A lentinus edodes cultivation material pre-wetting screening and material separating integrated precision processing device

Abstract

The application relates to the technical field of shiitake cultivation, and discloses a shiitake cultivation material pre-wetting screening and material distributing integrated precision processing device, which comprises a machine base, a pre-wetting cylinder, a feeding cylinder, a screening mechanism, a spraying and humidifying mechanism, a discharging pipe, a shielding mechanism and a quantitative material distributing mechanism, an installation groove is formed in the top of the machine base, and the front and back sides of the installation groove are both open structures; the pre-wetting cylinder is fixedly installed on the top of the machine base through two supporting legs; the feeding cylinder is fixedly installed on the top of the pre-wetting cylinder, and the top of the feeding cylinder is of an open structure; the screening mechanism is arranged in the feeding cylinder and used for screening and impurity removing of shiitake cultivation material; and the spraying and humidifying mechanism is arranged on the pre-wetting cylinder and used for spraying water mist and humidifying treatment of the shiitake cultivation material. The application has the following advantages and effects: the shiitake cultivation material can be subjected to integrated operation of feeding, screening and impurity removing, uniform and efficient pre-wetting and quantitative weighing and distributing, the manual labor and labor cost are reduced, and the work efficiency is improved.

Description

Technical Field

[0001] This application relates to the field of shiitake mushroom cultivation technology, and in particular to a precision processing device that integrates pre-wetting screening and material separation for shiitake mushroom cultivation materials. Background Technology

[0002] Shiitake mushrooms are a mainstream edible fungus cultivated on a large scale in my country. Shiitake mushroom substrate is typically a mixture of broadleaf sawdust, corn cobs, wheat bran, rice bran, and other agricultural and forestry byproducts. Removing impurities and controlling the moisture content of the substrate are crucial pre-processes that determine the quality of the finished mushroom substrate, reduce contamination by other microorganisms, and ensure stable and high-quality shiitake mushroom yields. Currently, large-scale shiitake mushroom substrate production requires pre-treatment processes such as screening, pre-wetting, and separating the substrate.

[0003] In existing technologies, the screening, pre-wetting, and portioning of shiitake mushroom cultivation substrate generally employs a segmented, independent equipment operation mode. Processing is completed sequentially through a screening machine, a pre-wetting mixing machine, and manual weighing and portioning. This approach fails to achieve integrated operation of screening, pre-wetting, and quantitative portioning, leading to increased manual labor, requiring multiple workers, and increased labor costs. Furthermore, the transfer of shiitake mushroom cultivation substrate between various pre-processing steps increases working time and reduces efficiency. Therefore, we propose an integrated precision processing device for pre-wetting, screening, and portioning of shiitake mushroom cultivation substrate to solve the aforementioned problems. Summary of the Invention

[0004] The purpose of this application is to provide a precision processing device for pre-wetting, screening, and distributing shiitake mushroom cultivation materials. This device integrates feeding, screening, and impurity removal of shiitake mushroom cultivation materials, uniform and efficient pre-wetting, and quantitative weighing and distributing, thereby reducing manual labor and labor costs and improving work efficiency.

[0005] The above-mentioned technical objective of this application is achieved through the following technical solution: a precision processing device integrating pre-wetting, screening, and dispensing of shiitake mushroom cultivation material, comprising a base, a pre-wetting cylinder, a feeding cylinder, a screening mechanism, a spray humidification mechanism, a discharge pipe, a shielding mechanism, and a quantitative dispensing mechanism. The base has an installation groove on its top, with open sections on both the front and rear sides. The pre-wetting cylinder is fixedly mounted on the top of the base via two legs. The feeding cylinder is fixedly mounted on the top of the pre-wetting cylinder, with an open top. The screening mechanism is located inside the feeding cylinder for screening and removing impurities from the shiitake mushroom cultivation material. The spray humidification mechanism is located on the pre-wetting cylinder for spraying water mist to humidify the shiitake mushroom cultivation material. The discharge pipe is fixedly mounted at the bottom of the pre-wetting cylinder. The shielding mechanism is located below the pre-wetting cylinder for shielding the bottom end of the discharge pipe. The quantitative dispensing mechanism is used to quantitatively dispense the shiitake mushroom cultivation material.

[0006] The further configuration of this application is as follows: the screening mechanism includes a screening hopper, a screen, multiple permanent magnets, an upper ring plate, a lower ring plate, multiple vertical rods, multiple springs, multiple stops, a crossbeam, a vibrating motor, and a feeding pipe; the screening hopper is located inside the feeding cylinder; the screen is fixedly installed inside the screening hopper; multiple permanent magnets are all fixedly installed on the inner side wall of the screening hopper and are distributed in an equally spaced ring, with the multiple permanent magnets located above the screen; the upper ring plate is fixedly sleeved on the outer side wall of the screening hopper; the lower ring plate is fixedly installed on the inner side wall of the feeding cylinder, and the bottom of the screening hopper passes through the lower ring plate; multiple vertical rods are all fixedly installed on the upper ring plate. The bottom of the ring plate is arranged in an evenly spaced ring, and the bottom ends of multiple vertical rods slide through the lower ring plate; the top ends of multiple springs are fixedly connected to the bottom of the upper ring plate, and the bottom ends of multiple springs are fixedly connected to the top of the lower ring plate, with each spring sleeved on a corresponding vertical rod; multiple stops are fixedly installed at the bottom ends of corresponding vertical rods; a crossbeam is fixedly installed inside the screen hopper and below the screen, with the top of the crossbeam having an arc-shaped convex surface; a vibrating motor is fixedly installed at the center of the bottom of the crossbeam; the top end of the feed pipe is fixedly connected to the bottom of the screen hopper, and the bottom end of the feed pipe extends into the pre-wetting cylinder.

