Display substrate, display panel and manufacturing method

Abstract

The application discloses a display substrate, a display panel and a manufacturing method. The display substrate of one embodiment comprises a display area and a non-display area surrounding the display area. The non-display area comprises an isolation dam area and a crack dam area in a direction from the display area. The crack dam area comprises a plurality of crack dams. At least two adjacent first crack dams close to the isolation dam area are provided with a first crack groove penetrating through the first crack dams. The crack dam area comprises a metal blocking part covering the first crack groove and partially covering the first crack dam. The side of the metal blocking part away from the isolation dam is higher than the side close to the isolation dam. The embodiment provided by the application sets a crack groove penetrating through the crack dam between the crack dams in the crack dam area of the non-display area of the display substrate, sets a metal blocking part in the crack groove, effectively blocks the crack extension by blocking the inorganic layer, prevents static electricity, and improves the structural strength of the frame of the display substrate.

Description

Technical Field

[0001] This invention relates to the field of display technology, and in particular to a display substrate, a display panel, and a manufacturing method. Background Technology

[0002] With increasingly stringent stability requirements for display products, existing Organic Light-Emitting Diode (OLED) display panels incorporate multiple crack dams along their bezels. When the bezel is impacted, the organic layers between these dams act as a buffer, preventing cracks from extending into the display area through the inorganic layers connected by the dams. However, in practical applications, there is a risk of defects due to increased gaps in the crack grooves between the dams.

[0003] Therefore, how to improve the stability of display products and avoid adverse risks has become a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0004] To solve at least one of the above problems, a first embodiment of the present invention provides a display substrate, including a display area and a non-display area surrounding the display area, wherein the non-display area includes an isolation dam area and a crack dam area in a direction from near to far from the display area; The crack dam area includes multiple crack dams, and a first crack groove that penetrates the first crack dam is provided between at least two adjacent first crack dams near the isolation dam area. The crack dam area includes a metal barrier that covers the first crack groove and partially covers the first crack dam, wherein the side of the metal barrier away from the isolation dam is higher than the side close to the isolation dam.

[0005] For example, in some embodiments of the display substrate provided in this application, the display substrate includes a flexible substrate. The first crack dam includes a dam top and sidewalls, and the sidewalls of adjacent first crack dams located on both sides of the first crack groove include at least two steps. The first crack groove includes a groove bottom that exposes the flexible substrate. The metal blocking portion includes a first blocking sub-portion located on the side of the first crack groove away from the isolation dam, a second blocking sub-portion covering the bottom of the first crack groove, and a third blocking sub-portion located on the side of the first crack groove close to the isolation dam. The first blocking sub-portion covers the sidewall of the adjacent first crack dam and partially covers the top of the first crack dam. The third blocking sub-portion partially covers the sidewall of the adjacent first crack dam. The height of the first blocking sub-portion relative to the flexible substrate is greater than the height of the third blocking sub-portion relative to the flexible substrate. The display substrate also includes a first planarization layer covering the crack dam and the metal barrier.

[0006] For example, in some embodiments of the display substrate provided in this application, the crack dam region includes three first crack dams, two first crack grooves located between the three first crack dams, and two metal blocking portions covering the two first crack grooves.

[0007] For example, in some embodiments of the display substrate provided in this application, the display substrate includes a flexible substrate. The first crack dam includes a dam top and sidewalls, and the first crack groove includes a groove bottom that exposes the flexible substrate; The display substrate further includes an organic buffer portion, which covers the top of the first crack dam and the sidewall of the first crack dam away from the isolation dam, and partially covers the bottom of the trench of the first crack dam away from the isolation dam. The metal blocking portion includes a fourth blocking sub-portion located on the side of the first crack groove away from the isolation dam, a fifth blocking sub-portion covering the exposed bottom of the first crack groove, and a sixth blocking sub-portion located on the side of the first crack groove close to the isolation dam. The fourth blocking sub-portion covers the sidewall of the adjacent first crack dam and partially covers the organic buffer portion. The orthographic projection of the fourth blocking sub-portion on the flexible substrate overlaps with the orthographic projection of the top of the adjacent first crack dam on the flexible substrate. The sixth blocking sub-portion overlaps with the organic buffer portion covering the bottom of the groove. The orthographic projection of the sixth blocking sub-portion on the flexible substrate overlaps with the orthographic projection of the organic buffer portion on the flexible substrate. The height of the fourth blocking sub-portion relative to the flexible substrate is greater than the height of the sixth blocking sub-portion relative to the flexible substrate. The display substrate further includes a second planarization layer covering the crack dam, the organic buffer portion, and the metal barrier portion.

[0008] For example, in some embodiments of the present application, the display substrate includes two first crack dams, a first crack groove located between the two first crack dams, and a metal blocking portion covering the first crack groove.

[0009] For example, in some embodiments of the display substrate provided in this application, the crack dam area is provided with a second crack groove between at least three adjacent crack dams away from the isolation dam area, and the depth of the second crack groove is less than the depth of the first crack groove.

[0010] For example, in some embodiments of the display substrate provided in this application, the display substrate further includes an encapsulation layer disposed on the planarization layer. In the direction from near to far from the flexible substrate, the encapsulation layer includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. The orthographic projection of the organic encapsulation layer on the flexible substrate coincides with the orthographic projection of the first inorganic encapsulation layer on the flexible substrate, and the orthographic projection of the organic encapsulation layer on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate. The orthographic projections of the first crack dam and the first crack groove on the flexible substrate fall within the orthographic projection of the organic encapsulation layer on the flexible substrate; The orthographic projection of the plurality of crack dams on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate.

[0011] For example, in some embodiments of the display substrate provided in this application, the thickness of the metal blocking portion covering the first crack groove is greater than or equal to 600 nm and less than or equal to 700 nm.

[0012] A second embodiment of the present invention provides a display panel, including a display substrate as described in the first embodiment.

