Container, method and storage for storing and / or transporting semiconductor manufacturing objects
Patent Information
- Application Number
- CN202580017722.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2024-02-29
- Filing Date
- 2025-01-17
- Publication Date
- 2026-09-25
AI Technical Summary
[0012]EOP相当庞大,导致用于储存EUV掩模版的储存库需要很大的空间需求或“占地面积”
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Figure CN122827016A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to apparatus, methods and devices for storing and / or transporting semiconductor manufacturing articles. Background Technology
[0002] Photolithography is widely used as one of the key steps in the manufacture of integrated circuits (ICs) and other semiconductor-related devices and / or structures. However, as the feature sizes produced by such processes shrink, the importance of photolithography for the production of miniature ICs or other devices and / or structures increases.
[0003] In photolithography, a geometric pattern is transferred from a photomask (often called a photomask) onto a substrate (such as a semiconductor wafer) using light, a photosensitive layer, and subsequent etching steps. Depending on the desired feature size on the substrate, the feature size of the photomask and the wavelength of the light used for pattern transfer need to be adjusted, while taking the Rayleigh criterion into account.
[0004] To reduce the minimum achievable feature size, extreme ultraviolet (EUV) radiation has been proposed. EUV radiation is electromagnetic radiation with wavelengths in the 5-20 nanometer range, for example, in the 5-10 nanometer range.
[0005] Any contamination of the photomask can degrade the imaging performance of the lithography process, and in more severe cases, may necessitate mask replacement. Photomasks are typically expensive, so minimizing the frequency of replacement is beneficial. Furthermore, mask replacement is a time-consuming process, during which the lithography process may have to be paused, reducing its efficiency, which is undesirable.
[0006] For EUV applications, particulate contamination with a diameter of less than 10 nanometers, as well as chemical contamination, such as through the adsorption of volatile organic compounds, may be relevant.
[0007] Therefore, masks used in such EUV applications are typically stored in a storage vault and retrieved when needed for use with lithography exposure equipment. Typically, the mask is housed in a double-shell container (double box), which includes what is known as the EUV outer box (EOP) and the EUV inner box (EIP).
[0008] For example, this dual-box design is described in more detail in U.S. Patent Application Publication US 2019 / 0214287 A1.
[0009] Because acceptable levels of particulate contamination are extremely low, friction between the mask and the container (leading to wear and particle generation) and friction between container components are to be avoided. Therefore, a typical EIP is designed to house a mask in such a way that movement within the mask is extremely limited, for example, by providing a corresponding receiving cavity that substantially corresponds to the size of the mask to be stored. A typical EIP is also equipped with an additional mask holder to secure the mask inside the EIP. To prevent contamination, the EIP is designed to apply a protective gas or vacuum to the mask. For this purpose, orifices equipped with filter material are typically provided to prevent gas from entering the environment surrounding the mask housed within the respective EIP from the EOP.
[0010] An EOP is equipped with one or more actuators adapted to bias the mask holder of the EIP into a holding position, thereby securing the mask inside the EIP when the EOP is attached to it. The EOP is also used to secure EIPs, which are typically composed of two parts, to each other to prevent wear caused by friction.
[0011] It should be understood that EIP components can move relative to each other as long as they are not externally secured. To avoid frictional wear caused by such movement, EOP typically provides this securing function for the EIP, while also providing protection from the surrounding atmosphere, which is necessary during transport, for example, between storage locations and processing tools that require mask operation.
[0012] EOPs are quite large, resulting in storage facilities for storing EUV masks requiring significant space or "footprint." Furthermore, they are made of polymer materials, which are also prone to abrasion and the release of volatile organic compounds. Summary of the Invention
[0013] The present invention seeks to address these problems by providing methods, apparatus, and devices having the features according to the independent claims. Advantageous embodiments and additional features are provided in the dependent claims and discussed in the following description.
[0014] This invention reduces the space required to store photomasks while ensuring at least the same level of protection against contamination and damage as conventional systems. Chemical contamination from the released EOP during storage is prevented, and mechanical damage protection is improved compared to storing photomasks in a dual-casing configuration. For example, EOPs are easily damaged during earthquakes, while the device according to the invention is less fragile even under such harsh conditions, as will be understood from the following description.
[0015] When developing this improved memory concept, aspects that can be advantageously considered include: changing the way masks are supplied to lithography equipment is highly undesirable, as this is often the most complex and expensive part of a semiconductor manufacturing facility.
