A trap and semiconductor process apparatus

Abstract

The present application relates to the technical field of semiconductor process, and especially relates to a catcher and a semiconductor process equipment. The semiconductor process equipment comprises the catcher, the catcher comprises a shell, a spiral blade and a catching assembly, the shell has an air inlet hole and an air outlet hole; the spiral blade is arranged in the shell, the air inlet hole is arranged above the spiral blade, and the air outlet hole is arranged below the spiral blade; and the catching assembly is arranged at the outer circumferential side area of the spiral blade in the shell. In the catcher and the semiconductor process equipment, under the action of the spiral centrifugal force, the solid-state material generated by the reaction of the precursor gas is thrown radially outward to the outer circumferential side area of the spiral blade, is blocked and captured by the catching assembly, falls to the bottom of the shell at the outer circumferential side area of the spiral blade, and cannot directly fall to the air outlet hole, so that the air outlet hole is reduced or even avoided from being blocked, and the adverse effect of the dry pump is reduced or even avoided.

Description

Technical Field

[0001] This invention relates to the field of semiconductor process technology, and more specifically, to a trap and semiconductor process equipment. Background Technology

[0002] With the development of semiconductor technology, film deposition equipment has rapidly advanced, and the requirements for film thickness and uniformity are becoming increasingly stringent. ALD (Atomic Layer Deposition) technology, due to its self-limiting nature, offers significant advantages in this regard. It forms a film by controlling the alternating introduction of precursor gases into a reaction chamber, where a chemical reaction occurs on the wafer surface. The film thickness and uniformity can be effectively adjusted by controlling the reaction pulse time. For example, in ALD TiN film deposition technology, NH3 and TiCl4 precursor gases are alternately introduced into the reaction chamber. These gases react chemically within a very short time, accumulating layer by layer to form a film. Excess NH3 and TiCl4 can enter the front-end pipeline from the chamber and react to form solid substances. If these solid substances are not removed promptly, they will accumulate in the front-end pipeline and cause blockages. Furthermore, these solid reactants react with moisture to generate corrosive gases (such as HCl), which can adversely affect the dry pump if they enter it.

[0003] To avoid the aforementioned adverse effects, related technologies typically install a trap in the pre-line pipeline. The trap includes a housing and a metal mesh inside the housing. Cooling water channels are installed inside the metal mesh. The air inlet of the housing is located directly above the metal mesh, and the air outlet is located directly below the metal mesh. In the film formation process, excess precursor gas passes through the pre-line pipeline, enters the trap through the air inlet, and directly passes through the metal mesh. Solid substances are generated on the metal mesh and adsorbed onto it, thereby capturing the generated solid byproducts. After capture, the remaining gas is drawn away from the air outlet by the suction of the dry pump. In this related technology, although the metal mesh captures excess precursor gas, the captured solid matter will fall from the outlet under the action of gravity and be sucked into the dry pump, thus adversely affecting the dry pump. Summary of the Invention

[0004] The purpose of this invention is to provide a trap and semiconductor process equipment to solve the technical problem that the solid material captured by the trap falls from the outlet under the action of gravity and is sucked into the dry pump, causing adverse effects on the dry pump.

[0005] The trap provided in this embodiment of the invention includes:

[0006] The casing has an air inlet and an air outlet;

[0007] A helical blade is disposed within the housing, with the air inlet located above the helical blade and the air outlet located below the helical blade;

[0008] The trapping component is located on the outer peripheral side of the spiral blade.

[0009] Optionally, the trapping assembly includes a plurality of baffles arranged at circumferential intervals along the spiral blades, the baffles being set at an angle to the spiral winding direction of the spiral blades.

[0010] Optionally, the trapping assembly further includes an arc-shaped connecting plate fixed between adjacent baffles. The arc-shaped connecting plate has multiple plates that are spaced apart along the axial, circumferential and radial directions of the spiral blades and form a mesh structure with the baffles.

[0011] Optionally, the upper end of the baffle is higher than the upper end of the arc-shaped connecting plate;

[0012] And / or, both the baffle and the arc-shaped connecting plate are made of metal.

[0013] Optionally, it also includes an isolation shield having an annular base plate; the trapping assembly is mounted on the annular base plate.

[0014] Optionally, the isolation cover also has an inner protective plate that protrudes upward from the annular base plate, the inner protective plate being disposed at the inner ring edge of the annular base plate.

[0015] Optionally, the isolation cover also has an outer protective plate that protrudes upward from the annular base plate, the outer protective plate being disposed at the outer ring edge of the annular base plate.

[0016] Optionally, the housing is provided with cooling channels for the flow of cooling medium to cool the trapping assembly.

[0017] Optionally, the cooling channel has a plurality of annular channels spaced apart from bottom to top, and the liquid inlet and liquid outlet of each annular channel are respectively disposed at intervals away from each other along their annular extension direction on the opposite sidewalls of the corresponding annular channel.

[0018] Optionally, the housing has a bottom-up extending baffle that passes through the annular channel and divides the annular channel into discontinuous annular channels;

[0019] In each of the discontinuous annular channels, one of the liquid inlet and the liquid outlet is located near the baffle rib, and the other is located away from the baffle rib.

[0020] Optionally, a central column is fixedly inserted through the axial center of the helical blade, and the helical blade is tightly coiled around the outer peripheral wall of the central column;

[0021] The air inlet is located on the upper cover and at an off-center position of the central column, and the air outlet is located on the bottom wall and at an off-center position of the central column.

[0022] Optionally, the central column has an air passage with an outlet extending through the outer wall of the central column for supplying gas into the housing.

[0023] Optionally, the air passage extends along the length of the central column, with the air inlet end of the air passage lower than the lower end of the spiral blade, and the air outlet end higher than the upper end of the spiral blade;

[0024] The air outlets are multiple and are spaced apart along the length of the central column, facing the space between adjacent upper and lower layers of the spiral blades.

[0025] Optionally, the airway includes a first airway and a second airway, wherein the first airway and the second airway are separated and not connected to each other.

[0026] Optionally, the air outlet connected to the first airway is the first air outlet, and the diameter of the plurality of first air outlets gradually increases from the air inlet end to the end end of the first airway.

[0027] Optionally, the surface of the helical blade is a smooth surface;

[0028] And / or, the helical blades are inclined from top to bottom along their radial direction.