[0013] A third embodiment of the present invention provides a method for manufacturing a display substrate as described in the first embodiment, comprising: An isolation dam area and a crack dam area are formed in the non-display area. The crack dam area includes multiple crack dams. A first crack groove that penetrates the first crack dam is provided between at least two adjacent first crack dams near the isolation dam area. A metal barrier is formed in the crack dam area, covering the first crack groove and partially covering the first crack dam, wherein the side of the metal barrier away from the isolation dam is higher than the side close to the isolation dam.

[0014] For example, in some embodiments of the manufacturing method provided in this application, The step of forming an isolation dam area and a crack dam area in the non-display area further includes: forming a plurality of crack dams on a flexible substrate, wherein the first crack dam includes a dam top and a sidewall; forming a first crack groove that penetrates the first crack dam and exposes the flexible substrate between at least two adjacent first crack dams near the isolation dam area; and forming at least two steps on the sidewalls of adjacent first crack dams located on both sides of the first crack groove. The metal blocking portion forming in the crack dam region that covers the first crack groove and partially covers the first crack dam further includes: forming a first blocking sub-part located on the side of the first crack groove away from the isolation dam, a second blocking sub-part covering the bottom of the first crack groove, and a third blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the first blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the top of the first crack dam, the third blocking sub-part partially covers the sidewall of the adjacent first crack dam, and the height of the first blocking sub-part relative to the flexible substrate is greater than the height of the third blocking sub-part relative to the flexible substrate. The manufacturing method further includes forming a first planarization layer covering the crack dam and the metal barrier.

[0015] For example, in some embodiments of the manufacturing method provided in this application, The step of forming an isolation dam area and a crack dam area in the non-display area further includes: forming a plurality of crack dams on a flexible substrate, wherein the first crack dam includes a dam top and a sidewall, and forming a first crack groove that penetrates the first crack dam and exposes the flexible substrate between at least two adjacent first crack dams near the isolation dam area. The manufacturing method further includes: forming an organic buffer section, the organic buffer section covering the top of the first cracked dam and the sidewall of the first cracked dam away from the isolation dam, and partially covering the bottom of the trench of the first cracked dam away from the isolation dam; The metal blocking portion forming in the crack dam area that covers the first crack groove and partially covers the first crack dam further includes: forming a fourth blocking sub-part located on the side of the first crack groove away from the isolation dam, a fifth blocking sub-part covering the bottom of the exposed first crack groove, and a sixth blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the fourth blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the organic buffer portion, the orthographic projection of the fourth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the top of the adjacent first crack dam on the flexible substrate, the sixth blocking sub-part overlaps with the organic buffer portion covering the bottom of the groove, the orthographic projection of the sixth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the organic buffer portion on the flexible substrate, and the height of the fourth blocking sub-part relative to the flexible substrate is greater than the height of the sixth blocking sub-part relative to the flexible substrate; The manufacturing method further includes forming a second planarization layer covering the crack dam, the organic buffer section, and the metal barrier section.

[0016] The beneficial effects of this invention are as follows: This invention addresses existing problems by providing a display substrate, display panel, and manufacturing method. By creating a crack groove that penetrates the crack dams in the non-display area of ​​the display substrate and placing a metal blocking part in the crack groove, the invention effectively blocks crack extension, prevents static electricity, and improves the structural strength of the display substrate frame by blocking the inorganic layer. This overcomes the problems existing in the prior art and has broad application prospects. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 A schematic diagram of the structure of a display substrate according to an embodiment of the present invention is shown; Figure 2 A top view schematic diagram of a display panel according to an embodiment of the present invention is shown; Figure 3 A schematic diagram of the structure of the display substrate according to another embodiment of the present invention is shown; Figure 4 A partial structural schematic diagram of the first crack dam and the first crack groove of the display substrate according to another embodiment of the present invention is shown; Figure 5 A schematic diagram of the structure of the display substrate according to another embodiment of the present invention is shown; Figure 6 A partial structural schematic diagram of the first crack dam and the first crack groove of the display substrate according to another embodiment of the present invention is shown; Figure 7 A flowchart illustrating a manufacturing method according to an embodiment of the present invention is shown. Detailed Implementation

[0019] To more clearly illustrate the present invention, the following description, in conjunction with preferred embodiments and accompanying drawings, further explains the invention. Similar components in the drawings are indicated by the same reference numerals. Those skilled in the art should understand that the specific description below is illustrative rather than restrictive and should not be construed as limiting the scope of protection of the present invention.

[0020] It should be noted that the terms "on," "formed on," and "set on" used in this document can indicate that one layer is directly formed or set on another layer, or that one layer is indirectly formed or set on another layer, meaning that there are other layers between the two layers. In this document, unless otherwise stated, the term "located on the same layer" means that two layers, components, elements, or parts can be formed through the same patterning process, and that these two layers, components, elements, or parts are generally formed of the same material. In this document, unless otherwise stated, the description of "patterning process" generally includes steps such as photoresist coating, exposure, development, etching, and photoresist stripping. The description of "one-time patterning process" refers to a process that uses a single photomask to form patterned layers, components, elements, etc.

[0021] like Figure 1 The diagram shows the border area of ​​the display substrate according to an embodiment of this application, particularly the crack dam area 300' at the border area. The display panel includes a substrate 10', a functional film layer 20', and an encapsulation layer 30'. The substrate 10' is a flexible substrate, including a first flexible substrate 101', a buffer layer 102', and a second flexible substrate 103'. The functional film layer 20' includes multiple crack dams 201'. To prevent cracks from extending to the display area through the inorganic layers connected by the crack dams, deep grooves exposing the second flexible substrate 103' are provided between the crack dams 201' near the display area. A first planarization layer 202' is covered on the crack dams, and a second planarization layer 203' is covered on the first planarization layer. An encapsulation layer 30' is covered on the functional film layer 20'. The encapsulation layer 30' includes a first inorganic encapsulation layer 301', an organic encapsulation layer 302', and a second inorganic encapsulation layer 303'. In this embodiment, the inorganic layers are cut off by setting crack dams and deep grooves between the crack dams to prevent crack propagation.