[0016] Therefore, since lithography equipment is typically designed to receive dual cassettes, the improved mask storage library is advantageously equipped with means for supplying conventional dual cassettes to the lithography equipment.
[0017] In a first aspect, the present invention provides a container for storing and / or transporting one or more semiconductor manufacturing objects, particularly wafers, chips, substrates, and photolithographic masks (especially EUV masks). The container includes an upper part and a lower part, wherein the upper part is reversibly attached to the top of the lower part. The container also includes a locking mechanism integrally formed within the upper and lower parts and configured to restrict movement of the upper and lower parts relative to each other. The locking mechanism includes a pin extending from a first of the upper and lower parts into a second of the upper and lower parts when the upper part is attached to the lower part. The locking mechanism also includes an engagement member received within the second of the upper and lower parts, the engagement member being configured to selectively restrict movement of the pin relative to the second part, wherein the pin includes a recess, and the engagement member is configured to engage with the recess. In the context of the invention, the term "selectively restrict movement" is understood to mean that selection is possible between at least two options, including a configuration where movement is restricted or blocked, and a configuration where movement is unrestricted, i.e., unimpeded.
[0018] It should be noted that, in the context of this specification, the term "container" is used for embodiments of the invention to avoid confusion with the more commonly used term "box" in the art. Therefore, wherever the term "container" is used to describe embodiments of the invention in this specification, the term "box" may be used instead without changing the meaning of the specification in any way.
[0019] By providing specific containers, particularly those for storage, the level of contamination within the corresponding storage facility can be significantly reduced compared to traditional storage methods where items are stored in boxes also used outside the storage facility. During normal operation, these containers do not need to leave the storage facility, thus preventing contaminants from being brought in from outside. However, it is important to provide items with protection comparable to that under traditional storage conditions during storage. Locking mechanisms that restrict the relative movement of container components maintain the protective shell of the container around the items, even in the event of an earthquake or even a simple power outage, thus protecting the items from damage in such situations.
[0020] In at least one embodiment, the engaging member is actuated from outside the container, switching between an open position and a locked position. In the open position, the engaging member is not engaged with the recess of the pin; in the locked position, the engaging member is engaged with the recess of the pin. This means that the locking function can be selectively engaged or disengaged as needed in any given situation. For example, it may be necessary to manually remove the mask from the corresponding storage container, such as in the event of an earthquake or power outage. In such cases, it may be desirable to keep the container locked to protect the mask as much as possible.
[0021] In at least one embodiment, the engaging member includes a stop configured to provide resistance against moving the engaging member out of the open position and / or the locked position. This prevents undesirable self-opening of the locking mechanism.
[0022] In at least one embodiment, the container is configured to secure the items therein when the upper component is attached to the lower component, particularly when the locking mechanism is in the locked position as defined earlier herein. This ensures at least a level of protection comparable to that provided by a conventional double-box container, with respect to mechanical damage to the stored or transported items.
[0023] In at least one embodiment, the engaging member comprises a plate-like element rotatably supported in a second of an upper and lower component about an axis perpendicular to the plate's maximum extension plane. The rotation of this plate element about the axis of rotation is anisotropic. For example, the plate element may be provided in the form of a cylindrical disk with a notch on its circumference for receiving a pin therein, the cylindrical axis of the disk oriented in a direction parallel to the axis of the pin, and the disk being rotatably supported, particularly about the cylindrical axis. Other examples of such plate-like engaging members include eccentrically rotatable cylindrical disks (with or without notches), triangular, square, pentagonal, or any other regular or irregular polygonal plate elements. Regardless of the specific form of the plate-like element, the rotational anisotropy allows the plate element to allow the tip of the pin to move across the maximum extension plane of the plate, such that the recess of the pin remains within the maximum extension plane of the plate. If the plate element is rotated in this position, the rotational anisotropy causes the plate element to engage with the recess, thereby substantially disabling movement of the pin along its axis. Alternatively, the connecting member may include a cylindrical rod with a notch on its circumference for receiving a pin therein, the cylindrical axis of the rod being oriented in a direction perpendicular to the axis of the pin, and the rod being rotatably supported, particularly about the cylindrical axis, in the second of the upper and lower components.
[0024] Regardless of the specific shape of the engaging member, in at least one embodiment, the radial depth of the notch for receiving the pin (or any other form of radial recess in a rotationally anisotropic engaging member) corresponds to the depth of the pin's recess. The radial depth can be defined as the difference between the maximum and minimum distances from the axis of rotation of the engaging member to its circumference.
