Strip photoetching system and photoetching method thereof

Abstract

The application provides a strip photoetching system and a photoetching method. The strip photoetching system comprises an unwinding unit, a calibration unit, an exposure assembly and a winding unit. The unwinding unit comprises an unwinding roller, an upstream tension roller and a plurality of upstream guide rollers. The calibration unit is used for detecting and calibrating the exposure position of the strip. The exposure assembly comprises an exposure part and at least two worktables. The exposure part is used for exposing the exposure position of the strip. The at least two worktables are used for holding part of the strip, and are arranged on a liftable rack and can reciprocate along the conveying direction of the strip. The at least two worktables comprise a first worktable, which is located upstream of the remaining worktables. In working, the return speed of the first worktable is greater than that of the other worktables. The winding unit is located downstream of the unwinding unit and comprises a winding roller, a downstream tension roller and a plurality of downstream guide rollers. The calibration unit and the exposure assembly are located between the unwinding unit and the winding unit.

Description

Technical Field

[0001] This application relates to the field of photolithography technology, specifically to a strip photolithography system and its photolithography method. Background Technology

[0002] The production processes of flexible printed circuits (FPCs), touch screens, and solar cells typically involve photolithography of the strip material.

[0003] To improve production efficiency, during photolithography, the strip is usually wound onto a winding machine so that the parts to be exposed are calibrated by the calibration unit and then wound after photolithography in the exposure unit, which can achieve automated continuous exposure.

[0004] However, during the above process, there is a possibility that abrasion marks may occur on the strip. Summary of the Invention

[0005] In view of this, this application provides a strip lithography system and a lithography method thereof to solve the problem of scratches being generated on the strip during the exposure process.

[0006] In a first aspect, embodiments of this application provide a strip lithography system, which includes an unwinding unit, a calibration unit, an exposure assembly, and a rewinding unit. The unwinding unit includes an unwinding roller, an upstream tension roller, and multiple upstream guide rollers. The multiple upstream guide rollers are located downstream of the unwinding roller, and the upstream tension roller is located between the multiple upstream guide rollers. The unwinding roller is used to supply strip material. The calibration unit is used to detect and calibrate the exposed portions of the strip. The exposure assembly includes an exposure section and at least two worktables. The exposure section is used to expose the exposed portions of the strip. The at least two worktables are used to hold portions of the strip material and are mounted on a liftable platform and are capable of reciprocating along the conveying direction of the strip material. The at least two worktables include a first worktable, which is located upstream of the other worktables. During operation, the return speed of the first worktable is greater than the return speed of the other worktables. The rewinding unit is located downstream of the unwinding unit and includes a rewinding roller, a downstream tension roller, and multiple downstream guide rollers. Multiple downstream guide rollers are located upstream of the take-up roller, and a downstream tension roller is located between the multiple downstream guide rollers. The take-up roller is used to receive the strip. The calibration unit and exposure assembly are located between the unwinding unit and the take-up unit.

[0007] In conjunction with the first aspect described above, in one possible implementation, at least two worktables further include a second worktable, and the first and second worktables are detachably connected.

[0008] In conjunction with the first aspect above, in one possible implementation, the first worktable and the second worktable can be electromagnetically connected.

[0009] In conjunction with the first aspect described above, in one possible implementation, a first guide portion is provided on the side of the first worktable opposite to the second worktable, and a second guide portion is provided on the side of the second worktable opposite to the first worktable. When the first worktable and the second worktable are docked together, the first guide portion and the second guide portion gradually engage with each other to align the first worktable and the second worktable.

[0010] In conjunction with the first aspect described above, in one possible implementation, the first guide portion is a plurality of grooves, and the second guide portion is a plurality of protrusions.

[0011] In conjunction with the first aspect described above, in one possible implementation, at least one of the first worktable and the second worktable is provided with a clamping part, which is detachably connected to the first worktable and the second worktable.

[0012] In conjunction with the first aspect described above, in one possible implementation, the clamping part includes a first clamping part and a second clamping part, wherein the first clamping part is detachably connected to the first worktable, and the second clamping part is detachably connected to the second worktable.

[0013] In conjunction with the first aspect above, in one possible implementation, the upstream tension roller and the downstream tension roller are hollow structures, and each is provided with an air inlet and an air outlet.

