Mask plate cleaning apparatus and self-cleaning method thereof

Abstract

The application provides a mask plate cleaning device and a self-cleaning method thereof. The mask plate cleaning device comprises a drying chamber, a bearing table and a cleaning assembly. The bearing table is provided with at least one accommodating groove. The cleaning assembly is arranged in the drying chamber and is configured to clean at least the side walls enclosing the accommodating groove. The side walls enclosing the accommodating groove comprise two first side walls and two second side walls. The cleaning assembly at least comprises a first cleaning member and a second cleaning member which are movably connected. The first cleaning member is movable to clean at least the two first side walls. The second cleaning member is movable to clean at least the two second side walls. According to the application, the first cleaning member and the second cleaning member are used to clean the accommodating groove, thereby avoiding the attachment of impurity particles and improving the cleanliness of the chamber.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, specifically to a photomask cleaning device and its self-cleaning method. Background Technology

[0002] Cleaning is an essential step in the mask production process. During cleaning, the mask is fed into a mask cleaning machine, where it is cleaned, dried, and then removed. However, during the cleaning process, it was found that impurities easily adhere to the sidewalls or bottom walls of the receiving tank in the drying chamber, requiring periodic shutdowns for cleaning. However, because the chamber is open during cleaning, external impurities can easily enter, reducing the chamber's cleanliness and causing secondary contamination of the mask. Summary of the Invention

[0003] This application provides a mask cleaning device and its self-cleaning method to avoid the adhesion of impurity particles and improve the cleanliness of the chamber.

[0004] In a first aspect, a mask cleaning device is provided, comprising: a drying chamber configured to accommodate and dry a mask; a support platform disposed in the drying chamber, the support platform having at least one receiving groove configured to accommodate the mask, wherein when the mask is placed in the receiving groove, there is a gap between the sidewall of the mask and the sidewall surrounding the receiving groove; and a cleaning assembly disposed in the drying chamber, the cleaning assembly being configured to clean at least the sidewall surrounding the receiving groove; wherein the sidewall surrounding the receiving groove includes two first sidewalls opposite each other along a first direction and two second sidewalls opposite each other along a second direction, the first and second directions intersecting, and the cleaning assembly including at least a first cleaning member and a second cleaning member movably connected, the first cleaning member being operable to clean at least two first sidewalls, and the second cleaning member being operable to clean at least two second sidewalls.

[0005] In conjunction with the first aspect, in some implementations of the first aspect, the cleaning component further includes: a first support frame disposed on one side of the support platform in a first direction; a first rotating component connected to the first support frame; a first telescopic component, one end of which is connected to the first rotating component, and the first rotating component is capable of driving the first telescopic component to rotate; a second rotating component connected to the other end of the first telescopic component, and a first cleaning component connected to the second rotating component, and the second rotating component is capable of driving the first cleaning component to rotate; wherein the first cleaning component has at least one first cleaning surface, and when the first rotating component drives the first telescopic component to rotate so that the first cleaning component is located on one side of one of the first sidewalls, the second rotating component is capable of driving the first cleaning component to rotate so that one of the first cleaning surfaces of the first cleaning component is opposite to the first sidewall.

[0006] In conjunction with the first aspect, in some implementations of the first aspect, the first cleaning component has a first cleaning surface and a second cleaning surface disposed opposite to each other in a first direction, the extension directions of the first cleaning surface and the extension directions of the second cleaning surface intersect and have a first preset angle, the first preset angle being between 30° and 65°, and the first cleaning surface and the second cleaning surface are respectively provided with a first dust-free cleaning strip.

[0007] In conjunction with the first aspect, in some implementations of the first aspect, the first cleaning component further includes a first auxiliary cleaning surface adjacent to the first cleaning surface and a second auxiliary cleaning surface adjacent to the second cleaning surface. The first auxiliary cleaning surface and the second auxiliary cleaning surface are connected, the first cleaning surface and the first auxiliary cleaning surface are perpendicular to each other, the second cleaning surface and the second auxiliary cleaning surface are perpendicular to each other, and the first auxiliary cleaning surface and the second auxiliary cleaning surface are respectively provided with a first sub-dust-free cleaning strip. The first sub-dust-free cleaning strip is configured to clean the bottom wall of the receiving groove at the location connected to the first side wall.

[0008] In conjunction with the first aspect, in some implementations of the first aspect, at least a first cleaning surface, a second cleaning surface, a first auxiliary cleaning surface, and a second auxiliary cleaning surface enclose a first chamber on the first cleaning component. The first cleaning surface and the second cleaning surface are respectively provided with a first through hole connecting the first chamber and the first dust-free cleaning strip. The first auxiliary cleaning surface and the second auxiliary cleaning surface are respectively provided with a second through hole connecting the first chamber and the first sub-dust-free cleaning strip. The first chamber also has a first opening extending in a second direction on the side facing away from the support platform in the vertical direction. The mask template cleaning device further includes: a first liquid inlet pipe, movably connected to the first... A support frame, a first liquid inlet pipe that can move relative to the first support frame in a second direction, the first liquid inlet pipe having an inlet and an outlet, the inlet being configured to communicate with an external liquid inlet mechanism; multiple first branches, each communicating with an outlet; multiple first nozzles, each connected to each first branch, when the first cleaning component is located below the first nozzle, a first telescopic assembly can drive the first cleaning component to rise in a vertical direction, so that at least multiple first nozzles extend into the first chamber from the first opening, each first nozzle facing a through hole of a cleaning surface, the first nozzle being configured to spray cleaning liquid onto the opposite cleaning strip.

[0009] In conjunction with the first aspect, some implementations of the first aspect further include: a first movable component connected to the first support frame, a first liquid inlet pipe connected to the first movable component, wherein when the first telescopic component drives at least the first nozzle to extend into the first chamber, the first movable component can drive the first nozzle to move in the second direction so that cleaning liquid can be sprayed at each position of the corresponding cleaning strip.

