Array processing mechanism, dry cleaning device, and display panel processing apparatus

Abstract

The application relates to an array processing mechanism, a dry cleaning device and a processing equipment of a display panel, wherein the array processing mechanism comprises a dry cleaning device, the dry cleaning device comprises a supporting assembly, a limiting assembly and a cleaning assembly, the supporting assembly has a supporting surface, the limiting assembly and the cleaning assembly are arranged on the supporting surface, the cleaning assembly comprises first and second cleaning components, the first and second cleaning components are arranged opposite to each other and are spaced apart in a direction perpendicular to the supporting surface, and the limiting assembly is used for supporting a component to be processed; the limiting assembly comprises a supporting component and a plurality of limiting components, the supporting component is arranged at least partially on the supporting surface and is used for supporting the component to be processed in the direction perpendicular to the supporting surface, and the at least partial limiting components are arranged opposite to each other in a first direction; an etching device; and a testing device. The array processing mechanism provided by the application can improve the yield of products.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to an array processing mechanism, a dry cleaning device, and a processing equipment for display panels. Background Technology

[0002] Existing display panel structures are relatively complex, typically consisting of multiple layers stacked sequentially. To improve film uniformity during the fabrication of some of these layers, physical vapor deposition (PVD) or chemical vapor deposition (CVD) methods are often used. These layers are then patterned using photolithography to obtain the desired film structure. Before etching, the substrate typically requires treatment using methods such as plasma cleaning to achieve at least one of the following: surface cleaning, surface activation, or surface modification. However, existing plasma cleaning methods often involve placing the component to be processed on a stage and cleaning its upper surface. This can easily result in particles remaining between the back side of the component and the stage, leading to unevenness and cooling, which in turn can cause localized display defects and abnormal electrostatic discharge, affecting product yield.

[0003] Therefore, there is an urgent need for an array processing mechanism that can improve product yield during plasma cleaning, as well as corresponding dry cleaning devices and display panel processing equipment. Summary of the Invention

[0004] This application provides an array processing mechanism, a dry cleaning device, and a display panel processing equipment. The array processing mechanism can improve product yield.

[0005] In a first aspect, an array processing mechanism is proposed according to an embodiment of this application, applied to the processing of a display panel. The array processing mechanism includes: a dry cleaning device, including a support component, a limiting component, and a cleaning component. The support component has a support surface, and the limiting component and the cleaning component are both disposed on the support surface. The cleaning component includes a first cleaning element and a second cleaning element, which are spaced apart from each other and arranged facing each other in a direction perpendicular to the support surface. The limiting component is used to support the part to be processed, so that the part to be processed is spaced apart from the support surface and at least partially located between the first cleaning element and the second cleaning element. The limiting component includes a support element and a plurality of limiting elements. The support element is at least partially disposed on the support surface and is used to support the part to be processed in a direction perpendicular to the support surface. At least some of the limiting elements are arranged opposite each other in a first direction, which is parallel to the support surface. An etching device is disposed downstream of the dry cleaning device. A testing device is disposed downstream of the etching device.

[0006] Secondly, according to embodiments of this application, a dry cleaning apparatus is proposed for processing display panels, comprising: a support assembly having a support surface; a limiting assembly disposed on the support surface, the limiting assembly including a support member and a plurality of limiting members, the support member being at least partially disposed on the support surface and used to support the part to be processed in a direction perpendicular to the support surface, and at least some of the limiting members being disposed opposite to each other in a first direction, the first direction being parallel to the support surface; and a cleaning assembly including a first cleaning member and a second cleaning member, the first cleaning member and the second cleaning member being spaced apart from each other and disposed facing each other in a direction perpendicular to the support surface; wherein, the limiting assembly is used to support the part to be processed, such that the part to be processed is spaced apart from the support surface and is at least partially located between the first cleaning member and the second cleaning member.

[0007] According to one aspect of the embodiments of this application, the cleaning assembly further includes a driving member, which extends at least partially along a second direction. The first direction, the second direction, and the direction perpendicular to the support surface are arranged to intersect each other. The driving member is connected to the first cleaning member and the second cleaning member and is used to drive the first cleaning member and the second cleaning member to move along the second direction.

[0008] According to one aspect of the embodiments of this application, the driving member includes a slide rail that slides and engages with each other and a plurality of sliders, the slide rail extending along a second direction, and the plurality of sliders being respectively connected to a first cleaning member and a second cleaning member; or, the driving member includes a meshing chain and a sprocket, the chain extending at least partially along the second direction, and the first cleaning member and the second cleaning member being respectively connected to the chain.

[0009] According to one aspect of the embodiments of this application, the first cleaning member and the second cleaning member are disposed opposite each other in a direction perpendicular to the support surface, and are capable of moving synchronously in a second direction.