[0007] A further feature of this application is that a horn-shaped guide cover located above the screen hopper is fixedly installed inside the feeding cylinder, and the inner diameter of the horn-shaped guide cover decreases sequentially from top to bottom.

[0008] The further configuration of this application is as follows: the spray humidification mechanism includes a hollow vertical shaft, a solid vertical shaft, spiral blades, multiple hollow stirring rods, multiple water mist nozzles (first type), multiple stirring blades, annular pipe, multiple water mist nozzles (second type), multiple water mist nozzles (third type), a rotary joint, a main water supply pipe, an electromagnetic flow regulating valve (first type), a water supply branch pipe, an electromagnetic flow regulating valve (second type), and a drive assembly; the hollow vertical shaft is rotatably installed at the top center of the pre-humidification cylinder, with its bottom end located inside the pre-humidification cylinder; the solid vertical shaft is fixedly installed at its bottom end; the spiral blades are fixedly installed on the solid vertical shaft, with both the bottom end of the solid vertical shaft and the bottom end of the spiral blades extending into the discharge pipe; one end of each of the multiple hollow stirring rods is fixedly connected to the hollow vertical shaft, and the other end of each of the multiple hollow stirring rods is fixedly connected to the solid vertical shaft, with the multiple hollow stirring rods arranged in an equally spaced annular pattern; multiple water mist nozzles (first type) are fixedly connected to the multiple hollow stirring rods. The components are evenly distributed; multiple stirring blades are fixedly connected to multiple hollow stirring rods and are evenly distributed; an annular pipe is fixedly installed on the top inner wall of the pre-wetting cylinder; multiple water mist nozzles are fixedly connected to the bottom of the annular pipe and are evenly distributed in a ring; multiple water mist nozzles are fixedly connected to the inner ring wall of the annular pipe and are evenly distributed in a ring, and the multiple water mist nozzles are all inclined downwards; a rotary joint is rotatably installed at the top of the hollow vertical shaft; the main water supply pipe is located above the pre-wetting cylinder, and one end of the main water supply pipe is fixedly connected to the top of the rotary joint; an electromagnetic flow regulating valve is fixedly installed on the main water supply pipe; one end of the water supply branch pipe is fixedly connected to the main water supply pipe and is located to the right of the electromagnetic flow regulating valve, and the other end of the water supply branch pipe is fixedly connected to the annular pipe; an electromagnetic flow regulating valve is fixedly installed on the water supply branch pipe; the drive assembly is located above the pre-wetting cylinder and is used to control the rotation of the hollow vertical shaft.

[0009] A further configuration of this application is as follows: the drive assembly includes a servo motor, a gear, and an external gear ring; the servo motor is fixedly mounted on the top of the pre-wetting cylinder; the gear is fixedly mounted on the output shaft end of the servo motor; the external gear ring is fixedly sleeved on the hollow vertical shaft, and the gear meshes with the external gear ring.

[0010] A further configuration of this application is as follows: the blocking mechanism includes an electric push rod, a vertical plate, a baffle, and a pressure sensor; the electric push rod is fixedly installed on the support leg located on the right side; the vertical plate is fixedly installed on the telescopic end of the electric push rod; the baffle is fixedly installed on the left side of the vertical plate, and the bottom end of the discharge pipe slides and seals against the top of the baffle; the pressure sensor is fixedly installed on the left side of the vertical plate and located above the baffle, and the pressure sensor abuts against the outer wall of the discharge pipe.

[0011] A further feature of this application is that a guide rod is fixedly installed on the right side of the vertical plate, and the right end of the guide rod slides through the support leg located on the right side.

[0012] A further configuration of this application is as follows: the quantitative dispensing mechanism includes a bearing seat, a rotating shaft, an adjusting motor, a pad, a weighing sensor, and a measuring cylinder; the bearing seat is fixedly installed on the left inner wall of the mounting groove; the left end of the rotating shaft is rotatably connected to the bearing seat; the adjusting motor is fixedly installed on the right inner wall of the mounting groove, and the right end of the rotating shaft is fixedly connected to the output shaft end of the adjusting motor; the pad is fixedly installed on the rotating shaft; the weighing sensor is fixedly installed on the top of the pad; the measuring cylinder is fixedly installed on the top of the weighing sensor, and the measuring cylinder is located directly below the discharge pipe.

[0013] A further feature of this application is that an angle sensor is fixedly installed on the left side of the pad.

