Integrated forming method and system, control device, storage medium, and program product

Abstract

This disclosure relates to an integrated molding method and system, control device, storage medium, and program product. The method includes: constructing a composite material, wherein the composite material comprises a photosensitive resin, a photoinitiating component, and a polymerization inhibitor; establishing a three-dimensional digital model of a target component; selectively exposing the composite material in a target area using a first-band light to excite the photoinitiating component in the composite material to perform preliminary curing or structural construction of the three-dimensional digital model; auxiliaryly exposing the target area using a second-band light to excite the polymerization inhibitor component in the composite material to inhibit or weaken the polymerization behavior of the target area; and modulating the light intensity distribution of the first-band light and the second-band light based on a preset light field distribution model to achieve integrated molding of the three-dimensional digital model. This disclosure achieves bidirectional modulation of the material curing behavior, balancing molding integrity and geometric accuracy.

Description

Technical Field

[0001] This disclosure relates to the fields of additive manufacturing and optical modulation technology, and in particular to an integrated forming method and system, control device, storage medium and program product. Background Technology

[0002] Most DLP (Digital Light Processing) / SLA (Stereo Lithography Appearance) photopolymerization additive manufacturing technologies use single-wavelength exposure or a single polymerization mechanism to complete the forming process. The forming boundary is mainly determined by the polymerization dose and the curing energy used, making it difficult to achieve coordinated control of full bulk curing and inhibited curing in specific areas during the same exposure process. Summary of the Invention

[0003] Research has revealed that for thin-walled curved parts such as dental veneers and contact lenses, locally recessed structures, and components requiring precise control of surface curing boundaries, related technologies typically rely on layer-by-layer stacking, support assistance, post-processing shaping, or multi-step exposure. This results in technical problems such as low forming efficiency, obvious layer textures, large interface errors, difficulty in support removal, and poor morphological consistency.

[0004] In view of at least one of the above technical problems, this disclosure provides an integrated molding method and system, control device, storage medium and program product, which adopts multi-wavelength modulation, using one wavelength mainly responsible for initiating polymerization and another wavelength mainly responsible for inhibiting polymerization or adjusting the concentration of active intermediates, thereby realizing bidirectional modulation of the material curing behavior, which can take into account both molding integrity and geometric accuracy.

[0005] According to one aspect of this disclosure, an integrated molding method is provided, comprising: constructing a composite material, wherein the composite material includes a photosensitive resin, a photoinitiating component, and a polymerization inhibitor; establishing a three-dimensional digital model of a target component; selectively exposing the composite material in a target area with a first-band light to excite the photoinitiating component in the composite material, and performing preliminary curing or structural construction according to the three-dimensional digital model; assistedly exposing the target area with a second-band light to excite the polymerization inhibitor in the composite material, thereby inhibiting or weakening the polymerization behavior of the target area; and modulating the light intensity distribution of the first-band light and the second-band light based on a preset light field distribution model to achieve integrated molding of the three-dimensional digital model.

[0006] In some embodiments of this disclosure, establishing a three-dimensional digital model of the target component includes: extracting the geometric parameters of the target component, wherein the geometric parameters include at least one of curvature, thickness, diameter, height distribution, boundary profile, total length, total width, base thickness, stripe period, height difference between peaks and troughs, number of stripes, width of central platform, width of side channel units, and spacing between adjacent channels.

[0007] In some embodiments of this disclosure, the selective exposure step and the auxiliary exposure step include: establishing a mapping relationship between the polymerization height and grayscale of the composite material under first-band light irradiation, and a mapping relationship between the polymerization inhibition height and grayscale under second-band light irradiation; establishing a correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution based on the mapping relationship between the polymerization height and grayscale, and the mapping relationship between the polymerization inhibition height and grayscale; and generating a first-band polymerization exposure pattern and a second-band polymerization inhibition exposure pattern based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution.

[0008] In some embodiments of this disclosure, the selective exposure step and the auxiliary exposure step further include: converting the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images into binary images; controlling the same digital micromirror device to alternately load the binary images of the first band aggregation exposure pattern and the second band inhibition exposure pattern according to a preset timing sequence, and synchronously controlling the corresponding first band light source and second band light source to turn on in sequence, with the first band light and the second band light alternately acting on the same area.

[0009] In some embodiments of this disclosure, converting the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images to binary images includes: using frequency modulation or ordered dithering matrix to convert the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images to binary images, mapping spatial grayscale information to duty cycle or pulse distribution in the time domain.

[0010] In some embodiments of this disclosure, the modulation of the light intensity distribution of the first band light and the second band light based on a preset light field distribution model to achieve the integrated forming of the three-dimensional digital model includes: by setting different exposure durations, switching frequencies, repetition times, and dual-band dose ratios, the target area gradually obtains cumulative polymerization dose and cumulative polymerization inhibition dose, forming a three-dimensional curing boundary matching the three-dimensional digital model inside the composite material; and cleaning the target component to obtain the integrated target component.

[0011] In some embodiments of this disclosure, the modulation of the light intensity distribution of the first band light and the second band light based on a preset light field distribution model to achieve the integrated forming of the three-dimensional digital model includes: controlling at least one of the exposure time, spatial distribution, switching sequence, light intensity, on-time and repetition number of the first band light and the second band light, as well as the pattern switching of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern, to regulate the polymerization depth, polymerization inhibition depth and three-dimensional curing boundary, thereby achieving integrated control of the geometric structure of the target component.

[0012] In some embodiments of this disclosure, the target component is any one of a thin-walled curved surface component, a partially recessed structure, an undulating curved surface structure, a multi-level channel structure, a plano-convex lens, a contact lens, a dental veneer, and a dental resin structure.

[0013] In some embodiments of this disclosure, the first wavelength light corresponds to the photoinitiating component, and the second wavelength light corresponds to the polymerization inhibitor component.

[0014] In some embodiments of this disclosure, the first band is 460 nm and the second band is 365 nm.

[0015] In some embodiments of this disclosure, the photoinitiating component includes camphorquinone and ethyl p-dimethylaminobenzoate.

[0016] In some embodiments of this disclosure, the polymerization inhibitory component includes at least one of butyl nitrite, tetraethylthiuram disulfide, and o-chlorohexaaryldiimidazole.

[0017] In some embodiments of this disclosure, the photosensitive resin includes at least one of bisphenol A glycerol dimethacrylate, triethylene glycol dimethacrylate, urethane dimethacrylate, trimethylolpropane trimethacrylate, trimethylolpropane triacrylate, and ethoxylated bisphenol A diacrylate.

[0018] According to another aspect of this disclosure, a control device is provided, comprising: a material construction module configured to construct a composite material, wherein the composite material includes a photosensitive resin, a photoinitiating component, and a polymerization inhibitor; a model building module configured to build a three-dimensional digital model of a target component; a first control module configured to selectively expose the composite material in a target area using a first wavelength of light to excite the photoinitiating component in the composite material and perform preliminary curing or structural construction according to the three-dimensional digital model; a second control module configured to assist in exposing the target area using a second wavelength of light to excite the polymerization inhibitor in the composite material and inhibit or weaken the polymerization behavior of the target area; and a modulation module configured to modulate the light intensity distribution of the first wavelength of light and the second wavelength of light based on a preset light field distribution model to achieve integrated forming of the three-dimensional digital model.

[0019] According to another aspect of this disclosure, a control device is provided, comprising: a memory; and a processor coupled to the memory, the processor being configured to execute the integral molding method as described in any of the above embodiments based on instructions stored in the memory.

[0020] According to another aspect of this disclosure, an integrated molding system is provided, comprising: a control device as described in any of the above embodiments; a resin tank and a carrier motion unit configured to accommodate the composite material to be cured and to control the spatial position of the molding substrate or sample.

[0021] In some embodiments of this disclosure, the integrated molding system further includes a multi-wavelength light source unit, wherein the multi-wavelength light source unit includes: a polymerization light source configured to emit first-wavelength light to excite photoinitiating components in the composite material to promote polymerization and curing; and a polymerization inhibitor light source configured to emit second-wavelength light to excite polymerization inhibitor components or regulate active free radical processes.

[0022] In some embodiments of this disclosure, the integrated forming system further includes: a beam combining unit, arranged downstream of the optical path of the multi-wavelength light source unit, configured to combine beams from different wavelength light sources so that the combined beams are emitted along a common optical path; and a common projection modulation unit, disposed in the common optical path, configured to alternately load and modulate the exposure patterns corresponding to each wavelength light according to a preset timing sequence.

[0023] In some embodiments of this disclosure, the integrated molding system further includes a projection optics unit configured to project and focus a multi-wavelength dynamic light field modulated by the common projection modulation unit onto the target area within the resin tank.

[0024] According to another aspect of this disclosure, a computer-readable storage medium is provided that stores computer instructions thereon, which, when executed by a processor, implement the integral molding method as described in any of the above embodiments.

[0025] According to another aspect of this disclosure, a computer program product is provided, including a computer program or instructions that, when executed by a processor, implement the integrated molding method as described in any of the above embodiments.

[0026] This disclosure employs multi-wavelength modulation, using one wavelength primarily responsible for initiating polymerization and another wavelength primarily responsible for inhibiting polymerization or regulating the concentration of active intermediates, thereby achieving bidirectional modulation of the material curing behavior and balancing molding integrity and geometric accuracy. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of this disclosure or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a schematic diagram of some embodiments of the integrated molding method disclosed herein.

[0029] Figure 2 This is a schematic diagram of some other embodiments of the integral molding method disclosed herein.

[0030] Figure 3 This is a schematic diagram of the ultraviolet and visible absorption spectra of the photoinitiator CQ and the polymerization inhibitor BN in some embodiments of this disclosure.

[0031] Figure 4 This is a schematic diagram illustrating the polymerization and polymerization inhibition depth control of dual-light dynamic projection lithography under preferred system and parameter conditions in some embodiments of this disclosure.

[0032] Figure 5 This is a grayscale light intensity mapping diagram for some embodiments of the present disclosure when the maximum light intensity of blue light (460 nm) is 84.9 mW / cm2 and the fixed light intensity of violet light (365 nm) is 0 mW / cm2, and a schematic diagram showing the corresponding relationship between the curing depth of different grayscale values ​​of blue light under an exposure time of 5s.

[0033] Figure 6 This is a grayscale light intensity mapping diagram for some embodiments of this disclosure when the maximum light intensity of violet light (365 nm) is 94.3 mW / cm2 and the fixed light intensity of blue light (460 nm) is 84.9 mW / cm2, and a schematic diagram showing the relationship between the inhibition depth of different grayscale values ​​of violet light under an exposure time of 5s.

[0034] Figure 7 This is a schematic diagram of a binary image obtained by FM modulation of an original 8-bit image in some embodiments of this disclosure.

[0035] Figure 8 This is a schematic diagram illustrating the light intensity comparison of a binary image obtained by modulating an original 8-bit grayscale image with a grayscale value of 96 using 8×8 FM in some embodiments of this disclosure.

[0036] Figure 9 This is a schematic diagram of some embodiments of the control device disclosed herein.

[0037] Figure 10 This is a schematic diagram of the structure of some other embodiments of the control device disclosed herein.

[0038] Figure 11 This is a schematic diagram of some embodiments of the integrated molding system disclosed herein.

[0039] Figure 12 This is a schematic diagram of the three-dimensional design model and structural dimensions of the target lens in some embodiments of this disclosure.

[0040] Figure 13 This is a schematic diagram showing the output of (a) a 460 nm exposure grayscale image and (b) a FM-modulated binary exposure image of the corresponding model in some embodiments of this disclosure.

[0041] Figure 14 This is a schematic diagram of the 365 nm polymerization inhibition binary equivalent grayscale image and the 460 nm polymerization binary equivalent grayscale image of the corresponding model in some embodiments of this disclosure.

[0042] Figure 15 This is a schematic diagram of a physical photograph of a shaped lens in some embodiments of this disclosure.

[0043] Figure 16 This is a comparison diagram of experimental profiles and simulation profiles in some embodiments of this disclosure.

[0044] Figure 17 This is a schematic diagram of the three-dimensional design model and structural dimensions of the contact lens in some embodiments of this disclosure.

[0045] Figure 18 This is a schematic diagram of the 365 nm polymerization inhibition exposure pattern and the 460 nm polymerization exposure pattern generated by the corresponding model in some embodiments of this disclosure.

[0046] Figure 19 This is a schematic diagram of (a) a photograph of a physical contact lens and (b) the test results and cross-sectional profile analysis of the three-dimensional morphology of the contact lens in some embodiments of this disclosure.

[0047] Figure 20The following are three-dimensional design models and structural dimension diagrams of periodic stripe structures in some embodiments of this disclosure.

[0048] Figure 21 This is a schematic diagram of the 365 nm polymerization inhibition pattern and 460 nm polymerization pattern generated by the corresponding model in some embodiments of this disclosure.

[0049] Figure 22 The images shown are physical representations of the undulating structures in some embodiments of this disclosure.

