Gas treatment system and method of controlling a gas treatment system

Abstract

Provided is a technique for suppressing a decrease in the gas separation capability of a gas separation member caused by purge gas in a gas processing system equipped with a gas separation device that uses the gas separation member to separate a gas. The gas processing system includes: a gas separation device equipped with a gas separation member that separates a raw material gas into a permeated gas that permeates through the gas separation member and a non-permeated gas that is discharged without permeating through the gas separation member; a gas processing device provided upstream of the gas separation device, through which the raw material gas passes; and a gas delivery device that pressurizes and delivers the non-permeated gas to the gas processing device or the gas separation device to remove dust contained in the raw material gas that has accumulated inside the gas processing device or the gas separation device.

Description

Technical Field

[0001] This invention relates to a gas processing system and a control method for the gas processing system. Background Technology

[0002] Patent document 1 discloses a method for returning a portion of the gas stream diverted to the gas flow as purge gas from a vacuum pump.

[0003] Patent Document 1: Japanese Patent Publication No. 2009-525861 Summary of the Invention

[0004] <Problem to be solved by this invention>

[0005] Combustion exhaust gases contain dust such as soot. In gas treatment systems that separate carbon dioxide, dust components (dust removal) are removed from the exhaust gases as a pretreatment step for carbon dioxide separation.

[0006] Dust can sometimes clog the shaft of a blower that pressurizes low-pressure combustion exhaust gases. If this clog is present, it can impair the blower's pressurization function. To prevent dust from clogging the shaft, a compressed air outlet is provided inside the blower's shaft. This compressed air is blown out to seal the shaft. Specifically, shaft seals are used in exhaust gas recirculation (EGR) blowers and similar devices used to reduce nitrogen oxides.

[0007] In a gas handling system for separating carbon dioxide, for example, if shaft sealing gas is introduced into a blower or purging gas is introduced to remove dust, the concentration of carbon dioxide decreases during separation, thereby reducing the separation efficiency.

[0008] The present invention provides a technique that can suppress the reduction in the gas separation capability of the gas separation component caused by purge gas in a gas processing system equipped with a gas separation device that uses a gas separation component to separate gases.

[0009] <Methods for solving problems>

[0010] According to one aspect of the present invention, a gas processing system is provided, comprising: a gas separation device having a gas separation component for separating a raw material gas into permeable gas that passes through the gas separation component and non-permeable gas that does not pass through the gas separation component and is discharged; a gas processing device disposed upstream of the gas separation device, through which the raw material gas passes; and a gas conveying device for pressurizing the non-permeable gas and conveying it to the gas processing device or the gas separation device to remove dust contained in the raw material gas that has accumulated inside the gas processing device or the gas separation device.

[0011] <The Effects of the Invention>

[0012] According to the present invention, in a gas processing system equipped with a gas separation device that uses a gas separation component to separate gases, it is possible to suppress the reduction in the gas separation capability of the gas separation component caused by purge gas. Attached Figure Description

[0013] Figure 1 This is a diagram illustrating the outline of the gas processing system according to the first embodiment.

[0014] Figure 2 This is a diagram illustrating the outline of the gas processing system according to the second embodiment.

[0015] Figure 3 This is a diagram illustrating the operation of the gas processing system according to this embodiment.

[0016] Figure 4 This is a diagram illustrating the operation of the gas processing system according to this embodiment.

[0017] Figure 5 This is a diagram illustrating the operation of the gas processing system according to this embodiment.

[0018] Figure 6 This is a diagram illustrating the operation of the gas processing system according to this embodiment.