[0022] However, in actual use, it was found that although this method prevented the cracks from extending further into the display area to a certain extent, it also posed a risk of product defects.

[0023] In response to the above situation, the inventors, after extensive research and experimentation, proposed that the reason for the risk of product defects is that the deep grooves between the crack dams further increase the step difference, causing the first flattening layer to fail to fill effectively, i.e., there is a situation of incomplete filling, which leads to defects during the production process, and at the same time, it does not form 100% blockage of cracks.

[0024] Based on the above problems and the causes of these problems, such as Figures 2-3 As shown, one embodiment of the present invention provides a display substrate, including a display area 100 and a non-display area 200 surrounding the display area 100, wherein the non-display area 200 includes an isolation dam area and a crack dam area 300 in a direction from near to far from the display area 100; The crack dam area 300 includes a plurality of crack dams 201, and a first crack groove 205 is provided between at least two adjacent first crack dams 2011 near the isolation dam area, which penetrates the first crack dam 2011. The crack dam area 300 includes a metal blocking portion 204 that covers the first crack groove 205 and partially covers the first crack dam 2011, wherein the side of the metal blocking portion 204 away from the isolation dam is higher than the side close to the isolation dam.

[0025] In this embodiment, Figure 2 This is a top view of a display substrate, including a display area 100 and a non-display area 200. Figure 3 This is a schematic cross-sectional view of the edge of the non-display area 200 away from the display area 100, including the crack dam area 300. In this embodiment, a crack groove penetrating the crack dam is provided between the crack dams in the crack dam area of ​​the non-display area of ​​the display substrate. A metal blocking part is provided in the crack groove. By blocking the inorganic layer, crack propagation is effectively prevented, static electricity is prevented, and the structural strength of the display substrate frame is improved. Specifically, as shown... Figure 3 As shown, the crack dam area includes multiple crack dams 201, wherein a deep groove 205 is provided between at least two adjacent crack dams near the display area. The crack dam is a first crack dam 2011, and the deep groove is a first crack groove 205. The first crack groove 205 penetrates the first crack dam 2011. A metal blocking part 204 is provided in the first crack groove 205. The metal blocking part 204 is directly formed in the first crack groove 205 and partially covers the first crack dam 2011. Figure 3 In the cross-sectional schematic diagram shown, the metal blocking part covers the sidewall and part of the top of the adjacent first crack dam on the side away from the display area, and partially covers the sidewall of another adjacent first crack dam on the side closer to the display area. In the cross-sectional schematic diagram, the metal blocking part overlaps on the left first crack dam, forming a covering on the right side of the left first crack dam. At the same time, the metal blocking part only partially overlaps on the sidewall of the right first crack dam, forming a metal blocking part with a high left side and a low right side, which effectively improves the frame strength while preventing the crack from extending into the display area.

[0026] In a specific embodiment, such as Figures 3-4 As shown, the display substrate includes a flexible substrate 10. The first crack dam 2011 includes a dam top 2012 and a sidewall 2013. The sidewall 2013 of the adjacent first crack dam 2011 located on both sides of the first crack groove 205 includes at least two steps. The first crack groove 205 includes a groove bottom 2051 that exposes the flexible substrate 10. The metal blocking portion 204 includes a first blocking sub-portion 2041 located on the side of the first crack groove 205 away from the isolation dam, a second blocking sub-portion 2042 covering the bottom 2051 of the first crack groove 205, and a third blocking sub-portion 2043 located on the side of the first crack groove 205 close to the isolation dam. The first blocking sub-portion 2041 covers the sidewall 2013 of the adjacent first crack dam 2011 and partially covers the top dam 2012 of the first crack dam 2011. The third blocking sub-portion 2043 partially covers the sidewall 2013 of the adjacent first crack dam 2011. The height of the first blocking sub-portion 2041 relative to the flexible substrate 10 is greater than the height of the third blocking sub-portion 2043 relative to the flexible substrate 10. The display substrate further includes a first planarization layer 202 covering the crack dam 201 and the metal barrier portion 204.

[0027] In this embodiment, a metal blocking part is embedded in the first crack groove, and the metal blocking part has different heights and areas on the sides away from and near the display area. That is, in this embodiment, on the one hand, the metal blocking part is set in the crack groove, and on the other hand, according to the fact that the force on the display substrate frame is horizontal from left to right, the horizontal force is concentrated on the dam body of the first crack dam on the right side; in other words, this embodiment uses the strong hardness of metal to completely cut off the crack dam of inorganic material by setting the metal blocking part in the crack groove, preventing the crack from extending further to the display area and reducing the step difference. At the same time, the strong pressure resistance of metal is used to further improve the frame strength by adopting the embedded structure of metal and inorganic layer.

[0028] To illustrate the specific structure of this embodiment, a detailed description will be provided using the fabrication of the display substrate of this embodiment as an example. Figure 3 and Figure 4 As shown, Figure 4 A partial schematic diagram of two adjacent first crack dams and the first crack groove between them includes the following steps: The first step is to form an isolation dam area and a crack dam area 300 in the non-display area. Specifically, a plurality of crack dams 201 are formed on the flexible substrate 10. The first crack dam 2011 includes a dam top 2012 and a sidewall 2013. A first crack groove 205 is formed between at least two adjacent first crack dams 2011 near the isolation dam area, penetrating the first crack dam 2011 and exposing the flexible substrate 10. At least two steps are formed on the sidewalls 2013 of the adjacent first crack dams 2011 located on both sides of the first crack groove 205.

