A deflasher

Abstract

The application discloses a kind of baffle type devolatilizers, including vertical tower body and at least one group of film-forming components in it. Film-forming components are arranged in vertical direction by multiple reaction plates arranged obliquely, the opposite direction of adjacent reaction plates is opposite, each reaction plate surface is equipped with drainage groove, and forms "Z" shaped material flow channel. Material chamber is arranged at the top of film-forming components, material flows out after material outlet, and sequentially flows down along each reaction plate, and finally flows to the bottom of tower body. Heating cavity is arranged in the inside of reaction plate, and after distribution of heat medium inflow chamber and heat medium outflow chamber, it enters and exits heating cavity through first opening and second opening, to realize uniform heating. The application significantly prolongs the reaction residence time of material, strengthens mass transfer efficiency, effectively reduces equipment height, and is suitable for devolatilization, desolventization and concentration treatment of high-viscosity liquid or molten material.

Description

Technical Field

[0001] This invention relates to the field of devolatilization equipment technology, and in particular to a baffle-type devolatilizer. Background Technology

[0002] Deviation is a crucial process in the treatment of polymer melts and other high-viscosity or heat-sensitive materials, primarily used to remove moisture, residual solvents, unreacted monomers, and other volatile components. The material spreads on the surface of the film-forming element to form a liquid film, increasing the gas-liquid contact area, shortening the heat and mass transfer path, and promoting the migration and escape of moisture, solvents, and other volatile components from the material to the gas-liquid interface. Therefore, the heat transfer efficiency, mass transfer efficiency, melt surface renewal capacity, and residence time distribution of the material within the devolatilization unit significantly impact the removal efficiency of volatile components, product quality, and production efficiency.

[0003] Currently, industrial equipment used for polymer melt devolatilization mainly includes flash tanks, vacuum devolatilization kettles, falling film devolatilizers, scraped film devolatilizers, and extrusion devolatilization equipment with venting function. Among them, falling film devolatilizers are widely used for the continuous removal and refining of volatile components in polymer melts, synthetic resins, oils, fine chemical products, and other high-viscosity or heat-sensitive materials due to their large gas-liquid contact area, good heat and mass transfer performance, and low pressure drop.

[0004] In the prior art, falling film devolatilizers typically adopt a vertical cylindrical structure with multiple falling film tubes or plates installed inside the shell. The material flows downward in a film-like manner along the surface of the falling film element, and the heat medium circulates and heats inside the falling film element to maintain the reaction temperature and promote the removal of volatile components.

[0005] However, in existing falling film devolatilizers, the falling film tubes or plates are mostly vertically arranged. Under the influence of gravity, the material flows downward along the vertical surface at a relatively high velocity, resulting in a short residence time within the devolatilizer, which is insufficient to meet the removal time requirements for volatile components. Furthermore, vertical falling film devolatilization is prone to problems such as film breakage and uneven distribution under high viscosity conditions, affecting heat and mass transfer efficiency. Summary of the Invention

[0006] This invention provides a baffled devolatilizer, which aims to solve the problems in existing falling film devolatilizers where the falling film tubes or plates are mostly vertically arranged. Under the action of gravity, the material flows downward along the vertical surface at a relatively high velocity, and the residence time of the material in the reactor is short, making it difficult to meet the removal time requirements of volatile components. In addition, vertical falling film is prone to liquid film breakage and uneven distribution under high viscosity conditions.

[0007] To achieve the above objectives, the present invention adopts the following technical solution:

[0008] This invention provides a baffled devolatilizer, comprising: a vertical tower body, wherein at least one membrane assembly is disposed inside the vertical tower body, and a material chamber is disposed on the top of the membrane assembly;

[0009] The film-forming assembly includes at least two reaction plates arranged vertically and inclined, with adjacent reaction plates having opposite inclination directions; a drainage groove is provided on the upper side of each reaction plate along its inclination direction.

[0010] The material chamber is connected to a material outlet, and the position of the material outlet corresponds to the topmost reaction plate.

[0011] In this process, after the material in the material chamber flows out of the material outlet, it falls into the top reaction plate. The material flows down the flow channel on the reaction plate in sequence through the flow channel of each reaction plate, and finally flows to the bottom of the vertical tower.

[0012] In one embodiment, within the same group of film-forming components, two adjacent reaction plates form a group, and the two reaction plates in each group have the same angle with the vertical direction, and the angle of each group gradually decreases from top to bottom along the vertical direction.

[0013] In one embodiment, within the same group of film-forming components, the distance between the bottom end of the upper reaction plate and the top end of the lower reaction plate in two adjacent reaction plates is I, and the distance I between two adjacent reaction plates gradually increases downward along the vertical direction.

[0014] In one embodiment, the spacing between two adjacent top reaction plates is I1, and the spacing between two adjacent bottom reaction plates is I. n ,I1 / I n The size is between 0.4 and 0.84.

