Exposure pattern processing method and device, computer device and readable storage medium

Abstract

The application relates to an exposure pattern processing method. The method comprises the following steps: acquiring pattern information of a plurality of exposure patterns; for each exposure pattern, constructing a write field matched with the exposure pattern and a first initial exposure area containing the write field based on the pattern information of the exposure pattern; determining selected exposure areas matched with the plurality of exposure patterns based on each first initial exposure area; in the case that there is a to-be-grouped pattern in each exposure pattern which does not match any write field of the selected exposure areas, determining a new selected exposure area matched with the to-be-grouped pattern based on the pattern information of the to-be-grouped pattern; and in the case that each exposure pattern has an adapted selected exposure area, obtaining an exposure area division file for the plurality of exposure patterns based on the exposure pattern matched with each selected exposure area. The method can improve the pattern placement accuracy of the exposure pattern.

Description

Technical Field

[0001] This application relates to the field of electron beam lithography technology, and in particular to an exposure pattern processing method, apparatus, computer equipment, computer-readable storage medium, and computer program product. Background Technology

[0002] In fields such as micro-nano fabrication and semiconductor device manufacturing, electron beam lithography machines, with their high-precision exposure capabilities, have become the core equipment for small-sized pattern fabrication. However, this equipment uses a finite-sized write field as the basic unit for a single exposure, so the proper division of the exposure area is crucial to ensuring exposure accuracy and avoiding pattern defects. Specifically, after determining the exposure area, the equipment software automatically divides the area into grids starting from the lower left corner, based on the set write field size. Each grid corresponds to one write field. Furthermore, to ensure optimal exposure results, each exposed pattern should be located as close as possible to the center point of its corresponding write field.

[0003] In traditional techniques, the exposure area can be manually divided, and each exposed pattern can be checked one by one to ensure it is on the stitching boundary of the writing field. However, this method is not only inefficient but also prone to introducing human error, resulting in low precision in the placement of the exposed patterns. Summary of the Invention

[0004] Therefore, it is necessary to provide an exposure pattern processing method, apparatus, computer equipment, computer-readable storage medium, and computer program product that can improve the pattern placement accuracy of exposure patterns in order to address the above-mentioned technical problems.

[0005] In a first aspect, this application provides an exposure pattern processing method, comprising: acquiring graphic information of a plurality of exposure patterns; for each of the exposure patterns, constructing a write field matching the exposure pattern and a first initial exposure region including the write field based on the graphic information of the exposure pattern; determining a selected exposure region adapted to the plurality of exposure patterns based on each of the first initial exposure regions; if there are images to be grouped in each of the exposure patterns that do not match any write field of the selected exposure region, determining a new selected exposure region matching the images to be grouped based on the graphic information of the images to be grouped; and if there are adapted selected exposure regions in each of the exposure patterns, obtaining an exposure region partitioning file for the plurality of exposure patterns based on the exposure patterns adapted to each of the selected exposure regions.

[0006] In the above embodiments, by acquiring the graphic information of each of the multiple exposure patterns, the tedious process of manually reading and recording graphic data one by one from the layout file is avoided, ensuring the accuracy and completeness of the data used for subsequent processing and laying a reliable foundation for automated exposure area division. For each exposure pattern, a write field matching the pattern and a first initial exposure area containing that write field are constructed based on the graphic information, eliminating the need for manual experience-based exposure area creation, thus reducing human error and improving the accuracy of pattern placement and the consistency of exposure area division. By determining selected exposure areas that fit multiple exposure patterns based on each first initial exposure area, the initial exposure areas corresponding to all exposure patterns can be combined to filter out selected exposure areas that fit multiple exposure patterns, avoiding repeated manual adjustments and trial-and-error processes, and significantly improving the efficiency and accuracy of exposure area division. When there are patterns among the exposure patterns that do not match any field of the selected exposure area, a new selected exposure area is determined based on the pattern information of the pattern to be grouped. This ensures that each exposure pattern can ultimately be adapted to the exposure area, solving the problem of omissions that are easily missed in traditional manual inspection. This helps to improve the completeness of exposure area division and the global consistency of pattern positioning. Finally, when there are suitable selected exposure areas for all exposure patterns, an exposure area division file is generated based on the exposure patterns that are adapted to each selected exposure area. Thus, the entire exposure area division process is automated, providing reliable and repeatable area division results for electron beam exposure technology.

[0007] In one embodiment, determining a selected exposure region adapted to the plurality of exposure patterns based on each of the first initial exposure regions includes: filtering a target exposure region from each of the first initial exposure regions; the plurality of exposure patterns include grouped patterns that match any write field in the target exposure region; performing a rigid transformation on the target exposure region to determine the center distance between the write field center of the target exposure region after the rigid transformation and the center of the pattern of the matched grouped pattern; the pattern center is determined based on the pattern information; and, if the central tendency statistics of each of the center distances converge, determining a selected exposure region adapted to the plurality of exposure patterns based on the transformed target exposure region.

[0008] In the above embodiments, target exposure areas are selected from each first initial exposure area, and a rigid body transformation is performed on these areas to optimize the positional deviation between the write field center and the pattern center of the matched pattern. The selected exposure area is finally determined when the central tendency statistics of the distances between the centers converge. Therefore, compared to the traditional method of manually dividing and adjusting exposure areas, this scheme can automatically and quantitatively achieve optimal alignment between the exposure area and the internal exposure pattern, significantly reducing the deviation between the write field center and the pattern center, improving the pattern placement accuracy of the exposure pattern, and providing a highly consistent write field configuration for subsequent exposure processes.

[0009] In one embodiment, determining the selected exposure region adapted to the plurality of exposure patterns based on the transformed target exposure region includes: if, among the center distances, there is a center distance greater than or equal to a preset threshold, returning to the step of performing rigid body transformation on the target exposure region; and if all the center distances are less than the preset threshold, determining the transformed target exposure region as the selected exposure region adapted to the plurality of exposure patterns.

[0010] In the above embodiments, the position and orientation of the target exposure area are gradually optimized through iterative rigid body transformation until the center distance between the center of all grouped patterns and the center of the corresponding write field is less than a preset threshold. This process eliminates the need for repeated manual adjustments or trial and error, ensuring that each grouped pattern meets the high-precision center alignment requirements, ultimately obtaining the globally optimal selected exposure area, fundamentally improving the pattern placement accuracy and process consistency of electron beam exposure.

[0011] In one embodiment, the step of filtering target exposure regions from each of the first initial exposure regions includes: for each first initial exposure region, determining, from the plurality of exposure patterns, a grouped pattern that matches any of the write fields of the first initial exposure region; determining, based on the graphic statistics of the grouped patterns, the graphic fit of the first initial exposure region; the graphic fit is positively correlated with the graphic statistics; and determining, among the first initial exposure regions, the first initial exposure region with the highest graphic fit as the target exposure region that fits the plurality of exposure patterns.