[0050] Figure 23 This is a schematic diagram showing the three-dimensional morphology test results and cross-sectional profile analysis of the periodic stripe structure in some embodiments of this disclosure.

[0051] Figure 24 This is a schematic diagram of the three-dimensional design model and structural dimensions of the multi-level channel structure in some embodiments of this disclosure.

[0052] Figure 25 This is a schematic diagram of the 365 nm polymerization inhibition pattern and 460 nm polymerization pattern of the corresponding model in some embodiments of this disclosure.

[0053] Figure 26 The following are schematic diagrams of (a) a physical image of the multi-level channel structure in some embodiments of this disclosure, (b) the three-dimensional morphology test results, and (cd) the longitudinal cross-sectional profile.

[0054] Figure 27 This is a schematic diagram of the three-dimensional design model and dimensions of the multi-level channel verification structure in the dental resin system in some embodiments of this disclosure.

[0055] Figure 28 This is a schematic diagram of the 365 nm polymerization inhibition pattern and the 460 nm polymerization pattern corresponding to the multi-level channel verification structure in some embodiments of this disclosure.

[0056] Figure 29 The images shown are physical representations of the integrated molding of multi-level channel structures in some embodiments of this disclosure.

[0057] Figure 30 This is a schematic diagram showing the three-dimensional morphology test results and cross-sectional profile analysis of the multi-level channel structure in some embodiments of this disclosure. Detailed Implementation

[0058] The technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit this disclosure or its application or use. All other embodiments obtained by those skilled in the art based on the embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0059] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps set forth in these embodiments do not limit the scope of this disclosure.

[0060] At the same time, it should be understood that, for ease of description, the dimensions of the various parts shown in the accompanying drawings are not drawn according to actual scale.

[0061] Techniques, methods, and equipment known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and equipment should be considered part of the specification.

[0062] In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values.

[0063] It should be noted that similar labels and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be discussed further in subsequent figures.

[0064] The study also revealed that Digital Light Processing (DLP) photopolymerization technology has attracted widespread attention due to its high forming speed, high spatial resolution, and ability to achieve surface exposure. Related technologies in DLP typically employ a single-wavelength light source to excite a photoinitiator, causing the liquid resin to polymerize and solidify within the exposure area, gradually building a three-dimensional structure. However, in a single-wavelength system, the exposure light field can only provide a polymerization-promoting effect, making it difficult to reverse-regulate local polymerization behavior within the same time and space. This results in the final curing boundary being passively determined by energy decay and threshold curing. When the target component is a curved thin-walled, concave, partially hollow, or a structure requiring controlled differences in curing depth, a single polymerization mechanism often struggles to balance forming integrity and geometric accuracy.

[0065] The 8-bit grayscale patterns in related technologies have a low loading frequency on DMD (Digital Micromirror Device) equipment, making it difficult to meet the requirements of microsecond-level, time-sequential, and precise allocation of polymerization and inhibition doses in dual-wavelength synergistic control. This results in the inability to achieve high-precision matching between polymerization inhibition and initiation within the same molding cycle. Furthermore, dental photocurable resins typically contain methacrylate monomers or prepolymers such as BisGMA (bisphenol A glycerol dimethacrylate), TEGDMA (triethylene glycol dimethacrylate), and UDMA (urethane dimethacrylate), and widely employ visible light initiation systems for polymerization and curing. While these materials have a good foundation for dental applications, in single-wavelength photocuring of related technologies, the light field primarily provides polymerization acceleration, making it difficult to reverse-control the curing depth and boundary morphology of local areas during the same exposure process. Therefore, when such dental resin systems are used to prepare verification structures with multi-level heights, local channels, or complex surface morphologies, technical problems such as boundary over-curing, difficulty in adjusting local heights, and insufficient structural consistency may still arise.

[0066] The study also revealed the following technical problems with the related technologies.

[0067] (1) The single-wavelength photopolymerization of related technologies can only promote polymerization in one direction and cannot actively inhibit polymerization in a local area during the same forming process. It is difficult to directly achieve precise boundary control of complex curved surfaces, thin walls, concave surfaces and other structures.

[0068] (2) The layer-by-layer stacking method of related technologies is prone to producing layer textures, step errors and interface defects when preparing curved or thin-walled parts, and often requires additional support and post-processing, increasing the complexity of the process.

[0069] (3) The grayscale projection of related technologies is limited by the loading rate of DMD for multi-depth images, making it difficult to meet the high-speed requirements for exposure sequence, switching time and dose distribution in multi-wavelength coordinated control.

[0070] (4) Related technologies usually separate geometric forming from surface shaping / post-processing, making it difficult to achieve true integrated forming.

[0071] In view of at least one of the above-mentioned technical problems, this disclosure aims to solve the technical problems of limited forming accuracy, difficulty in controlling structural deformation, and insufficient integrated manufacturing capability of multiple materials / multi-performance in existing photopolymerization molding technology, and provides an integrated molding method and system, control device, storage medium, and program product based on dual-wavelength dynamic light field modulation. The present disclosure will be described below through specific embodiments.

[0072] Figure 1The diagram illustrates some embodiments of the integrated molding method of this disclosure. Preferably, this embodiment can be executed by the integrated molding system or the control device of this disclosure. Figure 1 The integral molding method of the embodiment may include at least one of steps 11 to 15.

[0073] In step 11, a composite material is constructed, wherein the composite material comprises a photosensitive resin, a photoinitiating component, and a polymerization inhibitor component.

[0074] In some embodiments of this disclosure, the composite material may be a photocurable resin system that responds to both visible and ultraviolet light wavelengths or a composite resin containing a photocurable resin.

[0075] In some embodiments of this disclosure, the photosensitive resin may be a resin matrix.

[0076] In some embodiments of this disclosure, the photosensitive resin may include at least one of acrylate or methacrylate resins such as BisGMA (bisphenol A glycerol dimethacrylate), TEGDMA (triethylene glycol dimethacrylate), UDMA (urethane dimethacrylate), TMPTMA (trimethylolpropane trimethacrylate), TMPTA (trimethylolpropane triacrylate), and BPAEDA (ethoxylated bisphenol A diacrylate).

[0077] In some embodiments of this disclosure, the photosensitive resin may be a dental light-curing resin.

[0078] In some embodiments of this disclosure, the dental light-curing resin may include methacrylate monomers or prepolymers such as BisGMA (bisphenol A glycerol dimethacrylate), TEGDMA (triethylene glycol dimethacrylate), and UDMA (urethane dimethacrylate).

[0079] In some embodiments of this disclosure, the photoinitiating component (also known as the polymerization initiation system) includes camphorquinone and ethyl p-dimethylaminobenzoate.

[0080] In some embodiments of this disclosure, the content of CQ in the initiation system is 0.2-2 wt%, and the content of EDAB is 0.5-5 wt%.

[0081] In some embodiments of this disclosure, the polymerization inhibitor component (also known as the polymerization inhibitor system) may include at least one of butyl nitrite, tetraethylthiuram disulfide, and o-chlorohexaaryldiimidazole.

[0082] In some preferred embodiments of this disclosure, the polymerization inhibitor may be BN.

[0083] In some embodiments of this disclosure, the content of BN in the polymerization inhibitor system is 0.5-5 wt%.

[0084] In a preferred embodiment, the resin formulation comprises: 100 wt% TMPTA, 0.2 wt% CQ, 0.5 wt% EDAB, and 0.5 wt% BN.

[0085] In another preferred embodiment, the resin formulation comprises: BisGMA and TEGDMA, 100 wt% dental resin matrix, 0.2-2 wt% CQ, 0.5-5 wt% EDAB, and 0.5-5 wt% BN.

[0086] It should be noted that this disclosure is not limited to the specific formulations mentioned above. Any combination of resin / initiator / inhibitor that can respond to the polymerization band and the inhibition band respectively can be used to implement this disclosure.

[0087] In step 12, a three-dimensional digital model of the target component is established.

[0088] In some embodiments of this disclosure, the target component may be any one of a thin-walled curved surface, a partially recessed structure, an undulating curved surface, a multi-level channel structure, a plano-convex lens, a contact lens, a dental veneer, and a dental resin structure.

[0089] In step 13, the composite material in the target area is selectively exposed to light of the first wavelength band to excite the photoinitiating components in the composite material to perform preliminary curing or structural construction of the three-dimensional digital model.

[0090] In step 14, the target area is assisted by exposure to second-band light to excite the polymerization inhibitory component in the composite material and suppress or weaken the polymerization behavior of the target area.

[0091] In some embodiments of this disclosure, the first wavelength light may correspond to the photoinitiating component, and the second wavelength light may correspond to the polymerization inhibitor component.

[0092] In some embodiments of this disclosure, the first band can be 460 nm and the second band can be 365 nm.

[0093] In some embodiments of this disclosure, in preferred systems, 460 nm light mainly corresponds to the CQ (camphorquinone) / EDAB (ethyl p-dimethylaminobenzoate) initiating system, and 365 nm light mainly corresponds to polymerization inhibitor systems such as BN (butyl nitrite), TETD (tetraethylthiuram disulfide) or o-Cl-HABI (o-chlorohexaaryldiimidazole).

[0094] In the embodiments disclosed above, CQ and BN are clearly distinguishable in their corresponding wavelength bands, providing a material basis for dual-wavelength division of labor control.

[0095] In step 15, based on a preset light field distribution model, the light intensity distribution of the first band light and the second band light is modulated to achieve the integrated forming of the three-dimensional digital model.

[0096] The embodiments disclosed above construct a composite material system comprising a photosensitive resin and at least two photoinitiating systems with different spectral response characteristics.

[0097] The embodiments described above can selectively expose the target area using a first wavelength light source to achieve preliminary curing of the material or structural construction.

[0098] The embodiments disclosed above can use a second wavelength light source to assist in the exposure of the target area, and dynamically modulate the light intensity distribution of the first wavelength and the second wavelength based on a preset light field distribution model, so as to achieve precise shaping of the target three-dimensional structure.

[0099] The embodiments disclosed above introduce a frequency modulation (FM) algorithm strategy, which can convert a preset multi-wavelength light field distribution model (multi-bit grayscale pattern) into a binary image sequence that can be loaded at high speed by the projection modulation unit, and realize the alternating projection of the binary image sequence within a microsecond time scale.

[0100] The embodiments disclosed above can adjust the polymerization depth, polymerization inhibition depth and three-dimensional curing boundary of the composite material by synchronously or asynchronously controlling the exposure time, spatial distribution and intensity of the two wavelength light sources, thereby achieving integrated control of the geometric structure of the target component.

[0101] Figure 2 This is a schematic diagram of some other embodiments of the integral molding method of this disclosure. Preferably, this embodiment can be executed by the integral molding system or the control device of this disclosure. This disclosure may include, in addition to... Figure 1 In addition to steps 11 to 12 in the embodiment, it may also include Figure 2 At least one of steps 1 to 9 in the embodiment. Figure 2 The integrated forming method of the embodiment may include steps such as modeling, dual-wavelength exposure pattern generation, high-speed pattern modulation, alternating exposure control, and rapid forming output.

[0102] Figure 1 Step 12 of the embodiment may include Figure 2 At least one step in steps 1 and 2 of the embodiment; Figure 1 Steps 13 and 14 of the embodiment may include Figure 2 At least one of steps 3 to 7 in the embodiment; Figure 1 Step 15 of the embodiment may include Figure 2 At least one of steps 8 to 9 in the embodiment.

[0103] In step 1, a three-dimensional digital model of the target component is established.

[0104] In some embodiments of this disclosure, step 1 may include: using modeling software to create a three-dimensional digital model of the target component.

[0105] In step 2, the geometric parameters of the target component are extracted, wherein the geometric parameters include at least one of the following: curvature, thickness, diameter, height distribution, boundary profile, total length, total width, base thickness, stripe period, height difference between crests and troughs, number of stripes, width of the central platform, width of the two side channel units, and spacing between adjacent channels.

[0106] In some embodiments of this disclosure, step 2 may include: extracting geometric parameters such as curvature, thickness, height distribution, and boundary contour of the structure to be formed, as the basic input for subsequent exposure pattern design.

[0107] In step 3, a mapping relationship between the polymerization height and grayscale of the composite material under the first band of light irradiation and a mapping relationship between the polymerization inhibition height and grayscale under the second band of light irradiation are established.

[0108] In some embodiments of this disclosure, such as Figure 2 As shown, step 3 may include: establishing a mapping relationship between polymerization level and grayscale, and establishing a mapping relationship between polymerization inhibition level and grayscale.

[0109] In some embodiments of this disclosure, step 3 may include: establishing a polymerization height-grayscale mapping relationship of the resin system under 460 nm polymerization light irradiation, and a polymerization inhibition height-grayscale mapping relationship under 365 nm inhibition light.

[0110] In step 4, based on the mapping relationship between polymerization height and grayscale, and the mapping relationship between polymerization inhibition height and grayscale, a correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution is established.

[0111] In some embodiments of this disclosure, such as Figure 2 As shown, step 4 may include: establishing a mapping relationship between the target structure and the dual-band exposure pattern.

