Method for manufacturing anti-glare glass and anti-glare glass with paper-like touch

Abstract

The application discloses a kind of manufacturing methods of anti-glare glass, comprising: S1, design product surface convex point distribution diagram and concave point distribution diagram;S2, according to convex point distribution diagram and concave point distribution diagram compound, get single photomask;S3, using the single photomask of step S2, glass surface is patterned, and etching mask is obtained;S4, using etching mask to glass surface is etched, and the concave point pattern on single photomask is etched to obtain concave point, and convex point is not etched to form convex point at convex point position, and the concave point on glass surface is used to provide anti-glare and low flash point, and convex point is used to provide paper-like touch feeling.The manufacturing method of the anti-glare glass utilizes the selective protection effect of etching mask, and the etching forming of concave point and the protection reservation of convex point can be completed at the same time through once etching, so that the operation steps are reduced and the manufacturing cost is reduced.

Description

Technical Field

[0001] This invention relates to the field of anti-glare glass manufacturing, and more specifically, to a method for manufacturing anti-glare glass and anti-glare glass with a paper-like tactile feel. Background Technology

[0002] With the rapid development of electronic display technology, devices such as e-paper readers, handwriting tablets, touch screens, and drawing screens have been widely used in offices, education, design, and other fields. When using these devices, users not only pay attention to display clarity but also have increasingly higher requirements for the tactile experience when writing and reading.

[0003] Anti-glare AG glass, due to its ability to effectively scatter ambient light and reduce reflected glare, has been widely used in the surface protective covers of the aforementioned electronic display devices. Existing AG glass is mainly prepared through methods such as chemical etching (frosting), spraying, or coating, forming a micron-level uneven structure on its surface to achieve the light scattering effect.

[0004] However, existing AG glass has significant shortcomings in tactile simulation. Real paper has a unique, subtle damping feel when writing on it; the friction between the pen tip and the paper produces a slight drag and a "scratching" acoustic feedback. This synergistic tactile and auditory feedback is a crucial source of a realistic writing experience for users. However, the surface structure of traditional AG glass is mostly random unevenness on a single scale, typically micron-level pits formed by etching. Its tactile feel is primarily smooth, sticky, or rough like sandpaper, failing to simulate the subtle damping feel and acoustic feedback unique to real paper. When using a stylus or finger, users still feel like they are writing on glass rather than paper, leading to fatigue during prolonged writing and a decrease in pen control precision.

[0005] To address the aforementioned shortcomings in tactile simulation, some existing technologies attempt to improve tactile feel through dual-layer structural designs. For example, nanoscale or microscale protrusions are added to the existing pit structure on the glass surface through secondary coating or etching to provide additional frictional resistance. However, both secondary coating and secondary etching increase manufacturing steps and consequently raise manufacturing costs. Summary of the Invention

[0006] The purpose of this invention is to provide a method for manufacturing anti-glare glass. This method utilizes the selective protection effect of an etching mask, which can simultaneously complete the etching and shaping of concave points and the protection and retention of convex points in a single etching process, thereby reducing the number of operation steps and lowering manufacturing costs.

[0007] To achieve the above objectives, the present invention provides a method for manufacturing anti-glare glass, comprising: S1. Based on the type of touch, design the distribution diagram of raised dots and the distribution diagram of concave dots on the product surface respectively; S2. Based on the composite of the convex dot distribution map and the concave dot distribution map, a single photomask is obtained. During the composite process, the concave dot distribution map is used as a basis to remove the concave dots or some concave dots that overlap with the convex dots in the concave dot distribution map, so that the single photomask retains all the concave dots that are not covered by the convex dots. S3. Using the single photomask obtained in step S2, pattern the glass surface to obtain an etching mask; S4. Use an etching mask to etch the glass surface. The concave pattern on a single photomask is etched to form concave dots, while the convex dots are not etched to form convex dots. The concave dots on the glass surface are used to provide anti-glare and low flicker, while the convex dots are used to provide a paper-like feel.

