Substrate unidirectional conveying type double-side exposure system and exposure method

Abstract

The application discloses a substrate one-way conveying type double-side exposure system and an exposure method. The exposure system is used for exposing a first surface and a second surface of a substrate. The exposure system comprises a substrate conveying part used for conveying the substrate along a preset path; a first exposure part located below a gravity direction of the substrate, wherein when the substrate passes through an exposure area of the first exposure part, the first surface of the substrate faces the first exposure part; and a second exposure part located above the gravity direction of the substrate, wherein when the substrate passes through an exposure area of the second exposure part, the second surface of the substrate faces the second exposure part. Compared with the prior art, the exposure system provided by the application can complete the exposure of the two surfaces of the substrate by only one-way conveying the substrate, simplifies the exposure process, and reduces the space occupied by the exposure system.

Description

Technical Field

[0001] This invention relates to the field of maskless exposure technology, and in particular to a substrate unidirectional transport double-sided exposure system and exposure method. Background Technology

[0002] Maskless exposure technology is an exposure technique that does not use traditional photomasks. It generates a digital mask pattern by computer and outputs it to an acoustic optical modulator. Then, through an acoustic optical scanner and a mirror, the desired circuit pattern is directly exposed onto a substrate with a photosensitive coating to form the desired exposure pattern.

[0003] In the existing technology, the two opposing surfaces of the substrate are processed in two separate steps, and the substrate needs to be flipped, which increases the complexity of the exposure process and also causes the exposure system to occupy too much space. Summary of the Invention

[0004] The purpose of this invention is to provide a substrate unidirectional transport double-sided exposure system and exposure method to solve the technical problems of complex exposure processes and excessive space occupation in the prior art.

[0005] In a first aspect, the present invention provides a substrate unidirectional transport type double-sided exposure system for exposing a first side and a second side of a substrate, the exposure system comprising:

[0006] A substrate transport unit is used to transport substrates along a preset path.

[0007] The first exposure section is located below the direction of gravity of the substrate, and when the substrate passes through the exposure area of ​​the first exposure section, the first surface of the substrate faces the first exposure section.

[0008] The second exposure section is located above the substrate in the direction of gravity. When the substrate passes through the exposure area of ​​the second exposure section, the second surface of the substrate faces the second exposure section.

[0009] In the substrate unidirectional conveying double-sided exposure system described above, preferably, the substrate conveying unit includes a substrate feeding component, a substrate receiving component, a first adsorption moving component, and a second adsorption moving component, wherein:

[0010] The first adsorption moving member can reciprocate along the first path, and the first adsorption moving member can adsorb or release the substrate. The exposure area of ​​the first exposure part is located within the first path.

[0011] The second adsorption moving member can reciprocate along the second path, and the second adsorption moving member can adsorb or release the substrate. The exposure area of ​​the second exposure part is located within the second path.

[0012] In the substrate unidirectional conveying double-sided exposure system described above, preferably, the substrate conveying section further includes a substrate guide, which is located between the first adsorption moving member and the second adsorption moving member. The first path and the second path have a height difference in the direction of gravity. The first path is formed between the substrate guide and the substrate unloading member, and the second path is formed between the substrate guide and the substrate receiving member.

[0013] In the substrate unidirectional conveying double-sided exposure system described above, preferably, the substrate guide includes a first shaft and a second shaft, the first shaft being located above the second shaft in the direction of gravity, and the substrate delivered from the substrate unloading device sequentially passes around the first shaft and the second shaft before arriving at the substrate receiving device.

[0014] In the substrate unidirectional conveying double-sided exposure system described above, preferably, in the direction of gravity, the center of the first axis is higher than the center of the second axis and lower than the highest point of the second axis.

[0015] In the substrate unidirectional conveying double-sided exposure system described above, preferably, the first adsorption moving member and the second adsorption moving member each include a horizontal moving component, a vertical moving component, and an adsorption component. The horizontal moving component can move horizontally along the first path or the second path. The vertical moving component is disposed on the horizontal moving component and connected to the adsorption component to drive the adsorption component to reciprocate along the direction of gravity. The adsorption component is used to adsorb or release the substrate.