[0112] In some embodiments of this disclosure, step 4 may include: establishing a correspondence between the spatial morphology of the target structure and the dual-wavelength exposure dose distribution based on the polymerization height-grayscale mapping relationship of the resin system under 460 nm polymerization light irradiation and the polymerization inhibition height-grayscale mapping relationship under 365 nm inhibition light, thereby realizing the conversion from target geometry to light field control parameters.

[0113] In step 5, based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution, a first-band polymerization exposure pattern and a second-band polymerization inhibition exposure pattern are generated.

[0114] In some embodiments of this disclosure, such as Figure 2 As shown, step 5 may include: outputting a polymerization exposure pattern and a polymerization inhibition exposure pattern.

[0115] In some embodiments of this disclosure, step 5 may include: co-designing the polymerization behavior and polymerization inhibition behavior of the target region based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution.

[0116] In step 6, the first band aggregation exposure pattern and the second band inhibition exposure pattern are converted from multi-bit grayscale images into binary images.

[0117] In some embodiments of this disclosure, such as Figure 2 As shown, step 6 may include: modulating the grayscale image into a binary image using FM.

[0118] In some embodiments of this disclosure, step 6 may include: to meet the requirements of dual-wavelength coordinated control for pattern switching speed and dose distribution accuracy, using FM (Frequency Modulation) or an ordered dithering matrix method, converting the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images into binary images that can be loaded at high speed by DMD, mapping spatial grayscale information into duty cycle or pulse distribution in the time domain, thereby significantly improving the pattern loading frequency while ensuring exposure dose accuracy.

[0119] The inventors discovered through research that dual wavelengths alone are insufficient for precise control because the pattern loading frequency of the DMD varies significantly at different bit depths. The loading frequency is lower when loading an 8-bit grayscale image, while the loading frequency can be significantly increased when loading a 1-bit binary image. For dual-wavelength alternating exposure, if traditional 8-bit grayscale direct projection is still used, it is difficult to simultaneously achieve high temporal resolution and dosage accuracy within a single exposure cycle.

[0120] Therefore, the above embodiments of this disclosure further decompose the grayscale image into a high-speed loadable binary image sequence, and complete the dose accumulation control through frequency modulation.

[0121] The above embodiments of this disclosure propose an integrated forming method and system based on dual-wavelength dynamic light field modulation. By alternately projecting 365 nm blocking light and 460 nm focusing light onto the same DMD, and combining it with an FM modulation strategy to achieve the conversion of grayscale to binary sequence, the integrated exposure design and direct forming of complex structures are realized.

[0122] The embodiments disclosed above fully leverage the high-speed advantage of the DMD in 1-bit pattern loading mode, providing a hardware foundation for dual-wavelength alternating dynamic projection. Related experiments show that after introducing FM modulation in the embodiments of this disclosure, the printing image loading frequency can be significantly increased, thereby meeting the dynamic control requirements of coordinated polymerization inhibition and initiation.

[0123] In step 7, the same digital micromirror device is controlled to alternately load the binary images of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern according to a preset timing sequence, and the corresponding first band light source and second band light source are turned on in sequence, with the first band light and the second band light acting alternately on the same area.

[0124] In some embodiments of this disclosure, such as Figure 2 As shown, step 7 may include: alternating loading of polymerization exposure patterns and polymerization inhibition exposure patterns on the same DMD at a microsecond time scale, acting on the same area.

[0125] In the above embodiments of this disclosure, the first band (e.g., 365 nm) and the second band (e.g., 460 nm) patterns do not need to be projected simultaneously through different spatial channels. Instead, they are preferably loaded and emitted alternately by the same DMD in a time-multiplexed manner, thereby ensuring that the two types of patterns are strictly coaxially aligned in space and act synergistically on the resin system in a preset order and dosage ratio in time.

[0126] In step 8, by setting different exposure durations, switching frequencies, repetition times, and dual-band dose ratios, the target area gradually acquires cumulative polymerization dose and cumulative polymerization inhibition dose, forming a three-dimensional curing boundary inside the composite material (resin) that matches the three-dimensional digital model.

[0127] In some embodiments of this disclosure, such as Figure 2 As shown, step 8 may include: repeating the exposure cycle multiple times to obtain a cumulative polymerization dose and a cumulative polymerization inhibitor dose in the target area, thereby forming the desired three-dimensional curing boundary in the resin in a short time.

[0128] In some embodiments of this disclosure, Figure 2 Step 8 of the embodiment or Figure 1Step 15 of the embodiment may include: controlling at least one of the exposure time, spatial distribution, switching sequence, light intensity, on-time and repetition number of the first band light and the second band light, as well as the pattern switching of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern, so as to adjust the polymerization depth, polymerization inhibition depth and three-dimensional curing boundary of the composite material, thereby realizing the integrated control of the geometric structure of the target component.

[0129] In some embodiments of this disclosure, Figure 2 Step 8 of the embodiment or Figure 1 Step 15 of the embodiment may include: during the actual printing process, by controlling the same DMD to alternately load a 365 nm polymerization inhibition pattern and a 460 nm polymerization pattern according to a preset timing sequence, and synchronously controlling the corresponding wavelength light sources to turn on in sequence, so that the two beams of light alternately act on the same area within a microsecond time scale.

[0130] The embodiments disclosed above employ a dual-wavelength dynamic light field modulation method based on the same DMD, and achieve continuous and high-frequency control of the exposure process through high-speed binary map loading. Therefore, it usually does not need to rely on the traditional layer-by-layer stacking method, which helps to achieve integrated rapid prototyping of the target structure.

[0131] In step 9, the target component is removed and cleaned to obtain an integrated target component.

[0132] In the preferred embodiments of this disclosure, the entire exposure forming process can be completed in a very short time, preferably not exceeding 1 minute, and more preferably controlled in the tens of seconds range. Compared with the traditional layer-by-layer photopolymerization method, the above embodiments of this disclosure can not only achieve precise boundary control of complex curved surfaces, thin walls, or locally uneven structures, but also significantly shorten the forming cycle, improve manufacturing efficiency and structural consistency, thus having obvious advantages in rapid prototyping.

[0133] The embodiments disclosed above employ a multi-wavelength modulation approach. Taking dual-wavelength modulation as an example, one wavelength is primarily responsible for initiating polymerization, while the other wavelength is primarily responsible for inhibiting polymerization or regulating the concentration of active intermediates, thereby achieving bidirectional modulation of the material's curing behavior. In the embodiments disclosed above, the two wavelengths need to be matched to the absorption characteristics of different photochemical components and achieve precise synergy in both the temporal and spatial domains.

[0134] The following specific embodiments verify the dual-wavelength system, adjustable polymerization and inhibition depth, and FM modulation disclosed herein.

[0135] 1. Feasibility verification of the dual-wavelength system.

[0136] To verify the feasibility of the dual-wavelength system used in this disclosure in integrated molding, a photocurable resin system with dual-wavelength response characteristics was first constructed. Preferably, TMPTA was selected as the resin matrix, CQ / EDAB was used to construct a polymerization initiation system in the 460 nm band, and BN was used to construct a polymerization inhibition system in the 365 nm band. TMPTA, as a polymerizable monomer, provides the main material basis for the subsequent molded structure; the CQ / EDAB system can effectively generate active free radicals under 460 nm light irradiation, thereby initiating resin polymerization and curing; BN exhibits an inhibitory effect on the polymerization process under 365 nm light irradiation, used to achieve reverse control of the curing boundary. Through the above material combination, both polymerization-promoting and polymerization-inhibiting control mechanisms can be introduced simultaneously into the same resin system, providing a material basis for the implementation of the dual-wavelength synergistic molding method of this disclosure.

[0137] Figure 3 This is a schematic diagram of the UV and Visible absorption spectra of the photoinitiator CQ and the polymerization inhibitor BN in some embodiments of this disclosure. To further illustrate that this resin system is suitable for dual-wavelength selective modulation, absorption spectroscopy tests were performed on the key components of the system. Figure 3 The test results show that CQ and BN exhibit good response differentiation within their respective operating wavelengths. The CQ / EDAB system is more suitable for responding to 460 nm polymerization light, while BN is more suitable for responding to 365 nm inhibition light, indicating that the two photochemical processes have good functional separation characteristics in wavelength selection. Therefore, the material system used in this disclosure does not produce an indiscriminate response to the two beams of light, but rather exhibits differentiated behaviors of polymerization promotion and inhibition under different wavelengths, thus providing a reliable photochemical basis for subsequent precise shaping through dual-wavelength dynamic light fields.

[0138] In a specific embodiment of this disclosure, the first wavelength light (preferably 460 nm polymerizing light) primarily serves as the forming drive light source. Because this wavelength light possesses strong penetrating and polymerization-inducing capabilities within the fluid system, it can continuously trigger resin curing in deep regions, thereby forming a deep, penetrating cured region within the fluid. Therefore, the first wavelength light is used to provide the bulk curing dose to the target component. Table 1 is a schematic table of the exposure parameters for the corresponding output model.

[0139] Table 1

[0140] Furthermore, when a second-wavelength light (preferably 365 nm inhibiting light) is introduced and acts synergistically with the first-wavelength light in the same system, polymerization behavior in specific regions, such as near the light incident side, is significantly suppressed. This effectively weakens the continuous curing of the surface or near-surface layer, allowing the cured entity to be formed in a suspended state within the resin. The role of the second-wavelength light is not simply to reduce the overall degree of curing, but to actively regulate the spatial distribution of the polymerization location and curing boundary. This mechanism transforms the forming process from traditional continuous passive curing under a single wavelength into spatially selective curing determined by the combined dosage of multiple wavelengths.

[0141] Figure 4 This is a schematic diagram illustrating the polymerization and polymerization inhibition depth control of dual-light dynamic projection lithography under preferred system and parameter conditions in some embodiments of this disclosure.

[0142] Under a preferred system configuration and parameter conditions, such as Figure 4 As shown, the first wavelength (e.g., 460 nm) can achieve penetration and curing at the tens of millimeters level, demonstrating excellent deep-forming capabilities; while the second wavelength (e.g., 365 nm) can achieve millimeter-level (e.g., approximately 3.5 mm) control of polymerization inhibition depth, thereby effectively suppressing and reconstructing near-surface curing boundaries. Through the synergistic effect of the two, an effective curing region determined by both the polymerization dosage and the polymerization inhibitor dosage can be constructed within the fluid, thereby achieving precise control over the boundary position, surface morphology, and thickness distribution of three-dimensional entities.

[0143] In summary, the multi-wavelength optical field modulation mechanism proposed in this disclosure possesses clear spatial control capabilities: on the one hand, it utilizes the first-band focusing light to provide sufficient driving force for penetration and curing; on the other hand, it utilizes the second-band inhibiting light to effectively constrain the polymerization behavior in specific regions. Through the coordinated design and dynamic control of multi-wavelength optical fields, this disclosure achieves the coupled adjustment of deep polymerization and local inhibition polymerization within the same system, breaking through the limitations of traditional curing methods, thereby realizing the integrated and precise forming of complex components.

[0144] 2. Verification of adjustable polymerization and inhibition depths.

[0145] Figure 5 This is a grayscale light intensity mapping diagram for some embodiments of the present disclosure when the maximum light intensity of blue light (460 nm) is 84.9 mW / cm2 and the fixed light intensity of violet light (365 nm) is 0 mW / cm2, and a schematic diagram showing the corresponding relationship between the curing depth of different grayscale values ​​of blue light under an exposure time of 5s.

[0146] To further verify the precise control capability of the dual-wavelength dynamic light field on the forming boundary in this disclosure, grayscale-intensity-depth calibration experiments were conducted on the 460 nm polymerization light and the 365 nm inhibition light to establish the correspondence between the exposure grayscale and the actual polymerization depth / inhibition depth. This experiment further demonstrates that this disclosure not only achieves dual-wavelength synergistic forming but also enables continuous and predictable adjustment of polymerization and inhibition behaviors through grayscale parameters, thus providing an experimental basis for the subsequent back-calculation of the exposure pattern of the target structure. First, grayscale intensity mapping and curing depth tests were performed on the 460 nm polymerization light. For example... Figure 5 As shown, under the condition of 365 nm blocking light being off, the actual output light intensity of the 460 nm polymerization light at different gray values ​​was calibrated, and the resin curing depth corresponding to different gray values ​​was further measured under a fixed exposure time (e.g., 5 s). Experimental results show that the output light intensity of the 460 nm light monotonically increases with increasing gray value, and its curing depth also gradually increases with increasing gray value, indicating that continuous control of the resin polymerization depth can be achieved by adjusting the gray value distribution of the 460 nm exposure pattern. This result demonstrates that the 460 nm polymerization channel not only provides the bulk curing capability but also possesses good gray value response characteristics, making it a suitable main energy input channel for constructing the target structure's bulk morphology in this disclosure.