[0014] In conjunction with the first aspect above, in one possible implementation, the upstream tension roller and the downstream tension roller are retractable.

[0015] Secondly, embodiments of this application provide a lithography method for a strip lithography system. The strip lithography system includes an unwinding unit, a calibration unit, an exposure assembly, and a winding unit. The winding unit is located downstream of the unwinding unit, and the calibration unit and the exposure assembly are located between the unwinding unit and the winding unit. The exposure assembly includes an exposure section and at least two worktables. The at least two worktables include a first worktable, which is located upstream of the other worktables. During operation, the return speed of the first worktable is greater than the return speed of the other worktables. The lithography method includes: the calibration unit calibrating the exposure information based on the acquired detection information; the exposure section lithographically imprinting a pattern onto the exposed portion of the strip based on the calibrated exposure information; after exposure, the first worktable separates from the strip and returns at a first speed, while the other worktables continue to hold a portion of the strip and return at a second speed for a first distance, the first speed being greater than the second speed; the second worktable releases the workpiece, then returns and connects to the first worktable.

[0016] According to the technical solution of the embodiments of this application, the strip lithography system includes at least two worktables. After exposure, the first worktable releases the strip and returns to its original position at a first speed, while the second worktable continues to hold a portion of the strip and returns with the strip at a second speed for a first distance. This avoids the problems of high return speeds when the worktables and strip return at the same speed, which can easily cause slippage at the upstream and downstream tension rollers, resulting in scratches and wear on the strip; or low return speeds where the return distance of the worktable is greater than the return distance of the strip, requiring the worktable to release the strip after it returns to the desired position and then return a certain distance, leading to relatively cumbersome operation and reduced production efficiency. Attached Figure Description

[0017] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly described below. It should be understood that the drawings only show some embodiments of this application and should not be considered as a limitation of the scope. It should also be understood that the same or similar reference numerals are used in the drawings to represent the same or similar elements. Furthermore, it should be understood that the drawings are merely schematic, and the dimensions and scale of the elements in the drawings are not necessarily precise.

[0018] Figure 1 This is a schematic diagram of a strip lithography system provided according to an embodiment of this application.

[0019] Figure 2 This is a schematic diagram of a workbench holding a strip according to an embodiment of this application.

[0020] Figure 3 This is a schematic diagram of another workbench clamping strip according to one embodiment of this application.

[0021] Figure 4 This is a schematic diagram of the connection state of a workbench provided according to an embodiment of this application.

[0022] Figure 5 This is a schematic diagram of the workbench in a separated state according to an embodiment of this application.

[0023] Figure 6 This is a schematic flowchart of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0024] Figure 7 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0025] Figure 8 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0026] Figure 9This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0027] Figure 10 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0028] Figure 11 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0029] Figure 12 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0030] Figure 13 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0031] Figure 14 This is a schematic diagram of a photolithography method for a strip photolithography system according to an embodiment of this application.

[0032] Figure label: 100. Strip lithography system; 10. Unwinding unit; 11. Unwinding roll; 12. Upstream tension roll; 13. Upstream guide roll; 20. Calibration unit; 21. Camera; 30. Exposure assembly; 31. Exposure unit; 32. Worktable; 32a. First worktable; 32a1. First guide / groove; 32b. Second worktable; 32b1. Second guide / protrusion; 33. Liftable platform; 34. Track; 35. Base; 36. Clamping part; 36a. First clamping part; 36b. Second clamping part; 40. Rewinding unit; 41. Rewinding roll; 42. Downstream tension roll; 43. Downstream guide roll; 50. Strip material. Detailed Implementation

[0033] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application are within the scope of protection of this application.

[0034] Furthermore, to better illustrate this application, numerous specific details are provided in the following detailed embodiments. Those skilled in the art should understand that this application can be implemented even without certain specific details. In some instances, methods and means well-known to those skilled in the art have not been described in detail in order to highlight the main points of this application.

[0035] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0036] Furthermore, the terms "first" and "second" are used only to distinguish descriptions and should not be interpreted as indicating or implying relative importance.

[0037] For ease of description, a first direction X, a second direction Y, and a third direction Z are defined herein and illustrated in the accompanying drawings. Exemplarily, the first direction X can be the conveying direction of the strip, the second direction Y can be the width direction of the strip, and the third direction Z can be a direction perpendicular to the first direction X and the second direction Y. In this document, upstream and downstream are relative to the winding direction of the strip.