[0010] According to one aspect of the embodiments of this application, at least one of the first cleaning member and the second cleaning member is provided with a relief hole that extends through in a second direction, and the support member extends in the second direction and passes through the relief hole.

[0011] According to one aspect of the embodiments of this application, the limiting component includes two limiting members, both of which extend along a second direction, and a driving member is disposed on opposite sides of the limiting members in a direction perpendicular to the support surface; or, the cleaning component further includes a support frame, which is disposed on the support surface, and the driving member is at least partially disposed on the support frame, and the limiting members are at least partially disposed on the support frame.

[0012] According to one aspect of the embodiments of this application, the support is a non-contact support, which includes an air flotation conveying structure or an electromagnetic levitation conveying structure.

[0013] According to one aspect of the embodiments of this application, the plurality of limiting members include one or more first limiting members and one or more second limiting members. The first limiting members and the second limiting members extend along a second direction and are disposed opposite to each other in a first direction. The first direction, the second direction and the direction perpendicular to the support surface are disposed in pairs. The first limiting members and the second limiting members are respectively provided with limiting grooves. The openings of the limiting grooves are located on the side surfaces of the first limiting members and the second limiting members facing each other, and are recessed in directions away from each other.

[0014] According to one aspect of the embodiments of this application, the limiting member includes a plurality of traction sub-members and a plurality of fixing sub-members, the fixing sub-members are disposed on the support surface, and / or the fixing sub-members are disposed on the support member, one end of the traction sub-member is connected to the fixing sub-member, and the other end can be detachably connected to the part to be processed.

[0015] Thirdly, according to embodiments of this application, a display panel processing apparatus is provided, including the array processing mechanism in any embodiment of the first aspect.

[0016] The array processing mechanism provided in this application includes a dry cleaning device, an etching device, and a testing device. The dry cleaning device further includes a support component, a limiting component, and a cleaning component. The limiting component supports the part to be processed and is spaced apart from the support surface of the support component to prevent particles on the back side from causing unevenness of the part to be processed. At the same time, the cleaning component includes two or more cleaning elements, which can clean the part to be processed from both the top and bottom sides simultaneously to clean the back side equally, further reducing the possibility of display defects / short circuits on the part to be processed and improving product yield. Attached Figure Description

[0017] The features, advantages, and technical effects of exemplary embodiments of this application will now be described with reference to the accompanying drawings.

[0018] Figure 1 This is a schematic diagram of the structure of a dry cleaning apparatus provided in one embodiment of this application;

[0019] Figure 2 This is a schematic diagram of the structure of a dry cleaning apparatus provided in another embodiment of this application;

[0020] Figure 3 This is a schematic diagram of the structure of a dry cleaning apparatus provided in another embodiment of this application;

[0021] Figure 4 yes Figure 1 An enlarged view of region P shown.

[0022] in:

[0023] 100-Dry cleaning device;

[0024] 10 - Support component; 20 - Limiting component; 30 - Cleaning component;

[0025] 11-Supporting surface; 21-Supporting component; 22-Limiting component; 31-First cleaning component; 32-Second cleaning component; 33-Driving component; 34-Supporting frame;

[0026] 221 - Limiting groove; 311 - Displacement hole;

[0027] X - First direction; Y - Second direction; Z - Height direction. Detailed Implementation

[0028] The features and exemplary embodiments of various aspects of this application will now be described in detail. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain this application and are not configured to limit this application. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples of this application.

[0029] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0030] It should be understood that when describing the structure of a component, when referring to a layer or region as being "above" or "on top of" another layer or region, it can mean that it is directly above the other layer or region, or that it contains other layers or regions between it and the other layer or region. Furthermore, if the component is flipped over, that layer or region will be located "below" or "under" the other layer or region.

[0031] The features and exemplary embodiments of various aspects of this application will now be described in detail. Furthermore, the features, structures, or characteristics described below may be combined in any suitable manner in one or more embodiments.

[0032] Existing display panels typically consist of multiple stacked functional film layers, each used to form corresponding components, such as thin-film transistors, wiring, capacitors, and organic light-emitting elements. The fabrication of these display panels involves repeated film deposition and patterning operations layer by layer. The patterning process often employs dry etching, and the substrate is usually cleaned before processing to remove surface impurities.

[0033] Plasma cleaning is a common method for cleaning substrates. Plasma cleaning utilizes the high activity of plasma to clean, activate, and modify the material surface, improving the quality of subsequent processes. For example, bombardment by high-energy particles in plasma can effectively remove organic matter (such as grease, photoresist residue), oxides, microparticles, and electrostatically adsorbed dust from the surface of components, resulting in excellent surface cleaning. Compared to traditional solvent cleaning, plasma cleaning requires no chemical reagents, reducing environmental damage and avoiding secondary pollution.