[0015] In one embodiment, within the same group of film-forming components, the horizontal projection length between the top end of the lower reaction plate and the bottom end of the upper reaction plate in two adjacent reaction plates is L, where 4mm < L < 35mm.

[0016] In one embodiment, a heating chamber is provided inside the reaction plate, and a first opening and a second opening are provided through the side wall of the heating chamber, with the first opening located above the second opening;

[0017] The heating medium flows into the heating chamber from the second opening and flows out of the heating chamber from the first opening.

[0018] In one embodiment, a heat medium outflow chamber and a heat medium inflow chamber are further provided on the top of the film-forming assembly;

[0019] The heat medium outflow chamber is connected to a heat medium outflow pipe, which is vertically downward and sequentially connected to the first opening of the same group of film-forming components;

[0020] The heat medium inflow chamber is connected to a heat medium inflow pipe, which is vertically downward and sequentially connected to the second opening of the same group of film-forming components.

[0021] In one embodiment, within the same group of film-forming components, in two adjacent reaction plates, the inner diameters of the first opening and the second opening of the upper reaction plate are both ds, and the inner diameters of the first opening and the second opening of the lower reaction plate are both dx, where dx / ds=k; 1<k<1.2.

[0022] In one embodiment, a heat medium outflow chamber and a heat medium inflow chamber are further provided on the top of the film-forming assembly;

[0023] Within the same group of film-forming components, in two adjacent reaction plates, the second opening of the upper reaction plate communicates with the first opening of the lower reaction plate;

[0024] The heat medium outlet chamber is connected to a heat medium outlet pipe, and the heat medium outlet pipe is connected to the first opening of the topmost reaction plate;

[0025] The heat medium inflow chamber is connected to a heat medium inflow pipe, which is connected to the second opening of the bottom reaction plate.

[0026] In one embodiment, a plurality of partitions are provided inside the heating cavity, and the plurality of partitions form an S-shaped heat medium flow channel inside the heating cavity;

[0027] The first opening and the second opening are respectively located at both ends of the S-shaped heat medium flow channel.

[0028] The beneficial effects of this invention compared to existing technologies are as follows: In this invention, the film-forming component consists of multiple reaction plates arranged vertically, each of which is inclined, with adjacent reaction plates inclined in opposite directions. Drainage channels are provided on the reaction plates, forming a zigzag reaction flow channel. When the material flows out from the upper material chamber, it flows sequentially from top to bottom along the drainage channels on each reaction plate under gravity. The flow time along the inclined reaction plates is extended, not only meeting the requirements for the removal time of volatile components but also reducing the likelihood of film breakage and uneven distribution under high viscosity conditions. Furthermore, each time the material flows down a layer, its flow direction changes, causing disturbance and surface renewal of the liquid film, thereby promoting the removal of volatile components and improving mass transfer efficiency. In addition, due to the use of multi-layered inclined reaction plates, the height of the inclined reaction plates can be reduced in the vertical direction compared with the vertically arranged reaction plates. This allows the material to obtain the required total residence time while the overall height of the reactor is significantly reduced compared with the traditional straight tube falling film reactor, which significantly reduces the height of the equipment and saves manufacturing costs and installation space.

[0029] The above description is merely an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention, it can be implemented according to the contents of the specification. In order to make the above and other objects, features and advantages of the present invention more obvious and understandable, preferred embodiments are described in detail below. Attached Figure Description

[0030] Figure 1 A cross-sectional view of a baffle-type devourer provided in an embodiment of the present invention;

[0031] Figure 2 for Figure 1 A magnified view of a portion of the image;

[0032] Figure 3 This is a schematic diagram of the structure of a single reaction plate of a baffle-type devolatilizer provided in an embodiment of the present invention;

[0033] Figure 4 A simplified structural diagram of the film-forming component of a baffled devolatilizer provided in an embodiment of the present invention, viewed from the side.

[0034] Figure 5 for Figure 4 A magnified view of a portion of the image;

[0035] Figure 6 A distribution diagram of another type of heat medium outlet pipe and heat medium inlet pipe provided for an embodiment of the present invention;

[0036] Figure 7An internal structural diagram of the reaction plate of a baffle-type devolatilizer provided in an embodiment of the present invention;

[0037] Figure 8 This is a schematic diagram of another embodiment of the reaction plate of a baffle-type devolatilizer provided in this invention.