[0038] The production processes of flexible printed circuits (FPCs), touch screens, and solar cells typically involve photolithography of the strip material.

[0039] To improve production efficiency, during photolithography, the strip is usually wound onto a winding machine so that the parts to be exposed are calibrated by the calibration unit and then wound after photolithography in the exposure unit, which can achieve automated continuous exposure.

[0040] However, during the above process, scratches may occur on the strip. For example, when the strip returns after exposure, if the worktable returns at the same speed as the strip, a higher return speed can easily cause slippage at the upstream and downstream tension rollers, resulting in scratches and wear on the strip. If the return speed is lower, because the return distance of the worktable is greater than the return distance of the strip, the worktable needs to release the strip after it returns to the desired position and then return a certain distance, which is relatively cumbersome and affects production efficiency.

[0041] To address the aforementioned technical problems, embodiments of this application provide a strip lithography system and a lithography method thereof.

[0042] Below, in conjunction with Figures 1 to 14 The present application describes the strip lithography system and lithography method provided in the embodiments of this application.

[0043] Exemplary strip lithography system

[0044] refer to Figure 1 In a first aspect, embodiments of this application provide a strip lithography system 100, which may include an unwinding unit 10, a calibration unit 20, an exposure assembly 30, and a winding unit 40.

[0045] The unwinding unit 10 may include an unwinding roll 11, an upstream tension roll 12, and a plurality of upstream guide rolls 13, the plurality of upstream guide rolls 13 being located downstream of the unwinding roll 11, and the upstream tension roll 12 being located between the plurality of upstream guide rolls 13. For example, the plurality of upstream guide rolls 13 may include two upstream guide rolls 13, and the upstream tension roll 12 may be located between the two upstream guide rolls 13. The unwinding roll 11 is used to provide the strip 50, that is, the strip 50 is released from the unwinding roll 11 for subsequent exposure.

[0046] The calibration unit 20 is used to detect and calibrate the exposed areas of the strip 50. In one example, the calibration unit 20 may include an image acquisition device, such as a camera 21. The camera 21 may be located upstream of the exposure section 31 and acquires the position information of the strip 50 by photographing calibration marks (not shown in the figure) set on the strip 50. For example, the calibration marks may be photographed during the conveying process of the strip 50 for calibration of the exposure pattern and exposure position. Specific processes and operations can be referred to conventional techniques in the art and will not be described in detail here.

[0047] The exposure assembly 30 includes an exposure unit 31 and at least two work stages 32. The exposure unit 31 is used to expose the exposure areas of the strip 50. Exemplarily, the exposure unit 31 may include a light source, an optical system, and an exposure head, etc., and its specific structure and connection can refer to conventional settings in the art, which will not be described in detail here.

[0048] At least two worktables 32 are used to hold a portion of the strip 50, for example, by vacuum adsorption or adsorption plate adsorption, to prevent the strip 50 from shifting or wrinkling. Specific adsorption structures can refer to conventional settings in the art and will not be described in detail here. The at least two worktables 32 are mounted on a liftable platform 33 and are capable of reciprocating along the conveying direction of the strip 50. The at least two worktables 32 include a first worktable 32a, which is located upstream of the other worktables 32. During operation, the return speed of the first worktable 32a is greater than the return speed of the other worktables 32. Exemplarily, the strip lithography system 100 may include a base 35, on which a track 34 is arranged along the conveying direction of the strip 50, and the liftable platform 33 can reciprocate along the track 34. The specific structure and connection relationship of the base 35, track 34, and liftable platform 33 can refer to conventional settings in the art and will not be described in detail here.

[0049] The take-up unit 40 is located downstream of the unwinding unit 10 and includes a take-up roller 41, a downstream tension roller 42, and a plurality of downstream guide rollers 43. The plurality of downstream guide rollers 43 are located upstream of the take-up roller 41, and the downstream tension roller 42 is located between the plurality of downstream guide rollers 43. For example, the plurality of downstream guide rollers 43 may include two downstream guide rollers 43, with the downstream tension roller 42 located between the two downstream guide rollers 43. The take-up roller 41 is used to receive the strip 50; that is, the strip 50 after exposure can be wound onto the take-up roller 41.