[0029] Optionally, the wall of the air inlet is provided with a heating component; and / or, the wall of the air outlet is provided with a heating component.

[0030] The semiconductor process equipment provided in this embodiment of the invention includes a reaction chamber, a front-end pipeline, and the aforementioned trap. One end of the front-end pipeline is connected to the reaction chamber, and the other end is connected to the air inlet of the trap. The air outlet of the trap is configured to be connected to a dry pump.

[0031] The trap and semiconductor process equipment provided in the embodiments of the present invention have the following beneficial effects:

[0032] During the process, the precursor gas enters the housing through the inlet and flows directly to the spiral blades, moving along the spiral direction of the blades. During this process, due to centrifugal force, the solids generated by the reaction of the two precursor gases are radially thrown outward to the outer periphery of the spiral blades and captured by the capture assembly, falling to the bottom of the housing in the outer periphery of the spiral blades. Since the outlet is located below the spiral blades and far from the outer periphery of the spiral blades, the solids in the outer periphery of the spiral blades will not fall directly into the outlet. Therefore, this reduces or even avoids the solid reactants falling directly into the outlet due to gravity, reduces or even avoids the occurrence of outlet blockage, reduces or even avoids the probability of solids being sucked into the dry pump and causing downtime, and reduces or even avoids adverse effects on the dry pump. Attached Figure Description

[0033] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0034] Figure 1a This is a schematic diagram of the structure of semiconductor process equipment in related technologies;

[0035] Figure 1b This is a schematic diagram of the structure of a trap in related technologies;

[0036] Figure 2a This is a three-dimensional structural view of the trap provided in an embodiment of the present invention, wherein the top cover and air inlet are shown in perspective.

[0037] Figure 2b An exploded perspective view of the trap provided in an embodiment of the invention;

[0038] Figure 2c A longitudinal sectional view of the trap provided in the embodiment of the invention;

[0039] Figure 3a This is a longitudinal sectional view of the trap provided in an embodiment of the invention, wherein the housing and its related structures are not shown;

[0040] Figure 3b for Figure 3a AA section view diagram;

[0041] Figure 4 This is a three-dimensional structural view of the trap provided in an embodiment of the present invention, wherein the shell, spiral blades and their related structures are not shown, and the trapping assembly and the isolation shield are mainly shown;

[0042] Figure 5a A three-dimensional structural diagram of the shell in the trap provided in the embodiment of the present invention;

[0043] Figure 5b for Figure 5a A schematic diagram of the exploded three-dimensional structure of the middle shell;

[0044] Figure 5c for Figure 5a A three-dimensional cross-sectional view of one longitudinal section of the inner shell;

[0045] Figure 5d for Figure 5a A schematic diagram of the cross-sectional structure of another longitudinal section of the inner shell;

[0046] Figure 6a This is a three-dimensional structural diagram of the housing from one perspective of the trap provided in an embodiment of the present invention, wherein the annular plate is not shown;

[0047] Figure 6b for Figure 6a Enlarged view of point G1;

[0048] Figure 7a This is a three-dimensional structural diagram of the housing from another perspective in the trap provided in an embodiment of the present invention, wherein the annular plate is not shown;

[0049] Figure 7b for Figure 7a Enlarged view of point G2 in the middle;

[0050] Figure 8 This is a three-dimensional structural diagram of the plug in the trap provided in an embodiment of the present invention;

[0051] Figure 9a This is a three-dimensional structural diagram of the spiral blades in the trap provided in an embodiment of the present invention;

[0052] Figure 9b for Figure 9a A schematic diagram of the longitudinal section of the helical blades, where the arrows indicate the approximate direction of gas flow;

[0053] Figure 10 In the trap provided for the embodiments of the present invention, only the top view of the air inlet or the bottom view of the air outlet are shown, in which the heating rod is shown;

[0054] Figure 11 This is a schematic diagram of a semiconductor process equipment provided in an embodiment of the present invention.

[0055] Explanation of reference numerals in the attached figures:

[0056] 10 - Collector; 20 - Reaction chamber; 30 - Fore-end piping; 40 - Dry pump;

[0057] 100 - Housing; 110 - Air inlet; 120 - Air outlet;

[0058] 130 - Cooling flow channel;

[0059] 131-Annular channel; 132-Liquid inlet; 133-Liquid outlet; 134-Annular bar; 135-Annular plate;

[0060] 136 - Through hole; 137 - Plug;

[0061] 140-Retaining Rib;

[0062] 150 - Top cover; 151 - Sealing ring;

[0063] 160 - Bottom wall; 170 - Heating rod; 180 - Limiting ring;

[0064] 200-Helical blade;

[0065] 300 - Capture assembly; 310 - Baffle; 320 - Arc-shaped connecting plate; 301 - Capture net;

[0066] 400-Isolation Shield;

[0067] 410 - Circular base plate; 420 - Inner protective plate; 430 - Outer protective plate;

[0068] 500 - Central column;

[0069] 510 - First airway; 511 - First air outlet;

[0070] 520 - Second airway; 521 - Second air outlet. Detailed Implementation

[0071] The technical solution of the present invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0072] In related technologies, taking ALD TiN film formation as an example, this film formation process mainly involves alternately pulsed introduction of two precursors, NH3 and TiCl4, into the reaction chamber. These two precursors react in a very short time, accumulating layer by layer to form a film. For example... Figure 1aAs shown, each precursor is accompanied by N2 for diluting the special gas (such as TiCl4, NH3) and purging. The key long film process includes: NH3in → N2Purge → TiCl4in → N2Purge, that is, NH3 is introduced → N2 is introduced to purge NH3 → TiCl4 is introduced → N2 is introduced to purge TiCl4. The precursor gas and purge gas are alternately introduced and circulated repeatedly. During this process, excess NH3 and TiCl4 will enter the Foreline through the chamber and undergo a chemical reaction to generate solid products that adhere to the inner wall of the Foreline vacuum line and the Trap. The main function of the Trap is to capture the solid products to prevent dust particles from entering the dry pump and causing jamming, which would affect the normal process. At the same time, the solid products are easy to react with water vapor in the air to generate HCl, and its corrosive properties will also affect the dry pump.

