Image acquisition device, evaporation device, and image acquisition method
Patent Information
- Application Number
- CN202510356499.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-24
- Publication Date
- 2026-09-25
AI Technical Summary
蒸镀设备的对位系统是实现设备高精度成膜的重要组成部分之一，其中蒸镀设备中图像采集装置的图像采集效果直接影响蒸镀设备的对位能力，进而影响蒸镀效果
[0033]根据本申请实施例提供的图像采集装置、蒸镀设备、图像采集方法，图像采集装置包括第一光源、第二光源和第三光源，第一光源和第二光源中的环形光源能够为对位标识区域提供基础照明，在第一光源和第二光源的照射下，若对位标识区域存在一明一暗的非目标区域和目标区域的情况，第三光源中的弧形光源则能够针对性地对光亮较暗的目标区域进行光亮的补偿，以改善对位标识区域被照射的明暗不均的现象，从而使得所采集的对位标识区域的图像的亮度是一致的，提高对位标识区域的图像采集效果，进而提高蒸镀设备的对位能力，改善蒸镀效果。
Smart Images
Figure CN122815752A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of vapor deposition technology for display panels, specifically to an image acquisition device, vapor deposition equipment, and image acquisition method. Background Technology
[0002] Organic light-emitting diodes (OLEDs) and flat panel displays based on light-emitting diodes (LEDs) are widely used in various consumer electronics products such as mobile phones, televisions, laptops, and desktop computers due to their advantages such as high image quality, energy saving, thin body, and wide range of applications, becoming the mainstream of display devices.
[0003] In the manufacturing process of OLED display products, evaporation equipment is used to deposit materials onto corresponding areas of the substrate. The alignment system of the evaporation equipment is one of the important components for achieving high-precision film deposition. The image acquisition effect of the image acquisition device in the evaporation equipment directly affects the alignment capability of the evaporation equipment, and thus affects the evaporation effect. Summary of the Invention
[0004] This application provides an image acquisition device, a vapor deposition equipment, and an image acquisition method, which can improve the image acquisition effect, thereby improving the alignment capability of the vapor deposition equipment and thus improving the vapor deposition effect.
[0005] In a first aspect, embodiments of this application provide an image acquisition device for acquiring images of alignment marking areas of a substrate to be vapor-deposited. The image acquisition device includes: a light source assembly for emitting light toward the alignment marking areas of the substrate to be vapor-deposited; the light source assembly includes a first light source, a second light source, and a third light source; the first light source includes a first light-emitting element; the second light source includes at least one ring light source, the ring light source includes a plurality of second light-emitting elements, the plurality of second light-emitting elements in the ring light source being arranged around the first light source; the third light source includes at least one arc light source, the arc light source includes at least one third light-emitting element, the third light-emitting element in the arc light source being arranged around a portion of the first light source; when the alignment marking area includes a target area and a non-target area, the arc light source is used to emit light toward the target area to compensate for the brightness of the target area, and before the brightness of the target area is compensated, the brightness of the target area is less than the brightness of the non-target area.
[0006] In one possible implementation of the first aspect, the relative position of the arc-shaped light source and the alignment marking area is adjustable;
[0007] Preferably, the light source assembly is rotatable.
[0008] In one possible implementation of the first aspect, the third light source includes multiple arc-shaped light sources, and the brightness of different arc-shaped light sources can be adjusted independently;
[0009] Preferably, multiple arc-shaped light sources form a ring surrounding the first light source;
[0010] Preferably, multiple arc-shaped light sources are located on the same horizontal axis;
[0011] Preferably, the third light source includes four arc-shaped light sources;
[0012] Preferably, the number of third light-emitting elements is the same for different arc-shaped light sources;
[0013] Preferably, the light rays emitted by at least two arc-shaped light sources have different angles with the same horizontal plane;
[0014] Preferably, the angle of the light emitted by at least one arc-shaped light source is adjustable.
[0015] In one possible implementation of the first aspect, the arc-shaped light source includes multiple third light-emitting elements, and the multiple third light-emitting elements within the same arc-shaped light source are simultaneously lit and simultaneously turned off.
[0016] In one possible implementation of the first aspect, the third light source is located on the side of the second light source that is furthest from the first light source;
[0017] Preferably, the light-emitting area of the first light-emitting element is larger than the light-emitting area of the second light-emitting element, and the light-emitting area of the first light-emitting element is larger than the light-emitting area of the third light-emitting element;
[0018] Preferably, the light-emitting area of the second light-emitting element is equal to the light-emitting area of the third light-emitting element.