[0029] In this embodiment, during the fabrication of the display substrate, crack dams are formed simultaneously with the formation of the display area. Specifically, the crack dams are disposed in the same layer as the gate insulating layer, for example, a gate insulating material layer (including...) is formed simultaneously. Figure 3 The inorganic material layer 206 in the crack dam region is simultaneously patterned, meaning that crack dams are formed in the crack dam region while the gate insulating layer is being formed in the display area, including crack grooves between the crack dams. It is worth noting that the first crack groove 205 is formed through two etching processes; specifically, it is formed through the first etching process... Figure 3 The shallow grooves between the crack dams far from the display area are grooves that do not penetrate the crack dams, and the crack dams are connected to each other; the first crack groove is formed by the second etching, that is, the deep groove that exposes the flexible substrate is formed, and two steps are formed on the sidewall 2013 of the first crack dam 2011 by etching on both sides.

[0030] The second step involves forming a metal blocking portion 204 in the crack dam region 300 that covers the first crack groove 205 and partially covers the first crack dam 2011. Specifically, a first blocking sub-portion 2041 is formed on the side of the first crack groove 205 away from the isolation dam, a second blocking sub-portion 2042 covers the bottom 2051 of the first crack groove 205, and a third blocking sub-portion 2043 is formed on the side of the first crack groove 205 close to the isolation dam. The first blocking sub-portion 2041 covers the sidewall 2013 of the adjacent first crack dam 2011 and partially covers the top dam 2012 of the first crack dam 2011. The third blocking sub-portion 2043 partially covers the sidewall 2013 of the adjacent first crack dam 2011. The height of the first blocking sub-portion 2041 relative to the flexible substrate 10 is greater than the height of the third blocking sub-portion 2043 relative to the flexible substrate 10. The thickness of the metal blocking portion covering the first crack groove 205 is greater than or equal to 600 nm and less than or equal to 700 nm.

[0031] In this embodiment, during the fabrication of the display substrate, a metal blocking portion 204 is formed simultaneously with the formation of the display area. Specifically, the metal blocking portion is disposed on the same layer as the first source / drain layer. For example, the first source / drain material layer is formed simultaneously and patterned synchronously. That is, while the first source and the first drain are formed in the display area, the metal blocking portion 204 located in the crack dam area is formed. This includes forming a first blocking sub-part 2041 located on the side of the first crack groove 205 away from the isolation dam, a second blocking sub-part 2042 covering the bottom 2051 of the first crack groove 205, and a third blocking sub-part 2043 located on the side of the first crack groove 205 close to the isolation dam. In this embodiment, on the one hand, a metal blocking part is set in the crack groove; on the other hand, according to the fact that the force on the display substrate frame is horizontal from left to right and the horizontal force is concentrated on the dam body of the first crack dam on the right side, this embodiment utilizes the strong supporting performance of metal to completely cut off the crack dam of inorganic material by setting the metal blocking part in the crack groove, preventing the crack from extending further into the display area and reducing the step difference. At the same time, the strong pressure resistance of metal is utilized to further improve the frame strength by adopting an embedded structure of metal and inorganic layers.

[0032] Based on this, a first planarization layer is further formed simultaneously. This first planarization layer fills the crack grooves between each crack dam. Since the metal blocking portion effectively reduces the step difference between the first crack dam and the first crack groove, the yield of the display product is effectively improved, and product defects caused by excessive step difference can be avoided. Specifically, the thickness of the first planarization layer is greater than 1.3μm, the depth of the first crack groove is less than or equal to 1.90μm, and the thickness of the metal blocking portion of the first crack groove is greater than or equal to 600nm and less than or equal to 700nm. Therefore, the step difference after the metal blocking portion is reduced is less than the thickness of the first planarization layer. That is, the first planarization layer can achieve the planarization design of the film layer by itself, so there is no need to set a second planarization layer, which effectively simplifies the bezel structure, reduces the cutting difficulty of the display substrate edge, and avoids the risk of carbide residue caused by excessive accumulation of organic materials.

[0033] In an optional embodiment, such as Figure 3 As shown, the crack dam area 300 includes three first crack dams 2011, two first crack grooves 205 located between the three first crack dams 2011, and two metal blocking parts 204 covering the two first crack grooves 205.

[0034] To prevent cracks from extending into the display area, the more first crack grooves formed between the first crack dam and adjacent first crack dams, the better the crack isolation effect. However, to avoid static electricity accumulation, the smaller the metal blocking part formed in the crack dam area, the better. Therefore, in this embodiment, to balance the crack isolation effect and the anti-static effect, three crack dams close to the display area are selected as the first crack dams, forming two first crack grooves located between the three first crack dams. This effectively improves the product stability of the display substrate while isolating cracks.

[0035] In a specific example, such as Figure 3 As shown, the crack dam area 300 has a second crack groove 208 between at least three adjacent crack dams 201 away from the isolation dam area, and the depth of the second crack groove 208 is less than the depth of the first crack groove 205.

[0036] This embodiment effectively avoids the problem of cracks extending into the display area caused by edge cutting of the display substrate by setting crack grooves of different depths in the crack dam area, thereby effectively improving the product yield of the display substrate.

[0037] To minimize the amount of metal material in the bezel area of ​​the display substrate, in one optional embodiment, such as... Figure 5 and Figure 6 As shown, the display substrate includes a flexible substrate 10. The first crack dam 2011 includes a dam top 2012 and a sidewall 2013, and the first crack groove 205 includes a groove bottom 2051 that exposes the flexible substrate 10. The display substrate further includes an organic buffer portion 202, which covers the top 2012 of the first crack dam 2011 and the sidewall 2013 of the first crack dam 2011 away from the isolation dam, and partially covers the bottom of the first crack dam 2011 away from the isolation dam. The metal blocking portion 204 includes a fourth blocking sub-portion 2044 located on the side of the first crack groove 205 away from the isolation dam, a fifth blocking sub-portion 2045 covering the exposed bottom 2051 of the first crack groove 205, and a sixth blocking sub-portion 2046 located on the side of the first crack groove 205 near the isolation dam. The fourth blocking sub-portion 2044 covers the sidewall 2013 adjacent to the first crack dam 2011 and partially covers the organic buffer portion 202. The fourth blocking sub-portion 2044 is located on the flexible substrate 10. The orthographic projection of the sixth blocking sub-part 2046 overlaps with the orthographic projection of the top 2012 of the adjacent first crack dam 2011 on the flexible substrate 10. The sixth blocking sub-part 2046 overlaps with the organic buffer part 202 covering the bottom 2051 of the trench. The orthographic projection of the sixth blocking sub-part 2046 on the flexible substrate 10 overlaps with the orthographic projection of the organic buffer part 202 on the flexible substrate 10. The height of the fourth blocking sub-part 2044 relative to the flexible substrate 10 is greater than the height of the sixth blocking sub-part 2046 relative to the flexible substrate 10. The display substrate further includes a second planarization layer 203 covering the crack dam 201, the organic buffer portion 202, and the metal barrier portion 204.

