A self-cleaning plunger proportional pump and liquid preparation device

Abstract

The application provides a self-cleaning plunger proportional pump and a liquid preparation device. The proportional pump comprises a cavity assembly, a plunger rod assembly and a driving part. The cavity assembly is provided with a cleaning liquid cavity, a cleaning cavity and a pure water cavity. The cleaning cavity is arranged at an axial end of the cleaning liquid cavity. The cleaning cavity is provided with a cleaning inlet and a cleaning outlet. The cleaning liquid cavity is provided with a liquid inlet connector and a liquid outlet connector. The pure water cavity is provided with a water inlet connector and a water outlet connector. The water outlet connector is communicated with the cleaning inlet through a first pipeline. The cleaning outlet is communicated with a liquid preparation pipeline through a second pipeline. The liquid outlet connector is communicated with the liquid preparation pipeline. The plunger rod assembly comprises a push plate, a first plunger rod and a second plunger rod. The first plunger rod and the second plunger rod are respectively connected with the push plate at one end. The other end of the first plunger rod is inserted into the cleaning liquid cavity through the cleaning cavity. The other end of the second plunger rod is inserted into the pure water cavity. The driving part drives the push plate, the first plunger rod and the second plunger rod to move in a first direction. The application realizes flushing by using the power of the pump and has high proportioning accuracy.

Description

Technical Field

[0001] This invention relates to the field of proportioning pump technology, specifically to a self-cleaning plunger-type proportioning pump and a liquid dispensing device. Background Technology

[0002] In the IVD (in vitro diagnostics) industry, high-throughput analyzers (such as fully automated biochemical analyzers and immunoassay analyzers) consume a large amount of cleaning fluid, requiring continuous replenishment to maintain normal equipment operation and ensure the accuracy of test results. Currently, cleaning fluid preparation methods mainly include manual preparation and proportional pump automatic preparation. Manual preparation is inefficient and prone to large proportioning errors, making it difficult to meet the requirements of continuous and stable operation of high-throughput equipment. In contrast, proportional pump automatic preparation, with its advantages of ultra-high metrological accuracy and stability, high-efficiency and rapid response capabilities, automation, and remote control, has become the core solution to the above problems.

[0003] A plunger proportioning pump is a special positive displacement pump that can precisely control the output flow rate or pressure. Its core structure includes an integrated plunger chamber and an independent plunger, which are matched with each other in terms of dimensional accuracy to meet the mixing ratio requirements of cleaning fluid and purified water.

[0004] CN118976428A discloses a fluid preparation device that uses the bidirectional movement of a suction drive to simultaneously perform fluid delivery actions in a first and second chamber, ensuring the stability and proportion of the liquid volume. Continuous liquid supply is achieved through the joint distribution of multiple chambers. CN119056331A discloses a fluid preparation system that uses the movement of a drive motor to simultaneously perform fluid delivery actions in multiple fluid chambers. By utilizing the internal volume information of each fluid chamber, different combinations can be achieved to reach different proportions, ensuring the mixing of liquids with varying ratios.

[0005] However, the above two preparation devices have the following drawbacks in practical applications: 1. Plunger Crystallization and Equipment Damage: Cleaning fluid concentration ≥30%, containing surfactants and chelating agents, easily forms crystals on the plunger surface. During the plunger's reciprocating motion, these crystals may detach and enter the guide rails or motor, causing equipment jamming or even shutdown. Furthermore, crystallization accelerates the wear of seals between the plunger and the cavity, and the process of cleaning away crystals can easily cause secondary contamination of the cleaning fluid.

[0006] Existing technologies typically address this issue by adding extra cleaning pipelines and cleaning power sources. The existing pipeline designs are complex, which not only increases system complexity but also increases equipment size and space occupation, hindering the compact layout of high-throughput IVD equipment.

[0007] 2. Inadequate Proportioning Accuracy: On the one hand, leakage means that the liquid delivered by the pump has not completely entered the target pipeline, leading to deviations in the mixing ratio. Long-term leakage can also cause crystallization, further resulting in abnormal flow and pressure fluctuations, and even scratching components, leading to increasingly larger leakage channels and making the solution mixing results uncontrollable. On the other hand, existing plunger-type proportioning pumps use a central inlet and outlet design, meaning the inlet and outlet extend axially from the center of one end of the cavity and connect to the interior. When the plunger-type proportioning pump is installed horizontally or at an angle, the end wall of the cavity will block air bubbles from escaping from the inlet and outlet, preventing complete air bubble removal from the cavity. This causes pulsation in the cleaning fluid delivery, amplifies the proportioning error, affects the proportioning accuracy, and ultimately adversely affects the test results. Summary of the Invention

[0008] The first objective of this invention is to provide a self-cleaning plunger-type proportional pump that utilizes its own power to achieve flushing and has high proportioning accuracy.

[0009] A second objective of the present invention is to provide a liquid dispensing device comprising the aforementioned self-cleaning plunger proportioning pump.