[0019] In one possible implementation of the first aspect, the second light source includes a plurality of ring light sources, which are sequentially positioned away from the first light source.
[0020] Preferably, multiple ring light sources are lit or turned off simultaneously.
[0021] In one possible implementation of the first aspect, the image acquisition device further includes a capturing unit for capturing an image of the alignment marker area;
[0022] Preferably, the image acquisition device further includes a processor, which is used to acquire images captured by the imaging unit and determine whether to turn on the third light source based on the images.
[0023] Secondly, embodiments of this application provide a vapor deposition apparatus, including an image acquisition device as described in any embodiment of the first aspect.
[0024] Thirdly, embodiments of this application provide an image acquisition method for use with the image acquisition apparatus as described in any embodiment of the first aspect, the image acquisition method comprising:
[0025] Light is emitted towards the alignment marking area of the substrate to be vapor-deposited using a first light source and a second light source.
[0026] The first image of the alignment mark area is captured by the imaging unit of the image acquisition device;
[0027] Based on the first image, if it is determined that the alignment marking area includes both the target area and the non-target area, light is emitted towards the target area using at least one arc-shaped light source;
[0028] A second image of the alignment mark area is captured by the imaging unit, and the second image is used for alignment recognition.
[0029] In one possible implementation of the third aspect, light is emitted toward the target area via at least one arc-shaped light source, including:
[0030] Rotate the light source assembly to align at least one arc-shaped light source with the target area, and emit light into the target area through the arc-shaped light source aligned with the target area;
[0031] Preferably, the image acquisition method further includes:
[0032] Based on the first image, and assuming that the brightness of the alignment marking area is uniform, the third light source remains in a non-emitting state, and the first image is used for alignment recognition.
[0033] According to the image acquisition device, vapor deposition equipment, and image acquisition method provided in the embodiments of this application, the image acquisition device includes a first light source, a second light source, and a third light source. The ring light source in the first and second light sources can provide basic illumination for the alignment marking area. Under the illumination of the first and second light sources, if there is a non-target area and a target area that are bright and dark in the alignment marking area, the arc light source in the third light source can specifically compensate for the brightness of the darker target area to improve the uneven illumination of the alignment marking area. This makes the brightness of the acquired image of the alignment marking area consistent, improves the image acquisition effect of the alignment marking area, and thus improves the alignment capability of the vapor deposition equipment and improves the vapor deposition effect.
[0034] The above description is only an overview of the technical solution of this application. In order to better understand the technical means of this application and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this application more obvious and understandable, the following are specific embodiments of this application. Attached Figure Description
[0035] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings, in which the same or similar reference numerals denote the same or similar features, and the drawings are not drawn to scale.
[0036] Figure 1 This diagram illustrates a vapor deposition scenario provided in one embodiment of this application;
[0037] Figure 2 This illustration shows a schematic diagram of a light source component in an image acquisition device provided in an embodiment of this application;
[0038] Figure 3 This illustration shows another structural diagram of the light source component in the image acquisition device provided in this application embodiment;
[0039] Figure 4 Show Figure 3 A schematic diagram of a third light source in the middle;
[0040] Figure 5 Show Figure 3 A schematic diagram of a second light source in the middle;
[0041] Figure 6 This illustration shows a structural schematic diagram of an image acquisition device provided in an embodiment of this application;
[0042] Figure 7 This illustration shows a structural schematic diagram of a vapor deposition apparatus provided in an embodiment of this application;
[0043] Figure 8 This is a schematic flowchart of an image acquisition method provided in an embodiment of this application. Detailed Implementation
[0044] The features and exemplary embodiments of various aspects of this application will now be described in detail. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain this application and are not configured to limit this application. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples of this application.
[0045] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.
[0046] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.
[0047] It should be understood that the term "and / or" used in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, and B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.
[0048] In the description of the embodiments of this application, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. For those skilled in the art, the specific meaning of the above terms in the embodiments of this application can be understood according to the specific circumstances.
[0049] Various modifications and variations can be made to this application without departing from its spirit or scope, which will be apparent to those skilled in the art. Therefore, this application is intended to cover modifications and variations falling within the scope of the corresponding claims (the claimed technical solutions) and their equivalents. It should be noted that the embodiments provided in this application can be combined with each other without contradiction.
