Glue spreading and developing machine ld nozzle cleaning device and method

Abstract

The application discloses a kind of glue coating developing machine LD nozzle cleaning device, comprising: cleaning box.Cleaning box has the recess of top opening, recess has and the appearance of the working part of LD nozzle is matched and is used to fit the working part of LD nozzle, when cleaning, cleaning fluid is passed into recess and cleaning fluid will be placed in the working part of LD nozzle in recess immersion.The ultrasonic module is arranged on the side of recess, for providing ultrasonic wave to realize the ultrasonic cleaning of the working part of LD nozzle.Suction disc cover is arranged at the bottom of cleaning box, for fixing cleaning box by adsorption when cleaning.The application also discloses a kind of glue coating developing machine LD nozzle cleaning method.The application can save cleaning time and increase cleaning effect simultaneously.

Description

Technical Field

[0001] This invention relates to the field of semiconductor integrated circuit manufacturing, and particularly to a cleaning device for LD nozzles of a coating and developing machine. This invention also relates to a method for cleaning LD nozzles of a coating and developing machine. Background Technology

[0002] Due to its unique shape, the LD nozzle of the coating and developing machine has gaps and internal pores. In existing methods, simply using a cleaning cloth to wipe it can easily leave dirt residue, resulting in low cleaning efficiency and causing maintenance time to exceed the limit. Summary of the Invention

[0003] The technical problem to be solved by the present invention is to provide a cleaning device for the LD nozzle of a coating and developing machine, which can save cleaning time and increase cleaning effect at the same time. To this end, the present invention also provides a method for cleaning the LD nozzle of a coating and developing machine.

[0004] To solve the above-mentioned technical problems, the LD nozzle cleaning device for a coating and developing machine provided by the present invention includes a cleaning box.

[0005] The cleaning box has a groove with a top opening. The groove has a shape that matches the working part of the LD nozzle and is used to fit and place the working part of the LD nozzle. During cleaning, cleaning fluid is introduced into the groove and the cleaning fluid immerses the working part of the LD nozzle placed in the groove.

[0006] An ultrasonic module, disposed on the side of the groove, is used to provide ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle.

[0007] A suction cup cover is located at the bottom of the cleaning box and is used to fix the cleaning box in place by suction during cleaning.

[0008] A further improvement is that the cleaning solution includes alcohol and IPA.

[0009] A further improvement is that the groove includes a top groove and a bottom groove.

[0010] Along the width direction of the groove, the cross-sectional structure of the top groove is rectangular, and the cross-sectional structure of the bottom groove is semi-circular. The width of the bottom edge of the top groove is greater than the width of the top edge of the bottom groove, and the center position of the bottom edge of the top groove is aligned with the center position of the top edge of the bottom groove.

[0011] Along the length of the groove, the length of the top groove is greater than the length of the bottom groove.

[0012] A further improvement is that the suction cup cover is positioned at the middle of the bottom surface of the cleaning box.

[0013] A further improvement is that the coating and developing machine includes a rotating washing tray.

[0014] When cleaning the LD nozzle, the suction cup cover is fixed on the rotating washing plate.

[0015] To solve the above-mentioned technical problems, the present invention provides a method for cleaning the LD nozzle of a coating and developing machine, which includes the following steps: A cleaning box is provided, the cleaning box having a groove with a top opening, the groove having a shape that matches the working part of the LD nozzle and is used to fit and place the working part of the LD nozzle.

[0016] The working part of the LD nozzle is placed in the groove of the cleaning box and cleaning fluid is introduced into the groove to immerse the working part of the LD nozzle. Immersion of the working part of the LD nozzle prevents additional dirt from being generated on the working part of the LD nozzle.

[0017] The cleaning box is attached and fixed by suction cup cover located at the bottom of the cleaning box.

[0018] An ultrasonic module disposed on the side of the groove provides ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle, thereby cleaning the inside of the gap of the working step of the LD nozzle.

[0019] A further improvement is that the cleaning solution includes alcohol and IPA.

[0020] A further improvement is that the groove includes a top groove and a bottom groove.