[0010] To achieve the aforementioned first objective, the present invention provides a self-cleaning plunger-type proportional pump, comprising a cavity assembly, a plunger rod assembly, and a drive component. The cavity assembly is provided with a cleaning fluid chamber, a cleaning chamber, and a pure water chamber. The cleaning chamber is located at one axial end of the cleaning fluid chamber and is connected to a cleaning inlet and a cleaning outlet. The cleaning fluid chamber is connected to an inlet connector and an outlet connector, and the outlet connector is used to communicate with a dispensing pipeline. The pure water chamber is connected to a water inlet connector and a water outlet connector. At least one water outlet connector is connected to the cleaning inlet through a first pipeline, and the cleaning outlet is connected to the dispensing pipeline through a second pipeline. The plunger rod assembly includes a push plate, a first plunger rod, and a second plunger rod. The first ends of the first and second plunger rods are each connected to the push plate. The second end of the first plunger rod passes through the cleaning chamber and is inserted into the cleaning fluid chamber, and the second end of the second plunger rod is inserted into the pure water chamber. The drive component is connected to the push plate to drive the push plate, the first plunger rod, and the second plunger rod to move along a first direction, which is parallel to the axial direction of the cleaning fluid chamber.

[0011] As can be seen from the above scheme, by setting up a cleaning chamber, the water outlet is connected to the cleaning inlet via a first pipe, and the cleaning outlet is connected to the liquid distribution pipe via a second pipe. When the second plunger performs reciprocating linear motion, it forces the pure water in the pure water chamber to enter the cleaning chamber, which can clean the surface of the first plunger rod in real time and flush away residual cleaning fluid in time, blocking the formation of crystals from the source and preventing crystals from falling off and damaging the equipment, thereby ensuring the continuous liquid supply of high-flow equipment. At the same time, the liquid used to clean the surface of the first plunger rod in the cleaning chamber then flows into the liquid distribution pipe. In this way, the pure water in the pure water chamber is used for both cleaning and liquid distribution. It eliminates the need for an additional cleaning power source and independent cleaning pipeline, and ensures the accurate ratio of pure water to cleaning fluid, which helps to simplify the equipment structure and reduce space occupation.

[0012] A further option is to provide spiral grooves on the walls of the cleaning chamber, with the spiral grooves extending spirally along the axial direction of the cleaning chamber, and the cleaning inlet and cleaning outlet respectively located on both sides of the radial direction of the cleaning chamber.

[0013] As can be seen from the above scheme, by setting the spiral groove, pure water can be guided to form a spiral turbulence, thereby directionally enhancing the scouring force on the first plunger rod and effectively reducing the cleaning fluid residue and crystallization on its surface; by setting the cleaning inlet and cleaning outlet on the radial sides of the cleaning chamber respectively, pure water enters from one side of the cleaning chamber and exits from the other side, which helps to ensure the cleaning effect.

[0014] A further solution is to provide a first sealing structure between the cleaning chamber and the cleaning fluid chamber, and a second sealing structure at the end of the cleaning chamber facing away from the cleaning fluid chamber.

[0015] As can be seen from the above scheme, by setting the first sealing structure, the cleaning liquid and purified water can be effectively isolated to prevent the cleaning liquid from leaking; by setting the second sealing structure, the purified water and outside air can be effectively isolated to prevent the purified water from leaking. A further option is that both the first and second sealing structures are double sealing structures.

[0016] As can be seen from the above scheme, by adopting a double sealing structure, not only can the mixing accuracy be guaranteed, but the probability of crystal precipitation on the surface of the first plunger rod is also greatly reduced.

[0017] A further embodiment includes a cavity assembly comprising a mounting base, a cleaning seat, and a pressure plate. A cleaning fluid chamber is disposed within the mounting base, which has a first mounting groove and an annular flange. The annular flange protrudes from the bottom of the first mounting groove, and the pressure plate secures the cleaning seat within the first mounting groove. The cleaning seat also includes a protrusion, a first annular step, and a second annular step. The cleaning chamber is disposed inside the protrusion, and the first and second annular steps are respectively disposed on opposite sides of the protrusion in a first direction. A first sealing structure and a second sealing structure are respectively disposed on the first and second annular steps. The annular flange is inserted into the cleaning seat and abuts or abuts against the first sealing structure. As can be seen from the above scheme, by setting an annular flange inserted into the cleaning seat and adjacent to or abutting the first sealing structure, it is beneficial to ensure the seal between the first sealing structure, the first plunger rod, and the cleaning seat, and further effectively isolate the cleaning fluid chamber and the cleaning chamber.

[0018] A further embodiment is that the cleaning seat is also provided with a second mounting groove, which is located on one end of the first annular step near the mounting seat; a third sealing structure is provided between the annular flange and the second mounting groove.

[0019] As can be seen from the above scheme, by setting a third sealing structure, an effective seal between the mounting base and the cleaning base is ensured.

