Substrate cleaning apparatus, substrate cleaning method, and alignment mechanism

Abstract

The application discloses a substrate cleaning device, a substrate cleaning method and an alignment mechanism. The substrate cleaning device comprises a conveying mechanism for conveying a substrate; the conveying mechanism comprises an entrance section, a cleaning section and an exit section arranged in sequence along a first direction; a cleaning mechanism is arranged in the cleaning section and used for cleaning the substrate; an alignment mechanism is arranged in the entrance section and / or the exit section, and the alignment mechanism is used for adjusting the position of the substrate to align the substrate with the conveying mechanism; the alignment mechanism comprises a support frame and at least two alignment columns, the alignment columns are in the shape of a rotary body, the alignment columns are rotatably connected with the support frame, the rotation axes of the alignment columns are parallel to a second direction; the at least two alignment columns are located on both sides of the conveying mechanism along a third direction; the cross sections of at least part of the alignment columns gradually increase along the second direction, so that the at least two alignment columns support the substrate and limit the position of the substrate in the third direction. The application can reduce the risk of substrate damage.

Description

Technical Field

[0001] This application relates to the field of display panel manufacturing technology, and in particular to a substrate cleaning device, a substrate cleaning method, and an alignment mechanism. Background Technology

[0002] Cleaning equipment is installed on display panel production lines to clean substrates or semi-finished display panels. Cylindrical alignment devices are used at the inlet and outlet of the cleaning equipment to align the substrates to their predetermined positions. During alignment, one or both alignment posts of the alignment mechanism clamp the substrate, achieving proper alignment. During clamping, the alignment device may compress the substrate, causing fragments or cracks, and the cylindrical alignment posts generate dust through wear during contact with the substrate. Summary of the Invention

[0003] This application provides a substrate cleaning device, a substrate cleaning method, and an alignment mechanism, which can reduce the risk of substrate damage.

[0004] In a first aspect, a substrate cleaning apparatus is provided, comprising: a substrate cleaning apparatus for cleaning a substrate, the substrate cleaning apparatus comprising: a conveying mechanism for conveying the substrate along a first direction; the conveying mechanism comprising an inlet section, a cleaning section, and an outlet section arranged sequentially along the first direction; a cleaning mechanism disposed in the cleaning section for cleaning the substrate; and an alignment mechanism disposed in the inlet section and / or the outlet section for adjusting the position of the substrate to align the substrate with the conveying mechanism; the alignment mechanism comprising a support frame and at least two alignment posts, the alignment posts being rotating bodies rotatably connected to the support frame, the rotation axis of the alignment posts being parallel to a second direction; at least two alignment posts being located on both sides of the conveying mechanism along a third direction; the first direction, the second direction, and the third direction intersecting each other; at least a portion of the cross-section of the alignment posts gradually increasing along the second direction to support the substrate and restrict the position of the substrate in the third direction.

[0005] According to an embodiment of the first aspect of this application, the alignment column includes a frustum-shaped segment having a first end and a second end opposite to each other along a second direction, and the cross-section of the frustum-shaped segment gradually increases along the direction from the first end to the second end; the second end is rotatably connected to a support frame.

[0006] According to an embodiment of the first aspect of this application, the cross-section of the frustum segment increases uniformly along the direction from the first end to the second end.

[0007] According to an embodiment of the first aspect of this application, along the direction from the first end to the second end, the increase in the cross-sectional area of ​​the frustum segment gradually decreases per unit distance.

[0008] According to an embodiment of the first aspect of this application, the cone angle θ of the cone corresponding to the sidewall of the frustum segment is 45°-60°.

[0009] According to an embodiment of the first aspect of this application, the alignment post further includes a cylindrical segment, one end of which is connected to the first end, and the cross-section of the cylindrical segment is less than or equal to the cross-section of the first end.

[0010] According to an embodiment of the first aspect of this application, the connection between the cylindrical segment and the first end is provided with a curved chamfer.

[0011] According to an embodiment of the first aspect of this application, the alignment post further includes a limiting segment having a third end and a fourth end opposite to each other along a second direction, and the cross-section of the limiting segment gradually increases along the direction from the third end to the fourth end; the third end is connected to the first end.

[0012] According to an embodiment of the first aspect of this application, the support frame includes: a frame body and at least two connecting parts, wherein the alignment column is rotatably connected to the connecting parts, and the connecting parts are movably connected to the frame body along a third direction; at least two connecting parts are arranged along a third direction.

[0013] According to an embodiment of the first aspect of this application, the support frame further includes a locking part for fixing the relative position of the connecting part and the frame body.

[0014] According to an embodiment of the first aspect of this application, the alignment post includes a frustum-shaped segment, the frustum-shaped segment having a first end and a second end opposite to each other along a second direction, the cross-section of the frustum-shaped segment gradually increasing along the direction from the first end to the second end; the second end is rotatably connected to a connecting portion; the distance between the two connecting portions disposed along a third direction is D1, the radius of the first end is R1, the radius of the second end is R2, and the dimension of the substrate along the third direction is D0, wherein D1-2*R1>D0>D1-2*R2.

[0015] According to an embodiment of the first aspect of this application, the cross-section of the frustum segment increases uniformly along the direction from the first end to the second end; D0-(D1-2*R2)=Ds, where Ds is a preset difference value.