[0019] Explanation of reference numerals in the attached figures

[0020] 1, 2: Gas handling system

[0021] 10: Gas separation device

[0022] 11: Gas separation membrane

[0023] 21: Gas pressurization device

[0024] 22: Gas conveying device

[0025] 30: Dust removal filter device

[0026] 41, 42: Storage tanks

[0027] 51, 52, 53, 54, 55, 56, 57, 58, 59: On / off valves

[0028] 61, 62, 161: Adjusting valves

[0029] 71, 72, 73: Pressure gauges

[0030] 76: Flow meter

[0031] 90: Control Department

[0032] Am: air

[0033] Gb: Bypass gas

[0034] Gc: permeable gas

[0035] Gm: Raw material gas

[0036] Gn: Impermeable gas

[0037] Gp, Gp1, Gp2, Gp3: Purge gases Detailed Implementation

[0038] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. It should be noted that, in the descriptions and drawings of each embodiment, elements having substantially the same or corresponding functional structures are sometimes omitted by using the same reference numerals to avoid repetitive descriptions. Furthermore, for ease of understanding, the scales of parts in the drawings may sometimes differ from the actual figures.

[0039] The gas processing system of the present invention includes a gas separation device having a gas separation component that separates the raw material gas into permeable gas that passes through the gas separation component and non-permeable gas that is discharged from the gas separation component. Furthermore, the gas processing system of the present invention includes a gas processing device disposed upstream of the gas separation device, through which the raw material gas passes. Additionally, the gas processing system of the present invention includes a gas conveying device that pressurizes the non-permeable gas and conveys it to the gas processing device or gas separation device to remove dust contained in the raw material gas that has accumulated inside the gas processing device or gas separation device.

[0040] <First Implementation Method>

[0041] The gas handling system of the first embodiment is described with reference to the accompanying drawings. Figure 1This is a schematic diagram illustrating a gas processing system 1 as an example of the gas processing system in the first embodiment. Here, a gas processing system that separates and recovers carbon dioxide from the raw material gas Gm will be described, but in the gas processing system of the first embodiment, the gas separated by the gas separation component is not limited to carbon dioxide.

[0042] Gas processing system 1 recovers carbon dioxide contained in raw material gas Gm. Gas processing system 1 includes a gas separation device 10, a gas pressurization device 21, a gas conveying device 22, a dust removal filter device 30, storage tanks 41 and 42, and a control unit 90. Furthermore, gas processing system 1 includes on / off valves 51, 52, 53, 54, 55, 56, 57, 58, and 59, as well as regulating valves 61 and 62. Additionally, gas processing system 1 includes pressure gauges 71, 72, and 73, and a flow meter 76.

[0043] [Gas Separation Device 10]

[0044] Gas separation device 10 separates the raw material gas Gm into permeable gas Gc and non-permeable gas Gn. Gas separation device 10 includes a gas separation membrane 11. Gas separation device 10 separates permeable gas Gc, which contains a large amount of carbon dioxide contained in the raw material gas Gm, through the gas separation membrane 11, and non-permeable gas Gn, which contains less carbon dioxide than the permeable gas.

[0045] The gas separation membrane 11 is not particularly limited, as long as it is a membrane capable of separating carbon dioxide. The material of the gas separation membrane 11 can be, for example, an organic membrane such as a polymer membrane, or an inorganic membrane such as a zeolite membrane or a silicon-based amorphous membrane. The shape of the gas separation membrane 11 can be, for example, a homogeneous membrane, a composite membrane composed of a homogeneous membrane and a porous membrane, or a porous membrane. The way the separation membrane is housed in the gas separation device 10 can be, for example, a plate-and-frame type, a stacked type, or a spiral type or a hollow fiber type.

[0046] Furthermore, although the gas separation device 10 includes a gas separation membrane 11, the gas separation component included in the gas separation device of the gas separation system of the first embodiment is not limited to a gas separation membrane. The gas separation component included in the gas separation device of the gas separation system of the first embodiment is only required to be able to separate the permeated gas that passes through the gas separation component and the non-permeated gas that is discharged without passing through the gas separation component.

[0047] [Gas pressurization device 21]

[0048] The gas booster 21 pressurizes the raw material gas Gm and delivers it to the gas separator 10. The gas booster 21 is, for example, a blower. In the gas booster 21, dust contained in the raw material gas Gm, which is the exhaust gas, sometimes accumulates on the bearings of the rotating shaft. To blow away and remove the dust accumulated on the bearings of the rotating shaft, a purge gas Gp2 is supplied to the gas booster 21.