[0012] In the above embodiments, by matching each first initial exposure area with grouped graphics and quantifying the graphic fit based on the graphic statistics of the grouped graphics, the area with the highest graphic fit is finally selected as the target exposure area, thus achieving adaptive selection of the exposure area without the need for manual experience judgment, significantly improving the accuracy and efficiency of area selection.

[0013] In one embodiment, the graphic statistics information includes the number of graphics or the area of ​​graphics; determining the graphic fit of the first initial exposure region based on the graphic statistics information of the grouped graphics includes: determining the area of ​​the first initial exposure region; and determining the ratio between the graphic statistics information and the area as the graphic fit of the first initial exposure region.

[0014] In the above embodiments, by introducing the quantitative indicator of graphic adaptation (which is positively correlated with graphic statistics), the capacity of each first initial exposure area to accommodate the exposed graphic can be evaluated. This method does not require manual experience judgment or repeated trial selection, effectively avoiding the waste of writing field resources or the problem of sparse graphic distribution caused by improper area selection, and significantly improving the space utilization efficiency of the writing field.

[0015] In one embodiment, obtaining an exposure region partitioning file for the plurality of exposure graphics based on the exposure graphics adapted to each of the selected exposure regions includes: for each selected exposure region, obtaining layer partitioning information by configuring the exposure graphics adapted to the selected exposure region as the same layer; and obtaining an exposure region partitioning file for the plurality of exposure graphics based on the layer partitioning information and the region information of each of the selected exposure regions.

[0016] In the above embodiments, by configuring the adapted exposure graphics as the same layer according to the selected exposure area and combining the area information to generate a structured exposure area division file, the engineering usability of the exposure area division file can be significantly improved.

[0017] In one embodiment, the method further includes: when the exposure region division file is loaded into the electron beam lithography machine, if the exposure region division file passes verification, controlling the electron beam lithography machine to perform electron beam exposure operation based on the exposure region division file.

[0018] In the above embodiments, when an exposure area division file is obtained, the reliability and safety of the electron beam exposure process can be improved by loading the exposure area division file into the electron beam lithography machine for re-verification.

[0019] Secondly, this application provides an exposure pattern processing apparatus, the apparatus comprising: an acquisition module for acquiring graphic information of a plurality of exposure patterns; a construction module for constructing, based on the graphic information of the exposure patterns, a write field matching the exposure pattern and a first initial exposure region including the write field; a first processing module for determining, based on each of the first initial exposure regions, a selected exposure region adapted to the plurality of exposure patterns; a second processing module for determining, based on the graphic information of the selected exposure regions, a new selected exposure region matching the selected exposure regions when there are selected exposure regions in the exposure patterns that do not match any write field of the selected exposure regions; and a third processing module for obtaining an exposure region division file for the plurality of exposure patterns based on the exposure patterns adapted to each of the selected exposure regions when there are adapted selected exposure regions in each of the exposure patterns.

[0020] Thirdly, this application also provides a computer device, including a memory and a processor. The memory stores a computer program, and the processor executes the computer program to perform the following steps: acquiring graphic information of multiple exposure patterns; for each exposure pattern, constructing a write field matching the exposure pattern and a first initial exposure region containing the write field based on the graphic information of the exposure pattern; determining a selected exposure region adapted to the multiple exposure patterns based on each of the first initial exposure regions; if there are patterns to be grouped in each of the exposure patterns that do not match any write field of the selected exposure region, determining a new selected exposure region matching the pattern to be grouped based on the graphic information of the pattern to be grouped; if there are adapted selected exposure regions in each of the exposure patterns, obtaining an exposure region division file for the multiple exposure patterns based on the exposure patterns adapted to each of the selected exposure regions.

[0021] Fourthly, this application also provides a computer-readable storage medium storing a computer program thereon, which, when executed by a processor, performs the following steps: acquiring graphic information of a plurality of exposure patterns; for each of the exposure patterns, constructing a write field matching the exposure pattern and a first initial exposure region including the write field based on the graphic information of the exposure pattern; determining a selected exposure region adapted to the plurality of exposure patterns based on each of the first initial exposure regions; in the case where there are ungrouped patterns in each of the exposure patterns that do not match any write field of the selected exposure region, determining a new selected exposure region matching the ungrouped pattern based on the graphic information of the ungrouped pattern; and in the case where there are adapted selected exposure regions in each of the exposure patterns, obtaining an exposure region partitioning file for the plurality of exposure patterns based on the exposure patterns adapted to each of the selected exposure regions.

[0022] Fifthly, this application also provides a computer program product, including a computer program that, when executed by a processor, performs the following steps: acquiring graphic information of a plurality of exposure patterns; for each of the exposure patterns, constructing a write field matching the exposure pattern and a first initial exposure region containing the write field based on the graphic information of the exposure pattern; determining a selected exposure region adapted to the plurality of exposure patterns based on each of the first initial exposure regions; if there are patterns to be grouped in each of the exposure patterns that do not match any write field of the selected exposure region, determining a new selected exposure region matching the pattern to be grouped based on the graphic information of the pattern to be grouped; if there are adapted selected exposure regions in each of the exposure patterns, obtaining an exposure region partitioning file for the plurality of exposure patterns based on the exposure patterns adapted to each of the selected exposure regions.

[0023] The aforementioned exposure pattern processing method, apparatus, computer equipment, computer-readable storage medium, and computer program product, by acquiring the graphic information of multiple exposure patterns, avoid the tedious process of manually reading and recording graphic data one by one from the layout file, ensuring the accuracy and completeness of the data used for subsequent processing, and laying a reliable foundation for automated exposure area division. By constructing a write field matching the pattern and a first initial exposure area containing the write field for each exposure pattern based on its graphic information, the need for manual experience-based exposure area establishment is eliminated, human error is mitigated, and the accuracy of pattern placement and consistency of exposure area division are improved. By determining selected exposure areas suitable for multiple exposure patterns based on each first initial exposure area, the initial exposure areas corresponding to all exposure patterns can be integrated to filter out selected exposure areas suitable for multiple exposure patterns, avoiding repeated manual adjustments and trial-and-error processes, and significantly improving the efficiency and accuracy of exposure area division. When there are patterns among the exposure patterns that do not match any field of the selected exposure area, a new selected exposure area is determined based on the pattern information of the pattern to be grouped. This ensures that each exposure pattern can ultimately be adapted to the exposure area, solving the problem of omissions that are easily missed in traditional manual inspection. This helps to improve the completeness of exposure area division and the global consistency of pattern positioning. Finally, when there are suitable selected exposure areas for all exposure patterns, an exposure area division file is generated based on the exposure patterns that are adapted to each selected exposure area. Thus, the entire exposure area division process is automated, providing reliable and repeatable area division results for electron beam exposure technology. Attached Figure Description

[0024] To more clearly illustrate the technical solutions in the embodiments of this application or related technologies, the drawings used in the description of the embodiments of this application or related technologies will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a flowchart illustrating an exposure pattern processing method in one embodiment;

[0026] Figure 2 This is a flowchart illustrating the process of determining a selected exposure region that adapts to multiple exposure patterns based on each first initial exposure region in one embodiment.