[0073] To avoid the aforementioned adverse effects, such as Figure 1a As shown, a trap 10 is typically installed in the pre-pipeline 30. Specifically, the trap 300 is installed on the exhaust pipe of the pre-pipeline 30 of the process reaction chamber 20. The trap 10 is used to capture the solid products generated by the reaction of two precursor gases (such as TiCl4 and NH3). The two precursor gases alternately enter the reaction chamber 20 through corresponding gas pipelines and deposit the corresponding thin films on the substrate. Excess reaction gases and byproducts will enter the trap 10 through the exhaust pipe of the pre-pipeline 30 and are finally discharged to the exhaust gas treatment equipment by the dry pump 40.

[0074] In related technologies, such as Figure 1bAs shown, the collector 10 includes a housing 100, with a collection net 301 disposed inside the housing 100. An inlet 110 is located directly above the collection net 301, and an outlet 120 is located directly below the collection net. In the film-forming process, excess precursor gas and its byproducts enter the collector 10 through the inlet 110 via the pre-pipeline 30 and pass directly through the collection net 301. The collection net 301 has cooling water channels. The precursor gas (e.g., TiCl₂)... 4 and NH3 (at temperatures below 200°C) generate solid substances on the collection net 301 and are adsorbed onto the collection net 301, capturing the generated solid byproducts. After capture, the remaining gas is drawn away from the outlet by the suction of the dry pump 40. In this related technology, the collection net 301 captures excess precursor gases, but the solid substances generated after capture will fall directly from the outlet 120 under gravity and be sucked into the dry pump 40, thus affecting the dry pump 40. This causes adverse effects; furthermore, the precursor gas only enters the housing 100 through the air inlet 110, which cannot guarantee that enough NH3 can be introduced to completely react with TiCl4, resulting in TiCl4 residue, which corrodes the inner wall of the housing 100, the pre-pipeline 30, and the dry pump 40; in addition, in related technologies, a heating rod is provided at the air inlet 110 to heat the air inlet 110 to a temperature not lower than 250°C, at which temperature the reactants of TiCl4 and NH3 are mainly gaseous; the air inlet 110 has a gas flow channel, and gaseous NH3 is introduced into the air inlet 110 through the gas flow channel and flows to the collection net 301. Since the collection net 301 is equipped with a water channel, the temperature of the collection net 301 is lower than 200°C. NH3 reacts with the excess or excessive TiCl4 discharged from the reaction chamber 20 in the collection net 301 to form solids, which are adsorbed on the collection net 301, thus completing the function of capturing TiCl4.

[0075] As can be seen from the trap 10 provided in the above-mentioned related technologies, on the one hand, only introducing NH3 into the air inlet 110 cannot guarantee that it will react completely with the excess TiCl4 in the housing 100, and there may still be residual TiCl4, which will corrode the inner wall of the pipe and the dry pump 40; on the other hand, the air outlet 120 is not equipped with a heating structure, and the remaining precursor gas or gaseous reactants are easy to generate solids in the air outlet 120, which will cause the air outlet 120 to be blocked or affect the pumping speed of the dry pump 40; furthermore, since the air outlet 120 is located directly below the trap 301, the solids generated by the trap 301 may fall directly into the air outlet 120 due to gravity and other factors, and enter the dry pump 40, causing the dry pump 40 to jam and affecting the normal operation of the machine; in addition, the trap 301 is fixed inside the housing 100, making disassembly difficult and maintenance inconvenient.

[0076] This invention provides a trap and semiconductor process equipment, such as... Figures 2a-11As shown, a spiral blade 200 is mainly arranged inside the housing 100 of the trap 10, and a trapping assembly 300 is arranged on the outer peripheral area of ​​the spiral blade 200. During the flow of the precursor gas through the spiral channel formed by the spiral blade 200, the generated solids are thrown towards the outer peripheral area of ​​the spiral blade 200 under centrifugal force. The trapping assembly 300 blocks and captures these solids, which then fall downwards to the outer peripheral area of ​​the spiral blade 200, thereby reducing or even preventing them from falling directly into the outlet 120. The housing 100 is provided with a cooling structure to reduce the temperature in the area where the trapping assembly 300 is located. The precursor gas and its reaction products are in a solid state after contacting the trapping assembly 300; the central column 500 of the spiral blade 200 is provided with a gas channel to supplement the necessary precursor reaction gas or dilution gas, so that the corrosive gas in the housing 100 reacts as fully as possible, or dilutes the corrosive gas to reduce or even avoid corrosion of the housing 100, pipelines and dry pump 40; the air inlet 110 and air outlet 120 of the housing 100 are provided with heating structures to reduce or even avoid the formation of solids by the precursor gas in the corresponding air holes; the present invention will be further described in detail below by listing specific embodiments and in conjunction with the accompanying drawings.

[0077] This invention provides a trap 10, such as... Figures 2a-2c As shown, the trap 10 includes: a housing 100, a spiral blade 200, and a trapping assembly 300. The housing 100 has an air inlet 110 and an air outlet 120. The spiral blade 200 is disposed inside the housing 100, with the air inlet 110 located above the spiral blade 200 and the air outlet 120 located below the spiral blade 200. The trapping assembly 300 is disposed in the outer peripheral region of the spiral blade 200.

[0078] Multiple baffles 310 are provided at intervals along the circumference of the spiral blade 200 in the outer peripheral region of the spiral blade 200 inside the housing 100, and are arranged at an angle to the spiral winding direction of the spiral blade 200.

[0079] During the process, the precursor gas enters the housing 100 through the inlet 110 and flows directly into the spiral channel formed by the spiral blades 200. It flows along the spiral winding direction of the spiral blades 200. During this process, due to centrifugal force during the flow along the spiral channel of the spiral blades 200, the precursor gas disperses to the outer peripheral area of ​​the spiral blades 200. The solids generated by the reaction of the precursor gas are radially thrown outwards to the outer peripheral area of ​​the spiral blades 200 and are blocked and captured by the capture assembly 300, falling into the housing 100 in the outer peripheral area of ​​the spiral blades 200. At the bottom, since the vent 120 is located below the spiral blades 300 200 and is staggered with the outer peripheral area of ​​the spiral blades 200, solid objects located in the outer peripheral area of ​​the spiral blades 200 will not fall directly into the vent 120. Therefore, it will reduce or even avoid the occurrence of solid objects falling directly into the vent 120 due to gravity, causing blockage of the vent 120. At the same time, it will reduce or even avoid the probability of solid objects being sucked into the dry pump 40 and causing problems such as downtime, reduce or even avoid adverse effects on the dry pump 40, and ensure the service life of the dry pump 40.