[0020] A further embodiment is that the cleaning fluid chamber is provided with a first inlet and outlet, the first end of the first inlet and outlet is connected to the inlet connector and the outlet connector respectively, the second end of the first inlet and outlet is located between the side wall and the top wall of the cleaning fluid chamber, and the extension direction of the first inlet and outlet intersects the axis of the cleaning fluid chamber to form a first preset angle, the first preset angle being greater than or equal to 90° and less than 180°.

[0021] As can be seen from the above scheme, the above settings ensure that there is no structure in the cleaning fluid chamber that obstructs the discharge of air bubbles. Regardless of whether the installation is horizontal or inclined, the air bubbles can be automatically and completely discharged from the first inlet and outlet, thereby avoiding mixing errors and improving mixing accuracy.

[0022] A further embodiment is that a second inlet and outlet are connected to the pure water chamber. The first end of the second inlet and outlet is connected to the inlet connector and the outlet connector, respectively. The second end of the second inlet and outlet is located between the side wall and the top wall of the pure water chamber. The extension direction of the second inlet and outlet intersects the axis of the pure water chamber to form a second preset angle. The second preset angle is greater than or equal to 90° and less than 180°.

[0023] As can be seen from the above scheme, the above settings ensure that there is no structure in the pure water chamber that obstructs the discharge of air bubbles. Regardless of whether it is installed horizontally or at an angle, the air bubbles can be automatically discharged from the second inlet and outlet, thereby avoiding pure water ratio errors and improving the ratio accuracy.

[0024] A further option is to install the self-cleaning plunger-type proportional pump horizontally or at an angle, with the first inlet / outlet and / or the second inlet / outlet both facing upwards.

[0025] As can be seen from the above scheme, the above settings can, on the one hand, facilitate the automatic discharge of bubbles, keep the residual amount of bubbles below 0.1 mL, and keep the ratio error stably controlled within ±0.2%; on the other hand, it can prevent the precipitated crystals from falling onto the drive components or guide rails, thereby preventing damage to both.

[0026] A further embodiment is that the self-cleaning plunger proportional pump also includes a first fixed plate, a second fixed plate, a connecting plate, a sliding seat, and a guide rail. The first fixed plate and the connecting plate are arranged opposite each other along a second direction, which is perpendicular to the first direction. The second fixed plate and the push plate are both arranged between the first fixed plate and the connecting plate. The guide rail is arranged on the first fixed plate. The sliding seat is slidably connected to the guide rail and connected to the push plate. The driving component is arranged on the second fixed plate, and the driving end of the driving component is connected to the sliding seat.

[0027] As can be seen from the above scheme, with the above arrangement, the guide rail and the guide channel are set on the two sides respectively. Regardless of whether it is installed horizontally or at an incline, even if liquid leakage occurs, the leaked liquid or crystals will only fall on the connecting plate and will not contact the guide rail. A further option is to provide a flow guide groove on the side of the connecting plate facing the first fixed plate, with the flow guide groove positioned between the cavity assembly and the driving component.

[0028] As can be seen from the above scheme, by setting up a flow guide channel, the leaked liquid or crystals can be effectively intercepted, preventing them from falling into the drive component, thereby avoiding crystal precipitation that affects the normal operation of the drive component and the guide rail, and ensuring that the liquid preparation process is smooth and without jamming.

[0029] A further proposed solution is to have two or more second plunger rods and two or more pure water chambers, with each pure water chamber corresponding to one of the second plunger rods; at least one pure water chamber can supply water to the clean chamber, while the remaining pure water chambers supply water to the liquid distribution pipeline.

[0030] As can be seen from the above scheme, by setting it up, the cleaning solution and purified water can be accurately mixed in a preset ratio, while ensuring the mixing speed and effectively reducing the volume of the plunger proportioning pump.

[0031] To achieve the second objective mentioned above, the present invention provides a liquid preparation device, including the aforementioned self-cleaning plunger proportioning pump.

[0032] As can be seen from the above scheme, automated liquid preparation can be achieved through the above settings, along with the setting of specific sensing and control elements. Attached Figure Description

[0033] Figure 1This is a structural diagram from a first-view perspective of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0034] Figure 2 This is a structural diagram from a second perspective of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0035] Figure 3 This is an exploded view from a second perspective of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0036] Figure 4 This is a structural diagram from a third perspective of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0037] Figure 5 This is a cross-sectional view of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0038] Figure 6 yes Figure 5 Enlarged view of point A in the middle.

[0039] Figure 7 This is a front view of an embodiment of the self-cleaning plunger-type proportional pump of the present invention.

[0040] Figure 8 yes Figure 7 Sectional view at point BB.

[0041] Figure 9 yes Figure 8 Enlarged view of point C in the middle.

[0042] Figure 10 This is an exploded view of the cleaning seat, the first sealing structure, and the second sealing structure in an embodiment of the self-cleaning plunger proportional pump of the present invention.