[0034] Existing dry cleaning equipment typically has a support platform with a width greater than that of the substrate to be processed, which is used to support the substrate during the cleaning process. The support platform and the substrate are usually fixed together by vacuum adsorption or other methods to ensure a stable connection while flattening the substrate.

[0035] Based on this, the applicant discovered that existing substrates require several additional steps before immersion in a dry cleaning apparatus. These steps generate byproduct particles and by-product particles depending on the process. Simultaneously, the environment inside the apparatus may contain dust and other impurities, some of which adhere to the surfaces of the substrate. During plasma cleaning, the aforementioned particles are also present between the substrate and the support stage, easily leading to unevenness and localized protrusions. This results in uneven cooling during substrate cooling, causing abnormal electrostatic discharge and localized display defects at the protrusions, thus reducing product yield.

[0036] To address the aforementioned issues, this application proposes an array processing mechanism, a dry cleaning device, and a display panel processing equipment. By lifting the substrate to be processed to a position spaced apart from the support surface and simultaneously cleaning the bottom surface of the substrate, bottom particles can be effectively removed, thereby improving product yield.

[0037] It is understood that the following embodiments of this application are only used as an example of applying the dry cleaning device to the processing of array substrates, but this application is not limited to this. The dry cleaning device can also be applied to other occasions where the substrate to be processed needs to be flattened and protected.

[0038] To better understand this application, the following will be combined with... Figures 1 to 4 The array processing mechanism, dry cleaning device, and display panel processing equipment provided in the embodiments of this application will be described in detail.

[0039] Please refer to the following: Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the structure of a dry cleaning apparatus provided in one embodiment of this application. Figure 2 This is a schematic diagram of the structure of a dry cleaning apparatus provided in another embodiment of this application.

[0040] In a first aspect, according to an embodiment of this application, a dry cleaning apparatus 100 is provided for processing a display panel, comprising: a support assembly 10 having a support surface 11; a limiting assembly 20 disposed on the support surface 11, the limiting assembly 20 including a support member 21 and a plurality of limiting members 22, the support member 21 being at least partially disposed on the support surface 11 and used to support the part to be processed in a direction perpendicular to the support surface 11, and at least some of the limiting members 22 being disposed opposite each other in a first direction X, the first direction X being parallel to the support surface 11; and a cleaning assembly 30 including a first cleaning member 31 and a second cleaning member 32, the first cleaning member 31 and the second cleaning member 32 being spaced apart from each other and disposed facing each other in a direction perpendicular to the support surface 11; wherein, the limiting assembly 20 is used to support the part to be processed, such that the part to be processed is spaced apart from the support surface 11 and is at least partially located between the first cleaning member 31 and the second cleaning member 32.

[0041] This application provides a dry cleaning apparatus 100 for processing display panels, which can be used for plasma cleaning before etching an array substrate or pixel substrate. The dry cleaning apparatus 100 may include a support assembly 10 for supporting other components, a limiting assembly 20 for defining the position of the component to be processed during the cleaning process, and a cleaning assembly 30 for performing the cleaning.

[0042] Specifically, the support component 10 can be a support frame, support platform, or support plate, etc., and is provided with a support surface 11. The support surface 11 can be extended along a plane to facilitate processing and to facilitate the installation of other structural components on the support surface 11. The support surface 11 can be the top surface of the support component 10 to avoid interference between other structural components and the support component 10.

[0043] The limiting component 20 is disposed on the support surface 11. The limiting component 20 includes a support member 21 and multiple limiting members 22. The support member 21 is used to apply a force to the part to be processed in a direction perpendicular to the support surface 11. The limiting members 22 are used to limit the setting position of the part to be processed in a direction parallel to the support surface 11. By combining the support member 21 and the limiting members 22, the position of the part to be processed can be made stable and controllable while suspending it and setting it at intervals from the support surface 11, thereby further improving the product yield.

[0044] Optionally, the support member 21 in the limiting assembly 20 may be at least partially connected to the support surface 11. It may be positioned above the part to be processed and provide an adsorption force, and / or it may be positioned below the part to be processed and provide a thrust. By controlling the change in the magnitude of the supporting force of the support member 21, the suspension height of the part to be processed can be adjusted accordingly, and it can be kept at a distance from the support surface 11 in a direction perpendicular to the support surface 11.

[0045] The cleaning assembly 30 may be at least partially disposed on the support surface 11. The cleaning assembly 30 may further include an ion generator, a pipeline for transmitting the gas to be excited, and a cleaning head for ejecting plasma. All of the aforementioned structures may be disposed in the dry cleaning device 100, or the aforementioned structures may be formed by connecting with external components.

