A photoresist pump waste liquid discharge box and a photoresist pump waste liquid discharge system

Abstract

The application discloses a photoresist pump waste liquid discharging box and a photoresist pump waste liquid discharging system, which comprise a discharging box body, a containing cavity is arranged in the discharging box body, a liquid inlet is arranged at the top of the discharging box body, the liquid inlet is used for mounting a liquid discharging pipe, and a flow guide structure is arranged in the containing cavity; the flow guide structure comprises a first flow guide plate and a second flow guide plate which extend along the length direction of the discharging box body, the second flow guide plate is opposite to the first flow guide plate in the inclination direction, the second flow guide plate is arranged below the first flow guide plate, a liquid outlet is arranged at the bottom of the discharging box body, and the liquid outlet is used for connecting a liquid storage container; and a flushing port is arranged at the top of the discharging box body. Beneficial effects are as follows: waste liquid in each liquid discharging pipe enters the photoresist pump waste liquid discharging box body by gravity, and is discharged from the liquid outlet by gravity, so that the probability of pollution caused by backflow of the waste liquid into the liquid discharging pipe is reduced.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, specifically to a photoresist pump waste liquid discharge box and a photoresist pump waste liquid discharge system. Background Technology

[0002] In semiconductor manufacturing processes, photoresist coating and developing machines use high-precision photoresist pumps and nozzles to precisely coat photoresist onto the surface of a high-speed rotating wafer. To prevent the photoresist from crystallizing due to settling, the photoresist pump needs to periodically perform internal circulation and debubbling operations, and the waste liquid generated in this process is discharged externally through a drain pipe.

[0003] Currently, photoresist coating and developing machines are generally equipped with multiple photoresist pumps to meet the needs of more than ten types of photoresists. Due to the limited actual installation space of photoresist coating and developing machines, existing drainage methods mostly adopt a design where the drainage pipes of each photoresist pump are connected in parallel to the same main drainage pipe to achieve simultaneous centralized discharge of waste liquid from multiple pumps. Although this design is relatively simple in terms of space and pipeline layout, it has technical drawbacks such as cross-contamination. Summary of the Invention

[0004] The purpose of this invention is to provide a photoresist pump waste liquid discharge box and a photoresist pump waste liquid discharge system, which partially solves or alleviates one of the above-mentioned deficiencies in the prior art and can reduce the probability of waste liquid contaminating the photoresist tube.

[0005] To solve the aforementioned technical problems, the present invention specifically adopts the following technical solution: A first aspect of the present invention is to provide a photoresist pump waste liquid discharge box, including a discharge box body, a receiving chamber disposed inside the discharge box body, at least two liquid inlets spaced apart along the length direction on the top of the discharge box body, the liquid inlets communicating with the receiving chamber, and a flow guiding structure for guiding flow disposed inside the receiving chamber. The flow guiding structure includes: a first flow guiding plate extending along the length direction of the discharge box body, the first flow guiding plate being inclined downward along the height direction of the discharge box body; The flow guiding structure further includes: a second flow guiding plate disposed at the bottom of the receiving chamber and extending along the length direction of the discharge box body, the second flow guiding plate being inclined in the opposite direction to the first flow guiding plate and the second flow guiding plate being located below the first flow guiding plate, and a liquid outlet being disposed at the bottom of the discharge box body corresponding to the lower end position of the second flow guiding plate; It also includes a flushing port located on the top of the discharge box body, the flushing port being positioned at the upper end of the first guide plate, and the at least two liquid inlets being distributed on one side of the flushing port along the length extension direction of the discharge box body.

[0006] Furthermore, the discharge box body includes a first inner wall and a second inner wall respectively located on both sides of the at least two liquid inlets and disposed opposite to each other. The first guide plate extends from the upper end of the first inner wall along a direction close to the second inner wall, and forms a first inclination angle with the length direction of the discharge box body. The second guide plate extends from the bottom of the second inner wall along the direction close to the first inner wall and is connected to the bottom of the first inner wall. It forms a second inclination angle with the length direction of the discharge box body, and the second inclination angle is less than or equal to the first inclination angle.

