Semiconductor electrostatic chuck and pedestal gas channel cover plate electron beam welding apparatus and method
Patent Information
- Application Number
- CN202611339370.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-09-01
- Publication Date
- 2026-09-29
AI Technical Summary
[0003]本发明公开半导体静电卡盘与基座气道盖板电子束焊接设备及方法,旨在解决背景技术中焊接杂质残留与热应力控制的技术问题
步骤四:预热电子枪设置于电子束焊接头一侧,预热电子枪上端固定连接于电子束焊接头上端,温度调节器设置于预热电子枪一侧,温度调节器固定连接于预热电子枪表面,温度调节器调节预热电子枪的加热温度。
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Figure CN122829380A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor electrostatic chuck and base air passage cover welding technology, and more particularly to electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover. Background Technology
[0002] Semiconductor electrostatic chucks are key components in semiconductor manufacturing equipment. Their manufacturing process demands extremely high precision and cleanliness. During the assembly of the electrostatic chuck with the base air duct cover, electron beam welding technology is typically used to ensure the connection's airtightness and structural strength. In existing welding processes, tiny impurities are easily left on the surface of the welding position, and large thermal stress is easily generated during the welding process. If these impurities are not removed, they will be drawn into the weld to form pores or inclusions; while thermal stress can cause workpiece deformation or even cracks, which seriously affects the performance and lifespan of semiconductor electrostatic chucks. Summary of the Invention
[0003] This invention discloses an electron beam welding apparatus and method for semiconductor electrostatic chucks and base gas duct covers, aiming to solve the technical problems of welding impurity residue and thermal stress control in the prior art.
[0004] The electron beam welding equipment and method for semiconductor electrostatic chucks and base gas duct covers proposed in this invention include: A vacuum welding box, wherein a support frame is provided at the front end of the vacuum welding box, and a control panel is provided at the front end of the support frame. The front end of the vacuum welding box is fixedly connected to the surface of the support frame, and the surface of the control panel is fixedly connected to the surface of the support frame. A welding preheating mechanism, comprising an electron beam welding head disposed inside a vacuum welding chamber, wherein the upper end of the electron beam welding head is fixedly connected to the upper end of the inner wall of the vacuum welding chamber. The component welding and fitting mechanism includes a mounting box, which is disposed on the upper end of the support frame, and the lower end surface of the mounting box is slidably connected to the surface of the support frame through a sliding groove.
[0005] In a preferred embodiment, the welding preheating mechanism includes: The preheating electron gun is located on one side of the electron beam welding head. The upper end of the preheating electron gun is fixedly connected to the upper end of the electron beam welding head. The movement path of the preheating electron gun is consistent with the movement path of the electron beam welding head. A temperature regulator is provided on the side with the preheating electron gun. The temperature regulator is fixedly connected to the surface of the preheating electron gun and is used to adjust the heating temperature of the preheating electron gun.
[0006] In a preferred embodiment, the welding preheating mechanism further includes: A brush plate is set on one side of the preheating electron gun. A telescopic rod is set on the upper side of the brush plate. A spring is sleeved on the surface of the telescopic rod. The two ends of the spring are fixedly connected to the two ends of the telescopic rod. The lower end of the telescopic rod is fixedly connected to the inner wall of the brush plate. An impurity collection head is located on one side of the preheating electron gun. An air pump is installed on the outside of the impurity collection head and is fixedly connected to the surface of the impurity collection head. The air pump is used to collect the impurities cleaned by the brush plate.
[0007] In a preferred embodiment, it also includes: A guide plate is set on the upper side of the brush plate. The surface of the brush plate is slidably connected to the inner wall of the guide plate through a groove. The upper end of the telescopic rod is fixedly connected to the inner wall of the guide plate. The fixed base is located on the upper part of the guide plate. The two fixed bases are rotatably connected by a rotating shaft. The two fixed bases are respectively fixedly connected to the upper part of the guide plate and the lower part of the temperature regulator.
[0008] In a preferred embodiment, it also includes: The protective plate is equipped with a fixed seat at the rear end. The surface of the protective plate is fixedly connected to the lower surface of the temperature regulator. An active worm gear is installed inside the protective plate, and the surface of the active worm gear is rotatably connected to the inner wall of the protective plate. The driven worm gear is located inside the protective plate. The tooth surface of the driven worm gear meshes with the tooth surface of the driving worm gear. The driven worm gear is rotatably connected to the inner wall of the protective plate. The inner wall of the driven worm gear is fixedly connected to the surface of the connecting part of the two fixed seat shafts.