[0016] According to an embodiment of the first aspect of this application, the support frame further includes a driving component for driving the frame body to move along a second direction so that the aligned substrate contacts the transfer mechanism.

[0017] According to an embodiment of the first aspect of this application, the conveying mechanism includes a conveyor belt, with a first direction and a third direction both parallel to the plane where the conveyor belt is located; at least two alignment posts are respectively disposed on both sides of the conveyor belt along the third direction and arranged along the third direction.

[0018] Secondly, embodiments of this application provide a substrate cleaning method, which uses the substrate cleaning equipment of the first aspect of this application.

[0019] Thirdly, embodiments of this application provide an alignment mechanism for use in the substrate cleaning apparatus of the first aspect of this application.

[0020] In the substrate cleaning equipment, substrate cleaning method, and alignment mechanism provided in this application embodiment, a conveying mechanism is used to convey the substrate. The substrate enters from the inlet section, is cleaned by the cleaning mechanism in the cleaning section, and exits from the outlet section. An alignment mechanism is disposed in the inlet section and / or the outlet section to adjust the position of the substrate relative to the conveying mechanism so that the two are aligned. The alignment posts are rotating bodies, rotatably connected to the support frame, and at least a portion of the cross-section of the alignment posts gradually increases along a second direction. During the alignment process, the edge of the substrate slides along the sidewalls of the alignment posts until the sidewalls of at least two alignment posts hold the edge of the substrate and support it, at which point the substrate is aligned with the conveying mechanism. During the alignment process, since the alignment posts do not need to move along a third direction, the force exerted by the alignment posts on the edge of the substrate can be reduced, thereby reducing the risk of damage to the substrate due to the force exerted by the alignment posts. Attached Figure Description

[0021] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a schematic diagram of a substrate cleaning apparatus along a second direction according to an embodiment of this application.

[0023] Figure 2 This is a schematic diagram of a substrate cleaning device in use along a second direction according to an embodiment of this application.

[0024] Figure 3 This is a schematic diagram of the alignment mechanism and the substrate along a first direction of the substrate cleaning equipment according to an embodiment of this application.

[0025] Figure 4 for Figure 3 A partial enlarged view of the alignment mechanism and substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0026] Figure 5 for Figure 3 Another enlarged view of the alignment mechanism and the substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0027] Figure 6 for Figure 3 Another enlarged view of the alignment mechanism and the substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0028] Figure 7 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0029] Figure 8 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0030] Figure 9 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0031] Figure 10 This is a schematic diagram of the alignment mechanism, part of the conveyor belt, and the substrate along a first direction of the substrate cleaning equipment according to an embodiment of this application.

[0032] Figure 11 This is a schematic diagram of the alignment mechanism, a portion of the conveyor belt, and the substrate along a third direction of the substrate cleaning equipment according to an embodiment of this application.

[0033] Figure 12 This is a schematic flowchart of a substrate cleaning method according to an embodiment of this application.

[0034] Figure 13 This is a schematic diagram of the alignment mechanism along a first direction according to an embodiment of this application.

[0035] Figure label:

[0036] 1. Conveying mechanism; 11. Entrance section; 12. Cleaning section; 13. Exit section; 14. Conveyor belt;

[0037] 2. Cleaning facility;

[0038] 3. Alignment mechanism; 31. Support frame; 311. Frame body; 312. Connecting part; 313. Locking part; 314. Drive assembly; 32. Alignment column; 321. Frustum-shaped section; 321a. First end; 321b. Second end; 322. Columnar section; 323. Limiting section; 323a. Third end; 323b. Fourth end;

[0039] 4. Substrate;

[0040] A1, First Direction; A2, Second Direction; A3, Third Direction. Detailed Implementation

[0041] The features and exemplary embodiments of various aspects of this application will now be described in detail. Numerous specific details are set forth in the following detailed description in order to provide a comprehensive understanding of this application. However, it will be apparent to those skilled in the art that this application can be implemented without some of these specific details. The following description of embodiments is merely intended to provide a better understanding of this application by illustrating examples thereof.

[0042] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The embodiments will now be described in detail with reference to the accompanying drawings.

[0043] Relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0044] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.

[0045] Furthermore, the term "and / or" in this article is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Additionally, the character " / " in this article generally indicates that the preceding and following related objects have an "or" relationship.

[0046] It should be understood that in the embodiments of this application, "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean that B is determined solely based on A; B can also be determined based on A and / or other information.

[0047] The applicant discovered that during the manufacturing process of display panels, cleaning equipment is used to clean the substrates or semi-finished display panels. Alignment devices are installed at the inlet and outlet of the cleaning equipment to align the substrates. These alignment devices typically use pairs of cylindrical alignment posts, driven by a drive mechanism to clamp the sides of the substrate, thereby adjusting the substrate's position to align it with the conveyor belt. During the clamping process, the drive mechanism applies significant force to the substrate edges via the alignment posts, causing damage to the substrate, accelerating wear on the alignment posts, and generating dust that contaminates the substrate, all of which negatively impact substrate quality.