[0147] Figure 6 This is a grayscale light intensity mapping diagram for some embodiments of this disclosure when the maximum light intensity of violet light (365 nm) is 94.3 mW / cm2 and the fixed light intensity of blue light (460 nm) is 84.9 mW / cm2, and a schematic diagram showing the relationship between the inhibition depth of different grayscale values ​​of violet light under an exposure time of 5s.

[0148] Based on this, further grayscale intensity mapping and inhibition depth testing were conducted on the 365 nm inhibition light. For example... Figure 6 As shown, under a fixed 460 nm polymerization light condition, the output light intensity corresponding to different gray values ​​of the 365 nm inhibition light was calibrated, and the change in inhibition depth under the corresponding conditions was measured. Experimental results show that as the exposure gray value of 365 nm changes, its output light intensity changes regularly, and the corresponding inhibition depth also exhibits a continuously adjustable characteristic. This result indicates that the 365 nm inhibition channel does not merely have an on / off inhibition effect, but can achieve quantitative control of the inhibition depth through gray-scale modulation, thereby enabling active shaping of the curing boundary position.

[0149] As shown in the above results, in the dual-wavelength system employed in this disclosure, the 460 nm polymerization light provides an adjustable bulk curing depth, while the 365 nm inhibition light provides an adjustable surface or local inhibition depth. Both can achieve a continuous mapping relationship through grayscale parameters. In other words, this disclosure does not rely on a single fixed light intensity for simple exposure, but rather establishes grayscale-intensity-depth calibration relationships for the polymerization channel and inhibition channel respectively, enabling the target structure to be converted into corresponding 460 nm polymerization exposure patterns and 365 nm inhibition exposure patterns. Ultimately, through the synergistic loading of the two types of patterns in the time domain, the expected cumulative polymerization dose and cumulative inhibition dose can be obtained within the resin, thereby forming a controllable three-dimensional curing boundary.

[0150] Therefore, the experiments in this section further verify the feasibility and predictability of the present disclosure in terms of depth control, that is, the polymerization depth can be controlled by a 460 nm grayscale pattern and the polymerization inhibition depth can be controlled by a 365 nm grayscale pattern. After the two are coupled, the forming boundary of complex curved surfaces, thin walls and local concave and convex structures can be precisely controlled, providing a key process foundation for subsequent integrated rapid prototyping.

[0151] 3. FM modulation high-speed loading verification.

[0152] To meet the requirements of dual-wavelength dynamic projection in this disclosure regarding pattern switching frequency and timing control accuracy, an FM modulation strategy is further employed after the exposure pattern is generated to convert the original 8-bit grayscale image into a 1-bit binary image sequence that can be loaded at high speed by the DMD. The basic idea is that instead of directly outputting a single image in multi-bit grayscale form, the grayscale information is discretized into a set of binary patterns arranged in chronological order. By adjusting the frequency of occurrence, spatial distribution, or time duty cycle of the binary patterns per unit time, they are matched with the target dose distribution corresponding to the original grayscale image in terms of cumulative exposure. Thus, without changing the target exposure effect, the high-speed refresh advantage of the DMD in 1-bit pattern loading mode can be fully utilized, providing the necessary hardware support for dual-wavelength inhibition / aggregation synergistic control.

[0153] Table 2

[0154] Table 2 illustrates the loading frequency of images with different bit depths using the current device's DMD. Test results show that, as shown in Table 2, the loading rate of a 1-bit image in pattern mode is significantly higher than that of an 8-bit grayscale image. Specifically, under the current device conditions of this disclosure, the loading frequency of a 1-bit image can reach 9523 Hz, while the loading frequency of an 8-bit grayscale image is approximately 247 Hz, representing an improvement of about 38 times. This result indicates that if traditional 8-bit grayscale images are continued to be directly loaded, the pattern switching rate cannot meet the high-speed synchronous control requirements of the alternating action of 365 nm blocking light and 460 nm focusing light in this disclosure. However, by using a 1-bit binary image sequence, the pattern refresh rate can be significantly improved, enabling the dual-wavelength pattern to complete alternating loading and exposure within a shorter time scale, thereby meeting the microsecond-level, continuous, and dynamic timing control requirements of this disclosure.

[0155] Figure 7 This is a schematic diagram of a binary image obtained by FM modulation of an original 8-bit image in some embodiments of this disclosure.

[0156] In a preferred embodiment of this disclosure, FM modulation is not simply a conversion of grayscale values. Figure 2 Instead of converting the original grayscale image into a single black-and-white image, this method constructs a set of binary sub-patterns with a defined order, redistributing the original grayscale information in the temporal and spatial domains. Specifically, ordered dithering matrices can be recursively used to generate binary patterns of different scales, such as ordered dithering matrices of different orders like 2×2, 4×4, 8×8, and 16×16. In this way, the grayscale levels in the original 8-bit grayscale image are expanded into multiple binary exposure units, which are then output in a predetermined order during subsequent loading. This preserves the exposure dose information corresponding to the original grayscale image while significantly improving pattern loading efficiency. Figure 7 The results show that the original 8-bit grayscale image can be modulated by FM to obtain binary image representations at different scales, verifying the feasibility of this method in terms of grayscale unrolling and high-speed loading.

[0157] Figure 8 This is a schematic diagram illustrating the light intensity comparison of a binary image obtained by modulating an original 8-bit grayscale image with a grayscale value of 96 using 8×8 FM in some embodiments of this disclosure.

[0158] Furthermore, to compare the consistency of exposure effects between the original grayscale image and the binary image after FM modulation, a comparative analysis of the light intensity distribution was conducted on the original 8-bit grayscale image with a grayscale value of 96 and the binary image obtained after 8×8-order FM modulation. The results show that although the binary image only contains two states, on and off, in its instantaneous representation, after spatial-temporal expansion, its equivalent light intensity distribution remains consistent with the target light intensity level corresponding to the original grayscale image. That is, the binary image after FM modulation can achieve approximately equivalent dose output to the original grayscale image in terms of cumulative exposure. Simultaneously, the distribution curves show that the light intensity distribution of the original grayscale image fluctuates significantly overall, while the binary image obtained after FM modulation has a smoother overall distribution and more stable boundary transitions, which is more conducive to fine control of the dose boundary during subsequent dual-wavelength collaborative exposure. Figure 8 The experimental results shown further demonstrate that FM modulation can not only improve the loading speed, but also balance exposure uniformity and dose controllability.

[0159] The results above demonstrate that the FM modulation strategy introduced in this disclosure has a dual function: firstly, by converting an 8-bit grayscale image into a 1-bit binary image sequence, the DMD pattern loading frequency is significantly increased, enabling the device to meet the high-speed alternating exposure conditions required for dual-wavelength dynamic projection; secondly, through an ordered dithering matrix and its recursive generation method, the modulated binary image can maintain the target dose distribution corresponding to the original grayscale image in terms of cumulative exposure, and obtain smoother and more easily controllable light intensity distribution characteristics. Therefore, FM modulation is one of the key technical aspects of this disclosure in achieving dual-wavelength dynamic light field modulation, integrated rapid prototyping, and high-precision boundary control.

[0160] In summary, the integrated forming technology based on multi-wavelength dynamic light field modulation proposed in this disclosure possesses a complete and highly synergistic technical support system. Firstly, at the material response level, the first-band light (e.g., 460 nm polymerization light) and the second-band light (e.g., 365 nm polymerization inhibitor light) play orthogonal and synergistic roles in the photocurable fluid system. The first-band light can effectively penetrate and solidify deeper regions within the fluid, providing the main polymerization dose for the formation of the target structure; the second-band light can precisely suppress polymerization behavior near the incident side or in specific regions, thereby achieving active adjustment of the surface or local solidification boundary. The differentiated responses of different wavelength light fields in the same system constitute the basis for the multi-wavelength specialized control of this disclosure. Secondly, at the process control level, by dynamically adjusting the ratio between the first-band polymerization dose and the second-band polymerization inhibitor dose, the position, thickness, and boundary morphology of the final effective solidification area can be continuously varied. This disclosure overcomes the limitations of relying on fixed light intensity or single exposure conditions for rough shaping. It enables continuous control of spatial inhibition boundaries through precise design of multi-wavelength dose ratios, accurately mapping the three-dimensional geometric requirements of the target structure to corresponding multi-wavelength dynamic exposure parameters. This provides a reliable technological foundation for high-precision shaping of complex curved surfaces, thin walls, and locally uneven interfaces. At the hardware implementation level, this disclosure introduces a frequency modulation (FM) algorithm strategy to convert the original multi-bit grayscale image into a binary image sequence that can be rapidly loaded by a common projection modulation unit (such as a DMD), thereby significantly improving the pattern refresh rate. This approach accurately preserves the target dose distribution information corresponding to the original grayscale image while fully leveraging the high-speed response advantage of the projection modulation device in 1-bit pattern loading mode, enabling continuous switching and coordinated exposure of multi-wavelength exposure patterns within a microsecond timescale. The precise matching of high-speed pattern modulation and dynamic projection capabilities ensures efficient execution of multi-wavelength photochemical responses at the device level. In summary, the integrated forming method and system proposed in this disclosure achieve deep integration on three levels: in terms of materials, spatial decoupling of polymerization promotion and inhibition is achieved by relying on the spectral selectivity of the multi-wavelength system; in terms of process, continuous and controllable adjustment of the curing boundary is achieved by relying on multi-wavelength dosage ratio; and in terms of hardware, the high-speed timing requirements of multi-wavelength dynamic projection are met by relying on FM modulation and time-division alternating loading of the same projection unit. The above three aspects work together to form the core technical barrier for achieving integrated rapid prototyping and high-precision boundary control of complex structures in this disclosure.

[0161] Figure 9 These are schematic diagrams illustrating some embodiments of the control device disclosed herein. For example... Figure 9 As shown, the control device disclosed herein may include at least one of a material construction module 91, a model building module 92, a first control module 93, a second control module 94, and a modulation module 95.

[0162] Material construction module 91 is configured to construct a composite material, wherein the composite material includes a photosensitive resin, a photoinitiating component, and a polymerization inhibitor.

[0163] In some embodiments of this disclosure, the photoinitiating component includes camphorquinone and ethyl p-dimethylaminobenzoate.

[0164] In some embodiments of this disclosure, the polymerization inhibitor may include at least one of butyl nitrite, tetraethylthiuram disulfide, and o-chlorohexaaryldiimidazole.

[0165] In some embodiments of this disclosure, the photosensitive resin may include at least one of bisphenol A glycerol dimethacrylate, triethylene glycol dimethacrylate, urethane dimethacrylate, trimethylolpropane trimethacrylate, trimethylolpropane triacrylate, and ethoxylated bisphenol A diacrylate.

[0166] In some embodiments of this disclosure, the material construction module 91 may be configured to extract geometric parameters of the target component, wherein the geometric parameters may include at least one of curvature, thickness, diameter, height distribution, boundary profile, total length, total width, substrate thickness, stripe period, height difference between crests and troughs, number of stripes, width of central platform, width of side channel units, and spacing between adjacent channels.

[0167] Model building module 92 is configured to build a three-dimensional digital model of the target component.

[0168] In some embodiments of this disclosure, the target component may be any one of a thin-walled curved surface, a partially recessed structure, an undulating curved surface, a multi-level channel structure, a plano-convex lens, a contact lens, a dental veneer, and a dental resin structure.

[0169] The first control module 93 is configured to selectively expose the composite material in the target area with light of the first wavelength band, thereby exciting the photoinitiating components in the composite material to perform preliminary curing or structural construction of the three-dimensional digital model.

[0170] The second control module 94 is configured to provide auxiliary exposure to the target area using second-band light, thereby stimulating the polymerization inhibitory components in the composite material and suppressing or weakening the polymerization behavior of the target area.

[0171] In some embodiments of this disclosure, the first wavelength light may correspond to the photoinitiating component, and the second wavelength light may correspond to the polymerization inhibitor component.

[0172] In some embodiments of this disclosure, the first band can be 460 nm and the second band can be 365 nm.

[0173] In some embodiments of this disclosure, the first control module 93 and the second control module 94 can be configured to establish a mapping relationship between the polymerization height and grayscale of the composite material under first-band light irradiation, and a mapping relationship between the polymerization inhibition height and grayscale under second-band light irradiation; establish a correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution based on the mapping relationship between the polymerization height and grayscale, and the mapping relationship between the polymerization inhibition height and grayscale; and generate a first-band polymerization exposure pattern and a second-band polymerization inhibition exposure pattern based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution.

[0174] In some embodiments of this disclosure, the first control module 93 and the second control module 94 may also be configured to convert the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images into binary images; control the same digital micromirror device to alternately load the binary images of the first band aggregation exposure pattern and the second band inhibition exposure pattern according to a preset timing sequence, and synchronously control the corresponding first band light source and second band light source to turn on in sequence, with the first band light and the second band light acting alternately on the same area.

[0175] In some embodiments of this disclosure, the first control module 93 and the second control module 94, when converting the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images to binary images, can be configured to use frequency modulation or ordered dithering matrix to convert the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images to binary images, mapping spatial grayscale information to duty cycle or pulse distribution in the time domain.