[0007] Furthermore, the length of the first guide plate projected on the preset projection surface is less than the length of the second guide plate projected on the preset projection surface, and the projection of the first guide plate on the preset projection surface covers the projections of the at least two liquid inlets on the preset projection surface; the preset projection surface is perpendicular to the height direction of the discharge box body.

[0008] Furthermore, the height between the free end of the first guide plate away from the first inner wall and the second guide plate is greater than or equal to a first preset height threshold and less than or equal to a second preset height threshold.

[0009] Furthermore, a first baffle is provided between two adjacent liquid inlets, and the first baffle extends vertically downward along the height direction of the discharge box body.

[0010] Furthermore, a first baffle is provided between the flushing port and the nearest liquid inlet.

[0011] Furthermore, both the first and second guide plates are provided with a low surface energy coating.

[0012] Furthermore, the photoresist pump waste liquid discharge box also includes an overflow port disposed on the second inner wall, and a second baffle is disposed on the side of the top of the receiving chamber near the overflow port, with the lower end of the second baffle being lower than the installation height of the overflow port.

[0013] Furthermore, the first tilt angle is greater than or equal to 30° and less than or equal to 80°; And / or, the second tilt angle is greater than or equal to 30° and less than or equal to 80°.

[0014] A second aspect of the present invention is to provide a photoresist pump waste liquid discharge system, comprising at least two independently arranged photoresist pumps, each of the at least two photoresist pumps being connected to a drain pipe, the output end of each drain pipe being connected to the aforementioned photoresist pump waste liquid discharge box, the output end of the photoresist pump waste liquid discharge box being connected to a main drain pipe, and the output end of the main drain pipe being externally connected to a liquid storage container. It also includes a rinsing fluid pipe connected to the rinsing port of the photoresist pump waste liquid discharge box, and the input end of the rinsing fluid pipe is connected to a rinsing fluid storage container.

[0015] Beneficial effects: Due to the overall layout limitations of the photoresist coating and developing machine, the drain pipes of each photoresist pump need to be connected to the same main drain pipe to achieve centralized discharge of waste liquid. However, this single-connection method is prone to cross-flow of waste liquid, causing pipeline contamination risks. To address this, the present invention creatively sets up a photoresist pump waste liquid discharge box between each drain pipe and the main drain pipe. After the waste liquid enters the receiving chamber from the top of the discharge box, it falls entirely by its own weight to the inclined first guide plate, and then flows rapidly under the guidance of the first guide plate to the inlet between it and the second guide plate. Finally, under the guidance of the second guide plate, it flows slowly (in this article, "fast" and "slow" are relative; for example, the fluid has a faster flow rate under the action of the first guide plate and a slower flow rate under the action of the second guide plate) to the outlet for discharge. The entire drainage process is driven solely by gravity and flows under the guidance of two guide plates, requiring no external power. Furthermore, the flow direction is always unidirectional and downward, which physically cuts off the backflow path of waste liquid to the drainage pipe, thereby significantly reducing the probability of cross-contamination in the photoresist pipeline.

[0016] The photoresist pump waste liquid discharge box of the present invention essentially combines multiple discharge pipes into one discharge pipe (that is, the top of the photoresist pump waste liquid discharge box is provided with at least two inlets, while the bottom of the photoresist pump waste liquid discharge box has only one outlet). Based on this, the present invention provides a flow guiding structure with a first guide plate and a second guide plate with opposite inclination directions in the receiving chamber, forming an upper and lower two-layer bidirectional flow guiding structure. Specifically, the two guide vanes have different tilt angles: the first guide vane has a larger first tilt angle than the second guide vane, and the height difference between the free end of the first guide vane and the second guide vane is controlled within a preset range, achieving staged flow rate control (i.e., "velocity stratification"): the upper first guide vane achieves "rapid transfer" to reduce volatile residue, while the lower second guide vane "pushes the flow at a low speed" to avoid excessive accumulation at the outlet and overload. This "velocity stratification" design extends the fluid flow path, providing sufficient buffer time for drainage while shortening the evaporation window of the photoresist, inhibiting crystal nucleation from the source, and thus achieving a dynamic balance between "overload prevention" and "crystallization prevention." In other words, this invention, through the synergistic optimization of tilt angle and height difference, divides the fluid flow into two independent and controllable physical stages, taking into account both flow stability and anti-crystallization performance. Furthermore, this "speed stratification" + "speed switching inlet" design allows the cleaning fluid introduced during the cleaning stage to gain sufficient impact kinetic energy when flowing through the upper steep slope, so as to carry out large-area flushing of the lower gentle slope, greatly improving the cleaning power.