[0080] In embodiments of the present invention, such as Figures 2a-2c , Figure 3a , Figure 3b , Figure 4 As shown, the trapping assembly 300 includes a plurality of baffles 310 arranged at intervals along the circumference of the spiral blade 200, with the baffles 310 forming an angle with the spiral winding direction of the spiral blade 200. During the process, under the action of centrifugal force, the precursor gas and the solids generated by the reaction are radially thrown outward to the outer peripheral region of the spiral blade 200, where they are blocked and captured by the baffles 310 and fall to the bottom of the housing 100 in the outer peripheral region of the spiral blade 200.

[0081] In embodiments of the present invention, such as Figure 3a , Figure 3b , Figure 4As shown, the trapping assembly 300 also includes an arc-shaped connecting plate 320, which is fixedly connected between adjacent baffles 310. That is, adjacent baffles 310 are fixedly connected by the arc-shaped connecting plate 320. Multiple arc-shaped connecting plates 320 are spaced apart along the axial, circumferential, and radial directions of the helical blade 200, forming a mesh structure with the baffles 310. Specifically, multiple layers of arc-shaped connecting plates 320 are arranged along the axial direction of the helical blade 200, spaced apart. The gap allows solids ejected from the spiral blades 200 to enter the collection assembly 300. Arc-shaped connecting plates 320 are spaced apart along the axial direction of the spiral blades 200, with both ends fixed to adjacent baffles 310. That is, the baffles 310 are located in the circumferential gap between adjacent arc-shaped connecting plates 320. The arc-shaped connecting plates 320 are also spaced apart radially along the spiral blades 200, effectively creating a roughly annular three-dimensional mesh structure by sequentially spacing the arc-shaped connecting plates 320 in three directions. The arc-shaped connecting plates 320 effectively connect the baffles 310 into a single structure to form the collection assembly 300, enhancing its stability and facilitating assembly and disassembly. Furthermore, they increase the capture area for solids, enhancing its capture capacity. Both the baffles 310 and the arc-shaped connecting plates 320 can be made of metal.

[0082] Specifically, such as Figure 4 As shown, the upper end of the baffle 310 is higher than the upper end of the arc-shaped connecting plate 320, which makes it easier for the solid object to directly impact the upper end of the baffle 310 after being thrown out by centrifugal force, thereby facilitating the capture of the solid object. In this embodiment, the baffle 310 extends outward along the radial direction of the spiral blade 200, that is, it is perpendicular to the outer peripheral contour of the spiral blade 200, which can impact the solid object as directly as possible, thereby further ensuring the capture efficiency of the solid object.

[0083] In embodiments of the present invention, such as Figures 2a-4 As shown, the collector 10 also includes an isolation shield 400, which has an annular base plate 410; the collection assembly 300 is mounted on the annular base plate 410. During the process, the solids captured by the collection assembly 300 will fall onto the annular base plate 410 for centralized collection.

[0084] like Figures 2a-4As shown, the isolation shield 400 also has an inner shield 420 that protrudes upward from the annular base plate 410. The inner shield 420 is located at the inner ring edge of the annular base plate 410. Since the inner shield 420 is located at the inner ring edge of the annular base plate 410 and protrudes upward from the upper surface of the annular base plate 410, when the solid matter captured by the trapping assembly 300 falls, it will fall directly onto the annular base plate 410, preventing the solid matter from falling radially inward into the inner ring area of ​​the annular base plate 410. When the dry pump 40 pumps air from the housing 100, the inner shield 420 will prevent the solid matter from flowing outward. The vent 120 moves to collect solids on the annular base plate 410. When there are too many solids and their height is about to reach the protrusion height of the inner protective plate 420, or when the solids collected by the collection component 300 are too many and affect the collection effect, and replacement is required, simply remove the collection component 300 upwards for cleaning or replacement, clean or replace the solids collected by the isolation cover 400, and then reinstall the isolation cover 400 and the collection component 300 into the housing 100 in sequence to carry out solid capture and collection operations again. It has the advantages of high disassembly and assembly efficiency and low maintenance cost.

[0085] Please continue reading Figures 2a-4 The isolation shield 400 also has an outer protective plate 430 protruding upward from the annular base plate 410. The outer protective plate 430 is located at the outer ring edge of the annular base plate 410. This arrangement, with the outer protective plate 430, annular base plate 410, and inner protective plate 420 radially fixed from the inside out, forms an annular cylindrical cavity with an opening only at the top. The isolation shield 400 is placed within this annular cylindrical cavity, thereby confining the isolation shield 400 and the captured solid matter within the annular cylindrical cavity, further ensuring effective capture of the solid matter and preventing it from scattering to other areas. Specifically, as... Figure 2c As shown, the height of the outer protective plate 430 extends upward to be close to or flush with the height of the upper end of the housing 100. On the one hand, this facilitates manual removal and placement of the isolation cover 400. On the other hand, it further prevents solids from scattering to areas outside the outer periphery of the trapping assembly 300, such as preventing them from scattering to the inner wall of the housing 100, thereby avoiding adverse effects such as corrosion on the inner wall of the housing 100. The height of the inner protective plate 420 protruding upward is significantly lower than the height of the trapping assembly 300, that is, the upper part of the inner protective plate 420 is close to the bottom end of the trapping assembly 300. For example, the upper end of the inner protective plate 420 is slightly lower than the lower end of the spiral blade 200 or located in the vicinity of that end. As long as it does not obstruct the gas or solids thrown out by the spiral blade 200 from entering the trapping assembly 300, the height of the inner protective plate 420 should be maintained as much as possible to provide a larger trapping space.

[0086] In embodiments of the present invention, such as Figure 2b , Figure 2c , Figures 5b-5dAs shown, the housing 100 is provided with a cooling channel 130 for the flow of cooling medium to cool the trapping assembly 300. During the process, a cooling medium flows in the cooling channel 130 to effectively cool the trapping assembly 300, keeping the temperature of the trapping assembly 300 and its surrounding area at a preset temperature. At this preset temperature, different precursor gases can neutralize and react with each other or with the reactant gas to form solids, which are then easily captured by the trapping assembly 300.