[0016] In the substrate unidirectional conveying double-sided exposure system described above, preferably, a horizontal channel is formed within the horizontal moving component, the horizontal channel being used for the passage of the first exposure unit or the second exposure unit.

[0017] In the substrate unidirectional conveying double-sided exposure system described above, preferably, the horizontal moving component includes two sliders arranged side by side in the horizontal direction, the sliders being slidably mounted on a slide rail, the vertical moving component includes a connecting block connecting the two sliders, the connecting block being reciprocating along the direction of gravity, the connecting block and the two sliders forming the horizontal channel, and the adsorption component being disposed on the connecting block.

[0018] The substrate unidirectional conveying double-sided exposure system described above preferably further includes a stop member for restricting the movement of the substrate.

[0019] Secondly, the present invention provides an exposure method, the method comprising the following steps:

[0020] The substrate is coated with photoresist;

[0021] The substrate transport unit transports a substrate coated with photoresist along a preset path. A portion of the substrate is in the exposure area of ​​the first exposure unit, and a portion of the substrate is in the exposure area of ​​the second exposure unit. The first surface of the substrate in the exposure area of ​​the first exposure unit faces the first exposure unit, and the second surface of the substrate in the second exposure area faces the second exposure unit.

[0022] The first exposure unit exposes the first side of the substrate, and the first side of the substrate receives the light beam emitted by the first exposure unit. At the same time, the second exposure unit exposes the second side of the substrate, and the second side of the substrate receives the light beam emitted by the second exposure unit, thereby completing the predetermined pattern transfer.

[0023] Compared with the prior art, the exposure system provided by the present invention only needs to transport the substrate in one direction to complete the exposure of both surfaces of the substrate, which simplifies the exposure process and reduces the space occupied by the exposure system. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the exposure system provided in an embodiment of the present invention;

[0025] Figure 2 This is a schematic diagram of the structure of the first or second adsorption moving member provided in the embodiments of the present invention;

[0026] Figure 3 This is a schematic flowchart illustrating a method for double-sided exposure of a substrate according to an embodiment of the present invention.

[0027] Explanation of reference numerals in the attached figures:

[0028] 10-Substrate;

[0029] 20 - First Exposure Department;

[0030] 30 - Second Exposure Department;

[0031] 40-Substrate placing piece;

[0032] 50 - Substrate receiving component;

[0033] 60-First adsorption moving component, 61-Horizontal moving assembly, 62-Vertical moving assembly, 63-Adsorption assembly, 64-Horizontal channel;

[0034] 70 - Second adsorption moving part;

[0035] 80 - Substrate guide, 81 - First axis, 82 - Second axis;

[0036] 90-Stop;

[0037] S1 - First path;

[0038] S2 - Second Path. Detailed Implementation

[0039] The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0040] Reference Figure 1 As shown, an embodiment of the present invention provides a substrate unidirectional transport type double-sided exposure system for exposing a first side and a second side of a substrate 10. The first side and the second side of the substrate 10 are located on opposite sides in the direction of gravity. The exposure system includes a substrate transport section, a first exposure section 20, and a second exposure section 30, wherein:

[0041] The substrate transport unit is used to transport the substrate 10 along a preset path to ensure that the substrate 10 can accurately reach the exposure range of the first exposure unit 20 and the second exposure unit 30.

[0042] The first exposure unit 20 and the second exposure unit 30 are arranged sequentially along the transport direction of the substrate 10. The first exposure unit 20 is closer to the feeding direction of the substrate 10 than the second exposure unit 30. The first exposure unit 20 is located below the gravity direction of the substrate 10. When the substrate 10 passes through the exposure area of ​​the first exposure unit 20, the first surface of the substrate 10 faces the first exposure unit 20, and the first exposure unit 20 can accurately transfer the photolithographic pattern to the first surface of the substrate 10. The second exposure unit 30 is located above the gravity direction of the substrate 10. When the substrate 10 passes through the exposure area of ​​the second exposure unit 30, the second surface of the substrate 10 faces the second exposure unit 30, and the second exposure unit 30 can accurately transfer the photolithographic pattern to the second surface of the substrate 10.

