Method, system and apparatus for showerhead shower analysis for vapor deposition

Abstract

The application belongs to the technical field of deposition, and provides a shower head spraying state analysis method, system and device for vapor deposition, wherein the shower head spraying state analysis method comprises: obtaining spraying state parameters, the spraying state parameters comprising at least one of pressure variation in a reaction chamber, radio frequency reflection variation, gas flow conductance variation and plasma uniformity; performing weighted combination on the spraying state parameters to construct a composite blockage index model, and obtaining a composite blockage index corresponding to a vapor deposition process through the composite blockage index model; constructing a spraying state model based on the composite blockage index, inputting the composite blockage index corresponding to the vapor deposition process into the spraying state model to obtain a spraying state, and the spraying state comprises a normal state and a blockage state, and the composite blockage index corresponding to the normal state is smaller than the composite blockage index corresponding to the blockage state. The application integrates multi-source sensing data, has high sensitivity, and can realize intelligent diagnosis of real-time quantification of the spraying state of the shower head.

Description

Technical Field

[0001] This invention belongs to the field of deposition technology and relates to a method, system and device for analyzing the spray state of a spray head used in vapor deposition. Background Technology

[0002] In vapor deposition processes such as PECVD, the spray head is a core component, and its condition directly affects the uniformity, density, and particulate contamination level of the film. However, existing spray head diagnostic and maintenance technologies have revealed significant technical bottlenecks in practical applications, as follows: Traditional methods rely on manual, periodic disassembly of spray heads for visual inspection, or on indirect assessment of spray head condition through film thickness testing after each production batch. This approach, based on visual inspection or offline diagnosis, suffers from inherent limitations due to its inherent lag and subjectivity. This approach is akin to "hindsight bias," failing to detect the process of nozzle micro-orifice clogging or surface deposit accumulation in real time during production. Due to the lack of quantitative standards, over-reliance on experience-based judgment can easily lead to either insufficient maintenance (resulting in wafer scrap) or excessive maintenance (shortening the lifespan of expensive components). Furthermore, disassembly and inspection are time-consuming and labor-intensive, directly reducing the overall utilization rate of the equipment.

[0003] To improve objectivity, existing technologies attempt to analyze uniformity by capturing plasma images through a chamber observation window. While visualization is achieved, the optical window is highly susceptible to contamination by process byproducts, leading to image quality degradation over time and requiring frequent cleaning. More importantly, this method typically triggers feedback control only after significant plasma inhomogeneity has already occurred (i.e., the process has been damaged). It is more of a "compensation mechanism" than a true "prediction mechanism," and the image processing algorithms are complex with high computational latency, making it difficult to meet the demands of high-precision real-time process control.

[0004] In summary, existing technologies generally suffer from drawbacks such as limited diagnostic methods, poor real-time performance, weak anti-interference capabilities, and the inability to accurately quantify the early deterioration of the nozzle, which makes it impossible to achieve optimal component life management while ensuring yield.

[0005] There is an urgent need for an intelligent diagnostic method and system that can integrate multi-source sensor data, possess high sensitivity, and quantify the spray status of sprinkler heads in real time. Summary of the Invention

[0006] In view of the above problems, one embodiment of the present invention aims to provide a method for analyzing the spray status of a spray head for vapor deposition, so as to achieve real-time intelligent diagnosis of the spray status of the spray head.

[0007] Another objective of one embodiment of the present invention is to provide a spray head spray status analysis system and apparatus for vapor phase deposition.

[0008] According to a first aspect of the present invention, a method for analyzing the spray state of a spray head in a vapor deposition process is provided, comprising: Parameter acquisition steps: Obtain spray state parameters, which include at least one of the following: pressure change, radio frequency reflection change, gas conductance change, and plasma homogeneity within the reaction chamber; Steps for obtaining the composite blockage index: a composite blockage index model is constructed by weighted combination of the spray state parameters, and the composite blockage index corresponding to the vapor deposition process is obtained through the composite blockage index model. Spray state analysis steps: Construct a spray state model based on the composite blockage index. Input the composite blockage index corresponding to the vapor deposition process into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

[0009] In one possible implementation, the step of obtaining the composite congestion index includes: The composite congestion index model is constructed using the following formula to calculate... :

[0010] in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; For radio frequency weights; This represents the uniformity weight.

[0011] In one possible implementation, in the composite blockage index model, the radio frequency weight corresponding to the radio frequency reflection change is greater than the uniformity weight corresponding to the plasma uniformity.

[0012] In one possible implementation, the step of obtaining the composite congestion index includes: The composite congestion index model is constructed using the following formula to calculate... :

[0013] in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; This represents the pressure change within the reaction chamber; This is due to changes in gas conductivity; For radio frequency weights; The uniformity weight; Pressure weight; This represents the gas conductance weight.

[0014] In one possible implementation, the radio frequency weight, uniformity weight, pressure weight, and gas conductance weight decrease sequentially.

[0015] In one possible implementation, the spray states in the blocked state, in order of increasing composite index value, include spray monitoring, worsening of spray head blockage, spray warning, and spray shutdown.

[0016] In one possible implementation, the spray state analysis step involves constructing a spray state model using the following formula:

[0017] in, In spray mode; This is the composite congestion index.

[0018] In one possible implementation, the spray head spray state analysis method for vapor deposition further includes a decision step, which includes: Different decisions are made based on different spraying conditions, including normal operation and real-time monitoring.

[0019] In one possible implementation, the decision also includes one or more of the following: Clean the shower head; Perform preventative maintenance on the spray heads. Abort vapor deposition; Replace the spray head.

