A coating method for a touch screen

Abstract

The application discloses a coating method of a touch screen, which comprises the following steps: pretreating the surface of the touch screen; placing the pretreated touch screen in a magnetron sputtering device; introducing inert gas into the magnetron sputtering device, and controlling the vacuum degree of the magnetron sputtering device to be a preset vacuum degree; applying a preset voltage to a metal target material in the magnetron sputtering device to generate glow discharge, so that metal atoms on the metal target material are sputtered out to form a metal thin film on the surface of the pretreated touch screen. The technical scheme of the application can use the magnetron sputtering technology to coat a uniform, dense and high-transmittance metal thin film on the surface of the touch screen, and the deposition rate is relatively fast and the cost is relatively low.

Description

Technical Field

[0001] This invention relates to the field of touch screen technology, and more particularly to a coating method for touch screens. Background Technology

[0002] Touchscreens are important input devices widely used in electronic devices such as smartphones, tablets, and laptops. The coating process of a touchscreen directly affects its sensitivity, light transmittance, and display quality.

[0003] Traditional touchscreen coating methods typically employ chemical vapor deposition (CVD) or physical vapor deposition (PVD) techniques. However, CVD technology has a slow deposition rate and high cost, while PVD technology produces thin films with poor density and low light transmittance. Summary of the Invention

[0004] The purpose of this invention is to provide a coating method for a touch screen, which can use magnetron sputtering technology to deposit a uniform, dense, and highly transparent metal film on the surface of the touch screen, with a fast deposition rate and low cost.

[0005] To achieve the above objectives, embodiments of the present invention provide a coating method for a touchscreen, comprising:

[0006] Pre-treat the surface of the touchscreen;

[0007] The pre-processed touchscreen is placed in a magnetron sputtering device;

[0008] An inert gas is introduced into the magnetron sputtering equipment, and the vacuum level in the magnetron sputtering equipment is controlled to a preset vacuum level.

[0009] A preset voltage is applied to the metal target in the magnetron sputtering equipment to generate glow discharge, causing metal atoms on the metal target to be sputtered out, so as to form a metal film on the surface of the pre-treated touch screen.

[0010] Furthermore, the pretreatment of the touchscreen surface specifically includes:

[0011] The surface of the touch screen is cleaned, dried, and degreased.

[0012] Furthermore, the inert gas is argon.

[0013] Furthermore, the flow rate of the argon gas is 50 sccm.

[0014] Furthermore, the preset vacuum level is 10. -4 Below Pa.

[0015] Furthermore, the metal target is an indium tin oxide target or a fluorine-doped tin oxide target.

[0016] Furthermore, the preset voltage is 600V.

[0017] Furthermore, the sputtering time of the metal film is 5 minutes.

[0018] Furthermore, the sputtering power of the metal thin film is 100W.

[0019] Furthermore, the metal thin film has a light transmittance of 90% and a resistivity of 10⁻⁶. -4 Ω·cm.

[0020] Compared with existing technologies, this invention provides a coating method for a touchscreen. First, the surface of the touchscreen is pretreated. Next, the pretreated touchscreen is placed in a magnetron sputtering apparatus. Then, an inert gas is introduced into the magnetron sputtering apparatus, and the vacuum level is controlled to a preset level. Finally, a preset voltage is applied to a metal target in the magnetron sputtering apparatus to generate a glow discharge, causing metal atoms on the metal target to be sputtered out, thereby forming a metal thin film on the surface of the pretreated touchscreen. This invention can use magnetron sputtering technology to deposit a uniform, dense, and highly transparent metal thin film on the surface of a touchscreen, with a relatively fast deposition rate and low cost. Attached Figure Description

[0021] Figure 1 This is a flowchart of a preferred embodiment of a coating method for a touch screen provided by the present invention. Detailed Implementation

[0022] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0023] This invention provides a coating method for a touchscreen, see [link to relevant documentation]. Figure 1 The diagram shown is a flowchart of a preferred embodiment of a coating method for a touchscreen provided by the present invention, the method comprising steps S11 to S14:

[0024] Step S11: Pre-treat the surface of the touch screen;

[0025] Step S12: Place the pre-treated touch screen in the magnetron sputtering equipment;

[0026] Step S13: Inert gas is introduced into the magnetron sputtering equipment, and the vacuum level in the magnetron sputtering equipment is controlled to a preset vacuum level;

[0027] Step S14: Apply a preset voltage to the metal target in the magnetron sputtering equipment to generate glow discharge, causing metal atoms on the metal target to be sputtered out, so as to form a metal film on the surface of the pre-treated touch screen.