[0008] Preferably, in step S1, the bump distribution diagram includes the position of the bump, the particle size d of the bump, and the distance s between two adjacent bumps.

[0009] Preferably, 20μm ≤ d ≤ 100μm.

[0010] Preferably, s and the particle size d of the bump satisfy 1.8d ≤ s ≤ 5d.

[0011] Preferably, in step S1, the concave point distribution map includes the location of the concave points, the particle size D of the concave points, and the distance P between two adjacent concave points, and d is greater than or equal to D.

[0012] Preferably, 1μm≤D≤100μm.

[0013] Preferably, 1μm≤P≤200μm.

[0014] Preferably, in step S4, the etching depth is 0.1-20 μm.

[0015] The present invention also provides an anti-glare glass with a paper-like touch. The anti-glare glass with a paper-like touch is manufactured by any one of the anti-glare glass manufacturing methods of claims 1-8, and includes concave dots and convex dots located on the glass surface. The concave dots are recessed inward, and the convex dots are distributed in the inner bottom surface, side wall and / or flat area between the concave dots. Multiple concave dots and convex dots are respectively provided. The particle size of the protrusions is larger than that of the concave ones.

[0016] Preferably, the particle size of the bump is d, where 20μm ≤ d ≤ 100μm; The distance between two adjacent protrusions is s, and 1.8d ≤ s ≤ 5d.

[0017] According to the above technical solution, the present invention designs a bump distribution pattern and a concave distribution pattern according to product requirements. The bump distribution pattern and the concave distribution pattern are combined to obtain a single photomask. Then, the single photomask is patterned to form an etching mask. By utilizing the selective protection effect of the etching mask, the etching and shaping of concave points and the protection and retention of bump points can be completed simultaneously in one etching process. This not only reduces the number of manufacturing steps, but also reduces the alignment time when processing two photomasks, fundamentally avoiding the problem of alignment deviation and greatly reducing manufacturing costs.

[0018] Other features and advantages of the present invention will be described in detail in the following detailed description section. Attached Figure Description

[0019] The accompanying drawings are provided to further illustrate the invention and form part of the specification. They are used together with the following detailed description to explain the invention, but do not constitute a limitation thereof. In the drawings: Figure 1 This is a schematic diagram of the surface structure of an anti-glare glass with a paper-like feel; Figure 2 It is a silhouette of an anti-glare glass with a paper-like tactile feel; Figure 3 It is a state diagram that combines a convex dot distribution map and a concave dot distribution map; Figure 4 This is a schematic diagram of a single photomask. Detailed Implementation

[0020] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit the present invention.

[0021] In this invention, unless otherwise stated, directional terms included in the terminology represent only the orientation of the term in its normal use or as commonly understood by those skilled in the art, and should not be regarded as a limitation on the term.

[0022] See Figure 1 The method for manufacturing an anti-glare glass includes: S1. Based on the type of touch, design the distribution diagram of raised dots and the distribution diagram of concave dots on the product surface respectively; The design of the bump distribution pattern includes determining the location of each bump, the bump diameter *d*, and the spacing *s* between adjacent bumps. The bumps can be arranged periodically, such as in a square or hexagonal array, or quasi-periodicly, such as randomly distributed but satisfying statistical uniformity. The bump diameter *d* refers to the equivalent circular diameter of a single bump on the glass surface.

[0023] The design of the concave distribution map includes determining the location of each concave point, the particle size D of the concave point, and the spacing P between two adjacent concave points. The locations of the concave points can also be arranged periodically or quasi-periodically. The particle size D of the concave point refers to the equivalent circular diameter of a single concave point on the glass surface.