[0014] A further feature of this application is that a plurality of near-infrared moisture sensors are fixedly installed on the outer wall of the pre-wetting cylinder, and the detection ends of the plurality of near-infrared moisture sensors are all located inside the pre-wetting cylinder.

[0015] This application includes at least one of the following beneficial technical effects: 1. The screening mechanism designed in this application can efficiently remove coarse wood chips, hard straw, and clumps of dry material mixed in with shiitake mushroom cultivation substrate, as well as remove metal impurities such as iron nails and iron wires, ensuring uniform particle size of the material. This, in turn, ensures that the uniform particle size of the shiitake mushroom cultivation substrate has balanced air permeability, reduces the probability of contamination by miscellaneous bacteria in the later stage of the substrate, and improves the growth quality of shiitake mushrooms.

[0016] 2. This application designs a spray humidification mechanism that can spray water mist from two directions. One spray mist can spray the shiitake mushroom cultivation material in the space above the pre-humidification cylinder, while the other spray mist can spray the shiitake mushroom cultivation material in the middle part of the pre-humidification cylinder. In addition, the drive component controls the rotation of the solid vertical shaft, spiral blades, multiple hollow stirring rods, multiple water mist nozzles and multiple stirring blades, which can increase the movement range of the shiitake mushroom cultivation material, eliminate pre-humidification dead corners, and achieve efficient and uniform pre-humidification treatment of shiitake mushroom cultivation material.

[0017] 3. The quantitative dispensing mechanism designed in this application can achieve precise quantitative dispensing, ensuring that the weight of the shiitake mushroom cultivation material in each bag is consistent, resulting in uniform tightness of the mushroom sticks after bagging, and greatly improving the qualified rate of the finished shiitake mushroom sticks.

[0018] 4. By utilizing the synergistic effect of the screening mechanism, the spray humidification mechanism, the shielding mechanism, and the quantitative dispensing mechanism, this application can achieve integrated operation of feeding, screening and removing impurities, uniform and efficient pre-humidification, and quantitative weighing and dispensing of shiitake mushroom cultivation materials, thereby reducing manual labor and labor costs and improving work efficiency. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a three-dimensional structural diagram of this embodiment.

[0021] Figure 2 This is a schematic diagram of the three-dimensional structure in a partial cross-section of the main view in this embodiment.

[0022] Figure 3 This is a three-dimensional structural diagram of the screening mechanism.

[0023] Figure 4 This is a schematic diagram of the three-dimensional structure of the screening mechanism from the left sectional view.

[0024] Figure 5 This is a three-dimensional structural diagram of the spray humidification mechanism.

[0025] Figure 6 This is a three-dimensional structural diagram of the shielding mechanism.

[0026] Figure 7 This is a three-dimensional structural diagram of the quantitative material dispensing mechanism.

[0027] In the diagram: 1. Base; 2. Support leg; 3. Pre-wetting cylinder; 4. Feeding cylinder; 5. Screening mechanism; 51. Screening hopper; 52. Screen; 53. Permanent magnet; 54. Upper ring plate; 55. Lower ring plate; 56. Vertical rod; 57. Spring; 58. Stop block; 59. Crossbeam; 510. Vibrating motor; 511. Feeding pipe; 6. Horn-shaped guide hood; 7. Spray humidification mechanism; 71. Hollow vertical shaft; 72. Solid vertical shaft; 73. Spiral blade; 74. Hollow stirring rod; 75. Water mist nozzle one; 76. Stirring blade; 77. Annular pipe; 78. Water mist nozzle two; 79. Water mist nozzle three; 710. Rotation. 711. Connector; 712. Main water supply pipe; 713. Electromagnetic flow regulating valve one; 714. Branch water supply pipe; 715. Electromagnetic flow regulating valve two; 716. Servo motor; 717. Gear; 718. External gear ring; 8. Discharge pipe; 9. Baffle mechanism; 91. Electric actuator; 92. Vertical plate; 93. Baffle; 94. Pressure sensor; 95. Guide rod; 10. Quantitative dispensing mechanism; 101. Shaft seat; 102. Rotating shaft; 103. Adjusting motor; 104. Pad; 105. Weighing sensor; 106. Measuring cylinder; 107. Angle sensor; 11. Near-infrared moisture sensor; 12. Mounting slot. Detailed Implementation

[0028] The technical solution of this application will be clearly and completely described below with reference to specific embodiments. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0029] See Figures 1-7 This application provides a precision processing device integrating pre-wetting, screening, and dispensing of shiitake mushroom cultivation material, including a base 1, a pre-wetting cylinder 3, a feeding cylinder 4, a screening mechanism 5, a spray humidification mechanism 7, a discharge pipe 8, a shielding mechanism 9, and a quantitative dispensing mechanism 10. The base 1 has an installation groove 12 on its top, with open front and rear sides. The pre-wetting cylinder 3 is fixedly mounted on the top of the base 1 via two support legs 2. The feeding cylinder 4 is fixedly mounted on the top of the pre-wetting cylinder 3, with an open top. The screening mechanism 5 is located inside the feeding cylinder 4 for screening and removing impurities from the shiitake mushroom cultivation material. The spray humidification mechanism 7 is located on the pre-wetting cylinder 3 for spraying water mist to humidify the shiitake mushroom cultivation material. The discharge pipe 8 is fixedly mounted at the bottom of the pre-wetting cylinder 3. The shielding mechanism 9 is located below the pre-wetting cylinder 3 for shielding the bottom opening of the discharge pipe 8. The quantitative dispensing mechanism 10 is used to quantitatively dispense the shiitake mushroom cultivation material.