[0020] In one possible implementation, the parameter acquisition step includes several of the following steps: The steps for obtaining plasma homogeneity include: Acquire plasma images; Obtain the region of interest in the plasma image; Plasma uniformity is obtained by measuring the brightness of the region of interest. The steps for obtaining the pressure change within the reaction chamber include: Obtain the pressure in the reaction chamber of the spray head when the spraying state is normal, and establish a pressure baseline; Pressure changes are obtained by measuring the real-time pressure changes within the reaction chamber relative to the pressure baseline. The steps for obtaining changes in radio frequency reflection include: The radio frequency reflection power of the spray head in normal spray state during the vapor deposition process is obtained to construct the radio frequency baseline; The change in radio frequency reflection is obtained by measuring the real-time change in radio frequency reflection power relative to the radio frequency baseline during the vapor deposition process. The steps for obtaining changes in gas conductivity include: Gas conductance is characterized by exhaust pressure; Obtain the exhaust pressure of the reaction chamber in the vapor deposition process of the spray head in normal spray state, and construct the gas flow conduction baseline; The gas conductance variation is obtained by measuring the real-time exhaust pressure of the gas in the reaction chamber relative to the gas conductance baseline during the vapor deposition process.

[0021] In one possible implementation, the spray head spray state analysis method for vapor deposition further includes: The baseline update steps include: Within a vapor deposition cycle, when the spray status analysis step determines that the spray status is normal, the pressure baseline, radio frequency baseline, and gas flow conductance baseline are adaptively updated using the pressure, radio frequency reflection power, and exhaust pressure within the reaction chamber corresponding to that vapor deposition cycle, respectively. Within a vapor deposition cycle, when the spray state analysis step determines that the spray state is blocked, the parameter acquisition step is returned. The pressure, radio frequency reflection power, and exhaust pressure in the reaction chamber of the first subsequent cycle, which is determined to be normal by the spray state analysis step, are updated respectively to update the pressure baseline, radio frequency baseline, and gas flow conduction baseline.

[0022] In one possible implementation, the plasma homogeneity acquisition step further includes: By analyzing the scintillation and dark areas in the plasma image, the corresponding spray holes that reduce plasma uniformity can be identified.

[0023] In one possible implementation, a normalization step is included before the step of obtaining the composite congestion index, the normalization step comprising: The spray state parameters are normalized.

[0024] According to a second aspect of the present invention, a spray head spray state analysis system for vapor deposition is provided, comprising a parameter acquisition module, a composite clogging index acquisition module, and a spray state analysis module: The parameter acquisition module is configured to acquire spray state parameters in the vapor deposition process, the spray state parameters including at least one of pressure change, radio frequency reflection change, gas conductance change and plasma uniformity in the reaction chamber; The composite blockage index acquisition module is configured to input the spray state parameters obtained by the parameter acquisition module into the composite blockage index model to obtain the composite blockage index corresponding to the vapor deposition process; the composite blockage index model includes a weighted combination of multiple spray state parameters; The spray state analysis module is configured to input the composite blockage index corresponding to the vapor deposition process obtained by the composite blockage index acquisition module into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

[0025] In one possible implementation, the spray head spray status analysis system for vapor deposition further includes: The decision module is configured to generate corresponding decisions based on the spray status of the vapor deposition process obtained by the spray status analysis module, and the decisions include normal operation and real-time monitoring.

[0026] In one possible implementation, the spray head spray status analysis system for vapor deposition further includes: A sensor network, communicatively connected to the parameter acquisition module, includes multiple components such as pressure sensors, radio frequency matching devices, automatic pressure controllers, and cameras. The pressure sensor is installed inside the reaction chamber to measure the pressure changes inside the reaction chamber. The radio frequency matching unit is located outside the reaction chamber and is used to measure the radio frequency reflected power; The automatic pressure controller is installed on the pump suction pipe that evacuates the reaction chamber and is used to measure the exhaust pressure of the reaction chamber. The camera is located outside the reaction chamber and is used to capture plasma images.

[0027] According to a third aspect of the present invention, a spray head spray state analysis device for vapor deposition is provided, comprising a computing device including a memory and a processor; The memory is used to store computer-executable instructions, and the processor is used to execute the computer-executable instructions. When the computer-executable instructions are executed by the processor, they implement the steps of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0028] Beneficial effects

[0029] The spray head spray state analysis method for vapor deposition described in this invention solves the problems of existing technologies that can only passively respond after macroscopic faults such as cavity pressure or radio frequency anomalies, and that single sensors are susceptible to interference leading to high false alarm rates, through the close coordination of three steps: parameter acquisition, composite blockage index construction, and spray state analysis. The parameter acquisition step first introduces initial optical features such as plasma brightness and dark areas, and combines them with multidimensional data such as pressure, radio frequency matching, and APC to capture early degradation signals of the spray head from both microscopic optical evolution and macroscopic physical parameters. The composite blockage index acquisition step then integrates the above multi-source heterogeneous data into a single quantitative index through a weighted combination model. The cross-validation mechanism of visual data on physical parameters effectively filters out environmental noise and equipment drift, accurately identifying the initial blockage trend rather than waiting for the fault to occur. The spray state analysis step finally transforms continuous early degradation signals into a clear "normal / blocked" decision based on the composite index-driven state determination model, completely replacing the lagging mode that relies on a single threshold or post-event detection. The three-step synergistic effect enables early and accurate detection of spray head blockage and predictive maintenance triggering, significantly reducing the false alarm rate and maintaining plasma stability and uniformity, thereby improving process yield and mass production applicability, and shifting equipment maintenance from passive emergency repair to proactive prevention.