[0010] In conjunction with the first aspect, in some implementations of the first aspect, the cleaning component further includes: a second support frame disposed on one side of the support platform in a second direction; a third rotating component connected to the second support frame; a second telescopic component, one end of which is connected to the third rotating component, and the third rotating component is capable of driving the second telescopic component to rotate; a fourth rotating component connected to the other end of the second telescopic component, and the second cleaning component is connected to the fourth rotating component, and the fourth rotating component is capable of driving the second cleaning component to rotate; wherein the second cleaning component has at least one second cleaning surface, and in a state where the second rotating component drives the second telescopic component to rotate so that the second cleaning component is located on one side of one of the second sidewalls, the fourth rotating component is capable of driving the second cleaning component to rotate so that one of the second cleaning surfaces of the second cleaning component is opposite to the second sidewall.

[0011] In conjunction with the first aspect, in some implementations of the first aspect, the second cleaning component has a third cleaning surface and a fourth cleaning surface disposed opposite to each other in a second direction. The extension directions of the third cleaning surface and the fourth cleaning surface intersect and have a second preset angle, the second preset angle being between 30° and 65°. The third cleaning surface and the fourth cleaning surface are each provided with a second dust-free cleaning strip. The second cleaning component also includes a third auxiliary cleaning surface adjacent to the third cleaning surface and a fourth auxiliary cleaning surface adjacent to the fourth cleaning surface. The third auxiliary cleaning surface and the fourth auxiliary cleaning surface are connected and perpendicular to each other. The fourth cleaning surface and the fourth auxiliary cleaning surface are also perpendicular to each other. The third auxiliary cleaning surface and the fourth auxiliary cleaning surface are each provided with a second sub-dust-free cleaning strip. The second sub-dust-free cleaning strip is configured to clean the bottom wall of the receiving groove at the location connected to the first side wall.

[0012] In conjunction with the first aspect, some implementations of the first aspect further include: a cleaning chamber disposed on one side of the drying chamber, the cleaning chamber being configured to accommodate the mask template and clean the mask template; and a cleaning table disposed in the cleaning chamber, the cleaning table having at least one cleaning tank configured to contain cleaning fluid for cleaning the mask template.

[0013] Secondly, a self-cleaning method for a mask cleaning device is provided, applied to the mask cleaning device described above. The cleaning assembly further includes a first rotating assembly, a first telescopic assembly, a second rotating assembly, a third rotating assembly, a second telescopic assembly, and a fourth rotating assembly. The self-cleaning method includes: depressurizing a drying chamber without a mask; activating a first cleaning component to clean at least two first sidewalls surrounding the receiving groove, wherein the first rotating assembly rotates to drive the first telescopic assembly to rotate and extend, and the second rotating assembly drives the first cleaning component to rotate, with the first cleaning component contacting and cleaning one of the first sidewalls; activating a second cleaning component to clean at least two second sidewalls surrounding the receiving groove, wherein the third rotating assembly rotates to drive the second telescopic assembly to rotate and extend, and the fourth rotating assembly drives the second cleaning component to rotate, with the second cleaning component contacting and cleaning one of the second sidewalls.

[0014] This application provides a mask template cleaning device and its self-cleaning method. The mask template cleaning device includes: a drying chamber configured to accommodate and dry a mask template; a support platform disposed in the drying chamber, the support platform having at least one receiving groove configured to accommodate the mask template, and when the mask template is placed in the receiving groove, there is a gap between the side wall of the mask template and the side wall surrounding the receiving groove; and a cleaning component disposed in the drying chamber, the cleaning component being configured to clean at least the side wall surrounding the receiving groove; wherein the side wall surrounding the receiving groove includes two first side walls opposite each other along a first direction and two second side walls opposite each other along a second direction, the first and second directions intersecting, and the cleaning component including at least a first cleaning member and a second cleaning member movably connected, the first cleaning member being operable to clean at least two first side walls, and the second cleaning member being operable to clean at least two second side walls.

[0015] This application embodiment uses a first and a second cleaning component that are automatically controlled to operate within the drying chamber. This allows for the automatic cleaning of at least the first and second sidewalls of the receiving groove, preventing impurity particles from adhering to the receiving groove. This achieves self-cleaning of impurity particles on the receiving groove without opening the drying chamber, improving the cleanliness of the drying chamber and preventing secondary contamination of the mask template. Attached Figure Description

[0016] The accompanying drawings, which are included to provide a further understanding of this application and constitute a part of this application, illustrate exemplary embodiments of the application and are used to explain the application, but do not constitute an undue limitation of the application. In the drawings:

[0017] Figure 1 This is a schematic diagram of a mask cleaning device in one embodiment of this application.

[0018] Figure 2 This is a schematic diagram of the drying chamber of a mask cleaning device in one embodiment of this application.

[0019] Figure 3 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application.

[0020] Figure 4 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application.

[0021] Figure 5 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application.

[0022] Figure 6 This is a cross-sectional view of the first cleaning component in one embodiment of this application.

[0023] Figure 7This is a cross-sectional view of the first cleaning component and the first nozzle in one embodiment of this application.

[0024] Figure 8 This is a flowchart of a self-cleaning method for a mask cleaning device in one embodiment of this application. Detailed Implementation

[0025] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Many specific details are set forth in the following detailed description to provide a comprehensive understanding of this application. However, it will be apparent to those skilled in the art that this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application. The features and exemplary embodiments of various aspects of this application will be described in detail below.

[0026] Figure 1 This is a schematic diagram of a mask cleaning device in one embodiment of this application. Figure 2 This is a schematic diagram of the drying chamber of a mask cleaning device according to an embodiment of this application. Arrow X points to the first direction, arrow Y points to the second direction, the first direction X and the second direction Y intersect, and arrow Z points to the vertical direction. The first direction X, the second direction Y, and the vertical direction Z are all perpendicular to each other, and will not be emphasized separately thereafter.

[0027] like Figure 1 As shown, the mask cleaning equipment 100 includes at least a cleaning machine 20 and a dryer 10. The cleaning machine 20 has a cleaning chamber 201, and the dryer 10 has a drying chamber 1. The cleaning chamber 201 is located on one side of the drying chamber 1. The mask to be cleaned can be first transferred to the cleaning chamber 201 for cleaning and then transferred to the drying chamber 1.