[0050] The calibration unit 20 and the exposure assembly 30 can be located between the unwinding unit 10 and the winding unit 40.

[0051] In one example, the take-up roller 41 and the unwind roller 11 may each be provided with a drive mechanism (not shown in the figure) to drive the take-up roller 41 and the unwind roller 11 to rotate and achieve winding or take-up of the strip 50. The specific structure of the drive mechanism can refer to the conventional configuration in the art, and will not be described in detail here.

[0052] In one example, the upstream guide roller 13 and the downstream guide roller 43 can rotate to achieve the conveying and guiding of the strip 50.

[0053] In one example, the upstream tension roller 12 and the downstream tension roller 42 can be raised, lowered, and rotated to cushion and convey the strip 50 while providing tension to prevent the strip 50 from slack.

[0054] In one example, a position sensor (not shown in the figure) for detecting the end face position of the strip 50 can be provided on one side of the unwinding unit 10 to monitor and correct the end face position of the strip 50 based on the end face position obtained by the position sensor. Specific details regarding the detection and control of the single-sided position can be found in conventional techniques in the art and will not be elaborated here.

[0055] According to the technical solution of the embodiments of this application, the strip lithography system 100 is provided with at least two worktables 32. After exposure, the first worktable 32a releases the strip 50 and returns to its original position at a first speed, while the second worktable 32b continues to hold part of the strip 50 and returns with the strip 50 at a second speed for a first distance. In this way, it can avoid the problems of the worktable 32 and the strip 50 returning at the same speed, where the return speed is high and slippage at the upstream and downstream tension rollers can easily cause scratches and wear on the strip 50, or the worktable 32 returning at a low speed, where the return distance is greater than the return distance of the strip 50, requiring the worktable 32 to release the strip 50 after it returns to the desired position and then return a certain distance, which is relatively cumbersome and affects production efficiency.

[0056] refer to Figures 1 to 5At least two worktables 32 also include a second worktable 32b, and the first worktable 32a and the second worktable 32b are detachably connected. For example, the first worktable 32a and the second worktable 32b can be electromagnetically connected. In one example, one of the first worktable 32a and the second worktable 32b has a built-in magnet, and the other is provided with an electromagnetic coil. When the electromagnetic coil is energized, the first worktable 32a and the second worktable 32b are connected; when the electromagnetic coil is disconnected, they are separated. In another example, the first worktable 32a and the second worktable 32b are each provided with an electromagnetic coil. The connection or separation of the first worktable 32a and the second worktable 32b is achieved by controlling the electromagnetic repulsion or attraction of the electromagnetic coils through an electrical signal.

[0057] In an alternative embodiment, the first worktable 32a and the second worktable 32b can also be connected by a mechanical connection structure. For example, one of them is provided with a snap-fit ​​shaft, and the other is provided with a hydraulic or pneumatic chuck. The connection between the first worktable 32a and the second worktable 32b is achieved by driving the chuck to engage or disengage with the snap-fit ​​shaft.

[0058] refer to Figure 4 and Figure 5 A first guide portion 32a1 may be provided on the side of the first worktable 32a opposite to the second worktable 32b, and a second guide portion 32b1 may be provided on the side of the second worktable 32b opposite to the first worktable 32a. When the first worktable 32a and the second worktable 32b are connected to each other, the first guide portion 32a1 and the second guide portion 32b1 gradually engage with each other to align the first worktable 32a and the second worktable 32b.

[0059] In this way, when the first worktable 32a and the second worktable 32b are docked, the first guide part 32a1 and the second guide part 32b1 can guide the first worktable 32a and the second worktable 32b to align and connect, thus avoiding misalignment.

[0060] Continue to refer to Figure 4 and Figure 5 The first guide portion 32a1 can be a plurality of grooves 32a1, and the second guide portion 32b1 can be a plurality of protrusions 32b1. Alternatively, the first guide portion 32a1 can be a plurality of grooves 32a1, and the second guide portion 32b1 can be a plurality of protrusions 32b1. The plurality of grooves 32a1 and the plurality of protrusions 321 can be evenly distributed along the second direction Y.

