Adjustable evaporation source and evaporation machine

Abstract

The application provides an adjustable evaporation source and an evaporation machine. The adjustable evaporation source comprises an evaporation chamber, a cover plate assembly and an adjusting mechanism. The evaporation chamber comprises a wall part and an evaporation cavity. The wall part is provided with an opening and a heating element, and the evaporation cavity is communicated with the opening. The cover plate assembly is in sliding fit with the evaporation chamber and comprises a plate body and a nozzle. The nozzle is arranged on the plate body and is provided with a nozzle opening. The adjusting mechanism is connected with the cover plate assembly and comprises a first guide element, a second guide element and a connecting element. The first guide element and the second guide element are arranged in cross. The first guide element is provided with a first guide groove along the length direction of the first guide element. The second guide element is provided with a second guide groove along the length direction of the second guide element. The connecting element is arranged on the cover plate assembly and is in sliding fit with the first guide groove and the second guide groove respectively. The adjustable evaporation source can adjust the position of the nozzle opening, so as to flexibly adjust the dispersion range of the evaporation material.

Description

Technical Field

[0001] This application belongs to the field of vapor deposition technology, and particularly relates to an adjustable vapor deposition source and vapor deposition machine. Background Technology

[0002] The vapor deposition machine is equipped with a vapor deposition head, which is used to evaporate the coating material and diffuse the evaporated coating material onto the substrate. The vapor deposition head includes a vapor deposition source, which has an evaporation chamber and a nozzle. The evaporation chamber is used to heat the vapor deposition material to generate steam, and the nozzle is connected to the evaporation chamber, through which the steam is dispersed to the substrate to be vapor-deposited.

[0003] When multiple vapor deposition sources are arranged within a vacuum chamber, their different positions result in varying dispersion ranges of the vapor deposition material after it exits the nozzles. With the trend towards miniaturization of vacuum chambers and increasingly compact arrangement of vapor deposition sources, the placement of these sources becomes particularly challenging. In related technologies, the vapor deposition sources are immovable, the dispersion range of the vapor deposition material cannot be adjusted, and the vapor deposition quality is difficult to guarantee. Summary of the Invention

[0004] This application provides an adjustable vapor deposition source and vapor deposition machine, which aims to adjust the dispersion range of vapor deposition materials.

[0005] In a first aspect, embodiments of this application provide an adjustable vapor deposition source, comprising: an evaporation chamber, a cover plate assembly, and an adjustment mechanism; the evaporation chamber includes a wall and an evaporation cavity located within the wall, the wall having an opening and a heating element, the evaporation cavity communicating with the opening, the evaporation cavity for placing vapor deposition material, the heating element for evaporating the vapor deposition material, and the opening for discharging the vapor deposition material; the cover plate assembly is slidably fitted with the evaporation chamber, the cover plate assembly including a plate body and a nozzle, the plate body being attached to and covering the opening, the nozzle being disposed on the plate body, and the nozzle having a nozzle orifice. The nozzle is used to communicate with or disconnect from the opening; the adjustment mechanism is connected to the cover plate assembly, and the adjustment mechanism includes a first guide, a second guide, and a connector. The projections of the first guide and the second guide in the height direction of the evaporation chamber are intersected. The first guide has a first guide groove along its own length direction, and the second guide has a second guide groove along its own length direction. The connector is disposed on the cover plate assembly and slides with the first guide groove and the second guide groove respectively, so as to adjust the position of the nozzle based on the transmission of the first guide and / or the second guide.

[0006] According to an embodiment of the first aspect of this application, the first guide member includes a first guide rod and a first driving element, the first guide groove is located on the first guide rod, the first driving element is connected to the first guide rod, and the driving direction of the first driving element is perpendicular to the length direction of the first guide rod; the second guide member includes a second guide rod and a second driving element, the second guide groove is located on the second guide rod, the second driving element is connected to the second guide rod, and the driving direction of the second driving element is perpendicular to the length direction of the second guide rod.

[0007] According to any of the foregoing embodiments of the first aspect of this application, the first driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder; the second driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder.

[0008] According to any of the foregoing embodiments of the first aspect of this application, the first guide groove and the second guide groove are arranged perpendicularly.

[0009] According to any of the foregoing embodiments of the first aspect of this application, the opening is circular, the length of the first guide groove is not less than the diameter of the opening, and the length of the second guide groove is not less than the diameter of the opening.

[0010] According to any of the foregoing embodiments of the first aspect of this application, the diameter of the opening, the length of the first guide groove, and the length of the second guide groove are all equal.

[0011] According to any of the foregoing embodiments of the first aspect of this application, the connector includes a connecting portion and a guiding portion. One end of the connecting portion is connected to the plate body and the other end is connected to the guiding portion. The guiding portion includes a guiding section and a receiving section. The receiving section is located in the middle of the guiding section and its outer contour is larger than the outer contour of the guiding section. The guiding section is used to slide with the first guiding groove and the second guiding groove. The receiving section is used to abut against the first guiding member and the second guiding member.

[0012] According to any of the foregoing embodiments of the first aspect of this application, the receiving section is provided with a mounting hole and a buffer assembly. The buffer assembly is telescopically disposed within the mounting hole. The mounting hole penetrates the receiving section and has a contraction opening at its intersection with the end face of the receiving section. The buffer assembly includes a compression spring and a ball bearing. The two ends of the compression spring abut against the ball bearing respectively. The diameter of the ball bearing is smaller than the diameter of the mounting hole and larger than the diameter of the contraction opening. The ball bearing abuts against the first guide member or the second guide member.

[0013] According to any of the foregoing embodiments of the first aspect of this application, the cross-section of the receiving section is rectangular, and there are two mounting holes and two buffer components, which are symmetrically arranged on one diagonal of the rectangle.