[0030] In this embodiment, the screening mechanism 5 includes a screening hopper 51, a screen 52, multiple permanent magnets 53, an upper ring plate 54, a lower ring plate 55, multiple vertical rods 56, multiple springs 57, multiple stops 58, a crossbeam 59, a vibrating motor 510, and a feeding pipe 511. The screening hopper 51 is located inside the feeding cylinder 4. The screen 52 is fixedly installed inside the screening hopper 51. The multiple permanent magnets 53 are all fixedly installed on the inner sidewall of the screening hopper 51 and are distributed in a ring at equal intervals. The multiple permanent magnets 53 are all located above the screen 52. The design of iron 53 allows for magnetic adsorption of metal impurities such as iron nails and wires mixed in the mushroom cultivation medium. The design of screen 52 allows for the removal of coarse wood chips, hard straw, and clumps of dry material from the mushroom cultivation medium, thus ensuring that the screened mushroom cultivation medium has a uniform particle size and consistent aeration during subsequent mushroom cultivation, thereby improving the growth quality of the mushrooms. The upper ring plate 54 is fixedly fitted onto the outer wall of the sieve hopper 51; the lower ring plate 55 is fixedly installed on the inner wall of the feeding cylinder 4, and the bottom of the sieve hopper 51 passes through the lower ring plate 54. 5; Multiple vertical rods 56 are fixedly installed at the bottom of the upper ring plate 54 and are distributed in a ring at equal intervals. The bottom ends of the multiple vertical rods 56 slide through the lower ring plate 55; The top ends of multiple springs 57 are fixedly connected to the bottom of the upper ring plate 54, and the bottom ends of multiple springs 57 are fixedly connected to the top of the lower ring plate 55. The multiple springs 57 are respectively sleeved on the corresponding vertical rods 56; Multiple stops 58 are fixedly installed at the bottom ends of the corresponding vertical rods 56; The crossbeam 59 is fixedly installed inside the screen hopper 51 and located below the screen 52. The top of the crossbeam 59 is an arc-shaped convex surface; the vibrating motor 510 is fixedly installed at the bottom center of the crossbeam 59; the top of the feeding pipe 511 is fixedly connected to the bottom of the sieve hopper 51, and the bottom end of the feeding pipe 511 extends into the pre-wetting cylinder 3. By utilizing the high-frequency vibration generated by the vibrating motor 510 during operation, combined with the elastic force of multiple springs 57, and guided by multiple vertical rods 56, the sieve hopper 51 can be controlled to reciprocate vertically, thereby improving the screening efficiency and comprehensiveness of the shiitake mushroom cultivation material.

[0031] In this embodiment, a funnel-shaped guide cover 6 is fixedly installed inside the feeding cylinder 4 above the sieve hopper 51. The inner diameter of the funnel-shaped guide cover 6 decreases from top to bottom. By using the funnel-shaped guide cover 6, all the mushroom cultivation material to be screened can be guided into the sieve hopper 51.