[0024] In this invention, the raised dot distribution pattern and the concave dot distribution pattern can be designed independently. Specifically, the positions of the raised dots and the concave dots can completely overlap, partially overlap, or not overlap at all. The concave dot distribution pattern is mainly used to achieve the anti-glare function, while the raised dot distribution pattern is mainly used to achieve the paper-like tactile function. The two functions are decoupled and do not interfere with each other. Therefore, the raised dot distribution pattern and the concave dot distribution pattern can be designed according to the actual needs of the product for the anti-glare function and the paper-like tactile function.

[0025] S2. By combining the convex dot distribution map and the concave dot distribution map, a single photomask is obtained. During the composite process, the concave dot distribution map is used as the basis, and the concave dot patterns that overlap with the convex dots in the concave dot distribution map are removed, so that the single photomask retains all the concave dot patterns that are not covered by the convex dots. In the process of creating composite convex and concave dot distribution maps, the convex and concave dot distribution maps designed in step S1 are first imported into the same design file to ensure precise spatial alignment. Specifically, the concave dot distribution map is used as the base layer, and the convex dot distribution map is superimposed on it. After superposition, the presence of concave dot patterns is checked in the area covered by the convex dot patterns, i.e., the projection area of ​​the convex dot patterns on the glass surface. If overlapping concave dot patterns exist in the area covered by the convex dot patterns, the concave dot pattern is removed, i.e., the corresponding pattern of the concave dot pattern is deleted from the photomask design file. If the concave dot is completely covered, the entire concave dot is deleted; if only a part of the concave dot area is covered, the covered part is deleted. For concave dot patterns that do not overlap with any convex dot patterns, the concave dot pattern is retained. After the above composite operation is completed, a single photomask design file is obtained. This single photomask simultaneously contains micron-level patterns corresponding to both concave and convex dots.

[0026] The bumped areas on a single photomask are protected by an etched mask during subsequent etching processes, preventing the glass at those locations from being etched.

[0027] In step S2, two different patterns, concave and convex, are defined simultaneously using a single photomask. This is the key to achieving both convex and concave structures with a single photomask and a single etching operation. Traditional techniques typically require two or more photomasks and multiple photolithography and etching steps to form these two different structures, resulting in a complex and costly process. However, this invention combines the convex and concave distribution patterns onto the same photomask and employs a composite rule where concave areas give way to convex areas. This allows for the simultaneous fabrication of both convex and concave patterns using only one photomask, directly reducing photomask costs by approximately 50%.

[0028] S3. Using the single photomask obtained in step S2, pattern the glass surface to obtain an etching mask; Before etching, the glass substrate needs to be pre-treated by cleaning. The purpose of cleaning is to remove organic contaminants, inorganic particles, and metal ions from the glass surface, ensuring good adhesion between the subsequent coating layer and the glass surface. Then, a coating is deposited on the cleaned glass substrate surface. The deposited film is an acid-resistant barrier layer material. In one embodiment, an ITO barrier layer is deposited. This ITO film has excellent acid resistance and good chemical stability in fluorine-containing etching solutions such as hydrofluoric acid, effectively protecting the glass area it covers from etching. Photoresist is then coated onto the surface of the ITO film.

[0029] The single photomask obtained in step S2 is placed on a glass substrate coated with photoresist and exposed and developed. This transfers the pattern on the single photomask onto the photoresist. Using the developed photoresist pattern as a mask, the exposed ITO film is etched to obtain an etching mask.

[0030] Step S3 uses photolithography to precisely transfer the composite pattern on a single photomask onto the ITO barrier layer, forming an etching mask with exposed concave dots and covered convex dots. This etching mask provides a crucial structural foundation for the subsequent single etching process that simultaneously forms both concave and convex dots. Compared to existing technologies that require multiple photolithography and alignment steps, this invention completes the entire patterning process with only one photolithography step, significantly reducing the number of photolithography and alignment steps and substantially improving production efficiency and product yield. Simultaneously, the ITO film layer, acting as a barrier layer, possesses excellent acid resistance, ensuring complete protection of the convex dot areas throughout the etching process.