[0030] The spray head status analysis system for vapor deposition described in this invention first breaks through the limitations of a single sensor through a parameter acquisition module, simultaneously collecting multi-dimensional heterogeneous data such as pressure, radio frequency reflection, gas conductance, and plasma uniformity. This comprehensively characterizes the physical state of the spray head from three orthogonal dimensions: fluid dynamics, electrical characteristics, and process results. The composite blockage index acquisition module then fuses the aforementioned multi-source data into a single quantitative index through a weighted combination model. Utilizing a complementary verification mechanism among multiple parameters, it effectively filters out environmental noise and equipment aging drift, accurately capturing early, subtle deterioration signals of the spray head. Finally, the spray status analysis module, based on this composite index-driven status judgment model, transforms continuous physical quantity changes into a clear "normal / blocked" binary decision, completely replacing the lagging judgment mode relying on manual experience or offline detection. The synergistic effect of these three modules achieves real-time, accurate quantification of the spray head's health status, significantly reducing false positive and false negative rates. This shifts preventative maintenance from fixed cycles to precise triggering based on actual conditions, effectively avoiding over-maintenance and unplanned downtime.

[0031] The spray head spray status analysis device for vapor deposition described in this invention uses a processor to execute computer-executable instructions stored in the memory, solidifying the aforementioned spray head spray status analysis method into automated and standardized software logic. This solves the problems of existing technologies relying on manual experience judgment, offline detection lag, and poor reliability of single-sensor diagnosis. Its technical principle lies in utilizing the real-time data processing capabilities of computing devices to automatically complete the entire process of multi-dimensional parameter acquisition, weighted fusion of composite blockage indices, and spray status model determination. It transforms the originally discrete heterogeneous data such as visual, pressure, and radio frequency data into continuous and quantitative health status output. The resulting technical effects include achieving millisecond-level real-time detection and predictive maintenance triggering of early spray head blockage, significantly reducing false alarm rates and maintaining plasma stability and uniformity, thereby improving process yield and mass production applicability. At the same time, it frees the diagnostic process from dependence on the subjective experience of operators, ensuring the consistency and traceability of analysis results across different machines and shifts. Attached Figure Description

[0032] Figure 1 This is a schematic flowchart of an embodiment of the spray head spray state analysis method for vapor deposition described in this invention; Figure 2 This is a schematic flowchart of a preferred embodiment of the spray head spray state analysis method for vapor phase deposition described in this invention; Figure 3 This is a block diagram of an embodiment of the spray head spray status analysis system for vapor deposition described in this invention; Figure 4 This is a schematic block diagram of one embodiment of the computing device described in this invention; Figure 5 This is a schematic block diagram of another embodiment of the computing device described in this invention; The system comprises: 1. Sensor network; 2. Parameter acquisition module; 3. Composite blockage index acquisition module; 4. Spraying status analysis module; 5. Decision module; 10. Spraying head spraying status analysis system; 100. Computing device; 101. Spraying status parameters; 102. Composite blockage index; 103. Spraying status; 104. Decision; 105. Baseline update; 110. Memory; 120. Processor; 130. Bus; 140. Access device; 150. Database; 160. Network. Detailed Implementation

[0033] Numerous specific details are set forth in the following description to provide a full understanding of the invention. However, the invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar extensions without departing from the spirit of the invention. Therefore, the invention is not limited to the specific embodiments disclosed below.

[0034] The terminology used in one or more embodiments of the invention is for the purpose of describing particular embodiments only and is not intended to limit the invention. The singular forms “a” and “the” as used in one or more embodiments of the invention and in the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise.

[0035] Hereinafter, one or more embodiments of the present invention will be described in detail with reference to the accompanying drawings, so that those skilled in the art can clearly and completely understand the present invention. When the description of well-known structures or features would unnecessarily obscure the main points of the present invention, the description of such well-known structures or features will be omitted.

[0036] Existing spray head diagnostic and maintenance technologies mainly suffer from the following technical bottlenecks: On the one hand, traditional methods relying on manual disassembly for visual inspection or offline film thickness testing have serious lag and subjectivity, making it impossible to detect micropore blockage or surface deposit accumulation in real time during production. Furthermore, the lack of quantitative standards can easily lead to over- or under-maintenance, and frequent disassembly and inspection significantly reduce the overall utilization rate of the equipment. On the other hand, although optical detection schemes based on chamber observation windows achieve visualization, the optical windows are easily contaminated by process byproducts, leading to image quality degradation. Moreover, this scheme is essentially a passive compensation mechanism after significant plasma inhomogeneity has occurred. In addition, the image processing algorithm is complex and has high computational latency, making it difficult to meet the needs of high-precision real-time process control and early fault prediction.

[0037] To address the aforementioned technical problems in the prior art, this invention provides a method for analyzing the spray state of a spray head in vapor deposition, which is used to analyze the spray state of the spray head in the vapor deposition process, such as... Figure 1 As shown, the method for analyzing the spray state of the spray head used for vapor deposition includes: Step S1: Obtain spray state parameters, which include at least one of the following: pressure change, radio frequency reflection change, gas conductance change, and plasma homogeneity within the reaction chamber. Step S2: The spray state parameters are weighted and combined to construct a composite blockage index model, and the composite blockage index corresponding to the vapor deposition process is obtained through the composite blockage index model. Step S3: Construct a spray state model based on the composite blockage index. Input the composite blockage index corresponding to the vapor deposition process into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

[0038] The following details each step of the above-mentioned method for analyzing the spray state of spray heads used in vapor deposition: Step S1, Parameter Acquisition Steps: In one feasible embodiment, step S1 includes a plasma uniformity acquisition step, which includes: Acquire plasma images; Obtain the region of interest in the plasma image; Plasma uniformity is obtained by measuring the brightness of the region of interest.

[0039] Preferably, the plasma uniformity acquisition step further includes: By analyzing the scintillation and dark areas in the plasma image, the corresponding spray holes that reduce plasma uniformity can be identified.