[0038] Figure label:

[0039] 1. Vertical tower body; 11. Upper end cap; 111. Material chamber; 1111. Material outlet; 1112. Membrane tube; 1113. Material inlet; 1114. Material pipe; 112. Heat medium outflow chamber; 1121. Heat medium outflow pipe; 1122. Heat medium outlet; 113. Heat medium inflow chamber; 1131. Heat medium inflow pipe; 1132. Heat medium inlet; 12. Vertical shell; 121. Vacuum extraction port; 13. Bottom shell; 131. Agitator; 132. Material outlet; 14. Upper flange; 15. Lower flange;

[0040] 2. Film-forming assembly, 21. Reaction plate, 211. Drainage channel, 212. Heating chamber, 2121. First opening, 2122. Second opening, 2123. Partition, 22. Transverse connecting pipe, 23. Heat medium conveying connecting pipe, 24. Fixed connecting pipe. Detailed Implementation

[0041] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0042] It should be understood that, when used in this specification and the appended claims, the terms "comprising" and "including" indicate the presence of the described features, integrals, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components and / or collections thereof.

[0043] It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the invention. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0044] It should also be further understood that the term "and / or" as used in this specification and the appended claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes such combinations.

[0045] Please see Figure 1-8 This invention provides a baffled devolatilizer, comprising: a vertical tower body 1, wherein at least one membrane assembly 2 is disposed inside the vertical tower body 1, and a material chamber 111 is disposed on the top of the membrane assembly 2;

[0046] The film-forming assembly 2 includes at least two reaction plates 21 arranged vertically and inclined, with adjacent reaction plates 21 having opposite inclination directions; the upper side of the reaction plate 21 is provided with a drainage groove 211 along its inclination direction;

[0047] The material chamber 111 is connected to a material outlet 1111, and the position of the material outlet 1111 corresponds to the topmost reaction plate 21.

[0048] In this process, the material in the material chamber 111 flows out of the material outlet 1111 and falls into the top reaction plate 21. The material flows down the flow channel 211 on the reaction plate 21 in sequence through the flow channel 211 of each reaction plate 21, and finally flows to the bottom of the vertical tower body 1.

[0049] In this embodiment, the film-forming component 2 consists of multiple reaction plates 21 arranged vertically, each reaction plate 21 being inclined, with adjacent reaction plates 21 inclined in opposite directions. A flow channel 211 is provided on each reaction plate 21, forming a zigzag reaction channel. When the material flows out from the upper material chamber 111, it flows sequentially from top to bottom along the flow channel 211 on each reaction plate 21 under gravity. The flow time of the material along the inclined reaction plates 21 is extended, which not only meets the reaction time requirements of the polymer but also reduces the likelihood of liquid film breakage and uneven distribution under high viscosity conditions. Furthermore, each time the material flows down a layer, its flow direction changes, causing disturbance and surface renewal of the liquid film, thereby promoting the release of volatile components and improving mass transfer efficiency. In addition, due to the use of multi-layered inclined reaction plates 21, the inclined reaction plates 21 can compress the height in the vertical direction compared with the vertically arranged reaction plates 21. This allows the material to obtain the required total residence time while the overall height of the reactor is significantly reduced compared with the traditional straight tube falling film reactor, which significantly reduces the height of the equipment and saves manufacturing costs and installation space.

[0050] In this embodiment, the number of reaction plates 21 is determined based on the material characteristics and the target residence time, and is generally set to 6 to 30 layers; for polyester polycondensation reactions, 10 to 20 layers are preferred; for polyamide polycondensation reactions, 8 to 16 layers are preferred. With a configuration of 30 reaction plates 21, the effective reaction section height of the reactor can be controlled within 3m to 5m, while the height of a traditional straight-tube falling film reactor to achieve the same residence time usually requires 8m to 12m, a height reduction of about 50% to 65%.

[0051] In this embodiment, the vertical tower body 1 includes a vertical shell 12, an upper end cap 11 sealed to the upper end of the vertical shell 12 via an upper end flange 14, and a bottom shell 13 sealed to the lower end via a lower end flange 15. The material chamber 111 is disposed inside the upper end cap 11.

[0052] Both the upper flange 14 and the lower flange 15 adopt a high-neck welding flange structure. The flange sealing surfaces use a raised face fit. The gaskets are preferably metal toothed composite gaskets or metal spiral wound gaskets (with a flexible graphite inner layer and a 316L stainless steel strip outer layer). The gasket width is 12mm to 20mm to ensure sealing reliability under high vacuum and high temperature conditions. The flange bolts are 35CrMoA alloy steel double-ended studs. The number and specifications of the bolts are selected according to the flange size and the HG / T 20613 standard. The bolt preload torque is calculated and applied with a margin of 1.5 times the design pressure. Leakage detection ports are set near the sealing surfaces of the upper flange 14 and the lower flange 15. By connecting a micro gas detector, the flange sealing status can be monitored in real time to prevent safety accidents caused by leakage of high-temperature molten materials.