[0043] Explanation of reference numerals in the attached figures: 1-Cavity assembly, 11-Mounting base, 111-Cleaning fluid chamber, 1111-Inlet connector, 1112-Outlet connector, 1113-First inlet / outlet, 112-Cleaning chamber, 1121-Cleaning inlet, 1122-Cleaning outlet, 1123-Spiral groove, 113a-Pure water chamber one, 113b-Pure water chamber two, 1131-Water inlet connector, 11311-Second inlet / outlet, 1132-Water outlet connector, 114-First sealing structure, 115-Second sealing structure, 116-Sealing kit, 117-Sealing ring, 118-Annular flange, 119-First mounting groove, 12-First pipe, 13-Second pipe, 14-Cleaning base, 141-Protrusion, 142-First annular step, 143-Second annular step, 144-Second mounting groove, 15-Third sealing structure, 16-Pressure plate; 2-Plunger rod assembly, 21-Push plate, 22-First plunger rod, 23-Second plunger rod; 3-Drive components; 4-First fixing plate, 41-Detector; 5-Second fixing plate; 6-Connecting plate, 61-Guide channel; 7-Sliding seat, 71-Detection piece; 8-Guide rail.

[0044] The present invention will be further described below with reference to the accompanying drawings and embodiments. Detailed Implementation

[0045] Example of a self-cleaning plunger proportioning pump: See Figures 1 to 8 This embodiment provides a self-cleaning plunger proportional pump, comprising: a cavity assembly 1, a plunger rod assembly 2, a drive component 3, a first fixing plate 4, a second fixing plate 5, a connecting plate 6, a sliding seat 7, and two guide rails 8.

[0046] The first fixed plate 4 and the connecting plate 6 are arranged opposite each other along the second direction. The cavity assembly 1, the plunger rod assembly 2, the second fixed plate 5, the sliding seat 7, and the guide rail 8 are all connected between the first fixed plate 4 and the connecting plate 6. The driving component 3 is disposed on the second fixed plate 5, and the two guide rails 8 are arranged parallel to each other on the first fixed plate 4. The sliding seat 7 is slidably connected to the guide rails 8 and is connected to both the plunger rod assembly 2 and the driving component 3. The driving component 3 drives the plunger rod assembly 2 to reciprocate linearly along the first direction through the sliding seat 7, thereby realizing liquid aspiration and liquid injection operations. The first direction is perpendicular to the second direction.

[0047] Two detectors 41 are provided on the first fixed plate 4, and the two detectors 41 are arranged along a first direction and spaced at a preset distance. A detection plate 71 is provided on the sliding seat 7, and the detection plate 71 is correspondingly arranged with the two detectors 41 to detect the working state of the plunger proportional pump, including liquid injection and liquid aspiration states. In this embodiment, the detector 41 is preferably a photoelectric sensor.

[0048] The cavity assembly 1 includes a mounting base 11, a first pipe 12, and a second pipe 13. The mounting base 11 contains a cleaning fluid chamber 111, a cleaning chamber 112, and a pure water chamber. The cleaning chamber 112 is located at one axial end of the cleaning fluid chamber 111. Both the cleaning chamber 112 and the cleaning fluid chamber 111 are fitted onto the outside of the first plunger rod 22. The cleaning chamber 112 is used to clean the first plunger rod 22 and its mating surfaces with the sealing structure. The cleaning chamber 112 is connected to a cleaning inlet 1121 and a cleaning outlet 1122. The cleaning fluid chamber 111 is connected to an inlet connector 1111 and an outlet connector 1112. The pure water chamber is located on one side of the cleaning fluid chamber 111 and is connected to an inlet connector 1131 and an outlet connector 1132.

[0049] The water outlet connector 1132 is connected to the cleaning inlet 1121 via the first pipe 12, and is used to supply pure water from the pure water chamber into the cleaning chamber 112 to clean the first plunger rod 22 and its mating surface with the sealing structure in real time. The cleaning outlet 1122 is connected to the liquid mixing pipe via the second pipe 13, and is used to supply the cleaned pure water into the liquid mixing pipe, so that the pure water participates in both cleaning and liquid mixing. The liquid outlet connector 1112 is connected to the liquid mixing pipe, so that a certain amount of cleaning solution and a certain amount of pure water are mixed in the required ratio to meet the liquid mixing requirements.

[0050] The plunger rod assembly 2 includes a push plate 21, a first plunger rod 22, and a second plunger rod 23. The push plate 21 is connected to the sliding seat 7. The first ends of the first plunger rod 22 and the second plunger rod 23 are connected to the push plate 21. The second end of the first plunger rod 22 passes through the cleaning chamber 112 and is then inserted into the cleaning fluid chamber 111. The second end of the second plunger rod 23 is inserted into the pure water chamber. Both the first plunger rod 22 and the second plunger rod 23 are provided with plunger heads (not shown in the figure) for drawing in or pushing out liquid. The plunger heads are sealed and slidably engaged with the walls of the corresponding chambers.