[0040] In one feasible embodiment, step S1 includes a pressure change obtaining step within the reaction chamber, the pressure change obtaining step within the reaction chamber comprising: Obtain the pressure in the reaction chamber of the spray head when the spraying state is normal, and establish a pressure baseline; Pressure changes are obtained by measuring the real-time pressure change within the reaction chamber relative to the pressure baseline.

[0041] In one feasible embodiment, step S1 includes a step of obtaining radio frequency reflection changes, the step of obtaining radio frequency reflection changes including: The radio frequency reflection power of the spray head in normal spray state during the vapor deposition process is obtained to construct the radio frequency baseline; The change in radio frequency reflection is obtained by measuring the real-time change in radio frequency reflection power relative to the radio frequency baseline during the vapor deposition process.

[0042] In one feasible embodiment, step S1 includes a gas conductance change obtaining step, the gas conductance change obtaining step including: Gas conductance is characterized by exhaust pressure; Obtain the exhaust pressure of the reaction chamber in the vapor deposition process of the spray head in normal spray state, and construct the gas flow conduction baseline; The gas conductance variation is obtained by measuring the real-time exhaust pressure of the gas in the reaction chamber relative to the gas conductance baseline during the vapor deposition process.

[0043] Several embodiments of step S1 have been shown above, but the present invention is not limited thereto. Any combination of multiple steps, including the plasma uniformity acquisition step, the pressure change acquisition step in the reaction chamber, the radio frequency reflection change acquisition step, and the gas conductance change acquisition step, can be used.

[0044] The baselines corresponding to the pressure change acquisition step, radio frequency reflection change acquisition step, and gas flow conduction change acquisition step in the above reaction chamber are dynamically changing (adaptively updated) rather than fixed static values. This is to overcome the natural aging and environmental drift of the equipment over time and achieve a true state baseline comparison.

[0045] In a preferred embodiment, the spray head spray state analysis method for vapor deposition according to the present invention further includes: Step S4, baseline update step, the baseline update step includes: During a vapor deposition cycle, when the spray state analysis step determines that the spray state is normal, the pressure baseline, radio frequency baseline and gas flow conduction baseline are adaptively updated using the pressure, radio frequency reflection power and exhaust pressure in the reaction chamber corresponding to the vapor deposition cycle. Within a vapor deposition cycle, when the spray state analysis step determines that the spray state is blocked, the parameter acquisition step is returned. The pressure, radio frequency reflection power, and exhaust pressure in the reaction chamber of the first subsequent cycle, which is determined to be normal by the spray state analysis step, are updated respectively to update the pressure baseline, radio frequency baseline, and gas flow conduction baseline.

[0046] Step S2, Steps for obtaining the composite congestion index: In one feasible embodiment, step S2 includes: The composite congestion index model is constructed using the following formula (1) to calculate the congestion index. : (1) in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; For radio frequency weights; This represents the uniformity weight.

[0047] Preferably, in the composite blockage index model, the radio frequency weight corresponding to the radio frequency reflection change is greater than the uniformity weight corresponding to the plasma uniformity.

[0048] In a preferred embodiment, step S2 includes: The composite congestion index model is constructed using the following formula (2) to calculate the congestion index. : (2) in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; This represents the pressure change within the reaction chamber; This is due to changes in gas conductivity; For radio frequency weights; The uniformity weight; Pressure weight; This represents the gas conductance weight.

[0049] Preferably, the radio frequency weight is greater than the uniformity weight, the uniformity weight is greater than the pressure weight, and the pressure weight is greater than the gas conductance weight.

[0050] In the above embodiments, plasma uniformity is obtained by the following formula (3): (3) in, The brightness deviation of the region of interest (ROI) in the plasma image; This represents the average brightness of the region of interest (ROI) in the plasma image.

[0051] Step S3, Sprayer Status Analysis Step: In one feasible embodiment, the spray states in step S3 that are blocked include, in order of increasing composite index value, spray monitoring, worsening of spray head blockage, spray warning, and spray stoppage.

[0052] In one feasible embodiment, step S3 includes: The spray state model is constructed using the following formula (4): (4) in, In spray mode; This is the composite congestion index.

[0053] The above shows two embodiments of the spray state model, but the present invention is not limited thereto. The spray state can be divided into normal state, initial abnormality, blockage state and spray head cleaning in order of increasing composite blockage index.

[0054] In one feasible embodiment, step S3 includes: The spray state model is constructed using the following formula (5): (5) in, It is in spray mode.

[0055] The above illustrates several embodiments of the various steps of the spray head spray state analysis method for vapor deposition according to the present invention. However, the present invention is not limited thereto, and the spray head spray state analysis method may further include: Step S5, Decision-making step: Generate different decisions based on different spraying states.

[0056] Preferably, the decision includes several of the following: Normal operation; Real-time monitoring; Clean the shower head; Perform preventative maintenance on the spray heads. Abort vapor deposition; Replace the spray head.

[0057] In one feasible embodiment, when the spraying status analyzed in step S3 is normal, step S4 is executed; when the spraying status analyzed in step S3 is normal, step S5 is executed, and then the process returns to step S1.