[0087] In embodiments of the present invention, such as Figures 5b-5d , Figures 6a-6b , Figures 7a-7b As shown, the cooling channel 130 has multiple annular channels 131 spaced apart from bottom to top. The liquid inlet 132 and liquid outlet 133 of each annular channel 131 are respectively arranged at intervals along their annular extension direction on the opposite sidewalls of the corresponding annular channel 131, so that the cooling medium flows forward in an "S"-shaped meandering back and forth. The multiple annular channels 131 are distributed as widely as possible across the entire peripheral sidewall of the housing 100 to cool the entire annular area where the trapping assembly 300 is located. Taking two cooling channels 130 as an example, their initial liquid inlets are located near the bottom of the housing 100. They can share the same initial liquid inlet, or their initial liquid inlets can be independent and close to each other. The annular channels 131 of each cooling channel 130 are arranged in an "S" shape, meandering back and forth, like a snake. Their terminal liquid outlets can share the same terminal liquid outlet, or their terminal liquid outlets can be independent and close to each other. That is, liquid enters at the same initial inlet, then flows symmetrically back-to-back → towards each other → back-to-back → ... → towards each other, finally converging at the terminal liquid outlet and flowing out of the cooling channel 130, thus achieving cooling of the circumferential sidewalls of the housing 100. It should be noted that these two cooling channels 130 can be completely isolated or not completely isolated. For example, each annular channel 131 can share the same liquid inlet (e.g., ...). Figures 6a-6b As shown), the cooling medium flows in opposite directions from the shared inlet to form two cooling channels 130, which are not limited here.

[0088] Specifically, such as Figures 5a-5c As shown, the housing 100 has a baffle 140 extending from bottom to top. The baffle 140 passes through the annular channel 131 and divides the annular channel 131 into discontinuous annular channels 131 on the left and right. In each annular channel 131, one of the liquid inlet 132 and the liquid outlet 133 is located near the baffle 140, and the other is located away from the baffle 140 (e.g., in the middle region of the annular channel 131). Specifically, in adjacent annular channels 131, the channels are separated at the baffle 140, and the other parts are continuous channels.

[0089] In adjacent annular channels 131, if the inlet 132 of the lower annular channel 131 is located on the lower sidewall of the lower annular channel 131 and away from the baffle 140, then the outlet 133 of the lower annular channel 131 is located on the upper sidewall of the annular channel 131 and close to the baffle 140. Furthermore, the upper sidewall of the lower annular channel 131 is also the lower sidewall of the upper annular channel 131, and the outlet 133 of the lower annular channel 131 is also the inlet 132 of the upper annular channel 131. That is, the inlet 132 of the upper annular channel 131 is located on the lower sidewall of the upper annular channel 131 and close to the baffle 140, and the outlet 133 of the upper annular channel 131 is located on the upper sidewall of the upper annular channel 131 and away from the baffle 140. In the adjacent annular channel 131, if the inlet hole 132 of the lower annular channel 131 is located on the lower side wall of the lower annular channel 131 and close to the baffle 140, then the outlet hole 133 of the lower annular channel 131 is located on the upper side wall of the lower annular channel 131 and away from the baffle 140. The upper side wall of the lower annular channel 131 is also the lower side wall of the upper annular channel 131, and the outlet hole 133 of the lower annular channel 131 is also the inlet hole 132 of the upper annular channel 131. That is, the inlet hole 132 of the upper annular channel 131 is located on the lower side wall of the upper annular channel 131 and away from the baffle 140, and the outlet hole 133 of the upper annular channel 131 is located on the upper side wall of the upper annular channel 131 and close to the baffle 140.

[0090] For example, such as Figures 6a-6b , Figure 7aAs shown in Figure b, in adjacent annular channels 131, the liquid inlet 132 of the lower annular channel 131 is located directly below or near the liquid outlet 133 of the upper annular channel 131, and is located in the middle region of the annular channel 131. However, it is isolated by the upper sidewall of the lower annular channel 131 (which is also the lower sidewall of the upper annular channel 131). That is, in adjacent annular channels 131, the upper sidewall of the lower annular channel 131 is also the lower sidewall of the upper annular channel 131, and the liquid outlet 133 of the lower annular channel 131 is also the liquid inlet 132 of the upper annular channel 131. The liquid inlets 132 and outlets 133 of each annular channel 131 are far apart from each other and are staggered on their lower and upper sidewalls. With this arrangement, the cooling medium flows from the liquid inlet 132 of the lower annular channel 131. 32 enters the lower annular channel 131. Since the part directly above the inlet hole 132 is the upper sidewall of the lower annular channel 131 and is a continuous solid sidewall, the cooling medium is forced to flow along the lower annular channel 131 to the side of the inlet hole 132 towards the outlet hole 133 of the lower annular channel 131 (which is also the inlet hole 132 of the upper annular channel 131), and then flows into the upper annular channel 131. Similarly, since the upper sidewall of the upper annular channel 131 directly opposite the inlet hole 132 is a continuous solid sidewall, the cooling medium will be forced to flow to the side of the inlet hole 132 and towards the outlet hole 133 of the upper annular channel 131, and then flow into the next upper annular channel 131 adjacent to the upper annular channel 131, thus realizing the reciprocating flow of the cooling medium.