[0053] The bottom shell 13 adopts an inverted conical structure with a cone angle of 120° to 150° to facilitate the convergence of the polymer melt after reaction to the bottom center under gravity. A stirrer 131 and a material outlet 132 are located at the lowest point of the bottom shell 13. The stirrer 131 adopts an anchor or ribbon structure, and the stirring shaft is sealed with a mechanical seal. The sealing material is a silicon carbide-to-silicon carbide friction pair, and the flushing fluid is a high-temperature heat transfer oil compatible with the reactants. The flushing pressure is 0.1 MPa to 0.2 MPa higher than the internal pressure of the reactor to prevent material leakage along the stirring shaft.

[0054] In this embodiment, the material chamber 111 flows outward through the membrane tube 1112, and the material outlet 1111 is located at the end of the membrane tube 1112. The upper end of the membrane tube 1112 is connected to the bottom plate of the material chamber 111, and the lower end of the membrane tube 1112 extends downward to the top of the reaction plate 21, so that the molten material in the material chamber 111 can be evenly distributed on the surface of the reaction plate 21.

[0055] The membrane tube 1112 is a vertically arranged circular tube structure, and its inner diameter is determined according to the material processing capacity of a single reaction plate 21. When multiple parallel drainage grooves 211 are provided on the surface of the reaction plate 21, the number of membrane tubes 1112 corresponds one-to-one with the number of drainage grooves 211, that is, an independent membrane tube 1112 is provided above the starting end of each drainage groove 211.

[0056] A guide cone is provided at the lower outlet of the film-forming tube 1112. The guide cone has a conical structure with a cone angle of 60° to 90°, and its tip is positioned downwards on the central axis of the film-forming tube 1112. After the molten material flows out from the lower end of the film-forming tube 1112, it spreads evenly around the cone surface of the guide cone and then flows into the guide channel 211. This further improves the uniformity of material distribution on the surface of the reaction plate 21, and is especially suitable for film-forming conditions of high-viscosity materials (kinematic viscosity greater than 1000 Pa·s). As an alternative, the lower end of the film-forming tube 1112 can also be configured as a slit-shaped outlet. The slit width matches the width of the guide channel 211. The slit-shaped outlet extends along the width direction of the reaction plate 21, allowing the material to flow out in a film form and directly cover the starting end of the guide channel 211. This is suitable for reaction plates 21 with a larger plate width (150 mm to 200 mm).

[0057] A material filter with a filtration accuracy of 50-100 mesh is provided at the material inlet 1113 to intercept gel particles or solid impurities that may be entrained in the material and prevent clogging of the membrane tube 1112.

[0058] In one embodiment, such as Figure 6 As shown, the reaction plate 21 is provided with a heating chamber 212 inside. The side wall of the heating chamber 212 is provided with a first opening 2121 and a second opening 2122. The first opening 2121 is located above the second opening 2122.

[0059] The heating medium flows into the heating chamber 212 from the second opening 2122 and flows out of the heating chamber 212 from the first opening 2121.

[0060] In this embodiment, a heating chamber 212 is provided inside the reaction plate 21, and a heat medium can flow within the heating chamber 212. During the flow of the heat medium, it can provide the reaction plate 21 with the temperature required for the material reaction. In this embodiment, the direction of heat medium flow can be selected according to actual needs. It can be selected that the heat medium flows from the bottom to the top of the reaction plate 21, or it can be selected that the heat medium flows from the top to the bottom of the reaction plate 21.

[0061] In one embodiment, such as Figure 1 As shown, a heat medium outflow chamber 112 and a heat medium inflow chamber 113 are also provided on the top of the film-forming assembly 2;

[0062] The heat medium outflow chamber 112 is connected to a heat medium outflow pipe 1121, which is vertically downward and sequentially connected to the first opening 2121 of the same group of film-forming components 2.

[0063] The heat medium inflow chamber 113 is connected to a heat medium inflow pipe 1131, which is vertically downward and sequentially connected to the second opening 2122 of the same group of film-forming components 2.

[0064] In this embodiment, both the heat medium outflow chamber 112 and the heat medium inflow chamber 113 are located inside the upper end cap 11, and the material chamber 111, the heat medium outflow chamber 112, and the heat medium inflow chamber 113 are all sealed and isolated by horizontal partitions. The heat medium outflow chamber 112 is located at the top, the heat medium inflow chamber 113 is located at the bottom, and the material chamber 111 is located between the heat medium outflow chamber 112 and the heat medium inflow chamber 113. A heat medium outlet 1122, communicating with a heat medium outlet chamber 112, is provided on the side wall of the upper end cap 11. The heat medium flows out of the heat medium outlet chamber 112 through the heat medium outlet 1122. A material inlet 1113, communicating with a material chamber 111, is provided on the side wall of the upper end cap 11. External materials enter the material chamber 111 through the material inlet 1113. The material inlet 1113 is located at the top of the upper end cap 11. The material inlet 1113 is connected to the material chamber 111 through a material pipe 1114. The material pipe 1114 passes through the heat medium outlet chamber 112 and then connects to the material chamber 111. A heat medium inlet 1132, communicating with a heat medium inlet chamber 113, is also provided on the side wall of the upper end cap 11. External heat medium enters the heat medium inlet chamber 113 through the heat medium inlet 1132.