[0061] In conjunction with the first aspect described above, in one possible implementation, at least one of the first worktable 32a and the second worktable 32b is provided with a clamping part 36, which is detachably connected to the first worktable 32a and the second worktable 32b.

[0062] Return to reference Figure 3 The clamping part 36 may include a first clamping part 36a and a second clamping part 36b. The first clamping part 36a may be detachably connected to the first worktable 32a, and the second clamping part 36b may be detachably connected to the second worktable 32b. The detachable connection method can refer to the implementation method of the first worktable 32a and the second worktable 32b described above, and will not be repeated here.

[0063] In this way, the first worktable 32a and the second worktable 32b are respectively provided with the first clamping part 36a and the second clamping part 36b, which can be operated separately. This avoids the need to separate from the first worktable 32a and the second worktable 32b and then connect to the second worktable 32b when returning if only one clamping part 36 is provided, thus simplifying the operation steps.

[0064] In some embodiments, the upstream tension roller 12 and the downstream tension roller 42 can be hollow structures, and each is provided with an air inlet and an air outlet (not shown in the figure). In this way, when returning, a high-pressure gas supply device, such as an air pump or a high-pressure gas cylinder, can be connected through the air inlet to supply gas. Then the gas can be discharged through the air outlet to create an air gap between the tension roller and the strip 50 when the strip 50 returns after exposure. This provides tension while preventing the tension roller from contacting the strip 50, thereby avoiding accidental scratches on the strip 50.

[0065] In some embodiments, the upstream tension roller 12 and the downstream tension roller 42 are retractable, that is, the upstream tension roller 12 and the downstream tension roller 42 are retractable relative to the strip 50, so as to avoid the strip 50 from contacting the upstream tension roller 12 and the downstream tension roller 42 when the strip 50 returns after exposure, thereby avoiding accidental scratches on the strip 50. This retractable configuration can be achieved by lifting or rotating the tension rollers relative to the strip 50, for example, by providing a corresponding lifting drive mechanism or rotation mechanism.

[0066] Exemplary photolithography method

[0067] Secondly, embodiments of this application provide a lithography method for a strip lithography system 100, which can be used in the aforementioned strip lithography system 100. (See reference...) Figure 6 The photolithography method includes:

[0068] S101: The calibration unit 20 calibrates the exposure information based on the acquired detection information.

[0069] S102: The exposure unit 31 applies a pattern to the exposure area of ​​the strip 50 based on the calibrated exposure information.

[0070] S103: After the exposure is completed, the first stage 32a separates from the strip 50 and returns at a first speed, while the remaining stages 32 continue to hold a portion of the strip 50 and return at a second speed for a first distance (for example, the stages 32 continue to hold a portion of the strip 50 and return to the calibration position at the start of the next exposure of the strip 50). The first speed is greater than the second speed.

[0071] S104: The second worktable 32b releases the strip 50, then returns and connects to the second worktable 32b.

[0072] The structural description of the strip lithography system 100 can be found above and will not be repeated here.

[0073] According to the technical solution of the embodiments of this application, after exposure, the first worktable 32a releases the strip 50 and returns to its original position at a first speed, while the second worktable 32b continues to hold a portion of the strip 50 and returns with the strip 50 at a second speed for a first distance. This avoids the problems of the worktable 32 and the strip 50 returning at the same speed, where a high return speed can easily cause slippage at the upstream and downstream tension rollers, resulting in scratches and wear on the strip 50; or, when the return speed is low, because the return distance of the worktable 32 is greater than the return distance of the strip 50, the worktable 32 needs to release the strip 50 after it returns to the desired position and then return a certain distance, which is relatively cumbersome and affects production efficiency.

[0074] Below, in conjunction with Figures 7 to 14 The photolithography method and the working process of the strip photolithography system 100 of this application are further described in detail. In the figure, the arrows near the strip 50 represent the direction of movement of the strip 50. A is the exposure start position, and B is the exposure end position.

[0075] First, step S1: as Figure 7 As shown, the strip 50 is sequentially placed on the winding roll, and after passing through the upstream guide roll 13, the upstream tension roll 12, the downstream guide roll 43, and the downstream tension roll 42, it is fixed to the take-up roll 41.