[0091] Specifically, such as Figures 5a-5d As shown, multiple layers of annular strips 134 can be welded to the inner wall of the housing 100. Adjacent annular strips 134 form the upper and lower sidewalls of annular channels 131, and each annular channel 131 is sealed at its annular opening by welding annular plates 135. Figures 6a-6b , Figures 7a-7b As shown, the two ends of the annular bar 134 are welded to the left and right end faces of the retaining rib 140, respectively. The annular bar 134 has through holes 136 at corresponding positions to form inlet holes 132 or outlet holes 133. Please continue to refer to... Figures 6a-6b , Figures 7a-7b In adjacent annular bars 134, if one annular bar 134 has a through hole 136 (as a liquid inlet 132 or a liquid outlet 133) only in the middle region, then the other annular bar 134 has through holes 136 (as liquid inlet 132 or a liquid outlet 133) only at both ends; or, as Figures 6a-6b , Figures 7a-7b , Figure 8As shown, in adjacent annular bars 134, each annular bar 134 has through holes 136 in the middle area and at both ends, and plugs 137 are provided. The plugs 137 cooperate with the through holes 136 to seal the corresponding through holes 136. Specifically, one annular bar 134 does not seal the through hole 136 in the middle area (serving as a liquid inlet 132 or a liquid outlet 133), and seals the through holes 136 at both ends of its annular bar 134 with plugs 137. Then, the other annular bar 134 seals the through hole 136 in the middle area with plugs 137, but does not seal the through holes 136 at both ends of its annular bar 134 (serving as a liquid inlet 132 or a liquid outlet 133). The left and right ends of each annular plate 135 are respectively sealed and welded to the left and right ends of the baffle rib 140, and the upper and lower ends of the annular plate 135 are respectively sealed and welded to the annular bars 134 above and below it. In addition, the annular strip 134 can be welded to the outer wall of the housing 100. This is not limited, as long as the annular channel 131 described above can be formed.

[0092] It should be noted that, in this embodiment of the invention, the outer protective plate 430 of the isolation shield 400 can be closely attached to the inner sidewall of the housing 100, that is, close to the cooling channel 130 of the housing 100; the outer edge of the trapping assembly 300 is closely attached to the inner sidewall of the outer protective plate 430, that is, at least one of the baffle 310 and the arc-shaped connecting plate 320 is closely attached to the inner sidewall of the outer protective plate 430, thereby facilitating the cooling of the trapping assembly 300 to achieve the effect of condensation and trapping. In addition, while the cooling medium provides a good condensation environment for the trapping assembly 300 during its flow in the cooling channel 130, due to the physical properties of the corrosive gas (TiCl4), it will condense into a liquid state below 55°C. Therefore, the cooling temperature of the cooling medium should not be lower than 55°C to avoid directly condensing the corrosive gas (TiCl4) and adsorbing it on the bottom of the annular columnar cavity of the trapping assembly 300 or the isolation shield 400, thereby corroding the trapping assembly 300 and the isolation shield 400, and thus ensuring the service life of the trapping assembly 300, the isolation shield 400, and the trap 10.

[0093] In embodiments of the present invention, such as Figures 9a-9bAs shown, a central column 500 is fixedly inserted through the axial part of the spiral blade 200. The spiral blade 200 is tightly coiled around the outer peripheral wall of the central column 500 so that the inner edge of the spiral blade 200 is in close contact with the outer peripheral wall of the central column 500, with no gap between them. This allows the gas entering the spiral blade 200 to flow along the coiling direction of the spiral blade 200. The upper end of the central column 500 is installed on the upper cover 150 of the housing 100 (e.g., abutting against the upper cover 150), and the lower end is installed on the bottom wall 160 of the housing 100 (e.g., abutting against the bottom wall 160). The air inlet 110 is located on the upper cover 150 and at the eccentric part of the central column 500, and the air outlet 120 is located on the bottom wall 160 and at the eccentric part of the central column 500. The central column 500 serves two purposes. First, it provides a mounting platform for the helical blade 200. The helical blade 200 can be simply coiled around the outer periphery of the central column 500. For example, the two can be integrated into a single structure or welded together. Other methods, such as a detachable connection, are also possible and are not limited here. Second, the helical blade 200 can be installed by mounting the upper end of the central column 500 to the upper cover 150 and the lower end to the bottom wall 160. Specifically, as shown... Figure 2b , Figure 2c , Figure 5c , Figure 5d As shown, an upwardly protruding limiting structure, such as a limiting ring 180, is provided on the bottom wall 160. The lower end of the central column 500 is inserted into the limiting ring 180, and the upper end abuts against the top cover 150, thus enabling the installation of the central column 500 and the spiral blade 200. It should be noted that other limiting methods can also be used for this limiting structure. For example, multiple circumferentially spaced limiting protrusions (not shown in the figure) can be provided. Simply insert the lower end of the central column 500 into the area enclosed by the limiting protrusions. This is not limited here. For the specific structure of the top cover 150, a limiting structure corresponding to the bottom wall 160 (not shown in the figure) can be provided at the corresponding position of the top cover 150 to further limit the central column 500 and ensure further stability of its structure. This is not limited here. In addition, a sealing ring 151 is provided between the top cover 150 and the housing 100.

[0094] In embodiments of the present invention, such as Figure 3a , Figure 9a , Figure 9b As shown, the central column 500 has a gas passage with an outlet extending through the outer wall of the central column 500 for supplying gas into the housing 100. In use, reactive gas can be supplied into the housing 100 through this gas passage to neutralize corrosive gases within the housing 100, or inert gas can be supplied into the housing 100 to dilute corrosive gases within the housing 100.

[0095] Specifically, such as Figure 3a , Figure 9a , Figure 9b As shown, the air passage extends along the length of the central column 500. The air inlet end of the air passage is lower than the lower end of the spiral blade 200, and the air outlet end is higher than the upper end of the spiral blade 200. Multiple air outlets are arranged at intervals along the length of the central column 500, facing the space between adjacent upper and lower layers of the spiral blade 200. This arrangement ensures that the gas supplied to the housing 100 is more uniform and distributed throughout the housing 100 as much as possible, effectively neutralizing or diluting corrosive gases.

[0096] The aforementioned airway may include a first airway 510 and a second airway 520, such as Figure 3a , Figure 9a , Figure 9b As shown, the first gas passage 510 and the second gas passage 520 are separated and not connected to each other. This arrangement allows different gases to be delivered into the housing 100. For example, the first gas passage 510 can deliver a reactive gas to neutralize corrosive gases, and the second gas passage 520 can deliver an inert gas to dilute corrosive gases. Alternatively, the same type of gas can be delivered; for example, both can be reactive gases to quickly neutralize corrosive gases, or both can be inert gases to quickly dilute corrosive gases. No limitation is made here.

[0097] In this embodiment of the invention, taking the setting of two gas channels to transport the reactive gas and the inert gas respectively as an example, the two gas channels are the first gas channel 510 and the second gas channel 520, the gas outlet of the first gas channel 510 is the first gas outlet 511, and the gas outlet of the second gas channel 520 is the second gas outlet 521, as described in detail below.