[0017] In addition, the first guide plate forms an intermediate receiving surface in the chamber, which shortens the free path of the waste liquid falling from the inlet, thereby reducing the splashing or rebound caused by the waste liquid directly hitting the second guide plate.

[0018] Furthermore, the photoresist pump waste liquid discharge box of this invention is also equipped with an overflow port on its side, forming a dual protection mechanism. When the outlet is accidentally blocked, the liquid level in the receiving chamber rises to the height of the overflow port and is automatically discharged, effectively preventing waste liquid from filling the chamber and directly contacting the ends of each discharge pipe, further eliminating the risk of backflow contamination. At the same time, the overflow port also has a fault warning function. Once waste liquid is observed to be discharged from the overflow port, it indicates that there is a blockage inside the receiving chamber, which can promptly remind the operator to clear the blockage, thereby ensuring the long-term stable operation of the equipment. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. The elements or parts in the drawings are not necessarily drawn to scale. Obviously, the drawings described below are some embodiments of the present invention, and those skilled in the art can obtain other drawings based on these drawings without any creative effort.

[0020] Figure 1 A three-dimensional structural diagram of the photoresist pump waste liquid discharge box; Figure 2 A front view schematic diagram of the photoresist pump waste liquid discharge box; Figure 3 This is a schematic diagram of the waste liquid discharge system of the photoresist pump.

[0021] Summary of attached labeling and identification: 1. Discharge box body; 11. Receiving chamber; 12. Liquid inlet; 13. First guide plate; 14. Second guide plate; 15. Liquid outlet; 16. First baffle; 17. Rinse port; 18. Overflow port; 19. Second baffle; 110. First inner wall; 111. Second inner wall; 2. Photoresist pump; 3. Drain pipe; 4. Main drain pipe; 5. Rinse liquid pipe. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0023] In this document, suffixes such as "module," "part," or "unit" used to denote elements are used only for the purpose of illustrative purposes and have no specific meaning in themselves. Therefore, "module," "part," or "unit" may be used interchangeably.

[0024] In this document, the terms "upper," "lower," "inner," "outer," "front," "rear," "one end," and "the other end," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the present invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0025] In this document, unless otherwise explicitly specified and limited, the terms "installed," "equipped with," "connected," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, a direct connection, or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0026] In this document, "and / or" includes any and all combinations of one or more of the listed related items.

[0027] In this article, "multiple" means two or more, that is, it includes two, three, four, five, etc.

[0028] In this specification, certain embodiments may be disclosed in a range-bound format. It should be understood that this "range-bound" description is merely for convenience and brevity and should not be construed as a rigid limitation on the disclosed range. Therefore, the description of a range should be considered as having specifically disclosed all possible subranges and the individual numerical values ​​within those ranges. For example, a description of the range 1-6 should be considered as having specifically disclosed subranges such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., and the individual numbers within those ranges, such as 1, 2, 3, 4, 5, and 6. This rule applies regardless of the breadth of the range.

