can gently regulate the hydrolysis and condensation reaction rate of the precursor, avoiding the problems of particle precipitation and poor sol stability caused by excessively rapid reaction. This ensures that the prepared composite sol system is uniform, has controllable viscosity, and excellent storage stability, laying the foundation for subsequent uniform coating and film formation. At the same time, the mild sol-gel reaction conditions will not cause high-temperature damage, structural destruction, or electrical performance degradation to the already formed antireflective layer and conductive layer 143.

[0082] The coating process, employing a roller coating method, is adapted to the processing characteristics of the large-size planar substrate of photovoltaic glass 130. Compared to spraying and spin coating processes, roller coating allows for precise control of the sol coating amount and film thickness, enabling the stable preparation of ultra-thin protective films with uniform thickness and a smooth, dense surface. This effectively avoids defects such as uneven film thickness, localized missed coating, and wrinkling caused by accumulation. The roller coating process offers high construction efficiency and good consistency, meeting the needs of large-scale mass production of photovoltaic modules 100. After curing, the formed silicon-titanium composite protective layer 144 forms a continuous and complete inorganic dense film structure, combining the dense, water-resistant, wear-resistant, and impermeable properties of silicon dioxide with the ultraviolet shielding, photocatalytic, and self-cleaning properties of titanium dioxide. It firmly coats the surface of the conductive layer 143, effectively blocking external moisture, salt, ultraviolet rays, and wind and sand erosion, and stably protecting the conductivity and interlayer structural integrity of the underlying conductive layer 143. This further ensures the optical performance and alternating electric field dust removal stability of the conductive composite film 140 during long-term outdoor service.

[0083] To facilitate understanding of the solution in this application, several specific implementation examples are listed below:

[0084] Example 1

[0085] The surface of photovoltaic glass 130 was thoroughly cleaned sequentially using a 4% sodium hydroxide solution, a 1% hydrogen fluoride solution, and deionized water to remove organic oil, inorganic impurities, and residual chemicals. Then, the cleaned photovoltaic glass 130 surface was subjected to plasma activation treatment using argon plasma to enhance the surface activity of the glass substrate and the adhesion of subsequent film layers. Subsequently, the photovoltaic glass 130 was heated to 210°C in a vacuum environment to remove adsorbed water vapor and trace gas impurities from the glass interior and eliminate residual stress on the substrate, completing the substrate pretreatment. After pretreatment, titanium dioxide material was deposited on the surface of photovoltaic glass 130 using magnetron sputtering to form a first antireflection layer 141 with a thickness of 30 nm. Further magnetron sputtering was then performed... A controlled sputtering process is used to deposit silicon dioxide material on the surface of the first antireflection layer 141 to form a second antireflection layer 142 with a thickness of 70 nm. Then, a zinc oxide and aluminum oxide composite material with a mass ratio of 1% aluminum oxide is deposited on the surface of the second antireflection layer 142 by magnetron sputtering to form a conductive layer 143 with a thickness of 40 nm. Finally, a silicon dioxide and titanium dioxide composite sol with a mass ratio of 60% silicon dioxide is prepared using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent, and hydrochloric acid as catalyst. The composite sol is uniformly coated on the surface of the conductive layer 143 by roller coating. After curing, a protective layer 144 with a thickness of 20 nm is formed, thereby completing the preparation of the conductive composite film 140 adapted to the photovoltaic module 100.

[0086] Example 2

[0087] The surface of photovoltaic glass 130 was thoroughly cleaned sequentially with a 5% sodium hydroxide solution, a 2% hydrogen fluoride solution, and deionized water to remove organic oil, inorganic impurities, and residual chemicals. Then, argon plasma was used to activate the cleaned surface of photovoltaic glass 130, enhancing the surface activity of the glass substrate and the adhesion of subsequent film layers. Subsequently, photovoltaic glass 130 was heated to 220°C in a vacuum environment to remove adsorbed water vapor and trace gaseous impurities from the glass interior and eliminate residual stress on the substrate, completing the substrate pretreatment. After pretreatment, titanium dioxide was deposited on the surface of photovoltaic glass 130 using magnetron sputtering to form a 40nm thick first antireflection layer 141. Further magnetron sputtering was then performed... A sputtering process is used to deposit silicon dioxide material on the surface of the first antireflection layer 141 to form a second antireflection layer 142 with a thickness of 80 nm. Then, a zinc oxide and aluminum oxide composite material with a mass ratio of 2% aluminum oxide is deposited on the surface of the second antireflection layer 142 by magnetron sputtering to form a conductive layer 143 with a thickness of 50 nm. Finally, a silicon dioxide and titanium dioxide composite sol with a mass ratio of 62.5% silicon dioxide is prepared using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent, and hydrochloric acid as catalyst. The composite sol is uniformly coated on the surface of the conductive layer 143 by roller coating. After curing, a protective layer 144 with a thickness of 25 nm is formed, thereby completing the preparation of the conductive composite film 140 adapted to the photovoltaic module 100.