[0049] [Gas delivery device 22]

[0050] The gas delivery device 22 pressurizes the impermeable gas Gn and delivers it to the storage tank 42. The gas delivery device 22 is, for example, a blower. The gas delivery device 22 controls the speed of the motor, for example, according to a set flow rate. The control unit 90 controls the output of the gas delivery device 22 based on the flow rate of the impermeable gas Gn, i.e., the purge gas Gp, delivered from the gas delivery device 22 to the gas separation device 10, the gas pressurization device 21, and the dust removal filter device 30, respectively.

[0051] [Dust removal filter device 30]

[0052] The dust removal filter unit 30 removes dust contained in the raw material gas Gm. In the dust removal filter unit 30, dust contained in the raw material gas Gm sometimes adheres to the dust removal filter. To remove the dust adhering to the filter, a purge gas Gp1 is supplied to the dust removal filter unit 30.

[0053] [Storage Tank 41]

[0054] Storage tank 41 stores the impermeable gas Gn that has not passed through the gas separation membrane 11 and is discharged in the gas separator 10. Storage tank 41 suppresses flow and pressure fluctuations of the feed gas Gm and the impermeable gas Gn in the gas separator 10. Storage tank 41 is a so-called buffer tank. Pressure gauge 72 and regulating valve 61 are connected to storage tank 41. Regulating valve 61 adjusts its opening so that the pressure of the feed gas Gm flowing into the gas separator 10, as measured by pressure gauge 71, is the set pressure.

[0055] [Storage Tank 42]

[0056] Storage tank 42 stores the impurity gas Gn, i.e., purge gas Gp, after being pressurized by gas delivery device 22. Storage tank 42 suppresses flow and pressure fluctuations of the impurity gas Gn, i.e., purge gas Gp, after being pressurized by gas delivery device 22. Storage tank 42 is a so-called buffer tank. A pressure gauge 73 and an adjusting valve 62 are connected to storage tank 42. The adjusting valve 62 adjusts its opening so that the pressure of the purge gas Gp in storage tank 42, measured by pressure gauge 73, is the set pressure.

[0057] [Control Department 90]

[0058] The control unit 90 controls the entire gas handling system 1. The control unit 90 is, for example, centered around a computer that includes a processor, memory and other storage devices, auxiliary storage devices, and input / output interface devices for external communication. The processor is, for example, a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), or an MPU (Micro Processing Unit). The control unit 90 can be, for example, a PLC (Programmable Logic Controller).

[0059] [On / Off Valve 51]

[0060] The on / off valve 51 is located downstream of the gas booster 21. The on / off valve 51 opens or closes to allow or prevent the flow of the raw material gas Gm discharged from the gas booster 21 to the gas separator 10. The on / off valve 51 is controlled by the control unit 90.

[0061] [On / Off Valve 52]

[0062] The on / off valve 52 is provided downstream of the gas booster 21. The on / off valve 52 opens or closes to allow or prevent the flow of the raw material gas Gm discharged from the gas booster 21 to the outside. The on / off valve 52 is controlled by the control unit 90.

[0063] [On / Off Valve 53]

[0064] The on / off valve 53 is provided in the downstream branch of the gas separator 10. The on / off valve 53 opens or closes the valve to allow or prevent the purge gas Gp3 from flowing downstream of the gas separator 10. The on / off valve 53 is controlled by the control unit 90.

[0065] [On / Off Valve 54]

[0066] The on / off valve 54 is located downstream of the storage tank 41. The on / off valve 54 opens or closes to direct or prevent the flow of the raw material gas Gm from the storage tank 41 to the gas conveying device 22. The on / off valve 54 is controlled by the control unit 90.

[0067] [On / Off Valve 55]

[0068] The on / off valve 55 is installed in the downstream branch of the storage tank 41. The on / off valve 55 allows or prevents the flow of external air Am to the gas conveying device 22 by opening or closing the valve. The on / off valve 55 is controlled by the control unit 90.

[0069] [On / Off Valve 56]

[0070] An on / off valve 56 is installed between the storage tank 42 and the dust filter device 30. The on / off valve 56 opens or closes to allow or prevent the purge gas Gp1 from flowing to the dust filter device 30. The on / off valve 56 is controlled by a control unit 90.