[0009] In a preferred embodiment, the component welding and mating mechanism includes: The support platform is set on the upper side of the placement box. The surface of the support platform is rotatably connected to the inner wall of the placement box. A guide rail is fixedly connected to the upper end of the support platform. The placement box is slidably connected to the inside of the vacuum welding box. The placement box can be moved to the lower side of the electron beam welding head. A fixed plate is set on the upper side of the support platform. A connecting plate is set at the lower end of the fixed plate. The surface of the fixed plate is rotatably connected to the surface of the connecting plate, and the lower end of the connecting plate is fixedly connected to the upper surface of the support platform.
[0010] In a preferred embodiment, the component welding and mating mechanism further includes: A mating plate is located on the opposite side of the connecting plate, and the lower end of the mating plate is slidably connected to the upper surface of the support platform via a slide rail. An adjusting screw is positioned between two guide rails. Both ends of the adjusting screw are rotatably connected to the upper surface of the support platform via bearing seats. A servo motor is installed at the front end of the adjusting screw. The output end of the servo motor is fixedly connected to the inner wall of the adjusting screw. The surface of the servo motor is fixedly connected to the surface of the support platform. The inner wall of the mating plate is threadedly connected to the surface of the adjusting screw. The inner wall of the connecting plate is rotatably connected to the surface of the adjusting screw.
[0011] In a preferred embodiment, the component welding and mating mechanism further includes: A stepper motor is located on the rear side of the connecting plate. The surface of the stepper motor is fixedly connected to the surface of the connecting plate, and the output end of the stepper motor is fixedly connected to the inner wall of the fixed plate. A support shaft is located at the lower end of the support platform. The middle surface of the support shaft is fixedly connected to the lower end of the support platform, and both ends of the support shaft are rotatably connected to the inner wall of the mounting box.
[0012] In a preferred embodiment, the component welding and mating mechanism further includes: Two electric actuators are respectively set on both sides of the support shaft. Both ends of the electric actuators are rotatably connected to the opposite side surfaces of the support platform and the mounting box via a rotating shaft.
[0013] An electron beam welding apparatus and method for semiconductor electrostatic chucks and base gas duct covers, using the electron beam welding apparatus and method for semiconductor electrostatic chucks and base gas duct covers as described above, includes the following steps: Step 1: The fixed plate connects the semiconductor electrostatic chuck to the surface, the mating plate fixes the base air passage cover plate, the servo motor output end at the front end of the bearing platform drives the adjusting screw to rotate, the surface of the adjusting screw engages with the inner wall of the mating plate thread, the rotation of the adjusting screw drives the mating plate to move along the guide rail, the entire placement box is sent into the vacuum welding box, the electric push rods on both sides of the lower end of the bearing platform are connected to the placement box and the bearing platform through the rotating shaft, the electric push rods extend and retract to adjust the angle of the bearing platform, the stepper motor output end on the rear side of the fixed plate is connected to the fixed plate, the stepper motor drives the electrostatic chuck and the base cover plate to rotate; Step 2: The brush plate is installed on one side of the electron beam welding head. The brush plate contacts the surface of the welding position. The active worm gear on the back of the brush plate drives the driven worm wheel to rotate. The driven worm wheel drives the guide plate to rotate through the fixed seat. The guide plate drives the brush plate to move. A telescopic rod is installed on the inner wall of the brush plate. A spring is sleeved on the surface of the telescopic rod. The lower end of the telescopic rod is fixedly connected to the inner wall of the brush plate. The telescopic rod and the spring provide elastic force. The brush plate is slidably connected to the inner wall of the guide plate through the slide groove. The brush plate slides in the guide plate. Step 3: The impurity collection head is set on the front side of the brush plate. An air pump is set on the outside of the impurity collection head and is fixedly connected to the surface of the impurity collection head. The air pump sucks the impurities into the impurity collection head. Step 4: The preheating electron gun is set on one side of the electron beam welding head, and the upper end of the preheating electron gun is fixedly connected to the upper end of the electron beam welding head. The temperature regulator is set on one side of the preheating electron gun and fixedly connected to the surface of the preheating electron gun. The temperature regulator adjusts the heating temperature of the preheating electron gun.