[0065] In this embodiment, the heat medium inflow chamber 113 is connected to the second opening 2122 through the heat medium inflow pipe 1131, while the heat medium outflow chamber 112 is connected to the first opening 2121 through the heat medium outflow pipe 1121. This allows high-temperature heat medium (such as heat transfer oil) to enter the heating chamber 212 through the second opening 2122, gradually fill the heating chamber 212, and then flow out through the heat medium outflow pipe 1121 from the first opening 2121. This ensures that the heat medium can fill the heating chamber 212 as much as possible and fully heat the reaction plate 21.

[0066] like Figure 1 and Figure 2As shown, the film-forming assembly 2 in this embodiment is provided in three sets, such that three reaction plates 21 are provided at each layer position, and the center distance between two adjacent reaction plates 21 is 150mm. Correspondingly, the distance between the heat medium outflow pipe 1121 and the heat medium inflow pipe 1131 connected to the reaction plates 21 is also 150mm. When the positions of the first opening 2121 or the second opening 2122 of two adjacent reaction plates 21 in the same layer are close, these two first openings 2121 or second openings 2122 can be connected by a transverse connecting pipe 22. Figure 2 As shown, the second openings 2122 of the middle reaction plate 21 and the right reaction plate 21 of the second layer are close in position, so they are connected by a transverse connecting pipe 22 and connected to the same heat medium inflow pipe 1131. The first openings 2121 of the middle reaction plate 21 and the left reaction plate 21 of the second layer are close in position, so they are connected by a transverse connecting pipe 22 and connected to the same heat medium outflow pipe 1121.

[0067] In a further embodiment, within the same group of film-forming components 2, in two adjacent reaction plates 21, the inner diameters of the first opening 2121 and the second opening 2122 of the upper reaction plate 21 are both ds, and the inner diameters of the first opening 2121 and the second opening 2122 of the lower reaction plate 21 are both dx, where dx / ds=k; 1<k<1.2.

[0068] In this embodiment, from top to bottom along the vertical direction, the apertures of the first opening 2121 and the second opening 2122 on each layer of the reaction plate 21 gradually increase, thereby balancing the resistance to the flow of the heat medium and ensuring efficient flow of the heat medium within the bottom reaction plate 21. Therefore, let the topmost reaction plate 21 be the first layer, the inner diameter of the first opening 2121 and the second opening 2122 on the first layer reaction plate 21 be d1, and the inner diameter of the first opening 2121 and the second opening 2122 on the i-th layer (i=1,2,…,n, where n is the total number of layers) be di. Then, the inner diameters of each layer satisfy the following relationship: d i = d1× k （i-1） Where k is the diameter increase coefficient between adjacent layers, and the preferred value range for k is 1.05 to 1.20; the inner diameter d of the bottom layer n The ratio of the inner diameter d1 of the top layer to the outermost inner diameter is 1.2 to 2.5. Alternatively, according to the principle of equal pressure drop, the cross-sectional area of ​​the heat transfer pipe in each layer is inversely proportional to the pressure drop loss that the heat transfer flow in that layer needs to overcome, i.e., d... i ∝ (ΔP i ) -1 / 4 , where ΔP iThe total pressure drop from the heat medium flowing into the first opening 2121 and the second opening 2122 of the i-th layer; by increasing the diameter of the above-mentioned openings layer by layer, the flow deviation of the heat medium in each layer is controlled within ±10%.

[0069] In this embodiment, the inner diameters of the first opening 2121 and the second opening 2122 of the first layer reaction plate 21 are d1 = 4 mm, and the diameter increment coefficient between adjacent layers is k = 1.10. Therefore, the inner diameter of the second layer is d2 = 4.4 mm, the inner diameter of the third layer is d3 = 4.84 mm, and so on. Through this incremental diameter setting, the deviation of the heat transfer fluid flow rate in each layer can be controlled within ±10%, effectively ensuring the heating efficiency of the bottom layer reaction plate 21 and avoiding localized overheating or underheating due to uneven heat transfer fluid distribution.

[0070] In another embodiment, such as Figure 6 As shown, in the same group of film-forming components 2, in two adjacent reaction plates 21, the second opening 2122 of the upper reaction plate 21 is connected to the first opening 2121 of the lower reaction plate 21.

[0071] The heat medium outflow chamber 112 is connected to a heat medium outflow pipe 1121, and the heat medium outflow pipe 1121 is connected to the first opening 2121 of the topmost reaction plate 21.

[0072] The heat medium inflow chamber 113 is connected to a heat medium inflow pipe 1131, which is connected to the second opening 2122 of the bottom reaction plate 21.