[0048] Based on the above analysis, the applicant provides a substrate cleaning apparatus, a substrate cleaning method, and an alignment mechanism. The substrate cleaning apparatus includes a conveying mechanism, a cleaning mechanism, and an alignment mechanism. The conveying mechanism is used to convey the substrate, which enters from the inlet section, is cleaned by the cleaning mechanism in the cleaning section, and exits from the outlet section. The alignment mechanism is disposed in the inlet section and / or the outlet section and is used to adjust the position of the substrate relative to the conveying mechanism to align them. The alignment posts are rotating bodies and are rotatably connected to the support frame. At least a portion of the alignment posts have a cross-section that gradually increases along a second direction. During the alignment process, the edge of the substrate slides along the sidewalls of the alignment posts until the sidewalls of at least two alignment posts hold the edge of the substrate and support it, at which point the substrate is aligned with the conveying mechanism. During the alignment process, since the alignment posts do not need to move along a third direction, the force exerted by the alignment posts on the edge of the substrate can be reduced, thereby reducing the risk of damage to the substrate due to the force exerted by the alignment posts.

[0049] Figure 1 This is a schematic diagram of a substrate cleaning apparatus along a second direction according to an embodiment of this application. Figure 2 This is a schematic diagram of a substrate cleaning device in use along a second direction according to an embodiment of this application. Figure 3 This is a schematic diagram of the alignment mechanism and the substrate along a first direction of the substrate cleaning equipment according to an embodiment of this application.

[0050] Please see Figures 1 to 3This application provides a substrate 4 cleaning device for cleaning substrate 4. The substrate 4 cleaning device includes: a conveying mechanism 1 for conveying substrate 4 along a first direction A1; the conveying mechanism 1 includes an inlet section 11, a cleaning section 12, and an outlet section 13 arranged sequentially along the first direction A1; a cleaning mechanism 2 disposed in the cleaning section 12 for cleaning substrate 4; and an alignment mechanism 3 disposed in the inlet section 11 and / or the outlet section 13 for adjusting the position of substrate 4 so that substrate 4 is aligned with conveying mechanism 1; the alignment mechanism 3 includes a support frame 31 and at least two alignment posts, the alignment posts are rotating bodies, the alignment posts are rotatably connected to the support frame 31, and the rotation axis of the alignment posts is parallel to the second direction A2; at least two alignment posts are located on both sides of conveying mechanism 1 along a third direction A3; the first direction A1, the second direction A2, and the third direction A3 intersect each other; the cross-section of at least a portion of the alignment posts gradually increases along the second direction A2 so that at least two alignment posts support substrate 4 and restrict the position of substrate 4 in the third direction A3.

[0051] The substrate 4 cleaning device of this application embodiment is used in the manufacturing process of the display panel to clean the substrate 4. It should be emphasized that the substrate 4 can be a substrate without other film layers, or it can be a finished or semi-finished product of the display panel with some film layers.

[0052] The conveying mechanism 1 is used to convey the substrate 4 along the first direction A1. During the conveying of the substrate 4, the plane containing the substrate 4 is parallel to the first direction A1. Considering that the substrate 4 is usually a rectangular plate, the first direction A1 can be parallel to the length direction of the substrate 4. The first direction A1, the second direction A2, and the third direction A3 intersect each other. The second direction A2 can correspond to the width direction of the substrate 4, and the third direction A3 can be perpendicular to the plane containing the substrate 4. For ease of explanation, in this embodiment, the first direction A1, the second direction A2, and the third direction A3 are perpendicular to each other as an example.

[0053] The conveying mechanism 1 includes an inlet section 11, a cleaning section 12, and an outlet section 13 arranged sequentially along a first direction A1. The substrate 4 enters from the inlet section 11 and is conveyed along the first direction A1 to the outlet section 13. It is understood that the extension direction of the conveying mechanism 1 between the inlet section 11 and the cleaning section 12, and between the cleaning section 12 and the outlet section 13, can intersect with or be parallel to the first direction A1.

[0054] The cleaning mechanism 2 is disposed in the cleaning section 12. When the substrate 4 is conveyed to the cleaning section 12 by the conveying mechanism 1, the cleaning mechanism 2 cleans the substrate 4. It should be noted that the specific structure of the cleaning mechanism 2 can be adjusted according to the characteristics of the substrate 4. For example, depending on whether the substrate 4 has other film layers, the cleaning mechanism 2 can include a cleaning liquid circulation component, a spraying component, and a drying component. The cleaning liquid circulation component is used to maintain the recovery and filtration of the cleaning liquid. The filtered cleaning liquid can be sprayed onto the surface of the substrate 4 by the spraying component to clean the substrate 4. The drying component can dry the substrate 4 and remove the cleaning liquid remaining on the surface of the substrate 4.

[0055] The alignment mechanism 3 is used to adjust the position of the substrate 4 relative to the conveying mechanism 1 so that the substrate 4 is aligned with the conveying mechanism 1. The alignment mechanism 3 can be provided in the inlet section 11, or in the outlet section 13, or in both the outlet section 13 and the inlet section 11. For ease of explanation, in this embodiment, the alignment mechanism 3 is provided in the inlet section 11 as an example.