[0051] The driving component 3 drives the push plate 21, the first plunger rod 22, and the second plunger rod 23 to reciprocate linearly in the first direction simultaneously via the sliding seat 7. The driving component 3 is a device or mechanism capable of outputting linear motion power; in this embodiment, it is preferably a linear motor.

[0052] See Figure 5 , Figure 6 and Figure 10 A first sealing structure 114 is provided between the cleaning chamber 112 and the cleaning fluid chamber 111 to isolate the cleaning fluid chamber 111 from the cleaning chamber 112 and prevent leakage of cleaning fluid from the cleaning fluid chamber 111. A second sealing structure 115 is provided at the end of the cleaning chamber 112 facing away from the cleaning fluid chamber 111 to isolate the cleaning chamber 112 from the outside air and prevent leakage of pure water from the cleaning chamber 112. The provision of the first sealing structure 114 and the second sealing structure 115 ensures the sealing performance of the first plunger rod 22 during its movement. On the other hand, the pure water in the cleaning chamber 112 can buffer and equalize the pressure fluctuations during the injection process, making the pressure difference on both sides of the first sealing structure 114 more stable and the pressure sealing more uniform, which is beneficial to improving the sealing reliability and service life.

[0053] The cavity assembly 1 also includes a cleaning seat 14 and a pressure plate 16. The mounting seat 11 has a first mounting groove 119 and an annular flange 118 at one end of the cleaning fluid cavity 111. The annular flange 118 protrudes from the bottom of the first mounting groove 119. The cleaning seat 14 is disposed in the first mounting groove 119, and the pressure plate 16 is disposed at the opening of the first mounting groove 119 to fix the cleaning seat 14 in the first mounting groove 119.

[0054] The cleaning seat 14 is provided with a protrusion 141, a first annular step 142, a second annular step 143, and a second mounting groove 144. The protrusion 141 protrudes towards the center of the cleaning seat 14, and a cleaning cavity 112 is formed between the protrusion 141 and the first plunger rod 22. The first annular step 142 and the second annular step 143 are respectively provided on both sides of the protrusion 141 in a first direction. The second mounting groove 144 is provided on the end of the first annular step 142 near the mounting seat 11.

[0055] The first sealing structure 114 and the second sealing structure 115 are respectively disposed on the first annular step 142 and the second annular step 143. The annular flange 118 is inserted into the cleaning seat 14 and is adjacent to or abuts the first sealing structure 114, which is beneficial to improving the sealing performance between the first plunger rod 22 and the cleaning fluid chamber 111 and the cleaning chamber 112.

[0056] Both the first sealing structure 114 and the second sealing structure 115 are designed as double sealing structures, each including a sealing kit 116 and a sealing ring 117. The sealing kit 116 is fitted onto the outside of the first plunger rod 22, with its inner wall tightly fitted against the peripheral wall of the first plunger rod 22. The sealing ring 117 is fitted onto the outside of the sealing kit 116, with its sealing ring tightly fitted against both the sealing kit 116 and either the first annular step 142 or the second annular step 143.

[0057] A third sealing structure 15 is provided between the annular flange 118 and the second mounting groove 144, and the third sealing structure 15 is preferably a sealing ring. The annular flange 118 abuts against the inward side of the third sealing structure 15, and a sealing fit is achieved between the third sealing structure 15 and the cleaning seat 14.

[0058] A spiral groove 1123 is provided on the wall of the cleaning chamber 112. The spiral groove 1123 is located between the first sealing structure 114 and the second sealing structure 115, preferably inside the protrusion 141, and extends spirally along the axial direction of the cleaning chamber 112. The cleaning inlet 1121 and the cleaning outlet 1122 are respectively located on both radial sides of the cleaning chamber 112, so that pure water enters from one side of the cleaning chamber 112, flows along the spiral groove 1123 and rinses the first plunger rod 22, and then exits from the other side of the cleaning chamber 112. This helps to enhance the flushing force on the first plunger rod 22, reduce the cleaning fluid residue on the first plunger rod 22, and ensure the cleaning effect.

[0059] See Figure 1 and Figure 5The cleaning fluid chamber 111 is connected to a first inlet / outlet 1113. The first end of the first inlet / outlet 1113 is connected to an inlet connector 1111 and an outlet connector 1112, respectively. Both the inlet connector 1111 and the outlet connector 1112 can be controlled by valves to switch between inlet and outlet. The second end of the first inlet / outlet 1113 is located between the side wall and the top wall of the cleaning fluid chamber 111. The first inlet / outlet 1113 extends upward from one corner of the cleaning fluid chamber 111, and its extension direction intersects the axis of the cleaning fluid chamber 111 at a first preset angle. This first preset angle is the angle formed by rotating clockwise from the axis of the cleaning fluid chamber 111 to the axis of the first inlet / outlet 1113. The first inlet / outlet 113 and the second inlet / outlet 1113 are both oriented towards the same side of the mounting base 11. The first preset angle can be set with reference to the second preset angle θ. Figure 9 As shown. The first preset angle is greater than or equal to 90° and less than 180°, so that when the plunger proportional pump is tilted or placed horizontally, the air bubbles in the cleaning fluid chamber 111 can move upward from one corner of the cleaning fluid chamber 111 and be discharged from the first inlet / outlet 1113. Preferably, in this embodiment, the plunger proportional pump is placed horizontally, and the first preset angle is 90°. In this embodiment, one corner refers to the corner position of the cleaning fluid chamber 111, that is, the intersection of the peripheral wall and the top wall of the cleaning fluid chamber 111.

