Wafer inspection tool and microscope

Abstract

This invention discloses a wafer inspection fixture, comprising a base and a turntable rotatably connected to the base. The turntable has multiple support blocks, each with recessed platforms. These support blocks are arranged to match the wafer's shape. The wafer is supported by the recessed platforms on the support blocks, which also limit its movement. This specialized fixture allows for wafer rotation via the turntable structure. During inspection, the wafer itself does not require repeated adjustments; circumferential inspection is achieved simply by rotating the turntable. The support blocks isolate the wafer from other components, reducing the risk of scratches. The recessed platforms, in addition to supporting the wafer, also act as limiting platforms, ensuring the wafer remains stable and does not detach during rotation. The support blocks can be arranged according to the wafer's shape, offering high adaptability.

Description

Technical Field

[0001] This invention relates to the field of wafer inspection technology, specifically to wafer inspection fixtures and microscopes. Background Technology

[0002] Due to the high precision requirements of wafer products, precision measurements are required after the finished product is manufactured. The measurement process requires frequent adjustments to the wafer position or angle. Existing platforms are not functional enough to meet the requirements of multi-angle and multi-directional wafer measurements. Frequent adjustments to the wafer can scratch it, which is not only troublesome but also causes measurement errors or product damage. To improve the reliability of wafer measurements, it is necessary to improve the measurement equipment. Summary of the Invention

[0003] Technical objective: To address the shortcomings of existing technologies, this invention discloses a wafer inspection fixture and a microscope.

[0004] Technical Solution: According to one aspect of this application, a wafer inspection fixture is provided, comprising a base and a turntable rotatably connected to the base. The turntable has multiple support blocks, each with recesses. The support blocks are arranged to match the wafer's shape. The wafer is supported by the recesses on the support blocks, and the support blocks limit the wafer's position. This specialized fixture achieves wafer rotation through the turntable structure. During inspection, there is no need to repeatedly adjust the wafer itself; circumferential inspection can be achieved simply by rotating the turntable. The support blocks isolate the wafer from other components, reducing the risk of scratches. The recesses, in addition to supporting the wafer, also act as limiters, ensuring the wafer remains stable and does not fall off during rotation. The support blocks can be arranged according to the wafer's shape, offering high adaptability.

[0005] In some embodiments, the base and the turntable are connected by a bearing structure. The bearing structure has high rotational reliability, which is beneficial to the stable operation of the system.

[0006] In some embodiments, the base is provided with a raised ring, the turntable is provided with a concave ring groove that matches the raised ring, and the bearing is located between the raised ring and the concave ring groove. The raised ring and concave ring groove structure has the advantages of small space occupation, concealed bearing installation, good stability and reliability, and minimal interference to the bearing.

[0007] In some embodiments, the support blocks are circumferentially and evenly distributed on the turntable. Circular wafers are a more common shape, and circumferential distribution suits a wider range of applications, while uniform distribution provides better wafer support stability.

[0008] In some embodiments, an adjustment mechanism is provided between the support block and the turntable. The purpose of the adjustment mechanism is to accommodate wafers of various sizes.

[0009] In some embodiments, the adjustment mechanism refers to a matching elongated hole between the support block and the turntable, a circular hole on the support block, and a support rod for adjusting the axial height between the support block and the turntable within the circular hole. A locking screw is installed within the elongated hole. The screw, which rotates concealed within the circular hole, controls the gap between the support block and the turntable to achieve circumferential height adjustment. The elongated hole is used for adjustment. In some embodiments, a damping device for controlling the rotational speed of the turntable is further provided between the turntable and the base. The purpose of adding the damping device is to improve the stability of the wafer by maintaining the stability of the turntable. In the non-rotating operation state, the turntable remains stable on the base thanks to the damping device, which is beneficial to the reliability of the inspection and does not interfere with the normal inspection requirements for wafer stability. The turntable only rotates when an operating force is applied to it to adjust the wafer's state, improving the convenience of wafer inspection while ensuring wafer stability and reliable inspection.