[0028] It is understandable that mask cleaning is an essential step in the mask processing procedure. The mask cleaning equipment 100 is set up on a production line with other mask processing equipment so that the mask can be transferred between different equipment. This will not be described in detail.

[0029] Optionally, the cleaning chamber 201 is configured to house and clean the mask template. A cleaning platform 202 is provided in the drying chamber 1, and the cleaning platform 202 has at least one cleaning tank 203 configured to hold cleaning fluid for cleaning the mask template. The drying chamber 1 also includes other related mechanisms for cleaning the mask template, which will not be described in detail here.

[0030] Specifically, the drying chamber 1 is configured to accommodate and dry the mask template. The drying chamber 1 of the dryer 10 also includes a support platform 2 and a cleaning assembly 3. The support platform 2 has at least one receiving groove 21, which is configured to accommodate the mask template. When the mask template is placed in the receiving groove 21, there is a gap between the sidewall of the mask template and the sidewall surrounding the receiving groove 21. The cleaning assembly 3 is configured to clean at least the sidewall surrounding the receiving groove 21.

[0031] Optionally, the size of the receiving groove 21 can be matched according to the size of the mask template to be cleaned. In order to make it universal, the size of the receiving groove 21 can be set large enough so that various sizes of mask templates can be used without specific limitations.

[0032] like Figure 2 The sidewalls surrounding the receiving groove 21 include two first sidewalls 211 opposite each other along the first direction X and two second sidewalls 212 opposite each other along the second direction Y. The cleaning assembly 3 includes at least a first cleaning member 31 and a second cleaning member 32 that are movably connected. The first cleaning member 31 is capable of operating to clean at least the two first sidewalls 211, and the second cleaning member 32 is capable of operating to clean at least the two second sidewalls 212.

[0033] In this embodiment, by providing a first cleaning component 31 and a second cleaning component 32 with automatically controllable operation within the drying chamber 1, the first sidewall 211 and the second sidewall 212 of the receiving groove 21 can be automatically cleaned, preventing impurity particles from adhering to the receiving groove 21. This achieves self-cleaning of impurity particles on the receiving groove 21 without opening the drying chamber 1, improving the cleanliness of the drying chamber 1 and preventing secondary contamination of the mask template.

[0034] In some optional embodiments, a heating assembly (not shown in the figure) is also provided in the drying chamber 1. The heating assembly can be disposed on one or more of the side walls, bottom walls, and top walls of the drying chamber 1. Alternatively, the heating assembly can extend above the support platform 2 via a connecting bracket, or be directly disposed on the support platform 2, to improve the drying rate of the mask template supported on the support platform 2. It should be emphasized that the specific location, arrangement, and fixing method of the heating assembly in the drying chamber 1 can be adaptively adjusted according to actual needs and are not specifically limited.

[0035] Optionally, the heating component can be configured as a heating tube, heating rod, or heating wire, and can be adapted to meet actual needs without specific limitations.

[0036] In some optional embodiments, the drying chamber 1 may also be provided with an air inlet and an air outlet. The air inlet is used to communicate with an external air intake device, and the air outlet is used to communicate with an external air extraction device. A purge pipe may also be provided inside the drying chamber 1, with one end connected to the air inlet and the other end extending above the receiving groove 21. The purge pipe is provided with a connected purge head, which has multiple air holes connected to the purge pipe. Gas entering from the air inlet can be blown towards the mask template through the air holes to sweep away uncleaned or re-attached impurity particles on the mask template, further improving the cleaning effect of the mask template.

[0037] Optionally, the multiple air holes on the blow head are evenly arranged, and the direction of the gas blowing out has a non-90° angle with the mask, so as to improve the blowing effect on the mask.

[0038] Optionally, the air intake and exhaust devices can be fans, air pumps, etc., without specific limitations.

[0039] Figure 3 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application. Figure 4 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application. Figure 5 This is a schematic diagram of the drying chamber of a mask cleaning device in another embodiment of this application.

[0040] like Figures 2 to 5 The cleaning assembly 3 further includes a first support frame 311, a first rotating assembly 312, a first telescopic assembly 313, and a second rotating assembly 314. The first support frame 311 is disposed on one side of the support platform 2 in the first direction X. The first rotating assembly 312 is connected to the first support frame 311. One end of the first telescopic assembly 313 is connected to the first rotating assembly 312, and the first rotating assembly 312 can drive the first telescopic assembly 313 to rotate. The second rotating assembly 314 is connected to the other end of the first telescopic assembly 313. The first cleaning component 31 is connected to the second rotating assembly 314, and the second rotating assembly 314 can drive the first cleaning component 31 to rotate. The first cleaning component 31 has at least one first cleaning surface 31a. When the first rotating assembly 312 drives the first telescopic assembly to rotate so that the first cleaning component 31 is located on one side of one of the first sidewalls 211, the second rotating assembly 314 can drive the first cleaning component 31 to rotate so that one of the first cleaning surfaces 31a of the first cleaning component 31 is opposite to the first sidewall 211.

[0041] Optionally, the first support frame 311 can be configured as a plate-like structure extending vertically in the Z direction on one side of the support platform 2. The height of the first support frame 311 in the vertical Z direction can be adapted and adjusted according to the telescopic length of the installed first telescopic component 313 and the actual distance relative to the two first side walls 211, without being specifically limited.

[0042] Understandably, in order to improve the drying efficiency of the mask, the heating component can be avoided by setting it on the side wall of the drying chamber 1 opposite to the first support frame 311, or a through hole can be opened in the position where the first support frame 311 is not equipped with related components, so that the heat generated by the heating component can flow more directly to the support platform 2.

[0043] Optionally, the first telescopic component 313 can be a cylinder or a combination of multiple telescopic rods capable of automatic telescopic control. This can be adapted to the specific circumstances without being specifically limited. Furthermore, the number of the first telescopic components 313 can be one set or multiple sets arranged at intervals along the second direction Y to improve the stability of the connected first cleaning component 31.