[0032] In this embodiment, the spray humidification mechanism 7 includes a hollow vertical shaft 71, a solid vertical shaft 72, a spiral blade 73, multiple hollow stirring rods 74, multiple water mist nozzles 75, multiple stirring blades 76, an annular pipe 77, multiple water mist nozzles 78, multiple water mist nozzles 79, a rotary joint 710, a main water supply pipe 711, an electromagnetic flow regulating valve 712, a water supply branch pipe 713, an electromagnetic flow regulating valve 714, and a drive assembly. The hollow vertical shaft 71 is rotatably mounted on the top center of the pre-humidification cylinder 3, and the bottom end of the hollow vertical shaft 71 is located inside the pre-humidification cylinder 3. The solid vertical shaft 72 is fixedly mounted on the bottom end of the hollow vertical shaft 71. The spiral blade 73 is fixedly mounted on the solid vertical shaft 72, and the bottom ends of both the solid vertical shaft 72 and the spiral blade 73 extend to the outlet. Inside the feed pipe 8; one end of each of the multiple hollow stirring rods 74 is fixedly connected to the hollow vertical shaft 71, and the other end of each of the multiple hollow stirring rods 74 is fixedly connected to the solid vertical shaft 72. The multiple hollow stirring rods 74 are arranged in a ring at equal intervals; multiple water mist nozzles 75 are fixedly connected to the multiple hollow stirring rods 74 and are evenly distributed; multiple stirring blades 76 are fixedly connected to the multiple hollow stirring rods 74 and are evenly distributed; the annular pipe 77 is fixedly installed on the top inner wall of the pre-wetting cylinder 3; multiple water mist nozzles 78 are fixedly connected to the bottom of the annular pipe 77 and are arranged in a ring at equal intervals; multiple water mist nozzles 79 are fixedly connected to the inner annular wall of the annular pipe 77 and are arranged in a ring at equal intervals. The multiple water mist nozzles 79 are all inclined downwards; rotary joint 710. The hollow vertical shaft 71 is rotatably mounted on its top end; the main water supply pipe 711 is located above the pre-wetting cylinder 3, with one end of the main water supply pipe 711 fixedly connected to the top end of the rotary joint 710, and the other end of the main water supply pipe 711 fixedly connected to an external clean water pressure pipeline; the electromagnetic flow regulating valve 712 is fixedly mounted on the main water supply pipe 711; one end of the water supply branch pipe 713 is fixedly connected to the main water supply pipe 711 and located to the right of the electromagnetic flow regulating valve 712, and the other end of the water supply branch pipe 713 is fixedly connected to the annular pipe 77; the electromagnetic flow regulating valve 714 is fixedly mounted on the water supply branch pipe 713; the drive assembly is located above the pre-wetting cylinder 3 and is used to control the rotation of the hollow vertical shaft 71. By opening the electromagnetic flow regulating valve 712 to a suitable degree, the rotation of the main water supply pipe 711 can be controlled. Clear water is sprayed out in a mist from multiple water mist nozzles 75. By using the hollow vertical shaft 71 to drive the solid vertical shaft 72, spiral blades 73, multiple hollow stirring rods 74, multiple water mist nozzles 75, and multiple stirring blades 76 to rotate, and with the electromagnetic flow regulating valve 712 opening to a suitable degree, the mushroom cultivation material can be stirred and mixed at the same time, increasing the movement range of the mushroom cultivation material, while spraying water mist onto the mushroom cultivation material located in the middle of the pre-wetting cylinder 3. By opening the electromagnetic flow regulating valve 714, some clear water can be sprayed out in a mist from multiple water mist nozzles 78 and 79, which can spray water mist onto the mushroom cultivation material located in the space above the pre-wetting cylinder 3, thereby eliminating pre-wetting dead corners and achieving efficient and uniform pre-wetting treatment of mushroom cultivation material.

[0033] In this embodiment, the drive assembly includes a servo motor 715, a gear 716, and an external gear ring 717. The servo motor 715 is fixedly installed on the top of the pre-wetting cylinder 3. The gear 716 is fixedly installed on the output shaft end of the servo motor 715. The external gear ring 717 is fixedly sleeved on the hollow vertical shaft 71. The gear 716 meshes with the external gear ring 717. The servo motor 715 is a reversible motor used to drive the gear 716 to rotate. By utilizing the meshing transmission action between the gear 716 and the external gear ring 717, the rotation of the hollow vertical shaft 71 can be controlled. It should be noted that when the servo motor 715 is controlled to rotate forward, the spiral blade 73 follows forward, which can lift the mushroom cultivation material at the bottom of the pre-wetting cylinder 3 and in the discharge pipe 8 upward, thereby eliminating the dead corners of stirring and pre-wetting. When the servo motor 715 is controlled to rotate in reverse, the spiral blade 73 follows reverse, which can discharge the pre-wetted mushroom cultivation material evenly and uniformly from the discharge pipe 8 without causing blockage inside the discharge pipe 8.

[0034] In this embodiment, the blocking mechanism 9 includes an electric actuator 91, a vertical plate 92, a baffle 93, and a pressure sensor 94. The electric actuator 91 is fixedly mounted on the right-side support leg 2. The vertical plate 92 is fixedly mounted on the telescopic end of the electric actuator 91. The baffle 93 is fixedly mounted on the left side of the vertical plate 92, and the bottom end of the discharge pipe 8 is slidably sealed to the top of the baffle 93. The pressure sensor 94 is fixedly mounted on the left side of the vertical plate 92 and above the baffle 93, and the pressure sensor 94 abuts against the outer wall of the discharge pipe 8. The electric actuator 91 is used to drive the vertical plate 92 to move horizontally and linearly, thereby adjusting the position of the baffle 93. Figure 1 , Figure 2 and Figure 6 As shown, the electric actuator 91 is in the extended state. At this time, the baffle 93 completely seals the bottom end of the discharge pipe 8, which can ensure that the mushroom cultivation material will not leak out from the discharge pipe 8 during the pre-wetting process. The preset pressure value generated when the pressure sensor 94 comes into contact with the discharge pipe 8 can be used to determine whether the baffle 93 has moved to the left and whether the bottom end of the discharge pipe 8 has been completely sealed.

[0035] In this embodiment, a guide rod 95 is fixedly installed on the right side of the vertical plate 92. The right end of the guide rod 95 slides through the support leg 2 located on the right side. By using the guide rod 95, the stability of the horizontal linear movement of the vertical plate 92 can be ensured.