[0025] Embodiments of this type of engagement member are relatively easy to provide and operate. Rotation about the cylindrical axis can be achieved, for example, using a screwdriver-like tool or similar device, thereby rotating the notch to a position where the pin can pass through the notch and / or rotating it to a position where the unrecessed circumference of the engagement member protrudes into the recess of the pin, thereby preventing the pin from retracting from the second of the upper and lower parts.
[0026] In at least one embodiment, the cavity within the second of the upper and lower components, which supports the engagement member, is accessible from outside the container. This allows for inspection and / or maintenance of the engagement member, which may be necessary to assess its health condition, particularly regarding wear and / or particles generated due to friction.
[0027] In at least one embodiment, the cavity is sealed by a removable cover. This prevents particles generated, for example by operating (i.e. actuating) the engaging members, from leaving the cavity and contaminating the surrounding environment of the container, such as the interior of the corresponding mask storage tank.
[0028] In at least one embodiment, the cover is transparent to at least a portion of the wavelength spectrum including visible light and / or ultraviolet light and / or X-ray radiation. This allows for visual or any other radiation-based inspection without removing the cover.
[0029] A second aspect of the invention provides a method for storing and / or transporting semiconductor manufacturing articles, comprising enclosing the articles in a container as described herein and storing the container in a storage location within a semiconductor manufacturing storage facility, particularly a mask storage facility.
[0030] In at least one embodiment, the method further includes receiving an EUV double box containing an object and including an EUV inner box and an EUV outer box, opening the outer box and the inner box, removing the object from the inner box, and arranging the container around the object removed from the inner box.
[0031] In at least one embodiment, the method includes actuating the engagement member to an unengaged (or open) position, opening the container, placing an object into the container, closing the container, and actuating the engagement member to an engaged (or locked) position.
[0032] In at least one embodiment, the method further includes providing an EUV double box, wherein providing the EUV double box includes retrieving a container as described herein from a corresponding storage location within a storage vault, actuating the engagement member to an unengaged (or open) position, and arranging an outer box around the container. Providing the double box in this manner can also be achieved without the storage container step. In other words, the container can be used as a substitute for a conventional inner box. For this purpose, the locking mechanism should be in the open position so that devices other than the storage system can handle such a double box provided by the method without any modification. For example, a container with a locking mechanism in the open position can be processed by a lithography apparatus as if it were a conventional inner box. For such embodiments, the container may be provided with an interface for the outer box to provide a fixing function. Typically, the outer box interacts with the inner box by pressing the upper and lower parts of the inner box against each other. For this purpose, an actuator is provided in the outer box. For a container used as a substitute for an inner box according to such embodiments of the invention, the interface may be a pressure point located at predetermined positions on the upper and / or lower parts for the actuator to apply a predetermined pressing force to the container. When this dual-box system is received by the storage container, the outer box can be opened, the inner box locked by actuating the engaging member to the locking position, and the inner box can then be stored in its corresponding storage location without removing it from the inner box. This offers the advantage of requiring fewer processing operations that expose the mask (or other objects).
[0033] In a further aspect, the present invention provides a storage library for storing one or more semiconductor manufacturing objects, particularly wafers, chips, substrates, and photolithographic masks (especially EUV masks), configured to perform the methods described herein and to hold a plurality of containers as described herein in storage locations within the storage library. Therefore, the storage library accordingly enjoys the same advantages as the various embodiments of the methods and / or containers. Attached Figure Description
[0034] Figure 1 This is a perspective view schematically depicting an embodiment of a container according to the present invention.
[0035] Figure 2 It is a schematic depiction Figure 1 A partial perspective view of a detail in use of the embodiment.
[0036] Figure 3 It is a schematic depiction Figure 1 A partial sectional perspective view of a detail in use of the embodiment.
[0037] Figure 4 It is a schematic depiction Figure 1 A partial sectional top view of a detail in use of the embodiment.
[0038] Figure 5 It is a schematic depiction Figure 1 A detailed bottom view of an embodiment.
[0039] Figure 6 This is a side plan view schematically depicting the operation of a locking mechanism according to an embodiment of a container based on the present invention.
[0040] Figure 7 This is a schematic bottom view depicting another embodiment of the container according to the invention.
[0041] Figure 8 It is a schematic depiction Figure 7 A detailed bottom view of an embodiment.
[0042] Figure 9 It is a schematic depiction Figure 7 A partial perspective view of a detail of an embodiment.