[0027] Figure 3 This is a schematic diagram of a process for selecting a target exposure region from various first initial exposure regions in one embodiment;

[0028] Figure 4This is a flowchart illustrating the exposure pattern processing method in another embodiment;

[0029] Figure 5 This is a flowchart illustrating the exposure pattern processing method in another embodiment;

[0030] Figure 6 This is a structural block diagram of an exposure pattern processing device in one embodiment;

[0031] Figure 7 This is an internal structural diagram of a computer device in one embodiment;

[0032] Figure 8 This is a diagram of the internal structure of a computer device in another embodiment. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.

[0034] It should be noted that the terms "first," "second," etc., used in this application can be used to describe various initial exposure areas, but these initial exposure areas are not limited by these terms. These terms are only used to distinguish between the first initial exposure area and the second initial exposure area. The terms "comprising" and "having," and any variations thereof, used in this application, are intended to cover non-exclusive inclusion. The term "multiple" used in this application refers to two or more. The term "and / or" used in this application refers to one of the embodiments, or any combination of multiple embodiments.

[0035] Electron beam lithography machines are used to create small patterns on substrates and are widely used in semiconductor, micro-nano fabrication, and other fields. For example, an electron beam lithography machine is a high-precision electron beam exposure device manufactured by a certain company. A small pattern refers to a polygon whose maximum distance from the vertex of the exposed image to its geometric center is less than one-quarter of the side length of the write field. The write field refers to the effective area of ​​a single exposure in an electron beam lithography machine, typically with a side length of 50. (micrometers) -1000 A square.

[0036] In traditional techniques, exposure areas can be manually established, with each point checked to ensure the pattern is positioned at the write field junction (the boundary between two adjacent write fields). However, manually establishing exposure areas is unreliable, relying heavily on operator experience and prone to human error. Furthermore, it lacks the ability to effectively verify the defined exposure areas, leading to improper division and poor exposure results. Additionally, while purchasing an electron beam lithography machine, third-party software can be purchased to automatically center the exposed pattern at the write field center. However, such software is extremely expensive, placing a significant financial burden on the purchaser.

[0037] Based on the above analysis, this application provides an exposure image processing method that can be applied to computer equipment, which can be a terminal or a server. The terminal can be, but is not limited to, various personal computers, laptops, smartphones, tablets, etc. The server can be a standalone physical server, a server cluster or distributed system composed of multiple physical servers, or a cloud server providing cloud computing services.

[0038] In one exemplary embodiment, such as Figure 1 As shown, an exposure image processing method is provided. Taking the application of this method to a computer device as an example, it includes the following steps:

[0039] S10: Acquire graphic information for each of the multiple exposure patterns.

[0040] In this context, the exposure pattern refers to the unit that needs to be drawn during electron beam exposure. Pattern information refers to information related to the exposure pattern, such as shape and size. For example, the shape of the exposure pattern can be a polygon or other shapes.

[0041] In an optional embodiment, obtaining graphic information for each of the multiple exposure patterns includes: obtaining a layout file; and, if the layout file is preprocessed, parsing the preprocessed layout file to obtain graphic information for each of the multiple exposure patterns.

[0042] Among them, the layout file refers to the Graphic Design System (GDS) file. The GDS file is a standard format file used for semiconductor device layout design, which stores key data such as geometric information and layer information of the exposure pattern.

[0043] For example, preprocessing the layout file to obtain a preprocessed layout file includes: for the target layer in the layout file, merging the exposure graphics with connected parts in the target layer to obtain a preprocessed GDS file. Here, the target layer refers to the layer that needs to be exposed. Therefore, by merging the exposure graphics with connected parts, graphic fragmentation can be eliminated, preventing fragmented graphics from affecting subsequent processing and ensuring the accuracy of subsequent processing flows.

[0044] S20: For each exposure pattern, based on the graphic information of the exposure pattern, construct a write field that matches the exposure pattern and a first initial exposure area containing the write field.

[0045] In an optional embodiment, constructing a write field matching the exposure pattern and a first initial exposure region containing the write field based on the graphic information of the exposure pattern includes: determining the graphic center of the exposure pattern based on the graphic information of the exposure pattern; and constructing a write field matching the exposure pattern and a first initial exposure region containing the write field based on the graphic center of the exposure pattern.

[0046] For example, the graphic center of the exposed graphic is determined by geometric calculation methods based on the graphic information of the exposed graphic.

[0047] For example, if the distance between the center of the write field and the center of the exposure pattern is less than a set threshold, it is determined that the write field and the exposure pattern match.

[0048] It is understandable that by constructing a write field that matches the exposure pattern based on the pattern center, a first initial exposure area matching the pattern center can be constructed using the pattern center of the exposure pattern as a reference. Whether the write field center in the first initial exposure area matches the pattern center of other exposure patterns depends on the write field size.

[0049] S30, based on each first initial exposure area, determines the selected exposure area that is compatible with multiple exposure patterns.

[0050] The selected exposure area refers to an exposure area selected from each of the first initial exposure areas.

[0051] S40, if there is a grouping pattern in each exposure pattern that does not match any write field of the selected exposure area, a new selected exposure area that matches the grouping pattern is determined based on the pattern information of the grouping pattern.

[0052] Among them, the pattern to be grouped refers to the exposure pattern that does not match any write field of the selected exposure area. There is at least one pattern to be grouped. That is to say, for each write field within the selected exposure area, the pattern to be grouped is either completely outside the write field boundary or partially overlaps with the write field but is not completely contained (i.e., the exposure of the pattern to be grouped cannot be completed by a single write field).

[0053] In an optional embodiment, if the center distance between the exposed pattern and the center of any write field of the selected exposure area is greater than or equal to a set threshold, it is determined that the exposed pattern does not match any write field of the selected exposure area, and then the exposed pattern is a pattern to be grouped.

[0054] S50: When there are suitable selected exposure areas for each exposure pattern, an exposure area division file for multiple exposure patterns is obtained based on the exposure patterns that are suitable for each selected exposure area.

[0055] The exposure area partitioning file refers to a data set used to describe the hierarchical affiliation and spatial layout between the exposure graphic and the corresponding selected exposure area.