[0043] The exposure system mentioned in the above embodiments only needs to transport the substrate 10 in one direction to complete the exposure of both sides of the substrate 10 on the same transport path, thereby simplifying the exposure process, reducing the flipping or repeated movement of the substrate 10 during the exposure process, improving production efficiency, and reducing the space occupied by the exposure system.

[0044] Reference Figure 3 As shown, Figure 3 This is a schematic flowchart illustrating a method for double-sided exposure of a substrate 10 according to an embodiment of the present invention. The steps for double-sided exposure of the substrate 10 are as follows:

[0045] Step S101: Photoresist is coated onto substrate 10. A suitable photoresist is selected based on the material of substrate 10 and exposure requirements. Parameters such as the type of photoresist (positive or negative), thickness, and sensitivity are optimized according to the specific application.

[0046] Step S102: The substrate transport unit transports the substrate 10, whose surface is coated with photoresist, along a preset path. A portion of the substrate 10 is located in the exposure area of ​​the first exposure unit 20, and a portion of the substrate 10 is located in the exposure area of ​​the second exposure unit 30. The first surface of the substrate 10 located in the exposure area of ​​the first exposure unit 20 faces the first exposure unit 20, and the second surface of the substrate 10 located in the second exposure area faces the second exposure unit 30. During the transport process, the position of the substrate 10 is monitored in real time by a high-precision positioning system (such as a vision positioning system or a laser positioning system) to ensure that the substrate 10 can accurately reach the exposure areas of the first exposure unit 20 and the second exposure unit 30.

[0047] Step S103: The first exposure unit 20 exposes the first surface of the substrate 10, and the first surface of the substrate 10 receives the light beam emitted by the first exposure unit 20. Simultaneously, the second exposure unit 30 exposes the second surface of the substrate 10, and the second surface of the substrate 10 receives the light beam emitted by the second exposure unit 30, thereby completing the predetermined pattern transfer. By simultaneously exposing both surfaces, the photolithography system can significantly reduce exposure time and improve production efficiency.

[0048] Step S104: The substrate 10 that has completed double-sided exposure is subjected to subsequent development, etching and other processes to form the final micro-nano structure or circuit pattern.

[0049] In the embodiments provided by the present invention, reference is made to Figure 1 As shown, the substrate conveying unit includes a substrate feeding member 40, a substrate receiving member 50, a first adsorption moving member 60, and a second adsorption moving member 70, wherein:

[0050] The substrate unloading component 40 is the starting point of the entire transport process. It is responsible for providing the substrate 10 coated with photoresist. The substrate 10 is transported along a preset path to the substrate receiving component 50. The substrate receiving component 50 is the end point of the transport process. It is responsible for receiving the substrate 10 that has completed exposure and preparing it for subsequent processing.

[0051] The first adsorption moving member 60 can reciprocate along the first path S1. A high-precision vision positioning system or laser positioning system is used to ensure the positional accuracy of the first adsorption moving member 60 during the movement. The first adsorption moving member 60 can adsorb or release the substrate 10. The exposure area of ​​the first exposure unit 20 is located within the first path S1. The first exposure unit 20 can accurately focus on the first surface of the substrate 10 during each exposure. The substrate feeding member 40 provides the substrate 10 at a certain speed. This speed is synchronized with the moving speed of the first adsorption moving member 60 to ensure that the substrate 10 can be smoothly adsorbed by the first adsorption moving member 60 during the feeding process. The substrate 10 will not shift or vibrate during the movement, thereby ensuring the exposure quality.