[0176] The modulation module 95 is configured to modulate the light intensity distribution of the first band light and the second band light based on a preset light field distribution model, so as to realize the integrated forming of the three-dimensional digital model.

[0177] In some embodiments of this disclosure, the modulation module 95 can be configured to gradually acquire a cumulative polymerization dose and a cumulative polymerization inhibition dose in the target area by setting different exposure durations, switching frequencies, repetition times, and dual-band dose ratios, thereby forming a three-dimensional curing boundary inside the composite material that matches the three-dimensional digital model; and to perform part removal and cleaning on the target component to obtain an integrated target component.

[0178] In some embodiments of this disclosure, the modulation module 95 can be configured to control at least one of the following: exposure time, spatial distribution, switching sequence, light intensity, turn-on time and number of repetitions of the first band light and the second band light, as well as the pattern switching of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern, so as to regulate the polymerization inhibition depth, polymerization depth and three-dimensional curing boundary, thereby realizing the integrated control of the geometric structure of the target component.

[0179] In some embodiments of this disclosure, the control device may also be configured to perform any of the embodiments described above. Figures 1 to 2 The integrated molding method described in any embodiment.

[0180] Figure 10 This is a schematic diagram of the structure of some embodiments of the control device of this disclosure. For example... Figure 10 As shown, the control device includes a memory 81 and a processor 82.

[0181] Memory 81 is used to store instructions, and processor 82 is coupled to memory 81. Processor 82 is configured to execute instructions stored in memory to implement any of the above embodiments of this disclosure. Figures 1 to 2 The integrated molding method described in any embodiment.

[0182] like Figure 10 As shown, the control device also includes a communication interface 83 for exchanging information with other devices. Additionally, the control device includes a bus 84, through which the processor 82, communication interface 83, and memory 81 communicate with each other.

[0183] The memory 81 may include high-speed RAM, and may also include non-volatile memory, such as at least one disk drive. The memory 81 may also be a memory array. The memory 81 may also be divided into blocks, and these blocks may be combined into virtual volumes according to certain rules.

[0184] Furthermore, processor 82 may be a central processing unit (CPU), an application-specific integrated circuit (ASIC), or one or more integrated circuits configured to implement embodiments of the present disclosure.

[0185] Figure 11 These are schematic diagrams illustrating some embodiments of the integrated molding system disclosed herein. For example... Figure 11 As shown, the integrated molding system disclosed herein may include at least one of a control device 124, a resin tank 118, and a carrier motion unit 120.

[0186] The control device 124 can be any of the embodiments described above (e.g., Figure 9 or Figure 10The control device described in the embodiment).

[0187] In some embodiments of this disclosure, the control device 124 can be configured to generate exposure patterns corresponding to each band (such as a first band aggregation exposure pattern and a second band inhibition exposure pattern) based on the target three-dimensional model, and convert them into a binary image sequence that can be loaded at high speed through a frequency modulation (FM) algorithm, etc.; at the same time, it is used to synchronously control the switching timing, light intensity, exposure time of each band light source and the pattern switching of the common projection modulation unit.

[0188] The resin tank 118 and the carrier motion unit 120 are configured to accommodate the composite material to be cured and to control the spatial position of the molding substrate or sample.

[0189] In some embodiments of this disclosure, the composite material may be a photocurable fluid.

[0190] In some embodiments of this disclosure, such as Figure 11 As shown, the integrated molding system may further include a multi-wavelength light source unit, wherein the multi-wavelength light source unit may include light sources 102, 104, 106, and 108.

[0191] Multi-wavelength light source unit is used to provide light fields of various different wavelengths required for shaping.

[0192] In some embodiments of this disclosure, the multi-wavelength light source unit may include: a polymerization light source configured to emit a first wavelength light (e.g., 460 nm) to excite photoinitiating components in the composite material to promote polymerization and curing; and a polymerization inhibitor light source (e.g., 365 nm) configured to emit a second wavelength light to excite polymerization inhibitor components or regulate active free radical processes, thereby inhibiting or weakening polymerization behavior in the target region.

[0193] The integrated forming system disclosed herein can activate or combine other wavelength light sources as needed to achieve synergistic control of multiple photochemical responses.

[0194] In some embodiments of this disclosure, such as Figure 11 As shown, the integrated forming system may further include a beam combining unit 110 and a common projection modulation unit 114.

[0195] The beam combining unit 110 is arranged downstream of the optical path of the multi-wavelength light source unit and is configured to combine beams from different wavelength light sources so that the combined beams are emitted along a common optical path.

[0196] A common projection modulation unit 114 is disposed in the common optical path and is configured to alternately load and modulate the exposure patterns corresponding to each band of light according to a preset timing sequence.

[0197] In some embodiments of this disclosure, such as Figure 11 As shown, the integrated molding system may further include a projection optics unit, which may include a lens 112 and a projection objective lens 116.

[0198] In some embodiments of this disclosure, the projection optics unit is configured to project and focus a multi-wavelength dynamic light field modulated by the common projection modulation unit onto the target region (target forming region) within the resin tank.

[0199] Figure 11 A schematic diagram of the construction of the integrated shaping system for dual-wavelength dynamic optical field modulation disclosed in this paper is provided. Figure 11 In this process, the 365 nm and 460 nm patterns do not need to be projected simultaneously through different spatial channels. Instead, they are preferably loaded and emitted alternately by the same DMD in a time-multiplexed manner, thereby ensuring that the two types of patterns are strictly coaxially aligned in space and act synergistically on the resin system in a preset order and dosage ratio in time.

[0200] This disclosure proposes an integrated three-dimensional forming method and system based on multi-wavelength dynamic optical field modulation. By utilizing the orthogonality of the absorption spectra of photochemical materials and combining it with high-speed binarized pattern projection using the frequency modulation (FM) algorithm, it achieves synergistic control of aggregation and inhibition in space on a microsecond-level timescale, thereby breaking through the limitations of layer-by-layer stacking in related technologies and realizing integrated high-precision direct forming of complex structures.

[0201] The embodiments of this disclosure provide a three-dimensional forming method and system based on multi-wavelength high-speed dynamic light field modulation. Specifically, it relates to a method and system that utilizes multi-wavelength (e.g., a combination of 365 nm and 460 nm) light field co-modulation to convert the grayscale information of the polymerization exposure pattern and polymerization inhibition exposure pattern corresponding to the selected wavelengths into a high-speed loading binary image sequence to achieve volumetric forming. The method and system of the embodiments of this disclosure are applicable to acrylate, methacrylate, dental photocurable resin systems, and composite photocurable resin systems, and are used to achieve integrated rapid prototyping of models such as complex curved surfaces, local channels, multi-level interfaces, or surface morphology structures.

[0202] The embodiments of this disclosure, by introducing a polymerization-inhibiting response component distinct from the polymerization band into the dental resin system, achieve synergistic control of the polymerization and polymerization-inhibiting light fields, thereby verifying the applicability and material scalability of this method to dental light-cured resin systems. Therefore, the embodiments of this disclosure propose an integrated molding method and system capable of achieving synergistic control of polymerization and polymerization inhibition based on dual-wavelength dynamic light field modulation and high-speed pattern loading, to realize high-precision direct molding of complex curved surfaces, thin walls, and local morphological structures.

[0203] The integrated molding method and system of this disclosure will be described below through specific embodiments.

[0204] Example 1. Rapid prototyping of a plano-convex lens.

[0205] This embodiment uses the integrated rapid prototyping of a plano-convex lens as an example to illustrate the integrated molding method based on dual-wavelength dynamic optical field modulation proposed in this disclosure. The preferred resin system used is TMPTA, CQ, EDAB, and BN, wherein TMPTA serves as the resin matrix, CQ / EDAB serves as the polymerization initiation system in the 460 nm band, and BN serves as the polymerization inhibition system in the 365 nm band.

[0206] Figure 12 This is a schematic diagram illustrating the three-dimensional design model and structural dimensions of the target lens in some embodiments of this disclosure. First, a three-dimensional digital model of the target lens is established using modeling software, such as... Figure 12 As shown, the lens is preferably a circular aperture structure with a planar dimension of approximately Φ5.00 mm and a center thickness of approximately 2.00 mm. Based on the three-dimensional geometry of the target lens, parameters such as its aperture, center height, and radial height distribution are extracted as input conditions for subsequent exposure pattern generation. The printer used in this embodiment has a projection resolution of 1920×1080 pixels, a single pixel size of 5 μm, and a single exposure area of ​​9.60 mm × 5.40 mm. A three-dimensional model of the target lens is established within this exposure range. The lens is preferably a circular aperture structure with a diameter of Φ5.00 mm and a center thickness of approximately 2.00 mm, which allows it to be completely arranged within the exposure area.

[0207] After obtaining the target model, the dual-wavelength exposure pattern corresponding to the target lens is solved based on the pre-established 460 nm polymerization height-grayscale mapping relationship and the 365 nm polymerization inhibition height-grayscale mapping relationship. Since the target component in this embodiment is a plano-convex lens, its main morphology is primarily constructed directly by the polymerization light field. Figure 13 This diagram illustrates (a) a 460 nm exposure grayscale image and (b) a binary exposure image after FM modulation, outputting the corresponding model in some embodiments of this disclosure. Therefore, the generated 460 nm exposure pattern is a grayscale distribution map corresponding to the lens projection area, such as... Figure 13 As shown in (a); further, to meet the high-speed loading requirements of the DMD, the 460 nm grayscale image is FM modulated to obtain the corresponding binary exposure image, as shown in (a). Figure 13 As shown in (b).

[0208] at the same time, Figure 14This diagram illustrates the 365 nm polymerization inhibition binary equivalent grayscale image and the 460 nm polymerization binary equivalent grayscale image of the corresponding model in some embodiments of this disclosure. Based on the target structure's requirements for the polymerization inhibition channel, binary equivalent grayscale images of the 365 nm polymerization inhibition exposure pattern and the 460 nm polymerization exposure pattern are generated, as shown below. Figure 14 As shown. In this embodiment, the 365 nm polymerization inhibition pattern is in a closed state, meaning no effective polymerization inhibition exposure is applied to the target area; the 460 nm polymerization pattern corresponds to the main body exposure of the lens area, used to complete the overall forming of the target lens. During the printing process, the same DMD is used to time-division multiplex the dual-wavelength exposure patterns and dynamically project them according to preset exposure parameters.

[0209] Table 3 shows the exposure parameters of the corresponding model output in this embodiment, namely, the number of repetitions is set to 20,000, the 365nm light intensity is set to 0 mW / cm², the 365nm timing retention is 105 μs, the 460nm polymerization light intensity is 84.9 mW / cm², and the 460nm on-time is 250 μs. It can be seen that in this embodiment, the 365nm channel mainly exists as a reserved channel in the system timing control, while the actual forming is mainly completed by the 460nm polymerization channel. A single exposure cycle is approximately 355 μs, corresponding to a theoretical main exposure process duration of approximately 7.1 s. Excluding other auxiliary switching and operation times, the overall forming time is significantly less than 1 minute, demonstrating the integrated rapid prototyping advantage of this disclosure.

[0210] Table 3

[0211] Figure 15 This is a schematic diagram of a physical photograph of a shaped lens in some embodiments of this disclosure. Figure 16 This is a comparison diagram of the experimental profile and the simulated profile in some embodiments of this disclosure. After completing the exposure according to the above pattern and parameters, the corresponding plano-convex lens can be directly obtained, such as... Figure 15 As shown, the obtained sample has a complete overall contour and clear boundaries, and can form a lens structure on the substrate corresponding to the target model. Further comparison between the measured contour and the simulated predicted contour shows that the experimental results and the simulation results are in good agreement, and the overall morphology of the target structure is basically accurately reproduced.

[0212] This embodiment demonstrates that the present disclosure can directly generate a corresponding 460nm polymeric exposure pattern and its FM-modulated binary image based on the three-dimensional geometric model of the target lens, and achieve high-speed dynamic loading and rapid exposure output through the same DMD, thereby completing the integrated forming of the target component in a short time. This embodiment not only verifies the feasibility of the complete technical chain of the present disclosure from target model—exposure pattern—dynamic projection—solid forming, but also shows that the present disclosure can achieve rapid and direct manufacturing of curved optical components without relying on the traditional layer-by-layer stacking method.

[0213] Example 2. Rapid prototyping of an integrated contact lens.

[0214] This embodiment uses the integrated rapid prototyping of contact lenses as an example to illustrate the integrated molding method based on dual-wavelength dynamic light field modulation proposed in this disclosure. The preferred resin system used is TMPTA, CQ, EDAB, and BN, where TMPTA serves as the resin matrix, CQ / EDAB as the polymerization initiation system in the 460 nm band, and BN as the polymerization inhibitor system in the 365 nm band. The printing system uses the same DMD to time-division multiplex the 365 nm polymerization inhibitor pattern and the 460 nm polymerization pattern. The system has a single pixel size of 5 μm, a projection resolution of 1920×1080 pixels, and a single exposure area of ​​9.60 mm × 5.40 mm, which meets the integrated exposure design requirements for millimeter-level contact lens structures.