[0031] S4. Use an etching mask to etch the glass surface. The concave pattern on a single photomask is etched to form concave dots, while the convex dots are not etched to form convex dots. The concave dots on the glass surface are used to provide anti-glare and low flicker, while the convex dots are used to provide a paper-like feel.

[0032] In one embodiment, a glass substrate with an etching mask is immersed in an etching solution for acid etching. In the recessed areas of the glass surface, since the ITO etching mask has been removed, the glass surface is directly exposed to the etching solution. The hydrofluoric acid in the etching solution reacts with the silicon dioxide in the glass, and the resulting fluorosilicic acid (H₂SiF₆) is soluble in water. Therefore, the material on the glass surface is continuously etched away, forming downward-facing pit structures, i.e., recesses. As etching proceeds, the depth H of the recesses gradually increases until a preset value is reached. Preferably, a haze meter can be used to monitor the haze of the glass surface in real time. When the actual measured haze matches the haze value required by the product, etching is immediately stopped.

[0033] The raised area is completely covered by an etching mask, preventing the etching solution from contacting the glass surface. The etching solution cannot directly corrode the glass material at this location, thus allowing the glass in the raised area to maintain its original height. However, due to the influence of the surrounding recessed etching, the raised area will form a convex structure that is smaller at the top and larger at the bottom.

[0034] Because the entire glass substrate is simultaneously immersed in the etching solution, the etching of the concave areas and the protection of the convex areas occur in the same process. After etching, two structures are formed on the glass surface: the concave areas are etched to form pits, while the convex areas are protected by the etching mask and form protrusions relative to the pits.

[0035] After etching, the ITO film layer is removed first, and then the treated surface of the glass can be polished. The purpose of polishing is to remove the micro-burrs, spikes and edges generated during etching and film removal, especially to grind the sharp edges of the concave sidewalls and convex outer walls into rounded shapes to obtain a delicate and smooth paper-like feel.

[0036] After polishing, the glass surface exhibits a composite micron structure with both concave and convex points. The concave points, resembling downward-sloping pits, are responsible for scattering ambient light to achieve anti-glare functionality. The convex points, raised relative to the concave points, provide the necessary frictional damping force when the stylus or finger slides, producing a paper-like dragging sensation and a "scratching" acoustic feedback.

[0037] Preferably, step S4 further includes a chemical tempering process. Following the chemical tempering, the process further includes an AR anti-reflective coating and an AF anti-fingerprint coating.

[0038] In traditional techniques, forming two different structures typically requires two or more etching processes, each requiring independent coating, photolithography, and etching steps. By implementing the technical solution of this invention, the selective protection of the etching mask allows for the simultaneous etching of concave points and preservation of convex points in a single etching operation. This not only reduces manufacturing steps but also decreases the alignment time during the two-mask process, fundamentally avoiding alignment misalignment issues and significantly reducing manufacturing costs.

[0039] In this embodiment, preferably, in step S1, the bump distribution diagram includes the position of the bump, the particle size d of the bump, and the distance s between two adjacent bumps.

[0040] In this embodiment, preferably, 20μm ≤ d ≤ 100μm.

[0041] In this embodiment, preferably, s and the convex particle size d satisfy 1.8d ≤ s ≤ 5d.

[0042] The anti-glare glass with a paper-like feel includes inwardly recessed dots on the glass surface and raised dots surrounded by the recessed dots. Multiple recessed dots and raised dots are provided and distributed on the same surface of the glass.

[0043] The glass surface possesses a composite microstructure of concave and convex points. The convex points provide a paper-like tactile feel, while the concave points provide anti-glare and anti-flicker functions. The concave points appear as downward-sloping pits, distributed in certain areas of the glass surface. The convex points appear as upward-sloping structures relative to the concave points, distributed in the remaining areas of the glass surface. Overall, the convex points are situated within a background of concave points, surrounded by them.