[0056] In the above embodiments, by acquiring the graphic information of each of the multiple exposure patterns, the tedious process of manually reading and recording graphic data one by one from the layout file is avoided, ensuring the accuracy and completeness of the data used for subsequent processing and laying a reliable foundation for automated exposure area division. For each exposure pattern, a write field matching the pattern and a first initial exposure area containing that write field are constructed based on the graphic information, eliminating the need for manual experience-based exposure area creation, thus reducing human error and improving the accuracy of pattern placement and the consistency of exposure area division. By determining selected exposure areas that fit multiple exposure patterns based on each first initial exposure area, the initial exposure areas corresponding to all exposure patterns can be combined to filter out selected exposure areas that fit multiple exposure patterns, avoiding repeated manual adjustments and trial-and-error processes, and significantly improving the efficiency and accuracy of exposure area division. When there are patterns among the exposure patterns that do not match any field of the selected exposure area, a new selected exposure area is determined based on the pattern information of the pattern to be grouped. This ensures that each exposure pattern can ultimately be adapted to the exposure area, solving the problem of omissions that are easily missed in traditional manual inspection. This helps to improve the completeness of exposure area division and the global consistency of pattern positioning. Finally, when there are suitable selected exposure areas for all exposure patterns, an exposure area division file is generated based on the exposure patterns that are adapted to each selected exposure area. Thus, the entire exposure area division process is automated, providing reliable and repeatable area division results for electron beam exposure technology.

[0057] In one embodiment, determining a selected exposure region that matches multiple exposure patterns based on each first initial exposure region includes: randomly selecting a region from each first initial exposure region as the selected exposure region. This improves the efficiency of determining the selected exposure region.

[0058] In one embodiment, such as Figure 2 As shown, based on each initial exposure area, determining a selected exposure area that fits the multiple exposure patterns includes the following steps:

[0059] S301, select a target exposure region from each of the first initial exposure regions; among the multiple exposure patterns, there are grouped patterns that match any write field in the target exposure region.

[0060] The number of grouped graphics is at least one.

[0061] In an optional embodiment, the method further includes: for any write field in the target exposure area, if the distance between the center of the write field and the center of the exposure pattern is less than a set threshold, the exposure pattern is determined as a grouped pattern.

[0062] S302, Perform a rigid body transformation on the target exposure area, and determine the center distance between the write field center of the target exposure area after the rigid body transformation and the graphic center of the matched grouped graphic; the graphic center is determined based on the graphic information.

[0063] In an optional embodiment, determining the graphic center of the exposed graphic based on the graphic information of the exposed graphic includes: determining the graphic center of the exposed graphic using a geometric calculation method based on the graphic information of the exposed graphic.

[0064] Rigid body transformation includes translation or rotation. Therefore, by performing rigid body transformation on the target exposure area, write field splicing defects can be avoided, the alignment accuracy between the exposed graphic and the write field center can be improved, and the positional consistency of the graphic within the write field can be improved. This effectively reduces the risk of graphic misalignment or distortion caused by write field splicing and can be adapted to small-sized graphic scenarios with different distribution angles and sizes.

[0065] S303, when the central tendency statistics of the distances between the centers converge, determines the selected exposure area that is compatible with multiple exposure patterns based on the transformed target exposure area.

[0066] In an optional embodiment, the central tendency statistics include the average distance between the various center distances; the method further includes: determining that the central tendency statistics of the various center distances converge when the average distance reaches a preset minimum value.

[0067] In an optional embodiment, the central tendency statistics include the average distance between the various center distances; the method further includes: determining the historical center distance between the write field center of the target exposure area before rigid body transformation and the graphic center of the matched grouped graphic; and determining the convergence of the central tendency statistics of the various center distances when the average distance is less than the historical average distance.

[0068] In the above embodiments, target exposure areas are selected from each first initial exposure area, and a rigid body transformation is performed on these areas to optimize the positional deviation between the write field center and the pattern center of the matched pattern. The selected exposure area is finally determined when the central tendency statistics of the distances between the centers converge. Therefore, compared to the traditional method of manually dividing and adjusting exposure areas, this scheme can automatically and quantitatively achieve optimal alignment between the exposure area and the internal exposure pattern, significantly reducing the deviation between the write field center and the pattern center, improving the pattern placement accuracy of the exposure pattern, and providing a highly consistent write field configuration for subsequent exposure processes.

[0069] In one embodiment, determining a selected exposure region adapted to multiple exposure patterns based on the transformed target exposure region includes: if, among the various center distances, there is a center distance greater than or equal to a preset threshold, returning to the step of performing a rigid body transformation on the target exposure region; and if all center distances are less than the preset threshold, determining the transformed target exposure region as the selected exposure region adapted to the multiple exposure patterns.

[0070] For example, the preset threshold is less than or equal to the set threshold used when determining grouped patterns. In other words, the preset threshold is a more stringent criterion, and only exposure patterns that meet the closer distance requirements can pass the verification.

[0071] In the above embodiments, the position and orientation of the target exposure area are gradually optimized through iterative rigid body transformation until the center distance between the center of all grouped patterns and the center of the corresponding write field is less than a preset threshold. This process eliminates the need for repeated manual adjustments or trial and error, ensuring that each grouped pattern meets the high-precision center alignment requirements, ultimately obtaining the globally optimal selected exposure area, fundamentally improving the pattern placement accuracy and process consistency of electron beam exposure.

[0072] In one embodiment, such as Figure 3 As shown, the process of selecting a target exposure area from each initial exposure area includes the following steps:

[0073] S3011, for each first initial exposure area, determine from multiple exposure patterns a grouped pattern that matches any write field of the first initial exposure area.

[0074] In an optional embodiment, for each first initial exposure area, determining a grouped pattern that matches any write field of the first initial exposure area from a plurality of exposure patterns includes: for any write field in each first initial exposure area, if the distance between the center of the write field and the center of the exposure pattern is less than a set threshold, determining the exposure pattern as a grouped pattern.

[0075] S3012, Based on the graphic statistics of the grouped graphics, determine the graphic fit of the first initial exposure area; the graphic fit is positively correlated with the graphic statistics.

[0076] In an optional embodiment, the image statistics include the number of graphics. Determining the graphics fit of the first initial exposure region based on the graphics statistics of the grouped graphics includes: determining the number of graphics in the grouped graphics as the graphics fit of the first initial exposure region.

[0077] In an optional embodiment, the graphic statistics information includes the number of graphics or the area of ​​graphics. Determining the graphic fit of the first initial exposure region based on the graphic statistics of the grouped graphics includes: determining the area of ​​the first initial exposure region; and determining the ratio between the graphic statistics and the area as the graphic fit of the first initial exposure region.

[0078] The graphic area refers to the area of ​​the first initial exposure region occupied by the grouped graphics.

[0079] In the above embodiments, by introducing the quantitative indicator of graphic adaptation (which is positively correlated with graphic statistics), the capacity of each first initial exposure area to accommodate the exposed graphic can be evaluated. This method does not require manual experience judgment or repeated trial selection, effectively avoiding the waste of writing field resources or the problem of sparse graphic distribution caused by improper area selection, and significantly improving the space utilization efficiency of the writing field.