[0071] [On / Off Valve 57]

[0072] An on / off valve 57 is installed between the storage tank 42 and the gas pressurization device 21. The on / off valve 57 opens or closes to allow or prevent the purge gas Gp2 from flowing to the gas pressurization device 21. The on / off valve 57 is controlled by the control unit 90.

[0073] [On / Off Valve 58]

[0074] An on / off valve 58 is located between the storage tank 42 and the on / off valve 53. The on / off valve 58 opens or closes to allow or prevent the purge gas Gp3 from flowing downstream of the gas separator 10. The on / off valve 58 is controlled by the control unit 90.

[0075] [On / Off Valve 59]

[0076] The on / off valve 59 is installed downstream of the storage tank 42. The on / off valve 59 opens or closes to allow gas discharged from the storage tank 42 to flow to the outside as exhaust gas Ge, or to prevent its flow to the outside. The on / off valve 59 is controlled by the control unit 90.

[0077] [Adjusting Valve 61]

[0078] Adjusting valve 61 adjusts the flow rate of impermeable gas Gn discharged from storage tank 41 to the outside. Adjusting valve 61 is installed on the piping from storage tank 41 to discharge impermeable gas Gn to the outside. Adjusting valve 61 adjusts the pressure of raw material gas Gm discharged from gas booster device 21, as measured by pressure gauge 71, to the set pressure.

[0079] [Adjusting Valve 62]

[0080] Adjusting valve 62 adjusts the flow rate of bypass gas Gb returning from storage tank 42 to the suction side of gas delivery device 22. Adjusting valve 62 is installed on the bypass piping returning from storage tank 42 to the suction side of gas delivery device 22. Adjusting valve 62 adjusts the pressure of purge gas Gp in storage tank 42, measured by pressure gauge 73 installed on storage tank 42, to the set pressure.

[0081] [Pressure gauge 71]

[0082] Pressure gauge 71 measures the pressure of the raw material gas Gm after it has been pressurized by gas pressurization device 21. Based on the pressure of the raw material gas Gm measured by pressure gauge 71, regulating valve 61 is controlled.

[0083] [Pressure gauge 72]

[0084] Pressure gauge 72 measures the pressure of impermeable gas Gn stored in storage tank 41.

[0085] [Pressure gauge 73]

[0086] Pressure gauge 73 measures the pressure of purge gas Gp stored in storage tank 42. Based on the pressure of purge gas Gp measured by pressure gauge 73, regulating valve 62 is controlled.

[0087] [Flowmeter 76]

[0088] Flow meter 76 measures the flow rate of purge gas Gp discharged from gas delivery device 22. Based on the flow rate of purge gas Gp measured by flow meter 76, gas delivery device 22 is controlled.

[0089] In the gas processing system 1, when the gas separation device 10 is operating normally, on-off valves 51, 54, and 59 are in the open state, while on-off valves 52 and 55 are in the closed state. When the gas separation device 10 is operating normally, on-off valves 53, 56, 57, and 58 are each in the open state when purge gas Gp is ​​supplied, and in the closed state when purge gas Gp is ​​not supplied.

[0090] In addition, in the gas processing system 1, when the gas separation device 10 is not in operation, the on-off valves 51, 52, 55, and 59 are in the open state, and the on-off valve 54 is in the closed state. When the gas separation device 10 is not in operation, the on-off valves 53, 56, 57, and 58 are each in the open state when purge gas Gp is ​​supplied, and in the closed state when purge gas Gp is ​​not supplied.

[0091] The gas pressurization device 21 and the dust removal filter device 30 are respectively located upstream of the gas separation device, which is an example of a gas processing device through which the raw material gas passes. It should be noted that the gas processing device in the gas processing system of the present invention is not limited to the gas pressurization device and the dust removal filter device, but may also be, for example, a valve, a sensor, a heat exchanger, a storage tank, etc.

[0092] <Second Implementation Method>

[0093] The gas processing system of the second embodiment will be described. The gas processing system of the second embodiment differs from the gas processing system of the first embodiment in that the pressure adjustment method in the gas separation device 10 is different.