[0056] The alignment mechanism 3 includes a support frame 31 and at least two alignment posts, which are disposed on the support frame 31. The at least two alignment posts are located on both sides of the conveying mechanism 1 along the third direction A3. When the substrate 4 is placed at the inlet section 11, the at least two alignment posts on both sides of the substrate 4 along the third direction A3 restrict the position of the substrate 4, achieving alignment. The alignment posts are bodies of revolution and are rotatably connected to the support frame 31. The rotation axis of the alignment posts is parallel to the second direction A2. During the process of the substrate 4 being conveyed by the conveying mechanism 1, the sidewalls of the alignment posts contact the substrate 4, and simultaneously, the alignment posts rotate relative to the support frame 31, thereby guiding the substrate 4. It should be noted that a body of revolution refers to a three-dimensional solid shape formed by rotating a planar shape around a fixed axis, such as a cylinder, frustum, cone, spherical cap, or truncated cone. Considering that the cross-section of at least a portion of the alignment posts gradually increases along the second direction A2, the bodies of revolution formed by at least a portion of the alignment posts include, but are not limited to, frustums, cones, and truncated cones.

[0057] When substrate 4 is placed in inlet section 11, as the cross-section of at least a portion of the alignment posts gradually increases along the second direction A2, one edge of substrate 4 along the third direction A3 will contact the sidewall of one of the alignment posts and slide along that sidewall. During this process, the other edge of substrate 4 along the third direction A3 will gradually approach the sidewall of the other alignment post until it contacts the sidewall of the other alignment post. At this time, the two alignment posts restrict the position of substrate 4 in the third direction A3, thereby aligning substrate 4 with the conveying mechanism 1. At the same time, the sidewalls of the two alignment posts can provide a certain support for substrate 4, allowing substrate 4 to smoothly contact the conveying structure and be conveyed by the conveying mechanism 1 along the first direction A1.

[0058] During the alignment process of substrate 4 and conveying mechanism 1 using alignment posts, the distance between the rotation axes of the two alignment posts remains constant, reducing the force exerted on substrate 4 along the third direction A3, thereby reducing the risk of damage to substrate 4. Compared with related technologies, the substrate 4 cleaning device of this application eliminates the clamping process of alignment posts. Therefore, the substrate 4 cleaning device of this application simplifies the complexity of the equipment and the process of cleaning substrate 4, thereby improving the efficiency of cleaning substrate 4 and reducing the cost of cleaning substrate 4.

[0059] It should be noted that the alignment posts can be arranged in pairs, with each pair consisting of two alignment posts located on both sides of the conveying mechanism 1 along the third direction A3. Multiple pairs of alignment posts can be provided to improve the alignment accuracy of the substrate 4. For example, when the substrate 4 is rectangular, two pairs of alignment posts can be provided to restrict the four corners of the substrate 4 respectively.

[0060] Figure 4 for Figure 3 A partial enlarged view of the alignment mechanism and substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0061] Further, please refer to Figure 4 The alignment column includes a frustum-shaped segment 321, which has a first end 321a and a second end 321b opposite to each other along the second direction A2. The cross-section of the frustum-shaped segment 321 gradually increases along the direction from the first end 321a to the second end 321b. The second end 321b is rotatably connected to the support frame 31.

[0062] The sidewalls of the frustum-shaped segment 321 of the alignment post are used to limit the sides of the substrate 4. Along the direction from the first end 321a to the second end 321b, the cross-section of the frustum-shaped segment 321 gradually increases; that is, the first end 321a of the frustum-shaped segment 321 is thinner than the second end 321b. The second end 321b is rotatably connected to the support frame 31, so the second end 321b can be considered the bottom of the frustum-shaped segment 321, and the first end 321a can be considered the top of the frustum-shaped segment 321. It should be emphasized that the cross-section of the frustum-shaped segment 321 can increase uniformly or non-uniformly from the first end 321a to the second end 321b.

[0063] Further reading Figure 4 Along the direction from the first end 321a to the second end 321b, the cross-section of the frustum-shaped segment 321 increases uniformly, making the frustum-shaped segment 321 a truncated cone. The second end 321b can be regarded as the bottom of the frustum, and the first end 321a can be regarded as the top of the frustum. When the edge of the substrate 4 slides along the side wall of the frustum-shaped segment 321, the cross-section of the frustum-shaped segment 321 increases uniformly, allowing the substrate 4 to slide with uniform acceleration, thereby making the motion and stress state of the substrate 4 more stable.

[0064] Figure 5 for Figure 3 Another enlarged view of the alignment mechanism and the substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0065] Further, please refer to Figure 5 When the frustum-shaped segment 321 is a truncated cone, it can be considered as part of a cone with a cone angle θ of 45°-60°. That is, the cone angle θ corresponding to the sidewall of the frustum-shaped segment 321 is 45°-60°. Given a fixed length of the frustum-shaped segment 321 along the second direction A2, an appropriate cone angle allows for a sufficiently large difference between the cross-sectional size of the first end 321a and the cross-sectional size of the second end 321b. This ensures that the substrate 4 located between the two alignment posts can be positioned and supported by the frustum-shaped segments 321 of the two alignment posts.

[0066] Figure 6 for Figure 3 Another enlarged view of the alignment mechanism and the substrate in region B of the substrate cleaning apparatus of this application embodiment.

[0067] Further, please refer to Figure 6 As the frustum-shaped segment 321 moves from the first end 321a to the second end 321b, it gradually approaches a cylinder. That is, along the direction from the first end 321a to the second end 321b, the increase in cross-sectional area of ​​the frustum-shaped segment 321 gradually decreases per unit distance. When the edge of the substrate 4 slides along the sidewall of the frustum-shaped segment 321, the substrate 4 moves from the sidewall opposite to the frustum-shaped segment 321 to the side where it comes to rest. The edge of the substrate 4 exhibits variable acceleration motion, and the acceleration change is smoother, which reduces the impact of motion on the edge of the substrate 4 during its subsequent movement, further reducing the risk of damage to the substrate 4.