[0052] When the first adsorption moving member 60 is located at the beginning of the first path S1, the first adsorption moving member 60 adsorbs the substrate 10 and transports the substrate 10 along the first path S1 to the exposure area of ​​the first exposure section 20. During the movement, the moving speed of the first adsorption moving member 60 is synchronized with the feeding speed of the substrate feeding member 40. When the first adsorption moving member 60 reaches the end of the first path, the substrate 10 it carries is exposed. The first adsorption moving member 60 releases the substrate 10 and begins to move in the opposite direction. During the process of returning to the beginning of the first path S1, the substrate feeding member 40 stops supplying the substrate 10, and the substrate 10 remains stationary until the first adsorption moving member 60 returns to the beginning of the first path S1. Then the substrate feeding member 40 continues to supply the substrate 10.

[0053] The second adsorption moving member 70 can reciprocate along the second path S2. A high-precision vision positioning system or laser positioning system is used to ensure the positional accuracy of the second adsorption moving member 70 during the movement. The second adsorption moving member 70 can adsorb or release the substrate 10. The exposure area of ​​the second exposure unit 30 is located within the second path S2. The second exposure unit 30 can accurately focus on the second surface of the substrate 10 during each exposure. The substrate feeding member 40 provides the substrate 10 at a certain speed. This speed is synchronized with the moving speed of the second adsorption moving member 70 to ensure that the substrate 10 can be smoothly adsorbed by the second adsorption moving member 70 during the feeding process. The substrate 10 will not shift or vibrate during the movement, thereby ensuring the exposure quality.

[0054] When the second adsorption moving member 70 is located at the beginning of the second path S2, the second adsorption moving member 70 adsorbs the substrate 10 and transports the substrate 10 along the second path S2 to the exposure area of ​​the second exposure section 30. During the movement, the moving speed of the second adsorption moving member 70 is synchronized with the feeding speed of the substrate feeding member 40. When the second adsorption moving member 70 reaches the end of the second path, the substrate 10 it carries is exposed. The second adsorption moving member 70 releases the substrate 10 and begins to move in the opposite direction. During the process of returning to the beginning of the second path S2, the substrate feeding member 40 stops supplying the substrate 10, and the substrate 10 remains stationary until the second adsorption moving member 70 returns to the beginning of the second path S2. Then the substrate feeding member 40 continues to supply the substrate 10.

[0055] Furthermore, the substrate conveying unit also includes a substrate guide 80. The substrate 10 conveyed from the substrate unloading member 40 is turned by the substrate guide 80 and then conveyed to the substrate receiving member 50. The substrate guide 80 is located between the first adsorption moving member 60 and the second adsorption moving member 70. The substrate guide 80 is used to change the conveying height of the substrate 10. The first path S1 and the second path S2 have a height difference in the direction of gravity. The first path S1 is formed between the substrate guide 80 and the substrate unloading member 40, and the second path S2 is formed between the substrate guide 80 and the substrate receiving member 50. The path design with height difference can optimize the spatial layout of the equipment, making the whole system more compact.

[0056] Reference Figure 1 As shown, in the direction of gravity, the first path S1 is located above the second path S2. The first path S1 is positioned higher, and its bottom has a larger installation space, allowing the first exposure unit 20 to be placed below it. When the first adsorption moving member 60 moves the substrate 10, the first surface of the substrate 10 faces downwards, directly facing the first exposure unit 20 for exposure. Conversely, the second path S2 is positioned lower, and its top has a larger installation space, allowing the second exposure unit 30 to be placed above it. When the second adsorption moving member 70 moves the substrate 10, its second surface faces upwards, directly facing the second exposure unit 30 for exposure. This results in a more compact overall layout of the exposure system, facilitating the installation and operation of both the first and second exposure units 20 and 30, and reducing the equipment's footprint.