[0038] In this embodiment, by setting an organic buffer portion of organic material on the first crack dam of inorganic material and setting a metal blocking portion in the first crack groove formed by the first crack dam, with the metal blocking portion overlapping the organic buffer portion, the strong supporting performance of the metal material is used to completely cut off the crack dam of inorganic material to prevent the crack from extending to the display area, while also reducing the step difference and the amount of metal material in the bezel area. Furthermore, by padding the organic material on the crack dam of inorganic material, the organic material has a lower elastic modulus than the inorganic material, and the deformation of the organic material itself further bears and releases the horizontal force from the outside of the display substrate bezel, which can play a role in buffering external forces and effectively improve the external force resistance of the display substrate bezel.

[0039] To illustrate the specific structure of this embodiment, a detailed description will be provided using the fabrication of the display substrate of this embodiment as an example. Figure 5 and Figure 6 As shown, Figure 6 A partial schematic diagram of two adjacent first crack dams and the first crack groove between them includes the following steps: The first step is to form an isolation dam area and a crack dam area 300 in the non-display area. Specifically, a plurality of crack dams 201 are formed on the flexible substrate 10. The first crack dam 2011 includes a dam top 2012 and a sidewall 2013. A first crack groove 205 is formed between at least two adjacent first crack dams 2011 near the isolation dam area, penetrating the first crack dam 2011 and exposing the flexible substrate 10.

[0040] In this embodiment, during the fabrication of the display substrate, crack dams are formed simultaneously with the formation of the display area. Specifically, the crack dams are disposed in the same layer as the gate insulating layer, for example, a gate insulating material layer (including...) is formed simultaneously. Figure 3 The inorganic material layer 206 in the crack dam region is simultaneously patterned, meaning that crack dams are formed in the crack dam region while the gate insulating layer is being formed in the display area, including crack grooves between the crack dams. It is worth noting that the first crack groove 205 is formed through two etching processes; specifically, it is formed through the first etching process... Figure 5 The shallow grooves between the crack dams, which are far from the display area, are grooves that do not penetrate the crack dams, and the crack dams are connected to each other. The first crack groove is formed by a second etching, which forms a deep groove that exposes the flexible substrate. It is worth noting that the first crack groove 205 is formed by two etching processes. Specifically, the first etching forms a groove as shown in the image. Figure 5 The shallow grooves between the crack dams far from the display area are grooves that do not penetrate the crack dams, and the crack dams are connected to each other; the first crack groove is formed by the second etching, which forms a deep groove that exposes the flexible substrate, completely cutting off the crack dams of the inorganic material and preventing the cracks from extending to the display area through the inorganic material.

[0041] The second step is to form an organic buffer section 202, which covers the top dam 2012 of the first cracked dam and the sidewall 2013 of the first cracked dam away from the isolation dam, and partially covers the bottom 2051 of the first cracked dam away from the isolation dam.

[0042] In this embodiment, during the fabrication of the display substrate, an organic buffer portion is simultaneously formed on the basis of the first planarization layer forming the display area. Specifically, the organic buffer portion is disposed on the same layer as the first planarization layer covering the first source / drain layer. For example, the first planarization layer material layer is formed simultaneously and patterned synchronously. That is, the organic buffer portion located on the crack dam is formed at the same time as the first planarization layer covering the first source / drain layer is formed in the display area. Figure 5 and Figure 6As shown, the organic buffer portion 202 is used to buffer, withstand, and partially release horizontal stress from the outside of the frame from left to right. Therefore, viewed from left to right, organic material is retained at the left sidewall 2013 and dam top 2012 of the first crack dam 2011. Simultaneously, to further improve the buffering effect, the organic material partially covers part of the bottom of the dam groove on the left side of the first crack dam, i.e., the organic material partially covers the exposed flexible substrate. When horizontal stress strikes from left to right, in addition to the buffering and partial release by the organic buffer portion, the flexible substrate can also buffer and withstand part of the unreleased stress. That is, the organic buffer portion partially covers the left side of the first crack dam, forming a double buffer of the organic buffer portion and the flexible substrate, further improving the frame's resistance to external forces and forming a... Figure 5 and Figure 6 The morphology of the organic buffer section is shown.

[0043] Thirdly, a metal blocking portion 204 is formed in the crack dam area 300, covering the first crack groove 205 and partially covering the organic buffer portion 202 on the first crack dam 2011. Specifically, a fourth blocking sub-portion 2044 is formed on the side of the first crack groove 205 away from the isolation dam, a fifth blocking sub-portion 2045 covers the bottom 2051 of the first crack groove 205, and a sixth blocking sub-portion 2046 is formed on the side of the first crack groove 205 closer to the isolation dam. The fourth blocking sub-portion 2044 covers the adjacent first crack groove 2011. The sidewall 2013 of the first crack dam 2011 partially covers the organic buffer portion 202 on the dam top 2012 of the first crack dam 2011. The sixth blocking sub-part 2046 partially covers the organic buffer portion 202 on the sidewall 2013 of the adjacent first crack dam 2011. The height of the fourth blocking sub-part 2044 relative to the flexible substrate 10 is greater than the height of the sixth blocking sub-part 2046 relative to the flexible substrate 10. The thickness of the metal blocking portion covering the first crack groove 205 is greater than or equal to 600 nm and less than or equal to 700 nm.