[0029] This application physically isolates the drain pipes 3 of each photoresist pump 2 using a waste liquid discharge box, and incorporates a two-layer, bidirectional flow guiding structure within it. This flow guiding structure includes a first guide plate 13 and a second guide plate 14 arranged side-by-side with opposite flow directions (for example, the first guide plate 13 flows from left to right, while the second guide plate 14 flows from right to left). This extends the path of the waste liquid discharged from each drain pipe (this extension is relative to when only the second guide plate 14 is present, without the first guide plate 13, so that when the drain pipe directly impacts the second guide plate 14). (Regarding the flow path), to avoid the liquid outlet 15 being unable to drain completely and causing a large amount of liquid to accumulate at the liquid outlet 15, at the same time, the first guide plate 13 acts as an intermediate receiving surface, and then quickly guides the fluid to the second guide plate 14, so that the impact force when the waste liquid reaches the second guide plate 14 is greatly reduced compared to when it is directly discharged into the second guide plate 14, avoiding reverse splashing pollution caused by the high-speed liquid flow directly impacting the second guide plate 14, so that the droplets adhere to the surrounding side walls and the inner wall of the tank top, greatly reducing the dead corner area of ​​waste liquid hanging and crystallizing from the source, and significantly reducing the difficulty and frequency of daily cleaning and maintenance.

[0030] Example 1: like Figure 1As shown, a photoresist pump waste liquid discharge box includes a discharge box body 1. The discharge box body 1 has an internal receiving chamber 11 for temporarily storing the waste liquid generated by the photoresist pump. At least two inlets 12 are distributed along the length of the top of the discharge box body 1, and the inlets 12 are connected to the receiving chamber 11. Both inlets 12 are used to install the discharge pipe of the photoresist pump. A flow guiding structure is provided in the receiving chamber 11 for guiding the flow. The flow guiding structure includes a first flow guiding plate 13 extending along the length of the discharge box body 1. The first flow guiding plate 13 is inclined as a whole. The flow guiding structure also includes a second flow guiding plate 14 disposed at the bottom of the receiving chamber 11 and extending along the length of the discharge box body 1. The second flow guiding plate 14 is inclined in the opposite direction to the first flow guiding plate 13 and is located below the first flow guiding plate 13. An outlet 15 is disposed at the bottom of the discharge box body 1 corresponding to the lower end of the second flow guiding plate 14. The outlet 15 is used to connect to a liquid storage container.

[0031] Based on the above structure, the waste liquid generated by each photoresist pump during the internal circulation process enters the receiving chamber 11 through the inlet 12. The waste liquid falls onto the surface of the first guide plate 13 by its own weight and slides down the inclined surface to the second guide plate 14, finally flowing along the second guide plate 14 to the outlet 15 for discharge. Each drain pipe is independent of the others, ensuring no interference during drainage. After entering the receiving chamber 11, the waste liquid flows to the bottom outlet 15 by gravity, resulting in a single flow direction without the need for external power. This effectively reduces the probability of waste liquid flowing back into the drain pipe, significantly reducing the risk of cross-contamination and thus ensuring the cleanliness of the photoresist pipeline.

[0032] The photoresist pump waste liquid discharge box of the present invention essentially combines multiple discharge pipes into one discharge pipe (i.e., the top of the photoresist pump waste liquid discharge box is provided with at least two inlets 12, while the bottom of the photoresist pump waste liquid discharge box has only one outlet 15). Based on this, the present invention provides a first guide plate 13 and a second guide plate 14 with opposite inclination directions in the receiving chamber, that is, it increases the flow path of the waste liquid in the limited receiving chamber 11, which can buffer and equalize the flow of the waste liquid, effectively reducing the probability that a large amount of waste liquid will suddenly rush into the outlet 15 and cause the waste liquid to not be discharged in time. The first guide plate 13 forms an intermediate receiving surface in the chamber, shortening the free stroke of the waste liquid falling from the inlet 12. Compared with the speed at which the waste liquid directly hits the second guide plate 14 when the first guide plate 13 is not provided, the impact speed of the waste liquid when it contacts the first guide plate 13 is significantly reduced, thereby avoiding the phenomenon of splashing or rebounding when the waste liquid directly hits the second guide plate 14.

[0033] For example, with Figure 2The direction indicated by the middle arrow a is the extension direction. The first guide plate 13 is generally inclined downward, and the corresponding second guide plate 14 is generally inclined upward. The lower end of the first guide plate 13 extends to the upper end of the second guide plate 14.