[0050] Before describing the technical solutions provided in the embodiments of this application, in order to facilitate understanding of the embodiments of this application, this application first specifically explains the problems existing in the related technologies:
[0051] OLED display panels have many advantages such as self-illumination, fast response, high brightness, and thinness, and have gradually become the mainstream in the display field.
[0052] In the manufacturing process of OLED display panels, evaporation equipment is used to deposit materials onto corresponding areas of the substrate to form the display panel. Alignment is required during the evaporation process. The inventors discovered that, as... Figure 1 As shown, during vapor deposition, the substrate 200 to be vaporized is placed on the support mechanism 300. Due to the flatness of the vapor deposition equipment itself and the bending of the substrate 200 under gravity, the alignment mark area of the substrate to be vaporized will have a certain degree of warping.
[0053] Due to the effect of warping, the light source 100' in the related technology illuminates the alignment mark area of the substrate to be vapor-deposited 200, resulting in uneven illumination. This causes uneven brightness in the image of the alignment mark area captured by the imaging unit, affecting the alignment capability of the vapor deposition equipment and thus affecting the vapor deposition effect.
[0054] In view of the inventors’ above-mentioned research findings, the embodiments of this application consider improvements to the light source components in vapor deposition equipment in the related art.
[0055] Specifically, embodiments of this application provide an image acquisition device, a vapor deposition equipment, and an image acquisition method, which can improve the image acquisition effect, thereby improving the alignment capability of the vapor deposition equipment and thus improving the vapor deposition effect. The following will describe various embodiments of the image acquisition device, vapor deposition equipment, and image acquisition method provided in this application with reference to the accompanying drawings.
[0056] This application provides an image acquisition device for acquiring images of the alignment marking area of a substrate to be vapor-deposited. It is understood that the alignment marking area of the substrate to be vapor-deposited includes alignment markings used for alignment. For example, the alignment markings are used for alignment with a photomask.
[0057] Figure 2 This diagram illustrates a structural schematic of a light source component in an image acquisition device provided in an embodiment of this application. For example... Figure 2 As shown, the image acquisition device includes a light source assembly 100, which emits light towards the alignment marking area of the substrate to be vapor-deposited. Understandably, the light source assembly 100 illuminates the alignment marking area so that the imaging unit in the image acquisition process can clearly capture an image of the alignment marking area.
[0058] The light source assembly 100 includes a first light source 1, a second light source 2, and a third light source 3. The first light source 1, the second light source 2, and the third light source 3 are all capable of emitting light.
[0059] The first light source 1 includes a first light-emitting element 11, which is capable of emitting light. The first light source 1 can also be called a coaxial light source.
[0060] The second light source 2 includes at least one annular light source 20, and the annular light source 20 includes a plurality of second light-emitting elements 21. The plurality of second light-emitting elements 21 in the annular light source 20 are arranged around the first light source 1. It should be noted that, here, "annular light source" refers to a multiple second light-emitting elements arranged around the first light source, thereby forming an annular light source that surrounds the first light source.
[0061] The third light source 3 includes at least one arc-shaped light source 30, and the arc-shaped light source 30 includes at least one third light-emitting element 31. The third light-emitting element 31 in the arc-shaped light source 30 is arranged around the portion of the first light source 1. It should be noted that the "arc-shaped light source" here refers to the portion of the third light-emitting element arranged around the first light source, thereby forming an arc-shaped light source that partially surrounds the first light source.
[0062] In the case where the alignment marking area of the substrate to be vapor-deposited includes a target area and a non-target area, the brightness of the target area is less than that of the non-target area before the brightness of the target area is compensated. The arc-shaped light source 30 is used to emit light toward the target area to compensate for the brightness of the target area.
[0063] During image acquisition, the first light source 1 and the second light source 2 provide basic illumination to the alignment marking area of the substrate to be vapor-deposited. Before the brightness of the target area is compensated, only the first light source 1 and the second light source 2 provide illumination to the alignment marking area. It is understood that the first light source 1 is located at the center of the entire light source assembly, and the brightness it provides to all areas of the alignment marking area is uniform. The second light source 2 is a ring light source, and the brightness it provides to all areas of the alignment marking area is also uniform. However, if the alignment marking area of the substrate to be vapor-deposited has a certain warp, that is, if the alignment marking area is uneven, the distance between different areas of the alignment marking area and the light source assembly will vary. Therefore, the illumination effect received by different areas of the alignment marking area will be different. In other words, the alignment marking area includes both the target area and the non-target area. Under the illumination of the first light source 1 and the second light source 2, the brightness of the target area is less than that of the non-target area, resulting in uneven brightness in the acquired image of the alignment marking area. To address this, the third light source compensates for the brightness of the target area with less light, so that the illumination of each area of the alignment mark area tends to be consistent, thereby avoiding the problem of uneven brightness in the acquired image of the alignment mark area.