[0046] The cleaning assembly 30 further includes a first cleaning component 31 and a second cleaning component 32. Each cleaning component may include multiple cleaning heads. If the direction perpendicular to the support surface 11 is denoted as the height direction Z, then the first cleaning component 31 and the second cleaning component 32 are spaced apart from each other and arranged facing each other in the height direction Z. It can be understood that "arranged facing each other" here means that the openings of each cleaning head in the first cleaning component 31 face the second cleaning component 32, while the openings of each cleaning head in the second cleaning component 32 face the first cleaning component 31. Therefore, the two opposing cleaning components can simultaneously clean the workpiece disposed between them from opposite sides.

[0047] Furthermore, the limiting component 20 is used to limit the position of the part to be processed. During the use of the dry cleaning device 100, the limiting component 20 can be used to maintain a certain distance between the support of the part to be processed and the support surface 11, so that the part to be processed is at least partially suspended. At this time, the first cleaning component 31 and the second cleaning component 32 can be located on the upper and lower sides of the part to be processed, respectively, so as to clean the two opposite surfaces of the part to be processed in the aforementioned height direction Z.

[0048] By setting the limiting component 20 and spacing the part to be processed from the support surface 11, the problem of local bulging of the part to be processed caused by particles trapped between the two when the part to be processed is laid flat on the support surface 11 can be avoided, thus keeping the part to be processed in a preset position. At the same time, by setting cleaning components on both sides of the part to be processed, both surfaces can be cleaned simultaneously, further reducing the possibility of particles interfering with subsequent processes.

[0049] In some optional embodiments, the cleaning assembly 30 further includes a drive member 33, which extends at least partially along the second direction Y. The first direction X, the second direction Y, and the direction perpendicular to the support surface 11 are arranged to intersect each other. The drive member 33 is connected to the first cleaning member 31 and the second cleaning member 32 and is used to drive the first cleaning member 31 and the second cleaning member 32 to move along the second direction Y.

[0050] The cleaning assembly 30 in this embodiment may further include a driving member 33, which is used to connect and cooperate with the first cleaning member 31 and the second cleaning member 32 and drive the two cleaning members to move along the second direction Y, so as to gradually clean each position of the part to be processed. The first direction X, the second direction Y and the aforementioned height direction Z perpendicular to the support surface 11 are arranged to intersect each other, and may further be arranged to be perpendicular to each other.

[0051] Specifically, the drive member 33 may have a track or transmission structure extending along the second direction Y to define the movement trajectory of the first cleaning member 31 and the second cleaning member 32. The drive member 33 may include a power source, which may be an automatically controllable structure such as an electric motor, or a manually controllable structure such as a crank and a rotating wheel.

[0052] In the cleaning assembly 30, the first cleaning component 31 and the second cleaning component 32 can be connected to two driving components 33 respectively to control the movement of the two cleaning components independently; or, the first cleaning component 31 and the second cleaning component 32 can share the same driving component 33, for example, they can be connected to the same power source through different transmission structures to reduce costs and facilitate the synchronization of the movement of the first cleaning component 31 and the second cleaning component 32.

[0053] By incorporating a drive unit 33 into the cleaning assembly 30, cleaning can be performed on each part of the workpiece while maintaining its position, thereby improving the stability of the workpiece support and reducing the possibility of collision damage.

[0054] In some alternative embodiments, the drive member 33 includes a slide rail that slides together with each other and a plurality of sliders, the slide rail extending along the second direction Y, and the plurality of sliders being connected to the first cleaning member 31 and the second cleaning member 32 respectively; or, the drive member 33 includes a meshing chain and a sprocket, the chain extending at least partially along the second direction Y, and the first cleaning member 31 and the second cleaning member 32 being connected to the chain respectively.

[0055] In embodiments where the cleaning assembly 30 includes a drive member 33, the drive member 33 can take various different structural forms. For example, the drive member 33 may include a slide rail and a slider, or the drive member 33 may include a chain and a sprocket, etc., transmission combinations.

[0056] Specifically, the driving component 33 may include a slide rail and a slider that slide against each other. The slide rail extends along the second direction Y and is used to define the movement trajectory of the first cleaning component 31 and the second cleaning component 32. The slider slides against the slide rail and is connected to the first cleaning component 31 and the second cleaning component 32, so that the two cleaning components can move along the slide rail. Optionally, each cleaning component may be provided with two parallel slide rails. These two slide rails are spaced apart along the first direction X and are respectively connected to the two ends of the same cleaning component through sliders to make the movement of the cleaning component smooth.

[0057] Alternatively, the drive unit 33 may include a chain and sprockets that mesh with each other, with the chain moving due to the rotation of the sprockets. The chain may extend at least partially along the second direction Y, with a sprocket at each end of the chain along the second direction Y. Simultaneously, the chain may be provided with an adapter for connecting the cleaning component to the chain, optionally allowing the adapter to be detachably connected to at least one of the chain and the cleaning component, facilitating the installation of the cleaning component. The power source in the drive unit 33 may be a device capable of outputting torque, such as an electric motor, and connected to the sprocket drive. For example, the movement distance and speed of the first cleaning component 31 and the second cleaning component 32 can be precisely controlled through the cooperation of the stepper motor, sprockets, and chain.

