A vacuum rapid deposition coating chemical vapor deposition apparatus

Abstract

The present application relates to the technical field of circuit board processing, in particular to a vacuum type rapid deposition coating chemical vapor deposition equipment. It comprises a main frame, a deposition chamber assembly is arranged in the main frame, one side of the deposition chamber assembly is communicated with a sublimation assembly, locking assemblies are symmetrically arranged on the upper and lower sides of the deposition chamber assembly, and an energy-saving vacuumizing assembly is arranged on the side of the deposition chamber assembly away from the sublimation assembly. The present application solves the problem of unstable film formation caused by temperature and pressure fluctuations through a steady-state coating process environment with constant temperature of 150 DEG C and constant pressure of 1 Pa, and can ensure that the gaseous raw material particles of the parylene are uniformly and evenly adsorbed and polymerized on the surface of the circuit board at a constant working condition, effectively eliminating quality defects such as local film, plating leakage and pinholes, greatly improving the density and uniformity of the film layer, and stably adapting to extreme working conditions such as deep sea high humidity and strong corrosion, thereby significantly prolonging the service life of the circuit board and the running stability of the equipment.

Description

Technical Field

[0001] This invention relates to the field of circuit board processing technology, specifically to a vacuum-type rapid deposition chemical vapor deposition (CVD) equipment for coating. Background Technology

[0002] In extreme high humidity and high salt spray environments such as deep-sea drilling platforms and marine industrial control equipment, circuit boards are extremely susceptible to moisture corrosion and insulation failure. Therefore, the industry generally adopts chemical vapor deposition process to deposit a protective film of pyrene on the surface of the circuit board. Through the sublimation of raw materials, gas phase transport, and surface polymerization to form a film, the whole machine is protected against moisture and insulation.

[0003] Existing traditional deposition equipment mostly adopts a stepped temperature and pressure variable operation mode. The temperature and vacuum pressure inside the chamber fluctuate continuously, which makes the deposition rate of gaseous raw material particles unstable. The deposition rate of conventional processes is only about 1.5μm per hour, resulting in extremely low processing efficiency. At the same time, the dynamic temperature and pressure environment is prone to defects such as uneven film thickness, local pinholes, and incomplete coverage, which significantly reduces the reliability of protection under extreme environments. Traditional equipment requires heaters and high-power vacuum pumps to work continuously at full load throughout the process, resulting in a high proportion of ineffective energy consumption. Long-term mass production use leads to high electricity costs, making it difficult to meet the industrial demand for high-efficiency, low-cost, and high-yield coating production. Summary of the Invention

[0004] The purpose of this invention is to address the deficiencies and shortcomings of existing technologies by providing a reasonably designed vacuum-type rapid deposition chemical vapor deposition apparatus for coating, which can solve the aforementioned deficiencies.

[0005] To achieve the above objectives, the present invention provides the following technical solution: it includes a main frame, a deposition chamber assembly is disposed within the main frame, one side of the deposition chamber assembly is connected to a sublimation assembly, locking assemblies are symmetrically disposed on the upper and lower sides of the deposition chamber assembly, and an energy-saving vacuum assembly is disposed on the side of the deposition chamber assembly away from the sublimation assembly.

[0006] Preferably, the deposition chamber assembly includes a chamber body disposed within the main frame. A pair of connecting handles are provided on one side of the chamber body. A sealing door is provided on the front of the chamber body. A connector is provided on one side of the sealing door corresponding to the position of the connecting handles. The connector is movably connected to the connecting handles. An observation window is provided on the sealing door. A pull handle is provided on one side of the sealing door. A first reducer is provided on the back of the chamber body. The transmission end of the first reducer is located inside the chamber body. A rotating frame is provided on the transmission end of the first reducer. Several mounting frames are provided inside the rotating frame. A first motor is provided on the first reducer. The transmission end of the first motor is connected to the input end of the first reducer.