[0044] A bump is a micrometer-scale structure on a glass surface that bulges upwards relative to a concave area. Bumps have a specific positional distribution on the glass surface, which can be arranged in a periodic array or a quasi-periodic arrangement. A bump distribution pattern can be designed according to the product's requirement for a paper-like tactile feel.

[0045] The raised dots, designed to provide a paper-like tactile feel, are relatively large to ensure they are easily felt by fingers or pen tips; the concave dots, designed to provide anti-glare, are relatively small to ensure good optical scattering. Therefore, the particle size d of the raised dots is larger than the particle size D of the concave dots, thus forming a composite structure of large raised dots and small concave dots on the glass surface.

[0046] The equivalent particle size d of the bumps ranges from 20μm to 100μm. Experiments revealed that when the bump particle size d is less than 20μm, the bump size is too small, making it difficult for fingers or pen tips to effectively perceive their presence, resulting in insufficient tactile feedback and a weak paper-like feel. When the bump particle size d is greater than 100μm, under standard white light illumination and at a distance of approximately 30cm from the screen, noticeable granular bumps are visible to the naked eye on the glass surface, causing a rough feel when sliding the finger and failing to achieve a smooth, paper-like tactile experience. Therefore, limiting the bump particle size d to the range of 20μm to 100μm balances sufficient tactile perception with a visually non-granular feel.

[0047] The distance between two adjacent bumps is s, and s and the bump diameter d satisfy the constraint relationship: 1.8d ≤ s ≤ 5d. When s < 1.8d, the bumps are too dense. After bonding the polarizer, cover plate, or protective film, the micro-gap between the bumps and the bonding interface will cause optical interference, resulting in a visible light and dark pattern, which seriously degrades the display quality. When s > 5d, the bumps are too sparse. When a finger or stylus slides on the flat area between the bumps, the friction provided by the bumps is insufficient, and the unique "dragging feeling" and "scratching" acoustic feedback of writing on paper cannot be produced. The writing feel gradually disappears until it is completely lost. Therefore, the ratio of the bump spacing s to the bump diameter d is limited to between 1.8 and 5, that is, 1.8d ≤ s ≤ 5d, which avoids both the pattern problem and the loss of writing feel.

[0048] The above constraints can also be equivalently expressed as the range of values ​​for the particle size distribution ratio γ = d / s: γ satisfies 0.2 ≤ γ ≤ 0.56. This effective range is the design window for a paper-like tactile feel.

[0049] In this embodiment, preferably, in step S1, the concave point distribution map includes the location of the concave points, the particle size D of the concave points, and the distance P between two adjacent concave points, and d is greater than or equal to D.

[0050] In this embodiment, preferably, 1μm≤D≤100μm.

[0051] In this embodiment, preferably, 1μm≤P≤200μm.

[0052] Dimples are micron-sized pits that indent inwards on the glass surface. These dimples have a specific positional distribution on the glass surface, which can be arranged in a periodic array or a quasi-periodic arrangement. Once the arrangement of the dimples is selected, a dimple distribution pattern can be designed according to the product's anti-glare requirements. When designing the dimple distribution pattern, attention must be paid to the equivalent particle size D of the dimples and the spacing P between two adjacent dimples.

[0053] Preferably, the equivalent particle size D of the concave dots is 1μm to 100μm. When D is less than 1μm, the concave dot size is too small, resulting in insufficient scattering ability of visible light and difficulty in achieving the ideal anti-glare effect; when D is greater than 100μm, the concave dot size is too large, which may exacerbate the flashing phenomenon. Controlling the concave dot particle size D within the range of 1μm to 100μm can balance the anti-glare effect with display clarity.