[0010] In some embodiments, the damping device is a damping disk, wherein the two relatively rotating components of the damping disk are respectively connected to the base and the turntable. The damping disk has a simple structure, small size, mature technology, stable and reliable performance, and low cost, making it well-suited for wafer inspection work scenarios.

[0011] In some embodiments, the base has a through hole, the damping disc is located within the through hole, and the lower parts of the two relatively rotating components of the damping disc are connected to the base. This fully utilizes the base's own structure, reducing the overall size of the tooling. The through hole in the base is located within the inner ring of the bearing structure, which does not affect the bearing's rotation, while also making full use of the accommodating space formed by the bearing mechanism and the base.

[0012] In some embodiments, the turntable has a recess that matches the damping disk, and the upper parts of the two relatively rotating components of the damping disk are located in the recess and connected to the turntable. This fully utilizes the turntable structure, and the damping device is covered between the turntable and the base in cooperation with the base. This technique can make full use of the space formed by the bearing mechanism between the turntable and the base, hide the damping device, reduce the overall size, and protect the damping.

[0013] In some embodiments, the turntable is provided with a recessed step at the position between the support blocks. Wafer inspection requires placing the wafer on the support blocks, so whether it is operated manually or with the help of other equipment, operating space is required. The purpose of the recessed step is to provide as much operating space as possible to facilitate the handling of wafers. Moreover, the recessed step provides a positional reference for the installation of the support blocks. When the wafer is circular, the support blocks should also be distributed circumferentially. A circular recessed step facilitates the accurate installation of the support blocks. The recessed step has a similar function for other wafer shapes.

[0014] In some embodiments, the turntable is provided with a barrier, and the support block is located inside the barrier. The purpose of the barrier is for positioning, facilitating the installation and positioning of the support block and ensuring its stability and reliability after positioning.

[0015] Another aspect of this application provides a microscope that includes the aforementioned wafer inspection fixture. The use of this fixture on the measuring microscope significantly improves the efficiency and reliability of wafer inspection, resulting in less damage during the wafer inspection process.

[0016] In some embodiments, it also includes a moving platform on which the wafer inspection fixture is mounted. Microscopes with moving stages offer better sample movement capabilities, enabling more comprehensive wafer inspection. Furthermore, the inspection process eliminates the need to move or manipulate the wafer itself, significantly reducing the risk of wafer damage, thus increasing efficiency and minimizing risk. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below.

[0018] Figure 1 This is a schematic diagram of the overall structure of the wafer inspection fixture of the present invention.

[0019] Figure 2 This is a partial exploded view of the wafer inspection fixture of the present invention.

[0020] Figure 3 This is a partial exploded view of the wafer inspection fixture of the present invention from another angle.

[0021] Figure 4 This is a cross-sectional view of the wafer inspection tooling of the present invention.

[0022] Figure 5 This is a schematic diagram of the structure of the wafer inspection tooling of the present invention for matching wafer samples.

[0023] Figure 6 This is a schematic diagram of the wafer inspection fixture of the present invention used in a microscope. Detailed Implementation

[0024] The present invention will now be described more clearly and completely by way of a preferred embodiment in conjunction with the accompanying drawings, but this does not limit the invention to the scope of the described embodiment.

[0025] Reference Appendix Figure 6As shown, in a wafer inspection scenario, a microscope 10 is used to carry out inspection work. The movable stage 8 built into the microscope 10 can provide the microscope's inspection range and application scenarios. The user places the wafer sample 9 on the movable stage 8 for inspection. The movable stage 8 moves the wafer sample 9 to a suitable position. The wafer inspection fixture is installed on the movable stage 8 to achieve the rotation of the wafer sample 9. Then, the microscope 10 performs inspection on various positions of the wafer sample 9.