[0058] Figure 2 A schematic flowchart of a preferred embodiment of the spray head spray state analysis method for vapor deposition described in this invention is shown, as follows: Figure 2 As shown, the method for analyzing the spray state of the spray head used for vapor deposition is as follows: Step S10: Determine whether plasma is generated during vapor deposition (e.g., PECVD); If plasma is generated, step S20 is executed, and the plasma is captured in real time through the observation window using an imaging device (e.g., a camera) to obtain a plasma image; Step S30: Obtain the region of interest in the plasma image. Step S40: Analyze the plasma brightness of the region of interest; Step S50: Obtain plasma uniformity based on plasma brightness in the region of interest; Step S60: Analyze the flickering and dark areas in the region of interest; Step S70: Collect pressure data, radio frequency reflection power data and exhaust pressure data in the reaction chamber, and obtain pressure change, radio frequency reflection change and gas conductance change in the reaction chamber based on the above data. Step S80: Normalize the plasma uniformity, pressure changes, radio frequency reflection changes, and gas conductance changes within the reaction chamber. Step S90: Based on the normalized plasma homogeneity, pressure change, radio frequency reflection change and gas conductance change in the reaction chamber, a composite blockage index is obtained by weighted combination. Step S100: The real-time spraying status in the vapor deposition process is obtained by comparing the composite clogging index with the clogging threshold range corresponding to each spraying status. When the spraying status is normal, execute step S110: execute normal operation decision; When the spray state is At that time, execute step S120: execute real-time monitoring decision; When the spraying status is that the spray head clogging is aggravated, execute step S130: execute the decision to issue a prompt that the initial bad clogging (Clogging) stage is aggravated after replacing the spray head, and return to step S10; When the spray status is a spray head warning, execute step S140: execute the alarm and spray head cleaning decision, and return to step S10; When the spraying status is spraying stopped, execute step S150: execute the decision to stop vapor deposition; Step S160: Using the pressure, radio frequency reflection power, and exhaust pressure in the reaction chamber of the most recent vapor deposition cycle when the spray state is normal, the pressure baseline, radio frequency baseline, and gas flow conduction baseline are adaptively updated respectively.

[0059] The spray head spray status analysis method for vapor deposition described in this invention can detect shower head blockage in the early stage, improve plasma uniformity, reduce false alarms, enable predictive maintenance, improve process yield, and has excellent mass production applicability.

[0060] In one feasible embodiment, step S140 includes: Execute the alarm and sprinkler head cleaning decision, then return to step S10; After returning to step S10, determine whether the spray status obtained through steps S20-S100 is a normal state or spray monitoring; If the spraying status is normal or under spray monitoring, the preventive maintenance plan time point is set according to the composite blockage index obtained in step S90. The larger the composite blockage index, the shorter the time distance between the preventive maintenance plan time point and the present.

[0061] In one feasible embodiment, step S150 includes: Execute the decision to suspend vapor deposition; Perform the preventative maintenance decision and return to step S10; After returning to step S10, proceed through steps S20-S90 to determine whether the obtained composite congestion index has decreased. If the compound clogging index does not decrease, then the decision to replace the spray head should be made.

[0062] In one feasible embodiment, in step S150, a set number of preventive maintenance decisions can be executed to determine whether the spray status has reached a normal state or spray monitoring has been performed after the preventive maintenance decision is executed; if the spray status has not reached a normal state or spray monitoring has been performed, a decision to replace the spray head is executed; if the spray status has reached a normal state or spray monitoring has been performed, a decision to set the preventive maintenance plan time point based on the composite blockage index obtained in step S90 is executed.

[0063] The above embodiments illustrate various classifications of the spraying state, but the present invention is not limited thereto. The spraying state can also be classified as normal state, initial blockage, worsening blockage, severe blockage, and dangerous state.

[0064] Preferably, when the composite blockage index is 0-20, the spraying state is normal; when the composite blockage index is 20-40, the spraying state is initial blockage; when the composite blockage index is 40-60, the spraying state is worsening blockage; when the composite blockage index is 60-80, the spraying state is severe; and when the composite blockage index exceeds 80, the spraying state is dangerous.

[0065] Furthermore, preferably, when the spraying status is normal, a normal operation decision is executed; when the spraying status is initial clogging, a real-time monitoring decision is executed; when the spraying status is worsening clogging, a spray head cleaning decision is executed; when the spraying status is severe, a preventive maintenance decision and a spray head replacement decision are executed (the spray head is installed on the vapor deposition equipment after preventive maintenance); and when the spraying status is dangerous, a spray head replacement decision is executed.

[0066] Figure 3 This is a schematic block diagram of an embodiment of the spray head spray state analysis system for vapor deposition described in this invention, as shown below. Figure 3 As shown, the spray head spray status analysis system 10 includes a parameter acquisition module 2, a composite clogging index acquisition module 3, and a spray status analysis module 4. The parameter acquisition module 2 is configured to acquire spray state parameters in the vapor deposition process, the spray state parameters including at least one of pressure change, radio frequency reflection change, gas conductance change and plasma uniformity in the reaction chamber; The composite blockage index acquisition module 3 is configured to input the spray state parameters obtained by the parameter acquisition module 2 into the composite blockage index model to obtain the composite blockage index corresponding to the vapor deposition process; the composite blockage index model includes a weighted combination of multiple spray state parameters; The spray state analysis module 4 is configured to input the composite blockage index corresponding to the vapor deposition process obtained by the composite blockage index acquisition module 3 into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

[0067] In one feasible embodiment, the spray head spray status analysis system 10 further includes:

[0068] The decision module 5 is configured to generate corresponding decisions based on the spray status of the vapor deposition process obtained by the spray status analysis module 4. The decisions include normal operation and real-time monitoring.

[0069] In one feasible embodiment, the spray head spray status analysis system 10 further includes:

[0070] Sensor network 1 is communicatively connected to parameter acquisition module 2 and is used to measure data corresponding to spray status parameters.

[0071] In one feasible embodiment, the sensor network 1 includes multiple components such as pressure sensors, radio frequency matching devices, automatic pressure controllers, and cameras. The pressure sensor is installed inside the reaction chamber to measure the pressure changes inside the reaction chamber. The radio frequency matching unit is located outside the reaction chamber and is used to measure the radio frequency reflected power; The automatic pressure controller is installed on the pump suction pipe that evacuates the reaction chamber and is used to measure the exhaust pressure of the reaction chamber. The camera is located outside the reaction chamber and is used to capture plasma images.