[0007] Preferably, the sealed door body is provided with an observation component, which includes a sealing cylinder embedded in the wall of the sealed door body. A rotating shaft is movably disposed within the sealing cylinder. A mounting bracket 1 is provided on the front of the sealed door body, and a mounting bracket 2 is provided on the mounting bracket 1. One end of the rotating shaft is movably disposed on the mounting bracket 1 via a bearing seat. Several connecting blocks are provided at the rear end of the rotating shaft. A semi-circular arc clamping frame 1 is provided on the top of each connecting block, and a semi-circular arc clamping frame 2 is provided on each semi-circular arc clamping frame 1. A detachable transparent plate is provided between the corresponding semi-circular arc clamping frame 1 and semi-circular arc clamping frame 2, and one of the transparent plates blocks the front of the observation window. A T-shaped component is provided on one side of the first semi-circular arc clamping frame, and an L-shaped connecting plate is provided on the second semi-circular arc clamping frame corresponding to the position of the T-shaped component. The L-shaped connecting plate is movably mounted on the T-shaped component. A fitting plate is provided on the side of both the first and second semi-circular arc clamping frames away from the T-shaped component. An internally threaded cylinder is provided on both fitting plates, and a connecting bolt is threaded inside both internally threaded cylinders. A screw head is provided on the top of the connecting bolt. A second reducer is provided on the second mounting frame, and the transmission end of the second reducer is connected to one end of the rotating shaft through a coupling. A second motor is provided on the second reducer, and the transmission end of the second motor is connected to the input end of the second reducer.

[0008] Preferably, the back of the sealed door is symmetrically provided with support plates on both sides, and each support plate is connected with a cover plate, which is positioned in front of the transparent plate.

[0009] Preferably, a frame guard plate is provided on the outer side of the main frame, the sublimation component includes a sublimation chamber, a connecting pipe is provided on one side of the sublimation chamber, the connecting pipe is connected to the main body of the chamber, an opening and closing door is provided on the side of the sublimation chamber away from the connecting pipe, the opening and closing door is provided on the frame guard plate, a heating device is also provided in the main frame, and the connecting pipe is located in the heating device.

[0010] Preferably, the energy-saving vacuum assembly includes a rotary vane pump body disposed within the main frame body. The rotary vane pump body is connected to the main chamber body. An exhaust pipe is disposed on the side of the main chamber body away from the connecting pipe. A flow control cylinder is disposed on one side of the exhaust pipe. The telescopic rod of the flow control cylinder is located inside the exhaust pipe, and a plug is disposed at the top of the telescopic rod. One side of the exhaust pipe is connected to a molecular pump body. A Roots pump body is disposed above the rotary vane pump body and is connected to the main chamber body.

[0011] Preferably, the locking assembly includes a fixed shell disposed on the main frame, a telescopic cylinder disposed inside the fixed shell, and a linkage pressure disposed on the telescopic rod of the telescopic cylinder.

[0012] Preferably, a fixing plate is provided on the main body of the chamber at the position corresponding to the sealing door, and a detection sensor is provided on the fixing plate.

[0013] Preferably, a battery pack is provided on one side of the top of the main frame body, and a pressure sensor and a temperature sensor are provided inside the main chamber body.

[0014] The beneficial effects of the invention after adopting the above structure are: 1. This invention solves the problem of unstable film formation caused by temperature and pressure fluctuations by using a constant temperature of 150℃ and a constant pressure of 1Pa steady-state coating process environment. The constant working conditions can ensure that the gaseous raw material particles of Piriton are adsorbed and polymerized on the surface of the circuit board at a uniform speed, effectively eliminating quality defects such as local thin films, missed plating, and pinholes. The density and uniformity of the film layer are greatly improved, and it can be stably adapted to extreme working conditions such as high humidity and strong corrosion in the deep sea, significantly extending the service life of the circuit board and the stability of equipment operation.