[0014] As can be seen from the above, the electron beam welding equipment and method for semiconductor electrostatic chucks and base air passage covers provided by the present invention achieves precise docking and multi-angle adjustment of workpieces through the cooperation of servo motors and electric push rods. The equipment adopts a worm gear mechanism to adjust the brush plate angle. The brush plate is in contact with the welding surface through a telescopic rod and spring, adapting to edges of different shapes and cleaning impurities. The impurity collection head, together with an air pump, collects the impurities uniformly to avoid secondary diffusion. The preheating electron gun preheats the welding position, and the temperature regulator adjusts the preheating temperature according to the material characteristics to reduce thermal stress and prevent cracks. This solves the problems of residual impurities on the welding surface, difficulty in cleaning irregular edges, and control of welding thermal stress, thereby improving welding quality and reliability. Attached Figure Description
[0015] Figure 1 This is a schematic diagram of the main structure of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover proposed in this invention. Figure 2 This is a schematic diagram of the internal structure of the vacuum welding box of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover plate proposed in this invention. Figure 3 This is a schematic diagram of the welding preheating mechanism structure of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover proposed in this invention. Figure 4 This is a schematic diagram of the internal cross-sectional structure of the electron beam welding preheating mechanism of the semiconductor electrostatic chuck and base air passage cover plate electron beam welding equipment and method proposed in this invention. Figure 5 This is a schematic diagram of the component welding and mating mechanism of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover plate proposed in this invention. Figure 6 This is a schematic diagram of the internal cross-sectional structure of the component welding and mating mechanism of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover plate proposed in this invention. Figure 7 This is a schematic diagram of the upper structure of the component welding and mating mechanism of the electron beam welding equipment and method for semiconductor electrostatic chuck and base air passage cover proposed in this invention.
[0016] In the diagram: 1. Vacuum welding box; 2. Support frame; 3. Control panel; 4. Welding preheating mechanism; 401. Electron beam welding head; 402. Temperature regulator; 403. Preheating electron gun; 404. Impurity collection head; 405. Air pump; 406. Brush plate; 407. Telescopic rod; 408. Spring; 5. Component welding mating mechanism; 501. Placement box; 502. Servo motor; 503. Mating plate; 504. Adjusting screw; 505. Fixed plate; 506. Connecting plate; 507. Stepper motor; 508. Bearing platform; 509. Electric push rod; 510. Support shaft; 6. Protective plate; 7. Driving worm gear; 8. Driven worm wheel; 9. Fixed seat; 10. Guide plate. Detailed Implementation
[0017] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.
[0018] The electron beam welding equipment and method for semiconductor electrostatic chucks and base air passage covers disclosed in this invention are mainly applied to scenarios where it is difficult to clean irregular edges and control welding thermal stress in high-precision electron beam welding of semiconductor electrostatic chucks and base air passage covers.
[0019] Reference Figures 1-7 Electron beam welding equipment and method for semiconductor electrostatic chucks and base gas duct covers, including: Vacuum welding box 1, with a support frame 2 at the front end of vacuum welding box 1, and a control panel 3 at the front end of support frame 2. The front end of vacuum welding box 1 is fixedly connected to the surface of support frame 2, and the surface of control panel 3 is fixedly connected to the surface of support frame 2. The welding preheating mechanism 4 includes an electron beam welding head 401, which is disposed inside the vacuum welding box 1. The upper end of the electron beam welding head 401 is fixedly connected to the upper end of the inner wall of the vacuum welding box 1. The component welding and fitting mechanism 5 includes a mounting box 501, which is located on the upper end of the support frame 2. The lower surface of the mounting box 501 is slidably connected to the surface of the support frame 2 via a sliding groove.
[0020] Reference Figures 1-4 In a preferred embodiment, the welding preheating mechanism 4 includes: A preheating electron gun 403 is disposed on one side of the electron beam welding head 401. The upper end of the preheating electron gun 403 is fixedly connected to the upper end of the electron beam welding head 401. The moving path of the preheating electron gun 403 is consistent with the moving path of the electron beam welding head 401. Temperature regulator 402 is provided on one side of the preheating electron gun 403. Temperature regulator 402 is fixedly connected to the surface of preheating electron gun 403. Temperature regulator 402 is used to adjust the heating temperature of preheating electron gun 403. A brush plate 406 is set on one side of the preheating electron gun 403. A telescopic rod 407 is set on the upper side of the brush plate 406. A spring 408 is sleeved on the surface of the telescopic rod 407. The two ends of the spring 408 are fixedly connected to the two ends of the telescopic rod 407. The lower end of the telescopic rod 407 is fixedly connected to the inner wall of the brush plate 406. An impurity collection head 404 is located on one side of the preheating electron gun 403. An air pump 405 is provided on the outside of the impurity collection head 404. The air pump 405 is fixedly connected to the surface of the impurity collection head 404 and is used to collect the impurities cleaned by the brush plate 406.