[0060] See Figure 8 and Figure 9 and combined Figure 1 The pure water chamber is connected to a second inlet / outlet 11311. The first end of the second inlet / outlet 11311 is connected to both an inlet connector 1131 and an outlet connector 1132. Both the inlet connector 1131 and the outlet connector 1132 can be controlled by valves to switch between water inlet and outlet. The second end of the second inlet / outlet 11311 is located between the side wall and the top wall of the pure water chamber. Similarly, the second inlet / outlet 11311 extends upwards from one corner of the pure water chamber, and its extension direction intersects the axis of the pure water chamber at a second preset angle θ. This second preset angle θ is the angle formed by rotating clockwise from the axis of the pure water chamber to the axis of the second inlet / outlet 11311. The second preset angle θ is greater than or equal to 90° and less than 180°, so that when the plunger proportional pump is tilted or placed horizontally, air bubbles in the pure water chamber can move upward from one corner of the pure water chamber and be discharged from the second inlet / outlet 11311. Preferably, in this embodiment, the plunger proportional pump is placed horizontally, at which time the second preset angle is 90°. The water outlet connector 1132 is located at the end opposite to the second inlet / outlet 11311.

[0061] Combination Figure 3 , Figure 4 and Figure 5The self-cleaning plunger-type proportional pump can be installed horizontally or at an angle, preferably between 45° and 90°. Regardless of whether it is installed horizontally or at an angle, the first inlet / outlet 1113 of the cleaning chamber 111 and the second inlet / outlet 11311 of the pure water chamber are located at one end higher than the rest of the chamber. The first inlet / outlet 1113 and the second inlet / outlet 11311 are both arranged upwards, so that air bubbles can reach the first inlet / outlet 1113 and the second inlet / outlet 11311 under the action of buoyancy, which facilitates the discharge of air bubbles and avoids air bubble retention.

[0062] The self-cleaning plunger-type proportional pump is also equipped with at least two bubble sensors (not shown in the figure), which are used to detect air bubbles in the cleaning liquid chamber 111 and / or the pure water chamber. Specifically, the bubble sensors are located at the respective outlet ends of the cleaning liquid chamber 111 and the pure water chamber. When the bubble sensors detect air bubbles, the liquid pumped by the proportional pump is discharged as waste liquid, further ensuring the accuracy of the liquid dispensing. In this embodiment, the liquid in the cleaning liquid chamber and the cleaning chamber first enters the transfer tank through the dispensing pipeline, and the transfer tank discharges the liquid as waste liquid. Other embodiments may also include adding three-way valves to the outlet connector of the cleaning liquid chamber and the outlet connector of the pure water chamber to control the immediate rejection of liquid when air bubbles are detected.

[0063] By installing horizontally or at an angle, under the influence of gravity, even if there is leakage, the leaking liquid will only flow along the surface of the connecting plate 6 after dripping onto the connecting plate 6, and will not fall onto the guide rail 8, thus avoiding affecting the normal movement of the sliding seat 7.

[0064] A flow guide groove 61 is provided on the side of the connecting plate 6 facing the first fixed plate 4. In this embodiment, the flow guide groove 61 is disposed between the cavity assembly and the driving member 3. The flow guide groove 61 extends along the width direction of the connecting plate 6 to block the flow path of the leaking liquid on the connecting plate 6 and prevent the leaking liquid or its crystals from falling onto the driving member 3.

[0065] See Figure 5 The number of second plunger rods 23 is set to two or more, the number of pure water chambers is set to two or more, and the pure water chambers are set to correspond one-to-one with the second plunger rods 23.

[0066] This embodiment uses four second plunger rods 23 and four pure water chambers as an example. The four pure water chambers are respectively located on both sides of the cleaning fluid chamber 111. For ease of explanation, the two pure water chambers on the left side of the cleaning fluid chamber 111 are designated as Pure Water Chamber 113a, and the two pure water chambers on the right side of the cleaning fluid chamber 111 are designated as Pure Water Chamber 213b. Both Pure Water Chamber 213b are connected to the liquid distribution pipeline via a third pipe. Both Pure Water Chamber 113a supply water to the cleaning chamber 112 via the first pipe 12, and both Pure Water Chamber 213b supply water directly to the liquid distribution pipeline. Those skilled in the art can design different numbers or locations of pure water chambers according to actual needs, or design the number of pure water chambers that supply water to the cleaning chamber 112 via the first pipe 12.