[0072] The spray head spray state analysis system for vapor deposition described in this invention calculates a composite blockage index by fusing and analyzing pressure sensor data, RF matcher data, and plasma vision data, thereby analyzing the spray state of the spray head. This system offers the following advantages: Early detection of spray head blockage is possible: In existing technologies, abnormalities can only be detected after conditions such as abnormal chamber pressure or radio frequency (RF) instability occur. However, this invention can sense changes in plasma brightness, plasma inhomogeneity, and the appearance of dark zones in real time, thus enabling the detection of early blockage phenomena.

[0073] Reduce false alarms: This invention comprehensively analyzes vision data, pressure data, RF matcher data, and APC data, thus reducing false alarms compared to solutions based on a single sensor.

[0074] Improving plasma stability: When blockage occurs, problems such as uneven gas distribution, plasma instability, and increased radio frequency reflection may occur. This invention can detect these problems early, thereby maintaining plasma stability.

[0075] This invention does not rely solely on a single sensor, but rather diagnoses the spraying status of the sprinkler head by simultaneously utilizing multiple sets of data. When an abnormality occurs, the sprinkler head status can be intuitively diagnosed as the timing of PM and the initial abnormal state based on real-time suggestions to the GUI (Graphical User Interface) for "Initial Sprinkler Head Malfunction," "Cleaning," and "PM (Preventive Maintenance)," thereby reducing unnecessary PM and saving PM time and costs.

[0076] To illustrate the technical effectiveness of the spray head spray state analysis method for vapor deposition described in this invention, several specific embodiments were carried out on different vapor deposition devices: Example 1 The spraying status analysis method of the spray head for vapor deposition of the present invention was used to analyze the spraying status of the spray head in the vapor deposition process of multiple CVD vapor deposition equipment. It was found that the composite blockage index was 0-20, and the spraying status was normal.

[0077] The spray status was verified by using various spray status parameters in the CVD vapor deposition process, which were determined to be in a normal state by this invention: The pressure variation within the reaction chamber is within ±3%, which is within the normal range. The change in radio frequency reflection is within ±5W, which is within the normal range. The opening variation of the automatic pressure controller is within ±3%, which is within the normal range. Plasma homogeneity above 0.95 is within the normal range.

[0078] Example 2

[0079] The spraying status analysis method of the spray head for vapor deposition of the present invention was used to analyze the spraying status of the spray head in the vapor deposition process of multiple PVD vapor deposition equipment. The results showed that when the composite blockage index was 20-40, the spraying status was in the initial blockage stage, which is also a spray monitoring method.

[0080] The spray status is verified by using various spray status parameters in the PVD vapor deposition process of the PVD vapor deposition equipment, which are identified as spray monitoring equipment according to this invention: The pressure change in the reaction chamber exceeded ±5% but did not exceed ±8%, which is considered an initial abnormality. The change in radio frequency reflection is within ±10W, which is considered an initial abnormality. The opening variation of the automatic pressure controller is within ±7%, which is considered an initial abnormality. Plasma homogeneity between 0.90 and 0.85 indicates an initial anomaly.

[0081] Example 4

[0082] The spraying status analysis method of the spray head for vapor deposition of the present invention was used to analyze the spraying status of the spray head in the vapor deposition process of multiple CVD vapor deposition equipment, PVD vapor deposition equipment and PEVD vapor deposition equipment. The results showed that when the composite blockage index was 60-80, the spraying status was spray warning.

[0083] The spray status is verified by using various spray status parameters in the vapor deposition process of the vapor deposition equipment identified as having a spray warning according to this invention: The pressure change in the reaction chamber exceeded ±8% but did not exceed ±10%, which is suspected to be a blockage (the blockage was more severe compared to Example 2). Radio frequency reflection changes within ±15W-20W, indicating a possible blockage. If the opening of the automatic pressure controller changes by more than ±7% but less than ±10%, it is considered a suspected blockage. A plasma homogeneity below 0.85 indicates a suspected blockage.

[0084] Example 3

[0085] The spray head spray state analysis method of the present invention for vapor deposition was used to analyze the spray head spray state in the vapor deposition process of multiple PEVD vapor deposition equipment. The results showed that the composite blockage index was 40-60, indicating that the spray head blockage was aggravated.

[0086] The spray status was verified by using various spray status parameters in the vapor deposition process of the PEVD vapor deposition equipment, which were determined to be in a normal state according to the present invention: Pressure changes within the reaction chamber exceeding ±10% indicate severe blockage. A change in radio frequency reflection exceeding ±25W indicates severe blockage.

[0087] The above specific embodiments demonstrate that a unified composite index model can accurately characterize the state on various vapor deposition equipment such as CVD, PVD, and PEVD, verifying the universality of this invention, which is independent of specific equipment parameters. An early warning and predictive maintenance mechanism has been established, which can keenly capture the initial blockage trend through composite indices before a single parameter such as pressure or radio frequency reflection reaches the serious fault threshold (such as when each parameter only shows initial abnormality in Example 2), thus gaining a valuable window of opportunity for process intervention. The diagnostic results are highly reliable and traceable, and the composite indices at each level can strictly correspond to the backtesting data of multiple physical parameters, proving that the weighted fusion model effectively suppresses single sensor noise interference, significantly reduces the false alarm rate, and ensures the stability of process yield in mass production environments.

[0088] Figure 4 A schematic diagram of an application scenario of the spray head spray state analysis method for vapor phase deposition described in this invention is shown.

[0089] exist Figure 4 In the application scenario, the computing device 100 can acquire multiple spray state parameters 101 in the vapor deposition process. Then, the computing device 100 can perform a weighted combination of the multiple spray state parameters to obtain a composite blockage index 102. After that, the computing device 100 obtains the spray state 103 based on the composite blockage index 102. Finally, the computing device 100 can perform corresponding decisions 104 and baseline updates 105 based on the spray state.