[0021] Along the width direction of the groove, the cross-sectional structure of the top groove is rectangular, and the cross-sectional structure of the bottom groove is semi-circular. The width of the bottom edge of the top groove is greater than the width of the top edge of the bottom groove, and the center position of the bottom edge of the top groove is aligned with the center position of the top edge of the bottom groove.

[0022] Along the length of the groove, the length of the top groove is greater than the length of the bottom groove.

[0023] A further improvement is that the suction cup cover is positioned at the middle of the bottom surface of the cleaning box.

[0024] A further improvement is that the coating and developing machine includes a rotating washing tray.

[0025] When cleaning the LD nozzle, the suction cup cover is fixed on the rotating washing plate.

[0026] This invention designs a groove that matches the shape of the LD nozzle, allowing for a close fit to the working part of the LD nozzle and enabling cleaning fluid to flow into the groove to immerse the working part of the LD nozzle. Immersion prevents the introduction of additional contaminants. By incorporating an ultrasonic module on the side of the groove, ultrasonic cleaning is achieved. Ultrasonic cleaning not only cleans the surface of the working part of the LD nozzle but also cleans the internal crevices, thereby increasing cleaning effectiveness and efficiency and reducing cleaning time. Furthermore, this invention features a suction cup cover at the bottom of the cleaning box. The suction cup cover allows for the suction and fixation of the cleaning box, facilitating stable cleaning. The suction cup cover also facilitates the movement of the cleaning fluid, for example, allowing the cleaning box to be directly moved to the rotating washing tray of a coating and developing machine, enabling close-range or even in-situ cleaning of the LD nozzle, further saving cleaning time. Attached Figure Description

[0027] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments: Figure 1 This is a perspective view of the LD nozzle cleaning device of the coating and developing machine according to an embodiment of the present invention during cleaning; Figure 2 This is a side view of the cleaning box of the LD nozzle cleaning device of the coating and developing machine according to an embodiment of the present invention; Figure 3 It is along Figure 2 A cross-sectional view of line HH; Figure 4 This is a top view of the cleaning box of the LD nozzle cleaning device of the coating and developing machine according to an embodiment of the present invention. Detailed Implementation

[0028] like Figure 1 The image shown is a perspective view of the cleaning device for the LD nozzle 104 of the coating and developing machine according to an embodiment of the present invention during cleaning; as shown Figure 2 The image shown is a side view of the cleaning box 101 of the cleaning device for the LD nozzle 104 of the coating and developing machine according to an embodiment of the present invention. Figure 3 It is along Figure 2 A cross-sectional view of line HH; Figure 4 This is a top view of the cleaning box 101 of the cleaning device for the LD nozzle 104 of the coating and developing machine according to an embodiment of the present invention; the cleaning device for the LD nozzle 104 of the coating and developing machine according to an embodiment of the present invention includes: cleaning box 101.

[0029] The cleaning box 101 has a groove 105 with a top opening. The groove 105 has a shape that matches the working part of the LD nozzle 104 and is used to fit and place the working part of the LD nozzle 104. During cleaning, cleaning fluid is introduced into the groove 105 and the cleaning fluid immerses the working part of the LD nozzle 104 placed in the groove 105.

[0030] An ultrasonic module 102 is disposed on the side of the groove 105 for providing ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle 104.

[0031] A suction cup cover 103 is disposed at the bottom of the cleaning box 101 and is used to fix the cleaning box 101 by suction during cleaning.

[0032] In this embodiment of the invention, the cleaning solution includes alcohol and IPA. The LD nozzle 104 is a drip-proof fine atomizing nozzle, mainly used to spray developer to develop the photoresist exposed on the wafer. During the development process, the reaction between the developer and the photoresist can easily contaminate the LD nozzle 104, and the cleaning solution is required to remove these contaminants.

[0033] like Figure 3 As shown, the groove 105 includes a top groove 105b and a bottom groove 105a.

[0034] Along the width direction of the groove 105, the cross-sectional structure of the top groove 105b is rectangular, and the cross-sectional structure of the bottom groove 105a is semi-circular. The width of the bottom edge of the top groove 105b is greater than the width of the top edge of the bottom groove 105a, and the center position of the bottom edge of the top groove 105b is aligned with the center position of the top edge of the bottom groove 105a. Figure 3 The dimensions and height of the top edge of the top groove 105b and the overall height of the cleaning box are also indicated.