[0044] In this embodiment, during the fabrication of the display substrate, a metal blocking portion 204 is simultaneously formed on the basis of the second source / drain layer forming the display area. Specifically, the metal blocking portion is disposed in the same layer as the second source / drain layer, for example, the second source / drain material layer is formed simultaneously and patterned synchronously. That is, while forming the second source and the second drain in the display area, a metal blocking portion 204 located in the crack dam region is formed. This includes forming a fourth blocking sub-portion 2044 located on the side of the first crack groove 205 away from the isolation dam, a fifth blocking sub-portion 2045 covering the bottom 2051 of the first crack groove 205, and a sixth blocking sub-portion 2046 located on the side of the first crack groove 205 close to the isolation dam. Specifically, as shown... Figure 5 and Figure 6As shown, the fourth blocking sub-part 2044 of the metal blocking part 204 overlaps with the side wall of the first crack dam on the left and the organic buffer part 202 covering the top of the dam. At the same time, the sixth blocking sub-part 2046 overlaps with the organic buffer part 202 on the side wall of the first crack dam on the right. Through the fourth blocking sub-part 2044, the fifth blocking sub-part 2045 and the sixth blocking sub-part 2046 of the metal blocking part 204, the crack dam of the inorganic material is completely blocked, preventing the crack from extending along the inorganic material to the display area. At the same time, the strong supporting performance of the metal material is used to completely cut off the crack. The organic material is used to prevent cracks from extending into the display area, while also reducing step differences and the amount of metal material in the bezel area. Furthermore, by placing the organic material on the crack dam of the inorganic material, the organic material has a lower elastic modulus than the inorganic material. When subjected to horizontal forces from the metal barrier, the organic material deforms itself to further bear and release the horizontal forces from outside the display substrate bezel, reducing the horizontal forces entering the display area along the lower right inorganic crack dam and effectively improving the bezel's resistance to external forces.

[0045] Based on this, a second planarization layer is further formed simultaneously. The second planarization layer is used to fill the crack grooves between each crack dam and realize the planarization design of the film layer in the crack dam area. Since the metal blocking part effectively reduces the step difference between the first crack dam and the first crack groove, it effectively improves the yield of the display product and avoids product defects caused by excessive step difference.

[0046] In an optional embodiment, such as Figure 5 As shown, the crack dam area 300 includes two first crack dams 2011, a first crack groove 205 located between the two first crack dams 2011, and a metal blocking part 204 covering the first crack groove 205.

[0047] To prevent cracks from extending into the display area, the more first crack grooves formed between the first crack dam and adjacent first crack dams, the better the crack isolation effect. However, to avoid static electricity accumulation, the smaller the metal blocking part formed in the crack dam area, the better. Therefore, in this embodiment, to balance the crack isolation effect and the anti-static effect, two crack dams close to the display area are selected as the first crack dams, forming a first crack groove located between the two first crack dams. This effectively improves the product stability of the display substrate while isolating cracks.

[0048] In a specific example, such as Figure 5 As shown, the crack dam area 300 has a second crack groove 208 between at least three adjacent crack dams 201 away from the isolation dam area, and the depth of the second crack groove 208 is less than the depth of the first crack groove 205.

[0049] This embodiment effectively avoids the problem of cracks extending into the display area caused by edge cutting of the display substrate by setting crack grooves of different depths in the crack dam area, thereby effectively improving the product yield of the display substrate.

[0050] In an optional embodiment, such as Figure 3 and Figure 5 As shown, the display substrate further includes an encapsulation layer disposed on the planarization layer. In the direction from near to far from the flexible substrate, the encapsulation layer includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. The orthographic projection of the organic encapsulation layer on the flexible substrate coincides with the orthographic projection of the first inorganic encapsulation layer on the flexible substrate, and the orthographic projection of the organic encapsulation layer on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate. The orthographic projections of the first crack dam and the first crack groove on the flexible substrate fall within the orthographic projection of the organic encapsulation layer on the flexible substrate; The orthographic projection of the plurality of crack dams on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate.

[0051] In this embodiment, considering the location of the crack dam area, the encapsulation layer is set. On the orthographic projection of the flexible substrate, the first inorganic encapsulation layer and the organic encapsulation layer cover the first crack dam and the first crack groove, which effectively avoids product defects caused by stress between film layers and improves the product yield of the display substrate. At the same time, the second inorganic encapsulation layer covers the crack dam area, thereby forming a continuous and closed-loop barrier structure, solving problems such as side water and oxygen penetration, step stress concentration, and edge cutting crack extension, further improving the product yield of the display substrate.

[0052] Based on the display substrate of the above embodiments, one embodiment of the present invention provides a display panel including the display substrate of the above embodiments.

[0053] In this embodiment, by providing a through-crack groove between the crack dams in the non-display area of ​​the display substrate of the display panel, and providing a metal blocking part in the crack groove, the inorganic layer is effectively blocked to prevent crack propagation, prevent static electricity, and improve the structural strength of the display substrate frame. The display panel can be any product or component with display function, such as a smartphone, tablet, television, monitor, laptop, digital photo frame, or navigator; this embodiment is not limited to this.

[0054] Based on the display substrate of the above embodiments, one embodiment of the present invention provides a method for manufacturing the display substrate of the above embodiments, such as... Figure 7 As shown, it includes: An isolation dam area and a crack dam area are formed in the non-display area. The crack dam area includes multiple crack dams. A first crack groove that penetrates the first crack dam is provided between at least two adjacent first crack dams near the isolation dam area. A metal barrier is formed in the crack dam area, covering the first crack groove and partially covering the first crack dam, wherein the side of the metal barrier away from the isolation dam is higher than the side close to the isolation dam.