[0057] In one feasible implementation, refer to Figure 1 As shown, the substrate guide 80 includes a first shaft 81 and a second shaft 82. The first shaft 81 is located above the second shaft 82 in the direction of gravity. The substrate 10, which is fed from the substrate feeding member 40, passes through the first shaft 81 and the second shaft 82 in sequence and arrives at the substrate receiving member 50. The axes of the first shaft 81 and the second shaft 82 are parallel to each other. The substrate 10 is attached to the upper surface of the first shaft 81. The second shaft 82 is located to the lower left of the first shaft 81. The lower surface of the second shaft 82 is pressed onto the substrate 10. The substrate 10 is fed from the substrate feeding member 40 and covers the upper surface of the first shaft 81. After the substrate 10 passes around the first shaft 81, it continues to be conveyed to the second shaft 82. The lower surface of the second shaft 82 is pressed onto the substrate 10 to guide the substrate 10 to be conveyed. The substrate 10 continues to be conveyed to the substrate receiving member 50. By arranging the first shaft 81 and the second shaft 82 vertically, the substrate guide 80 makes full use of the space in the vertical direction, making the whole system more compact.

[0058] Preferably, in the direction of gravity, the center of the first axis 81 is higher than the center of the second axis 82 and lower than the highest point of the second axis 82. The projections of the first axis 81 and the second axis 82 in the horizontal direction have an overlapping area. The first axis 81 and the second axis 82 are close to each other, which ensures the stability of the substrate 10 during the transport process, avoids displacement or vibration, and further reduces the space occupied by the exposure system.

[0059] In one feasible implementation, refer to Figure 2 As shown, both the first adsorption moving member 60 and the second adsorption moving member 70 include a horizontal moving component 61, a vertical moving component 62, and an adsorption component 63, wherein:

[0060] The vertical moving component 62 is mounted on the horizontal moving component 61. The horizontal moving component 61 can reciprocate along the first path S1 or the second path S2 to realize the horizontal reciprocating movement of the first adsorption moving member 60 or the second adsorption moving member 70. The moving speed of the horizontal moving component 61 is synchronized with the feeding speed of the substrate feeding member 40 to ensure the smooth transport of the substrate 10. The power source of the horizontal moving component 61 can be a drive motor or a drive cylinder, which is not limited here.

[0061] The vertical moving component 62 is connected to the adsorption component 63 to drive the adsorption component 63 to move back and forth along the direction of gravity, so that the substrate 10 can be operated at different height positions to focus with the first exposure unit 20 or the second exposure unit 30. The power source of the vertical moving component 62 can be a drive motor or a drive cylinder, which is not limited here.

[0062] The adsorption component 63 is used to adsorb or release the substrate 10. The adsorption component 63 firmly adsorbs the substrate 10 onto its surface by generating negative pressure, ensuring that the substrate 10 remains stable during movement and exposure. When needed, the adsorption component 63 can stop generating negative pressure, thereby releasing the substrate 10, and the first adsorption moving member 60 or the second adsorption moving member 70 can return to the initial position.

[0063] When the substrate 10 reaches the position of the first adsorption moving member 60 and the second adsorption moving member 70, the adsorption assembly 63 is activated, generating negative pressure to firmly adsorb the substrate 10. The horizontal moving assembly 61 transports the substrate 10 to the exposure area of ​​the first exposure section 20 and the exposure area of ​​the second exposure section 30. At this time, the vertical moving assembly 62 drives the adsorption assembly 63 to move along the direction of gravity, lifting the substrate 10 to a suitable height so that it can cooperate with the first exposure section 20 and the second exposure section 30 to perform the exposure operation. After the exposure operation is completed, the adsorption assembly 63 stops generating negative pressure, releases the substrate 10, and the horizontal moving assembly 61 returns to the initial position.

[0064] Furthermore, in order to prevent the first adsorption moving member 60 from touching the first exposure part 20 during movement, or the second adsorption moving member 70 from touching the second exposure part 30 during movement, a horizontal channel 64 is formed in the horizontal moving assembly 61, which is used for the passage of the first exposure part 20 or the second exposure part 30.

[0065] In one feasible implementation, the first exposure unit 20 and the first adsorption moving member 60 are both located below the first path S1, the second exposure unit 30 is located above the second path S2, and the second adsorption moving member 70 is located below the second path S2. Therefore, the first adsorption moving member 60 needs to be provided with a horizontal channel 64 for the first exposure unit 20 to pass through, so as to avoid the first adsorption moving member 60 touching the first exposure unit 20 during the movement, while the second adsorption moving member 70 does not need to be provided with a horizontal channel 64.