[0058] Setting the drive component 33 to either of the aforementioned structural forms makes it easy to install, reduces costs, and ensures smooth movement of the cleaning component.

[0059] In some alternative embodiments, the first cleaning member 31 and the second cleaning member 32 are arranged opposite each other along a direction perpendicular to the support surface 11 and can move synchronously in the second direction Y.

[0060] Optionally, in the embodiments of this application, the first cleaning member 31 and the second cleaning member 32, which are used to clean the opposite sides of the part to be processed, can be arranged facing each other in the height direction Z, and remain facing each other in the height direction Z during the process of moving along the second direction Y and cleaning different positions of the part to be processed.

[0061] Specifically, in the embodiments of this application, the limiting component 20 is used to support the part to be processed and limit its position. In order to reduce the possibility of secondary contamination of the part to be processed after cleaning, the limiting component 20 can adopt a non-contact support / drive structure, that is, during the cleaning process, the part to be processed can be at least partially suspended.

[0062] Based on this, by setting the first cleaning component 31 and the second cleaning component 32 to be in a facing position, the force on the part to be processed can be concentrated and uniform, making it easy to adjust the supporting force on the part to be processed according to the cleaning position. At the same time, it can effectively reduce the possibility of collision damage caused by the part to be processed tilting or flipping during cleaning.

[0063] Optionally, in an embodiment where a drive member 33 is provided, the first cleaning member 31 and the second cleaning member 32 can be moved synchronously by synchronous control of the drive member 33, or the aforementioned synchronization effect can be achieved by adjusting the transmission structure.

[0064] In some optional embodiments, at least one of the first cleaning member 31 and the second cleaning member 32 is provided with a relief hole 311 that extends through along the second direction Y, and the support member 21 extends along the second direction Y and passes through the relief hole 311.

[0065] The dry cleaning apparatus 100 in this embodiment includes a cleaning assembly 30 and a limiting assembly 20. The supporting member 21 in the limiting assembly 20 supports the part to be processed in the height direction Z. Therefore, the supporting member 21 can extend along the second direction Y and has an extension dimension larger than that of the part to be processed in this direction, ensuring stable and reliable support. Simultaneously, to facilitate cleaning of various positions of the part to be processed by the cleaning assembly 30, both the first cleaning member 31 and the second cleaning member 32 can move along the second direction Y, and their movement trajectories at least partially overlap with the extension trajectory of the supporting member 21.

[0066] Therefore, at least one of the first cleaning member 31 and the second cleaning member 32 may be provided with a relief hole 311 extending along the second direction Y, the relief hole 311 being for the support member 21 to pass through. The shape of the relief hole 311 may be the same as the shape of the support member 21, and the cross-sectional area of ​​the relief hole 311 may be slightly larger than the cross-sectional area of ​​the support member 21, so that the cleaning member provided with the relief hole 311 can slide along the extending direction of the support member 21.

[0067] Optionally, the limiting component 20 may include multiple support members 21. To stabilize the position of the part to be processed, the support members 21 may be simultaneously disposed on opposite sides of the part to be processed in the height direction Z, and multiple support members 21 may be disposed on each side. The multiple support members 21 located on the same side of the part to be processed may all extend along the second direction Y and be arranged at intervals with each other in the first direction X. Correspondingly, the cleaning component on this side may be provided with multiple clearance holes 311, and these clearance holes 311 may be provided one-to-one with the support members 21.

[0068] By providing clearance holes 311 in the first cleaning member 31 and the second cleaning member 32 and allowing the support member 21 to pass through them, the space required for installing the dry cleaning device 100 can be reduced, while the stability of the cleaning members during movement can be further improved.

[0069] Please refer to the following: Figure 3 and Figure 4 , Figure 3 This is a schematic diagram of the structure of a dry cleaning apparatus provided in another embodiment of this application. Figure 4 yes Figure 1 An enlarged view of region P shown.

[0070] In some optional embodiments, the limiting component 20 includes two limiting members 22, both of which extend along the second direction Y, and the driving member 33 is disposed on opposite sides of the limiting members 22 in a direction perpendicular to the support surface 11; or, the cleaning component 30 further includes a support frame 34, which is disposed on the support surface 11, and the driving member 33 is at least partially disposed on the support frame 34, and the limiting members 22 are at least partially disposed on the support frame 34.

[0071] The limiting component 20 in this embodiment may include two limiting members 22, both of which extend along the second direction Y and are disposed opposite to each other in the first direction X, and the extension dimensions of the two limiting members 22 in the second direction Y may be the same. In this embodiment, the limiting member 22 extends continuously along the second direction Y, and its extension dimension may be greater than the extension dimension of the part to be processed, so as to ensure the positional stability of the part to be processed.