[0043] In the description of the accompanying drawings, the same elements are denoted by the same reference numerals. For the sake of brevity, the corresponding descriptions for each drawing will not be repeated. Detailed Implementation
[0044] exist Figure 1 In the figure, an embodiment of the container according to the invention is schematically depicted in perspective and is generally indicated by reference numeral 100.
[0045] Container 100 includes an upper part 110 and a lower part 120. During typical use of container 100, the azimuth reference terms “upper” and “lower” have their usual meanings, that is, the upper part 110 is generally farther from the ground than the lower part 120.
[0046] The upper component 110 may be attached to the lower component 120, for example by relative movement toward the lower component 120 in the vertical direction 136, and includes at least one pin 112 (four such pins 112 are provided in the example shown here) for proper alignment between the upper component 110 and the lower component 120. For this purpose, when the two components 110, 120 are attached to each other, the pin 112 extends into the lower component 120. The pin 112 then restricts relative movement between the upper component 110 and the lower component 120 in the lateral (horizontal) directions 132, 134.
[0047] exist Figure 2 The image is depicted schematically using a partial 3D view. Figure 1 A detail of the embodiment is explained. Specifically, it illustrates how the attachment of the upper component 110 to the lower component 120 is achieved, and how the pin 112 helps align the upper component 110 and the lower component 120 with each other. Figure 2In view A, the two components are separated from each other, allowing container 100 to be opened, meaning that in this state, the internal volume of container 100 can be accessed from the outside. Figure 2 In view B, the two components 110 and 120 are attached to each other, causing the container 100 to close, meaning that in this state, the internal volume of the container 100 is inaccessible. Furthermore, it can be seen that the pin 112 includes a recess 114, which can be engaged by a cylindrical rod-shaped engaging member 122 disposed in the lower component 120. The engaging member 122 and the pin 112 are components of a locking mechanism, indicated by 140 in subsequent figures.
[0048] exist Figure 3 and Figure 4 The diagram is schematically depicted using partial sectional perspective views and partial sectional top views, respectively. Figure 1 A detail in the use of the embodiment. Specifically, these figures illustrate the locking mechanism 140 in more detail. As shown, the locking mechanism includes a pin 112 in the upper component 110 and a cylindrical rod 122 in the lower component 120. The cylindrical rod 122 includes a notch 124 at an axial position relative to the cylindrical rod 122, into which the pin 112 extends when the upper component 110 is attached to the lower component 120. The depth of the notch 124 in the cylindrical rod 122 substantially corresponds to the depth of the recess 114 in the pin 112. The cylindrical axis of the rod 122 is substantially orthogonal to the axis of the pin 112, i.e., orthogonal to the already engaged... Figure 1 The mentioned vertical direction 136. The cylindrical rod 122 is rotatably supported in the lower part 120 about its axis, allowing the notch to rotate away from the position into which the pin 112 extends. By comparison... Figure 4 C and 4D best illustrate this point, among which Figure 4 D depicts the notch 124 in lever 122 facing pin 112 ("unlocked position"), while Figure 4 C depicts the case where the notch 124 in the rod 122 does not face the pin 112 (“locked position”). In the locked position, the rod 122 engages with the notch 114, i.e. extends into the notch 114, and thus in the locked position, the pin 112 is restricted in its movement relative to the lower part 120 by means of the engaging member or the rod 122, particularly in the vertical direction 136.
[0049] From the figure, especially Figure 3 and Figure 4 As can be seen, the lever can be actuated from outside the container, allowing the locking mechanism 140 to switch between a locked position and an unlocked position as needed, for example, using a tool with an end shape similar to a screwdriver.
[0050] exist Figure 4The diagram illustrates a stop configured to provide resistance against dislodging the engaging member (i.e., lever 122 in the illustrated example) from both a locked and unlocked position. In the illustrated example, the stop includes a tapered tip 126 biased toward lever 122 by a spring 128. Along the circumference of lever 122, at the axial location where the tip 126 abuts the lever, and at the circumferential location facing the tip 126 in both the locked and unlocked positions, recesses 129 are formed. This causes the tip 126 to protrude into these recesses at these locations, thus requiring the spring bias to be overcome to dislodge the lever from either the locked or unlocked position, preventing the lever from inadvertently leaving these positions, for example, due to vibration. This ensures proper alignment of lever 122 for any handling operations associated with container 100, particularly for opening and closing container 100.
[0051] The entire portion of the locking mechanism 140, located in the bottom component 120, is housed within a cavity inside the bottom component 120. This cavity is accessible from the outside of the container 100, such as... Figure 5 As shown. The cavity is not in direct communication with the interior of container 100; that is, it is closed towards the top of the bottom component 120.