[0015] 2. This invention utilizes a three-stage pump body graded gradient vacuum structure, which starts and stops operations in stages based on the energy consumption differences of the rotary vane pump 8, Roots pump, and molecular pump. The corresponding pump body is activated only in the corresponding pressure range, eliminating the need for high-power equipment to operate continuously under no-load. Combined with the flow control cylinder and plug adaptive pressure regulation structure, a constant vacuum level in the cavity is maintained, significantly reducing the equipment's ineffective energy consumption output. Compared with the traditional full-load vacuum operation mode, this invention significantly reduces the overall power consumption of the equipment and effectively controls the mass production processing costs of enterprises.

[0016] 3. This invention utilizes a replaceable transparent observation component and a quick-release clamping frame structure, allowing for automatic switching of the clean observation window during the coating process. This prevents raw material particles from accumulating and obstructing the view, ensuring full visual monitoring. The contaminated transparent plate can be quickly disassembled online and cleaned offline without requiring the entire machine to be shut down for cleaning. This effectively avoids production interruptions caused by cleaning the observation window in traditional equipment. At the same time, the equipment is equipped with an emergency battery pack, which can effectively withstand sudden power outages, protect precision vacuum and temperature control components, and improve the stability of continuous operation. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a structural diagram illustrating the overall removal of the frame guard plate according to the present invention; Figure 3 This is a schematic diagram of the other side of the structure when the frame guard plate is completely removed according to the present invention; Figure 4 This is a schematic diagram of the deposition chamber assembly structure of the present invention; Figure 5 This is a schematic diagram of the other side of the deposition chamber assembly of the present invention; Figure 6 This is a schematic diagram of the rotating frame structure of the present invention; Figure 7 This is a schematic diagram of the locking assembly structure of the present invention; Figure 8 This is a schematic diagram of the sealing door structure of the present invention; Figure 9 This is a schematic diagram of the other side of the sealing door body of the present invention; Figure 10 This is a schematic diagram of the observation component structure of the present invention; Figure 11 This is a schematic diagram of the structure of the observation component of the present invention when the transparent plate is removed; Figure 12 This is a schematic diagram of the sublimation component structure of the present invention; Explanation of reference numerals in the attached figures: Main frame 1, frame guard plate 10, sedimentation chamber assembly 2, chamber body 20, sealed door 21, observation window 22, first reducer 23, rotating frame 24, mounting frame 25, handle 26, connecting handle 27, connector 28, support plate 29, cover plate 210, mounting frame one 211, mounting frame two 212, first motor 213, observation assembly 3, sealed shaft cylinder 30, rotating shaft 31, bearing seat 32, connecting block 33, semi-circular arc clamping frame one 34, T-shaped piece 35, L-shaped connecting plate 36, bonding plate 37, internal thread 38. Patterned cylinder, 39. Connecting bolt, 310. Tightening head, 311. Transparent plate, 312. Second reducer, 313. Second motor, 314. Coupling, 315. Semi-circular arc clamping frame, 416. Sublimation assembly, 40. Sublimation chamber, 41. Opening and closing door, 42. Connecting pipe, 43. Heating equipment, 5. Roots pump body, 6. Molecular pump body, 7. Locking assembly, 70. Telescopic cylinder, 71. Linkage pressure claw, 72. Fixed shell, 73. Fixed plate, 74. Detection sensor, 8. Rotary vane pump body, 9. Air outlet pipe, 90. Flow control cylinder, 100. Battery pack. Detailed Implementation

[0018] The technical solutions of the embodiments of the invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the invention, and not all embodiments. Based on the embodiments of the invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the invention.