[0076] Next, in step S2: the automatic operation of the strip lithography system 100 begins. The first work strip and the second stage 32b, located at the calibration start position, rise to the adsorption position, adsorb one end of the strip 50, and keep it flat. At the same time, the clamping part 36 clamps the strip 50, for example, the clamping part 36 clamps both sides of the strip 50 along the second direction Y.

[0077] Next, step S3: Refer to Figure 8 The unwinding roller 11 rotates under the drive of a rotary drive mechanism (not shown in the figure) to release a specified amount of strip 50. The released strip 50 enters the upstream tension roller 12 via the upstream guide roller 13 for buffering.

[0078] Next, step S4: Refer to Figure 9 The first worktable 32a and the second worktable 32b move horizontally downstream in the X direction, passing under the camera 21 while keeping the strip 50 in place. At the same time, the strip 50 buffered by the upstream tension roller 12 is pulled out and buffered by the downstream tension roller 42.

[0079] Markings can be provided on the strip 50 for calibrating the exposure section 31 based on the exposure pattern. This calibration step can be selected and set as needed. (Continue to refer to...) Figure 9 The camera 21 uses the position information of the strip 50 obtained from the marking to calibrate the strip 50 with the pattern to be exposed. For example, the controller corrects the coordinates of the exposure data used by the exposure unit 31 when exposing (i.e., photolithographically lithographically) the pattern onto the strip 50 based on the received position information of the strip 50. During the exposure data correction process, the first stage 32a and the second stage 32b hold the strip 50 and pause at the exposure start position.

[0080] Step S5: Next, refer to Figure 10 After calibration, the first worktable 32a and the second worktable 32b move downstream along the first direction X. The exposure unit 31 scans and exposes the exposure pattern onto the surface photosensitive layer of the strip 50 held by the first worktable 32a and the second worktable 32b using known exposure techniques until the preset exposure length (i.e. the length of the strip 50 after one exposure) ends. The first worktable 32a and the second worktable 32b then stop moving at the exposure end position.

[0081] Next, step S6: Refer to Figure 11 The first worktable 32a releases the strip 50, separates from the second worktable 32b, and descends. The second worktable 32b and the clamping part 36 still hold the strip 50 (for example, if the second worktable 32b is provided with a separate second clamping part 36b, the first clamping part 36a releases the strip 50; if the first worktable 32a and the second worktable 32b share a clamping part, the clamping part 36 continues to hold the strip 50 and separates from the first worktable 32a), so that the strip 50 is held in the specified position.

[0082] Next, step S7: Refer to Figure 12 The first worktable 32a returns to its initial position at a first speed. The second worktable 32b and the workpiece return by a predetermined amount at a second speed, so that the strip 50 is positioned at the calibration start position after the exposure of one segment (i.e., the end position of the exposure of one segment is at the calibration start position), with the first speed being greater than the second speed. While moving the strip 50, the strip 50 can be calibrated based on feedback from a position sensor (not shown). During the return process, the strip 50 is partially cushioned by the upstream tension roller 12.

[0083] Next, step S8: Refer to Figure 13 When the strip 50 is in the calibration start position after the last segment of the exposed section is completed, the second worktable 32b and the strip 50 stop moving, the second worktable 32b and the clamping part 36 release the strip 50, and then return and descend along the third direction Z to connect with the first worktable 32a.

[0084] In this way, during the return process, the first worktable 32a can return at a relatively fast speed, while the second worktable 32b keeps the strip 50 returning at a lower speed, avoiding slippage of the upstream tension roller 12 and / or the downstream tension roller 42 due to excessive speed, which could cause scratches on the strip 50. When the return amount brings the next exposure start position of the strip 50 to the calibration position, the first worktable 32a and the strip 50 stop moving, the first worktable 32a and the clamping part 36 release the strip 50, and the first worktable 32a descends and can continue to return at a higher speed to connect with the first worktable 32a. This balances production efficiency with preventing slippage of the upstream tension roller 12 and the downstream tension roller 42 that could cause scratches on the strip 50.

[0085] Finally, step S9: Refer to Figure 14 After the first worktable 32a and the second worktable 32b are connected and the strip 50 has finished moving, the first worktable 32a and the second worktable 32b rise to the adsorption position to adsorb the strip 50 of the next exposure segment to keep it flat, and the clamping part 36 clamps the strip 50 of the next exposure segment. At the same time, the upstream drive unwinding roller 11 rotates to release a predetermined amount of strip 50, which is buffered by the upstream tension roller 12, and a certain length of strip 50 is wound by the downstream take-up roller 41.