[0044] Optionally, such as Figure 4 and Figure 5 The first rotating assembly 312 and the second rotating assembly 314 can be configured as a combination of a rotating shaft and a drive motor. The drive motor is fixedly connected to the first support frame 311, and the first telescopic assembly 313 is fixedly connected to the rotating shaft. The drive motor is also fixedly connected to the other end of the first telescopic assembly 313. The rotating shaft passes through the first telescopic assembly 313 and is fixedly connected to the first cleaning component 31. The axes of the rotating shafts of the first rotating assembly 312 and the second rotating shaft assembly are parallel and both parallel to the second direction Y. This allows the first rotating assembly 312 to drive the first telescopic assembly 313 and the first cleaning component 31 to rotate around the rotating shaft at the first support frame 311. At the same time, the first telescopic assembly 313 drives the first cleaning component 31 to extend, allowing the first cleaning component 31 to be positioned within the receiving groove 21 according to requirements, corresponding to a first sidewall 211. Then, by controlling the rotation of the rotating shaft of the second rotating assembly 314, the angle of the first cleaning surface 31a in the first cleaning component 31 is adjusted to align with the corresponding first sidewall 211, thereby cleaning the impurity particles on the first sidewall 211. Similarly, after cleaning one of the first sidewalls 211, the rotation angle of the first rotating component 312, the extension length of the first telescopic component 313, and the rotation angle of the second rotating component 314 are adjusted to clean the other first sidewall 211, which will not be described in detail here.

[0045] In some embodiments, the first cleaning member 31 has a first cleaning surface 31a and a second cleaning surface 31b disposed opposite to each other in a first direction X. The extending directions of the first cleaning surface 31a and the second cleaning surface 31b intersect and have a first preset angle α. The first preset angle α is in the range of 30° to 65°. The first cleaning surface 31a and the second cleaning surface 31b are respectively provided with a first dust-free cleaning strip 317.

[0046] Optionally, the first cleaning surface 31a and the second cleaning surface 31b can be used to set a first dust-free cleaning strip 317. The first dust-free cleaning strip 317 is used to clean the first sidewall 211. The size of the first dust-free cleaning strip 317 can be adaptively adjusted according to the actual situation of the first sidewall 211, without specific limitation. The first dust-free cleaning strip 317 can be made of non-woven fabric or sponge.

[0047] It is understood that when the mask is placed in the receiving groove 21, due to the gap between the mask and the side wall of the receiving groove 21, the bottom wall 213 of the part where the receiving groove 21 connects to the side wall is exposed. During the long-term drying process, impurity particles are easily attached to this part of the bottom wall 213. Therefore, in this embodiment, the first cleaning member 31 can clean the side wall surrounding the receiving groove 21 while also cleaning the bottom wall 213 of the part surrounding the receiving groove 21.

[0048] In some optional embodiments, the first cleaning member 31 further includes a first auxiliary cleaning surface 31c adjacent to the first cleaning surface 31a and a second auxiliary cleaning surface 31d adjacent to the second cleaning surface 31b. The first auxiliary cleaning surface 31c and the second auxiliary cleaning surface 31d are connected. The first cleaning surface 31a and the first auxiliary cleaning surface 31c are perpendicular to each other, and the second cleaning surface 31b and the second auxiliary cleaning surface 31d are perpendicular to each other. The first auxiliary cleaning surface 31c and the second auxiliary cleaning surface 31d are respectively provided with a first sub-dust-free cleaning strip 318. The first sub-dust-free cleaning strip 318 is configured to clean the bottom wall 213 of the receiving groove 21 at the position connected to the first side wall 211.

[0049] Optionally, the first auxiliary cleaning surface 31c and the second auxiliary cleaning surface 31d can be used to set a first sub-dust-free cleaning strip 318. The first sub-dust-free cleaning strip 318 is used to clean part of the bottom wall 213 at the location where it connects with the side wall. The size of the first sub-dust-free cleaning strip 318 can be adjusted according to actual needs and is not specifically limited. The first sub-dust-free cleaning strip 318 can be made of non-woven fabric or sponge.

[0050] It is understandable that the first dust-free cleaning strip 317 and the first sub-dust-free cleaning strip 318 can be designed to be detachably connected to the corresponding cleaning surface so that they can be replaced after multiple uses, in order to ensure the cleaning effect on impurity particles on the side wall and bottom wall 213.

[0051] In some embodiments, the first support frame 311 may also be provided with a cleaning liquid spraying mechanism for spraying cleaning liquid onto the first dust-free cleaning strip 317 and the first sub-dust-free cleaning strip 318, which has a higher degree of automation and further improves the cleaning effect on the side wall and bottom wall 213.

[0052] In some alternative embodiments, the cleaning fluid spraying mechanism may be disposed on one side of the first cleaning member 31, and at least one of them may be rotatable so that the cleaning fluid spraying mechanism may spray cleaning fluid onto the dust-free cleaning strips located in different directions respectively.

[0053] Figure 6 This is a cross-sectional view of the first cleaning component in one embodiment of this application. Figure 7 This is a cross-sectional view of the first cleaning component and the first nozzle in one embodiment of this application.

[0054] like Figure 6 and Figure 7 At least the first cleaning surface 31a, the second cleaning surface 31b, the first auxiliary cleaning surface 31c, and the second auxiliary cleaning surface 31d enclose a first chamber 3111 on the first cleaning component 31. The first cleaning surface 31a and the second cleaning surface 31b are respectively provided with a first through hole 311a connecting the first chamber 3111 and the first dust-free cleaning strip 317. The first auxiliary cleaning surface 31c and the second auxiliary cleaning surface 31d are respectively provided with a second through hole 311b connecting the first chamber 3111 and the first sub-dust-free cleaning strip 318. The first chamber 3111 is also provided with a first opening 3111a extending along the second direction Y on the side of the first chamber 3111 that is away from the support platform 2 in the vertical direction Z. The mask cleaning device 100 further includes: a first liquid inlet pipe 316, movably connected to a first support frame 311, the first liquid inlet pipe 316 being able to move relative to the first support frame 311 in a second direction Y, the first liquid inlet pipe 316 having an inlet and an outlet, the inlet being configured to communicate with an external liquid inlet mechanism; multiple first branches 316a, each communicating with an outlet; and multiple first nozzles 319, each connected to a first branch 316a. When the first cleaning component 31 is located below the first nozzle 319, the first telescopic component 313 can drive the first cleaning component 31 to rise in the vertical direction Z, so that at least multiple first nozzles 319 extend from the first opening 3111a into the first chamber 3111, each first nozzle 319 facing a through hole of a cleaning surface, and the first nozzle 319 being configured to spray cleaning liquid onto the opposite dust-free cleaning strip.