[0068] Figure 7 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0069] Further, please refer to Figure 7The alignment post also includes a cylindrical segment 322, one end of which is connected to the first end 321a. The cross-section of the cylindrical segment 322 is less than or equal to the cross-section of the first end 321a. Besides the frustum segment 321, the alignment post may also include a cylindrical segment 322. For example, the alignment post can be a geometric shape formed by connecting a cylinder and a frustum. The cross-section of the cylindrical segment 322 is less than or equal to the cross-section of the first end 321a; that is, the cylindrical segment 322 has the same thickness as the first end 321a of the frustum segment 321, or the cylindrical segment 322 is thinner than the first end 321a of the frustum segment 321. When the substrate 4 is placed in the inlet segment 11 along the second direction A2, the movement interference of the cylindrical segment 322 on the edge of the substrate 4 can be reduced, allowing the edge of the substrate 4 to smoothly pass to the sidewall of the frustum segment 321.

[0070] Furthermore, a chamfered arc surface is provided at the connection between the cylindrical segment 322 and the first end 321a. When the edge of the substrate 4 slides from the side wall of the cylindrical segment 322 to the side wall of the frustum segment 321, the chamfered arc surface can make the sliding of the edge of the substrate 4 smoother. At the connection between the cylindrical segment 322 and the first end 321a, the impact of movement on the edge of the substrate 4 is reduced, thereby further reducing the risk of damage to the substrate 4.

[0071] Figure 8 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0072] Further, please refer to Figure 8 The alignment post also includes a limiting segment 323, which has a third end 323a and a fourth end 323b opposite to each other along the second direction A2. The cross-section of the limiting segment 323 gradually increases along the direction from the third end 323a to the fourth end 323b. The third end 323a is connected to the first end 321a.

[0073] When the substrate 4 moves along the first direction A1 to between the two alignment posts on both sides of the conveying mechanism 1 along the third direction A3, the limiting posts are used to prevent the substrate 4 from falling out between the two alignment posts along the second direction A2. In the limiting segment 323, the cross-section of the limiting segment 323 gradually increases along the direction from the third end 323a to the fourth end 323b, that is, the third end 323a is thinner than the fourth end 323b. For example, the limiting segment 323 can be in the shape of an inverted frustum or an inverted spherical frustum. The third end 323a is connected to the first end 321a. Along the second direction A2, the cross-section of the alignment post first gradually decreases and then gradually increases, and the overall shape is similar to an hourglass. It is understandable that the connection between the third end 323a and the first end 321a is provided with an arc chamfer. When the edge of the substrate 4 slides along the side wall of the alignment post, the arc chamfer can make the sliding of the edge of the substrate 4 smoother. At the connection between the third end 323a and the first end 321a, the impact of movement on the edge of the substrate 4 is reduced, thereby further reducing the risk of damage to the substrate 4.

[0074] Figure 9 This is a schematic diagram of another structure of the alignment mechanism and the substrate along the first direction of the substrate cleaning apparatus according to an embodiment of this application.

[0075] Further, please refer to Figure 9 The support frame 31 includes: a frame body 311 and at least two connecting parts 312. The alignment column is rotatably connected to the connecting parts 312, and the connecting parts 312 are movably connected to the frame body 311 along a third direction A3. At least two connecting parts 312 are arranged along a third direction A3.

[0076] The alignment post is connected to the connecting part 312, and the connecting part 312 is movably connected to the frame 311 along the third direction A3. Therefore, the alignment post can move relative to the frame 311 along the third direction A3. Before cleaning the substrate 4 using the substrate 4 cleaning equipment of this application embodiment, the position of the alignment post relative to the frame 311 is adjusted so that the distance between the alignment posts on both sides of the conveying mechanism 1 along the third direction A3 is appropriate. When the two alignment posts limit and support the substrate 4, the edge of the substrate 4 contacts the side wall of the alignment post, reducing the risk of the substrate 4 falling off between the two alignment posts along the second direction A2. Exemplarily, the movable connection between the frame 311 and the connecting part 312 can be in the form of a slide rail slider. The connecting part 312 can be moved relative to the frame 311 by automatic drive or by manual drive. When the connecting part 312 is moved relative to the frame 311 by automatic drive, a telescopic cylinder or a lead screw nut can be used to drive the connecting part 312 relative to the frame 311. Understandably, markings can be set on the frame 311 to determine the distance between the two connecting parts 312, and thus the distance between the rotation axes of the two alignment columns. It should be noted that each of the alignment columns located on either side of the conveying mechanism 1 along the third direction A3 is connected to a connecting part 312. Both connecting parts 312 are movably connected to the frame 311, and are also located on either side of the conveying mechanism 1 along the third direction A3.

[0077] After the alignment post limits and supports the edge of the substrate 4, when the conveying mechanism 1 conveys the substrate 4 along the first direction A1, since the alignment post and the connecting part 312 are rotatably connected, the alignment post can rotate together with the substrate 4 as it is conveyed along the first direction A1, guiding the edge of the substrate 4. This makes the conveying of the substrate 4 smoother while maintaining the alignment between the substrate 4 and the conveying mechanism 1, thereby reducing the risk of damage to the substrate 4 caused by bumps or scratches during the conveying process.