[0034] In this embodiment, see Figure 1 The discharge box body 1 includes a first inner wall 110 and a second inner wall 111 respectively located on both sides of at least two liquid inlets 12 and disposed opposite to each other. A first guide plate 13 extends from the upper end of the first inner wall 110 along a direction close to the second inner wall 111, and forms a first inclination angle (i.e., the inclination angle of the first guide plate 13) with respect to the length direction of the discharge box body 1. A second guide plate 14 extends from the bottom of the second inner wall 111 along a direction close to the first inner wall 110 and connects to the bottom of the first inner wall 110, and forms a second inclination angle (i.e., the inclination angle of the second guide plate 14) with respect to the length direction of the discharge box body 1, wherein the second inclination angle is less than or equal to the first inclination angle. It should be noted that the liquid outlet 15 is formed between the lower end of the second guide plate 14 and the bottom of the first inner wall 110.

[0035] For example, the tilt angle of the first guide plate 13 and the tilt angle of the second guide plate 14 are both greater than or equal to 30° and less than or equal to 80°, preferably 30°. Based on this, it can be ensured that after the waste liquid falls onto the surface of the first guide plate 13 or the second guide plate 14, it can convert its own gravitational potential energy into kinetic energy and thus achieve flow. In addition, it can also prevent the waste liquid from flowing too fast and impacting the inner wall of the receiving chamber 11, thereby avoiding the waste liquid from splashing onto the drain pipe and causing pollution.

[0036] In some embodiments, the length of the projection of the first guide plate 13 onto the preset projection surface is less than the length of the projection of the second guide plate 14 onto the preset projection surface, and the projection of the first guide plate 13 onto the preset projection surface covers the projections of the at least two liquid inlets 12 onto the preset projection surface; the preset projection surface is perpendicular to the height direction of the discharge box body 1, that is, along... Figure 2 The projection made in the direction of the extension of the middle arrow b.

[0037] By ensuring that the projection of the first guide plate 13 covers the projection of all liquid inlets 12, meaning that all outlets of the drain pipes 3 fall within the effective area of ​​the first guide plate 13, it is guaranteed that the discharged liquid falls onto the first guide plate 13 and does not drip directly onto the second guide plate 14, causing localized impact and splashing onto the sidewalls outside the second guide plate 14, thus increasing cleaning difficulty. In other words, the first guide plate 13 effectively acts as a "liquid receiving shield," physically isolating the vertical drop points of each pipe on the first guide plate 13.

[0038] In some embodiments, the height between the free end of the first guide plate 13 (i.e., away from the first inner wall 110) and the second guide plate 14 is greater than or equal to a first preset height threshold and less than or equal to a second preset height threshold. Preferably, the first preset height threshold is 55 mm and the second preset height threshold is 70 mm. If the height is too low, it may cause solid-phase adhesive filament bridging between the waste liquid and the first guide plate 13 and the second guide plate 14, thereby affecting the drainage; if the height is too high, when the waste liquid drips from the first guide plate 13 onto the second guide plate 14, it may cause splashing, for example, splashing onto the surrounding side walls, thereby increasing the difficulty of cleaning. In addition, if a large amount of waste liquid flows into the receiving chamber 11, the excessively high height may cause a large amount of waste liquid to flow into the second guide plate 14, resulting in the outlet 15 not having enough time to drain the liquid. Therefore, in this embodiment, a height range between the two is set.

[0039] Since the longer the waste liquid stays on the first guide plate 13 or the second guide plate 14 (i.e., the longer it flows), the greater the probability of crystal formation on the surface of the first guide plate 13 or the second guide plate 14. To reduce the residence time of the waste liquid on the first guide plate 13 or the second guide plate 14, in this embodiment, both the first guide plate 13 and the second guide plate 14 are provided with a low surface energy coating. Utilizing the low surface tension characteristics of the low surface energy coating, the viscous resistance between the waste liquid and the plate surface is significantly reduced. Combined with the synergistic effect of the inclined design, the flow velocity of the waste liquid on the plate surface is increased, thereby fundamentally shortening its flow time at the physical level and reducing the risk of volatilization and crystallization. Preferably, the low surface energy coating is a diamond-like carbon coating or a perfluoropolyether silane monolayer film. By utilizing the low surface tension and the large angle of inclination of the coating, the flow velocity of the waste liquid on the plate surface is increased, thereby shortening its flow time to a certain extent.