[0055] Understandably, in combination Figure 2 and Figure 3 When the first cleaning component 31 is in a non-working state, the shafts of the first rotating assembly 312, the first telescopic assembly 313, and the second rotating assembly 314 are arranged sequentially in the vertical direction Z, with the first opening 3111a facing the multiple first nozzles 319. If cleaning fluid needs to be sprayed onto the dust-free cleaning strip, the first telescopic assembly 313 is driven to shorten in the vertical direction Z, causing the first cleaning component 31 to rise. During this process, the multiple first nozzles 319 can extend into the first chamber 3111 from the first opening 3111a, and each nozzle 319 is positioned opposite a cleaning surface. Afterward, when the first cleaning fluid is sprayed, the cleaning fluid from each of the first nozzles 319 can pass through the corresponding through-holes and spray onto the dust-free cleaning strip.

[0056] Optionally, the size of the first opening 3111a can be adaptively adjusted according to the space occupied by the combination of multiple first nozzles 319 and the length and width of the dust-free cleaning strip, without being specifically limited.

[0057] Optionally, the first nozzle 319 can be configured as an umbrella-shaped nozzle, with multiple dispersed liquid outlet holes. The distance from the first nozzle 319 to the corresponding through hole can be adaptively adjusted according to actual needs, so that the cleaning liquid sprayed from the liquid outlet hole can be more dispersed and fully sprayed on the dust-free cleaning strip.

[0058] Optionally, the through hole provided on each cleaning surface can be one or multiple holes arranged in a dispersed manner, as long as more dust-free cleaning strips can be exposed to the first chamber 3111 through the through hole, so that the cleaning liquid can be sprayed more fully and evenly on the dust-free cleaning strips, without specific limitations.

[0059] Optionally, the first moving component 315 may include a screw and nut assembly structure disposed on the first support frame 311, wherein the screw extends along the second direction Y, the nut threaded onto the screw is fixed with a first liquid inlet pipe 316, the motor is fixed on the first support frame 311 and connected to the screw, the motor can drive the screw to rotate, thereby driving the first liquid inlet pipe 316 on the nut to move along the second direction Y, so that multiple first nozzles 319 move along the second direction Y to spray cleaning liquid onto different areas of the dust-free cleaning strip.

[0060] It is understood that the first liquid inlet pipe 316 can be configured as a flexible hose or a retractable tube with elastic deformation capability, so that the first moving component 315 can drive the first liquid inlet pipe 316 to move without causing damage to the first liquid inlet pipe 316. It can be adapted to actual needs and is not specifically limited.

[0061] In some embodiments, such as Figure 2 and Figure 3 The cleaning component 3 further includes: a second support frame 321, disposed on one side of the support platform 2 in the second direction Y; a third rotating component 322, connected to the second support frame 321; a second telescopic component 323, one end of which is connected to the third rotating component 322, and the third rotating component 322 is capable of driving the second telescopic component 323 to rotate; and a fourth rotating component 324, connected to the other end of the second telescopic component 323, with the second cleaning component 32 connected to the fourth rotating component 324, and the fourth rotating component 324 capable of driving the second cleaning component 32 to rotate; wherein the second cleaning component 32 has at least one second cleaning surface 31b, and when the second rotating component 314 drives the second telescopic component 323 to rotate so that the second cleaning component 32 is located on one side of one of the second sidewalls 212, the fourth rotating component 324 is capable of driving the second cleaning component 32 to rotate so that one of the second cleaning surfaces 31b of the second cleaning component 32 is opposite to the second sidewall 212.

[0062] Optionally, the second support frame 321 can be configured as a plate-like structure extending vertically in the Z direction on one side of the support platform 2. The height of the second support frame 321 in the Z direction can be adapted and adjusted according to the telescopic length of the installed second telescopic component 323 and the actual distance relative to the two second side walls 212, without being specifically limited.

[0063] Understandably, in order to improve the drying efficiency of the mask, the heating component can be avoided by setting it on the side wall of the drying chamber 1 opposite to the second support frame 321, or a through hole can be opened in the position where the second support frame 321 is not equipped with related components, so that the heat generated by the heating component can flow more directly to the support platform 2.

[0064] Optionally, the second telescopic component 323 can be a cylinder or a combination of multiple telescopic rods capable of automatic telescopic control. This can be adapted to the specific situation without being specifically limited. Furthermore, the number of second telescopic components 323 can be one set or multiple sets arranged at intervals along the first direction X to improve the stability of the connected second cleaning component 32.

[0065] In some embodiments, the second cleaning member 32 has a third cleaning surface 32a and a fourth cleaning surface 32b disposed opposite to each other in the second direction Y. The extending directions of the third cleaning surface 32a and the fourth cleaning surface 32b intersect and have a second preset angle, which is between 30° and 65°. The third cleaning surface 32a and the fourth cleaning surface 32b are respectively provided with a second dust-free cleaning strip 327. The second cleaning member 32 also includes a third auxiliary cleaning surface 32c adjacent to the third cleaning surface 32a and a fourth cleaning surface 32b adjacent to the fourth cleaning surface. The fourth auxiliary cleaning surface 32d adjacent to 32b, the third auxiliary cleaning surface 32c and the fourth auxiliary cleaning surface 32d are connected, the third cleaning surface 32a and the third auxiliary cleaning surface 32c are perpendicular to each other, the fourth cleaning surface 32b and the fourth auxiliary cleaning surface 32d are perpendicular to each other, the third auxiliary cleaning surface 32c and the fourth auxiliary cleaning surface 32d are respectively provided with a second sub-dust-free cleaning strip 328, the second sub-dust-free cleaning strip 328 is configured to clean the bottom wall 213 of the receiving groove 21 at the position connected to the first side wall 211.