[0055] In this embodiment, by providing a crack groove that penetrates the crack dam between the crack dams in the non-display area of ​​the display substrate, and providing a metal blocking part in the crack groove, the inorganic layer is effectively blocked from crack extension, prevents static electricity, and improves the structural strength of the display substrate frame.

[0056] In an optional embodiment, a plurality of crack dams are formed on a flexible substrate, the first crack dam including a dam top and a sidewall, a first crack groove is formed between at least two adjacent first crack dams near the isolation dam area, penetrating the first crack dam and exposing the flexible substrate, and at least two steps are formed on the sidewalls of adjacent first crack dams located on both sides of the first crack groove. The metal blocking portion forming in the crack dam region that covers the first crack groove and partially covers the first crack dam further includes: forming a first blocking sub-part located on the side of the first crack groove away from the isolation dam, a second blocking sub-part covering the bottom of the first crack groove, and a third blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the first blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the top of the first crack dam, the third blocking sub-part partially covers the sidewall of the adjacent first crack dam, and the height of the first blocking sub-part relative to the flexible substrate is greater than the height of the third blocking sub-part relative to the flexible substrate. The manufacturing method further includes forming a first planarization layer covering the crack dam and the metal barrier.

[0057] In this embodiment, a metal blocking part is embedded in the first crack groove, and the metal blocking part has different heights and areas on the sides away from and near the display area. That is, this embodiment, on the one hand, uses the metal blocking part in the crack groove, and on the other hand, considers that the force on the display substrate frame is horizontal from left to right, with the horizontal force concentrated on the dam body of the first crack dam on the right side. In other words, this embodiment utilizes the high hardness of metal to completely cut off the crack dam of the inorganic material through the metal blocking part in the crack groove, preventing the crack from extending further into the display area and reducing the step difference. Simultaneously, the high pressure resistance of metal is utilized to further improve the frame strength through the embedded structure of metal and inorganic layers. For specific implementation details of this embodiment, please refer to the foregoing embodiments, which will not be repeated here.

[0058] In an optional embodiment, forming an isolation dam area and a crack dam area in the non-display area further includes: forming a plurality of crack dams on a flexible substrate, the first crack dam including a dam top and a sidewall, and forming a first crack groove that penetrates the first crack dam and exposes the flexible substrate between at least two adjacent first crack dams near the isolation dam area. The manufacturing method further includes: forming an organic buffer section, the organic buffer section covering the top of the first cracked dam and the sidewall of the first cracked dam away from the isolation dam, and partially covering the bottom of the trench of the first cracked dam away from the isolation dam; The metal blocking portion forming in the crack dam area that covers the first crack groove and partially covers the first crack dam further includes: forming a fourth blocking sub-part located on the side of the first crack groove away from the isolation dam, a fifth blocking sub-part covering the bottom of the exposed first crack groove, and a sixth blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the fourth blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the organic buffer portion, the orthographic projection of the fourth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the top of the adjacent first crack dam on the flexible substrate, the sixth blocking sub-part overlaps with the organic buffer portion covering the bottom of the groove, the orthographic projection of the sixth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the organic buffer portion on the flexible substrate, and the height of the fourth blocking sub-part relative to the flexible substrate is greater than the height of the sixth blocking sub-part relative to the flexible substrate; The manufacturing method further includes forming a second planarization layer covering the crack dam, the organic buffer section, and the metal barrier section.

[0059] In this embodiment, by setting an organic buffer portion of organic material on the first crack dam of inorganic material and setting a metal blocking portion in the first crack groove formed by the first crack dam, with the metal blocking portion overlapping the organic buffer portion, the strong supporting performance of the metal material is used to completely cut off the crack dam of inorganic material to prevent the crack from extending to the display area, while also reducing the step difference and the amount of metal material in the bezel area. Furthermore, by padding the organic material on the crack dam of inorganic material, the organic material has a lower elastic modulus than the inorganic material, and the deformation of the organic material itself further bears and releases the horizontal force from the outside of the display substrate bezel, which can play a role in buffering external forces and effectively improve the external force resistance of the display substrate bezel.

[0060] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. For those skilled in the art, other variations or modifications can be made based on the above description. It is impossible to exhaustively list all the implementation methods here. All obvious variations or modifications derived from the technical solutions of the present invention are still within the protection scope of the present invention.

Claims

1. A display substrate, characterized in that, The display substrate includes a display area and a non-display area surrounding the display area. The non-display area includes an isolation dam area and a crack dam area in a direction from near to far from the display area. The crack dam area includes multiple crack dams, and a first crack groove that penetrates the first crack dam is provided between at least two adjacent first crack dams near the isolation dam area. The crack dam area includes a metal barrier that covers the first crack groove and partially covers the first crack dam, wherein the side of the metal barrier away from the isolation dam is higher than the side close to the isolation dam.

2. The display substrate according to claim 1, characterized in that, The display substrate includes a flexible substrate. The first crack dam includes a dam top and sidewalls, and the sidewalls of adjacent first crack dams located on both sides of the first crack groove include at least two steps. The first crack groove includes a groove bottom that exposes the flexible substrate. The metal blocking portion includes a first blocking sub-portion located on the side of the first crack groove away from the isolation dam, a second blocking sub-portion covering the bottom of the first crack groove, and a third blocking sub-portion located on the side of the first crack groove close to the isolation dam. The first blocking sub-portion covers the sidewall of the adjacent first crack dam and partially covers the top of the first crack dam. The third blocking sub-portion partially covers the sidewall of the adjacent first crack dam. The height of the first blocking sub-portion relative to the flexible substrate is greater than the height of the third blocking sub-portion relative to the flexible substrate. The display substrate also includes a first planarization layer covering the crack dam and the metal barrier.

3. The display substrate according to claim 2, characterized in that, The crack dam area includes three first crack dams, two first crack grooves located between the three first crack dams, and two metal barriers covering the two first crack grooves.