[0035] like Figure 4 As shown, along the length direction of the groove 105, the length of the top groove 105b is greater than the length of the bottom groove 105a. Figure 4 The dimensions also indicate the length and width of the top recess 105b, the length and width of the bottom recess 105a, and the overall length of the cleaning box. The width of the bottom recess 105a is... Figure 3 The width of the top edge of the bottom groove 105a described in the text.

[0036] like Figure 1 As shown, the suction cup cover 103 is positioned at the middle of the bottom surface of the cleaning box 101.

[0037] The coating and developing machine includes a rotating washing tray.

[0038] When cleaning the LD nozzle 104, the suction cup cover 103 is fixed on the rotating washing disc. This allows for on-site cleaning of the LD nozzle 104, or even in-situ cleaning, which greatly improves cleaning efficiency.

[0039] This invention incorporates a groove 105 that matches the shape of the LD nozzle 104, allowing for close placement of the working part of the LD nozzle 104 and enabling the introduction of cleaning fluid to immerse the working part of the LD nozzle 104. Immersion prevents the introduction of additional contaminants. An ultrasonic module 102 is provided on the side of the groove 105 for ultrasonic cleaning. Ultrasonic cleaning not only cleans the surface of the working part of the LD nozzle 104 but also cleans the internal crevices, thereby increasing cleaning effectiveness and efficiency and reducing cleaning time. Furthermore, this invention includes a suction cup cover 103 at the bottom of the cleaning box 101. The suction cup cover 103 allows for the adsorption and fixation of the cleaning box 101, facilitating stable cleaning. The suction cup cover 103 also facilitates the movement of the cleaning fluid, for example, allowing the cleaning box 101 to be directly moved to the rotating washing tray of the coating and developing machine, enabling close-range or even in-situ cleaning of the LD nozzle 104, further saving cleaning time.

[0040] The cleaning method for the LD nozzle 104 of the adhesive coating and developing machine according to an embodiment of the present invention includes the following steps: A cleaning box 101 is provided, the cleaning box 101 having a groove 105 with a top opening, the groove 105 having a shape that matches the working part of the LD nozzle 104 and is used to fit and place the working part of the LD nozzle 104.

[0041] In the method of this embodiment of the invention, the groove 105 includes a top groove 105b and a bottom groove 105a.

[0042] Along the width direction of the groove 105, the cross-sectional structure of the top groove 105b is rectangular, and the cross-sectional structure of the bottom groove 105a is semi-circular. The width of the bottom edge of the top groove 105b is greater than the width of the top edge of the bottom groove 105a, and the center position of the bottom edge of the top groove 105b is aligned with the center position of the top edge of the bottom groove 105a.

[0043] Along the length direction of the groove 105, the length of the top groove 105b is greater than the length of the bottom groove 105a.

[0044] The working part of the LD nozzle 104 is placed in the groove 105 of the cleaning box 101 and cleaning fluid is introduced into the groove 105 to immerse the working part of the LD nozzle 104. Immersion of the working part of the LD nozzle 104 prevents additional dirt from being generated on the working part of the LD nozzle 104.

[0045] In the method of this invention, the cleaning solution includes alcohol and IPA.

[0046] The cleaning box 101 is fixed by suction cup cover 103 located at the bottom of the cleaning box 101.

[0047] In the method of this embodiment, the suction cup cover 103 is positioned at the middle of the bottom surface of the cleaning box 101. The coating and developing machine includes a rotating washing tray. When cleaning the LD nozzle 104, the suction cup cover 103 is fixed to the rotating washing tray.

[0048] The ultrasonic module 102 provided on the side of the groove 105 provides ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle 104, thereby cleaning the inside of the gap of the working step of the LD nozzle 104.