[0066] Optionally, the third cleaning surface 32a and the fourth cleaning surface 32b can be used to install a second dust-free cleaning strip 327. The second dust-free cleaning strip 327 is used to clean the second sidewall 212. The size of the second dust-free cleaning strip 327 can be adaptively adjusted according to the actual situation of the second sidewall 212, without specific limitations. The second dust-free cleaning strip 327 can be made of non-woven fabric or sponge.

[0067] It is understood that when the mask is placed in the receiving groove 21, due to the gap between the mask and the side wall of the receiving groove 21, the bottom wall 213 of the part where the receiving groove 21 connects to the side wall is exposed. During the long-term drying process, impurity particles are easily attached to this part of the bottom wall 213. Therefore, in this embodiment, the second cleaning member 32 can clean the side wall surrounding the receiving groove 21 while also cleaning the bottom wall 213 of the part surrounding the receiving groove 21.

[0068] In some optional embodiments, at least the third cleaning surface 32a, the fourth cleaning surface 32b, the third auxiliary cleaning surface 32c, and the fourth auxiliary cleaning surface 32d enclose a second chamber on the second cleaning member 32. The third cleaning surface 32a and the fourth cleaning surface 32b are respectively provided with a third through hole connecting the second chamber and the second dust-free cleaning strip 327. The third auxiliary cleaning surface 32c and the fourth auxiliary cleaning surface 32d are respectively provided with a fourth through hole connecting the second chamber and the second sub-dust-free cleaning strip 328. The second chamber is also provided with a second opening extending along the first direction X on the side facing away from the support platform 2 in the vertical direction Z. The mask cleaning device 100 further includes: a second liquid inlet pipe 326, movably connected to a second support frame 321, the second liquid inlet pipe 326 being movable relative to the second support frame 321 in a first direction X, the second liquid inlet pipe 326 having an inlet and an outlet, the inlet being configured to communicate with an external liquid inlet mechanism; multiple second branches, each connected to an outlet; and multiple second nozzles, each connected to a second branch. When the second cleaning element 32 is located below the second nozzle, the second telescopic component 323 can drive the second cleaning element 32 to rise in the vertical direction Z, so that at least multiple second nozzles extend into the second chamber from the second opening, each second nozzle facing a through hole of a cleaning surface, and the second nozzles being configured to spray cleaning liquid onto the opposite dust-free cleaning strip.

[0069] Optionally, the size of the second opening can be adaptively adjusted according to the space occupied by the multiple second nozzle combinations and the length and width of the dust-free cleaning strip, without being specifically limited.

[0070] Optionally, the second nozzle can be configured as an umbrella-shaped nozzle with multiple dispersed liquid outlet holes. The distance from the second nozzle to the corresponding through hole can be adjusted according to actual needs, so that the cleaning liquid sprayed from the outlet hole can be more dispersed and fully sprayed on the dust-free cleaning strip.

[0071] Optionally, the through hole provided on each cleaning surface can be one or multiple holes arranged in a dispersed manner, as long as more dust-free cleaning strips can be exposed to the second chamber through the through hole, so that the cleaning liquid can be sprayed more fully and evenly on the dust-free cleaning strips, without specific limitations.

[0072] In some alternative embodiments, a second moving component 325 may also be included. The second moving component 325 is connected to the second support frame 321, and the second liquid inlet pipe 326 is connected to the second moving component 325. When the second telescopic component 323 drives at least the second nozzle to extend into the second chamber, the second moving component 325 can drive the second nozzle to move along the first direction X so that cleaning liquid can be sprayed at each position of the corresponding cleaning strip.

[0073] It is understandable that through the action of the second cleaning component 32 mentioned above, the second side wall 212 and the bottom wall 213 at the connected position can be cleaned as needed, thereby achieving self-cleaning of the receiving tank, further improving the cleanliness of the drying chamber, avoiding the need to stop the machine to open the drying chamber for cleaning, and thus avoiding secondary pollution.

[0074] Optionally, the second moving component 325 may include a screw and nut assembly structure disposed on the second support frame 321, wherein the screw extends along the first direction X, the nut threaded onto the screw is fixed with a second liquid inlet pipe 326, the motor is fixed on the second support frame 321 and connected to the screw, the motor can drive the screw to rotate, thereby driving the second liquid inlet pipe 326 on the nut to move along the first direction X, so that multiple second nozzles move along the first direction X to spray cleaning liquid onto different areas of the dust-free cleaning strip.

[0075] Optionally, the cleaning solution used to clean the container 21 can be alcohol or other cleaning agents, which can be adapted according to actual needs and are not specifically limited.

[0076] In this embodiment, the working principle of the second cleaning component 32 and the structure related to the operation of the second cleaning component 32 are the same as those of the first cleaning component 31 and related structures. The only difference is the direction. For details, please refer to the relevant description of the first cleaning component 31, which will not be repeated here.

[0077] Figure 8 This is a flowchart of a self-cleaning method for a mask cleaning device in one embodiment of this application.

[0078] This application also provides a self-cleaning method for a mask cleaning device, such as... Figure 8 As shown, the self-cleaning method is applied to the mask cleaning device 100. The mask cleaning device 100 can be referred to the relevant descriptions of the above embodiments. The steps of the self-cleaning method of the mask cleaning device 100 are described as follows.

[0079] S110: Depressurize the drying chamber 1 that does not contain the mask template.

[0080] S120: The first cleaning component 31 is activated to clean at least two first sidewalls 211 surrounding the receiving groove 21. The first rotating component 312 is activated to drive the first telescopic component 313 to rotate and the first telescopic component 313 extends. The second rotating component 314 drives the first cleaning component 31 to rotate. The first cleaning component 31 is attached to one of the first sidewalls 211 and cleans it.