[0028] In practice, the surface of the touch screen is first pretreated; then, the pretreated touch screen is placed in a magnetron sputtering apparatus; next, an inert gas is introduced into the magnetron sputtering apparatus, and the apparatus is evacuated to control the vacuum level to a preset level; finally, a preset voltage is applied to the metal target in the magnetron sputtering apparatus to generate a glow discharge, which sputters metal atoms from the metal target, thereby forming a thin metal film on the surface of the pretreated touch screen.

[0029] It should be noted that the thickness and resistivity of the metal thin film can be adjusted by controlling the sputtering time and sputtering power.

[0030] In one optional embodiment, the pretreatment of the touchscreen surface specifically includes:

[0031] The surface of the touch screen is cleaned, dried, and degreased.

[0032] Specifically, in conjunction with the above embodiments, when pre-treating the surface of the touch screen, the present invention can perform treatment steps such as cleaning, drying and degreasing on the surface of the touch screen.

[0033] In one alternative embodiment, the inert gas is argon.

[0034] Specifically, in conjunction with the above embodiments, when introducing an inert gas into the magnetron sputtering equipment, the inert gas introduced can be argon, or other suitable inert gas can be selected. The embodiments of the present invention do not make specific limitations.

[0035] In one alternative embodiment, the argon gas flow rate is 50 sccm.

[0036] Specifically, in conjunction with the above embodiments, when argon gas is introduced into the magnetron sputtering equipment, the flow rate of argon gas can be 50 sccm. That is, the present invention can introduce argon gas into the magnetron sputtering equipment at a flow rate of 50 sccm.

[0037] In one optional embodiment, the preset vacuum level is 10. -4 Below Pa.

[0038] Specifically, in conjunction with the above embodiments, when evacuating the magnetron sputtering equipment, the present invention can control the vacuum level in the magnetron sputtering equipment to a preset vacuum level, and the value of the preset vacuum level can be 10. -4 Below Pa, that is, the embodiments of the present invention can evacuate the magnetron sputtering equipment to reduce the vacuum level in the magnetron sputtering equipment to 10 Pa. -4 Below Pa.

[0039] In one optional embodiment, the metal target is an indium tin oxide target or a fluorine-doped tin oxide target.

[0040] Specifically, in conjunction with the above embodiments, the metal target used in the embodiments of the present invention can be an indium tin oxide (ITO) target or a fluorine-doped tin oxide (FTO) target. That is, in the embodiments of the present invention, the ITO target or FTO target can be placed in the magnetron sputtering equipment in advance.

[0041] It is understood that, in addition to ITO or FTO targets, other suitable metal targets may be selected in the embodiments of the present invention, and the embodiments of the present invention do not make specific limitations.

[0042] In one alternative embodiment, the preset voltage is 600V.

[0043] Specifically, in conjunction with the above embodiments, when applying a preset voltage to the metal target in the magnetron sputtering equipment, the preset voltage can be 600V. That is, the present invention can apply a high voltage of 600V to the metal target in the magnetron sputtering equipment to generate glow discharge.

[0044] In one alternative embodiment, the sputtering time of the metal film is 5 minutes.

[0045] Specifically, in conjunction with the above embodiments, when forming a metal thin film on the surface of a touch screen using magnetron sputtering technology, the sputtering time of the metal thin film can be 5 minutes.

[0046] In one alternative embodiment, the sputtering power of the metal film is 100W.

[0047] Specifically, in conjunction with the above embodiments, when forming a metal thin film on the surface of a touch screen using magnetron sputtering technology, the sputtering power of the metal thin film can be 100W.