[0040] In some embodiments, see details. Figure 1 Due to limited space, multiple liquid inlets need to be set on the top of the receiving chamber 11 to connect different drain pipes. Therefore, the interval between the multiple liquid inlets needs to be small. To avoid interference between two adjacent liquid inlets, a first baffle 16 is set in the area between any two adjacent liquid inlets 12 at the top of the receiving chamber 11. The first baffle 16 extends vertically downward along the height direction of the discharge box body 1. Based on the design of the first baffle 16, each liquid inlet 12 can be separated, further ensuring that two adjacent drain pipes 3 can not interfere with each other when discharging waste liquid, thereby reducing the probability of the drain pipe 3 being contaminated.

[0041] like Figure 1As shown, a rinsing port 17 is provided on the top of the discharge box body 1, corresponding to the upper end of the first guide plate 13. The rinsing port 17 is used to connect the rinsing liquid pipe. It should be noted that, since the first guide plate 13 is inclined as a whole, the upper end of the first guide plate 13, that is, the end with the higher height of the first guide plate 13, is also the end closer to the first inner wall 110. Based on this, when the rinsing liquid enters the receiving chamber 11 from the rinsing port 17, it falls onto the surface of the first guide plate 13 due to its own weight, flows along the inclined surface of the first guide plate 13 to the surface of the second guide plate 14, and finally flows along the second guide plate 14 to the outlet 15 for discharge, thereby cleaning the inside of the receiving chamber 11 and helping to reduce the probability of crystal formation on the surfaces of the first guide plate 13 and the second guide plate 14.

[0042] Furthermore, a first baffle 16 is provided between the flushing port 17 and its nearest liquid inlet 12. This design can separate the flushing port 17 from its adjacent liquid inlet 12, thereby reducing the probability of flushing fluid contaminating its adjacent drain pipe.

[0043] Furthermore, at least two inlets 12 are distributed along the length of the discharge box body 1 on one side of the rinsing port 17. This design ensures that the rinsing fluid is rinsed in place and that the positions of the first guide plate 13 corresponding to each inlet 12 can be rinsed.

[0044] In some embodiments, specific details can be found in the following: Figure 1 The photoresist pump waste liquid discharge box also includes an overflow port 18, which is located on the second inner wall 111. Based on the design of the overflow port 18, when the outlet 15 is abnormally blocked, the waste liquid can be discharged through the overflow port 18, preventing the containment chamber 11 from being filled with waste liquid and contaminating the various drain pipes; in addition, the overflow port 18 can also indicate to the user that the outlet 15 is abnormally blocked and needs to be checked and cleared in time.

[0045] By setting the flushing port 17 and the overflow port 18 at the two ends of the length direction of the discharge box body 1, the probability of flushing fluid being discharged directly from the overflow port 18 can be reduced, thereby reducing the probability of the overflow port 18 providing an incorrect signal to the user.

[0046] Furthermore, the liquid outlet 15 and the flushing port 17 are located at the same end along the length of the discharge box body 1. In other words, the liquid outlet 15 and the overflow port 18 are located at opposite ends along the length of the discharge box body 1. It should be noted that the above distribution relationship (i.e., the liquid outlet 15 and the overflow port 18 are located at opposite ends along the length of the discharge box body 1) is based on the two-section guide plate design of the first guide plate 13 and the second guide plate 14 of the present invention. Through the above design, the height difference between the liquid outlet 15 and the overflow port 18 can be increased, avoiding a large amount of waste liquid entering the containment chamber 11 at the same time and failing to be discharged in time, resulting in the waste liquid being discharged from the overflow port 18.