[0064] According to the image acquisition device provided in the embodiments of this application, the image acquisition device includes a first light source, a second light source, and a third light source. The ring light source in the first and second light sources can provide basic illumination for the alignment marking area. Under the illumination of the first and second light sources, if there is a non-target area and a target area that are bright and dark in the alignment marking area, the arc light source in the third light source can specifically compensate for the brightness of the darker target area to improve the uneven illumination of the alignment marking area. This makes the brightness of the acquired image of the alignment marking area consistent, improves the image acquisition effect of the alignment marking area, and thus improves the alignment capability of the vapor deposition equipment and improves the vapor deposition effect.
[0065] In some embodiments, the relative position of the arc-shaped light source 30 and the alignment marking area is adjustable.
[0066] For example, if the alignment marking area of the substrate to be vapor-deposited includes a target area and a non-target area, and the brightness of the target area is less than that of the non-target area before the brightness of the target area is compensated, and the orthographic projection of the arc light source 30 on the substrate to be vapor-deposited does not overlap with the target area of the alignment marking area, then the position of the arc light source 30 can be adjusted until the orthographic projection of the arc light source 30 on the substrate to be vapor-deposited overlaps with the target area of the alignment marking area. In this way, the light emitted by the arc light source 30 can be specifically irradiated to the target area of the alignment marking area to compensate for the brightness of the target area of the alignment marking area.
[0067] In this embodiment, the position of the arc-shaped light source is set to be adjustable, so as to use the arc-shaped light source to illuminate the target area of the alignment mark area to compensate for the brightness of the target area of the alignment mark area.
[0068] For example, the light source assembly 100 is rotatable.
[0069] For example, the first light source 1, the second light source 2, and the third light source 3 are mounted on the same support mechanism. By rotating the support mechanism, the first light source 1, the second light source 2, and the third light source 3 rotate simultaneously. It is understandable that, since the first light source is located in the center and the second light source is a ring light source surrounding the first light source, regardless of how the light source assembly rotates, the brightness provided by the first and second light sources to each area of the alignment marking area remains uniform and constant, provided that the brightness of the first and second light sources themselves does not change.
[0070] In some embodiments, please refer to the reference Figure 3 and Figure 4 The third light source 3 includes multiple arc-shaped light sources 30, and the brightness of different arc-shaped light sources 30 can be adjusted independently.
[0071] For example, when illuminating the alignment marking area of the substrate to be vapor-deposited, multiple arc-shaped light sources 30 can be turned on, and the brightness of at least two arc-shaped light sources 30 can be different.
[0072] For example, when only the first light source 1 and the second light source 2 are used to provide basic illumination for the alignment marking area of the substrate to be vapor-deposited, the alignment marking area includes target areas and non-target areas. The brightness of the target areas is less than that of the non-target areas. The alignment marking area includes multiple target areas with different brightness. In this case, multiple curved light sources can be used to compensate for the brightness of multiple target areas with different brightness. Since the brightness of different curved light sources can be adjusted independently, the brightness of different curved light sources can be controlled to provide targeted brightness compensation for multiple target areas with different brightness.
[0073] Understandably, the ability to independently adjust the brightness of different curved light sources 30 can prevent mutual interference between them.
[0074] For example, such as Figure 3 As shown, multiple arc-shaped light sources 30 form a ring surrounding the first light source 1. For example, the number of arc-shaped light sources 30 is n, where n is greater than 1, and one arc-shaped light source 30 occupies an average of 1 / n of the arc.
[0075] As an example, the third light source includes four curved light sources 30. Exemplarily, the brightness of each of the four curved light sources 30 can be adjusted independently.
[0076] Understandably, the more curved light sources there are, the higher the precision of brightness compensation for the alignment marking area. However, the more curved light sources there are, the higher the control complexity.
[0077] In this embodiment, the number of arc-shaped light sources is set to four, which can meet the brightness compensation requirements in most cases without making the control too complicated.