[0078] Further reading Figure 9The support frame 31 also includes a locking part 313 for fixing the relative position of the connecting part 312 and the frame 311. Before cleaning the substrate 4 using the substrate 4 cleaning equipment of this application embodiment, after adjusting the distance between the two connecting parts 312, the connecting part 312 and the frame 311 are locked by the locking part 313. When the substrate 4 is placed between the alignment posts located on both sides of the conveying mechanism 1 along the third direction A3, the connecting part 312 and the frame 311 can be kept fixed, thereby fixing the distance between the rotation axes of the two alignment posts. When cleaning multiple substrates 4 of the same size continuously, the consistency of the positioning and support of the alignment posts on the substrate 4 can be maintained. Exemplarily, the locking part 313 can be in the form of a bolt, which is threadedly connected to the frame 311. By rotating the bolt, the end of the bolt can abut against the connecting part 312, thereby fixing the connecting part 312 and the frame 311.

[0079] Further reading Figure 9 The alignment post includes a frustum-shaped segment 321, which has a first end 321a and a second end 321b opposite each other along the second direction A2. The cross-section of the frustum-shaped segment 321 gradually increases along the direction from the first end 321a to the second end 321b. The second end 321b is rotatably connected to the connecting portion 312. The distance between the two connecting portions 312 provided along the third direction A3 is D1, the radius of the first end 321a is R1, the radius of the second end 321b is R2, and the dimension of the substrate 4 along the third direction A3 is D0, wherein D1-2*R1>D0>D1-2*R2.

[0080] Along the direction from the first end 321a to the second end 321b, the cross-section of the frustum-shaped segment 321 gradually increases, that is, the frustum-shaped segment 321 is a frustum of a cone or a frustum of a sphere. In order for the frustum-shaped segment 321 to restrict and support the edge of the substrate 4, the edge of the substrate 4 should abut against the sidewall of the frustum-shaped segment 321. Along the third direction A3, the side dimension D0 of the substrate 4 (or the width of the substrate 4 for a rectangular substrate 4) needs to be greater than the minimum distance between the second ends 321b of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3. That is, the difference between the distance between the rotation axes of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3 and twice the radius R2 of the second end 321b. The distance between the rotation axes of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3 is equal to the distance D1 between the connecting portions 312 on both sides of the conveying mechanism 1 along the third direction A3. Therefore, D0 > D1 - 2 * R2. Furthermore, in order for the substrate 4 to be positioned between the alignment posts on both sides of the conveying mechanism 1 along the third direction A3, the side dimension D0 of the substrate 4 (or the width of the substrate 4 for a rectangular substrate 4) along the third direction A3 needs to be less than the minimum distance between the first ends 321a of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3. That is, the difference between the distance between the rotation axes of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3 and twice the radius R1 of the first end 321a. The distance between the rotation axes of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3 is equal to the distance D1 between the connecting portions 312 on both sides of the conveying mechanism 1 along the third direction A3. Therefore, D1 - 2 * R1 > D0. It should be emphasized that the distance D1 between the connecting portions 312 on both sides of the conveying mechanism 1 along the third direction A3 refers to the distance between the corresponding positions of the two connecting portions 312 and the rotation axes of the alignment posts.

[0081] Further reading Figure 9 Along the direction from the first end 321a to the second end 321b, the cross section of the frustum segment 321 increases uniformly; D0-(D1-2*R2)=Ds, where Ds is a preset difference value.

[0082] When the frustum segment 321 is a truncated cone, given that the cone angle of the cone corresponding to the sidewall of the frustum segment 321 is determined, the cross-sectional radius of each position on the sidewall of the frustum segment 321 is linearly related to the distance from that position on the sidewall to the second end 321b along the second direction A2. When the edge of the substrate 4 abuts against the sidewall of the frustum segment 321, the distance between the plane of the substrate 4 and the second end 321b along the second direction A2 is proportional to the distance from the edge of the substrate 4 to the edge of the second end 321b along the third direction A3, and the proportionality coefficient is the tangent of half the cone angle of the cone corresponding to the sidewall of the frustum segment 321. Given a fixed side dimension (width of substrate 4 for rectangular substrate 4) D0, the distance from the edge of substrate 4 to the edge of the second end 321b along the third direction A3 is linearly related to the distance between the rotation axes of the alignment posts on both sides of the conveying mechanism 1 along the third direction A3, i.e., linearly related to the distance D1 between the connecting portions 312 on both sides of the conveying mechanism 1 along the third direction A3. Therefore, the distance from the plane of substrate 4 to the second end 321b along the second direction A2 can be adjusted by adjusting the distance D1 between the connecting portions 312 on both sides of the conveying mechanism 1 along the third direction A3. Before cleaning the substrate 4 using the substrate 4 cleaning equipment of this application embodiment, a preset difference value Ds can be predetermined. The preset difference value Ds is the difference between the side dimension D0 of the substrate 4 (or the width of the substrate 4 for a rectangular substrate 4) and the minimum distance between the second end 321b of the alignment post located on both sides of the conveying mechanism 1 along the third direction A3, i.e., D0-(D1-2*R2)=Ds. At this time, the preset difference value Ds is equivalent to twice the distance from the edge of the substrate 4 to the edge of the second end 321b along the third direction A3. The ratio of the distance between the plane where the substrate 4 is located and the second end 321b along the second direction A2 to half of the preset difference value Ds is equal to the tangent of half of the cone angle of the cone corresponding to the side wall surface of the frustum segment 321. Therefore, by adjusting the size of the preset difference Ds, the distance between the plane where the substrate 4 is located and the second end 321b along the second direction A2 can be adjusted. In other words, the relative position between the plane where the substrate 4 is located and the conveying mechanism 1 along the third direction A3 can be adjusted so that when the substrate 4 is limited and supported by the alignment post, the substrate 4 can contact the conveying mechanism 1 so that the conveying mechanism 1 can convey the aligned substrate 4.