[0014] According to any of the foregoing embodiments of the first aspect of this application, the cross-section of the guide segment is elliptical and is tangent to the two sidewalls of the first guide groove along the length direction and the two sidewalls of the second guide groove along the length direction, respectively, and the major axis of the ellipse intersects the length direction of the first guide groove and the length direction of the second guide groove.

[0015] According to any of the foregoing embodiments of the first aspect of this application, a sleeve assembly is further included, comprising a guide sleeve, a telescopic sleeve, a transmission component, and a power mechanism. The guide sleeve is disposed on the cover plate assembly. The telescopic sleeve is slidably engaged with the guide sleeve and coaxially disposed on the outer circumference of the nozzle. The transmission component is connected to the telescopic sleeve and the power mechanism respectively. The power mechanism is used to drive the telescopic sleeve to slide along its own axis through the transmission component to adjust the vapor deposition angle.

[0016] According to any of the foregoing embodiments of the first aspect of this application, the transmission member includes a hinged end, a first slide groove, and a second slide groove. The hinged end is hinged to the telescopic sleeve. The first slide groove is located between the second slide groove and the hinged end and is slidably engaged with the connecting member. The second slide groove is slidably engaged with the power mechanism. The power mechanism includes a third driving element and a slider. The third driving element is disposed on the cover plate assembly, and the slider is disposed on the third driving element and is slidably engaged with the second slide groove.

[0017] According to any of the foregoing embodiments of the first aspect of this application, the third driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder.

[0018] Secondly, embodiments of this application also provide a vapor deposition machine, including the adjustable vapor deposition source in any of the above embodiments.

[0019] This application provides an adjustable vapor deposition source, which includes an evaporation chamber, a cover plate assembly, and an adjustment mechanism. The evaporation chamber has an opening, and the cover plate assembly includes a plate and a nozzle. The plate covers the opening and slides with the evaporation chamber. The adjustment mechanism includes a first guide, a second guide, and a connector, with the connector disposed on the plate. The first and second guides are intersecting and can both drive the plate to slide via the connector. This allows the position of the nozzle above the evaporation chamber to be changed in a plane perpendicular to the axis of the evaporation chamber, thereby flexibly adjusting the dispersion range of the vapor deposition material and improving the vapor deposition quality. Attached Figure Description

[0020] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments of this application will be briefly introduced below. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the internal structure of the evaporation chamber according to the first aspect of this application;

[0022] Figure 2 This is a schematic diagram of the adjustable vapor deposition source according to the first aspect of this application from one view.

[0023] Figure 3 This is a schematic diagram of the adjustable vapor deposition source according to the first aspect of this application from another perspective.

[0024] Figure 4 For the purposes of this application Figure 3 A magnified view of a portion at point A;

[0025] Figure 5 For the purposes of this application Figure 4 Sectional view at BB;

[0026] Figure 6 This is a schematic diagram of the structure of the connector according to the first aspect of this application;

[0027] Figure 7 This is a schematic diagram of the sleeve assembly according to the first aspect of this application from one perspective;

[0028] Figure 8 This is a schematic diagram of the sleeve assembly according to the first aspect of this application from another perspective.

[0029] In the attached diagram:

[0030] 1-Evaporation chamber; 11-Wall; 111-Opening; 112-Heating element; 12-Evaporation cavity;

[0031] 2-Cover plate assembly; 21-Plate body; 22-Nozzle;

[0032] 3-Adjusting mechanism; 31-First guide member; 311-First driving element; 312-First guide rod; 3121-First guide groove; 32-Second guide member; 321-Second guide rod; 3211-Second guide groove; 322-Second driving element; 33-Connector; 331-Connecting part; 332-Guiding part; 3321-Guiding section; 3322-Receiving section; 333-Buffer assembly; 3331-Compression spring; 3332-Ball bearing;

[0033] 4-Sleeve assembly; 41-Guide sleeve; 42-Telescopic sleeve; 43-Transmission component; 431-First slide groove; 432-Second slide groove; 44-Power mechanism; 441-Third drive element. Detailed Implementation

[0034] The features and exemplary embodiments of various aspects of this application will be described in detail below. To make the objectives, technical solutions, and advantages of this application clearer, the application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain this application and not to limit it. For those skilled in the art, this application can be implemented without some of these specific details. The following description of the embodiments is merely to provide a better understanding of this application by illustrating examples.

[0035] It should be noted that, in this document, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes said element.

[0036] A vapor deposition machine is a device that uses physical vapor deposition technology to deposit thin film materials on the surface of a substrate. Its core principle is to evaporate the coating material by heating it, and the evaporated coating material is uniformly attached to the substrate surface in a vacuum environment, condensing to form a dense thin film.

[0037] The vapor deposition machine is equipped with a vapor deposition head, which is used to evaporate the coating material and diffuse the evaporated coating material onto the substrate. The vapor deposition head includes a vapor deposition source, which has an evaporation chamber and a nozzle. The evaporation chamber is used to heat the vapor deposition material to generate steam, and the nozzle is connected to the evaporation chamber, through which the steam is dispersed to the substrate to be vapor-deposited.

[0038] To improve the utilization rate of vapor deposition machines, multiple vapor deposition sources are usually set up in the vacuum chamber of the vapor deposition machine. Different vapor deposition materials can be placed in different vapor deposition sources, so that multiple different materials can be vapor deposited in one vapor deposition machine.

[0039] When multiple vapor deposition sources are placed within a vacuum chamber, the varying placement of these sources results in different dispersion ranges of the vaporized material after exiting the nozzles. With the trend towards miniaturization of vacuum chambers and increasingly compact arrangement of vapor deposition sources, the placement of these sources presents particular challenges. In related technologies, the vapor deposition sources are immovable, the dispersion range of the vaporized material cannot be adjusted, and the vapor deposition quality is difficult to guarantee.

[0040] In view of this, this application provides an adjustable vapor deposition source that can adjust the dispersion range of the vapor deposition material, thereby improving the vapor deposition quality.