[0078] Of course, the number of curved light sources can also be set to other values according to needs.
[0079] For example, multiple curved light sources 30 are located on the same horizontal axis. For instance, multiple curved light sources 30 are mounted on the same support mechanism, allowing the multiple curved light sources to rotate.
[0080] For example, the number of third light-emitting elements 31 in each of the arc light sources 30 may be the same.
[0081] As an example, the light rays emitted by different curved light sources 30 have the same angle with the same horizontal plane.
[0082] As another example, the light emitted by at least two curved light sources 30 has different angles relative to the same horizontal plane. This allows for independent adjustment of the angles of the light emitted by the different curved light sources 30. For instance, during the fabrication of the light source assembly, the mounting angle of the third light-emitting element 31 within each of the different curved light sources 30 can be adjusted to achieve different angles between the light emitted by at least two curved light sources 30 and the same horizontal plane.
[0083] As another example, the angle of the light emitted by at least one curved light source 30 is adjustable. For example, in a first operating condition, the angle of the light emitted by at least one curved light source 30 is adjusted to a first angle; in a second operating condition, the angle of the light emitted by at least one curved light source 30 is adjusted to a second angle. In this example, the adjustable angle of the curved light source 30 allows for flexible brightness compensation to meet different operating conditions.
[0084] It is understandable that as long as the angle of the light emitted by at least one arc-shaped light source 30 can be adjusted, this application does not limit the specific implementation method of the adjustable angle of the light emitted by at least one arc-shaped light source 30.
[0085] In some embodiments, such as Figure 4 As shown, the arc-shaped light source 30 includes multiple third light-emitting elements 31, and the multiple third light-emitting elements 31 in the same arc-shaped light source 30 are lit and turned off at the same time.
[0086] In other words, multiple third light-emitting elements 31 within the same arc-shaped light source 30 can be turned on simultaneously, and multiple third light-emitting elements 31 within the same arc-shaped light source 30 can be turned off simultaneously.
[0087] For example, when it is necessary to use a certain arc-shaped light source 30 for brightness compensation, multiple third light-emitting elements 31 in the arc-shaped light source 30 can be turned on at the same time to provide brightness compensation to the alignment mark area. After the image acquisition is completed, the multiple third light-emitting elements 31 in the arc-shaped light source 30 can be turned off at the same time to stop providing brightness compensation to the alignment mark area.
[0088] It should be noted that the brightness of different curved light sources 30 can be adjusted independently, and the third light-emitting element 31 in different curved light sources 30 can be turned on or off independently.
[0089] In some embodiments, such as Figure 3 As shown, the third light source 3 is located on the side of the second light source 2 that is away from the first light source 1.
[0090] The first light source 1 and the second light source 2 provide basic illumination to the alignment marking area of the substrate to be vapor-deposited. The first light source 1 and the second light source 2 are located on the inner side, and the third light source 3 is located on the outermost side. This ensures that the first light source 1 and the second light source 2 can provide sufficient basic illumination to the alignment marking area to meet the basic image acquisition requirements.
[0091] For example, if there is no unevenness in the alignment mark area of the substrate to be vapor-deposited, it is not necessary to turn on the third light source. Only the first light source 1 and the second light source 2 are used to provide basic illumination to the alignment mark area of the substrate to be vapor-deposited. In this case, there will be no unevenness in the brightness of the acquired image corresponding to the alignment mark area.
[0092] When the alignment marking area of the substrate to be vapor-deposited is uneven, the first light source 1 and the second light source 2 provide basic illumination to the alignment marking area of the substrate to be vapor-deposited, and the third light source 3 illuminates the target area of the alignment marking area to compensate for the brightness of the target area, so that the brightness of each area of the alignment marking area tends to be uniform.
[0093] For example, such as Figure 3 As shown, the light-emitting area of the first light-emitting element 11 is greater than that of the second light-emitting element 21, and the light-emitting area of the first light-emitting element 11 is greater than that of the third light-emitting element 31.
[0094] The light source formed by the first light-emitting element 11 is a central coaxial light source. The light-emitting area of the first light-emitting element 11 is relatively large, which enables the central coaxial light source to provide clear and uniform illumination. This allows the positioning system of the vapor deposition equipment to accurately detect the position of the alignment mark, thereby improving the alignment accuracy between the mask and the substrate to be vapor-deposited and ensuring the accuracy of the vapor deposition pattern.