[0026] In practice, the wafer inspection fixture in this case can be adapted to various microscopes or application scenarios.

[0027] Reference Appendix Figure 1-5 As shown, in this embodiment, the wafer inspection fixture includes a base 1 and a turntable 2. The turntable 2 is rotatably connected to the base 1, and the base 1 and the turntable 2 are connected by a bearing 4. The base 1 has a raised ring 1.1, and the turntable 2 has a recessed annular groove 2.1 that matches the raised ring 1.1. The raised ring 1.1 and the recessed annular groove 2.1 form an installation space. The bearing 4 is located between the raised ring 1.1 and the recessed annular groove 2.1 to achieve the rotational engagement between the turntable 2 and the base 1. The installation and fixing of the bearing 4 itself is a conventional technique and will not be described in detail.

[0028] The turntable 2 is provided with multiple support blocks 3, each support block 3 having a recessed platform 3.1. The multiple support blocks 3 are arranged to match the shape of the wafer. The wafer is supported by the recessed platforms 3.1 on the multiple support blocks 3, and the multiple support blocks 3 limit the wafer's position. In practice, the wafer sample 9 is mostly circular. The support blocks 3 are evenly distributed circumferentially on the turntable 2. Setting three support blocks 3 is sufficient to ensure the support function. In addition to supporting the wafer sample 9, the recessed platforms 3.1 on the support blocks 3 also serve as radial limiters. In practice, the diameter of the circular support space formed by the support blocks 3 matches the size of the wafer sample 9, ensuring the stability of the wafer sample 9 during installation.

[0029] In some embodiments, an adjustment mechanism is provided between the support block 3 and the turntable 2. The purpose of the adjustment mechanism is to ensure that the mounting space formed by the three support blocks 3 can match the size of the wafer sample 9.

[0030] In some embodiments, the adjustment mechanism refers to a matching elongated hole 5 (not shown on the turntable 2 in the accompanying drawings) provided between the support block 3 and the turntable 2. The support block 3 is provided with a circular hole 6, and the circular hole 6 is provided with a support rod for adjusting the axial height between the support block 3 and the turntable 2. A locking screw is installed inside the elongated hole 5. The support rod is threadedly connected to the circular hole. By adjusting the length of the support rod, the height between the support block 3 and the turntable 2 is adjusted, thereby matching wafer samples of different thicknesses. This ensures that the wafer sample does not contact the turntable, while also ensuring sufficient operating space for mounting and placing the wafer sample 9. The elongated hole 5 allows for adjustment of the support block 3 in the radial direction of the turntable 2, matching wafer samples of different diameters.

[0031] In some embodiments, a damping device for controlling the rotational speed of the turntable 2 is further provided between the turntable 2 and the base 1. The damping device is a damping disc 7, and the two relatively rotating parts of the damping disc 7 are respectively connected to the base 1 and the turntable 2. The damping disc 7 comprises upper and lower parts, which are respectively connected to the turntable 2 and the base 1. The base 1 has a through hole 1.2, and the damping disc 7 is located within the through hole 1.2. The lower parts of the two relatively rotating parts of the damping disc 7 are connected to the base 1.

[0032] In some embodiments, the turntable 2 is provided with a recess 2.2 that matches the damping disk 7. The upper parts of the two relatively rotating components of the damping disk 7 are located in the recess 2.2 and connected to the turntable 2. The through hole 1.2 and the recess 2.2 can make full use of the space between the base 1 and the turntable 2, reducing the volume of the wafer inspection fixture itself. The through hole 1.2 on the base 1 is easy to process, and the damping disk 7 will be hidden after the base 1 is installed with the moving platform 8. The recess 2.2 on the turntable 2 can reduce the interference of the damping disk on the wafer sample 9. The end face of the turntable 2 corresponding to the wafer sample 9 remains flat, which helps to reduce accidental damage to the wafer sample. In this way, the damping disk 7 can make full use of the space between the base 1 and the turntable 2, reducing its volume, and can be completely covered to avoid exposure and interference.