[0054] The distance between two adjacent dimples is denoted by P, which ranges from 1 μm to 200 μm. The dimple spacing P affects the surface roughness and haze uniformity of the glass. When P is less than 1 μm, the dimples are too dense, resulting in excessive surface roughness and a significant decrease in light transmittance. When P is greater than 200 μm, the dimples are too sparse, leading to insufficient surface roughness and difficulty in achieving the required haze. Controlling the dimple spacing P within the range of 1 μm to 200 μm ensures that the haze reaches the target range of 10% to 40%.

[0055] The function of the concave dots is to scatter the incident light multiple times through the curved surface and sidewalls of the concave dots when ambient light shines on the glass surface, converting specularly reflected light into diffusely reflected light, thereby reducing reflected glare and achieving an anti-glare effect. At the same time, the micron-sized dimensions of the concave dots are much smaller than the size of display pixels, preventing pixel-level optical distortion and achieving a low-flicker effect.

[0056] In this embodiment, preferably, in step S4, the etching depth is 0.1-20 μm.

[0057] The etching depth is 0.1-20 μm. After etching, the depth H of the recessed spots after polishing is approximately 0.1 μm to 30 μm. The recessed spot depth H affects the light scattering intensity and flash point suppression effect. When H is less than 0.1 μm, the recessed spot is too shallow, resulting in insufficient scattering ability; when H is greater than 30 μm, the recessed spot is too deep, which may lead to a decrease in glass strength.

[0058] Example 1 The specific steps for manufacturing a glass product with a strong writing feel are as follows: Step S1: Based on the target tactile type of "strong writing feel", design the raised dot distribution map and the concave dot distribution map. The specific design parameters are shown in Table 1.

[0059] Table 1:

[0060] Based on the product parameters shown in Table 1, a bump distribution pattern was designed. The parameters for the bump distribution pattern are: bump particle size d = 70 μm, bump spacing s = 200 μm; the parameters for the concave distribution pattern are: concave particle size D = 30 μm, concave spacing P = 60 μm, and concave depth H = 3 μm. The bump particle size d = 70 μm is greater than the concave particle size D = 30 μm.

[0061] Step S2: Combine the convex dot distribution map and the concave dot distribution map to obtain a single photomask. During the composite process, the concave dot distribution map is used as a basis, and the concave dot patterns that overlap with the convex dots in the concave dot distribution map are removed, so that the single photomask retains all the concave dot patterns not covered by the convex dots. The photomask simultaneously contains micron-level patterns corresponding to the concave dots and micron-level patterns corresponding to the convex dots.

[0062] Step S3: Cleaning and pretreatment of the glass substrate. After cleaning, a coating is deposited on the glass surface by magnetron sputtering. This coating layer can be an ITO film, a chromium film, a silicon dioxide film, or other films. Positive photoresist is spin-coated onto the surface of the coating layer. After pre-baking, UV exposure is performed using the aforementioned single photomask. After development, the coating layer is etched using the photoresist as a mask, transferring the photoresist pattern to the coating layer. After removing residual photoresist, a patterned etching mask is obtained. The concave areas are uncovered by the film layer, while the convex areas are covered by the film layer.

[0063] Step S4: Immerse the glass substrate with the patterned ITO etching mask into the etching solution for etching.

[0064] After etching, remove the glass substrate and rinse it with deionized water. Immerse the rinsed glass substrate in a stripping solution to remove the ITO film. After stripping, rinse with deionized water and dry.

[0065] Then, continue polishing with hydrofluoric acid until the desired haze is achieved, at which point polishing is stopped.

[0066] After polishing, the glass is cleaned and dried, and then chemically tempered. After chemical tempering, it undergoes AR anti-reflective coating and AF anti-fingerprint coating treatments to obtain the final anti-glare glass product with a paper-like feel.

[0067] The product manufactured in Example 1 was tested, and the results are shown in Table 2.

[0068] Table 2:

[0069] Comparative Example 1 The method is the same as in Example 1, except that d = 120 μm and s = 200 μm, where S < 1.8d.

[0070] The products manufactured in Comparative Example 1 were tested, and the results are shown in Table 3.