[0072] Based on this, the driving component 33 in the cleaning assembly 30 can be at least partially disposed on the limiting member 22, and the limiting member 22 can provide support for the first cleaning component 31 and the second cleaning component 32. For example, the limiting member 22 can be provided with two slide rails on its two opposite sides along the height direction Z. These two slide rails can be connected to the first cleaning component 31 and the second cleaning component 32 respectively through sliders. The slide rails can extend in the same direction as the limiting member 22 and have the same or slightly smaller extension dimensions.

[0073] By setting the drive component 33 on the limiting component 22, the limiting component 22 can be reused as a structure for carrying the cleaning component, reducing the space occupied by the interference cleaning device and reducing costs.

[0074] Alternatively, the cleaning assembly 30 may also include a support frame 34, which may be detachably connected to the support surface 11. The support frame 34 may simultaneously support the drive member 33 and the limiting member 22. For example, the support frame 34 may have a certain extension dimension in the second direction Y, and the slide rail in the drive member 33 may be mounted on the support frame 34 and spaced apart from the limiting member 22.

[0075] By adding a support frame 34 to the cleaning assembly 30, the positional stability of the drive component 33 and the limiting component 22 can be further improved.

[0076] In some alternative embodiments, the support 21 is a non-contact support 21, which includes an air flotation conveying structure or an electromagnetic levitation conveying structure.

[0077] To protect the cleanliness of the surface of the workpiece and avoid secondary contamination, the support 21 can be a non-contact support structure that supports the workpiece without making additional contact with it. Alternatively, it can be configured to drive the workpiece to move without contact.

[0078] Specifically, the non-contact support 21 can support the workpiece using either air-float drive or electromagnetic levitation drive. Air-float drive refers to forming an air film at the bottom of the workpiece using compressed air, which supports and suspends the workpiece on the support surface 11 with a certain gap between them. The airflow propels the workpiece. The advantage of air-float drive is the absence of physical contact, effectively reducing frictional damage, and its suitability for continuous cleaning of large-area, thin workpieces.

[0079] Electromagnetic levitation drive refers to controlling the movement trajectory of a workpiece through an electromagnetic field, using electromagnetic force to propel or position the workpiece. It is understood that in embodiments where the workpiece is a conductive substrate such as an electrode substrate, eddy currents can be induced within the substrate by changes in the magnetic field. These eddy currents then interact with an external magnetic field to generate a Lorentz force, propelling the substrate. In embodiments where the workpiece is not conductive, conductive magnetic materials (such as plating or embedded magnetic particles) can be pre-placed within the workpiece, or it can be manipulated by changes in the external magnetic field gradient.

[0080] By setting the support member 21 as a non-contact support structure, it is possible to avoid the parts to be processed from coming into contact with other parts during the process of moving to the support assembly 10 or during the cleaning process, thereby reducing the possibility of secondary contamination or collision damage.

[0081] In some optional embodiments, the plurality of limiting members 22 include one or more first limiting members 22 and one or more second limiting members 22. The first limiting members 22 and the second limiting members 22 extend along the second direction Y and are disposed opposite to each other in the first direction X. The first direction X, the second direction Y and the direction perpendicular to the support surface 11 are intersected in pairs. The first limiting members 22 and the second limiting members 22 are respectively provided with limiting grooves 221. The openings of the limiting grooves 221 are located on the side surfaces of the first limiting members 22 and the second limiting members 22 facing each other, and are recessed in the direction away from each other.

[0082] The limiting component 20 in this embodiment may include multiple limiting members 22. These limiting members 22 may be divided into first limiting members 22 and second limiting members 22, which are respectively used to be disposed on opposite sides of the part to be processed, and the position of the part to be processed is defined by the two sides. The first limiting member 22 and the second limiting member 22 are disposed opposite to each other in the first direction X and extend along the second direction Y. In embodiments where multiple first limiting members 22 or multiple second limiting members 22 are disposed simultaneously, the multiple first limiting members 22 may be arranged sequentially along the second direction Y and disposed facing each other, and the multiple second limiting members 22 may be arranged sequentially along the second direction Y and disposed facing each other, so as to form a regular and flush limiting surface on the side facing the part to be processed.

[0083] Both the first limiting member 22 and the second limiting member 22 may be provided with a limiting groove 221 for cooperating with the part to be processed. The opening of the limiting groove 221 is located on the side of the first limiting member 22 and the second limiting member 22 facing each other in the first direction X, that is, the side facing the part to be processed. The limiting groove 221 is recessed along the first direction X, and its extension dimension in the second direction Y may be the same as the extension dimension of the first limiting member 22 / second limiting member 22 in that direction, that is, it is through-type in that direction to facilitate the movement of the part to be processed.