[0066] Specifically, refer to Figure 2 As shown, the horizontal moving component 61 includes two sliders arranged side by side in the horizontal direction. The sliders extend along the direction of gravity, providing support and guidance for the entire first adsorption moving component 60. The sliders are slidably mounted on a slide rail. The vertical moving component 62 includes a connecting block connecting the two sliders. The connecting block can reciprocate along the direction of gravity. The connecting block and the two sliders together form a horizontal channel 64. The adsorption component 63 is disposed on the bottom surface of the connecting block. During the movement of the first adsorption moving component 60, the first exposure part 20 passes through the horizontal channel 64 between the two sliders, preventing the first adsorption moving component 60 from touching the first exposure part 20 during the movement.

[0067] To ensure that the substrate feeding member 40 stops feeding the substrate 10 when needed and that the substrate 10 remains stationary, a stop member 90 is also provided in the exposure system. The stop member 90 is used to restrict the movement of the substrate 10. The stop member 90 is preferably a roller parallel to the first roller body 81. The stop member 90 can move closer to or further away from the roller body 81. The movement of the stop member 90 is synchronized with the movement of the substrate feeding member 40.

[0068] During the substrate 10 transport process, the stop member 90 moves away from the roller 81, allowing the substrate 10 to move freely. When it is necessary to stop the transport of the substrate 10, the substrate feeding member 40 stops supplying the substrate 10, and the stop member 90 moves closer to the roller 81, pressing the substrate 10 against the roller 81, thus keeping the substrate 10 stationary. This ensures the stability of the substrate 10 during exposure, thereby improving the exposure quality. By setting the stop member 90 to precisely control the transport and stopping of the substrate 10, exposure errors caused by substrate 10 movement are reduced, improving the accuracy and consistency of the exposed pattern.

[0069] In one feasible embodiment, both the first exposure unit 20 and the second exposure unit 30 include a light source generator, a reflector, a spatial light modulator, and an imaging unit, wherein:

[0070] The light source generator is used to provide an exposure beam. The light source generator includes a laser light source, an optical fiber, and a beam homogenizing device. The beam emitted by the laser light source enters the beam homogenizing device through the optical fiber to collimate and / or homogenize the beam.

[0071] Reflectors are used to change the direction of light beam propagation to optimize the beam path so that it can accurately reach the spatial light modulator. They can also be used to adjust the focusing position and angle of the beam.

[0072] The spatial light modulator is used to generate circuit patterns. It can modulate the light beam according to the pattern information input by the computer, thereby forming the required pattern on the substrate 10. The spatial light modulator uses a DMD (digital micromirror device) chip. The DMD chip is a micromirror array composed of many micromirror surfaces. Each micromirror can independently control its reflection angle, thereby achieving high-precision pattern generation.

[0073] The imaging device is used to project the circuit pattern onto the first or second surface of the substrate 10. The imaging device may include two sets of lenses at the top and bottom and a microlens array in the middle. The microlens array of the imaging device corresponds one-to-one with the micromirror array of the DMD chip.

[0074] The substrate 10 has a layer of photoresist coated on its surface. An exposure beam emitted by the light source is reflected by a mirror and projected onto a spatial light modulator. The spatial light modulator generates the desired circuit pattern and projects it onto an imaging device. After passing through the spatial light modulator, the beam is modulated into multiple beams by a micro-mirror array, each of which can be individually controlled by a micro-mirror. The beams passing through the imaging device converge onto the first or second surface of the substrate 10 in the form of a dot matrix of light spots, thereby exposing the first or second surface of the substrate 10 and forming the desired exposure pattern.

[0075] The above description, based on the embodiments shown in the figures, details the structure, features, and effects of the present invention. The above description is only a preferred embodiment of the present invention, but the present invention is not limited to the scope of implementation shown in the figures. Any changes made in accordance with the concept of the present invention, or equivalent embodiments modified to have equivalent changes, that do not exceed the spirit covered by the specification and figures, should be within the protection scope of the present invention.