[0052] exist Figure 5 The image is depicted schematically in a partial bottom view. Figure 1 A detail of the embodiment.
[0053] The cavity in the aforementioned bottom component 120 is covered by a cap 142, which seals the cavity toward the outside of the container 100. In particular, the cap is configured to block at least 90%, 95%, 98%, 99%, 99.5%, 99.9%, or more than 99.99% of particles with a diameter greater than 40 nanometers, especially with regard to the total mass and / or number of particles within the cavity.
[0054] In the illustrated embodiment, the portion of the cover 142 that houses the tip 126 and the spring 128 within the sealed cavity is transparent, at least within the visible light spectrum. This allows for visual inspection of the tip 126 and the spring 128, which are particularly susceptible to wear and general damage. In the example shown here, the cover 142 is reversibly removed from the bottom component 120 and secured to it by, for example, screws or threaded bolts 144. This allows for individual access to the stops 126, 128, i.e., without disassembling the entire locking mechanism, for example, for maintenance and / or replacement.
[0055] exist Figure 6 The operation of a locking mechanism according to an embodiment of a container according to the invention is schematically depicted in a side plan view. This can be interpreted as an illustration of an embodiment of a method according to the invention, generally indicated by reference numeral 200.
[0056] In the first step 210 of method 200, container 100 (in particular container 100 with locking mechanism in locked position) is positioned such that locking mechanism 140, in particular engagement member (in the case depicted, cylindrical rod 122) can be accessed from outside the container by tool 310.
[0057] In step 220, the tool 310 is engaged with the engagement member 122 (indicated by relative motion arrow 222), and the engagement member 122 is actuated to the unlocked position, for example by rotating the engagement member by a predetermined angle, such as 90° about its cylindrical axis (indicated by rotational motion arrow 224).
[0058] In step 230, the container 100 is opened by lifting the upper part 110 from the lower part 120 in the vertical direction 136 (indicated by the vertical movement arrow 232), so that the internal volume of the container 100 can be accessed and the object 190 contained therein can be handled.
[0059] The steps shown can be performed in reverse order and direction to enclose the object 190 in the container 100 and lock the container 100.
[0060] exist Figure 7 Another embodiment of the container 100 according to the invention is schematically depicted in a bottom view. The container 100 shown here differs in the specific configuration of the locking mechanism from... Figures 2 to 5 The embodiments differ, and the locking mechanism is generally indicated herein by reference numeral 160. The locking mechanism 160 is... Figure 8 and Figure 9 The figures are shown in more detail in partial bottom view and partial perspective view.
[0061] The locking mechanism 160 includes a pin 112 and a generally circular disc 162, which functionally replaces the previously referenced... Figures 2 to 6 The discussed embodiment has a circular rod 122. A circular disc 162 includes a notch 164 on its circumference. This notch is configured to receive a pin 112 when the upper part 110 of the container 100 is attached to the lower part. The disc 162 is supported in the lower part 120 and is rotatable about its cylindrical axis. In the case of the locking mechanism 160, this cylindrical axis of the disc 162 is oriented substantially parallel to the axis of the pin 112, i.e., in the vertical direction 136. By rotating the notch 164 toward or away from the position into which the pin 112 extends, the disc can be locked in a locked state C (e.g., Figure 9Switching between the optimal (as shown) and unlocked or open state D causes the disc 162 to engage or disengage from the recess 114 of the pin 112. This is essentially the same type of interaction as discussed with reference to the cylindrical rod 122, except that in the case of the disc-shaped engaging member 162, the axis of rotation is vertical rather than horizontal. Therefore, actuation of the disc 162 is achieved from the bottom side of the container 100 rather than the side side. This provides an advantage that the tool for actuating the disc 162 can be integrated into the support on which the container opening and closing is typically performed. Therefore, less action is required to actuate the engaging member 162 compared to embodiments using the cylindrical rod 122 as the engaging member of the locking mechanism 140. Specifically, only rotation is required, as in this case, the tool automatically inserts once the container is placed on the support. Furthermore, since the actuation is performed from the bottom of the container, any particles generated by wear during the actuation process will fall downwards, i.e. away from the container 100, thereby improving the contamination behavior of the locking mechanism 160 compared to other options that restrict the movement of the upper part 110 and the lower part 120 of the container 100.