[0081] S130: The second cleaning component 32 is activated to clean at least two second sidewalls 212 surrounding the receiving groove 21. The third rotating component 322 is activated to drive the second telescopic component 323 to rotate and the second telescopic component 323 extends. The fourth rotating component 324 drives the second cleaning component 32 to rotate. The second cleaning component 32 is attached to one of the second sidewalls 212 and cleans it.

[0082] In this embodiment, by providing a first cleaning component 31 and a second cleaning component 32 with automatically controllable operation within the drying chamber 1, the first sidewall 211 and the second sidewall 212 of the receiving groove 21 can be automatically cleaned, preventing impurity particles from adhering to the receiving groove 21. This achieves self-cleaning of impurity particles on the receiving groove 21 without opening the drying chamber 1, improving the cleanliness of the drying chamber 1 and preventing secondary contamination of the mask template.

[0083] In some embodiments, in the step of depressurizing the drying chamber 1 without a mask template, the pressurization or depressurization of the drying chamber 1 can be achieved by automatic control, which will not be described in detail.

[0084] In some embodiments, the actions of activating the first cleaning member 31 and activating the second cleaning member 32 are not performed simultaneously. For example, during the process of the first cleaning member 31 activating to clean the two first sidewalls 211 of the corresponding receiving groove 21, the second cleaning member 32 is kept in its initial state, that is, the extension directions of the third rotating component 322, the fourth rotating component 324 and the second telescopic component 323 are parallel to the vertical direction, so as to avoid interference with the action of the first cleaning member 31.

[0085] Optionally, after the first cleaning element 31 cleans the two first sidewalls 211 and returns to its initial state, the second cleaning element 32 is activated after the first cleaning element 31 is detected to have reset. The detection device used to detect the actions of the first cleaning element 31 and the second cleaning element 32 can be one or more position detectors, photosensors, etc., installed in the drying chamber 1, and can be adaptively adjusted according to actual needs without specific limitations.

[0086] In some embodiments, after receiving an instruction to activate the first cleaning component 31 or the second cleaning component 32, before activating the corresponding first cleaning component 31 or the second cleaning component 32 to clean the sidewall of the corresponding receiving groove 21, taking the first cleaning component 31 as an example, the first telescopic component 313 needs to be shortened vertically so that the first nozzle 319 can extend into the first chamber 3111 from the first opening 3111a. Then, the cleaning fluid is sprayed onto the first dust-free cleaning strip 317 and the first letter dust-free cleaning strip 318 through each of the first nozzles 319. At the same time, the first moving component 315 is activated so that the multiple first nozzles 319 can move along the second direction Y so that the cleaning fluid can be sprayed evenly and dispersedly onto each area of ​​the cleaning strip.

[0087] In some embodiments, when the first cleaning member 31 is activated to clean the two first sidewalls 211 or the second cleaning member 32 is activated to clean the two second sidewalls 212, taking the activation of the first cleaning member 31 as an example, firstly, the first dust-free cleaning strip 317 on the first cleaning surface 31a cleans one of the first sidewalls 211 near the first support frame 311, and then the first sub-dust-free cleaning strip 318 on the first auxiliary cleaning surface 31c cleans the bottom wall 213 adjacent to the first sidewall 211. Then, the first dust-free cleaning strip 317 on the second cleaning surface 31b cleans the other first sidewall 211 away from the first support frame 311, and then the first sub-dust-free cleaning strip 318 on the second auxiliary cleaning surface 31d cleans the bottom wall 213 adjacent to the first sidewall 211.

[0088] It is understood that the specific cleaning methods of the first cleaning component 31 and the second cleaning component 32 for the corresponding parts of the receiving groove 21 can be referred to the relevant descriptions in the above embodiments, and will not be repeated here.

[0089] It should be noted that the dimensions of layers and regions may be exaggerated in the accompanying drawings of this application for clarity. Furthermore, it is understood that when an element or layer is referred to as being "on" another element or layer, it may be directly on the other element, or there may be intermediate layers. Additionally, it is understood that when an element or layer is referred to as being "below" another element or layer, it may be directly below the other element, or there may be more than one intermediate layer or element. Furthermore, it is understood that when a layer or element is referred to as being "between" two layers or two elements, it may be the only layer between the two layers or two elements, or there may be more than one intermediate layer or element. Similar reference numerals throughout indicate similar elements.

[0090] Furthermore, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0091] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0092] The above are merely preferred embodiments of this application and are not intended to limit this application. Any modifications or equivalent substitutions made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A mask template cleaning device, characterized in that, include: A drying chamber is configured to house and dry a mask template; A support platform is provided in the drying chamber. The support platform is provided with at least one receiving groove, which is configured to receive the mask template. When the mask template is placed in the receiving groove, there is a gap between the side wall of the mask template and the side wall surrounding the receiving groove. A cleaning component is disposed in the drying chamber, the cleaning component being configured to clean at least the sidewalls surrounding the receiving groove; The sidewalls surrounding the receiving groove include two first sidewalls opposite each other along a first direction and two second sidewalls opposite each other along a second direction, the first direction and the second direction intersect, and the cleaning assembly includes at least a first cleaning member and a second cleaning member that are movably connected, the first cleaning member being able to operate to clean at least two of the first sidewalls, and the second cleaning member being able to operate to clean at least two of the second sidewalls.

2. The mask cleaning device according to claim 1, characterized in that, The cleaning component also includes: A first support frame is disposed on one side of the support platform in the first direction; The first rotating component is connected to the first support frame; A first telescopic component, one end of which is connected to the first rotating component, and the first rotating component is capable of driving the first telescopic component to rotate. The second rotating assembly is connected to the other end of the first telescopic assembly, the first cleaning component is connected to the second rotating assembly, and the second rotating assembly can drive the first cleaning component to rotate; The first cleaning component has at least one first cleaning surface. When the first rotating component drives the first telescopic rotation so that the first cleaning component is located on one side of one of the first sidewalls, the second rotating component can drive the first cleaning component to rotate so that one of the first cleaning surfaces of the first cleaning component is opposite to the first sidewall.