[0086] Repeat steps S4 to S9 until the strip 50 exposure process is complete.

[0087] It should be noted that, for clarity, not all the structures of the strip lithography system 100 described above are depicted. To achieve their necessary functions, those skilled in the art can configure other structures according to specific application scenarios, and the embodiments of this application do not impose such limitations. Similarly, for clarity, not all of the above-described fabrication processes and techniques are described. To achieve the desired fabrication, those skilled in the art can select fabrication processes and techniques according to specific application scenarios, and the embodiments of this application do not impose such limitations.

[0088] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0089] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications or equivalent substitutions made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A strip lithography system, characterized in that, include: An unwinding unit includes an unwinding roll, an upstream tension roll, and a plurality of upstream guide rolls. The plurality of upstream guide rolls are located downstream of the unwinding roll, and the upstream tension roll is located between the plurality of upstream guide rolls. The unwinding roll is used to provide the strip. A calibration unit is used to detect and calibrate the exposed areas of the strip. An exposure assembly includes an exposure section and at least two worktables. The exposure section is used to expose the exposure portion of the strip. The at least two worktables are used to hold a portion of the strip. The at least two worktables are mounted on a liftable frame and can reciprocate along the conveying direction of the strip. The at least two worktables include a first worktable, which is located upstream of the other worktables. During operation, the return speed of the first worktable is greater than the return speed of the other worktables. A winding unit, located downstream of the unwinding unit, includes a winding roller, a downstream tension roller, and multiple downstream guide rollers. The multiple downstream guide rollers are located upstream of the winding roller, and the downstream tension roller is located between the multiple downstream guide rollers. The winding roller is used to receive the strip material. The calibration unit and the exposure assembly are located between the unwinding unit and the winding unit.

2. The strip lithography system according to claim 1, characterized in that, The at least two worktables also include a second worktable, and the first worktable and the second worktable are detachably connected.

3. The strip lithography system according to claim 2, characterized in that, The first workbench and the second workbench can be electromagnetically connected.

4. The strip lithography system according to claim 2, characterized in that, A first guide portion is provided on the side of the first worktable opposite to the second worktable, and a second guide portion is provided on the side of the second worktable opposite to the first worktable. When the first worktable and the second worktable are connected to each other, the first guide portion and the second guide portion gradually engage with each other to align the first worktable and the second worktable.

5. The strip lithography system according to claim 4, characterized in that, The first guide portion has multiple grooves, and the second guide portion has multiple protrusions.

6. The strip lithography system according to any one of claims 2, characterized in that, At least one of the first worktable and the second worktable is provided with a clamping part, which is detachably connected to the first worktable and the second worktable.

7. The strip lithography system according to claim 6, characterized in that, The clamping part includes a first clamping part and a second clamping part. The first clamping part is detachably connected to the first worktable, and the second clamping part is detachably connected to the second worktable.

8. The strip lithography system according to any one of claims 1 to 7, characterized in that, The upstream tension roller and the downstream tension roller are hollow structures, and each is provided with an air inlet and an air outlet.

9. The strip lithography system according to any one of claims 1 to 7, characterized in that, The upstream tension roller and the downstream tension roller are retractable.

10. A photolithography method for a strip photolithography system, characterized in that, The strip lithography system includes an unwinding unit, a calibration unit, an exposure assembly, and a rewinding unit. The rewinding unit is located downstream of the unwinding unit, and the calibration unit and the exposure assembly are located between the unwinding unit and the rewinding unit. The exposure assembly includes an exposure section and at least two work stages. The at least two work stages include a first work stage, which is located upstream of the other work stages. During operation, the return speed of the first work stage is greater than the return speed of the other work stages. The lithography method includes: The calibration unit calibrates the exposure information based on the acquired detection information; The exposure unit photolithographically prints the pattern onto the exposed area of ​​the strip based on the calibrated exposure information; After exposure, the first worktable separates from the strip and returns at a first speed, while the remaining worktables continue to hold a portion of the strip and return at a second speed for a first distance, the first speed being greater than the second speed; The second worktable releases the strip, then returns and connects to the second worktable.

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