[0041] Please refer to Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the internal structure of the evaporation chamber according to the first aspect of this application; Figure 2 This is a schematic diagram of the adjustable vapor deposition source according to the first aspect of this application from one viewpoint.

[0042] In a first aspect, embodiments of this application provide an adjustable vapor deposition source, which includes an evaporation chamber 1, a cover plate assembly 2, and an adjustment mechanism 3. The evaporation chamber 1 includes a wall 11 and an evaporation cavity 12 located within the wall 11. The wall 11 is provided with an opening 111 and a heating element 112. The evaporation cavity 12 communicates with the opening 111. The evaporation cavity 12 is used to place vapor deposition material, the heating element 112 is used to evaporate the vapor deposition material, and the opening 111 is used to discharge the vapor deposition material. The cover plate assembly 2 is slidably fitted with the evaporation chamber 1. The cover plate assembly 2 includes a plate body 21 and a nozzle 22. The plate body 21 is attached to the wall 11 and covers the opening 111. The nozzle 22 is disposed on the plate body 21. A nozzle is provided, which is used to connect or disconnect with the opening 111; the adjustment mechanism 3 is connected to the cover plate assembly 2. The adjustment mechanism 3 includes a first guide 31, a second guide 32 and a connecting member 33. The projections of the first guide 31 and the second guide 32 in the height direction of the evaporation chamber 1 are intersected. The first guide 31 has a first guide groove 3121 along its own length direction, and the second guide 32 has a second guide groove 3211 along its own length direction. The connecting member 33 is provided on the cover plate assembly 2 and slides with the first guide groove 3121 and the second guide groove 3211 respectively, so as to adjust the position of the nozzle based on the transmission of the first guide 31 and / or the second guide 32.

[0043] The heating element 112 is a component that heats the wall portion 11 to heat the vapor deposition material in the evaporation chamber 12, causing the vapor deposition material to evaporate and be emitted sequentially through the opening 111 and the nozzle.

[0044] For example, the heating element 112 can be a resistance wire, which is spirally wound inside the wall 11 and can generate heat when current passes through it, thereby heating the vapor-deposited material in the evaporation chamber 12. The heating element 112 can also be an electron gun, which can emit an electron beam to bombard the vapor-deposited material in the evaporation chamber 12, causing the vapor-deposited material to evaporate upon heating.

[0045] The wall 11 of the evaporation chamber 1 can be a cylindrical structure, and one end of it is closed along its own axis, while the other end is provided with an opening 111, thereby forming an evaporation chamber 12 and an opening 111 connected to the evaporation chamber 12.

[0046] For example, the outer contours of the evaporation chamber 12 and the opening 111 are both circular. The outer diameter of the evaporation chamber 12 can be larger than or equal to the outer diameter of the opening 111.

[0047] The plate 21 of the cover assembly 2 is slidably engaged with one end of the wall 11 that has an opening 111, and the outer contour of the plate 21 is larger than the outer contour of that end of the wall 11. When the adjusting mechanism 3 drives the plate 21 to slide relative to the wall 11, the plate 21 always covers the opening 111 and seals the opening 111, so that the vapor-deposited material escaping from the opening 111 can only be emitted from the nozzle.

[0048] For example, the outer contour of the plate 21 is circular and its diameter is larger than the diameter of the opening 111.

[0049] The nozzle 22 is disposed on the plate 21. It can be integrally formed with the plate 21, or it can be assembled onto the plate 21 after the plate 21 has been formed. For example, the nozzle 22 can be fixedly installed on the plate 21 by welding, snap-fitting, bolting, or other methods. The nozzle 22 is provided with a spray orifice that passes through both the nozzle 22 and the plate 21. The cross-section of the spray orifice is circular, and the axis of the spray orifice can be parallel to or intersect with the axis of the plate 21.

[0050] For example, the nozzle 22 is disposed at the axis of the plate 21, and the nozzle orifice is coaxially disposed on the nozzle 22. The axis of the nozzle orifice intersects the axis of the plate 21, and the included angle is an acute angle. The included angle can be any value among 5°, 6°, 7°, 8°, 9°, 10°, 11°, 12°, 13°, 14°, and 15°, or any intermediate value between any two adjacent values ​​mentioned above.

[0051] With the axial direction of the evaporation chamber 1 as the height direction, the first guide member 31 and the second guide member 32 are located at different heights. The first guide member 31 and the second guide member 32 can be attached together or spaced apart. The first guide groove 3121 passes through the first guide member 31 in the height direction, and the second guide groove 3211 passes through the second guide member 32 in the height direction. The projections of the first guide groove 3121 and the second guide groove 3211 along the height direction intersect and have an overlapping portion. When they intersect, the length direction of the first guide groove 3121 can be perpendicular to the length direction of the second guide groove 3211, or the length direction of the first guide groove 3121 can be non-perpendicular to the length direction of the second guide groove 3211. The overlapping portion is quadrilateral, and the connecting member 33 is disposed on the plate 21 and connected in series within the overlapping portion. The outer contour of the connecting member 33 can coincide with the outer contour of the overlapping portion, or the outer contour of the connecting member 33 can be tangential to the outer contour of the overlapping portion.

[0052] One end of the first guide member 31 can be located above the cover plate assembly 2, and the other end can extend outside the vacuum chamber of the vapor deposition machine. The first guide member 31 can drive the cover plate assembly 2 to slide along a direction intersecting its own length direction. One end of the second guide member 32 can be located above the first guide member 31 or between the first guide member 31 and the plate 21. The other end of the second guide member 32 can extend outside the vacuum chamber of the vapor deposition machine. The second guide member 32 can drive the cover plate assembly 2 to slide along a direction intersecting its own length direction. When sliding, the first guide member 31 and / or the second guide member 32 can also slide and cooperate with the cavity wall of the vacuum chamber, thereby providing vertical support force through the cavity wall.