[0098] When different precursor gases enter the housing 100 during the process / use, there may be insufficient reactive gas to completely neutralize the corrosive gases. To provide sufficient reactive gas within the housing 100, in this embodiment of the invention, such as... Figure 3a , Figure 9a , Figure 9bAs shown, the central column 500 has a first air passage 510 extending upward to the upper end region of the helical blade 200. The first air passage 510 is connected to a plurality of first air outlets 511 spaced apart from bottom to top. The first air outlets 511 penetrate the outer wall of the central column 500 and face the space between adjacent upper and lower layers of the helical blade 200. The uppermost first air outlet 511 is located above the upper surface of the helical blade 200. The first air passage 510 is used to introduce a corresponding reactive gas into the housing 100. This reactive gas is used to neutralize excess corrosive gas in the housing 100, thereby effectively reducing or even eliminating corrosive gas. In related technologies, reactive gas is introduced only at the air inlet 110 of the housing 100, which can only neutralize the corrosive gas in the air inlet 110 and the surrounding area, but cannot fully neutralize the corrosive gas inside the housing 100. In contrast to the related technologies, in the trap 10 provided in the embodiment of the present invention, the central column 500 is provided with a first air passage 510 extending along its axial direction and a first air outlet 511 connected to the first air passage 510 and arranged sequentially at intervals along its axial direction. This can not only fully neutralize the corrosive gas at the air inlet 110, but also fully neutralize the corrosive gas inside the housing 100.

[0099] Specifically, in order to quickly introduce the gas from the process in the reaction chamber 20 into the shell 100 through the air inlet 110, the air inlet 110 has a relatively large diameter. The content (concentration) of the corrosive gas to be neutralized at this location is relatively high, requiring a larger amount of reactant gas to neutralize the corrosive gas. As the spiral flow channel moves downwards, the amount of corrosive gas gradually decreases, and the required amount of reactant gas also gradually decreases. That is, the amount of reactant gas required varies at different heights of the central column 500. To adapt to this situation, see [further details omitted]. Figure 3a , Figure 9a , Figure 9b In this embodiment of the invention, the apertures of the multiple first air outlets 511 are gradually increased from bottom to top. That is, from the air inlet end to the end of the first air passage 510, the apertures of the multiple first air outlets 511 gradually increase. This allows the housing 100 to be supplied with a gradually decreasing amount of reactive gas from top to bottom. This not only effectively neutralizes excess corrosive gas but also avoids introducing too much reactive gas to accommodate the large amount of corrosive gas at the air inlet 110. This not only ensures the neutralization effect of the reactive gas and the corrosive gas but also reduces the cost of using the reactive gas.

[0100] In embodiments of the present invention, such as Figure 9bAs shown, the central column 500 has a second air passage 520 extending upward to the upper end region of the helical blade 200. The second air passage 520 is connected to a plurality of second air outlets 521 spaced apart from bottom to top. The second air outlets 521 penetrate the outer wall of the central column 500 and face the space between adjacent upper and lower layers of the helical blade 200. The uppermost second air outlet 521 is located above the upper surface of the helical blade 200. The second air passage 520 is separated from the first air passage 510 and is not connected to it. The second air passage 520 is used to introduce inert gas into the housing 100 to help dilute the concentration of corrosive gas inside the housing 100 and reduce the corrosiveness of the corrosive gas to the housing 100 and the pipe wall. Specifically, the aperture of the second outlet 521 can be set slightly smaller to ensure that the air pressure at the second outlet 521 is 0.8MPa to 1.2MPa, preferably 1MPa. That is, the second outlet 521 has a certain purging capability, which can blow the gas and solid matter in the spiral channel radially outward to the outer peripheral area of ​​the spiral blade 200, so as to facilitate blowing them into the collection assembly 300, thereby further ensuring the collection effect of the collection assembly 300. It should be noted that the first outlet 511 can also blow the gas and solid matter in the spiral channel radially outward to the outer peripheral area of ​​the spiral blade 200 to a certain extent, further ensuring the collection effect of the collection assembly 300.

[0101] by Figure 9b As shown in the example, there are 10 first air outlets 511 and 10 second air outlets 521, numbered sequentially from bottom to top as: 1, 2, ..., 10. For the selection of the aperture of the first air outlet 511 and the second air outlet 521, this embodiment recommends the following as shown in Table 1.

[0102] Serial Number 1 2 3 4 5 6 7 8 9 10 First air outlet 511 3.25 3.75 4.25 4.75 5.25 5.75 6.25 6.75 7.25 7.75 Second air outlet 521 4 4 4 4 4 4 4 4 4 4

[0103] Table 1: Recommended orifice diameters (mm) for the first air outlet 511 and the second air outlet 521.

[0104] It should be noted that in this embodiment of the invention, the central column 500 is arranged vertically, so its length extension direction is vertical. The specific embodiment of the extension direction from bottom to top / from top to bottom is the length extension direction of the central column 500, which is not limited in this case.

[0105] In this embodiment of the invention, the surface of the spiral blade 200 is a smooth surface to ensure a low surface roughness value, thereby facilitating the solid material to slide down to the outer peripheral area of ​​the spiral blade 200 under the action of centrifugal force and smoothly slide into the collection assembly 300.

[0106] In embodiments of the present invention, such as Figures 9a-9bAs shown, the spiral blade 200 is inclined from top to bottom along its radial direction so that the solid object can slide down to the outer peripheral area of ​​the spiral blade 200 under the combined action of centrifugal force and gravity, and smoothly slide into the collection assembly 300.

[0107] In this embodiment of the invention, the spiral blade 200 is selected as a glass sheet spirally wound into a multi-layered structure, thereby causing adjacent glass sheets to form a spiral airflow.

[0108] In this embodiment of the invention, the wall of the air inlet 110 is provided with a heating component (not shown in the figure) to ensure the temperature at the air inlet 110 and prevent the formation of solids at this location that could block the air inlet 110 or affect the pumping speed of the dry pump 40; such as Figure 10 As shown, the heating assembly includes heating rods 170 to ensure that the temperature at the air inlet 110 is not lower than 250°C, so that the reaction products of NH3 and TiCl4 at this temperature are mainly gaseous, avoiding the formation of solid reactants or temperature condensation, which could cause the air inlet 110 to become blocked and affect the vacuuming operation of the chamber. Specifically, four heating rods can be evenly spaced along the circumference of the air inlet 110, or other numbers of heating rods 170 can be provided, which is not limited here.