[0080] S3013, among the first initial exposure regions, the first initial exposure region with the highest graphic adaptation is determined as the target exposure region that adapts to the multiple exposure graphics.

[0081] In the above embodiments, by matching each first initial exposure area with grouped graphics and quantifying the graphic fit based on the graphic statistics of the grouped graphics, the area with the highest graphic fit is finally selected as the target exposure area, thus achieving adaptive selection of the exposure area without the need for manual experience judgment, significantly improving the accuracy and efficiency of area selection.

[0082] In one embodiment, determining a new selected exposure region matching the graphics to be grouped based on the graphic information of the graphics to be grouped includes: when there is only one graphics to be grouped, determining the graphic center of the graphics to be grouped based on the graphic information of the graphics to be grouped; constructing a write field matching the graphics to be grouped and a second initial exposure region containing the write field based on the graphic center of the graphics to be grouped; performing a rigid body transformation on the second initial exposure region to determine the center distance between the graphic center of the graphics to be grouped after the rigid body transformation and the center of the write field of the second initial exposure region after the rigid body transformation; and obtaining a new selected exposure region matching the graphics to be grouped based on the transformed second initial exposure region if the center distance after the rigid body transformation converges.

[0083] For example, if the center distance after the rigid body transformation reaches a preset minimum value, it is determined that the center distance after the rigid body transformation has converged. Alternatively, if the center distance after the rigid body transformation is less than the center distance before the rigid body transformation, it is determined that the center distance after the rigid body transformation has converged.

[0084] In the above embodiments, high-precision automatic adaptation of individual missed exposure patterns is achieved. This process does not require manual intervention and can solve the problem of missed exposure patterns due to manual intervention in traditional methods. It ensures that all exposure patterns can eventually obtain a writing field configuration that meets the center alignment requirements, and significantly improves the completeness of exposure area division and individual accuracy of pattern positioning.

[0085] In one embodiment, determining a new selected exposure region matching the graphics to be grouped based on the graphic information of the graphics to be grouped includes: when there are at least two graphics to be grouped, determining the graphic center of each graphics to be grouped based on the graphic information of the graphics to be grouped; constructing a write field matching the graphics to be grouped and a second initial exposure region containing the write field based on the graphic center of the graphics to be grouped; when the graphics to be grouped are used as new exposure graphics and the second initial exposure region is used as new first initial exposure region, returning to the step of determining a selected exposure region adapted to multiple exposure graphics based on each first initial exposure region; and when each graphics to be grouped has a new selected exposure region that is adapted to each graphics to be grouped, obtaining a new selected exposure region that matches each graphics to be grouped.

[0086] In the above embodiments, when there are multiple graphics to be grouped, a second initial exposure area matching the center of each graphic is constructed for each graphic to be grouped, and the process is repeated to redetermine the selected exposure area. This ensures that each graphic in the multiple graphics to be grouped has an exposure area that matches the center of its graphic, which significantly improves the completeness of the exposure area division and the individual accuracy of graphic positioning.

[0087] In one embodiment, an exposure region segmentation file for multiple exposure patterns is obtained based on the exposure patterns adapted to each selected exposure region, including: for each selected exposure region, layer segmentation information is obtained by configuring the exposure patterns adapted to the selected exposure region as the same layer; and based on the layer segmentation information and the region information of each selected exposure region, an exposure region segmentation file for multiple exposure patterns is obtained.

[0088] The layer division information includes the layer number of each layer, the region number of the selected exposure area belonging to each layer number, and the graphic information of the exposure pattern that matches the selected exposure area belonging to each layer number. The region information includes the center coordinates of each selected exposure area and the layer number corresponding to each selected exposure area.

[0089] In an optional embodiment, based on the layer division information and the area information of each selected exposure area, an exposure area division file for multiple exposure patterns is obtained, including: generating a new layout file that can be recognized by an electron beam lithography machine based on the layer division information; generating a configuration file that can be recognized by an electron beam lithography machine based on the area information of each selected exposure area; and combining the new layout file and the configuration file to obtain an exposure area division file for multiple exposure patterns.

[0090] For example, generating a new layout file that can be recognized by an electron beam lithography machine based on layer division information includes: generating a first intermediate file with a convertible format based on the layer division information; and converting the first intermediate file into a new layout file that can be recognized by the electron beam lithography machine using basic programming tools or software. This enables device adaptation and is simple to operate and cost-effective.

[0091] For example, based on the regional information of each selected exposure area, a configuration file that can be recognized by the electron beam lithography machine is generated, including: generating a second intermediate file in a convertible format based on the regional information of each selected exposure area; and converting the second intermediate file into a configuration file that can be recognized by the electron beam lithography machine using basic programming tools or software. This enables equipment adaptation and is simple to operate and cost-effective.

[0092] The first and second intermediate files can be TXT format files containing coordinate and layer information. The configuration file can be a WOR file. A WOR file is a configuration file recognizable by the electron beam lithography machine, used to record information such as the center coordinates of the selected exposure area and the corresponding layer number, enabling the equipment to match the new pattern file.

[0093] In the above embodiments, by configuring the adapted exposure graphics as the same layer according to the selected exposure area and combining the area information to generate a structured exposure area division file, the engineering usability of the exposure area division file can be significantly improved.

[0094] In one embodiment, the method further includes: if there are no images to be grouped that do not match any write field of the selected exposure region in each exposure image, obtaining an exposure region segmentation file for multiple exposure images based on the exposure images that are adapted to each of the selected exposure regions.

[0095] For example, based on the exposure patterns adapted to the selected exposure areas, an exposure area division file for multiple exposure patterns is obtained, including: obtaining layer division information by configuring the exposure patterns adapted to the selected exposure areas as the same layer; and obtaining an exposure area division file for multiple exposure patterns based on the layer division information and the area information of the selected exposure areas.

[0096] In the above embodiments, by completing the region adaptation and file generation of all exposure patterns at once, the efficiency of exposure data preparation can be improved, which helps to shorten the turnaround time from layout design to actual exposure process.

[0097] In one embodiment, the method further includes: when loading an exposure region division file into an electron beam lithography machine, if the exposure region division file passes verification, controlling the electron beam lithography machine to perform electron beam exposure operation based on the exposure region division file.

[0098] For example, if the exposure area division file passes verification, the electron beam lithography machine is controlled to perform electron beam exposure based on the exposure area division file. This includes: if the exposure area division file passes verification through the equipment verification program, the electron beam lithography machine is controlled to perform electron beam exposure based on the exposure area division file. The equipment verification program verifies that the exposure layer and the corresponding selected exposure area are loaded correctly and matched without error, and that all exposure patterns are located near the write field center point without any splicing defects.