4. The display substrate according to claim 1, characterized in that, The display substrate includes a flexible substrate. The first crack dam includes a dam top and sidewalls, and the first crack groove includes a groove bottom that exposes the flexible substrate; The display substrate further includes an organic buffer portion, which covers the top of the first crack dam and the sidewall of the first crack dam away from the isolation dam, and partially covers the bottom of the trench of the first crack dam away from the isolation dam. The metal blocking portion includes a fourth blocking sub-portion located on the side of the first crack groove away from the isolation dam, a fifth blocking sub-portion covering the exposed bottom of the first crack groove, and a sixth blocking sub-portion located on the side of the first crack groove close to the isolation dam. The fourth blocking sub-portion covers the sidewall of the adjacent first crack dam and partially covers the organic buffer portion. The orthographic projection of the fourth blocking sub-portion on the flexible substrate overlaps with the orthographic projection of the top of the adjacent first crack dam on the flexible substrate. The sixth blocking sub-portion overlaps with the organic buffer portion covering the bottom of the groove. The orthographic projection of the sixth blocking sub-portion on the flexible substrate overlaps with the orthographic projection of the organic buffer portion on the flexible substrate. The height of the fourth blocking sub-portion relative to the flexible substrate is greater than the height of the sixth blocking sub-portion relative to the flexible substrate. The display substrate further includes a second planarization layer covering the crack dam, the organic buffer portion, and the metal barrier portion.

5. The display substrate according to claim 4, characterized in that, The crack dam area includes two first crack dams, a first crack groove located between the two first crack dams, and a metal barrier covering one of the first crack grooves.

6. The display substrate according to any one of claims 1-5, characterized in that, The cracked dam area has a second crack groove between at least three adjacent cracked dams away from the isolation dam area, and the depth of the second crack groove is less than the depth of the first crack groove.

7. The display substrate according to claim 6, characterized in that, The display substrate also includes an encapsulation layer disposed on the planarization layer. In the direction from near to far from the flexible substrate, the encapsulation layer includes a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer. The orthographic projection of the organic encapsulation layer on the flexible substrate coincides with the orthographic projection of the first inorganic encapsulation layer on the flexible substrate, and the orthographic projection of the organic encapsulation layer on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate. The orthographic projections of the first crack dam and the first crack groove on the flexible substrate fall within the orthographic projection of the organic encapsulation layer on the flexible substrate; The orthographic projection of the plurality of crack dams on the flexible substrate falls within the orthographic projection of the second inorganic encapsulation layer on the flexible substrate.

8. The display substrate according to claim 1, characterized in that, The thickness of the metal barrier covering the first crack groove is greater than or equal to 600 nm and less than or equal to 700 nm.

9. A display panel, characterized in that, Includes the display substrate as described in any one of claims 1-8.

10. A method for manufacturing a display substrate as described in any one of claims 1-8, characterized in that, include: An isolation dam area and a crack dam area are formed in the non-display area. The crack dam area includes multiple crack dams. A first crack groove that penetrates the first crack dam is provided between at least two adjacent first crack dams near the isolation dam area. A metal barrier is formed in the crack dam area, covering the first crack groove and partially covering the first crack dam, wherein the side of the metal barrier away from the isolation dam is higher than the side close to the isolation dam.

11. The manufacturing method according to claim 10, characterized in that, The step of forming an isolation dam area and a crack dam area in the non-display area further includes: forming a plurality of crack dams on a flexible substrate, wherein the first crack dam includes a dam top and a sidewall; forming a first crack groove that penetrates the first crack dam and exposes the flexible substrate between at least two adjacent first crack dams near the isolation dam area; and forming at least two steps on the sidewalls of adjacent first crack dams located on both sides of the first crack groove. The metal blocking portion forming in the crack dam region that covers the first crack groove and partially covers the first crack dam further includes: forming a first blocking sub-part located on the side of the first crack groove away from the isolation dam, a second blocking sub-part covering the bottom of the first crack groove, and a third blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the first blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the top of the first crack dam, the third blocking sub-part partially covers the sidewall of the adjacent first crack dam, and the height of the first blocking sub-part relative to the flexible substrate is greater than the height of the third blocking sub-part relative to the flexible substrate. The manufacturing method further includes forming a first planarization layer covering the crack dam and the metal barrier.

12. The manufacturing method according to claim 10, characterized in that, The step of forming an isolation dam area and a crack dam area in the non-display area further includes: forming a plurality of crack dams on a flexible substrate, wherein the first crack dam includes a dam top and a sidewall, and forming a first crack groove that penetrates the first crack dam and exposes the flexible substrate between at least two adjacent first crack dams near the isolation dam area. The manufacturing method further includes: forming an organic buffer section, the organic buffer section covering the top of the first cracked dam and the sidewall of the first cracked dam away from the isolation dam, and partially covering the bottom of the trench of the first cracked dam away from the isolation dam; The metal blocking portion forming in the crack dam area that covers the first crack groove and partially covers the first crack dam further includes: forming a fourth blocking sub-part located on the side of the first crack groove away from the isolation dam, a fifth blocking sub-part covering the bottom of the exposed first crack groove, and a sixth blocking sub-part located on the side of the first crack groove close to the isolation dam, wherein the fourth blocking sub-part covers the sidewall of the adjacent first crack dam and partially covers the organic buffer portion, the orthographic projection of the fourth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the top of the adjacent first crack dam on the flexible substrate, the sixth blocking sub-part overlaps with the organic buffer portion covering the bottom of the groove, the orthographic projection of the sixth blocking sub-part on the flexible substrate overlaps with the orthographic projection of the organic buffer portion on the flexible substrate, and the height of the fourth blocking sub-part relative to the flexible substrate is greater than the height of the sixth blocking sub-part relative to the flexible substrate; The manufacturing method further includes forming a second planarization layer covering the crack dam, the organic buffer section, and the metal barrier section.

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