[0073] Specifically, such as Figure 6 As shown, the heat medium inflow pipe 1131 is connected to the bottom plate of the heat medium inflow chamber 113, and then extends downward along the interior of the vertical shell 12 to the second opening 2122 of the bottom reaction plate 21, where it is welded. Between two adjacent reaction plates 21, the first opening 2121 of the lower reaction plate 21 is welded to the second opening 2122 of the upper reaction plate 21 via the heat medium delivery connecting pipe 23; the uppermost first opening 2121 of the uppermost reaction plate 21 is welded to the lower end of the heat medium outflow pipe 1121. Each reaction plate 21 is fixed by the heat medium delivery connecting pipe 23 and the fixed connecting pipe 24, which is welded between the heat medium inflow pipe 1131 and the reaction plate 21. Thus, the heat medium flow channels of each reaction plate 21 are connected in series, forming a unidirectional continuous heat medium loop from bottom to top. This series circuit ensures that the flow rate of the heat medium in each layer is completely equal, thus eliminating the problem of uneven flow distribution inherent in parallel flow. At the same time, the heat medium flows from bottom to top layer by layer, continuously releasing heat to the molten material in each layer. The temperature of the heat medium decreases from bottom to top layer by layer, forming a countercurrent match with the reaction process of the material from top to bottom.

[0074] As an alternative implementation, the heat medium circuit can also be reversed, that is, the heat medium inflow pipe 1131 is connected to the uppermost first opening 2121 of the uppermost reaction plate 21, and the heat medium flows in series from top to bottom, and is finally discharged from the second opening 2122 of the lowermost reaction plate 21 through the heat medium outflow pipe 1121, which can also achieve the effect of balanced flow in each layer.

[0075] In one embodiment, please refer again Figure 4 Within the same group of film-forming components 2, the angle between each pair of reaction plates 21 pointing downwards along the vertical direction and the vertical direction is the same, and the angle between each pair of reaction plates 21 pointing downwards along the vertical direction and the vertical direction gradually decreases.

[0076] In other words, in this embodiment, within the same group of film-forming components 2, two adjacent reaction plates 21 form a group, and the angle between the two reaction plates 21 in each group and the vertical direction is the same, and the angle between each group gradually decreases from top to bottom along the vertical direction.

[0077] Specifically, the angle between the first and second reaction plates 21 is 45°, the angle between the third and fourth reaction plates 21 is 40°, the angle between the fifth and sixth reaction plates 21 is 35°, and so on. Each pair of adjacent reaction plates 21 uses the same tilt angle, decreasing by 5° every two layers until the bottom layer reaches approximately 5°. Furthermore, the tilt directions of adjacent reaction plates 21 are opposite; that is, if the upper layer tilts to the lower left, the lower layer tilts to the lower right, thus forming a zigzag flow path.

[0078] In this embodiment, the angle between the reaction plate 21 and the axis of the vertical shell 12 decreases gradually from top to bottom as the viscosity of the material increases. This allows the upper layer of low-viscosity material to flow more smoothly to ensure reaction time, while the lower layer of high-viscosity material flows faster on the steeper plate surface with the help of gravity, avoiding accumulation and stagnation.

[0079] In one embodiment, such as Figure 5 As shown, within the same group of film-forming components 2, the distance between the bottom end of the upper reaction plate 21 and the top end of the lower reaction plate 21 in two adjacent reaction plates 21 is I, and the distance I between two adjacent reaction plates 21 gradually increases downward along the vertical direction.

[0080] The distance between the two adjacent reaction plates 21 at the top is I1, and the distance between the two adjacent reaction plates 21 at the bottom is I. n ,I1 / I n The size is between 0.4 and 0.84.

[0081] In this embodiment, the spacing between the topmost layer I1 and the spacing between the bottommost layer In The ratio is 0.5.

[0082] In a further embodiment, such as Figure 5 As shown, within the same group of film-forming components 2, the horizontal projection length between the top end of the lower reaction plate 21 and the bottom end of the upper reaction plate 21 in two adjacent reaction plates 21 is L, where L is the offset of the top end of the lower reaction plate 21, and 4mm < L < 35mm.

[0083] In this embodiment, in the horizontal projection direction, the top of the lower reaction plate 21 is offset outward by L by 30mm relative to the bottom of the upper reaction plate 21, so as to ensure that the molten material can accurately fall into the starting end of the lower reaction plate 21 after flowing out from the upper reaction plate 21, and avoid material splashing or deviating.

[0084] In another embodiment, such as Figure 7 As shown, a plurality of partitions 2123 are provided inside the heating chamber 212, and the plurality of partitions 2123 form an S-shaped flow channel inside the heating chamber 212;

[0085] The first opening 2121 and the second opening 2122 are respectively located at both ends of the S-shaped heat medium flow channel.