[0036] In this embodiment, the quantitative dispensing mechanism 10 includes a bearing seat 101, a rotating shaft 102, an adjusting motor 103, a pad 104, a weighing sensor 105, and a measuring cylinder 106. The bearing seat 101 is fixedly installed on the left inner wall of the mounting groove 12. The left end of the rotating shaft 102 is rotatably connected to the bearing seat 101. The adjusting motor 103 is fixedly installed on the right inner wall of the mounting groove 12, and the right end of the rotating shaft 102 is fixedly connected to the output shaft end of the adjusting motor 103. The pad 104 is fixedly installed on the rotating shaft 102. The weighing sensor 105 is fixedly installed on the top of the pad 104. The measuring cylinder 106 is fixedly installed on the weighing... The weighing sensor 105 is located at the top, and the measuring cylinder 106 is located directly below the discharge pipe 8. The adjusting motor 103 is a reversible motor. The weighing sensor 105 is used to weigh and measure the shiitake mushroom cultivation material in the measuring cylinder 106. By using the adjusting motor 103 to drive the rotating shaft 102 to rotate, the measuring cylinder 106 is flipped around the rotating shaft 102 as the center, so that the opening of the measuring cylinder 106 is flipped downwards, so that the staff can take the bag and receive the required weight of shiitake mushroom cultivation material, thereby achieving precise quantitative distribution and ensuring that the weight of shiitake mushroom cultivation material in each bag is consistent, so that the tightness of the mushroom sticks is uniform after bagging.

[0037] In this embodiment, an angle sensor 107 is fixedly installed on the left side of the pad 104. The flip angle of the measuring cylinder 106 can be detected by using the angle sensor 107.

[0038] In this embodiment, multiple near-infrared moisture sensors 11 are fixedly installed on the outer wall of the pre-wetting cylinder 3 in a uniformly distributed manner. The detection ends of the multiple near-infrared moisture sensors 11 are all located inside the pre-wetting cylinder 3. By utilizing multiple uniformly distributed near-infrared moisture sensors 11, the humidity of the shiitake mushroom cultivation material can be collected in real time from all directions, ensuring that the pre-wetting of the shiitake mushroom cultivation material is uniform and can stably maintain the standard moisture content of 58%-62% for the shiitake mushroom cultivation material, laying the foundation for the subsequent vigorous growth of shiitake mushrooms.

[0039] In this embodiment, it should be noted that the vibration motor 510, electromagnetic flow regulating valve one 712, electromagnetic flow regulating valve two 714, servo motor 715, electric actuator 91, pressure sensor 94, regulating motor 103, weighing sensor 105, angle sensor 107, and multiple near-infrared moisture sensors 11 are all electrically connected to an external controller. Furthermore, the pressure sensor 94, weighing sensor 105, angle sensor 107, and multiple near-infrared moisture sensors 11 are all electrically connected to an external display screen. The wiring connection method and control method are mature technologies in this field and have been fully disclosed and explained, so they will not be described again in this document.