[0084] Optionally, the cross-sectional shape formed by the limiting groove 221 in the section perpendicular to the second direction Y can be rectangular or trapezoidal, etc. Meanwhile, the cross-sectional shapes formed by the first limiting member 22 and the second limiting member 22 in this section can be two "U" shapes with opposite openings, so that the limiting member 22 is easy to process.

[0085] Furthermore, the dimensions of the limiting groove 221 can be limited according to the dimensions of the part to be processed, such that the extension dimension of the limiting groove 221 in the direction perpendicular to the support surface 11 is greater than the dimension of the part to be processed in that direction, and the minimum distance between the bottom wall of the limiting groove 221 of the first limiting member 22 and the bottom wall of the limiting groove 221 of the second limiting member 22 in the first direction X is greater than the maximum dimension of the part to be processed in the first direction X. This provides sufficient space for the movement of the part to be processed in the limiting groove 221, reducing the possibility of scratch damage to the part to be processed.

[0086] By setting the limiting groove 221, the position of the part to be processed can be conveniently limited in the first direction X, and the position of the part to be processed in the height direction Z perpendicular to the support surface 11 can be further limited.

[0087] In some optional embodiments, the limiting member 22 includes multiple traction sub-members and multiple fixing sub-members, the fixing sub-members are disposed on the support surface 11, and / or the fixing sub-members are disposed on the support member 21, one end of the traction sub-member is connected to the fixing sub-member, and the other end can be detachably connected to the part to be processed.

[0088] Unlike the aforementioned setting of the limiting groove 221, the limiting member 22 can also adopt a structure in which a traction sub-component and a fixing sub-component cooperate, wherein the traction sub-component is used to pull the part to be processed and stabilize it within a certain area, and the fixing sub-component is used to provide a fixing point for the traction sub-component.

[0089] Specifically, the fixing component can be connected to the support member 21 or directly mounted on the support surface 11. The fixing component can be a pulley, a fixing ring, a fixing rod, a fixing base, or other structural forms, allowing one end of the traction component to be connected to the fixing component. The other end of the traction component can be connected to the part to be processed, using methods such as clamping, snap-fit, or vacuum suction cup connection. The traction component can be a chain, rope, or traction rod, with a connector at the end furthest from the fixing component for connecting to the part to be processed.

[0090] In an embodiment where the limiting member 22 includes a traction sub-member and a fixing sub-member, multiple limiting members 22 can be respectively set at different positions of the part to be processed, and the position of the part to be processed can be adjusted accordingly by adjusting the specific setting position of the fixing sub-member and the length of each traction sub-member.

[0091] By setting the limiting member 22 to include a traction sub-component and a fixing sub-component, the ease of moving the workpiece before and after processing can be improved, while the volume and weight required to set the limiting member 22 can be reduced.

[0092] Secondly, according to an embodiment of this application, an array processing mechanism is proposed for processing display panels. The array processing mechanism includes a dry cleaning device 100, comprising a support component 10, a limiting component 20, and a cleaning component 30. The support component 10 has a support surface 11. The limiting component 20 and the cleaning component 30 are both disposed on the support surface 11. The cleaning component 30 includes a first cleaning element 31 and a second cleaning element 32, which are spaced apart from each other and arranged facing each other in a direction perpendicular to the support surface 11. The limiting component 20 is used for... The component to be processed is supported such that it is spaced apart from the support surface 11 and at least partially located between the first cleaning component 31 and the second cleaning component 32; wherein, the limiting component 20 includes a support component 21 and a plurality of limiting components 22, the support component 21 is at least partially disposed on the support surface 11 and is used to support the component to be processed in a direction perpendicular to the support surface 11, and at least some of the limiting components 22 are disposed opposite each other in a first direction X, the first direction X being parallel to the support surface 11; an etching device is disposed downstream of the dry cleaning device 100; a testing device is disposed downstream of the etching device.

[0093] This application also provides an array processing mechanism, including the dry cleaning apparatus 100 as described in any of the embodiments of the first aspect. In addition to the dry cleaning apparatus 100, the array processing mechanism may also include an etching apparatus and a testing apparatus, among other related processing devices. The etching apparatus is located downstream of the dry cleaning apparatus 100 and is used to etch the substrate to be processed after plasma cleaning to achieve film patterning. The testing apparatus is located downstream of the etching apparatus and is used to inspect the resulting film structure after etching to determine whether it can be used normally.

[0094] It is understood that the array processing mechanism may also include other devices, not shown, for processing the array substrate, and may be arranged upstream and downstream of the dry cleaning device 100 according to the sequence of their process steps. This application does not make any specific limitations in this regard.

[0095] Thirdly, according to embodiments of this application, a display panel processing apparatus is provided, including the array processing mechanism in any embodiment of the second aspect.

[0096] This application further proposes a processing apparatus for manufacturing display panels, including the array processing mechanism in any of the embodiments of the second aspect, that is, including the dry cleaning apparatus 100 in any of the embodiments of the first aspect. The processing apparatus for display panels may also include other related mechanisms such as chip processing mechanism, bonding mechanism, and aging test mechanism, and this application does not make specific limitations in this regard.