Claims
1. A container (100) for storing and / or transporting semiconductor manufacturing objects (190), particularly one or more of wafers, chips, substrates, and photomasks, especially EUV masks. The container (100) includes an upper part (110) and a lower part (120). The upper component (110) is reversibly attached to the lower component (120). The container (100) further includes locking mechanisms (140, 160) integrally formed within the upper component (110) and the lower component (120) and configured to restrict movement of the upper component (110) and the lower component (120) relative to each other. The locking mechanism (140, 160) includes a pin (112) that, when the upper part (110) is attached to the lower part (120), extends from the first of the upper part (110) and the lower part (120) to the second of the upper part (110) and the lower part (120). The locking mechanism (140, 160) further includes engaging members (122, 162) housed within the second of the upper component (110) and the lower component (120). The engaging members (122, 162) are configured to selectively restrict movement of the pin (112) relative to the second of the upper member (110) and the lower member (120). The pin (112) includes a recess (114), and the engaging member (122, 162) is configured to engage with the recess (114).
2. The container (100) according to claim 1, wherein the engaging member (122, 162) is actuated from outside the container (100) such that the engaging member (122, 162) is switched between an open position (D) and a locked position (C), wherein in the open position the engaging member (122, 162) is not engaged with the recess (114) of the pin (112), and in the locked position the engaging member (122, 162) is engaged with the recess (114) of the pin (112).
3. The container (100) of claim 2, wherein the engaging member (122, 162) includes a stop (126, 128) configured to provide resistance to moving the engaging member (122, 162) from the open position (D) and / or the locked position (C).
4. The container (100) according to any of the preceding claims, configured to secure an article (190) therein when the upper part (110) is attached to the lower part (120), particularly when the locking mechanism (140, 160) is in the locking position (C) as defined in claim 2.
5. The container (100) according to any one of the preceding claims, wherein the connecting member (122, 162) comprises a cylindrical disk (162) having a notch (164) on its circumference for receiving the pin (112) therein. The cylindrical axis of the disk (162) is oriented in a direction (136) parallel to the axis of the pin (112), and The disk (162) is rotatably supported in the second of the upper part (110) and the lower part (120).
6. The container (100) according to any one of claims 1 to 4, wherein the connecting member (122, 162) comprises a cylindrical rod having a notch (124) on its circumference for receiving the pin (112) therein. The cylindrical axis of the rod is oriented in a direction (134) perpendicular to the axis (136) of the pin (112), and The rod is rotatably supported in the second of the upper part (110) and the lower part (120).
7. The container (100) according to claim 5 or 6, wherein the depth of the notch (124, 164) for receiving the pin (112) corresponds to the depth of the recess (114) of the pin (112).
8. The container (100) according to any one of the preceding claims, wherein the cavity within the second of the upper part (110) and the lower part (120), wherein the connecting member (122, 162) is accessible from the outside of the container (100).
9. The container (100) of claim 8, wherein the cavity is sealed by a removable cap (142).
10. The container (100) of claim 9, wherein the lid (142) is transparent to at least a portion of the wavelength spectrum including visible light and / or ultraviolet light and / or X-ray radiation.
11. A method (200) for storing and / or transporting a semiconductor manufacturing article (190), comprising enclosing the article (190) in a container (100) according to any one of the preceding claims, and storing the container (100) in a storage location within a semiconductor manufacturing storage facility, particularly a mask storage facility.
12. The method (200) of claim 11, further comprising receiving an EUV double box containing the object (190) and including an EUV inner box and an EUV outer box, opening the outer box and the inner box, removing the object (190) from the inner box, and arranging the container (100) around the object (190) removed from the inner box.
13. The method (200) according to claim 11 or 12, comprising actuating (224) the engagement member (122, 162) to the unengaged position (D), opening (232) the container (100), placing the object (190) into the container, closing the container (100), and actuating (224) the engagement member (122, 162) to the engaged position (C).
14. The method (200) according to any one of claims 11 to 13, further comprising providing an EUV dual-box, wherein providing the EUV dual-box comprises: Retrieve the container (100) according to any one of claims 1 to 10 from the corresponding storage location within the storage facility. Actuate (224) the engaging members (122, 162) to the unengaged position (D), and Arrange the outer box around the container (100).
15. A storage library for storing one or more of semiconductor manufacturing objects (190), particularly wafers, chips, substrates, and photomasks, especially EUV masks, the storage library being configured to perform the method (200) according to any one of claims 11 to 14, and to hold a plurality of containers (100) according to any one of claims 1 to 10 in storage locations within the storage library.
Citation Information
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