[0047] like Figure 1 As shown, a second baffle 19 is provided on the top of the receiving chamber 11 near the overflow port 18. Specifically, each first baffle 16 is located in the area between the flushing port 17 and the second baffle 19, and the lower end of the second baffle 19 is lower than the installation height of the overflow port 18. Based on this, it is possible to further prevent waste liquid from falling onto the first guide plate 13, or from splashing directly onto the overflow port 18 while the waste liquid is flowing on the first guide plate 13.

[0048] Furthermore, the overflow port 18 is positioned lower than the bottom of the drain pipe 3 inside the inlet port 12. With this design, when the outlet port 15 experiences abnormal blockage, as the liquid level inside the receiving chamber 11 rises, it can be discharged first from the overflow port 18, preventing waste liquid from contacting the bottom of the drain pipe 3 and causing contamination.

[0049] For example, each drain pipe 3 extends 1-2cm into the body of the drain box 1, that is, the bottom surface of the drain pipe 3 is 1-2cm away from the top surface of the body of the drain box 1, the overflow port 18 is located 3-4cm away from the top surface of the body of the drain box 1, and the length of the second baffle 19 is greater than 4cm.

[0050] It should be noted that the first guide plate 13, the second guide plate 14, and the second baffle 19 are not interconnected. Based on this structure, the first guide plate 13 and the second guide plate 14 can prevent the interior of the receiving chamber 11 from being divided into several independent areas, thereby ensuring that the waste liquid can flow to the outlet 15 through the first guide plate 13 and the second guide plate 14; at the same time, it can also ensure that when the outlet 15 is abnormally blocked, the waste liquid can be discharged from the overflow port 18.

[0051] In some embodiments, the inlet ports 12 are arranged in two rows along the length of the discharge box body 1 at the top of the discharge box body 1. A partition (not shown in the figure) extends along the length of the first guide plate 13. The partition divides the first guide plate 13 into two guide channels adapted to the two rows of inlet ports 12. A rinsing port 17 is provided at the top of the discharge box body 1 corresponding to the two guide channels. Based on this, by increasing the number of rows to reduce the number of inlet ports 12 in each row, the probability of crystallization on the surface of the first guide plate 13 is reduced. In other words, the probability of crystallization on the surface of the first guide plate 13 is reduced by diverting the flow.

[0052] Example 2: like Figure 3As shown, the present invention also provides a photoresist pump waste liquid discharge system, specifically including at least two independently arranged photoresist pumps 2, each of which is connected to a drain pipe 3. The end of each drain pipe 3 furthest from the photoresist pump 2 is connected to the photoresist pump waste liquid discharge box described in Embodiment 1. Specifically, each drain pipe 3 is inserted into the inlet 12 at the top of the discharge box body 1. The output end (i.e., outlet 15) of the photoresist pump waste liquid discharge box is connected to a main drain pipe 4, and the output end of the main drain pipe 4 (i.e., the end furthest from the photoresist pump waste liquid discharge box) is externally connected to a storage container (not shown in the figure). It should be understood that the overflow port 18 is externally connected to the storage container through a drain pipe.

[0053] Furthermore, the photoresist pump waste liquid discharge system also includes a rinsing liquid pipe 5 connected to the input end of the photoresist pump waste liquid discharge box. Specifically, the output end of the rinsing liquid pipe 5 is connected to the rinsing port 17 on the top of the discharge box body 1, and the input end of the rinsing liquid pipe 5 is connected to a rinsing liquid storage container (not shown in the figure).

[0054] It should be noted that, in this document, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Unless otherwise specified, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes that element.

[0055] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of the present invention without departing from the spirit and scope of the claims. All of these forms are within the protection scope of the present invention.