[0095] For example, the first light-emitting element 11, the second light-emitting element 21 and the third light-emitting element 31 include, but are not limited to, LED light-emitting elements.
[0096] For example, the light-emitting area of the second light-emitting element 21 is equal to the light-emitting area of the third light-emitting element 31.
[0097] For example, the light-emitting areas of the multiple second light-emitting elements 21 are equal.
[0098] For example, the light-emitting areas of the plurality of third light-emitting elements 31 are equal.
[0099] In some embodiments, please refer to the reference Figure 3 and Figure 5 The second light source 2 includes multiple ring light sources 20, which are arranged sequentially away from the first light source 1.
[0100] For example, the second light source 2 includes two annular light sources 20 arranged sequentially away from the first light source 1. Of course, the number of annular light sources can also be set to other values according to actual needs.
[0101] In this embodiment, multiple ring light sources can provide better basic lighting to the alignment marking area.
[0102] For example, the second light-emitting elements 21 in different ring light sources 20 have the same light-emitting area and the same size. It is understood that in this case, the ring light source 20 that is farther away from the first light source 1 includes more second light-emitting elements 21.
[0103] For example, multiple ring light sources 20 can be turned on or off simultaneously. For instance, during image acquisition, multiple second light-emitting elements 21 within multiple ring light sources 20 can be turned on simultaneously; when illumination is not required, multiple second light-emitting elements 21 within multiple ring light sources 20 can be turned off simultaneously, thereby reducing the complexity of control.
[0104] For example, the brightness of the first light source 1, the second light source 2, and the third light source 3 can be adjusted independently to avoid mutual interference between different light sources and ensure the image acquisition effect.
[0105] In some embodiments, such as Figure 6 As shown, the image acquisition device 600 also includes a capturing unit 400, which is used to capture images of the alignment mark area.
[0106] For example, the imaging unit 400 includes, but is not limited to, a charge-coupled device (CCD) camera.
[0107] For example, the imaging unit and the light source assembly may be arranged on the same axis. For instance, the orthographic projections of the imaging unit and the light source assembly on the substrate to be vapor-deposited at least partially overlap.
[0108] For example, the light source assembly may be located between the imaging unit and the substrate to be vapor-deposited. The image acquisition device also includes a reflector, etc., so that the imaging unit can acquire an image of the alignment mark area on the substrate to be vapor-deposited.
[0109] For example, such as Figure 6 As shown, the image acquisition device also includes a processor 500, which is used to acquire images captured by the imaging unit 400 and determine whether to turn on the third light source 3 based on the images.
[0110] The processor 500 is communicatively connected to the imaging unit 400. When it is determined that the third light source needs to be turned on, the processor 500 can send a control signal to the corresponding controller, and the controller will turn on the third light source based on the corresponding control signal.
[0111] For example, the processor 500 is further configured to determine whether the position of the third light source needs to be adjusted when it is determined that the third light source needs to be turned on, and if the position of the third light source needs to be adjusted, send a control signal to the corresponding controller, and the controller adjusts the position of the third light source based on the corresponding control signal.
[0112] In this embodiment, the imaging unit can capture images of the alignment marking area, and the processor can determine whether to turn on the third light source based on the images captured by the imaging unit. Then, brightness compensation is only performed when brightness compensation is required to ensure the accuracy of compensation, improve the image acquisition effect, and thus improve the alignment capability of the vapor deposition equipment and improve the vapor deposition effect.
[0113] Based on the same technical concept, embodiments of this application also provide a vapor deposition apparatus. For example... Figure 7 As shown, the vapor deposition equipment 700 includes an image acquisition device 600, which is the image acquisition device provided in any of the above embodiments.
[0114] According to the vapor deposition equipment provided in the embodiments of this application, the vapor deposition equipment includes an image acquisition device, which includes a first light source, a second light source, and a third light source. The ring light source in the first and second light sources can provide basic illumination for the alignment marking area. Under the illumination of the first and second light sources, if there is a non-target area and a target area that are bright and dark in the alignment marking area, the arc light source in the third light source can specifically compensate for the brightness of the darker target area to improve the uneven illumination of the alignment marking area. This makes the brightness of the acquired image of the alignment marking area consistent, improves the image acquisition effect of the alignment marking area, and thus improves the alignment capability of the vapor deposition equipment and improves the vapor deposition effect.