[0021] In this invention, the welding preheating mechanism 4 further includes: A guide plate 10 is disposed on the upper side of the brush plate 406. The surface of the brush plate 406 is slidably connected to the inner wall of the guide plate 10 through a groove. The upper end of the telescopic rod 407 is fixedly connected to the inner wall of the guide plate 10. A fixing seat 9 is set on the upper end of the guide plate 10. The two fixing seats 9 are rotatably connected by a rotating shaft. The two fixing seats 9 are respectively fixedly connected to the upper end of the guide plate 10 and the lower end of the temperature regulator 402. The protective plate 6 is provided with a fixed seat 9 at its rear end. The surface of the protective plate 6 is fixedly connected to the lower surface of the temperature regulator 402. The protective plate 6 is provided with an active worm gear 7 inside, and the surface of the active worm gear 7 is rotatably connected to the inner wall of the protective plate 6. The driven worm gear 8 is located inside the protective plate 6. The tooth surface of the driven worm gear 8 is meshed with the tooth surface of the driving worm 7. The driven worm gear 8 is rotatably connected to the inner wall of the protective plate 6. The inner wall of the driven worm gear 8 is fixedly connected to the surface of the shaft connection part of the two fixed seats 9.
[0022] Specifically, the brush plate 406 mounted on one side of the electron beam welding head 401 first contacts the surface of the welding position before welding begins. The brush plate 406 cleans any impurities that may be present at the welding position. The operator can twist the driving worm gear 7 on the rear side of the brush plate 406. The driving worm gear 7 drives the driven worm wheel 8 to rotate. The worm wheel and worm gear structure has a self-locking characteristic, so the brush plate 406 remains stable in the adjusted position, and the angle of the brush plate 406 will not change unexpectedly. The driven worm wheel 8 drives the guide plate 10 to rotate through the fixed seat 9. The guide plate 10 drives the brush plate 406 to move. The brush plate 406 is moved to maintain contact with the welding position. A telescopic rod 407 and a spring 408 are installed on the inner wall of the brush plate 406. The telescopic rod 407 and spring 408 provide elastic force, ensuring that the brush plate 406 always fits the welding position. The brush plate 406 can slide within the guide plate 10. When there are protrusions or depressions at the welding position, the brush plate 406 can adapt to the shape changes of the surface and maintain a close fit. This structural design ensures that the brush plate 406 can adapt to welding edges of different shapes, ensuring that impurities are effectively removed and preventing impurities from affecting the subsequent welding quality. Impurities removed by the brush plate 406 are collected by the impurity collection head 404 on the front side. An air pump 405 installed on one side of the impurity collection head 404 is activated, drawing the impurities into the collection head 404 for unified storage. This collection action of the impurity collection head 404 prevents secondary diffusion of impurities, thus preventing them from adversely affecting the welding effect. A preheating electron gun 403 installed on one side of the electron beam welding head 401 preheats the welding position. The preheating effect of the preheating electron gun 403 reduces thermal stress during the welding process. Preheating prevents crack formation and improves the weld structure. A temperature regulator 402 is installed on the upper side of the preheating electron gun 403. The temperature regulator 402 adjusts the output temperature of the preheating electron gun 403 according to the material characteristics of the electrostatic chuck and the base cover plate. After the preheating process is completed, the electron beam welding head 401 performs welding operation on the welding position. The entire welding process is carried out in the order of positioning, cleaning, preheating and welding. The steps are closely connected to ensure the welding quality and reliability of the semiconductor electrostatic chuck and the base gas duct cover plate. In specific application scenarios, this welding preheating mechanism 4 mainly solves the problems of residual impurities on the welding surface and control of welding thermal stress. Through the cooperation of the brush plate 406 and the impurity collection head 404, the welding position is cleaned. Under the action of the telescopic rod 407 and the spring 408, the brush plate 406 can closely fit the welding surface. This structure can adapt to welding edges of different shapes. When there are protrusions or depressions at the welding position, the brush plate 406 can follow the surface shape. The impurity collection head 404 works in conjunction with the air pump 405. The air pump 405 sucks the impurities cleaned by the brush plate 406 into the collection head, preventing secondary diffusion of impurities. The preheating electron gun 403 is located on one side of the electron beam welding head 401. The preheating electron gun 403 preheats the welding position, reducing thermal stress during the welding process. The preheating electron gun 403 prevents weld cracks and maintains a stable temperature. The regulator 402 adjusts the heating temperature of the preheating electron gun 403. The temperature regulator 402 adjusts the output parameters according to the material characteristics of the electrostatic chuck and the base cover plate to ensure the reliability of welding quality. The difference from the prior art is that it integrates adaptive cleaning and temperature-controllable preheating functions. The prior art usually lacks an automatic cleaning device for irregular welding surfaces and it is difficult to control the pre-welding temperature. The advantage of this mechanism is that it introduces a worm gear transmission structure, which uses its self-locking characteristics to fix the angle of the brush plate 406 to prevent displacement during operation. The design of the guide plate 10 and the elastic component allows the brush plate 406 to adapt to the micro-undulations of the workpiece surface in real time. The combination of the air pump 405 and the collection head effectively isolates the source of contamination. The application of the temperature regulator 402 enables precise preheating of workpieces of different materials. These improvements improve the quality of the weld structure, eliminate impurity interference, and ensure the welding yield of precision semiconductor components.