[0083] Figure 10 This is a schematic diagram of the alignment mechanism, part of the conveyor belt, and the substrate along a first direction of the substrate cleaning equipment according to an embodiment of this application.

[0084] Further, please refer to Figure 10The support frame 31 also includes a driving assembly for driving the frame 311 to move along the second direction A2, so that the aligned substrate 4 comes into contact with the transfer mechanism 1. The driving assembly can drive the frame 311 to move along the second direction A2. After the alignment post limits and supports the substrate 4, it can move the substrate 4 along the second direction A2, so that the aligned substrate 4 can come into contact with the transfer mechanism 1, so that the transfer mechanism 1 can transfer the substrate 4 along the first direction A1.

[0085] Figure 11 This is a schematic diagram of the alignment mechanism, a portion of the conveyor belt, and the substrate along a third direction of the substrate cleaning equipment according to an embodiment of this application.

[0086] Further reading Figure 10 and combined Figure 11 The conveying mechanism 1 includes a conveyor belt 14, with both the first direction A1 and the third direction A3 parallel to the plane of the conveyor belt 14. At least two alignment posts are respectively disposed on both sides of the conveyor belt 14 along the third direction A3 and arranged along the third direction A3. The conveying mechanism 1 adopts a belt conveying method. The substrate 4 is placed on the conveyor belt 14, and the conveyor belt 14 drives the substrate 4 to move along the first direction A1 through the friction between the substrate 4 and the conveyor belt 14. The alignment posts are disposed on both sides of the conveyor belt 14 along the third direction A3 and arranged along the third direction A3. After the alignment posts align the substrate 4, the substrate 4 is aligned with the conveyor belt 14 and then contacts the conveyor belt 14, thereby conveying the substrate 4 along the first direction A1.

[0087] This application also provides a substrate 4 cleaning method, which uses the substrate 4 cleaning equipment described in the foregoing embodiments of this application.

[0088] Figure 12 This is a schematic flowchart of a substrate cleaning method according to an embodiment of this application.

[0089] For example, please refer to Figure 12 The substrate 4 cleaning method in this application embodiment includes:

[0090] Step S1: Place the substrate 4 in the inlet section 11.

[0091] The substrate 4 can be moved by adsorption. After the substrate 4 is moved to the inlet section 11 of the conveying mechanism 1, the substrate 4 is released and falls onto the conveying mechanism 1. At the same time, the substrate 4 slides along the edge of the alignment post along one side of the third direction A3 until the two sides of the substrate 4 along the third direction A3 contact the alignment posts located on both sides of the conveying mechanism 1 along the third direction A3. At this time, the alignment posts limit and support the substrate 4, realizing the alignment process of the alignment posts to the substrate 4.

[0092] Step S2, Clean the substrate 4.

[0093] The substrate 4 is brought into contact with the conveying mechanism 1. The friction between the conveying mechanism 1 and the substrate 4 causes the substrate 4 to move along the first direction A1. Simultaneously, the alignment post rotates around its own rotation axis, guiding the movement of the substrate 4. The substrate 4 is moved until it enters the cleaning section 12, where the cleaning mechanism 2 cleans the surface of the substrate 4.

[0094] Step S3: Transfer the substrate 4 to the exit section 13.

[0095] The substrate 4 is conveyed to the exit section 13 via the conveying mechanism 1 to facilitate subsequent operations on the substrate 4.

[0096] In this embodiment, the alignment post remains at the same position in the third direction A3 during step S1, which reduces the force exerted on the substrate 4 along the third direction A3, thereby reducing the risk of damage to the substrate 4. The substrate 4 cleaning method of this embodiment also simplifies the complexity of the equipment and the substrate 4 cleaning process, thereby improving the efficiency of substrate 4 cleaning and reducing the cost of substrate 4 cleaning.

[0097] Figure 13 This is a schematic diagram of the alignment mechanism along a first direction according to an embodiment of this application.

[0098] Please see Figure 13 This application also provides an alignment mechanism 3 for use in the cleaning equipment described in the foregoing embodiments of this application. The alignment mechanism 3 includes a support frame 31 and at least two alignment posts, which are disposed on the support frame 31. The at least two alignment posts are located on both sides of the conveying mechanism 1 along the third direction A3. When the substrate 4 is placed at the inlet section 11, the at least two alignment posts on both sides of the substrate 4 along the third direction A3 restrict the position of the substrate 4, achieving alignment. The alignment posts are rotating bodies and rotatably connected to the support frame 31. The rotation axis of the alignment posts is parallel to the second direction A2. During the process of the substrate 4 being conveyed by the conveying mechanism 1, the sidewalls of the alignment posts contact the substrate 4, and simultaneously, the alignment posts rotate relative to the support frame 31, thereby guiding the substrate 4.