[0033] In some embodiments, the turntable 2 is provided with a recessed step 2.3 at the position between each support block 3. The recessed step 2.3 firstly provides more operating space for picking up and placing the wafer sample 9. Secondly, the recessed step 2.3 is set according to the shape of the wafer sample 9, such as circular. The recessed step 2.3 provides a basic installation position reference for the installation of the support block 3, which facilitates the quick installation or adjustment of the support block 3.

[0034] In some embodiments, the turntable 2 is provided with a retaining wall 2.4, and the support block 3 is located inside the retaining wall 2.4. By setting the size of the retaining wall 2.4 to match the outer dimensions of the support block 3, circumferential limiting is achieved, improving the stability of the support block 3 and reducing the probability of shaking. Furthermore, when manually operating the turntable 2, the retaining wall 2.4 can serve as a handle, facilitating manual operation of the turntable 2.

Claims

1. A wafer inspection fixture, characterized in that, It includes a base (1) and a turntable (2), the turntable (2) being rotatably connected to the base (1), the turntable (2) being provided with multiple support blocks (3), the support blocks (3) being provided with recesses (3.1), the multiple support blocks (3) being arranged according to the matching wafer shape structure, the wafer being supported by the recesses (3.1) on the multiple support blocks (3), and the multiple support blocks (3) limiting the wafer.

2. The wafer inspection fixture according to claim 1, characterized in that, The base (1) and the turntable (2) are connected by a bearing (4) structure.

3. The wafer inspection fixture according to claim 2, characterized in that, The base (1) is provided with a raised ring (1.1), the turntable (2) is provided with a concave ring groove (2.1) that matches the raised ring (1.1), and the bearing (4) is located between the raised ring (1.1) and the concave ring groove (2.1).

4. The wafer inspection fixture according to claim 1, characterized in that, The support blocks (3) are evenly distributed circumferentially on the turntable (2).

5. The wafer inspection fixture according to claim 1, characterized in that, An adjustment mechanism is provided between the support block (3) and the turntable (2).

6. The wafer inspection fixture according to claim 5, characterized in that, The adjustment mechanism refers to the following: a matching elongated hole (5) is provided between the support block (3) and the turntable (2); a round hole (6) is provided on the support block (3); a support rod for adjusting the axial height between the support block (3) and the turntable (2) is provided in the round hole (6); and a locking screw is provided in the elongated hole (5).

7. The wafer inspection fixture according to claim 1, characterized in that, A damping device for controlling the rotational speed of the turntable (2) is also provided between the turntable (2) and the base (1).

8. The wafer inspection fixture according to claim 7, characterized in that, The damping device is a damping disc (7), and the two relatively rotating parts of the damping disc (7) are respectively connected to the base (1) and the turntable (2).

9. The wafer inspection fixture according to claim 8, characterized in that, The base (1) is provided with a through hole (1.2), and the damping disk (7) is located inside the through hole (1.2). The lower parts of the two relatively rotating parts of the damping disk (7) are connected to the base (1).

10. The wafer inspection fixture according to claim 9, characterized in that, The turntable (2) is provided with a recess (2.2) that matches the damping disk (7). The upper parts of the two relatively rotating parts of the damping disk (7) are located in the recess (2.2) and connected to the turntable (2).

11. The wafer inspection fixture according to claim 1, characterized in that, The turntable (2) is provided with a sunken step (2.3) at the position between each support block (3).

12. The wafer inspection fixture according to claim 1, characterized in that, The turntable (2) is provided with a barrier (2.4), and the support block (3) is located inside the barrier (2.4).

13. A microscope, characterized in that, It includes the wafer inspection fixture described in claims 1-10 above.

14. The microscope according to claim 11, characterized in that, It also includes a mobile platform (8), on which the wafer inspection fixture is mounted.

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