[0023] Reference Figures 5-7 In a preferred embodiment, the component welding and mating mechanism 5 includes: A support platform 508 is set on the upper side of the placement box 501. The surface of the support platform 508 is rotatably connected to the inner wall of the placement box 501. A guide rail is fixedly connected to the upper end of the support platform 508. The placement box 501 is slidably connected to the inside of the vacuum welding box 1. The placement box 501 can be moved to the lower side of the electron beam welding head 401. A fixed plate 505 is disposed on the upper side of the support platform 508. A connecting plate 506 is provided at the lower end of the fixed plate 505. The surface of the fixed plate 505 is rotatably connected to the surface of the connecting plate 506. The lower end of the connecting plate 506 is fixedly connected to the upper surface of the support platform 508. The mating plate 503 is located on the opposite side of the connecting plate 506, and the lower end of the mating plate 503 is slidably connected to the upper surface of the support platform 508 via a slide rail. An adjusting screw 504 is positioned between two guide rails. Both ends of the adjusting screw 504 are rotatably connected to the upper surface of the support platform 508 via bearing seats. A servo motor 502 is mounted at the front end of the adjusting screw 504. The output end of the servo motor 502 is fixedly connected to the inner wall of the adjusting screw 504. The surface of the servo motor 502 is fixedly connected to the surface of the support platform 508. The inner wall of the mating plate 503 is threadedly connected to the surface of the adjusting screw 504. The inner wall of the connecting plate 506 is rotatably connected to the surface of the adjusting screw 504. Stepper motor 507 is located on the rear side of connecting plate 506. The surface of stepper motor 507 is fixedly connected to the surface of connecting plate 506, and the output end of stepper motor 507 is fixedly connected to the inner wall of fixed plate 505. A support shaft 510 is provided at the lower end of the support platform 508. The middle surface of the support shaft 510 is fixedly connected to the lower end of the support platform 508, and the two ends of the support shaft 510 are rotatably connected to the inner wall of the mounting box 501. Electric push rods 509, two electric push rods 509 are respectively set on both sides of the support shaft 510, and both ends of the electric push rods 509 are rotatably connected to the opposite side surfaces of the support platform 508 and the mounting box 501 through rotating shafts.
[0024] Specifically, before welding the semiconductor electrostatic chuck to the base air duct cover, the operator first needs to position and fix the workpiece. The fixing plate 505 stably connects the semiconductor electrostatic chuck to the surface, ensuring that the electrostatic chuck does not shift. The mating plate 503 firmly fixes the base air duct cover, and the base cover can accurately align with the welding position of the electrostatic chuck. After the servo motor 502 at the front end of the bearing platform 508 is started, the output end of the servo motor 502 drives the adjusting screw 504 to rotate. The surface of the adjusting screw 504 and the inner wall of the mating plate 503 have a threaded engagement structure. The rotation of the adjusting screw 504 drives the mating plate 503 to move along the guide rail on the bearing platform 508. The mating plate 503 drives the base cover to move until the electrostatic chuck and the base cover are completely attached. The entire mounting box 501 is then placed. The electrostatic chuck is placed in the vacuum welding box 1, and the welding position of the electrostatic chuck and the base cover plate is placed directly below the electron beam welding head 401. Two electric push rods 509 are installed on both sides of the lower end of the support platform 508. The two ends of the electric push rods 509 are connected to the mounting box 501 and the support platform 508 respectively through the rotating shaft. The control program adjusts the angle of the support platform 508 by controlling the extension and retraction of the two electric push rods 509, so that the support platform 508 swings within a certain range in the mounting box 501. The stepper motor 507 on the rear side of the fixed plate 505 drives the electrostatic chuck and the base cover plate to rotate during the welding process. The rotation of the stepper motor 507 enables the welding points at different positions to be aligned with the welding head in sequence. The swing of the support platform 508 and the rotation of the stepper motor 507 cooperate with each other to meet the requirements of multi-angle welding. In specific application scenarios, the welding mating mechanism 5 of this component mainly solves the problems of precise workpiece docking and multi-angle welding in the precision welding process. The support platform 508 cooperates with the placement box 501, enabling the workpiece to move accurately below the electron beam welding head 401. The servo motor 502 drives the adjusting screw 504 to rotate, and the adjusting screw 504 drives the mating plate 503 to move along the guide rail through the threaded structure. This action achieves precise contact between the base cover plate and the electrostatic chuck. The two electric push rods 509 adjust the angle of the support platform 508 through telescopic movement, allowing the support platform 508 to swing within the placement box 501. The stepper motor 507 drives the fixed plate 505 and the workpiece to rotate, so that different welding points can be aligned with the welding head in sequence. The oscillation and rotation of the stepper motor 507 work together to meet the multi-angle welding requirements of complex workpieces. The difference between this mechanism and existing technologies lies in the adoption of a multi-dimensional precision adjustment structure. Existing welding equipment can usually only perform simple linear movements, which is difficult to handle welding in complex spatial positions. The advantage of this mechanism is that it introduces a dual drive system of servo motor 502 and stepper motor 507, which, together with the angle adjustment function of electric push rod 509, realizes the precise three-dimensional positioning of the workpiece. This multi-axis linkage design not only ensures the seamless fit of the workpiece before welding, but also enables all-round angle changes during the welding process. This greatly improves the flexibility and precision of welding, effectively avoids errors caused by manual operation, and ensures the welding quality of semiconductor precision components.