[0053] For example, the first guide member 31 and the second guide member 32 may both be provided with driving elements outside the vacuum chamber, and the driving directions are respectively perpendicular to the length direction of the first guide member 31 and the length direction of the second guide member 32. The driving element can be an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder.

[0054] When the adjustable vapor deposition source is operating normally, the heating element 112 is energized to heat the vapor deposition material, causing it to evaporate. The evaporated material enters the nozzle through the opening 111 and is then emitted from the nozzle. When the position of the nozzle 22 needs to be adjusted, the first guide member 31 can drive the plate 21 to slide along the second guide groove 3211, and the second guide member 32 can drive the plate 21 to slide along the first guide groove 3121. Both can drive the plate 21 to slide simultaneously or not simultaneously. When the plate 21 slides, the position of the nozzle 22 above the evaporation chamber 1 changes, and the emission range of the evaporated material from the nozzle changes.

[0055] Projecting along the axial direction of the evaporation chamber 1, when the outline of the junction of the nozzle and the opening 111 is inside the opening 111, the evaporating material can be emitted from the nozzle; when the outline of the junction of the nozzle and the opening 111 is outside the opening 111, the nozzle is closed.

[0056] In the above embodiment, the adjustable vapor deposition source includes an evaporation chamber 1, a cover plate assembly 2, and an adjustment mechanism 3. The evaporation chamber 1 has an opening 111. The cover plate assembly 2 includes a plate 21 and a nozzle 22. The plate 21 covers the opening 111 and slides with the evaporation chamber 1. The adjustment mechanism includes a first guide 31, a second guide 32, and a connector 33. The connector 33 is disposed on the plate 21. The first guide 31 and the second guide 32 are intersecting and can both drive the plate 21 to slide through the connector 33. The position of the nozzle 22 above the evaporation chamber 1 can be changed in a plane perpendicular to the axis of the evaporation chamber 1, thereby flexibly adjusting the dispersion range of the vapor deposition material and improving the vapor deposition quality.

[0057] Please refer to Figures 3 to 6 , Figure 3 This is a schematic diagram of the adjustable vapor deposition source according to the first aspect of this application from another perspective. Figure 4 For the purposes of this application Figure 3 A magnified view of a portion at point A;

[0058] Figure 5 For the purposes of this application Figure 4 Sectional view at BB; Figure 6 This is a schematic diagram of the structure of the connector according to the first aspect of this application.

[0059] In some embodiments of this application, the first guide member 31 includes a first guide rod 312 and a first driving element 311. A first guide groove 3121 is located on the first guide rod 312. The first driving element 311 is connected to the first guide rod 312, and the driving direction of the first driving element 311 is perpendicular to the length direction of the first guide rod 312. The second guide member 32 includes a second guide rod 321 and a second driving element 322. A second guide groove 3211 is located on the second guide rod 321. The second driving element 322 is connected to the second guide rod 321, and the driving direction of the second driving element 322 is perpendicular to the length direction of the second guide rod 321.

[0060] Both the first driving element 311 and the second driving element 322 are linear driving elements. The first driving element 311 can drive the first guide rod 312 to translate, and the second driving element 322 can drive the second guide rod 321 to translate. The first driving element 311 can be disposed inside the vacuum chamber or outside the vacuum chamber; the second driving element 322 can be disposed inside the vacuum chamber or outside the vacuum chamber.

[0061] For example, the first driving element 311 can be one of an electric cylinder, a pneumatic cylinder or a hydraulic cylinder, and is fixedly installed in or outside the vacuum chamber relative to the vacuum chamber (e.g., it can be installed on the cavity wall of the vacuum chamber). It drives the connecting member 33 to slide along the second guide groove 3211 in a direction perpendicular to the length of the first guide rod 312, thereby driving the nozzle 22 to slide.

[0062] For example, the second driving element 322 can be one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder. The power source (electric energy, pneumatic energy, hydraulic energy) of the second driving element 322 can be the same as or different from the first driving element 311. The second driving element 322 is fixedly installed relative to the vacuum chamber inside or outside the vacuum chamber, and drives the connecting member 33 to slide along the first guide groove 3121 in a direction perpendicular to the length of the second guide rod 321, thereby driving the nozzle 22 to slide.

[0063] In the above embodiment, the driving direction of the first driving element 311 is perpendicular to the length direction of the first guide rod 312, and the driving direction of the second driving element 322 is perpendicular to the length direction of the second guide rod 321. When driving force is provided, the direction of the driving force is parallel to the direction of motion, and the first driving element 311 and the second driving element 322 will not be subjected to radial component force, which can improve motion accuracy and extend the service life of the first driving element 311 and the second driving element 322.

[0064] like Figure 3 As shown, in some embodiments of this application, the first guide groove 3121 and the second guide groove 3211 are arranged perpendicularly.

[0065] The length direction of the first guide groove 3121 is along the length direction of the first guide rod 312, and the length direction of the second guide groove 3211 is along the length direction of the second guide rod 321.

[0066] For example, both the first guide groove 3121 and the second guide groove 3211 have rectangular outlines, and the long sides of the two rectangles are arranged perpendicularly in space. To facilitate the grooving process of the first guide groove 3121 and the second guide groove 3211, the first guide groove 3121 and the second guide groove 3211 can also be machined with rounded corners, and the rounded corner transition facilitates milling. The first guide rod 312 and the second guide rod 321 can both be milled from stainless steel to adapt to the working conditions inside the vacuum chamber.

[0067] In the above embodiment, the first guide groove 3121 and the second guide groove 3211 are vertically arranged. When the first guide rod 312 drives the connector 33 to slide, the first guide rod 312 and the connector 33 are relatively stationary; when the second guide rod 321 drives the connector 33 to slide, the second guide rod 321 and the connector 33 are relatively stationary. Firstly, this reduces the friction between the connector 33 and the first guide rod 312 and the second guide rod 321, thus improving the smoothness of adjustment. Secondly, the movement of the connector 33 is simple, making it easy to confirm the position of the nozzle 22.