[0215] First, a three-dimensional digital model of the target contact lens is created using modeling software, and the key geometric parameters of the structure to be formed are extracted. Figure 17 This is a schematic diagram showing the three-dimensional design model and structural dimensions of the contact lens in some embodiments of this disclosure. For example... Figure 17 As shown, the target model is preferably a thin-walled rotationally symmetric structure with an outwardly convex curved surface and an inwardly concave curved surface, with an outer diameter of approximately Φ5 mm, an edge region thickness of approximately 0.50 mm, and a central arc height of approximately 1.50 mm. This structure differs from ordinary solid lenses; it not only requires the formation of a continuous outer surface curvature but also the formation of a concave space internally that matches the target design. Therefore, it better demonstrates the technical advantage of this disclosure in achieving integrated forming of complex thin-walled curved surfaces through dual-wavelength synergistic modulation.

[0216] After obtaining the target model, the dual-wavelength exposure pattern corresponding to the contact lens is solved and generated based on the pre-established 460 nm polymerization height-grayscale mapping relationship and the 365 nm polymerization inhibition height-grayscale mapping relationship. Figure 18 These are schematic diagrams of 365 nm polymerization inhibition exposure patterns and 460 nm polymerization exposure patterns generated by corresponding models in some embodiments of this disclosure. Figure 18As shown, the 460 nm polymerization exposure pattern mainly covers the overall projection area of ​​the lens, providing the polymerization dose required for the formation of the lens's main structure; the 365 nm polymerization inhibition exposure pattern mainly corresponds to the central region or local areas where the curing depth needs to be controlled, suppressing excessive polymerization in that area, thereby actively shaping the inner surface curvature and thickness distribution of the lens. In other words, the 460 nm polymerization channel is responsible for building the solid structure, while the 365 nm polymerization inhibition channel is responsible for correcting the boundaries. The two are spatially superimposed and temporally alternated, jointly determining the final three-dimensional curing contour of the contact lens structure.

[0217] To meet the requirements of dual-wavelength dynamic projection for pattern switching frequency and timing control accuracy, the generated 365 nm inhibition pattern and 460 nm polymerization pattern are further converted into a binary image sequence that can be loaded at high speed by a DMD via FM modulation, and then alternately projected by the same DMD according to a preset timing sequence. Table 4 shows the exposure parameters of the corresponding model output in this embodiment: 20,000 repetitions, 365 nm light intensity of 94.3 mW / cm², 365 nm on-time of 250 μs, 460 nm light intensity of 84.9 mW / cm², and 460 nm on-time of 250 μs. It can be seen that in a complete exposure cycle, the two beams of light act sequentially on the same area, allowing the resin to simultaneously receive both inhibition and polymerization doses in each cycle. Based on the parameters shown in Table 4, the cumulative time for the main exposure alone is approximately 10 s; even considering pattern switching, system response, and auxiliary operation time, the overall forming process can still be controlled within 1 minute, fully demonstrating the integrated rapid prototyping advantages of this disclosure.

[0218] Table 4

[0219] In the actual forming process, the 460 nm polymerizing light first provides sufficient curing driving force for the entire target lens, enabling the convex curved surface and main contour to be established quickly. Simultaneously, the 365 nm inhibiting light locally and inversely constrains the polymerization behavior near the central region, suppressing excessive through-curving in this area, thus allowing the sample to retain the expected concave curvature while forming the whole. Through this synergistic effect of polymerization and inhibition, this disclosure enables the direct formation of a thin-walled contact lens structure with bi-curvature characteristics without the need for traditional layer-by-layer stacking or complex post-processing. Compared to relying solely on 460 nm polymerizing light to construct a solid curved surface structure, this dual-wavelength synergistic approach is more suitable for controlling the curvature of the inner and outer surfaces of the lens, edge thickness, and the spatial morphology of the central region, thus better reflecting the core technical features of this disclosure.

[0220] Figure 19This is a schematic diagram illustrating (a) a photograph of a formed contact lens and (b) the three-dimensional morphology test results and cross-sectional profile analysis of a contact lens in some embodiments of this disclosure. After printing according to the above dual-wavelength pattern and exposure parameters, a physical sample of a contact lens can be directly obtained, such as... Figure 19 As shown in (a). The physical results show that the obtained sample has a complete overall contour, exhibiting obvious thin-walled dome-shaped curved surface characteristics, continuous edges, and no obvious collapse or complete solidification in the central region, thus preliminarily reflecting the design morphology of the target lens. Further, three-dimensional morphology testing and cross-sectional contour analysis were performed on the obtained sample, such as... Figure 19 As shown in (b), the measurement results show that the sample has formed a continuous spatial curved surface profile, and its surface height distribution is consistent with the target design trend. There is a clear height difference between the central region and the edge region, indicating that the dual-wavelength exposure pattern generated by this disclosure can be effectively converted into the corresponding three-dimensional solid structure.

[0221] The three-dimensional morphology test results show that the obtained contact lens sample formed a relatively complete dome-shaped surface within the measurement area, with a smooth and continuous contour curve. This indicates that the resin did not cure randomly during the molding process, but was precisely controlled by a dual-wavelength dynamic light field. Although there may still be slight deviations in local areas due to resin surface tension, edge diffusion, reaction threshold, or post-processing conditions, the overall curvature, maximum height, and edge transition can all reflect the geometric characteristics of the target model well, verifying the practical feasibility of this disclosure on complex thin-walled curved surface components.

[0222] This embodiment demonstrates that the present disclosure can directly generate corresponding 365 nm polymerization inhibition patterns and 460 nm polymerization patterns based on the target model of the contact lens, and achieve high-speed alternating dynamic projection through the same DMD, so that the resin is simultaneously subjected to the synergistic regulation of polymerization promotion and local polymerization inhibition in space, thereby completing the integrated rapid prototyping of the contact lens in a short time.

[0223] Unlike Example 1, which mainly relies on 460 nm focusing light to directly construct a solid curved surface structure, this example achieves the joint shaping of the inner and outer surface curvature and thin-wall boundary of the contact lens through the synergistic modulation of 365 nm blocking light and 460 nm focusing light, which better reflects the technical features of dual-wavelength dynamic light field modulation disclosed in this invention.

[0224] Example 3. Integrated rapid prototyping of undulating surface structures.

[0225] This embodiment uses an integrated rapid prototyping of undulating surface structures as an example to illustrate the ability of this disclosure to directly construct surface microstructures based on dual-wavelength dynamic light field modulation. The preferred resin system used is TMPTA, CQ, EDAB, and BN, where TMPTA serves as the resin matrix, CQ / EDAB as the polymerization initiation system in the 460 nm band, and BN as the polymerization inhibitor system in the 365 nm band. The printing system uses the same DMD to time-division multiplex the 365 nm polymerization inhibitor pattern and the 460 nm polymerization pattern. The system projection resolution is 1920×1080 pixels, with a single pixel size of 5 μm, corresponding to a single exposure area of ​​9.60 mm × 5.40 mm, which can meet the overall exposure design requirements for millimeter-level stripe structures and their surface morphology control.

[0226] First, a three-dimensional digital model of the target periodic stripe structure is established using modeling software, such as... Figure 20 As shown, Figure 20 The following are three-dimensional design models and structural dimension diagrams of periodic stripe structures in some embodiments of this disclosure.

[0227] The model is preferably composed of a rectangular substrate and the periodic undulating contour of its upper surface. Geometric parameters such as the total length, total width, substrate thickness, stripe period, height difference between peaks and troughs, and number of stripes are extracted from the target structure and used as input conditions for subsequent dual-wavelength exposure pattern generation. Unlike the solid lens structure in Example 1 and the thin-walled curved surface structure of the contact lens in Example 2, this embodiment emphasizes the periodic shaping ability of the local contour of the sample's upper surface, making it more suitable for verifying the technical effect of precisely controlling the surface morphology using a focused light field.

[0228] After obtaining the target model, the dual-wavelength exposure pattern is solved and generated based on the pre-established 460 nm polymerization height-grayscale mapping relationship and the 365 nm polymerization inhibition height-grayscale mapping relationship. Specifically, the 460 nm polymerization exposure pattern is preferably set as a uniform exposure pattern covering the entire projection area of ​​the target structure, used to provide the bulk polymerization dose required for substrate forming and overall curing; the 365 nm polymerization inhibition exposure pattern is designed as a striped grayscale pattern arranged periodically in one direction, whose spatial distribution corresponds to the undulating contour of the target surface, used to differentially suppress the polymerization depth in local areas, thereby forming periodic peaks and troughs on the final sample surface. In other words, in this embodiment, the 460 nm polymerization channel is responsible for forming the overall solid foundation, and the 365 nm polymerization inhibition channel is responsible for superimposing spatially selective contour modulation on the solid surface. Through the synergistic effect of the two, a striped structure with a periodically undulating surface can be directly generated.

[0229] Figure 21These are schematic diagrams of 365 nm polymerization inhibition patterns and 460 nm polymerization patterns generated by corresponding models in some embodiments of this disclosure. Figure 21 As shown, to meet the requirements of dual-wavelength dynamic projection for pattern switching frequency and timing control accuracy, the generated 365 nm stripe polymerization inhibition pattern and 460 nm overall polymerization pattern are further converted into a binary image sequence that can be loaded at high speed by a DMD through FM modulation, and then alternately loaded and dynamically projected by the same DMD according to a preset timing sequence. Table 5 shows the exposure parameters of the corresponding model output in this embodiment: 20,000 repetitions, 365 nm light intensity of 94.3 mW / cm², 365 nm on-time of 250 μs, 460 nm light intensity of 84.9 mW / cm², and 460 nm on-time of 250 μs. Thus, in each exposure cycle, the 365 nm polymerization inhibition light and the 460 nm polymerization light act sequentially on the same area, so that the resin locally obtains both polymerization inhibition dose and polymerization dose under the constraint of the periodic stripe pattern, and forms a surface undulation profile corresponding to the target design after multiple repetitions. Based on the above parameters, the cumulative time for the main exposure alone is approximately 10 seconds. Even considering the time for pattern switching, system response, and auxiliary operations, the overall forming process can still be controlled within 1 minute, demonstrating that this disclosure combines surface structure control capabilities with rapid manufacturing advantages.

[0230] Table 5

[0231] In the actual forming process, the 460 nm polymerization light provides a relatively uniform bulk curing dose throughout the target area, allowing the sample to first form a continuous solid substrate. Simultaneously, the 365 nm inhibition light selectively suppresses polymerization behavior in localized areas in a periodic stripe pattern, reducing the effective curing depth in those areas, while areas not inhibited or with weak inhibition maintain a larger curing height. After multiple exposures, the sample surface forms an undulating structure corresponding to the 365 nm inhibition stripes; that is, areas with strong inhibition form troughs, while areas with weak inhibition retain higher peaks. Thus, this embodiment achieves simultaneous construction of the overall substrate and surface microstructure of the sample within a single overall exposure design framework, eliminating the need for additional mold imprinting, secondary etching, or subsequent machining.

[0232] Figure 22The images show physical models of the undulating structures in some embodiments of this disclosure. After printing according to the dual-wavelength pattern and exposure parameters described above, a physical sample with a periodic stripe structure can be directly obtained, as shown in the photograph. The sample has a complete overall outline, a continuous substrate, and obvious periodic undulating stripes on the upper surface, indicating that the 365 nm stripe polymerization inhibition pattern designed in this disclosure can be effectively transformed into an actual spatial outline structure. Furthermore, three-dimensional morphology testing and cross-sectional profile analysis were performed on the obtained sample. The test results show that there are continuous and regular undulations on the sample surface, with a maximum height of approximately 1.7 mm and a height difference between adjacent peaks and valleys on the order of hundreds of micrometers. For example, a height difference of approximately 400 μm can be measured in the test results, indicating that this disclosure can further superimpose surface profile modulation on the order of hundreds of micrometers on a millimeter-scale substrate structure. This result proves that the 365 nm polymerization inhibition channel can not only be used for overall curing boundary position control, but also for the active shaping of surface periodic structures and local morphological details.

[0233] Figure 23 This is a schematic diagram of the three-dimensional morphology test results and cross-sectional profile analysis of the periodic stripe structure in some embodiments of this disclosure. The three-dimensional morphology test results also show that the sample surface exhibits a relatively stable periodic distribution trend, with peak and valley positions basically consistent with the target stripe direction, indicating that the 365 nm polymerization inhibition pattern in this disclosure has good spatial correspondence in controlling the surface morphology. The overall profile can well reflect the design intent of the target structure, verifying the feasibility of this disclosure in the rapid manufacturing of surface functional textures and regularly undulating interfaces. This embodiment shows that this disclosure can directly generate corresponding polymerization inhibition and polymerization patterns based on the target periodic stripe model, and achieve high-speed alternating dynamic projection through the same DMD, so that the resin is simultaneously subjected to the synergistic control of overall polymerization and local periodic polymerization inhibition in space, thereby completing the integrated rapid prototyping of stripe structures with periodically undulating surfaces in a short time. This embodiment further verifies that this disclosure is not only applicable to the direct manufacturing of integral curved surface components and thin-walled cavity structures, but also enables the rapid and direct construction of surface microstructures, periodic textures, and functional interfaces.