[0099] In the above embodiments, when an exposure area division file is obtained, the reliability and safety of the electron beam exposure process can be improved by loading the exposure area division file into the electron beam lithography machine for re-verification.

[0100] In summary, such as Figure 4 The diagram illustrates a flowchart of an exposure image processing method, using an application of this method to a computer device as an example. The method includes the following steps:

[0101] S401, Preprocess GDS files.

[0102] For example, for the target layer in a GDS file, the preprocessed GDS file is obtained by merging the exposure images of the target layer that have connected parts.

[0103] S402 reads and parses the preprocessed GDS file.

[0104] For example, the preprocessed GDS file is parsed to obtain the graphic information of each of the multiple exposure graphics.

[0105] S403, Initially establish the exposure area.

[0106] For example, for each exposure pattern, based on the graphic information of the exposure pattern, a write field matching the exposure pattern and a first initial exposure region containing the write field are constructed.

[0107] S404, Determine the initial seed point.

[0108] For example, target exposure regions representing initial seed points are selected from each of the first initial exposure regions; among the multiple exposure patterns, there are grouped patterns that match any write field in the target exposure regions.

[0109] S405, phase optimization of the exposure area.

[0110] S406, optimize whether the verification passes.

[0111] For example, a rigid body transformation is performed on the target exposure area to determine the center distance between the write field center of the target exposure area after the rigid body transformation and the center of the matching grouped graphics. If the central tendency statistics of each center distance converge, and each center distance is less than a preset threshold, the optimization verification is determined to be successful, and the transformed target exposure area is determined as the selected exposure area that matches the multiple exposure graphics. If any center distance is greater than or equal to the preset threshold, the optimization verification is determined to be unsuccessful, and the process returns to the step of performing a rigid body transformation on the target exposure area.

[0112] S407, Filter the graphics to be grouped.

[0113] For example, from each exposure pattern, patterns to be grouped are filtered out that do not match any write field of the selected exposure area.

[0114] S408 generates a new GDS file and a WOR file.

[0115] For example, based on the layer division information, a new pattern file (i.e., a new GDS file) that can be recognized by the electron beam lithography machine is generated; based on the area information of each selected exposure area, a configuration file (i.e., a WOR file) that can be recognized by the electron beam lithography machine is generated.

[0116] S409, Device Load Verification.

[0117] For example, the new pattern file and configuration file are combined to obtain an exposure area division file for multiple exposure patterns; when the exposure area division file is loaded into the electron beam lithography machine, if the exposure area division file is verified, the electron beam lithography machine is controlled to perform electron beam exposure operation based on the exposure area division file.

[0118] As can be seen from the above, this application achieves precise division of small-size pattern exposure areas in electron beam lithography machines through a complete process of "preprocessing-parsing-preliminary construction-optimization verification-grouping and filtering-file generation-equipment verification". Therefore, the method provided in this application can achieve the following effects:

[0119] The cost is extremely low, requiring no additional economic investment. Specifically, all core functions, such as GDS file parsing, center coordinate calculation, exposure area optimization, and file generation, are implemented through self-written code. There is no need to purchase expensive third-party software; it can be achieved using only existing computer terminals and basic programming environments. This significantly reduces the economic cost of exposure area division and solves the core pain point of expensive third-party software in traditional technologies.

[0120] It is simple and convenient to operate, with a high degree of automation. Specifically, the process is clear and the steps are coherent. From GDS file preprocessing to device loading and verification, most of the automated operations can be completed by simply starting the written code. There is no need for operators to manually establish exposure areas point by point or check the position of the graphic point by point, which greatly reduces the reliance on the operator's experience and workload, and solves the problems of tedious and inefficient manual operation.

[0121] High reliability and high exposure success rate. Specifically, an optimization and verification process is implemented to rigorously verify each optimized exposure area, ensuring that all polygons are located near the center point of the field, thus avoiding exposure defects caused by unreasonable division. At the same time, fragmentation interference is eliminated through image preprocessing, and phase optimization ensures the optimal image position, further improving the accuracy of exposure area division. Compared with manual operation, this significantly reduces human error and increases the exposure success rate.

[0122] Highly efficient and suitable for batch processing of small-sized patterns. Specifically, by determining the selected exposure area and then repeatedly building the process, all patterns can be quickly allocated, which greatly improves efficiency compared to manual point-by-point processing; at the same time, the automated file generation does not require additional manual configuration and can be directly connected to the electron beam lithography machine, adapting to the batch exposure processing needs of small-sized patterns.

[0123] It boasts strong adaptability and requires no equipment modification. Specifically, the generated WOR file can be directly recognized by electron beam lithography machines, seamlessly adapting to the equipment. No hardware or software modifications are needed for existing Raith electron beam lithography machines; exposure operations can be performed simply by loading the generated GDS and WOR files. It has a wide range of applications and is highly practical.

[0124] In summary, such as Figure 5 As shown, an exposure image processing method is provided. Taking the application of this method to a computer device as an example, the method includes the following steps:

[0125] S501 acquires the graphic information of each of the multiple exposure patterns.

[0126] S502, for each exposure pattern, based on the graphic information of the exposure pattern, constructs a write field that matches the exposure pattern, and a first initial exposure area containing the write field.

[0127] S503, for each first initial exposure region, determine from multiple exposure patterns a grouped pattern that matches any write field of the first initial exposure region.

[0128] S504, based on the graphic statistics of the grouped graphics, determine the graphic fit of the first initial exposure area; the graphic fit is positively correlated with the graphic statistics.

[0129] S505, among the first initial exposure regions, the first initial exposure region with the highest graphic adaptation is determined as the target exposure region that adapts to the multiple exposure graphics; the multiple exposure graphics include grouped graphics that match any write field in the target exposure region.

[0130] S506, Perform a rigid body transformation on the target exposure area, and determine the center distance between the write field center of the target exposure area after the rigid body transformation and the graphic center of the matched grouped graphic; the graphic center is determined based on the graphic information.

[0131] S507, if the central tendency statistics of each center distance converge, and if there is a center distance greater than or equal to a preset threshold, then return to the step of performing rigid body transformation on the target exposure area.

[0132] S508, if the central tendency statistical values ​​of the center distances converge and all center distances are less than the preset threshold, then the transformed target exposure area is determined as the selected exposure area that matches the multiple exposure patterns.

[0133] S509, if there is a grouping pattern in each exposure pattern that does not match any write field of the selected exposure area, a new selected exposure area that matches the grouping pattern is determined based on the pattern information of the grouping pattern.

[0134] S510, when each exposure pattern has a corresponding selected exposure area, an exposure area division file for multiple exposure patterns is obtained based on the exposure patterns that are corresponding to each selected exposure area.