[0068] like Figure 1 and Figure 3 As shown, in some embodiments of this application, the opening 111 is circular, the length of the first guide groove 3121 is not less than the diameter of the opening 111, and the length of the second guide groove 3211 is not less than the diameter of the opening 111.

[0069] For example, the length of the first guide groove 3121 can be greater than the diameter of the opening 111, or the length of the first guide groove 3121 can be equal to the diameter of the opening 111; the length of the second guide groove 3211 can be greater than the diameter of the opening 111, or the length of the second guide groove 3211 can be equal to the diameter of the opening 111. The lengths of the first guide groove 3121 and the second guide groove 3211 can be the same or different.

[0070] In the technical solution of the above embodiment, the lengths of the first guide groove 3121 and the second guide groove 3211 are both not less than the diameter of the opening 111, which allows the position of the nozzle to be adjusted within the entire range of the opening 111, thereby increasing the adjustment range of the opening 111. Furthermore, the nozzle can be moved to the outside of the contour of the opening 111, thereby achieving nozzle closure.

[0071] Preferably, the length of the first guide groove 3121 is equal to the length of the second guide groove 3211, and the diameter of the opening 111 is equal to the length of the first guide groove 3121.

[0072] When the first guide member 31 and the second guide member 32 slide the cover plate assembly 2, the position of the nozzle can be adjusted within the entire contour range of the opening 111, thereby improving the adjustment range of the nozzle. Furthermore, the contour of the opening 111 is circular. When the connector 33 abuts against one end of the first guide groove 3121 along its length but not against one end of the second guide groove 3211 along its length, the nozzle moves to the edge of the opening 111. When the connector 33 abuts against one end of the second guide groove 3211 along its length but not against one end of the first guide groove 3121 along its length, the nozzle moves to the edge of the opening 111. When the connector 33 abuts against one end of the first guide groove 3121 along its length and simultaneously against one end of the second guide groove 3211 along its length, the nozzle moves to the outside of the contour of the opening 111, and the nozzle is closed.

[0073] In the above embodiment, the diameter of the opening 111, the length of the first guide groove 3121, and the length of the second guide groove 3211 are set to be equal. This not only allows the position of the nozzle to be adjusted within the entire range of the opening 111, but also allows for reliable control of the opening and closing of the nozzle.

[0074] like Figure 5 and Figure 6 As shown, in some embodiments of this application, the connector 33 includes a connecting portion 331 and a guiding portion 332. One end of the connecting portion 331 is connected to the plate 21, and the other end is connected to the guiding portion 332. The guiding portion 332 includes a guiding section 3321 and a receiving section 3322. The receiving section 3322 is located in the middle of the guiding section 3321, and its outer contour is larger than that of the guiding section 3321. The guiding section 3321 is used to slide with the first guiding groove 3121 and the second guiding groove 3211, and the receiving section 3322 is used to abut against the first guide member 31 and the second guide member 32.

[0075] Along the length of the connector 33, there are, in sequence, a connecting portion 331, a guide section 3321, a receiving section 3322, and another guide section 3321. The connecting portion 331 is connected to a guide section 3321. The outer contours of the connecting portion 331 and the guide section 3321 may be the same or different. The receiving section 3322 is a circumferentially protruding section of the connector 33 from the guide section 3321, and the outer contour of the receiving section 3322 surrounds the outer contour of the guide section 3321.

[0076] Along the axial direction of the evaporation chamber 1, the first guide rod 312 and the second guide rod 321 are spaced apart. The receiving section 3322 is located between the first guide rod 312 and the second guide rod 321, and abuts against the first guide rod 312 and the second guide rod 321 respectively. The two guide sections 3321 slide in one-to-one with the first guide groove 3121 and the second guide groove 3211.

[0077] For example, in a cross-section perpendicular to the length of the connector 33, the outer contour of the connector 331 can be circular, and a circular hole is provided on the plate 21. The connector 331 is inserted into the circular hole and snapped into place, thereby achieving the fixed installation of the connector 33 on the plate 21. The outer contour of the receiving section 3322 can be polygonal (rectangular, rectangular with chamfered or rounded corners, trapezoidal, rhomboid, circular, elliptical, etc.). The outer contour of the guide section 3321 can be square, or it can be a rectangle with rounded corners, which can not only drive the cover plate assembly 2 to slide. The movement can also provide a limit for the cover plate assembly 2 to prevent it from rotating; the outer contour of the guide section 3321 can also be circular and tangent to the first guide groove 3121 and the second guide groove 3211 respectively. In order to prevent the cover plate assembly 2 from rotating when moving, the number of the first guide rod 312, the second guide rod 321 and the connecting piece 33 can all be set to two or more, and any two first guide rods 312 are arranged in parallel, and any two second guide rods 321 are arranged in parallel, thereby preventing the cover plate assembly 2 from rotating.

[0078] For example, in the length direction of the connector 33, the two end faces of the receiving segment 3322 can be planes or curved surfaces. The two end faces can both be planes or both be curved surfaces, or one can be a plane and the other a curved surface.

[0079] Preferably, both end faces of the receiving section 3322 are smooth curved surfaces and gradually slope towards each other from the center to the periphery, which can reduce the friction between the receiving section 3322 and the first guide rod 312 and the second guide rod 321.

[0080] In the technical solution of the above embodiment, the receiving section 3322 is disposed in the middle of the guide section 3321 and can abut against the first guide rod 312 and the second guide rod 321 respectively. When the first guide rod 312 and the second guide rod 321 slide relative to each other, the first guide rod 312 and / or the second guide rod 321 slides against the end face of the receiving section 3322 in the length direction, thereby preventing the first guide rod 312 and the second guide rod 321 from directly rubbing against each other. This can optimize the frictional resistance and protect the first guide rod 312 and the second guide rod 321.