[0234] Unlike Example 1, which mainly verified the overall polymerization molding capability, and Example 2, which mainly verified the dual-wavelength collaborative construction capability of thin-walled curved surfaces, this example further demonstrates that the present disclosure can periodically control the local curing depth of the surface through a 365 nm polymerization inhibition pattern, thereby directly obtaining a surface microstructure with a regular undulating contour, which better reflects the extended application value of the present disclosure in the manufacturing of functional surfaces and structural textures.

[0235] Example 4. Integrated rapid prototyping of multi-level channel structures.

[0236] This embodiment uses the integrated rapid prototyping of a multi-level channel structure as an example to illustrate the ability of this disclosure to directly construct complex partition interfaces and multi-level boundaries based on dual-wavelength dynamic optical field modulation. The preferred resin system used is TMPTA, CQ, EDAB, and BN, where TMPTA serves as the resin matrix, CQ / EDAB as the polymerization initiation system in the 460 nm band, and BN as the polymerization inhibitor system in the 365 nm band. The printing system uses the same DMD to time-division multiplex the 365 nm polymerization inhibitor pattern and the 460 nm polymerization pattern. The system projection resolution is 1920×1080 pixels, with a single pixel size of 5 μm, corresponding to a single exposure area of ​​9.60 mm × 5.40 mm, which can meet the requirements of overall exposure design and rapid prototyping of millimeter-level multi-level channel structures.

[0237] First, a three-dimensional digital model of the target multi-level channel structure is established using modeling software, such as... Figure 24 As shown. Figure 24 This is a schematic diagram of the three-dimensional design model and structural dimensions of the multi-level channel structure in some embodiments of this disclosure. The model is preferably a rectangular base structure, with periodically spaced local steps / channel units on both sides of the base edge region, and a continuous platform region in the middle. Geometric information such as the total width, central platform width, width of the channel units on both sides, spacing between adjacent channels, and local depth parameters at different locations are extracted from the target structure. As can be seen from the target cross-sectional view, the local channel depth in this embodiment can be set to multiple different levels, such as 0.05 mm, 0.16 mm, 0.45 mm, 0.70 mm, 0.89 mm, and 1.00 mm, to verify the ability of this disclosure to control the multi-level boundary height and local curing depth in different zones.

[0238] After obtaining the target model, the corresponding dual-wavelength exposure pattern is solved and generated based on the pre-established 460 nm polymerization height-grayscale mapping relationship and the 365 nm polymerization inhibition height-grayscale mapping relationship. Specifically, the 460 nm polymerization exposure pattern is preferably set as a uniform exposure pattern covering the entire projection area of ​​the target structure, used to provide the main polymerization dose required for the formation of the substrate and the overall entity; the 365 nm polymerization inhibition exposure pattern is designed as a strip-shaped pattern distributed along both sides of the sample, whose spatial position corresponds to the target channel area, used to locally weaken and partition the polymerization depth of the corresponding area, thereby forming multiple discretely distributed and depth-adjustable channel units in the final sample. In other words, in this embodiment, the 460 nm polymerization channel is responsible for forming a continuous matrix, and the 365 nm polymerization inhibition channel is responsible for superimposing spatially selective local subtractive boundary control on the continuous matrix, thereby realizing the direct shaping of multi-region and multi-level structural interfaces in the same component. To meet the requirements of dual-wavelength dynamic projection for pattern switching frequency and timing control accuracy, the generated 365 nm polymerization inhibition pattern and 460 nm polymerization pattern are further converted into a pattern using FM modulation. Figure 25 The binary image sequence shown can be loaded at high speed by a DMD, and is alternately loaded and dynamically projected by the same DMD according to a preset time sequence. Figure 25 This diagram illustrates the 365 nm inhibition pattern and 460 nm polymerization pattern of the corresponding model in some embodiments of this disclosure. According to the exposure parameters of the corresponding model output in this embodiment, as shown in Table 6, by repeating each image group 20,000 times, the 365 nm light intensity is 94.3 mW / cm², the 365 nm on-time is 250 μs, the 460 nm light intensity is 84.9 mW / cm², and the 460 nm on-time is 250 μs. Thus, in each exposure cycle, the 365 nm inhibition light and the 460 nm polymerization light sequentially act on the same area, allowing the resin to simultaneously receive both inhibition and polymerization doses locally, forming a multi-level channel structure with different local curing heights and boundary depths after multiple cycles. Based on the above parameters, the cumulative main exposure time is estimated to be approximately 10 s; even considering pattern switching, system response, and auxiliary operation time, the overall forming process can still be controlled within 1 minute, demonstrating the rapid prototyping advantage of this disclosure in the manufacture of complex partitioned structures.

[0239] Table 6

[0240] In the actual forming process, the 460 nm polymerization light provides a relatively uniform bulk curing dose throughout the target area, enabling the sample to first form a continuous overall substrate. Simultaneously, the 365 nm inhibition light selectively suppresses the polymerization behavior in localized areas on both sides in a segmented, block-like manner, reducing the effective curing depth of these areas and thus forming channels or recessed interfaces at corresponding locations. Since different channel positions correspond to different target depths, the spatial distribution, grayscale, or equivalent duty cycle of the 365 nm inhibition pattern can be designed to further achieve differentiated control of the depth of multiple local channels. Therefore, this embodiment can directly form complex structures containing continuous substrates, discrete channels, and multi-level boundaries without layer-by-layer engraving or subsequent machining.

[0241] Figure 26 The figures provided are (a) a physical image of the multi-level channel structure in some embodiments of this disclosure, (b) a schematic diagram of the three-dimensional morphology test results, and (cd) a longitudinal cross-sectional profile. After printing according to the above dual-wavelength pattern and exposure parameters, a physical sample of the multi-level channel structure can be directly obtained. Figure 26 The physical results of experiment a show that the obtained sample has a complete overall outline, a continuous main substrate, and clearly distinguishable channel units on both sides, indicating that the 365 nm partitioned polymerization inhibition pattern designed in this disclosure can be effectively transformed into actual local boundary structures. Furthermore, three-dimensional morphology testing and cross-sectional profile analysis were performed on the obtained sample. The test results show that obvious partitioned steps and local groove structures were formed on the sample surface, with a maximum height of approximately 1.6314 mm. Multiple sets of local height differences could be measured at different locations, indicating that this disclosure can not only complete the overall forming but also achieve the simultaneous construction of interfaces at multiple locations and depths within the same entity. Figure 26 As shown in (bd), the local cross-sectional results also show that the height variation trends of different channel regions of the sample are basically consistent with the target model. The central platform region maintains a high and continuous surface morphology, while the regions on both sides regulated by the polymerization inhibition pattern form discretely distributed concave boundaries, verifying the feasibility of the overall polymerization-local polymerization inhibition synergistic mechanism in this disclosure for complex partitioned structures. Although the transition morphology of individual channel boundaries may differ from the ideal model due to factors such as resin flow, interfacial tension, edge diffusion, and actual reaction threshold, the overall partitioned structure, local channel positions, and multi-level height trends can all reflect the target design requirements well.

[0242] This embodiment demonstrates that the present disclosure can directly generate corresponding 365 nm polymerization inhibition patterns and 460 nm polymerization patterns based on a target multi-level channel model, and achieve high-speed alternating dynamic projection through the same DMD, allowing the resin to be synergistically controlled by both overall polymerization and local polymerization inhibition in space, thereby completing the integrated rapid prototyping of multi-level channel structures in a short time. This embodiment further verifies that the present disclosure is not only applicable to the direct manufacturing of integral curved surfaces, thin-walled cavities, and continuous periodic texture structures, but also enables the rapid and direct construction of partitioned steps, discrete channels, and multi-level interfaces.

[0243] Unlike Example 3, which mainly verified continuous undulating surfaces, this example further demonstrates that the present disclosure can perform partitioned boundary control of local areas through 365 nm polymerization inhibition patterns, thereby directly obtaining discrete channels, multi-level steps, and composite interface structures, and better reflects the expansion capabilities of the present disclosure in the manufacturing of complex functional surfaces and hierarchical structures.

[0244] Example 5: Integrated rapid prototyping of multi-level channel structures in dental resin systems.

[0245] This embodiment uses a multi-channel verification structure in a BisGMA / TEGDMA dental light-curing resin system as an example to illustrate the applicability of this disclosure in dental resin material systems. The preferred resin system used is BisGMA, TEGDMA, CQ, EDAB, and BN, wherein BisGMA and TEGDMA together constitute the dental resin matrix, CQ / EDAB serves as the polymerization initiation system in the 460 nm band, and BN serves as the polymerization inhibitor system in the 365 nm band. Preferably, BisGMA and TEGDMA are mixed in a predetermined ratio to form the resin matrix, and CQ, EDAB, and BN are added. After stirring and degassing in the dark, a dental resin system suitable for dual-wavelength dynamic light field modulation molding is obtained.

[0246] First, a three-dimensional digital model of the target multi-level channel verification structure is established using modeling software, such as... Figure 27 As shown. Figure 27 This is a schematic diagram of the three-dimensional design model and dimensions of a multi-level channel verification structure in the dental resin system of some embodiments of this disclosure. The model is a rectangular base structure with multiple parallel strip-shaped protrusions and channel regions on the base surface. Different regions have different local heights and boundary positions. This structure is not used to simulate specific dental occlusal surfaces or clinical restoration morphology, but rather serves as a process verification model in the dental resin material system to illustrate the adaptability of this disclosure to the BisGMA / TEGDMA dental light-cured resin system, as well as its ability to control multi-level boundaries and local curing depth.

[0247] After obtaining the target model, based on the polymerization behavior of the BisGMA / TEGDMA dental resin system under 460 nm polymerization light irradiation and the polymerization inhibition behavior under 365 nm inhibition light, the dual-wavelength exposure pattern corresponding to the target structure was designed and generated. Figure 28 This is a schematic diagram of the 365 nm polymerization inhibition pattern and the 460 nm polymerization pattern corresponding to the multi-level channel verification structure in some embodiments of this disclosure. For example... Figure 28 As shown, the 365 nm polymerization inhibition pattern is set as a striped pattern corresponding to the target channel region, used to selectively suppress the polymerization depth in the corresponding area; the 460 nm polymerization pattern is set as a uniform exposure pattern covering the entire projected area of ​​the target structure, used to provide the polymerization dose required to form a continuous substrate and main structure. Thus, in the same dental resin system, the 460 nm polymerization light is responsible for forming the overall solid base, while the 365 nm polymerization inhibition light is responsible for spatially selectively adjusting the local channels and multi-level boundaries.

[0248] To meet the requirements of dual-wavelength dynamic projection for pattern switching frequency and timing control accuracy, the generated 365 nm inhibition pattern and 460 nm polymerization pattern are further converted into a binary image sequence that can be loaded at high speed by a DMD via FM modulation. The same DMD then alternately loads and dynamically projects the sequence according to a preset timing. The exposure parameters of the corresponding model output in this embodiment are shown in Table 7: 20,000 repetitions, 365 nm light intensity of 94.3 mW / cm², 365 nm on-time of 250 μs; 460 nm light intensity of 133.6 mW / cm², 460 nm on-time of 250 μs. In each exposure cycle, the 365 nm inhibition light and 460 nm polymerization light sequentially act on the same area, allowing the resin to simultaneously receive both inhibition and polymerization doses locally, forming a cured structure with strip-shaped channels and multi-level height differences after multiple cycles.

[0249] Table 7

[0250] After printing according to the above dual-wavelength pattern and exposure parameters, a multi-level channel structure sample of BisGMA / TEGDMA dental resin can be directly obtained, such as... Figure 29 As shown. Figure 29 This is a physical image of the integrated molding of the multi-level channel structure in some embodiments of this disclosure. The resulting sample has a complete overall outline, and the strip-shaped protrusions and channel areas are clearly distinguishable, indicating that in the BisGMA / TEGDMA dental resin system, the combination of CQ / EDAB and BN can respond to 460 nm polymerization light and 365 nm inhibition light respectively, and support the dual-wavelength dynamic light field modulation molding process described in this disclosure.

[0251] Furthermore, the obtained samples underwent three-dimensional morphology testing and cross-sectional profile analysis, with results as follows: Figure 30 As shown. Figure 30 This diagram illustrates the three-dimensional morphology test results and cross-sectional profile analysis of the multi-level channel structure in some embodiments of this disclosure. The three-dimensional morphology test results show that a distinct multi-level strip structure and local channel boundaries are formed on the sample surface, with distinguishable height differences between different regions. The cross-sectional profile results further show that the raised areas, channel areas, and boundary transition areas of the sample correspond to the target model and the dual-wavelength exposure pattern design, indicating that the 365 nm polymerization inhibition pattern can effectively control the local polymerization depth in the dental resin system.