[0135] S511, when the exposure area division file is loaded into the electron beam lithography machine, if the exposure area division file is verified, the electron beam lithography machine is controlled to perform electron beam exposure operation based on the exposure area division file.

[0136] The contents of S501 to S511 can be referred to the aforementioned content description, and will not be repeated here.

[0137] In summary, this application establishes a simple, convenient, efficient, and inexpensive method for processing exposure patterns to achieve matching between the center of the exposure pattern and the write field center of the exposure area. Specifically, using the write field center of the exposure area as a reference, a preset threshold is used to determine the distance between the exposure pattern and the write field, enabling reasonable grouping of polygons and distinguishing between grouped patterns and patterns to be processed. Furthermore, by determining target exposure areas adapted to multiple exposure patterns based on each initial exposure area, and using the center of the adapted exposure pattern as a basis, the coverage efficiency of the exposure area can be improved. The target exposure area can also be adjusted by translation or rotation to minimize the average distance from all exposure patterns within the area to the write field center, thus obtaining the selected exposure area and avoiding write field stitching defects. In addition, the distance between the exposure pattern within the selected exposure area and the matching write field center is checked one by one using a preset threshold. If the requirements are not met, the process returns to the phase optimization step for reprocessing to ensure reasonable division. Finally, by re-layering the exposure patterns of the same exposure area to generate a new GDS file, a WOR file containing the center coordinates and layer number of the exposure area is generated simultaneously, achieving seamless device adaptation without additional manual configuration.

[0138] It should be understood that although the steps in the flowcharts of the embodiments described above are shown sequentially according to the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless explicitly stated herein, there is no strict order restriction on the execution of these steps, and they can be executed in other orders. Moreover, at least some steps in the flowcharts of the embodiments described above may include multiple steps or multiple stages. These steps or stages are not necessarily completed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be performed alternately or in turn with other steps or at least some of the steps or stages in other steps. It is understood that the steps in different embodiments can be freely combined as needed, and all non-contradictory solutions formed by such combinations are within the scope of protection of this application.

[0139] Based on the same inventive concept, this application also provides an exposure pattern processing apparatus for implementing the exposure pattern processing method described above. The solution provided by this apparatus is similar to the implementation described in the above method; therefore, the specific limitations in one or more exposure pattern processing apparatus embodiments provided below can be found in the limitations of the exposure pattern processing method described above, and will not be repeated here.

[0140] In one exemplary embodiment, such as Figure 6 As shown, an exposure pattern processing apparatus is provided, comprising: an acquisition module 601, a construction module 602, a first processing module 603, a second processing module 604, and a third processing module 605, wherein:

[0141] The module 601 is used to acquire graphic information of each of the multiple exposure graphics; the module 602 is used to construct, based on the graphic information of each exposure graphic, a write field matching the exposure graphic and a first initial exposure region containing the write field; the first processing module 603 is used to determine a selected exposure region adapted to the multiple exposure graphics based on each of the first initial exposure regions; the second processing module 604 is used to determine a new selected exposure region matching the to-be-grouped graphics based on the graphic information of the to-be-grouped graphics when there are to-be-grouped graphics in each of the exposure graphics that do not match any write field of the selected exposure region; the third processing module 605 is used to obtain an exposure region division file for the multiple exposure graphics based on the exposure graphics adapted to each of the selected exposure regions when there are adapted selected exposure regions in each of the exposure graphics.

[0142] In one embodiment, the first processing module 603 is further configured to: filter target exposure regions from each of the first initial exposure regions; the plurality of exposure patterns include grouped patterns that match any write field in the target exposure region; perform a rigid body transformation on the target exposure region to determine the center distance between the write field center of the target exposure region after the rigid body transformation and the center of the pattern of the matched grouped pattern; the pattern center is determined based on the pattern information; and, if the central tendency statistics of each of the center distances converge, determine a selected exposure region that matches the plurality of exposure patterns based on the transformed target exposure region.

[0143] In one embodiment, the first processing module 603 is further configured to: return to the step of performing rigid body transformation on the target exposure area if, among the various center distances, there is a center distance greater than or equal to a preset threshold; and determine the transformed target exposure area as a selected exposure area that is adapted to the plurality of exposure patterns if, among the various center distances, there is a center distance less than the preset threshold.

[0144] In one embodiment, the first processing module 603 is further configured to: for each first initial exposure region, determine, from the plurality of exposure patterns, a grouped pattern that matches any of the write fields of the first initial exposure region; determine, based on the graphic statistics of the grouped pattern, the graphic fit of the first initial exposure region; the graphic fit is positively correlated with the graphic statistics; and determine, among the first initial exposure regions, the first initial exposure region with the largest graphic fit as the target exposure region that fits the plurality of exposure patterns.

[0145] In one embodiment, the graphic statistics information includes the number of graphics or the area of ​​graphics; the first processing module 603 is further configured to: determine the area of ​​the first initial exposure region; and determine the ratio between the graphic statistics information and the area as the graphic fit of the first initial exposure region.

[0146] In one embodiment, the third processing module 605 is further configured to: for each selected exposure area, obtain layer division information by configuring the exposure pattern adapted to the selected exposure area as the same layer; and obtain an exposure area division file for the plurality of exposure patterns based on the layer division information and the area information of each selected exposure area.

[0147] In one embodiment, the third processing module 605 is further configured to: when the exposure region division file is loaded into the electron beam lithography machine, if the exposure region division file is verified, control the electron beam lithography machine to perform electron beam exposure operation based on the exposure region division file.

[0148] Each module in the aforementioned exposure pattern processing apparatus can be implemented entirely or partially through software, hardware, or a combination thereof. These modules can be embedded in or independent of the processor in a computer device, or stored in the memory of a computer device as software, so that the processor can call and execute the operations corresponding to each module.

[0149] In one exemplary embodiment, a computer device is provided, which may be a server, and its internal structure diagram may be as follows: Figure 7 As shown, this computer device includes a processor, memory, input / output (I / O) interfaces, and a communication interface. The processor, memory, and I / O interfaces are connected via a system bus, and the communication interface is also connected to the system bus via the I / O interfaces. The processor provides computational and control capabilities. The memory includes non-volatile storage media and internal memory. The non-volatile storage media stores the operating system, computer programs, and a database. The internal memory provides the environment for the operation of the operating system and computer programs stored in the non-volatile storage media. The database stores relevant data during the exposure pattern processing. The I / O interfaces are used for exchanging information between the processor and external devices. The communication interface is used for communicating with external terminals via a network connection. When the computer program is executed by the processor, it implements an exposure pattern processing method.