3. The mask cleaning device according to claim 2, characterized in that, The first cleaning component has a first cleaning surface and a second cleaning surface arranged opposite to each other in the first direction. The extension directions of the first cleaning surface and the extension directions of the second cleaning surface intersect and have a first preset angle. The first preset angle is in the range of 30° to 65°. The first cleaning surface and the second cleaning surface are respectively provided with a first dust-free cleaning strip.

4. The mask cleaning device according to claim 3, characterized in that, The first cleaning component further includes a first auxiliary cleaning surface adjacent to the first cleaning surface and a second auxiliary cleaning surface adjacent to the second cleaning surface. The first auxiliary cleaning surface and the second auxiliary cleaning surface are connected and perpendicular to each other. The second cleaning surface and the second auxiliary cleaning surface are perpendicular to each other. The first auxiliary cleaning surface and the second auxiliary cleaning surface are each provided with a first sub-dust-free cleaning strip. The first sub-dust-free cleaning strip is configured to clean the bottom wall of the receiving groove at the location connected to the first side wall.

5. The mask cleaning device according to claim 4, characterized in that, At least the first cleaning surface, the second cleaning surface, the first auxiliary cleaning surface, and the second auxiliary cleaning surface enclose a first chamber on the first cleaning component. The first cleaning surface and the second cleaning surface are respectively provided with a first through hole connecting the first chamber and the first dust-free cleaning strip. The first auxiliary cleaning surface and the second auxiliary cleaning surface are respectively provided with a second through hole connecting the first chamber and the first sub-dust-free cleaning strip. The first chamber is also provided with a first opening extending along the second direction on the side facing away from the support platform in the vertical direction. The mask cleaning equipment also includes: A first liquid inlet pipe is movably connected to the first support frame. The first liquid inlet pipe is capable of moving relative to the first support frame in the second direction. The first liquid inlet pipe has a liquid inlet and a liquid outlet. The liquid inlet is configured to communicate with an external liquid inlet mechanism. Multiple first branch paths are connected to the liquid outlet, respectively; Multiple first nozzles are connected to each of the first branches. When the first cleaning element is located below the first nozzle, the first telescopic assembly can drive the first cleaning element to rise vertically so that at least multiple first nozzles extend into the first chamber from the first opening. Each first nozzle faces a through hole in a cleaning surface. The first nozzle is configured to spray cleaning liquid onto the opposite cleaning strip.

6. The mask cleaning device according to claim 5, characterized in that, Also includes: A first movable component is connected to the first support frame, and a first liquid inlet pipe is connected to the first movable component. When the first telescopic component drives at least the first nozzle to extend into the first chamber, the first movable component can drive the first nozzle to move along the second direction so that cleaning liquid can be sprayed on each position of the corresponding cleaning strip.

7. The mask cleaning device according to any one of claims 1-6, characterized in that, The cleaning component also includes: The second support frame is disposed on one side of the support platform in the second direction; The third rotating component is connected to the second support frame; A second telescopic component, one end of which is connected to the third rotating component, the third rotating component being able to drive the second telescopic component to rotate; The fourth rotating assembly is connected to the other end of the second telescopic assembly, and the second cleaning component is connected to the fourth rotating assembly. The fourth rotating assembly can drive the second cleaning component to rotate. The second cleaning component has at least one second cleaning surface. When the second rotating component drives the second telescopic component to rotate so that the second cleaning component is located on one side of one of the second sidewalls, the fourth rotating component can drive the second cleaning component to rotate so that one of the second cleaning surfaces of the second cleaning component is opposite to the second sidewall.

8. The mask cleaning device according to claim 7, characterized in that, The second cleaning component has a third cleaning surface and a fourth cleaning surface arranged opposite to each other in the second direction. The extension directions of the third cleaning surface and the fourth cleaning surface intersect and have a second preset angle. The range of the second preset angle is between 30° and 65°. The third cleaning surface and the fourth cleaning surface are respectively provided with a second dust-free cleaning strip. The second cleaning component further includes a third auxiliary cleaning surface adjacent to the third cleaning surface and a fourth auxiliary cleaning surface adjacent to the fourth cleaning surface. The third auxiliary cleaning surface and the fourth auxiliary cleaning surface are connected and perpendicular to each other. The fourth cleaning surface and the fourth auxiliary cleaning surface are also perpendicular to each other. The third auxiliary cleaning surface and the fourth auxiliary cleaning surface are each provided with a second sub-dust-free cleaning strip. The second sub-dust-free cleaning strip is configured to clean the bottom wall of the receiving groove at the location connected to the first sidewall.

9. The mask template cleaning equipment according to any one of claims 1-6, characterized in that, Also includes: A cleaning chamber is disposed on one side of the drying chamber, and the cleaning chamber is configured to accommodate the mask template and clean the mask template; A cleaning station is provided in the cleaning chamber, and the cleaning station is provided with at least one cleaning tank, which is configured to contain cleaning fluid for cleaning the mask template.

10. A self-cleaning method for a mask template cleaning device, characterized in that, The mask cleaning device according to any one of claims 1-9, wherein the cleaning assembly further comprises a first rotating assembly, a first telescopic assembly, a second rotating assembly, a third rotating assembly, a second telescopic assembly, and a fourth rotating assembly, and the self-cleaning method comprises: Depressurization treatment is performed on the drying chamber that does not contain the mask template; The first cleaning component is activated to clean at least two first sidewalls that form the receiving groove, wherein the first rotating component is activated to drive the first telescopic component to rotate, and the first telescopic component extends, the second rotating component drives the first cleaning component to rotate, and the first cleaning component is attached to one of the first sidewalls and cleans it. The second cleaning component is activated to clean at least two second sidewalls that form the receiving groove. The third rotating component is activated to drive the second telescopic component to rotate, and the second telescopic component extends. The fourth rotating component drives the second cleaning component to rotate, and the second cleaning component adheres to one of the second sidewalls and cleans it.

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