[0081] like Figure 5 and Figure 6As shown, in some embodiments of this application, the receiving section 3322 is provided with a mounting hole and a buffer assembly 333. The buffer assembly 333 is telescopically disposed in the mounting hole, which passes through the receiving section 3322 and has a contraction opening at the intersection with the end face of the receiving section 3322. The buffer assembly 333 includes a compression spring 3331 and a ball bearing 3332. The two ends of the compression spring 3331 abut against the ball bearing 3332 respectively. The diameter of the ball bearing 3332 is smaller than the diameter of the mounting hole and larger than the diameter of the contraction opening. The ball bearing 3332 abuts against the first guide member 31 or the second guide member 32.

[0082] For example, the axis of the mounting hole can be parallel to the length direction of the connector 33, or the axis of the mounting hole can be at an angle to the length direction of the connector 33, with the angle being an acute angle. Preferably, the axis of the mounting hole is parallel to the length direction of the connector 33.

[0083] When the buffer assembly 333 is positioned within the mounting hole, the compression spring 3331 is subjected to pressure from the two balls 3332. The two balls 3332 are confined by a contraction opening, with only a portion of their spherical surface extending out of the mounting hole and abutting against the first guide rod 312 or the second guide rod 321. When adjusting the nozzle position, the balls 3332 abut against the first guide rod 312 or the second guide rod 321, can roll along the first guide rod 312 or the second guide rod 321, and can change their extension amount outside the mounting hole under the compression of the first guide rod 312 or the second guide rod 321.

[0084] For example, the number of buffer components 333 can be one or more. When there are multiple buffer components 333, they can be evenly distributed on the receiving section 3322 or randomly distributed on the receiving section 3322; the multiple buffer components 333 can be arranged in parallel or each can be arranged at an angle on the receiving section 3322 and not parallel to each other.

[0085] In the technical solution of the above embodiment, the receiving section 3322 is provided with a mounting hole, which can provide a mounting position for the buffer component 333, and can achieve the snap-fit ​​of the ball 3332 through the shrinkage opening, which can prevent the ball 3332 from coming out of the mounting hole. The buffer assembly 333 abuts against the first guide rod 312 and the second guide rod 321 respectively. Firstly, it can provide support and optimize the force on the first guide rod 312 or the second guide rod 321. Secondly, it can reduce the friction between the receiving section 3322 and the first guide rod 312 and the second guide rod 321, which facilitates the smoothness of the sliding of the first guide rod 312 and the second guide rod 321. Thirdly, it can provide a buffering effect. When the first guide rod 312 and / or the second guide rod 321 tilts in the axial direction of the evaporation chamber 1, the buffer assembly 333 can adjust the amount of the ball bearing 3332 protruding outside the mounting hole, thereby preventing the first guide rod 312 and / or the second guide rod 321 from jamming and improving the smoothness of adjustment.

[0086] Preferably, the cross-section of the receiving section 3322 is rectangular, and there are two mounting holes and two buffer components 333, which are symmetrically arranged on one diagonal of the rectangle.

[0087] There are two buffer components 333, and therefore four ball bearings 3332. The buffer components 333 are symmetrically arranged on a diagonal line of the arc, near the corner of the receiving section 3322. For the first guide rod 312, a ball bearing 3332 abuts on each side of the first guide groove 3121, and for the second guide rod 321, a ball bearing 3332 abuts on each side of the second guide groove 3211.

[0088] In the technical solution of the above embodiment, there are two mounting holes and two buffer components 333. The mounting holes can provide mounting positions for the buffer components 333 in a one-to-one correspondence. The two buffer components 333 are symmetrically arranged on a diagonal line of the receiving section 3322. They can not only provide support for both sides of the first guide groove 3121 on the first guide rod 312 and both sides of the second guide groove 3211 on the second guide rod 321, but also make the forces on both sides of the first guide groove 3121 on the first guide rod 312 and the forces on both sides of the second guide groove 3211 on the second guide rod 321 balanced.

[0089] like Figure 4 As shown, in some embodiments of this application, the cross-section of the guide segment 3321 is elliptical and is tangent to the two side walls of the first guide groove 3121 along the length direction and the two side walls of the second guide groove 3211 along the length direction, respectively. The major axis of the ellipse intersects the length direction of the first guide groove 3121 and the length direction of the second guide groove 3211.

[0090] For example, the overlapping portion formed by the projections of the first guide groove 3121 and the second guide groove 3211 along the axis of the evaporation chamber 1 is rectangular, and the major axis of the ellipse coincides with one diagonal of the rectangle. The ratio of the major axis to the minor axis of the ellipse can be any ratio among 5:4, 4:3, 3:2, 2:1, 3:1, and 4:1, or any intermediate ratio between any two adjacent ratios mentioned above.

[0091] For example, the guide segment 3321 is divided into two by the receiving segment 3322. One guide segment 3321 slides in engagement with the first guide groove 3121, and the other slides in engagement with the second guide groove 3211. Both guide segments 3321 are elliptical in shape, and their outer contours may or may not coincide. When the outer contours of the two guide segments 3321 do not coincide, the major axes of the two guide segments 3321 may be located on the same diagonal of the overlapping portion, or they may be located on different diagonals of the overlapping portion.

[0092] In the technical solution of the above embodiment, the cross-section of the guide section 3321 is elliptical and is tangentially arranged with the side walls of the first guide groove 3121 and the second guide groove 3211, respectively. This not only reduces the contact area between the connector 33 and the first guide rod 312 and the second guide rod 321, thereby reducing friction and improving smoothness, but also prevents the connector 33 from rotating in the first guide groove 3121 and the second guide groove 3211, thereby preventing the plate 21 from rotating during movement and improving the adjustment accuracy of the nozzle. This ensures that the nozzle can be accurately translated by relying solely on the transmission cooperation of one first guide rod 312, one second guide rod 321 and one connector 33.