[0115] Based on the same technical concept, embodiments of this application also provide an image acquisition method for use with the image acquisition device in any of the above embodiments. For example... Figure 8 As shown, the image acquisition method provided in this application embodiment includes S801 to S804:
[0116] S801, light is emitted towards the alignment marking area of the substrate to be vapor-deposited through the first light source and the second light source;
[0117] S802, the first image of the alignment mark area is captured by the imaging unit of the image acquisition device;
[0118] S803, based on the first image, if it is determined that the alignment marking area includes a target area and a non-target area, light is emitted towards the target area through at least one arc-shaped light source;
[0119] S804 captures a second image of the alignment mark area using the imaging unit; the second image is used for alignment recognition.
[0120] For example, when the substrate to be vapor-deposited includes multiple alignment marking areas, the multiple alignment marking areas and multiple light source components can be arranged in a one-to-one correspondence, and the multiple imaging units and multiple alignment marking areas can be arranged in a one-to-one correspondence. Each light source component is used to illuminate its corresponding alignment marking area, and each imaging unit is used to photograph its corresponding alignment marking area. In this way, multiple light source components can be used to illuminate multiple alignment marking areas simultaneously, and multiple imaging units can be used to capture images of multiple alignment marking areas, thereby improving image acquisition efficiency. In addition, compared to using one imaging unit and one light source component to illuminate and photograph multiple alignment marking areas, this embodiment does not require moving the imaging unit and light source component from one alignment marking area to another, which also improves image acquisition efficiency from this perspective.
[0121] For example, the first light source and the second light source are turned on. The brightness of the first light source and the second light source can be adjusted independently, so the brightness of the first light source and the second light source can be controlled as needed.
[0122] For example, the imaging unit captures a first image of the alignment marking area and uploads the first image to the processor. The processor determines whether the alignment marking area includes a target area and a non-target area based on the brightness of each point in the first image. For instance, if some areas in the first image have higher brightness and some areas have lower brightness, it can be determined whether the alignment marking area includes a target area and a non-target area. The areas with lower brightness in the first image correspond to the target area of the alignment marking area, and the areas with higher brightness in the first image correspond to the non-target area of the alignment marking area.
[0123] For example, the processor determines a brightness threshold based on the average brightness of each point in the first image, and defines the area where the brightness is greater than the brightness threshold as a brighter area, and the area where the brightness is less than the brightness threshold as a darker area.
[0124] If the alignment marking area is determined to include both the target area and the non-target area, light is emitted towards the target area through at least one arc-shaped light source. Here, the light from the arc-shaped light source does not need to illuminate the non-target area.
[0125] According to the image acquisition method provided in the embodiments of this application, the ring light source in the first and second light sources can provide basic illumination for the alignment marking area, and a first image is obtained by the imaging unit. Based on the first image, if there is a non-target area and a target area with uneven brightness in the alignment marking area, the arc light source in the third light source can be used to specifically compensate for the brightness of the darker target area. Then, a second image is obtained by the imaging unit. The second image is used for alignment recognition. The third light source improves the uneven brightness phenomenon of the alignment marking area being illuminated, so that the brightness of the second image of the acquired alignment marking area is consistent, thereby improving the image acquisition effect of the alignment marking area, and thus improving the alignment capability of the vapor deposition equipment and improving the vapor deposition effect.
[0126] In some embodiments, emitting light toward a target area via at least one arc-shaped light source includes:
[0127] Rotate the light source assembly to align at least one arc-shaped light source with the target area, and emit light into the target area through the arc-shaped light source aligned with the target area.
[0128] If the third light source is not aligned with the target area, the system can be switched to the light source assembly so that at least one curved light source is aligned with the target area. In this way, the curved light source aligned with the target area can specifically compensate for the brightness of the target area.
[0129] For example, aligning the third light source with the target area includes: the orthographic projection of the third light source on the substrate to be vaporized at least partially overlapping the target area.
[0130] For example, the image acquisition method provided in this application embodiment further includes:
[0131] Based on the first image, and assuming that the brightness of the alignment marking area is uniform, the third light source remains in a non-emitting state, and the first image is used for alignment recognition.
[0132] If the alignment marking area is uniformly illuminated by the first and second light sources, there is no need to activate the third light source, and the first image can be directly used for alignment recognition. In this example, when brightness compensation is not required, not activating the third light source saves power and improves production efficiency.