[0025] An electron beam welding apparatus and method for semiconductor electrostatic chucks and base gas duct covers, using the electron beam welding apparatus for semiconductor electrostatic chucks and base gas duct covers as described above, includes the following steps: Step 1: Before welding the semiconductor electrostatic chuck to the base air duct cover, the operator must first position and fix the workpiece. The fixing plate 505 stably connects the semiconductor electrostatic chuck to the surface, ensuring the chuck does not shift. The mating plate 503 firmly fixes the base air duct cover, ensuring the base cover is accurately aligned with the welding position of the electrostatic chuck. After the servo motor 502 at the front end of the support platform 508 is started, its output drives the adjusting screw 504 to rotate. The surface of the adjusting screw 504 has a threaded engagement structure with the inner wall of the mating plate 503. The rotation of the adjusting screw 504 drives the mating plate 503 to move along the guide rail on the support platform 508. The mating plate 503 then moves the base cover until the electrostatic chuck and the base cover are completely fitted together. The entire mounting box 501 is then... The electrostatic chuck is placed in the vacuum welding box 1, and the welding position of the electrostatic chuck and the base cover plate is placed directly below the electron beam welding head 401. Two electric push rods 509 are installed on both sides of the lower end of the support platform 508. The two ends of the electric push rods 509 are connected to the mounting box 501 and the support platform 508 respectively through the rotating shaft. The control program adjusts the angle of the support platform 508 by controlling the extension and retraction of the two electric push rods 509, so that the support platform 508 swings within a certain range in the mounting box 501. The stepper motor 507 on the rear side of the fixed plate 505 drives the electrostatic chuck and the base cover plate to rotate during the welding process. The rotation of the stepper motor 507 enables the welding points at different positions to be aligned with the welding head in sequence. The swing of the support platform 508 and the rotation of the stepper motor 507 cooperate with each other to meet the requirements of multi-angle welding. Step Two: Before welding begins, the brush plate 406 mounted on one side of the electron beam welding head 401 first contacts the surface of the welding position. The brush plate 406 cleans any impurities that may be present at the welding position. The operator can twist the driving worm gear 7 on the rear side of the brush plate 406. The driving worm gear 7 drives the driven worm wheel 8 to rotate. The worm wheel and worm gear structure has a self-locking characteristic, so the brush plate 406 remains stable in the adjusted position, and the angle of the brush plate 406 will not change unexpectedly. The driven worm wheel 8 drives the guide plate 10 to rotate through the fixed seat 9, and the guide plate 10 drives the brush plate 406 to move. The brush plate 406 is kept in contact with the welding position. The inner wall of the brush plate 406 is equipped with a telescopic rod 407 and a spring 408. The telescopic rod 407 and the spring 408 provide elastic force, which keeps the brush plate 406 in contact with the welding position. The brush plate 406 can slide within the guide plate 10. When there are protrusions or depressions at the welding position, the brush plate 406 can adapt to the shape changes of the surface and maintain a close fit. This structural design ensures that the brush plate 406 can adapt to welding edges with different shapes, ensures that impurities are effectively cleaned, and avoids impurities affecting the subsequent welding quality. Step 3: Impurities removed by the brush plate 406 are collected by the impurity collection head 404 on the front side. The air pump 405 installed on one side of the impurity collection head 404 is activated, and the air pump 405 draws the impurities into the impurity collection head 404. The impurities are stored uniformly inside the collection head. The collection action of the impurity collection head 404 avoids secondary diffusion of impurities and prevents impurities from adversely affecting the welding effect. The preheating electron gun 403 installed on one side of the electron beam welding head 401 preheats the welding position. The preheating effect of the preheating electron gun 403 reduces the thermal stress during the welding process. Preheating not only prevents crack formation but also improves the weld microstructure. A temperature regulator 402 is installed on the upper side of the preheating electron gun 403. The temperature regulator 402 adjusts the output temperature of the preheating electron gun 403 according to the material characteristics of the electrostatic chuck and the base cover plate. After the preheating process is completed, the electron beam welding head 401 performs welding operations on the welding position. The entire welding process is carried out in the order of positioning, cleaning, preheating and welding. The steps are closely connected to ensure the welding quality and reliability of the semiconductor electrostatic chuck and the base gas duct cover plate.