[0094] The gas handling system of the second embodiment is illustrated with reference to the accompanying drawings. Figure 2This is a schematic diagram illustrating a gas processing system 2 as an example of the gas processing system of the second embodiment. Similar to the gas processing system of the first embodiment, a gas processing system that separates and recovers carbon dioxide from the raw material gas Gm will be described. However, in the gas processing system of the second embodiment, the gas separated by the gas separation component is not limited to carbon dioxide.

[0095] Gas processing system 2 recovers carbon dioxide contained in the raw material gas Gm. Gas processing system 2 also includes an adjustment valve 161, as described in gas processing system 1. For details regarding the common structures in gas processing system 2 and gas processing system 1, please refer to the description of gas processing system 1; detailed descriptions are omitted here.

[0096] [Adjusting Valve 161]

[0097] Adjusting valve 161 adjusts the flow rate of impermeable gas Gn discharged from gas separator 10. Adjusting valve 161 is installed on the piping from gas separator 10 to storage tank for impermeable gas Gn. Adjusting valve 161 adjusts the pressure of raw material gas Gm discharged from gas booster 21, as measured by pressure gauge 71, to a set pressure.

[0098] In the gas handling system 2, the regulating valve 61 is controlled based on the pressure of the non-permeable gas Gn in the storage tank 41.

[0099] The operation of the gas processing system of the present invention will be described. Here, the operation of the gas processing system of the present invention will be described using gas processing system 1. By describing the operation of the gas processing system of the present invention, the control method of the gas processing system of the present invention will be explained.

[0100] First, the process of supplying purge gas to the gas pressurization unit 21 and the dust filter unit 30 respectively before starting them while the gas separation unit 10 is stopped will be described. While the gas separation unit 10 is stopped, in order to supply purge gas to the gas pressurization unit 21 and the dust filter unit 30 respectively, the on / off valve 55 is opened for control, and air Am is used to allow a predetermined flow rate to the gas delivery device 22. Furthermore, while the gas separation unit 10 is stopped, in order to supply purge gas to the gas pressurization unit 21 and the dust filter unit 30 respectively, the pressure in the storage tank 42 is controlled to a predetermined pressure. Then, while the gas separation unit 10 is stopped, purge gas Gp1, purge gas Gp2, and purge gas Gp3 are supplied respectively.

[0101] When the gas handling system 1 starts operating, the on / off valve 59 is in the open state, and all other on / off valves and control valves are in the closed state.

[0102] Figure 3 This is a diagram illustrating the operation of the gas processing system according to this embodiment. Figure 3 The horizontal axis represents time, and the vertical axis represents the signal. Each signal is shown in detail.

[0103] Signal PM1 indicates the operation command of gas delivery device 22. Signal PM1 is an on or off signal. When signal PM1 is on, it indicates that gas delivery device 22 is operated; when signal PM1 is off, it indicates that gas delivery device 22 is stopped.

[0104] Signal V1 represents the opening and closing command of the on / off valve 55. Signal V1 is a signal that indicates whether the valve is on or off. Signal V1 indicates that the valve is open when it is on and closed when it is off.

[0105] The signal PM1-MV represents the control value of the gas conveying device 22. For example, the signal PM1-MV is the rotational speed of the motor in the gas conveying device 22.

[0106] Signal F represents the flow rate measured in flow meter 76.

[0107] Signal TK-PV is the pressure command value for storage tank 42. Signal TK-PV indicates the pressure of the target pressure gauge 73.

[0108] Signal CV1 indicates the opening degree of regulating valve 62. The opening degree of regulating valve 62 is controlled so that the pressure of tank 42 measured by pressure gauge 73 is the pressure command value set by signal TK-PV.

[0109] Signal P2 is a measured value of the pressure in storage tank 42. Signal P2 is the pressure of the purge gas Gp in storage tank 42, measured by pressure gauge 73.

[0110] At time T1, if signals PM1 and V1 are activated, the gas delivery device 22 will start operating and the on / off valve 55 will open.

[0111] Then, as the signal PM1-MV is gradually increased during the time interval from time T1 to time T2, the flow rate indicated by the signal F gradually increases.