[0019] like Figures 1-12As shown, the present invention proposes a vacuum-type rapid deposition chemical vapor deposition (CVD) equipment, which includes a main frame 1, an outer frame guard plate 10 covering the main frame 1, and an integrated deposition chamber assembly 2, a sublimation assembly 4, a locking assembly 7, an energy-saving vacuum pumping assembly, and a backup power supply battery pack 100 inside the main frame 1. The deposition chamber assembly 2 serves as the core cavity structure for circuit board coating, and its side is connected to the sublimation assembly 4 to transport the coating raw material gas. The upper and lower locking assemblies 7 are symmetrically mounted on the deposition chamber assembly 2 to press and lock the cavity sealing door 21. The energy-saving vacuum pumping assembly is mounted on the rear side of the deposition chamber assembly 2 to provide a graded vacuum environment for the coating operation. The deposition chamber assembly 2 includes a chamber body 20 fixedly assembled inside the main frame 1. A pair of connecting handles 27 are fixedly installed on one side of the chamber body 20. A sealing door 21 is hinged to the front of the chamber body 20. A connecting piece 28 is fixed to the side wall of the sealing door 21. The connecting piece 28 and the connecting handles 27 are movably hinged to realize the opening and closing of the sealing door 21. An observation window 22 is opened in the middle of the sealing door 21 to facilitate the observation of the internal coating process by the staff. A pull handle 26 is installed on the outside of the sealing door 21 to facilitate manual opening of the chamber. A first reducer 23 and a first motor 21 are fixedly installed on the back side of the chamber body 20. 3. The transmission end of the first motor 213 is connected to the input end of the first reducer 23. The output end of the first reducer 23 extends into the cavity body 20 and is fixed to the rotating frame 24. Multiple mounting frames 25 are arranged in a ring array inside the rotating frame 24 for layering the circuit boards to be coated. During operation, the circuit boards can be rotated at a uniform speed to ensure uniform coating. Pressure sensors and temperature sensors are installed inside the cavity body 20 to collect vacuum pressure and operating temperature data in real time. A fixing plate 73 is fixed at the port position of the cavity body 20. A detection sensor 74 is installed on the fixing plate 73 to detect the door closing signal. An observation component 3 is integrated on the sealed door body 21. The observation component 3 includes a sealing shaft cylinder 30 embedded inside the sealed door body 21. A rotating shaft 31 is rotatably mounted inside the sealing shaft cylinder 30. A mounting bracket 1 211 and a mounting bracket 212 are fixed on the front of the sealed door body 21. The end of the rotating shaft 31 is rotatably supported on the mounting bracket 1 211 through a bearing seat 32. A second motor 313 and a second reducer 312 are fixed on the mounting bracket 212. The second motor 313 drives the rotating shaft 31 to rotate through a coupling 314. Multiple sets of connecting blocks 33 are circumferentially fixed at one end of the rotating shaft 31 inside the cavity. Each set of connecting blocks 33 is equipped with a semi-circular arc clamping frame 1 34 and a semi-circular arc clamping frame 2 315 at its top. The transparent plate 311 can be detachably clamped and fixed between 15. One of the transparent plates 311 normally covers the inside of the observation window 22 to achieve sealed observation of the cavity. A T-shaped piece 35 is set on one side of the semi-circular arc clamping frame 34. The semi-circular arc clamping frame 315 is slidably assembled on the outside of the T-shaped piece 35 to achieve opening and closing alignment. The outer sides of the two sets of clamping frames are integrally formed with bonding plates 37. Both sets of bonding plates 37 are provided with internal threaded cylinders 38 on the outside. They are locked and fixed by the threaded bolts 39 to achieve quick disassembly and replacement of the transparent plate 311. The back of the sealed door 21 is symmetrically fixed with support plates 29. The support plates 29 are connected to the cover plate 210. Under normal conditions, the cover plate 210 forms a shielding and protection for the spare transparent plate 311 to prevent the idle transparent plate 311 from being contaminated with coating dust in advance. Sublimation component 4 includes a sublimation chamber 40 fixed inside the main frame 1. The sublimation chamber 40 is connected to the interior of the chamber body 20 through a connecting pipe 42. A heating device 43 is sleeved outside the connecting pipe 42 to provide constant temperature heating for the pipeline and the sublimation chamber 40, preventing the raw material gas from condensing and blocking. An opening and closing door 41 is installed on the outside of the sublimation chamber 40. The opening and closing door 41 is embedded in the frame guard plate 10 to facilitate the workers to put the phenelzine dimer raw material into the sublimation chamber 40. The energy-saving vacuum pumping assembly includes a rotary vane pump body 8, a Roots pump body 5, and a molecular pump body 6 connected in sequence to the main body 20 of the chamber. The three work together in stages to achieve gradient vacuuming. The rear side of the main body 20 of the chamber is connected to the exhaust pipe 9. The exhaust pipe 9 is equipped with a flow control cylinder 90. The end of the telescopic rod of the flow control cylinder 90 is fixed with a plug. The plug extends into the exhaust pipe 9. The exhaust flow rate is adjusted by changing the flow cross-sectional area of ​​the pipe. The chamber pressure is stabilized and controlled in conjunction with the pressure sensor. The locking assembly 7 includes a fixed housing 72 fixed on the main frame 1. A telescopic cylinder 70 is installed inside the fixed housing 72. A linkage pressure claw 71 is fixed at the end of the telescopic rod of the telescopic cylinder 70. After the sealing door 21 is closed, the telescopic cylinder 70 drives the linkage pressure claw 71 to press the end face of the door, thereby improving the overall sealing performance of the cavity. A battery pack 100 is installed at the top inside the main frame 1. It can provide emergency power supply when the equipment suddenly loses power, and protect the internal precision pump, sensor and electrical control components from damage.