[0048] In one alternative embodiment, the metal thin film has a light transmittance of 90% and a resistivity of 10⁻⁶.-4 Ω·cm.

[0049] Specifically, in conjunction with the above embodiments, when forming a metal thin film on the surface of a touchscreen using magnetron sputtering technology, the final metal thin film obtained has a light transmittance of 90% and a resistivity of 10⁻⁶. -4 Ω·cm.

[0050] Based on all the above embodiments, the implementation process of this solution is described below through a specific embodiment, including: (1) cleaning, drying and degreasing the surface of the touch screen; (2) placing the touch screen into the magnetron sputtering equipment; (3) introducing argon gas into the magnetron sputtering equipment at a flow rate of 50 sccm; (4) evacuating the magnetron sputtering equipment to reduce the vacuum level in the magnetron sputtering equipment to 10. -4 Pa below; (5) Apply a high voltage of 600V to the ITO or FTO target in the magnetron sputtering equipment to generate glow discharge. The glow discharge sputters the metal atoms on the metal target and controls the sputtering time to 5 minutes and the sputtering power to 100W, thereby forming a metal film on the surface of the touch screen.

[0051] Furthermore, experimental tests show that the metal thin film obtained after coating using the embodiments of the present invention has a light transmittance of 90% and a resistivity of 10⁻⁶. -4 The sensitivity of the touchscreen is improved by 20% compared to traditional touchscreen coating processes, achieving an Ω·cm value.

[0052] In summary, the touchscreen coating method provided by this invention involves: first, pretreating the surface of the touchscreen; then, placing the pretreated touchscreen in a magnetron sputtering apparatus; next, introducing an inert gas into the magnetron sputtering apparatus and controlling the vacuum level within the apparatus to a preset level; and finally, applying a preset voltage to a metal target in the magnetron sputtering apparatus to generate a glow discharge, causing metal atoms on the metal target to be sputtered out, thereby forming a metal thin film on the surface of the pretreated touchscreen. This invention provides the following beneficial effects:

[0053] (1) Magnetron sputtering technology is used, which has a faster deposition rate and lower cost;

[0054] (2) Metal thin films deposited by magnetron sputtering technology have the characteristics of uniformity, density and high light transmittance;

[0055] (3) By improving the coating process of the touch screen, the sensitivity and transmittance of the touch screen are improved, thereby improving the display effect and user experience of the touch screen.

[0056] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A coating method for a touchscreen, characterized in that, include: Pre-treat the surface of the touchscreen; The pre-processed touchscreen is placed in a magnetron sputtering device; An inert gas is introduced into the magnetron sputtering equipment, and the vacuum level in the magnetron sputtering equipment is controlled to a preset vacuum level. A preset voltage is applied to the metal target in the magnetron sputtering equipment to generate glow discharge, causing metal atoms on the metal target to be sputtered out, so as to form a metal film on the surface of the pre-treated touch screen.

2. The coating method for a touchscreen as described in claim 1, characterized in that, The pretreatment of the touchscreen surface specifically includes: The surface of the touch screen is cleaned, dried, and degreased.

3. The coating method for a touchscreen as described in claim 1, characterized in that, The inert gas is argon.

4. The coating method for a touchscreen as described in claim 3, characterized in that, The flow rate of the argon gas is 50 sccm.

5. The coating method for a touchscreen as described in claim 1, characterized in that, The preset vacuum level is 10. -4 Below Pa.

6. The coating method for a touchscreen as described in claim 1, characterized in that, The metal target is an indium tin oxide target or a fluorine-doped tin oxide target.

7. The coating method for a touch screen as described in claim 1, characterized in that, The preset voltage is 600V.

8. The coating method for a touchscreen as described in claim 1, characterized in that, The sputtering time for the metal film is 5 minutes.

9. The coating method for a touch screen as described in claim 1, characterized in that, The sputtering power of the metal thin film is 100W.

10. The coating method for a touchscreen as described in claim 1, characterized in that, The metal thin film has a light transmittance of 90% and a resistivity of 10⁻⁶. -4 Ω·cm.

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