[0112] Next, after the flow rate stabilizes as indicated by signal F for time T3, the pressure command value of tank 42, indicated by signal TK-PM, is changed to the set pressure value ps1. By changing the pressure command value of tank 42, signal CV1 is gradually increased from time T3 to time T4. As signal CV1 gradually increases, the pressure of tank 42, indicated by signal P2, gradually rises.

[0113] Next, the process of supplying purge gas to the gas pressurization unit 21 and the dust filter unit 30 while the gas separation unit 10 is stopped will be described. With the pressure of the purge gas Gp in the storage tank 42 at a preset pressure, multiple on / off valves 56, 57, and 58 are opened sequentially or simultaneously for a predetermined time. By opening the multiple on / off valves sequentially or simultaneously for the predetermined time, the dust accumulation areas of the gas separation unit 10, the gas pressurization unit 21, and the dust filter unit 30 are flushed and cleaned.

[0114] Figure 4 This is a diagram illustrating the operation of the gas handling system according to this embodiment. Figure 4 In the diagram, the horizontal axis represents time, and the vertical axis represents the signal. Details of each signal are shown. Figure 4 In China, for the sake of Figure 3 For the same signal, please refer to the explanation of the signal. Figure 3 The explanation is omitted here.

[0115] Signal FS1 indicates a flushing command for separately clearing purge gases Gp1 and Gp3. Signal FS1 is an on / off signal. When signal FS1 is on, it indicates that purge gases Gp1 and Gp3 are supplied separately; when signal FS1 is off, it indicates that the supply of purge gases Gp1 and Gp3 is stopped.

[0116] Signal BV1 represents the opening and closing command for valves 56 and 58. Signal BV1 is an on / off signal. When signal BV1 is on, it indicates that valves 56 and 58 are both open; when signal BV1 is off, it indicates that valves 56 and 58 are both closed.

[0117] Signal FS2 indicates a flushing command for purging purge gas Gp2. Signal FS2 is an on / off signal. When signal FS2 is on, it indicates that purge gas Gp2 is being supplied; when signal FS2 is off, it indicates that the supply of purge gas Gp2 is stopped.

[0118] Signal BV2 represents the opening and closing command of the on / off valve 57. Signal BV2 is a signal that is either on or off. When signal BV2 is on, it indicates that the on / off valve 57 is open; when it is off, it indicates that the on / off valve 58 is closed.

[0119] For example, when signal FS1 is activated between time T11 and time T13, signal BV1 is activated. When signal BV1 is activated, on / off valves 56 and 58 open respectively. At time T11, due to the increased flow rates of purge gas Gp1 and Gp3, the opening degree of regulating valve 62 changes between time T11 and time T12, as indicated by signal CV1. Corresponding to the change in signal CV1, the pressure of tank 42, indicated by signal P2, also changes temporarily. Furthermore, at time T13, due to the decreased flow rates of purge gas Gp1 and Gp3, the opening degree of regulating valve 62 changes between time T13 and time T14, as indicated by signal CV1. Corresponding to the change in signal CV1, the pressure of tank 42, indicated by signal P2, also changes temporarily.

[0120] Similarly, for example, when signal FS2 is activated between time T15 and time T17, signal BV2 is activated. When signal BV2 is activated, the on / off valve 57 opens. At time T15, due to the increased flow rate of purge gas Gp2, the opening degree of regulating valve 62 changes between time T15 and time T16, as indicated by signal CV1. Corresponding to the change in signal CV1, the pressure of tank 42, indicated by signal P2, also changes temporarily. Furthermore, at time T17, due to the decreased flow rate of purge gas Gp2, the opening degree of regulating valve 62 changes between time T17 and time T18, as indicated by signal CV1. Corresponding to the change in signal CV1, the pressure of tank 42, indicated by signal P2, also changes temporarily.

[0121] Next, the operation of the gas separation device 10 will be described. After the gas separation device 10 is started and the pressure in the storage tank 42 stabilizes, purge gas Gp2 is supplied to the gas pressurization device 21. In addition, purge gas Gp1 and purge gas Gp3 are supplied for a specified period of time.