[0252] This embodiment demonstrates that the sample as a whole exhibits a zoned curing characteristic jointly determined by the 365 nm inhibition pattern and the 460 nm polymerization pattern. This disclosure is applicable not only to general acrylate light-curing resin systems but also to dental light-curing resin systems. By introducing the CQ / EDAB polymerization initiation system and the BN polymerization inhibition system into dental resins, and combining this with the high-speed alternating projection of 365 nm inhibition light and 460 nm polymerization light, the synergistic control of local curing depth, multi-level channels, and surface boundary morphology in dental resin materials can be achieved, further proving that the dual-wavelength dynamic light field modulation method described in this disclosure has good material system scalability.

[0253] According to another aspect of this disclosure, a computer program product is provided, including a computer program or instructions that, when executed by a processor, implement the integrated molding method as described in any of the above embodiments.

[0254] According to another aspect of this disclosure, a computer-readable storage medium is provided that stores computer instructions thereon, which, when executed by a processor, implement the integral molding method as described in any of the above embodiments.

[0255] In some embodiments of this disclosure, the computer-readable storage medium may be a non-transitory computer-readable storage medium.

[0256] The above embodiments of this disclosure propose an integrated molding approach based on dual-wavelength dynamic light field modulation, wherein 460nm light is used to promote polymerization and 365nm light is used to inhibit polymerization, and the two work together to shape the final solidified boundary in the same molding process.

[0257] The embodiments disclosed above can use the same DMD as a common pattern modulation unit to perform time-division multiplexing and alternating loading of 365 nm and 460 nm exposure patterns, thereby achieving high-precision spatial registration of dual-wavelength patterns.

[0258] The embodiments described above propose an FM modulation strategy for converting multi-bit grayscale exposure images into high-speed binary image sequences to address the need for microsecond-level loading frequencies in dual-wavelength collaborative exposure.

[0259] The above embodiments of this disclosure establish a mapping method from target geometry to dual-wavelength exposure patterns and exposure parameters, which can directly output 365 nm polymerization inhibition patterns, 460 nm polymerization patterns and corresponding timing parameters.

[0260] The embodiments disclosed above achieve rapid, integrated, and direct forming of curved, thin-walled, and concave structures that are difficult to obtain using traditional single-wavelength methods by coupling and controlling the polymerization field and the polymerization field.

[0261] Compared with related technologies, the above embodiments of this disclosure have the following significant technical effects.

[0262] (1) The above embodiments of this disclosure can achieve in vivo polymerization and surface / local inhibition of polymerization simultaneously through dual-wavelength synergistic regulation, breaking through the limitation that a single wavelength can only promote curing in one direction.

[0263] (2) The above embodiments of this disclosure use the same DMD for time-division multiplexing projection, which can significantly improve the spatial alignment accuracy of dual-wavelength patterns and reduce system complexity.

[0264] (3) The above embodiments of this disclosure convert an 8-bit grayscale image into a 1-bit binary image sequence by FM modulation, which can significantly improve the pattern loading frequency and enable the device to meet the microsecond-level exposure control requirements.

[0265] (4) The above embodiments of this disclosure can finely control the inhibition depth and polymerization depth by adjusting the light intensity of 365 nm and 460 nm, the on-time and the number of repetitions, so as to achieve complex boundary forming.

[0266] (5) The above embodiments of this disclosure can realize the integrated direct forming of curved thin-walled structures, reduce support dependence and post-processing steps, and improve forming efficiency and dimensional consistency.

[0267] (6) The above embodiments of this disclosure have good material system scalability and can be extended to other acrylic resins and other dual-wavelength responsive polymerization inhibitor / initiator systems.

[0268] Those skilled in the art will understand that embodiments of this disclosure can be provided as methods, apparatus, or computer program products. Therefore, this disclosure can take the form of a completely hardware embodiment, a completely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, this disclosure can take the form of a computer program product embodied on one or more computer-usable non-transitory storage media (including, but not limited to, disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0269] This disclosure is described with reference to flowchart illustrations and / or block diagrams of methods, apparatus (systems), and computer program products according to embodiments of this disclosure. It will be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, create a machine for implementing the flowchart illustrations and / or block diagrams. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0270] These computer program instructions may also be stored in a computer-readable storage medium that can direct a computer or other programmable data processing device to function in a particular manner, such that the instructions stored in the computer-readable storage medium produce an article of manufacture including instruction means, which are implemented in a process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0271] These computer program instructions may also be loaded onto a computer or other programmable data processing equipment to cause a series of operational steps to be performed on the computer or other programmable equipment to produce a computer-implemented process, thereby providing instructions that execute on the computer or other programmable equipment for implementing the process. Figure 1 One or more processes and / or boxes Figure 1 The steps of the function specified in one or more boxes.

[0272] The control device, material building module, model building module, first control module, second control module, and modulation module described above can be implemented as a general-purpose processor, programmable logic controller (PLC), digital signal processor (DSP), application-specific integrated circuit (ASIC), field-programmable gate array (FPGA), or other programmable logic device, discrete gate or transistor logic device, discrete hardware component, or any suitable combination thereof for performing the functions described in this application.

[0273] This concludes the detailed description of the present disclosure. To avoid obscuring the concept of the disclosure, some details known in the art have not been described. Those skilled in the art will fully understand how to implement the technical solutions disclosed herein based on the above description.

[0274] Those skilled in the art will understand that all or part of the steps of the above embodiments can be implemented by hardware, or by a program instructing the relevant hardware to implement them. The program can be stored in a non-transitory computer-readable storage medium, such as a read-only memory, a disk, or an optical disk.

[0275] The description in this disclosure is provided for illustrative and descriptive purposes only and is not intended to be exhaustive or to limit the disclosure to its forms. Many modifications and variations will be apparent to those skilled in the art. The embodiments were chosen and described in order to better illustrate the principles and practical application of this disclosure and to enable those skilled in the art to understand this disclosure and to design various embodiments with various modifications suitable for a particular purpose.

Claims

1. An integral molding method, comprising: Construct a composite material, wherein the composite material comprises a photosensitive resin, a photoinitiating component, and a polymerization inhibitor; Establish a three-dimensional digital model of the target component; The composite material in the target area is selectively exposed by the first band of light to excite the photoinitiating component in the composite material, and then preliminary curing or structural construction is carried out according to the three-dimensional digital model. The target area is assisted by second-band light to excite the polymerization inhibitory component in the composite material, thereby inhibiting or weakening the polymerization behavior of the target area. Based on a preset light field distribution model, the light intensity distribution of the first band light and the second band light is modulated to achieve the integrated forming of the three-dimensional digital model. The selective exposure and the auxiliary exposure include: Establish the mapping relationship between polymerization height and grayscale of the composite material under first-band light irradiation, and the mapping relationship between polymerization inhibition height and grayscale under second-band light irradiation; Based on the mapping relationship between polymerization height and grayscale, and the mapping relationship between polymerization inhibition height and grayscale, a correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution is established. Based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution, a first-band polymerization exposure pattern and a second-band polymerization inhibition exposure pattern are generated.

2. The integrated molding method according to claim 1, wherein, The establishment of the three-dimensional digital model of the target component includes: Extract the geometric parameters of the target component, wherein the geometric parameters include at least one of the following: curvature, thickness, diameter, height distribution, boundary profile, total length, total width, base thickness, stripe period, height difference between crests and troughs, number of stripes, width of central platform, width of side channel units, and spacing between adjacent channels.

3. The integrated molding method according to claim 1 or 2, wherein, The selective exposure and the auxiliary exposure also include: The first band aggregation exposure pattern and the second band inhibition exposure pattern are converted from multi-bit grayscale images into binary images; The same digital micromirror device is controlled to alternately load binary images of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern according to a preset timing sequence, and the corresponding first band light source and second band light source are turned on in sequence, with the first band light and the second band light acting alternately on the same area.

4. The integrated molding method according to claim 3, wherein, The step of converting the first band aggregation exposure pattern and the second band inhibition exposure pattern from multi-bit grayscale images to binary images includes: By employing frequency modulation or ordered dithering matrix methods, the first band aggregation exposure pattern and the second band blocking exposure pattern are converted from multi-bit grayscale images into binary images, and the spatial grayscale information is mapped to the duty cycle or pulse distribution in the time domain.

5. The integrated molding method according to claim 1 or 2, wherein, The modulation of the light intensity distribution of the first and second bands of light based on a preset light field distribution model to achieve the integrated forming of the three-dimensional digital model includes: By setting different exposure durations, switching frequencies, repetition times, and dual-band dose ratios, the target area gradually acquires cumulative polymerization dose and cumulative polymerization inhibition dose, forming a three-dimensional curing boundary inside the composite material that matches the three-dimensional digital model. The target component is removed and cleaned to obtain an integrated target component.

6. The integrated molding method according to claim 1 or 2, wherein, The modulation of the light intensity distribution of the first and second bands of light based on a preset light field distribution model to achieve the integrated forming of the three-dimensional digital model includes: Controlling at least one of the following: exposure time, spatial distribution, switching sequence, light intensity, on-time and repetition count of the first and second band light, as well as the pattern switching of the first band polymerization exposure pattern and the second band polymerization inhibition exposure pattern, to regulate the polymerization depth, polymerization inhibition depth and three-dimensional curing boundary, thereby achieving integrated control of the geometric structure of the target component.

7. The integral molding method according to claim 1 or 2, wherein, The target component is any one of the following: thin-walled curved surface component, locally recessed structure, undulating curved surface structure, multi-level channel structure, plano-convex lens, contact lens, dental veneer, and dental resin structure.

8. The integral molding method according to claim 1 or 2, wherein: The first wavelength corresponds to the photoinitiating component, and the second wavelength corresponds to the polymerization inhibitor component; The first band is 460 nm, and the second band is 365 nm; The photoinitiating component includes camphorquinone and ethyl p-dimethylaminobenzoate; The polymerization inhibitory component includes at least one of butyl nitrite, tetraethylthiuram disulfide and o-chlorohexaaryldiimidazole; The photosensitive resin includes at least one of bisphenol A glycerol dimethacrylate, triethylene glycol dimethacrylate, urethane dimethacrylate, trimethylolpropane trimethacrylate, trimethylolpropane triacrylate, and ethoxylated bisphenol A diacrylate.

9. A control device, comprising: A material construction module is configured to construct a composite material, wherein the composite material includes a photosensitive resin, a photoinitiating component, and a polymerization inhibitor component; The model building module is configured to build a three-dimensional digital model of the target component; The first control module is configured to selectively expose the composite material in the target area with light of the first wavelength band, excite the photoinitiating component in the composite material, and perform preliminary curing or structural construction according to the three-dimensional digital model. The second control module is configured to perform auxiliary exposure of the target area using second-band light to excite the polymerization inhibitory component in the composite material and inhibit or weaken the polymerization behavior of the target area. The modulation module is configured to modulate the light intensity distribution of the first band light and the second band light based on a preset light field distribution model, so as to realize the integrated forming of the three-dimensional digital model. The first control module and the second control module are configured to establish a mapping relationship between the polymerization height and grayscale of the composite material under first-band light irradiation, and a mapping relationship between the polymerization inhibition height and grayscale under second-band light irradiation; establish a correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution based on the mapping relationship between the polymerization height and grayscale, and the mapping relationship between the polymerization inhibition height and grayscale; and generate a first-band polymerization exposure pattern and a second-band polymerization inhibition exposure pattern based on the correspondence between the spatial morphology of the target structure and the dual-band exposure dose distribution.

10. A control device, comprising: Memory; as well as A processor coupled to the memory, the processor being configured to execute the integral molding method as described in any one of claims 1 to 8 based on instructions stored in the memory.

11. An integrated molding system, comprising: The control device as described in claim 10 or 9; The resin tank and the supporting motion unit are configured to accommodate the composite material to be cured and to control the spatial position of the molding substrate or sample.

12. The integrated molding system according to claim 11 further includes a multi-wavelength light source unit, wherein, The multi-wavelength light source unit includes: A polymerization light source is configured to emit light in a first wavelength band to excite the photoinitiating component in the composite material to promote polymerization and curing; and The polymerization inhibitor light source is configured to emit second-band light to excite the polymerization inhibitor component or modulate the active free radical process.

13. The integrated molding system according to claim 12 or 11, further comprising: The beam combining unit is located downstream of the optical path of the multi-wavelength light source unit and is configured to combine beams from different wavelength light sources so that the combined beam is emitted along a common optical path. A common projection modulation unit is disposed in the common optical path and is configured to alternately load and modulate the exposure patterns corresponding to each wavelength light according to a preset timing sequence.

14. The integrated molding system according to claim 13, further comprising: The projection optics unit is configured to project and focus the multi-wavelength dynamic light field modulated by the common projection modulation unit onto the target area within the resin tank.

15. A computer-readable storage medium having stored thereon computer instructions that, when executed by a processor, implement the integral molding method as described in any one of claims 1 to 8.

16. A computer program product comprising a computer program or instructions that, when executed by a processor, implement the integral molding method as described in any one of claims 1 to 8.

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