[0020] When this equipment is in operation, firstly, the sealing door 21 is opened by pulling handle 26, and the circuit board to be coated is neatly placed on the mounting rack 25 inside the main chamber 20. Then, the sealing door 21 is closed and locked, and the linkage claw 71 of the locking component 7 is used to press and fix it to ensure the airtightness of the chamber. Then, the opening and closing door 41 of the sublimation component 4 is opened to put the Piriton dimer coating material into the sublimation material chamber 40. The opening and closing door 41 is closed to complete the material loading preparation. After the equipment starts, it enters a graded energy-saving vacuuming process. The energy-saving vacuuming component relies on three pumps—rotary vane pump 8, Roots pump 5, and molecular pump 6—to operate in stages, starting and stopping according to energy consumption gradients. First, the rotary vane pump 8, which has the highest energy consumption, is started to perform coarse vacuuming of the main chamber 20. When the pressure sensor detects that the internal pressure of the chamber has dropped to 1000Pa-1500Pa, the rotary vane pump 8 stops working. Then, the Roots pump 5, which has the middle energy consumption, is switched to continue vacuuming. When the chamber pressure drops to 20Pa, the Roots pump 5 stops. Finally, the molecular pump 6, which has the lowest energy consumption, is started to perform fine pressure stabilization vacuuming. At the same time, the pressure sensor provides real-time feedback of the chamber pressure data, and the flow control cylinder 90 extends and adjusts the depth of the plug inserted into the exhaust pipe 9 to precisely control the exhaust flow rate, keeping the internal pressure of the chamber stable at 1Pa, the standard working condition for coating. The graded start-stop pump operation effectively avoids long-term no-load operation of high-power equipment and significantly reduces the power consumption of the equipment. After vacuuming is completed, the heating device 43 starts working to heat the sublimation chamber 40 and the connecting pipe 42 at a constant temperature, so that the temperature inside the main body 20 and the sublimation chamber 40 is kept stable at 150°C. The temperature sensor monitors the temperature of the chamber in real time. When the temperature reaches the set threshold, the heating device 43 automatically stops working and enters the heat preservation state. When the temperature of the chamber naturally drops, it automatically restarts and stops to avoid continuous heating and energy waste, thus achieving constant temperature and energy-saving operation. Under high temperature conditions, the pyrene dimer raw material inside the sublimation chamber 40 is sublimated into gaseous raw material particles by heat. Under the negative pressure of the chamber, the raw material particles are uniformly transported into the main body 20 of the chamber through the connecting pipe 42. At the same time, the first motor 213 drives the rotating frame 24 to rotate at a constant speed through the first reducer 23, which drives the circuit board on the mounting frame 25 to rotate slowly. The gaseous raw material particles are uniformly adsorbed and polymerized on the surface of the circuit board, and continuously deposited to form a dense and uniform protective film. The stable working conditions of constant temperature and pressure can greatly improve the deposition efficiency, and a protective film with a thickness of 5-10μm can be deposited per hour, effectively shortening the processing time. During the continuous coating process, raw material particles floating in the chamber will continuously adhere to the surface of the transparent plate 311 in front of the observation window 22. Long-term accumulation will obstruct the observation view. When the contamination level of the transparent plate 311 exceeds the standard, the equipment controller will automatically trigger the second motor 313 to start. The second motor 313 drives the rotating shaft 31 to rotate through the second reducer 312, which drives multiple sets of clamping frames and the transparent plate 311 to rotate as a whole. The clean transparent plate 311 protected by the rear shield 210 is rotated and switched to the front of the observation window 22, and the contaminated transparent plate 311 is rotated to an idle position to ensure that the observation field of view is always clear and transparent. When a single batch of coating operations is completed and the equipment is depressurized and materials are removed, the operator can manually unscrew the connecting bolt 39, open the semi-circular arc clamping frame 1 34 and the semi-circular arc clamping frame 2 315, quickly remove the dust-contaminated transparent plate 311, replace it with a brand new transparent plate 311 and put it into the next round of operations. At the same time, the disassembled contaminated transparent plate 311 can be cleaned offline during the intervals of continuous production of the equipment, without stopping the machine to wait for the window to be cleaned, effectively ensuring the working efficiency of continuous coating operations of the equipment.