[0122] Figure 5 This is a diagram illustrating the operation of the gas handling system according to this embodiment. Figure 5 In the diagram, the horizontal axis represents time, and the vertical axis represents the signal. Each signal is shown in detail. Figure 5 In China, for the sake of Figure 3 or Figure 4 For the same signal, refer to the explanation of the signal. Figure 3 or Figure 4 The explanation is omitted here.

[0123] Signal P1 is the measured pressure in storage tank 41. Signal P1 is the pressure of the impermeable gas Gn in storage tank 41, measured by pressure gauge 72.

[0124] Signal CV2 indicates the opening degree of regulating valve 61. The opening degree of regulating valve 61 is controlled so that the pressure of the raw material gas Gm measured by pressure gauge 71 is the set pressure command value.

[0125] Signal V2 represents the opening and closing command of the on / off valve 54. Signal V2 is an on or off signal. When signal V2 is on, it indicates that the on / off valve 54 is open; when signal V2 is off, it indicates that the on / off valve 54 is closed.

[0126] To operate the gas separation device 10, as indicated by signals V1 and V2, the on / off valve 54 is opened at time T21 and the on / off valve 55 is closed at time T22. In the gas processing system 1, the on / off valve 54 is first opened, and after a preset time has elapsed as determined by a timer or similar means, the on / off valve 55 is closed.

[0127] Next, at time T23, the purge gas Gp2 is supplied. For example, assume that before time T24, the signal P1, which represents the pressure in tank 41, needs time to stabilize. The time between time T23 and time T24 is used to stabilize the purge gas Gp2.

[0128] Next, during time T25 to time T27, purge gases Gp1 and Gp3 are purged. During time T25 to time T26, the signal P1, representing the pressure in storage tank 41, fluctuates due to feedback delay. Similarly, during time T27 to time T28, the signal P1, representing the pressure in storage tank 41, fluctuates due to feedback delay. The period from time T25 to time T28 is used to stabilize purge gases Gp1 and Gp3.

[0129] Next, the operation of the gas processing system of the present invention will be described using the gas processing system 2. First, the gas processing system 2 controls the pressure in the storage tank 41 to a predetermined pressure. Next, the gas processing system 2 controls the regulating valve 161 to control the pressure in the gas separation device 10.

[0130] Figure 6 This is a diagram illustrating the operation of the gas handling system according to this embodiment. Figure 6 In the diagram, the horizontal axis represents time, and the vertical axis represents the signal.

[0131] The signal SU represents the operation command of the gas separation device 10. The signal SU is an on or off signal. When the signal SU is on, it indicates that the gas separation device 10 is operated; when it is off, it indicates that the gas separation device 10 is stopped.

[0132] Signal V3-PV indicates the pressure command value at the inlet of the gas separation device 10. Signal V3-PV also indicates the pressure of the target pressure gauge 71.

[0133] Signal CV3 indicates the opening degree of regulating valve 161. The opening degree of regulating valve 161 is controlled so that the pressure at the inlet of gas separation device 10, as measured by pressure gauge 71, is the pressure command value set by signal V3-PV.

[0134] Signal P3 is a measured value of the pressure at the inlet of the gas separator 10. Signal P3 is the pressure of the raw material gas Gm at the inlet of the gas separator 10, measured by pressure gauge 71.

[0135] Signal TK2-PV is the pressure command value for storage tank 41. Signal TK2-PV indicates the pressure of the target pressure gauge 72.

[0136] Signal CV2 indicates the opening degree of regulating valve 61. The opening degree of regulating valve 61 is controlled so that the pressure in tank 41 measured by pressure gauge 72 is the preset pressure command value.

[0137] Signal P2 is a measured value of the pressure in storage tank 42. Signal P2 is the pressure of the purge gas Gp in storage tank 42, measured by pressure gauge 73.

[0138] The signal PM1-MV represents the control value of the gas conveying device 22. For example, the signal PM1-MV is the rotational speed of the motor in the gas conveying device 22.

[0139] At time T31, the gas separation device 10 is started to operate. Then, at time T32, control is performed to bring the pressure in the storage tank 41 to the desired pressure.