[0099] In summary, this application provides a substrate cleaning apparatus, a substrate cleaning method, and an alignment mechanism. In the substrate cleaning apparatus, a conveying mechanism transports the substrate, which enters from the inlet section, is cleaned by the cleaning mechanism in the cleaning section, and exits from the outlet section. An alignment mechanism is disposed in the inlet section and / or the outlet section to adjust the position of the substrate relative to the conveying mechanism, aligning them. Alignment posts are rotating bodies, rotatably connected to a support frame, and at least a portion of the alignment posts have a gradually increasing cross-section along a second direction. During alignment, the edge of the substrate slides along the sidewalls of the alignment posts until the sidewalls of at least two alignment posts engage and support the substrate, at which point the substrate is aligned with the conveying mechanism. During alignment, since the alignment posts do not need to move along a third direction, the force exerted by the alignment posts on the edge of the substrate can be reduced, thereby lowering the risk of damage to the substrate due to the force exerted by the alignment posts.

[0100] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A substrate cleaning device, characterized in that, The substrate cleaning equipment is used to clean substrates, and the substrate cleaning equipment includes: A conveying mechanism for conveying a substrate along a first direction; the conveying mechanism includes an inlet section, a cleaning section, and an outlet section arranged sequentially along the first direction; A cleaning mechanism is provided in the cleaning section, and the cleaning mechanism is used to clean the substrate; An alignment mechanism is disposed in the inlet section and / or the outlet section. The alignment mechanism is used to adjust the position of the substrate so that the substrate is aligned with the conveying mechanism. The alignment mechanism includes a support frame and at least two alignment posts. The alignment posts are rotating bodies and are rotatably connected to the support frame. The rotation axis of the alignment posts is parallel to a second direction. At least two of the alignment posts are located on both sides of the conveying mechanism along a third direction. The first direction, the second direction, and the third direction intersect each other. The cross-section of at least a portion of the alignment posts gradually increases along the second direction so that at least two of the alignment posts support the substrate and restrict the position of the substrate in the third direction.

2. The substrate cleaning equipment according to claim 1, characterized in that, The alignment column includes a frustum-shaped segment having a first end and a second end opposite each other along the second direction, and the cross-section of the frustum-shaped segment gradually increases along the direction from the first end to the second end; the second end is rotatably connected to the support frame. Preferably, the cross-section of the frustum-shaped segment increases uniformly along the direction from the first end to the second end; Preferably, along the direction from the first end to the second end, the increase in the cross-sectional area of ​​the frustum segment gradually decreases per unit distance; Preferably, the cone angle θ of the cone corresponding to the sidewall of the frustum-shaped segment is 45°-60°.

3. The substrate cleaning equipment according to claim 2, characterized in that, The alignment column further includes a cylindrical segment, one end of which is connected to the first end, and the cross-section of the cylindrical segment is less than or equal to the cross-section of the first end. Preferably, the connection between the cylindrical segment and the first end is provided with an arc-shaped chamfer.

4. The substrate cleaning equipment according to claim 2, characterized in that, The alignment post further includes a limiting segment having a third end and a fourth end opposite to each other along the second direction, and the cross-section of the limiting segment gradually increases along the direction from the third end to the fourth end; the third end is connected to the first end.

5. The substrate cleaning equipment according to claim 1, characterized in that, The support frame includes: a frame body and at least two connecting parts, wherein the alignment column is rotatably connected to the connecting parts, and the connecting parts are movably connected to the frame body along the third direction; at least two of the connecting parts are arranged along the third direction; Preferably, the support frame further includes a locking part for fixing the relative position of the connecting part and the frame body.

6. The substrate cleaning equipment according to claim 5, characterized in that, The alignment post includes a frustum-shaped segment, which has a first end and a second end opposite to each other along the second direction. The cross-section of the frustum-shaped segment gradually increases along the direction from the first end to the second end. The second end is rotatably connected to the connecting portion. The distance between the two connecting portions arranged along the third direction is D1, the radius of the first end is R1, the radius of the second end is R2, and the dimension of the substrate along the third direction is D0, wherein D1-2*R1>D0>D1-2*R2; Preferably, the cross-section of the frustum segment increases uniformly along the direction from the first end to the second end; D0-(D1-2*R2)=Ds, where Ds is a preset difference value.

7. The substrate cleaning equipment according to claim 5, characterized in that, The support frame further includes a drive assembly for driving the frame to move along the second direction so that the aligned substrate comes into contact with the conveying mechanism.

8. The substrate cleaning equipment according to claim 1, characterized in that, The conveying mechanism includes a conveyor belt, with the first direction and the third direction both parallel to the plane of the conveyor belt; at least two alignment posts are respectively disposed on both sides of the conveyor belt along the third direction and arranged along the third direction.

9. A substrate cleaning method, characterized in that, The substrate cleaning method uses the substrate cleaning equipment described in any one of claims 1 to 8.

10. A positioning mechanism, characterized in that, The alignment mechanism is used in the substrate cleaning equipment according to any one of claims 1 to 8.

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