[0086] like Figure 7 As shown, multiple baffles 2123 are welded inside the heating chamber 212, dividing the inner cavity into an S-shaped heat transfer medium flow channel that meanders from the lower end to the upper end. After entering the lower end of the reaction plate 21 through the second opening 2122, the heat transfer medium flows along the S-shaped flow channel in a tortuous manner, eventually flowing into the heat transfer medium outlet pipe from the first opening 2121. This S-shaped flow channel significantly extends the flow path of the heat transfer medium within the reaction plate 21, making the heat exchange between the heat transfer medium and the melt on the plate surface more complete, while reducing the temperature gradient along the flow direction. In addition, the heat transfer medium flow channel in this embodiment can be set as an N-shaped flow channel or a multi-pass reversing flow channel, which can also achieve the effect of uniform temperature control.

[0087] In a further embodiment, such as Figure 8 As shown, the surface drainage groove structure of the reaction plate 21 has been optimized. As illustrated, four parallel V-shaped drainage grooves 211 are formed on the surface of the reaction plate 21. The depth of each groove 211 is 10 mm, and the grooves 211 extend from the bottom to the top of the plate surface. Each V-shaped drainage groove 211 on the uppermost layer of the reaction plate 21 has a corresponding film-forming tube 1112 at its upper end. The V-shaped drainage grooves 211 effectively guide the melt to form a stable liquid film and utilize the surface tension at the edges of the grooves 211 to prevent the liquid film from shrinking and breaking.

[0088] As an alternative, the cross-sectional shape of the drainage channel 211 can also be rectangular, trapezoidal, or arc-shaped. When a rectangular or trapezoidal drainage channel 211 is used, the depth is preferably 5mm to 20mm; when an arc-shaped or V-shaped drainage channel 211 is used, the depth is preferably 4mm to 15mm. A single reaction plate 21 can be provided with a single wide drainage channel 211, or 2 to 8 parallel drainage channels 211 can be provided, preferably 3 to 6. The width of a single reaction plate 21 is 30mm to 200mm, and in this embodiment, it is preferably 120mm.

[0089] The specific working process of this invention is as follows: First, a high-temperature heat medium (such as heat transfer oil) enters the heat medium inflow chamber 113 inside the upper end cap 11 from the outside through the heat medium inlet 1132, and then is distributed to the heating chamber 212 of the reaction plate 21 of each film-forming component 2 via the heat medium inflow pipe 1131. The heat medium flows from bottom to top in the S-shaped or N-shaped heat medium flow channel formed by the partition 2123, uniformly heating the reaction plate 21. Finally, it flows from the first opening 2121 above the reaction plate 21 through the heat medium outflow pipe 1121 into the heat medium outflow chamber 112, and returns to the external heat medium system for recycling through the heat medium outlet 1122.

[0090] Simultaneously, preheated molten polycondensation reaction materials (such as polyester prepolymer) enter the material chamber 111 from the upstream equipment through the material inlet 1113. Under gravity, they are evenly distributed to the surface of the guide channel 211 of the first reaction plate 21 through the film distribution tube 1112. The material forms a continuous and stable liquid film along the inclined guide channel 211 surface and flows obliquely downward under the guidance of the guide channel 211. When a multi-layer baffle structure is adopted, after the material flows out from the bottom of the upper reaction plate 21, it falls into the top of the next reverse-inclined reaction plate 21 under gravity. This repeated baffle process significantly extends the effective residence time of the material in the reactor. During the flow, under high temperature and high vacuum conditions, small molecule byproducts (such as water, ethylene glycol, etc.) diffuse out from the molten liquid film and are removed through the vacuum extraction port 121 at the top of the vertical shell 12, pushing the polycondensation reaction equilibrium towards the polymerization direction. Finally, the high molecular weight molten polymer that has completed the reaction is discharged from the bottom shell 13 through the material outlet 132 after being stirred by the agitator 131, and enters the subsequent granulation or pelletizing process.

[0091] Compared with the prior art, this application has the following advantages:

[0092] (1) Extending the reaction time to adapt to high viscosity materials: The inclined reaction plate 21 slows down the material flow rate, meets the residence time requirements of polymer polycondensation reaction, and is less likely to cause liquid film breakage or uneven distribution under high viscosity conditions.

[0093] (2) Enhance mass transfer and reaction efficiency: The flow direction of the material changes every time it passes through a reaction plate 21, causing disturbance and surface renewal of the liquid film, promoting the removal of by-products and improving mass transfer efficiency.

[0094] (3) Significantly reduced equipment height: Compared with traditional straight tube falling film reactors, the multi-layer inclined baffle structure significantly reduces the vertical height for the same residence time, saving manufacturing costs and installation space.

[0095] (4) Uniform heating and controllable temperature: Through the internal heating chamber 212 and S-shaped flow channel design, the heat medium flow path is extended, heat exchange is sufficient, and the temperature gradient is small; at the same time, by increasing the pipe diameter layer by layer or using series loops, the flow rate of heat medium in each layer is balanced, avoiding local overheating or insufficient heating.