[0067] In this embodiment, the self-cleaning plunger-type proportional pump has equal volumes of pure water chamber 113a and pure water chamber 113b. Before liquid suction, the cleaning chamber 112, the first pipe 12, and the second pipe 13 are filled with pure water. During liquid suction, pure water enters pure water chamber 113a and pure water chamber 113b, while cleaning fluid enters cleaning fluid chamber 111. During liquid injection, the pure water in pure water chamber 113a flows sequentially along the first pipe 12, the cleaning chamber 112, and the second pipe 13 and enters the liquid distribution channel. The pure water in pure water chamber 113b and the cleaning fluid in cleaning fluid chamber 111 are directly injected into the liquid distribution channel. During this process, the total amount of pure water in the liquid distribution channel is equal to the total volume of pure water chambers 113a and 113b, and the amount of cleaning fluid in the liquid distribution channel is equal to the volume of the cleaning fluid chamber, achieving precise proportioning.

[0068] In summary, this invention, by setting up a cleaning chamber, connects the water outlet to the cleaning inlet via a first pipe, and connects the cleaning outlet to the liquid distribution pipe via a second pipe. When the second plunger performs reciprocating linear motion, it forces pure water from the pure water chamber into the cleaning chamber, enabling real-time cleaning of the surface of the first plunger rod and timely flushing away residual cleaning fluid. This prevents crystal formation at the source, avoiding damage to the equipment from crystal shedding, thus ensuring continuous liquid supply for high-flow-rate equipment. Simultaneously, the liquid used to clean the surface of the first plunger rod in the cleaning chamber then flows into the liquid distribution pipe. In this way, the pure water in the pure water chamber is used for both cleaning and liquid distribution, eliminating the need for an additional cleaning power source and independent cleaning pipeline, while ensuring a precise ratio of pure water to cleaning fluid. This simplifies the equipment structure and reduces space occupation.

[0069] To investigate the impact of the improved structure on solution mixing accuracy and aging life, a comparative test was conducted on the proportioning pump of CN119056331A and the improved proportioning pump of this invention. The main difference between the two is that the proportioning pump of this application has an added cleaning chamber, the proportioning pump of CN119056331A is arranged vertically as usual, while the proportioning pump of this invention is installed horizontally and the structure of the exhaust port has been modified accordingly.

[0070] Evaluation criteria: The purified water and cleaning solution drawn in and dispensed by the proportional pump in each operation should meet the cleaning solution ratio requirement of 9.0±0.15; the accuracy should be retested every 50,000 to 200,000 cycles; The test results are as follows: Table 1 Test data of CN119056331A proportional pump

[0071] Table 2. Test data of the improved proportioning pump in this application.

[0072] As shown in Tables 1 and 2 above, the improved proportioning pump of this application has achieved unexpected technical effects compared with the prior art (control group). Under the same aging test conditions, the proportioning pump of the control group generally suffered fatal failures such as leakage, motor damage, crystallization causing guide rail jamming, or serious inaccuracy in proportioning accuracy when operating between 175,000 and 300,000 cycles, and could not complete the 1 million cycle life test. However, all five samples of the improved proportioning pump of this application successfully passed the 1 million cycle aging test, and the proportioning accuracy remained stable within the proportioning requirements throughout the entire life cycle of 1 million cycles, with no trend of decline in the pumping flow rate of cleaning fluid and purified water. The above data fully demonstrates that this application effectively solves the technical problems of leakage, jamming, and instability in accuracy of existing proportioning pumps during long-term operation, increasing its service life by more than 4 times, and achieving high-precision and high-reliability operation throughout the entire life cycle.

[0073] Example of a liquid preparation device: This embodiment provides a liquid mixing device, including a control element, a supply line, a delivery line, a storage container, a self-cleaning plunger-type proportional pump as described in the previous embodiment, and at least two fluid reservoirs. The control element is electrically connected to the plunger-type proportional pump. The fluid reservoirs are connected to the inlet end of the plunger-type proportional pump via the supply line, and the storage containers are connected to the outlet end of the plunger-type proportional pump via the delivery line. Each fluid reservoir is used to independently store fluid, and the stored fluids can be the same or different fluids, selected according to actual needs. The plunger-type proportional pump can deliver the fluids in the corresponding fluid reservoirs to the storage containers according to a preset ratio, so as to mix and prepare a mixed fluid in the storage containers.