[0088] Example 3

[0089] The surface of photovoltaic glass 130 was thoroughly cleaned sequentially using a 6% sodium hydroxide solution, a 3% hydrogen fluoride solution, and deionized water to remove organic oil, inorganic impurities, and residual chemicals. Then, argon plasma was used to activate the cleaned surface of photovoltaic glass 130, enhancing the surface activity of the glass substrate and the adhesion of subsequent film layers. Subsequently, photovoltaic glass 130 was heated to 230°C in a vacuum environment to remove adsorbed water vapor and trace gaseous impurities from the glass interior and eliminate residual stress on the substrate, completing the substrate pretreatment. After pretreatment, titanium dioxide was deposited on the surface of photovoltaic glass 130 using magnetron sputtering to form a 50nm thick first antireflection layer 141. Further magnetron sputtering was then performed... A controlled sputtering process is used to deposit silicon dioxide material on the surface of the first antireflection layer 141 to form a second antireflection layer 142 with a thickness of 90 nm. Then, a zinc oxide and aluminum oxide composite material with a mass ratio of 3% aluminum oxide is deposited on the surface of the second antireflection layer 142 by magnetron sputtering to form a conductive layer 143 with a thickness of 60 nm. Finally, a silicon dioxide and titanium dioxide composite sol with a mass ratio of 65% silicon dioxide is prepared using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent, and hydrochloric acid as catalyst. The composite sol is uniformly coated on the surface of the conductive layer 143 by roller coating. After curing, a protective layer 144 with a thickness of 30 nm is formed, thereby completing the preparation of the conductive composite film 140 adapted to the photovoltaic module 100.

[0090] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A photovoltaic module, characterized in that, include: Back panel; Battery cells are stacked on the backplate; Photovoltaic glass is stacked on the solar cells; A conductive composite film includes an antireflective layer, a conductive layer, and a protective layer. The antireflective layer is disposed on the surface of a photovoltaic glass, the conductive layer is disposed on the surface of the antireflective layer, and the protective layer is disposed on the surface of the conductive layer. An electrode is disposed on the photovoltaic glass and electrically connected to the conductive layer, for inputting alternating current into the conductive layer; A controller, electrically connected to the electrode and the battery cell, is used at least to adjust the voltage and frequency of the alternating current input to the conductive layer to form an alternating electric field for dust removal.

2. The photovoltaic module according to claim 1, characterized in that, The antireflection layer includes a first antireflection layer and a second antireflection layer. The first antireflection layer is disposed on the surface of the photovoltaic glass, and the second antireflection layer is disposed on the surface of the first antireflection layer. The first antireflection layer is made of titanium dioxide, and the second antireflection layer is made of silicon dioxide.

3. The photovoltaic module according to claim 2, characterized in that, The thickness of the first antireflection layer is 30nm-50nm, and the thickness of the second antireflection layer is 70nm-90nm.

4. The photovoltaic module according to claim 3, characterized in that, The conductive layer is formed by a composite of zinc oxide and aluminum oxide, and the mass percentage of aluminum oxide is 1%-3%.

5. The photovoltaic module according to claim 4, characterized in that, The thickness of the conductive layer is 40-60 nm.

6. The photovoltaic module according to claim 5, characterized in that, The protective layer is formed by combining silicon dioxide and titanium dioxide, with the mass ratio of silicon dioxide in the protective layer being 60%-65%.

7. The photovoltaic module according to claim 6, characterized in that, The thickness of the protective layer is 20-30 nm.

8. A method for preparing a conductive composite thin film, characterized in that, The preparation of the conductive composite film in the photovoltaic module according to any one of claims 1 to 7 includes the following steps: The photovoltaic glass surface in the photovoltaic module is cleaned and subjected to plasma surface treatment, and then heated in a vacuum environment; Titanium dioxide is deposited onto the surface of the photovoltaic glass using a magnetron sputtering process to form a first antireflection layer; Silicon dioxide is deposited onto the surface of the first antireflection layer using a magnetron sputtering process to form the second antireflection layer; A composite of zinc oxide and aluminum oxide is deposited onto the surface of the second antireflection layer using a magnetron sputtering process to form a conductive layer. A protective layer is formed by coating a composite of silica and titanium dioxide onto the surface of the conductive layer using a sol-gel method.

9. The method for preparing the conductive composite thin film according to claim 8, characterized in that, The process of cleaning and plasma surface treatment of the photovoltaic glass surface in the photovoltaic module, followed by heating the photovoltaic glass in a vacuum environment, specifically includes: The surface of the photovoltaic glass is cleaned sequentially with a sodium hydroxide solution of 4%-6% by mass, a hydrogen fluoride solution of 1%-3% by mass, and deionized water. The photovoltaic glass surface is subjected to plasma surface treatment using argon plasma after cleaning. The photovoltaic glass is heated to 210℃-230℃ in a vacuum environment.

10. The method for preparing the conductive composite thin film according to claim 9, characterized in that, The method of coating the composite of silica and titanium dioxide onto the surface of the conductive layer using the sol-gel method to form a protective layer specifically includes: preparing a silica and titanium dioxide composite sol using tetraethyl orthosilicate and tetrabutyl titanate as precursors, anhydrous ethanol as solvent and hydrochloric acid as catalyst, and coating the prepared silica and titanium dioxide composite sol onto the surface of the conductive layer using a roller coating method to form the protective layer.

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