[0071] Table 3:

[0072] The present invention also provides an anti-glare glass with a paper-like touch. The anti-glare glass with a paper-like touch is manufactured using an anti-glare glass manufacturing method and includes concave dots and convex dots located on the glass surface. The concave dots are recessed inward, and the convex dots are distributed on the sidewalls of the concave dots and / or the flat area between the concave dots. Multiple concave dots and convex dots are respectively provided. The particle size of the protrusions is larger than that of the concave ones.

[0073] In the dot distribution diagram, if a convex dot covers all the concave dots in the concave dot distribution diagram, or does not cover any concave dots at all, the convex dot will be located in the flat area between the concave dots. When the convex dot covers part of the concave dots, the convex dot will be located on the sidewall of the concave dots. Since there are many concave and convex dots distributed on the glass surface, in an anti-glare glass product with a paper-like touch, some convex dots may be located on the sidewall of the concave dots, while others may be located in the flat area between the concave dots.

[0074] In this embodiment, preferably, the particle size of the bump is d, where 20μm ≤ d ≤ 100μm; The distance between two adjacent protrusions is s, and 1.8d ≤ s ≤ 5d.

[0075] The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0076] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0077] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A method for manufacturing anti-glare glass, characterized in that, include: S1. Based on the type of touch, design the distribution diagram of raised dots and the distribution diagram of concave dots on the product surface respectively; S2. Based on the composite of the convex dot distribution map and the concave dot distribution map, a single photomask is obtained. During the composite process, based on the concave dot distribution map, the concave dots or some concave dots that overlap with the convex dots in the concave dot distribution map are removed, so that the single photomask retains all the concave dots that are not covered by the convex dots. S3. Using the single photomask obtained in step S2, pattern the glass surface to obtain an etching mask; S4. The glass surface is etched using the etching mask. The concave pattern on the single photomask is etched to form concave dots, and the convex dots are not etched to form convex dots. The concave dots on the glass surface are used to provide anti-glare and low flicker, and the convex dots are used to provide a paper-like feel.

2. The method for manufacturing anti-glare glass according to claim 1, characterized in that, In step S1, the bump distribution diagram includes the position of the bump, the particle size d of the bump, and the distance s between two adjacent bumps.

3. The method for manufacturing anti-glare glass according to claim 2, characterized in that, 20μm≤ d ≤ 100μm.

4. The method for manufacturing anti-glare glass according to claim 2, characterized in that, The particle size s and the particle size d of the bump satisfy 1.8d ≤ s ≤ 5d.

5. The method for manufacturing anti-glare glass according to claim 2, characterized in that, In step S1, the concave distribution map includes the location of the concave point, the particle size D of the concave point, and the distance P between two adjacent concave points, and d is greater than or equal to D.

6. The method for manufacturing anti-glare glass according to claim 5, characterized in that, 1μm≤D≤ 100μm.

7. The method for manufacturing anti-glare glass according to claim 5, characterized in that, 1μm≤P≤ 200μm.

8. The method for manufacturing anti-glare glass according to claim 1, characterized in that, In step S4, the etching depth is 0.1-20 μm.

9. An anti-glare glass with a paper-like tactile feel, characterized in that, The anti-glare glass with a paper-like feel is manufactured using the anti-glare glass manufacturing method of any one of claims 1-8, and includes concave dots and convex dots located on the glass surface. The concave dots are recessed inward, and the convex dots are distributed on the inner bottom surface, side wall and / or flat area between the concave dots. Multiple concave dots and multiple convex dots are provided respectively. The particle size of the protrusion is larger than that of the concave point.

10. The anti-glare glass with a paper-like tactile feel according to claim 9, characterized in that, The particle size of the protrusion is d, where 20μm ≤ d ≤ 100μm; The distance between two adjacent convex points is s, and 1.8d ≤ s ≤ 5d.

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