[0096] (5) Adapting to changes in material viscosity: The tilt angle of the reaction plate 21 decreases gradually from top to bottom. The upper layer of low-viscosity material flows smoothly to ensure reaction time, while the lower layer of high-viscosity material flows faster with the help of the steeper plate surface to avoid accumulation and stagnation.

[0097] (6) Stable liquid film to prevent film breakage: V-shaped (or rectangular, trapezoidal, or arc-shaped) flow channel 211 guides the melt to form a stable liquid film and uses the edge surface tension to prevent the liquid film from shrinking and breaking.

[0098] (7) Precise material drop to avoid flow deviation: Set a reasonable horizontal offset (4mm~35mm) between adjacent reaction plates 21 to ensure that the material falls accurately from the upper layer to the starting end of the lower layer, reducing splashing or flow deviation.

[0099] (8) The equipment has a compact structure and is easy to implement: the multi-layer reaction plate 21 and the heat medium pipeline are integrated in the vertical tower body 1, which has a compact structure and is easy to manufacture, install and maintain.

[0100] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in the present invention, and these modifications or substitutions should all be covered within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A baffle-type devourer, characterized in that, include: A vertical tower body, wherein at least one membrane assembly is provided inside the vertical tower body, and a material chamber is provided on top of the membrane assembly; The film-forming assembly includes at least two reaction plates arranged vertically and inclined, with adjacent reaction plates having opposite inclination directions; a drainage groove is provided on the upper side of each reaction plate along its inclination direction. The material chamber is connected to a material outlet, and the position of the material outlet corresponds to the topmost reaction plate. In this process, after the material in the material chamber flows out of the material outlet, it falls into the top reaction plate. The material flows down the flow channel on the reaction plate in sequence through the flow channel of each reaction plate, and finally flows to the bottom of the vertical tower.

2. The baffle-type devourer according to claim 1, characterized in that, Within the same group of film-forming components, two adjacent reaction plates form a group, and the two reaction plates in each group have the same angle with the vertical direction, and the angle of each group gradually decreases from top to bottom along the vertical direction.

3. The baffle-type devourer according to claim 1, characterized in that, Within the same group of film-forming components, the distance between the bottom of the upper reaction plate and the top of the lower reaction plate in two adjacent reaction plates is I, and the distance I between two adjacent reaction plates gradually increases downwards in the vertical direction.

4. The baffle-type devolatilizer according to claim 3, characterized in that, The distance between the two adjacent reaction plates at the top is I1, and the distance between the two adjacent reaction plates at the bottom is I. n ,I1 / I n The size is between 0.4 and 0.

84.

5. The baffle-type devourer according to claim 1, characterized in that, Within the same group of film-forming components, the horizontal projection length between the top end of the lower reaction plate and the bottom end of the upper reaction plate in two adjacent reaction plates is L, where 4mm < L < 35mm.

6. The baffle-type devolatilizer according to any one of claims 1 to 5, characterized in that, The reaction plate has a heating chamber inside, and the side wall of the heating chamber has a first opening and a second opening through it, with the first opening located above the second opening; The heating medium flows into the heating chamber from the second opening and flows out of the heating chamber from the first opening.

7. The baffle-type devolatilizer according to claim 6, characterized in that, A heat medium outflow chamber and a heat medium inflow chamber are also provided on the top of the film-forming assembly; The heat medium outflow chamber is connected to a heat medium outflow pipe, which is vertically downward and sequentially connected to the first opening of the same group of film-forming components; The heat medium inflow chamber is connected to a heat medium inflow pipe, which is vertically downward and sequentially connected to the second opening of the same group of film-forming components.

8. The baffle-type devolatilizer according to claim 7, characterized in that, Within the same group of film-forming components, in two adjacent reaction plates, the inner diameters of the first and second openings of the upper reaction plate are both ds, and the inner diameters of the first and second openings of the lower reaction plate are both dx, where dx / ds = k; 1 < k < 1.

2.

9. The baffle-type devolatilizer according to claim 6, characterized in that, A heat medium outflow chamber and a heat medium inflow chamber are also provided on the top of the film-forming assembly; Within the same group of film-forming components, in two adjacent reaction plates, the second opening of the upper reaction plate communicates with the first opening of the lower reaction plate; The heat medium outlet chamber is connected to a heat medium outlet pipe, and the heat medium outlet pipe is connected to the first opening of the topmost reaction plate; The heat medium inflow chamber is connected to a heat medium inflow pipe, which is connected to the second opening of the bottom reaction plate.

10. The baffle-type devourer according to claim 6, characterized in that, The heating chamber is provided with several baffles, which form an S-shaped heat medium flow channel within the heating chamber. The first opening and the second opening are respectively located at both ends of the S-shaped heat medium flow channel.

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