Claims

1. A waste liquid discharge box for a photoresist pump, characterized in that, The system includes a discharge box body (1), which has a receiving chamber (11) inside. At least two liquid inlets (12) are spaced apart on the top of the discharge box body (1) along its length. The liquid inlets (12) are connected to the receiving chamber (11). The receiving chamber (11) is provided with a flow guiding structure for guiding the flow. The flow guiding structure includes: a first flow guiding plate (13) extending along the length direction of the discharge box body (1), and the first flow guiding plate (13) is inclined downward along the height direction of the discharge box body (1); The flow guiding structure further includes: a second flow guiding plate (14) disposed at the bottom of the receiving chamber (11) and extending along the length direction of the discharge box body (1), the second flow guiding plate (14) being inclined in the opposite direction to the first flow guiding plate (13), and the second flow guiding plate (14) being located below the first flow guiding plate (13), and a liquid outlet (15) being provided at the bottom of the discharge box body (1) corresponding to the lower end position of the second flow guiding plate (14). It also includes a flushing port (17) disposed on the top of the discharge box body (1), the flushing port (17) being disposed at the position corresponding to the upper end of the first guide plate (13), and the at least two liquid inlets (12) being distributed on one side of the flushing port (17) along the length extension direction of the discharge box body (1).

2. The photoresist pump waste liquid discharge box according to claim 1, characterized in that, The discharge box body (1) includes a first inner wall and a second inner wall respectively located on both sides of the at least two liquid inlets (12) and arranged opposite to each other. The first guide plate (13) extends from the upper end of the first inner wall in a direction close to the second inner wall, and forms a first inclination angle with the length direction of the discharge box body (1). The second guide plate (14) extends from the bottom of the second inner wall along the direction close to the first inner wall and is connected to the bottom of the first inner wall. It forms a second inclination angle with the length direction of the discharge box body (1), and the second inclination angle is less than or equal to the first inclination angle.

3. The photoresist pump waste liquid discharge box according to claim 2, characterized in that, The length of the first guide plate (13) projected on the preset projection surface is less than the length of the second guide plate (14) projected on the preset projection surface, and the projection of the first guide plate (13) on the preset projection surface covers the projection of the at least two liquid inlets (12) on the preset projection surface; the preset projection surface is perpendicular to the height direction of the discharge box body (1).

4. The photoresist pump waste liquid discharge box according to claim 1, characterized in that, The height between the free end of the first guide plate (13) away from the first inner wall and the second guide plate (14) is greater than or equal to the first preset height threshold and less than or equal to the second preset height threshold.

5. The photoresist pump waste liquid discharge box according to claim 1, characterized in that, A first baffle (16) is provided between two adjacent liquid inlets (12), and the first baffle (16) extends vertically downward along the height direction of the discharge box body (1).

6. The photoresist pump waste liquid discharge box according to claim 5, characterized in that, A first baffle (16) is provided between the flushing port (17) and the nearest liquid inlet (12).

7. The photoresist pump waste liquid discharge box according to claim 4, characterized in that, Both the first guide plate (13) and the second guide plate (14) are provided with a low surface energy coating.

8. The photoresist pump waste liquid discharge box according to claim 2, characterized in that, It also includes an overflow port (18) provided on the second inner wall, and a second baffle (19) is provided on the side of the top of the receiving chamber (11) near the overflow port (18), and the lower end of the second baffle (19) is lower than the installation height of the overflow port (18).

9. The photoresist pump waste liquid discharge box according to claim 2, characterized in that, The first tilt angle is greater than or equal to 30° and less than or equal to 80°; and / or, the second tilt angle is greater than or equal to 30° and less than or equal to 80°.

10. A photoresist pump waste liquid discharge system, characterized in that, It includes at least two independently configured photoresist pumps (2), each of which is connected to a drain pipe (3). The output end of each drain pipe (3) is connected to a photoresist pump waste discharge box according to any one of claims 1 to 9. The output end of the photoresist pump waste discharge box is connected to a main drain pipe (4), and the output end of the main drain pipe (4) is connected to a liquid storage container. It also includes a flushing liquid pipe (5) connected to the flushing port (17) of the photoresist pump waste liquid discharge box, and the input end of the flushing liquid pipe (5) is connected to a flushing liquid storage container.

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