[0090] It should be noted that the aforementioned computing device 100 can be either hardware or software. When the computing device 100 is hardware, it can be implemented as a distributed cluster composed of multiple servers or terminal devices, or as a single server, a single terminal device, or a single controller (such as a PLC controller). When the computing device 100 is software, it can be installed in the hardware devices listed above. It can be implemented as, for example, multiple software programs or software modules used to provide distributed services, or as a single software program or software module. No specific limitations are made here.

[0091] Figure 5 This diagram illustrates another application scenario of the spray head spray state analysis method for vapor phase deposition described in this invention.

[0092] exist Figure 5 In the application scenario, the components of the computing device 100 include, but are not limited to, a memory 110 and a processor 120. The processor 120 is connected to the memory 110 via a bus 130, and may also include a database 150 for storing data.

[0093] The computing device 100 also includes an access device 140 that enables the computing device 100 to communicate via one or more networks 160. Examples of these networks include Public Switched Telephone Network (PSTN), Local Area Network (LAN), Wide Area Network (WAN), Personal Area Network (PAN), or combinations of communication networks such as the Internet. The access device may include one or more of any type of wired or wireless network interface (e.g., a network interface controller (NIC)), such as a Wireless Local Area Network (WLAN) interface, a Wi-MAX (Worldwide Interoperability for Microwave Access) interface, an Ethernet interface, a Universal Serial Bus (USB) interface, a cellular network interface, a Bluetooth interface, or a Near Field Communication (NFC) interface.

[0094] In one embodiment of the present invention, the above-mentioned components of the computing device 100 and Figure 5 Other components, not shown, can also be connected to each other, for example, via a bus. It should be understood that... Figure 5 The structural block diagram of the computing device 100 shown is for illustrative purposes only and is not intended to limit the scope of the invention. Those skilled in the art can add or replace other components as needed.

[0095] The computing device 100 can be any type of stationary or mobile computing device 100, including mobile computers or mobile computing devices 100 (e.g., tablet computers, personal digital assistants, laptop computers, notebook computers, netbooks, etc.), mobile phones (e.g., smartphones), wearable computing devices 100 (e.g., smartwatches, smart glasses, etc.) or other types of mobile devices, or stationary computing devices 100 such as desktop computers or personal computers (PCs). The computing device 100 can also be a mobile or stationary server.

[0096] The processor executes computer-executable instructions, which, when executed by the processor, implement the steps of the above-described method for analyzing the spray state of a spray head for vapor deposition. The above is a schematic representation of a computing device 100 according to this embodiment. It should be noted that the technical solution of this computing device 100 and the technical solution of the above-described method for analyzing the spray state of a spray head for vapor deposition belong to the same concept. Details not described in detail in the technical solution of the computing device 100 can be found in the description of the technical solution of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0097] The present invention also provides a computer-readable storage medium storing computer-executable instructions that, when executed by a processor, implement the steps of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0098] The above is an illustrative embodiment of the computer-readable storage medium of the present invention. It should be noted that the technical solution of this storage medium belongs to the same concept as the technical solution of the above-described method for analyzing the spray state of a spray head for vapor deposition. Details not described in detail in the technical solution of the storage medium can be found in the description of the technical solution of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0099] The present invention also provides a computer program, wherein when the computer program is executed in a computer, the computer is instructed to perform the steps of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0100] The above is an illustrative embodiment of the computer program described in this invention. It should be noted that the technical solution of this computer program belongs to the same concept as the technical solution of the above-described method for analyzing the spray state of a spray head for vapor deposition. Details not described in detail in the computer program's technical solution can be found in the description of the above-described method for analyzing the spray state of a spray head for vapor deposition.

[0101] The foregoing has described specific embodiments of the invention. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps described in the claims may be performed in a different order than that shown in the embodiments and may still achieve the desired results. Furthermore, the processes depicted in the drawings do not necessarily require the specific or sequential order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0102] It should be noted that, for the sake of simplicity, the foregoing method embodiments are all described as a series of actions. However, those skilled in the art should understand that the embodiments of the present invention are not limited to the described order of actions, because according to the embodiments of the present invention, some steps can be performed in other orders or simultaneously. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions and modules involved are not necessarily essential to the embodiments of the present invention.

[0103] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions of other embodiments.

[0104] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. The optional embodiments do not exhaustively describe all details, nor do they limit the invention to the specific implementations described. Clearly, many modifications and variations can be made based on the embodiments of the present invention. These embodiments are selected and specifically described to better explain the principles and practical applications of the present invention, thereby enabling those skilled in the art to better understand and utilize the present invention.

Claims

1. A method for analyzing the spray state of a spray head in vapor deposition, used to analyze the spray state of a spray head in a vapor deposition process, characterized in that, include: Parameter acquisition steps: Obtain spray state parameters, which include at least one of the following: pressure change, radio frequency reflection change, gas conductance change, and plasma homogeneity within the reaction chamber; Steps for obtaining the composite blockage index: a composite blockage index model is constructed by weighted combination of the spray state parameters, and the composite blockage index corresponding to the vapor deposition process is obtained through the composite blockage index model. Spray state analysis steps: Construct a spray state model based on the composite blockage index. Input the composite blockage index corresponding to the vapor deposition process into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

2. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, The steps for obtaining the composite congestion index include: The composite congestion index model is constructed using the following formula to calculate... : in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; For radio frequency weights; This represents the uniformity weight.

3. The method for analyzing the spray state of a spray head for vapor deposition according to claim 2, characterized in that, In the composite blockage index model, the radio frequency weight corresponding to the radio frequency reflection change is greater than the uniformity weight corresponding to the plasma uniformity.

4. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, The steps for obtaining the composite congestion index include: The composite congestion index model is constructed using the following formula to calculate... : in, The composite congestion index; This is due to changes in radio frequency reflection; For plasma uniformity; This represents the pressure change within the reaction chamber; This is due to changes in gas conductivity; For radio frequency weights; The uniformity weight; Pressure weight; This represents the gas conductance weight.

5. The method for analyzing the spray state of a spray head for vapor deposition according to claim 4, characterized in that, In the composite blockage index model, the radio frequency weight, uniformity weight, pressure weight, and gas conductance weight decrease sequentially.

6. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, The spray states in the blockage state, in order of increasing composite index value, include spray monitoring, worsening of spray head blockage, spray warning, and spray stoppage.

7. The method for analyzing the spray state of a spray head for vapor deposition according to claim 6, characterized in that, In the spray state analysis step, the spray state model is constructed using the following formula: in, In spray mode; This is the composite congestion index.

8. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, It also includes decision-making steps, which include: Different decisions are made based on different spraying conditions, including normal operation and real-time monitoring.

9. The method for analyzing the spray state of a spray head for vapor deposition according to claim 8, characterized in that, The decision also includes one or more of the following: Clean the shower head; Perform preventative maintenance on the spray heads. Abort vapor deposition; Replace the spray head.

10. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, The parameter acquisition step includes several of the following steps: The steps for obtaining plasma homogeneity include: Acquire plasma images; Obtain the region of interest in the plasma image; Plasma uniformity is obtained by measuring the brightness of the region of interest. The steps for obtaining the pressure change within the reaction chamber include: Obtain the pressure in the reaction chamber of the spray head when the spraying state is normal, and establish a pressure baseline; Pressure changes are obtained by measuring the real-time pressure changes within the reaction chamber relative to the pressure baseline. The steps for obtaining changes in radio frequency reflection include: The radio frequency reflection power of the spray head in normal spray state during the vapor deposition process is obtained to construct the radio frequency baseline; The change in radio frequency reflection is obtained by measuring the real-time change in radio frequency reflection power relative to the radio frequency baseline during the vapor deposition process. The steps for obtaining changes in gas conductivity include: Gas conductance is characterized by exhaust pressure; Obtain the exhaust pressure of the reaction chamber in the vapor deposition process of the spray head in normal spray state, and construct the gas flow conduction baseline; The gas conductance variation is obtained by measuring the real-time exhaust pressure of the gas in the reaction chamber relative to the gas conductance baseline during the vapor deposition process.

11. The method for analyzing the spray state of a spray head for vapor deposition according to claim 10, characterized in that, Also includes: The baseline update steps include: During a vapor deposition cycle, when the spray state analysis step determines that the spray state is normal, the pressure baseline, radio frequency baseline and gas flow conduction baseline are adaptively updated using the pressure, radio frequency reflection power and exhaust pressure in the reaction chamber corresponding to the vapor deposition cycle. as well as Within a vapor deposition cycle, when the spray state analysis step determines that the spray state is blocked, the parameter acquisition step is returned. The pressure, radio frequency reflection power, and exhaust pressure in the reaction chamber of the first subsequent cycle, which is determined to be normal by the spray state analysis step, are updated respectively to update the pressure baseline, radio frequency baseline, and gas flow conduction baseline.

12. The method for analyzing the spray state of a spray head for vapor deposition according to claim 10, characterized in that, The plasma uniformity acquisition step further includes: By analyzing the scintillation and dark areas in the plasma image, the corresponding spray holes that reduce plasma uniformity can be identified.

13. The method for analyzing the spray state of a spray head for vapor deposition according to claim 1, characterized in that, The step of obtaining the composite congestion index includes a normalization step, which includes: The spray state parameters are normalized.

14. A spray head spray state analysis system for vapor phase deposition, characterized in that, Includes a parameter acquisition module, a composite clogging index acquisition module, and a spray status analysis module: The parameter acquisition module is configured to acquire spray state parameters in the vapor deposition process, the spray state parameters including at least one of pressure change, radio frequency reflection change, gas conductance change and plasma uniformity in the reaction chamber; The composite blockage index acquisition module is configured to input the spray state parameters obtained by the parameter acquisition module into the composite blockage index model to obtain the composite blockage index corresponding to the vapor deposition process; the composite blockage index model includes a weighted combination of multiple spray state parameters; The spray state analysis module is configured to input the composite blockage index corresponding to the vapor deposition process obtained by the composite blockage index acquisition module into the spray state model to obtain the spray state. The spray state includes a normal state and a blockage state. The composite blockage index corresponding to the normal state is less than the composite blockage index corresponding to the blockage state.

15. The spray head spray status analysis system for vapor deposition according to claim 14, characterized in that, Also includes: The decision module is configured to generate corresponding decisions based on the spray status of the vapor deposition process obtained by the spray status analysis module, and the decisions include normal operation and real-time monitoring.

16. The spray head spray status analysis system for vapor deposition according to claim 14, characterized in that, Also includes: A sensor network, communicatively connected to the parameter acquisition module, includes multiple components such as pressure sensors, radio frequency matching devices, automatic pressure controllers, and cameras. The pressure sensor is installed inside the reaction chamber to measure the pressure changes inside the reaction chamber. The radio frequency matching unit is located outside the reaction chamber and is used to measure the radio frequency reflected power; The automatic pressure controller is installed on the pump suction pipe that evacuates the reaction chamber and is used to measure the exhaust pressure of the reaction chamber. The camera is located outside the reaction chamber and is used to capture plasma images.

17. A spray head spray state analysis device for vapor phase deposition, characterized in that, Includes a computing device, which includes a memory and a processor; The memory is used to store computer-executable instructions, and the processor is used to execute the computer-executable instructions, which, when executed by the processor, implement the steps of the spray head spray state analysis method for vapor deposition as described in any one of claims 1 to 13.

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