[0021] It should be understood that the specific embodiments described above are merely illustrative or explanatory of the principles of the invention and do not constitute a limitation thereof. Therefore, any modifications, equivalent substitutions, improvements, etc., made without departing from the spirit and scope of the invention should be included within the scope of protection of the invention. Furthermore, the appended claims are intended to cover all variations and modifications falling within the scope and boundaries of the appended claims, or equivalent forms of such scope and boundaries.

Claims

1. A vacuum-type rapid deposition chemical vapor deposition apparatus for coating, comprising a main frame (1), characterized in that: The main frame (1) is provided with a sedimentation chamber assembly (2). One side of the sedimentation chamber assembly (2) is connected to the sublimation assembly (4). Locking assemblies (7) are symmetrically arranged on the upper and lower sides of the sedimentation chamber assembly (2). An energy-saving vacuum assembly is located on the side of the sedimentation chamber assembly (2) away from the sublimation assembly (4).

2. The vacuum-type rapid deposition chemical vapor deposition equipment for coating as described in claim 1, characterized in that: The deposition chamber assembly (2) includes a chamber body (20) disposed within the main frame (1). A pair of connecting handles (27) are provided on one side of the chamber body (20). A sealing door (21) is provided on the front of the chamber body (20). A connector (28) is provided on one side of the sealing door (21) corresponding to the position of the connecting handles (27). The connector (28) is movably connected to the connecting handles (27). An observation window (22) is provided on the sealing door (21). A handle (26) is provided on one side of the chamber body (20). A first reducer (23) is provided on the back of the chamber body (20). The transmission end of the first reducer (23) is located inside the chamber body (20). A rotating frame (24) is provided on the transmission end of the first reducer (23). Several mounting frames (25) are provided inside the rotating frame (24). A first motor (213) is provided on the first reducer (23). The transmission end of the first motor (213) is connected to the input end of the first reducer (23).