[0074] Finally, it should be emphasized that the above are merely preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A self-cleaning plunger-type proportional pump, characterized in that, include: A cavity assembly is provided with a cleaning fluid cavity, a cleaning cavity, and a pure water cavity. The cleaning cavity is located at one end of the axial direction of the cleaning fluid cavity and is connected to a cleaning inlet and a cleaning outlet. The cleaning fluid cavity is connected to an inlet connector and an outlet connector, and the outlet connector is used to communicate with a liquid mixing pipeline. The pure water cavity is connected to a water inlet connector and a water outlet connector. At least one of the water outlet connectors is connected to the cleaning inlet through a first pipeline, and the cleaning outlet is connected to the liquid mixing pipeline through a second pipeline. A plunger rod assembly includes a push plate, a first plunger rod, and a second plunger rod. The first ends of the first plunger rod and the second plunger rod are connected to the push plate. The second end of the first plunger rod passes through the cleaning chamber and is then inserted into the cleaning fluid chamber. The second end of the second plunger rod is inserted into the pure water chamber. A driving component, connected to the push plate, drives the push plate, the first plunger rod, and the second plunger rod to move along a first direction, which is parallel to the axial direction of the cleaning fluid chamber.

2. The self-cleaning plunger-type proportional pump according to claim 1, characterized in that: The cleaning chamber has a spiral groove on its wall, and the spiral groove extends spirally along the axial direction of the cleaning chamber. The cleaning inlet and the cleaning outlet are respectively located on both sides of the radial direction of the cleaning chamber.

3. The self-cleaning plunger-type proportional pump according to claim 1, characterized in that: A first sealing structure is provided between the cleaning chamber and the cleaning fluid chamber. A second sealing structure is provided at the end of the cleaning chamber facing away from the cleaning fluid chamber; Optionally, both the first sealing structure and the second sealing structure are double sealing structures.

4. The self-cleaning plunger-type proportional pump according to claim 3, characterized in that: The cavity assembly includes a mounting base, a cleaning base, and a pressure plate. The cleaning fluid cavity is disposed within the mounting base. The mounting base is provided with a first mounting groove and an annular flange. The annular flange protrudes from the bottom of the first mounting groove. The pressure plate fixes the cleaning base within the first mounting groove. The cleaning seat is provided with a protrusion, a first annular step and a second annular step, and the cleaning cavity is provided inside the protrusion. The first annular step and the second annular step are respectively provided on both sides of the protrusion in a first direction. The first sealing structure and the second sealing structure are respectively disposed on the first annular step and the second annular step, and the annular flange is inserted into the cleaning seat and adjacent to or abuts against the first sealing structure; Optionally, the cleaning seat is further provided with a second mounting groove, which is located on one end of the first annular step near the mounting seat, and a third sealing structure is provided between the annular flange and the second mounting groove.

5. The self-cleaning plunger-type proportional pump according to claim 1, characterized in that: The cleaning fluid chamber is provided with a first inlet and outlet. The first end of the first inlet and outlet is connected to the inlet connector and the outlet connector, respectively. The second end of the first inlet and outlet is located between the side wall and the top wall of the cleaning fluid chamber. The extension direction of the first inlet and outlet intersects the axial direction of the cleaning fluid chamber at a first preset angle. The first preset angle is greater than or equal to 90° and less than 180°.

6. The self-cleaning plunger-type proportional pump according to claim 5, characterized in that: The pure water chamber is provided with a second inlet and outlet. The first end of the second inlet and outlet is connected to the water inlet connector and the water outlet connector, respectively. The second end of the second inlet and outlet is located between the side wall and the top wall of the pure water chamber. The extension direction of the second inlet and outlet intersects the axis of the pure water chamber at a second preset angle. The second preset angle is greater than or equal to 90° and less than 180°.

7. The self-cleaning plunger-type proportional pump according to claim 6, characterized in that: The self-cleaning plunger-type proportional pump is installed horizontally or at an angle, with both the first inlet / outlet and the second inlet / outlet facing upwards.

8. The self-cleaning plunger-type proportional pump according to any one of claims 1 to 7, characterized in that: The self-cleaning plunger-type proportional pump further includes a first fixed plate, a second fixed plate, a connecting plate, a sliding seat, and a guide rail. The first fixed plate and the connecting plate are arranged opposite each other along a second direction, which is perpendicular to the first direction. The second fixed plate and the push plate are both disposed between the first fixed plate and the connecting plate. The guide rail is disposed on the first fixed plate. The sliding seat is slidably connected to the guide rail and connected to the push plate. The driving member is disposed on the second fixed plate, and the driving end of the driving member is connected to the sliding seat. Optionally, the connecting plate is provided with a guide groove on the side facing the first fixing plate.

9. The self-cleaning plunger-type proportional pump according to any one of claims 1 to 5, characterized in that: The number of the second plunger rod is set to two or more, the number of the pure water chamber is set to two or more, and the pure water chamber is set in a one-to-one correspondence with the second plunger rod; At least one of the pure water chambers can supply water to the clean chamber, and the remaining pure water chambers supply water to the liquid distribution pipeline.

10. A liquid preparation device, characterized in that, Including the self-cleaning plunger proportioning pump as described in any one of claims 1 to 9.

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