[0133] The embodiments described above are not exhaustive, nor do they limit the application to the specific embodiments described herein. Clearly, many modifications and variations can be made based on the above description. These embodiments are selected and specifically described in this specification to better explain the principles and practical applications of this application, thereby enabling those skilled in the art to effectively utilize this application and its modifications. This application is limited only by the claims and their full scope and equivalents.
Claims
1. An image acquisition device, characterized in that, The image acquisition device is used to acquire images of the alignment marking area of the substrate to be vapor-deposited, and the image acquisition device includes: A light source assembly, the light source assembly being used to emit light toward the alignment marking area of the substrate to be vapor-deposited; The light source assembly includes a first light source, a second light source, and a third light source; The first light source includes a first light-emitting element; The second light source includes at least one ring light source, the ring light source includes a plurality of second light-emitting elements, and the plurality of second light-emitting elements in the ring light source are arranged around the first light source; The third light source includes at least one arc-shaped light source, the arc-shaped light source includes at least one third light-emitting element, and the third light-emitting element in the arc-shaped light source is arranged around a portion of the first light source; When the alignment marking area includes a target area and a non-target area, the arc-shaped light source is used to emit light towards the target area to compensate for the brightness of the target area. Before the brightness of the target area is compensated, the brightness of the target area is less than the brightness of the non-target area.
2. The image acquisition device according to claim 1, characterized in that, The relative position of the arc-shaped light source and the alignment marking area is adjustable; Preferably, the light source assembly is rotatable.
3. The image acquisition device according to claim 1 or 2, characterized in that, The third light source includes multiple arc-shaped light sources, and the brightness of different arc-shaped light sources can be adjusted independently; Preferably, the plurality of the arc-shaped light sources form a ring surrounding the first light source; Preferably, the plurality of the arc-shaped light sources are located on the same horizontal axis; Preferably, the third light source includes four of the arc-shaped light sources; Preferably, the number of the third light-emitting elements in the different arc-shaped light sources is the same; Preferably, the light rays emitted by at least two of the arc-shaped light sources have different angles with the same horizontal plane; Preferably, the angle of light emitted by at least one of the arc-shaped light sources is adjustable.
4. The image acquisition device according to claim 1 or 2, characterized in that, The arc-shaped light source includes multiple third light-emitting elements, and the multiple third light-emitting elements within the same arc-shaped light source can be lit and turned off simultaneously.
5. The image acquisition device according to claim 1 or 2, characterized in that, The third light source is located on the side of the second light source that is furthest from the first light source; Preferably, the light-emitting area of the first light-emitting element is greater than the light-emitting area of the second light-emitting element, and the light-emitting area of the first light-emitting element is greater than the light-emitting area of the third light-emitting element; Preferably, the light-emitting area of the second light-emitting element is equal to the light-emitting area of the third light-emitting element.
6. The image acquisition device according to claim 1 or 2, characterized in that, The second light source includes a plurality of the ring light sources, which are arranged sequentially away from the first light source; Preferably, multiple ring light sources are lit or turned off simultaneously.
7. The image acquisition device according to claim 1 or 2, characterized in that, The image acquisition device further includes a shooting unit, which is used to capture an image of the alignment mark area; Preferably, the image acquisition device further includes a processor, which is used to acquire the image captured by the imaging unit and determine whether to turn on the third light source based on the image.
8. A vapor deposition apparatus, characterized in that, Includes the image acquisition device as described in any one of claims 1-7.
9. An image acquisition method, characterized in that, The method, used in an image acquisition apparatus as described in any one of claims 1-7, comprises: Light is emitted towards the alignment marking area of the substrate to be vapor-deposited through the first light source and the second light source; The first image of the alignment mark area is captured by the imaging unit of the image acquisition device; Based on the first image, if it is determined that the alignment marking area includes a target area and a non-target area, light is emitted toward the target area through at least one of the arc-shaped light sources; The imaging unit captures a second image of the alignment marking area, and the second image is used for alignment recognition.
10. The method according to claim 9, characterized in that, Emitting light toward the target area through at least one of the said arc-shaped light sources includes: The light source assembly is rotated so that at least one of the arc-shaped light sources is aligned with the target area, and light is emitted towards the target area through the arc-shaped light source aligned with the target area; Preferably, the method further includes: Based on the first image, and assuming that the brightness of the alignment marking area is uniform, the third light source remains in a non-emitting state, and the first image is used for alignment recognition.