[0093] The adjustable vapor deposition source allows adjustment of the nozzle position by adjusting the relative position of the nozzle 22 and the evaporation chamber 1, thereby regulating the dispersion range of the vapor deposition material. As the vapor deposition material is emitted from the nozzle and moves towards the substrate to be vaporized, its path forms a cone shape. A cross-section along the axis of this cone reveals two ridges on its surface; the angle between these two ridges is called the vapor deposition angle (R). A larger vapor deposition angle results in more dispersed vapor deposition material, while a smaller angle results in more concentrated material. Adjusting the vapor deposition angle also allows for adjustment of the dispersion range of the vapor deposition material.

[0094] Please refer to Figure 7 and Figure 8 , Figure 7 This is a schematic diagram of the sleeve assembly according to the first aspect of this application from one perspective; Figure 8 This is a schematic diagram of the sleeve assembly according to the first aspect of this application from another perspective.

[0095] In some embodiments of this application, a sleeve assembly 4 is also included, including a guide sleeve 41, a telescopic sleeve 42, a transmission component 43, and a power mechanism 44. The guide sleeve 41 is disposed on the cover plate assembly 2. The telescopic sleeve 42 is slidably engaged with the guide sleeve 41 and is coaxially disposed on the outer circumference of the nozzle. The transmission component 43 is connected to the telescopic sleeve 42 and the power mechanism 44 respectively. The power mechanism 44 is used to drive the telescopic sleeve 42 to slide along its own axis through the transmission component 43 to adjust the vapor deposition angle.

[0096] The guide sleeve 41 is fixedly installed on the plate 21 (for example, the guide sleeve 41 can be snapped onto the plate 21, welded to the plate 21, or bolted to the plate 21). The outer wall surface of the telescopic sleeve 42 slides against the inner wall surface of the guide sleeve 41. The telescopic sleeve 42 can extend out of the guide sleeve 41 along the axis of the guide sleeve 41 or retract into the guide sleeve 41. When the power mechanism 44 provides power, the transmission component 43 drives the telescopic sleeve 42 to slide, thereby blocking a portion of the vapor-deposited material emitted from the nozzle along the moving path by the telescopic sleeve 42, thus changing the vapor deposition angle of the vapor-deposited material. By adjusting the amount of vapor-deposited material blocked by the telescopic sleeve 42, the vapor deposition angle of the vapor-deposited material can be adjusted.

[0097] For example, the power mechanism 44 can be a linear drive element, which can be one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder. The power mechanism 44 can be hinged to the plate 21, and the transmission member 43 can be fixedly connected at one end to the telescopic sleeve 42 and at the other end to the power mechanism 44, so that the telescopic sleeve 42 can slide based on the linear driving force of the power mechanism 44; the power mechanism 44 can also be fixedly connected to the plate 21, and the driving direction of the power mechanism 44 is parallel to the axis of the guide sleeve 41. The transmission member 43 can also be fixedly connected at one end to the telescopic sleeve 42 and at the other end to the power mechanism 44, so that the telescopic sleeve 42 can slide based on the linear driving force of the power mechanism 44.

[0098] In the above embodiment, the adjustable vapor deposition source is provided with a sleeve assembly 4, which includes a guide sleeve 41, a telescopic sleeve 42, a transmission component 43, and a power mechanism 44. Based on the driving force of the power mechanism 44, the transmission component 43 can drive the telescopic sleeve 42 to slide along the guide sleeve 41, thereby adjusting the vapor deposition angle of the vapor deposition material and thus more precisely adjusting the dispersion range of the vapor deposition material.

[0099] like Figure 8As shown, in some embodiments of this application, the transmission component 43 includes a hinged end, a first slide groove 431 and a second slide groove 432. The hinged end is hinged to the telescopic sleeve 42. The first slide groove 431 is located between the second slide groove 432 and the hinged end and is slidably engaged with the connecting component 33. The second slide groove 432 is slidably engaged with the power mechanism 44. The power mechanism 44 includes a third driving element 441 and a slider. The third driving element 441 is disposed on the cover plate assembly 2, and the slider is disposed on the third driving element 441 and is slidably engaged with the second slide groove 432.

[0100] For example, the transmission member 43 is rod-shaped, with one end in the length direction being a hinge end. The hinge end has a hinge hole, and the telescopic sleeve 42 extends a hinge rod in the circumferential direction. The hinge hole and the hinge rod are rotatably connected. The length direction of the first slide groove 431 is consistent with the length direction of the transmission member 43. The connecting member 33 extends a mating rod in the circumferential direction. The mating rod is located in the first slide groove 431 and slides in cooperation with the first slide groove 431. The length direction of the second slide groove 432 is consistent with the length direction of the transmission member 43. The third driving element 441 has a slider perpendicular to the driving direction. The slider is located in the second slide groove 432 and slides in cooperation with the second slide groove 432. The third driving element 441 is fixedly mounted on the plate 21.

[0101] When the third driving element 441 provides driving force, the slider slides in the second slide groove 432 and presses the transmission member 43, causing the transmission member 43 to swing. The mating rod slides in the first slide groove 431, and the transmission member 43 flips and slides relative to the mating rod, thereby driving the telescopic sleeve 42 to slide along the axis of the guide sleeve 41.

[0102] For example, the third drive element 441 can be an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder, capable of providing linear drive force.