[0040] Based on the above structure, the working principle of the integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate provided in this application is as follows: The prepared shiitake mushroom cultivation medium, which is a mixture of broadleaf tree wood chips, corn cobs, wheat bran, rice bran, gypsum powder, etc., is fed into the top of the feeding cylinder 4. It is then guided into the screen hopper 51 by the trumpet-shaped guide cover 6. Multiple ring-shaped permanent magnets 53 are used to adsorb metal fragments such as iron nails and iron wires mixed in the shiitake mushroom cultivation medium, thus completing the metal removal. At the same time, the vibration motor 510 is started and runs. The vibration motor drives the crossbeam 59 to generate high-frequency excitation force. With the elastic force of multiple springs 57, the screen hopper 51 can vibrate up and down along the vertical rod 56. Under the vibration state, the shiitake mushroom cultivation medium can be screened out by the screen 52. Coarse wood segments, hard lumps, and large pieces of straw are trapped on the upper surface of the screen 52 and cleaned manually at regular intervals. Fine materials that meet the particle size requirements pass down through the screen holes on the screen 52. After the removal of impurities, the shiitake mushroom cultivation medium with uniform particle size falls into the pre-wetting cylinder 3 through the feeding pipe 511. After screening, when all the shiitake mushroom cultivation material with uniform and suitable particle size falls into the pre-wetting cylinder 3, the electromagnetic flow regulating valve 1 712 and electromagnetic flow regulating valve 2 714 are opened to appropriate opening degrees, and the servo motor 715 is started to run in reverse. At this time, clean water enters the main water supply pipe 711 through the external pipe and flows in two directions. One direction enters the hollow vertical shaft 71 through the rotary joint 710, then passes through multiple hollow stirring rods 74, and finally sprays out in a mist from multiple water mist nozzles 1 75 to pre-wet the shiitake mushroom cultivation material in the middle part of the pre-wetting cylinder 3. The other direction enters the annular pipe 77 through the water supply branch pipe 713, and finally sprays out from multiple water mist nozzles 2 78 and 3 79 to pre-wet the shiitake mushroom cultivation material in the space above the pre-wetting cylinder 3. At the same time, the servo motor 715 engages with the gear 716. The outer gear ring 717 drives the hollow vertical shaft 71, solid vertical shaft 72, spiral blade 73, multiple hollow stirring rods 74, multiple water mist nozzles 75, and multiple stirring blades 76 to rotate in reverse, which can mix the mushroom cultivation material in all directions, increase the movement range of the mushroom cultivation material, and make the sprayed water mist come into full contact with the mushroom cultivation material, eliminating pre-wetting dead corners. At the same time, using multiple near-infrared moisture sensors 11, the moisture content of the mushroom cultivation material in the pre-wetting cylinder 3 can be detected in real time. If the moisture content of the mushroom cultivation material is lower than 58%, the opening of the electromagnetic flow regulating valve 712 and the electromagnetic flow regulating valve 714 can be increased to increase the spray volume. When the moisture content of the mushroom cultivation material is detected to be between 58% and 62%, the electromagnetic flow regulating valve 712 and the electromagnetic flow regulating valve 714 are closed, thus completing the pre-wetting treatment. Subsequently, the electric actuator 91 retracts and resets, pushing the vertical plate 92 and baffle 93 to the right, thus releasing the blockage of the bottom opening of the discharge pipe 8 by the baffle 93. The servo motor 715 is then controlled to rotate forward, causing the spiral blades 73 to follow suit. This allows the pre-wetted and uniformly moistened mushroom cultivation material to be discharged from the discharge pipe 8 at a constant speed and in a uniform quantity. The discharged mushroom cultivation material falls into the measuring cylinder 106, where the weight of the mushroom cultivation material is detected by the weighing sensor 105. When the weight of the mushroom cultivation material in the measuring cylinder 106 reaches the preset standard weight for a single bag, the servo motor 715 is paused, and the regulating motor 103 is started, driving the rotating shaft 102 to rotate. The rotation causes the pad 104 and the measuring cylinder 106 to rotate synchronously. The side angle sensor 107 of the pad monitors the rotation angle in real time and precisely controls the tilt of the measuring cylinder 106. The staff can then take the container bag to receive the mushroom cultivation material poured out of the measuring cylinder 106. After the material is poured out, the control motor 103 is reversed to adjust the measuring cylinder 106 to a vertical position so that the opening of the measuring cylinder 106 faces upward. The servo motor 715 is then started to rotate forward again, so that the pre-moistened and evenly moistened mushroom cultivation material can continue to be transported into the measuring cylinder 106. By following the above operation steps, quantitative material distribution can be achieved to ensure that the weight of each bag of mushroom cultivation material is consistent.

[0041] The above provides a detailed description of the integrated precision processing device for pre-wetting, screening, and distributing shiitake mushroom cultivation substrate provided in this application. Specific embodiments have been used to illustrate the principles and implementation methods of this application. These embodiments are merely illustrative and are intended to aid in understanding the method and core concepts of this application. It should be noted that those skilled in the art can make various improvements and modifications to this application without departing from its principles, and these improvements and modifications also fall within the scope of protection of the claims of this application.

Claims

1. A precision processing device integrating pre-wetting screening and material separation for shiitake mushroom cultivation substrate, characterized in that, include: The base (1) has a mounting groove (12) on its top, and the mounting groove (12) has an open structure on both the front and back sides. The pre-wetting cylinder (3) is fixedly installed on the top of the base (1) by two support legs (2); Feeding cylinder (4) is fixedly installed on the top of the pre-wetting cylinder (3), and the top of the feeding cylinder (4) is an open structure; The screening mechanism (5) is set inside the feeding cylinder (4) and is used to screen and remove impurities from the shiitake mushroom cultivation material; A spray humidification mechanism (7) is installed on the pre-humidification cylinder (3) and is used to spray water mist to humidify the shiitake mushroom cultivation material. The discharge pipe (8) is fixedly installed at the bottom of the pre-wetting cylinder (3); A shielding mechanism (9) is provided below the pre-wetting cylinder (3) to shield the bottom end of the discharge pipe (8); The quantitative dispensing mechanism (10) is used to quantitatively dispense shiitake mushroom cultivation material.

2. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 1, characterized in that, The screening mechanism (5) includes: The sieve hopper (51) is located inside the feeding cylinder (4); A screen (52) is fixedly installed inside the screen hopper (51); Multiple permanent magnets (53) are fixedly installed on the inner side wall of the sieve hopper (51) and are distributed in a ring at equal intervals. The multiple permanent magnets (53) are located above the sieve (52). The upper ring plate (54) is fixedly sleeved on the outer side wall of the screen hopper (51); The lower ring plate (55) is fixedly installed on the inner side wall of the feeding cylinder (4), and the bottom of the screen hopper (51) passes through the lower ring plate (55). Multiple vertical rods (56) are fixedly installed at the bottom of the upper ring plate (54) and are distributed in a ring at equal intervals. The bottom ends of the multiple vertical rods (56) slide through the lower ring plate (55). Multiple springs (57) are fixedly connected at their top ends to the bottom of the upper ring plate (54), and at their bottom ends to the top of the lower ring plate (55). The multiple springs (57) are respectively sleeved on the corresponding vertical rods (56). Multiple stops (58) are fixedly installed at the bottom end of the corresponding vertical rods (56); A crossbeam (59) is fixedly installed inside the sieve hopper (51) and located below the sieve (52). The top of the crossbeam (59) is an arc-shaped convex surface. A vibration motor (510) is fixedly installed at the bottom center of the crossbeam (59); The top end of the feed pipe (511) is fixedly connected to the bottom of the screen hopper (51), and the bottom end of the feed pipe (511) extends into the pre-wetting cylinder (3).

3. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 2, characterized in that, The feeding cylinder (4) is fixedly installed with a trumpet-shaped guide cover (6) located above the screen hopper (51), and the inner diameter of the trumpet-shaped guide cover (6) decreases from top to bottom.

4. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 1, characterized in that, The spray humidification mechanism (7) includes: A hollow vertical shaft (71) is rotatably installed at the top center of the pre-wetting cylinder (3), with the bottom end of the hollow vertical shaft (71) located inside the pre-wetting cylinder (3); A solid vertical shaft (72) is fixedly installed at the bottom end of the hollow vertical shaft (71); The spiral blade (73) is fixedly installed on the solid vertical shaft (72), and the bottom end of the solid vertical shaft (72) and the bottom end of the spiral blade (73) both extend into the discharge pipe (8); Multiple hollow stirring rods (74) are fixedly connected at one end to the hollow vertical shaft (71), and at the other end to the solid vertical shaft (72). The multiple hollow stirring rods (74) are arranged in a ring with equal spacing. Multiple water mist nozzles (75) are fixedly connected to multiple hollow stirring rods (74) and are evenly distributed; Multiple stirring blades (76) are fixedly connected to multiple hollow stirring rods (74) and are evenly distributed; The annular tube (77) is fixedly installed on the top inner wall of the pre-wetting cylinder (3); Multiple water mist nozzles (78) are fixedly connected to the bottom of the annular pipe (77) and are distributed in a ring at equal intervals; Multiple water mist nozzles (79) are fixedly connected to the inner ring wall of the annular tube (77) and are distributed in a ring at equal intervals. All of the multiple water mist nozzles (79) are set at an angle downwards. A rotary joint (710) is rotatably mounted on the top of the hollow vertical shaft (71); The main water supply pipe (711) is located above the pre-wetting cylinder (3), and one end of the main water supply pipe (711) is fixedly connected to the top end of the rotary joint (710). Electromagnetic flow regulating valve 1 (712) is fixedly installed on the main water supply pipe (711); One end of the water supply branch pipe (713) is fixedly connected to the main water supply pipe (711) and located to the right of the electromagnetic flow regulating valve (712), and the other end of the water supply branch pipe (713) is fixedly connected to the annular pipe (77). Electromagnetic flow regulating valve 2 (714) is fixedly installed on the water supply branch pipe (713); A drive assembly, located above the pre-wetting cylinder (3), is used to control the rotation of the hollow vertical shaft (71).

5. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 4, characterized in that, The driving component includes: A servo motor (715) is fixedly installed on the top of the pre-wetting cylinder (3); Gear (716) is fixedly installed on the output shaft end of the servo motor (715); An external gear ring (717) is fixedly sleeved on the hollow vertical shaft (71), and the gear (716) meshes with the external gear ring (717).

6. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 1, characterized in that, The shielding mechanism (9) includes: An electric actuator (91) is fixedly mounted on the right-side support leg (2); A vertical plate (92) is fixedly installed at the telescopic end of the electric actuator (91); A baffle (93) is fixedly installed on the left side of the vertical plate (92), and the bottom end of the discharge pipe (8) is slidably and sealed to the top of the baffle (93); A pressure sensor (94) is fixedly installed on the left side of the vertical plate (92) and above the baffle (93). The pressure sensor (94) abuts against the outer wall of the discharge pipe (8).

7. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 6, characterized in that, A guide rod (95) is fixedly installed on the right side of the vertical plate (92), and the right end of the guide rod (95) slides through the support leg (2) located on the right side.

8. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 1, characterized in that, The quantitative dispensing mechanism (10) includes: The bearing seat (101) is fixedly installed on the inner left side of the mounting groove (12); The left end of the rotating shaft (102) is rotatably connected to the bearing seat (101); The regulating motor (103) is fixedly installed on the inner right side of the mounting groove (12), and the right end of the rotating shaft (102) is fixedly connected to the output shaft end of the regulating motor (103). A pad (104) is fixedly installed on the rotating shaft (102); A load cell (105) is fixedly mounted on the top of the pad (104); A measuring cylinder (106) is fixedly installed on top of the weighing sensor (105), and the measuring cylinder (106) is located directly below the discharge pipe (8).

9. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 8, characterized in that, An angle sensor (107) is fixedly installed on the left side of the pad (104).

10. The integrated precision processing device for pre-wetting, screening, and separating shiitake mushroom cultivation substrate according to claim 1, characterized in that, Multiple near-infrared moisture sensors (11) are fixedly installed on the outer wall of the pre-wetting cylinder (3) in a uniformly distributed manner, and the detection ends of the multiple near-infrared moisture sensors (11) are all located inside the pre-wetting cylinder (3).

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