[0049] In this embodiment of the invention, the newly developed cleaning fixture, namely the LD nozzle cleaning device, allows the cleaning solution to reach crevices that are difficult to wipe with a cleaning cloth. Through soaking and ultrasonic cleaning, deep cleaning of the LD nozzle can be achieved. Afterwards, combined with existing conventional methods such as wiping with a cleaning cloth, a highly efficient nozzle cleaning effect can be achieved. Compared with existing methods, the method of this invention is simpler and more efficient in cleaning the slits and internal pores of the LD nozzle. The cleaning time of the method of this invention is reduced by 30%; the main defect caused by dirt in the LD nozzle is development residue, and the development residue defect detection results after cleaning by the method of this invention show a 40% reduction in defects.

[0050] The present invention has been described in detail above through specific embodiments, but these are not intended to limit the invention. Many modifications and improvements can be made by those skilled in the art without departing from the principles of the invention, and these should also be considered within the scope of protection of the present invention.

Claims

1. A cleaning device for an LD nozzle of a coating and developing machine, characterized in that, include: Cleaning box; The cleaning box has a groove with a top opening. The groove has a shape that matches the working part of the LD nozzle and is used to fit and place the working part of the LD nozzle. During cleaning, cleaning fluid is introduced into the groove and the cleaning fluid immerses the working part of the LD nozzle placed in the groove. An ultrasonic module, disposed on the side of the groove, is used to provide ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle; A suction cup cover is located at the bottom of the cleaning box and is used to fix the cleaning box in place by suction during cleaning.

2. The LD nozzle cleaning device for a coating and developing machine as described in claim 1, characterized in that: The cleaning solution includes alcohol and IPA.

3. The LD nozzle cleaning device for a coating and developing machine as described in claim 1, characterized in that: The groove includes a top groove and a bottom groove; Along the width direction of the groove, the cross-sectional structure of the top groove is rectangular, the cross-sectional structure of the bottom groove is semi-circular, the width of the bottom edge of the top groove is greater than the width of the top edge of the bottom groove, and the center position of the bottom edge of the top groove is aligned with the center position of the top edge of the bottom groove. Along the length of the groove, the length of the top groove is greater than the length of the bottom groove.

4. The LD nozzle cleaning device for a coating and developing machine as described in claim 1, characterized in that: The suction cup cover is positioned at the center of the bottom surface of the cleaning box.

5. The LD nozzle cleaning device for a coating and developing machine as described in claim 1, characterized in that: The coating and developing machine includes a rotating washing tray; When cleaning the LD nozzle, the suction cup cover is fixed on the rotating washing plate.

6. A method for cleaning the nozzle of an LD coating and developing machine, characterized in that, Includes the following steps: A cleaning box is provided, the cleaning box having a groove with a top opening, the groove having a shape that matches the working part of the LD nozzle and is used to fit and place the working part of the LD nozzle; The working part of the LD nozzle is placed in the groove of the cleaning box and cleaning fluid is introduced into the groove to immerse the working part of the LD nozzle. Immersion of the working part of the LD nozzle prevents additional dirt from being generated on the working part of the LD nozzle. The cleaning box is fixed in place by suction cup cover located at the bottom of the cleaning box; An ultrasonic module disposed on the side of the groove provides ultrasonic waves to achieve ultrasonic cleaning of the working part of the LD nozzle, thereby cleaning the inside of the gap of the working step of the LD nozzle.

7. The method for cleaning the LD nozzle of a coating and developing machine as described in claim 6, characterized in that: The cleaning solution includes alcohol and IPA.

8. The method for cleaning the LD nozzle of a coating and developing machine as described in claim 6, characterized in that: The groove includes a top groove and a bottom groove; Along the width direction of the groove, the cross-sectional structure of the top groove is rectangular, the cross-sectional structure of the bottom groove is semi-circular, the width of the bottom edge of the top groove is greater than the width of the top edge of the bottom groove, and the center position of the bottom edge of the top groove is aligned with the center position of the top edge of the bottom groove. Along the length of the groove, the length of the top groove is greater than the length of the bottom groove.

9. The method for cleaning the LD nozzle of a coating and developing machine as described in claim 6, characterized in that: The suction cup cover is positioned at the center of the bottom surface of the cleaning box.

10. The method for cleaning the LD nozzle of a coating and developing machine as described in claim 6, characterized in that: The coating and developing machine includes a rotating washing tray; When cleaning the LD nozzle, the suction cup cover is fixed on the rotating washing plate.

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