3. The vacuum-type rapid deposition chemical vapor deposition equipment for coating as described in claim 2, characterized in that: An observation assembly (3) is provided on the sealed door body (21). The observation assembly (3) includes a sealing cylinder (30) embedded in the wall of the sealed door body (21). A rotating shaft (31) is movably arranged inside the sealing cylinder (30). A mounting bracket one (211) is provided on the front of the sealed door body (21). A mounting bracket two (212) is provided on the mounting bracket one (211). One end of the rotating shaft (31) is movably mounted on the mounting bracket one (211) through a bearing seat (32). The pivot (31) is located at one end of the back of the sealed door (21) and is provided with several connecting blocks (33). Each connecting block (33) is provided with a semi-circular arc clamping frame one (34) at its top, and each semi-circular arc clamping frame one (34) is provided with a semi-circular arc clamping frame two (315). A detachable transparent plate (311) is provided between the corresponding semi-circular arc clamping frame one (34) and semi-circular arc clamping frame two (315). One of the transparent plates (311) blocks the front of the observation window (22). A T-shaped piece (35) is provided on one side of the arc clamping frame one (34). An L-shaped connecting plate (36) is provided on the semi-circular arc clamping frame two (315) corresponding to the position of the T-shaped piece (35). The L-shaped connecting plate (36) is movably mounted on the T-shaped piece (35). A fitting plate (37) is provided on the side of both the semi-circular arc clamping frame one (34) and the semi-circular arc clamping frame two (315) away from the T-shaped piece (35). An internally threaded cylinder (38) is provided on both fitting plates (37). 8) The internal thread is provided with a connecting bolt (39), and the top of the connecting bolt (39) is provided with a screw head (310). The second mounting bracket (212) is provided with a second reducer (312). The transmission end of the second reducer (312) is connected to one end of the rotating shaft (31) through a coupling (314). The second reducer (312) is provided with a second motor (313), and the transmission end of the second motor (313) is connected to the input end of the second reducer (312).

4. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 3, characterized in that: The back of the sealed door (21) is symmetrically provided with support plates (29), and each support plate (29) is connected with a cover plate (210), which is positioned in front of the transparent plate (311).

5. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 2, characterized in that: The main frame (1) is provided with a frame guard plate (10) on the outside. The sublimation component (4) includes a sublimation chamber (40). A connecting pipe (42) is provided on one side of the sublimation chamber (40). The connecting pipe (42) is connected to the main body of the chamber (20). An opening and closing door (41) is provided on the side of the sublimation chamber (40) away from the connecting pipe (42). The opening and closing door (41) is provided on the frame guard plate (10). A heating device (43) is also provided inside the main frame (1). The connecting pipe (42) is provided inside the heating device (43).

6. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 5, characterized in that: The energy-saving vacuum assembly includes a rotary vane pump (8) installed in the main frame (1), the rotary vane pump (8) being connected to the chamber body (20), an outlet pipe (9) being provided on the side of the chamber body (20) away from the connecting pipe (42), a flow control cylinder (90) being provided on one side of the outlet pipe (9), the telescopic rod of the flow control cylinder (90) being located inside the outlet pipe (9), and a plug being provided at the top of the telescopic rod, one side of the outlet pipe (9) being connected to a molecular pump (6), and a Roots pump (5) being provided above the rotary vane pump (8), the Roots pump (5) being connected to the chamber body (20).

7. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 2, characterized in that: The locking assembly (7) includes a fixed shell (72) disposed on the main frame (1), a telescopic cylinder (70) disposed inside the fixed shell (72), and a linkage pressure claw (71) disposed on the telescopic rod of the telescopic cylinder (70).

8. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 7, characterized in that: A fixing plate (73) is provided on the main body of the chamber (20) at the position corresponding to the sealing door (21), and a detection sensor (74) is provided on the fixing plate (73).

9. The vacuum-type rapid deposition chemical vapor deposition apparatus for coating as described in claim 2, characterized in that: A battery pack (100) is provided on one side of the top of the main frame (1), and a pressure sensor and a temperature sensor are provided inside the main body of the chamber (20).

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