[0140] Next, at time T32, when the pressure in the storage tank 41 reaches the desired pressure, the gas delivery device 22 is started to operate.

[0141] At time T34 after the start of operation of the gas delivery device 22, the regulating valve 161 is controlled to make the pressure in the pressure gauge 71 reach the preset pressure value ps2.

[0142] According to the gas processing system of the present invention, in a gas processing system equipped with a gas separation device that uses a gas separation component to separate gases, it is possible to suppress the reduction in the gas separation capacity of the gas separation component due to purge gas.

[0143] For example, in a gas pressurization device, when air is used to purge the bearing section, the carbon dioxide concentration decreases by approximately 8.5% after passing through the gas pressurization device. According to the gas processing system of the present invention, by using the impermeable gas from the gas separation device as the purging gas, the carbon dioxide concentration can be suppressed to decrease by approximately 3.9% after passing through the gas pressurization device.

[0144] It should be considered that the embodiments disclosed herein are illustrative in all respects and not restrictive. The above embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims.

Claims

1. A gas processing system, comprising: A gas separation device comprising a gas separation component that separates a raw material gas into permeable gas that passes through the gas separation component and non-permeable gas that does not pass through the gas separation component and is discharged. A gas processing device is located upstream of the gas separation device, through which the raw material gas passes; as well as A gas conveying device that pressurizes the impermeable gas and conveys it to the gas processing device or the gas separation device to remove dust contained in the raw gas that has accumulated inside the gas processing device or the gas separation device.

2. The gas handling system according to claim 1, wherein, The gas processing device is a gas pressurization device that pressurizes the raw material gas to be supplied to the gas separation device. The dust accumulated on the bearings of the gas booster device is removed using the impermeable gas.

3. The gas processing system according to claim 1, wherein, The gas processing device is a dust removal filter device. The dust accumulated inside the dust removal filter device is removed using the impermeable gas.

4. The gas processing system according to claim 1, further comprising: An adjusting valve, which adjusts the flow rate of the impermeable gas discharged from the gas separator based on the pressure of the raw material gas being supplied to the gas separator.

5. The gas handling system according to any one of claims 1 to 4, further comprising: A storage tank that stores the impermeable gas discharged from the gas delivery device; as well as Control Department The control unit controls the gas separation device in such a way that, before operating the gas separation device, it uses external air to deliver a preset flow rate to the gas delivery device and causes the pressure of the impermeable gas in the storage tank to reach a preset pressure.

6. The gas handling system according to claim 5, wherein, The control unit controls the gas separation device by using air to remove the dust accumulated inside the gas processing device or the gas separation device before the gas separation device is operated.

7. The gas handling system according to claim 5, wherein, The control unit controls the gas separation device in such a way that, after the gas separation device is operated, the impermeable gas pressurized and delivered by the gas delivery device is used to remove the dust accumulated inside the gas processing device or the gas separation device.

8. The gas handling system according to claim 5, wherein, The control unit controls the gas separation device in such a way that, after the gas separation device is operated, the output of the gas delivery device is controlled based on the flow rate of the impermeable gas to be delivered from the gas delivery device to the gas processing device and the gas separation device, respectively.

9. The gas processing system according to claim 4, further comprising: A storage tank, located downstream of the regulating valve, stores the impermeable gas discharged from the gas separation device; as well as Control Department The control unit controls the gas in such a way that, after the pressure of the impermeable gas in the storage tank reaches a preset pressure before the gas separation device is operated, the flow rate of the impermeable gas discharged from the gas separation device is adjusted by the adjusting valve.

10. A control method for a gas processing system, the gas processing system comprising: A gas separation device includes a gas separation component that separates a raw material gas into permeable gas that passes through the gas separation component and non-permeable gas that does not pass through the gas separation component and is discharged; a gas processing device disposed upstream of the gas separation device, through which the raw material gas passes; and a gas conveying device that pressurizes and conveys the non-permeable gas, wherein... The control is performed by supplying the impermeable gas, which has been pressurized by the gas delivery device, to the gas processing device and the gas separation device, respectively.

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