[0103] In the above embodiment, the third driving element 441 is mounted on the plate 21. The transmission component 43 is hinged to the telescopic sleeve 42, the transmission component 43 is slidably engaged with the connecting component 33, and the transmission component 43 is slidably engaged with the third driving element 441. Based on the driving force of the third driving element 441 and relying on the support provided by the connecting component 33, the connecting component 33 can drive the telescopic sleeve 42 to slide along the guide sleeve 41, adjust the vapor deposition angle of the vapor deposition material, and thus adjust the dispersion range of the vapor deposition material. Firstly, the transmission component 43 has at least one degree of freedom when connected to the third driving element 441, the connecting component 33, and the telescopic sleeve 42, which can reduce the assembly accuracy requirements and make the adjustment action smooth. Secondly, the transmission component 43 uses the connecting component 33 as a fulcrum, which can save the driving force of the third driving element 441, thereby making the third driving element 441 more miniaturized and lightweight.

[0104] Secondly, this application also provides a vapor deposition machine, which includes the adjustable vapor deposition source in the above embodiments, and thus has all the advantages of the adjustable vapor deposition source in any of the above embodiments, which will not be repeated here.

[0105] The above description is merely a specific implementation of this application. Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working processes of the systems, modules, and units described above can be referred to the corresponding processes in the foregoing method embodiments, and will not be repeated here. It should be understood that the protection scope of this application is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in this application, and these modifications or substitutions should all be covered within the protection scope of this application.

Claims

1. An adjustable vapor deposition source, characterized in that, include: An evaporation chamber includes a wall and an evaporation cavity located within the wall. The wall has an opening and a heating element. The evaporation cavity communicates with the opening. The evaporation cavity is used to hold a vapor deposition material. The heating element is used to evaporate the vapor deposition material. The opening is used to discharge the vapor deposition material. A cover plate assembly is slidably fitted with the evaporation chamber. The cover plate assembly includes a plate body and a nozzle. The plate body is attached to the wall and covers the opening. The nozzle is disposed on the plate body and has a spray nozzle for communicating or disconnecting from the opening. An adjustment mechanism is connected to the cover plate assembly. The adjustment mechanism includes a first guide, a second guide, and a connector. The projections of the first guide and the second guide in the height direction of the evaporation chamber are intersected. The first guide has a first guide groove along its length, and the second guide has a second guide groove along its length. The connector is disposed on the cover plate assembly and slides with the first guide groove and the second guide groove respectively, so as to adjust the position of the nozzle based on the transmission of the first guide and / or the second guide.

2. The adjustable vapor deposition source according to claim 1, characterized in that, The first guide member includes a first guide rod and a first driving element. The first guide groove is located on the first guide rod. The first driving element is connected to the first guide rod, and the driving direction of the first driving element is perpendicular to the length direction of the first guide rod. The second guide member includes a second guide rod and a second driving element. The second guide groove is located on the second guide rod. The second driving element is connected to the second guide rod, and the driving direction of the second driving element is perpendicular to the length direction of the second guide rod. Preferably, the first driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder; The second driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder.

3. The adjustable vapor deposition source according to claim 1, characterized in that, The first guide groove and the second guide groove are arranged perpendicularly.

4. The adjustable vapor deposition source according to claim 1, characterized in that, The opening is circular, the length of the first guide groove is not less than the diameter of the opening, and the length of the second guide groove is not less than the diameter of the opening; Preferably, the diameter of the opening, the length of the first guide groove, and the length of the second guide groove are all equal.

5. The adjustable vapor deposition source according to claim 1, characterized in that, The connector includes a connecting part and a guiding part. One end of the connecting part is connected to the plate body and the other end is connected to the guiding part. The guiding part includes a guiding section and a receiving section. The receiving section is located in the middle of the guiding section and its outer contour is larger than that of the guiding section. The guiding section is used to slide with the first guiding groove and the second guiding groove. The receiving section is used to abut against the first guiding member and the second guiding member.

6. The adjustable vapor deposition source according to claim 5, characterized in that, The receiving section is provided with a mounting hole and a buffer assembly. The buffer assembly is telescopically disposed in the mounting hole, which passes through the receiving section and has a contraction opening at the intersection with the end face of the receiving section. The buffer assembly includes a compression spring and a ball bearing. The two ends of the compression spring abut against the ball bearing respectively. The diameter of the ball bearing is smaller than the diameter of the mounting hole and larger than the diameter of the contraction opening. The ball bearing abuts against the first guide member or the second guide member. Preferably, the receiving section has a rectangular cross-section, and there are two mounting holes and two buffer components, which are symmetrically arranged on one diagonal of the rectangle.

7. The adjustable vapor deposition source according to claim 5, characterized in that, The cross-section of the guide section is elliptical and is tangent to the two side walls of the first guide groove along its length and the two side walls of the second guide groove along its length, respectively. The major axis of the ellipse intersects the length direction of the first guide groove and the length direction of the second guide groove.

8. The adjustable vapor deposition source according to claim 1, characterized in that, It also includes a sleeve assembly, comprising a guide sleeve, a telescopic sleeve, a transmission component, and a power mechanism. The guide sleeve is disposed on the cover plate assembly. The telescopic sleeve is slidably engaged with the guide sleeve and is coaxially disposed on the outer circumference of the nozzle. The transmission component is connected to the telescopic sleeve and the power mechanism respectively. The power mechanism is used to drive the telescopic sleeve to slide along its own axis through the transmission component to adjust the vapor deposition angle.

9. The adjustable vapor deposition source according to claim 8, characterized in that, The transmission component includes a hinged end, a first slide groove, and a second slide groove. The hinged end is hinged to the telescopic sleeve. The first slide groove is located between the second slide groove and the hinged end and is slidably engaged with the connecting member. The second slide groove is slidably engaged with the power mechanism. The power mechanism includes a third driving element and a slider. The third driving element is disposed on the cover plate assembly, and the slider is disposed on the third driving element and slides in cooperation with the second slide groove. Preferably, the third driving element is one of an electric cylinder, a pneumatic cylinder, or a hydraulic cylinder.

10. A vapor deposition machine, characterized in that, Includes the adjustable vapor deposition source as described in any one of claims 1 to 9.

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