Claims

1. A substrate unidirectional conveying double-sided exposure system for exposing a first side and a second side of a substrate, characterized in that, The exposure system includes: A substrate transport unit is used to transport substrates along a preset path. The first exposure section is located below the direction of gravity of the substrate, and when the substrate passes through the exposure area of ​​the first exposure section, the first surface of the substrate faces the first exposure section. The second exposure section is located above the substrate in the direction of gravity. When the substrate passes through the exposure area of ​​the second exposure section, the second surface of the substrate faces the second exposure section.

2. The substrate unidirectional transport double-sided exposure system according to claim 1, characterized in that, The substrate conveying unit includes a substrate feeding component, a substrate receiving component, a first adsorption moving component, and a second adsorption moving component, wherein: The first adsorption moving member can reciprocate along the first path, and the first adsorption moving member can adsorb or release the substrate. The exposure area of ​​the first exposure part is located within the first path. The second adsorption moving member can reciprocate along the second path, and the second adsorption moving member can adsorb or release the substrate. The exposure area of ​​the second exposure part is located within the second path.

3. The substrate unidirectional transport double-sided exposure system according to claim 2, characterized in that, The substrate conveying unit further includes a substrate guide, which is located between the first adsorption moving member and the second adsorption moving member. The first path and the second path have a height difference in the direction of gravity. The first path is formed between the substrate guide and the substrate feeding member, and the second path is formed between the substrate guide and the substrate receiving member.

4. The substrate unidirectional transport double-sided exposure system according to claim 3, characterized in that, The substrate guide includes a first shaft and a second shaft. The first shaft is located above the second shaft in the direction of gravity. The substrate delivered from the substrate feeding device passes through the first shaft and the second shaft in sequence before arriving at the substrate receiving device.

5. The substrate unidirectional transport double-sided exposure system according to claim 4, characterized in that, In the direction of gravity, the center of the first shaft is higher than the center of the second shaft and lower than the highest point of the second shaft.

6. The substrate unidirectional transport double-sided exposure system according to claim 2, characterized in that, The first and second adsorption moving components each include a horizontal moving component, a vertical moving component, and an adsorption component. The horizontal moving component can move horizontally along the first path or the second path. The vertical moving component is disposed on the horizontal moving component and connected to the adsorption component to drive the adsorption component to reciprocate along the direction of gravity. The adsorption component is used to adsorb or release the substrate.

7. The substrate unidirectional transport double-sided exposure system according to claim 6, characterized in that, A horizontal channel is formed within the horizontal moving component, which is used for the passage of the first exposure unit or the second exposure unit.

8. The substrate unidirectional transport double-sided exposure system according to claim 7, characterized in that, The horizontal moving component includes two sliders arranged side by side in the horizontal direction. The sliders are slidably mounted on a slide rail. The vertical moving component includes a connecting block connecting the two sliders. The connecting block can reciprocate along the direction of gravity. The connecting block and the two sliders together form the horizontal channel. The adsorption component is disposed on the connecting block.

9. The substrate unidirectional transport double-sided exposure system according to claim 2, characterized in that, It also includes a stop for limiting the movement of the substrate.

10. An exposure method, characterized in that, The method includes the following steps: The substrate is coated with photoresist; The substrate transport unit transports a substrate coated with photoresist along a preset path. A portion of the substrate is in the exposure area of ​​the first exposure unit, and a portion of the substrate is in the exposure area of ​​the second exposure unit. The first surface of the substrate in the exposure area of ​​the first exposure unit faces the first exposure unit, and the second surface of the substrate in the second exposure area faces the second exposure unit. The first exposure unit exposes the first side of the substrate, and the first side of the substrate receives the light beam emitted by the first exposure unit. At the same time, the second exposure unit exposes the second side of the substrate, and the second side of the substrate receives the light beam emitted by the second exposure unit, thereby completing the predetermined pattern transfer.

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