[0026] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.
Claims
1. An electron beam welding device for semiconductor electrostatic chucks and base gas duct covers, characterized in that, include: Vacuum welding box (1), the front end of the vacuum welding box (1) is provided with a support frame (2), the front end of the support frame (2) is provided with a control panel (3), the front end of the vacuum welding box (1) is fixedly connected to the surface of the support frame (2), and the surface of the control panel (3) is fixedly connected to the surface of the support frame (2); The welding preheating mechanism (4) includes an electron beam welding head (401), which is located inside the vacuum welding box (1). The upper end of the electron beam welding head (401) is fixedly connected to the upper end of the inner wall of the vacuum welding box (1). The component welding and fitting mechanism (5) includes a mounting box (501), which is located on the upper end of the support frame (2). The lower end surface of the mounting box (501) is slidably connected to the surface of the support frame (2) through a groove.
2. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 1, characterized in that, The welding preheating mechanism (4) includes: A preheating electron gun (403) is disposed on one side of the electron beam welding head (401). The upper end of the preheating electron gun (403) is fixedly connected to the upper end of the electron beam welding head (401). The moving path of the preheating electron gun (403) is consistent with the moving path of the electron beam welding head (401). Temperature regulator (402) is provided on one side of the preheating electron gun (403). Temperature regulator (402) is fixedly connected to the surface of the preheating electron gun (403). Temperature regulator (402) is used to adjust the heating temperature of the preheating electron gun (403).
3. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 2, characterized in that, The welding preheating mechanism (4) further includes: A brush plate (406) is set on one side of the preheating electron gun (403). A telescopic rod (407) is set on the upper side of the brush plate (406). A spring (408) is sleeved on the surface of the telescopic rod (407). The two ends of the spring (408) are fixedly connected to the two ends of the telescopic rod (407). The lower end of the telescopic rod (407) is fixedly connected to the inner wall of the brush plate (406). An impurity collection head (404) is located on one side of the preheating electron gun (403). An air pump (405) is provided on the outside of the impurity collection head (404). The air pump (405) is fixedly connected to the surface of the impurity collection head (404) and is used to collect the impurities cleaned by the brush plate (406).
4. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 3, characterized in that, Also includes: A guide plate (10) is set on the upper side of the brush plate (406). The surface of the brush plate (406) is slidably connected to the inner wall of the guide plate (10) through a groove. The upper end of the telescopic rod (407) is fixedly connected to the inner wall of the guide plate (10). The fixed seat (9) is set on the upper end of the guide plate (10). The two fixed seats (9) are rotatably connected by a rotating shaft. The two fixed seats (9) are respectively fixedly connected to the upper end of the guide plate (10) and the lower end of the temperature regulator (402).
5. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 4, characterized in that, Also includes: The protective plate (6) is provided with a fixed seat (9) at the rear end. The surface of the protective plate (6) is fixedly connected to the lower surface of the temperature regulator (402). The protective plate (6) is provided with an active worm gear (7) inside. The surface of the active worm gear (7) is rotatably connected to the inner wall of the protective plate (6). The driven worm gear (8) is located inside the protective plate (6). The tooth surface of the driven worm gear (8) is meshed with the tooth surface of the driving worm (7). The driven worm gear (8) is rotatably connected to the inner wall of the protective plate (6). The inner wall of the driven worm gear (8) is fixedly connected to the surface of the shaft connection part of the two fixed seats (9).
6. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 1, characterized in that, The component welding and mating mechanism (5) includes: The support platform (508) is set on the upper side of the mounting box (501). The surface of the support platform (508) is rotatably connected to the inner wall of the mounting box (501). The upper end of the support platform (508) is fixedly connected to a guide rail. The mounting box (501) is slidably connected to the inside of the vacuum welding box (1). The mounting box (501) can be moved to the lower side of the electron beam welding head (401). A fixed plate (505) is set on the upper side of the support platform (508). A connecting plate (506) is provided at the lower end of the fixed plate (505). The surface of the fixed plate (505) is rotatably connected to the surface of the connecting plate (506). The lower end of the connecting plate (506) is fixedly connected to the upper surface of the support platform (508).
7. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 6, characterized in that, The component welding and mating mechanism (5) also includes: The mating plate (503) is located on the opposite side of the connecting plate (506), and the lower end of the mating plate (503) is slidably connected to the upper surface of the support platform (508) via a slide rail; An adjusting screw (504) is positioned between two guide rails. Both ends of the adjusting screw (504) are rotatably connected to the upper surface of the support platform (508) via bearing seats. A servo motor (502) is provided at the front end of the adjusting screw (504). The output end of the servo motor (502) is fixedly connected to the inner wall of the adjusting screw (504). The surface of the servo motor (502) is fixedly connected to the surface of the support platform (508). The inner wall of the mating plate (503) is threadedly connected to the surface of the adjusting screw (504). The inner wall of the connecting plate (506) is rotatably connected to the surface of the adjusting screw (504).
8. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 6, characterized in that, The component welding and mating mechanism (5) also includes: A stepper motor (507) is disposed on the rear side of the connecting plate (506). The surface of the stepper motor (507) is fixedly connected to the surface of the connecting plate (506), and the output end of the stepper motor (507) is fixedly connected to the inner wall of the fixed plate (505). A support shaft (510) is provided at the lower end of the support platform (508). The middle surface of the support shaft (510) is fixedly connected to the lower end of the support platform (508), and both ends of the support shaft (510) are rotatably connected to the inner wall of the placement box (501).
9. The electron beam welding equipment for semiconductor electrostatic chuck and base gas duct cover plate according to claim 8, characterized in that, The component welding and mating mechanism (5) also includes: Electric push rods (509) are respectively set on both sides of the support shaft (510). Both ends of the electric push rods (509) are rotatably connected to the opposite side surfaces of the support platform (508) and the mounting box (501) through the rotating shaft.
10. A method for using an electron beam welding apparatus for semiconductor electrostatic chucks and base gas duct covers, comprising using an electron beam welding apparatus for semiconductor electrostatic chucks and base gas duct covers as described in any one of claims 1-9, characterized in that, Includes the following steps: Step 1: The fixed plate (505) connects the semiconductor electrostatic chuck to the surface, the mating plate (503) fixes the base air passage cover plate, the output end of the servo motor (502) at the front end of the bearing platform (508) drives the adjusting screw (504) to rotate, the surface of the adjusting screw (504) is threaded with the inner wall of the mating plate (503), the rotation of the adjusting screw (504) drives the mating plate (503) to move along the guide rail, the entire placement box (501) is sent into the vacuum welding box (1), the two ends of the electric push rods (509) on both sides of the lower end of the bearing platform (508) are connected to the placement box (501) and the bearing platform (508) through the rotating shaft, the electric push rods (509) extend and retract to adjust the angle of the bearing platform (508), the output end of the stepper motor (507) on the rear side of the fixed plate (505) is connected to the fixed plate (505), the stepper motor (507) drives the electrostatic chuck and the base cover plate to rotate; Step 2: The brush plate (406) is installed on one side of the electron beam welding head (401). The brush plate (406) contacts the surface of the welding position. The active worm gear (7) on the back side of the brush plate (406) drives the driven worm wheel (8) to rotate. The driven worm wheel (8) drives the guide plate (10) to rotate through the fixed seat (9). The guide plate (10) drives the brush plate (406) to move. A telescopic rod (407) is installed on the inner wall of the brush plate (406). A spring (408) is sleeved on the surface of the telescopic rod (407). The lower end of the telescopic rod (407) is fixedly connected to the inner wall of the brush plate (406). The telescopic rod (407) and the spring (408) provide elastic force. The brush plate (406) is slidably connected to the inner wall of the guide plate (10) through the slide groove. The brush plate (406) slides in the guide plate (10). Step 3: The impurity collection head (404) is set in front of the brush plate (406). An air pump (405) is set on the outside of the impurity collection head (404). The air pump (405) is fixedly connected to the surface of the impurity collection head (404). The air pump (405) sucks the impurities into the impurity collection head (404). Step 4: The preheating electron gun (403) is set on one side of the electron beam welding head (401). The upper end of the preheating electron gun (403) is fixedly connected to the upper end of the electron beam welding head (401). The temperature regulator (402) is set on one side of the preheating electron gun (403). The temperature regulator (402) is fixedly connected to the surface of the preheating electron gun (403). The temperature regulator (402) adjusts the heating temperature of the preheating electron gun (403).