[0150] In one exemplary embodiment, a computer device is provided, which may be a terminal, and its internal structure diagram may be as follows: Figure 8As shown, the computer device includes a processor, memory, input / output interfaces, a communication interface, a display unit, and an input device. The processor, memory, and input / output interfaces are connected via a system bus, and the communication interface, display unit, and input device are also connected to the system bus via the input / output interfaces. The processor provides computing and control capabilities. The memory includes non-volatile storage media and internal memory. The non-volatile storage media stores the operating system and computer programs. The internal memory provides an environment for the operation of the operating system and computer programs stored in the non-volatile storage media. The input / output interfaces are used for exchanging information between the processor and external devices. The communication interface is used for wired or wireless communication with external terminals; wireless communication can be achieved through Wi-Fi, mobile cellular networks, Near Field Communication (NFC), or other technologies. When the computer program is executed by the processor, it implements an exposure graphics processing method. The display unit is used to form a visually visible image and can be a display screen, a projection device, or a virtual reality imaging device. The display screen can be an LCD screen or an e-ink screen. The input device of the computer device can be a touch layer covering the display screen, or buttons, trackballs, or touchpads set on the casing of the computer device, or external keyboards, touchpads, or mice, etc.

[0151] Those skilled in the art will understand that Figure 7 or Figure 8 The structure shown is merely a block diagram of a portion of the structure related to the present application and does not constitute a limitation on the computer device to which the present application is applied. Specific computer devices may include more or fewer components than those shown in the figure, or combine certain components, or have different component arrangements.

[0152] In one embodiment, a computer device is also provided, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the computer program to implement the steps in the above method embodiments.

[0153] In one embodiment, a computer-readable storage medium is provided having a computer program stored thereon that, when executed by a processor, implements the steps in the above method embodiments.

[0154] In one embodiment, a computer program product is provided, including a computer program that, when executed by a processor, implements the steps in the above method embodiments.

[0155] It should be noted that the user information (including but not limited to user device information, user personal information, etc.) and data (including but not limited to data used for analysis, data stored, data displayed, etc.) involved in this application are all information and data authorized by the user or fully authorized by all parties, and the collection, use and processing of the relevant data must comply with relevant regulations.

[0156] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. The computer program can be stored in a non-volatile computer-readable storage medium, and when executed, it can include the processes of the embodiments of the above methods. Any references to memory, databases, or other media used in the embodiments provided in this application can include at least one of non-volatile memory and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take many forms, such as Static Random Access Memory (SRAM) or Dynamic Random Access Memory (DRAM). The databases involved in the embodiments provided in this application may include at least one type of relational database and non-relational database. Non-relational databases may include, but are not limited to, blockchain-based distributed databases. The processors involved in the embodiments provided in this application may be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logic devices, artificial intelligence (AI) processors, etc., and are not limited to these.

[0157] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this application.

[0158] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of this patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.

Claims

1. An exposure pattern processing method, characterized in that, The method includes: Acquire the graphic information of each of the multiple exposure graphics; For each of the exposure patterns, based on the graphic information of the exposure pattern, a write field matching the exposure pattern and a first initial exposure region containing the write field are constructed; Based on each of the first initial exposure areas, a selected exposure area that is adapted to the plurality of exposure patterns is determined; If there is a grouping pattern in each of the exposure patterns that does not match any write field of the selected exposure area, a new selected exposure area that matches the grouping pattern is determined based on the pattern information of the grouping pattern. When each of the exposure patterns has a corresponding selected exposure area, an exposure area division file for the multiple exposure patterns is obtained based on the exposure patterns that are corresponding to each of the selected exposure areas.

2. The method according to claim 1, characterized in that, The step of determining a selected exposure region that matches the plurality of exposure patterns based on each of the first initial exposure regions includes: Target exposure regions are selected from each of the first initial exposure regions; the plurality of exposure patterns include grouped patterns that match any write field in the target exposure regions; A rigid body transformation is performed on the target exposure area to determine the center distance between the write field center of the target exposure area after the rigid body transformation and the center of the matched grouped graphics; the center of the graphics is determined based on the graphics information. When the central tendency statistics of each of the center distances converge, a selected exposure area that matches the plurality of exposure patterns is determined based on the transformed target exposure area.

3. The method according to claim 2, characterized in that, The step of determining a selected exposure region that matches the plurality of exposure patterns based on the transformed target exposure region includes: If any of the center distances is greater than or equal to a preset threshold, the step of performing rigid body transformation on the target exposure area is returned. If the center distances of all the aforementioned points are less than the preset threshold, the transformed target exposure area is determined as the selected exposure area that is compatible with the multiple exposure patterns.

4. The method according to claim 2, characterized in that, The step of filtering the target exposure region from each of the first initial exposure regions includes: For each of the first initial exposure regions, a grouped pattern that matches any of the write fields of the first initial exposure region is determined from the plurality of exposure patterns; Based on the graphic statistics of the grouped graphics, the graphic fit of the first initial exposure area is determined; the graphic fit is positively correlated with the graphic statistics. The first initial exposure region with the highest graphic adaptation among all the first initial exposure regions is determined as the target exposure region that adapts to the plurality of exposure graphics.

5. The method according to claim 4, characterized in that, The graphic statistics information includes the number of graphics or the area of ​​graphics; determining the graphic fit of the first initial exposure area based on the graphic statistics information of the grouped graphics includes: Determine the area of ​​the first initial exposure region; The ratio between the graphic statistics and the area of ​​the region is determined as the graphic fit of the first initial exposure region.

6. The method according to any one of claims 1 to 5, characterized in that, The process of obtaining an exposure region segmentation file for the multiple exposure patterns based on the exposure patterns adapted to each of the selected exposure regions includes: For each selected exposure area, layer division information is obtained by configuring the exposure pattern adapted to the selected exposure area as the same layer; Based on the layer division information and the region information of each selected exposure region, an exposure region division file is obtained for the multiple exposure graphics.

7. The method according to claim 6, characterized in that, The method further includes: When the exposure area division file is loaded into the electron beam lithography machine, if the exposure area division file passes verification, the electron beam lithography machine is controlled to perform electron beam exposure operation based on the exposure area division file.

8. An exposure pattern processing apparatus, characterized in that, The device includes: The acquisition module is used to acquire the graphic information of each of the multiple exposure graphics; A construction module is used to construct, for each of the exposure patterns, a write field matching the exposure pattern and a first initial exposure region containing the write field, based on the graphic information of the exposure pattern. The first processing module is used to determine a selected exposure area that is compatible with the plurality of exposure patterns based on each of the first initial exposure areas; The second processing module is used to determine a new selected exposure region that matches the selected exposure region based on the graphic information of the selected exposure region when there is a grouping pattern in each of the exposure patterns that does not match any write field of the selected exposure region. The third processing module is used to obtain an exposure region division file for the multiple exposure patterns based on the exposure patterns that are adapted to each of the selected exposure regions, when each of the exposure patterns has a matching selected exposure region.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, characterized in that, When the processor executes the computer program, it implements the steps of the method according to any one of claims 1 to 7.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the steps of the method according to any one of claims 1 to 7.

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