[0097] The array processing mechanism and display panel processing equipment provided in this application embodiment have all the beneficial effects of the dry cleaning device 100 provided in the first aspect above. For details, please refer to the specific description of the dry cleaning device 100 in the above embodiments. This embodiment will not repeat the description here.

[0098] It is understood that the above description and details are merely exemplary and explanatory, and do not constitute a limitation on this application. Those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Thus, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.

Claims

1. An array processing mechanism, applied to the processing of display panels, characterized in that, include: A dry cleaning device includes a support assembly, a limiting assembly, and a cleaning assembly. The support assembly has a support surface, and both the limiting assembly and the cleaning assembly are disposed on the support surface. The cleaning assembly includes a first cleaning component and a second cleaning component, which are spaced apart from each other and arranged facing each other in a direction perpendicular to the support surface. The limiting assembly is used to support the part to be processed, so that the part to be processed is spaced apart from the support surface and at least partially located between the first cleaning component and the second cleaning component. The limiting component includes a support member and a plurality of limiting members. The support member is at least partially disposed on the support surface and is used to support the part to be processed in a direction perpendicular to the support surface. At least some of the limiting members are disposed opposite each other in a first direction, which is parallel to the support surface. An etching apparatus is located downstream of the dry cleaning apparatus; The testing device is located downstream of the etching device.

2. A dry cleaning device, used in the processing of display panels, characterized in that, include: Support components, having a support surface; A limiting component is disposed on the support surface. The limiting component includes a support member and a plurality of limiting members. The support member is at least partially disposed on the support surface and is used to support the part to be processed in a direction perpendicular to the support surface. At least some of the limiting members are disposed opposite each other in a first direction, which is parallel to the support surface. The cleaning assembly includes a first cleaning component and a second cleaning component, wherein the first cleaning component and the second cleaning component are spaced apart from each other and arranged facing each other in a direction perpendicular to the support surface; The limiting component is used to support the part to be processed, so that the part to be processed is spaced apart from the supporting surface and is at least partially located between the first cleaning component and the second cleaning component.

3. The dry cleaning device according to claim 2, characterized in that, The cleaning assembly further includes a driving member, which extends at least partially along a second direction. The first direction, the second direction, and the direction perpendicular to the support surface are arranged to intersect each other. The driving member is connected to the first cleaning member and the second cleaning member and is used to drive the first cleaning member and the second cleaning member to move along the second direction. Preferably, the driving component includes a slide rail that slides and engages with each other and a plurality of sliders, the slide rail extending along the second direction, and the plurality of sliders being respectively connected to the first cleaning component and the second cleaning component; Alternatively, the drive component includes a meshing chain and a sprocket, the chain extending at least partially along the second direction, and the first cleaning component and the second cleaning component being respectively connected to the chain.

4. The dry cleaning apparatus according to claim 3, characterized in that, Along a direction perpendicular to the support surface, the first cleaning component and the second cleaning component are positioned opposite each other and can move synchronously in the second direction.

5. The dry cleaning apparatus according to claim 3, characterized in that, At least one of the first cleaning member and the second cleaning member is provided with a clearance hole that extends through along the second direction, and the support member extends along the second direction and passes through the clearance hole.

6. The dry cleaning apparatus according to claim 5, characterized in that, The limiting component includes two limiting members, both of which extend along the second direction, and the driving member is disposed on opposite sides of the limiting members in a direction perpendicular to the support surface; Alternatively, the cleaning assembly may further include a support frame disposed on the support surface, the drive member being at least partially disposed on the support frame, and the limiting member being at least partially disposed on the support frame.

7. The dry cleaning apparatus according to claim 2, characterized in that, The support component is a non-contact support component, which includes an air flotation conveying structure or an electromagnetic levitation conveying structure.

8. The dry cleaning apparatus according to claim 7, characterized in that, The plurality of limiting members include one or more first limiting members and one or more second limiting members, wherein the first limiting members and the second limiting members extend along the second direction and are disposed opposite to each other in the first direction, and the first direction, the second direction and the direction perpendicular to the support surface are disposed in pairs; The first limiting member and the second limiting member are respectively provided with limiting grooves. The openings of the limiting grooves are located on the side surfaces of the first limiting member and the second limiting member facing each other, and are recessed in a direction away from each other.

9. The dry cleaning apparatus according to claim 7, characterized in that, The limiting component includes multiple traction sub-components and multiple fixing sub-components. The fixing sub-components are disposed on the support surface and / or on the support member. One end of the traction sub-component is connected to the fixing sub-component, and the other end can be detachably connected to the part to be processed.

10. A processing device for a display panel, characterized in that, Includes the array processing mechanism as described in claim 1.

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