[0109] In this embodiment of the invention, the wall of the vent 120 is provided with a heating component to ensure the temperature at the vent 120 and prevent the formation of solids at that location that could block the vent 120 or affect the pumping speed of the dry pump 40; for example Figure 5d , Figure 10 As shown, the heating assembly includes heating rods 170 to ensure that the temperature at the vent 120 is not lower than 250°C, so that the reaction products of NH3 and TiCl4 at this temperature are mainly gaseous, avoiding the formation of solid reactants or condensation, which could cause the vent 120 to become blocked and affect the vacuuming operation of the chamber. Specifically, four heating rods 170 can be evenly spaced along the circumference of the vent 120, or other numbers of heating rods 170 can be used, which is not limited here.

[0110] This invention also provides a semiconductor process apparatus, such as... Figure 11 As shown, the semiconductor process apparatus includes a reaction chamber 20, a front-end pipeline 30, and the aforementioned trap 10. One end of the front-end pipeline 30 is connected to the reaction chamber 20, and the other end is connected to the inlet 110 of the trap 10. The outlet 120 of the trap 10 is configured to connect to a dry pump 40. This semiconductor process apparatus possesses all the advantages of the trap 10 described above, which will not be elaborated further here.

[0111] In the description of this invention, it should be noted that the terms "upper", "lower", "front", "horizontal", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0112] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the term "installation" should be interpreted broadly. For example, it can refer to a fixed connection, a detachable connection, or an integral connection; it can refer to a mechanical connection or an electrical connection; it can refer to a direct connection or an indirect connection through an intermediate medium; it can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0113] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A trap, characterized in that, include: The housing (100) has an air inlet (110) and an air outlet (120); A helical blade (200) is disposed inside the housing (100), an air inlet (110) is disposed above the helical blade (200), and an air outlet (120) is disposed below the helical blade (200). The trapping assembly (300) is disposed on the outer peripheral region of the spiral blade (200).

2. The trap according to claim 1, characterized in that, The trapping assembly (300) includes a plurality of baffles (310) arranged circumferentially along the spiral blade (200), the baffles (310) being set at an angle to the spiral winding direction of the spiral blade (200).

3. The trap according to claim 2, characterized in that, The trapping assembly (300) further includes an arc-shaped connecting plate (320) fixed between adjacent baffles (310). The arc-shaped connecting plate (320) has multiple plates that are spaced apart along the axial, circumferential and radial directions of the spiral blade (200) and form a mesh structure with the baffle (310).

4. The trap according to claim 3, characterized in that, The upper end of the baffle (310) is higher than the upper end of the arc-shaped connecting plate (320); And / or, both the baffle (310) and the arc-shaped connecting plate (320) are made of metal.

5. The trap according to claim 1, characterized in that, It also includes an isolation shield (400) having an annular base plate (410); the trapping assembly (300) is mounted on the annular base plate (410).

6. The trap according to claim 5, characterized in that, The isolation shield (400) also has an inner protective plate (420) that protrudes upward from the annular base plate (410), and the inner protective plate (420) is disposed on the inner ring edge of the annular base plate (410).

7. The trap according to claim 5, characterized in that, The isolation cover (400) also has an outer protective plate (430) that protrudes upward from the annular base plate (410), and the outer protective plate (430) is disposed on the outer ring edge of the annular base plate (410).

8. The trap according to any one of claims 1-7, characterized in that, The housing (100) is provided with cooling channels (130) for the flow of cooling medium to cool the trapping assembly (300).

9. The trap according to claim 8, characterized in that, The cooling channel (130) has a plurality of annular channels (131) spaced apart from bottom to top. The liquid inlet (132) and liquid outlet (133) of each annular channel (131) are respectively arranged at intervals away from each other along their annular extension direction on the opposite sidewall of the corresponding annular channel (131).

10. The trap according to claim 9, characterized in that, The housing (100) has a bottom-up extending baffle (140) that passes through the annular channel (131) and divides the annular channel (131) into discontinuous annular channels; In each of the discontinuous annular channels, one of the liquid inlet (132) and the liquid outlet (133) is located near the baffle (140), and the other is located away from the baffle (140).

11. The trap according to any one of claims 1-7, characterized in that, A central column (500) is fixedly inserted through the axial part of the spiral blade (200), and the spiral blade (200) is tightly coiled around the outer peripheral wall of the central column (500). The air inlet (110) is located on the upper cover (150) and at an eccentric position on the central column (500), and the air outlet (120) is located on the bottom wall (160) and at an eccentric position on the central column (500).

12. The trap according to claim 11, characterized in that, The central column (500) has an air passage with an outlet that extends through the outer wall of the central column (500) for supplying gas into the housing (100).

13. The trap according to claim 12, characterized in that, The air passage extends along the length of the central column (500), with the air inlet end of the air passage lower than the lower end of the spiral blade (200) and the end of the air passage higher than the upper end of the spiral blade (200). The air outlets are multiple and are spaced apart along the length of the central column (500), and face the space between adjacent upper and lower layers of the spiral blade (200).

14. The trap according to claim 13, characterized in that, The airway includes a first airway (510) and a second airway (520), wherein the first airway and the second airway are separated and not connected to each other.

15. The trap according to claim 14, characterized in that, The air outlet connected to the first air passage (510) is the first air outlet (511). From the air inlet end to the end of the first air passage (510), the diameter of the multiple first air outlets (511) gradually increases.

16. The trap according to any one of claims 1-7, characterized in that, The surface of the helical blade (200) is a smooth surface; And / or, the helical blade (200) is inclined from top to bottom along its radial direction.

17. The trap according to any one of claims 1-7, characterized in that, The air inlet (110) is provided with a heating component (170) on its wall; and / or the air outlet (120) is provided with a heating component (170) on its wall.

18. A semiconductor process apparatus, characterized in that, The device includes a reaction chamber (20), a pre-pipeline (30), and a trap (10) as described in any one of claims 1-17, wherein one end of the pre-pipeline (30) is connected to the reaction chamber (20), and the other end is connected to the air inlet (110) of the trap (10), and the air outlet (120) of the trap (10) is configured to be connected to a dry pump (40).

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